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WO2006098121A1 - Organic semiconductor material, organic semiconductor film, organic semiconductor device, organic thin-film transistor, and method for manufacturing organic thin-film transistor - Google Patents

Organic semiconductor material, organic semiconductor film, organic semiconductor device, organic thin-film transistor, and method for manufacturing organic thin-film transistor Download PDF

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Publication number
WO2006098121A1
WO2006098121A1 PCT/JP2006/303111 JP2006303111W WO2006098121A1 WO 2006098121 A1 WO2006098121 A1 WO 2006098121A1 JP 2006303111 W JP2006303111 W JP 2006303111W WO 2006098121 A1 WO2006098121 A1 WO 2006098121A1
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group
organic semiconductor
ring
general formula
semiconductor material
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French (fr)
Japanese (ja)
Inventor
Rie Katakura
Tatsuo Tanaka
Katsura Hirai
Hiroshi Kita
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Konica Minolta Inc
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Konica Minolta Inc
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/464Lateral top-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/466Lateral bottom-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/615Polycyclic condensed aromatic hydrocarbons, e.g. anthracene

Definitions

  • Organic semiconductor material organic semiconductor film, organic semiconductor device, organic thin film transistor, and method for forming organic thin film transistor
  • the present invention relates to an organic semiconductor material, an organic semiconductor film, an organic semiconductor device, an organic thin film transistor, and a method for forming an organic thin film transistor.
  • a display medium is formed by using elements utilizing liquid crystal, organic EL (organic electoluminescence), electrophoresis, or the like.
  • a technology using an active drive element (TFT element) as an image drive element has become mainstream to ensure uniformity of screen brightness, screen rewriting speed, and the like!
  • TFT element active drive element
  • these TFT elements are formed on a glass substrate, and liquid crystal, organic EL elements, etc. are sealed.
  • TFT elements such as a—Si (amorphous silicon) and p—Si (polysilicon) can be mainly used for TFT elements, and these S ⁇ conductors (and metal films as required).
  • the TFT element is manufactured by forming a multi-layered structure and sequentially forming source, drain, and gate electrodes on the substrate. The production of such TFT elements usually requires sputtering and other vacuum-based manufacturing processes.
  • the substrate material is limited to a material that can withstand the process temperature. Become. For this reason, in practice, glass must be used, and when the above-mentioned electronic paper or digital paper! /, And a thin display using such a conventionally known TFT element are used, the display Will be heavy and inflexible, and may be broken by the impact of a drop.
  • organic semiconductor materials have been energetically advanced in recent years as an organic compound having a high charge transporting property. These compounds are reported in numerous papers such as organic laser oscillators as discussed in Non-Patent Document 1, etc., as well as, for example, Non-Patent Document 2, in addition to charge transport materials for organic EL devices. Applications to organic thin film transistor devices (organic TFT devices) are expected! If these organic semiconductor devices can be realized, it is possible to obtain a semiconductor that can be made into a solution by making the manufacturing process relatively low, vacuuming at a temperature, simplifying the manufacturing process by low-pressure deposition, and further improving the molecular structure appropriately. Production by printing methods including inkjet method by converting organic semiconductor solution into ink is also considered.
  • a TFT element may be formed on the transparent resin substrate. If a TFT element is formed on a transparent resin substrate and the display material can be driven by the TFT element, the display will be lighter and more flexible than conventional ones, and will not crack even if dropped (or (It is difficult to break)).
  • the acenes such as pentacene and tetracene have been studied so far (for example, see Patent Document 1), and phthalocyanines including lead phthalocyanine.
  • Low molecular weight compounds such as perylene and its tetracarboxylic acid derivatives (see, for example, Patent Document 2), and aromatic oligomers represented by a thiophene hexamer called a chenille or sexithiophene (for example, Patent Document 3).
  • aromatic oligomers represented by a thiophene hexamer called a chenille or sexithiophene for example, Patent Document 3
  • Naphthalene, anthracene and symmetrical compounds of 5-membered aromatic heterocycles for example, see Patent Document 4
  • modified oligos and polydithienopyridines for example, see Patent Document 5
  • polythiophene Conjugated polymers such as poly-ethylene biylene and poly-p-phenylene biylene, etc.
  • Patent Document 1 Japanese Patent Laid-Open No. 5-55568
  • Patent Document 2 JP-A-5-190877
  • Patent Document 3 JP-A-8-264805
  • Patent Document 4 JP-A-11-195790
  • Patent Document 5 Japanese Patent Laid-Open No. 2003-155289
  • Patent Document 6 Japanese Patent Laid-Open No. 2003-261655
  • Patent Document 7 Japanese Unexamined Patent Publication No. 2003-264327
  • Patent Document 8 Japanese Unexamined Patent Application Publication No. 2003-268083
  • Non-Patent Document 1 Science 289 ⁇ , 599 pages (2000)
  • Non-Patent Document 2 “Nature” 403ature, 521 pages (2000)
  • Non-Patent Document 3 "Advanced Material", 2002, No. 2, page 99
  • An object of the present invention is an organic semiconductor material that is manufactured by a simple process, has good characteristics as a transistor, and further suppresses deterioration over time, an organic semiconductor film using the organic semiconductor material, an organic semiconductor device, An organic thin film transistor and a method for forming the organic thin film transistor are provided.
  • An organic semiconductor material comprising a compound represented by the following general formula (1):
  • Ar and Ar represent a hydrogen atom or a substituent, and at least one of Ar and Ar is
  • Ar and Ar are aromatic condensed with an aromatic hydrocarbon ring or aromatic heterocycle
  • organic semiconductor material as described in 1 above, which is a hydrocarbon condensed ring or an aromatic hetero condensed ring. 3.
  • An organic semiconductor material comprising a compound represented by the following general formula (2):
  • Ar and Ar represent a hydrogen atom or a substituent, and at least one of Ar and Ar
  • 21 represents a linking group bonded with a conjugated system containing an aromatic hydrocarbon ring or an aromatic heterocycle.
  • the organic semiconductor material as described in 3 above which is a hydrocarbon condensed ring or an aromatic hetero condensed ring.
  • Ar to Ar are aromatic hydrocarbon rings or aromatic heterocyclic rings, and R is a substituent.
  • R and R represent a hydrogen atom or a substituent.
  • organic semiconductor material according to any one of 1 to 5, wherein the organic semiconductor material has a partial structure in which two or more substituted thiophene rings are connected.
  • the compound power represented by the general formula (1) or (2) has a partial structure represented by the following general formula (4), according to any one of the above 1 to 5, Organic semiconductor materials.
  • R represents a substituent
  • An organic semiconductor film comprising the organic semiconductor material according to any one of 1 to 11 above.
  • An organic thin film transistor wherein the organic semiconductor material according to any one of 1 to 11 is used for a semiconductor layer.
  • an organic semiconductor material that is manufactured by a simple process, has good characteristics as a transistor, and further suppresses deterioration over time, an organic semiconductor film using the organic semiconductor material, an organic semiconductor device, An organic thin film transistor and a method for forming the organic thin film transistor can be provided.
  • Fig. 1 is a diagram showing a structural example of an organic thin film transistor of the present invention.
  • FIG. 2 is an example of a schematic equivalent circuit diagram of the organic thin film transistor sheet of the present invention.
  • an organic semiconductor material useful for a thin film transistor can be obtained by using the structure defined in any one of claims 1 to: L1. .
  • the organic semiconductor of the present invention produced using the organic semiconductor material is also provided.
  • Body films, organic semiconductor devices, and organic thin film transistors (hereinafter also referred to as organic TFTs) have excellent transistor characteristics such as high carrier mobility and high durability, and high durability. However, it was divided.
  • pentacene is a well-known force-insoluble material, and conventionally, a force film cannot be formed by evaporation, and it is difficult to produce a coating film.
  • a thiophene oligomer without a substituent such as unsubstituted 6T can easily form a ⁇ stack between molecules, but it is insoluble like pentacene and cannot form a force film by vapor deposition. It was.
  • the activity at the 4-position of terminal thiophene is high, there was a problem in the temporal stability of the material and the coating film.
  • a thiophene polymer such as ⁇ that has been proposed as a material that can be applied has been proposed.
  • a polymer with a molecular weight distribution is not sufficient to form a ⁇ stack, and the molecular arrangement is disordered. We were able to achieve satisfactory TFT performance with many parts.
  • the organic semiconductor material of the present invention is characterized by containing a compound represented by the above general formula (1) or (2). [0030] The compound represented by the general formula (1) according to the present invention will be described.
  • Ar and Ar represent a hydrogen atom or a substituent
  • At least one represents an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring in which an aromatic hydrocarbon ring or an aromatic heterocyclic ring is condensed.
  • Ar and Ar are aromatic charcoal
  • It is preferably an aromatic hydrocarbon condensed ring or an aromatic complex condensed ring in which a hydrogenated ring or an aromatic heterocyclic ring is condensed.
  • aromatic hydrocarbon condensed ring or aromatic heterocondensed ring condensed with an aromatic hydrocarbon ring or aromatic heterocycle means an aromatic hydrocarbon condensed composed only of an aromatic hydrocarbon ring. It means an aromatic heterocondensed ring composed only of a ring, an aromatic heterocycle, or an aromatic heterocondensed ring composed of an aromatic hydrocarbon ring and an aromatic heterocondensed ring.
  • the aromatic heterofused ring preferably contains at least one heteroatom selected from N, O and S. Furthermore, these condensed rings may optionally have a substituent.
  • the condensed aromatic hydrocarbon condensed ring and aromatic heterocyclic condensed ring are preferably composed of a 5-membered ring or a 6-membered ring.
  • the atom next to the atom involved in the bond to L is bonded to an atom other than hydrogen, and is bonded to other than the atoms constituting the ring Preferably not.
  • the aromatic hydrocarbon condensed ring condensed with an aromatic hydrocarbon ring is an acene (acene is a compound in which a plurality of benzene rings are condensed, such as naphthalene, anthracene, tetracene, pentacene, Hexacene, phenanthrene, pyrene, etc.), azulene ring, taricene ring, naphthacene ring, acenaphthene ring, coronene ring, fluorene ring, fluoranthrene ring, naphthacene ring, perylene ring, pentaphen ring, picene ring, pyrene ring, pyranthrene Ring, anthraanthrene ring and the like.
  • acene is a compound in which a plurality of benzene rings are condensed, such as naphthalene, anthracene,
  • the aromatic heterocondensed ring in which the aromatic heterocycle is condensed, or the aromatic hydrocarbon ring and the aromatic heterocycle are condensed includes benzimidazole ring, indole ring, benzimidazo Ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline ring, phthalazine ring, force rubazole ring, carboline ring, diaza force rubazole ring (one of the carbon atoms of the hydrocarbon ring constituting the carboline ring) And a ring substituted with a nitrogen atom).
  • aromatic hydrocarbon condensed ring or aromatic heterocyclic ring condensed with the above aromatic hydrocarbon ring or aromatic heterocyclic ring may be unsubstituted or may have a substituent.
  • an alkyl group for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, etc.
  • cycloalkyl Groups for example, cyclopentyl group, cyclohexyl group, etc.
  • alkenyl groups for example, vinyl group, allyl group, etc.
  • alkyl groups for example, ethynyl group, propargyl group, etc.
  • aryl groups for example, phenyl) Group, naphthyl group, etc.
  • aminoamino groups methylaminocarboxylic groups, dimethylaminocarboxylic groups, propylaminocarboxylic groups, pentylaminocarboxylic groups, cyclohexylaminocarboxylic groups) Group, octylaminocarbol group, 2-ethylhexylaminocarbol group, dodecylaminocarbole group, phenolaminocarbol group, naphthylaminocarbol group, 2-pyridylaminocarbol group Etc.), ureido group (for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octyl) Ureido group, dodecylureido group, phenol-ureido group naphthylureido group, 2-pyridylaminoureido group, etc.),
  • substituents may be further substituted with the above-described substituents.
  • a plurality of these substituents may be bonded to each other to form a ring.
  • L represents a linking group bonded with a conjugated system including an aromatic hydrocarbon ring or an aromatic heterocyclic ring.
  • Examples of the aromatic hydrocarbon ring include a benzene ring, a biphenyl ring, a naphthalene ring, an azulene ring, an anthracene ring, a phenanthrene ring, a pyrene ring, a thalylene ring, a naphthacene ring, a triphenylene ring, and o-terfene ring.
  • Examples of the aromatic heterocycle include furan ring, thiophene ring, pyridine ring, pyridazine ring, pyrimidin ring, pyrazine ring, triazine ring, benzimidazole ring, oxadiazole ring, triazole ring, imidazole ring, pyrazole ring, Carbon atom of the hydrocarbon ring constituting the thiazole ring, indole ring, benzimidazole ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline ring, phthalazine ring, force rubazole ring, carboline ring, carboline ring Examples include a ring in which at least one is further substituted with a nitrogen atom.
  • the organic semiconductor material of the present invention is characterized by containing a compound represented by the above general formula (1) or (2). [0041] The compound represented by the general formula (2) according to the present invention will be described.
  • Ar and Ar represent a hydrogen atom or a substituent
  • Ar and Ar represent a hydrogen atom or a substituent
  • At least one of 21 22 21 22 is an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring condensed with an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and R
  • L 22 represents a hydrogen atom or a substituent, and L is bonded with a conjugated system including an aromatic hydrocarbon ring or an aromatic heterocyclic ring.
  • the hydrogen fluoride condensed ring or the aromatic hetero condensed ring is represented by Ar or Ar in the general formula (1).
  • aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring condensed with an aromatic hydrocarbon ring or an aromatic heterocyclic ring.
  • R and R is an aromatic group in which two or more rings of the general formula (1) are condensed.
  • the linking group is synonymous with the linking group L bonded through a synergistic system containing the aromatic hydrocarbon ring or aromatic heterocycle of the general formula (1).
  • It is preferably a condensed aromatic hydrocarbon ring or an aromatic heterocyclic ring in which two or more rings are condensed.
  • the weight molecular weight of the compound represented by the general formula (1) or (2) is preferably 10,000 or less, and more preferably in the range of 100 to 5,000. By limiting the molecular weight to this range, the stackability and orientation between molecules can be improved, a film in which molecules are regularly arranged can be produced, and the TFT performance can be improved.
  • the weight average molecular weight or number average molecular weight of the organic semiconductor material of the present invention is measured using GPC (gel permeation chromatography) using tetrahydrofuran as a column solvent.
  • the compound represented by the general formula (1) or (2) preferably has a partial structure represented by the general formula (3).
  • Ar to Ar are an aromatic hydrocarbon ring or an aromatic heterocyclic ring.
  • R is a substituent
  • R 1 and R 2 represent a hydrogen atom or a substituent
  • aromatic hydrocarbon condensed ring or the aromatic heterocyclic condensed ring represented by Ar to Ar is the above-mentioned
  • the substituent represented by R 1, R 2 and R 3 is synonymous with the aromatic hydrocarbon ring or aromatic heterocycle described for the linking group L in the general formula (1), and the substituent represented by R 1, R 2 and R 3 is the aromatic carbon ring of the general formula (1).
  • L in the general formula (1) or L in the general formula (2) is substituted or unsubstituted.
  • L or L is a partial structure in which two or more substituted or unsubstituted thiophene rings are linked.
  • the number of thiophene rings contained in L or L is 2 to 40.
  • the compound represented by the general formula (1) or (2) preferably has a partial structure represented by the general formula (4).
  • the L or L force has a partial structure represented by the general formula (4).
  • R represents a substituent.
  • substituents include an alkyl group (for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group).
  • cycloalkyl group eg, cyclopentyl group, cyclohexyl group, etc.
  • alkenyl group eg, vinyl group, aryl group, etc.
  • alkynyl group eg, ethynyl group, propargyl group, etc.
  • aryl Group e.g., phenyl group, p-chlorophenyl group, mesityl group, tolyl group, xylyl group, naphthyl group, anthryl group, azulenyl group, acenaphthyl group, fluoride group, phenanthryl group, indur group, pyrethyl group) Group, bif ⁇ -ryl group, etc.
  • aromatic heterocycle eg furyl group, chenyl group, pyridyl group, pyridazyl group, Mijiru group, Birajiru group, triazyl group, an imidazo
  • substituents may be further substituted with the above-described substituents, or a plurality thereof may be bonded to each other to form a ring.
  • the thiophene oligomer according to the present invention preferably has no head-to-head structure in the structure, more preferably a head-to-tail structure or a Tai 1 to-tail structure. It is to have.
  • head-to-head structure, head-to-tail structure, and tail-to-tail structure according to the present invention for example, “ ⁇ -electron organic solids” (1998, published by the Japan Society of Chemistry) 27-32 pages, Adv. Mater. 1998, 10, No. 2, pages 93-116, etc.
  • specific examples of the compound represented by the general formula (1) or (2) according to the present invention will be shown, but the present invention is not limited thereto.
  • Compound 12 was synthesized according to the following scheme.
  • an organic semiconductor device By using the organic semiconductor material of the present invention for the semiconductor layer of an organic semiconductor film, an organic semiconductor device, or an organic thin film transistor, an organic semiconductor device and an organic thin film transistor that are driven well can be provided.
  • An organic thin film transistor has a source electrode and a drain electrode connected with an organic semiconductor as a semiconductor layer on a support, a top gate type having a gate electrode on the gate electrode via a gate insulating layer, and a support. First, it is roughly divided into a bottom gate type having a gate electrode and having a source electrode and a drain electrode connected by an organic semiconductor through a gate insulating layer.
  • an organic semiconductor device In order to install the organic semiconductor material of the present invention on a semiconductor layer of an organic semiconductor film, an organic semiconductor device, or an organic thin film transistor, it can be installed on a substrate by vacuum deposition.
  • the solution prepared by dissolving in an appropriate solvent and adding additives as necessary is preferably placed on the substrate by cast coating, spin coating, printing, ink jet method, abrasion method or the like.
  • the solvent for dissolving the organic semiconductor material of the present invention is not particularly limited as long as it can prepare a solution having an appropriate concentration by dissolving the organic semiconductor material.
  • Chain ether solvents such as ethyl ether diisopropyl ether, cyclic ether solvents such as tetrahydrofuran and dioxane, keton solvents such as acetone methylethyl ketone, halogenated forms such as chloroform and 1,2-dichloroethane.
  • Examples include alkyl solvents, toluene, aromatic solvents such as o-dichlorobenzene, nitrobenzene, and m-talezole, N-methylpyrrolidone, and carbon dioxide.
  • a solvent containing a non-halogen solvent is preferably a non-halogen solvent.
  • the organic semiconductor material of the present invention is preferably used for the semiconductor layer as described above.
  • the semiconductor layer is preferably formed by applying a solution or dispersion containing these organic semiconductor materials.
  • the solvent that dissolves the organic semiconductor material is preferably composed of a non-halogen solvent that is preferably a solvent containing the non-halogen solvent.
  • the material for forming the source electrode, the drain electrode, and the gate electrode is not particularly limited as long as it is a conductive material.
  • conductive polymers which conductivity has been improved by doping, for example, conductive polyarlin, conductive polypyrrole, conductive polythiophene, polyethylene dioxythiophene and polystyrene sulfonic acid complex, etc. are also suitably used. . Of these, those having low electrical resistance on the contact surface with the semiconductor layer are preferred.
  • a method for forming the electrode a method such as vapor deposition or sputtering using the above as a raw material is used.
  • a method of forming an electrode by using a known photolithographic method and a lift-off method, and a method of etching a metal foil such as aluminum or copper using a resist by thermal transfer, ink jet or the like.
  • the conductive polymer solution or dispersion, or the conductive fine particle dispersion may be directly patterned by inkjet, or may be formed from the coating film by lithography, laser abrasion, or the like.
  • a method of patterning an ink containing a conductive polymer or conductive fine particles, a conductive paste, or the like by a printing method such as relief printing, intaglio printing, planographic printing, or screen printing can also be used.
  • an inorganic oxide film having a high relative dielectric constant is preferable.
  • inorganic oxides include silicon oxide, aluminum oxide, tantalum oxide, titanium oxide, tin oxide, vanadium oxide, barium strontium titanate, barium zirconate titanate, lead zirconate titanate, titanate Examples include lead lanthanum, strontium titanate, barium titanate, barium magnesium fluoride, bismuth titanate, strontium bismuth titanate, strontium bismuth tantanoate, bismuth tantalate niobate, and trioxide yttrium.
  • silicon oxide, acid aluminum, acid tantalum, and acid titanium Inorganic nitrides such as silicon nitride and aluminum nitride can also be suitably used.
  • Examples of the method for forming the coating include vacuum deposition, molecular beam epitaxy, ion cluster beam, low energy ion beam, ion plating, CVD, sputtering, and atmospheric pressure plasma. Dry process, spray coating method, spin coating method, blade coating method, dip coating method, casting method, roll coating method, bar coating method, die coating method, and other methods by patterning such as printing and inkjet Etc., and can be used depending on the material.
  • the wet process includes a method of applying and drying a liquid in which fine particles of inorganic oxide are dispersed in an arbitrary organic solvent or water using a dispersion aid such as a surfactant as necessary, or an oxide precursor.
  • a so-called sol-gel method in which a solution of a body, for example, an alkoxide body is applied and dried is used.
  • the atmospheric pressure plasma method and the sol-gel method are preferable.
  • a method for forming an insulating film by plasma film formation under atmospheric pressure is a process in which discharge is performed under atmospheric pressure or a pressure near atmospheric pressure, and a reactive gas is plasma-excited to form a thin film on a substrate.
  • the method is described in JP-A-11-61406, JP-A-11-133205, JP-A-2000-121804, JP-A-2000-147209, JP-A-2000-185362, etc. Also referred to as atmospheric pressure plasma method).
  • a highly functional thin film can be formed with high productivity.
  • organic compound film polyimide, polyamide, polyester, polyacrylate, photo-radical polymerization system, photopower thione polymerization system photocurable resin, or copolymer containing acrylonitrile component, polybutanol, Polybulal alcohol, novolak rosin, and cyanoethyl pullulan can also be used.
  • the wet process is preferred as a method for forming the organic compound film.
  • An inorganic oxide film and an organic oxide film can be laminated and used together.
  • the film thickness of these insulating films is generally 5011111 to 3111, preferably 100 nm to l ⁇ m.
  • the support is composed of glass or a flexible resin sheet.
  • a plastic film can be used as the sheet.
  • the plastic film include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polyetherimide, polyetheretherketone, polyethylene-sulfuride, polyarylate, polyimide, polycarbonate ( PC), cellulose triacetate (TAC), and cellulose acetate propionate (CAP).
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PES polyethersulfone
  • polyetherimide polyetheretherketone
  • polyethylene-sulfuride polyarylate
  • PC polycarbonate
  • TAC cellulose triacetate
  • CAP cellulose acetate propionate
  • FIG. 1 is a diagram showing a configuration example of an organic thin film transistor of the present invention.
  • a source electrode 2 and a drain electrode 3 are formed on a support 6 with a metal foil or the like, an organic semiconductor layer 1 made of the organic semiconductor material of the present invention is formed between the two electrodes, and the organic semiconductor layer 1 is formed thereon.
  • An insulating layer 5 is formed, and further a gate electrode 4 is formed thereon to form an organic thin film transistor.
  • FIG. 2B shows the organic semiconductor layer 1 formed between the electrodes in FIG. 1A so as to cover the entire surface of the electrode and the support using a coating method or the like.
  • C First on the support 6 The organic semiconductor layer 1 is formed using a coating method or the like, and then the source electrode 2, the drain electrode 3, the insulating layer 5, and the gate electrode 4 are formed.
  • FIG. 4 (d) after forming the gate electrode 4 on the support 6 with a metal foil or the like, the insulating layer 5 is formed thereon, and the source electrode 2 and the drain electrode 3 are formed on the metal foil or the like. Then, an organic semiconductor layer 1 formed of the organic semiconductor material of the present invention is formed between the electrodes.
  • Other configurations such as shown in (e) and (f) of FIG.
  • FIG. 2 is a diagram showing an example of a schematic equivalent circuit diagram of an organic thin film transistor sheet.
  • the organic thin film transistor sheet 10 has a large number of organic thin film transistors 11 arranged in a matrix. 7 is a gate bus line of each organic thin film transistor 11, and 8 is a source bus line of each organic thin film transistor 11.
  • An output element 12 is connected to the source electrode of each organic thin film transistor 11, and this output 12 is, for example, a liquid crystal, an electrophoretic element or the like, and constitutes a pixel in the display device.
  • the pixel electrode may be used as the input electrode of the photosensor.
  • the liquid crystal is shown as an output element in an equivalent circuit having resistance and capacitor power.
  • 13 is a storage capacitor
  • 14 is a vertical drive circuit
  • 15 is a horizontal drive circuit.
  • a 200-nm-thick thermal oxide film was formed on a Si wafer with a specific resistance of 0.01 ⁇ 'cm as the gate electrode to form a gate insulating layer, followed by surface treatment with octadecyltrichlorosilane.
  • a coated film of comparative compound 1 (poly (3-hexylthiophene), regioregular, Aldrich, average molecular weight 89000, PHT) was applied using an applicator and allowed to dry naturally to form a cast film ( And a heat treatment was performed at 50 ° C. for 30 minutes in a nitrogen atmosphere.
  • Source and drain electrodes are 100 m wide, 200 nm thick, and channel width W
  • An organic thin film transistor 1 having a thickness of 3 mm and a channel length L of 20 ⁇ m was fabricated.
  • the organic thin film transistors 2 and 3 were respectively prepared in the same manner except that the comparative compound 1 was changed to comparative compounds 2 and 3 (Pentacene, Aldrich commercial reagent was used after sublimation purification). Was made.
  • Organic thin film transistors 4 to 9 were produced in the same manner as in the production of the organic thin film transistor 1, except that the organic semiconductor material of the present invention described in Table 1 was used instead of the comparative compound 1. All of the molecular weights of the organic semiconductor materials of the present invention were 10,000 or less.
  • the carrier mobility and ON / OFF value of each element were determined immediately after fabrication and after being left in the atmosphere for 1 month.
  • the saturation region force carrier mobility of the IV characteristic is obtained, and further, the ONZOFF ratio is obtained from the ratio of the drain current value when the drain bias is 50 V and the gate bias is 50 V and 0 V.

