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WO2003034078A1 - Probe pin, probe card, test apparatus, and method of manufacturing probe pin - Google Patents

Probe pin, probe card, test apparatus, and method of manufacturing probe pin Download PDF

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Publication number
WO2003034078A1
WO2003034078A1 PCT/JP2002/010517 JP0210517W WO03034078A1 WO 2003034078 A1 WO2003034078 A1 WO 2003034078A1 JP 0210517 W JP0210517 W JP 0210517W WO 03034078 A1 WO03034078 A1 WO 03034078A1
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WO
WIPO (PCT)
Prior art keywords
electronic device
contact portion
probe
probe pin
electrically connected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/010517
Other languages
French (fr)
Japanese (ja)
Inventor
Koichi Wada
Hidenori Kitazume
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of WO2003034078A1 publication Critical patent/WO2003034078A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/07314Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support

Definitions

  • Probe pin Description Probe pin, probe card, test equipment, and probe pin manufacturing method
  • the present invention relates to a test apparatus for testing an electronic device, a probe card for transmitting and receiving signals to and from the electronic device, a probe pin connected to a terminal of the electronic device, and a probe pin manufacturing method.
  • This application is related to the following Japanese patent application. For those designated countries that are permitted to be incorporated by reference to the literature, the contents described in the following application are incorporated into this application by reference and are incorporated as part of the description of this application.
  • a probe card when testing an electronic device, a probe card has been used to exchange signals with the electronic device.
  • the probe card has a plurality of probe pins.
  • the plurality of probe pins are respectively connected to terminals of the electronic device.
  • Figure 8 shows a conventional probe pin.
  • the probe pin has a contact portion that contacts a terminal of the electronic device (DUT), and an elastic portion provided with the contact portion.
  • the contact part of the conventional probe pin has a quadrangular pyramid shape.
  • the tip of the contact portion made contact with the terminal of the electronic device, and the tip of the contact portion scribed the terminal.
  • the probe pins are provided at a predetermined angle with respect to the probe card.
  • the tip of the contact portion may not be able to sufficiently scrub the terminal of the electronic device.
  • one side of the contact part is almost parallel to the terminal of the electronic device, one side of the contact part will come into contact with the terminal, and the tip of the contact part will scrub the terminal of the electronic device sufficiently. As a result, it was difficult to obtain good electrical connection characteristics.
  • the present invention provides a probe pin and a probe that can solve the above-described problems.
  • An object of the present invention is to provide a card, a test apparatus, and a method of manufacturing a probe pin. This object is achieved by a combination of features described in the independent claims.
  • the dependent claims define further advantageous embodiments of the present invention. Disclosure of the invention
  • a probe pin for supplying a signal to an electronic component by contacting the electronic component, the probe pin comprising: a first surface; A second surface substantially parallel to the first surface and having a larger area than the first surface, comprising: a contact portion that contacts the electronic component; and an elastic portion provided with the contact portion.
  • the contact portion may further have a third surface substantially perpendicular to the first surface. Further, the contact portion may have four third surfaces. Further, the first surface is preferably a quadrangular shape, and the second surface is preferably a pentagonal or more polygonal shape. The second surface may be octagonal. The contact portion may further include a fourth surface having an angle with respect to the first surface different from an angle of the third surface with respect to the first surface. The contact portion may have four fourth surfaces. Further, the contact portion and the elastic portion may be formed of the same material.
  • a probe pin for supplying a signal to an electronic component by contacting the electronic component, the probe pin being in contact with the electronic component, and being substantially perpendicular to the first surface and the first surface.
  • a probe pin comprising: a contact portion having a suitable second surface; and an elastic portion provided with the contact portion.
  • a probe card electrically connected to a plurality of connection terminals provided on an electronic device to supply a signal to an electronic device, wherein the probe card is provided on the substrate and the substrate.
  • a plurality of probe pins electrically connected to connection terminals of the electronic device, and a transmission line electrically connected to the plurality of probe pins, wherein the probe pins are in contact with the connection terminals, and the first surface And a contact portion having a second surface substantially parallel to the first surface and an elastic portion provided with the contact portion.
  • a probe card electrically connected to a plurality of connection terminals provided on an electronic device to supply signals to an electronic device, the probe card being provided on a substrate and a substrate.
  • a plurality of probe pins electrically connected to connection terminals of the electronic device, and a transmission line electrically connected to the plurality of probe pins, wherein the probe pins are in contact with the connection terminals, and the first surface And a contact portion having a second surface substantially perpendicular to the first surface and an elastic portion provided with the contact portion.
  • a test apparatus for testing an electronic device comprising: a pattern generation unit for generating a test signal for testing an electronic device; and a test signal generated by the pattern generation unit.
  • a waveform shaper that shapes the waveform, a probe card that supplies the test signal shaped by the waveform shaper to the electronic device and receives the output signal output from the electronic device, and an electronic device that outputs based on the test signal
