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WO2005022209A1 - Miroir ayant un substrat en diamant et destine a une unite de deviation d'un systeme laser, sont procede de production et unite de deviation destinee a un systeme laser - Google Patents

Miroir ayant un substrat en diamant et destine a une unite de deviation d'un systeme laser, sont procede de production et unite de deviation destinee a un systeme laser Download PDF

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Publication number
WO2005022209A1
WO2005022209A1 PCT/EP2004/051396 EP2004051396W WO2005022209A1 WO 2005022209 A1 WO2005022209 A1 WO 2005022209A1 EP 2004051396 W EP2004051396 W EP 2004051396W WO 2005022209 A1 WO2005022209 A1 WO 2005022209A1
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
diamond
substrate
carrier substrate
segments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2004/051396
Other languages
German (de)
English (en)
Inventor
Hans Klingel
Hans Jürgen MAYER
Daniel Metz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Via Mechanics Ltd
Siemens Corp
Original Assignee
Siemens AG
Hitachi Via Mechanics Ltd
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Hitachi Via Mechanics Ltd, Siemens Corp filed Critical Siemens AG
Priority to JP2006524350A priority Critical patent/JP2007503607A/ja
Publication of WO2005022209A1 publication Critical patent/WO2005022209A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
    • H01S3/1024—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping for pulse generation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors