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  • Thin Film Transistor (AREA)

Abstract

Disclosed is an organic semiconductor material which can be produced by a simple process while having good characteristics as a transistor. This organic semiconductor material is suppressed in deterioration over time. Also disclosed are an organic semiconductor film using such an organic semiconductor material, an organic semiconductor device, an organic thin-film transistor and a method for manufacturing an organic thin-film transistor. Specifically disclosed is an organic semiconductor material characterized by containing a compound represented by the following general formula (1). General formula (1) Ar1-L-Ar2 (In the formula, Ar1 and Ar2 respectively represent a hydrogen atom or a substituent, and at least one of Ar1 and Ar2 is an aromatic hydrocarbon fused ring or an aromatic heterocyclic fused ring wherein aromatic hydrocarbon rings or aromatic heterocyclic rings are fused; and L represents a linked group connected by a conjugated system containing an aromatic hydrocarbon ring or an aromatic heterocyclic ring.

Description

明 細 書  Specification

有機半導体材料、有機半導体膜、有機半導体デバイス、有機薄膜トラン ジスタ及び有機薄膜トランジスタの形成方法  Organic semiconductor material, organic semiconductor film, organic semiconductor device, organic thin film transistor, and method for forming organic thin film transistor

技術分野  Technical field

[0001] 本発明は、有機半導体材料、有機半導体膜、有機半導体デバイス、有機薄膜トラン ジスタ及び有機薄膜トランジスタの形成方法に関する。  The present invention relates to an organic semiconductor material, an organic semiconductor film, an organic semiconductor device, an organic thin film transistor, and a method for forming an organic thin film transistor.

背景技術  Background art

[0002] 情報端末の普及に伴い、コンピュータ用のディスプレイとしてフラットパネルディスプ レイに対するニーズが高まっている。また、さらに情報化の進展に伴い、従来、紙媒 体で提供されていた情報が電子化される機会が増え、薄くて軽い、手軽に持ち運び が可能なモパイル用表示媒体として、電子ペーパーある 、はデジタルペーパーへの ニーズも高まりつつある。  With the widespread use of information terminals, there is an increasing need for flat panel displays as computer displays. In addition, with the progress of computerization, the information provided by paper media has been increasingly digitized, and electronic paper is a display medium for mopile that is thin, light, and easy to carry. There is a growing need for digital paper.

[0003] 一般に平板型のディスプレイ装置にぉ 、ては、液晶、有機 EL (有機エレクト口ルミ ネッセンス)、電気泳動等を利用した素子を用いて表示媒体を形成している。また、こ うした表示媒体では画面輝度の均一性や画面書き換え速度等を確保するために、 画像駆動素子としてアクティブ駆動素子 (TFT素子)を用いる技術が主流になって!/ヽ る。例えば、通常のコンピュータディスプレイではガラス基板上にこれら TFT素子を形 成し、液晶、有機 EL素子等が封止されている。  [0003] Generally, in a flat display device, a display medium is formed by using elements utilizing liquid crystal, organic EL (organic electoluminescence), electrophoresis, or the like. In such display media, a technology using an active drive element (TFT element) as an image drive element has become mainstream to ensure uniformity of screen brightness, screen rewriting speed, and the like! For example, in an ordinary computer display, these TFT elements are formed on a glass substrate, and liquid crystal, organic EL elements, etc. are sealed.

[0004] ここで TFT素子には主に a— Si (アモルファスシリコン)、 p— Si (ポリシリコン)等の半 導体を用いることができ、これらの S泮導体 (必要に応じて金属膜も)を多層化し、ソ ース、ドレイン、ゲート電極を基板上に順次形成していくことで TFT素子が製造される 。こうした TFT素子の製造には通常、スパッタリング、その他の真空系の製造プロセス が必要とされる。  Here, semiconductors such as a—Si (amorphous silicon) and p—Si (polysilicon) can be mainly used for TFT elements, and these S 泮 conductors (and metal films as required). The TFT element is manufactured by forming a multi-layered structure and sequentially forming source, drain, and gate electrodes on the substrate. The production of such TFT elements usually requires sputtering and other vacuum-based manufacturing processes.

[0005] し力しながら、このような TFT素子の製造では、真空チャンバ一を含む真空系の製 造プロセスを何度も繰り返して各層を形成せざるを得ず、装置コスト、ランニングコスト が非常に膨大なものとなっていた。例えば、 TFT素子では、通常それぞれの層の形 成のために真空蒸着、ドープ、フォトリソグラフ、現像等の工程を何度も繰り返す必要 があり、何十もの工程を経て素子を基板上に形成している。スイッチング動作の要と なる半導体部分に関しても、 p型、 n型等、複数種類の半導体層を積層している。こう した従来の Si半導体による製造方法ではディスプレイ画面の大型化のニーズに対し 、真空チャンバ一等の製造装置の大幅な設計変更が必要とされる等、設備の変更が 容易ではない。 [0005] However, in the manufacture of such a TFT element, the vacuum system manufacturing process including the vacuum chamber must be repeated many times to form each layer, resulting in extremely high equipment costs and running costs. It was huge. For example, in TFT devices, it is usually necessary to repeat the steps of vacuum deposition, dope, photolithography, development, etc. many times to form each layer. The device is formed on the substrate through several tens of steps. For the semiconductor portion that is the key to the switching operation, multiple types of semiconductor layers such as p-type and n-type are stacked. In such a conventional manufacturing method using Si semiconductors, it is not easy to change the equipment, for example, a design change of a manufacturing apparatus such as a vacuum chamber is required in response to the need for a large display screen.

[0006] また、このような従来からの Si材料を用いた TFT素子の形成には高い温度の工程 が含まれるため、基板材料には工程温度に耐える材料であると ヽぅ制限が加わること になる。このため実際上はガラスを用いざるをえず、先に述べた電子ペーパーあるい はデジタルペーパーと!/、つた薄型ディスプレイを、こうした従来知られた TFT素子を 利用して構成した場合、そのディスプレイは重ぐ柔軟性に欠け、落下の衝撃で割れ る可能性のある製品となってしまう。ガラス基板上に TFT素子を形成することに起因 するこれらの特徴は、情報化の進展に伴う手軽な携行用薄型ディスプレイへの-一 ズを満たすにあたり望ましくな 、ものである。  [0006] In addition, since the formation of a TFT element using such a conventional Si material includes a process at a high temperature, the substrate material is limited to a material that can withstand the process temperature. Become. For this reason, in practice, glass must be used, and when the above-mentioned electronic paper or digital paper! /, And a thin display using such a conventionally known TFT element are used, the display Will be heavy and inflexible, and may be broken by the impact of a drop. These characteristics resulting from the formation of TFT elements on a glass substrate are desirable in satisfying the demand for easy-to-use thin displays for portable use as information technology advances.

