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WO2005056686A1 - Radiation curing conductive composition - Google Patents

Radiation curing conductive composition Download PDF

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Publication number
WO2005056686A1
WO2005056686A1 PCT/JP2004/018160 JP2004018160W WO2005056686A1 WO 2005056686 A1 WO2005056686 A1 WO 2005056686A1 JP 2004018160 W JP2004018160 W JP 2004018160W WO 2005056686 A1 WO2005056686 A1 WO 2005056686A1
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Prior art keywords
water
radiation
compound
soluble
meth
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French (fr)
Japanese (ja)
Inventor
Takamasa Harada
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AZ Electronic Materials Japan Co Ltd
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AZ Electronic Materials Japan Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • H01B1/124Intrinsically conductive polymers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • H01B1/122Ionic conductors

Definitions

  • the present invention is excellent in adhesion to plastics, glass surfaces, etc., film formation, and transparency
  • the present invention relates to a radiation-curable conductive composition containing an organic conductive polymer, which can form a heat-resistant, abrasion-resistant, scratch-resistant conductive film.
  • the method there are a method of kneading a conductive substance such as a surfactant, a carbon powder, a metal powder and the like into an insulating base material such as a polyester film, a method of blending the above-mentioned conductive substance into an adhesive; It is common practice to coat the back of the tape with a surfactant or other antistatic agent, or to apply an antistatic layer consisting of an ion conductive polymer between the substrate and the adhesive layer. ing. However, if it is attempted to impart sufficient antistatic properties by kneading the conductive material such as carbon powder or metal powder into the substrate, or by blending them, the transparency of the substrate is impaired. There is a drawback.
  • a surfactant is generally used as an antistatic agent for films, packaging materials, etc.
  • the surfactant has a surface resistance (10 ⁇ ⁇ ) that is sufficient to suppress adhesion of dust and dirt.
  • the antistatic ability is susceptible to change due to the influence of ambient moisture and moisture.
  • the surface resistance of the film lowered by the surfactant, and the increase in the low humidity, the desired antistatic ability can not be obtained.
  • film, packaging material surface The adhesion of dust on the skin causes various problems.
  • films without electrostatic interference under low humidity environment are being sought, and for that purpose, the emergence of antistatic agents that give surface resistance values of 10 ⁇ ⁇ or less under low humidity is desired. .
  • organic conductive polymers As these organic conductive polymers, polyaline or polyaline derivatives, polythiophene, polythiophen derivatives, polypyrrole, polyacetylene, polyparaphenylene, polyphenylene bilene, etc. are known (for example, JP-A No. 6-73270). Publication No. 2001-81413). However, since these organic conductive polymers are generally brittle and infusible and insoluble in aqueous solvents and organic solvents, they have a problem of inferior moldability.
  • solubility in such an aqueous solvent is improved by using a poly- or poly- or poly-phosphor derivative and a dopant, and further, if necessary, a water-soluble resin or polymer emulsion, to form a conductive film.
  • Methods have been proposed (see, for example, JP-A-7-330901, JP-A-8-41321, JP-A-8-100060 and JP-A-2000-256617).
  • An object of the present invention is to provide a conductive composition using a base organic conductive polymer which does not have the above problems, and more specifically, a water-soluble or water-soluble organic solvent Using an aqueous solution of an aqueous soluble polymer material or an aqueous emulsion and an organic conductive polymer, the composition does not separate so the formed film is transparent, and the heat resistance 'abrasion resistance' It is an object of the present invention to provide a radiation curable conductive composition capable of forming a conductive film which is hard to stick.
  • the present invention relates to the following radiation-curable conductive compositions, and the above-mentioned object can be achieved by the compositions of the present invention.
  • Organic conductive polymer water-soluble or aqueous emulsion-forming compound, water-soluble or aqueous emulsion-forming epoxy or oxetane compound, photosensitizer, and water and Z or water-soluble organic solvent
  • a radiation curable conductive composition comprising:
  • R represents a hydrogen atom or a methyl group
  • X represents CH 2 CH 2 O—, — [CH 2 CH 2 (CH 2) 2]
  • a radiation curable conductive composition according to the above (5) which is a compound represented by
  • the organic conductive polymer according to any one of (1) to (8) above which is at least one selected from the group consisting of polyaniline, polyaniline derivatives, polythiophen and polithiophen derivatives.
  • the photosensitizer described above is a radical polymerization photosensitizer and Z or a photopower thione polymerization photosensitizer.
  • the radiation-curable conductive composition of the present invention is produced, for example, as follows. That is, for example, for polyarylated polymers such as polyarylin and Z or sulfonic acid polyarylin, a polyester resin bonded with a sulfonic acid group and Z or its alkali metal base, or polythiophen. Against an aqueous solution or aqueous emulsion of an organic conductive polymer, which is made water soluble or dispersible in a poly anion, water soluble or water soluble It is mixed with a water-soluble or aqueous emulsion-forming compound dissolved or dispersed in an organic solvent to form a solution.
  • the water-soluble or aqueous dispersion-forming compound may be a radiation-curable monomer, oligomer or polymer compound, or may be a polymer compound which is not cured by radiation.
  • these radiation-curable monomers, oligomer and polymer compounds, and polymer compounds which are not cured by radiation may be referred to as “base resins”.
  • base resins these radiation-curable monomers, oligomer and polymer compounds, and polymer compounds which are not cured by radiation, may be referred to as “base resins”.
  • base resins In order to improve the adhesion of this solution to the substrate, and the abrasion resistance and scratch resistance of the formed film, an aqueous solution of a water-soluble or aqueous emulsion-forming epoxy or oxetane composite is further added. Or add an aqueous emulsion.
  • a radiation-curable conductive composition can be obtained without separation of the emulsion, and the composition is excellent in transparency and heat resistance. It is preferable to use the base resin and the epoxy or epoxy resin compound in the form of an aqueous emulsion, because it is excellent in abrasion resistance, scratch resistance, and can form a conductive film.
  • an organic conductive polymer is used, and as the organic conductive polymer, for example, polyaniline or a polyaniline derivative, a polythiophen or a polythiophen derivative, a polypyrrole conventionally known as an organic conductive polymer. Any of polyacetylene, polyparaphenylene, and polyethylene can be used. Among these organic conductive polymers, preferred are poly- or poly- or poly- or poly- or poly- or poly- thio derivatives, polysulfone sulfide and the like!
  • Examples of polyarrin or a derivative thereof include those obtained by acid polymerization of a phosphorus represented by the following general formula (III) or a derivative thereof.
  • R 1 may be the same or different, and each may be a hydrogen atom, an alkyl group, an alkoxy group, an alkoxy group, an alkoxy group, an alkylthio group, an aryloxy group, Alkylthio alkyl group, aryl group, alkyl aryl group, aryl alkyl group, alkyl sulfiel group, alkoxy alkyl group, alkyl sulfo group, alkoxy carbonyl group, amino group, alkyl amino group, dialkyl amino group, Represents an arylthio group, an arylsulfyl group, an aryl sulfol group, a carboxyl group, a halogen, a cyano group, a haloalkyl group, a nitroalkyl group or a cyanoalkyl group, and n represents an integer of 0-5.
  • R 1 is a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group, an aryl group, a cyano group, a halogen, an aryloxy group, etc.
  • the compound include: aniline, o -Toluidine, m-toluidine, o-ethylanilin, m-ethylanilin, o-electron anthoxylin, m-butylanillin, m-hexiranilin, m-ability curtyanilin, 2, 3-dimethylanilin, 2, 5- dimethylanilin, Examples thereof include 2,5-dimethoxyvanyrin, o-cyanoanilin, 2,5-dichloroanilin, 2-bromoanilin, 5-chloro-2-methoxyvanyrin, 3-phenoxyphosphorin and the like. These phosphorus or derivatives thereof may be used alone or in combination of two or more
  • a solution of an oxidizing agent is added to a solution or suspension of ananilin and Z or a derivative thereof represented by the above general formula (III) and a protonic acid, It is carried out by stirring at a temperature of 40 ° C. for 30 minutes with force for 48 hours under normal pressure.
  • the oxidizing agent used in the oxidative polymerization include peroxodisulfate ammonium, hydrogen peroxide, and second base iron salts.
  • polyaryls or their derivatives are usually used together with a protic acid dopant and made soluble or dispersible in an aqueous solvent or an organic solvent.
  • a protic acid dopant for example, benzene monosulfonic acids, aromatic acids containing at least one sulfonic acid group and at least one sulfonic acid salt (for example, an alkali metal salt) in the molecule, general formula (IV) : [Chemical Formula 10]
  • R 2 , R 3 and R 2 may be the same or different and each may be an alkylene group or a phenyl group, and p and r each may be the same or different) 1 to 50 Represents an integer of
  • R 5 and R ° may be the same or different, and each has 1 to 10, preferably 2 to 8 carbon atoms, alkyl, alkyl, thioalkyl, aryl
  • R 7 and R 8 independently represent a hydrogen atom or a C 1 C alkyl group, or Taken together optionally substituted C 1 C alkylene groups, preferably optionally alkyl groups
  • R 7 and R 8 are methylene, ethylene 1, 2 and propylene 1, 3 groups, formed by joining together the forces R 7 and R 8 which are preferably methyl or ethyl groups. And ethylene 1, 2 groups are particularly preferred.
  • Examples of the dopants of the above-mentioned polythiophen or polythiophen derivatives include polymeric carboxylic acids such as polyacrylic acid, polymethacrylic acid or polymaleic acid, and polymeric sulfonic acids such as polystyrene sulfonic acid and polyaryl sulfonic acid anions. .
  • polyanions such as these carboxylic acids or sulfonic acids are present, polythiophen or polythiophen derivatives form a complex with these polycarboxylic acids and polysulfonic acids, and polythiophen, etc. contribute to the stabilization of the conductivity of polythiophen derivatives. Contribute to the improvement of the solubility or dispersibility in an aqueous solvent.
  • polymeric carboxylic acids and polymeric sulfonic acids may be copolymers of vinyl carboxylic acids and vinyl sulfonic acids with other polymerizable monomers such as acrylic esters and styrene.
  • the molecular weight Mn of the polyacid supplying the polyan is preferably ⁇ 1,000 to 2,000,000, particularly preferably 2,000 to 500,000.
  • Positive acids or alkali metal salts thereof, such as polystyrene sulfonic acid and polyacrylic acid, are commercially available or can be prepared by known methods.
  • a water-soluble or aqueous dispersion-forming compound is used in the radiation-curable conductive composition of the present invention.
  • the water-soluble or aqueous emulsion-forming compound is used in an amount of 3 to 50% by weight, preferably 5 to 30% by weight, based on the composition.
  • compounds having unsaturated bonds such as unsaturated double bonds include, for example, urethane atalylate, epoxy atalylate, lauri atalylate, ethoxydiethylene glycol atalylate, methoxytrile.
  • Acrylic acid derivatives such as polyvalent acrylate compounds such as borate, tetrapentaerythritol polyarylate and trimethylolpropane acrylic acid benzoate, 2-ethylhexyl meth
  • urethane atalylate monomers, oligomers of urethane atalylate, polymers and the like are described, for example, in JP-A 2003-40955, JP-A 2000-159847, JP-A 2000-118193, and JP-A 11 209448. No. 11-106468, JP-A-8-109230, JP-A-5-222145 and the like, and epoxyallylarylate monomers, oligomers of epoxyallylallylates, polymers, etc.
  • f rows are disclosed in Japanese Patent Application Laid-Open Nos. 2003-238653, 2003-183350, 2003-12660, 2002- 284842, 2002-128863, and the like.
  • urethane atalylates As urethane atalylates, (A) hydroxyl group-containing acrylic acid ester, (B) organic polyisocyanate, (C) polyethylene glycols containing at least one hydroxyl group in a molecule, and (D)
  • the polyurethane acrylate which is a neutralized salt of the reaction product formed by neutralizing a reaction product consisting of a fatty acid containing at least one hydroxyl group in the molecule with (E) tertiary amine is particularly preferable It is.
  • hydroxyl group-containing acrylate ester of the component (A) used to produce the above polyurethane atalylate examples include, for example, 2-hydroxyl (meth) atalylate, 2-hydroxypropyl (meth) atalylate, 2-Hydroxyalkyl (meth) atalylates such as 4-hydroxybutyl (meth) atalylate, polyethylene glycol mono (meth) atalylate, hydroxy alkylene glycol mono (meth) atarilate such as polypropylene glycol mono (meth) atalylate And pentaerythritol triarylate, rosin epoxyallylate, etc., which may be used alone or in combination.
  • the component (B) which is an organic polyisocyanate an organic polyisocyanate having three or more reactive isocyanato groups in the molecule is applicable. Further, its molecular weight is preferably about 500-1000.
  • Specific examples of the component (B) include, for example, 1,6-hexanediisosocyanate, isophoronediisosiate, xylylene diisocyanate, hydrogenated xylylene diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, etc. And trimers obtained from various kinds of diisocyanates, prepolymers obtained by reacting the diisocyanates with polyhydric alcohols such as trimethylolpropane, polymethylenepolypolypolyisocyanate, and the like.
  • polyethylene glycols of component (C) various ones having at least one hydroxyl group in the molecule can be used without particular limitation, but those represented by the following general formula (VII) are particularly used. It is suitable. [Formula 13]
  • R 9 represents an alkyl group having 1 to 14 carbon atoms, and s represents an integer of 7 to 25).
  • the amount of the component (C) used is usually 3 to 12% by weight, preferably 5 to 10% by weight, based on the total amount of the polyurethane atalylate. If the content is less than 3% by weight, the water washability is not sufficient. On the other hand, if it exceeds 12% by weight, it is not preferable because the water resistance of the cured coating is insufficient or the cohesion is insufficient.
  • the fatty acid of component (D) contains at least one hydroxyl group and one carboxyl group in its molecule.
  • the acid value and the hydroxyl value are not particularly limited, but in general, the range of 150 to 500 is preferable.
  • Specific examples of the component (D) include, for example, castor oil fatty acid, hydrogenated castor oil fatty acid, 6-hydroxycaproic acid and the like.
  • the content of the component (D) in the polyurethane atarylate is such that the acid value of the polyurethane atarylate is 10 to 50 mg KOHZg, preferably 15 to 45 mg KOHZg. If the acid value of the polyurethane atarilate is less than 1 Omg KOHZg, insufficient hydrophilicity and stable emulsion can not be obtained. In addition, when the acid value of polyurethane atalylate exceeds 50 mg KOHZg, the hydrophilicity becomes too strong, and a solution of high viscosity can not be obtained.
  • tertiary organic amine of component (E) examples include trimethylamine, trytylamine, N-methyldiethanolamine, triethanolamine and the like. Among these, trimethylamine and trytilamine are particularly preferred. The reason is that when the active energy ray-curable water-containing resin composition is applied and dried, trimethylamine and triethylamine relatively easily evaporate and remain in the coating.
  • epoxy ester (80 MFA manufactured by Kyoeisha Shigaku Co., Ltd.) having triglycerin ditalylate represented by the above-mentioned formula (II) as the main component is particularly preferable.
  • examples of compounds other than the above-mentioned compounds having unsaturated double bonds include the following compounds. That is, methyl (meth) atarylate, ethyl (meth) atarylate, propyol (meth) atarylate, butyl (meth) atarylate, 2-ethylhexyl (meth) atarylate, n-nor (meth) Atalylate, lauryl (meth) atalylate, cyclohexyl (meth) atalylate, cyclohexyl methyl (meth) atalylate, methoxyethyl (meth) atalylate, etoxethyl (meth) atarylate, methoxyethoxyl (meth) Atalylate, Ethoxyethoxethyl (meth) atalylate, Methoxy polyethylene glycol (Meth) atalylate, 2-hydroxyl (meth) atalylate, 4-hydroxybutyl (
  • Monofunctional (meth) acrylamides such as ⁇ , ⁇ -dimethyl (meth) acrylamide, ⁇ - methylol (meth) acrylamide;
  • Methinolevino noreutenore ecinolevino noreetetenore, propinore vinino ree tenore, butynorebi noenoe tenore, 2-echinore hexinorebi-noree tenore, eta-norebi-noreote nore, lauri nore ide Levinino Ree Tenore, Mocke Etche Renovino Ree Tenore, Ethoxyethyl dibi nore ether, Methoxyte qui ecyl bibi nore ether, Ethoxyeto A simple substance such as xycetyl vinyl ether, methoxypolyethylene glycol vinyl ether, 2-hydroxy ethyl vinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol mononole mono binno lee tenore, polyethylene glycono levinone lee tenole, clono
  • N-vinyl compounds such as N-bulone pyrrolidone, N-bulyl proratatam, N-bulyl N methylformamide, N-bulyl imidazole, N-bulyl formamide, N-bulasetoamide and the like;
  • Monofunctional vinyl compounds such as styrene, ⁇ -methylstyrene, toluene, allyl acetate, vinyl acetate, vinyl propionate, vinyl benzoate and the like;
  • maleic anhydride maleic acid, dimethyl maleate, jetyl maleate, monomethyl maleate, monoethyl maleate, fumaric acid, dimethyl fumarate, jetyl fumarate, monomethyl fumarate, monoethyl fumarate, itaconic acid anhydride, itaconic acid, Dimethyl itaconate, jetyl itaconate, monomethyl itaconate, monoethyl itaconate, methylene malonic acid, dimethyl methylene malonate, monomethyl methylene malonate, cinnamic acid, methyl cinnamic acid, ethyl cinnamic acid, crotonic acid, methyl crotonate, Monofunctional ⁇ , ⁇ -unsaturated compounds such as ketyl crotonate;
  • Ethylene glycol di (meth) atalylate diethylene glycol di (meth) atalylate, polyethylene glycol di (meth) atalylate, propylene glycol di (meth) atalylate, butylene glycol di (meth) atalylate, hexane Diol di (meth) atalylate, Thiex Hexane dimethanol di (meth) atalylate, bisphenol ⁇ alkylene oxide di (meth) atalylate, bis phenol F alkylene oxide di (meth) atalylate, trimethyl
  • Multifunctional (meth) (meth) Atarilates Ethylene glycol divinyl ether, diethylene glycol divinyl ether, polyethylene glycol divinyl ether, propylene glycol divinyl ether, butyl glycol divinyl ether, hexanediol divinyl ether, bis phenol A alkylene oxide di vinyl ether, bisphenol phenol F Alkylene oxide di Vininore e nore, Trimethyl nole propane Tri Vinolee Ene Nore, ditri methylo nore propane tetra vinyl ether, glycerin trivinyl ether, pentaerythritol tetra bibi nore etenore, dipenta Erytri Toeno penta bini Nore etenore, dipenta Erys Lithonol Hexabul ether, ethylene oxide-added trimethylolpropane tri Multifunctional buffal ethers such as buff ether, ethylene oxide-a
  • Multifunctional vinyl compounds such as divinylbenzene
  • Ethylene glycol diglycidyl ether diethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, hexanediol diglycidyl ether, bisphenol A alkylene oxide diglycidyl ether, bisphenol F alkylene Oxide diglycidyl ether, trimethylolpropane triglycidyl ether, ditrimethylolpropane tetraglycidyl ether, glycerin triglycidyl ether, pentaerythritole tetraglycidole ether, dipentaerythritole pentaglycidyl ether, dipentaerythryitol hexaglycidyl Ether, ethylene oxide addition Trimethylolpropane triglycidyl ether, ethylene oxide with Caro ditrimethylolprop
  • methyl (meth) atalylate, butyl (meth) atalylate, 2-ethylhexyl (meth) atalylate, methoxypolyethylene glycol (meth) atalylate, (meth) atalic acid, butylbi -Ruethers, cyclohexyl vinyl ethers, maleic anhydride, maleic acid, dimethyl maleate, jetyl maleate and their oligomers and the like are preferable.
  • vinyl ether group-containing acrylic compounds are also preferable compounds.
  • the butyl ether group-containing acrylic compound include bule ether group-containing (meth) acrylic acid esters. The following compounds are preferable as the vinyl ether group-containing (meth) acrylic acid ester.
  • These compounds may be oligomers.
  • examples of the compound which is water-soluble or aqueous dispersion-forming and has no unsaturated bond include, for example, a vinyl acetate polymer, an ethylene / bule ester polymer, an acrylic polymer, and a vinyl chloride polymer.
  • vinylidene chloride polymers, styrene polymers, Resin, polyester, epoxy resin, silicone resin, polybutene, polybutadiene, butadiene copolymer, polyisoprene, polychloroprene, polysulfide rubber, etc. may be mentioned.
  • These water-soluble or aqueous emulsion-forming resins may have a structure containing a radiation-polymerizable unsaturated double bond.
  • water-soluble or aqueous dispersion-forming resin other than the above-mentioned resins such as polyacrylamide and polyvinyl pyrrolidone, a water-soluble or water-dispersible copolymer polyester containing a hydroxyl group or a carboxylic acid group, Acrylic acid resin such as polyacrylic acid and polymethacrylic acid, acrylic acid ester resin such as polyacrylic acid ester and polymethacrylic acid ester resin, ester resin such as polyethylene terephthalate and polybutylene terephthalate, polystyrene, poly ⁇ -Styrene-based resins such as methylstyrene, polychloromethylstyrene, polystyrene sulfone acid and polyphenylphenol, polybutyl ether, polybutyl ether, polybutyl alcohol, polyvinyl alcohol, polyvinyl formal, poly Poly Bulle alcohols such as butyral, a novolak
  • the radiation-curable conductive composition of the present invention In this regard, water-soluble or aqueous emulsion-type (forming) epoxy or oxetane blends are used.
  • an epoxy or oxetane compound for example, methyl dalysidyl ether, ethyl glycidyl ether, propyl glycidyl ether, butyl dalysidyl ether, 2-ethyl hexyl glycidyl ether, ⁇ - noyl glycidyl ether, lauryl glycidyl Monofunctional epoxy such as ether, cyclohexyl glycidyl ether, methoxy ethyl dalysyl ether, ethoxy ethyl dalysyl ether, methoxy ethoxy ethyl dalysidyl ether, ethoxy ethoxy ethyl dalysid
  • the water-soluble or emulsion-forming compound is used in an amount of 5 to 80% by weight, preferably 10 to 50% by weight.
  • the water-soluble or aqueous emulsion type epoxy group-containing compound a polyfunctional epoxy compound, bisphenol A type water-soluble epoxy compound, novolac type water-soluble compound.
  • Epoxy compound may be used.
  • multifunctional epoxy compounds include diglycerin polyglycidyl ether and the like. These are contained in an amount of 5 to 50% by weight, preferably 10 to 30% by weight, based on the water-soluble or emulsion-forming compound.
  • a cationic photopolymerization initiator is used together with a radiation-curable cationic polymerization type monomer, oligomer or polymer compound, and as this cationic photopolymerization initiator, light in which an acid is generated upon irradiation with radiation is used.
  • An acid generator is mentioned as a preferable thing.
  • Photoacid generators that can be used as a cationic photopolymerization initiator can be roughly classified into ionic compounds and non-ionic compounds.
  • Examples of the ionic compound include aryldiazo-m salt, diaryliodium salt, triarylsulfo-m salt and triarylphospho-m salt, and the like, and the counter ion BF-, PF-, AsF-, SbF-, etc. are used.
  • aryldiazo-m salt diaryliodium salt
  • triarylsulfo-m salt triarylphospho-m salt
  • a photosensitizer such as anthracene or thioxanthone can be used in combination with the photoacid generator of the um salt type, if necessary.
  • the non-ionic photoacid generator those capable of generating carboxylic acid, sulfonic acid, phosphoric acid, halogen hydrogen and the like by light irradiation can be used.
  • the photoacid generator sulfonic acid Nitrobenzyl ester, iminosulfonate, 1-oxo-2-diazonaphthoquinone 4 sulfonate derivative, N-hydroxyimidosulfonate, tri (methanesulfo-methoxy) benzene derivative, etc.
  • the cationic photoinitiator is used in an amount of 110% by weight, preferably 2-5% by weight, based on the water-soluble or emulsion-forming compound.
  • a radical photopolymerization initiator is optionally used to photopolymerize the compound having the unsaturated double bond.
  • This radical photoinitiator Any of the polymerization initiators conventionally used in photopolymerization of compounds having unsaturated double bonds can be used in the present invention. Specific examples of such radical photopolymerization initiators include benzophenone, acetophenone, benzoin and benzoin methyl, ethyl, isopropyl, butyl or isobutyl ether, ⁇ -hydroxy or ⁇ -amino aryl ketone and benzyl ketal. It is.
  • the radical photoinitiators are used in amounts of 110% by weight, preferably 2-5% by weight, based on the water-soluble or emulsion-forming compound.
  • the viscosity can be adjusted by appropriately mixing a water-soluble organic solvent such as isopropyl alcohol ( ⁇ ) in the case of high viscosity.
  • a compound insoluble in water can be emeryged with a water-soluble organic solvent using a solvating surfactant.
  • water-soluble organic solvents include ketone-based water-soluble organic solvents, such as methyl ethyl ketone, methyl isopyl ketone, methyl butyl ketone, ethyl butyl ketone, cyclohexanone, isophorone and the like.
  • water-soluble organic solvents include, for example, ethyl acetate, butyl, acetate, isopropyl acetate, isopropyl acetate, secethyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, etc.
  • Acetate ester solvents ethanol, ⁇ -propyl alcohol, isopropyl alcohol, ⁇ -butyl alcohol, isobutyl alcohol, secondary butyl alcohol, tertiary butyl alcohol, ⁇ -amyl alcohol, isoamyl alcohol, secondary amyl alcohol, tasha Alcohol solvents such as lyamyl alcohol, organic acid hexanol, ethylene glycolonole, propylene glycol, butylene glycolonole; ethylene glycol Glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol monoethyl phenole ethylene glycol, ethylene glycol mono methyl ethyl alcohol, ethylene glycol mono methyl ethyl alcohol, ethylene glycol mono methyl ethyl ketone, ethylene glycol mono lithium methyl ether, di ethylene glycol mono methyl nore ether, di ethylene glycol mono ethyl ether Solvents: Ether-
  • glycol ether solvents have good compatibility with water and other organic solvents, and can dissolve organic solvent-soluble resins or other additives well, making them an optimal solvent. It can be said.
  • a dispersant S may be used to stabilize the emulsion.
  • the dispersing agent include surfactants such as NO-ON type surfactants, cationic surfactants, and A-ON type surfactants. Polyallyn and Z or sulfonic or polyallyl ester, sulfonic acid groups and Z Alternatively, NO-ON based surfactant is particularly excellent for an aqueous solution of polythiophen in the presence of polyester resin or polyanion to which an alkali metal base is bound.
  • the dispersant is used in an amount of 0.5-5% by weight, preferably 13% by weight, based on the radiation-curable conductive composition.
  • the organic conductive polymer to be used is ionic
  • the photosensitizer etc. is ionic
  • the organic conductive polymer may be coagulated to form a precipitate.
  • the mixing ratio of the ionic cationic photopolymerization initiator is preferably 3% or less with respect to the other solid content.
  • the radiation-curable conductive composition of the present invention is of emulsion type and is applied to a substrate.
  • the solid content concentration of the composition at the time of application is not particularly limited, but is 0.5 to 50% by weight, preferably 1 to 30% by weight.
  • the substrate to be coated is not particularly limited, but usually, glass, film, fiber and the like.
  • a film made of glass, a thermoplastic resin such as polyester, nylon, polypropylene or polyethylene, or a film made of an organic solvent-soluble resin such as aromatic polyamide, polyamideimide or polyimide is preferable.
  • Examples of the method for applying the conductive composition of the present invention to the surface of the substrate include gravure roll coating, reverse roll coating, knife coater, dip coater, spin coating, etc. It is not particularly limited as long as it is a method of forming a film.
  • the formed coating is heated and dried at an appropriate temperature, and then radiation such as ultraviolet irradiation is performed to cure the coating.
  • a conductive cured film is formed on the surface of the substrate.
  • the heat drying is usually performed at a temperature of 50 to 200 ° C. for about 10 to 300 seconds.
  • the radiation may be any of ultraviolet rays, far ultraviolet rays, X-rays, electron beams, etc. Usually, ultraviolet rays are preferred as the general point power of the apparatus.
  • the radiation dose is not particularly limited as long as the coating film cures.
  • Use UV as radiation In the case where the composition is used, although the dose varies depending on the composition of the composition to be used, the film thickness, etc., the irradiation dose is usually about 1,000 to 20, OOOmj Zcm 2 , preferably about 5,000 to 15, OOOmj Zcm 2 .
  • the conductive composition of the present invention can form a transparent film having excellent solvent resistance, high surface hardness, and high conductivity even under low humidity, for example, preferred as an antistatic film. Used.
  • an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used. Separately from this, polypropylene glycol monomethyl ether was mixed with urethane atalylate aqueous emulsion (EM 90, manufactured by Arakawa Chemical Industries, Ltd., solid content 40%) to prepare a urethane atarylate 10% emulsion solution.
  • EM 90 urethane atalylate aqueous emulsion
  • a 10% polypropylene glycol monomethyl ether emulsion solution of diglycerin polyglycidyl ether which is a multifunctional glycol-based epoxy compound was added and mixed to obtain a base solution having a 10% solid content.
  • 2% of a cationic photopolymerization initiator (Irgacure I 250, manufactured by Ciba-Geigy) and 3% of a radical photopolymerization initiator (Irgacure I 184, manufactured by Ciba-Geigy) are added to the solid content of the base solution and mixed.
  • the above-mentioned polythiophen colloid solution is adjusted so that the solid content concentration of the organic conductive material is 10% of the solid content of the above base solution, and added under stirring of the disper, and further 1.5 h after the addition. Stir at.
  • the emulsion solution was cloudy, and no component separation was observed.
  • This solution is applied on a PET (polyethylene terephthalate) film using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with a UV irradiation device at an irradiation dose of lOO m J Was cured to form a cured coating (no coat).
  • the surface resistance of the obtained cured film is 0.2-0.5 ⁇ Yes, the cured film was clear.
  • the light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured based on the following measurement methods. The results are shown in Table 1.
  • the hard coat produced on PET was measured as light transmittance of PET incorporated by Nippon Denshoku COH 300A.
  • the resistance value of the film was measured to examine the change from the resistance value before the heat resistance test.
  • the surface hardness was determined by a pencil hardness test (pencil pull test). That is, the surface hardness was determined by using a prepared pencil coated film and a pencil for testing specified by JIS-S-6006, according to the pencil hardness evaluation method specified by JIS-K 5400, with a load of 9. 7N. Is the value of the hardness of the pencil.
  • a radiation curable conductive composition is prepared in the same manner as in Example 1 except that a monotelluric solution is used, and the radiation curable conductive composition is coated on a PET film in the same manner as in Example 1.
  • the coating was dried at 100 ° C. and then irradiated with an irradiation dose of lOOoiuJ in a UV irradiation apparatus to cure the coating, thereby forming a cured coating.
  • the surface resistance of the obtained film was 0.8-10.3 ⁇ , and the cured film was transparent.
  • the light of the coating obtained in the same manner as in Example 1 The transmittance, heat resistance, adhesion, and surface hardness were measured. The results are shown in Table 1.
  • a radiation-curable conductive composition was produced in the same manner as in Example 1 except that MP-triazine (manufactured by Sanwa Chemical Co., Ltd.) was used in place of IRGACURE-I 250 as a cationic photopolymerization initiator,
  • This radiation-curable conductive composition is applied onto a PET film in the same manner as in Example 1, dried at 100 ° C., and then the coating is cured by irradiation with an irradiation dose of lOOOmJ in an ultraviolet irradiation device. , Hardened film was formed.
  • the surface resistance of the obtained film was 1.0 to 1.5 ⁇ and the cured film was transparent.
  • the light transmittance, heat resistance, adhesion and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.
  • Example 1 In the same manner as Example 1, except that WP AG-145 (manufactured by Wako Pure Chemical Industries; bis (cyclohexyl sulfol) diazomethane) was used in place of Irgacure I 250 as the cationic photopolymerization initiator, A radiation-curable conductive composition is produced, and the radiation-curable conductive composition is applied onto a PET film in the same manner as in Example 1, dried at 100 ° C., and then irradiated with an ultraviolet radiation device to obtain lOOOmJ The coating film was cured by irradiation with an irradiation dose to form a cured film. The surface resistance of the obtained film was 0.5-0.7 ⁇ ⁇ , and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.
  • a radiation curable conductive composition is prepared in the same manner as in Example 1 except that bis (t-butylsulfo) diazomethane) is used, and the radiation curable conductive composition is produced in the same manner as in Example 1.
  • the composition is coated on a PET film, dried at 100 ° C., and then irradiated with an irradiation dose of lOOOmJ in an ultraviolet irradiation device to cure the coating and cure.
  • a film was formed.
  • the surface resistance of the obtained film was 0.3 to 0.8 ⁇ and the cured film was transparent.
  • the light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.
  • This radiation-curable conductive composition is applied onto a PET film in the same manner, dried at 100 ° C., and then irradiated with an irradiation dose of 100OmJ with an ultraviolet irradiation device to cure the coating and cure. A film was formed. The surface resistance of the obtained film was 0.3 to 0.8 ⁇ and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the resulting film were measured in the same manner as in Example 1. The results are shown in Table 1.
  • an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used.
  • urethane atalylate aqueous emulsion (EM 90, Arakawa Chemical Industries, EM 90, 40%) was mixed with IPA (isopropyl alcohol) to prepare a urethane atarylate 10% emulsion solution.
  • the surface resistance of the obtained cured film was 0.5-0.7 ⁇ ⁇ , and the cured film was transparent.
  • the light transmittance, heat resistance, adhesion, and surface hardness of the resulting film were measured in the same manner as in Example 1. The results are shown in Table 1.
  • an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used. Separately from this, methyl ethyl ketone was mixed with urethane atalylate aqueous emulsion (EM 90, manufactured by Arakawa Chemical Industries, Ltd., 40%) to prepare a 10% emulsion solution of urethane atarylate.
  • EM 90 urethane atalylate aqueous emulsion
  • the mixture was further stirred for 5 hours with a disperser.
  • This solution is coated on a PET film using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of lOO m J in an ultraviolet irradiation device to cure the coating, A cured film was formed.
  • the surface resistance of the resulting cured film was 0.5-0.7 ⁇ and the cured film was transparent.
  • the light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.
  • a radiation curing method was carried out in the same manner as in Example 1 except that a polyadiphosphorus and a sulfone or polyapoline emulsion solution containing 300 parts by weight of a water-soluble or water-dispersible copolymerized polyester was used. Mold conductive compositions were produced.
  • This solution is applied on a glass plate using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of 100 OmJ in an ultraviolet irradiation device to cure the coating film, thereby curing the film. Formed.
  • the surface resistance of the obtained cured film was 1.0-1. 5 ⁇ , and all the cured films were transparent.
  • an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used.
  • polyethylene glycol dibutyl ether was mixed with methacrylic acid polyethylene glycol monobutyl ether aqueous emulsion to make a 10% solution. In this solution, 1 O o / 0 propylene of diglycerin polyglycidyl ether which is an emulsion type multifunctional glycol-based epoxy compound is used.
  • the glycol monomethyl ether emulsion solution was mixed to obtain a base solution having 10% solids. Thereafter, 3% of light-power thione polymerization agent (manufactured by Sumi Chemical Co., Ltd., MP-triazine) is added to the solid content of the base solution and mixed, and the above-mentioned polythiophen colloid solution is further added to solid matter of organic conductive material. The concentration was adjusted so as to be 10% of the solid content of the base solution, added with stirring of the disperser, and after the addition, it was further stirred by the disperser for 1.5 hours. The emulsion solution was cloudy, and separation of the solution was not possible.
  • This solution is applied on a glass plate using an applicator with a clearance of 10 / zm, dried at 100 ° C., and then irradiated with an irradiation dose of lOOOmJ using a UV irradiation device to cure the coating, and cure.
  • a film was formed.
  • the surface resistance of the resulting cured film was 0.5.0-1.0 ⁇ , and the cured film was transparent.
  • polystyrene sulfonic acid solid content: 1.2%) is contained as a dopant! /
  • An aqueous dispersion of polyethylene dioxithiophen colloid solid state of polyethylene dioxythiophen
  • An amount of 2% was used.
  • the polyvinyl butyral aqueous emulsion was diluted with water to make a 10% solids solution. This solution was mixed with a 10% emulsion type polypropylene glycol monomethyl ether solution of diglycerin polyglycidyl ether which is a multifunctional glycol based epoxy compound to obtain a base solution having a 10% solid content.
  • 3% of a light power thione polymerization agent (manufactured by Sanwa Chemical Co., Ltd., MP-triazine) is mixed with the solid content of this base solution, and the above-mentioned polythiolene colloid solution is further mixed with The solution was adjusted to 10% of the solid content of the base solution, added while stirring with a disperser, and after the addition, the mixture was further stirred for 1.5 hours with a disperser.
  • This solution is applied on a glass plate using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of lOOOmJ by an ultraviolet irradiation device to cure the coating film, thereby curing the cured film. It formed.
  • the surface resistance of the obtained cured film was 0.5-1.0 ⁇ .
  • polystyrene sulfonic acid solid content 1.2%) is contained as a dopant! /
  • Aqueous dispersion of polyethylene dioxythiophen colloid polyethylene The solid content of dioxithofen (2%) was used.
  • urethane atalylate is dissolved in IPA, and non-emergence type urethane atalylate (manufactured by Kyoeisha Chemical Co., Ltd .; 3061 (main component: pentaerythritol triarylate isophorone diisocyanate urethane prepolymer) A 10% solution was made.
  • This solution was mixed with a 10% polypropylene glycol monomethyl ether solution of diglycerin polyglycidyl ether which is a polyfunctional glycol-based epoxy compound, to obtain a base solution having a solid content of 10%. Thereafter, 3% of light-power thione polymerization agent (manufactured by Sanwa Chemical Co., Ltd., MP-triazine) is mixed with the solid content of the base solution, and the above-mentioned polythiophene colloid solution is further mixed with the solid concentration of the organic conductive material. The solution was adjusted to 10% of the solid content of the base solution, added while stirring with a disperser, and further stirred with a disperser for 1.5 hours after addition. This solution was applied on a glass plate using an accreditor with a clearance of 10 m and dried at 100 ° C., and the formed film became cloudy and cracked.
  • 3% of light-power thione polymerization agent manufactured by Sanwa Chemical Co., Ltd., MP-tri
  • the radiation curable conductive composition of the present invention can be used to impart antistatic properties to magnetic tapes, various packaging materials, for example, packaging materials for packaging semiconductor devices, etc. It is preferably used as

