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WO2005095671A3 - Verfahren zur herstellung von beschichtungen aus iridiumoxiden - Google Patents

Verfahren zur herstellung von beschichtungen aus iridiumoxiden Download PDF

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Publication number
WO2005095671A3
WO2005095671A3 PCT/DE2005/000399 DE2005000399W WO2005095671A3 WO 2005095671 A3 WO2005095671 A3 WO 2005095671A3 DE 2005000399 W DE2005000399 W DE 2005000399W WO 2005095671 A3 WO2005095671 A3 WO 2005095671A3
Authority
WO
WIPO (PCT)
Prior art keywords
irox
iridium oxide
oxide coatings
production
colloidal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2005/000399
Other languages
English (en)
French (fr)
Other versions
WO2005095671A2 (de
Inventor
Manfred Theodor Reetz
Hendrik Schulenburg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Studiengesellschaft Kohle gGmbH
Original Assignee
Studiengesellschaft Kohle gGmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Studiengesellschaft Kohle gGmbH filed Critical Studiengesellschaft Kohle gGmbH
Priority to EP05735009A priority Critical patent/EP1730328A2/de
Priority to US10/599,434 priority patent/US20080248195A1/en
Priority to JP2007505364A priority patent/JP5090901B2/ja
Publication of WO2005095671A2 publication Critical patent/WO2005095671A2/de
Publication of WO2005095671A3 publication Critical patent/WO2005095671A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
    • C01G55/004—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Electrochemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Paints Or Removers (AREA)
  • Chemically Coating (AREA)

Abstract

Es wird Verfahren zur Herstellung von Beschichtungen aus Iridiumoxid beansprucht, welches die folgenden Schritte umfasst: a) Aufbringen von kolloidalem IrOX, worin x eine Zahl von 1 bis 2 bedeutet, auf eine Oberfläche, b) Trocknen der beschichteten Oberfläche und c) Brennen der Oberfläche bei einer Temperatur von 300 bis 1000°C, wobei die Schritte a bis c wiederholt werden können, bis die gewünschte Schichtdicke erhalten ist. Durch den Einsatz von kolloidalem IrOX als Ausgangskomponente zur Herstellung von Beschichtungen aus IrOX wird die Bildung toxischer Gase während des Brennens vermieden.
PCT/DE2005/000399 2004-03-31 2005-03-09 Verfahren zur herstellung von beschichtungen aus iridiumoxiden Ceased WO2005095671A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP05735009A EP1730328A2 (de) 2004-03-31 2005-03-09 Verfahren zur herstellung von beschichtungen aus iridiumoxiden
US10/599,434 US20080248195A1 (en) 2004-03-31 2005-03-09 Method for the Production of Iridium Oxide Coatings
JP2007505364A JP5090901B2 (ja) 2004-03-31 2005-03-09 酸化イリジウムコーティングの製造方法。

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004015633A DE102004015633A1 (de) 2004-03-31 2004-03-31 Verfahren zur Herstellung von Beschichtungen aus Iridiumoxiden
DE102004015633.6 2004-03-31

Publications (2)

Publication Number Publication Date
WO2005095671A2 WO2005095671A2 (de) 2005-10-13
WO2005095671A3 true WO2005095671A3 (de) 2006-05-11

Family

ID=34965127

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2005/000399 Ceased WO2005095671A2 (de) 2004-03-31 2005-03-09 Verfahren zur herstellung von beschichtungen aus iridiumoxiden

Country Status (5)