[0007] 一方、近年にぉ ヽて高 ヽ電荷輸送性を有する有機化合物として、有機半導体材料 の研究が精力的に進められて 、る。これらの化合物は有機 EL素子用の電荷輸送性 材料のほか、例えば非特許文献 1等において論じられているような有機レーザー発 振素子や、例えば非特許文献 2等、多数の論文にて報告されている有機薄膜トラン ジスタ素子 (有機 TFT素子)への応用が期待されて!ヽる。これら有機半導体デバイス を実現できれば、比較的低 、温度での真空な 、し低圧蒸着による製造プロセスの簡 易化や、さらにはその分子構造を適切に改良することによって、溶液化できる半導体 を得る可能性があると考えられ、有機半導体溶液をインク化することによりインクジェ ット方式を含む印刷法による製造も考えられる。これらの低温プロセスによる製造は、 従来の Si系半導体材料については不可能と考えられてきたが、有機半導体を用い たデバイスにはその可能性があり、従って前述の基板耐熱性に関する制限が緩和さ れ、透明榭脂基板上にも例えば TFT素子を形成できる可能性がある。透明榭脂基 板上に TFT素子を形成し、その TFT素子により表示材料を駆動させることができれ ば、ディスプレイを従来のものよりも軽ぐ柔軟性に富み、落としても割れない (もしくは 非常に割れにくい)ディスプレイとすることができるであろう。 [0008] し力しながら、こうした TFT素子を実現するための有機半導体としてこれまでに検討 されてきたのは、ペンタセンゃテトラセンといったァセン類 (例えば、特許文献 1参照) 、鉛フタロシアニンを含むフタロシアニン類、ペリレンやそのテトラカルボン酸誘導体と いった低分子化合物(例えば、特許文献 2参照)や、 a チェニールもしくはセクシ チォフェンと呼ばれるチォフェン 6量体を代表例とする芳香族オリゴマー(例えば、特 許文献 3参照)、ナフタレン、アントラセンに 5員の芳香族複素環が対称に縮合したィ匕 合物(例えば、特許文献 4参照)、モ入オリゴ及びポリジチエノピリジン (例えば、特許 文献 5参照)、さらにはポリチォフェン、ポリチェ-レンビ-レン、ポリ p—フエ-レン ビ-レンといった共役高分子等限られた種類の化合物 (例えば、非特許文献 1〜3参 照)でしかなぐ高 ヽキャリア移動度を示す新規な電荷輸送性材料を用いた半導体 性組成物の開発が待望されていた。 [0007] On the other hand, research on organic semiconductor materials has been energetically advanced in recent years as an organic compound having a high charge transporting property. These compounds are reported in numerous papers such as organic laser oscillators as discussed in Non-Patent Document 1, etc., as well as, for example, Non-Patent Document 2, in addition to charge transport materials for organic EL devices. Applications to organic thin film transistor devices (organic TFT devices) are expected! If these organic semiconductor devices can be realized, it is possible to obtain a semiconductor that can be made into a solution by making the manufacturing process relatively low, vacuuming at a temperature, simplifying the manufacturing process by low-pressure deposition, and further improving the molecular structure appropriately. Production by printing methods including inkjet method by converting organic semiconductor solution into ink is also considered. Manufacturing using these low-temperature processes has been considered impossible for conventional Si-based semiconductor materials, but there are possibilities for devices using organic semiconductors, and therefore the above-mentioned restrictions on substrate heat resistance are relaxed. For example, a TFT element may be formed on the transparent resin substrate. If a TFT element is formed on a transparent resin substrate and the display material can be driven by the TFT element, the display will be lighter and more flexible than conventional ones, and will not crack even if dropped (or (It is difficult to break)). [0008] However, as an organic semiconductor for realizing such a TFT element, the acenes such as pentacene and tetracene have been studied so far (for example, see Patent Document 1), and phthalocyanines including lead phthalocyanine. Low molecular weight compounds such as perylene and its tetracarboxylic acid derivatives (see, for example, Patent Document 2), and aromatic oligomers represented by a thiophene hexamer called a chenille or sexithiophene (for example, Patent Document 3). ), Naphthalene, anthracene and symmetrical compounds of 5-membered aromatic heterocycles (for example, see Patent Document 4), modified oligos and polydithienopyridines (for example, see Patent Document 5), and polythiophene Conjugated polymers such as poly-ethylene biylene and poly-p-phenylene biylene, etc. The development of a semiconducting composition using a novel charge transporting material exhibiting a high carrier mobility that can only be achieved with a compound (for example, see Non-Patent Documents 1 to 3 ) has been awaited.

[0009] また、特開 2003— 292588号公報、米国特許出願公開第 2003/136958号明 細書、同 2003Z160230号明細書、同 2003,164495号明細書では「マイクロエ レクト口-タス用の集積回路論理素子にポリマー TFTを用いると、その機械的耐久性 が大きく向上し、その使用可能寿命が長くなる。し力 半導体ポリチォフェン類の多く は、周囲の酸素によって酸化的にドープされ、導電率が増大してしまうため空気に触 れると安定ではないと考えられる。この結果、これらの材料カゝら製造したデバイスのォ フ電流は大きくなり、そのため電流オン Zオフ比は小さくなる。従ってこれらの材料の 多くは、材料加工とデバイス製造の間に環境酸素を排除して酸ィ匕的ドーピングを起こ さない、あるいは最小とするよう厳重に注意しなければならない。この予防措置は製 造コストを押し上げるため、特に大面積デバイスのための、アモルファスシリコン技術 に代わる経済的な技術としてのある種のポリマー TFTの魅力が削がれてしまう。これ ら及びその他の欠点は、本発明の実施の形態において回避され、あるいは最小とな る。従って、酸素に対して強い対抗性を有し、比較的高い電流 ONNZOFF比を示 すエレクトロニックデバイスが望まれている」との記載があり、その解決手段が種々提 案されている(例えば、特許文献 6、 7及び 8参照)が、改善のレベルは満足できるも のではなぐさらなる改良が望まれている。 [0009] In addition, in Japanese Patent Application Laid-Open No. 2003-292588, US Patent Application Publication No. 2003/136958, 2003Z160230, 2003,164495, "Integrated circuit logic for micro-elect port-tas" is disclosed. The use of polymer TFTs in the device greatly improves the mechanical durability and prolongs the useful life of the device, and many of the semiconductor polythiophenes are oxidatively doped with ambient oxygen, increasing the conductivity. As a result, the devices manufactured by these materials have a higher off-current and therefore a lower current-on-Z-off ratio. Many must be very careful to eliminate environmental oxygen during material processing and device manufacturing to avoid or minimize acid doping. To increase costs, the attractiveness of certain polymer TFTs as an economical alternative to amorphous silicon technology, especially for large area devices, is diminished. Therefore, an electronic device having a strong resistance to oxygen and a relatively high current ONNZOFF ratio is desired ”. Various means have been proposed (see, for example, Patent Documents 6, 7, and 8), but further improvements are desired that do not satisfy the level of improvement.

特許文献 1:特開平 5— 55568号公報 特許文献 2:特開平 5 - 190877号公報 Patent Document 1: Japanese Patent Laid-Open No. 5-55568 Patent Document 2: JP-A-5-190877

特許文献 3:特開平 8 - 264805号公報  Patent Document 3: JP-A-8-264805

特許文献 4:特開平 11— 195790号公報  Patent Document 4: JP-A-11-195790

特許文献 5 :特開 2003— 155289号公報  Patent Document 5: Japanese Patent Laid-Open No. 2003-155289

特許文献 6:特開 2003 - 261655号公報  Patent Document 6: Japanese Patent Laid-Open No. 2003-261655

特許文献 7:特開 2003 - 264327号公報  Patent Document 7: Japanese Unexamined Patent Publication No. 2003-264327

特許文献 8:特開 2003 - 268083号公報  Patent Document 8: Japanese Unexamined Patent Application Publication No. 2003-268083

非特許文献 1:『サイエンス』 (Science)誌 289卷、 599ページ(2000)  Non-Patent Document 1: Science 289 卷, 599 pages (2000)

非特許文献 2:『ネイチヤー』 (Nature)誌 403卷、 521ページ(2000)  Non-Patent Document 2: “Nature” 403ature, 521 pages (2000)

非特許文献 3 :『アドバンスド 'マテリアル』(Advanced Material)誌、 2002年、第 2 号、 99ページ  Non-Patent Document 3: "Advanced Material", 2002, No. 2, page 99

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0010] 本発明の目的は、簡単なプロセスで製造され、トランジスタとしての特性が良好であ り、さらに経時劣化が抑えられた有機半導体材料、それを用いた有機半導体膜、有 機半導体デバイス、有機薄膜トランジスタ及び有機薄膜トランジスタの形成方法を提 供することである。 [0010] An object of the present invention is an organic semiconductor material that is manufactured by a simple process, has good characteristics as a transistor, and further suppresses deterioration over time, an organic semiconductor film using the organic semiconductor material, an organic semiconductor device, An organic thin film transistor and a method for forming the organic thin film transistor are provided.

課題を解決するための手段  Means for solving the problem

[0011] 本発明の上記課題は以下の構成により達成される。 [0011] The above-described problems of the present invention are achieved by the following configurations.

1.下記一般式 (1)で表される化合物を含有することを特徴とする有機半導体材料。  1. An organic semiconductor material comprising a compound represented by the following general formula (1):

[0012] 一般式(1) Ar -L-Ar [0012] General formula (1) Ar -L-Ar

1 2  1 2

(式中、 Ar及び Arは水素原子または置換基を表し、 Ar及び Arの少なくとも 1つは  (In the formula, Ar and Ar represent a hydrogen atom or a substituent, and at least one of Ar and Ar is

1 2 1 2 芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水素縮合環または 芳香族複素縮合環であり、 Lは芳香族炭化水素環または芳香族複素環を含む共役 系をもって結合した連結基を表す。 )  1 2 1 2 Aromatic hydrocarbon condensed ring or aromatic heterocyclic condensed ring condensed with aromatic hydrocarbon ring or aromatic heterocyclic ring, L is bonded with a conjugated system containing aromatic hydrocarbon ring or aromatic heterocyclic ring Represents a linking group. )

2.前記 Ar及び Arが、芳香族炭化水素環または芳香族複素環が縮合した芳香族  2. Ar and Ar are aromatic condensed with an aromatic hydrocarbon ring or aromatic heterocycle

1 2  1 2

炭化水素縮合環または芳香族複素縮合環であることを特徴とする前記 1に記載の有 機半導体材料。 3.下記一般式 (2)で表される化合物を含有することを特徴とする有機半導体材料。 2. The organic semiconductor material as described in 1 above, which is a hydrocarbon condensed ring or an aromatic hetero condensed ring. 3. An organic semiconductor material comprising a compound represented by the following general formula (2):

[化 1] 一般式 >

Figure imgf000007_0001
[Chemical formula 1] General formula>
Figure imgf000007_0001

[0014] (式中、 Ar 及び Ar は水素原子または置換基を表し、 Ar 及び Ar の少なくとも 1つ [Wherein Ar and Ar represent a hydrogen atom or a substituent, and at least one of Ar and Ar

21 22 21 22  21 22 21 22

は、芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水素縮合環また は芳香族複素縮合環であり、 R  Is an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring condensed with an aromatic hydrocarbon ring or an aromatic hetero ring, and R

21及び R  21 and R

22は水素原子または置換基を表し、 L  22 represents a hydrogen atom or a substituent, L

21は芳香 族炭化水素環または芳香族複素環を含む共役系をもって結合した連結基を表す。) 21 represents a linking group bonded with a conjugated system containing an aromatic hydrocarbon ring or an aromatic heterocycle. )

4.前記 Ar 及び Ar 力 芳香族炭化水素環または芳香族複素環が縮合した芳香族 4. Aromatic condensed Ar or Ar force aromatic hydrocarbon ring or aromatic heterocycle

21 22  21 22

炭化水素縮合環または芳香族複素縮合環であることを特徴とする前記 3に記載の有 機半導体材料。  4. The organic semiconductor material as described in 3 above, which is a hydrocarbon condensed ring or an aromatic hetero condensed ring.

5.前記一般式(1)または(2)で表される化合物の分子量が 1万以下であることを特 徴とする前記 1〜4のいずれ力 1項に記載の有機半導体材料。  5. The organic semiconductor material according to any one of 1 to 4 above, wherein the compound represented by the general formula (1) or (2) has a molecular weight of 10,000 or less.

6.前記一般式(1)または(2)で表される化合物力 下記一般式(3)で表される部分 構造を有することを特徴とする前記 1〜5のいずれか 1項に記載の有機半導体材料。  6. Compound power represented by the general formula (1) or (2) The organic compound according to any one of the above 1 to 5, which has a partial structure represented by the following general formula (3) Semiconductor material.

[0015] [化 2] 一般式 (3)  [0015] [Chemical formula 2] General formula (3)

■ΑΓ3Ί -Ar3-2 、- Ar3'3 ■ ΑΓ 3 Ί -Ar 3 - 2 , - Ar 3 '3

[0016] (式中、 Ar 〜Ar は芳香族炭化水素環または芳香族複素環であり、 R は置換基で [In the formula, Ar to Ar are aromatic hydrocarbon rings or aromatic heterocyclic rings, and R is a substituent.

31 33 31  31 33 31

あり、 R及び R は水素原子または置換基を表す。)  R and R represent a hydrogen atom or a substituent. )

32 33  32 33

7.前記一般式(1)における Lまたは前記一般式(2)における L 力 前記一般式(3)  7. L in the general formula (1) or L force in the general formula (2) The general formula (3)

21  twenty one

で表される部分構造を有することを特徴とする前記 1〜5のいずれか 1項に記載の有 機半導体材料。 8.前記一般式(1)における Lまたは前記一般式(2)における L 力 置換または無置 6. The organic semiconductor material according to any one of 1 to 5, wherein the organic semiconductor material has a partial structure represented by: 8. L in the general formula (1) or L force in the general formula (2)

21  twenty one

換のチォフェン環を含むことを特徴とする前記 1〜5のいずれか 1項に記載の有機半 導体材料。  6. The organic semiconductor material according to any one of 1 to 5 above, which contains a substituted thiophene ring.

9.前記一般式(1)における Lまたは前記一般式(2)における L 力 置換または無置  9. L in the general formula (1) or L force in the general formula (2)

21  twenty one

換のチォフェン環が 2個以上連結した部分構造を有することを特徴とする前記 1〜5 の 、ずれか 1項に記載の有機半導体材料。  6. The organic semiconductor material according to any one of 1 to 5, wherein the organic semiconductor material has a partial structure in which two or more substituted thiophene rings are connected.

10.前記一般式(1)または(2)で表される化合物力 下記一般式 (4)で表される部 分構造を有することを特徴とする前記 1〜5のいずれか 1項に記載の有機半導体材 料。  10. The compound power represented by the general formula (1) or (2) has a partial structure represented by the following general formula (4), according to any one of the above 1 to 5, Organic semiconductor materials.

[0017] [化 3] 般式 (4>

Figure imgf000008_0001
[0017] [Chemical 3] General formula (4>
Figure imgf000008_0001

[0018] (式中、 Rは置換基を表す。) [In the formula, R represents a substituent.]

11.前記一般式(1)における Lまたは前記一般式(2)における L 力 前記一般式 (4  11. L in the general formula (1) or L force in the general formula (2)

21  twenty one

)で表される部分構造を有することを特徴とする前記 1〜5のいずれか 1項に記載の 有機半導体材料。  6. The organic semiconductor material according to any one of 1 to 5, which has a partial structure represented by:

12.前記 1〜 11の ヽずれか 1項に記載の有機半導体材料を含有することを特徴とす る有機半導体膜。  12. An organic semiconductor film comprising the organic semiconductor material according to any one of 1 to 11 above.

13.前記 1〜 11の 、ずれか 1項に記載の有機半導体材料を用 、ることを特徴とする 有機半導体デバイス。  13. An organic semiconductor device using the organic semiconductor material according to any one of 1 to 11 above.

14.前記 1〜11のいずれか 1項に記載の有機半導体材料を半導体層に用いること を特徴とする有機薄膜トランジスタ。  14. An organic thin film transistor, wherein the organic semiconductor material according to any one of 1 to 11 is used for a semiconductor layer.

15.前記半導体層を、前記 1〜11のいずれか 1項に記載の有機半導体材料を含有 する溶液または分散液を塗布することにより形成することを特徴とする有機薄膜トラン ジスタの形成方法。 発明の効果 15. A method for forming an organic thin film transistor, wherein the semiconductor layer is formed by applying a solution or dispersion containing the organic semiconductor material described in any one of 1 to 11 above. The invention's effect

[0019] 本発明によれば、簡単なプロセスで製造され、トランジスタとしての特性が良好であ り、さらに経時劣化が抑えられた有機半導体材料、それを用いた有機半導体膜、有 機半導体デバイス、有機薄膜トランジスタ及び有機薄膜トランジスタの形成方法を提 供することができる。  [0019] According to the present invention, an organic semiconductor material that is manufactured by a simple process, has good characteristics as a transistor, and further suppresses deterioration over time, an organic semiconductor film using the organic semiconductor material, an organic semiconductor device, An organic thin film transistor and a method for forming the organic thin film transistor can be provided.

図面の簡単な説明  Brief Description of Drawings

[0020] [図 1]本発明の有機薄膜トランジスタの構成例を示す図である。 [0020] Fig. 1 is a diagram showing a structural example of an organic thin film transistor of the present invention.

[図 2]本発明の有機薄膜トランジスタシートの概略等価回路図の 1例である。  FIG. 2 is an example of a schematic equivalent circuit diagram of the organic thin film transistor sheet of the present invention.

符号の説明  Explanation of symbols

[0021] 1 有機半導体層 [0021] 1 Organic semiconductor layer

2 ソース電極  2 Source electrode

3 ドレイン電極  3 Drain electrode

4 ゲート電極  4 Gate electrode

5 絶縁層  5 Insulation layer

6 支持体  6 Support

7 ゲートバスライン  7 Gate bus line

8 ソースノ スライン  8 Sourcenos line

10 有機薄膜トランジスタシート  10 Organic thin film transistor sheet

11 有機薄膜トランジスタ  11 Organic thin-film transistors

12 出力素子  12 Output element

13 蓄積コンデンサ  13 Storage capacitor

14 垂直駆動回路  14 Vertical drive circuit

15 水平駆動回路  15 Horizontal drive circuit

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0022] 本発明の有機半導体材料においては、請求の範囲第 1〜: L 1項のいずれか 1項に 規定される構成を用いることにより、薄膜トランジスタ用途に有用な有機半導体材料 を得ることができる。また、該有機半導体材料を用いて作製した本発明の有機半導 体膜、有機半導体デバイス、有機薄膜トランジスタ (以下、有機 TFTともいう)は、キヤ リア移動度が高ぐ良好な ONZOFF特性を示す等、優れたトランジスタ特性を示し ながら、かつ、高耐久性であることが分力つた。 [0022] In the organic semiconductor material of the present invention, an organic semiconductor material useful for a thin film transistor can be obtained by using the structure defined in any one of claims 1 to: L1. . The organic semiconductor of the present invention produced using the organic semiconductor material is also provided. Body films, organic semiconductor devices, and organic thin film transistors (hereinafter also referred to as organic TFTs) have excellent transistor characteristics such as high carrier mobility and high durability, and high durability. However, it was divided.

