WO2005030366A1 - Method for the purification of sulphur hexafluoride gas mixtures by means of photolysis - Google Patents
Method for the purification of sulphur hexafluoride gas mixtures by means of photolysis Download PDFInfo
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- WO2005030366A1 WO2005030366A1 PCT/EP2004/010671 EP2004010671W WO2005030366A1 WO 2005030366 A1 WO2005030366 A1 WO 2005030366A1 EP 2004010671 W EP2004010671 W EP 2004010671W WO 2005030366 A1 WO2005030366 A1 WO 2005030366A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B17/00—Sulfur; Compounds thereof
- C01B17/45—Compounds containing sulfur and halogen, with or without oxygen
- C01B17/4507—Compounds containing sulfur and halogen, with or without oxygen containing sulfur and halogen only
- C01B17/4515—Compounds containing sulfur and halogen, with or without oxygen containing sulfur and halogen only containing sulfur and fluorine only
- C01B17/453—Sulfur hexafluoride
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/30—Sulfur compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/804—UV light
Definitions
- the invention relates to a method for cleaning SF 6 , which is used as a protective, insulating and arc quenching gas.
- SF 6 is a non-toxic, inert gas with high dielectric strength and thermal stability.
- SF 6 is chemically inert and stable, it is one of the most inert substances. So it can be heated up to 500 ° C without decomposition. Commonly used materials such as metals, glass, ceramics are resistant to SF 6 up to temperatures of approx. 150 ° C.
- the object of the invention is to provide a process for the purification of sulfur hexafluoride gas mixtures with which toxic compounds can be removed without the sulfur hexafluoride being destroyed, so that the purified sulfur hexafluoride z. B. easily reused, or can be traced back to the SF 6 manufacturing process.
- the process according to the invention combines the known process stages of gas scrubbing, adsorption and / or membrane separation with a photolytic treatment.
- the toxic compound S 2 F ⁇ 0 which is formed by the connection of two SF 5 radicals, converted photolytically.
- z. B. CF4, SOF2, SO2F2, SO2, S2F-10 may be included.
- the main impurities can be removed by washing, adsorption or membrane separation.
- S2F10 can be destroyed with light with a wavelength of 104 to 107 nm, SF 6 and SF could be detected as fission products, but a further splitting of the SF 6 cannot be ruled out here.
- SF is very sensitive to hydrolysis, it reacts with water to form SOF 2 and HF. It has been found that a selective decomposition of the S 2 F- ⁇ 0 is possible by irradiation with light with a wavelength of 130 to 255 nm, preferably 253.7 nm, without destroying the SF 6 .
- the contaminated SF 6 gas mixture is introduced after a gas wash into a container in which a light source with a wavelength of 130 to 255 nm is arranged and irradiated.
- the residence time of the gas mixture in the radiation container depends on the amount of S 2 F 10 contained in the SF 6 gas. A flow rate of 0.6 to 8 l / min. was found to be sufficient.
- a light source with monochromatic or polychromatic radiation in the UV range e.g. B. an excimer laser with emission bands in the range of 130 to 255 nm, or a UV lamp with a line spectrum of z. B. 253.7 nm can be used.
- the light source is expediently embedded in a Pyrex immersion tube or quartz glass tube.
- the gas mixture can be introduced from the photolysis container into a gas scrubber, where, for. B. the oxidized fluorine compounds are washed out.
- the completeness of the photolytic conversion can e.g. B. be checked by gas chromatography.
- gas mixture pre-cleaned in this way can additionally be contacted with hydrophobic zeolites before entering a membrane separation stage.
- the gas mixture irradiated with UV light according to the invention is fed to the membrane separation stage after gas washing and drying, where oxygen and nitrogen are separated off.
- the separation can take place on several membrane stages.
- Each membrane separation stage can consist of several membrane cartridges (arranged in parallel).
- Organic, asymmetrical membranes are used as the membrane.
- Rubber-elastic membranes are known which separate on the basis of the solubility of the permeate.
- Other membranes separate due to the diffusibility of the person Permeates, including non-elastic, rather crystalline membranes. The latter are preferably used.
- the membrane can be constructed in a known manner, for example as a bundle of hollow fiber membranes.
- Particularly preferred membranes have a polymeric matrix that has two porous surfaces and a layer that enables the separation of the sulfur hexafluoride from the other gas components.