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Abstract

Disclosed is a radiation curing conductive composition which contains an organic conductive polymer such as a polythiophene, a polyaniline or a derivative of those; a water-soluble or aqueous emulsion-forming compound; a water-soluble or aqueous emulsion-forming epoxy or oxethane compound; a cationic photopolymerization photosensitizer and/or a radical polymerization photosensitizer; and if necessary a water-soluble or water-dispersible resin water, water or a water-soluble organic solvent.

Description

放射線硬化型導電性組成物  Radiation curable conductive composition

技術分野  Technical field

[0001] 本発明は、プラスチック、ガラス表面などへの付着性、被膜形成性に優れ、透明性 The present invention is excellent in adhesion to plastics, glass surfaces, etc., film formation, and transparency

、耐熱性、耐磨耗性で、傷の付きにくい導電膜を形成することができる、有機導電性 ポリマーを含有する放射線硬化型導電性組成物に関する。 The present invention relates to a radiation-curable conductive composition containing an organic conductive polymer, which can form a heat-resistant, abrasion-resistant, scratch-resistant conductive film.

背景技術  Background art

[0002] 従来、合成樹脂は一般的に疎水性であるため、合成樹脂からなる構造形成体の表 面に静電気が発生しやすぐほこり等が表面に付着しやすくなり、様々なトラブルを引 き起こしている。例えば、ポリエステルフィルム力も磁気テープを得る場合、磁気テー プに静電気が発生し、テープがまとわりついて作業性が悪くなつたり、磁気テープに ほこりが付着して汚れやすくなり、それに伴い信号のドロップアウトが増加する等の問 題が生じる。また、半導体素子等を取り扱う場合、その包装材料等に帯電防止機能 が付与されていないと、静電気により半導体が破壊されるケースがある。その対策とし て磁気テープや半導体素子の包装材料には、帯電防止剤が添加または塗布されて いる。その方法としては、ポリエステルフィルム等の絶縁基材に界面活性剤、炭素粉 末、金属粉末等の導電性物質を練り込む方法、粘着剤中に上記のような導電性物 質を配合する方法、テープの背面に界面活性剤その他の帯電防止剤をコーティング する方法、基材と粘着材層との間にイオン導電性高分子カゝらなる帯電防止層を付与 する方法等が一般的に行われている。しかし、導電性物質である炭素粉末や金属粉 末を基材に練り込んだり、あるいはそれらを配合する方法で充分な帯電防止性を与 えようとすると、基材の透明性が損なわれてしまう欠点がある。このため、一般的には フィルム、包装材料等の帯電防止剤として界面活性剤が用いられるが、界面活性剤 では塵、ほこり等の付着を抑制するのに充分な表面抵抗(10ωΩ Ζ口以下)が得られ ないのみならず、帯電防止能が周囲の湿気や水分の影響を受け変化しやすい。特 に界面活性剤により低下したフィルムの表面抵抗力、低湿度下では大幅に増大して 所望の帯電防止能が得られなくなる欠点がある。その結果、フィルム、包装材料表面 へのほこりの付着が起こり、様々なトラブルの原因となる。よりハイテク化した今日、低 湿度環境下で静電気障害のないフィルムが求められつつあり、そのためには低湿度 下で 10ωΩΖ口以下の表面抵抗値を与える帯電防止剤の出現が望まれている。 Conventionally, since synthetic resins are generally hydrophobic, static electricity is generated on the surface of the structure-forming body made of synthetic resins, and dust etc. easily adheres to the surface, causing various problems. I'm waking up. For example, when a polyester film is used to obtain a magnetic tape, static electricity is generated on the magnetic tape, the tape clings up and works poorly, or the magnetic tape becomes dusty and prone to contamination, and the signal dropout is accompanied accordingly. Problems such as increase will occur. Also, when handling semiconductor elements, etc., if the packaging material etc. is not provided with an antistatic function, the semiconductor may be destroyed by static electricity. As a countermeasure, an antistatic agent is added or applied to the packaging material of the magnetic tape and the semiconductor element. As the method, there are a method of kneading a conductive substance such as a surfactant, a carbon powder, a metal powder and the like into an insulating base material such as a polyester film, a method of blending the above-mentioned conductive substance into an adhesive; It is common practice to coat the back of the tape with a surfactant or other antistatic agent, or to apply an antistatic layer consisting of an ion conductive polymer between the substrate and the adhesive layer. ing. However, if it is attempted to impart sufficient antistatic properties by kneading the conductive material such as carbon powder or metal powder into the substrate, or by blending them, the transparency of the substrate is impaired. There is a drawback. For this reason, a surfactant is generally used as an antistatic agent for films, packaging materials, etc. However, the surfactant has a surface resistance (10 Ω Ω) that is sufficient to suppress adhesion of dust and dirt. Not only is it possible to obtain the following, but also the antistatic ability is susceptible to change due to the influence of ambient moisture and moisture. In particular, there is a disadvantage that the surface resistance of the film lowered by the surfactant, and the increase in the low humidity, the desired antistatic ability can not be obtained. As a result, film, packaging material surface The adhesion of dust on the skin causes various problems. Nowadays more advanced technology, films without electrostatic interference under low humidity environment are being sought, and for that purpose, the emergence of antistatic agents that give surface resistance values of 10 Ω Ω or less under low humidity is desired. .