  • a determination unit that determines pass / fail of the electronic device based on the output signal
  • the probe card includes a substrate, a plurality of probe pins provided on the substrate, and electrically connected to connection terminals of the electronic device;
  • a transmission line electrically connected to the probe pin, wherein the probe pin is in contact with the connection terminal and is substantially parallel to the first surface and the first surface.
  • a contact portion having a second surface, providing a test apparatus which comprises an elastic portion contacting portion is provided.
  • a test apparatus for testing an electronic device comprising: a pattern generation section for generating a test signal for testing an electronic device; and a test signal generated by the pattern generation section.
  • a waveform shaper that shapes the waveform, a probe card that supplies the test signal shaped by the waveform shaper to the electronic device and receives the output signal output from the electronic device, and an electronic device that outputs based on the test signal
  • a determination unit that determines pass / fail of the electronic device based on the output signal
  • the probe card includes a substrate, a plurality of probe pins provided on the substrate, and electrically connected to connection terminals of the electronic device;
  • a transmission line electrically connected to the probe pin, wherein the probe pin is in contact with the connection terminal and is substantially perpendicular to the first surface and the first surface.
  • a second surface A test device comprising: a contact portion having the contact portion; and an elastic portion provided with the contact portion.
  • a probe pin manufacturing method for manufacturing a probe pin for supplying a signal to an electronic component comprising: a substrate preparing step of preparing a silicon substrate; An etching step of forming a groove having a bottom surface substantially parallel to the surface of the silicon substrate and having a smaller area than the opening on the surface of the substrate; a filling step of filling the groove with a conductive material; Removing the probe pin.
  • a silicon substrate with a ⁇ 100 ⁇ surface is prepared.
  • the four sides are in the ⁇ 100> direction on the silicon substrate surface before the etching step.
  • the method further includes an etching mask forming step of forming an etching mask having a rectangular opening, and a mask removing step of removing the etching mask after the etching step, wherein the etching step includes determining whether the etching mask has an opening. Therefore, it is preferable to etch the silicon substrate.
  • a groove may be formed in the silicon substrate further having a surface substantially perpendicular to the surface of the silicon substrate.
  • FIG. 1 is a diagram showing an example of a configuration of a test apparatus 100 according to the present invention.
  • FIG. 2 is a diagram showing an example of the configuration of the probe card 50.
  • FIG. 3 is a diagram showing an example of the configuration of the probe pin 60.
  • FIG. 4 is a diagram showing another example of the contact portion 64. As shown in FIG. 4
  • FIG. 5 is a diagram showing another example of the contact portion 6.
  • FIG. 6 is a diagram illustrating an example of the method of manufacturing a probe pin according to the present invention.
  • FIG. 7 is a view for explaining another example of the probe pin manufacturing method according to the present invention.
  • FIG. 8 is a diagram showing a conventional probe pin. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 shows an example of the configuration of a test apparatus 100 according to the present invention.
  • the test apparatus 100 includes a pattern generation section 10, a waveform shaping section 20, a judgment section 40, and a probe card 50. Be prepared.
  • the pattern generation unit 10 generates a test signal for testing the electronic device and supplies the test signal to the waveform shaping unit 20.
  • the waveform shaping unit 20 shapes the received test signal, and supplies the shaped test signal to the probe card 50.
  • the waveform shaping section 20 may supply the test signal to the probe card 50 at a desired timing, for example.
  • the waveform shaping section 20 has a timing generator for generating desired timing.
  • the timing generator generates a desired timing.
  • the timing generator has, for example, a variable delay circuit.
  • the timing generator receives a reference clock for controlling the operation of the test apparatus 100, delays the received reference clock by a desired time by a variable delay circuit, and sets a waveform shaping unit as the desired timing.
  • the probe card 50 is electrically connected to a plurality of connection terminals provided on the electronic device 30 and supplies signals to the electronic device. Further, the probe card 50 receives an output signal output from the electronic device based on the test signal, and supplies the received output signal to the determination unit 40.
  • the determination unit 40 determines pass / fail of the electronic device 30 based on an output signal output by the electronic device 30 based on the test signal. For example, the determination unit 40 may determine whether the electronic device 30 is good by comparing an expected value signal to be output by the electronic device 30 based on the test signal with an output signal output by the electronic device 30. . In this case, putter The generation unit 10 generates the expected value signal based on the generated test signal, and supplies the generated expected value signal to the determination unit 40.
  • FIG. 2 shows an example of the configuration of the probe card 50.
  • the probe card 50 has a substrate 52, a plurality of probe pins 60, and a transmission line (not shown).
  • the plurality of probe pins 60 are provided on the substrate 52, and are electrically connected to the plurality of connection terminals 56 of the electronic device 30, respectively.
  • the probe pins 60 exchange signals with the electronic device 30 by contacting the electronic device 30 as an electronic component.
  • the transmission line is electrically connected to a plurality of probe pins.
  • the probe card 50 receives the test signal from the waveform shaping unit 20 (see FIG. 1), and supplies the test signal to the electronic device 30 via the transmission line and the probe pin 60. Further, the probe card 50 supplies the output signal of the electronic device received via the probe pin 60 and the transmission line to the determination unit 40.
