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WO2003034169A1 - Pulse shot flow regulator and pulse shot flow regulating method - Google Patents

Pulse shot flow regulator and pulse shot flow regulating method Download PDF

Info

Publication number
WO2003034169A1
WO2003034169A1 PCT/JP2002/010733 JP0210733W WO03034169A1 WO 2003034169 A1 WO2003034169 A1 WO 2003034169A1 JP 0210733 W JP0210733 W JP 0210733W WO 03034169 A1 WO03034169 A1 WO 03034169A1
Authority
WO
WIPO (PCT)
Prior art keywords
pulse shot
cutoff valve
shot flow
pulse
process gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/010733
Other languages
English (en)
French (fr)
Inventor
Tokuhide Nawata
Yoshihisa Sudoh
Masayuki Kouketsu
Masayuki Watanabe
Hiroki Doi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CKD Corp
Original Assignee
CKD Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CKD Corp filed Critical CKD Corp
Priority to JP2003536834A priority Critical patent/JP4197648B2/ja
Priority to US10/491,955 priority patent/US6913031B2/en
Priority to KR1020047005666A priority patent/KR100878577B1/ko
Publication of WO2003034169A1 publication Critical patent/WO2003034169A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y10T137/0379—By fluid pressure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7759—Responsive to change in rate of fluid flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7761—Electrically actuated valve
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86389—Programmer or timer
    • Y10T137/86405—Repeating cycle
    • Y10T137/86421—Variable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Measuring Volume Flow (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
PCT/JP2002/010733 2001-10-18 2002-10-16 Pulse shot flow regulator and pulse shot flow regulating method Ceased WO2003034169A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003536834A JP4197648B2 (ja) 2001-10-18 2002-10-16 パルスショット式流量調整装置とパルスショット式流量調整方法
US10/491,955 US6913031B2 (en) 2001-10-18 2002-10-16 Pulse shot type flow controller and pulse shot type flow controlling method
KR1020047005666A KR100878577B1 (ko) 2001-10-18 2002-10-16 펄스 샷 타입 유량 조정 장치 및 펄스 샷 타입 유량 조정방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001320560 2001-10-18
JP2001/320560 2001-10-18

Publications (1)

Publication Number Publication Date
WO2003034169A1 true WO2003034169A1 (en) 2003-04-24

Family

ID=19137933

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/010733 Ceased WO2003034169A1 (en) 2001-10-18 2002-10-16 Pulse shot flow regulator and pulse shot flow regulating method

Country Status (5)

Country Link
US (1) US6913031B2 (ja)
JP (1) JP4197648B2 (ja)
KR (1) KR100878577B1 (ja)
TW (1) TW552490B (ja)
WO (1) WO2003034169A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006137404A1 (ja) * 2005-06-24 2006-12-28 Ckd Corporation 流量制御弁
JP2007535617A (ja) * 2004-04-12 2007-12-06 エム　ケー　エス　インストルメンツ　インコーポレーテッド パルス化された質量流量搬送システム及び方法
JP2020173121A (ja) * 2019-04-08 2020-10-22 株式会社堀場エステック 流量算出装置、流量算出システム、及び、流量算出装置用プログラム
JP2021508129A (ja) * 2018-02-02 2021-02-25 エム ケー エス インストルメンツ インコーポレーテッドＭｋｓ Ｉｎｓｔｒｕｍｅｎｔｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 遮断弁を用いたパルスガス供給方法および装置
CN112525511A (zh) * 2020-11-30 2021-03-19 江苏大学 一种射流脉冲三通实验装置
CN113351120A (zh) * 2021-06-08 2021-09-07 哈尔滨工业大学 一种气体混合系统及混合方法
WO2022065114A1 (ja) * 2020-09-24 2022-03-31 東京エレクトロン株式会社 ガスを供給する装置、基板を処理するシステム、及びガスを供給する方法
CN115675808A (zh) * 2022-10-26 2023-02-03 上海理工大学 用于喷水推进器的自循环射流扩稳控制系统及方法

