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WO2008041636A1 - Polyimide and optical waveguide using the same - Google Patents

Polyimide and optical waveguide using the same Download PDF

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Publication number
WO2008041636A1
WO2008041636A1 PCT/JP2007/069006 JP2007069006W WO2008041636A1 WO 2008041636 A1 WO2008041636 A1 WO 2008041636A1 JP 2007069006 W JP2007069006 W JP 2007069006W WO 2008041636 A1 WO2008041636 A1 WO 2008041636A1
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Prior art keywords
polyimide
chemical
bis
skeleton
aromatic
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PCT/JP2007/069006
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French (fr)
Japanese (ja)
Inventor
Maki Kinami
Yosuke Yukawa
Go Matsuoka
Satoshi Imahashi
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Toyobo Co Ltd
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Toyobo Co Ltd
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Priority to JP2007557264A priority Critical patent/JP5560526B2/en
Publication of WO2008041636A1 publication Critical patent/WO2008041636A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1221Basic optical elements, e.g. light-guiding paths made from organic materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Definitions

  • the present invention relates to a polyimide for optical materials that can be used for optical waveguide elements, optical fibers, lenses, optical disk substrates and the like having heat resistance and excellent dimensional stability and a low linear expansion coefficient.
  • the present invention can be used as an optical material for optical waveguides in opto-electronic integrated circuits (OEIC) and opto-electronic hybrid mounting wiring boards, and it is particularly excellent in optical polyimide that combines heat resistance, low linear expansion coefficient, light transmission characteristics, and insulation sustainability.
  • the present invention relates to an optical material.
  • the polyimide used in polymer optical waveguides is peeled or warped due to the difference in linear expansion coefficient between the silicon substrate and the like, and the polyimide is softened at 320 ° C or higher in Au—Sn solder, resulting in malfunction.
  • the present invention relates to a polyimide for optical materials that solves the problems such as the loss of functionality as an optical component due to the double refraction.
  • optical branching couplers optical power bras
  • optical multiplexers / demultiplexers optical isolators
  • optical fiber amplifiers etc.
  • optical waveguide type elements are of particular interest and practical materials are strongly desired.
  • the optical waveguide element with the highest performance and high reliability is the glass optical waveguide, but there are problems in the process, such as the high temperature process above 1000 ° C in the manufacturing process. Has a problem.
  • an optical waveguide using a polyethylene methacrylate or polycarbonate As a polymer optical waveguide using a polymer material other than the fluorinated polyimide, an optical waveguide using a polyethylene methacrylate or polycarbonate has been proposed.
  • the polymer material of poly (methyl methacrylate) is inexpensive and easy to process.
  • Polymethyl methacrylate has a low glass transition temperature (Tg) of about 100 ° C, so it can be heated during processing. Therefore, there is a risk of softening, and there is a problem that the refractive index cannot be controlled.
  • Tg glass transition temperature
  • Fluorinated polyimide is transparent in the communication wavelength band (1 ⁇ S ⁇ m, 1.55 m). Although it passes, its linear expansion coefficient is high, so if a wave-guiding layer is formed on a silicon wafer or a synthetic quartz substrate, the substrate is often distorted or peeled off from the substrate.
  • the polyimide is formed on the substrate.
  • the core layer consisting of 2, 2'-dichloro-4,4 ', 5,5' is a first polyimide obtained by polycondensation of monobiphenyltetracarboxylic dianhydride and aromatic diamine and a cladding layer of 2 , 2'-dichloro-4,4 ', 5,5'-biphenyltetracarboxylic dianhydride, including biphenyltetracarboxylic dianhydride, and second polyimide obtained by polycondensation of aromatic diamine
  • chlorine is generated from the constituent polyimide by dissociation and decomposition (see Patent Document 5, for example). In many cases, it has a great influence on the insulation failure of the conductor circuit.
  • a polymer having a rigid and bulky skeleton has low thermal expansion and excellent dimensional stability due to its rigidity, and has high heat resistance, and the bulky skeleton reduces its polarizability and birefringence. There is an effect that can be reduced.
  • the structure of [Chemical 1] can be cited as a skeleton that can be expected to have such effects.
  • Polyimides incorporating this skeleton include 4,4'-one (2,2'-hexafluoroisopropylidene) diphthalic dianhydride and 2,2,1-bis (biphenyl) benzidine.
  • 4,4 '-(2,2'-hexafluoroisopropylidene) diphthalic dianhydride the linear expansion coefficient is 62.3 ppm. There is no solution to distorting or peeling off a substrate as high as / ° C.
  • Patent Document 1 Japanese Patent Laid-Open No. 09-021920
  • Patent Document 2 Japanese Patent Laid-Open No. 11 147955
  • Patent Document 3 Japanese Patent Laid-Open No. 06-208033
  • Patent Document 4 Japanese Patent Laid-Open No. 04-009807
  • Patent Document 5 Japanese Unexamined Patent Publication No. 2005-350562
  • Non-Patent Document 1 JC Chen, FW Harris, Polymer, 40, 4571 (1999)
  • the present invention was made to solve the above-mentioned problems in optical materials, particularly polymer-based optical waveguides, and is a substrate for forming a linear waveguide and a linear expansion coefficient of polyimide as an optical material.
  • optical materials particularly polymer-based optical waveguides
  • a substrate for forming a linear waveguide and a linear expansion coefficient of polyimide as an optical material As a result, the difference in the coefficient of linear expansion between the glass substrate and the key substrate is small. As a result, the substrate is not curled and the substrate and the optical waveguide are not easily separated. Therefore, an object of the present invention is to provide an optical material, particularly an optical waveguide, which has characteristics that do not cause a poor insulation of a conductor circuit.
  • the present invention is based on the following configuration.
  • a polyimide containing no chlorine atom in the molecule! / Obtained by reacting an aromatic tetracarboxylic acid and an aromatic diamine, which has a glass transition point of 300 ° C or higher and a birefringence index Polyimide, characterized by having a coefficient of linear expansion of 0.15 or less and a linear expansion coefficient of 70 ppm / ° C or less.
  • [Chemical Formula 1] shows two aspects of the phenyl skeleton
  • [Chemical Formula 2] shows two aspects of the biphenyl skeleton
  • [Chemical Formula 3] shows three aspects of the naphthyl skeleton.
  • X;! To X6 represent a monovalent hydrocarbon aromatic group (phenyl, biphenyl, naphthyl), a monovalent aromatic ether group (phenoxy, biphenoxy, naphthoxy), hydrogen, and each unit (skeleton) ) At least one of them is a monovalent hydrocarbon aromatic group and / or a monovalent aromatic ether group, and the other bonding part represents a carboxylic acid bonding part.
  • polyimide as described in any one of 1 to 4 above, wherein the polyimide has a linear expansion coefficient of 60 ppm / ° C or less and contains the following structural formula [Chemical Formula 7] in the polyimide structure.
  • the polyimide for optical material according to the present invention is a polyimide that does not contain a chlorine atom in the molecule, has a glass transition point of 300 ° C or higher, a birefringence of 0.15 or lower, and a linear expansion coefficient of 70 ppm / ° C or lower. It is a polyimide for an optical material, and its linear expansion coefficient is small and the difference between the linear expansion coefficient of the glass substrate and the silicon substrate is small. Even if a crack layer or core layer is formed, the substrate does not curl and the substrate and the optical waveguide are not easily peeled off.
  • the insulation failure of the conductor circuit Heat resistance, light transmission, low coefficient of linear expansion, insulation maintenance, with characteristics that do not cause malfunction due to deformation of polyimide at a temperature of 320 ° C or higher in Au-Sn solder that is hard to generate And is useful as an optical material, particularly as an optical waveguide.
  • the polyimide in the present invention is a polyimide obtained by reacting, for example, an aromatic tetraforce rubonic acid containing no chlorine atom in the molecule with an aromatic diamine, and has a glass transition point of 300 ° C or higher.
  • Any polyimide having a birefringence of 0.15 or less and a linear expansion coefficient of 70 ppm / ° C or less is not particularly limited, but the following aromatic diamines and aromatic tetracarboxylic acid (anhydrous anhydride) Things) are preferred! /, For example.
  • one or more diamines exemplified below may be used in combination with the above diamine.
  • it is less than 50 mol%, or less than 30 mol%, further less than 20 mol% of all diamines (including diamine and amide bond derivatives).
  • diamines examples include 5-amino-2- (p-aminophenyl) benzoxazole, 6-amino-2- (p-aminophenyl) benzoxazole, and 5-amino-2- (m-aminophenol).
  • the molecule used in the present invention does not contain a chlorine atom! /,
  • An aromatic tetracarboxylic acid (including tetracarboxylic acid, dianhydride, amide bond derivative, etc.) that can be preferably used.
  • Specific examples of carboxylic acids include, but are not limited to, compounds represented by [Chemical 27] to [Chemical 50].
  • one or more aromatic tetracarboxylic acids exemplified below may be used in combination with the aromatic tetracarboxylic acids.
  • it is less than 50 mol% of all tetracarboxylic acids (including tetracarboxylic acid and carboxylic acid derivatives), or less than 30 mol%, more preferably less than 20 mol%.
  • the polyimide of the present invention can be produced, for example, by polycondensation (polymerization) of the aromatic diamines and the aromatic tetracarboxylic acid (anhydride) to produce a polyamic acid, and imidizing the polyamic acid.
  • polyamic acid polyamic acid
  • the solvent used in the production of the polyamic acid is not particularly limited as long as it dissolves the raw material monomer and the resulting polyamic acid! /, But there is no particular limitation, but a polar organic solvent is preferred.
  • 2-pyrrolidone N-acetylyl 2-pyrrolidone, N, N dimethylformamide, N, N
  • examples thereof include talamides such as lumamide, N, N-dimethylacetamide, dimethyl sulfoxide, hexamethylphosphoric amide, ethyl acetate sorb acetate, diethylene glycol dimethyl ether, sulphophoran, halogenated phenols, and m-taresol.
  • solvents can be used alone or in combination.
  • the amount of the solvent used is sufficient if it is sufficient to dissolve the monomer as a raw material.
  • the specific amount used is that the mass power of the monomer in the solution in which the monomer is dissolved is usually 5 to 40% by mass, preferably The amount is 10-30% by mass.
  • a co-solvent may be used to azeotrope water.
  • force S including toluene, xylene and the like is not limited as long as water can be efficiently azeotroped.
  • polymerization reaction The conditions for the polymerization reaction for producing the polyamic acid (hereinafter, simply referred to as “polymerization reaction”) are as follows: after the production of polyamic acid, the conventional known conditions can be applied, followed by thermal imidization or chemical imidization.
  • the two-stage polymerization, or the one-stage polymerization which is performed at once in an organic solvent until imidization is preferably used.
  • the two-stage polymerization include stirring and / or mixing continuously in an organic solvent at a temperature range of 0 to 80 ° C. for 10 minutes to 30 hours. If necessary, the polymerization reaction may be divided or the temperature may be increased or decreased. In this case, the order of addition of both monomers is not particularly limited, but it is preferable to add aromatic tetracarboxylic anhydrides to a solution of aromatic diamines.
  • the one-step polymerization is continuously carried out in a temperature range of 0 to 80 ° C for 10 minutes to 30 hours with stirring and / or mixing in an organic solvent, and then further performed at 100 to 300 ° C. The process is continued for 10 to 30 hours in the temperature range.
  • the polymerization reaction can be divided or the temperature can be raised or lowered.
  • the order of addition of both reactants is not particularly limited, but it is preferable to add aromatic tetracarboxylic acid anhydrides to the solution of aromatic diamines.
  • the polymerization reaction is preferably carried out while distilling off water together with the azeotropic solvent. Further, a ring-closing catalyst may be used.
  • the ring-closing catalyst used in the present invention include aromatic carboxylic acids such as benzoic acid, o-benzoic acid, m-benzoic acid and p-benzoic acid, and aliphatic tertiary compounds such as trimethylamine and triethylamine.
  • the content of the ring-closing catalyst is preferably in the range in which the content (mol) of the ring-closing catalyst (mol) / the content (mol) of the precursor polyamic acid is 0.01 to 10;
  • the mass of the polyamic acid obtained by the polymerization reaction or the polyamic acid or polyimide in the polyimide solution is preferably 5 to 40% by mass, more preferably 10 to 30% by mass, and the viscosity of the solution is a Brookfield viscometer According to the measurement according to the above (25 ° C.), the point of stability of the liquid feeding is also preferably 10 to 2000 Pa ′s, more preferably 100 to lOOOPa ′s.
  • the reduced viscosity (7] sp / C) of the polyamic acid or polyimide in the present invention is not particularly limited, but is preferably 1. Odl / g or more, more preferably 2.0 dl / g or more.
  • Vacuum degassing during the polymerization reaction is effective for producing a good quality polyamic acid or polyimide organic solvent solution.
  • the polymerization may be controlled by adding a small amount of an end-capping agent to the aromatic diamine before the polymerization reaction.
  • the end capping agent include compounds having a carbon-carbon double bond such as anhydrous maleic acid.
  • maleic anhydride is used, the amount used is preferably from 0.00;! To 1.0 monole per mole of aromatic diamine.
  • an imidization method by high-temperature treatment a conventionally known imidization reaction can be appropriately used.
  • the imidization reaction proceeds by subjecting it to a heat treatment (so-called thermal ring-closing method), or a polyamic acid solution containing a ring-closing catalyst and a dehydrating agent.
  • a heat treatment so-called thermal ring-closing method
  • a polyamic acid solution containing a ring-closing catalyst and a dehydrating agent There can be mentioned a chemical ring closure method in which an imidization reaction is carried out by the action of the above ring closure catalyst and a dehydrating agent.
  • the heating maximum temperature of the thermal ring closure method is exemplified by 100 to 500 ° C, preferably 200 to 480 ° C. If the maximum heating temperature is lower than this range, it is difficult to sufficiently close the ring, and if it is higher than this range, deterioration proceeds and the composite tends to become brittle.
  • a more preferred embodiment includes a two-stage heat treatment in which treatment is performed at 150 to 250 ° C. for 3 to 20 minutes and then treatment at 350 to 500 ° C. for 3 to 20 minutes.
  • the imidization reaction of the polyamic acid solution partially proceeds to provide self-supporting properties.
  • imidization can be performed completely by heating.
  • the condition for partially proceeding with the imidization reaction is preferably a heat treatment at 100 to 200 ° C. for 3 to 20 minutes (3 minutes to 30 hours), in order to complete the imidation reaction.
  • the condition is preferably a heat treatment for 3 to 20 minutes at 200 to 400 ° C.
  • the timing for adding the ring-closing catalyst to the polyamic acid solution is not particularly limited, and may be added in advance before the polymerization reaction for obtaining the polyamic acid, or may be added during or after the polymerization reaction.
  • Specific examples of the ring-closing catalyst include aliphatic tertiary amines such as trimethylamine and triethylamine, and heterocyclic tertiary amines such as isoquinoline, pyridine, and betapicoline. At least one amine selected from tertiary amines is preferred.
  • the amount of the ring-closing catalyst used per mole of polyamic acid is not particularly limited, but is preferably 0.01 to 10 moles.
  • the timing of adding the dehydrating agent to the polyamic acid solution is not particularly limited, and may be added in advance before the polymerization reaction for obtaining the polyamic acid.
  • Specific examples of the dehydrating agent include aliphatic carboxylic acid anhydrides such as acetic anhydride, propionic anhydride, butyric anhydride, and aromatic carboxylic acid anhydrides such as benzoic anhydride. Among them, acetic anhydride, benzoic anhydride, etc. Acids or mixtures thereof are preferred.
  • the amount of the dehydrating agent used per mole of polyamic acid is not particularly limited, but is preferably 0.01 to 10 moles. When using a dehydrating agent, you can use acetylacetone and the like together!
  • the polyimide in the present invention is preferably a polyimide having a linear expansion coefficient of 60 ppm / ° C or less and a skeleton represented by the structural formula [Chemical Formula 7].
  • it is obtained by reacting 2,2'-bis (biphenyl) benzidine (a diamine having a [Chemical 7] skeleton) with tetracarboxylic dianhydride having a rigid structure such as pyromellitic acid. More preferred is [Chemical 5 ;!
  • a polyimide obtained by reacting with a substituted aromatic tetracarboxylic dianhydride, especially 3,6-diphenylbiromellitic acid [Chemicals 51] is preferably used for tetracarboxylic dianhydride! /.
  • mixing other resins with the polyimide described above does not exclude this unless the dimensional stability and low linear expansion coefficient of the present invention are impaired! / It is preferable that 50% by mass or more is contained in the mixed resin.
  • the birefringence of the polyimide is not particularly limited as long as it is 0.15 or less.
  • the force S is preferably 0.10 or less. If the birefringence exceeds 0.15, the functionality as an optical component is likely to be impaired.
  • Non-Patent Document 2 The synthesis of 2,2′-bis (biphenyl) benzidine in the present invention was in accordance with the following document (Non-Patent Document 2).
  • Non-Patent Document 2 Der— Jang Liaw, Macromolecules, 38, 4024 (2005)
  • the polyimide in the present invention is preferably a polyimide having a skeleton represented by the structural formula [Chemical Formula 8].
  • Rigidities such as 2,5 diphenylenol 1,4 phenyldiamine (diamine of [Chemical Formula 8]) and pyromellitic acid, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride
  • It is a polyimide obtained by reacting with a tetracarboxylic dianhydride having a simple structure, and more preferably has a rigid and bulky substituent as shown in the above [Chemical Formula 51] to [Chemical Formula 59].
  • an aromatic tetracarboxylic dianhydride it is desirable to use [Chemical Formula 52] or [Chemical Formula 53] as a tetracarboxylic dianhydride.
  • mixing other resins with the polyimide does not exclude this unless the low birefringence, heat resistance, and dimensional stability of the present invention are impaired, but the polyimide of the present invention is mixed. It is preferable to contain 50% by mass or more in the resin.
  • Non-Patent Document 3 L. H. Klemm, J. Heterocyclic. Chem, 2, 140 (1965)
  • the birefringence of the polyimide is not particularly limited as long as it is 0.15 or less, and preferably S 0.05 or less. More preferably 0.03 or less, still more preferably 0.0 1 or less, particularly preferably 0.005 or less is desirable. If the birefringence exceeds 0.1, the functionality as an optical component is likely to be impaired.
  • the linear expansion coefficient of the polyimide is not particularly limited as long as it is 70 ppm / ° C or less, but is preferably 50 ppm / ° C or less, more preferably 30 ppm / ° C or less, and even more preferably 15 ppm / ° C. ° C or less is preferred.
  • the linear expansion coefficient exceeds 70 ppm / ° C, distortion occurs between the polyimide and the substrate, and there is a high possibility that warpage and peeling will occur due to this distortion.
  • various fillers may be added to the polyimide within a range that does not impair the properties of the optical material polyimide as an optical waveguide.
  • examples of such fillers include wear resistance improvers such as graphite, carborundum, keystone powder, molybdenum disulfide, and fluorine resins, reinforcing agents such as glass fibers and carbon fibers, antimony trioxide, and magnesium carbonate.
  • Flame retardants such as calcium and calcium carbonate, electrical property improvers such as clay and my strength, tracking resistance improvers such as vest, silica and graphite, and acid resistance such as barium sulfate, silica and calcium metasilicate
  • Heat conductivity improver such as iron powder, zinc powder, aluminum powder, copper powder, glass beads, glass spheres, talc, key algae, alumina, shirasu balun, hydrated alumina, metal oxide, colorant, etc. Can be mentioned.
  • the polyimide obtained by the reaction may be reprecipitated from the reaction solution using an appropriate poor solvent.
  • the poor solvent include acetone, methanol, ethanol, water, and the like.
  • the poor solvent is not particularly limited as long as it can be reprecipitated efficiently.
  • the solvent for removing the residual reaction solvent after reprecipitation is not particularly limited, but it is preferable to use the solvent used for reprecipitation.
  • the reaction solution may be used as a polyimide solution as it is, or the polyimide reprecipitated by the above-described method may be dissolved in a solvent again to obtain a polyimide solution.
  • a solvent again to obtain a polyimide solution.
  • the polyimide there is no particular limitation as long as the polyimide can be dissolved efficiently, but examples include o-creso monore, m-creso monore, p-creso monore, N-methylo.
  • the means for mixing the polyimide and the organic solvent is not particularly limited.
  • the composition of the polyimide in the polyimide solution obtained in the present invention is preferably 1 to 50% by mass, more preferably 5 to 30% by mass. in this case. Its viscosity is 0 ⁇ l to 2000 Pa-s as measured with a Brookfield viscometer, preferably;! To lOOOPa • s, which is preferable because stable processing is possible.
  • the method of applying the polyimide solution onto the substrate is not particularly limited! /,
  • spin coating such as spin coating, doctor blade, applicator, comma coater
  • a method using a squeegee, a screen printing method, and the like for example, a method using a squeegee, a screen printing method, and the like.
  • the drying temperature condition for removing the polyimide solution solvent applied on the substrate is 80 ° C or higher, preferably 150 ° C or higher, more preferably 180 ° C or higher. Is. If the drying temperature is too low, it takes time to evaporate the solvent, or sufficient drying is expected! If the drying temperature is high! /, Better, 1S too high, the film properties will deteriorate due to thermal deterioration, so it is better to keep the temperature below 500 ° C.
  • the base material is preferably a base material that constitutes an electric / electronic component, a wiring board, or the like, but is not limited thereto.
  • a base material that constitutes an electric / electronic component, a wiring board, or the like, but is not limited thereto.
  • an inorganic substrate such as a silicon wafer, a glass substrate, or a copper foil, a polyethylene terephthalate film And organic substrates such as polyimide films.
  • a solution dissolved in ⁇ -methyl-2-pyrrolidone so that the polymer concentration was 0.2 g / dl was measured at 25 ° C. with an Ubbelohde type viscosity tube.
  • the measurement was made using a micrometer (Millitron 1254D, manufactured by Finerfu).
  • the glass transition point (Tg) was measured under the following conditions.
  • the glass transition point mentioned here was calculated as the Inflection temperature in the analysis of the step-like curve.
  • Temperature rise start temperature room temperature
  • Temperature rise end temperature 450 ° C
  • the glass transition point may not be detected by the above DSC measurement. In that case, the inflection point in the above average linear expansion coefficient measurement was taken as the glass transition point. If there was no inflection point up to 400 ° C, the glass transition point was determined to be 400 ° C or higher.
  • the scattering detection method uses an optical fiber as a probe, moves the tip approaching the waveguide while keeping the angle and the distance from the waveguide constant, and plots logP with respect to L. This is a measurement method for calculating propagation loss.
  • DPBPDA [Chemical Formula 37] (2, 2'-diphenylenole 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) was added in an amount of 4.46 parts by mass and DAMBO (5-amino- 2- (p-aminomino) benzoxazolene) 2 ⁇ 25 parts by mass were dissolved in m-taresol to give a 3% by mass solution.
  • isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution.
  • DPBPDA [Chemical Formula 37] (2, 2'-diphenylenole 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) was added in an amount of 4.46 parts by mass and TFMB (2, 2 'Bis (trifnoleolomethyl) 4 , 4 , diaminobiphenyl) 3 ⁇ 20 parts by mass was dissolved in m-taresol to give a 3% by mass solution. After stirring this at room temperature for 3 hours, isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution.
  • DPBPDA [Chemical Formula 37] (2, 2'-diphenylenole 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) was added in an amount of 4-46 parts by mass and Fluorenediamine (9, 9 , Bis (4-aminophenyl) fluorene) 3 ⁇ 48 parts by mass was dissolved in m-taresol to give a 5% by mass solution. After stirring this at room temperature for 3 hours, isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution.
  • DPBPDA [Chemical Formula 37] (2,2'-diphenylenoyl 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) 3.57 parts by mass, BPDA (3,4 , 3, 4, bihue Polyimide in the same manner as in Example 1 except that 0 ⁇ 56 parts by mass of dienetetracarboxylic dianhydride) and DAMBO (5 amino-2- ( ⁇ -aminophenyl) benzoxazole) 2. 25 parts by mass were used. A film was obtained. The film was peeled from the silicon substrate, and the linear expansion coefficient was measured and found to be 10.5 ppm / ° C.
  • the glass transition point could not be detected by DSC and the inflection point was not observed in the TMA measurement, the glass transition point was determined to be 400 ° C or higher.
  • DPBPDA [Chemical Formula 37] (2, 2'-diphenyl 3, 4, 3 ', 4'-biphenylene tetracarboxylic dianhydride) was added in an amount of 4.46 parts by mass and DAMBO (5 Mino 1— (paminophenenole) benzoxazonole) 1.13 mass ⁇ Fluorenediamin e (9, 9 'bis (4-aminophenyl) fluorene) 1.
  • Example 1 except that 74 parts by mass were used A polyimide film was obtained in the same manner. This film was peeled off from the silicon substrate, and the coefficient of linear expansion was measured to be 20. lppm / ° C. The glass transition point could not be detected by DSC, and no inflection point was observed by TMA measurement.
  • DPOBPDA [Chemical Formula 21] (2, 2'-diphenyl 3, 4, 3 ', 4'- biphenyltetracarboxylic dianhydride) was added in 4 ⁇ 78 parts by mass and TFMB (2 , 2'-bis (trifluoromethyl) 4, 4, diaminobiphenyl) 3 ⁇ 20 parts by mass was dissolved in m-taresol to give a 10% by mass solution. Thereafter, a polyimide film was obtained in the same manner as in Example 1. The linear expansion coefficient was 26. lppm / ° C. The glass transition point could not be detected by DSC.
  • the TMA measurement showed that the inflection point was not observed, and the glass transition point was judged to be 400 ° C or higher.
  • the film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 15. lppm / ° C.
  • the glass transition point could not be detected by DSC, and the TMA measurement showed no inflection point. Therefore, the glass transition point was determined to be 400 ° C or higher.
  • a polyimide film was obtained in the same manner as in Example 1.
  • the film was peeled from the silicon substrate and the coefficient of linear expansion was measured. As a result, it was 41. Oppm / ° C and the glass transition point was 380 ° C.
  • the polymer is dissolved in N-methyl-2-pyrrolidone by heating to form a 10% by mass solution, applied onto a clean silicon substrate, and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour.
  • a 6.5 m thick polyimide film was obtained.
  • the film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to be 3.7 ppm / ° C.
  • the glass transition point could not be detected by DSC, and no inflection point was found in the TMA measurement, so the glass transition point was determined to be 400 ° C or higher.
  • the polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a polyimide film having a thickness of 10.6 mm.
  • the polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a polyimide film having a thickness of 13. mm.
  • the film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 8. lppm / ° C.
  • the glass transition point could not be detected by DSC, and no inflection point was observed by TMA measurement, so the glass transition point was determined to be 400 ° C or higher.
  • the film was peeled from the silicon substrate and the coefficient of linear expansion was measured and found to be 0.8 ppm / ° C.
  • the glass transition point could not be detected by DSC, and the inflection point was not observed in TMA measurement, so the glass transition point was determined to be 400 ° C or higher.
  • a 6.0-m-thick polyimide Finolem was obtained by heating the temple for 1 day.
  • the film was peeled from the silicon substrate and the coefficient of linear expansion was measured.
  • the glass transition point could not be detected by DSC, and the TMA measurement showed no inflection point. Therefore, the glass transition point was determined to be 400 ° C or higher.
  • the film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 23.7 ppm / ° C.
  • the glass transition point could not be detected by DSC, and no inflection point was found by TMA measurement. Therefore, the glass transition point was determined to be 400 ° C or higher.
  • the polyimide of the present invention has a small linear expansion coefficient and a small difference from the linear expansion coefficient of a glass substrate or a key substrate, a clad layer or a core layer made of such a polyimide on these substrates. Even when the substrate is formed, the substrate is not curled and the substrate and the optical waveguide are not easily separated from each other, and the conductor circuit is insulated from the composite circuit board in which the conductor circuit and the optical waveguide are mixed. Insufficient defects in Au-Sn solder In 300 ° C or higher, polyimide is softened and deformed due to softening, etc., and malfunction is not caused. Also, the birefringence is small, so the functionality as an optical component is impaired. It is a polyimide that has characteristics such as no dimensional stability, low linear expansion coefficient, optical isotropy, heat resistance, light transmission characteristics, and insulation sustainability, and is useful for optical materials, particularly optical waveguides.
  • Semiconductor mounting technology can be used as it is for optical waveguide production, and it is possible to produce highly reliable optical waveguides with little misalignment and warping at low cost, which is expected to make a significant contribution to the industry. Is done.