Definitions

  • the invention relates to a mirror for a deflection unit in a laser system, consisting of a flat mirror substrate which has a reflective surface on at least one side.
  • the invention also relates to a method for producing such a mirror and to a deflection unit containing such a mirror.
  • deflection units are used to deflect the laser beam two-dimensionally via at least one, preferably two, movable mirrors and thus to be able to direct the laser beam to every point of a given processing field.
  • galvo motors are used to deflect the mirrors, which enable very fast and precise movement.
  • the requirements for movement speed and accuracy are becoming increasingly high.
  • the smaller the hole diameter to be drilled the larger the mirror, for example, in order to achieve a correspondingly small focal spot after the focusing (F-theta) optics.
  • F-theta focal spot after the focusing
  • the stiffness is given by the ratio of the modulus of elasticity to the density or mass of the mirror substrate.
  • mirrors made of glass or silicon in exceptional cases also made of beryllium, are preferably used in the deflection units.
  • other materials are also possible.
  • the above materials decrease in the order listed in the density (or the mass with a defined mirror size).
  • the modulus of elasticity of all these materials is so small that the stiffness reaches its limits with the mirror sizes and speeds currently used.
  • the aim of the invention is therefore to create a mirror for a laser deflection unit and to specify a production method for it, with which a lower moment of inertia with a consistently high or higher rigidity can be achieved with the same mirror size or mirror surface.
  • this aim is achieved with a mirror of the type mentioned in the introduction in that the mirror substrate consists of diamond. 200312500
  • Diamant has one of the largest moduli of elasticity of all materials, and this results in a higher stiffness, which allows higher working speeds with comparable galvomotors or even makes it possible to use smaller motors with the same mirror size, which in turn have less mass to move , e.g. the axis is lighter.
  • a HOD (highly oriented diamond) synthetic diamond is preferably used for the invention, which has properties comparable to natural diamonds.
  • This diamond is produced in a high-pressure, high-temperature synthesis or in a low-pressure synthesis.
  • Thin diamond films are applied to foreign substrates such as silicon.
  • a method according to the invention for producing a mirror consists in passing several thin diamond layers from the gas phase on a carrier substrate
  • the carrier substrate required for the production of the diamond can be completely or partially removed, for example etched off, in order to keep the inertial mass of the mirror low. It is also possible to leave a framework of struts and ribs standing by partially etching off the carrier substrate, which then contributes to additional stiffening of the mirror. Furthermore, it is also possible to etch corresponding struts or ribs into the diamond layer itself from the rear in order to additionally reduce the mass. 200312500
  • the diamond substrate is formed from a plurality of diamond segments arranged side by side in a surface. These diamond segments, which have, for example, an area of the order of 10 ⁇ 10 mm, each have a higher planarity over the area than, for example, a diamond plate with a side length of 50 mm.
  • the diamond segments can be joined together in various ways to form a larger mirror. It is thus possible to join the diamond segments to one another without a carrier substrate and to glue or bond them to one another. However, they can also be laterally offset and attached to each other in two planes and thus connected to one another.
  • the diamond segments can be glued or bonded to the carrier substrate on one or both sides, it being advantageous to arrange the opposite diamond segments laterally offset.
  • FIG. 1 shows a laser processing arrangement with two galvo mirrors
  • FIG. 2 shows an example of a mirror according to the invention in a perspective view
  • FIG. 3 shows another embodiment of a mirror according to the invention in a view from the rear
  • 6 to 10 further embodiments of a mirror according to the invention, composed of a plurality of diamond segments, each in a side view.
  • FIG. 1 there is schematically an arrangement for processing, i.e. for drilling or structuring printed circuit boards, shown with a laser beam, mirrors according to the invention being used in a deflection unit.
  • a laser beam 2 emitted by a laser 1 is applied to the substrate to be processed, for example, via a deflection unit consisting of two galvo deflection elements 3 and 4 and then via an imaging unit 5, preferably an F-theta lens a printed circuit board 6, which is arranged on a support table 7 and can be adjusted by means of this table at least in two horizontal directions, preferably also in the vertical direction.
  • the deflection element 3 consists of a galvo motor 31 which drives a mirror 32 and pivots about its axis 33 in accordance with the double arrow 34.
  • the deflecting element 4 consists of a galvo motor 41 and a mirror 42 which, according to the double arrow 44, moves around the axis 43. 200312500
  • the pivotal movement of the first mirror 32 directs the laser beam 2 to any desired point on the line 45 on the second mirror 42, and the pivotal movement of the mirror 42 then allows the laser beam to be directed to any point within the surface 61 of the circuit board 6 by there, for example, drilling a hole or structuring a conductor layer.
  • the mirrors of the deflection unit must have the lowest possible mass of inertia, i.e. have a thickness that is as small as possible, but at the same time have a high degree of rigidity, so that after each jumping movement they require no or the least possible post-oscillation time until standstill.
  • the mirrors used in a deflection system do not have to be the same size.
  • the laser beam 2 impinges on the first mirror 3 in the beam path — ideally — only at point 35, while it hits the second mirror at every point along line 45 due to the pivoting movement of this first mirror. can hit.
  • the second mirror 42 must be larger than the first mirror 32.
  • the first mirror can still maintain the required low inertial mass and high rigidity, for example, with a conventional substrate, for example made of glass or silicon, with a substrate thickness d1. while the same working speed can only be achieved with the second mirror 42 with a smaller thickness d2.
  • the second mirror 42 according to the invention has a mirror substrate made of diamond, which ensures the required rigidity with the smaller thickness d2.
  • both mirrors 32 and 42 can be made of diamond.
  • a diamond mirror according to the invention is shown in perspective in FIG. 2, with any other shape being conceivable instead of the octagonal shape shown here.
  • the mirror substrate 10 with a thickness d is provided on its front side with a reflective coating 11, which is preferably specifically matched to the wavelength of the laser used.
  • the thickness d of the diamond mirror substrate can be in the order of magnitude of, for example, 0.2 to 0.5 mm, while this thickness d would be approximately 1 to 2 mm in the case of a conventional mirror substrate made of glass or silicon with an otherwise identical mirror size. Due to the higher modulus of elasticity and the resulting higher stiffness of the diamond, the mirror according to the invention can therefore be significantly thinner, so that it has a lower mass and permits higher working speeds.
  • a carrier substrate 12 is also indicated in FIG. 2, which initially serves as a basis in the production of the diamond substrate 10 and can later be removed in whole or in part to reduce the thickness and the mass of the mirror substrate.
  • FIGS. 3 to 5 show examples of how the carrier substrate 12 can be reduced in its mass and still be used for additional stiffening of the mirror.
  • FIG. 3 shows a mirror substrate 10 seen from the rear. In this case, ribs 14 and struts 15 are exposed through recesses 13, which only slightly increase the mass of the finished mirror substrate, but significantly improve the rigidity of the mirror substrate 10. 4 and 5 show two different examples of such profiles of the carrier substrate.
  • the mirror substrate is composed of several diamond segments.
  • FIGS. 6 to 10 examples of such composite mirror substrates are shown in side view.
  • diamond segments 21 are produced which, due to their small area of, for example, 10 ⁇ 10 mm, have high planarity. These diamond segments can be separated from a diamond plate using an etching process, for example.
  • the diamond segments 21 obtained in this way are joined together and glued or bonded to one another, as a result of which a mirror substrate 20 with the desired larger area is then obtained.
  • the individual diamond segments 21 can be joined together in one plane without an additional carrier substrate.
  • FIG. 7 such diamond segments can also be laterally offset from one another and joined to one another in two planes.
  • an additional carrier substrate 22 can also be used, onto which the diamond segments 21 are glued or bonded either on one side according to FIG. 8 or on both sides according to FIG. In this case too, the opposite diamond segments can be laterally offset, as shown in FIG.
  • struts or certain grids for example according to FIGS. 3 to 5, can also be incorporated into the carrier substrate 22 in this case, which in turn reduce the mass and increase the rigidity.
  • the surface of the composite mirror substrate 20 is also polished and preferably provided with a reflective coating 11.