[0023] 有機半導体材料としてはペンタセンがよく知られている力 不溶性のため従来は蒸 着によってし力膜を形成できず、塗布膜を作製することは難しい。無置換 6Tに代表 されるような置換基を持たな ヽチォフェンオリゴマーは分子間で πスタックを形成しや すいが、ペンタセンと同様に不溶性であり蒸着によってし力膜を形成できない問題点 があった。また、末端チォフェンの 4位の活性が高いため、材料及び塗膜の経時安定 '性に問題があった。 [0023] As an organic semiconductor material, pentacene is a well-known force-insoluble material, and conventionally, a force film cannot be formed by evaporation, and it is difficult to produce a coating film. A thiophene oligomer without a substituent such as unsubstituted 6T can easily form a π stack between molecules, but it is insoluble like pentacene and cannot form a force film by vapor deposition. It was. In addition, since the activity at the 4-position of terminal thiophene is high, there was a problem in the temporal stability of the material and the coating film.

[0024] 一方で、塗布可能な材料として ΡΗΤに代表されるようなチオフエンポリマーが提案 されている力 分子量分布を持つポリマーでは πスタックの形成が不十分であり、分 子配列が乱れている部分が多ぐ満足できる TFT性能が得られな力つた。  [0024] On the other hand, a thiophene polymer such as ΡΗΤ that has been proposed as a material that can be applied has been proposed. A polymer with a molecular weight distribution is not sufficient to form a π stack, and the molecular arrangement is disordered. We were able to achieve satisfactory TFT performance with many parts.

[0025] 本発明者等は、上記の問題点を種々検討した結果、末端に芳香族炭化水素縮合 環または芳香族複素縮合環を導入することによって分子間のスタック性が向上し、さ らに、分子量をある特定の範囲に制限することにより、分子の配列性を向上させること が可能となった。さらに従来公知のペンタセン等で見られたような分子が規則的に配 列した膜が作製でき、 TFT性能の向上が可能となった。  [0025] As a result of various studies on the above problems, the present inventors have improved the stacking property between molecules by introducing an aromatic hydrocarbon condensed ring or an aromatic heterocondensed ring at the terminal, and moreover. By restricting the molecular weight to a specific range, it became possible to improve the molecular arrangement. Furthermore, it was possible to produce a film in which molecules regularly arranged such as those known in the prior art pentacene were arranged, and TFT performance could be improved.

[0026] また本発明のようにチォフェンオリゴマー等の部分構造を機能分離 (溶解性促進ュ ニットと πスタック促進ユニットに分離)することで十分な溶媒溶解性を持ちながら、分 子配列性の高い膜を形成することが可能となり、 TFT性能 (移動度)を向上すること ができた。  [0026] Further, as in the present invention, functional separation of a partial structure of thiophene oligomer or the like (separation into a solubility promoting unit and a π stack promoting unit) provides sufficient solvent solubility while maintaining molecular arrangement. It was possible to form a high film, and the TFT performance (mobility) could be improved.

[0027] また、芳香族炭化水素縮合環または芳香族複素縮合環でチォフェン環の 2位を置 換することにより、チォフェン環の活性部位をふさぎ、経時安定性が向上する。  [0027] In addition, by replacing the 2-position of the thiophene ring with an aromatic hydrocarbon condensed ring or an aromatic heterocondensed ring, the active site of the thiophene ring is closed, and stability over time is improved.

[0028] 以下、本発明に係る各構成要素の詳細について説明する。 [0028] Details of each component according to the present invention will be described below.

[0029] 〔有機半導体材料〕 [0029] [Organic semiconductor material]

(一般式 (1)で表される化合物)  (Compound represented by the general formula (1))

本発明の有機半導体材料は、上記一般式 (1)または (2)で表される化合物を含有 することが特徴である。 [0030] 本発明に係る一般式(1)で表される化合物につ 、て説明する。 The organic semiconductor material of the present invention is characterized by containing a compound represented by the above general formula (1) or (2). [0030] The compound represented by the general formula (1) according to the present invention will be described.

[0031] 一般式(1)にお 、て、 Ar及び Arは水素原子または置換基を表し、 Ar及び Arの  [0031] In the general formula (1), Ar and Ar represent a hydrogen atom or a substituent,

1 2 1 2 少なくとも 1つは、芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水 素縮合環または芳香族複素縮合環を表す。さらに Ar及び Arの両方が、芳香族炭  1 2 1 2 At least one represents an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring in which an aromatic hydrocarbon ring or an aromatic heterocyclic ring is condensed. Furthermore, both Ar and Ar are aromatic charcoal

1 2  1 2

化水素環または芳香族複素環が縮合した芳香族炭化水素縮合環または芳香族複 素縮合環であることが好まし 、。  It is preferably an aromatic hydrocarbon condensed ring or an aromatic complex condensed ring in which a hydrogenated ring or an aromatic heterocyclic ring is condensed.

本発明では、上記「芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化 水素縮合環または芳香族複素縮合環」とは、芳香族炭化水素環のみで構成された 芳香族炭化水素縮合環、芳香族複素環のみで構成された芳香族複素縮合環、また は芳香族炭化水素環と芳香族複素縮合環によって構成された芳香族複素縮合環を 意味する。  In the present invention, the above-mentioned “aromatic hydrocarbon condensed ring or aromatic heterocondensed ring condensed with an aromatic hydrocarbon ring or aromatic heterocycle” means an aromatic hydrocarbon condensed composed only of an aromatic hydrocarbon ring. It means an aromatic heterocondensed ring composed only of a ring, an aromatic heterocycle, or an aromatic heterocondensed ring composed of an aromatic hydrocarbon ring and an aromatic heterocondensed ring.

ここで、芳香族複素縮合環は好ましくは N、 O及び Sから選択された少なくとも 1個の ヘテロ原子を含む。さらにこれらの縮合環は随意に置換基を有していてもよい。また 、上記の縮合した芳香族炭化水素縮合環及び芳香族複素縮合環は、 5員環または 6 員環から構成されて ヽることが好ま ヽ。  Here, the aromatic heterofused ring preferably contains at least one heteroatom selected from N, O and S. Furthermore, these condensed rings may optionally have a substituent. In addition, the condensed aromatic hydrocarbon condensed ring and aromatic heterocyclic condensed ring are preferably composed of a 5-membered ring or a 6-membered ring.

[0032] さらに、 Arまたは Arで表される芳香族炭化水素縮合環または芳香族複素縮合環 [0032] Further, an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring represented by Ar or Ar

1 2  1 2

において Lと結合している環が 6員環である場合は、 Lとの結合に関与する原子の隣 の原子が水素以外の原子と結合して 、な 、または環を構成する原子以外と結合して いないことが好ましい。  In the case where the ring bonded to L is a 6-membered ring, the atom next to the atom involved in the bond to L is bonded to an atom other than hydrogen, and is bonded to other than the atoms constituting the ring Preferably not.

[0033] 芳香族炭化水素環が縮合した芳香族炭化水素縮合環としては、ァセン類 (ァセン 類とはベンゼン環が複数個縮合したィ匕合物をいい、ナフタレン、アントラセン、テトラ セン、ペンタセン、へキサセン、フエナントレン、ピレン等が挙げられる)、ァズレン環、 タリセン環、ナフタセン環、ァセナフテン環、コロネン環、フルオレン環、フルオラントレ ン環、ナフタセン環、ペリレン環、ペンタフェン環、ピセン環、ピレン環、ピラントレン環 、アンスラアントレン環等が挙げられる。好ましく用いられるのは、アントラセン、テトラ セン、ヘプタセン、へキサセン、フエナントレンである。  [0033] The aromatic hydrocarbon condensed ring condensed with an aromatic hydrocarbon ring is an acene (acene is a compound in which a plurality of benzene rings are condensed, such as naphthalene, anthracene, tetracene, pentacene, Hexacene, phenanthrene, pyrene, etc.), azulene ring, taricene ring, naphthacene ring, acenaphthene ring, coronene ring, fluorene ring, fluoranthrene ring, naphthacene ring, perylene ring, pentaphen ring, picene ring, pyrene ring, pyranthrene Ring, anthraanthrene ring and the like. Preferably used are anthracene, tetracene, heptacene, hexacene and phenanthrene.

[0034] 芳香族複素環が縮合した、または芳香族炭化水素環及び芳香族複素環が縮合し た芳香族複素縮合環としては、ベンゾイミダゾール環、インドール環、ベンゾイミダゾ ール環、ベンゾチアゾール環、ベンゾォキサゾール環、キノキサリン環、キナゾリン環 、フタラジン環、力ルバゾール環、カルボリン環、ジァザ力ルバゾール環(カルボリン環 を構成する炭化水素環の炭素原子の一つがさらに窒素原子で置換されている環)等 が挙げられる。 [0034] The aromatic heterocondensed ring in which the aromatic heterocycle is condensed, or the aromatic hydrocarbon ring and the aromatic heterocycle are condensed includes benzimidazole ring, indole ring, benzimidazo Ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline ring, phthalazine ring, force rubazole ring, carboline ring, diaza force rubazole ring (one of the carbon atoms of the hydrocarbon ring constituting the carboline ring) And a ring substituted with a nitrogen atom).

また、上記の芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水素 縮合環または芳香族複素縮合環は、無置換でも、置換基を有していてもよいが、該 置換基としては、アルキル基 (例えば、メチル基、ェチル基、プロピル基、イソプロピル 基、 tert—ブチル基、ペンチル基、へキシル基、ォクチル基、ドデシル基、トリデシル 基、テトラデシル基、ペンタデシル基等)、シクロアルキル基 (例えば、シクロペンチル 基、シクロへキシル基等)、アルケニル基 (例えば、ビニル基、ァリル基等)、アルキ- ル基 (例えば、ェチニル基、プロパルギル基等)、ァリール基 (例えば、フエ二ル基、ナ フチル基等)、芳香族複素環 (例えば、フリル基、チェ-ル基、ピリジル基、ピリダジ- ル基、ピリミジニル基、ピラジュル基、トリアジニル基、イミダゾリル基、ピラゾリル基、チ ァゾリル基、キナゾリニル基、フタラジュル基等)、複素環基 (例えば、ピロリジル基、ィ ミダゾリジル基、モルホリル基、ォキサゾリジル基等)、アルコキシ基 (例えば、メトキシ 基、エトキシ基、プロピルォキシ基、ペンチルォキシ基、へキシルォキシ基、ォクチル ォキシ基、ドデシルォキシ基等)、シクロアルコキシ基 (例えば、シクロペンチルォキシ 基、シクロへキシルォキシ基等)、ァリールォキシ基 (例えば、フエノキシ基、ナフチル ォキシ基等)、アルキルチオ基 (例えば、メチルチオ基、ェチルチオ基、プロピルチオ 基、ペンチルチオ基、へキシルチオ基、ォクチルチオ基、ドデシルチオ基等)、シクロ アルキルチオ基 (例えば、シクロペンチルチオ基、シクロへキシルチオ基等)、ァリー ルチオ基 (例えば、フエ-ルチオ基、ナフチルチオ基等)、アルコキシカルボニル基( 例えば、メチルォキシカルボ-ル基、ェチルォキシカルボ-ル基、ブチルォキシカル ボニル基、ォクチルォキシカルボ-ル基、ドデシルォキシカルボ-ル基等)、ァリール ォキシカルボ-ル基(例えば、フエ-ルォキシカルボ-ル基、ナフチルォキシカルボ -ル基等)、スルファモイル基(例えば、アミノスルホ -ル基、メチルアミノスルホ -ル 基、ジメチルアミノスルホ -ル基、ブチルアミノスルホ -ル基、へキシルアミノスルホ- ル基、シクロへキシルアミノスルホ -ル基、ォクチルアミノスルホ -ル基、ドデシルアミ ノスルホ -ル基、フエ-ルアミノスルホ -ル基、ナフチルアミノスルホ -ル基、 2—ピリ ジルアミノスルホ -ル基等)、ァシル基(例えば、ァセチル基、ェチルカルボ-ル基、 プロピルカルボ-ル基、ペンチルカルボ-ル基、シクロへキシルカルボ-ル基、オタ チルカルボ-ル基、 2—ェチルへキシルカルボ-ル基、ドデシルカルポ-ル基、フエ -ルカルボ-ル基、ナフチルカルボ-ル基、ピリジルカルボ-ル基等)、ァシルォキ シ基(例えば、ァセチルォキシ基、ェチルカルボ-ルォキシ基、ブチルカルボ-ルォ キシ基、ォクチルカルボ-ルォキシ基、ドデシルカルボ-ルォキシ基、フエ-ルカル ボニルォキシ基等)、アミド基 (例えば、メチルカルボ-ルァミノ基、ェチルカルボ-ル アミノ基、ジメチルカルボ-ルァミノ基、プロピルカルボ-ルァミノ基、ペンチルカルボ -ルァミノ基、シクロへキシルカルボ-ルァミノ基、 2—ェチルへキシルカルボ-ルアミ ノ基、ォクチルカルボ-ルァミノ基、ドデシルカルボ-ルァミノ基、フヱ-ルカルボ-ル アミノ基、ナフチルカルボニルァミノ基等)、力ルバモイル基 (例えば、ァミノカルボ- ル基、メチルァミノカルボ-ル基、ジメチルァミノカルボ-ル基、プロピルアミノカルボ -ル基、ペンチルァミノカルボ-ル基、シクロへキシルァミノカルボ-ル基、ォクチル ァミノカルボ-ル基、 2—ェチルへキシルァミノカルボ-ル基、ドデシルァミノカルボ- ル基、フエ-ルァミノカルボ-ル基、ナフチルァミノカルボ-ル基、 2—ピリジルァミノ カルボ-ル基等)、ウレイド基(例えば、メチルウレイド基、ェチルウレイド基、ペンチル ウレイド基、シクロへキシルウレイド基、ォクチルゥレイド基、ドデシルウレイド基、フエ -ルウレイド基ナフチルウレイド基、 2—ピリジルアミノウレイド基等)、スルフィエル基( 例えば、メチルスルフィエル基、ェチルスルフィ-ル基、ブチルスルフィ-ル基、シク 口へキシルスルフィ-ル基、 2—ェチルへキシルスルフィ-ル基、ドデシルスルフィ- ル基、フヱニルスルフィ-ル基、ナフチルスルフィ-ル基、 2—ピリジルスルフィエル基 等)、アルキルスルホ -ル基(例えば、メチルスルホ -ル基、ェチルスルホ -ル基、ブ チルスルホ-ル基、シクロへキシルスルホ -ル基、 2—ェチルへキシルスルホ -ル基 、ドデシルスルホ -ル基等)、ァリールスルホ -ル基(フエ-ルスルホ-ル基、ナフチ ルスルホ -ル基、 2—ピリジルスルホ -ル基等)、アミノ基 (例えば、アミノ基、ェチルァ ミノ基、ジメチルァミノ基、ブチルァミノ基、シクロペンチルァミノ基、 2—ェチルへキシ ルァミノ基、ドデシルァミノ基、ァ-リノ基、ナフチルァミノ基、 2—ピリジルァミノ基等) 、ハロゲン原子 (例えば、フッ素原子、塩素原子、臭素原子等)、フッ化炭化水素基( 例えば、フルォロメチル基、トリフルォロメチル基、ペンタフルォロェチル基、ペンタフ ルォロフエ-ル基等)、シァノ基、ニトロ基、ヒドロキシ基、メルカプト基、シリル基 (例え ば、トリメチルシリル基、トリイソプロビルシリル基、トリフエ-ルシリル基、フエ-ルジェ チルシリル基等)等が挙げられる。 In addition, the aromatic hydrocarbon condensed ring or aromatic heterocyclic ring condensed with the above aromatic hydrocarbon ring or aromatic heterocyclic ring may be unsubstituted or may have a substituent. Is an alkyl group (for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, etc.), cycloalkyl Groups (for example, cyclopentyl group, cyclohexyl group, etc.), alkenyl groups (for example, vinyl group, allyl group, etc.), alkyl groups (for example, ethynyl group, propargyl group, etc.), aryl groups (for example, phenyl) Group, naphthyl group, etc.), aromatic heterocycle (for example, furyl group, chael group, pyridyl group, pyridazyl group, pyrimidinyl group, pyrajuryl group, triazinyl group) Group, imidazolyl group, pyrazolyl group, thiazolyl group, quinazolinyl group, phthaladyl group, etc.), heterocyclic group (eg, pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (eg, methoxy group, ethoxy group) Group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc., cycloalkoxy group (for example, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (for example, phenoxy group, naphthyloxy group, etc.) Etc.), alkylthio group (eg, methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group, dodecylthio group, etc.), cycloalkylthio group (eg, cyclopentylthio group, cyclohexylthio group, etc.) Arylthio group (for example, phenylthio group, naphthylthio group, etc.), alkoxycarbonyl group (for example, methyloxycarbonyl group, ethyloxycarbonyl group, butyloxycarbonyl group, octyloxycarbon group) Group, dodecyloxycarbon group, etc.), aryloxycarbonyl group (eg, phenylcarbol group, naphthyloxycarbonyl group, etc.), sulfamoyl group (eg, aminosulfol group, methylaminosulfo group, etc.) -Luyl group, dimethylaminosulfol group, butylaminosulfol group, hexylaminosulfol group, cyclohexylaminosulfol group, octylaminosulfol group, dodecylamino Nosulfol group, phenolaminosulfol group, naphthylaminosulfol group, 2-pyridylaminosulfol group, etc.), acyl group (for example, acetyl group, ethylcarbol group, propylcarbol group, Pentyl carbo yl, cyclohexyl carbo yl, octyl carbo yl, 2-ethyl hexyl carbo ol, dodecyl carbo ol, phenol carbo yl, naphthyl carb ol, pyridyl carbo ol Group), an acyl group (eg, acetyloxy group, ethylcarbo-oxy group, butyl carboxy-oxy group, octyl carboxy-oxy group, dodecyl carboxy-oxy group, phenyl carbonyloxy group, etc.), an amide group (eg, methyl carbo-oxy group) Ruamino group, ethyl carbo amino group, dimethyl carbolumino group, propyl carbolumino group, pentylca Rubo-lumino group, cyclohexyl carbo-lumino group, 2-ethylhexyl carboamino group, octyl carbolumino group, dodecyl carbo-lumino group, vinyl carboxyamino group, naphthylcarbonylamino group, etc.) Rubamoyl groups (e.g. aminoamino groups, methylaminocarboxylic groups, dimethylaminocarboxylic groups, propylaminocarboxylic groups, pentylaminocarboxylic groups, cyclohexylaminocarboxylic groups) Group, octylaminocarbol group, 2-ethylhexylaminocarbol group, dodecylaminocarbole group, phenolaminocarbol group, naphthylaminocarbol group, 2-pyridylaminocarbol group Etc.), ureido group (for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octyl) Ureido group, dodecylureido group, phenol-ureido group naphthylureido group, 2-pyridylaminoureido group, etc.), sulfier group (eg methylsulfyl group, ethylsulfuryl group, butylsulfuryl group, cyclohexylsulfyl group) 2-ethylhexylsulfyl group, dodecylsulfuryl group, phenylsulfyl group, naphthylsulfuryl group, 2-pyridylsulfyl group, etc.), alkylsulfol group (for example, methylsulfol group) , Ethylsulfyl group, butylsulfol group, cyclohexylsulfol group, 2-ethylhexylsulfol group, dodecylsulfol group, etc.), arylsulfol group (phenylsulfol group, naphthylsulfol group) Group, 2-pyridylsulfol group, etc.), amino group (for example, amino group, ethylamino group, dimethyl group) Amino groups, Buchiruamino group, cyclopentyl Rua amino group, alkoxy Ruamino group to 2-Echiru, Dodeshiruamino group, § - Rinomoto, Nafuchiruamino group, 2-Pirijiruamino group) Halogen atoms (eg fluorine atom, chlorine atom, bromine atom, etc.), fluorohydrocarbon groups (eg fluoromethyl group, trifluoromethyl group, pentafluoroethyl group, pentafluorophenyl group, etc.), cyano Group, nitro group, hydroxy group, mercapto group, silyl group (for example, trimethylsilyl group, triisopropylpropyl silyl group, triphenylsilyl group, ferroethylsilyl group, etc.).