Country Link
US (1) US20080248195A1 (de)
EP (1) EP1730328A2 (de)
JP (1) JP5090901B2 (de)
DE (1) DE102004015633A1 (de)
WO (1) WO2005095671A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8124556B2 (en) * 2008-05-24 2012-02-28 Freeport-Mcmoran Corporation Electrochemically active composition, methods of making, and uses thereof
US20160056409A1 (en) * 2013-03-28 2016-02-25 National Institute For Materials Science Organic el element and method for manufacturing same
US9790605B2 (en) 2013-06-27 2017-10-17 Yale University Iridium complexes for electrocatalysis
US10081650B2 (en) 2013-07-03 2018-09-25 Yale University Metal oxide-organic hybrid materials for heterogeneous catalysis and methods of making and using thereof
CN105803482A (zh) * 2016-03-17 2016-07-27 同济大学 一种电解水制氢用电解池的集电极材料的改性方法及用途
KR101773564B1 (ko) 2016-03-31 2017-08-31 유니테크 주식회사 전해반응기용 다공성 이리듐 전극의 제조방법
CN106854001B (zh) * 2016-12-19 2018-06-19 有研亿金新材料有限公司 一种三氯化铱的控制还原制备方法
CN115872466B (zh) * 2022-12-15 2023-09-08 苏州擎动动力科技有限公司 一种铱的氧化物及其制备方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3711385A (en) * 1970-09-25 1973-01-16 Chemnor Corp Electrode having platinum metal oxide coating thereon,and method of use thereof
JPS62254817A (ja) * 1986-04-30 1987-11-06 Fuji Electric Co Ltd 電気浸透式脱水機の陽極電極
US5550706A (en) * 1993-04-24 1996-08-27 Dornier Gmbh Electrode with a long-time stability and a double-layer capacitor formed thereof
US5658355A (en) * 1994-05-30 1997-08-19 Alcatel Alsthom Compagnie Generale D'electricite Method of manufacturing a supercapacitor electrode
WO1998002891A1 (en) * 1996-07-11 1998-01-22 The United States Of America Electrode materials from hydrous metal and/or hydrous mixed metal oxides and method of preparing the same
DE10211701A1 (de) * 2002-03-16 2003-09-25 Studiengesellschaft Kohle Mbh Verfahren zur in situ Immobilisierung von wasserlöslichen nanodispergierten Metalloxid-Kolloiden

Family Cites Families (12)

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NL235848A (de) * 1959-02-06
IT959730B (it) * 1972-05-18 1973-11-10 Oronzio De Nura Impianti Elett Anodo per sviluppo di ossigeno
US3926751A (en) * 1972-05-18 1975-12-16 Electronor Corp Method of electrowinning metals
US4579942A (en) * 1984-09-26 1986-04-01 Union Carbide Corporation Polysaccharides, methods for preparing such polysaccharides and fluids utilizing such polysaccharides
US5156726A (en) * 1987-03-24 1992-10-20 Tdk Corporation Oxygen-generating electrode and method for the preparation thereof
JP2713788B2 (ja) * 1989-12-22 1998-02-16 ティーディーケイ株式会社 酸素発生用電極及びその製造方法
KR100196094B1 (ko) * 1992-03-11 1999-06-15 사토 히로시 산소발생전극
JPH0688270A (ja) * 1992-09-03 1994-03-29 Permelec Electrode Ltd 電解用電極とその製造方法
JPH06346267A (ja) * 1993-06-14 1994-12-20 Daiso Co Ltd 酸素発生用電極及びその製法
JP3368179B2 (ja) * 1997-08-01 2003-01-20 松下電器産業株式会社 電極触媒粉末の作製法
FR2782280B1 (fr) * 1998-08-12 2000-09-22 Inst Francais Du Petrole Catalyseurs supportes utilisables dans des reactions de transformation de composes organiques
JP2003253254A (ja) * 2002-02-28 2003-09-10 Fuji Photo Film Co Ltd 酸化物半導体超微粒子からなる発光層構造物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3711385A (en) * 1970-09-25 1973-01-16 Chemnor Corp Electrode having platinum metal oxide coating thereon,and method of use thereof
JPS62254817A (ja) * 1986-04-30 1987-11-06 Fuji Electric Co Ltd 電気浸透式脱水機の陽極電極
US5550706A (en) * 1993-04-24 1996-08-27 Dornier Gmbh Electrode with a long-time stability and a double-layer capacitor formed thereof
US5658355A (en) * 1994-05-30 1997-08-19 Alcatel Alsthom Compagnie Generale D'electricite Method of manufacturing a supercapacitor electrode
WO1998002891A1 (en) * 1996-07-11 1998-01-22 The United States Of America Electrode materials from hydrous metal and/or hydrous mixed metal oxides and method of preparing the same
DE10211701A1 (de) * 2002-03-16 2003-09-25 Studiengesellschaft Kohle Mbh Verfahren zur in situ Immobilisierung von wasserlöslichen nanodispergierten Metalloxid-Kolloiden

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 198750, Derwent World Patents Index; Class D15, AN 1987-351947, XP002362777 *

Also Published As

Publication number Publication date
US20080248195A1 (en) 2008-10-09
DE102004015633A1 (de) 2005-10-20
WO2005095671A2 (de) 2005-10-13
EP1730328A2 (de) 2006-12-13
JP2007530793A (ja) 2007-11-01
JP5090901B2 (ja) 2012-12-05

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