[0003] このような低表面抵抗値を与える素材として、種々のものが提案され、その中の一 つとして有機導電性ポリマーがある。これら有機導電性ポリマーとしては、ポリア-リン またはポリア-リン誘導体、ポリチォフェン、ポリチォフェン誘導体、ポリピロール、ポリ アセチレン、ポリパラフエ-レン、ポリフエ-レンビ-レンなどが知られている(例えば、 特開平 6— 73270号公報、特開 2001— 81413号公報参照)。しかしこれら有機導電 性ポリマーは、一般に脆ぐ不融で、水性溶媒、有機溶媒に不溶なため成形性に劣 るという問題があった。これに対し、ポリア-リンまたはポリア-リン誘導体とドーパント 、更に必要に応じ水溶性榭脂あるいは重合体ェマルジヨンを用いることにより、このよ うな水性溶媒への溶解性を改善し、導電性皮膜を形成する方法が提案されている( 例えば、特開平 7— 330901号公報、特開平 8— 41321号公報、特開平 8— 100060 号公報、特開 2000-256617号公報参照)。 [0003] Various materials have been proposed as materials for providing such low surface resistance, and one of them is an organic conductive polymer. As these organic conductive polymers, polyaline or polyaline derivatives, polythiophene, polythiophen derivatives, polypyrrole, polyacetylene, polyparaphenylene, polyphenylene bilene, etc. are known (for example, JP-A No. 6-73270). Publication No. 2001-81413). However, since these organic conductive polymers are generally brittle and infusible and insoluble in aqueous solvents and organic solvents, they have a problem of inferior moldability. On the other hand, the solubility in such an aqueous solvent is improved by using a poly- or poly- or poly-phosphor derivative and a dopant, and further, if necessary, a water-soluble resin or polymer emulsion, to form a conductive film. Methods have been proposed (see, for example, JP-A-7-330901, JP-A-8-41321, JP-A-8-100060 and JP-A-2000-256617).

[0004] また、ポリア-リンの場合、芳香環にスルホン酸基を結合させるとともに、水溶性また は水分散性榭脂を混合することにより、導電性皮膜を形成する方法も提案されている (例えば、特開平 8— 325432号公報、特開平 9 279025号公報参照)。しかし、スル ホンィ匕ポリア-リンと相溶性の悪い榭脂を混合すると膜表面が白濁してしまうという問 題があり、他方相溶性の良 、榭脂を用 、た場合は所定の表面抵抗値が出な 、という 問題が生じてしまう。また従来濡れ性を改善するために界面活性剤が添加されるが、 2次加工性の悪ィ匕等問題があった。さらに、水溶性榭脂を用いる場合、機械的な特 性も劣るため、これら導電性ポリマーにより形成された帯電防止膜は、表面での傷- 磨耗等の問題があった。一方、導電性ポリマーがポリチォフェン又はポリチォフェン 誘導体の場合は、特に水溶性ポリマーと相溶性が良ぐ水溶性ポリマーと良く混ざり 合うものの、一般的に水溶性ポリマーは耐磨耗性'硬度等に劣り、機械的特性の良 V、帯電防止膜を得ることが難 、状態であった。 [0004] Further, in the case of poly-arrin, a method has been proposed in which a conductive film is formed by bonding a sulfonic acid group to an aromatic ring and mixing a water-soluble or water-dispersible resin. For example, refer to JP-A-8-325432 and JP-A-9-279025). However, there is a problem that the membrane surface becomes clouded if a mixture of sulfone polyarrin and incompatible resin is used, and on the other hand, good compatibility, resin is used, and in the case of using resin, the predetermined surface resistance value is obtained. The problem arises that Also, although a surfactant is conventionally added to improve the wettability, there has been a problem such as the secondary processing property being bad. Furthermore, when a water-soluble resin is used, the mechanical properties are also inferior, so that the antistatic film formed of these conductive polymers has problems such as scratches and abrasion on the surface. On the other hand, when the conductive polymer is a polythiophen or a polythiophen derivative, it mixes well with a water-soluble polymer which is particularly compatible with the water-soluble polymer, but generally the water-soluble polymer is inferior in abrasion resistance 'hardness etc. It was difficult to obtain good mechanical properties and antistatic films.

[0005] これに対し、ポリチォフェン調製物をイオンィ匕照射 (例えば紫外線あるいは電子線) で硬化する組成物と組み合わせることにより、改良された耐引つ力き性を有する導電 性被膜を形成することも知られている(例えば、特開平 9-12968号公報参照)が、こ の組成物を用いる場合形成された被膜の白濁が起こる傾向がみられるものもあり、さ らに透明性、耐引つ力ゝき傷性に優れ、加えて耐熱性、耐摩耗性などに優れた有機導 電性材料を用いた導電膜を得ることが求められて 、る。 [0005] On the other hand, electrical conductivity with improved resistance to pulling by combining a polythiophen preparation with a composition that cures with ion irradiation (eg UV light or electron beam) (See, for example, JP-A-9-12968), there is also a tendency that white turbidity of the formed film tends to occur when this composition is used. It is required to obtain a conductive film using an organic conductive material which is excellent in transparency, resistance to abrasion and scratch resistance as well as in heat resistance and abrasion resistance.

[0006] 本発明は、上記問題を有さな ヽ有機導電性ポリマーを用いる導電性組成物を提供 することを目的とするものであり、より具体的には、水溶性あるいは水可溶性有機溶 剤に可溶なポリマー材料の水溶液あるいは水性ェマルジヨンと有機導電性ポリマー を用い、組成物の分離がなぐしたがって形成された膜が透明で、かつ耐熱性'耐磨 耗性'透明性に優れ、傷が付きにくい導電膜を形成することができる放射線硬化型 導電性組成物を提供することを目的とするものである。 An object of the present invention is to provide a conductive composition using a base organic conductive polymer which does not have the above problems, and more specifically, a water-soluble or water-soluble organic solvent Using an aqueous solution of an aqueous soluble polymer material or an aqueous emulsion and an organic conductive polymer, the composition does not separate so the formed film is transparent, and the heat resistance 'abrasion resistance' It is an object of the present invention to provide a radiation curable conductive composition capable of forming a conductive film which is hard to stick.

発明の開示  Disclosure of the invention

課題を解決するための手段  Means to solve the problem

[0007] 本発明は、以下の放射線硬化型導電性組成物に関するものであり、これら本発明 の組成物により上記目的が達成できる。 The present invention relates to the following radiation-curable conductive compositions, and the above-mentioned object can be achieved by the compositions of the present invention.

[0008] (1)有機導電性ポリマー、水溶性または水性ェマルジヨン形成性ィ匕合物、水溶性ま たは水性ェマルジヨン形成性のエポキシまたはォキセタン化合物、感光剤、及び水 及び Zまたは水可溶性有機溶剤を含有することを特徴とする放射線硬化型導電性 組成物。 (1) Organic conductive polymer, water-soluble or aqueous emulsion-forming compound, water-soluble or aqueous emulsion-forming epoxy or oxetane compound, photosensitizer, and water and Z or water-soluble organic solvent A radiation curable conductive composition comprising:

[0009] (2)上記水溶性な 、し水性ェマルジヨン形成性ィ匕合物がウレタンアタリレートイ匕合物 であることを特徴とすることを特徴とする上記(1)記載の放射線硬化型導電性組成物  (2) The radiation-curable conductive material according to the above (1), characterized in that the water-soluble, water-based emulsion-forming compound is a urethane atalylate-ion compound. Sex composition

[0010] (3)上記ウレタンアタリレートイ匕合物がアクリル基を有する水溶性または水性ェマルジ ヨン形成性多官能アクリルィ匕合物であることを特徴とする上記(2)に記載の放射線硬 化型導電性組成物。 (3) The radiation curing as described in (2) above, characterized in that the above-mentioned urethane atalylate copolymer is a water-soluble or water-soluble emulsion-forming multifunctional acrylic copolymer having an acrylic group. Type conductive composition.

[0011] (4)上記ウレタンアタリレートイ匕合物力 (A)水酸基含有アクリル酸エステル、(B)有 機ポリイソシァネート類、(C)分子内に少なくとも 1個の水酸基を含有するポリエチレ ングリコール類、及び (D)分子内に少なくとも 1個の水酸基を含有する脂肪酸、から なる反応生成物を (E) 3級ァミンで中和してなる該反応生成物の中和塩であるポリゥ レタンアタリレートであることを特徴とする上記(2)記載の放射線硬化型導電性組成 物。 (4) The force of the above urethane atalylate complex compound (A) hydroxyl group-containing acrylic ester, (B) organic polyisocyanates, (C) polyethylene having at least one hydroxyl group in the molecule (E) Polyamide which is a neutralized salt of the reaction product obtained by neutralizing the reaction product consisting of glycols and (D) fatty acid containing at least one hydroxyl group in the molecule with (E) tertiary amine The radiation-curable conductive composition as described in (2) above, which is a retaatarilate.

[0012] (5)上記水溶性な 、し水性ェマルジヨン形成性ィ匕合物がエポキシアタリレートイ匕合物 であることを特徴とする上記(1)記載の放射線硬化型導電性組成物。  (5) The radiation-curable conductive composition as described in (1) above, wherein the water-soluble, water-based emulsion-forming compound is an epoxy atalylate-ion compound.

[0013] (6)上記エポキシアタリレートイ匕合物力 一般式 (I):  (6) The above epoxyallylaryate compound compound general formula (I):

[化 5]

Figure imgf000005_0001
[Chem. 5]
Figure imgf000005_0001

— ( I )  — (I)

(式中、 Rは水素原子またはメチル基を表し、 Xは CH CH O—、—〔CH CH (CH ) (Wherein, R represents a hydrogen atom or a methyl group, X represents CH 2 CH 2 O—, — [CH 2 CH 2 (CH 2) 2]

2 2 2 3 2 2 2 3

0 CH CH (OH) CH O 0 CH CH (OH) CH O

k 2 2 m  k 2 2 m

[化 6]

Figure imgf000005_0002
または [Chemical 6]
Figure imgf000005_0002
Or

[化 7] [Chem. 7]

Figure imgf000005_0003
を表し、 kおよび mは 1一 4の整数を表す。)
Figure imgf000005_0003
And k and m represent integers of 1 to 4. )

で表される化合物であることを特徴とする上記(5)記載の放射線硬化型導電性組成 物。  A radiation curable conductive composition according to the above (5), which is a compound represented by

[0014] (7)上記一般式 (I)で表されるエポキシアタリレートイ匕合物が、一般式 (Π):  (7) The epoxy atallylate i compound represented by the above general formula (I) has the general formula (Π):

[化 8] CH2=CH-C-0-CH2-CH-CH2-0-CH2-CH-CH2-0-CH2-CH-CH2-0-C-CH=CH2 [Formula 8] CH 2 = CH-C-0-CH 2 -CH-CH 2 -0-CH 2 -CH 2 -CH 2 -0-CH 2 -CH-CH 2 -0-C-CH = CH 2

O OH OH OH O  O OH OH OH O

― ( Π ) で表される化合物であることを特徴とする上記(6)記載の放射線硬化型導電性組成 物。  -A radiation curable conductive composition as described in the above (6), which is a compound represented by-()).

[0015] (8)上記水溶性な ヽし水性ェマルジヨン形成性ィ匕合物がビニルエーテル基含有ァク リル化合物であることを特徴とする上記(1)記載の放射線硬化型導電性組成物。  (8) The radiation-curable conductive composition according to the above (1), wherein the water-soluble, water-based emulsion-forming compound is a vinyl ether group-containing acrylic compound.

[0016] (9)上記有機導電性ポリマー力 ポリア-リン、ポリア-リン誘導体、ポリチォフェン及 びポリチォフェン誘導体力 選ばれた少なくとも 1種であることを特徴とする上記(1) 一 (8)の 、ずれかに記載の放射線硬化型導電性組成物。  (9) The organic conductive polymer according to any one of (1) to (8) above, which is at least one selected from the group consisting of polyaniline, polyaniline derivatives, polythiophen and polithiophen derivatives. The radiation-curable conductive composition as described in any one of the above.

[0017] (10)上記有機導電性ポリマー力 ポリチォフェンまたはポリチォフェン誘導体及びポ リスチレンスルホン酸力 なることを特徴とする上記(1)一(8)のいずれかに記載の放 射線硬化型導電性組成物。  (10) The radiation curable conductive composition according to any one of the above (1) to (8), characterized in that the organic conductive polymer, the polythiophen or the polythiophen derivative, and the polystyrene sulfonic acid are used. object.

[0018] (11)ポリア-リンまたはスルホン化ポリア-リンがスルホン酸基及び Zまたはそのァ ルカリ金属塩基の結合したポリエステル榭脂により、またはポリチォフェンまたはポリ チォフェン誘導体がポリ陰イオン存在下で、水溶性または水性分散化された有機導 電性ポリマーであることを特徴とする上記(1)一(8)のいずれかに記載の放射線硬化 型導電性組成物。  (11) Water-soluble or polythiolin or sulfonated polyarrin by a polyester resin in which a sulfonic acid group and Z or its alkali metal base are bound, or polythiophen or polythiophen derivative in the presence of polyanion The radiation curable conductive composition according to any one of the above (1) to (8), which is an organic conductive polymer dispersed in water or water.

[0019] (12)上記感光剤がラジカル重合感光剤及び Zまたは光力チオン重合感光剤である ことを特徴とする上記(1)一(11)の!ヽずれかに記載の放射線硬化型導電性組成物 (12) The photosensitizer described above is a radical polymerization photosensitizer and Z or a photopower thione polymerization photosensitizer. Radiation curable conductive composition according to any one of the claims

[0020] (13)水溶性または水性ェマルジヨン形成性のエポキシ化合物が多官能のグリシジル 化合物を含むことを特徴とする上記(1)一(12)のいずれかに記載の放射線硬化型 導電性組成物。 (13) The radiation-curable conductive composition according to any one of (1) to (12) above, wherein the water-soluble or aqueous dispersion-forming epoxy compound contains a polyfunctional glycidyl compound. .

[0021] 本発明の放射線硬化型導電性組成物は、例えば、次のようにして製造される。すな わち、例えば、ポリア-リン及び Zまたはスルホンィ匕ポリア-リンなどのポリア-リン誘 導体に対して、スルホン酸基及び Zまたはそのアルカリ金属塩基の結合したポリエス テル榭脂で、またはポリチォフェンに対して、ポリ陰イオンで水溶性または水分散性と されて 、る有機導電性ポリマーの水溶液または水性ェマルジヨンを、水または水可溶 性溶剤に溶解または分散された水溶性または水性ェマルジヨン形成性ィ匕合物と混合 し溶液化する。この水溶性または水性ェマルジヨン形成性ィ匕合物は、放射線硬化型 のモノマー、オリゴマーあるいは高分子化合物であってもよいし、放射線により硬化し ない高分子化合物であってもよい。以下では、これら放射線硬化型のモノマー、オリ ゴマー及び高分子化合物並びに放射線により硬化しな 、高分子化合物を含め「ベ ースレジン」ということがある。この溶液の基板に対する密着性や、形成された被膜の 耐摩耗性、耐引つ力ゝき傷性などを改善するため、さらに水溶性または水性ェマルジョ ン形成性のエポキシまたはォキセタンィ匕合物の水溶液または水性ェマルジヨンを添 加する。このとき、ベースレジン、エポキシまたはォキセタン化合物を水性ェマルジョ ンの形態で用いることにより、ェマルジヨンの分離のな 、放射線硬化型導電性組成物 が得られ、しかもこの組成物により透明性に優れ、耐熱性'耐磨耗性にも優れ、傷が 付きにく 、導電膜を形成することができるため、ベースレジン及びエポキシまたはォ キタセンィ匕合物は水性ェマルジヨンの形態で用いることが好まし 、。 The radiation-curable conductive composition of the present invention is produced, for example, as follows. That is, for example, for polyarylated polymers such as polyarylin and Z or sulfonic acid polyarylin, a polyester resin bonded with a sulfonic acid group and Z or its alkali metal base, or polythiophen. Against an aqueous solution or aqueous emulsion of an organic conductive polymer, which is made water soluble or dispersible in a poly anion, water soluble or water soluble It is mixed with a water-soluble or aqueous emulsion-forming compound dissolved or dispersed in an organic solvent to form a solution. The water-soluble or aqueous dispersion-forming compound may be a radiation-curable monomer, oligomer or polymer compound, or may be a polymer compound which is not cured by radiation. Hereinafter, these radiation-curable monomers, oligomer and polymer compounds, and polymer compounds which are not cured by radiation, may be referred to as “base resins”. In order to improve the adhesion of this solution to the substrate, and the abrasion resistance and scratch resistance of the formed film, an aqueous solution of a water-soluble or aqueous emulsion-forming epoxy or oxetane composite is further added. Or add an aqueous emulsion. At this time, by using a base resin, an epoxy or an oxetane compound in the form of an aqueous emulsion, a radiation-curable conductive composition can be obtained without separation of the emulsion, and the composition is excellent in transparency and heat resistance. It is preferable to use the base resin and the epoxy or epoxy resin compound in the form of an aqueous emulsion, because it is excellent in abrasion resistance, scratch resistance, and can form a conductive film.

[0022] 以下、本発明をさらに詳細に説明する。本発明においては、有機導電性ポリマーが 用いられるが、該有機導電性ポリマーとしては、従来力も有機導電性ポリマーとして 知られた、例えばポリア-リンまたはポリア-リン誘導体、ポリチォフェンまたはポリチ ォフェン誘導体、ポリピロール、ポリアセチレン、ポリパラフエ-レン、ポリフエ-レンビ 二レンなど任意のものを用いることができる。これら有機導電性ポリマーとしては、ポリ ァ-リンまたはポリア-リン誘導体、ポリチォフェンあるいはポリチォフェン誘導体、ポ リスルフォンサルファイドなどが中でも好まし!/、。  Hereinafter, the present invention will be described in more detail. In the present invention, an organic conductive polymer is used, and as the organic conductive polymer, for example, polyaniline or a polyaniline derivative, a polythiophen or a polythiophen derivative, a polypyrrole conventionally known as an organic conductive polymer. Any of polyacetylene, polyparaphenylene, and polyethylene can be used. Among these organic conductive polymers, preferred are poly- or poly- or poly- or poly- or poly- or poly- thio derivatives, polysulfone sulfide and the like!

[0023] ポリア-リンまたはその誘導体としては、例えば下記一般式 (III)で表されるァ-リン またはその誘導体を酸ィ匕重合させて得られるものが挙げられる。  [0023] Examples of polyarrin or a derivative thereof include those obtained by acid polymerization of a phosphorus represented by the following general formula (III) or a derivative thereof.

[0024] [化 9]  [Formula 9]

Figure imgf000007_0001
Figure imgf000007_0001

(式中、 R1は同一あるいは異なっていてもよぐそれぞれ水素原子、アルキル基、了 ルケ-ル基、アルコキシ基、アルカノィル基、アルキルチオ基、ァリールォキシ基、ァ ルキルチオアルキル基、ァリール基、アルキルァリール基、ァリールアルキル基、アル キルスルフィエル基、アルコキシアルキル基、アルキルスルホ-ル基、アルコキシカル ボニル基、アミノ基、アルキルアミノ基、ジアルキルアミノ基、ァリールチオ基、ァリー ルスルフィ-ル基、ァリールスルホ-ル基、カルボキシル基、ハロゲン、シァノ基、ハロ アルキル基、ニトロアルキル基あるいはシァノアルキル基を表し、 nは 0— 5の整数を 表す。) (Wherein R 1 may be the same or different, and each may be a hydrogen atom, an alkyl group, an alkoxy group, an alkoxy group, an alkoxy group, an alkylthio group, an aryloxy group, Alkylthio alkyl group, aryl group, alkyl aryl group, aryl alkyl group, alkyl sulfiel group, alkoxy alkyl group, alkyl sulfo group, alkoxy carbonyl group, amino group, alkyl amino group, dialkyl amino group, Represents an arylthio group, an arylsulfyl group, an aryl sulfol group, a carboxyl group, a halogen, a cyano group, a haloalkyl group, a nitroalkyl group or a cyanoalkyl group, and n represents an integer of 0-5. )

[0026] 式中、好ましい R1は、水素原子、炭素数 1一 5のアルキル基、アルコキシ基、ァリー ル基、シァノ基、ハロゲン及びァリールォキシ基などであり、具体的化合物としては、 ァニリン、 o—トルイジン、 m—トルイジン、 o—ェチルァニリン、 m—ェチルァニリン、 o—ェ トキシァニリン、 m—ブチルァニリン、 m—へキシルァニリン、 m—才クチルァニリン、 2, 3 —ジメチルァ二リン、 2, 5—ジメチルァニリン、 2, 5—ジメトキシァニリン、 o—シァノアニリ ン、 2, 5—ジクロロア二リン、 2—ブロモア二リン、 5—クロロー 2—メトキシァニリン、 3—フエ ノキシァ-リンなどが挙げられる。これらのァ-リンまたはその誘導体は、単独である いは 2種以上を併用することができる。 In the formula, preferable R 1 is a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group, an aryl group, a cyano group, a halogen, an aryloxy group, etc. Specific examples of the compound include: aniline, o -Toluidine, m-toluidine, o-ethylanilin, m-ethylanilin, o-electron anthoxylin, m-butylanillin, m-hexiranilin, m-ability curtyanilin, 2, 3-dimethylanilin, 2, 5- dimethylanilin, Examples thereof include 2,5-dimethoxyvanyrin, o-cyanoanilin, 2,5-dichloroanilin, 2-bromoanilin, 5-chloro-2-methoxyvanyrin, 3-phenoxyphosphorin and the like. These phosphorus or derivatives thereof may be used alone or in combination of two or more.