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Optical Scanning Systems (AREA)

Abstract

L'invention concerne un miroir (42) destiné à une unité de galvo-déviation (3,4) d'un système de traitement laser. Ce miroir comprend un substrat (10) réalisé dans un matériau diamant. Ce substrat peut également être composé de plus petits segments de diamant. Ce substrat (10) en diamant a, pour une faible épaisseur (d2) par rapport aux substrats miroir (32) traditionnels, une grande ridigité et permet ainsi des vitesses de travail plus élevées dans le système laser.
PCT/EP2004/051396 2003-08-26 2004-07-07 Miroir ayant un substrat en diamant et destine a une unite de deviation d'un systeme laser, sont procede de production et unite de deviation destinee a un systeme laser Ceased WO2005022209A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006524350A JP2007503607A (ja) 2003-08-26 2004-07-07 レーザーシステムにおける偏向装置のためのミラー、その製造方法およびレーザーシステムのための偏向装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10339220.3 2003-08-26
DE2003139220 DE10339220B4 (de) 2003-08-26 2003-08-26 Spiegel für eine Ablenkeinheit in einem Lasersystem, Verfahren zu dessen Herstellung sowie Ablenkeinheit für ein Lasersystem

Publications (1)

Publication Number Publication Date
WO2005022209A1 true WO2005022209A1 (fr) 2005-03-10

Family

ID=34258224

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/051396 Ceased WO2005022209A1 (fr) 2003-08-26 2004-07-07 Miroir ayant un substrat en diamant et destine a une unite de deviation d'un systeme laser, sont procede de production et unite de deviation destinee a un systeme laser

Country Status (5)

Country Link
JP (1) JP2007503607A (fr)
KR (1) KR20060058110A (fr)
CN (1) CN1842728A (fr)
DE (1) DE10339220B4 (fr)
WO (1) WO2005022209A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015183619A3 (fr) * 2014-05-21 2016-03-03 Us Synthetic Corporation Miroir comprenant un corps de diamant polycristallin à utiliser avec un moteur, des systèmes de balayage comprenant celui-ci, et procédés associés
US10191190B2 (en) 2013-12-09 2019-01-29 Element Six Technologies Limited Synthetic diamond optical mirrors
CN113447939A (zh) * 2020-03-26 2021-09-28 莱卡地球系统公开股份有限公司 测距装置
EP4180859A1 (fr) 2021-11-16 2023-05-17 Precitec GmbH & Co. KG Dispositif de déviation pourvu d'un élément miroir revêtu et tête d'usinage laser dotée de celui-ci

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2065734A1 (fr) * 2007-11-30 2009-06-03 Plansee Se Miroir destiné au traitement par laser
JP5864949B2 (ja) * 2010-11-29 2016-02-17 ギガフォトン株式会社 極端紫外光生成システム
CN102323631A (zh) * 2011-10-14 2012-01-18 日芯光伏科技有限公司 贴膜式花岗岩基底大口径光学反射镜
DE102015103164B4 (de) 2015-03-04 2022-10-20 Carl Zeiss Microscopy Gmbh Scanvorrichtung mit wenigstens einer eindimensional scannenden Scaneinheit
US10751835B2 (en) * 2015-06-19 2020-08-25 Ipg Photonics Corporation Laser welding head with dual movable mirrors providing beam movement and laser welding systems and methods using same
JP2017129650A (ja) * 2016-01-19 2017-07-27 株式会社ディスコ 走査用ミラー
DE102018205786B4 (de) * 2018-04-17 2025-04-24 TRUMPF Laser SE Scannerspiegel, Scannereinrichtung und Bestrahlungseinrichtung
DE102019202222B4 (de) * 2019-02-19 2023-08-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung

Citations (4)