[0036] これらの置換基は、上記の置換基によってさらに置換されて 、てもよ 、。また、これ らの置換基は複数が互 、に結合して環を形成して 、てもよ 、。  [0036] These substituents may be further substituted with the above-described substituents. In addition, a plurality of these substituents may be bonded to each other to form a ring.

[0037] Lは芳香族炭化水素環または芳香族複素環を含む共役系をもって結合した連結基 を表す。  [0037] L represents a linking group bonded with a conjugated system including an aromatic hydrocarbon ring or an aromatic heterocyclic ring.

[0038] 芳香族炭化水素環としては、ベンゼン環、ビフエ-ル環、ナフタレン環、ァズレン環 、アントラセン環、フエナントレン環、ピレン環、タリセン環、ナフタセン環、トリフエ-レ ン環、 o—テルフエ-ル環、 m—テルフエ-ル環、 p—テルフエ-ル環、ァセナフテン 環、コロネン環、フルオレン環、フルオラントレン環、ナフタセン環、ペンタセン環、ペリ レン環、ペンタフェン環、ピセン環、ピレン環、ピラントレン環、アンスラアントレン環等 が挙げられる。中でも好ましく用いられるのはベンゼン環である。さらに、これらの芳 香族炭化水素環は、無置換でも置換基を有していてもよいが、該置換基としては、前 述の 2つ以上の環が縮合した芳香族炭化水素環及び 2つ以上の環が縮合した芳香 族複素環の置換基として説明した置換基が挙げられる。  [0038] Examples of the aromatic hydrocarbon ring include a benzene ring, a biphenyl ring, a naphthalene ring, an azulene ring, an anthracene ring, a phenanthrene ring, a pyrene ring, a thalylene ring, a naphthacene ring, a triphenylene ring, and o-terfene ring. Ring, m-terfel ring, p-terfel ring, acenaphthene ring, coronene ring, fluorene ring, fluoranthrene ring, naphthacene ring, pentacene ring, perylene ring, pentaphen ring, picene ring, pyrene ring, Examples include a pyranthrene ring and anthraanthrene ring. Of these, a benzene ring is preferably used. Further, these aromatic hydrocarbon rings may be unsubstituted or have a substituent. Examples of the substituent include an aromatic hydrocarbon ring in which two or more of the aforementioned rings are condensed, and 2 Examples of the substituent include those described for the aromatic heterocyclic ring in which two or more rings are condensed.

[0039] 芳香族複素環としては、フラン環、チォフェン環、ピリジン環、ピリダジン環、ピリミジ ン環、ピラジン環、トリアジン環、ベンゾイミダゾール環、ォキサジァゾール環、トリァゾ ール環、イミダゾール環、ピラゾール環、チアゾール環、インドール環、ベンゾイミダゾ ール環、ベンゾチアゾール環、ベンゾォキサゾール環、キノキサリン環、キナゾリン環 、フタラジン環、力ルバゾール環、カルボリン環、カルボリン環を構成する炭化水素環 の炭素原子の少なくともひとつがさらに窒素原子で置換されている環等が挙げられる  [0039] Examples of the aromatic heterocycle include furan ring, thiophene ring, pyridine ring, pyridazine ring, pyrimidin ring, pyrazine ring, triazine ring, benzimidazole ring, oxadiazole ring, triazole ring, imidazole ring, pyrazole ring, Carbon atom of the hydrocarbon ring constituting the thiazole ring, indole ring, benzimidazole ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline ring, phthalazine ring, force rubazole ring, carboline ring, carboline ring Examples include a ring in which at least one is further substituted with a nitrogen atom.

[0040] (一般式 (2)で表される化合物) [0040] (Compound represented by formula (2))

本発明の有機半導体材料は、上記一般式 (1)または (2)で表される化合物を含有 することが特徴である。 [0041] 本発明に係る一般式 (2)で表される化合物につ 、て説明する。 The organic semiconductor material of the present invention is characterized by containing a compound represented by the above general formula (1) or (2). [0041] The compound represented by the general formula (2) according to the present invention will be described.

[0042] 一般式(2)において、 Ar 及び Ar は水素原子または置換基を表し、 Ar及び Ar  [0042] In the general formula (2), Ar and Ar represent a hydrogen atom or a substituent, and Ar and Ar

21 22 21 22 の少なくとも 1つは、芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化 水素縮合環または芳香族複素縮合環であり、 R  At least one of 21 22 21 22 is an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring condensed with an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and R

21及び R  21 and R

22は水素原子または置換基 を表し、 L は芳香族炭化水素環または芳香族複素環を含む共役系をもって結合し  22 represents a hydrogen atom or a substituent, and L is bonded with a conjugated system including an aromatic hydrocarbon ring or an aromatic heterocyclic ring.

21  twenty one

た連結基を表す。  Represents a linking group.

[0043] Ar 、 Ar で表される芳香族炭化水素環または芳香族複素環が縮合した芳香族炭  [0043] An aromatic charcoal in which an aromatic hydrocarbon ring or an aromatic heterocycle represented by Ar or Ar is condensed

21 22  21 22

化水素縮合環または芳香族複素縮合環は、前記一般式(1)の Arまたは Arで表さ  The hydrogen fluoride condensed ring or the aromatic hetero condensed ring is represented by Ar or Ar in the general formula (1).

1 2 れる芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水素縮合環また は芳香族複素縮合環と同義である。  It is synonymous with an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring condensed with an aromatic hydrocarbon ring or an aromatic heterocyclic ring.

[0044] R及び R で表される置換基は、前記一般式(1)の 2つ以上の環が縮合した芳香 [0044] The substituent represented by R and R is an aromatic group in which two or more rings of the general formula (1) are condensed.

21 22  21 22

族炭化水素環及び 2つ以上の環が縮合した芳香族複素環の置換基と同義である。  It is synonymous with a substituent of an aromatic heterocyclic ring in which an aromatic hydrocarbon ring and two or more rings are condensed.

[0045] L で表される芳香族炭化水素環または芳香族複素環を含む共役系をもって結合 [0045] Bonded with a conjugated system containing an aromatic hydrocarbon ring or an aromatic heterocycle represented by L

21  twenty one

した連結基は、前記一般式 (1)の芳香族炭化水素環または芳香族複素環を含む共 役系をもって結合した連結基 Lと同義である。  The linking group is synonymous with the linking group L bonded through a synergistic system containing the aromatic hydrocarbon ring or aromatic heterocycle of the general formula (1).

[0046] 一般式(2)で表される化合物についても、 Ar 及び Ar の両方が、 2つ以上の環が [0046] Regarding the compound represented by the general formula (2), both Ar and Ar have two or more rings.

21 22  21 22

縮合した芳香族炭化水素環または 2つ以上の環が縮合した芳香族複素環であること が好ましい。  It is preferably a condensed aromatic hydrocarbon ring or an aromatic heterocyclic ring in which two or more rings are condensed.

[0047] 前記一般式(1)または(2)で表される化合物の重量分子量は 1万以下であることが 好ましぐさらに好ましくは 100〜5000の範囲である。分子量をこの範囲に制限する ことにより、分子間のスタック性及び配向性が向上し、分子が規則的に配列した膜が 作製でき、 TFT性能の向上が可能となる。本発明の有機半導体材料の重量平均分 子量または数平均分子量は、テトラヒドロフランをカラム溶媒として用いる GPC (ゲル パーミーシヨンクロマトグラフィー)を用いて測定を行う。  [0047] The weight molecular weight of the compound represented by the general formula (1) or (2) is preferably 10,000 or less, and more preferably in the range of 100 to 5,000. By limiting the molecular weight to this range, the stackability and orientation between molecules can be improved, a film in which molecules are regularly arranged can be produced, and the TFT performance can be improved. The weight average molecular weight or number average molecular weight of the organic semiconductor material of the present invention is measured using GPC (gel permeation chromatography) using tetrahydrofuran as a column solvent.

前記一般式(1)または (2)で表される化合物が、前記一般式 (3)で表される部分構 造を有することが好ましい。  The compound represented by the general formula (1) or (2) preferably has a partial structure represented by the general formula (3).

[0048] さらに、前記一般式(1)における Lまたは前記一般式(2)における L は、前記一般 [0048] Further, L in the general formula (1) or L in the general formula (2)

21  twenty one

式 (3)で表される部分構造を有することが好ま 、。このような部分構造を有すること により、分子のスタック性が向上し、 TFT性能の向上が可能となる。 It is preferable to have a partial structure represented by the formula (3). Having such a partial structure This improves the stackability of molecules and improves the TFT performance.

[0049] 一般式(3)において、 Ar 〜Ar は芳香族炭化水素環または芳香族複素環であり [0049] In the general formula (3), Ar to Ar are an aromatic hydrocarbon ring or an aromatic heterocyclic ring.

31 33  31 33

、R は置換基であり、 R 及び R は水素原子または置換基を表す。  , R is a substituent, and R 1 and R 2 represent a hydrogen atom or a substituent.

31 32 33  31 32 33

[0050] Ar 〜Ar で表される芳香族炭化水素縮合環または芳香族複素縮合環は、前記  [0050] The aromatic hydrocarbon condensed ring or the aromatic heterocyclic condensed ring represented by Ar to Ar is the above-mentioned

31 33  31 33

一般式 (1)における連結基 Lで説明した芳香族炭化水素環または芳香族複素環と 同義であり、 R 、R 及び R で表される置換基は、前記一般式(1)の芳香族炭化水  The substituent represented by R 1, R 2 and R 3 is synonymous with the aromatic hydrocarbon ring or aromatic heterocycle described for the linking group L in the general formula (1), and the substituent represented by R 1, R 2 and R 3 is the aromatic carbon ring of the general formula (1). water

31 32 33  31 32 33

素環または芳香族複素環が縮合した芳香族炭化水素縮合環または芳香族複素縮 合環の置換基と同義である。  It is synonymous with the substituent of the aromatic hydrocarbon condensed ring or aromatic heterocyclic condensed ring in which the elemental ring or aromatic heterocyclic ring is condensed.

[0051] 前記一般式(1)における Lまたは前記一般式(2)における L は、置換または無置 [0051] L in the general formula (1) or L in the general formula (2) is substituted or unsubstituted.

21  twenty one

換のチォフェン環を有することが好まし 、。  It is preferred to have a substituted thiophene ring.

[0052] また、 Lまたは L は、置換または無置換のチォフェン環が 2個以上連結した部分構 [0052] L or L is a partial structure in which two or more substituted or unsubstituted thiophene rings are linked.

21  twenty one

造を有することが好ましぐかつ、 Lまたは L に含まれるチォフェン環の環数は 2〜40  The number of thiophene rings contained in L or L is 2 to 40.

21  twenty one

であることが好ましぐより好ましくは 3〜20であり、さらに好ましくは 4〜 10である。 前記一般式(1)または (2)で表される化合物が、前記一般式 (4)で表される部分構 造を有することが好ましい。  More preferably, it is 3-20, and more preferably 4-10. The compound represented by the general formula (1) or (2) preferably has a partial structure represented by the general formula (4).

[0053] さらに好ましくは、 Lまたは L 力 前記一般式 (4)で表される部分構造を有すること [0053] More preferably, the L or L force has a partial structure represented by the general formula (4).

21  twenty one

である。  It is.