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JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
US7628861B2 (en) * 2004-12-17 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
JP3945519B2 (ja) * 2004-06-21 2007-07-18 東京エレクトロン株式会社 被処理体の熱処理装置、熱処理方法及び記憶媒体
US20060000509A1 (en) * 2004-07-01 2006-01-05 Pozniak Peter M Fluid flow control device and system
WO2007076026A2 (en) * 2005-12-23 2007-07-05 Quantum Fuel Systems Technologies Worldwide, Inc. Safety warning and shutdown device and method for hydrogen storage containers
US7881829B2 (en) * 2006-10-03 2011-02-01 Horiba Stec Co., Ltd. Mass flow controller
JP5459895B2 (ja) * 2007-10-15 2014-04-02 Ｃｋｄ株式会社 ガス分流供給ユニット
CN101836173B (zh) * 2007-12-05 2012-02-01 日立造船株式会社 真空容器的压力控制方法及压力控制装置
US8790464B2 (en) * 2010-01-19 2014-07-29 Mks Instruments, Inc. Control for and method of pulsed gas delivery
US9348339B2 (en) 2010-09-29 2016-05-24 Mks Instruments, Inc. Method and apparatus for multiple-channel pulse gas delivery system
US8997686B2 (en) * 2010-09-29 2015-04-07 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10126760B2 (en) 2011-02-25 2018-11-13 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10031531B2 (en) 2011-02-25 2018-07-24 Mks Instruments, Inc. System for and method of multiple channel fast pulse gas delivery
US10353408B2 (en) 2011-02-25 2019-07-16 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US9958302B2 (en) * 2011-08-20 2018-05-01 Reno Technologies, Inc. Flow control system, method, and apparatus
EP2618143B1 (en) * 2012-01-19 2015-05-27 Idexx Laboratories, Inc. Analyzer with fluid pressure control device
JP5754853B2 (ja) * 2012-01-30 2015-07-29 株式会社フジキン 半導体製造装置のガス分流供給装置
JP5665793B2 (ja) * 2012-04-26 2015-02-04 株式会社フジキン 可変オリフィス型圧力制御式流量制御器
JP5868796B2 (ja) * 2012-07-03 2016-02-24 株式会社堀場エステック 圧力制御装置、流量制御装置、及び、圧力制御装置用プログラム、流量制御装置用プログラム
FR2994455B1 (fr) * 2012-08-10 2014-09-05 Faurecia Sys Echappement Ensemble de fourniture d'un flux dose de gaz, procede associe, ligne d'echappement de vehicule equipee d'un tel ensemble
JP5397525B1 (ja) * 2012-11-13 2014-01-22 Ｓｍｃ株式会社 真空調圧システム
JP6107327B2 (ja) * 2013-03-29 2017-04-05 東京エレクトロン株式会社 成膜装置及びガス供給装置並びに成膜方法
JP6336719B2 (ja) * 2013-07-16 2018-06-06 株式会社ディスコ プラズマエッチング装置
JP6158111B2 (ja) * 2014-02-12 2017-07-05 東京エレクトロン株式会社 ガス供給方法及び半導体製造装置
ES2962231T3 (es) * 2014-02-17 2024-03-18 Special Springs Srl Aparato para la presurización controlada de accionadores de cilindros de gas
US10515783B2 (en) * 2016-02-23 2019-12-24 Lam Research Corporation Flow through line charge volume
CN105806371B (zh) * 2016-04-29 2018-03-09 国网上海市电力公司 传感器的温压动态补偿方法
US10679880B2 (en) * 2016-09-27 2020-06-09 Ichor Systems, Inc. Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US11144075B2 (en) 2016-06-30 2021-10-12 Ichor Systems, Inc. Flow control system, method, and apparatus
JP6786096B2 (ja) * 2016-07-28 2020-11-18 株式会社フジキン 圧力式流量制御装置
JP6978865B2 (ja) * 2017-07-05 2021-12-08 株式会社堀場エステック 流体制御装置、流体制御方法、及び、流体制御装置用プログラム
JP7107648B2 (ja) * 2017-07-11 2022-07-27 株式会社堀場エステック 流体制御装置、流体制御システム、流体制御方法、及び、流体制御装置用プログラム
WO2019163676A1 (ja) * 2018-02-26 2019-08-29 株式会社フジキン 流量制御装置および流量制御方法
WO2019208417A1 (ja) * 2018-04-27 2019-10-31 株式会社フジキン 流量制御方法および流量制御装置
CN112272809A (zh) * 2018-06-26 2021-01-26 株式会社富士金 流量控制方法以及流量控制装置
US11404290B2 (en) * 2019-04-05 2022-08-02 Mks Instruments, Inc. Method and apparatus for pulse gas delivery
JP7122335B2 (ja) * 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
JP7122334B2 (ja) * 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
KR20230000975A (ko) * 2021-06-25 2023-01-03 가부시키가이샤 호리바 에스텍 유체 제어 장치, 유체 제어 시스템, 유체 제어 장치용 프로그램 및 유체 제어 방법
US20250155331A1 (en) * 2023-11-13 2025-05-15 Entech Instruments Inc. System and Method for Pulsed Canister Sampling

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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007535617A (ja) * 2004-04-12 2007-12-06 エム　ケー　エス　インストルメンツ　インコーポレーテッド パルス化された質量流量搬送システム及び方法
US7628860B2 (en) * 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7829353B2 (en) 2004-04-12 2010-11-09 Mks Instruments, Inc. Pulsed mass flow delivery system and method
KR100963937B1 (ko) 2005-06-24 2010-06-17 씨케이디 가부시키 가이샤 유량 제어 밸브
US7748684B2 (en) 2005-06-24 2010-07-06 Ckd Corporation Flow control valve
WO2006137404A1 (ja) * 2005-06-24 2006-12-28 Ckd Corporation 流量制御弁
JP2021508129A (ja) * 2018-02-02 2021-02-25 エム ケー エス インストルメンツ インコーポレーテッドＭｋｓ Ｉｎｓｔｒｕｍｅｎｔｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 遮断弁を用いたパルスガス供給方法および装置
JP2020173121A (ja) * 2019-04-08 2020-10-22 株式会社堀場エステック 流量算出装置、流量算出システム、及び、流量算出装置用プログラム
JP7273596B2 (ja) 2019-04-08 2023-05-15 株式会社堀場エステック 流量算出装置、流量算出システム、及び、流量算出装置用プログラム
WO2022065114A1 (ja) * 2020-09-24 2022-03-31 東京エレクトロン株式会社 ガスを供給する装置、基板を処理するシステム、及びガスを供給する方法
CN112525511A (zh) * 2020-11-30 2021-03-19 江苏大学 一种射流脉冲三通实验装置
CN113351120A (zh) * 2021-06-08 2021-09-07 哈尔滨工业大学 一种气体混合系统及混合方法
CN113351120B (zh) * 2021-06-08 2022-09-16 哈尔滨工业大学 一种气体混合系统及混合方法
CN115675808A (zh) * 2022-10-26 2023-02-03 上海理工大学 用于喷水推进器的自循环射流扩稳控制系统及方法

Also Published As

Publication number Publication date
US6913031B2 (en) 2005-07-05
TW552490B (en) 2003-09-11
JP4197648B2 (ja) 2008-12-17
US20040244837A1 (en) 2004-12-09
JPWO2003034169A1 (ja) 2005-02-03
KR20040062569A (ko) 2004-07-07
KR100878577B1 (ko) 2009-01-15

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