  • the plurality of probe pins 60 make a predetermined angle with respect to the substrate.
  • the test apparatus 100 moves the probe card 50 and / or the electronic device 30 to a desired position, and electrically connects the plurality of probe pins 60 and the plurality of connection terminals 56. It is preferable to have In this example, the probe card 50 exchanges signals with one electronic device 30. In other examples, the probe card 50 exchanges signals with a plurality of electronic devices 30. May be performed.
  • the probe card 50 according to the present invention may be a part of a probe card. That is, the probe card 50 may be a replacement member of a probe card in which a plurality of probe pins 60 can be replaced.
  • FIG. 3 shows an example of the configuration of the probe pin 60.
  • FIG. 3A is a schematic diagram illustrating an example of the configuration of the probe pin 60.
  • the probe pin 60 has a contact portion 64 and an elastic portion 62.
  • the contact portion 64 contacts the connection terminal 56 of the electronic device 30 (see FIG. 2).
  • the contact portion 64 has a first surface and a second surface substantially parallel to the first surface.
  • the contact portion 64 in this example contacts the connection terminal 56 at the contact point shown in FIG. JP02 / 10517
  • the elastic portion 62 is provided with a contact portion 64.
  • a contact portion 64 is provided at one end of the elastic portion 62, and the other end is connected to the substrate 52 (see FIG. 2).
  • the other end of the elastic portion 62 is connected to the transmission line of the substrate 52.
  • the other end of the elastic portion 62 may be connected to the transmission line of the substrate 52 by solder or the like. Further, it is preferable that the elastic portion 62 has a predetermined angle with respect to the substrate 52.
  • the contact portion 64 and the elastic portion 62 are formed of a conductive material.
  • the probe pin 60 supplies a test signal received from the transmission line of the substrate 52 to the connection terminal 56 of the electronic device 30 via the elastic portion 62 and the contact portion 64.
  • the probe pin 60 supplies the output signal of the electronic device 30 to the transmission line of the substrate 52 via the contact portion 64 and the elastic portion 62.
  • the elastic portion 62 and the contact portion 64 preferably have a transmission line for transmitting a signal.
  • FIG. 3B shows a perspective view of an example of the contact portion 64.
  • FIG. 3C shows a top view of the contact portion 64 in this example.
  • FIG. 3 (d) shows a side view of the contact portion 64 viewed from the direction of 1 in FIG. 3 (c)
  • FIG. 3 (e) shows a side view of the contact portion 64 as viewed from the direction of 2 in FIG. The side view of the contact part 64 is shown.
  • the contact portion 64 has a first surface 66 and a second surface 72 substantially parallel to the first surface 66 and having a larger area than the first surface 66.
  • the second surface 72 may be a pentagon or more polygonal shape.
  • the contact portion 64 is joined to the elastic portion 62 on the second surface.
  • the contact portion 64 may be formed integrally with the elastic portion 62, and the contact portion 64 may be bonded to the elastic portion 62 with a conductive adhesive material. Further, the contact portion 64 and the elastic portion 62 may be formed of the same material.
  • the contact portion 64 further has a third surface 68 substantially perpendicular to the first surface 66.
  • the first surface 66 of the contact portion 64 has a rectangular shape, and the second surface 72 has an octagonal shape.
  • the contact portion 64 has four third surfaces 68.
  • Each of the third surfaces 68 is substantially perpendicular to the first surface, and each of the third surfaces 68 is substantially perpendicular to any of the other third surfaces 68. Further, each third surface 68 is substantially parallel to the other opposing third surface.
  • the contact portion 64 further has a fourth surface 70 whose angle with respect to the first surface 66 is different from the angle of the third surface 68 with respect to the first surface.
  • the contact portion 64 has four fourth surfaces 70.
  • the third surface 68 and the fourth surface 70 are alternately arranged on the side surface of the contact portion 64.
  • the third surface 68 has a triangular shape that shares one vertex with the first surface 66 and shares one side with the second surface 72.
  • the fourth surface 70 has a trapezoidal shape in which one side of the parallel sides is shared with the first surface 66 and the other side is shared with the second surface 72.
  • the contact portion 64 contacts the connection terminal 56 at the contact point shown in FIG.
  • the contact point is one of the vertices shared by the first surface 66 and the third surface 68. Since the third surface 68 is substantially perpendicular to the elastic portion 60 and the first surface 66 is substantially parallel to the elastic portion 60, as shown in FIG.
  • the contact portion 64 becomes Contact only with the connection terminal 56. Therefore, the probe pins 60 can easily scrub the connection terminals 56. Therefore, the probe pin 60 and the connection terminal 56 can be electrically connected with good characteristics.
  • FIG. 4 shows another example of the contact portion 64.
  • FIG. 4A shows a perspective view of an example of the contact portion 64.
  • FIG. 4B shows a top view of the contact portion 64 in this example.
  • FIG. 4 (c) shows a side view of the contact portion 64 viewed from the direction of 1 in FIG. 4 (b)
  • FIG. 4 (d) shows a contact view viewed from the direction of 2 in FIG. 4 (b).
  • a side view of part 64 is shown.
  • the contact portion 64 shown in FIG. 4 is similar to the contact portion 64 shown in FIG. 3 in that the first surface 66, the second surface 72, the third surface 68, and the fourth surface Has 70.
  • the second side 72, the third side 68, and the fourth side 70 are the second side 72, the third side 68, and the fourth side described with reference to FIG. Same as 70.
  • the first surface 66 has an octagonal shape.
  • the third surface 68 has a trapezoidal shape.
  • the third surface 68 shares one side of the parallel sides with the first surface 66 and shares the other side with the second surface 72.
  • the contact portion 64 contacts the connection terminal 56 (see FIG. 2) at the contact portion shown in FIG. 4 (a).
  • the contact area includes the first surface 66 and the third surface 68. Is one side to share. For this reason, the contact area between the contact portion 64 and the connection terminal 56 can be reduced as compared with the conventional case, and scrubbing can be easily performed.