[0027] 酸化重合反応は、例えば、上記一般式 (III)で表されるァニリン及び Zまたはその 誘導体とプロトン酸の溶液または懸濁液に、酸化剤の溶液を添加し、— 10°Cカゝら 40 °Cの温度で、 30分力ゝら 48時間、常圧下で攪拌を行うことにより行われる。酸化重合 の際に用いられる酸化剤として、例えば、ペルォキソ二硫酸アンモ-ゥム、過酸化水 素、第二塩ィ匕鉄などが挙げられる。  In the oxidative polymerization reaction, for example, a solution of an oxidizing agent is added to a solution or suspension of ananilin and Z or a derivative thereof represented by the above general formula (III) and a protonic acid, It is carried out by stirring at a temperature of 40 ° C. for 30 minutes with force for 48 hours under normal pressure. Examples of the oxidizing agent used in the oxidative polymerization include peroxodisulfate ammonium, hydrogen peroxide, and second base iron salts.

[0028] これらポリア-リンまたはその誘導体は、通常プロトン酸ドーパントとともに用いられ 、水性溶媒または有機溶媒に対する溶解性あるいは分散性とされる。このようなプロト ン酸ドーパントとしては、ベンゼンモノスルホン酸類、分子内に少なくとも 1つのスルホ ン酸基と少なくとも 1つのスルホン酸塩 (例えば、アルカリ金属塩)を含む芳香族酸、 一般式 (IV) : [0029] [化 10] These polyaryls or their derivatives are usually used together with a protic acid dopant and made soluble or dispersible in an aqueous solvent or an organic solvent. As such protonic acid dopants, benzene monosulfonic acids, aromatic acids containing at least one sulfonic acid group and at least one sulfonic acid salt (for example, an alkali metal salt) in the molecule, general formula (IV) : [Chemical Formula 10]

( IV )

Figure imgf000009_0001
(IV)
Figure imgf000009_0001

[0030] (式中、 R2、 R3及び は同一あるいは異なっていてもよぐそれぞれアルキレン基また はフエ-レン基を、また p及び rは同一あるいは異なっていてもよぐそれぞれ 1から 50 の整数を表す。 ) (Wherein, R 2 , R 3 and R 2 may be the same or different and each may be an alkylene group or a phenyl group, and p and r each may be the same or different) 1 to 50 Represents an integer of

で示される化合物、  A compound represented by

[0031] 一般式 (V) :  General Formula (V):

[化 11]  [Formula 11]

Figure imgf000009_0002
Figure imgf000009_0002

[0032] (式中、 R5及び R°は同一あるいは異なっていてもよぐそれぞれ炭素数 1一 10、好ま しくは 2— 8のアルキル基、ァルケ-ル基、アルキルチオアルキル基、ァリール基、ァ ルキルァリール基、ァリールアルキル基またはアルコキシアルキル基を表す。) で示される化合物、スルホン酸基及びそのアルカリ金属塩基力 なる群力 選ばれた 少なくとも 1種の基が結合した水溶性または水分散性共重合ポリエステルなどが挙げ られる。 (Wherein R 5 and R ° may be the same or different, and each has 1 to 10, preferably 2 to 8 carbon atoms, alkyl, alkyl, thioalkyl, aryl), A compound represented by alkylaryl group, arylalkyl group or alkoxyalkyl group), sulfonic acid group and alkali metal basic power group thereof water solubility or water dispersibility in which at least one selected group is bonded Copolymerized polyester and the like can be mentioned.

[0033] また、ポリチォフェンまたはポリチォフェン誘導体としては、一般式 (VI):  Also, as polythiophen or polythiophen derivatives, general formula (VI):

[0034] [化 12] [Formula 12]

Figure imgf000009_0003
Figure imgf000009_0003

[0035] (式中、 R7及び R8は互いに独立に水素原子又は C一 Cアルキル基を表し、或いは 一緒になつて任意に置換された C一 Cアルキレン基、好ましくは任意にアルキル基 [Wherein, R 7 and R 8 independently represent a hydrogen atom or a C 1 C alkyl group, or Taken together optionally substituted C 1 C alkylene groups, preferably optionally alkyl groups

1 4  14

で置換されたメチレン基、任意に c  A methylene group substituted by, optionally c

1一 C アルキル基又はフヱニル基で置換されたェ 12  1 C substituted with a C alkyl group or a phenyl group 12

チレン 1 , 2基、プロピレン 1 , 3基又はシクロへキシレン 1 , 2基を形成する基を表す o )  Represents a group forming a thylene 1, 2 group, a propylene 1, 3 group or a cyclohexylene 1, 2 group o)

で示される反復単位を含むものが挙げられる。  What contains the repeating unit shown by these is mentioned.

[0036] 上式において、 R7及び R8は、好ましくはメチルあるいはェチル基である力 R7及び R8が一緒になつて形成される、メチレン、エチレン 1,2及びプロピレン 1,3基であり 、エチレン 1,2基が特に好適である。 [0036] In the above formulae, R 7 and R 8 are methylene, ethylene 1, 2 and propylene 1, 3 groups, formed by joining together the forces R 7 and R 8 which are preferably methyl or ethyl groups. And ethylene 1, 2 groups are particularly preferred.

[0037] 上記ポリチォフェンあるいはポリチォフェン誘導体のドーパントとしては、ポリマー力 ルボン酸、例えばポリアクリル酸、ポリメタクリル酸又はポリマレイン酸あるいはポリマ ースルホン酸、例えばポリスチレンスルホン酸及びポリビュルスルホン酸のァ-オン が挙げられる。これらポリマーカルボン酸またはスルホン酸などのポリ陰イオンが存在 すると、ポリチォフェンあるいはポリチォフェン誘導体はこれらのポリカルボン酸及び ポリスルホン酸と複合体を作成し、ポリチォフェンある 、はポリチォフェン誘導体の導 電性の安定に寄与するとともに、水性溶媒に対する溶解性あるいは分散性の向上に 寄与する。これらポリマーカルボン酸及びポリマースルホン酸は、ビ-ルカルボン酸 及びビニルスルホン酸と、他の重合可能な単量体例えばアクリル酸エステル及びス チレンとの共重合体であってよい。ポリア-オンを供給するポリ酸の分子量 Mnは、好 まし <は 1,000— 2,000,000、特に好まし <は 2,000— 500,000である。ポジ酸又は そのアルカリ金属塩、例えばポリスチレンスルホン酸及びポリアクリル酸は商業的に 入手でき、或いは公知の方法で製造することができる。  Examples of the dopants of the above-mentioned polythiophen or polythiophen derivatives include polymeric carboxylic acids such as polyacrylic acid, polymethacrylic acid or polymaleic acid, and polymeric sulfonic acids such as polystyrene sulfonic acid and polyaryl sulfonic acid anions. . When polyanions such as these carboxylic acids or sulfonic acids are present, polythiophen or polythiophen derivatives form a complex with these polycarboxylic acids and polysulfonic acids, and polythiophen, etc. contribute to the stabilization of the conductivity of polythiophen derivatives. Contribute to the improvement of the solubility or dispersibility in an aqueous solvent. These polymeric carboxylic acids and polymeric sulfonic acids may be copolymers of vinyl carboxylic acids and vinyl sulfonic acids with other polymerizable monomers such as acrylic esters and styrene. The molecular weight Mn of the polyacid supplying the polyan is preferably <1,000 to 2,000,000, particularly preferably 2,000 to 500,000. Positive acids or alkali metal salts thereof, such as polystyrene sulfonic acid and polyacrylic acid, are commercially available or can be prepared by known methods.

[0038] また、本発明の放射線硬化型導電性組成物には、水溶性または水性ェマルジヨン 形成性化合物が用いられる。水溶性または水性ェマルジヨン形成性ィ匕合物は、前記 組成物に対し 3— 50重量%、好ましくは 5— 30重量%の量で用いられる。この水溶 性または水性ェマルジヨン形成性化合物の内、不飽和二重結合などの不飽和結合 を有する化合物としては、例えば、ウレタンアタリレート、エポキシアタリレート、ラウリ ルアタリレート、エトキシジエチレングリコールアタリレート、メトキシトリエチレングリコー ルアタリレート、フエノキシェチルアタリレート、テトラヒドロフルフリルアタリレート、イソ ボルニルアタリレート、 2—ヒドロキシェチルアタリレート、 2—ヒドロキシプロピルアタリレ ート及び 2—ヒドロキシー 3 フエノキシアタリレート等の単官能アタリレートイ匕合物、ネオ ペンチルグリコールジアタリレート、 1, 6 キサンジオールジアタリレート、 1, 6 キサンジオールジメタタリレート、トリメチロールプロパントリアタリレート、ペンタエリスリ トールトリアタリレート、ジペンタエリスリトールトリアタリレート、ジペンタエリスリトールへ キサアタリレート、トリペンタエリスリトールポリアタリレート、テトラペンタエリスリトールポ リアタリレート及びトリメチロールプロパンアクリル酸安息香酸エステル等の多官能ァク リレート化合物等のアクリル酸誘導体、 2—ェチルへキシルメタタリレート、 n—ステアリ ルメタタリレート、シクロへキシルメタタリレート、テトラヒドロフルフリルメタタリレート、 2- ヒドロキシェチルメタタリレート及び 2—ヒドロキシブチルメタタリレート等の単官能メタク リレート化合物、 1, 6 キサンジオールジメタタリレート、トリメチロールプロパントリメ タクリレート及びグリセリンジメタタリレート等の多官能メタクリレートイ匕合物等のメタタリ ル酸誘導体、グリセリンジメタタリレートへキサメチレンジイソシァネート及びペンタエリ スリトールトリアタリレートへキサメチレンジイソシァネート等のウレタンアタリレートイ匕合 物等のモノマー、及び上記モノマーのオリゴマー、ポリマー等の紫外線硬化性化合 物が挙げられ、本発明にお 、てはこれらモノマー及びオリゴマーの水性ェマルジヨン が特に好適なものである。 In the radiation-curable conductive composition of the present invention, a water-soluble or aqueous dispersion-forming compound is used. The water-soluble or aqueous emulsion-forming compound is used in an amount of 3 to 50% by weight, preferably 5 to 30% by weight, based on the composition. Among the water-soluble or water-based emulsion-forming compounds, compounds having unsaturated bonds such as unsaturated double bonds include, for example, urethane atalylate, epoxy atalylate, lauri atalylate, ethoxydiethylene glycol atalylate, methoxytrile. Ethylene glycol atalylate, vinyl nosylate atalylate, tetrahydrofurfuryl atalylate, iso Monofunctional atalylate compounds such as bornyl atalylate, 2-hydroxyatalylate, 2 -hydroxypropyl atarylate and 2 -hydroxy-3 phenoxia tarylate, neopentyl glycol diatalylate, 1 , 6 Xandiol diatalylate, 1, 6 Xandiol dimetatalylate, trimethylolpropane triarylate, pentaerythritol tritalylate, dipentaerythryl tritalylate, dipentaerythrylate hexatalialate, tripentaerythritol polyatarial Acrylic acid derivatives such as polyvalent acrylate compounds such as borate, tetrapentaerythritol polyarylate and trimethylolpropane acrylic acid benzoate, 2-ethylhexyl methacrylate, n-stearyl Monofunctional metal acrylate compounds such as ruthenium methacrylate, cyclohexyl methacrylate, tetrahydrofurfuryl methacrylate, 2-hydroxy methacrylate, 2-hydroxybutyl methacrylate, 1, 6 xanthdiol dimetatalylate , Methacrylic acid derivatives such as trimethylolpropane trime methacrylate and polyfunctional methacrylate complex such as glycerin dimetatalylate, glycerin dimetatalylate hexamethylene diisocyanate and pentaerythritol tritalylate hexamethylene diiso Monomers such as urethane atalylate complexes such as cyanate and UV curable compounds such as oligomers and polymers of the above monomers are mentioned, and in the present invention, aqueous dispersions of these monomers and oligomers are particularly useful. It is suitable.

上記化合物の内、ウレタンアタリレートモノマー、ウレタンアタリレートのオリゴマー、 ポリマー等については、例えば特開 2003— 40955号公報、特開 2000— 159847号 公報、特開 2000 - 118193号公報、特開平 11 209448号公報、特開平 11— 1064 68号公報、特開平 8— 109230号公報、特開平 5— 222145号公報などに記載されて おり、またエポキシアタリレートモノマー、エポキシアタリレートのオリゴマー、ポリマー 等 ίこつ ヽて ίま、 f列え ί 特開 2003— 238653号公報、特開 2003— 183350号公報、 特開 2003— 12660号公報、特開 2002— 284842号公報、特開 2002— 128863号 公報、特開 2002— 105168号公報、特開 2001— 183820号公報、特開 2001— 114 850号公報、特開 2000— 336144号公報、特開平 10— 168033号公報、特開平 10 -101770号公報、特開平 9-48838号公報、特開平 8-677737号公報、特開平 7 -316107号公報、特開平 7-70281号公報、特開平 7—48424号公報、特開平 5— 194708号公報などに記載されており、いずれも従来力も広く知られているものであ る。本発明においては、これら公知のものの何れをも不飽和結合を有する化合物とし て用いることができる。 Among the above compounds, urethane atalylate monomers, oligomers of urethane atalylate, polymers and the like are described, for example, in JP-A 2003-40955, JP-A 2000-159847, JP-A 2000-118193, and JP-A 11 209448. No. 11-106468, JP-A-8-109230, JP-A-5-222145 and the like, and epoxyallylarylate monomers, oligomers of epoxyallylallylates, polymers, etc. For example, f rows are disclosed in Japanese Patent Application Laid-Open Nos. 2003-238653, 2003-183350, 2003-12660, 2002- 284842, 2002-128863, and the like. JP 2002-105168, JP 2001-183820, JP 2001-114 850, JP 2000-336144, JP 10-168033, JP 10-101770, JP-A-H10-101770. 9-48838, JP-A-8-677737 JP-A-7-316107, JP-A-7-70281, JP-A-7-48424, JP-A-5-5. No. 194708, and the like, and all of the conventional techniques are widely known. In the present invention, any of these known compounds can be used as a compound having an unsaturated bond.

[0040] ウレタンアタリレート類としては、(A)水酸基含有アクリル酸エステル、 (B)有機ポリ イソシァネート類、(C)分子内に少なくとも 1個の水酸基を含有するポリエチレングリコ ール類、及び (D)分子内に少なくとも 1個の水酸基を含有する脂肪酸、からなる反応 生成物を (E) 3級ァミンで中和してなる該反応生成物の中和塩であるポリウレタンァク リレートが特に好ましいものである。  As urethane atalylates, (A) hydroxyl group-containing acrylic acid ester, (B) organic polyisocyanate, (C) polyethylene glycols containing at least one hydroxyl group in a molecule, and (D) The polyurethane acrylate which is a neutralized salt of the reaction product formed by neutralizing a reaction product consisting of a fatty acid containing at least one hydroxyl group in the molecule with (E) tertiary amine is particularly preferable It is.

[0041] 上記ポリウレタンアタリレートを製造するために用いられる (A)成分の水酸基含有ァ クリル酸エステルとしては、例えば 2—ヒドロキシェチル (メタ)アタリレート、 2—ヒドロキ シプロピル (メタ)アタリレート、 4-ヒドロキシブチル (メタ)アタリレートなどの 2-ヒドロキ シアルキル (メタ)アタリレート類、ポリエチレングリコールモノ (メタ)アタリレート、ポリプ ロピレングリコールモノ(メタ)アタリレート等のヒドロキシアルキレングリコールモノ(メタ )アタリレート、ペンタエリスリトールトリアタリレート、ロジンエポキシアタリレートなどが 挙げられ、これらはそれぞれ単独または組み合わせて使用できる。  Examples of the hydroxyl group-containing acrylate ester of the component (A) used to produce the above polyurethane atalylate include, for example, 2-hydroxyl (meth) atalylate, 2-hydroxypropyl (meth) atalylate, 2-Hydroxyalkyl (meth) atalylates such as 4-hydroxybutyl (meth) atalylate, polyethylene glycol mono (meth) atalylate, hydroxy alkylene glycol mono (meth) atarilate such as polypropylene glycol mono (meth) atalylate And pentaerythritol triarylate, rosin epoxyallylate, etc., which may be used alone or in combination.

[0042] また、有機ポリイソシァネート類である(B)成分としては、分子内に反応性のイソシ アナ一ト基を 3個以上有する有機ポリイソシァネート類が該当する。またその分子量 は 500— 1000程度が好ましい。 (B)成分の具体例は、例えば 1, 6—へキサンジイソ シァネート、イソホロンジイソシァネート、キシリレンジイソシァネート、水添キシリレンジ イソシァネート、トリレンジイソシァネート、ジフエ-ノレメタンジイソシァネートなどの各 種ジイソシァネートから得られる 3量体、該ジイソシァネート類をトリメチロールプロパ ンなどの多価アルコールと反応させたプレポリマー、ポリメチレンポリフエ-ルポリイソ シァネートなどが挙げられる。  Further, as the component (B) which is an organic polyisocyanate, an organic polyisocyanate having three or more reactive isocyanato groups in the molecule is applicable. Further, its molecular weight is preferably about 500-1000. Specific examples of the component (B) include, for example, 1,6-hexanediisosocyanate, isophoronediisosiate, xylylene diisocyanate, hydrogenated xylylene diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, etc. And trimers obtained from various kinds of diisocyanates, prepolymers obtained by reacting the diisocyanates with polyhydric alcohols such as trimethylolpropane, polymethylenepolypolypolyisocyanate, and the like.

[0043] (C)成分のポリエチレングリコール類は、その分子内に少なくとも 1個の水酸基を有 する各種のものを特に制限なく使用できるが、下記一般式 (VII)で表されるものが特 に好適である。 [0044] [化 13] As polyethylene glycols of component (C), various ones having at least one hydroxyl group in the molecule can be used without particular limitation, but those represented by the following general formula (VII) are particularly used. It is suitable. [Formula 13]

H— ( O C H2 C H2) s— O R 9 (VI I) H— (OCH 2 CH 2 ) s — OR 9 (VI I)

[0045] (式中、 R9は炭素数 1一 4のアルキル基を、 sは 7— 25の整数を示す。) (Wherein, R 9 represents an alkyl group having 1 to 14 carbon atoms, and s represents an integer of 7 to 25).

[0046] (C)成分の使用量は、ポリウレタンアタリレート全量に対し通常 3— 12重量%、好ま しくは 5— 10重量%である。 3重量%に満たない場合には、水洗浄性が不足となり好 ましくない。また、 12重量%を越える場合には、硬化塗膜の耐水性が不足となったり 、凝集性が不足したりするため好ましくない。  The amount of the component (C) used is usually 3 to 12% by weight, preferably 5 to 10% by weight, based on the total amount of the polyurethane atalylate. If the content is less than 3% by weight, the water washability is not sufficient. On the other hand, if it exceeds 12% by weight, it is not preferable because the water resistance of the cured coating is insufficient or the cohesion is insufficient.

[0047] (D)成分の脂肪酸は、その分子内に少なくとも 1個の水酸基と、 1個のカルボキシル 基を含有する。その酸価及び水酸基価は特に制限されないが、通常はともに 150— 500の範囲が好ましい。(D)成分の具体例としては、例えばひまし油脂肪酸、硬化ひ まし油脂肪酸、 6—ヒドロキシカプロン酸などが挙げられる。ポリウレタンアタリレート中 の(D)成分の含有量はポリウレタンアタリレートの酸価が 10— 50mgKOHZg、好ま しくは 15— 45mgKOHZgとなるように配合する。ポリウレタンアタリレートの酸価が 1 OmgKOHZg未満であると親水性が不十分で安定なェマルジヨンが得られな、。ま た、ポリウレタンアタリレートの酸価が 50mgKOHZgを超えると親水性が強くなりすぎ 、高粘度の水溶液しカゝ得られない。  The fatty acid of component (D) contains at least one hydroxyl group and one carboxyl group in its molecule. The acid value and the hydroxyl value are not particularly limited, but in general, the range of 150 to 500 is preferable. Specific examples of the component (D) include, for example, castor oil fatty acid, hydrogenated castor oil fatty acid, 6-hydroxycaproic acid and the like. The content of the component (D) in the polyurethane atarylate is such that the acid value of the polyurethane atarylate is 10 to 50 mg KOHZg, preferably 15 to 45 mg KOHZg. If the acid value of the polyurethane atarilate is less than 1 Omg KOHZg, insufficient hydrophilicity and stable emulsion can not be obtained. In addition, when the acid value of polyurethane atalylate exceeds 50 mg KOHZg, the hydrophilicity becomes too strong, and a solution of high viscosity can not be obtained.

[0048] (E)成分の 3級有機ァミンとしては、例えばトリメチルァミン、トリェチルァミン、 N-メ チルジエタノールァミン、トリエタノールァミンなどを例示できる。これらの中で特にトリ メチルァミン、トリェチルァミンが好ましい。その理由は本活性エネルギー線硬化性含 水榭脂組成物を塗工し、乾燥させる時、トリメチルアミンゃトリエチルァミンは比較的 容易に揮発し塗膜に残らな 、ためである。  Examples of tertiary organic amine of component (E) include trimethylamine, trytylamine, N-methyldiethanolamine, triethanolamine and the like. Among these, trimethylamine and trytilamine are particularly preferred. The reason is that when the active energy ray-curable water-containing resin composition is applied and dried, trimethylamine and triethylamine relatively easily evaporate and remain in the coating.