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Abstract

[PROBLEMS] To provide a polyimide which has heat resistance, light transmission properties, a low linear expansion coefficient and insulation-retaining properties and which is useful for an optical material, particularly an optical waveguide. [MEANS FOR SOLVING PROBLEMS] Disclosed is a polyimide which contains no chlorine atom in the molecule, and has a glass transition temperature of 300 ºC or higher, a birefringence index of 0.15 or less and a linear expansion coefficient of 70 ppm/ °C or lower. The polyimide can be produced, for example, by reacting an aromatic tetracarboxylic acid with an aromatic diamine, wherein the aromatic tetracarboxylic acid and the aromatic diamine have the structures shown below, respectively.

Description

明 細 書  Specification

ポリイミド及びそれを用レ、た光導波路  Polyimide and optical waveguide using it

技術分野  Technical field

[0001] 本発明は耐熱性で寸法安定性に優れた低線膨張係数を有する光導波路素子、光 ファイバー、レンズ,光ディスク用基板などに使用可能な光学材料用ポリイミドに関し TECHNICAL FIELD [0001] The present invention relates to a polyimide for optical materials that can be used for optical waveguide elements, optical fibers, lenses, optical disk substrates and the like having heat resistance and excellent dimensional stability and a low linear expansion coefficient.

、特に光電子集積回路(OEIC)や光電子混載実装配線板における光導波路の光学 材料として使用可能な、特に耐熱性と低線膨張係数と光透過特性と絶縁維持性とを 兼ね備える性状の優れた光ポリイミド光学材料に関する。本発明は、ポリマー系光導 波路における使用ポリイミドとシリコン基板などとの線膨張係数の乖離による剥がれや 反り、 Au— Sn半田における 320°C以上においてポリイミドが軟化するなどによって変 形し機能不全を招ぐ複屈折により光学部品としての機能性を損なう、などの課題を 解決した光学材料用ポリイミドに関する。 In particular, it can be used as an optical material for optical waveguides in opto-electronic integrated circuits (OEIC) and opto-electronic hybrid mounting wiring boards, and it is particularly excellent in optical polyimide that combines heat resistance, low linear expansion coefficient, light transmission characteristics, and insulation sustainability. The present invention relates to an optical material. In the present invention, the polyimide used in polymer optical waveguides is peeled or warped due to the difference in linear expansion coefficient between the silicon substrate and the like, and the polyimide is softened at 320 ° C or higher in Au—Sn solder, resulting in malfunction. The present invention relates to a polyimide for optical materials that solves the problems such as the loss of functionality as an optical component due to the double refraction.

背景技術  Background art

[0002] 近時関心が高まりつつある光通信分野にお!/、て、重要な光学材料として、光分岐 結合器 (光力ブラ)、光合分波器、光アイソレータ、光ファイバ一アンプ等があるが、そ れらの中でも光導波路型素子が特に関心がもたれ実用的な材料が強く望まれている 。現在、最も高性能で信頼性の高い光導波路素子はガラス光導波路であるが、製造 工程に 1000°C以上での高温プロセスを含む等、工程に問題があり、加工'成形性に おいても課題を有している。  [0002] In the optical communication field, where interest has been increasing recently, optical branching couplers (optical power bras), optical multiplexers / demultiplexers, optical isolators, optical fiber amplifiers, etc. are important optical materials. However, among these, optical waveguide type elements are of particular interest and practical materials are strongly desired. Currently, the optical waveguide element with the highest performance and high reliability is the glass optical waveguide, but there are problems in the process, such as the high temperature process above 1000 ° C in the manufacturing process. Has a problem.

これらの解決のためにポリマー材料を用いるポリマー系光導波路力 最近、数多く 提案されている。透明性、耐熱性、低吸湿性等の性質を備えていることから、含フッ 素ポリイミド樹脂が光導波路用ポリマー材料として数多く提案されている(特許文献 1 〜4、参照)。  In order to solve these problems, polymer optical waveguide forces using polymer materials have been proposed recently. Since it has properties such as transparency, heat resistance and low hygroscopicity, many fluorine-containing polyimide resins have been proposed as polymer materials for optical waveguides (see Patent Documents 1 to 4).

フッ素化ポリイミド以外のポリマー材料を用いたポリマー光導波路としては、ポリメチ ノレメタタリレート、ポリカーボネートなどを用いた光導波路が提案されている。ポリメチ ルメタタリレートのポリマー材料は、低価格であり、しかも、加工も容易であるカ、ポリメ チルメタタリレートは、ガラス転移温度 (Tg)が 100°C程度と低いので、加工中に熱に よって軟化してしまうおそれがあり、屈折率を制御できないという問題も有している [0003] フッ素化ポリイミドは、通信波長帯(1 · S ^ m, 1. 55 m)においては、透明性にす ぐれるものの、その線膨張係数が高いので、シリコンウェハや合成石英基板上に導 波層を形成すれば、基板を歪ませたり基板から剥がれたりすることが多発する。 As a polymer optical waveguide using a polymer material other than the fluorinated polyimide, an optical waveguide using a polyethylene methacrylate or polycarbonate has been proposed. The polymer material of poly (methyl methacrylate) is inexpensive and easy to process. Polymethyl methacrylate has a low glass transition temperature (Tg) of about 100 ° C, so it can be heated during processing. Therefore, there is a risk of softening, and there is a problem that the refractive index cannot be controlled. [0003] Fluorinated polyimide is transparent in the communication wavelength band (1 · S ^ m, 1.55 m). Although it passes, its linear expansion coefficient is high, so if a wave-guiding layer is formed on a silicon wafer or a synthetic quartz substrate, the substrate is often distorted or peeled off from the substrate.

また、基板にカール (弯曲)を起こさない、多層化に際してポリイミド層にソルベント' クラックの生じないポリイミドからなるコア層とクラッド層とを備えたポリマー光導波路を 提供するために、基板上にポリイミドからなるコア層が 2, 2 '—ジクロロー 4, 4 ' , 5, 5 '一ビフヱニルテトラカルボン酸二無水物と芳香族ジァミンとを重縮合して得られる第 1のポリイミドとクラッド層が 2, 2 '—ジクロロー 4, 4 ' , 5, 5 '—ビフエニルテトラカルボ ン酸ニ無水物を含む芳香族テトラカルボン酸二無水物と芳香族ジァミンとを重縮合し て得られる第 2のポリイミドとを設けたポリマー光導波路が提案されている(特許文献 5 、参照)が細密な導体回路と光導波路が混載された複合配線板などにおいて塩素は 解離や分解によって構成ポリイミドから発生し、導体回路の絶縁性不良に多大の影 響を及ぼす場合が多い。  In addition, in order to provide a polymer optical waveguide having a core layer and a clad layer made of polyimide that does not cause curl (folding) in the substrate and does not cause solvent cracks in the polyimide layer when multilayered, the polyimide is formed on the substrate. The core layer consisting of 2, 2'-dichloro-4,4 ', 5,5' is a first polyimide obtained by polycondensation of monobiphenyltetracarboxylic dianhydride and aromatic diamine and a cladding layer of 2 , 2'-dichloro-4,4 ', 5,5'-biphenyltetracarboxylic dianhydride, including biphenyltetracarboxylic dianhydride, and second polyimide obtained by polycondensation of aromatic diamine In polymer composite waveguides with fine conductor circuits and optical waveguides mixed together, chlorine is generated from the constituent polyimide by dissociation and decomposition (see Patent Document 5, for example). In many cases, it has a great influence on the insulation failure of the conductor circuit.

[0004] 剛直で嵩高い骨格を持つポリマーは、その剛直性により低熱膨張で寸法安定性に 優れ、かつ、高い耐熱性を有すると共に、嵩高い骨格により、その分極率が低下し、 複屈折が低減できる効果がある。このような効果が期待できる骨格として [化 1]の構 造が挙げられる。 [0004] A polymer having a rigid and bulky skeleton has low thermal expansion and excellent dimensional stability due to its rigidity, and has high heat resistance, and the bulky skeleton reduces its polarizability and birefringence. There is an effect that can be reduced. The structure of [Chemical 1] can be cited as a skeleton that can be expected to have such effects.

この骨格を導入したポリイミドとしては、 4, 4 '一(2, 2 '一へキサフルォロイソプロピリ デン)ジフタル酸二酸無水物と 2, 2,一ビス(ビフエニル)ベンジジンが挙げられている (非特許文献 1、参照)が、 4, 4 ' - (2, 2 '—へキサフルォロイソプロピリデン)ジフタ ル酸ニ酸無水物の柔軟な構造により、線膨張係数が 62. 3ppm/°Cと高ぐ基板を 歪ませたり基板から剥がれたりすることを解決するには至らない。  Polyimides incorporating this skeleton include 4,4'-one (2,2'-hexafluoroisopropylidene) diphthalic dianhydride and 2,2,1-bis (biphenyl) benzidine. However, due to the flexible structure of 4,4 '-(2,2'-hexafluoroisopropylidene) diphthalic dianhydride, the linear expansion coefficient is 62.3 ppm. There is no solution to distorting or peeling off a substrate as high as / ° C.

特許文献 1 :特開平 09— 021920号公報  Patent Document 1: Japanese Patent Laid-Open No. 09-021920

特許文献 2:特開平 11 147955号公報  Patent Document 2: Japanese Patent Laid-Open No. 11 147955

特許文献 3:特開平 06— 208033号公報  Patent Document 3: Japanese Patent Laid-Open No. 06-208033

特許文献 4 :特開平 04— 009807号公報  Patent Document 4: Japanese Patent Laid-Open No. 04-009807

特許文献 5:特開 2005— 350562号公報 非特許文献 1 :J. C. Chen, F. W. Harris, Polymer, 40, 4571 (1999) Patent Document 5: Japanese Unexamined Patent Publication No. 2005-350562 Non-Patent Document 1: JC Chen, FW Harris, Polymer, 40, 4571 (1999)

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0005] 本発明は、光学材料特にポリマー系光導波路における上述した問題を解決するた めになされたものであって、光学材料としてのポリイミドの線膨張係数と光導波路形 成時の基板であるガラス基板やケィ素基板との線膨張係数の差が小さぐその結果、 基板にカールが発生せず基板と光導波路との剥離が生じ難ぐまた導体回路と光導 波路が混載された複合配線板などにぉレ、て導体回路の絶縁性不良をも発生しなレ、 特性を兼ね備えた光学材料特に光導波路を提供することを目的とする。 [0005] The present invention was made to solve the above-mentioned problems in optical materials, particularly polymer-based optical waveguides, and is a substrate for forming a linear waveguide and a linear expansion coefficient of polyimide as an optical material. As a result, the difference in the coefficient of linear expansion between the glass substrate and the key substrate is small. As a result, the substrate is not curled and the substrate and the optical waveguide are not easily separated. Therefore, an object of the present invention is to provide an optical material, particularly an optical waveguide, which has characteristics that do not cause a poor insulation of a conductor circuit.

課題を解決するための手段  Means for solving the problem

[0006] すなわち本発明は以下の構成によるものである。 That is, the present invention is based on the following configuration.

1. 分子内に塩素原子を含まな!/、芳香族テトラカルボン酸類と芳香族ジァミン類とを 反応させて得られるポリイミドであって、該ポリイミドのガラス転移点が 300°C以上、複 屈折率が 0. 15以下、線膨張係数が 70ppm/°C以下であることを特徴とするポリイミ ド、。  1. a polyimide containing no chlorine atom in the molecule! /, Obtained by reacting an aromatic tetracarboxylic acid and an aromatic diamine, which has a glass transition point of 300 ° C or higher and a birefringence index Polyimide, characterized by having a coefficient of linear expansion of 0.15 or less and a linear expansion coefficient of 70 ppm / ° C or less.

2. ポリイミドのガラス転移点が 320°C以上、線膨張係数が 40ppm/°C以下である ことを特徴とする前記 1に記載のポリイミド。  2. The polyimide according to 1 above, wherein the polyimide has a glass transition point of 320 ° C. or more and a linear expansion coefficient of 40 ppm / ° C. or less.

3. 分子内に塩素原子を含まな!/、芳香族テトラカルボン酸類が以下の [化;!]〜 [化 3]の骨格を有する芳香族テトラカルボン酸類を含む前記 2に記載のポリイミド。  3. The polyimide according to 2 above, wherein the molecule does not contain a chlorine atom! /, And the aromatic tetracarboxylic acid includes an aromatic tetracarboxylic acid having a skeleton of the following [Chemical!] To [Chemical 3].

[化 1]  [Chemical 1]

Figure imgf000004_0001
Figure imgf000004_0001

[化 2]  [Chemical 2]

Figure imgf000004_0002
[化 3]
Figure imgf000004_0002
[Chemical 3]

Figure imgf000005_0001
Figure imgf000005_0001

( [化 1]〜[化 3]において、 [化 1]ではフエニル骨格の 2態様を、 [化 2]ではビフエ二 ル骨格の 2態様を、 [化 3]ではナフチル骨格の 3態様を示し、 X;!〜 X6は、 1価の炭 化水素芳香族基 (フエニル、ビフヱニル、ナフチル)、 1価の芳香族エーテル基 (フエノ キシ、ビフエノキシ、ナフトキシ)、水素を示し、かつ各ユニット (骨格)中少なくとも 1つ が 1価の炭化水素芳香族基及び又は 1価の芳香族エーテル基であり、その他結合部 はカルボン酸結合部を示すものである。 )  (In [Chemical Formula 1] to [Chemical Formula 3], [Chemical Formula 1] shows two aspects of the phenyl skeleton, [Chemical Formula 2] shows two aspects of the biphenyl skeleton, and [Chemical Formula 3] shows three aspects of the naphthyl skeleton. , X;! To X6 represent a monovalent hydrocarbon aromatic group (phenyl, biphenyl, naphthyl), a monovalent aromatic ether group (phenoxy, biphenoxy, naphthoxy), hydrogen, and each unit (skeleton) ) At least one of them is a monovalent hydrocarbon aromatic group and / or a monovalent aromatic ether group, and the other bonding part represents a carboxylic acid bonding part.

4. 芳香族ジァミン類が以下の [化 4]〜 [化 6]の骨格を有する芳香族ジァミン類を 含む前記 2又は 31/、ずれかに記載のポリイミド。  4. The polyimide as described in 2 or 31 / above, wherein the aromatic diamine contains an aromatic diamine having a skeleton of [Chemical Formula 4] to [Chemical Formula 6] below.

[化 4] [Chemical 4]

Figure imgf000005_0002
Figure imgf000005_0002

[化 6]

Figure imgf000005_0003
[Chemical 6]
Figure imgf000005_0003

( [化 4]〜[化 6]において、 [化 4]ではフエニル骨格の 2態様を、 [化 5]ではビフエ二 ル骨格の 2態様を、 [化 6]ではナフチル骨格の 5態様を示し、 X;!〜 X8は、 1価の炭 化水素芳香族基 (フエニル、ビフヱニル、ナフチル)、 1価の芳香族エーテル基 (フエノ キシ、ビフエノキシ、ナフトキシ)、水素を示し、かつ各ユニット (骨格)中少なくとも 1つ が 1価の炭化水素芳香族基及び又は 1価の芳香族エーテル基であり、その他結合部 はァミン結合部を示すものである。 ) (In [Chemical 4] to [Chemical 6], [Chemical 4] shows two aspects of the phenyl skeleton, [Chemical 5] shows two aspects of the biphenyl skeleton, and [Chemical 6] shows five aspects of the naphthyl skeleton. , X;! To X8 are monovalent hydrocarbon aromatic groups (phenyl, biphenyl, naphthyl), monovalent aromatic ether groups (phenol) Xy, biphenoxy, naphthoxy), hydrogen, and at least one of each unit (skeleton) is a monovalent hydrocarbon aromatic group and / or a monovalent aromatic ether group, and the other bond portion is an amine bond portion. It is shown. )

5. ポリイミドの線膨張係数が 60ppm/°C以下であり、かつポリイミド構造中に下記 構造式 [化 7]を含むことを特徴とする前記 1〜4いずれかに記載のポリイミド。  5. The polyimide as described in any one of 1 to 4 above, wherein the polyimide has a linear expansion coefficient of 60 ppm / ° C or less and contains the following structural formula [Chemical Formula 7] in the polyimide structure.