  • FIG. 5 shows another example of the contact portion 64.
  • FIG. 5A shows a perspective view of the contact portion 64 in the present example.
  • FIG. 5B shows a top view of the contact portion 64 in this example.
  • FIG. 5 (c) shows a side view of the contact portion 64 viewed from the direction 1 of FIG. 5 (b), and
  • FIG. 5 (d) shows the contact portion 64 viewed from the direction 2 of FIG. 5 (b).
  • a side view of part 64 is shown.
  • the contact portion 64 shown in FIG. 5 has a first surface 66, a second surface 72, a third surface 68, and a fourth surface 70, similarly to the contact portion 64 shown in FIG.
  • the first surface 66, the second surface 72, the third surface 68, and the fourth surface 70 correspond to the first surface 66, the second surface 72, Similar to the third surface 68 and the fourth surface 70.
  • the contact portion 64 in this example further has a ridge line 74 connecting the vertex of the third surface 68 and the vertex of the first surface 66.
  • the ridge 74 connects a vertex of the third surface 68 that is not shared with the second surface 72 and a vertex of the first surface 66.
  • the contact portion 64 comes into contact with the connection terminal 56 (see FIG. 2) at the ridge line 74. For this reason, the contact area between the contact portion 64 and the connection terminal 56 can be reduced as compared with the related art, and the scrub can be easily performed.
  • FIG. 6 illustrates an example of the probe pin manufacturing method according to the present invention.
  • a method of manufacturing a contact portion of a prop pin will be described.
  • FIG. 6A a silicon substrate 200 having a ⁇ 100 ⁇ surface is prepared.
  • FIG. 6B is a cross-sectional view of the silicon substrate 200 shown in FIG.
  • the ⁇ 100 ⁇ plane is a plane represented by the Miller index, and includes all the planes having symmetry with the (100) plane.
  • an etching mask formation step an etching mask 202 having a rectangular opening 210 having four sides in the ⁇ 100> direction is formed on the surface of the silicon substrate 200.
  • the etching mask 202 may be a silicon oxide film.
  • the etching mask 202 is formed by thermal oxidation.
  • the ⁇ 100> direction is a direction represented by the Miller index, and includes all directions having symmetry with the [100] direction.
  • the bottom surface 2 1 2 which is substantially parallel to the surface of the silicon Is formed.
  • the etching step forms a trench 204 having a bottom surface 212 having an area smaller than the area of the opening 214 of the trench 204.
  • a top view of the groove 204 shown in the sectional view of FIG. 6C is shown in the right view of FIG. 6C.
  • the shape of the groove portion 204 in FIG. 6C is the same as the shape of the contact portion 64 described in FIG.
  • a ⁇ 100 ⁇ plane and a ⁇ 111 ⁇ plane are formed on the side surfaces of the groove 204 by anisotropic jet etching.
  • the ⁇ 100 ⁇ face of the groove 204 corresponds to the third face 68 of the contact portion 64 described in FIG.
  • the ⁇ 111 ⁇ surface of the groove 204 corresponds to the fourth surface 70 of the contact portion 64 described in FIG.
  • the ⁇ 111> direction is less likely to be eroded than the ⁇ 100> direction. Therefore, as the anisotropic wet etching is performed, the area ratio of the ⁇ 111 ⁇ plane to the ⁇ 100 ⁇ plane gradually increases. Therefore, when the groove 204 shown in FIG. 6C is further anisotropically wet-etched, the shape of the groove 204 becomes the same as the shape of the contact portion 64 described in FIG. FIG. 6D shows a case where the groove 204 having the same shape as the contact portion 64 described in FIG. 3 is further subjected to anisotropic wet etching.
  • the shape of the groove portion 204 in FIG. 6D is the same as the shape of the contact portion 64 described in FIG.
  • a ridgeline 2 16 is formed in the groove 204.
  • the ridge line 2 16 corresponds to the ridge line 74 of the contact portion 64 described in FIG. 5 and is in the ⁇ 1 110> direction.
  • the etching mask is removed.
  • the groove 204 is filled with the conductive material 218.
  • This step may include the step of forming a mask for filling the groove 204 with the conductive material 218 before filling the groove 204 with the conductive material 218.
  • the method further includes a step of removing the mask after filling the groove 204 with the conductive material 218.
  • the method may further include a step of polishing the surface of the silicon substrate 200 after removing the mask.
  • the silicon substrate 20 is removed to form a contact portion of the probe pin.
  • the probe pin contact portion according to the present invention can be easily manufactured.
  • the method may further include a step of preparing the elastic portion 62 described in FIG. 3 and a step of bonding the contact portion and the elastic portion 62 manufactured in this example.
  • FIG. 7 illustrates another example of the probe pin manufacturing method according to the present invention.
  • the manufacturing method in this example has the steps described with reference to FIGS. 6A to 6E of the probe pin manufacturing method described in FIG.
  • a mask 2 for forming an elastic portion having a desired shape on the surface of the silicon substrate 200 after the step described with reference to FIG. 6 (e), as shown in FIG. 7 (a), a mask 2 for forming an elastic portion having a desired shape on the surface of the silicon substrate 200.
  • the mask 208 may be a mask having a rectangular opening.
  • a conductive regenerated material 220 is formed on the surface of the silicon substrate 200.
  • the conductive material 220 may be formed on the surface of the silicon substrate 200 by plating or evaporation.
  • the silicon substrate 200 and the mask 208 are removed.
  • a probe pin can be obtained.
  • the probe pins described with reference to FIGS. 3 to 5 can be easily manufactured.
  • the probe pin and the probe card according to the present invention good contact characteristics can be obtained with respect to the connection terminal of the electronic device.
  • the test apparatus since good contact characteristics with the electronic device can be obtained, the test of the electronic device can be performed with high accuracy.
  • the method of manufacturing a probe pin according to the present invention it is possible to easily manufacture a probe pin capable of obtaining good contact characteristics with a connection terminal of an electronic device.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Tests Of Electronic Circuits (AREA)

