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WO2006035360A3 - Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede - Google Patents

Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede Download PDF

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Publication number
WO2006035360A3
WO2006035360A3 PCT/IB2005/053090 IB2005053090W WO2006035360A3 WO 2006035360 A3 WO2006035360 A3 WO 2006035360A3 IB 2005053090 W IB2005053090 W IB 2005053090W WO 2006035360 A3 WO2006035360 A3 WO 2006035360A3
Authority
WO
WIPO (PCT)
Prior art keywords
protective coating
coating
filler component
forming
porous matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2005/053090
Other languages
English (en)
Other versions
WO2006035360A2 (fr
Inventor
Danielle Beelen
Jongh Petra E De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Priority to EP05798271A priority Critical patent/EP1797016A2/fr
Priority to JP2007534130A priority patent/JP2008514415A/ja
Publication of WO2006035360A2 publication Critical patent/WO2006035360A2/fr
Publication of WO2006035360A3 publication Critical patent/WO2006035360A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30—Technical effects
    • H01L2924/301—Electrical effects
    • H01L2924/3011—Impedance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

La présente invention concerne un procédé de formation d'un revêtement de protection sur un substrat électronique, tel qu'un CI. Le revêtement de protection présente une bonne résistance mécanique, chimique et physique et une opacité appropriée. Selon l'invention, une matrice poreuse (comprenant de préférence Ti02) est formée et remplie d'un élément de charge, tel que des particules de TiN, pouvant absorber ou diffuser la lumière. Après une étape de polymérisation, un élément précurseur de renfort est ajouté. Lors de la préparation du revêtement de protection, une quantité préétablie de l'élément de charge est utilisée pour obtenir au moins 40 % en volume de l'élément de charge présent dans le revêtement de protection finalement réalisé, sur la base de la matrice poreuse obtenue.
PCT/IB2005/053090 2004-09-30 2005-09-20 Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede Ceased WO2006035360A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP05798271A EP1797016A2 (fr) 2004-09-30 2005-09-20 Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede
JP2007534130A JP2008514415A (ja) 2004-09-30 2005-09-20 基材上にコーティングを形成する方法、及び、こうして形成されたコーティング

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04104791 2004-09-30
EP04104791.1 2004-09-30

Publications (2)

Publication Number Publication Date
WO2006035360A2 WO2006035360A2 (fr) 2006-04-06
WO2006035360A3 true WO2006035360A3 (fr) 2006-08-03

Family

ID=36119265

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2005/053090 Ceased WO2006035360A2 (fr) 2004-09-30 2005-09-20 Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede

Country Status (5)

Country Link
EP (1) EP1797016A2 (fr)
JP (1) JP2008514415A (fr)
CN (1) CN101031519A (fr)
TW (1) TW200626519A (fr)
WO (1) WO2006035360A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014529185A (ja) * 2011-08-02 2014-10-30 ダウ グローバル テクノロジーズ エルエルシー 湿気からの保護を得るために複雑な表面上にコンフォーマルに被覆された結晶特性を有する薄いバリア膜を用いた光電子デバイス
CN107188616B (zh) * 2017-05-23 2019-08-23 佛山欧神诺陶瓷有限公司 一种裂纹砖及其制备方法
CN112517352B (zh) * 2020-10-13 2022-07-22 江苏大学 一种纳米颗粒负载多孔超宽光谱吸收涂层及制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5665422A (en) * 1991-03-19 1997-09-09 Hitachi, Ltd. Process for formation of an ultra fine particle film
US5711987A (en) * 1996-10-04 1998-01-27 Dow Corning Corporation Electronic coatings
US6198155B1 (en) * 1998-06-10 2001-03-06 U.S. Philips Corporation Semiconductor device comprising an integrated circuit provided with a ceramic security coating and method of manufacturing such a device
WO2004031445A1 (fr) * 2002-10-03 2004-04-15 Alberta Research Council Inc. Revetement protecteur ceramique

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5665422A (en) * 1991-03-19 1997-09-09 Hitachi, Ltd. Process for formation of an ultra fine particle film
US5711987A (en) * 1996-10-04 1998-01-27 Dow Corning Corporation Electronic coatings
US6198155B1 (en) * 1998-06-10 2001-03-06 U.S. Philips Corporation Semiconductor device comprising an integrated circuit provided with a ceramic security coating and method of manufacturing such a device
WO2004031445A1 (fr) * 2002-10-03 2004-04-15 Alberta Research Council Inc. Revetement protecteur ceramique

Also Published As

Publication number Publication date
TW200626519A (en) 2006-08-01
CN101031519A (zh) 2007-09-05
EP1797016A2 (fr) 2007-06-20
JP2008514415A (ja) 2008-05-08
WO2006035360A2 (fr) 2006-04-06

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