Figure imgf000006_0001
Figure imgf000006_0001

6. ポリイミドの複屈折が 0. 1以下である前記 5記載のポリイミド。  6. The polyimide as described in 5 above, wherein the birefringence of the polyimide is 0.1 or less.

7. ポリイミド構造中に下記構造式 [化 8]のジァミン骨格含むことを特徴とする前記 1 〜4レ、ずれかに記載のポリイミド。  7. The polyimide according to 1 to 4 above, wherein the polyimide structure contains a diamine skeleton of the following structural formula [Chemical Formula 8].

[化 8] [Chemical 8]

Figure imgf000006_0002
Figure imgf000006_0002

8. ポリイミドの複屈折が 0. 05以下である前記 7に記載のポリイミド。  8. The polyimide according to 7 above, wherein the birefringence of the polyimide is 0.05 or less.

9. 前記;!〜 81/、ずれかに記載のポリイミドを用いた光導波路。  9. An optical waveguide using the polyimide according to the above;! ~ 81 /.

発明の効果 The invention's effect

本発明による光学材料用ポリイミドは、分子内に塩素原子を含まないポリイミドであ つて、ガラス転移点が 300°C以上、複屈折率が 0. 15以下、線膨張係数が 70ppm/ °C以下である光学材料用ポリイミドであり、その線膨張係数が小さくガラス基板ゃケィ 素基板の線膨張係数との差が小さレ、ので、これらの基板上にそのようなポリイミドから なるクラック層やコア層を形成した場合も、基板にカールが生じず基板と光導波路と の剥離が生じ難ぐまた導体回路と光導波路が混載された複合配線板などにおいて 導体回路の絶縁性不良をも発生し難ぐ Au— Sn半田における 320°C以上において ポリイミドが軟化するなどによって変形し機能不全を招くことのない特性を兼ね備えた 耐熱性、光透過性、低線膨張係数、絶縁維持性を兼ね備えたポリイミドであって、光 学材料特に光導波路として有用である。 The polyimide for optical material according to the present invention is a polyimide that does not contain a chlorine atom in the molecule, has a glass transition point of 300 ° C or higher, a birefringence of 0.15 or lower, and a linear expansion coefficient of 70 ppm / ° C or lower. It is a polyimide for an optical material, and its linear expansion coefficient is small and the difference between the linear expansion coefficient of the glass substrate and the silicon substrate is small. Even if a crack layer or core layer is formed, the substrate does not curl and the substrate and the optical waveguide are not easily peeled off. Also, in the composite wiring board in which the conductor circuit and the optical waveguide are mixed, the insulation failure of the conductor circuit Heat resistance, light transmission, low coefficient of linear expansion, insulation maintenance, with characteristics that do not cause malfunction due to deformation of polyimide at a temperature of 320 ° C or higher in Au-Sn solder that is hard to generate And is useful as an optical material, particularly as an optical waveguide.

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0008] 本発明におけるポリイミドは、例えば、分子内に塩素原子を含まない芳香族テトラ力 ルボン酸類と芳香族ジァミン類とを反応させて得られるポリイミドであって、ガラス転移 点が 300°C以上、複屈折率が 0. 15以下、線膨張係数が 70ppm/°C以下であるポ リイミドであれば特に限定されるものではないが、下記の芳香族ジァミン類と芳香族テ トラカルボン酸 (無水物)類とが好まし!/、例として挙げられる。  [0008] The polyimide in the present invention is a polyimide obtained by reacting, for example, an aromatic tetraforce rubonic acid containing no chlorine atom in the molecule with an aromatic diamine, and has a glass transition point of 300 ° C or higher. Any polyimide having a birefringence of 0.15 or less and a linear expansion coefficient of 70 ppm / ° C or less is not particularly limited, but the following aromatic diamines and aromatic tetracarboxylic acid (anhydrous anhydride) Things) are preferred! /, For example.

本発明で特に好ましく使用できる芳香族ジァミン類として、下記の [化 9]〜[化 26] の化合物が例示できるがこれらに限定されるものではない。  Examples of aromatic diamines that can be particularly preferably used in the present invention include the following compounds of [Chemical Formula 9] to [Chemical Formula 26], but are not limited thereto.

[0009] [化 9]  [0009] [Chemical 9]

Figure imgf000007_0001
Figure imgf000007_0001

[0010] [化 10]  [0010] [Chemical 10]

Figure imgf000007_0002
Figure imgf000007_0002

[0011] [化 11] [0011] [Chemical 11]

Figure imgf000008_0001
Figure imgf000008_0001

[0015] [化 15] [0015] [Chemical 15]

Figure imgf000009_0001
Figure imgf000009_0001

[0020] [化 20] [0020] [Chemical 20]

Figure imgf000010_0001
Figure imgf000010_0001

[0024] [化 24] [0024] [Chemical 24]

Figure imgf000011_0001
Figure imgf000011_0001

Figure imgf000011_0002
Figure imgf000011_0002

Figure imgf000011_0003
Figure imgf000011_0003

本発明は、下記に例示されるジァミン類を一種又は二種以上、上記ジァミンに併用 してもよい。好ましくは全ジァミン類 (ジァミン及びアミド結合性誘導体を含む)の 50モ ル%未満、もしくは 30モル%未満、さらには 20モル%未満が好ましい。  In the present invention, one or more diamines exemplified below may be used in combination with the above diamine. Preferably, it is less than 50 mol%, or less than 30 mol%, further less than 20 mol% of all diamines (including diamine and amide bond derivatives).

そのようなジァミン類としては、例えば、 5—アミノー 2— (p—ァミノフエニル)ベンゾ ォキサゾール、 6—アミノー 2—(p—ァミノフエニル)ベンゾォキサゾール、 5—アミノー 2 - (m—ァミノフエ二ノレ)ベンゾォキサゾール、 6—アミノー 2— (m—ァミノフエニル) ベンゾォキサゾール、 4, 4,一ビス(3—アミノフエノキシ)ビフエニル、ビス [4— (3—ァ ミノフエノキシ)フエ二ノレ]ケトン、ビス [4— (3—アミノフエノキシ)フエ二ノレ]スルフイド、 ビス [4— (3—アミノフエノキシ)フエ二ノレ]スルホン、 2, 2—ビス [4— (3—アミノフエノ キシ)フエ二ノレ]プロパン、 2, 2—ビス [4— (3—アミノフエノキシ)フエ二ル]— 1 , 1 , 1 , 3, 3, 3—へキサフルォロプロパン、 m—フエ二レンジァミン、 o—フエ二レンジァミン 、 p—フエ二レンジァミン、 m—ァミノべンジノレアミン、 p—ァミノべンジノレアミン、 2, 6 - ジァミノナフタレン、 1 , 4ージァミノナフタレン、 1 , 8 ジァミノナフタレン、 2, 7 ジァ ミノナフタレン、 Examples of such diamines include 5-amino-2- (p-aminophenyl) benzoxazole, 6-amino-2- (p-aminophenyl) benzoxazole, and 5-amino-2- (m-aminophenol). Benzoxazole, 6-amino-2- (m-aminophenyl) Benzoxazole, 4, 4, 1-bis (3-aminophenoxy) biphenyl, bis [4- (3-aminophenoxy) phenyl] ketone, bis [4— (3-Aminophenoxy) phenol] sulfide, bis [4— (3-aminophenoxy) phenol] sulfone, 2,2-bis [4— (3-aminophenoxy) phenol] propane, 2 , 2-bis [4- (3-Aminophenoxy) phenyl] — 1, 1, 1, 3, 3, 3—Hexafluoropropane, m-phenylenediamine, o-phenylenediamine, p— Fenji Rangemi , M-aminobenzinoleamine, p-aminobenzinoleamine, 2, 6- Diaminonaphthalene, 1,4-diaminonaphthalene, 1,8 diaminonaphthalene, 2,7 diaminonaphthalene,

[0028] 3, 3,ージアミノジフエニルエーテル、 3, 4 '—ジアミノジフエニルエーテル、 4, 4' ジアミノジフエニルエーテル、 3, 3'ージアミノジフエニルスルフイド、 3, 3'ージァミノ ジフエニルスルホキシド、 3, 4'—ジアミノジフエニルスルホキシド、 4, 4'ージアミノジ フエニルスルホキシド、 3, 3'ージアミノジフエニルスルホン、 3, 4'—ジアミノジフエ二 ノレスルホン、 4, 4'ージアミノジフエニルスルホン、 3, 3'ージァミノべンゾフエノン、 3, 4'ージァミノべンゾフエノン、 4, 4'ージァミノべンゾフエノン、 3, 3'ージアミノジフエ二 ノレメタン、 3, 4'—ジアミノジフエニルメタン、 4, 4'ージアミノジフエニルメタン、ビス [4 — (4—アミノフエノキシ)フエニル]メタン、 1 , 1—ビス [4— (4—アミノフエノキシ)フエ 二ノレ]ェタン、 1 , 2 ビス [4一(4 アミノフエノキシ)フエ二ノレ]ェタン、 1 , 1 ビス [4 — (4 アミノフエノキシ)フエ二ノレ]プロパン、 1 , 2 ビス [4— (4 アミノフエノキシ)フ ェニノレ]プロパン、 1 , 3 ビス [4一(4 アミノフエノキシ)フエ二ノレ]プロパン、 2, 2— ビス [4— (4—アミノフエノキシ)フエ二ノレ]プロパン、  [0028] 3,3, -diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4 'diaminodiphenyl ether, 3,3'-diaminodiphenylsulfide, 3,3'-diaminodiph Enyl sulfoxide, 3, 4'-diaminodiphenyl sulfoxide, 4, 4'-diaminodiphenyl sulfoxide, 3, 3'-diaminodiphenyl sulfone, 3, 4'-diaminodiphenyl sulfone, 4, 4'-diaminodiphenyl sulfone 3, 3'-Diaminobenzophenone, 3, 4'-Diaminobenzofenone, 4, 4'-Diaminobenzophenone, 3, 3'-Diaminodiphenylenemethane, 3, 4'-Diaminodiphenylmethane, 4, 4'-Diaminodiph Enylmethane, bis [4 — (4-aminophenoxy) phenyl] methane, 1, 1-bis [4— (4-aminophenoxy) phenol binole] ethane, 1, 2 bis [4 (4 aminophenoxy) pheneno] ethane, 1,1 bis [4 — (4 aminophenoxy) pheneno] propane, 1,2 bis [4— (4 aminophenoxy) pheneno]] propane, 1,3 bis [4 (4 aminophenoxy) phenol] propane, 2,2-bis [4-((4-aminophenoxy) phenol] propane,

[0029] 1 , 1 ビス [4一(4 アミノフエノキシ)フエニル]ブタン、 1 , 3 ビス [4一(4ーァミノ フエノキシ)フエ二ノレ]ブタン、 1 , 4一ビス [4一(4一アミノフエノキシ)フエ二ノレ]ブタン、 2, 2 ビス [4一(4ーァミノフエノシ)フエ二ノレ]ブタン、 2, 3 ビス [4一(4ーァミノフエ ノキシ)フエニル]ブタン、 2— [4— (4 アミノフエノキシ)フエニル] 2— [4— (4 ァ ミノフエノキシ) 3 メチルフエ二ノレ]プロパン、 2, 2 ビス [4— (4 ァミノフエノキシ )一 3 メチルフエ二ノレ]プロパン、 2— [4一(4 アミノフエノキシ)フエニル ]ー2— [4 一(4ーァミノフエノキシ) 3, 5 ジメチルフエ二ノレ]プロパン、 2, 2 ビス [4— (4 アミノフエノキシ) 3, 5 ジメチルフエ二ノレ]プロパン、 2, 2 ビス [4— (4 アミノフ エノキシ)フエニル ]ー1 , 1 , 1 , 3, 3, 3—へキサフルォロプロパン、  [0029] 1,1 bis [4 (4-aminophenoxy) phenyl] butane, 1,3 bis [4 (4-aminophenoxy) phenolin] butane, 1,4 bis [4 (4 (aminophenoxy) phene] Ninole] butane, 2, 2 bis [4 1 (4-aminominophen) phenine] butane, 2,3 bis [4 1 (4-aminophenoxy) phenyl] butane, 2— [4— (4 aminophenoxy) phenyl] 2 — [4— (4 aminophenoxy) 3 methylphenoxy] propane, 2, 2 bis [4— (4 aminophenoxy) 1 3 methylphenoxy] propane, 2 — [4 one (4 aminophenoxy) phenyl] -2— [ 4 One (4-aminophenoxy) 3,5 Dimethylphenol] propane, 2,2 bis [4— (4 Aminophenoxy) 3,5 Dimethylphenol] propane, 2,2 bis [4— (4 Aminophenoxy) ) Phenyl] -1, 1, 1, 3, 3, 3—Hexafluoro Propane,

[0030] 1 , 4 ビス(3 アミノフエノキシ)ベンゼン、 1 , 3 ビス(3 アミノフエノキシ)ベンゼ ン、 1 , 4—ビス(4—アミノフエノキシ)ベンゼン、 4, 4'—ビス(4—アミノフエノキシ)ビ フエニル、ビス [4— (4—アミノフエノキシ)フエ二ノレ]ケトン、ビス [4— (4—アミノフエノ キシ)フエ二ノレ]スルフイド、ビス [4一(4 アミノフエノキシ)フエ二ノレ]スルホキシド、ビ ス [4— (4—アミノフエノキシ)フエ二ノレ]スルホン、ビス [4— (3—アミノフエノキシ)フエ 二ノレ]エーテル、ビス [4一(4 アミノフエノキシ)フエニル]エーテル、 1, 3—ビス [4 (4—アミノフエノキシ)ベンゾィル]ベンゼン、 1, 3—ビス [4— (3—アミノフエノキシ)ベ ンゾィル]ベンゼン、 1, 4—ビス [4— (3—アミノフエノキシ)ベンゾィル]ベンゼン、 4, 4,一ビス [(3—アミノフエノキシ)ベンゾィル]ベンゼン、 1, 1—ビス [4— (3—アミノフ エノキシ)フエ二ノレ]プロパン、 1, 3—ビス [4一(3—アミノフエノキシ)フエ二ノレ]プロパ ン、 3, 4'—ジアミノジフエニルスルフイド、 [0030] 1,4 bis (3 aminophenoxy) benzene, 1,3 bis (3 aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenoxy) biphenyl, Bis [4- (4-aminophenoxy) phenol] ketone, Bis [4- (4-aminophenoxy) phenol] sulfide, Bis [4 (4-aminophenoxy) phenol] sulfoxide, Bis [4- (4-Aminophenoxy) phenone] sulfone, bis [4-((3-aminophenoxy) phene Ninole] ether, bis [4 (4-aminophenoxy) phenyl] ether, 1,3-bis [4 (4-aminophenoxy) benzoyl] benzene, 1,3-bis [4- (3-aminophenoxy) benzoyl] benzene 1, 4, 2-bis [4- (3-aminophenoxy) benzoyl] benzene, 4, 4, monobis [(3-aminophenoxy) benzoyl] benzene, 1,1-bis [4- (3-aminophenoxy) phenyl Nore] propane, 1,3-bis [4 (3-aminophenoxy) phenyl] propane, 3,4'-diaminodiphenylsulfide,

[0031] 2, 2 ビス [3— (3 アミノフエノキシ)フエ二ル]— 1, 1, 1, 3, 3, 3 へキサフル ォロプロパン、ビス [4— (3—アミノフエノキシ)フエ二ノレ]メタン、 1, 1 ビス [4— (3— アミノフエノキシ)フエニル]ェタン、 1, 2 ビス [4— (3 アミノフエノキシ)フエニル]ェ タン、ビス [4— (3—アミノフエノキシ)フエ二ノレ]スルホキシド、 4, 4,一ビス [3— (4— アミノフエノキシ)ベンゾィル]ジフエ二ルエーテル、 4, 4,一ビス [3—(3—アミノフエノ キシ)ベンゾィル]ジフエ二ルエーテル、 4, 4' ビス [4一(4 アミノー α , a ジメチ ノレベンジル)フエノキシ]ベンゾフエノン、 4, 4'—ビス [4— (4—ァミノ一 α , a—ジメ チルベンジル)フエノキシ]ジフエニルスルホン、ビス [4— {4— (4—アミノフエノキシ) フエノキシ }フエ二ノレ]スルホン、 1, 4—ビス [4— (4—アミノフエノキシ)フエノキシ α , α—ジメチルベンジル]ベンゼン、 1, 3—ビス [4一(4 アミノフエノキシ)フエノキシ - a, aージメチルベンジル]ベンゼン、 1, 3—ビス [4一(4一アミノー 6—トリフルォ ロメチルフエノキシ) α , α—ジメチルベンジル]ベンゼン、 1, 3—ビス [4一(4ーァ ミノ一 6—フルオロフエノキシ) - a, a—ジメチルベンジノレ]ベンゼン、 1, 3—ビス [4 - (4—アミノー 6—メチルフエノキシ) α , α—ジメチルベンジル]ベンゼン、 1, 3— ビス [4— (4—アミノー 6—シァノフエノキシ) α , α ジメチノレべンジノレ]ベンゼン、 [0031] 2, 2 Bis [3— (3 Aminophenoxy) phenyl] — 1, 1, 1, 3, 3, 3 Hexafluoropropane, Bis [4— (3-Aminophenoxy) phenol] methane, 1 , 1 Bis [4- (3-aminophenoxy) phenyl] ethane, 1,2 Bis [4-((3-aminophenoxy) phenyl] ethane, Bis [4- (3-aminophenoxy) phenyl] sulfoxide, 4, 4, 1-bis [3- (4-aminophenoxy) benzoyl] diphenyl ether, 4,4,1-bis [3- (3-aminophenoxy) benzoyl] diphenyl ether, 4,4 'bis [4 (4-amino-α, a dimethylenobenzyl) phenoxy] benzophenone, 4, 4'-bis [4- (4-amino-1-α, a-dimethylbenzyl) phenoxy] diphenylsulfone, bis [4- {4- (4-aminophenoxy) phenoxy} Ninore] sulfone, 1, 4—bis [4— ( 4-aminophenoxy) phenoxy α, α-dimethylbenzyl] benzene, 1,3-bis [4 (4-aminophenoxy) phenoxy-a, a-dimethylbenzyl] benzene, 1,3-bis [4 (4-amino-6) —Trifluoromethylphenoxy) α, α-Dimethylbenzyl] benzene, 1,3-bis [4 (4-amino-6-fluorophenoxy) -a, a-dimethylbenzenole] benzene, 1 , 3-bis [4- (4-amino-6-methylphenoxy) α, α-dimethylbenzyl] benzene, 1,3-bis [4- (4-amino-6-cyanphenoxy) α, α dimethinolevendinore] benzene,

[0032] 3, 3,ージアミノー 4, 4'ージフエノキシベンゾフエノン、 4, 4'ージアミノー 5, 5' ジフエノキシベンゾフエノン、 3, 4'—ジアミノー 4, 5'ージフエノキシベンゾフエノン、 3 , 3'—ジアミノー 4 フエノキシベンゾフエノン、 4, 4'ージアミノー 5—フエノキシベン ゾフエノン、 3, 4'—ジアミノー 4 フエノキシベンゾフエノン、 3, 4'—ジアミノー 5'— フエノキシベンゾフエノン、 3, 3'ージアミノー 4, 4'ージビフエノキシベンゾフエノン、 4 , 4'ージアミノー 5, 5'ージビフエノキシベンゾフエノン、 3, 4'—ジアミノー 4, 5'ージ ビフエノキシベンゾフエノン、 3, 3,ージアミノー 4ービフエノキシベンゾフエノン、 4, 4, ージアミノー 5—ビフエノキシベンゾフエノン、 3, 4 '—ジアミノー 4ービフエノキシベン ゾフエノン、 3, 4 '—ジアミノー 5 '—ビフエノキシベンゾフエノン、 1 , 3—ビス(3—ァミノ —4—フエノキシベンゾィノレ)ベンゼン、 1 , 4—ビス(3—アミノー 4—フエノキシベンゾ ィノレ)ベンゼン、 1 , 3—ビス(4—ァミノ一 5—フエノキシベンゾィル)ベンゼン、 1 , 4— ビス(4—ァミノ一 5—フエノキシベンゾィル)ベンゼン、 1 , 3—ビス(3—ァミノ一 4—ビ フエノキシベンゾィノレ)ベンゼン、 1 , 4 ビス(3—アミノー 4ービフエノキシベンゾィノレ) ベンゼン、 1 , 3—ビス(4—アミノー 5—ビフエノキシベンゾィノレ)ベンゼン、 1 , 4—ビス (4 ァミノ一 5 ビフエノキシベンゾィル)ベンゼン、 2, 6 ビス [4— (4 ァミノ一 α , aージメチルベンジル)フエノキシ]ベンゾニトリル及び上記芳香族ジァミンにおける 芳香環上の水素原子の一部もしくは全てがフッ素原子、炭素数 1〜3のアルキル基 又はアルコキシル基、シァノ基、又はアルキル基又はアルコキシル基の水素原子の 一部もしくは全部がフッ素原子で置換された炭素数 1〜3のフッ素化アルキル基又は アルコキシル基で置換された芳香族ジァミン等が挙げられる。 [0032] 3,3, -diamino-4,4'-diphenoxybenzophenone, 4,4'-diamino-5,5 'diphenoxybenzophenone, 3,4'-diamino-4,5'-diphenoxy Benzophenone, 3, 3'-diamino-4 phenoxybenzophenone, 4, 4'-diamino-5-phenoxyben zophenone, 3, 4'-diamino-4 phenoxybenzophenone, 3, 4'-diamino-5 ' — Phenoxybenzophenone, 3, 3'-diamino-4,4'-dibiphenoxybenzophenone, 4,4'-diamino-5,5'-dibiphenoxybenzophenone, 3, 4'-diamino- 4,5'-dibiphenoxybenzophenone, 3, 3, -diamino-4-biphenoxybenzophenone, 4, 4, -Diamino-5-biphenoxybenzophenone, 3, 4 '-Diamino-4-biphenoxyben zophenone, 3, 4' -Diamino-5 '-biphenoxybenzophenone, 1,3-bis (3-amino) — 4-phenoxybenzoino) benzene, 1,4-bis (3-amino-4-phenoloxybenzoino) benzene, 1,3-bis (4-amino-5-phenoxybenzoyl) benzene, 1, 4-bis (4-amino-5-phenoxybenzoyl) benzene, 1,3-bis (3-amino-4-biphenoxybenzoino) benzene, 1,4 bis (3-amino-4) -Biphenoxybenzoinole) Benzene, 1,3-bis (4-amino-5-biphenoxybenzoinole) benzene, 1,4-bis (4 amino-5-biphenoxybenzoyl) benzene, 2 , 6 bis [4- (4 amino 1 α, a-dimethylbenzyl ) Phenoxy] benzonitrile and some or all of the hydrogen atoms on the aromatic ring in the aromatic diamine are fluorine atoms, alkyl groups having 1 to 3 carbon atoms, alkoxyl groups, cyano groups, alkyl groups or alkoxyl group hydrogen atoms. Examples thereof include aromatic diamines substituted with a fluorinated alkyl group having 1 to 3 carbon atoms substituted with a fluorine atom or an alkoxyl group.