- the number and arrangement of the membrane cartridges depends on the desired degree of purity. Three membrane separation stages are preferably used.
- the separated as a retentate, purified sulfur hexafluoride can, for. B. be reused in the SF 6 manufacturing process as a raw material.
- the permeate, which contains nitrogen and oxygen in particular, is released into the air after further process steps, for. B. condensation or adsorption has passed through to residual amounts of z. B. SF 6 to remove.
- the laboratory system used consisted of three parts:
- the contaminated SF 6 gas mixture was introduced from a collecting container into a quartz glass reactor in which a UV light source (700 W, 254 nm) is arranged.
- the irradiation volume was 250 ml.
- the gas mixture used represents the composition of used SF5 from electrical applications within one year and contained the following as an impurity:
- the gas mixture was led past the UV light source at a pressure of ⁇ 1 bar.
- the irradiation times ranged from 1 sec to 2 min.
- the gas paths were controlled so that the pure SF 6 was also introduced into the quartz glass container and bypassed the UV light source.
- the parameters pressure, temperature and flow rate were recorded using appropriate sensors.
- the gas composition was filled in a gas chromatograph (GC) with a separation column (SS-2m • 1/8 "• 2 mm) filled with Porasil C and determined with a DID (discharge ionization detector).
- GC gas chromatograph
- SS-2m • 1/8 "• 2 mm separation column
- DID discharge ionization detector
- the concentrations of air and sulfur hexafluoride were determined before and after the photolytic treatment. It was found that there was no change.
- the determination of the S 2 F 10 content and the identification of the impurities in the collection containers were carried out before the laboratory test was carried out by GC-DID and infrared analysis.
- 0 converted to hydratable fluorides.
- These can e.g. B. be removed from the gas by washing with water or alkaline medium. It is also possible to separate the fluorides formed by condensation.
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- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
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- Health & Medical Sciences (AREA)
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Abstract
Description
Solvay Fluor und Derivate GmbH 30173 Hannover Solvay Fluor und Derivate GmbH 30173 Hanover
VERFAHREN ZUR REINIGUNG VON SCH EFELHEXAFLUORID-GASGEMISCHEN MITTELS PHOTOLYSEMETHOD FOR PURIFYING SCH EFEL HEXAFLUORIDE GAS MIXTURES BY MEANS OF PHOTOLYSIS
Beschreibungdescription
Die Erfindung bezieht sich auf ein Verfahren zur Reinigung von SF6, welches als Schutz-, Isolier- und Lichtbogenlöschgas eingesetzt wird.The invention relates to a method for cleaning SF 6 , which is used as a protective, insulating and arc quenching gas.
SF6 ist ein ungiftiges, inertes Gas von hoher dielektrischer Durchschlagsfestigkeit und thermischer Stabilität.SF 6 is a non-toxic, inert gas with high dielectric strength and thermal stability.
Es wird daher z. B. in Produktionsanlagen, in Hochspannungsschaltanlagen, in Mittelspannungsschaltanlagen, in Transformatoren, gasisolierten Leitungssystemen oder Meßwandlern eingesetzt. Ein besonderer Vorteil des eingesetzten SF6 besteht darin, daß es Lichtbögen löschen kann oder diese nicht entstehen läßt.It is therefore z. B. used in production plants, in high-voltage switchgear, in medium-voltage switchgear, in transformers, gas-insulated line systems or transducers. A particular advantage of the SF 6 used is that it can extinguish arcs or prevent them from occurring.
Unter normalen Bedingungen ist SF6 chemisch inert und beständig, es zählt zu den reaktionsträgsten Stoffen. So kann es ohne Zersetzung bis auf 500 °C erhitzt werden. Bis zu Temperaturen von ca. 150 °C sind üblicherweise verwendete Materialien wie Metalle, Glas, Keramik gegenüber SF6 beständig.Under normal conditions SF 6 is chemically inert and stable, it is one of the most inert substances. So it can be heated up to 500 ° C without decomposition. Commonly used materials such as metals, glass, ceramics are resistant to SF 6 up to temperatures of approx. 150 ° C.
