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WO2005116760A3 - Photosensitive resin composition, and cured product and use thereof - Google Patents

Photosensitive resin composition, and cured product and use thereof Download PDF

Info

Publication number
WO2005116760A3
WO2005116760A3 PCT/JP2005/009999 JP2005009999W WO2005116760A3 WO 2005116760 A3 WO2005116760 A3 WO 2005116760A3 JP 2005009999 W JP2005009999 W JP 2005009999W WO 2005116760 A3 WO2005116760 A3 WO 2005116760A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
meth
photosensitive resin
compound
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2005/009999
Other languages
French (fr)
Other versions
WO2005116760A2 (en
Inventor
Hirofumi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to EP05745837A priority Critical patent/EP1759244A2/en
Priority to US11/579,920 priority patent/US20070166642A1/en
Publication of WO2005116760A2 publication Critical patent/WO2005116760A2/en
Anticipated expiration legal-status Critical
Publication of WO2005116760A3 publication Critical patent/WO2005116760A3/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)

Abstract

The invention relates to a photosensitive resin composition comprising (A) an epoxy(meth)acrylate resin synthesized from components containing (a) epoxy prepolymer, (b) an unsaturated group-containing monocarboxylic acid and (c) an acid anhydride, (B) a urethane (meth)acrylate resin synthesized from components containing (d) a dihydroxyl compound having a carboxyl group, (e) a polyol compound having an number average molecular weight of 200 to 20,000, (f) a hydroxyl compound having a (meth)acryloyl group and (g) diisocyanate compound, (C) an epoxy resin, (D) a diluent, (E) a photopolymerization initiator and if appropriate (F) inorganic ion exchanger, and cured product and use thereof. The photosensitive resin composition of the invention having good photosensitivity, developability, flexibility and property exhibiting excellent HHBT performance can be suitably used in printed circuit boards.
PCT/JP2005/009999 2004-05-26 2005-05-25 Photosensitive resin composition, and cured product and use thereof Ceased WO2005116760A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP05745837A EP1759244A2 (en) 2004-05-26 2005-05-25 Photosensitive resin composition, and cured product and use thereof
US11/579,920 US20070166642A1 (en) 2004-05-26 2005-05-25 Photosensitive resin composition, and cured product and use thereof

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004156492 2004-05-26
JP2004-156492 2004-05-26
US57603004P 2004-06-02 2004-06-02
US60/576,030 2004-06-02

Publications (2)

Publication Number Publication Date
WO2005116760A2 WO2005116760A2 (en) 2005-12-08
WO2005116760A3 true WO2005116760A3 (en) 2007-01-25

Family

ID=37684662

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/009999 Ceased WO2005116760A2 (en) 2004-05-26 2005-05-25 Photosensitive resin composition, and cured product and use thereof

Country Status (5)

Country Link
US (1) US20070166642A1 (en)
EP (1) EP1759244A2 (en)
CN (1) CN1965267A (en)
TW (1) TW200613903A (en)
WO (1) WO2005116760A2 (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200630447A (en) 2004-11-19 2006-09-01 Showa Denko Kk Resin cured film for flexible printed wiring board and production process thereof
JP5399603B2 (en) * 2005-10-07 2014-01-29 昭和電工株式会社 Thermosetting resin composition containing silicone powder
JP4839092B2 (en) * 2006-01-30 2011-12-14 矢崎総業株式会社 Inkjet ink for wire marking
JP4994922B2 (en) * 2007-04-06 2012-08-08 太陽ホールディングス株式会社 Solder resist composition and cured product thereof
KR100940174B1 (en) * 2007-04-27 2010-02-03 다이요 잉키 세이조 가부시키가이샤 Manufacturing method of printed wiring boards and printed wiring boards
CN101520602B (en) * 2008-02-28 2011-09-07 新力美科技股份有限公司 Radiation-curable developable polyurethane and radiation-curable developable photoresist composition containing same
KR101048329B1 (en) * 2008-10-06 2011-07-14 주식회사 엘지화학 Urethane-based multifunctional monomer, a manufacturing method thereof and a photosensitive resin composition comprising the same
JP4318743B1 (en) * 2008-10-07 2009-08-26 昭和高分子株式会社 Ultraviolet curable removable pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet using the same
JP5404028B2 (en) * 2008-12-25 2014-01-29 東京応化工業株式会社 Method for manufacturing substrate to be etched
JP5515394B2 (en) * 2009-04-30 2014-06-11 株式会社ピーアイ技術研究所 Photosensitive modified polyimide resin composition and use thereof
TWI395027B (en) * 2009-05-01 2013-05-01 Ind Tech Res Inst Sealant composition
WO2010147090A1 (en) * 2009-06-15 2010-12-23 東洋インキ製造株式会社 Urethane resin, adhesive curable with actinic energy rays, and back protective sheet for solar cell
CN102792224A (en) * 2010-03-08 2012-11-21 株式会社Lg化学 Photosensitive resin composition and protective film for printed circuit boards having excellent heat resistance and mechanical properties
CA2755151C (en) 2010-10-18 2014-06-17 Valspar Sourcing, Inc. Anti-graffiti coatings
KR101332436B1 (en) * 2010-12-06 2013-11-22 제일모직주식회사 Anisotropic conductive film
CN102181019B (en) * 2011-03-18 2014-08-13 湖北工业大学 Ultraviolet (UV)-curing plasma display circuit protective agent with silver ion migration resistance and preparation method thereof
CN110083010A (en) * 2011-08-10 2019-08-02 日立化成株式会社 The manufacturing method of photosensitive polymer combination, photosensitive film, permanent resist and permanent resist
WO2013084283A1 (en) 2011-12-05 2013-06-13 日立化成株式会社 Method for forming protective film for touch panel electrodes, photosensitive resin composition, and photosensitive element
KR20170106655A (en) * 2011-12-05 2017-09-21 히타치가세이가부시끼가이샤 Method for forming protective film on electrode for touch panel, photosensitive resin composition and photosensitive element, and method for manufacturing touch panel
WO2013084282A1 (en) 2011-12-05 2013-06-13 日立化成株式会社 Method for forming resin cured film pattern, photosensitive resin composition, and photosensitive element
CN103305133B (en) * 2013-06-18 2015-02-18 北京京东方光电科技有限公司 Frame sealing glue and preparation method thereof as well as liquid crystal display panel and liquid display
KR101562964B1 (en) * 2013-09-02 2015-10-26 주식회사 케이씨씨 Photosensitive resin composition with good reliability and method for preparing the same
US9540529B2 (en) * 2015-01-13 2017-01-10 Xerox Corporation Solder mask compositions for aerosol jet printing
JP6930894B2 (en) * 2017-10-26 2021-09-01 オリンパス株式会社 Resin compositions, flexible tubes, acoustic lenses, and skins for medical devices undergoing gas pasteurization, and medical devices undergoing gas pasteurization
JP7255241B2 (en) * 2018-03-09 2023-04-11 三菱ケミカル株式会社 Active energy ray-curable peelable pressure-sensitive adhesive composition and peelable pressure-sensitive adhesive sheet
CN109467651B (en) * 2018-11-07 2021-01-15 华东理工大学华昌聚合物有限公司 Light-cured epoxy vinyl ester resin and synthetic method thereof
CN109776756A (en) * 2019-01-21 2019-05-21 深圳市道尔顿电子材料有限公司 A kind of dual modified epoxy acrylate and its photoresist
CN110563925B (en) * 2019-09-16 2022-02-01 上海昭和高分子有限公司 Anhydride modified epoxy acrylic resin, alkali development high-heat-resistance polyurethane resin and solder resist ink thereof
CN114716777B (en) * 2020-12-22 2023-07-11 广东生益科技股份有限公司 Transparent resin composition, flexible copper-clad plate containing same and application of transparent resin composition