[0033] 本発明で用いられる分子内に塩素原子を含まな!/、芳香族テトラカルボン酸類 (テト ラカルボン酸や二酸無水物やアミド結合性誘導体などを含む)として好ましく使用で きる芳香族テトラカルボン酸類は、具体的には、 [化 27]〜[化 50]の化合物が挙げら れるカ S、これらに限定されるものではない。  [0033] The molecule used in the present invention does not contain a chlorine atom! /, An aromatic tetracarboxylic acid (including tetracarboxylic acid, dianhydride, amide bond derivative, etc.) that can be preferably used. Specific examples of carboxylic acids include, but are not limited to, compounds represented by [Chemical 27] to [Chemical 50].

[0034] [化 27]  [0034] [Chemical 27]

Figure imgf000014_0001
Figure imgf000014_0001

Figure imgf000014_0002
[0036] [化 29]
Figure imgf000014_0002
[0036] [Chemical 29]

Figure imgf000015_0001
[0040] [化 33]
Figure imgf000016_0001
Figure imgf000015_0001
[0040] [Chemical 33]
Figure imgf000016_0001

[0041] [化 34] [0041] [Chemical 34]

Figure imgf000016_0002
Figure imgf000016_0002

[0044] [化 37] [0044] [Chemical 37]

Figure imgf000016_0003
[0045] [化 38]
Figure imgf000017_0001
Figure imgf000016_0003
[0045] [Chemical 38]
Figure imgf000017_0001

[0046] [化 39]

Figure imgf000017_0002
[0046] [Chemical 39]
Figure imgf000017_0002

[0047] [化 40]

Figure imgf000017_0003
[0047] [Chemical 40]
Figure imgf000017_0003

[0048] [化 41] [0048] [Chemical 41]

Figure imgf000017_0004
Figure imgf000017_0004

[0049] [化 42] [0049] [Chemical 42]

Figure imgf000018_0001
Figure imgf000018_0001

[0052] [化 45] [0052] [Chemical 45]

Figure imgf000018_0002
Figure imgf000018_0002

[0053] [化 46] [0053] [Chemical 46]

Figure imgf000019_0001
Figure imgf000019_0001

[0057] [化 50] [0057] [Chemical 50]

Figure imgf000020_0001
Figure imgf000020_0001

[0058] 本発明においては、下記に例示される芳香族テトラカルボン酸類を一種又は二種 以上、上記芳香族テトラカルボン酸類と併用しても構わない。好ましくは全テトラカル ボン酸類(テトラカルボン酸及びカルボン酸誘導体を含む)の 50モル%未満、もしく は 30モル%未満さらに好ましくは 20モル%未満である。 In the present invention, one or more aromatic tetracarboxylic acids exemplified below may be used in combination with the aromatic tetracarboxylic acids. Preferably, it is less than 50 mol% of all tetracarboxylic acids (including tetracarboxylic acid and carboxylic acid derivatives), or less than 30 mol%, more preferably less than 20 mol%.

[0059] ピロメリット酸無水物、 3, 3' , 4, 4'—ビフエニルテトラテトラカルボン酸二無水物、 2 , 3,, 3, 4'—ビフエニルテトラテトラカルボン酸二無水物、 2, 2' , 3, 3'—ビフエニル テトラテトラカルボン酸二無水物、 3, 3' 4, 4'ーォキシジフエニルテトラカルボン酸 無水物、ベンゾフエノン 3, 3' , 4, 4'—テトラカルボン酸二無水物、ジフエニルスル ホン 3, 3' , 4, 4'—テトラカルボン酸二無水物、 4, 4'一(2, 2 へキサフルォロイ ソプロピリデン)ジフタル酸二酸無水物、ジフエ二ルメロフエニックジアンハイドライド、 2, 2,一ジフエノキシ一 3, 3' , 4, 4'—ビフエニルテトラテトラカルボン酸二無水物、 1 , 2, 5, 6 ナフタレンテトラカルボン酸二無水物、 2, 3, 6, 7 ナフタレンテトラカル ボン酸二無水物、 2, 3, 5, 6 ピリジンテトラカルボン酸二無水物、 1 , 4, 5, 8 ナ フタレンテトラカルボン酸二無水物、 3, 4, 9, 10 ペリレンテトラカルボン酸二無水 物、 4, 4' スルホ二ルジフタル酸二無水物、 3, 3,, 4, 4,ーテトラフエニルシランテ トラカルボン酸二無水物、メタ ターフェ二ルー 3, 3' , 4, 4'—テトラカルボン酸二無 水物、 3, 3' , 4, 4'—ジフエニルエーテルテトラカルボン酸二無水物、 1 , 3—ビス(3 , 4ージカルボキシフエニル) 1 , 1 , 3, 3—テトラメチルジシロキサン二無水物、 1 - (2, 3—ジカルボキシフエ二ル)一 3— (3, 4—ジカルボキシフエ二ル)一 1 , 1 , 3, 3— テトラメチルジシロキサン二無水物、(トリフルォロメチル)ピロメリット酸二無水物、ジ( 二無水物、ペンタフルォロェチルピロメリット酸二無水物、ビス { 3, 5—ジ(トリフルォロ メチル)フエノキシ }ピロメリット酸ニ無水物、 2, 2 ビス(3, 4 ジカルボキシフエニル )へキサフルォロプロパン二無水物、 5, 5,—ビス(トリフルォロメチル)—3, 3,, 4, 4 'ーテトラカルボキシビフエニルニ無水物、 2, 2,一5, 5,ーテトラキス(トリフルォロメ チル)ー3, 3,, 4, 4,ーテトラカルボキシビフエニルニ無水物、 5, 5,一ビス(トリフル ォロメチル)—3, 3' , 4, 4'—テトラカルボキシジフエニルエーテル二無水物、 5, 5, ビス(トリフルォロメチル) 3, 3' , 4, 4'—テトラカルボキシベンゾフエノン二無水 物、ビス { (トリフルォロメチル)ジカルボキシフエノキシ }ベンゼン二無水物、ビス { (トリ ス(ジカルボキシフエノキシ)(トリフルォロメチル)ベンゼン二無水物、ビス(ジカルボキ シフエノキシ)ビス(トリフルォロメチル)ベンゼン二無水物、ビス(ジカルボキシフエノキ シ)テトラキス(トリフルォロメチノレ)ベンゼン二無水物、 2, 2 ビス { (4一(3, 4 ジカ ノレボキシフエノキシ)フエニル)へキサフルォロプロパン二無水物、ビス { (トリフルォロ ノレボキシフエノキシ }ビス(トリフルォロメチル)ビフエニルニ無水物、ビス { (トリフルォロ メチノレ)ジカルボキシフエノキシ }ジフエニルエーテル二無水物、ビス(ジカルボキシフ エノキシ)ビス(トリフルォロメチル)ビフエニルニ無水物、 2, 2 ビス [4一(3, 4 ジカ ルポキシフエノキシ)フエニル]プロパン及び上記芳香族テトラカルボン酸類における 芳香環上の水素原子の一部もしくは全てがフッ素原子、炭素数 1〜3のアルキル基 又はアルコキシル基、シァノ基、又はアルキル基又はアルコキシル基の水素原子の 一部もしくは全部がフッ素原子で置換された炭素数 1〜3のフッ素化アルキル基又は アルコキシル基で置換された芳香族テトラカルボン酸等が挙げられる。 [0059] pyromellitic anhydride, 3, 3 ', 4, 4'-biphenyltetratetracarboxylic dianhydride, 2, 3 ,, 3, 4'-biphenyltetratetracarboxylic dianhydride, 2 , 2 ', 3, 3'-biphenyl tetratetracarboxylic dianhydride, 3, 3' 4, 4'-oxydiphenyl tetracarboxylic anhydride, benzophenone 3, 3 ', 4, 4'-tetracarboxylic Acid dianhydride, diphenyl sulfone 3, 3 ', 4, 4'-tetracarboxylic dianhydride, 4, 4' mono (2, 2 hexafluoroloy propylidene) diphthalic dianhydride, diphenyl melophene Dianhydride, 2, 2, 1 diphenoxy 1, 3, 3 ', 4, 4'-biphenyl tetratetracarboxylic dianhydride, 1, 2, 5, 6 naphthalene tetracarboxylic dianhydride, 2, 3, 6 , 7 Naphthalenetetracarboxylic dianhydride, 2, 3, 5, 6 Pyridinetetracarboxylic dianhydride, 1, 4, 5, 8 Naphthalenetetracarboxylic dianhydride, 3, 4, 9, 10 Perylenetetracarboxylic dianhydride, 4, 4 'Sulfodirudiphthalic dianhydride, 3, 3, 4, 4, 4 , -Tetraphenylsilane tetracarboxylic dianhydride, metaterfeline, 3, 3 ', 4, 4'-tetracarboxylic dianhydride, 3, 3', 4, 4'-diphenyl ether tetracarboxylic Acid dianhydride, 1,3-bis (3,4-dicarboxyphenyl) 1,1,3,3-tetramethyldisiloxane dianhydride, 1- (2,3-dicarboxyphenyl) mono 3— (3,4-dicarboxyphenyl) 1 1,1,3,3—tetramethyldisiloxane dianhydride, (trifluoromethyl) pyromellitic dianhydride, di (dianhydride, penta Fluoroetilpyromellitic dianhydride, bis {3,5-di (trifluoro Methyl) phenoxy} pyromellitic dianhydride, 2, 2 bis (3,4 dicarboxyphenyl) hexafluoropropane dianhydride, 5, 5, -bis (trifluoromethyl) -3, 3 ,, 4, 4'-tetracarboxybiphenyl dianhydride, 2, 2, 1, 5, 5, -tetrakis (trifluoromethyl) -3, 3 ,, 4, 4, 4-tetracarboxybiphenyl dianhydride, 5, 5,1bis (trifluoromethyl) -3,3 ', 4,4'-tetracarboxydiphenyl ether dianhydride, 5,5, bis (trifluoromethyl) 3,3', 4,4'-tetra Carboxybenzophenone dianhydride, bis {(trifluoromethyl) dicarboxyphenoxy} benzene dianhydride, bis {(tris (dicarboxyphenoxy) (trifluoromethyl) benzene dianhydride, Bis (dicarboxiphenoxy) bis (trifluoromethyl) E) Benzene dianhydride, bis (dicarboxyphenoxy) tetrakis (trifluoromethinole) benzene dianhydride, 2, 2 bis {(4 (3,4 dicanoloxyphenoxy) phenyl) Xafluoropropane dianhydride, bis {(trifluoronorlevoxyphenoxy) bis (trifluoromethyl) biphenyl dianhydride, bis {(trifluoromethylinore) dicarboxyphenoxy} diphenyl ether dianhydride, bis Hydrogen atoms on the aromatic ring in (dicarboxyphenoxy) bis (trifluoromethyl) biphenyl dianhydride, 2, 2 bis [4 ((4,4 dicarboxyphenoxy) phenyl] propane and the above aromatic tetracarboxylic acids A part or all of these are fluorine atoms, alkyl groups having 1 to 3 carbon atoms, alkoxyl groups, cyano groups, alkyl groups or alkoxy Some or all of the hydrogen atoms of the Le group aromatic tetracarboxylic acid substituted with an fluorinated alkyl group or alkoxyl group having 1 to 3 carbon atoms are exemplified by a fluorine atom.

これらのテトラカルボン酸類は単独で用いてもよ!/、し、二種以上を併用してもよレ、。 本発明のポリイミドの作製は、例えば、前記芳香族ジァミン類と、前記芳香族テトラ カルボン酸 (無水物)類とを重縮合(重合)してポリアミド酸を製造して、このポリアミド 酸をイミド化してポリイミドを得ることができる。ポリアミド酸を製造するときに用いる溶 媒は、原料となるモノマー及び生成するポリアミド酸の!/、ずれをも溶解するものであれ ば特に限定されないが、極性有機溶媒が好ましぐ例えば、 N メチルー 2—ピロリド ン、 N ァセチルー 2—ピロリドン、 N, N ジメチルホルムアミド、 N, N ジェチルホ ルムアミド、 N, N—ジメチルァセトアミド、ジメチルスルホキシド、へキサメチルホスホリ ックアミド、ェチルセ口ソルブアセテート、ジエチレングリコールジメチルエーテル、ス ノレホラン、ハロゲン化フエノール類、 m—タレゾールなどのタレゾール類等があげられ る。これらの溶媒は、単独あるいは混合して使用することができる。溶媒の使用量は、 原料となるモノマーを溶解するのに十分な量であればよぐ具体的な使用量としては 、モノマーを溶解した溶液に占めるモノマーの質量力 通常 5〜40質量%、好ましく は 10〜30質量%となるような量が挙げられる。 These tetracarboxylic acids may be used alone or in combination of two or more. The polyimide of the present invention can be produced, for example, by polycondensation (polymerization) of the aromatic diamines and the aromatic tetracarboxylic acid (anhydride) to produce a polyamic acid, and imidizing the polyamic acid. Thus, polyimide can be obtained. The solvent used in the production of the polyamic acid is not particularly limited as long as it dissolves the raw material monomer and the resulting polyamic acid! /, But there is no particular limitation, but a polar organic solvent is preferred. 2-pyrrolidone, N-acetylyl 2-pyrrolidone, N, N dimethylformamide, N, N Examples thereof include talamides such as lumamide, N, N-dimethylacetamide, dimethyl sulfoxide, hexamethylphosphoric amide, ethyl acetate sorb acetate, diethylene glycol dimethyl ether, sulphophoran, halogenated phenols, and m-taresol. These solvents can be used alone or in combination. The amount of the solvent used is sufficient if it is sufficient to dissolve the monomer as a raw material. The specific amount used is that the mass power of the monomer in the solution in which the monomer is dissolved is usually 5 to 40% by mass, preferably The amount is 10-30% by mass.

[0061] 本発明では、水を共沸させるために共溶媒を用いても良い。例えば、トルエン、キシ レン等が挙げられる力 S、効率よく水を共沸させることができるものであればこれらに限 定されない。 [0061] In the present invention, a co-solvent may be used to azeotrope water. For example, force S including toluene, xylene and the like is not limited as long as water can be efficiently azeotroped.

ポリアミド酸を製造するための重合反応(以下、単に「重合反応」ともレ、う)の条件は 従来公知の条件を適用すればよぐポリアミック酸を製造した後、熱イミド化もしくは化 学イミド化する 2段階重合、もしくは、有機溶媒中でイミド化まで一気に行う一段階重 合が好ましく利用される。  The conditions for the polymerization reaction for producing the polyamic acid (hereinafter, simply referred to as “polymerization reaction”) are as follows: after the production of polyamic acid, the conventional known conditions can be applied, followed by thermal imidization or chemical imidization. The two-stage polymerization, or the one-stage polymerization which is performed at once in an organic solvent until imidization is preferably used.

2段階重合の具体例として、有機溶媒中、 0〜80°Cの温度範囲で、 10分〜 30時間 連続して撹拌及び/又は混合することが挙げられる。必要により重合反応を分割した り、温度を上下させてもかまわない。この場合に、両モノマーの添加順序には特に制 限はないが、芳香族ジァミン類の溶液中に芳香族テトラカルボン酸無水物類を添カロ するのが好ましい。  Specific examples of the two-stage polymerization include stirring and / or mixing continuously in an organic solvent at a temperature range of 0 to 80 ° C. for 10 minutes to 30 hours. If necessary, the polymerization reaction may be divided or the temperature may be increased or decreased. In this case, the order of addition of both monomers is not particularly limited, but it is preferable to add aromatic tetracarboxylic anhydrides to a solution of aromatic diamines.

[0062] 一方、 1段階重合は有機溶媒中で撹拌及び/又は混合しながら、 0〜80°Cの温度 範囲で、 10分〜 30時間連続して進めた後、さらに 100〜300°Cの温度範囲で 10分 から 30時間連続して進められる。必要により重合反応を分割したり、温度を上下させ ても力、まわない。この場合に、両反応体の添加順序には特に制限はないが、芳香族 ジァミン類の溶液中に芳香族テトラカルボン酸無水物類を添加するのが好ましい。な お、重合反応においては、共沸溶媒とともに水を留去させながら行うのが好ましい。 また、閉環触媒を用いても良い。本発明で使用される閉環触媒の具体例としては、安 息香酸、 o—安息香酸、 m—安息香酸、 p—安息香酸などの芳香族カルボン酸、トリメ チルァミン、トリェチルァミンなどの脂肪族第 3級ァミン、イソキノリン、ピリジン、ベータ ピコリンなどの複素環式第 3級ァミンなどが挙げられる力 S、複素環式第 3級ァミンから 選ばれる少なくとも一種のアミンを使用することが好ましい。閉環触媒の含有量は、閉 環触媒の含有量 (モル) /前駆体であるポリアミド酸中の含有量 (モル)が 0. 01〜; 10 となる範囲が好ましい。 [0062] On the other hand, the one-step polymerization is continuously carried out in a temperature range of 0 to 80 ° C for 10 minutes to 30 hours with stirring and / or mixing in an organic solvent, and then further performed at 100 to 300 ° C. The process is continued for 10 to 30 hours in the temperature range. If necessary, the polymerization reaction can be divided or the temperature can be raised or lowered. In this case, the order of addition of both reactants is not particularly limited, but it is preferable to add aromatic tetracarboxylic acid anhydrides to the solution of aromatic diamines. The polymerization reaction is preferably carried out while distilling off water together with the azeotropic solvent. Further, a ring-closing catalyst may be used. Specific examples of the ring-closing catalyst used in the present invention include aromatic carboxylic acids such as benzoic acid, o-benzoic acid, m-benzoic acid and p-benzoic acid, and aliphatic tertiary compounds such as trimethylamine and triethylamine. Grade amine, isoquinoline, pyridine, beta It is preferable to use at least one amine selected from a force S such as a heterocyclic tertiary amine such as picoline and a heterocyclic tertiary amine. The content of the ring-closing catalyst is preferably in the range in which the content (mol) of the ring-closing catalyst (mol) / the content (mol) of the precursor polyamic acid is 0.01 to 10;

重合反応によって得られるポリアミド酸もしくはポリイミド溶液に占めるポリアミド酸も しくはポリイミドの質量は、好ましくは 5〜40質量%、より好ましくは 10〜30質量%で あり、前記溶液の粘度はブルックフィールド粘度計による測定(25°C)で、送液の安 定性の点力も、好ましくは 10〜2000Pa ' sであり、より好ましくは 100〜; lOOOPa' sで ある。  The mass of the polyamic acid obtained by the polymerization reaction or the polyamic acid or polyimide in the polyimide solution is preferably 5 to 40% by mass, more preferably 10 to 30% by mass, and the viscosity of the solution is a Brookfield viscometer According to the measurement according to the above (25 ° C.), the point of stability of the liquid feeding is also preferably 10 to 2000 Pa ′s, more preferably 100 to lOOOPa ′s.

本発明におけるポリアミド酸もしくはポリイミドの還元粘度( 7] sp/C)は、特に限定 するものではないが 1. Odl/g以上が好ましぐ 2. 0dl/g以上がさらに好ましい。  The reduced viscosity (7] sp / C) of the polyamic acid or polyimide in the present invention is not particularly limited, but is preferably 1. Odl / g or more, more preferably 2.0 dl / g or more.

[0063] 重合反応中に真空脱泡することは、良質なポリアミド酸もしくはポリイミドの有機溶媒 溶液を製造するのに有効である。また、重合反応の前に芳香族ジァミン類に少量の 末端封止剤を添加して重合を制御することを行ってもよい。末端封止剤としては、無 水マレイン酸等といった炭素 炭素二重結合を有する化合物が挙げられる。無水マ レイン酸を使用する場合の使用量は、芳香族ジァミン類 1モル当たり好ましくは 0. 00 ;!〜 1. 0モノレである。 [0063] Vacuum degassing during the polymerization reaction is effective for producing a good quality polyamic acid or polyimide organic solvent solution. Further, the polymerization may be controlled by adding a small amount of an end-capping agent to the aromatic diamine before the polymerization reaction. Examples of the end capping agent include compounds having a carbon-carbon double bond such as anhydrous maleic acid. When maleic anhydride is used, the amount used is preferably from 0.00;! To 1.0 monole per mole of aromatic diamine.