[0054] 一般式 (4)にお 、て、 Rは置換基を表す。置換基としては、例えば、アルキル基 (例 えば、メチル基、ェチル基、プロピル基、イソプロピル基、 tert—ブチル基、ペンチル 基、へキシル基、ォクチル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシ ル基等)、シクロアルキル基 (例えば、シクロペンチル基、シクロへキシル基等)、アル ケニル基 (例えば、ビニル基、ァリル基等)、アルキニル基 (例えば、ェチニル基、プロ パルギル基等)、ァリール基 (例えば、フエ-ル基、 p—クロ口フエニル基、メシチル基 、トリル基、キシリル基、ナフチル基、アントリル基、ァズレニル基、ァセナフテュル基、 フルォレ -ル基、フエナントリル基、インデュル基、ピレ-ル基、ビフヱ-リル基等)、 芳香族複素環 (例えば、フリル基、チェニル基、ピリジル基、ピリダジル基、ピリミジル 基、ビラジル基、トリアジル基、イミダゾリル基、ピラゾリル基、チアゾリル基、ベンゾイミ ダゾリル基、ベンゾォキサゾリル基、キナゾリル基、フタラジル基等)、複素環基 (例え ば、ピロリジル基、イミダゾリジル基、モルホリル基、ォキサゾリジル基等)、アルコキシ 基 (例えば、メトキシ基、エトキシ基、プロピルォキシ基、ペンチルォキシ基、へキシル ォキシ基、ォクチルォキシ基、ドデシルォキシ基等)、シクロアルコキシ基 (例えば、シ クロペンチルォキシ基、シクロへキシルォキシ基等)、ァリールォキシ基 (例えば、フエ ノキシ基、ナフチルォキシ基等)、アルキルチオ基 (例えば、メチルチオ基、ェチルチ ォ基、プロピルチオ基、ペンチルチオ基、へキシルチオ基、ォクチルチオ基、ドデシ ルチオ基等)、シクロアルキルチオ基 (例えば、シクロペンチルチオ基、シクロへキシ ルチオ基等)、ァリールチオ基 (例えば、フ 二ルチオ基、ナフチルチオ基等)、アル コキシカルボ-ル基(例えば、メチルォキシカルボ-ル基、ェチルォキシカルボ-ル 基、ブチルォキシカルボ-ル基、ォクチルォキシカルボ-ル基、ドデシルォキシカル ボ-ル基等)、ァリールォキシカルボ-ル基(例えば、フエ-ルォキシカルボ-ル基、 ナフチルォキシカルボ-ル基等)、スルファモイル基(例えば、アミノスルホ -ル基、メ チルアミノスルホ -ル基、ジメチルアミノスルホ -ル基、ブチルアミノスルホ -ル基、へ キシルアミノスルホ -ル基、シクロへキシルアミノスルホ -ル基、ォクチルアミノスルホ -ル基、ドデシルアミノスルホ-ル基、フエ-ルアミノスルホ -ル基、ナフチルアミノス ルホ-ル基、 2—ピリジルアミノスルホ -ル基等)、ァシル基 (例えば、ァセチル基、ェ チルカルボ-ル基、プロピルカルボ-ル基、ペンチルカルボ-ル基、シクロへキシル カルボ-ル基、ォクチルカルポ-ル基、 2—ェチルへキシルカルボ-ル基、ドデシル カルボ-ル基、フヱ-ルカルボ-ル基、ナフチルカルボ-ル基、ピリジルカルボ-ル 基等)、ァシルォキシ基 (例えば、ァセチルォキシ基、ェチルカルボ-ルォキシ基、ブ チルカルボ-ルォキシ基、ォクチルカルポ-ルォキシ基、ドデシルカルボニルォキシ 基、フエ-ルカルポニルォキシ基等)、アミド基 (例えば、メチルカルボニルァミノ基、 ェチルカルボ-ルァミノ基、ジメチルカルボ-ルァミノ基、プロピルカルボ-ルァミノ基 、ペンチルカルボ-ルァミノ基、シクロへキシルカルボ-ルァミノ基、 2—ェチルへキ シルカルボ-ルァミノ基、ォクチルカルボ-ルァミノ基、ドデシルカルボ-ルァミノ基、 フエ-ルカルポ-ルァミノ基、ナフチルカルボ-ルァミノ基等)、力ルバモイル基(例え ば、ァミノカルボ-ル基、メチルァミノカルボ-ル基、ジメチルァミノカルボ-ル基、プ 口ピルアミノカルボ-ル基、ペンチルァミノカルボ-ル基、シクロへキシルァミノカルボ -ル基、ォクチルァミノカルボ-ル基、 2—ェチルへキシルァミノカルボ-ル基、ドデ シルァミノカルボ-ル基、フエ-ルァミノカルボ-ル基、ナフチルァミノカルボ-ル基、 2—ピリジルァミノカルボ-ル基等)、ウレイド基 (例えば、メチルウレイド基、ェチルゥ レイド基、ペンチルゥレイド基、シクロへキシルウレイド基、ォクチルゥレイド基、ドデシ ルゥレイド基、フエ-ルゥレイド基、ナフチルウレイド基、 2—ピリジルアミノウレイド基等 )、スルフィエル基(例えば、メチルスルフィ-ル基、ェチルスルフィ-ル基、ブチルス ルフィ-ル基、シクロへキシルスルフィ-ル基、 2—ェチルへキシルスルフィエル基、ド デシルスルフィ-ル基、フエ-ルスルフィ-ル基、ナフチルスルフィ-ル基、 2—ピリジ ルスルフィ -ル基等)、アルキルスルホ -ル基(例えば、メチルスルホ -ル基、ェチル スルホ-ル基、ブチルスルホ -ル基、シクロへキシルスルホ -ル基、 2—ェチルへキ シルスルホ-ル基、ドデシルスルホ -ル基等)、ァリールスルホ -ル基(例えば、フエ ニルスルホ-ル基、ナフチルスルホ-ル基、 2—ピリジルスルホ -ル基等)、アミノ基( 例えば、アミノ基、ェチルァミノ基、ジメチルァミノ基、ブチルァミノ基、シクロペンチル アミノ基、 2—ェチルへキシルァミノ基、ドデシルァミノ基、ァ-リノ基、ナフチルァミノ 基、 2—ピリジルァミノ基等)、ハロゲン原子 (例えば、フッ素原子、塩素原子、臭素原 子等)、フッ化炭化水素基 (例えば、フルォロメチル基、トリフルォロメチル基、ペンタ フルォロェチル基、ペンタフルオロフヱニル基等)、シァノ基、シリル基 (例えば、トリメ チルシリル基、トリイソプロビルシリル基、トリフ -ルシリル基、フ -ルジェチルシリ ル基等)等が挙げられる。中でも、前記 Rがアルキル基またはアルコキシ基であること が好ましい。 [0054] In the general formula (4), R represents a substituent. Examples of the substituent include an alkyl group (for example, methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group). Group), cycloalkyl group (eg, cyclopentyl group, cyclohexyl group, etc.), alkenyl group (eg, vinyl group, aryl group, etc.), alkynyl group (eg, ethynyl group, propargyl group, etc.), aryl Group (e.g., phenyl group, p-chlorophenyl group, mesityl group, tolyl group, xylyl group, naphthyl group, anthryl group, azulenyl group, acenaphthyl group, fluoride group, phenanthryl group, indur group, pyrethyl group) Group, bif ヱ -ryl group, etc.), aromatic heterocycle (eg furyl group, chenyl group, pyridyl group, pyridazyl group, Mijiru group, Birajiru group, triazyl group, an imidazolyl group, a pyrazolyl group, a thiazolyl group, Benzoimi Dazoriru group, benzo O hexa benzotriazolyl group, quinazolyl group, phthalazyl group), a Hajime Tamaki (eg Pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (for example, methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc.), cycloalkoxy group ( For example, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (eg, phenoxy group, naphthyloxy group, etc.), alkylthio group (eg, methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group) Group, octylthio group, dodecylthio group, etc.), cycloalkylthio group (for example, cyclopentylthio group, cyclohexylthio group, etc.), arylthio group (for example, furylthio group, naphthylthio group, etc.), alkoxycarbonyl group (for example, For example, methylo Xyloxy group, ethyoxycarbol group, butyloxycarbol group, octyloxycarbol group, dodecyloxycarbol group, etc.), aryloxycarboro group (For example, phenylcarbol group, naphthyloxycarol group, etc.), sulfamoyl group (for example, aminosulfol group, methylaminosulfol group, dimethylaminosulfol group, butylaminosulfol group) Group, hexylaminosulfol group, cyclohexylaminosulfol group, octylaminosulfol group, dodecylaminosulfol group, phenolaminosulfol group, naphthylaminosulfol group, 2 —Pyridylaminosulfol group, etc.), acyl group (eg, acetyl group, ethyl carbonate group, propyl carbon group, pentyl carbonate group, cyclohexyl carbon group, octyl group) A carboxy group, a 2-ethylhexyl carbo yl group, a dodecyl carbo ol group, a vinyl carbo ol group, a naphthyl carbo ol group, a pyridyl carbo ol group, etc.), an acyloxy group (for example, an acetyloxy group, Ethyl carbo-loxy group, Butyl carbo-loxy group, Octyl carbo- loxy group, Dodecyl carbonyloxy group, Phenol carbonyloxy group, etc.) Amide group (for example, methylcarbonylamino group, ethylcarbo-lamino group, dimethylcarboxyl group) -Luamino group, propyl carbolumino group, pentyl carbolumino group, cyclohexyl carbolumino group, 2-ethyl hexyl carbolumino group, octyl carbolumino group, dodecyl carbolumino group, phenol carbolumino group , Naphthylcarbo-amino groups, etc.), rubamoyl groups (eg amino Carbo - group, methyl § amino carbo - group, dimethyl § amino carbo - group, flop port pills aminocarboxy - group, pentyl Rua amino carbo - group, hexyl § amino carbonitrile cyclohexane Group, octylaminocarbol group, 2-ethylhexylaminocarbol group, dodecylaminocarbol group, phenolaminocarbol group, naphthylaminocarbol group, 2-pyridyl Aminocarbole group, etc.), ureido group (for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octylureido group, dodecylureido group, phenolureido group, naphthylureido group, 2- Pyridylaminoureido group, etc.), sulfier groups (for example, methylsulfuryl group, ethylsulfyl group, butylsulfuryl group, cyclohexylsulfuryl group, 2-ethylhexylsulfuryl group, dodecylsulfuryl group, phenol) -Rulsulfyl group, naphthylsulfuryl group, 2-pyridylsulfyl group, etc.), alkylsulfol group ( For example, a methylsulfol group, an ethylsulfol group, a butylsulfol group, a cyclohexylsulfol group, a 2-ethylhexylsulfol group, a dodecylsulfol group, etc.), an arylsulfol group (for example, A phenylsulfol group, a naphthylsulfol group, a 2-pyridylsulfol group, etc.), an amino group (for example, an amino group, an ethylamino group, a dimethylamino group, a butylamino group, a cyclopentylamino group, a 2-ethylhexylamino group, Dodecylamino group, arlino group, naphthylamino group, 2-pyridylamino group, etc.), halogen atom (eg, fluorine atom, chlorine atom, bromine atom, etc.), fluorinated hydrocarbon group (eg, fluoromethyl group, trifluoromethyl group, etc.) Group, pentafluoroethyl group, pentafluorophenyl group, etc.), cyan group, silyl group (for example, trimethyl) Silyl group, tri-isopropyl building silyl group, triflate - Rushiriru group, full - Rujechirushiri Le group). Among these, R is preferably an alkyl group or an alkoxy group.

[0055] これらの置換基は上記の置換基によってさらに置換されていても、複数が互いに結 合して環を形成して 、てもよ 、。  [0055] These substituents may be further substituted with the above-described substituents, or a plurality thereof may be bonded to each other to form a ring.

[0056] 本発明に係るチォフェンオリゴマーは、構造中に、 Head— to— Head構造を持た ないことが好ましぐそれに加えて、さらに好ましくは Head— to— Tail構造または Tai 1 to— Tail構造を有することである。本発明に係る Head— to— Head構造、 Head — to— Tail構造、 Tail— to—Tail構造については、例えば、『π電子系有機固体』( 1998年、学会出版センター発行、日本化学界編) 27〜32頁、 Adv. Mater. 1998 , 10, No. 2, 93〜116頁等により参照できる。 [0057] 以下、本発明に係る一般式(1)または(2)で表される化合物の具体例を示すが、本 発明はこれらに限定されない。 [0056] The thiophene oligomer according to the present invention preferably has no head-to-head structure in the structure, more preferably a head-to-tail structure or a Tai 1 to-tail structure. It is to have. For the head-to-head structure, head-to-tail structure, and tail-to-tail structure according to the present invention, for example, “π-electron organic solids” (1998, published by the Japan Society of Chemistry) 27-32 pages, Adv. Mater. 1998, 10, No. 2, pages 93-116, etc. Hereinafter, specific examples of the compound represented by the general formula (1) or (2) according to the present invention will be shown, but the present invention is not limited thereto.

[0058] [化 4] [0058] [Chemical 4]

Figure imgf000019_0001
Figure imgf000019_0001

[0059] [化 5] [0059] [Chemical 5]

[9^ ] [0900] [9 ^] [0900]

Figure imgf000020_0001
[ΐ9οο]
Figure imgf000020_0001
[ΐ9οο]

Figure imgf000021_0001
Figure imgf000021_0001

lllC0C/900Zdf/X3d 61· ΪΖΪ860/900Ζ OAV lllC0C / 900Zdf / X3d 61 · 860 / 900Ζ OAV

[ ] [2900] [] [2900]

Figure imgf000022_0001
Figure imgf000022_0001

TllC0C/900Zdf/X3d 03 ΪΖΪ860/900Ζ OAV TllC0C / 900Zdf / X3d 03 ΪΖΪ860 / 900Ζ OAV

[6^ ] [S900] [6 ^] [S900]

Figure imgf000023_0001
Figure imgf000023_0001

TllC0C/900Zdf/X3d ΪΖΪ860/900Ζ OAV TllC0C / 900Zdf / X3d ΪΖΪ860 / 900Ζ OAV

[Οΐ^ ] 900] [Οΐ ^] 900]

Figure imgf000024_0001
Figure imgf000024_0001

TllC0C/900Zdf/X3d zz ΪΖΪ860/900Ζ OAV [π¾] [S900] TllC0C / 900Zdf / X3d zz ΪΖΪ860 / 900Ζ OAV [π¾] [S900]

Figure imgf000025_0001
Figure imgf000025_0001

TllC0C/900Zdf/X3d ΪΖΪ860/900Ζ OAV TllC0C / 900Zdf / X3d ΪΖΪ860 / 900Ζ OAV

Figure imgf000026_0001
Figure imgf000026_0001

[0066] [化 12] [0066] [Chemical 12]

[ετ^ ] [ 900] [ετ ^] [900]

Figure imgf000027_0001
Figure imgf000027_0001

lllf0f/900ldf/13d 93 ΙΠ860/900Ζ ΟΛ lllf0f / 900ldf / 13d 93 ΙΠ860 / 900Ζ ΟΛ

[fl^] [8900] [fl ^] [8900]

Figure imgf000028_0001
Figure imgf000028_0001

Ul£0£/900Zd£/13d 93 IJ1860/900Z OAV Ul £ 0 £ / 900Zd £ / 13d 93 IJ1860 / 900Z OAV

Figure imgf000029_0001
Figure imgf000029_0001

[0069] 以下に、これらの化合物の合成例を示す。 [0069] Synthesis examples of these compounds are shown below.

[0070] (化合物 12の合成) [0070] (Synthesis of Compound 12)

下記スキームによりィ匕合物 12を合成した。  Compound 12 was synthesized according to the following scheme.

[0071] [化 15] [0071] [Chemical 15]

Figure imgf000030_0001
Figure imgf000030_0001

〈中間体 2の合成〉 <Synthesis of Intermediate 2>

J. Phys. Chem., 99, 10, 1995, 3218— 3224に従って合成した中間体 1 6g をジクロロメタン 240mlと酢酸 120mlの混合溶媒中に溶解し、室温で N -ブロモスク シンイミド 2gを分割して加えた。還流下で 3時間攪拌した後、室温まで戻し得られた 反応混合物を 5質量%水酸化カリウム水溶液、水、飽和食塩水で洗った。溶媒を留 去したのち、カラムクロマトグラフィーにて目的物を単離し、中間体 2を 3. 8g得た (収 率 55%)。 Intermediate synthesized according to J. Phys. Chem., 99, 10, 1995, 3218-3224 was dissolved in a mixed solvent of 240 ml of dichloromethane and 120 ml of acetic acid, and 2 g of N-bromosuccinimide was added in portions at room temperature. . After stirring under reflux for 3 hours, the reaction mixture obtained by returning to room temperature was washed with 5 mass% aqueous potassium hydroxide solution, water and saturated brine. After the solvent was distilled off, the target product was isolated by column chromatography to obtain 3.8 g of intermediate 2. Rate 55%).

[0073] 〈化合物 12の合成〉  <Synthesis of Compound 12>

窒素雰囲気下、 THF40ml中に中間体 2を 1. 2g、中間体 3を 2g、テトラキス(トリフ ェ-ルホスフィン)パラジウム(0)を 0. 3g、 20質量0 /0炭酸カリウム水溶液 lmlをカロえ、 還流下 72時間攪拌した。得られた反応混合物を水、飽和食塩水で洗った後、溶媒 を留去し、カラムクロマトグラフィーによりィ匕合物 12を 0. 5g得た (収率 19%)。得られ た化合物 12の分子構造は、 1H- NMR (核磁気共鳴スペクトル)及び質量スぺタト ル測定を行い、目的物と矛盾しないことを確認した。さらに HPLC測定した結果より 9 9%以上の純度であることを確認した。 Under a nitrogen atmosphere, Intermediate 2 1. 2 g in 40 ml of THF, Intermediate 3 2 g, tetrakis (triflates E - Le phosphine) palladium 0. 3 g, 20 weight 0/0 aqueous solution of potassium carbonate lml the a (0) Karoe The mixture was stirred for 72 hours under reflux. The obtained reaction mixture was washed with water and saturated brine, the solvent was evaporated, and 0.5 g of Compound 12 was obtained by column chromatography (yield 19%). The molecular structure of the resulting compound 12 was confirmed by 1H-NMR (nuclear magnetic resonance spectrum) and mass spectral measurement to be consistent with the target product. Furthermore, it was confirmed that the purity was 99% or more from the result of HPLC measurement.

[0074] 他の化合物も同様にして合成できる。  [0074] Other compounds can be synthesized in the same manner.

[0075] 〔有機半導体膜、有機半導体デバイス、有機薄膜トランジスタ及び有機薄膜トランジ スタの形成方法〕  [Organic Semiconductor Film, Organic Semiconductor Device, Organic Thin Film Transistor, and Organic Thin Film Transistor Forming Method]

本発明の有機半導体膜、有機半導体デバイス、有機薄膜トランジスタ及び有機薄 膜トランジスタの形成方法にっ 、て説明する。  The method for forming the organic semiconductor film, organic semiconductor device, organic thin film transistor, and organic thin film transistor of the present invention will be described.

[0076] 本発明の有機半導体材料は、有機半導体膜、有機半導体デバイス、有機薄膜トラ ンジスタの半導体層に用いることにより、良好に駆動する有機半導体デバイス、有機 薄膜トランジスタを提供することができる。有機薄膜トランジスタは、支持体上に、半導 体層として有機半導体で連結されたソース電極とドレイン電極を有し、その上にゲー ト絶縁層を介してゲート電極を有するトップゲート型と、支持体上にまずゲート電極を 有し、ゲート絶縁層を介して有機半導体で連結されたソース電極とドレイン電極を有 するボトムゲート型に大別される。  [0076] By using the organic semiconductor material of the present invention for the semiconductor layer of an organic semiconductor film, an organic semiconductor device, or an organic thin film transistor, an organic semiconductor device and an organic thin film transistor that are driven well can be provided. An organic thin film transistor has a source electrode and a drain electrode connected with an organic semiconductor as a semiconductor layer on a support, a top gate type having a gate electrode on the gate electrode via a gate insulating layer, and a support. First, it is roughly divided into a bottom gate type having a gate electrode and having a source electrode and a drain electrode connected by an organic semiconductor through a gate insulating layer.