Abstract

A probe pin and a method of manufacturing the probe pin, the probe pin having a first surface, a second surface generally parallel with the first surface and having an area larger than that of the first surface, and four third surfaces generally perpendicular to the first surface comprising a contact part coming into contact with an electronic component and an elastic part having the contact part; the method of manufacturing the probe pin comprising the steps of preparing a silicon substrate having a surface {100}, forming a mask, having a rectangular opening with four sides in a direction <100> in the surface of the silicon substrate, forming a groove part by anisotropic wet etching, and filling conductive material in the formed groove part.

Description

明 細 書 プローブピン、 プローブカード、 試験装置、 及びプローブピン製造方法 技術分野  Description Probe pin, probe card, test equipment, and probe pin manufacturing method

本発明は、電子デバイスを試験するための試験装置、電子デバイスと信号の授 受を行うプローブカード、 及ぴ電子デバイスの端子と接続されるプローブピン、 並びにプローブピン製造方法に関する。 また本出願は、下記の日本特許出願に関 連する。文献の参照による組み込みが認められる指定国については、下記の出願 に記載された内容を参照により本出願に組み込み、 本出願の記載の一部とする。  The present invention relates to a test apparatus for testing an electronic device, a probe card for transmitting and receiving signals to and from the electronic device, a probe pin connected to a terminal of the electronic device, and a probe pin manufacturing method. This application is related to the following Japanese patent application. For those designated countries that are permitted to be incorporated by reference to the literature, the contents described in the following application are incorporated into this application by reference and are incorporated as part of the description of this application.

特願 2 0 0 1— 3 1 6 0 5 8 出願日 2 0 0 1年 1 0月 1 2日 背景技術  Japanese Patent Application No. 2 0 0 1— 3 1 6 0 5 8 Filing Date 2 0 0 1 Year 1 October 1 2 Background Technology

従来、 電子デバイスを試験する場合に、 電子デバイスと信号の授受を行うために プローブカードが用いられている。 プローブカードは、 複数のプローブピンを有す る。 複数のプローブピンは、 電子デバイスの端子とそれぞれ接続される。  Conventionally, when testing an electronic device, a probe card has been used to exchange signals with the electronic device. The probe card has a plurality of probe pins. The plurality of probe pins are respectively connected to terminals of the electronic device.

図 8に、 従来のプローブピンを示す。 プローブピンは、 電子デバイス (D U T) の端子と接触する接触部と、 当該接触部が設けられた弾性部とを有する。 従来のプ 口ーブピンの接触部は四角錐形状である。 接触部の先端で電子デバィスの端子と接 触し、 接触部の先端で端子をスクライビングしていた。  Figure 8 shows a conventional probe pin. The probe pin has a contact portion that contacts a terminal of the electronic device (DUT), and an elastic portion provided with the contact portion. The contact part of the conventional probe pin has a quadrangular pyramid shape. The tip of the contact portion made contact with the terminal of the electronic device, and the tip of the contact portion scribed the terminal.

図 8に示すように、 プローブピンはプローブカードに対して、 所定の角度を持つ て設けられる。 このため、 図 8に示すように、 接触部の先端が電子デバイスの端子 を十分にスクラブすることができない場合がある。 例えば、 接触部の一辺と電子デ パイスの端子とがほぼ平行である場合、 接触部の一辺が当該端子と接触してしまう ため、 接触部の先端は電子デバイスの端子を十分にスクラブすることができず、 良 好な電気的接続特性を得ることが困難であった。  As shown in FIG. 8, the probe pins are provided at a predetermined angle with respect to the probe card. For this reason, as shown in FIG. 8, the tip of the contact portion may not be able to sufficiently scrub the terminal of the electronic device. For example, if one side of the contact part is almost parallel to the terminal of the electronic device, one side of the contact part will come into contact with the terminal, and the tip of the contact part will scrub the terminal of the electronic device sufficiently. As a result, it was difficult to obtain good electrical connection characteristics.

そこで本発明は、上記の課題を解決することのできるプローブピン、プローブ カード、試験装置、 及びプローブピン製造方法を提供することを目的とする。 こ の目的は請求の範囲における独立項に記載の特徴の組み合わせにより達成され る。 また従属項は本発明の更なる有利な具体例を規定する。 発明の開示 Therefore, the present invention provides a probe pin and a probe that can solve the above-described problems. An object of the present invention is to provide a card, a test apparatus, and a method of manufacturing a probe pin. This object is achieved by a combination of features described in the independent claims. The dependent claims define further advantageous embodiments of the present invention. Disclosure of the invention

上記課題を解決するために、 本発明の第 1の形態においては、 電子部品に接触す ることにより、 電子部品に信号を供給するプローブピンであって、 第 1の面と、 第 1の面と略平行であって、 第 1の面より面積の大きい第 2の面とを有し、 電子部品 と接触する接触部と、 接触部が設けられた弾性部とを備えることを特徴とするプロ ーブピンを提供する。  In order to solve the above problems, in a first aspect of the present invention, there is provided a probe pin for supplying a signal to an electronic component by contacting the electronic component, the probe pin comprising: a first surface; A second surface substantially parallel to the first surface and having a larger area than the first surface, comprising: a contact portion that contacts the electronic component; and an elastic portion provided with the contact portion. Provide vepin.

接触部は、 第 1の面と略垂直な第 3の面を更に有してよい。 また、 接触部は、 第 3の面を 4面有してよい。 また、 第 1の面は、 四角形状であり、 第 2の面は五角形 以上の多角形状であることが好ましい。 第 2の面は八角形状であってよい。 また、 接触部は、 第 1の面に対する角度が、 第 3の面の第 1の面に対する角度と異なる第 4の面を更に有してよい。 接触部は、 第 4の面を 4面有してよい。 また、 接触部と 弾性部とは同一の材料により形成されてよい。  The contact portion may further have a third surface substantially perpendicular to the first surface. Further, the contact portion may have four third surfaces. Further, the first surface is preferably a quadrangular shape, and the second surface is preferably a pentagonal or more polygonal shape. The second surface may be octagonal. The contact portion may further include a fourth surface having an angle with respect to the first surface different from an angle of the third surface with respect to the first surface. The contact portion may have four fourth surfaces. Further, the contact portion and the elastic portion may be formed of the same material.