[0064] 高温処理によるイミド化方法としては、従来公知のイミド化反応を適宜用いることが 可能である。例えば、閉環触媒や脱水剤を含まないポリアミド酸溶液を用いて、加熱 処理に供することでイミド化反応を進行させる方法 (所謂、熱閉環法)やポリアミド酸 溶液に閉環触媒及び脱水剤を含有させてお!/、て、上記閉環触媒及び脱水剤の作用 によってイミド化反応を行わせる、化学閉環法を挙げることができる。  [0064] As an imidization method by high-temperature treatment, a conventionally known imidization reaction can be appropriately used. For example, using a polyamic acid solution that does not contain a ring-closing catalyst or a dehydrating agent, the imidization reaction proceeds by subjecting it to a heat treatment (so-called thermal ring-closing method), or a polyamic acid solution containing a ring-closing catalyst and a dehydrating agent. There can be mentioned a chemical ring closure method in which an imidization reaction is carried out by the action of the above ring closure catalyst and a dehydrating agent.

熱閉環法の加熱最高温度は、 100〜500°Cが例示され、好ましくは 200〜480°C である。加熱最高温度がこの範囲より低いと充分に閉環されづらくなり、またこの範囲 より高いと劣化が進行し、複合体が脆くなりやすくなる。より好ましい態様としては、 15 0〜250°Cで 3〜20分間処理した後に 350〜500°Cで 3〜20分間処理する 2段階熱 処理が挙げられる。  The heating maximum temperature of the thermal ring closure method is exemplified by 100 to 500 ° C, preferably 200 to 480 ° C. If the maximum heating temperature is lower than this range, it is difficult to sufficiently close the ring, and if it is higher than this range, deterioration proceeds and the composite tends to become brittle. A more preferred embodiment includes a two-stage heat treatment in which treatment is performed at 150 to 250 ° C. for 3 to 20 minutes and then treatment at 350 to 500 ° C. for 3 to 20 minutes.

[0065] 化学閉環法では、ポリアミド酸溶のイミド化反応を一部進行させて自己支持性を有 するポリイミド前駆体を形成した後に、加熱によってイミド化を完全に行わせることが できる。 [0065] In the chemical ring closure method, the imidization reaction of the polyamic acid solution partially proceeds to provide self-supporting properties. After the polyimide precursor to be formed is formed, imidization can be performed completely by heating.

この場合、イミド化反応を一部進行させる条件としては、好ましくは 100〜200°Cに よる 3〜20分間(3分〜 30時間)の熱処理であり、イミド化反応を完全に行わせるため の条件は、好ましくは 200〜400°Cによる 3〜20分間の熱処理である。  In this case, the condition for partially proceeding with the imidization reaction is preferably a heat treatment at 100 to 200 ° C. for 3 to 20 minutes (3 minutes to 30 hours), in order to complete the imidation reaction. The condition is preferably a heat treatment for 3 to 20 minutes at 200 to 400 ° C.

閉環触媒をポリアミド酸溶液に加えるタイミングは特に限定はなぐポリアミド酸を得 るための重合反応を行う前に予め加えておいてもよいし、重合反応中、重合反応後 に加えてもよい。閉環触媒の具体例としては、トリメチルァミン、トリェチルァミンなどと いった脂肪族第 3級ァミンや、イソキノリン、ピリジン、ベータピコリンなどといった複素 環式第 3級ァミンなどが挙げられ、中でも、複素環式第 3級ァミンから選ばれる少なく とも一種のァミンが好ましい。ポリアミド酸 1モルに対する閉環触媒の使用量は特に限 定はないが、好ましくは 0. 01〜; 10モルである。  The timing for adding the ring-closing catalyst to the polyamic acid solution is not particularly limited, and may be added in advance before the polymerization reaction for obtaining the polyamic acid, or may be added during or after the polymerization reaction. Specific examples of the ring-closing catalyst include aliphatic tertiary amines such as trimethylamine and triethylamine, and heterocyclic tertiary amines such as isoquinoline, pyridine, and betapicoline. At least one amine selected from tertiary amines is preferred. The amount of the ring-closing catalyst used per mole of polyamic acid is not particularly limited, but is preferably 0.01 to 10 moles.

脱水剤をポリアミド酸溶液に加えるタイミングも特に限定はなく、ポリアミド酸を得る ための重合反応を行う前に予め加えておいてもよい。脱水剤の具体例としては、無水 酢酸、無水プロピオン酸、無水酪酸などといった脂肪族カルボン酸無水物や、無水 安息香酸などといった芳香族カルボン酸無水物などが挙げられ、中でも、無水酢酸、 無水安息香酸あるいはそれらの混合物が好ましい。また、ポリアミド酸 1モルに対する 脱水剤の使用量は特に限定はないが、好ましくは 0. 01〜; 10モルである。脱水剤を 用いる場合には、ァセチルアセトンなどと!/、つたゲル化遅延剤を併用してもよレ、。 本発明におけるポリイミドは、線膨張係数が 60ppm/°C以下で、構造式 [化 7]で表 される骨格を有するポリイミドであることが好ましい。好ましくは 2, 2'—ビス(ビフエ二 ノレ)ベンジジン([化 7]骨格を有するジァミン)とピロメリット酸のような剛直な構造を有 するテトラカルボン酸二酸無水物とを反応させて得られるポリイミドであり、さらに好ま しくは [化 5;!]〜 [化 59]で示されるような嵩高!/、置換基を持つ芳香族テトラカルボン 酸二無水物とを反応させて得られるポリイミドであり、特に 3, 6—ジフエ二ルビロメリツ ト酸 [化 51]をテトラカルボン酸二酸無水物に用いることが望まし!/、。  The timing of adding the dehydrating agent to the polyamic acid solution is not particularly limited, and may be added in advance before the polymerization reaction for obtaining the polyamic acid. Specific examples of the dehydrating agent include aliphatic carboxylic acid anhydrides such as acetic anhydride, propionic anhydride, butyric anhydride, and aromatic carboxylic acid anhydrides such as benzoic anhydride. Among them, acetic anhydride, benzoic anhydride, etc. Acids or mixtures thereof are preferred. The amount of the dehydrating agent used per mole of polyamic acid is not particularly limited, but is preferably 0.01 to 10 moles. When using a dehydrating agent, you can use acetylacetone and the like together! The polyimide in the present invention is preferably a polyimide having a linear expansion coefficient of 60 ppm / ° C or less and a skeleton represented by the structural formula [Chemical Formula 7]. Preferably, it is obtained by reacting 2,2'-bis (biphenyl) benzidine (a diamine having a [Chemical 7] skeleton) with tetracarboxylic dianhydride having a rigid structure such as pyromellitic acid. More preferred is [Chemical 5 ;! ] ~ ~ As shown in [Chemical formula 59] !, a polyimide obtained by reacting with a substituted aromatic tetracarboxylic dianhydride, especially 3,6-diphenylbiromellitic acid [Chemicals 51] is preferably used for tetracarboxylic dianhydride! /.

本発明においては、前記のポリイミドに他の樹脂を混合することは、本発明の寸法 安定性や低線膨張係数を損なわない限りこれを排除しな!/、が、本発明のポリイミドが 混合された樹脂中 50質量%以上含んでいることが好ましい。 In the present invention, mixing other resins with the polyimide described above does not exclude this unless the dimensional stability and low linear expansion coefficient of the present invention are impaired! / It is preferable that 50% by mass or more is contained in the mixed resin.

上記ポリイミドの複屈折としては、 0. 15以下であれば特に限定されるものではない 力 S、 0. 10以下であることが好ましい。複屈折が 0. 15を越えると、光学部品としての 機能性を損なう可能性が高い。  The birefringence of the polyimide is not particularly limited as long as it is 0.15 or less. The force S is preferably 0.10 or less. If the birefringence exceeds 0.15, the functionality as an optical component is likely to be impaired.

本発明における 2, 2 '—ビス(ビフエニル)ベンジジンの合成は、下記の文献 (非特 許文献 2)に従った。  The synthesis of 2,2′-bis (biphenyl) benzidine in the present invention was in accordance with the following document (Non-Patent Document 2).

非特許文献 2 : Der— Jang Liaw, Macromolecules, 38, 4024 (2005)  Non-Patent Document 2: Der— Jang Liaw, Macromolecules, 38, 4024 (2005)

[0067] また、本発明におけるポリイミドは、構造式 [化 8]で表される骨格を有するポリイミド であることが好ましい。好ましくは 2, 5 ジフエ二ノレ一 1 , 4 フエ二レンジァミン([化 8 ]のジァミン)とピロメリット酸、 3, 3 ' , 4, 4 '—ビフエニルテトラカルボン酸二無水物の ような剛直な構造を有するテトラカルボン酸二酸無水物とを反応させて得られるポリイ ミドであり、さらに好ましくは上記の [化 51]〜[化 59]で示されるような剛直かつ嵩高 い置換基を持つ芳香族テトラカルボン酸二無水物とを反応させて得られるポリイミド であり、特に、 [化 52]や [化 53]をテトラカルボン酸二酸無水物に用いることが望まし い。本発明においては、前記のポリイミドに他の樹脂を混合することは、本発明の低 複屈折性や耐熱性、寸法安定性を損なわない限りこれを排除しないが、本発明のポ リイミドが混合された樹脂中 50質量%以上含んでいることが好ましい。 [0067] The polyimide in the present invention is preferably a polyimide having a skeleton represented by the structural formula [Chemical Formula 8]. Rigidities such as 2,5 diphenylenol 1,4 phenyldiamine (diamine of [Chemical Formula 8]) and pyromellitic acid, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride It is a polyimide obtained by reacting with a tetracarboxylic dianhydride having a simple structure, and more preferably has a rigid and bulky substituent as shown in the above [Chemical Formula 51] to [Chemical Formula 59]. It is a polyimide obtained by reacting with an aromatic tetracarboxylic dianhydride. In particular, it is desirable to use [Chemical Formula 52] or [Chemical Formula 53] as a tetracarboxylic dianhydride. In the present invention, mixing other resins with the polyimide does not exclude this unless the low birefringence, heat resistance, and dimensional stability of the present invention are impaired, but the polyimide of the present invention is mixed. It is preferable to contain 50% by mass or more in the resin.

本発明における 2, 5 ジフエ二ルー 1 , 4 フエ二レンジァミンの合成は、下記の非 特許文献に従った。  The synthesis of 2,5 diphenyl-1,4 phenylenediamine in the present invention was in accordance with the following non-patent literature.

非特許文献 3 : L. H. Klemm, J. Heterocyclic. Chem, 2, 140 (1965)  Non-Patent Document 3: L. H. Klemm, J. Heterocyclic. Chem, 2, 140 (1965)

[0068] [化 51] [0068] [Chemical 51]

Figure imgf000025_0001
Figure imgf000025_0001

[0069] [化 52] [0069] [Chemical 52]

Figure imgf000026_0001
Figure imgf000026_0001

[0073] [化 56] [0073] [Chemical 56]

Figure imgf000027_0001
Figure imgf000027_0001

化 59]  Chemicalization 59]

Figure imgf000027_0002
Figure imgf000027_0002

上記ポリイミドの複屈折としては、 0. 15以下であれば特に限定されるものではない S 0. 05以下であることが好ましい。より好ましくは 0. 03以下、さらに好ましくは 0. 0 1以下、特に好ましくは 0. 005以下が望ましい。複屈折が 0. 1を越えると、光学部品 としての機能性を損なう可能性が高い。 The birefringence of the polyimide is not particularly limited as long as it is 0.15 or less, and preferably S 0.05 or less. More preferably 0.03 or less, still more preferably 0.0 1 or less, particularly preferably 0.005 or less is desirable. If the birefringence exceeds 0.1, the functionality as an optical component is likely to be impaired.

また、上記ポリイミドの線膨張係数としては、 70ppm/°C以下であれば特に限定さ れるものではないが、好ましくは 50ppm/°C以下、より好ましくは 30ppm/°C以下、 さらに好ましくは 15ppm/°C以下が好ましい。線膨張係数が 70ppm/°Cを越えると 、ポリイミドと基板との間に歪みを生じ、この歪みに起因して反り、剥がれが起こる可能 性が高い。  The linear expansion coefficient of the polyimide is not particularly limited as long as it is 70 ppm / ° C or less, but is preferably 50 ppm / ° C or less, more preferably 30 ppm / ° C or less, and even more preferably 15 ppm / ° C. ° C or less is preferred. When the linear expansion coefficient exceeds 70 ppm / ° C, distortion occurs between the polyimide and the substrate, and there is a high possibility that warpage and peeling will occur due to this distortion.

[0078] 本発明にお!/、ては、種々の充填剤を光学材料用ポリイミドゃ光導波路としての特性 を損なわない範囲でポリイミドに配合してもよい。そのような充填剤として、例えば、グ ラフアイト、カーボランダム、ケィ石粉、二硫化モリブデン、フッ素系樹脂等の耐摩耗 性向上剤、ガラス繊維、カーボン繊維等の補強剤、三酸化アンチモン、炭酸マグネシ ゥム、炭酸カルシウム等の難燃性向上剤、クレー、マイ力等の電気的特性向上剤、ァ スベスト、シリカ、グラフアイト等の耐トラッキング向上剤、硫酸バリウム、シリカ、メタケ ィ酸カルシウム等の耐酸性向上剤、鉄粉、亜鉛粉、アルミニウム粉、銅粉等の熱伝導 度向上剤、ガラスビーズ、ガラス球、タルク、ケィ藻度、アルミナ、シラスバルン、水和 アルミナ、金属酸化物、着色料等を挙げることができる。  [0078] In the present invention, various fillers may be added to the polyimide within a range that does not impair the properties of the optical material polyimide as an optical waveguide. Examples of such fillers include wear resistance improvers such as graphite, carborundum, keystone powder, molybdenum disulfide, and fluorine resins, reinforcing agents such as glass fibers and carbon fibers, antimony trioxide, and magnesium carbonate. Flame retardants such as calcium and calcium carbonate, electrical property improvers such as clay and my strength, tracking resistance improvers such as vest, silica and graphite, and acid resistance such as barium sulfate, silica and calcium metasilicate Heat conductivity improver such as iron powder, zinc powder, aluminum powder, copper powder, glass beads, glass spheres, talc, key algae, alumina, shirasu balun, hydrated alumina, metal oxide, colorant, etc. Can be mentioned.

[0079] 本発明では、反応によって得られたポリイミドを適当な貧溶媒を用いて反応溶液か ら再沈殿させても良い。貧溶媒としては、アセトン、メタノール、エタノール、水などが 挙げられる力 効率よく再沈殿させることができるものであれば、特にこれらに限定さ れない。また、再沈殿した後の残存反応溶媒を除去する溶媒についても特に限定さ れなレ、が、再沈殿させた際に用いた溶媒を使用することが好ましレ、。  [0079] In the present invention, the polyimide obtained by the reaction may be reprecipitated from the reaction solution using an appropriate poor solvent. Examples of the poor solvent include acetone, methanol, ethanol, water, and the like. The poor solvent is not particularly limited as long as it can be reprecipitated efficiently. In addition, the solvent for removing the residual reaction solvent after reprecipitation is not particularly limited, but it is preferable to use the solvent used for reprecipitation.

[0080] 本発明では、反応溶液をそのままポリイミド溶液として利用しても良!/、し、反応溶液 力、ら上記手法で再沈殿させたポリイミドを再び溶媒に溶解させてポリイミド溶液を得て もよい。後者の場合、ポリイミドを効率よく溶解させるものであれば、特に限定されるも のではないが、例として、 o—クレゾ一ノレ、 m—クレゾ一ノレ、 p—クレゾ一ノレ、 N—メチ ルー 2—ピロリドン, N—ァセチルー 2—ピロリドン、 N, N—ジメチルホルムアミド、 N, N—ジメチルホルムアミド、 N, N—ジメチルァセトアミド、ジメチルスルホキシド、 γ - ブチロラタトン、スルホラン、ハロゲン化フエノール類等の有機溶剤が挙げられる。 [0081] 本発明では、ポリイミドと有機溶媒を混合させる手段として、特に限定はしないが、 例えば、通常の攪拌翼、高粘度用の攪拌翼を用いて混合攪拌する方法、多軸の押 し出し機、あるいはスタティックミキサーなどを用いる方法、更には、ロールミルなどの 高粘度用混合分散機を用いる方法を用いて混合攪拌することが挙げられる。 [0080] In the present invention, the reaction solution may be used as a polyimide solution as it is, or the polyimide reprecipitated by the above-described method may be dissolved in a solvent again to obtain a polyimide solution. Good. In the latter case, there is no particular limitation as long as the polyimide can be dissolved efficiently, but examples include o-creso monore, m-creso monore, p-creso monore, N-methylo. Organic compounds such as 2-pyrrolidone, N-acetylyl 2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, γ-butyrolatathone, sulfolane, halogenated phenols A solvent is mentioned. [0081] In the present invention, the means for mixing the polyimide and the organic solvent is not particularly limited. For example, a method of mixing and stirring using a normal stirring blade, a high-viscosity stirring blade, multi-axial extrusion, and the like. And a method using a static mixer or the like, and a method using a high viscosity mixing and dispersing machine such as a roll mill.

[0082] 本発明で得られるポリイミド溶液中のポリイミドの組成としては、好ましくは 1〜50質 量%、より好ましくは 5〜30質量%を含有することが挙げられる。この場合。その粘度 はブルックフィールド粘度計による測定で 0· l~2000Pa- s,好ましくは;!〜 lOOOPa •sのもの力 安定した加工が可能であることから好ましい。  [0082] The composition of the polyimide in the polyimide solution obtained in the present invention is preferably 1 to 50% by mass, more preferably 5 to 30% by mass. in this case. Its viscosity is 0 · l to 2000 Pa-s as measured with a Brookfield viscometer, preferably;! To lOOOPa • s, which is preferable because stable processing is possible.

[0083] 本発明にお!/、て、ポリイミド溶液を基材上に塗布する方法は、特に限定しな!/、が、 例えば、スピンコートなど回転塗布する方法、ドクターブレードやアプリケーター、コン マコーターなどスキージを利用する方法、スクリーン印刷法などが挙げられる。  [0083] In the present invention, the method of applying the polyimide solution onto the substrate is not particularly limited! /, For example, spin coating such as spin coating, doctor blade, applicator, comma coater For example, a method using a squeegee, a screen printing method, and the like.

本発明にお!/、て、基材上に塗布されたポリイミド溶液力 溶媒を除去するための乾 燥温度条件は、 80°C以上、好ましくは 150°C以上、なお好ましくは 180°C以上である 。乾燥温度が低すぎると、溶媒の揮発に時間力 Sかかるため、あるいは十分な乾燥が 見込めな!/、ため概ね 80°C以上で行ったほうが良!/、。また乾燥温度は高!/、方が良レ、 1S 高すぎると、熱劣化によりフィルム物性が低下するため、概ね 500°C以下で行つ たほうが良い。  In the present invention, the drying temperature condition for removing the polyimide solution solvent applied on the substrate is 80 ° C or higher, preferably 150 ° C or higher, more preferably 180 ° C or higher. Is. If the drying temperature is too low, it takes time to evaporate the solvent, or sufficient drying is expected! If the drying temperature is high! /, Better, 1S too high, the film properties will deteriorate due to thermal deterioration, so it is better to keep the temperature below 500 ° C.

[0084] 上記基材は、電気電子部品、配線基板等を構成する基材が好適であるが限定され ないが、例えば、シリコンウェハやガラス基板、銅箔などの無機基板、ポリエチレンテ レフタレ一トフイルムやポリイミドフィルムなどの有機基板などが挙げられる。  [0084] The base material is preferably a base material that constitutes an electric / electronic component, a wiring board, or the like, but is not limited thereto. For example, an inorganic substrate such as a silicon wafer, a glass substrate, or a copper foil, a polyethylene terephthalate film And organic substrates such as polyimide films.

実施例  Example

[0085] 以下、実施例及び比較例を示して本発明をより具体的に説明するが、本発明は以 下の実施例によって限定されるものではない。  Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples. However, the present invention is not limited to the following examples.

なお、以下の実施例などにおける物性の評価方法は以下の通りである。  In addition, the evaluation method of the physical property in the following examples etc. is as follows.

1.ポリアミド酸、ポリイミドの還元粘度( 7] sp/C)  1. Reduced viscosity of polyamic acid and polyimide (7] sp / C)

ポリマー濃度が 0· 2g/dlとなるように Ν—メチルー 2—ピロリドンに溶解した溶液を ウベローデ型の粘度管により 25°Cで測定した。  A solution dissolved in Ν-methyl-2-pyrrolidone so that the polymer concentration was 0.2 g / dl was measured at 25 ° C. with an Ubbelohde type viscosity tube.

(ポリアミド酸溶液の調製に使用した溶媒が N、N—ジメチルァセトアミドの場合は N N—ジメチルァセトアミドを使用してポリマーを溶解し測定した。 ) (If the solvent used to prepare the polyamic acid solution is N, N-dimethylacetamide, N The polymer was dissolved and measured using N-dimethylacetamide. )

2.ポリイミド層(フィルム)の厚さ  2. Thickness of polyimide layer (film)

マイクロメーター(ファインリューフ社製、ミリトロン 1254D)を用いて測定した。  The measurement was made using a micrometer (Millitron 1254D, manufactured by Finerfu).