[0077] 本発明の有機半導体材料を有機半導体膜、有機半導体デバイス、有機薄膜トラン ジスタの半導体層に設置するには、真空蒸着により基板上に設置することもできるが [0077] In order to install the organic semiconductor material of the present invention on a semiconductor layer of an organic semiconductor film, an organic semiconductor device, or an organic thin film transistor, it can be installed on a substrate by vacuum deposition.

、適切な溶媒に溶解し必要に応じ添加剤を加えて調製した溶液をキャストコート、ス ピンコート、印刷、インクジェット法、アブレーシヨン法等によって基板上に設置するの が好ましい。 The solution prepared by dissolving in an appropriate solvent and adding additives as necessary is preferably placed on the substrate by cast coating, spin coating, printing, ink jet method, abrasion method or the like.

[0078] この場合、本発明の有機半導体材料を溶解する溶媒は、有機半導体材料を溶解し て適切な濃度の溶液が調製できるものであれば格別の制限はな 、が、具体的にはジ ェチルエーテルゃジイソプロピルエーテル等の鎖状エーテル系溶媒、テトラヒドロフ ランやジォキサン等の環状エーテル系溶媒、アセトンゃメチルェチルケトン等のケト ン系溶媒、クロ口ホルムや 1, 2—ジクロロェタン等のハロゲン化アルキル系溶媒、トル ェン、 o—ジクロ口ベンゼン、ニトロベンゼン、 m—タレゾール等の芳香族系溶媒、 N— メチルピロリドン、 2硫ィ匕炭素等を挙げることができる。これらの溶媒のうち、非ハロゲ ン系溶媒を含む溶媒が好ましぐ非ハロゲン系溶媒で構成することが好ましい。 In this case, the solvent for dissolving the organic semiconductor material of the present invention is not particularly limited as long as it can prepare a solution having an appropriate concentration by dissolving the organic semiconductor material. Chain ether solvents such as ethyl ether diisopropyl ether, cyclic ether solvents such as tetrahydrofuran and dioxane, keton solvents such as acetone methylethyl ketone, halogenated forms such as chloroform and 1,2-dichloroethane. Examples include alkyl solvents, toluene, aromatic solvents such as o-dichlorobenzene, nitrobenzene, and m-talezole, N-methylpyrrolidone, and carbon dioxide. Among these solvents, a solvent containing a non-halogen solvent is preferably a non-halogen solvent.

[0079] 本発明の有機薄膜トランジスタは、本発明の有機半導体材料を前述のように半導 体層に用いることが好ましい。また、本発明の有機薄膜トランジスタの形成方法は、 前記半導体層を、これらの有機半導体材料を含有する溶液または分散液を塗布す ることにより形成することが好ましい。有機半導体材料を溶解する溶媒は、前記非ハ ロゲン系溶媒を含む溶媒が好ましぐ非ハロゲン系溶媒で構成することが好ましい。  [0079] In the organic thin film transistor of the present invention, the organic semiconductor material of the present invention is preferably used for the semiconductor layer as described above. In the method for forming an organic thin film transistor of the present invention, the semiconductor layer is preferably formed by applying a solution or dispersion containing these organic semiconductor materials. The solvent that dissolves the organic semiconductor material is preferably composed of a non-halogen solvent that is preferably a solvent containing the non-halogen solvent.

[0080] 本発明にお 、て、ソース電極、ドレイン電極及びゲート電極を形成する材料は導電 性材料であれば特に限定されず、白金、金、銀、ニッケル、クロム、銅、鉄、錫、アン チモン鈴、タンタル、インジウム、パラジウム、テルル、レニウム、イリジウム、ァノレミ-ゥ ム、ルテニウム、ゲルマニウム、モリブデン、タングステン、酸化スズ 'アンチモン、酸化 インジウム'スズ (ITO)、フッ素ドープ酸ィ匕亜鉛、亜鉛、炭素、グラフアイト、グラッシ一 カーボン、銀ペースト及びカーボンペースト、リチウム、ベリリウム、ナトリウム、マグネ シゥム、カリウム、カルシウム、スカンジウム、チタン、マンガン、ジルコニウム、ガリウム 、ニオブ、ナトリウム、ナトリウム一カリウム合金、マグネシウム、リチウム、ァノレミ-ゥム、 マグネシウム Z銅混合物、マグネシウム Z銀混合物、マグネシウム Zアルミニウム混 合物、マグネシウム Zインジウム混合物、アルミニウム Z酸ィ匕アルミニウム混合物、リ チウム Zアルミニウム混合物等が用いられるが、特に、白金、金、銀、銅、アルミ-ゥ ム、インジウム、 ιτο及び炭素が好ましい。あるいはドーピング等で導電率を向上させ た公知の導電性ポリマー、例えば、導電性ポリア-リン、導電性ポリピロール、導電性 ポリチォフェン、ポリエチレンジォキシチォフェンとポリスチレンスルホン酸の錯体等も 好適に用いられる。中でも半導体層との接触面にぉ ヽて電気抵抗が少な ヽものが好 ましい。  In the present invention, the material for forming the source electrode, the drain electrode, and the gate electrode is not particularly limited as long as it is a conductive material. Platinum, gold, silver, nickel, chromium, copper, iron, tin, Antimony bell, tantalum, indium, palladium, tellurium, rhenium, iridium, ano-remium, ruthenium, germanium, molybdenum, tungsten, tin oxide 'antimony, indium oxide' tin (ITO), fluorine-doped zinc oxide, zinc , Carbon, graphite, glassy carbon, silver paste and carbon paste, lithium, beryllium, sodium, magnesium, potassium, calcium, scandium, titanium, manganese, zirconium, gallium, niobium, sodium, sodium monopotassium alloy, magnesium, Lithium, Anoleum, Mug Cium Z copper mixture, magnesium Z silver mixture, magnesium Z aluminum mixture, magnesium Z indium mixture, aluminum Z acid-aluminum mixture, lithium Z aluminum mixture, etc. are used, especially platinum, gold, silver, copper Aluminum, indium, ιτο and carbon are preferred. Alternatively, known conductive polymers whose conductivity has been improved by doping, for example, conductive polyarlin, conductive polypyrrole, conductive polythiophene, polyethylene dioxythiophene and polystyrene sulfonic acid complex, etc. are also suitably used. . Of these, those having low electrical resistance on the contact surface with the semiconductor layer are preferred.

[0081] 電極の形成方法としては、上記を原料として蒸着やスパッタリング等の方法を用い て形成した導電性薄膜を、公知のフォトリソグラフ法やリフトオフ法を用いて電極形成 する方法、アルミニウムや銅等の金属箔上に熱転写、インクジェット等によるレジスト を用いてエッチングする方法がある。また導電性ポリマーの溶液あるいは分散液、導 電性微粒子分散液を直接インクジェットによりパターユングしてもよ ヽし、塗工膜から リソグラフやレーザーアブレーシヨン等により形成してもよい。さらに導電性ポリマーや 導電性微粒子を含むインク、導電性ペースト等を凸版、凹版、平版、スクリーン印刷 等の印刷法でパターユングする方法も用いることができる。 [0081] As a method for forming the electrode, a method such as vapor deposition or sputtering using the above as a raw material is used. There are a method of forming an electrode by using a known photolithographic method and a lift-off method, and a method of etching a metal foil such as aluminum or copper using a resist by thermal transfer, ink jet or the like. Alternatively, the conductive polymer solution or dispersion, or the conductive fine particle dispersion may be directly patterned by inkjet, or may be formed from the coating film by lithography, laser abrasion, or the like. In addition, a method of patterning an ink containing a conductive polymer or conductive fine particles, a conductive paste, or the like by a printing method such as relief printing, intaglio printing, planographic printing, or screen printing can also be used.

[0082] ゲート絶縁層としては種々の絶縁膜を用いることができる力 特に比誘電率の高い 無機酸ィ匕物皮膜が好ましい。無機酸ィ匕物としては、酸化ケィ素、酸ィ匕アルミニウム、 酸化タンタル、酸化チタン、酸化スズ、酸化バナジウム、チタン酸バリウムストロンチウ ム、ジルコニウム酸チタン酸バリウム、ジルコニウム酸チタン酸鉛、チタン酸鉛ランタン 、チタン酸ストロンチウム、チタン酸バリウム、フッ化バリウムマグネシウム、チタン酸ビ スマス、チタン酸ストロンチウムビスマス、タンタノレ酸ストロンチウムビスマス、タンタノレ 酸ニオブ酸ビスマス、トリオキサイドイットリウム等が挙げられる。それらのうち好ましい のは酸化ケィ素、酸ィ匕アルミニウム、酸ィ匕タンタル、酸ィ匕チタンである。窒化ケィ素、 窒化アルミニウム等の無機窒化物も好適に用いることができる。  As a gate insulating layer, various insulating films can be used. In particular, an inorganic oxide film having a high relative dielectric constant is preferable. Examples of inorganic oxides include silicon oxide, aluminum oxide, tantalum oxide, titanium oxide, tin oxide, vanadium oxide, barium strontium titanate, barium zirconate titanate, lead zirconate titanate, titanate Examples include lead lanthanum, strontium titanate, barium titanate, barium magnesium fluoride, bismuth titanate, strontium bismuth titanate, strontium bismuth tantanoate, bismuth tantalate niobate, and trioxide yttrium. Among them, preferable are silicon oxide, acid aluminum, acid tantalum, and acid titanium. Inorganic nitrides such as silicon nitride and aluminum nitride can also be suitably used.

[0083] 上記皮膜の形成方法としては、真空蒸着法、分子線ェピタキシャル成長法、イオン クラスタービーム法、低エネルギーイオンビーム法、イオンプレーティング法、 CVD法 、スパッタリング法、大気圧プラズマ法等のドライプロセスや、スプレーコート法、スピ ンコート法、ブレードコート法、ディップコート法、キャスト法、ロールコート法、バーコ ート法、ダイコート法等の塗布による方法、印刷やインクジェット等のパターユングに よる方法等のウエットプロセスが挙げられ、材料に応じて使用できる。  [0083] Examples of the method for forming the coating include vacuum deposition, molecular beam epitaxy, ion cluster beam, low energy ion beam, ion plating, CVD, sputtering, and atmospheric pressure plasma. Dry process, spray coating method, spin coating method, blade coating method, dip coating method, casting method, roll coating method, bar coating method, die coating method, and other methods by patterning such as printing and inkjet Etc., and can be used depending on the material.

[0084] ウエットプロセスは、無機酸化物の微粒子を、任意の有機溶媒あるいは水に必要に 応じて界面活性剤等の分散補助剤を用いて分散した液を塗布、乾燥する方法や、 酸化物前駆体、例えば、アルコキシド体の溶液を塗布、乾燥する、いわゆるゾルゲル 法が用いられる。これらのうち好ましいのは、大気圧プラズマ法とゾルゲル法である。  [0084] The wet process includes a method of applying and drying a liquid in which fine particles of inorganic oxide are dispersed in an arbitrary organic solvent or water using a dispersion aid such as a surfactant as necessary, or an oxide precursor. A so-called sol-gel method in which a solution of a body, for example, an alkoxide body is applied and dried is used. Among these, the atmospheric pressure plasma method and the sol-gel method are preferable.

[0085] 大気圧下でのプラズマ製膜処理による絶縁膜の形成方法は、大気圧または大気圧 近傍の圧力下で放電し、反応性ガスをプラズマ励起し、基材上に薄膜を形成する処 理で、その方法については特開平 11— 61406号公報、同 11 133205号公報、特 開 2000— 121804号公報、同 2000— 147209号公報、同 2000— 185362号公報 等に記載されている(以下、大気圧プラズマ法とも称する)。これによつて高機能性の 薄膜を、生産性高く形成することができる。 [0085] A method for forming an insulating film by plasma film formation under atmospheric pressure is a process in which discharge is performed under atmospheric pressure or a pressure near atmospheric pressure, and a reactive gas is plasma-excited to form a thin film on a substrate. The method is described in JP-A-11-61406, JP-A-11-133205, JP-A-2000-121804, JP-A-2000-147209, JP-A-2000-185362, etc. Also referred to as atmospheric pressure plasma method). As a result, a highly functional thin film can be formed with high productivity.

[0086] また有機化合物皮膜として、ポリイミド、ポリアミド、ポリエステル、ポリアタリレート、光 ラジカル重合系、光力チオン重合系の光硬化性榭脂、あるいはアクリロニトリル成分 を含有する共重合体、ポリビュルフエノール、ポリビュルアルコール、ノボラック榭脂、 及びシァノエチルプルラン等を用いることもできる。有機化合物皮膜の形成法として は、前記ウエットプロセスが好ましい。無機酸ィ匕物皮膜と有機酸ィ匕物皮膜は積層して 併用することができる。またこれら絶縁膜の膜厚としては、ー般に5011111〜3 111、好 ましくは 100nm〜l μ mである。  [0086] Further, as an organic compound film, polyimide, polyamide, polyester, polyacrylate, photo-radical polymerization system, photopower thione polymerization system photocurable resin, or copolymer containing acrylonitrile component, polybutanol, Polybulal alcohol, novolak rosin, and cyanoethyl pullulan can also be used. The wet process is preferred as a method for forming the organic compound film. An inorganic oxide film and an organic oxide film can be laminated and used together. The film thickness of these insulating films is generally 5011111 to 3111, preferably 100 nm to l μm.

[0087] また、支持体はガラスやフレキシブルな榭脂製シートで構成され、例えば、プラスチ ックフィルムをシートとして用いることができる。前記プラスチックフィルムとしては、例 えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリエー テルスルホン(PES)、ポリエーテルイミド、ポリエーテルエーテルケトン、ポリフエ-レ ンスルフイド、ポリアリレート、ポリイミド、ボリカーボネート(PC)、セルローストリァセテ ート (TAC)、セルロースアセテートプロピオネート(CAP)等力 なるフィルム等が挙 げられる。このように、プラスチックフィルムを用いることで、ガラス基板を用いる場合に 比べて軽量ィ匕を図ることができ、可搬性を高めることができるとともに、衝撃に対する 耐性を向上できる。  [0087] Further, the support is composed of glass or a flexible resin sheet. For example, a plastic film can be used as the sheet. Examples of the plastic film include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polyetherimide, polyetheretherketone, polyethylene-sulfuride, polyarylate, polyimide, polycarbonate ( PC), cellulose triacetate (TAC), and cellulose acetate propionate (CAP). In this way, by using a plastic film, it is possible to achieve lighter weight than when a glass substrate is used, to improve portability, and to improve resistance to impact.

[0088] 以下に、本発明の有機半導体材料を用いて形成された有機半導体膜を用いた有 機薄膜トランジスタについて説明する。  Hereinafter, an organic thin film transistor using an organic semiconductor film formed using the organic semiconductor material of the present invention will be described.

[0089] 図 1は、本発明の有機薄膜トランジスタの構成例を示す図である。同図(a)は、支持 体 6上に金属箔等によりソース電極 2、ドレイン電極 3を形成し、両電極間に本発明の 有機半導体材料からなる有機半導体層 1を形成し、その上に絶縁層 5を形成し、さら にその上にゲート電極 4を形成して有機薄膜トランジスタを形成したものである。同図 (b)は、有機半導体層 1を、(a)では電極間に形成したものを、コート法等を用いて電 極及び支持体表面全体を覆うように形成したものを表す。(c)は、支持体 6上に先ず コート法等を用いて、有機半導体層 1を形成し、その後ソース電極 2、ドレイン電極 3、 絶縁層 5、ゲート電極 4を形成したものを表す。 FIG. 1 is a diagram showing a configuration example of an organic thin film transistor of the present invention. In FIG. 2 (a), a source electrode 2 and a drain electrode 3 are formed on a support 6 with a metal foil or the like, an organic semiconductor layer 1 made of the organic semiconductor material of the present invention is formed between the two electrodes, and the organic semiconductor layer 1 is formed thereon. An insulating layer 5 is formed, and further a gate electrode 4 is formed thereon to form an organic thin film transistor. FIG. 2B shows the organic semiconductor layer 1 formed between the electrodes in FIG. 1A so as to cover the entire surface of the electrode and the support using a coating method or the like. (C) First on the support 6 The organic semiconductor layer 1 is formed using a coating method or the like, and then the source electrode 2, the drain electrode 3, the insulating layer 5, and the gate electrode 4 are formed.

[0090] 同図(d)は、支持体 6上にゲート電極 4を金属箔等で形成した後、絶縁層 5を形成 し、その上に金属箔等で、ソース電極 2及びドレイン電極 3を形成し、該電極間に本 発明の有機半導体材料により形成された有機半導体層 1を形成する。その他同図 (e )、 (f)に示すような構成を取ることもできる。 [0090] In FIG. 4 (d), after forming the gate electrode 4 on the support 6 with a metal foil or the like, the insulating layer 5 is formed thereon, and the source electrode 2 and the drain electrode 3 are formed on the metal foil or the like. Then, an organic semiconductor layer 1 formed of the organic semiconductor material of the present invention is formed between the electrodes. Other configurations such as shown in (e) and (f) of FIG.