[0049] また、エポキシアタリレートとしては、前記一般式 (I)で示されるものが好ましい化合 物として挙げられ、具体的には、例えば次のような化合物が挙げられる。 [0050] [化 14] Further, as the epoxy atalylate, those represented by the above general formula (I) can be mentioned as preferable compounds, and specifically, for example, the following compounds can be mentioned. [Formula 14]

[0051] [0051]

[0052] [0052]

[0053] [0053]

[0054] [0054]

[0055][0055]

Figure imgf000014_0001
[0056] [化 20]
Figure imgf000015_0001
Figure imgf000014_0001
[Formula 20]
Figure imgf000015_0001

[0057] [化 21]

Figure imgf000015_0002
[Formula 21]
Figure imgf000015_0002

[0058] これらの中でも、上記式 (II)で示されるトリグリセリンジアタリレートを主成分とするェ ポキシエステル(共栄社ィ匕学製 80MFA)が特に好まし ヽものである。 Among these, epoxy ester (80 MFA manufactured by Kyoeisha Shigaku Co., Ltd.) having triglycerin ditalylate represented by the above-mentioned formula (II) as the main component is particularly preferable.

[0059] また、不飽和二重結合を有する上記以外の化合物としては、例えば、次のような化 合物が挙げられる。即ち、メチル (メタ)アタリレート、ェチル (メタ)アタリレート、プロピ ル (メタ)アタリレート、ブチル (メタ)アタリレート、 2—ェチルへキシル (メタ)アタリレート 、 n-ノ-ル (メタ)アタリレート、ラウリル (メタ)アタリレート、シクロへキシル (メタ)アタリ レート、シクロへキシルメチル (メタ)アタリレート、メトキシェチル (メタ)アタリレート、エト キシェチル (メタ)アタリレート、メトキシェトキシェチル (メタ)アタリレート、エトキシエト キシェチル (メタ)アタリレート、メトキシポリエチレングリコール (メタ)アタリレート、 2—ヒ ドロキシェチル (メタ)アタリレート、 4-ヒドロキシブチル (メタ)アタリレート、ポリエチレ ングリコール (メタ)アタリレート、(メタ)アクリル酸、 N, N—ジメチルアミノエチル (メタ) アタリレート、 α—ヒドロキシメチルアクリル酸メチル、 α—ヒドロキシメチルアクリル酸ェ チル、 α—ヒドロキシメチルアクリル酸ブチル等の単官能 (メタ)アタリレート類;  In addition, examples of compounds other than the above-mentioned compounds having unsaturated double bonds include the following compounds. That is, methyl (meth) atarylate, ethyl (meth) atarylate, propyol (meth) atarylate, butyl (meth) atarylate, 2-ethylhexyl (meth) atarylate, n-nor (meth) Atalylate, lauryl (meth) atalylate, cyclohexyl (meth) atalylate, cyclohexyl methyl (meth) atalylate, methoxyethyl (meth) atalylate, etoxethyl (meth) atarylate, methoxyethoxyl (meth) Atalylate, Ethoxyethoxethyl (meth) atalylate, Methoxy polyethylene glycol (Meth) atalylate, 2-hydroxyl (meth) atalylate, 4-hydroxybutyl (meth) atalylate, polyethylene glycol (meth) atarylate ( Meta) acrylic acid, N, N-dimethylamino Chill (meth) Atari rate, alpha-hydroxymethyl acrylate methyl, alpha-hydroxymethylacrylic Sane chill, monofunctional (meth) Atari rate such as butyl alpha-hydroxymethyl acrylate;

[0060] Ν, Ν—ジメチル (メタ)アクリルアミド、 Ν—メチロール (メタ)アクリルアミド等の単官能( メタ)アクリルアミド類;  [0060] Monofunctional (meth) acrylamides such as Ν, Ν-dimethyl (meth) acrylamide, Ν- methylol (meth) acrylamide;

メチノレビニノレエーテノレ、ェチノレビニノレエーテノレ、プロピノレビニノレエーテノレ、ブチノレビ ニノレエーテノレ、 2—ェチノレへキシノレビ-ノレエーテノレ、 η—ノ-ノレビ-ノレエーテノレ、ラウリ ノレビニノレエーテノレ、シクロへキシノレビニノレエーテノレ、メトキシェチノレビニノレエーテノレ、 エトキシェチルビ二ノレエーテル、メトキシェトキシェチルビ二ノレエーテル、エトキシエト キシェチルビニルエーテル、メトキシポリエチレングリコールビニルエーテル、 2—ヒド ロキシェチルビニルエーテル、 4ーヒドロキシブチルビニルエーテル、ジエチレングリコ 一ノレモノビニノレエーテノレ、ポリエチレングリコーノレビニノレエーテノレ、クロノレエチノレビ二 ルエーテル等の単官能ビニルエーテル類; Methinolevino noreutenore, ecinolevino noreetetenore, propinore vinino ree tenore, butynorebi noenoe tenore, 2-echinore hexinorebi-noree tenore, eta-norebi-noreote nore, lauri nore ide Levinino Ree Tenore, Mocke Etche Renovino Ree Tenore, Ethoxyethyl dibi nore ether, Methoxyte qui ecyl bibi nore ether, Ethoxyeto A simple substance such as xycetyl vinyl ether, methoxypolyethylene glycol vinyl ether, 2-hydroxy ethyl vinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol mononole mono binno lee tenore, polyethylene glycono levinone lee tenole, clonole ethyle vinyl ether, etc. Functional vinyl ethers;

[0061] N—ビュルピロリドン、 N—ビュル力プロラタタム、 N—ビュル N メチルホルムアミド、 N —ビュルイミダゾール、 N ビュルホルムアミド、 N ビュルァセトアミド等の単官能 N— ビニル化合物類; [0061] Monofunctional N-vinyl compounds such as N-bulone pyrrolidone, N-bulyl proratatam, N-bulyl N methylformamide, N-bulyl imidazole, N-bulyl formamide, N-bulasetoamide and the like;

スチレン、 α—メチルスチレン、ビュルトルエン、酢酸ァリル、酢酸ビュル、プロピオン 酸ビニル、安息香酸ビニル等の単官能ビニル化合物類;  Monofunctional vinyl compounds such as styrene, α-methylstyrene, toluene, allyl acetate, vinyl acetate, vinyl propionate, vinyl benzoate and the like;

無水マレイン酸、マレイン酸、マレイン酸ジメチル、マレイン酸ジェチル、マレイン酸モ ノメチル、マレイン酸モノエチル、フマル酸、フマル酸ジメチル、フマル酸ジェチル、 フマル酸モノメチル、フマル酸モノエチル、無水ィタコン酸、ィタコン酸、ィタコン酸ジ メチル、ィタコン酸ジェチル、ィタコン酸モノメチル、ィタコン酸モノエチル、メチレンマ ロン酸、メチレンマロン酸ジメチル、メチレンマロン酸モノメチル、桂皮酸、桂皮酸メチ ル、桂皮酸ェチル、クロトン酸、クロトン酸メチル、クロトン酸ェチル等の単官能 α , β -不飽和化合物類; Maleic anhydride, maleic acid, dimethyl maleate, jetyl maleate, monomethyl maleate, monoethyl maleate, fumaric acid, dimethyl fumarate, jetyl fumarate, monomethyl fumarate, monoethyl fumarate, itaconic acid anhydride, itaconic acid, Dimethyl itaconate, jetyl itaconate, monomethyl itaconate, monoethyl itaconate, methylene malonic acid, dimethyl methylene malonate, monomethyl methylene malonate, cinnamic acid, methyl cinnamic acid, ethyl cinnamic acid, crotonic acid, methyl crotonate, Monofunctional α , β-unsaturated compounds such as ketyl crotonate;

[0062] エチレングリコールジ (メタ)アタリレート、ジエチレングリコールジ (メタ)アタリレート、ポ リエチレングリコールジ (メタ)アタリレート、プロピレングリコールジ (メタ)アタリレート、 ブチレングリコールジ (メタ)アタリレート、へキサンジオールジ (メタ)アタリレート、シク 口へキサンジメタノールジ (メタ)アタリレート、ビスフエノール Αアルキレンオキサイドジ (メタ)アタリレート、ビスフエノール Fアルキレンオキサイドジ (メタ)アタリレート、トリメチ  Ethylene glycol di (meth) atalylate, diethylene glycol di (meth) atalylate, polyethylene glycol di (meth) atalylate, propylene glycol di (meth) atalylate, butylene glycol di (meth) atalylate, hexane Diol di (meth) atalylate, Thiex Hexane dimethanol di (meth) atalylate, bisphenol Α alkylene oxide di (meth) atalylate, bis phenol F alkylene oxide di (meth) atalylate, trimethyl

、グリセリントリ(メタ)アタリレート、ペンタエリスリトールテトラ (メタ)アタリレート、ジペン タエリスリトールペンタ(メタ)アタリレート、ジペンタエリスリトールへキサ(メタ)アタリレ ート、エチレンオキサイド付カ卟リメチロールプロパントリ(メタ)アタリレート、エチレンォ キサイド付加ジトリメチロールプロパンテトラ (メタ)アタリレート、エチレンオキサイド付 加ペンタエリスリトールテトラ (メタ)アタリレート、エチレンオキサイド付加ジペンタエリ スリトールへキサ (メタ)アタリレート等の多官能 (メタ)アタリレート類; [0063] エチレングリコールジビニノレエーテル、ジエチレングリコールジビニノレエーテル、ポリ エチレングリコールジビニノレエーテル、プロピレングリコールジビニノレエーテル、ブチ レングリコールジビニルエーテル、へキサンジオールジビニルエーテル、ビスフエノー ル Aアルキレンオキサイドジビニルエーテル、ビスフエノール Fアルキレンオキサイドジ ビニノレエーテノレ、 トリメチローノレプロパントリビニノレエーテノレ、ジトリメチローノレプロパン テトラビニルエーテル、グリセリントリビニルエーテル、ペンタエリスリトールテトラビ二 ノレエーテノレ、ジペンタエリスリトーノレペンタビニノレエーテノレ、ジペンタエリスリトーノレへ キサビュルエーテル、エチレンオキサイド付加トリメチロールプロパントリビュルエーテ ル、エチレンオキサイド付カ卩ジトリメチロールプロパンテトラビュルエーテル、エチレン オキサイド付加ペンタエリスリトールテトラビュルエーテル、エチレンオキサイド付加ジ ペンタエリスリトールへキサビュルエーテル等の多官能ビュルエーテル類; Glycerin tri (meth) atalylate, pentaerythritol tetra (meth) atalylate, dipentaerythritol penta (meth) atalylate, dipentaerythritol hexa (meth) atarylate, ethylene glycol oxide methyl methacrylate propane tri ( Meta) atalylate, ethylene oxide added ditrimethylol propane tetra (meth) atalylate, ethylene oxide added pentaerythritol tetra (meth) atalylate, ethylene oxide added dipentaerythritol tritol oxa (meth) atalylate, etc. Multifunctional (meth) (meth) Atarilates; Ethylene glycol divinyl ether, diethylene glycol divinyl ether, polyethylene glycol divinyl ether, propylene glycol divinyl ether, butyl glycol divinyl ether, hexanediol divinyl ether, bis phenol A alkylene oxide di vinyl ether, bisphenol phenol F Alkylene oxide di Vininore e nore, Trimethyl nole propane Tri Vinolee Ene Nore, ditri methylo nore propane tetra vinyl ether, glycerin trivinyl ether, pentaerythritol tetra bibi nore etenore, dipenta Erytri Toeno penta bini Nore etenore, dipenta Erys Lithonol Hexabul ether, ethylene oxide-added trimethylolpropane tri Multifunctional buffal ethers such as buff ether, ethylene oxide-added ditrimethylolpropane tetrabule ether, ethylene oxide-added pentaerythritol tetrabule ether, and ethylene oxide-added dipentaerythritol hexabole ether;

[0064] ジビニルベンゼン等の多官能ビニル化合物類;  [0064] Multifunctional vinyl compounds such as divinylbenzene;

エチレングリコールジグリシジルエーテル、ジエチレングリコールジグリシジルエーテ ル、ポリエチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジル エーテル、ブチレングリコールジグリシジルエーテル、へキサンジオールジグリシジル エーテル、ビスフエノール Aアルキレンオキサイドジグリシジルエーテル、ビスフエノー ル Fアルキレンオキサイドジグリシジルエーテル、トリメチロールプロパントリグリシジル エーテル、ジトリメチロールプロパンテトラグリシジルエーテル、グリセリントリグリシジル エーテル、ペンタエリスリトーノレテトラグリシジノレエーテル、ジペンタエリスリトーノレペン タグリシジルエーテル、ジペンタエリスリトールへキサグリシジルエーテル、エチレンォ キサイド付加トリメチロールプロパントリグリシジルエーテル、エチレンオキサイド付カロ ジトリメチロールプロパンテトラグリシジルエーテル、エチレンオキサイド付カ卩ペンタエ リスリトールテトラグリシジルエーテル、エチレンオキサイド付加ジペンタエリスリトール へキサグリシジルエーテル等の多官能エポキシ化合物類;  Ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butylene glycol diglycidyl ether, hexanediol diglycidyl ether, bisphenol A alkylene oxide diglycidyl ether, bisphenol F alkylene Oxide diglycidyl ether, trimethylolpropane triglycidyl ether, ditrimethylolpropane tetraglycidyl ether, glycerin triglycidyl ether, pentaerythritole tetraglycidole ether, dipentaerythritole pentaglycidyl ether, dipentaerythryitol hexaglycidyl Ether, ethylene oxide addition Trimethylolpropane triglycidyl ether, ethylene oxide with Caro ditrimethylolpropane tetra glycidyl ether, mosquitoes with ethylene oxide 卩 Pentae Risuri tall tetraglycidyl ether, polyfunctional epoxy compounds such as hexa glycidyl ether to ethylene oxide adduct of dipentaerythritol;

ジ [1 メチル(3—ォキセタ -ル) ]メチルエーテル、ジ [1 ェチル(3—才キセタ -ル) ] メチルエーテル、 1, 4 ビス { [ (3—メチルー 3—ォキセタ -ル)メトキシ]メチル }べンゼ ン、 1, 4—ビス { [ (3—ェチルー 3—ォキセタ -ル)メトキシ]メチル }ベンゼン、ビス {4一 [ ( 3—メチルー 3—ォキセタ -ル)メトキシ]メチル }ベンジルエーテル、ビス {4一 [ (3—ェチ ルー 3—才キセタ -ル)メトキシ]メチル }ベンジルエーテル等の多官能脂環式エーテル 化合物類及びこれらのオリゴマー。 Di [1 methyl (3-oxetal)] methyl ether, di [1 cetyl (3-glycetal)] methyl ether, 1, 4 bis {[(3-methyl- 3-oxeta-l) methoxy] methyl } Benzene, 1,4-bis [[(3-ethyl-3-oxetayl) methoxy] methyl} benzene, bis {4-([3-methyl-3-oxeta-l) methoxy] methyl} benzyl ether, Bis {4 1 [(3-Echi (3) R.sup.3 -C.sub.4 -C.sub.4) Methcyl) Methoxy] Methyl} Multifunctional alicyclic ether compounds such as benzyl ether and oligomers of these.

[0065] これらの中でも、メチル(メタ)アタリレート、ブチル (メタ)アタリレート、 2—ェチルへキ シル (メタ)アタリレート、メトキシポリエチレングリコール (メタ)アタリレート、(メタ)アタリ ル酸、ブチルビ-ルエーテル、シクロへキシルビ-ルエーテル、無水マレイン酸、マ レイン酸、マレイン酸ジメチル、マレイン酸ジェチル及びこれらのオリゴマーなどが好 適である。 Among these, methyl (meth) atalylate, butyl (meth) atalylate, 2-ethylhexyl (meth) atalylate, methoxypolyethylene glycol (meth) atalylate, (meth) atalic acid, butylbi -Ruethers, cyclohexyl vinyl ethers, maleic anhydride, maleic acid, dimethyl maleate, jetyl maleate and their oligomers and the like are preferable.

[0066] また、ビニルエーテル基含有アクリルィ匕合物も好ましい化合物である。ビュルエー テル基含有アクリルィ匕合物としては、例えばビュルエーテル基含有 (メタ)アクリル酸 エステル類が挙げられる。ビニルエーテル基含有 (メタ)アクリル酸エステルとしては、 次の化合物が好適である。  In addition, vinyl ether group-containing acrylic compounds are also preferable compounds. Examples of the butyl ether group-containing acrylic compound include bule ether group-containing (meth) acrylic acid esters. The following compounds are preferable as the vinyl ether group-containing (meth) acrylic acid ester.

[0067] (メタ)アクリル酸 2—ビ-ロキシェチル、(メタ)アクリル酸 3—ビ-ロキシプロピル、(メタ) アクリル酸 1ーメチルー 2—ビ-ロキシェチル、(メタ)アクリル酸 2—ビ-ロキシプロピル、 (メタ)アクリル酸 4ービ-口キシブチル、(メタ)アクリル酸 1ーメチルー 3—ビ-ロキシプロ ピル、(メタ)アクリル酸 1—ビ-ロキシメチルプロピル、(メタ)アクリル酸 2—メチルー 3— ビ-ロキシプロピル、(メタ)アクリル酸 3—メチルー 3—ビ-ロキシプロピル、(メタ)アタリ ル酸 1 , 1 ジメチルー 2—ビ-口キシェチル、(メタ)アクリル酸 3—ビ-口キシブチル、(メ タ)アクリル酸 1ーメチルー 2—ビ-ロキシプロピル、(メタ)アクリル酸 2—ビ -ロキシブチ ル、(メタ)アクリル酸 4 ビ-ロキシシクロへキシル、(メタ)アクリル酸 5—ビ-ロキシぺ ンチル、(メタ)アクリル酸 6—ビ -ロキシへキシル、(メタ)アクリル酸 4ービ -ロキシメチ ルシクロへキシルメチル、(メタ)アクリル酸 3—ビ-ロキシメチルシクロへキシルメチル、 (メタ)アクリル酸 2—ビ-ロキシメチルシクロへキシルメチル、(メタ)アクリル酸 p ビ-ロ キシメチルフエ-ルメチル、(メタ)アクリル酸 m—ビ-ロキシメチルフエ-ルメチル、(メ タ)アクリル酸 o—ビ-ロキシメチルフエ-ルメチル、(メタ)アクリル酸 2— (ビ-ロキシエト キシ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシ)ェチル、(メタ)アクリル 酸 2— (ビ-ロキシエトキシ)プロピル、(メタ)アクリル酸 2— (ビ-ロキシエトキシ)イソプ 口ピル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシ)プロピル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシ)イソプロピル、(メタ)アクリル酸 2— (ビ-ロキシエトキシエト キシ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシエトキシイソプロポキシ)ェチル、(メタ) アクリル酸 2— (ビ-ロキシイソプロポキシエトキシ)ェチル、(メタ)アクリル酸 2— (ビ-口 キシイソプロポキシイソプロポキシ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシエトキシェ トキシ)プロピル、(メタ)アクリル酸 2— (ビ-ロキシエトキシイソプロポキシ)プロピル、 ( メタ)アクリル酸 2— (ビ-ロキシイソプロポキシエトキシ)プロピル、(メタ)アクリル酸 2— ( ビ-ロキシイソプロポキシイソプロポキシ)プロピル、(メタ)アクリル酸 2— (ビ-口キシェ トキシエトキシ)イソプロピル、(メタ)アクリル酸 2— (ビ-ロキシエトキシイソプロポキシ) イソプロピル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシエトキシ)イソプロピル、 ( メタ)アクリル酸 2— (ビ-ロキシイソプロポキシイソプロポキシ)イソプロピル、(メタ)ァク リル酸 2— (ビ-ロキシエトキシエトキシエトキシ)ェチル、(メタ)アクリル酸 2— (ビ -ロキ シエトキシエトキシエトキシエトキシ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシイソプロ ポキシエトキシ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシエトキシェトキ シ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシエトキシエトキシエトキシ) ェチル、(メタ)アクリル酸 2— (ビ-ロキシイソプロポキシエトキシエトキシエトキシェトキ シ)ェチル、(メタ)アクリル酸ポリエチレングリコールモノビュルエーテル、(メタ)アタリ ル酸ポリプロピレングリコールモノビュルエーテル。 [0067] (Meth) acrylic acid 2-bi-loxycetyl, (meth) acrylic acid 3-bi-loxypropyl, (meth) acrylic acid 1-methyl- 2-bi-loxycetyl, (meth) acrylic acid 2-bi-loxypropyl (Meth) acrylic acid 4-bi-port xylbutyl, (meth) acrylic acid 1-methyl-3-bi-hydroxypropyl, (meth) acrylic acid 1-bi-hydroxymethylpropyl, (meth) acrylic acid 2-methyl-3- Bi-hydroxypropyl, (meth) acrylic acid 3-methyl-3-bi-hydroxypropyl, (meth) atalic acid 1, 1 dimethyl-2 bi-mouth xycethyl, (meth) acrylic acid 3-bi-mouth x-butyl ( (Meta) acrylic acid 1-methyl-2-bi-hydroxypropyl, (meth) acrylic acid 2-bi-hydroxybutyl, (meth) acrylic acid 4 bi-hydroxycyclohexyl, (meth) acrylic acid 5-bi-loxy Penthyl, (meth) acrylic acid 6-bi-hydroxyhexyl, (meth) acrylic acid 4-bi-oxymethylcyclohexylmethyl, (meth) acrylic acid 3-bi-hydroxymethylcyclohexylmethyl, (meth) acrylic acid 2-Bi-hydroxymethylcyclohexyl, p-hydroxymethylphenyl (meth) acrylate, (meth) acrylic acid m-bi-hydroxymethylphenyl methyl, (meth) acrylic acid o-bioxymethylmethyl Phenylmethyl, (meth) acrylic acid 2- (bi-loxyethoxy) ethyl, (meth) acrylic acid 2- (bi-oxyisopropoxy) ethyl, (meth) acrylic acid 2- (bi-loxyethoxy) propyl, (Meth) acrylic acid 2- (bi-loxyethoxy) isopropyl ether, (meth) acrylic acid 2- (bi-loxyisopropoxy) propyl, (meth) acrylic acid 2- (bi-oxyisopropoxy) isopropyl, (meth) acrylic acid 2- (bi-oxyethoxy etho) Xyl) ethyl, (meth) acrylic acid 2- (bi-loxyethoxyisopropoxy) ethyl, (meth) acrylic acid 2-(bi-oxyisopropoxyethoxy) ethyl, (meth) acrylic acid 2-(bi-hydroxy) Isopropoxy isopropoxy) ethyl, (meth) acrylic acid 2- (bi-oxyethoxyethoxy) propyl, (meth) acrylic acid 2- (bi-oxyethoxyisopropoxy) propyl, (meth) acrylic acid 2- (bi) -Hydroxy isopropoxy ethoxy) propyl, (meth) acrylic acid 2-(bi-oxy isopropoxy isopropoxy) propyl, (meth) acrylic acid 2-(bi-ported xylethoxy) isopropyl, (meth) acrylic acid 2- (Bi-oxyethoxyisopropoxy) isopropyl, (meth) acrylic acid 2- (bi-oxyisopropoxyethoxy) isop ROPHIL, (Meth) acrylic acid 2- (bi-oxyisopropoxy isopropoxy) isopropyl, (meth) acrylic acid 2- (bi-oxyethoxyethoxyethoxy) ethyl, (meth) acrylic acid 2- (bi-loxy Siethoxyethoxyethoxyethoxy) ethyl, (meth) acrylic acid 2- (bi-hydroxyisopropoxyethoxy) ethyl, (meth) acrylic acid 2- (bi-oxyisopropoxyethoxy-ethoxy) ethyl, (meth) acrylic acid 2- (Bi-oxyisopropoxyethoxyethoxyethoxy) hydroxyethyl, (meth) acrylic acid 2- (bi-oxyisopropoxyethoxyethoxyethoxyethoxy) ethyl, (meth) acrylic acid polyethylene glycol monobutyl ether, (meth) acrylic acid Polypropylene glycol monobule ether.