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DE3809921A1 (de) * 1988-03-24 1989-10-12 Diehl Gmbh & Co Grossflaechiger hochenergie-laserspiegel und verfahren zum herstellen eines solchen spiegels
WO1996038758A1 (fr) * 1995-05-30 1996-12-05 Philips Electronics N.V. Dispositif de commutation et son utilisation
EP0930648A2 (fr) * 1998-01-16 1999-07-21 Sumitomo Electric Industries, Ltd. Boítier semi-conducteur et module semi-conducteur utilisant le boítier
DE19955574A1 (de) * 1999-11-18 2001-07-05 Fraunhofer Ges Forschung Masseoptimierter Laserspiegel zur Laserbearbeitung und Verfahren zur Kühlung der masseoptimierten Spiegel bei der Laserbearbeitung

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US4764003A (en) * 1986-11-03 1988-08-16 The United States Of America As Represented By The Secretary Of The Air Force Optical mirror coated with organic superconducting material
DE3713109A1 (de) * 1987-04-16 1988-11-03 Limess Licht Messtechnik Gmbh Vorrichtung zum vermessen von werkstuecken
DE4102721A1 (de) * 1991-01-30 1992-08-06 Rosenthal Ag Verfahren und vorrichtung zur erzeugung einer sollkontur an einem werkstueck
JP3549228B2 (ja) * 1993-05-14 2004-08-04 株式会社神戸製鋼所 高配向性ダイヤモンド放熱基板
DE4404141A1 (de) * 1994-02-09 1995-08-10 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Laserstrahlformung, insbesondere bei der Laserstrahl-Oberflächenbearbeitung
US5803967A (en) * 1995-05-31 1998-09-08 Kobe Steel Usa Inc. Method of forming diamond devices having textured and highly oriented diamond layers therein
US6544599B1 (en) * 1996-07-31 2003-04-08 Univ Arkansas Process and apparatus for applying charged particles to a substrate, process for forming a layer on a substrate, products made therefrom
DE19941363B4 (de) * 1999-08-31 2006-06-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung eines Mikroaktorbauteils

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3809921A1 (de) * 1988-03-24 1989-10-12 Diehl Gmbh & Co Grossflaechiger hochenergie-laserspiegel und verfahren zum herstellen eines solchen spiegels
WO1996038758A1 (fr) * 1995-05-30 1996-12-05 Philips Electronics N.V. Dispositif de commutation et son utilisation
EP0930648A2 (fr) * 1998-01-16 1999-07-21 Sumitomo Electric Industries, Ltd. Boítier semi-conducteur et module semi-conducteur utilisant le boítier
DE19955574A1 (de) * 1999-11-18 2001-07-05 Fraunhofer Ges Forschung Masseoptimierter Laserspiegel zur Laserbearbeitung und Verfahren zur Kühlung der masseoptimierten Spiegel bei der Laserbearbeitung

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10191190B2 (en) 2013-12-09 2019-01-29 Element Six Technologies Limited Synthetic diamond optical mirrors
WO2015183619A3 (fr) * 2014-05-21 2016-03-03 Us Synthetic Corporation Miroir comprenant un corps de diamant polycristallin à utiliser avec un moteur, des systèmes de balayage comprenant celui-ci, et procédés associés
EP3146370A4 (fr) * 2014-05-21 2018-01-03 US Synthetic Corporation Miroir comprenant un corps de diamant polycristallin à utiliser avec un moteur, des systèmes de balayage comprenant celui-ci, et procédés associés
US9933617B2 (en) 2014-05-21 2018-04-03 Us Synthetic Corporation Mirror including polycrystalline diamond body for use with a motor, scanning systems including the same, and related methods
CN113447939A (zh) * 2020-03-26 2021-09-28 莱卡地球系统公开股份有限公司 测距装置
US11846709B2 (en) 2020-03-26 2023-12-19 Leica Geosystems Ag Distance measuring device
EP4180859A1 (fr) 2021-11-16 2023-05-17 Precitec GmbH & Co. KG Dispositif de déviation pourvu d'un élément miroir revêtu et tête d'usinage laser dotée de celui-ci
DE102021129829A1 (de) 2021-11-16 2023-05-17 Precitec Gmbh & Co. Kg Ablenkvorrichtung mit beschichtetem Spiegelelement sowie Laserbearbeitungskopf mit derselben

Also Published As

Publication number Publication date
CN1842728A (zh) 2006-10-04
DE10339220A1 (de) 2005-04-28
JP2007503607A (ja) 2007-02-22
DE10339220B4 (de) 2006-08-10
KR20060058110A (ko) 2006-05-29

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