[0086] 3.ポリイミド層(フィルム)の 30°Cから 200°Cの平均線膨張係数 [0086] 3. Average linear expansion coefficient of polyimide layer (film) from 30 ° C to 200 ° C

測定対象のポリイミド層(フィルム)について、下記条件にて 30°C 40°C 40°C 5 0°C、…と 10°Cの間隔での伸縮率/温度を測定し、この測定を 400°Cまで行い、 50 °Cから 200°Cまでの全測定値の降温時の平均値を平均線膨張係数 (CTE)として算 uし/  For the polyimide layer (film) to be measured, measure the stretch rate / temperature at intervals of 30 ° C, 40 ° C, 40 ° C, 50 ° C, ... and 10 ° C under the following conditions. C, and calculate the average value of all measured values from 50 ° C to 200 ° C when the temperature falls as the average coefficient of linear expansion (CTE) /

装置名 ; MACサイエンス社製 TMA4000S  Device name: TMA4000S manufactured by MAC Science

試料長さ ; 10mm  Sample length; 10mm

試料幅 ; 2mm  Sample width: 2mm

昇温開始温度 ; 25°C  Temperature rise start temperature; 25 ° C

昇温終了温度 ; 400°C  Temperature rise end temperature; 400 ° C

昇温速度 ; 5°C/min  Heating rate: 5 ° C / min

雰囲気 ; アルゴン  Atmosphere: Argon

[0087] 4.複屈折率測定 [0087] 4. Birefringence measurement

測定対象のポリイミド層(フィルム)をガラス基板上に載せ、下記条件にて TE, TM 方向の屈折率 nTE, ηΤΜを測定し、複屈折率 Δ η = ηΤΕ— ηΤΜを算出した。  The polyimide layer (film) to be measured was placed on a glass substrate, the refractive index nTE, ηΤΜ in the TE and TM directions was measured under the following conditions, and the birefringence index Δη = η = -ηΤΕ was calculated.

装置名 ; メトリコン社製プリズム力プラモデル 2010  Device name: Metricon Prism Force Plastic Model 2010

測定波長 ; 633nm  Measurement wavelength: 633nm

モー卜 ; Dual Film  Moh ; Dual Film

[0088] 5.ガラス転移点測定  [0088] 5. Measurement of glass transition point

測定対象のポリイミド層(フィルム)につ!/、て、下記条件にてガラス転移点 (Tg)を測 定した。ここで言うガラス転移点は、ステップ状曲線の解析における Inflection温度 を算出した。  For the polyimide layer (film) to be measured, the glass transition point (Tg) was measured under the following conditions. The glass transition point mentioned here was calculated as the Inflection temperature in the analysis of the step-like curve.

装置名 ; ティ一エーインスツルメント社製 DSC2920  Device name: DSC2920 manufactured by Ti Instruments Co., Ltd.

試料量 ; 10 ± 0. 5mg  Sample amount: 10 ± 0.5mg

昇温開始温度 ; 室温 昇温終了温度 ; 450°C Temperature rise start temperature; room temperature Temperature rise end temperature: 450 ° C

昇温速度 ; 10°C/min  Heating rate: 10 ° C / min

雰囲気 ; アルゴン  Atmosphere: Argon

なお、剛直な一次構造を持つポリイミドは、上記の DSC測定ではガラス転移点が検 出されない場合があった。その場合、上記の平均線膨張係数測定における変曲点を ガラス転移点とした。 400°Cまで変曲点がなければ、ガラス転移点は 400°C以上と判 断した。  For polyimides with a rigid primary structure, the glass transition point may not be detected by the above DSC measurement. In that case, the inflection point in the above average linear expansion coefficient measurement was taken as the glass transition point. If there was no inflection point up to 400 ° C, the glass transition point was determined to be 400 ° C or higher.

[0089] 4.伝搬損失測定 [0089] 4. Propagation loss measurement

メトリコン社製プリズム力プラモデル 2010のオプション機能を用いて、散乱検出法 により測定した。散乱検出法とは、光ファイバ一をプローブとして用い、導波路に接近 させた先端を角度と導波路からの距離を一定に保って移動し、 logPを Lに対してプロ ットすることにより、伝搬損失を算出する測定法である。  Using the optional function of Metricon's Prism Force Plastic Model 2010, measurements were made by the scattering detection method. The scattering detection method uses an optical fiber as a probe, moves the tip approaching the waveguide while keeping the angle and the distance from the waveguide constant, and plots logP with respect to L. This is a measurement method for calculating propagation loss.

装置名 ; メトリコン社製プリズム力プラモデル 2010  Device name: Metricon Prism Force Plastic Model 2010

測定波長 ; 633nm  Measurement wavelength: 633nm

測定距離 ; 5cm  Measuring distance: 5cm

[0090] (実施例 1) [0090] (Example 1)

乾燥窒素雰囲気中で、 DPBPDA [化 37] (2, 2'ージフエニノレー 3, 4, 3' , 4'ービ フエ二レンテトラカルボン酸 2無水物)を 4. 46質量部及び DAMBO (5—アミノー 2— (p—ァミノフエ二ノレ)ベンゾォキサゾーノレ) 2· 25質量部を m—タレゾールに溶解し、 3 質量%の溶液とした。これを 3時間室温で撹拌した後、イソキノリンを触媒として加え、 窒素気流下、 200°Cで 3時間撹拌し、室温まで冷却すると高粘度の溶液が得られる。 このポリイミド溶液をエタノール中に再沈すると、黄色の繊維状ポリマーが得られた。 ポリマーの乾燥後、これを N—メチル—2—ピロリドンに溶解し、 10質量0 /0の溶液とし 、清浄なシリコン基板上に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時 間加熱することにより厚さ 20 mのポリイミドフィルムが得られた。このフィルムをシリコ ン基板からはがし、線膨張係数を測定したところ、 14. 7ppm/°Cであった。また、複 屈折率は Δ η = 0. 1128 (ηΤΕ= 1. 7301 , ηΤΜ= 1. 6173)であった。なお、ガラ ス転移点は DSCで検出できな力、つた。一方、 ΤΜΑ測定でも変曲点が見られなかつ たことから、ガラス転移点は 400°C以上と判断した。 In a dry nitrogen atmosphere, DPBPDA [Chemical Formula 37] (2, 2'-diphenylenole 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) was added in an amount of 4.46 parts by mass and DAMBO (5-amino- 2- (p-aminomino) benzoxazolene) 2 · 25 parts by mass were dissolved in m-taresol to give a 3% by mass solution. After stirring this at room temperature for 3 hours, isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution. When this polyimide solution was reprecipitated in ethanol, a yellow fibrous polymer was obtained. After drying the polymer, which was dissolved in N- methyl-2-pyrrolidone, and 10 mass 0/0 solution was applied to a clean silicon substrate, in a dry nitrogen atmosphere, a 15-minute 120 ° C, 350 ° By heating with C for 1 hour, a polyimide film with a thickness of 20 m was obtained. The film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 14.7 ppm / ° C. The birefringence was Δ η = 0.1128 (ηΤΕ = 1. 7301, ηΤΜ = 1.6173). The glass transition point is a force that cannot be detected by DSC. On the other hand, no inflection point was found in the wrinkle measurement Therefore, the glass transition point was determined to be 400 ° C or higher.

[0091] (実施例 2) [0091] (Example 2)

乾燥窒素雰囲気中で、 DPBPDA [化 37] (2, 2'ージフエニノレー 3, 4, 3' , 4'ービ フエ二レンテトラカルボン酸 2無水物)を 4. 46質量部及び TFMB (2, 2' ビス(トリフ ノレオロメチル) 4, 4,ジアミノビフエ二ノレ) 3· 20質量部を m タレゾールに溶解し、 3 質量%の溶液とした。これを 3時間室温で撹拌した後、イソキノリンを触媒として加え、 窒素気流下、 200°Cで 3時間撹拌し、室温まで冷却すると高粘度の溶液が得られる。 このポリイミド溶液をエタノール中に再沈すると、淡黄色の繊維状ポリマーが得られた 。ポリマーの乾燥後、実施例 1と同様の方法でポリイミドフィルムを得た。このフィルム をシリコン基板からはがし、線膨張係数を測定したところ 24. 7ppm/°Cであった。ま た、 DSCでガラス転移点は測定できな力、つた力 TMAの変曲点からガラス転移温度 (ま 390。Cであった。一方、複屈折率 (ま Δ η = 0. 0676 (ηΤΕ= 1. 6452, ηΤΜ= 1. 5776)であった。 In a dry nitrogen atmosphere, DPBPDA [Chemical Formula 37] (2, 2'-diphenylenole 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) was added in an amount of 4.46 parts by mass and TFMB (2, 2 'Bis (trifnoleolomethyl) 4 , 4 , diaminobiphenyl) 3 · 20 parts by mass was dissolved in m-taresol to give a 3% by mass solution. After stirring this at room temperature for 3 hours, isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution. When this polyimide solution was reprecipitated in ethanol, a light yellow fibrous polymer was obtained. After drying the polymer, a polyimide film was obtained in the same manner as in Example 1. The film was peeled from the silicon substrate and the coefficient of linear expansion was measured to be 24.7 ppm / ° C. In addition, the DSC showed that the glass transition point was a force that could not be measured, and the resulting force was from the inflection point of the TMA to the glass transition temperature (up to 390 C. On the other hand, the birefringence index (up to Δ η = 0.0.676 (ηΤΕ = 1. 6452, ηΤΜ = 1. 5776).

[0092] (実施例 3) [0092] (Example 3)

乾燥窒素雰囲気中で、 DPBPDA [化 37] (2, 2'ージフエニノレー 3, 4, 3' , 4'ービ フエ二レンテトラカルボン酸 2無水物)を 4· 46質量部及び Fluorenediamine (9, 9, ビス(4ーァミノフエニル)フルオレン) 3· 48質量部を m タレゾールに溶解し、 5質 量%の溶液とした。これを 3時間室温で撹拌した後、イソキノリンを触媒として加え、窒 素気流下、 200°Cで 3時間撹拌し、室温まで冷却すると高粘度の溶液が得られる。こ のポリイミド溶液をエタノール中に再沈すると、淡黄色の繊維状ポリマーが得られた。 ポリマーの乾燥後、実施例 1と同様の方法でポリイミドフィルムを得た。このフィルムを シリコン基板からはがし、線膨張係数を測定したところ 39. 5ppm/°Cであった。また 、 DSCでガラス転移点は測定できなかった力 TMAの変曲点からガラス転移温度は 360。Cであった。一方、複屈折率は Δ η = 0. 0146 (ηΤΕ= 1. 6822、ηΤΜ= 1. 6 676)であった。  In a dry nitrogen atmosphere, DPBPDA [Chemical Formula 37] (2, 2'-diphenylenole 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) was added in an amount of 4-46 parts by mass and Fluorenediamine (9, 9 , Bis (4-aminophenyl) fluorene) 3 · 48 parts by mass was dissolved in m-taresol to give a 5% by mass solution. After stirring this at room temperature for 3 hours, isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution. When this polyimide solution was reprecipitated in ethanol, a light yellow fibrous polymer was obtained. After drying the polymer, a polyimide film was obtained in the same manner as in Example 1. The film was peeled off from the silicon substrate and the coefficient of linear expansion was measured to be 39.5 ppm / ° C. Moreover, the glass transition temperature was 360 from the inflection point of the force TMA, which could not be measured by DSC. C. On the other hand, the birefringence was Δη = 0.0146 (ηΤΕ = 1.6822, ηΤΜ = 1.676).

[0093] (実施例 4) [0093] (Example 4)

乾燥窒素雰囲気中で、 DPBPDA [化 37] (2, 2'ージフエニノレー 3, 4, 3' , 4'ービ フエ二レンテトラカルボン酸 2無水物)を 3. 57質量部、 BPDA(3, 4, 3,, 4,ービフエ 二レンテトラカルボン酸 2無水物)を 0· 56質量部及び DAMBO (5 アミノー 2—(ρ ーァミノフエニル)ベンゾォキサゾール) 2. 25質量部を用いた以外は実施例 1と同様 の方法でポリイミドフィルムを得た。このフィルムをシリコン基板からはがし、線膨張係 数を測定したところ 10. 5ppm/°Cであった。なお、ガラス転移点は DSCで検出でき ず、 TMA測定でも変曲点が見られな力 たことから、ガラス転移点は 400°C以上と 判断した。一方、複屈折率は Δ η = 0. 1430 (ηΤΕ= 1. 7541、ηΤΜ= 1. 6111)で あった。 In a dry nitrogen atmosphere, DPBPDA [Chemical Formula 37] (2,2'-diphenylenoyl 3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) 3.57 parts by mass, BPDA (3,4 , 3, 4, bihue Polyimide in the same manner as in Example 1 except that 0 · 56 parts by mass of dienetetracarboxylic dianhydride) and DAMBO (5 amino-2- (ρ-aminophenyl) benzoxazole) 2. 25 parts by mass were used. A film was obtained. The film was peeled from the silicon substrate, and the linear expansion coefficient was measured and found to be 10.5 ppm / ° C. Since the glass transition point could not be detected by DSC and the inflection point was not observed in the TMA measurement, the glass transition point was determined to be 400 ° C or higher. On the other hand, the birefringence was Δη = 0.1430 (ηΤΕ = 1. 7541, ηΤΜ = 1.61111).

[0094] (実施例 5)  [Example 5]

乾燥窒素雰囲気中で、 DPBPDA [化 37] (2, 2'—ジフエ二ルー 3, 4, 3' , 4'ービフエ二レンテトラカルボン酸 2無水物)を 4. 46質量部及び DAMBO (5 ァ ミノ一 2— (p ァミノフエ二ノレ)ベンゾォキサゾーノレ) 1. 13質量き ^ Fluorenediamin e (9, 9 ' ビス(4ーァミノフエニル)フルオレン) 1. 74質量部を用いた以外は実施例 1と同様の方法でポリイミドフィルムを得た。このフィルムをシリコン基板からはがし、線 膨張係数を測定したところ 20. lppm/°Cであった。なお、ガラス転移点は DSCで検 出できず、 TMA測定でも変曲点が見られなかったことから、ガラス転移点は 400°C 以上と半 IJ断した。一方、複屈折率は Δ η = 0. 0430 (ηΤΕ= 1. 7082、ηΤΜ= 1. 66 52)であった。  In a dry nitrogen atmosphere, DPBPDA [Chemical Formula 37] (2, 2'-diphenyl 3, 4, 3 ', 4'-biphenylene tetracarboxylic dianhydride) was added in an amount of 4.46 parts by mass and DAMBO (5 Mino 1— (paminophenenole) benzoxazonole) 1.13 mass ^ Fluorenediamin e (9, 9 'bis (4-aminophenyl) fluorene) 1. Example 1 except that 74 parts by mass were used A polyimide film was obtained in the same manner. This film was peeled off from the silicon substrate, and the coefficient of linear expansion was measured to be 20. lppm / ° C. The glass transition point could not be detected by DSC, and no inflection point was observed by TMA measurement. On the other hand, the birefringence was Δη = 0.0430 (ηΤΕ = 1.7082, ηΤΜ = 1.6652).

[0095] (実施例 6)  [Example 6]

乾燥窒素雰囲気中で、 DPPMDA [化 8] (1 , 4 ジフヱ二ルーピロメリット酸 2無水 物)を 3· 70質量部および DAMBO (5 アミノー 2— (ρ ァミノフエニル)ベンゾォキ サゾール) 2. 25質量部を m タレゾールに溶解し、 3質量%の溶液とした。あとは実 施例 1と同じ方法でポリイミドフィルムを得た。線膨張係数は、 25. Oppm/°Cであつ た。また、複屈折率は Δ η = 0. 1481 (ηΤΕ= 1. 7174, ηΤΜ= 1. 5693)であった 。なお、ガラス転移点は DSCで検出できな力、つた。一方、 TMA測定でも変曲点が見 られな力 たことから、ガラス転移点は 400°C以上と判断した。  In a dry nitrogen atmosphere, DPPMDA [Chemical 8] (1,4 diphenylpyromellitic acid dianhydride) 3.70 parts by mass and DAMBO (5 amino-2- (ρaminophenyl) benzoxazole) 2.25 parts by mass Was dissolved in m-taresole to give a 3% by mass solution. Thereafter, a polyimide film was obtained in the same manner as in Example 1. The linear expansion coefficient was 25. Oppm / ° C. The birefringence was Δη = 0.1481 (ηΤΕ = 1. 7174, ηΤΜ = 1. 5693). The glass transition point is a force that cannot be detected by DSC. On the other hand, it was judged that the glass transition point was 400 ° C or higher because the inflection point was not observed in the TMA measurement.

[0096] (実施例 7) [Example 7]

乾燥窒素雰囲気中で、 DPPMDA [化 8] (1 , 4 ジフヱ二ルーピロメリット酸 2 無水物)を 3. 70質量部および TFMB (2, 2,—ビス(トリフルォロメチル)—4, 4'ジァ ミノビフエニル) 3. 20質量部を m—タレゾールに溶解し、 4質量0 /0の溶液とした。あと は実施例 1と同じ方法でポリイミドフィルムを得た。線膨張係数は、 19. 8ppm/°Cで あった。なお、ガラス転移点は DSCで検出できなかった。一方、 TMA測定でも変曲 点が見られな力、つたことから、ガラス転移点は 400°C以上と判断した。一方、複屈折 率は Δ η = 0. 0505 (ηΤΕ= 1. 6098, ηΤΜ= 1. 5593)であった。 In a dry nitrogen atmosphere, DPPMDA [Chemical Formula 8] (1,4 diphenylpyromellitic acid dianhydride) 3.70 parts by mass and TFMB (2,2, -bis (trifluoromethyl) —4, 4 'Jia Minobifueniru) 3. 20 parts by weight were dissolved in m- Tarezoru and a solution of 4 wt 0/0. Thereafter, a polyimide film was obtained in the same manner as in Example 1. The linear expansion coefficient was 19.8 ppm / ° C. The glass transition point could not be detected by DSC. On the other hand, the TMA measurement showed that the inflection point was not seen, and the glass transition point was determined to be 400 ° C or higher. On the other hand, the birefringence was Δ η = 0.0505 (ηΤΕ = 1.6098, ηΤΜ = 1.5593).

[0097] (実施例 8) [Example 8]

乾燥窒素雰囲気中で、 DPOBPDA [化 21] (2, 2'—ジフエ二ルー 3, 4, 3' , 4'— ビフエ二レンテトラカルボン酸 2無水物)を 4. 78質量部および DAMBO (5 アミノー 2 (p ァミノフエ二ノレ)ベンゾォキサゾーノレ) 2· 25質量部を m—タレゾールに溶解 し、 10質量%の溶液とした。あとは実施例 1と同じ方法でポリイミドフィルムを得た。線 膨張係数は、 14. 5ppm/°Cであった。また、複屈折率は Δ η = 0· 0781 (ηΤΕ= 1 . 7260、 ηΤΜ= 1. 6479)であった。なお、ガラス転移点は DSCで検出できなかつ た。一方、 TMA測定でも変曲点が見られな力、つたことから、ガラス転移点は 400°C以 上と判断した。 In a dry nitrogen atmosphere, DPOBPDA [Chemical 21] (2, 2'-Diphenyl 3, 4, 3 ', 4'- Biphenyl tetracarboxylic dianhydride) 4.78 parts by mass and DAMBO (5 Amino-2 (paminophenol) benzoxazonole ( 2 · 25 parts by mass) was dissolved in m-taresol to give a 10% by mass solution. Thereafter, a polyimide film was obtained in the same manner as in Example 1. The linear expansion coefficient was 14.5 ppm / ° C. The birefringence was Δ η = 0 · 0781 (ηΤΕ = 1.7260, ηΤΜ = 1.6479). The glass transition point could not be detected by DSC. On the other hand, the TMA measurement showed that the inflection point was not observed, and the glass transition point was judged to be 400 ° C or higher.

[0098] (実施例 9) [Example 9]

乾燥窒素雰囲気中で、 DPOBPDA [化 21] (2, 2'—ジフエ二ルー 3, 4, 3' , 4'— ビフエ二レンテトラカルボン酸 2無水物)を 4· 78質量部および TFMB (2, 2 ' —ビス( トリフルォロメチル) 4, 4,ジアミノビフエニル) 3· 20質量部を m—タレゾールに溶解 し、 10質量%の溶液とした。あとは実施例 1と同じ方法でポリイミドフィルムを得た。線 膨張係数は、 26. lppm/°Cであった。なお、ガラス転移点は DSCで検出できなか つた。一方、 TMA測定でも変曲点が見られな力、つたことから、ガラス転移点は 400°C 以上と判断した。一方、複屈折率は Δ η = 0. 0414 (ηΤΕ= 1. 6338、 ηΤΜ= 1. 59 24)であった。  In a dry nitrogen atmosphere, DPOBPDA [Chemical Formula 21] (2, 2'-diphenyl 3, 4, 3 ', 4'- biphenyltetracarboxylic dianhydride) was added in 4 · 78 parts by mass and TFMB (2 , 2'-bis (trifluoromethyl) 4, 4, diaminobiphenyl) 3 · 20 parts by mass was dissolved in m-taresol to give a 10% by mass solution. Thereafter, a polyimide film was obtained in the same manner as in Example 1. The linear expansion coefficient was 26. lppm / ° C. The glass transition point could not be detected by DSC. On the other hand, the TMA measurement showed that the inflection point was not observed, and the glass transition point was judged to be 400 ° C or higher. On the other hand, the birefringence was Δη = 0.04414 (ηΤΕ = 1.6338, ηΤΜ = 1.5924).

[0099] (実施例 10) [0099] (Example 10)

乾燥窒素雰囲気中で、 DPOBPDA [化 21] (2, 2'—ジフエ二ルー 3, 4, 3' , 4'— ビフエ二レンテトラカルボン酸 2無水物)を 4· 78質量部および Fluorenediamine (9 , 9, 一ビス(4 ァミノフエ二ノレ)フルオレン) 3· 48質量部を m—タレゾールに溶解し、 10質量%の溶液とした。あとは実施例 1と同じ方法でポリイミドフィルムを得た。線膨 張係数は、 38. Oppm/°Cであった。また、 DSCでガラス転移点は測定できなかった 力 S、 TMAの変曲点からガラス転移温度は 350°Cであった。一方、複屈折率は Δ η = 0. 0047 (ηΤΕ= 1. 6727, ηΤΜ= 1. 6680)であった。 In a dry nitrogen atmosphere, DPOBPDA [Chemical 21] (2, 2'-diphenyl 3, 4, 3 ', 4'- biphenylene tetracarboxylic dianhydride) in 4 · 78 parts by mass and Fluorenediamine (9 , 9, bis (4aminophenenole) fluorene) 3 · 48 parts by mass was dissolved in m-taresol to give a 10% by mass solution. Thereafter, a polyimide film was obtained in the same manner as in Example 1. Linear expansion The tonicity factor was 38. Oppm / ° C. The glass transition temperature could not be measured by DSC. From the inflection point of force S and TMA, the glass transition temperature was 350 ° C. On the other hand, the birefringence was Δη = 0.0047 (ηΤΕ = 1.6727, ηΤΜ = 1.6680).