[0068] これらの化合物はオリゴマーであってもよい。これらの中でも、(メタ)アクリル酸 2—ビ 二口キシェチル、(メタ)アクリル酸 3—ビ-ロキシプロピル、(メタ)アクリル酸 1ーメチルー 2—ビ-ロキシェチル、(メタ)アクリル酸 2—ビ-ロキシプロピル、(メタ)アクリル酸 4—ビ 二口キシブチル、(メタ)アクリル酸 4ービ-口キシシクロへキシル、(メタ)アクリル酸 5— ビ-ロキシペンチル、(メタ)アクリル酸 6—ビ -ロキシへキシル、(メタ)アクリル酸 4-ビ -ロキシメチルシクロへキシルメチル、(メタ)アクリル酸 p—ビ-ロキシメチルフエ-ルメ チル、(メタ)アクリル酸 2— (ビ-ロキシエトキシ)ェチル、(メタ)アクリル酸 2— (ビ -ロキ シエトキシエトキシ)ェチル、(メタ)アクリル酸 2— (ビ-ロキシエトキシエトキシエトキシ) ェチル及びそれらのオリゴマーが好適である。  [0068] These compounds may be oligomers. Among these, 2-methacrylic acid (2-meth) acrylic acid, 2-methacrylic acid (3-meth-acrylic acid), 1-methyl-2-methacrylic acid (2-methacrylic acid), 2-methacrylic acid (2-methacrylic acid) Roxypropyl, (meth) acrylic acid 4-bi-biphenyl x-butyl, (meth) acrylic acid 4-bi-port xycyclohexyl, (meth) acrylic acid 5-bi-oxypentyl, (meth) acrylic acid 6-bi- Roxyhexyl, 4-bi-hydroxymethylcyclohexyl (meth) acrylate, p-bi-hydroxymethylphenyl (meth) acrylate, 2-methacrylic acid 2- (bi-ethoxyethoxy) ethyl, (Meth) acrylic acid 2- (bi- oxyethoxyethoxy) ethyl, (meth) acrylic acid 2- (bi-oxyethoxyethoxyethoxy) hydroxyethyl and their oligomers are preferred .

[0069] 一方、水溶性または水性ェマルジヨン形成性で不飽和結合を有しない化合物とし ては、例えば、酢酸ビニル系重合体、エチレン ·ビュルエステル系重合体、アクリル系 重合体、塩化ビニル系重合体、塩化ビニリデン系重合体、スチレン系重合体、ポリウ レタン、ポリエステル、エポキシ榭脂、シリコーン榭脂、ポリブテン、ポリブタジエン、ブ タジェン系共重合体、ポリイソプレン、ポリクロ口プレン、多硫ィ匕ゴムなどが挙げられるOn the other hand, examples of the compound which is water-soluble or aqueous dispersion-forming and has no unsaturated bond include, for example, a vinyl acetate polymer, an ethylene / bule ester polymer, an acrylic polymer, and a vinyl chloride polymer. , Vinylidene chloride polymers, styrene polymers, Resin, polyester, epoxy resin, silicone resin, polybutene, polybutadiene, butadiene copolymer, polyisoprene, polychloroprene, polysulfide rubber, etc. may be mentioned.

。これらは、単独で用いられても、 2種類以上が併用されてもよい。これらとしては、中 でも、ポリウレタン、エチレン 'ビュルエステル共重合体、アクリル系重合体が好ましい 。これら水溶性または水性ェマルジヨン形成性榭脂は、放射線重合可能な不飽和二 重結合が含まれた構造を有するものであっても良 、。 . These may be used alone or in combination of two or more. Among these, polyurethane, ethylene ′ ′ boule ester copolymer, and acrylic polymer are preferable among them. These water-soluble or aqueous emulsion-forming resins may have a structure containing a radiation-polymerizable unsaturated double bond.

[0070] また、水溶性または水性ェマルジヨン形成性榭脂としては、上記の他ポリアクリルァ ミド、ポリビニルピロリドンなどの榭脂、水酸基またはカルボン酸基を含んだ水溶性ま たは水分散性共重合ポリエステル、ポリアクリル酸、ポリメタクリル酸などのアクリル酸 系榭脂、ポリアクリル酸エステル、ポリメタクリル酸エステルなどのアクリル酸エステル 系榭脂、ポリエチレンテレフタレート、ポリブチレンテレフタレート、などのエステル榭 脂、ポリスチレン、ポリ α—メチルスチレン、ポリクロロメチルスチレン、ポリスチレンス ルホン酸、ポリビュルフエノールなどのスチレン系榭脂、ポリビュルメチルエーテル、 ポリビュルェチルエーテルなどのビュルエーテル榭脂、ポリビュルアルコール、ポリビ ニルホルマール、ポリビュルプチラールなどのポリビュルアルコール類、ノボラック、レ ゾールなどのフエノール榭脂などが用いられてもよ!/、。  In addition, as the water-soluble or aqueous dispersion-forming resin, other than the above-mentioned resins such as polyacrylamide and polyvinyl pyrrolidone, a water-soluble or water-dispersible copolymer polyester containing a hydroxyl group or a carboxylic acid group, Acrylic acid resin such as polyacrylic acid and polymethacrylic acid, acrylic acid ester resin such as polyacrylic acid ester and polymethacrylic acid ester resin, ester resin such as polyethylene terephthalate and polybutylene terephthalate, polystyrene, poly α -Styrene-based resins such as methylstyrene, polychloromethylstyrene, polystyrene sulfone acid and polyphenylphenol, polybutyl ether, polybutyl ether, polybutyl alcohol, polyvinyl alcohol, polyvinyl formal, poly Poly Bulle alcohols such as butyral, a novolak, also like phenol 榭脂 such as Les Orres is used! /,.

[0071] また、本発明の放射線硬化型導電性組成物にお!ヽては、水溶性または水性エマ ルジョンタイプ (形成性)のエポキシまたはォキセタンィ匕合物が用いられる。このような エポキシまたはォキセタン化合物としては、例えば、メチルダリシジルエーテル、ェチ ルグリシジルエーテル、プロピルグリシジルエーテル、ブチルダリシジルエーテル、 2 ーェチルへキシルグリシジルエーテル、 η—ノ -ルグリシジルエーテル、ラウリルグリシ ジルエーテル、シクロへキシルグリシジルエーテル、メトキシェチルダリシジルエーテ ル、エトキシェチルダリシジルエーテル、メトキシエトキシェチルダリシジルエーテル、 エトキシエトキシェチルダリシジルエーテル、メトキシポリエチレングリコールグリシジ ルエーテル等の単官能エポキシ化合物類; 3—メチルー 3—ヒドロキシメチルォキセタン 、 3—ェチルー 3—ヒドロキシメチルォキセタン、 3—メチルー 3—フエノキシメチルォキセタ ン、 3—ェチルー 3 フエノキシメチルォキセタン、 3—メチルー 3—(2—ェチルへキシロキ シメチル)ォキセタン、 3—ェチルー 3—(2 ェチルへキシロキシメチル)ォキセタン等の 単官能脂環式エーテル化合物類が挙げられる。エポキシまたはォキタセン化合物はIn addition, the radiation-curable conductive composition of the present invention! In this regard, water-soluble or aqueous emulsion-type (forming) epoxy or oxetane blends are used. As such an epoxy or oxetane compound, for example, methyl dalysidyl ether, ethyl glycidyl ether, propyl glycidyl ether, butyl dalysidyl ether, 2-ethyl hexyl glycidyl ether, η- noyl glycidyl ether, lauryl glycidyl Monofunctional epoxy such as ether, cyclohexyl glycidyl ether, methoxy ethyl dalysyl ether, ethoxy ethyl dalysyl ether, methoxy ethoxy ethyl dalysidyl ether, ethoxy ethoxy ethyl dalysidyl ether, methoxy polyethylene glycol glycidyl ether Compounds; 3-Methyl-3-hydroxymethyloxetane, 3-Ethyl-3-hydroxymethyloxetane, 3-Methyl-3-phenoxymethyloxetane, 3-Ethyl 3 Phenyloxymethyloxetane, 3-methyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl 3- (2-acetylhexyloxymethyl) oxetane, etc. Monofunctional alicyclic ether compounds are mentioned. Epoxy or oxacene compounds are

、水溶性またはェマルジヨン形成性ィ匕合物に対し 5— 80重量%、好ましくは 10— 50 重量%の量で用いられる。 The water-soluble or emulsion-forming compound is used in an amount of 5 to 80% by weight, preferably 10 to 50% by weight.

[0072] さらに、本発明にお 、ては、水溶性または水性ェマルジヨンタイプのエポキシ基含 有化合物として、多官能エポキシィ匕合物、ビスフエノール A型水溶性エポキシィ匕合物 、ノボラック型水溶性エポキシィ匕合物などが用いられてもよい。多官能エポキシィ匕合 物としては、例えばジグリセリンポリグリシジルエーテルなどが挙げられる。これらは、 水溶性またはェマルジヨン形成性ィ匕合物に対し 5— 50重量%、好ましくは 10— 30重 量%の量で含有される。  Furthermore, in the present invention, as the water-soluble or aqueous emulsion type epoxy group-containing compound, a polyfunctional epoxy compound, bisphenol A type water-soluble epoxy compound, novolac type water-soluble compound. Epoxy compound may be used. Examples of multifunctional epoxy compounds include diglycerin polyglycidyl ether and the like. These are contained in an amount of 5 to 50% by weight, preferably 10 to 30% by weight, based on the water-soluble or emulsion-forming compound.

[0073] 放射線硬化するカチオン重合タイプのモノマー、オリゴマーないし高分子化合物と ともに、カチオン光重合開始剤が使用されるが、このカチオン光重合開始剤としては 、放射線の照射により酸が発生される光酸発生剤が好ましいものとして挙げられる。 カチオン光重合開始剤として使用できる光酸発生剤は、イオン性の化合物と非ィォ ン性の化合物に大別できる。イオン性の化合物としてはァリールジァゾ -ゥム塩、ジ ァリールョードニゥム塩、トリアリールスルホ-ゥム塩及びトリアリールホスホ-ゥム塩等 があり、対イオンとして BF―、 PF―、 AsF―、 SbF—などが用いられる。このようなォ- A cationic photopolymerization initiator is used together with a radiation-curable cationic polymerization type monomer, oligomer or polymer compound, and as this cationic photopolymerization initiator, light in which an acid is generated upon irradiation with radiation is used. An acid generator is mentioned as a preferable thing. Photoacid generators that can be used as a cationic photopolymerization initiator can be roughly classified into ionic compounds and non-ionic compounds. Examples of the ionic compound include aryldiazo-m salt, diaryliodium salt, triarylsulfo-m salt and triarylphospho-m salt, and the like, and the counter ion BF-, PF-, AsF-, SbF-, etc. are used. Like this

4 6 6 6 4 6 6 6

ゥム塩系の光酸発生剤には必要に応じてアンスラセンゃ、チォキサントンのような光 増感剤を併用することができる。非イオン性の光酸発生剤としては、光照射によって カルボン酸、スルホン酸、リン酸、ハロゲンィ匕水素等を生成するものが使用でき、具体 的には光酸発生剤として、スルホン酸の 2—二トロべンジルエステル、イミノスルホナ一 ト、 1 ォキソ—2—ジァゾナフトキノン 4 スルホナート誘導体、 N—ヒドロキシイミドスル ホナート、トリ(メタンスルホ -ルォキシ)ベンゼン誘導体等が利用でき、さらにカルボ ン酸 o—-トロべンジルエステル、 1 ォキソ 2 ジァゾナフトキノン 5—ァリールスルホ ナート、トリアリールリン酸エステル誘導体等が使用できる。カチオン光重合開始剤は 、水溶性またはェマルジヨン形成性ィ匕合物に対し 1一 10重量%、好ましくは 2— 5重 量%の量で用いられる。  A photosensitizer such as anthracene or thioxanthone can be used in combination with the photoacid generator of the um salt type, if necessary. As the non-ionic photoacid generator, those capable of generating carboxylic acid, sulfonic acid, phosphoric acid, halogen hydrogen and the like by light irradiation can be used. Specifically, as the photoacid generator, sulfonic acid Nitrobenzyl ester, iminosulfonate, 1-oxo-2-diazonaphthoquinone 4 sulfonate derivative, N-hydroxyimidosulfonate, tri (methanesulfo-methoxy) benzene derivative, etc. can be used, and carboxylic acid o-tro Benzyl ester, 1-oxo 2-diazonaphthoquinone 5-aryl sulfonate, triaryl phosphate ester derivative and the like can be used. The cationic photoinitiator is used in an amount of 110% by weight, preferably 2-5% by weight, based on the water-soluble or emulsion-forming compound.

[0074] 本発明の組成物においては、上記不飽和二重結合を有する化合物を光重合する ため、ラジカル光重合開始剤が必要に応じ用いられる。このラジカル光重合開始剤と しては、従来不飽和二重結合を有する化合物を光重合する際に用いられて 、た重 合開始剤の何れのものも本発明においては使用することができる。このようなラジカ ル光重合開始剤としては、具体的には、ベンゾフエノン、ァセトフエノン、ベンゾイン及 びべンゾインのメチル、ェチル、イソプロピル、ブチルまたはイソブチルエーテル、 α —ヒドロキシまたは α—アミノアリールケトン及びべンジルケタールである。ラジカル光 重合開始剤は、水溶性またはェマルジヨン形成性ィ匕合物に対し 1一 10重量%、好ま しくは 2— 5重量%の量で用いられる。 In the composition of the present invention, a radical photopolymerization initiator is optionally used to photopolymerize the compound having the unsaturated double bond. With this radical photoinitiator Any of the polymerization initiators conventionally used in photopolymerization of compounds having unsaturated double bonds can be used in the present invention. Specific examples of such radical photopolymerization initiators include benzophenone, acetophenone, benzoin and benzoin methyl, ethyl, isopropyl, butyl or isobutyl ether, α-hydroxy or α-amino aryl ketone and benzyl ketal. It is. The radical photoinitiators are used in amounts of 110% by weight, preferably 2-5% by weight, based on the water-soluble or emulsion-forming compound.

また、上記化合物を混合する際、高粘度の場合イソプロピルアルコール (ΙΡΑ)等の 水可溶性の有機溶剤を適時混合することで粘度を調整することができる。また、エマ ルジョンを形成する際、水に不溶な化合物を水可溶性の有機溶剤に溶力 界面活 性剤にてェマルジヨンィ匕することができる。水可溶性の有機溶剤としては、ケトン系水 可溶性有機溶剤としては、例えば、メチルェチルケトン、メチルイソプチルケトン、メチ ルブチルケトン、ェチルブチルケトン、シクロへキサノン、イソホロン等があげられる。 これ以外の水可溶性有機溶剤としては、例えば、酢酸ェチル、酢酸プチル、酢酸イソ ブチル、酢酸イソプロピル、酢酸セコンダリーブチル、酢酸エチレングリコールモノメ チルエーテル、酢酸エチレングリコールモノェチルエーテル、酢酸エチレングリコー ルモノブチルエーテル等の酢酸エステル系溶剤;エタノール、 η—プロピルアルコー ル、イソプロピルアルコール、 η—ブチルアルコール、イソブチルアルコール、セコンダ リーブチルアルコール、ターシャリーブチルアルコール、 η -ァミルアルコール、イソァ ミルアルコール、セコンダリーアミルアルコール、ターシャリーアミルアルコール、シク 口へキサノール、エチレングリコーノレ、プロピレングリコール、ブチレングリコーノレ等の アルコール系溶剤;エチレングリコールモノメチルエーテル、エチレングリコールモノ ェチノレエーテノレ、エチレングリコーノレジメチノレエーテノレ、エチレングリコーノレジェチノレ エーテノレ、ジエチレングリコーノレモノメチノレエーテノレ、ジエチレングリコーノレモノブチ ルエーテル等のグリコールエーテル系溶剤;ジォキサン、ジメチルジォキサン等のェ 一テル系溶剤;等があげられる。特に、グリコールエーテル系溶剤は、水及び他の有 機溶剤との相溶性も良ぐまた有機溶剤可溶な榭脂または他の添加物を良く溶解す ることが出来、最適な溶剤であるといえる。 [0076] 本発明の放射線硬化型導電性組成物には、ェマルジヨンを安定ィ匕するため分散剤 力 S用いられてもよい。分散剤としては、ノ-オン系界面活性剤、カチオン系界面活性 剤、ァ-オン系界面活性剤等がある力 ポリア-リン及び Zまたはスルホンィ匕ポリア- リンに対して、スルホン酸基及び Zまたはそのアルカリ金属塩基の結合したポリエス テル榭脂またはポリ陰イオンの存在下でのポリチォフェン水溶液には、ノ-オン系界 面活性剤が特に優れている。分散剤は、放射線硬化型導電性組成物に対し 0. 5— 5重量%、好ましくは 1一 3重量%の量で用いられる。 Further, when mixing the above-mentioned compounds, the viscosity can be adjusted by appropriately mixing a water-soluble organic solvent such as isopropyl alcohol (ΙΡΑ) in the case of high viscosity. In addition, when forming an emulsion, a compound insoluble in water can be emeryged with a water-soluble organic solvent using a solvating surfactant. Examples of water-soluble organic solvents include ketone-based water-soluble organic solvents, such as methyl ethyl ketone, methyl isopyl ketone, methyl butyl ketone, ethyl butyl ketone, cyclohexanone, isophorone and the like. Other water-soluble organic solvents include, for example, ethyl acetate, butyl, acetate, isopropyl acetate, isopropyl acetate, secethyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, etc. Acetate ester solvents; ethanol, η -propyl alcohol, isopropyl alcohol, η-butyl alcohol, isobutyl alcohol, secondary butyl alcohol, tertiary butyl alcohol, η-amyl alcohol, isoamyl alcohol, secondary amyl alcohol, tasha Alcohol solvents such as lyamyl alcohol, organic acid hexanol, ethylene glycolonole, propylene glycol, butylene glycolonole; ethylene glycol Glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol monoethyl phenole ethylene glycol, ethylene glycol mono methyl ethyl alcohol, ethylene glycol mono methyl ethyl alcohol, ethylene glycol mono methyl ethyl ketone, ethylene glycol mono lithium methyl ether, di ethylene glycol mono methyl nore ether, di ethylene glycol mono ethyl ether Solvents: Ether-based solvents such as dioxane and dimethyl dioxane; and the like. In particular, glycol ether solvents have good compatibility with water and other organic solvents, and can dissolve organic solvent-soluble resins or other additives well, making them an optimal solvent. It can be said. In the radiation-curable conductive composition of the present invention, a dispersant S may be used to stabilize the emulsion. Examples of the dispersing agent include surfactants such as NO-ON type surfactants, cationic surfactants, and A-ON type surfactants. Polyallyn and Z or sulfonic or polyallyl ester, sulfonic acid groups and Z Alternatively, NO-ON based surfactant is particularly excellent for an aqueous solution of polythiophen in the presence of polyester resin or polyanion to which an alkali metal base is bound. The dispersant is used in an amount of 0.5-5% by weight, preferably 13% by weight, based on the radiation-curable conductive composition.