Erst oberhalb 200 °C beginnen einige Metalle zersetzend auf das Gas einzuwirken. Bei den üblichen Gebrauchsmetallen und Legierungen ist eine merkliche Zersetzung erst im Temperaturbereich zwischen 400 °C und 600 °C zu beobachten.Only above 200 ° C do some metals begin to decompose the gas. With common metals and alloys, a noticeable decomposition can only be observed in the temperature range between 400 ° C and 600 ° C.
Elektrische Entladungen zersetzen das Gas in einem Umfang, welcher der umgesetzten Energie proportional ist Unter dem Einfluß des elektrischen Lichtbogens wird ein Teil des Schwefelhexafluorids in seine Bestandteile zerlegt. Die Reaktion ist reversibel. Nach dem Verlöschen der Entladung wird der Ausgangszustand des Isoliergases wieder hergestellt; soweit nicht Sekundärreaktionen mit verdampftem Elektrodenmetall, der Behälterwand oder anderen Bauteilen eintreten. Bei diesen Reaktionen können sowohl feste als auch gasförmige Reaktionsprodukte entstehen; derartige Folgeprodukte sind zum Teil ebenfalls gute Dielektrika, so daß keine nachteiligen Folgen für die Funktionstüchtigkeit der Anlagen eintreten. Dies gilt jedoch nur, solange der Feuchtigkeitsgehalt im Gasraum gering ist. Allerdings können hierbei unter bestimmten Voraussetzungen Zerfallsprodukte wie z. B. S2F10 gebildet werden, welches hochtoxisch ist und deshalb entfernt werden muß. Die gebildeten Mengen an S2F10 sind jedoch sehr gering, so daß bisher kein technisches Verfahren zur Entfernung dieses Stoffes zur Verfügung steht.Electrical discharges decompose the gas to an extent that is proportional to the energy converted. Under the influence of the electric arc, part of the sulfur hexafluoride is broken down into its components. The reaction is reversible. After the discharge has extinguished, the initial state of the insulating gas is restored; unless secondary reactions with evaporated electrode metal, the container wall or other components occur. Both solid and gaseous reaction products can result from these reactions; Such follow-up products are also partly good dielectrics, so that there are no negative consequences for the functionality of the systems. However, this only applies as long as the moisture content in the gas space is low. However, under certain conditions, decay products such. B. S 2 F 10 are formed, which is highly toxic and must therefore be removed. However, the amounts of S 2 F 10 formed are very small, so that no technical process for removing this substance has been available to date.
Die Aufgabe der Erfindung ist es, ein Verfahren zur Reinigung von Schwefelhexafluo- rid-Gasgemischen anzugeben, mit dem toxische Verbindungen entfernt werden können, ohne daß das Schwefelhexafluorid zerstört wird, damit das gereinigte Schwefelhexafluorid z. B. problemlos einer Wiederverwendung zugeführt, bzw. in den SF6-Herstellprozeß zurückgeführt werden kann.The object of the invention is to provide a process for the purification of sulfur hexafluoride gas mixtures with which toxic compounds can be removed without the sulfur hexafluoride being destroyed, so that the purified sulfur hexafluoride z. B. easily reused, or can be traced back to the SF 6 manufacturing process.
Das erfindungsgemäße Verfahren kombiniert die bekannten Verfahrensstufen Gaswäsche, Adsorption und/oder Membrantrennung mit einer photolytischen Behandlung.The process according to the invention combines the known process stages of gas scrubbing, adsorption and / or membrane separation with a photolytic treatment.
Erfindungsgemäß wird z. B. die toxische Verbindung S2Fι0, welche durch die Verbindung zweier SF5-Radikale entsteht, photolytisch umgewandelt.According to the z. B. the toxic compound S 2 Fι 0 , which is formed by the connection of two SF 5 radicals, converted photolytically.
Es ist bekannt, daß Schwefelhexafluorid-Gasgemische durch Waschen mit Lauge oder Wasser und durch Adsorption z. B. mit Al203 oder durch Membrantrennung gereinigt werden können.It is known that sulfur hexafluoride gas mixtures by washing with lye or water and by adsorption z. B. can be cleaned with Al 2 0 3 or by membrane separation.