本発明の第 2の形態においては、 電子部品に接触することにより、 電子部品に信 号を供給するプローブピンであって、 電子部品と接触し、 第 1の面と第 1の面と略 垂直な第 2の面とを有する接触部と、 接触部が設けられた弾性部とを備えることを 特徴とするプローブピンを提供する。  According to a second aspect of the present invention, there is provided a probe pin for supplying a signal to an electronic component by contacting the electronic component, the probe pin being in contact with the electronic component, and being substantially perpendicular to the first surface and the first surface. A probe pin, comprising: a contact portion having a suitable second surface; and an elastic portion provided with the contact portion.

本発明の第 3の形態においては、 電子デバィスに設けられた複数の接続端子と電 気的に接続し、 電子デバイスに信号を供給するためのプローブカードであって、 基 板と、 基板に設けられ、 電子デバイスの接続端子と電気的に接続する複数のプロ一 ブピンと、 複数のプローブピンと電気的に接続された伝送線路とを備え、 プローブ ピンは、 接続端子と接触し、 第 1の面と第 1の面と略平行な第 2の面とを有する接 触部と、 接触部が設けられた弾性部とを有することを特徴とするプローブカードを 提供する。 本発明の第 4の形態においては、 電子デパイスに設けられた複数の接続端子と電 気的に接続し、 電子デバイスに信号を供給するためのプローブカードであって、 基 板と、 基板に設けられ、 電子デバイスの接続端子と電気的に接続する複数のプロ一 ブピンと、 複数のプローブピンと電気的に接続された伝送線路とを備え、 プローブ ピンは、 接続端子と接触し、 第 1の面と第 1の面と略垂直な第 2の面とを有する接 触部と、 接触部が設けられた弾性部とを有することを特徴とするプローブカードを 提供する。 According to a third aspect of the present invention, there is provided a probe card electrically connected to a plurality of connection terminals provided on an electronic device to supply a signal to an electronic device, wherein the probe card is provided on the substrate and the substrate. A plurality of probe pins electrically connected to connection terminals of the electronic device, and a transmission line electrically connected to the plurality of probe pins, wherein the probe pins are in contact with the connection terminals, and the first surface And a contact portion having a second surface substantially parallel to the first surface and an elastic portion provided with the contact portion. According to a fourth aspect of the present invention, there is provided a probe card electrically connected to a plurality of connection terminals provided on an electronic device to supply signals to an electronic device, the probe card being provided on a substrate and a substrate. A plurality of probe pins electrically connected to connection terminals of the electronic device, and a transmission line electrically connected to the plurality of probe pins, wherein the probe pins are in contact with the connection terminals, and the first surface And a contact portion having a second surface substantially perpendicular to the first surface and an elastic portion provided with the contact portion.

本発明の第 5の形態においては、 電子デパイスを試験するための試験装置であつ て、 電子デバイスを試験するための試験信号を発生するパターン発生部と、 パター ン発生部が発生する試験信号の波形を整形する波形整形器と、 波形整形器によって 整形された試験信号を、 電子デバイスに供給し、 電子デバイスから出力される出力 信号を受け取るプローブカードと、 電子デバイスが試験信号に基づいて出力した出 力信号に基づいて、 電子デバイスの良否を判定する判定部とを備え、 プローブカー ドは、 基板と、 基板に設けられ、 電子デバイスの接続端子と電気的に接続する複数 のプローブピンと、 複数のプローブピンと電気的に接続された伝送線路とを備え、 プローブピンは、 接続端子と接触し、 第 1の面と第 1の面と略平行な第 2の面とを 有する接触部と、 接触部が設けられた弾性部とを含むことを特徴とする試験装置を 提供する。  According to a fifth aspect of the present invention, there is provided a test apparatus for testing an electronic device, comprising: a pattern generation unit for generating a test signal for testing an electronic device; and a test signal generated by the pattern generation unit. A waveform shaper that shapes the waveform, a probe card that supplies the test signal shaped by the waveform shaper to the electronic device and receives the output signal output from the electronic device, and an electronic device that outputs based on the test signal A determination unit that determines pass / fail of the electronic device based on the output signal; the probe card includes a substrate, a plurality of probe pins provided on the substrate, and electrically connected to connection terminals of the electronic device; A transmission line electrically connected to the probe pin, wherein the probe pin is in contact with the connection terminal and is substantially parallel to the first surface and the first surface. A contact portion having a second surface, providing a test apparatus which comprises an elastic portion contacting portion is provided.

本発明の第 6の形態においては、 電子デパイスを試験するための試験装置であつ て、 電子デバイスを試験するための試験信号を発生するパターン発生部と、 パター ン発生部が発生する試験信号の波形を整形する波形整形器と、 波形整形器によって 整形された試験信号を、 電子デバイスに供給し、 電子デバイスから出力される出力 信号を受け取るプローブカードと、 電子デバイスが試験信号に基づいて出力した出 力信号に基づいて、 電子デバイスの良否を判定する判定部とを備え、 プローブカー ドは、 基板と、 基板に設けられ、 電子デバイスの接続端子と電気的に接続する複数 のプローブピンと、 複数のプローブピンと電気的に接続された伝送線路とを備え、 プローブピンは、 接続端子と接触し、 第 1の面と第 1の面と略垂直な第 2の面とを 有する接触部と、 接触部が設けられた弾性部とを有することを特徴とする試験装置 を提供する。 According to a sixth aspect of the present invention, there is provided a test apparatus for testing an electronic device, comprising: a pattern generation section for generating a test signal for testing an electronic device; and a test signal generated by the pattern generation section. A waveform shaper that shapes the waveform, a probe card that supplies the test signal shaped by the waveform shaper to the electronic device and receives the output signal output from the electronic device, and an electronic device that outputs based on the test signal A determination unit that determines pass / fail of the electronic device based on the output signal; the probe card includes a substrate, a plurality of probe pins provided on the substrate, and electrically connected to connection terminals of the electronic device; A transmission line electrically connected to the probe pin, wherein the probe pin is in contact with the connection terminal and is substantially perpendicular to the first surface and the first surface. And a second surface A test device comprising: a contact portion having the contact portion; and an elastic portion provided with the contact portion.