[0077] ただし、使用する有機導電性ポリマーはイオン性であるため、感光剤等がイオン性 であると有機導電性ポリマーが凝集を起こし、沈殿物を生成する場合がある。鋭意研 究の結果、感光剤の混合割合を下げることにより、凝集が発生しないことが判明した 。イオン性のカチオン光重合開始剤の混合割合は、他の固形分に対して 3%以下で あることが好ましい。  However, since the organic conductive polymer to be used is ionic, if the photosensitizer etc. is ionic, the organic conductive polymer may be coagulated to form a precipitate. As a result of intensive studies, it was found that aggregation was not generated by lowering the mixing ratio of the photosensitizer. The mixing ratio of the ionic cationic photopolymerization initiator is preferably 3% or less with respect to the other solid content.

[0078] 本発明の放射線硬化型導電性組成物は、ェマルジヨンタイプとされ基材に塗布さ れる。塗布時の組成物の固形分濃度は特に限定されるものではないが、 0. 5— 50 重量%、好ましくは 1一 30重量%である。塗布すべき基材としては、特に制限されな いが、通常、ガラス、フィルム、繊維などである。特に、ガラスや、ポリエステル、ナイ口 ン、ポリプロピレン、ポリエチレンなどの熱可塑性榭脂からなるフィルム、芳香族ポリア ミド、ポリアミドイミド、ポリイミドなどの有機溶媒可溶型の榭脂からなるフィルムなどが 好ましい。  The radiation-curable conductive composition of the present invention is of emulsion type and is applied to a substrate. The solid content concentration of the composition at the time of application is not particularly limited, but is 0.5 to 50% by weight, preferably 1 to 30% by weight. The substrate to be coated is not particularly limited, but usually, glass, film, fiber and the like. In particular, a film made of glass, a thermoplastic resin such as polyester, nylon, polypropylene or polyethylene, or a film made of an organic solvent-soluble resin such as aromatic polyamide, polyamideimide or polyimide is preferable.

[0079] 上記基材表面に本発明の導電性組成物を塗布する方法としては、グラビアロール コーティング法、リバースロールコーティング法、ナイフコータ法、ディップコータ法、ス ピンコート法などが挙げられるが、従来塗膜を形成する方法であればよく特に限定さ れない。形成された塗膜は、適宜の温度で加熱、乾燥後、放射線、例えば紫外線照 射が行われ、塗膜の硬化が図られる。これにより、基材表面に導電性の硬化被膜が 形成される。加熱乾燥は、通常 50— 200°Cの温度で、 10— 300秒程度行われる。ま た、放射線としては、紫外線、遠紫外線、 X線、電子線などいずれのものでもよいが、 通常紫外線が装置の汎用性の点力 好ましい。放射線の照射量は、塗膜が硬化す る量であればよぐ特にそれ以上限定されるものではない。放射線として紫外線を用 いる場合、使用される組成物の組成、膜厚などにより異なるものの、照射量は通常 1, 000— 20, OOOmjZcm2、好まし <は 5, 000— 15, OOOmjZcm2程度である。 Examples of the method for applying the conductive composition of the present invention to the surface of the substrate include gravure roll coating, reverse roll coating, knife coater, dip coater, spin coating, etc. It is not particularly limited as long as it is a method of forming a film. The formed coating is heated and dried at an appropriate temperature, and then radiation such as ultraviolet irradiation is performed to cure the coating. Thus, a conductive cured film is formed on the surface of the substrate. The heat drying is usually performed at a temperature of 50 to 200 ° C. for about 10 to 300 seconds. The radiation may be any of ultraviolet rays, far ultraviolet rays, X-rays, electron beams, etc. Usually, ultraviolet rays are preferred as the general point power of the apparatus. The radiation dose is not particularly limited as long as the coating film cures. Use UV as radiation In the case where the composition is used, although the dose varies depending on the composition of the composition to be used, the film thickness, etc., the irradiation dose is usually about 1,000 to 20, OOOmj Zcm 2 , preferably about 5,000 to 15, OOOmj Zcm 2 .

発明の効果  Effect of the invention

[0080] 本発明の導電性組成物により、透明で、耐溶剤性に優れ、高い表面硬度を有し、 かつ低湿度下でも高 、導電性を有する膜が形成でき、例えば帯電防止膜として好ま しく用いられる。  The conductive composition of the present invention can form a transparent film having excellent solvent resistance, high surface hardness, and high conductivity even under low humidity, for example, preferred as an antistatic film. Used.

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0081] 以下、実施例を示してさらに詳細に説明するが、本発明が以下の実施例に限定さ れるものではない。なお、以下においては、特に断りがない限り、%は重量%を示す 実施例 1 The present invention will be described in more detail by way of examples, but the present invention is not limited to the following examples. In the following,% indicates% by weight unless otherwise noted. Example 1

[0082] 導電性材料として、ポリスチレンスルホン酸(固形分量 1. 2%)がドーパントとして含 有されたポリエチレン ジォキシチォフェンコロイドの水性分散液(ポリエチレンージォ キシチォフェンの固形分量 2%)が用いられた。これとは別に、ウレタンアタリレート水 性ェマルジヨン (荒川化学工業製 EM90、固形分量 40%)にポリプロピレングリコー ルモノメチルエーテルを混合し、ウレタンアタリレート 10%ェマルジヨン溶液を作成し た。この溶液に、多官能グリコール系エポキシィ匕合物であるジグリセリンポリグリシジ ルエーテルの 10%ポリプロピレングリコールモノメチルエーテルエマルジヨン溶液を 添加、混合し、 10%固形分を有するベース溶液を得た。その後、このベース溶液の 固形分量に対してカチオン光重合開始剤 (ィルガキュア一 250、チバガイギ社製)を 2%及びラジカル光重合開始剤 (ィルガキュア一 184、チバガイギ社製) 3%を添加、 混合し、さらに上記のポリチォフェンコロイド溶液を有機導電性材料の固形分濃度が 前記ベース溶液の固形分の 10%となるように調整しデイスパーの撹拌下に添加し、 添加後 1. 5時間さらにデイスパーにて撹拌した。このェマルジヨン溶液は、白濁して おり、成分分離はみられなかった。この溶液を、クリアランスが 10 mのアプリケータ 一を用いて PET (ポリエチレンテレフタレート)フィルム上に塗布し、 100°Cで乾燥さ せ、その後 UV照射装置にて lOOOmJの照射量で照射して塗膜を硬化せしめ、硬化 被膜 (ノ、ードコート)を形成した。得られた硬化被膜の表面抵抗は、 0. 2-0. 5Μ Ωで あり、硬化被膜は透明であった。得られた被膜の光透過率、耐熱性、密着性、表面 硬度を下記測定法に基づき測定した。結果を表 1に示す。 As a conductive material, an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used. Separately from this, polypropylene glycol monomethyl ether was mixed with urethane atalylate aqueous emulsion (EM 90, manufactured by Arakawa Chemical Industries, Ltd., solid content 40%) to prepare a urethane atarylate 10% emulsion solution. To this solution, a 10% polypropylene glycol monomethyl ether emulsion solution of diglycerin polyglycidyl ether which is a multifunctional glycol-based epoxy compound was added and mixed to obtain a base solution having a 10% solid content. Thereafter, 2% of a cationic photopolymerization initiator (Irgacure I 250, manufactured by Ciba-Geigy) and 3% of a radical photopolymerization initiator (Irgacure I 184, manufactured by Ciba-Geigy) are added to the solid content of the base solution and mixed. Further, the above-mentioned polythiophen colloid solution is adjusted so that the solid content concentration of the organic conductive material is 10% of the solid content of the above base solution, and added under stirring of the disper, and further 1.5 h after the addition. Stir at. The emulsion solution was cloudy, and no component separation was observed. This solution is applied on a PET (polyethylene terephthalate) film using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with a UV irradiation device at an irradiation dose of lOO m J Was cured to form a cured coating (no coat). The surface resistance of the obtained cured film is 0.2-0.5 Ω Yes, the cured film was clear. The light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured based on the following measurement methods. The results are shown in Table 1.

[0083] (光透過率) (Light transmittance)

PETに作製したハードコートを日本電色製 COH 300Aにより PET込みの光透過 率として測定した。  The hard coat produced on PET was measured as light transmittance of PET incorporated by Nippon Denshoku COH 300A.

(耐熱試験)  (Heat test)

80°Cで 1000時間オーブン中に保持した後、被膜の抵抗値を測定し、耐熱試験前 の抵抗値との変化を調べた。  After holding in an oven at 80 ° C. for 1000 hours, the resistance value of the film was measured to examine the change from the resistance value before the heat resistance test.

[0084] (密着性試験) (Attachment test)

ハードコート表面にカッターを用いて、 1mm X 1mmの間隔で傷を付け 100個の升 目に、セロテープ (登録商標;ニチバン (株)製) No. 405を貼り付け、 30秒後にセロ テープを剥がし、剥がれたり、エッジが欠けた升目の数を観察した。 100個の升目が 残っているものを〇、升目の一部がかけたものがあるものを△、升目が複数剥がれた ものを Xとした。  Using a cutter, scratch the surface of the hard coat at a distance of 1 mm x 1 mm and stick Sellotape (registered trademark; made by Nichiban Co., Ltd.) No. 405 to 100 squares, and remove the tape after 30 seconds. The number of squares peeled off or missing edges was observed. A sample in which 100 squares were left was marked with 〇, a sample in which a part of squares was covered was marked △, and a sample in which squares were peeled off was marked X.

[0085] (表面硬度) (Surface Hardness)

表面硬度は鉛筆硬度試験 (鉛筆引つ搔き試験)により行った。すなわち、表面硬度 は、作製したノヽードコートフィルムを JIS—S— 6006が規定する試験用鉛筆を用いて、 JIS— K 5400が規定する鉛筆硬度評価方法に従い、 9. 7Nの荷重にて傷が認めら れな 、鉛筆の硬度の値である。  The surface hardness was determined by a pencil hardness test (pencil pull test). That is, the surface hardness was determined by using a prepared pencil coated film and a pencil for testing specified by JIS-S-6006, according to the pencil hardness evaluation method specified by JIS-K 5400, with a load of 9. 7N. Is the value of the hardness of the pencil.

実施例 2  Example 2

[0086] 多官能グリコール系エポキシ化合物であるジグリセリンポリグリシジルエーテルの 10 %ポリプロピレングリコールモノメチルエーテル溶液に代えて、多官能グリコール系ェ ポキシ化合物(共栄社ィ匕学製 80MF)の 10%ポリプロピレングリコールモノメチルェ 一テル溶液を用いることを除き実施例 1と同様にして、放射線硬化型導電性組成物 を製造し、実施例 1と同様の方法でこの放射線硬化型導電性組成物を PETフィルム 上に塗布し、 100°Cで乾燥させ、その後 UV照射装置にて lOOOiuJの照射量で照射 して塗膜を硬化せしめ、硬化被膜を形成した。得られた被膜の表面抵抗は、 0. 8— 1 . 3Μ Ωであり、硬化被膜は透明であった。実施例 1と同様にして、得られた被膜の光 透過率、耐熱性、密着性、表面硬度を測定した。結果を表 1に示す。 Instead of a 10% polypropylene glycol monomethyl ether solution of diglycerin polyglycidyl ether which is a polyfunctional glycol epoxy compound, 10% polypropylene glycol monomethyl ether of a polyfunctional glycol epoxy compound (80 MF manufactured by Kyoeisha Gakugaku Co., Ltd.) A radiation curable conductive composition is prepared in the same manner as in Example 1 except that a monotelluric solution is used, and the radiation curable conductive composition is coated on a PET film in the same manner as in Example 1. The coating was dried at 100 ° C. and then irradiated with an irradiation dose of lOOoiuJ in a UV irradiation apparatus to cure the coating, thereby forming a cured coating. The surface resistance of the obtained film was 0.8-10.3 Ω, and the cured film was transparent. The light of the coating obtained in the same manner as in Example 1 The transmittance, heat resistance, adhesion, and surface hardness were measured. The results are shown in Table 1.

実施例 3  Example 3

[0087] カチオン光重合開始剤として、ィルガキュア一 250に代えて MP—トリァジン(三和ケ ミカル製)を用いることを除き実施例 1と同様にして、放射線硬化型導電性組成物を 製造し、実施例 1と同様の方法でこの放射線硬化型導電性組成物を PETフィルム上 に塗布し、 100°Cで乾燥させ、その後紫外線照射装置にて lOOOmJの照射量で塗膜 を照射して硬化せしめ、硬化被膜を形成した。得られた被膜の表面抵抗は、 1. 0-1 . 5Μ Ωであり、硬化被膜は透明であった。実施例 1と同様にして、得られた被膜の光 透過率、耐熱性、密着性、表面硬度を測定した。結果を表 1に示す。  A radiation-curable conductive composition was produced in the same manner as in Example 1 except that MP-triazine (manufactured by Sanwa Chemical Co., Ltd.) was used in place of IRGACURE-I 250 as a cationic photopolymerization initiator, This radiation-curable conductive composition is applied onto a PET film in the same manner as in Example 1, dried at 100 ° C., and then the coating is cured by irradiation with an irradiation dose of lOOOmJ in an ultraviolet irradiation device. , Hardened film was formed. The surface resistance of the obtained film was 1.0 to 1.5 Ω and the cured film was transparent. The light transmittance, heat resistance, adhesion and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.

実施例 4  Example 4

[0088] カチオン光重合開始剤として、ィルガキュア一 250に代えて WP AG— 145 (和光純 薬工業製;ビス (シクロへキシルスルホ -ル)ジァゾメタン)を用いることを除き実施例 1 と同様にして、放射線硬化型導電性組成物を製造し、実施例 1と同様の方法でこの 放射線硬化型導電性組成物を PETフィルム上に塗布し、 100°Cで乾燥させ、その後 紫外線照射装置にて lOOOmJの照射量で照射して塗膜を硬化せしめ、硬化被膜を 形成した。得られた被膜の表面抵抗は、 0. 5-0. 7Μ Ωであり、硬化被膜は透明で あった。実施例 1と同様にして、得られた被膜の光透過率、耐熱性、密着性、表面硬 度を測定した。結果を表 1に示す。  [0088] In the same manner as Example 1, except that WP AG-145 (manufactured by Wako Pure Chemical Industries; bis (cyclohexyl sulfol) diazomethane) was used in place of Irgacure I 250 as the cationic photopolymerization initiator, A radiation-curable conductive composition is produced, and the radiation-curable conductive composition is applied onto a PET film in the same manner as in Example 1, dried at 100 ° C., and then irradiated with an ultraviolet radiation device to obtain lOOOmJ The coating film was cured by irradiation with an irradiation dose to form a cured film. The surface resistance of the obtained film was 0.5-0.7Μ Ω, and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.

実施例 5  Example 5

[0089] ウレタンアタリレート水性ェマルジヨン (荒川化学工業製 EM90、固形分量 40%) にポリプロピレングリコールモノメチルエーテルを混合して製造されたウレタンアタリレ ート 10%溶液に代えて、エポキシエステル(共栄社ィ匕学製 80MFA)にポリプロピレ ングリコールモノメチルエーテルを混合して製造されたエポキシエステル 10%溶液を 用いること、またカチオン光重合開始剤として、ィルガキュア一 250に代えて WP AG -170 (和光純薬工業製;ビス (t-プチルスルホ -ル)ジァゾメタン)を用いることを除き 実施例 1と同様にして、放射線硬化型導電性組成物を製造し、実施例 1と同様の方 法でこの放射線硬化型導電性組成物を PETフィルム上に塗布し、 100°Cで乾燥させ 、その後紫外線照射装置にて lOOOmJの照射量で照射して塗膜を硬化せしめ、硬化 被膜を形成した。得られた被膜の表面抵抗は、 0. 3-0. 8Μ Ωであり、硬化被膜は 透明であった。実施例 1と同様にして、得られた被膜の光透過率、耐熱性、密着性、 表面硬度を測定した。結果を表 1に示す。 [0089] In place of a 10% solution of a urethane atarilate produced by mixing a polypropylene glycol monomethyl ether with a urethane atarilate aqueous emulsion (EM 90, manufactured by Arakawa Chemical Industries, solid content 40%), an epoxy ester (Kyoeisha Ltd. Using a 10% solution of epoxy ester prepared by mixing polypropylene glycol monomethyl ether with Gakusan 80 MFA, and replacing it with IRGACURE-I 250 as a cationic photopolymerization initiator, WP AG-170 (Wako Pure Chemical Industries, Ltd.) A radiation curable conductive composition is prepared in the same manner as in Example 1 except that bis (t-butylsulfo) diazomethane) is used, and the radiation curable conductive composition is produced in the same manner as in Example 1. The composition is coated on a PET film, dried at 100 ° C., and then irradiated with an irradiation dose of lOOOmJ in an ultraviolet irradiation device to cure the coating and cure. A film was formed. The surface resistance of the obtained film was 0.3 to 0.8 Ω and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.

実施例 6  Example 6

[0090] ウレタンアタリレート水性ェマルジヨン (荒川化学工業製 EM90、固形分量 40%) にポリプロピレングリコールモノメチルエーテルを混合して製造されたウレタンアタリレ ート 10%溶液に代えて、エポキシエステル(共栄社ィ匕学製 80MFA)にポリプロピレ ングリコールモノメチルエーテルを混合して製造されたエポキシエステル 10%溶液を 用いることを除き実施例 1と同様にして、放射線硬化型導電性組成物を製造し、実施 例 1と同様の方法でこの放射線硬化型導電性組成物を PETフィルム上に塗布し、 10 0°Cで乾燥させ、その後紫外線照射装置にて lOOOmJの照射量で照射して塗膜を硬 化せしめ、硬化被膜を形成した。得られた被膜の表面抵抗は、 0. 3-0. 8Μ Ωであ り、硬化被膜は透明であった。実施例 1と同様にして、得られた被膜の光透過率、耐 熱性、密着性、表面硬度を測定した。結果を表 1に示す。  [0090] In place of a 10% solution of a urethane atarilate produced by mixing a polypropylene glycol monomethyl ether with an urethane atarilate aqueous emulsion (EM 90, manufactured by Arakawa Chemical Industries, solid content 40%), an epoxy ester (Kyoeisha Ltd. A radiation curable conductive composition was prepared in the same manner as in Example 1 except that a 10% solution of epoxy ester prepared by mixing polypropylene glycol monomethyl ether with Gakusan 80 MFA was used. This radiation-curable conductive composition is applied onto a PET film in the same manner, dried at 100 ° C., and then irradiated with an irradiation dose of 100OmJ with an ultraviolet irradiation device to cure the coating and cure. A film was formed. The surface resistance of the obtained film was 0.3 to 0.8 Ω and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the resulting film were measured in the same manner as in Example 1. The results are shown in Table 1.

実施例 7  Example 7

[0091] 導電性材料として、ポリスチレンスルホン酸(固形分量 1. 2%)がドーパントとして含 有されたポリエチレン ジォキシチォフェンコロイドの水性分散液(ポリエチレンージォ キシチォフェンの固形分量 2%)が用いられた。これとは別に、ウレタンアタリレート水 性ェマルジヨン(荒川化学工業製 EM90、 40%)に IPA (イソプロピルアルコール) を混合してウレタンアタリレート 10%ェマルジヨン溶液を作成した。この溶液に多官能 グリコール系エポキシ化合物であるジグリセリンポリグリシジルエーテルの 10%IPA( イソプロピルアルコール)溶液を混合し 10%固形分を有するベース溶液を得た。その 後このベース溶液のェマルジヨン固形分量に対して光力チオン重合剤 WPAG— 199 (和光純薬工業製;ビス(p—トルエンスルホ -ル)ジァゾメタン)を 2%及びラジカル光 重合開始剤 (ィルガキュア一 184、チバガイギ社製) 3%を混合し、さらに上記のポリ チォフェンコロイド溶液を有機導電性材料の固形分濃度が前記ベース溶液の固形 分の 10%となるように調整しデイスパーの撹拌下に添加し、添加後 1. 5時間さらにデ イスパーにて撹拌した。このェマルジヨン溶液は、白濁しており、成分分離はみられな かった。この溶液を、クリアランスが 10 mのアプリケーターを用いて PETフィルム上 に塗布し、 100°Cで乾燥させてその後紫外線照射装置にて lOOOmJの照射量で照 射して塗膜を硬化せしめ、硬化被膜を形成した。得られた硬化被膜の表面抵抗は、 0. 5-0. 7Μ Ωであり、硬化被膜は透明であった。実施例 1と同様にして、得られた 被膜の光透過率、耐熱性、密着性、表面硬度を測定した。結果を表 1に示す。 As a conductive material, an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used. Separately, urethane atalylate aqueous emulsion (EM 90, Arakawa Chemical Industries, EM 90, 40%) was mixed with IPA (isopropyl alcohol) to prepare a urethane atarylate 10% emulsion solution. A 10% IPA (isopropyl alcohol) solution of diglycerin polyglycidyl ether, which is a multifunctional glycol-based epoxy compound, was mixed with this solution to obtain a base solution having a 10% solid content. After that, 2% of photopower thione polymerization agent WPAG-199 (manufactured by Wako Pure Chemical Industries; bis (p-toluenesulfonyl) diazomethane) and radical photopolymerization initiator (IRGACURE I) with respect to the emulsion solid content of this base solution 184, Ciba-Geigy Co., Ltd. 3% are mixed, and the above-mentioned polythiophen colloid solution is adjusted so that the solid content concentration of the organic conductive material is 10% of the solid content of the above base solution, and under agitation of disper. After addition, the mixture was further stirred for 1.5 hours in a desiccant. This emerald solution is cloudy, and no component separation is observed. won. This solution is applied on a PET film using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of lOO m J in an ultraviolet irradiation device to cure the coating film, and a cured film is formed. Formed. The surface resistance of the obtained cured film was 0.5-0.7Μ Ω, and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the resulting film were measured in the same manner as in Example 1. The results are shown in Table 1.