Als Verunreinigungen können in Abhängigkeit von Verwendungszweck des Schwefel- hexafluorid-Gasgemisches z. B. CF4, SOF2, SO2F2, SO2, S2F-10 enthaften sein. Durch Waschen, Adsorption oder Membrantrennung können die hauptsächlichen Verunreinigungen entfernt werden.Depending on the intended use of the sulfur hexafluoride gas mixture, z. B. CF4, SOF2, SO2F2, SO2, S2F-10 may be included. The main impurities can be removed by washing, adsorption or membrane separation.
Mit den bekannten Verfahren ist es jedoch nicht möglich, die geringen Mengen des hochtoxischen S2Fι0 zu entfernen.With the known methods, however, it is not possible to remove the small amounts of the highly toxic S 2 Fι 0 .
Es ist bekannt, daß S2F10 mit Licht einer Wellenlänge von 104 bis 107 nm zerstört werden kann als Spaltprodukte konnten SF6 und SF nachgewiesen werden, eine weitere Aufspaltung des SF6 ist hierbei jedoch nicht auszuschließen. SF ist stark hydrolyseempfindlich, es reagiert mit Wasser unter Bildung von SOF2 und HF. Es wurde.gefunden, daß eine selektive Zersetzung des S2F-ι0 durch Bestrahlung mit Licht einer Wellenlänge von 130 bis 255 nm, vorzugsweise 253,7 nm möglich ist, ohne das SF6 zu zerstören.It is known that S2F10 can be destroyed with light with a wavelength of 104 to 107 nm, SF 6 and SF could be detected as fission products, but a further splitting of the SF 6 cannot be ruled out here. SF is very sensitive to hydrolysis, it reacts with water to form SOF 2 and HF. It has been found that a selective decomposition of the S 2 F-ι 0 is possible by irradiation with light with a wavelength of 130 to 255 nm, preferably 253.7 nm, without destroying the SF 6 .
In einer Ausführungsform wird das verunreinigte SF6-Gasgemisch nach einer Gaswäsche in einen Behälter, in dem eine Lichtquelle einer Wellenlänge von 130 bis 255 nm angeordnet ist, eingeleitet und bestrahlt. Die Verweildauer des Gasgemisches in dem Bestrahlungsbehälter ist abhängig von der Menge des im SF6-Gas enthaltenen S2F10. Eine Durchflußrate von 0,6 bis 8 l/min. wurde als ausreichend gefunden.In one embodiment, the contaminated SF 6 gas mixture is introduced after a gas wash into a container in which a light source with a wavelength of 130 to 255 nm is arranged and irradiated. The residence time of the gas mixture in the radiation container depends on the amount of S 2 F 10 contained in the SF 6 gas. A flow rate of 0.6 to 8 l / min. was found to be sufficient.
Als Lichtquelle kann beispielsweise eine Lichtquelle mit einer monochromatischen oder polychromatischen Abstrahlung im UV-Bereich, z. B. ein Excimer-Laser mit Emissionsbanden im Bereich von 130 bis 255 nm, oder eine UV-Lampe mit einem Linienspektrum von z. B. 253,7 nm verwendet werden.As a light source, for example, a light source with monochromatic or polychromatic radiation in the UV range, e.g. B. an excimer laser with emission bands in the range of 130 to 255 nm, or a UV lamp with a line spectrum of z. B. 253.7 nm can be used.
Zweckmäßigerweise ist die Lichtquelle in ein Pyrex-Tauchrohr bzw. Quarzglasrohr eingelassen.The light source is expediently embedded in a Pyrex immersion tube or quartz glass tube.
Nachdem das S2F10 vollständig umgewandelt ist, kann das Gasgemisch aus dem Photolysebehälter in einen Gaswäscher eingeleitet werden, wo z. B. die oxidierten Fluorverbindungen herausgewaschen werden.After the S 2 F 10 has been completely converted, the gas mixture can be introduced from the photolysis container into a gas scrubber, where, for. B. the oxidized fluorine compounds are washed out.
Die Vollständigkeit der photolytischen Umwandlung kann z. B. gaschromatographisch überprüft werden.The completeness of the photolytic conversion can e.g. B. be checked by gas chromatography.
Es ist ebenfalls möglich, daß das so vorgereinigte Gasgemisch vor Eintritt in eine Membrantrennstufe noch zusätzlich mit hydrophoben Zeolithen kontaktiert werden kann.It is also possible that the gas mixture pre-cleaned in this way can additionally be contacted with hydrophobic zeolites before entering a membrane separation stage.