本発明の第 7の形態においては、 電子部品に信号を供給するプローブピンを製造 するためのプローブピン製造方法であって、 シリコン基板を用意する基板準備段階 と、 異方性ウエットエッチングにより、 シリコン基板の表面に、 シリコン基板の表 面と略平行であって、 開口部より面積の小さ 、底面を有する溝部を形成するエッチ ング段階と、 溝部に導電材料を充填する充填段階と、 シリコン基板を除去する段階 とを備えることを特徴とするプローブピン製造方法を提供する。  According to a seventh aspect of the present invention, there is provided a probe pin manufacturing method for manufacturing a probe pin for supplying a signal to an electronic component, comprising: a substrate preparing step of preparing a silicon substrate; An etching step of forming a groove having a bottom surface substantially parallel to the surface of the silicon substrate and having a smaller area than the opening on the surface of the substrate; a filling step of filling the groove with a conductive material; Removing the probe pin.

基板準備段階は、 表面が { 1 0 0 } 面であるシリ コン基板を用意し、 プローブ ピン製造方法は、 エッチング段階の前に、 シリコン基板の表面に、 四辺が 〈1 0 0〉方向である矩形状の開口部を有するエッチング用マスクを形成するエツチン グマスク形成段階と、エッチング段階の後に、エッチング用マスクを除去するマ スク除去段階とを更に備え、エツチング段階は、エッチング用マスクの開口部か ら、 シリコン基板をエッチングすることが好ましい。 また、 エッチング段階は、 シリコン基板に、シリコン基板の表面と略垂直な面を更に有する溝部を形成して よい。  In the substrate preparation step, a silicon substrate with a {100} surface is prepared. In the probe pin manufacturing method, the four sides are in the <100> direction on the silicon substrate surface before the etching step. The method further includes an etching mask forming step of forming an etching mask having a rectangular opening, and a mask removing step of removing the etching mask after the etching step, wherein the etching step includes determining whether the etching mask has an opening. Therefore, it is preferable to etch the silicon substrate. In the etching step, a groove may be formed in the silicon substrate further having a surface substantially perpendicular to the surface of the silicon substrate.

尚、上記の発明の概要は、本発明の必要な特徴の全てを列挙したものではなく、 これらの特徴群のサブコンビネーションも又、 発明となりうる。 図面の簡単な説明  The above summary of the present invention does not list all of the necessary features of the present invention, and a sub-combination of these features may also be an invention. BRIEF DESCRIPTION OF THE FIGURES

図 1は、 本発明に係る試験装置 1 0 0の構成の一例を示す図である。  FIG. 1 is a diagram showing an example of a configuration of a test apparatus 100 according to the present invention.

図 2は、 プローブカード 5 0の構成の一例を示す図である。  FIG. 2 is a diagram showing an example of the configuration of the probe card 50.

図 3は、 プローブピン 6 0の構成の一例を示す図である。  FIG. 3 is a diagram showing an example of the configuration of the probe pin 60.

図 4は、 接触部 6 4の他の例を示す図である。  FIG. 4 is a diagram showing another example of the contact portion 64. As shown in FIG.

図 5は、 接触部 6 の他の例を示す図である。  FIG. 5 is a diagram showing another example of the contact portion 6.

図 6は、 本発明に係るプローブピン製造方法の一例を説明する図である。  FIG. 6 is a diagram illustrating an example of the method of manufacturing a probe pin according to the present invention.

図 7は、 本発明に係るプローブピン製造方法の他の例を説明する図である。 図 8は、 従来のプローブピンを示す図である。 発明を実施するための最良の形態 FIG. 7 is a view for explaining another example of the probe pin manufacturing method according to the present invention. FIG. 8 is a diagram showing a conventional probe pin. BEST MODE FOR CARRYING OUT THE INVENTION

以下、 発明の実施の形態を通じて本発明を説明するが、 以下の実施形態は特許請 求の範囲にかかる発明を限定するものではなく、 又実施形態の中で説明されている 特徴の組み合わせの全てが発明の解決手段に必須であるとは限らない。  Hereinafter, the present invention will be described through embodiments of the present invention. However, the following embodiments do not limit the invention according to the scope of the patent request, and all combinations of the features described in the embodiments are described. Is not necessarily essential to the solution of the invention.

図 1は、 本発明に係る試験装置 1 0 0の構成の一例を示す ^験装置 1 0 0は、 パターン発生部 1 0、 波形整形部 2 0、 判定部 4 0、 及びプローブカード 5 0を備 える。 パターン発生部 1 0は、 電子デバイスを試験するための試験信号を発生し、 波形整形部 2 0に供給する。  FIG. 1 shows an example of the configuration of a test apparatus 100 according to the present invention. The test apparatus 100 includes a pattern generation section 10, a waveform shaping section 20, a judgment section 40, and a probe card 50. Be prepared. The pattern generation unit 10 generates a test signal for testing the electronic device and supplies the test signal to the waveform shaping unit 20.

