[go: up one dir, main page]

WO2007002170A3 - Microdischarge light source configuration and illumination system - Google Patents

Microdischarge light source configuration and illumination system Download PDF

Info

Publication number
WO2007002170A3
WO2007002170A3 PCT/US2006/024104 US2006024104W WO2007002170A3 WO 2007002170 A3 WO2007002170 A3 WO 2007002170A3 US 2006024104 W US2006024104 W US 2006024104W WO 2007002170 A3 WO2007002170 A3 WO 2007002170A3
Authority
WO
WIPO (PCT)
Prior art keywords
source configuration
microdischarge
light source
illumination system
generation
Prior art date
Application number
PCT/US2006/024104
Other languages
French (fr)
Other versions
WO2007002170A2 (en
Inventor
Brian E Jurczyk
Robert Stubbers
Original Assignee
Starfire Industries Llc
Brian E Jurczyk
Robert Stubbers
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Starfire Industries Llc, Brian E Jurczyk, Robert Stubbers filed Critical Starfire Industries Llc
Publication of WO2007002170A2 publication Critical patent/WO2007002170A2/en
Publication of WO2007002170A3 publication Critical patent/WO2007002170A3/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A novel plasma source configuration system based on an arrangement of microdischarges is presented with particular emphasis on the generation of radiation for next-generation lithographic integrated circuit manufacturing, microscopy and medical/biological imaging. The present invention makes substantive improvements to the current state-of-the-art by specifically addressing known deficiencies, problems limiting high-volume manufacturing and cost-of-ownership considerations. In particular, the present invention enables a series of innovative illumination configurations that can improve lithographic tool design and performance.
PCT/US2006/024104 2005-06-21 2006-06-21 Microdischarge light source configuration and illumination system WO2007002170A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69244505P 2005-06-21 2005-06-21
US60/692,445 2005-06-21

Publications (2)

Publication Number Publication Date
WO2007002170A2 WO2007002170A2 (en) 2007-01-04
WO2007002170A3 true WO2007002170A3 (en) 2009-04-23

Family

ID=37595786

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/024104 WO2007002170A2 (en) 2005-06-21 2006-06-21 Microdischarge light source configuration and illumination system

Country Status (1)

Country Link
WO (1) WO2007002170A2 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696493B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP5218994B2 (en) * 2007-02-20 2013-06-26 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical element having a plurality of primary light sources
US8785881B2 (en) 2008-05-06 2014-07-22 Massachusetts Institute Of Technology Method and apparatus for a porous electrospray emitter
US10125052B2 (en) 2008-05-06 2018-11-13 Massachusetts Institute Of Technology Method of fabricating electrically conductive aerogels
US8891058B2 (en) 2008-07-18 2014-11-18 Koninklijke Philips N.V. Extreme UV radiation generating device comprising a contamination captor
KR101748461B1 (en) 2010-02-09 2017-06-16 에너제틱 테크놀로지 아이엔씨. Laser-driven light source
US8450051B2 (en) 2010-12-20 2013-05-28 Varian Semiconductor Equipment Associates, Inc. Use of patterned UV source for photolithography
US10308377B2 (en) 2011-05-03 2019-06-04 Massachusetts Institute Of Technology Propellant tank and loading for electrospray thruster
US9669416B2 (en) 2013-05-28 2017-06-06 Massachusetts Institute Of Technology Electrospraying systems and associated methods
US10928736B2 (en) 2015-12-30 2021-02-23 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
US10712669B2 (en) 2015-12-30 2020-07-14 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
US10527946B2 (en) 2015-12-30 2020-01-07 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
US10141855B2 (en) 2017-04-12 2018-11-27 Accion Systems, Inc. System and method for power conversion
WO2020236961A1 (en) 2019-05-21 2020-11-26 Accion Systems, Inc. Apparatus for electrospray emission
EP4200218A4 (en) 2020-08-24 2024-08-07 Accion Systems, Inc. PROPELLER DEVICE
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
WO2025087536A1 (en) * 2023-10-26 2025-05-01 Respiro B.V. Gas analysis system

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
US6414438B1 (en) * 2000-07-04 2002-07-02 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
US6665051B2 (en) * 1998-02-27 2003-12-16 Nikon Corporation Illumination system and exposure apparatus and method
US6667484B2 (en) * 2000-07-03 2003-12-23 Asml Netherlands B.V. Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
US20040108473A1 (en) * 2000-06-09 2004-06-10 Melnychuk Stephan T. Extreme ultraviolet light source
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US20040256575A1 (en) * 1998-05-05 2004-12-23 Carl Zeiss Smt Ag Illumination system with a plurality of light sources
US20050140945A1 (en) * 2003-12-31 2005-06-30 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
US6194833B1 (en) * 1997-05-19 2001-02-27 The Board Of Trustees Of The University Of Illinois Microdischarge lamp and array
US6665051B2 (en) * 1998-02-27 2003-12-16 Nikon Corporation Illumination system and exposure apparatus and method
US20040256575A1 (en) * 1998-05-05 2004-12-23 Carl Zeiss Smt Ag Illumination system with a plurality of light sources
US20040108473A1 (en) * 2000-06-09 2004-06-10 Melnychuk Stephan T. Extreme ultraviolet light source
US6667484B2 (en) * 2000-07-03 2003-12-23 Asml Netherlands B.V. Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
US6414438B1 (en) * 2000-07-04 2002-07-02 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US20050140945A1 (en) * 2003-12-31 2005-06-30 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris

Also Published As

Publication number Publication date
WO2007002170A2 (en) 2007-01-04

Similar Documents

Publication Publication Date Title
WO2007002170A3 (en) Microdischarge light source configuration and illumination system
PL2136126T3 (en) Operating light
NZ591472A (en) Lighting apparatus with heat dissipating plate and frame with a lens spanning an aperture for emitted light
WO2010090832A3 (en) Ballast/line detection circuit for fluorescent replacement lamps
WO2006107877A3 (en) Vaginal speculum
ATE474718T1 (en) DIRECT ENGRAVING OF FLEXO PRINTING PLATES
WO2008082913A3 (en) Inspection apparatus having illumination assembly
WO2006099760A3 (en) Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source
WO2010029370A3 (en) X-ray tubes
WO2007142999A3 (en) Dual energy x-ray source
WO2006002146A3 (en) Plasma lamp with light-transmissive waveguide
DE50208838D1 (en) Phase-contrast electron microscope with annular illumination aperture
EP2103483A3 (en) Vehicular headlamp
EP1693879A3 (en) Scanning electron microscope
EP2378538A3 (en) Ring cathode for use in a magnetron sputtering device
WO2011005690A3 (en) Imaging assembly
EP1708231A3 (en) Discharge lamp
WO2008075952A3 (en) Reducing fast ions in a plasma radiation source having a second activation source
WO2009147657A3 (en) Lampshade
WO2007023429A3 (en) Lighting unit
CN203115768U (en) Gas discharge lamp tube for train
CN201866676U (en) LED (light emitting diode) lamp with inbuilt power supply
EP2575414A3 (en) A light detector to control a hybrid lamp
TW200630695A (en) Illumination module
CN202188314U (en) Medical Miniature Lighting Device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 06773666

Country of ref document: EP

Kind code of ref document: A2