Das erfindungsgemäß mit UV-Licht bestrahlte Gasgemisch wird in einer bevorzugten Ausführungsform nach einer Gaswäsche und der Trocknung der Membrantrennstufe zugeführt, wo Sauerstoff und Stickstoff abgetrennt werden. Die Trennung kann an mehreren Membranstufen erfolgen. Jede Membrantrennstufe kann aus mehreren Membrankartuschen (parallel angeordnet) bestehen. Als Membran werden organische, asymmetrische Membranen verwendet. Bekannt sind gummielastische Membranen, die auf der Basis der Löslichkeit des Permeats trennen. Andere Membranen trennen aufgrund der Diffusionsfähigkeit des Per- Permeats, darunter sind nichtgummielastische, eher kristalline Membranen zu verstehen. Bevorzugt werden letztere eingesetzt.In a preferred embodiment, the gas mixture irradiated with UV light according to the invention is fed to the membrane separation stage after gas washing and drying, where oxygen and nitrogen are separated off. The separation can take place on several membrane stages. Each membrane separation stage can consist of several membrane cartridges (arranged in parallel). Organic, asymmetrical membranes are used as the membrane. Rubber-elastic membranes are known which separate on the basis of the solubility of the permeate. Other membranes separate due to the diffusibility of the person Permeates, including non-elastic, rather crystalline membranes. The latter are preferably used.
Die Membran kann in bekannter Weise aufgebaut sein, beispielsweise als Bündel von Hohlfasermembranen. Besonders bevorzugte Membranen weisen eine polymere Matrix auf, die zwei poröse Oberflächen aufweist und eine Schicht, die die Trennung des Schwefel- hexafluorids von den anderen Gasbestandteilen ermöglicht.The membrane can be constructed in a known manner, for example as a bundle of hollow fiber membranes. Particularly preferred membranes have a polymeric matrix that has two porous surfaces and a layer that enables the separation of the sulfur hexafluoride from the other gas components.
Die Anzahl und die Anordnung der Membrankartuschen richtet sich nach dem gewünschten Reinheitsgrad. Bevorzugt werden drei Membrantrennstufen verwendet.The number and arrangement of the membrane cartridges depends on the desired degree of purity. Three membrane separation stages are preferably used.
Das als Retentat abgetrennte, gereinigte Schwefelhexafluorid kann z. B. in den SF6-Herstellprozeß als Rohstoff wiederverwendet werden. Das Permeat, das insbesondere Stickstoff und Sauerstoff enthält, wird in die Luft abgegeben, nachdem es weitere Prozeßstufen, z. B. Kondensation oder Adsorption, durchlaufen hat, um Restmengen von z. B. SF6 zu entfernen.The separated as a retentate, purified sulfur hexafluoride can, for. B. be reused in the SF 6 manufacturing process as a raw material. The permeate, which contains nitrogen and oxygen in particular, is released into the air after further process steps, for. B. condensation or adsorption has passed through to residual amounts of z. B. SF 6 to remove.
Das nachfolgende Beispiel soll die Erfindung weiter erläutern, ohne es jedoch einzuschränken.The following example is intended to explain the invention further, but without restricting it.
Beispiel:Example:
Die photolytische Behandlung des verunreinigten Schwefelhexafluorid-Gasgemisches wurde im Labor durchgeführt.The photolytic treatment of the contaminated sulfur hexafluoride gas mixture was carried out in the laboratory.
Die eingesetzte Laboranlage bestand aus drei Teilen:The laboratory system used consisted of three parts:
1. Gasteil:1st gas section:
- Sammelbehälter gefüllt mit reinem SF6,- collection container filled with pure SF 6 ,
- Sammelbehälter gefüllt mit verunreinigtem SF6 - Collection container filled with contaminated SF 6
- Verdampfungseinheit,- evaporation unit,
- Ventile, Rohrleitungen.- valves, piping.
2. Elektrischer Teil:2. Electrical part:
- handelsübliche UV-Lampe mit einer Wellenlänge von 254 nm und 700 W,- commercially available UV lamp with a wavelength of 254 nm and 700 W,
- Transformator. 3. Wäscher- transformer. 3. Washer
Aus einem Sammelbehälter wurde das verunreinigte SF6 -Gasgemisch in einen Quarzglasreaktor, in dem eine UV-Lichtquelle (700 W, 254 nm) angeordnet ist, eingeleitet.The contaminated SF 6 gas mixture was introduced from a collecting container into a quartz glass reactor in which a UV light source (700 W, 254 nm) is arranged.