実施例 8  Example 8

[0092] 導電性材料として、ポリスチレンスルホン酸(固形分量 1. 2%)がドーパントとして含 有されたポリエチレン ジォキシチォフェンコロイドの水性分散液(ポリエチレンージォ キシチォフェンの固形分量 2%)が用いられた。これとは別に、ウレタンアタリレート水 性ェマルジヨン (荒川化学工業製 EM90、 40%)にメチルェチルケトンを混合しウレ タンアタリレート 10%ェマルジヨン溶液を作成した。この溶液に、多官能グリコール系 エポキシ化合物であるジグリセリンポリグリシジルエーテルの 10%メチルェチルケトン 溶液を添加、混合し 10%固形分を有するベース溶液を得た。その後このベース溶液 の固形分量に対して光力チオン重合剤 (WPAG— 145、和光純薬工業製)を 2%及 びラジカル光重合開始剤 (ィルガキュア一 184、チバガイギ社製) 3%を添加、混合し 、さらに上記のポリチォフェンコロイド溶液を有機導電性材料の固形分濃度が前記べ ース溶液の固形分の 10%となるように調整しデイスパーの撹拌下に添加し、添加後 1 . 5時間さらにデイスパーにて撹拌した。この溶液を、クリアランスが 10 mのアプリケ 一ターを用いて PETフィルム上に塗布し、 100°Cで乾燥させ、その後紫外線照射装 置にて lOOOmJの照射量で照射して塗膜を硬化せしめ、硬化被膜を形成した。得ら れた硬化被膜の表面抵抗は、 0. 5-0. 7Μ Ωであり、硬化被膜は透明であった。実 施例 1と同様にして、得られた被膜の光透過率、耐熱性、密着性、表面硬度を測定し た。結果を表 1に示す。  As the conductive material, an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used. Separately from this, methyl ethyl ketone was mixed with urethane atalylate aqueous emulsion (EM 90, manufactured by Arakawa Chemical Industries, Ltd., 40%) to prepare a 10% emulsion solution of urethane atarylate. To this solution was added a 10% methyl ketone solution of diglycerin polyglycidyl ether, which is a polyfunctional glycol epoxy compound, and mixed to obtain a base solution having a 10% solid content. After that, 2% of photopower thione polymerization agent (WPAG-145, manufactured by Wako Pure Chemical Industries, Ltd.) and 3% of a radical photopolymerization initiator (IRGACURE I-184, manufactured by Ciba-Geigy) are added to the solid content of the base solution, After mixing, the above-mentioned polythiophen colloid solution is adjusted so that the solid content concentration of the organic conductive material is 10% of the solid content of the base solution, and added under stirring of the disperser, and after addition 1. The mixture was further stirred for 5 hours with a disperser. This solution is coated on a PET film using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of lOO m J in an ultraviolet irradiation device to cure the coating, A cured film was formed. The surface resistance of the resulting cured film was 0.5-0.7 Ω and the cured film was transparent. The light transmittance, heat resistance, adhesion, and surface hardness of the obtained film were measured in the same manner as in Example 1. The results are shown in Table 1.

[0093] [表 1] 表 1 [Table 1] table 1

Figure imgf000029_0001
実施例 9
Figure imgf000029_0001
Example 9

[0094] 導電性材料として、ポリスチレンスルホン酸をドーパントとして含有するポリエチレン ジォキシチォフェンコロイドの水性分散液に代えて、ポリア-リン 100重量部に対し て、スルホン酸基及び またはそのアルカリ金属塩基の結合した水溶性または水分 散性共重合ポリエステルを 300重量部含有するポリア二リン及び Zまたはスルホンィ匕 ポリア二リンエマルジョン溶液を用レヽることを除いて、実施例 1と同様にして放射線硬 化型導電性組成物を製造した。この溶液を、クリアランスが 10 mのアプリケーター を用いてガラス板上に塗布し、 100°Cで乾燥させ、その後紫外線照射装置にて 100 OmJの照射量で照射して塗膜を硬化せしめ、硬化被膜を形成した。得られた硬化被 膜の表面抵抗は、 1. 0-1. 5Μ Ωであり、硬化被膜はいずれも透明であった。  A sulfonic acid group and / or an alkali metal base thereof relative to 100 parts by weight of poly (arene) instead of an aqueous dispersion of polyethylene dihydroxy thiophen colloid containing polystyrene sulfonic acid as a dopant as a conductive material A radiation curing method was carried out in the same manner as in Example 1 except that a polyadiphosphorus and a sulfone or polyapoline emulsion solution containing 300 parts by weight of a water-soluble or water-dispersible copolymerized polyester was used. Mold conductive compositions were produced. This solution is applied on a glass plate using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of 100 OmJ in an ultraviolet irradiation device to cure the coating film, thereby curing the film. Formed. The surface resistance of the obtained cured film was 1.0-1. 5 Ω, and all the cured films were transparent.

実施例 10  Example 10

[0095] 導電性材料として、ポリスチレンスルホン酸(固形分量 1. 2%)がドーパントとして含 有されたポリエチレン ジォキシチォフェンコロイドの水性分散液 (ポリエチレンージォ キシチォフェンの固形分量 2%)が用いられた。これとは別に、メタクリル酸ポリェチレ ングリコールモノビュルエーテル水性ェマルジヨンにエチレングリコールジビュルエー テルを混合し、 10%溶液を作成した。この溶液に、ェマルジヨンタイプの多官能グリコ ール系エポキシィヒ合物であるジグリセリンポリグリシジルエーテルの 1 Oo/0プロピレン グリコールモノメチルエーテルエマルジヨン溶液を混合し、 10%固形分を有するベー ス溶液を得た。その後、このベース溶液の固形分量に対して光力チオン重合剤(三 和ケミカル製、 MP-トリァジン) 3%を添加、混合し、さらに上記のポリチォフェンコロ イド溶液を有機導電性材料の固形分濃度が前記ベース溶液の固形分の 10%となる ように調整し、デイスパーの攪拌下に添加し、添加後 1. 5時間さらにデイスパーにて 攪拌した。このェマルジヨン溶液は白濁しており、液の分離はみられな力つた。この溶 液を、クリアランスが 10 /z mのアプリケーターを用いてガラス板上に塗布し、 100°Cで 乾燥させ、その後紫外線照射装置により lOOOmJの照射量で照射して塗膜を硬化せ しめ、硬化被膜を形成した。得られた硬化被膜の表面抵抗は、 0. 5-1. 0Μ Ωであ り、硬化被膜は透明であった。 As a conductive material, an aqueous dispersion of polyethylene dioxthiophen colloid (polyvinyl-dioxthiophen solid content 2%) containing polystyrene sulfonic acid (solid content 1.2%) as a dopant is used. It was used. Separately, polyethylene glycol dibutyl ether was mixed with methacrylic acid polyethylene glycol monobutyl ether aqueous emulsion to make a 10% solution. In this solution, 1 O o / 0 propylene of diglycerin polyglycidyl ether which is an emulsion type multifunctional glycol-based epoxy compound is used. The glycol monomethyl ether emulsion solution was mixed to obtain a base solution having 10% solids. Thereafter, 3% of light-power thione polymerization agent (manufactured by Sumi Chemical Co., Ltd., MP-triazine) is added to the solid content of the base solution and mixed, and the above-mentioned polythiophen colloid solution is further added to solid matter of organic conductive material. The concentration was adjusted so as to be 10% of the solid content of the base solution, added with stirring of the disperser, and after the addition, it was further stirred by the disperser for 1.5 hours. The emulsion solution was cloudy, and separation of the solution was not possible. This solution is applied on a glass plate using an applicator with a clearance of 10 / zm, dried at 100 ° C., and then irradiated with an irradiation dose of lOOOmJ using a UV irradiation device to cure the coating, and cure. A film was formed. The surface resistance of the resulting cured film was 0.5.0-1.0 Ω, and the cured film was transparent.

実施例 11  Example 11

[0096] 導電性材料として、ポリスチレンスルホン酸(固形分量 1. 2%)がドーパントとして含 有されて!/、るポリエチレン ジォキシチォフェンコロイドの水性分散液(ポリエチレン ジォキシチォフェンの固形分量 2%)を用いた。これとは別に、ポリビニルブチラール 水性ェマルジヨンを水で薄め、固形分 10%の溶液を作成した。この溶液に多官能グ リコール系エポキシ化合物であるジグリセリンポリグリシジルエーテルの 10%ェマル ジョンタイプのポリプロピレングリコールモノメチルエーテル溶液を混合し、 10%固形 分を有するベース溶液を得た。その後、このベース溶液の固形分量に対して光力チ オン重合剤(三和ケミカル製、 MP-トリァジン) 3%を混合し、さらに上記のポリチオフ ェンコロイド溶液を有機導電性材料の固形分濃度が前記ベース溶液の固形分の 10 %となるように調整し、デイスパーの攪拌下に添加し、添加後 1. 5時間さらにディスパ 一にて攪拌した。この溶液を、クリアランスが 10 mのアプリケーターを用いてガラス 板上に塗布し、 100°Cで乾燥させた後、紫外線照射装置により lOOOmJの照射量で 照射して塗膜を硬化せしめ、硬化被膜を形成した。得られた硬化被膜の表面抵抗は 、 0. 5— 1. 0Μ Ωであった。  As a conductive material, polystyrene sulfonic acid (solid content: 1.2%) is contained as a dopant! /, An aqueous dispersion of polyethylene dioxithiophen colloid (solid state of polyethylene dioxythiophen) An amount of 2% was used. Separately, the polyvinyl butyral aqueous emulsion was diluted with water to make a 10% solids solution. This solution was mixed with a 10% emulsion type polypropylene glycol monomethyl ether solution of diglycerin polyglycidyl ether which is a multifunctional glycol based epoxy compound to obtain a base solution having a 10% solid content. Thereafter, 3% of a light power thione polymerization agent (manufactured by Sanwa Chemical Co., Ltd., MP-triazine) is mixed with the solid content of this base solution, and the above-mentioned polythiolene colloid solution is further mixed with The solution was adjusted to 10% of the solid content of the base solution, added while stirring with a disperser, and after the addition, the mixture was further stirred for 1.5 hours with a disperser. This solution is applied on a glass plate using an applicator with a clearance of 10 m, dried at 100 ° C., and then irradiated with an irradiation dose of lOOOmJ by an ultraviolet irradiation device to cure the coating film, thereby curing the cured film. It formed. The surface resistance of the obtained cured film was 0.5-1.0 Ω.

[0097] 比較例 1  Comparative Example 1

導電性材料として、ポリスチレンスルホン酸(固形分量 1. 2%)がドーパントとして含 有されて!/、るポリエチレン ジォキシチォフェンコロイドの水性分散液(ポリエチレン ジォキシチォフェンの固形分量 2%)を用いた。これとは別に、ウレタンアタリレートを I PAで溶解し、非ェマルジヨンタイプのウレタンアタリレート(共栄社化学社製; 3061( 主成分;ペンタエリスリトールトリアタリレートイソホロンジイソシァネートウレタンプレポリ マー)) 10%溶液を作成した。この溶液に多官能グリコール系エポキシィ匕合物である ジグリセリンポリグリシジルエーテルの 10%ポリプロピレングリコールモノメチルエーテ ル溶液を混合し、固形分 10%を有するベース溶液を得た。その後、このベース溶液 の固形分量に対して光力チオン重合剤(三和ケミカル製、 MP—トリァジン) 3%を混合 し、さらに上記のポリチォフェンコロイド溶液を有機導電性材料の固形分濃度が前記 ベース溶液の固形分の 10%となるように調整し、デイスパーの攪拌下に添加し、添カロ 後 1. 5時間さらにデイスパーにて攪拌した。この溶液を、クリアランスが 10 mのアブ リケーターを用いてガラス板上に塗布し、 100°Cで乾燥させたところ、形成された膜は 白濁しひび割れを起こした。 As a conductive material, polystyrene sulfonic acid (solid content 1.2%) is contained as a dopant! /, Aqueous dispersion of polyethylene dioxythiophen colloid (polyethylene The solid content of dioxithofen (2%) was used. Separately, urethane atalylate is dissolved in IPA, and non-emergence type urethane atalylate (manufactured by Kyoeisha Chemical Co., Ltd .; 3061 (main component: pentaerythritol triarylate isophorone diisocyanate urethane prepolymer) A 10% solution was made. This solution was mixed with a 10% polypropylene glycol monomethyl ether solution of diglycerin polyglycidyl ether which is a polyfunctional glycol-based epoxy compound, to obtain a base solution having a solid content of 10%. Thereafter, 3% of light-power thione polymerization agent (manufactured by Sanwa Chemical Co., Ltd., MP-triazine) is mixed with the solid content of the base solution, and the above-mentioned polythiophene colloid solution is further mixed with the solid concentration of the organic conductive material. The solution was adjusted to 10% of the solid content of the base solution, added while stirring with a disperser, and further stirred with a disperser for 1.5 hours after addition. This solution was applied on a glass plate using an accreditor with a clearance of 10 m and dried at 100 ° C., and the formed film became cloudy and cracked.

産業上の利用分野 Industrial application field

本発明の放射線硬化型導電性組成物は、磁気テープ、各種包装材料、例えば、 半導体素子などを包装するための包装材料などに帯電防止性を付与するために用 V、られる帯電防止膜形成材料として好ましく用いられる。  The radiation curable conductive composition of the present invention can be used to impart antistatic properties to magnetic tapes, various packaging materials, for example, packaging materials for packaging semiconductor devices, etc. It is preferably used as

Claims

請求の範囲 The scope of the claims [1] 有機導電性ポリマー、水溶性または水性ェマルジヨン形成性ィ匕合物、水溶性また は水性ェマルジヨン形成性のエポキシまたはォキセタンィ匕合物、感光剤、及び水及 び,または水可溶性有機溶剤を含有することを特徴とする放射線硬化型導電性組 成物。  [1] Organic conductive polymer, water-soluble or aqueous emulsion-forming compound, water-soluble or aqueous emulsion-forming epoxy or oxetane compound, photosensitizer, and water and / or water-soluble organic solvent A radiation curable conductive composition characterized by containing. [2] 上記水溶性な!/、し水性ェマルジヨン形成性ィ匕合物がウレタンアタリレートイ匕合物で あることを特徴とする請求の範囲第 1項記載の放射線硬化型導電性組成物。  [2] The radiation-curable conductive composition according to claim 1, wherein the water-soluble! /, Water-based emulsion-forming compound is a urethane atarilate-ion compound. [3] 上記ウレタンアタリレートイ匕合物がアクリル基を有する水溶性または水性ェマルジョ ン形成性多官能アクリルィ匕合物であることを特徴とする請求の範囲第 2項記載の放 射線硬化型導電性組成物。  [3] The radiation-curable conductive material according to claim 2, characterized in that the above-mentioned urethane atalylate is a water-soluble or aqueous emulsion-forming polyfunctional acrylic compound having an acrylic group. Sex composition. [4] 上記ウレタンアタリレートイ匕合物力 (Α)水酸基含有アクリル酸エステル、(Β)有機 ポリイソシァネート類、(C)分子内に少なくとも 1個の水酸基を含有するポリエチレン グリコール類、及び (D)分子内に少なくとも 1個の水酸基を含有する脂肪酸、力 な る反応生成物を (Ε) 3級ァミンで中和してなる該反応生成物の中和塩であるポリウレ タンアタリレートであることを特徴とする請求の範囲第 2項記載の放射線硬化型導電 性組成物。  [4] The above-mentioned urethane atalylate complexed compound (Α) hydroxyl group-containing acrylic acid ester, (Β) organic polyisocyanate, (C) polyethylene glycol containing at least one hydroxyl group in a molecule, D) A fatty acid containing at least one hydroxyl group in the molecule, and a polyurethane atallate which is a neutralized salt of the reaction product obtained by neutralizing a strong reaction product with (Ε) tertiary amine. The radiation curable conductive composition according to claim 2, characterized in that [5] 上記水溶性な!/、し水性ェマルジヨン形成性ィ匕合物がエポキシアタリレートイ匕合物で あることを特徴とする請求の範囲第 1項記載の放射線硬化型導電性組成物。  [5] The radiation-curable conductive composition according to claim 1, wherein the water-soluble! /, Water-based emulsion-forming compound is an epoxy atalylate complex. [6] 上記エポキシアタリレートイ匕合物が、一般式 (I):  [6] The above epoxy atalylate mixture is a compound of the general formula (I): [化 1]
Figure imgf000032_0001
[Formula 1]
Figure imgf000032_0001
— ( I )  — (I) (式中、 Rは水素原子またはメチル基を表し、 Xは CH CH O—、—〔CH CH (CH ) (Wherein, R represents a hydrogen atom or a methyl group, X represents CH 2 CH 2 O—, — [CH 2 CH 2 (CH 2) 2] 2 2 2 3 2 2 2 3 0〕 一、一〔CH CH (OH) CH O〕 一、 0] One, one [CH CH (OH) CH O] one, k 2 2 m  k 2 2 m [化 2]
Figure imgf000033_0001
または
[Formula 2]
Figure imgf000033_0001
Or
[化 3]
Figure imgf000033_0002
を表し、 kおよび mは 1一 4の整数を表す。)
[Chemical 3]
Figure imgf000033_0002
And k and m represent integers of 1 to 4. )
で表される化合物であることを特徴とする請求の範囲第 5項記載の放射線硬化型導 電性組成物。  6. The radiation curable conductive composition according to claim 5, which is a compound represented by the formula:
[7] 上記一般式 (I)で表されるエポキシアタリレートイ匕合物が、一般式 (Π):  [7] The epoxy atallylate compound represented by the above general formula (I) has the general formula (Π): [化 4]  [Formula 4] CH2=CH-C-0-CH2-CH-CH2-0-CH2-CH-CH2-0-CH2-CH-CH2-0-C-CH=CH2 CH 2 = CH-C-0-CH 2 -CH-CH 2 -0-CH 2 -CH 2 -CH 2 -0-CH 2 -CH-CH 2 -0-C-CH = CH 2 0 OH OH OH O  0 OH OH OH O --- ( Π ) で表される化合物であることを特徴とする請求の範囲第 6項記載の放射線硬化型導 電性組成物。  The radiation-curable conductive composition according to claim 6, which is a compound represented by (6). [8] 上記水溶性ないし水性ェマルジヨン形成性ィ匕合物がビュルエーテル基含有アタリ ル化合物であることを特徴とする請求の範囲第 1項記載の放射線硬化型導電性組成 物。  8. The radiation-curable conductive composition according to claim 1, wherein the water-soluble to water-based emulsion-forming compound is a bule ether group-containing atalyl compound. [9] 上記有機導電性ポリマー力 ポリア-リン、ポリア-リン誘導体、ポリチォフェン及び ポリチォフェン誘導体力 選ばれた少なくとも 1種であることを特徴とする請求の範囲 第 1一 8項のいずれかに記載の放射線硬化型導電性組成物。  [9] The organic conductive polymer according to any one of claims 1 to 18, characterized in that it is at least one selected from the group consisting of polyarylin, polyaniline derivatives, polythiophen and polythiophen derivatives. Radiation curable conductive composition. [10] 上記有機導電性ポリマー力 ポリチォフェンまたはポリチォフェン誘導体及びポリス チレンスルホン酸力 なることを特徴とする請求の範囲第 1一 8項のいずれかに記載 の放射線硬化型導電性組成物。 [10] The radiation-curable conductive composition according to any one of claims 1 to 18, characterized in that the organic conductive polymer, the polythiophen or the polythiophen derivative, and the polystyrene sulfonic acid are used. [11] ポリア-リンまたはポリア-リン誘導体であるスルホンィ匕ポリア-リンカ、スルホン酸 基及び Zまたはそのアルカリ金属塩基の結合したポリエステル榭脂により、またはポ リチォフェンまたはポリチォフェン誘導体がポリ陰イオン存在下で、水溶性または水 性分散化された有機導電性ポリマーであることを特徴とする請求の範囲第 1一 8項の V、ずれかに記載の放射線硬化型導電性組成物。 [11] A polyaryne or polyaryne derivative, a sulfone polyary linker, a polyester resin combined with a sulfonic acid group and Z or an alkali metal base thereof, or a polythiophen or polythiophen derivative in the presence of a polyanion The radiation-curable conductive composition according to any one of claims 1 to 18, which is a water-soluble or water-dispersible dispersed organic conductive polymer. [12] 上記感光剤がラジカル重合感光剤及び Zまたは光力チオン重合感光剤であること を特徴とする請求の範囲第 1一 8項のいずれかに記載の放射線硬化型導電性組成 物。 [12] The radiation-curable conductive composition according to any one of claims 1 to 18, wherein the photosensitizer is a radical polymerization photosensitizer and Z or a photopower thione polymerization photosensitizer. [13] 水溶性または水性ェマルジヨン形成性のエポキシィ匕合物が多官能のグリシジルイ匕 合物を含むことを特徴とする請求の範囲第 1一 8項のいずれかに記載の放射線硬化 型導電性組成物。  [13] The radiation-curable conductive material according to any one of claims 1 to 18, wherein the water-soluble or aqueous dispersion-forming epoxy compound comprises a multifunctional glycidyl compound. Composition.
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