[0091] 図 2は、有機薄膜トランジスタシートの概略等価回路図の 1例を示す図である。 FIG. 2 is a diagram showing an example of a schematic equivalent circuit diagram of an organic thin film transistor sheet.

[0092] 有機薄膜トランジスタシート 10はマトリクス配置された多数の有機薄膜トランジスタ 1 1を有する。 7は各有機薄膜トランジスタ 11のゲートバスラインであり、 8は各有機薄膜 トランジスタ 11のソースバスラインである。各有機薄膜トランジスタ 11のソース電極に は、出力素子 12が接続され、この出力 12は例えば液晶、電気泳動素子等であり、表 示装置における画素を構成する。画素電極は光センサの入力電極として用いてもよ い。図示の例では、出力素子として液晶が、抵抗とコンデンサ力もなる等価回路で示 されている。 13は蓄積コンデンサ、 14は垂直駆動回路、 15は水平駆動回路である。 実施例 The organic thin film transistor sheet 10 has a large number of organic thin film transistors 11 arranged in a matrix. 7 is a gate bus line of each organic thin film transistor 11, and 8 is a source bus line of each organic thin film transistor 11. An output element 12 is connected to the source electrode of each organic thin film transistor 11, and this output 12 is, for example, a liquid crystal, an electrophoretic element or the like, and constitutes a pixel in the display device. The pixel electrode may be used as the input electrode of the photosensor. In the illustrated example, the liquid crystal is shown as an output element in an equivalent circuit having resistance and capacitor power. 13 is a storage capacitor, 14 is a vertical drive circuit, and 15 is a horizontal drive circuit. Example

[0093] 以下、実施例を挙げて本発明を詳細に説明するが、本発明はこれらに限定されな い。  Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited thereto.

[0094] 実施例  [0094] Examples

(有機薄膜トランジスタ 1の作製)  (Preparation of organic thin film transistor 1)

ゲート電極としての比抵抗 0. 01 Ω 'cmの Siウェハーに、厚さ 200nmの熱酸化膜 を形成してゲート絶縁層とした後、ォクタデシルトリクロロシランによる表面処理を行つ た。  A 200-nm-thick thermal oxide film was formed on a Si wafer with a specific resistance of 0.01 Ω'cm as the gate electrode to form a gate insulating layer, followed by surface treatment with octadecyltrichlorosilane.

[0095] 比較化合物 1 (ポリ(3—へキシルチオフェン)、 regioregular、アルドリッチ社製、平 均分子量 89000、 PHT)のクロ口ホルム溶液をアプリケーターを用いて塗布し、自然 乾燥することによりキャスト膜 (厚さ 50nm)を形成して、窒素雰囲気下で 50°C、 30分 間の熱処理を施した。  [0095] A coated film of comparative compound 1 (poly (3-hexylthiophene), regioregular, Aldrich, average molecular weight 89000, PHT) was applied using an applicator and allowed to dry naturally to form a cast film ( And a heat treatment was performed at 50 ° C. for 30 minutes in a nitrogen atmosphere.

[0096] さらに、この膜の表面にマスクを用いて金を蒸着してソース電極及びドレイン電極を 形成した。ソース電極及びドレイン電極は幅 100 m、厚さ 200nmで、チャネル幅 W = 3mm、チャネル長 L = 20 μ mの有機薄膜トランジスタ 1を作製した。 Furthermore, gold was deposited on the surface of this film using a mask to form a source electrode and a drain electrode. Source and drain electrodes are 100 m wide, 200 nm thick, and channel width W An organic thin film transistor 1 having a thickness of 3 mm and a channel length L of 20 μm was fabricated.

[0097] (有機薄膜トランジスタ 2及び 3の作製) [0097] (Preparation of organic thin film transistors 2 and 3)

有機薄膜トランジスタ 1の作製において、比較化合物 1を比較化合物 2、 3 (ペンタセ ン、アルドリッチ社製市販試薬を昇華精製して用いた)に各々変更した以外は同様に して、それぞれ有機薄膜トランジスタ 2、 3を作製した。  In the production of the organic thin film transistor 1, the organic thin film transistors 2 and 3 were respectively prepared in the same manner except that the comparative compound 1 was changed to comparative compounds 2 and 3 (Pentacene, Aldrich commercial reagent was used after sublimation purification). Was made.

[0098] [化 16] 比較化合物 1 比較化合物 2 [0098] [Compound 16] Comparative compound 1 Comparative compound 2

Figure imgf000036_0001
比較化合物 3
Figure imgf000036_0002
Figure imgf000036_0001
Comparative compound 3
Figure imgf000036_0002

[0099] (有機薄膜トランジスタ 4〜9の作製) [0099] (Production of organic thin film transistors 4-9)

有機薄膜トランジスタ 1の作製において、比較化合物 1の代わりに、表 1に記載の本 発明の有機半導体材料に変更した以外は同様にして、有機薄膜トランジスタ 4〜9を 作製した。本発明の有機半導体材料の分子量はいずれも 1万以下であった。  Organic thin film transistors 4 to 9 were produced in the same manner as in the production of the organic thin film transistor 1, except that the organic semiconductor material of the present invention described in Table 1 was used instead of the comparative compound 1. All of the molecular weights of the organic semiconductor materials of the present invention were 10,000 or less.

[0100] (キャリア移動度及び ONZOFF値の評価)  [0100] (Evaluation of carrier mobility and ONZOFF value)

得られた有機薄膜トランジスタ 1〜9について、作製直後と大気中で 1ヶ月放置後の 各素子のキャリア移動度と ON/OFF値を求めた。なお、本発明では、 I—V特性の 飽和領域力 キャリア移動度を求め、さらに、ドレインバイアス一 50Vとし、ゲートバイ ァス 50V及び 0Vにしたときのドレイン電流値の比率から ONZOFF比を求めた。  With respect to the obtained organic thin film transistors 1 to 9, the carrier mobility and ON / OFF value of each element were determined immediately after fabrication and after being left in the atmosphere for 1 month. In the present invention, the saturation region force carrier mobility of the IV characteristic is obtained, and further, the ONZOFF ratio is obtained from the ratio of the drain current value when the drain bias is 50 V and the gate bias is 50 V and 0 V.

[0101] 得られた結果を表 1に示す。  [0101] The results obtained are shown in Table 1.

[0102] [表 1] 作製直後 1 力月放 S後 [0102] [Table 1] Immediately after fabrication After Rikitsu S

有機 TFT 有機半導体  Organic TFT Organic semiconductor

素子 No. 移動度 移動度 備 考  Element No. Mobility Mobility Remarks

材料 ON/OFF値 ON/OFF値  Material ON / OFF value ON / OFF value

(cnVVsec)  (cnVVsec)

1 比較化合物 1 t .0X10—2 1.2X103 2.0X1CT1 1.1 X10' 比較例 1 Comparative compound 1 t .0X10— 2 1.2X10 3 2.0X1CT 1 1.1 X10 'Comparative example

2 比較化合物 2 6.8X10"3 4.2X105 1.5X10"4 3.2X104 比較例 2 Comparative compound 2 6.8X10 " 3 4.2X10 5 1.5X10" 4 3.2X10 4 Comparative example

3 比較化合物 3 3.2X10"5 2.2X101 測定不能 測定不能 比較例 3 Comparative compound 3 3.2X10 " 5 2.2X10 1 Unmeasurable Unmeasurable Comparative example

4 例示化合物 9 2.7X10"1 4.5X105 2.1 X10"' 4.3X105 本発明 4 Exemplary compounds 9 2.7X10 " 1 4.5X10 5 2.1 X10"'4.3X10 5 The present invention

5 例示化合物 12 2,2Χί0_1 5.0X105 1.4X10— 1 4.8X105 本発明 5 Exemplary compounds 12 2,2Χί0 _1 5.0X10 5 1.4X10— 1 4.8X10 5 The present invention

6 例示化合物 18 3.8X10"1 4.8X105 3.2X1CT' 4.4X105 本発明 6 Exemplary compounds 18 3.8X10 " 1 4.8X10 5 3.2X1CT '4.4X10 5 The present invention

7 例示化合物 23 1 ,5X10"' 4.6X105 0.9X1CT1 4.0X105 本発明 7 Exemplified compound 23 1,5X10 "'4.6X10 5 0.9X1CT 1 4.0X10 5

8 例示化合物 26 2.0X10— 1 4.2X105 1.4X10一1 3.7X105 本発明 8 Exemplified Compound 26 2.0X10- 1 4.2X10 5 1.4X10 one 1 3.7 × 10 5 invention

9 例示化合物 0 2.5X10—' 4.7X105 1.9X10"' 4.0X105 本発明 表 1から、比較の有機半導体材料を用いて作製した比較の有機薄膜トランジスタと 比べて、本発明の有機半導体材料を用いて作製した有機薄膜トランジスタ 4〜9は、 作製直後においても優れたトランジスタ特性を示し、かつ、経時劣化が少ないという 高 ヽ耐久性を併せ持つと ヽうことが分かる。 9 Exemplary compounds 0 2.5X10— '4.7X10 5 1.9X10 "' 4.0X10 5 Present invention From Table 1, the organic semiconductor material of the present invention is used in comparison with the comparative organic thin film transistor fabricated using the comparative organic semiconductor material. It can be seen that the organic thin film transistors 4 to 9 produced in this way have excellent transistor characteristics even immediately after production and have high durability with little deterioration with time.

Claims

請求の範囲 The scope of the claims [1] 下記一般式 (1)で表される化合物を含有することを特徴とする有機半導体材料。  [1] An organic semiconductor material comprising a compound represented by the following general formula (1): 一般式(1) Ar -L-Ar  General formula (1) Ar -L-Ar 1 2  1 2 (式中、 Ar及び Arは水素原子または置換基を表し、 Ar及び Arの少なくとも 1つは  (In the formula, Ar and Ar represent a hydrogen atom or a substituent, and at least one of Ar and Ar is 1 2 1 2 芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水素縮合環または 芳香族複素縮合環であり、 Lは芳香族炭化水素環または芳香族複素環を含む共役 系をもって結合した連結基を表す。 )  1 2 1 2 Aromatic hydrocarbon condensed ring or aromatic heterocyclic condensed ring condensed with aromatic hydrocarbon ring or aromatic heterocyclic ring, L is bonded with a conjugated system containing aromatic hydrocarbon ring or aromatic heterocyclic ring Represents a linking group. ) [2] 前記 Ar及び Arが、芳香族炭化水素環または芳香族複素環が縮合した芳香族炭 [2] Aromatic carbon in which Ar and Ar are condensed with an aromatic hydrocarbon ring or an aromatic heterocyclic ring 1 2  1 2 化水素縮合環または芳香族複素縮合環であることを特徴とする請求の範囲第 1項に 記載の有機半導体材料。  2. The organic semiconductor material according to claim 1, which is a hydrogen fluoride condensed ring or an aromatic hetero condensed ring. [3] 下記一般式 (2)で表される化合物を含有することを特徴とする有機半導体材料。  [3] An organic semiconductor material comprising a compound represented by the following general formula (2): [化 1] 一般式 >
Figure imgf000038_0001
[Chemical formula 1] General formula>
Figure imgf000038_0001
(式中、 Ar 及び Ar は水素原子または置換基を表し、 Ar 及び Ar の少なくとも 1つ (Wherein Ar and Ar represent a hydrogen atom or a substituent, and at least one of Ar and Ar 21 22 21 22  21 22 21 22 は、芳香族炭化水素環または芳香族複素環が縮合した芳香族炭化水素縮合環また は芳香族複素縮合環であり、 R 及び R は水素原子または置換基を表し、 L は芳香  Is an aromatic hydrocarbon condensed ring or an aromatic hetero condensed ring condensed with an aromatic hydrocarbon ring or an aromatic hetero ring, R and R represent a hydrogen atom or a substituent, and L is an aromatic 21 22 21 族炭化水素環または芳香族複素環を含む共役系をもって結合した連結基を表す。) 前記 Ar 及び Ar 力 芳香族炭化水素環または芳香族複素環が縮合した芳香族炭 21 22 Represents a linking group bonded through a conjugated system containing a group 21 hydrocarbon ring or aromatic heterocycle. Aromatic charcoal in which Ar and Ar force aromatic hydrocarbon rings or aromatic heterocycles are condensed 21 22 21 22 化水素縮合環または芳香族複素縮合環であることを特徴とする請求の範囲第 3項に 記載の有機半導体材料。  4. The organic semiconductor material according to claim 3, which is a hydrogen fluoride condensed ring or an aromatic hetero condensed ring. 前記一般式(1)または(2)で表される化合物の分子量が 1万以下であることを特徴と する請求の範囲第 1〜4項のいずれか 1項に記載の有機半導体材料。  The organic semiconductor material according to any one of claims 1 to 4, wherein the compound represented by the general formula (1) or (2) has a molecular weight of 10,000 or less. 前記一般式(1)または (2)で表される化合物が、下記一般式 (3)で表される部分構 造を有することを特徴とする請求の範囲第 1〜5項のいずれか 1項に記載の有機半 導体材料。 6. The compound according to any one of claims 1 to 5, wherein the compound represented by the general formula (1) or (2) has a partial structure represented by the following general formula (3). Organic half as described in Conductor material. [化 2]  [Chemical 2] 一般式 (3)
Figure imgf000039_0001
General formula (3)
Figure imgf000039_0001
(式中、 Ar 〜Ar は芳香族炭化水素環または芳香族複素環であり、 R は置換基で (In the formula, Ar to Ar are aromatic hydrocarbon rings or aromatic heterocyclic rings, and R is a substituent. 31 33 31 あり、 R及び R は水素原子または置換基を表す。)  31 33 31 and R and R represent a hydrogen atom or a substituent. ) 32 33  32 33 [7] 前記一般式(1)における Lまたは前記一般式(2)における L 1S 前記一般式(3)で  [7] L in the general formula (1) or L 1S in the general formula (2) In the general formula (3) 21  twenty one 表される部分構造を有することを特徴とする請求の範囲第 1〜5項のいずれか 1項に 記載の有機半導体材料。  The organic semiconductor material according to any one of claims 1 to 5, wherein the organic semiconductor material has a partial structure represented. [8] 前記一般式(1)における Lまたは前記一般式(2)における L 力 置または無置換の [8] L in the general formula (1) or L in the general formula (2) or unsubstituted 21  twenty one チォフェン環を含むことを特徴とする請求の範囲第 1〜5項のいずれか 1項に記載の 有機半導体材料。  6. The organic semiconductor material according to claim 1, comprising a thiophene ring. [9] 前記一般式(1)における Lまたは前記一般式(2)における L 力 置換または無置換  [9] L in the general formula (1) or L force in the general formula (2) Substituted or unsubstituted 21  twenty one のチオフ ン環が 2個以上連結した部分構造を有することを特徴とする請求の範囲 第 1〜5項のいずれか 1項に記載の有機半導体材料。  6. The organic semiconductor material according to claim 1, wherein the organic semiconductor material has a partial structure in which two or more thiophene rings are connected. [10] 前記一般式(1)または (2)で表される化合物が、下記一般式 (4)で表される部分構 造を有することを特徴とする請求の範囲第 1〜5項のいずれか 1項に記載の有機半 導体材料。 [10] The compound according to any one of claims 1 to 5, wherein the compound represented by the general formula (1) or (2) has a partial structure represented by the following general formula (4): Or the organic semiconductor material according to item 1. [化 3]  [Chemical 3] —般式 (4>
Figure imgf000039_0002
—General formula (4>
Figure imgf000039_0002
(式中、 Rは置換基を表す。) (In the formula, R represents a substituent.) 前記一般式(1)における Lまたは前記一般式(2)における L 力 前記一般式 (4)で 表される部分構造を有することを特徴とする請求の範囲第 1〜5項のいずれか 1項に 記載の有機半導体材料。 L in the general formula (1) or L force in the general formula (2) In the general formula (4) The organic semiconductor material according to any one of claims 1 to 5, wherein the organic semiconductor material has a partial structure represented. [12] 請求の範囲第 1〜11項のいずれか 1項に記載の有機半導体材料を含有することを 特徴とする有機半導体膜。 [12] An organic semiconductor film comprising the organic semiconductor material according to any one of claims 1 to 11. [13] 請求の範囲第 1〜11項のいずれか 1項に記載の有機半導体材料を用いることを特 徴とする有機半導体デバイス。 [13] An organic semiconductor device characterized by using the organic semiconductor material according to any one of claims 1 to 11. [14] 請求の範囲第 1〜11項のいずれか 1項に記載の有機半導体材料を半導体層に用い ることを特徴とする有機薄膜トランジスタ。 [14] An organic thin film transistor, wherein the organic semiconductor material according to any one of claims 1 to 11 is used for a semiconductor layer. [15] 前記半導体層を、請求の範囲第 1〜11項のいずれか 1項に記載の有機半導体材料 を含有する溶液または分散液を塗布することにより形成することを特徴とする有機薄 膜トランジスタの形成方法。 [15] The organic thin film transistor, wherein the semiconductor layer is formed by applying a solution or a dispersion containing the organic semiconductor material according to any one of claims 1 to 11. Forming method.
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