[0100] (比較例 1) [0100] (Comparative Example 1)

乾燥窒素雰囲気中で、 BPDA(3, 4, 3' , 4'—ビフヱ二レンテトラカルボン酸 2無水 物 )を 2· 94質量部及び PDA (p—フエ二レンジァミン) 1 · 08質量部を N—メチルー 2—ピロリドンに溶解し、 12質量%の溶液とした。これを 15時間室温で撹拌すると高 粘度の黄色のポリアミック酸溶液が得られた。このポリアミック酸溶液を、清浄なシリコ ン基板上に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱するこ とにより厚さ 20 μ mのポリイミドフィルムが得られた。このフィルムをシリコン基板からは がし、線膨張係数を測定したところ、 15. lppm/°Cであった。また、複屈折率は Δ η =0. 2631 (ηΤΕ= 1. 8665, ηΤΜ= 1. 6034)であった。なお、ガラス転移点は D SCで検出できず、 TMA測定でも変曲点が見られな力、つたことから、ガラス転移点は 400°C以上と判断した。  In a dry nitrogen atmosphere, 2 · 94 parts by mass of BPDA (3, 4, 3 ', 4'-biphenylenetetracarboxylic dianhydride) and 1 · 08 parts by mass of PDA (p-phenylenediamine) N —Dissolved in methyl-2-pyrrolidone to give a 12% by mass solution. When this was stirred for 15 hours at room temperature, a highly viscous yellow polyamic acid solution was obtained. This polyamic acid solution is applied onto a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a polyimide film with a thickness of 20 μm. It was. The film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 15. lppm / ° C. The birefringence was Δη = 0.2631 (ηΤΕ = 1.8665, ηΤΜ = 1.6034). The glass transition point could not be detected by DSC, and the TMA measurement showed no inflection point. Therefore, the glass transition point was determined to be 400 ° C or higher.

[0101] (比較例 2) [0101] (Comparative Example 2)

乾燥窒素雰囲気中で、 BPDA(3, 4, 3' , 4'—ビフヱ二レンテトラカルボン酸 2無水 物 )を 2· 94質量部及び DAMBO (5—アミノー 2—(p—ァミノフエニル)ベンゾォキ サゾール) 2. 25質量部を用いた以外は比較例 1と同様に、厚さ 20 mのポリイミドフ イルムを得た。このフィルムの線膨張係数は 8. lppm/°Cであった。また、複屈折率 は Δ η = 0. 2815 (ηΤΕ= 1. 8848、 ηΤΜ= 1. 6033)であった。なお、ガラス転移 点は DSCで検出できず、 ΤΜΑ測定でも変曲点が見られな力、つたことから、ガラス転 移点は 400°C以上と判断した。  In a dry nitrogen atmosphere, 2 · 94 parts by mass of BPDA (3, 4, 3 ', 4'-biphenylene ditetracarboxylic dianhydride) and DAMBO (5-amino-2- (p-aminophenyl) benzoxazole) 2. A polyimide film having a thickness of 20 m was obtained in the same manner as Comparative Example 1 except that 25 parts by mass was used. The linear expansion coefficient of this film was 8. lppm / ° C. The birefringence was Δη = 0.2815 (ηΤΕ = 1.8484, ηΤΜ = 1.6033). Since the glass transition point could not be detected by DSC and the inflection point was not observed in the wrinkle measurement, the glass transition point was determined to be 400 ° C or higher.

[0102] (比較例 3) [0102] (Comparative Example 3)

乾燥窒素雰囲気中で、 BPDA(3, 4, 3' , 4'—ビフヱ二レンテトラカルボン酸 2無水 物)を 2· 94質量部及び Fluorenediamine (9, 9 '—ビス(4ーァミノフエニル)フルォ レン) 3. 48質量部を m—タレゾールに溶解し、 10質量%の溶液とした。これを 3時間 室温で撹拌した後、イソキノリンを触媒として加え、窒素気流下、 200°Cで 3時間撹拌 し、室温まで冷却すると高粘度の溶液が得られる。このポリイミド溶液をエタノール中 に再沈すると、黄色の繊維状ポリマーが得られた。ポリマー乾燥後、実施例 1と同様 の方法でポリイミドフィルムを得た。このフィルムをシリコン基板からはがし、線膨張係 数を測定したところ 41. Oppm/°C、ガラス転移点は 380°Cであった。一方、複屈折 率は Δ η = 0. 0387 (ηΤΕ= 1. 6910, ηΤΜ= 1. 6523)であった。 In a dry nitrogen atmosphere, 2-94 parts by mass of BPDA (3, 4, 3 ', 4'-biphenylenditetracarboxylic dianhydride) and Fluorenediamine (9,9'-bis (4-aminominophenyl) fluorene) 3. 48 parts by mass was dissolved in m-talesole to make a 10% by mass solution. After stirring this at room temperature for 3 hours, isoquinoline is added as a catalyst, stirred at 200 ° C for 3 hours under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution. This polyimide solution in ethanol When re-precipitated, a yellow fibrous polymer was obtained. After drying the polymer, a polyimide film was obtained in the same manner as in Example 1. The film was peeled from the silicon substrate and the coefficient of linear expansion was measured. As a result, it was 41. Oppm / ° C and the glass transition point was 380 ° C. On the other hand, the birefringence was Δ η = 0.0387 (ηΤΕ = 1.6910, ηΤΜ = 1.6523).

[0103] (比較例 4) [0103] (Comparative Example 4)

乾燥窒素雰囲気中で、 DSDA (ジフエニルスルホン— 3, 4, 3' , 4'—テトラカルボン 酸 2無水物)を 3. 58質量部及び ODA(4, 4'—ジアミノジフエニルエーテル) 2. 00 質量部を用いた以外は比較例 3と同様の方法でポリイミドフィルムを得た。このフィノレ ムをシリコン基板からはがし、線膨張係数を測定したところ 64. 5ppm/°C、ガラス転 移点は 280。Cであった。一方、複屈折率は Δ η = 0· 0072 (ηΤΕ= 1. 6692、 ηΤΜ = 1. 6620)であった。  In a dry nitrogen atmosphere, 3.58 parts by mass of DSDA (diphenylsulfone-3, 4, 3 ', 4'-tetracarboxylic dianhydride) and ODA (4, 4'-diaminodiphenyl ether) 2. A polyimide film was obtained in the same manner as in Comparative Example 3 except that 00 parts by mass was used. This finenome was peeled from the silicon substrate, and the coefficient of linear expansion was measured to be 64.5 ppm / ° C and the glass transition point was 280. C. On the other hand, the birefringence was Δ η = 0 · 0072 (ηΤΕ = 1.6692, ηΤΜ = 1.6620).

[0104] (実施例 11)  [Example 10]

乾燥窒素雰囲気中で、 3, 6 ジフヱ二ルーピロメリット酸無水物(lmmol、 0. 370 3g)及び 2, 2' ビス(ビフエ二ノレ)ベンジジン(lmmol、 0· 4886g)を m クレゾ一 ルに溶解し、 4質量%の溶液とした。これを 2時間室温で撹拌した後、イソキノリンを触 媒として加え、窒素気流下、 200°Cで 30分撹拌し、このポリイミド溶液を 2 プロパノ ール中に再沈すると、黄色の粉状ポリマーが得られた。得られたポリマーは 2—プロ ノ ノールで洗浄し、乾燥した。ポリマーの還元粘度は、 1. 38であった。ポリマーを N —メチル— 2—ピロリドンに加熱溶解し、 10質量%の溶液とし、清浄なシリコン基板上 に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱することにより厚 さ 6. 5 mのポリイミドフィルムが得られた。このフィルムをシリコン基板からはがし、線 膨張係数を測定したところ、 3. 7ppm/°Cであった。また、このフィルムの複屈折 Δ η =0. 0533 (ηΤΕ= 1. 7055、ηΤΜ= 1. 6522)、伝搬損失は 2. 7dB/cmであつ た。なお、ガラス転移点は DSCで検出できず、 TMA測定でも変曲点が見られなかつ たことから、ガラス転移点は 400°C以上と判断した。  In a dry nitrogen atmosphere, add 3, 6 diphenylpyrrolomellitic anhydride (lmmol, 0.370 3g) and 2,2 'bis (biphenyl) benzidine (lmmol, 0.4886g) to m cresol. Dissolved to give a 4% by weight solution. After stirring this at room temperature for 2 hours, isoquinoline was added as a catalyst, stirred at 200 ° C for 30 minutes under a nitrogen stream, and when this polyimide solution was reprecipitated in 2-propanol, a yellow powdery polymer was formed. Obtained. The polymer obtained was washed with 2-propanol and dried. The reduced viscosity of the polymer was 1.38. The polymer is dissolved in N-methyl-2-pyrrolidone by heating to form a 10% by mass solution, applied onto a clean silicon substrate, and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour. As a result, a 6.5 m thick polyimide film was obtained. The film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to be 3.7 ppm / ° C. The birefringence of this film was Δη = 0.05533 (ηΤΕ = 1.7055, ηΤΜ = 1.6522), and the propagation loss was 2.7 dB / cm. The glass transition point could not be detected by DSC, and no inflection point was found in the TMA measurement, so the glass transition point was determined to be 400 ° C or higher.

[0105] (実施例 12)  [Example 12]

乾燥窒素雰囲気中で、ピロメリット酸無水物(lmmol、 0. 2942g)及び 2, 2' ビス (ビフエニル)ベンジジン(lmmol、 0. 4886g)を N メチル 2 ピロリドンに溶解し 、 20質量%の溶液とした。これを窒素雰囲気下、 24時間室温で撹拌すると高粘度の 溶液が得られる。得られた溶液の還元粘度は、 1. 17であった。ポリマー溶液を、清 浄なシリコン基板上に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間 加熱することにより厚さ 8. 2 mのポリイミドフィルムが得られた。このフィルムをシリコ ン基板からはがし、線膨張係数を測定したところ、 20. 8ppm/°Cであった。また、こ のフィルムの複屈折 Δ η = 0. 0267 (ηΤΕ= 1. 6846, ηΤΜ= 1. 6579)、伝搬損失 は 2. 9dB/cmであった。なお、ガラス転移点は DSCで検出できず、 TMA測定でも 変曲点が見られなかったことから、ガラス転移点は 400°C以上と判断した。 In a dry nitrogen atmosphere, pyromellitic anhydride (lmmol, 0.2942g) and 2,2'bis (biphenyl) benzidine (lmmol, 0.4886g) were dissolved in N-methyl-2-pyrrolidone. 20% by mass solution. When this is stirred for 24 hours at room temperature in a nitrogen atmosphere, a highly viscous solution is obtained. The reduced viscosity of the obtained solution was 1.17. The polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a 8.2-m thick polyimide film. The film was peeled from the silicon substrate, and the coefficient of linear expansion was measured. As a result, it was 20.8 ppm / ° C. The birefringence of this film was Δ η = 0.0267 (ηΤΕ = 1.6846, ηΤΜ = 1. 6579), and the propagation loss was 2.9 dB / cm. The glass transition point could not be detected by DSC, and no inflection point was found by TMA measurement, so the glass transition point was determined to be 400 ° C or higher.

[0106] (実施例 13)  [Example 13]

乾燥窒素雰囲気中で、 3, 4, 3' , 4'—ビフエニルテトラカルボン酸無水物(lmmol 、 0. 2942g)及び 2, 2,—ビス(ビフエ二ノレ)ベンジジン(lmmol、 0. 4886g)を m— タレゾールに溶解し、 10質量%の溶液とした。これを 2時間室温で撹拌した後、イソ キノリンを触媒として加え、窒素気流下、 200°Cで 3時間撹拌した後、室温まで冷却 すると、高粘度の溶液が得られる。このポリイミド溶液を 2—プロパノール中に再沈す ると、淡黄色の繊維状ポリマーが得られた。得られたポリマーは 2—プロパノールで洗 浄し、乾燥した。ポリマーの還元粘度は、であった。ポリマーを N—メチルー 2—ピロリ ドンに溶解し、 8質量%の溶液とし、清浄なシリコン基板上に塗布し、乾燥窒素雰囲 気中、 120°Cで 15分、 350°Cで 1時間加熱することにより厚さ 7. 4 mのポリイミドフ イルムが得られた。このフィルムをシリコン基板からはがし、線膨張係数を測定したとこ ろ、 16. 4ppm/。Cであった。また、このフィルムの複屈折 Δ η = 0· 0341 (ηΤΕ= 1. 7195、 ηΤΜ= 1. 6854)、伝搬損失は 2. 3dB/cmであった。なお、ガラス転移点 は DSCで検出できず、 TMA測定でも変曲点が見られなかったことから、ガラス転移 点は 400°C以上と判断した。  In a dry nitrogen atmosphere, 3, 4, 3 ', 4'-biphenyltetracarboxylic anhydride (lmmol, 0.2942g) and 2,2, -bis (biphenyl) benzidine (lmmol, 0.4886g) Was dissolved in m-talesol to give a 10% by mass solution. After stirring this for 2 hours at room temperature, isoquinoline is added as a catalyst, stirring at 200 ° C for 3 hours under a nitrogen stream, and then cooling to room temperature gives a highly viscous solution. When this polyimide solution was reprecipitated in 2-propanol, a light yellow fibrous polymer was obtained. The polymer obtained was washed with 2-propanol and dried. The reduced viscosity of the polymer was: Dissolve the polymer in N-methyl-2-pyrrolidone to make an 8% by weight solution, apply it on a clean silicon substrate, and heat in a dry nitrogen atmosphere at 120 ° C for 15 minutes and at 350 ° C for 1 hour. As a result, a polyimide film having a thickness of 7.4 m was obtained. The film was peeled from the silicon substrate and the coefficient of linear expansion was measured. C. Further, the birefringence of this film was Δη = 0.03341 (ηΤΕ = 1. 7195, ηΤΜ = 1.6854), and the propagation loss was 2.3 dB / cm. The glass transition point could not be detected by DSC, and no inflection point was found by TMA measurement. Therefore, the glass transition point was determined to be 400 ° C or higher.

[0107] (実施例 14)  [Example 14]

反応容器に 3, 3' , 4, 4'—ビフエニルテトラカルボン酸二無水物(lmmol、 0. 294 2g)、 2, 2, 一ビス(ビフエ二ル)一 1 , 1, 一ジフエニル一 4, 4, 一ジイソシァネート(lm mol、 0. 5406g)、フツイ匕カリウム lOOmgを入れ、 N—メチノレー 2—ピロリドン 10gに 溶解した後、窒素気流下、撹拌しながら、 80°C〜150°Cで 8時間反応させることによ り、透明で粘稠なポリアミドイミド溶液を得た。ポリマー溶液を、清浄なシリコン基板上 に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱することにより厚 さ 10· 6〃mのポリイミドフィルムが得られた。このフィルムをシリコン基板からはがし、 線膨張係数を測定したところ、 18. 6ppm/°Cであった。また、このフィルムの複屈折 Δ η = 0. 0276 (ηΤΕ= 1. 7163, ηΤΜ= 1. 6887)、伝搬損失は 2. 2dB/cmで あった。なお、ガラス転移点は DSCで検出できず、 TMA測定でも変曲点が見られな 力、つたことから、ガラス転移点は 400°C以上と判断した。 In a reaction vessel, 3, 3 ', 4, 4'-biphenyltetracarboxylic dianhydride (lmmol, 0.294 2g), 2, 2, monobis (biphenyl) 1, 1, 1, monodiphenyl 1 4 , 4, monodiisocyanate (lm mol, 0.5406g) and potassium salt of FUJI 匕 potassium lOOmg, dissolved in 10g of N-methylolene-2-pyrrolidone, then stirred at 80 ° C to 150 ° C under nitrogen flow for 8 By reacting for hours As a result, a transparent and viscous polyamideimide solution was obtained. The polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a polyimide film having a thickness of 10.6 mm. The film was peeled from the silicon substrate and the coefficient of linear expansion was measured to find 18.6 ppm / ° C. Further, the birefringence of this film was Δη = 0.0276 (ηΤΕ = 1. 7163, ηΤΜ = 1.6887), and the propagation loss was 2.2 dB / cm. Since the glass transition point could not be detected by DSC and the inflection point was not seen in TMA measurement, the glass transition point was judged to be 400 ° C or higher.

[0108] (比較例 5) [0108] (Comparative Example 5)

乾燥窒素雰囲気中で、 4, 4'一(2, 2'一へキサフルォロイソプロピリデン)ジフタノレ 酸二酸無水物(lmmol、 0· 4442g)及び 2, 2 '—ビス(ビフエ二ノレ)ベンジジン(lm mol、 0. 4886g)を m クレゾ一ノレに溶解し、 10質量0 /0の溶液とした。これを 3時間 室温で撹拌した後、イソキノリンを触媒として加え、窒素気流下、 200°Cで 3時間撹拌 し、室温まで冷却すると高粘度の溶液が得られる。このポリイミド溶液を 2—プロパノ ール中に再沈すると、白色の繊維状ポリマーが得られた。ポリマー乾燥後、実施例 1 と同様の方法で膜厚 26. 8 mのポリイミドフィルムを得、線膨張係数を測定したとこ ろ 62· 3ppm/°Cであった。また、ガラス転移点は 285°Cであった。一方、複屈折率 (ま Δ η = 0. 006 (ηΤΕ= 1. 6361 , ηΤΜ= 1. 6301)、伝搬損失 (ま 1. 2dB/cmで あった。 In a dry nitrogen atmosphere, 4, 4 '-(2,2'-hexafluoroisopropylidene) diphthalanol dianhydride (lmmol, 0.444g) and 2,2'-bis (biphenol) benzidine (lm mol, 0. 4886g) was dissolved in m cresol one Honoré was 10 mass 0/0 solution. This is stirred for 3 hours at room temperature, then isoquinoline is added as a catalyst, stirred for 3 hours at 200 ° C under a nitrogen stream, and cooled to room temperature to obtain a highly viscous solution. When this polyimide solution was reprecipitated in 2-propanol, a white fibrous polymer was obtained. After drying the polymer, a polyimide film having a film thickness of 26.8 m was obtained in the same manner as in Example 1, and the coefficient of linear expansion was measured to be 62.3 ppm / ° C. The glass transition point was 285 ° C. On the other hand, the birefringence (up to Δ η = 0.006 (ηΤΕ = 1.6361, ηΤΜ = 1.6301)) and propagation loss (up to 1.2 dB / cm).

[0109] (比較例 6) [0109] (Comparative Example 6)

乾燥窒素雰囲気中で、ピロメリット酸無水物(2. 181g)及び 1 , 3 ビス(4 アミノフ エノキシ)ベンゼン(2· 923g)をジメチルァセトアミドに溶解し、 12質量0 /0の溶液とし た。これを窒素雰囲気下、 24時間室温で撹拌すると高粘度の溶液が得られる。この ポリアミド酸溶液を用いて実施例 2と同様の方法で膜厚 15. 2 mのポリイミドフィル ムを得、線膨張係数を測定したところ 51. 4ppm/°C、ガラス転移点は 330°Cであつ た。一方、複屈折率は Δ η = 0. 1307 (ηΤΕ= 1. 7380、ηΤΜ= 1. 6073)、伝搬損 失は 2· 8dB/cmであった。 In a dry nitrogen atmosphere, dissolved pyromellitic anhydride (2. 181 g) and 1, 3-bis (4 Aminofu enoxy) benzene (2 · 923g) in dimethyl § Seth amide was 12 mass 0/0 solution . When this is stirred for 24 hours at room temperature in a nitrogen atmosphere, a highly viscous solution is obtained. Using this polyamic acid solution, a polyimide film with a film thickness of 15.2 m was obtained in the same manner as in Example 2. The coefficient of linear expansion was measured to be 51.4 ppm / ° C and the glass transition point was 330 ° C. It was hot. On the other hand, the birefringence was Δ η = 0.1307 (ηΤΕ = 1. 7380, ηΤΜ = 1. 6073), and the propagation loss was 2.8 dB / cm.

[0110] (比較例 7) [0110] (Comparative Example 7)

乾燥窒素雰囲気中で、 2, 2'—ジフエ二ルー 3, 4, 3' , 4'—テトラカルボン酸無水 物(10mmol、 2. 942g)及び 5 アミノー 2— (4 ァミノフエニル)ベンゾォキサゾー ル(10mmol、 2. 253g)をジメチルァセトアミドに溶解し、 10質量0 /0の溶液とした。こ れを窒素雰囲気下、 96時間室温で撹拌すると高粘度の溶液が得られる。得られた溶 液の還元粘度は、 0. 44であった。ポリマー溶液を、清浄なシリコン基板上に塗布し、 乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱することにより厚さ 13. Ομ mのポリイミドフィルムが得られた。このフィルムをシリコン基板からはがし、線膨張係 数を測定したところ、 8. lppm/°Cであった。また、このフィルムの複屈折 Δη = 0· 2 602(ηΤΕ=1. 8765、ηΤΜ=1. 6163)、伝搬損失は 4. 9dB/cmであった。なお 、ガラス転移点は DSCで検出できず、 TMA測定でも変曲点が見られなかったことか ら、ガラス転移点は 400°C以上と判断した。 2, 2'-Diphenyl 3, 4, 3 ', 4'-tetracarboxylic anhydride in dry nitrogen atmosphere Objects (10 mmol, 2. 942 g) was dissolved and 5-amino-2- (4 Aminofueniru) Benzookisazo le (10 mmol, 2. 253 g) and dimethyl § Seth amide was 10 mass 0/0 solution. When this is stirred at room temperature for 96 hours in a nitrogen atmosphere, a highly viscous solution is obtained. The reduced viscosity of the obtained solution was 0.44. The polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a polyimide film having a thickness of 13. mm. The film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 8. lppm / ° C. The birefringence of this film was Δη = 0.6022 (ηΤΕ = 1.88765, ηΤΜ = 1.1633), and the propagation loss was 4.9 dB / cm. The glass transition point could not be detected by DSC, and no inflection point was observed by TMA measurement, so the glass transition point was determined to be 400 ° C or higher.