Das Bestrahlungsvolumen betrug 250 ml.The irradiation volume was 250 ml.
Das eingesetzte Gasgemisch repräsentiert die Zusammensetzung von gebrauchtem SF5 aus elektrischen Anwendungen innerhalb eines Jahres und enthielt als Verunreinigung:The gas mixture used represents the composition of used SF5 from electrical applications within one year and contained the following as an impurity:
174 ppm S2F-10 300 ppm SO 200 ppm SO2F2 11500 ppm CF4 15900 ppm Luft174 ppm S2F-10 300 ppm SO 200 ppm SO 2 F 2 11500 ppm CF 4 15900 ppm air
Das Gasgemisch wurde bei einem Druck < 1 bar an der UV-Lichtquelle vorbeigeführt.The gas mixture was led past the UV light source at a pressure of <1 bar.
Die Bestrahlungszeiten lagen bei 1 sec bis 2 min.The irradiation times ranged from 1 sec to 2 min.
Zum Vergleich wurden die Gaswege so gesteuert, daß auch das reine SF6 in den Quarzglasbehälter eingeleitet und an der UV-Lichtquelle vorbeigeleitet wurde. Die Parameter Druck, Temperatur und Durchflußmenge wurden mittels entsprechenden Sensoren aufgenommen.For comparison, the gas paths were controlled so that the pure SF 6 was also introduced into the quartz glass container and bypassed the UV light source. The parameters pressure, temperature and flow rate were recorded using appropriate sensors.
Es konnte gaschromatographisch nachgewiesen werden, daß die gesamte Menge S2F10 umgewandelt worden ist.It could be demonstrated by gas chromatography that the entire amount of S 2 F 10 had been converted.
Die Gaszusammensetzung wurde in einem Gaschromatographen (GC) über eine Trennsäule (SS-2m • 1/8" • 2 mm) befüllt mit Porasil C aufgetrennt und mit einem DID (discharge ionisa- tion detector) bestimmt. Dazu wurde das Gerät mittels Helium spülbarer Kapillaren mit der Gasleitung der Laboranlage verbunden. Die Anschlüsse der Kapillaren befanden sich vor und nach der UV-Quelle, so daß unzersetztes Gas und, nach Umschaltung und Spülung der Kapillare, zersetztes Gas untersucht werden konnte.The gas composition was filled in a gas chromatograph (GC) with a separation column (SS-2m • 1/8 "• 2 mm) filled with Porasil C and determined with a DID (discharge ionization detector). For this purpose, the device was flushed with helium Capillaries connected to the gas line of the laboratory system The connections of the capillaries were located before and after the UV source, so that undecomposed gas and, after switching over and flushing the capillary, decomposed gas could be examined.
Die Konzentrationen von Luft und Schwefelhexafluorid wurden vor und nach der photolyti- schen Behandlung bestimmt. Es konnte festgestellt werden, daß keine Veränderung erfolgte. Die Bestimmung des S2F10-Gehaltes und die Identifizierung der Verunreinigungen in den Sammelbehältern erfolgte vor Durchführung des Laborversuches durch GC-DID und Infrarotanalyse.The concentrations of air and sulfur hexafluoride were determined before and after the photolytic treatment. It was found that there was no change. The determination of the S 2 F 10 content and the identification of the impurities in the collection containers were carried out before the laboratory test was carried out by GC-DID and infrared analysis.
Durch die photolytische Behandlung wird das S2F-|0 zu hydratisierbaren Fluoriden umgewandelt. Diese können z. B. durch Waschen mit Wasser oder alkalischem Medium aus dem Gas entfernt werden. Es ist ebenfalls möglich, die gebildeten Fluoride durch Kondensation abzutrennen. The S 2 F- | 0 converted to hydratable fluorides. These can e.g. B. be removed from the gas by washing with water or alkaline medium. It is also possible to separate the fluorides formed by condensation.