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089376A (en) * 1986-12-08 1992-02-18 Armstrong World Industries, Inc. Photoimagable solder mask coating
EP1094364A1 (en) * 1999-10-20 2001-04-25 Rohm And Haas Company Photoimageable composition having photopolymerizeable binder oligomer
EP1170315A1 (en) * 1999-03-19 2002-01-09 Nippon Kayaku Kabushiki Kaisha Urethane oligomer, resin compositions thereof, and cured article thereof
WO2002023273A2 (en) * 2000-09-11 2002-03-21 Showa Denko K.K. Photosensitive composition, cured article thereof, and printed circuit board using the same
US20020192596A1 (en) * 1998-07-31 2002-12-19 Dai Nippon Printing Co., Ltd. Photosensitive resin composition and color filter
WO2003005126A1 (en) * 2001-07-04 2003-01-16 Showa Denko K.K. Resist curable resin composition and cured article thereof
WO2006054791A1 (en) * 2004-11-19 2006-05-26 Showa Denko K.K. Resin cured film for flexible printed wiring board and production process thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5420171A (en) * 1991-12-31 1995-05-30 Tech Spray, Inc. UV curable temporary solder mask
JP3223678B2 (en) * 1993-12-24 2001-10-29 三菱電機株式会社 Soldering flux and cream solder
US6197149B1 (en) * 1997-04-15 2001-03-06 Hitachi Chemical Company, Ltd. Production of insulating varnishes and multilayer printed circuit boards using these varnishes

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089376A (en) * 1986-12-08 1992-02-18 Armstrong World Industries, Inc. Photoimagable solder mask coating
US20020192596A1 (en) * 1998-07-31 2002-12-19 Dai Nippon Printing Co., Ltd. Photosensitive resin composition and color filter
EP1170315A1 (en) * 1999-03-19 2002-01-09 Nippon Kayaku Kabushiki Kaisha Urethane oligomer, resin compositions thereof, and cured article thereof
EP1094364A1 (en) * 1999-10-20 2001-04-25 Rohm And Haas Company Photoimageable composition having photopolymerizeable binder oligomer
WO2002023273A2 (en) * 2000-09-11 2002-03-21 Showa Denko K.K. Photosensitive composition, cured article thereof, and printed circuit board using the same
WO2003005126A1 (en) * 2001-07-04 2003-01-16 Showa Denko K.K. Resist curable resin composition and cured article thereof
WO2006054791A1 (en) * 2004-11-19 2006-05-26 Showa Denko K.K. Resin cured film for flexible printed wiring board and production process thereof

Also Published As

Publication number Publication date
TW200613903A (en) 2006-05-01
US20070166642A1 (en) 2007-07-19
EP1759244A2 (en) 2007-03-07
WO2005116760A2 (en) 2005-12-08
CN1965267A (en) 2007-05-16

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