[0111] (比較例 8) [0111] (Comparative Example 8)

乾燥窒素雰囲気中で、ピロメリット酸無水物(10mmol、 2. 181g)及び 5 アミノー 2—(4ーァミノフエニル)ベンゾォキサゾール(10mmol、 2. 253g)をジメチルァセト アミドに溶解し、 10質量%の溶液とした。これを窒素雰囲気下、 24時間室温で撹拌 すると高粘度の溶液が得られる。得られた溶液の還元粘度は、 3. 1であった。ポリマ 一溶液を、清浄なシリコン基板上に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 35 0°Cで 1時間加熱することにより厚さ 9. 4 mのポリイミドフィルムが得られた。このフィ ルムをシリコン基板からはがし、線膨張係数を測定したところ、 0. 8ppm/°Cであつ た。また、このフィルムの複屈折 Δη = 0. 2524(ηΤΕ=1. 8471、ηΤΜ=1. 5947) 、伝搬損失は 5. 2dB/cmであった。なお、ガラス転移点は DSCで検出できず、 TM A測定でも変曲点が見られな力 たことから、ガラス転移点は 400°C以上と判断した In a dry nitrogen atmosphere, pyromellitic anhydride (10 mmol, 2. 181 g) and 5 amino-2- (4-aminophenyl) benzoxazole (10 mmol, 2.253 g) are dissolved in dimethylacetamide to give a 10% by mass solution. It was. When this is stirred at room temperature for 24 hours in a nitrogen atmosphere, a highly viscous solution is obtained. The reduced viscosity of the obtained solution was 3.1. A polymer solution was coated on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and at 350 ° C for 1 hour to obtain a 9.4 m thick polyimide film. . The film was peeled from the silicon substrate and the coefficient of linear expansion was measured and found to be 0.8 ppm / ° C. The birefringence of this film was Δη = 0.2524 (ηΤΕ = 1.8471, ηΤΜ = 1.5947), and the propagation loss was 5.2 dB / cm. The glass transition point could not be detected by DSC, and the inflection point was not observed in TMA measurement, so the glass transition point was determined to be 400 ° C or higher.

Yes

[0112] (実施例 15)  [0112] (Example 15)

乾燥窒素雰囲気中で、 2, 2'—ジフエノキシ 3, 3' , 4, 4'—ビフエニルテトラカル ボン酸二無水物(lmmol、 0. 4784g)及び 2, 5 ジフエニノレー 1, 4 フエ二レンジ ァミン(lmmol、 0. 2603g)をジメチルァセトアミドに溶解し、 20質量0 /0の溶液とした 。これを窒素雰囲気下、 96時間室温で撹拌すると高粘度の溶液が得られる。得られ た溶液の還元粘度は、 0. 465であった。ポリマー溶液を、清浄なシリコン基板上に塗 布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱することにより厚さ 20 . O ^ mのポリイミドフィルムが得られた。このフィルムをシリコン基板からはがし、線膨 張係数を測定したところ、 55. 7ppm/°Cであった。また、このフィルムの複屈折 Δ η =0. 00076 (ηΤΕ= 1. 6486, ηΤΜ= 1. 6478)、伝搬損失は 2. 6dB/cmであつ た。なお、ガラス転移点は DSCで検出できず、 TMA測定でも変曲点が見られなかつ たことから、ガラス転移点は 400°C以上と判断した。 2, 2'-Diphenoxy 3, 3 ', 4, 4'-Biphenyltetracarboxylic dianhydride (lmmol, 0.4784g) and 2,5 Diphenenole 1, 4 Phenyl diamamine in dry nitrogen atmosphere (lmmol, 0. 2603g) was dissolved in dimethyl § Seth amide was 20 wt 0/0 solution. When this is stirred at room temperature for 96 hours in a nitrogen atmosphere, a highly viscous solution is obtained. The reduced viscosity of the obtained solution was 0.465. Apply the polymer solution onto a clean silicon substrate. A polyimide film having a thickness of 20.O ^ m was obtained by coating and heating in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour. This film was peeled off from the silicon substrate, and the coefficient of linear expansion was measured to be 55.7 ppm / ° C. In addition, the birefringence of this film was Δη = 0.0.00076 (η486 = 1.6486, ηΤΜ = 1.6478), and the propagation loss was 2.6 dB / cm. The glass transition point could not be detected by DSC, and no inflection point was found in the TMA measurement, so the glass transition point was determined to be 400 ° C or higher.

[0113] (実施例 16)  [0113] (Example 16)

乾燥窒素雰囲気中で、 3, 3' , 4, 4'—ビフエニルテトラカルボン酸二無水物(lmm ol、 0. 2942g)及び 2, 5 ジフエ二ノレ一 1 , 4 フエ二レンジァミン(lmmol、 0. 260 3g)をジメチルァセトアミドに溶解し、 20質量%の溶液とした。これを窒素雰囲気下、 6時間室温で撹拌するとゲル状ポリマーが得られる。得られたポリマーの還元粘度は 、 0. 75であった。ゲル状ポリマーを 120°Cで 30秒加熱すると、ポリマー溶液となる。 このポリマー溶液を、すばやく清浄なシリコン基板上に塗布し、乾燥窒素雰囲気中、 120。Cで 15分、 350。Cで 1日寺間カロ熱することにより厚さ 6. 0〃 mのポリイミドフイノレム が得られた。このフィルムをシリコン基板からはがし、線膨張係数を測定したところ、 4 2. lppm/。Cであった。また、このフィルムの複屈折 Δ η = 0· 00301 (ηΤΕ= 1. 66 834、 ηΤΜ= 1. 66533)、伝搬損失は 2. 9dB/cmであった。なお、ガラス転移点 は DSCで検出できず、 TMA測定でも変曲点が見られな力、つたことから、ガラス転移 点は 400°C以上と判断した。  In a dry nitrogen atmosphere, 3, 3 ', 4, 4'-biphenyltetracarboxylic dianhydride (lmmol, 0.2942g) and 2,5 diphenylinol 1,4 phenylenediamine (lmmol, 0 260 3g) was dissolved in dimethylacetamide to give a 20% by weight solution. When this is stirred at room temperature for 6 hours in a nitrogen atmosphere, a gel polymer is obtained. The reduced viscosity of the obtained polymer was 0.75. When the gel polymer is heated at 120 ° C for 30 seconds, a polymer solution is obtained. This polymer solution is quickly applied onto a clean silicon substrate, 120 in a dry nitrogen atmosphere. 15 minutes at C, 350. A 6.0-m-thick polyimide Finolem was obtained by heating the temple for 1 day. The film was peeled from the silicon substrate and the coefficient of linear expansion was measured. C. The birefringence of this film was Δη = 0.00301 (ηΤΕ = 1.66 834, ηΤΜ = 1.66533), and the propagation loss was 2.9 dB / cm. The glass transition point could not be detected by DSC, and the TMA measurement showed no inflection point. Therefore, the glass transition point was determined to be 400 ° C or higher.

[0114] (実施例 17)  [0114] (Example 17)

反応容器に 2, 2'—ジフエノキシ 3, 3' , 4, 4'—ビフエニルテトラカルボン酸二無 水物(lmmol、 0. 4784g)、 2, 5 ジフエ二ノレ一 1 , 4 フエ二レンジイソシァネート( lmmol、 0. 3123g)、フツイ匕カリウム lOOmgを入れ、 N メチノレー 2 ピロリドン 10g に溶解した後、窒素気流下、撹拌しながら、 80°C〜150°Cで 8時間反応させることに より、透明で粘稠なポリアミドイミド溶液を得た。ポリマー溶液を、清浄なシリコン基板 上に塗布し、乾燥窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱することにより 厚さ 15. 2〃mのポリイミドフィルムが得られた。このフィルムをシリコン基板からはがし 、線膨張係数を測定したところ、 55. 7ppm/°Cであった。また、このフィルムの複屈 折 Δ η = 0. 0060 (ηΤΕ= 1. 6535、 ηΤΜ= 1. 6475)、伝搬損失は 2. 8dB/cm であった。なお、ガラス転移点は DSCで検出できず、 TMA測定でも変曲点が見られ なかったことから、ガラス転移点は 400°C以上と判断した。 2, 2'-Diphenoxy 3, 3 ', 4, 4'-Biphenyltetracarboxylic acid dihydrate (lmmol, 0.4784g), 2, 5 By adding cyanate (lmmol, 0.3123g) and potassium salt of futsui potassium lOOmg and dissolving in 10g of N-methinole-2-pyrrolidone, the mixture was allowed to react at 80 ° C to 150 ° C for 8 hours with stirring under a nitrogen stream. A clear and viscous polyamideimide solution was obtained. The polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a 15.2 mm thick polyimide film. This film was peeled off from the silicon substrate, and the coefficient of linear expansion was measured. As a result, it was 55.7 ppm / ° C. Also, the double bending of this film As a result, Δ η = 0. 0060 (ηΤΕ = 1. 6535, ηΤΜ = 1. 6475), and the propagation loss was 2.8 dB / cm 2. The glass transition point could not be detected by DSC, and no inflection point was found in the TMA measurement. Therefore, the glass transition point was determined to be 400 ° C or higher.

[0115] (比較例 9) [0115] (Comparative Example 9)

乾燥窒素雰囲気中で、 3, 4, 3' , 4'—べンゾフエノンテトラカルボン酸無水物(10 mmol、 3. 222g)及び 5 アミノー 2— (4 ァミノフエ二ノレ)ベンゾォキサゾール(10 mmol、 2. 253g)をジメチルァセトアミドに溶解し、 10質量%の溶液とした。これを窒 素雰囲気下、 24時間室温で撹拌すると高粘度の溶液が得られる。得られた溶液の 還元粘度は、 2. 5であった。ポリマー溶液を、清浄なシリコン基板上に塗布し、乾燥 窒素雰囲気中、 120°Cで 15分、 350°Cで 1時間加熱することにより厚さ 20. 6 mの ポリイミドフィルムが得られた。このフィルムをシリコン基板からはがし、線膨張係数を 測定したところ、 23. 7ppm/°Cであった。また、このフィルムの複屈折 Δ η = 0· 232 0 (ηΤΕ= 1. 8417、 ηΤΜ= 1. 6097)、伝搬損失は 3. OdB/cmであった。なお、 ガラス転移点は DSCで検出できず、 TMA測定でも変曲点が見られなかったことから 、ガラス転移点は 400°C以上と判断した。  In a dry nitrogen atmosphere, 3, 4, 3 ', 4'-benzophenone tetracarboxylic anhydride (10 mmol, 3. 222 g) and 5 amino-2- (4 aminopheninole) benzoxazole (10 mmol, 2.253 g) was dissolved in dimethylacetamide to give a 10% by weight solution. When this is stirred at room temperature for 24 hours in a nitrogen atmosphere, a highly viscous solution is obtained. The reduced viscosity of the obtained solution was 2.5. The polymer solution was applied on a clean silicon substrate and heated in a dry nitrogen atmosphere at 120 ° C for 15 minutes and 350 ° C for 1 hour to obtain a polyimide film having a thickness of 20.6 m. The film was peeled from the silicon substrate, and the coefficient of linear expansion was measured to find 23.7 ppm / ° C. This film had a birefringence of Δη = 0.2320 (ηΤΕ = 1.8417, ηΤΜ = 1.6097), and a propagation loss of 3. OdB / cm. The glass transition point could not be detected by DSC, and no inflection point was found by TMA measurement. Therefore, the glass transition point was determined to be 400 ° C or higher.

[0116] (比較例 10) [0116] (Comparative Example 10)

乾燥窒素雰囲気中で、ピロメリット酸無水物(2. 181g)及び 1 , 3 ビス(4 アミノフ エノキシ)ベンゼン(2· 923g)をジメチルァセトアミドに溶解し、 12質量0 /0の溶液とし た。これを窒素雰囲気下、 24時間室温で撹拌すると高粘度の溶液が得られる。この ポリアミド酸溶液を用いて実施例 2と同様の方法で膜厚 15. 2 mのポリイミドフィル ムを得、線膨張係数を測定したところ 51. 4ppm/°C、ガラス転移点は 330°Cであつ た。一方、複屈折率は Δ η = 0. 1307 (ηΤΕ= 1. 7380、 ηΤΜ= 1. 6073)、伝搬損 失は 2· 8dB/cmであった。 In a dry nitrogen atmosphere, dissolved pyromellitic anhydride (2. 181 g) and 1, 3-bis (4 Aminofu enoxy) benzene (2 · 923g) in dimethyl § Seth amide was 12 mass 0/0 solution . When this is stirred for 24 hours at room temperature in a nitrogen atmosphere, a highly viscous solution is obtained. Using this polyamic acid solution, a polyimide film with a film thickness of 15.2 m was obtained in the same manner as in Example 2. The coefficient of linear expansion was measured to be 51.4 ppm / ° C and the glass transition point was 330 ° C. It was hot. On the other hand, the birefringence was Δ η = 0.1307 (ηΤΕ = 1. 7380, ηΤΜ = 1. 6073), and the propagation loss was 2.8 dB / cm.

産業上の利用可能性  Industrial applicability

[0117] 本発明のポリイミドは、その線膨張係数が小さくガラス基板やケィ素基板の線膨張 係数との差が小さレ、ので、これらの基板上にそのようなポリイミドからなるクラッド層や コア層を形成した場合も、基板にカールが生じず基板と光導波路との剥離が生じ難く 、また導体回路と光導波路が混載された複合配線板などにぉレ、て導体回路の絶縁 性不良をも発生し難ぐ Au— Sn半田における 300°C以上においてポリイミドが軟化 するなどによって変形し機能不全を招くことがなぐまた、複屈折が小さいため、光学 部品としての機能性を損なうことがないといった特性を兼ね備えた、寸法安定性、低 線膨張係数、光学等方性、耐熱性、光透過特性、絶縁維持性を兼ね備えたポリイミド であって、光学材料特に光導波路に有用である。 [0117] Since the polyimide of the present invention has a small linear expansion coefficient and a small difference from the linear expansion coefficient of a glass substrate or a key substrate, a clad layer or a core layer made of such a polyimide on these substrates. Even when the substrate is formed, the substrate is not curled and the substrate and the optical waveguide are not easily separated from each other, and the conductor circuit is insulated from the composite circuit board in which the conductor circuit and the optical waveguide are mixed. Insufficient defects in Au-Sn solder In 300 ° C or higher, polyimide is softened and deformed due to softening, etc., and malfunction is not caused. Also, the birefringence is small, so the functionality as an optical component is impaired. It is a polyimide that has characteristics such as no dimensional stability, low linear expansion coefficient, optical isotropy, heat resistance, light transmission characteristics, and insulation sustainability, and is useful for optical materials, particularly optical waveguides.

半導体の実装技術を光導波路作成にそのまま用いることができ、位置ずれ、反りな どが少ない信頼性の高い光導波路を安価に作成することが可能であり、産業界に大 きく寄与することが期待される。  Semiconductor mounting technology can be used as it is for optical waveguide production, and it is possible to produce highly reliable optical waveguides with little misalignment and warping at low cost, which is expected to make a significant contribution to the industry. Is done.

Claims

請求の範囲 The scope of the claims [1] 分子内に塩素原子を含まないポリイミドであって、該ポリイミドのガラス転移点が 300 °C以上、複屈折率が 0. 15以下、線膨張係数が 70ppm/°C以下であることを特徴と するポリイミド。  [1] A polyimide having no chlorine atom in the molecule, the polyimide having a glass transition point of 300 ° C or more, a birefringence of 0.15 or less, and a linear expansion coefficient of 70 ppm / ° C or less. Characteristic polyimide. [2] ポリイミドのガラス転移点が 320°C以上、線膨張係数が 40ppm/°C以下であること を特徴とする請求項 1に記載のポリイミド。  [2] The polyimide according to claim 1, wherein the polyimide has a glass transition point of 320 ° C. or higher and a linear expansion coefficient of 40 ppm / ° C. or lower. [3] 分子内に塩素原子を含まな!/、芳香族テトラカルボン酸類が以下の [化;!]〜 [化 3] の骨格を有する芳香族テトラカルボン酸類を含む請求項 2に記載のポリイミド。 [3] The polyimide according to claim 2, wherein the molecule does not contain a chlorine atom! /, And the aromatic tetracarboxylic acid includes an aromatic tetracarboxylic acid having a skeleton of the following [Chemical ;!] to [Chemical 3] . [化 1]  [Chemical 1]
Figure imgf000043_0001
Figure imgf000043_0001
( [化 1]〜[化 3]において、 [化 1]ではフエニル骨格の 2態様を、 [化 2]ではビフエ二 ル骨格の 2態様を、 [化 3]ではナフチル骨格の 3態様を示し、 X;!〜 X6は、 1価の炭 化水素芳香族基 (フエニル、ビフエニル、ナフチル)、 1価の芳香族エーテル基 (フエノ キシ、ビフエノキシ、ナフトキシ)、水素を示し、かつ各ユニット (骨格)中少なくとも 1つ が 1価の炭化水素芳香族基及び又は 1価の芳香族エーテル基であり、その他結合部 はカルボン酸結合部を示すものである。 ) [4] 芳香族ジァミン類が以下の [化 4]〜 [化 6]の骨格を有する芳香族ジァミン類を含む 請求項 2又は 31/、ずれかに記載のポリイミド。 (In [Chemical Formula 1] to [Chemical Formula 3], [Chemical Formula 1] shows two aspects of the phenyl skeleton, [Chemical Formula 2] shows two aspects of the biphenyl skeleton, and [Chemical Formula 3] shows three aspects of the naphthyl skeleton. , X;! To X6 represent a monovalent hydrocarbon aromatic group (phenyl, biphenyl, naphthyl), a monovalent aromatic ether group (phenoxy, biphenoxy, naphthoxy), hydrogen, and each unit (skeleton) ) At least one of them is a monovalent hydrocarbon aromatic group and / or a monovalent aromatic ether group, and the other bonding part represents a carboxylic acid bonding part. [4] The polyimide according to claim 2 or 31 /, wherein the aromatic diamine includes an aromatic diamine having a skeleton of [Chemical Formula 4] to [Chemical Formula 6] below.
Figure imgf000044_0001
Figure imgf000044_0002
Figure imgf000044_0001
Figure imgf000044_0002
Figure imgf000044_0003
Figure imgf000044_0003
( [化 4]〜[化 6]において、 [化 4]ではフエニル骨格の 2態様を、  (In [Chemical 4] to [Chemical 6], in [Chemical 4], the two aspects of the phenyl skeleton are [化 5]ではビフエ二 ル骨格の 2態様を、 [化 6]ではナフチル骨格の 5態様を示し、 X;!〜 X8は、 1価の炭 化水素芳香族基 (フエニル、ビフエニル、ナフチル)、 1価の芳香族エーテル基 (フエノ キシ、ビフエノキシ、ナフトキシ)、水素を示し、かつ各ユニット (骨格)中少なくとも 1つ が 1価の炭化水素芳香族基及び又は 1価の芳香族エーテル基であり、その他結合部 はァミン結合部を示すものである。 ) [Chemical 5] shows two aspects of the biphenyl skeleton, [Chemical 6] shows five aspects of the naphthyl skeleton, and X;! To X8 are monovalent hydrocarbon aromatic groups (phenyl, biphenyl, naphthyl). , Monovalent aromatic ether group (phenoxy, biphenoxy, naphthoxy), hydrogen, and at least one of each unit (skeleton) is a monovalent hydrocarbon aromatic group and / or monovalent aromatic ether group Yes, and the other binding part indicates an amine binding part. ) ポリイミドの線膨張係数が 60ppm/°C以下であり、かつポリイミド構造中に下記構 造式 [化 7]を含むことを特徴とする請求項 1〜4いずれかに記載のポリイミド。  5. The polyimide according to claim 1, wherein the polyimide has a linear expansion coefficient of 60 ppm / ° C. or less, and the polyimide structure includes the following structural formula [Chemical Formula 7]. [化 7]  [Chemical 7]
Figure imgf000044_0004
Figure imgf000044_0004
[6] ポリイミドの複屈折が 0. 1以下である請求項 5記載のポリイミド。 6. The polyimide according to claim 5, wherein the birefringence of the polyimide is 0.1 or less. [7] ポリイミドの構造中に下記構造式 [化 8]のジァミン骨格含むことを特徴とする請求項 [7] The polyimide structure contains a diamine skeleton represented by the following structural formula [Chemical Formula 8] 1〜4いずれかに記載のポリイミド。 The polyimide in any one of 1-4. [化 8] [Chemical 8]
Figure imgf000045_0001
Figure imgf000045_0001
ポリイミドの複屈折が 0. 05以下である請求項 7記載のポリイミド。  8. The polyimide according to claim 7, wherein the birefringence of the polyimide is 0.05 or less. 1〜8レ、ずれかに記載のポリイミドを用いた光導波路。  An optical waveguide using the polyimide described in 1-8.
PCT/JP2007/069006 2006-10-02 2007-09-28 Polyimide and optical waveguide using the same Ceased WO2008041636A1 (en)

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Publication number Priority date Publication date Assignee Title
JP2010254792A (en) * 2009-04-24 2010-11-11 Toyobo Co Ltd Polyimide, and polyimide for optical waveguide
CN101928398A (en) * 2009-06-23 2010-12-29 日东电工株式会社 Polyimide compound, method for producing it, and optical film and optical waveguide obtained therefrom
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