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04765531A EP1667783A1 (en) | 2003-09-26 | 2004-09-23 | Method for the purification of sulphur hexafluoride gas mixtures by means of photolysis |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10344738A DE10344738A1 (en) | 2003-09-26 | 2003-09-26 | Process for the purification of sulfur hexafluoride gas mixtures |
| DE10344738.5 | 2003-09-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005030366A1 true WO2005030366A1 (en) | 2005-04-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2004/010671 Ceased WO2005030366A1 (en) | 2003-09-26 | 2004-09-23 | Method for the purification of sulphur hexafluoride gas mixtures by means of photolysis |
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| Country | Link |
|---|---|
| EP (1) | EP1667783A1 (en) |
| KR (1) | KR20060093720A (en) |
| DE (1) | DE10344738A1 (en) |
| WO (1) | WO2005030366A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101887093A (en) * | 2010-06-29 | 2010-11-17 | 河南省电力公司平顶山供电公司 | The Method of Using Gas Chromatography to Detect Internal Faults of SF6 Electrical Equipment |
| US7909912B2 (en) | 2005-09-12 | 2011-03-22 | Twister B.V. | Method and device for enhancing condensation and separation in a fluid separator |
| CN109364682A (en) * | 2018-11-19 | 2019-02-22 | 庄志斌 | A self-eliminating arc isolation device for air purification equipment in public toilets |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0216663A1 (en) * | 1985-08-22 | 1987-04-01 | Commissariat A L'energie Atomique | Process for the production of sulfur hexafluoride |
| DE19837845A1 (en) * | 1998-08-20 | 2000-02-24 | Solvay Fluor & Derivate | Separation of sulfur trifluoride/nitrogen or air mixtures used as filling gas for underground cables comprises contacting the mixtures with hydrophobic zeolite |
| DE19854549A1 (en) * | 1998-11-26 | 2000-05-31 | Univ Schiller Jena | Process for purifying gases comprises scrubbing the gas using an aqueous cleaning medium while simultaneously treating it with UV light |
| US6179971B1 (en) * | 1999-04-30 | 2001-01-30 | Kse, Inc. | Two stage process and catalyst for photocatalytic conversion of contaminants |
| US6605133B1 (en) * | 1995-07-17 | 2003-08-12 | L'air Liquide - Societe Anonyme A' Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and system for separation and recovery of perfluorocompound gases |
-
2003
- 2003-09-26 DE DE10344738A patent/DE10344738A1/en not_active Withdrawn
-
2004
- 2004-09-23 WO PCT/EP2004/010671 patent/WO2005030366A1/en not_active Ceased
- 2004-09-23 EP EP04765531A patent/EP1667783A1/en not_active Withdrawn
- 2004-09-23 KR KR1020067007828A patent/KR20060093720A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0216663A1 (en) * | 1985-08-22 | 1987-04-01 | Commissariat A L'energie Atomique | Process for the production of sulfur hexafluoride |
| US6605133B1 (en) * | 1995-07-17 | 2003-08-12 | L'air Liquide - Societe Anonyme A' Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and system for separation and recovery of perfluorocompound gases |
| DE19837845A1 (en) * | 1998-08-20 | 2000-02-24 | Solvay Fluor & Derivate | Separation of sulfur trifluoride/nitrogen or air mixtures used as filling gas for underground cables comprises contacting the mixtures with hydrophobic zeolite |
| DE19854549A1 (en) * | 1998-11-26 | 2000-05-31 | Univ Schiller Jena | Process for purifying gases comprises scrubbing the gas using an aqueous cleaning medium while simultaneously treating it with UV light |
| US6179971B1 (en) * | 1999-04-30 | 2001-01-30 | Kse, Inc. | Two stage process and catalyst for photocatalytic conversion of contaminants |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7909912B2 (en) | 2005-09-12 | 2011-03-22 | Twister B.V. | Method and device for enhancing condensation and separation in a fluid separator |
| CN101887093A (en) * | 2010-06-29 | 2010-11-17 | 河南省电力公司平顶山供电公司 | The Method of Using Gas Chromatography to Detect Internal Faults of SF6 Electrical Equipment |
| CN109364682A (en) * | 2018-11-19 | 2019-02-22 | 庄志斌 | A self-eliminating arc isolation device for air purification equipment in public toilets |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060093720A (en) | 2006-08-25 |
| DE10344738A1 (en) | 2005-04-14 |
| EP1667783A1 (en) | 2006-06-14 |
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