波形整形部 2 0は、 受け取った試験信号を整形し、 整形した試験信号をプローブ カード 5 0に供給する。 波形整形部 2 0は、 例えば試験信号を所望のタイミングで プローブカード 5 0に供給してよい。 本例において、 波形整形部 2 0は、 所望のタ ィミングを発生するタイミング発生器を有する。  The waveform shaping unit 20 shapes the received test signal, and supplies the shaped test signal to the probe card 50. The waveform shaping section 20 may supply the test signal to the probe card 50 at a desired timing, for example. In the present example, the waveform shaping section 20 has a timing generator for generating desired timing.

当該タイミング発生器は、 所望のタイミングを発生する。 当該タイミング発生器 は、 例えば可変遅延回路を有する。 本例において、 当該タイミング発生器は、 試験 装置 1 0 0の動作を制御する基準クロックを受け取り、 受け取った基準クロックを 可変遅延回路で所望の時間だけ遅延させ、 当該所望のタイミングとして波形整形部 The timing generator generates a desired timing. The timing generator has, for example, a variable delay circuit. In this example, the timing generator receives a reference clock for controlling the operation of the test apparatus 100, delays the received reference clock by a desired time by a variable delay circuit, and sets a waveform shaping unit as the desired timing.

2 0に供給してよい。 20 may be supplied.

プローブカード 5 0は、 電子デバイス 3 0に設けられた複数の接続端子と電気的 に接続し、 電子デバイスに信号を供給する。 また、 プローブカード 5 0は、 電子デ バイスが試験信号に基づいて出力する出力信号を受け取り、 受け取った出力信号を 判定部 4 0に供給する。  The probe card 50 is electrically connected to a plurality of connection terminals provided on the electronic device 30 and supplies signals to the electronic device. Further, the probe card 50 receives an output signal output from the electronic device based on the test signal, and supplies the received output signal to the determination unit 40.

判定部 4 0は、 試験信号に基づいて電子デバイス 3 0が出力する出力信号に基づ いて、 電子デバイス 3 0の良否を判定する。 判定部 4 0は、 例えば電子デバイス 3 0が試験信号に基づいて出力するべき期待値信号と、 電子デバイス 3 0が出力した 出力信号とを比較して電子デバイス 3 0の良否を判定してよい。 この場合、 パター ン発生部 1 0は、 発生した試験信号に基づいて当該期待値信号を生成し、 判定部 4 0に供給してよレ、。 The determination unit 40 determines pass / fail of the electronic device 30 based on an output signal output by the electronic device 30 based on the test signal. For example, the determination unit 40 may determine whether the electronic device 30 is good by comparing an expected value signal to be output by the electronic device 30 based on the test signal with an output signal output by the electronic device 30. . In this case, putter The generation unit 10 generates the expected value signal based on the generated test signal, and supplies the generated expected value signal to the determination unit 40.

図 2は、 プローブカード 5 0の構成の一例を示す。 プローブカード 5 0は、 基板 5 2と、 複数のプローブピン 6 0と、 伝送線路 (図示せず) とを有する。 複数のプ ローブピン 6 0は、 基板 5 2に設けられ、 電子デバィス 3 0の複数の接続端子 5 6 とそれぞれ電気的に接続する。 プローブピン 6 0は、 電子部品である電子デバイス 3 0と接触することにより、 電子デバイス 3 0と信号の授受を行う。 また、 当該伝 送線路は、 複数のプローブピンと電気的に接続される。 プローブカード 5 0は波形 整形部 2 0 (図 1参照) から試験信号を受け取り、 当該伝送線路及びプローブピン 6 0を介して、 電子デバイス 3 0に試験信号を供給する。 また、 プローブカード 5 0は、 プローブピン 6 0及び当該伝送線路を介して受け取った電子デバイスの出力 信号を、 判定部 4 0に供給する。  FIG. 2 shows an example of the configuration of the probe card 50. The probe card 50 has a substrate 52, a plurality of probe pins 60, and a transmission line (not shown). The plurality of probe pins 60 are provided on the substrate 52, and are electrically connected to the plurality of connection terminals 56 of the electronic device 30, respectively. The probe pins 60 exchange signals with the electronic device 30 by contacting the electronic device 30 as an electronic component. Further, the transmission line is electrically connected to a plurality of probe pins. The probe card 50 receives the test signal from the waveform shaping unit 20 (see FIG. 1), and supplies the test signal to the electronic device 30 via the transmission line and the probe pin 60. Further, the probe card 50 supplies the output signal of the electronic device received via the probe pin 60 and the transmission line to the determination unit 40.

本例において、 複数のプローブピン 6 0は、 基板に対して所定の角度をする。 ま た、 試験装置 1 0 0は、 プロープカード 5 0及び/又は電子デバィス 3 0を所望の 位置に移動させ、 複数のプローブピン 6 0と複数の接続端子 5 6とを電気的に接続 させる手段を有することが好ましい。 また、 本例においてプローブカード 5 0は、 1つの電子デバイス 3 0と信号の授受を行ったが、 他の例においては、 プローブ力 ード 5 0は、 複数の電子デバイス 3 0と信号の授受を行ってよい。 また、 本発明に 係るプローブカード 5 0は、 プローブカードの一部であってよい。 つまり、 プロ一 プカード 5 0は、 複数のプローブピン 6 0を交換可能なプローブカードの、 交換用 部材であってよい。  In this example, the plurality of probe pins 60 make a predetermined angle with respect to the substrate. In addition, the test apparatus 100 moves the probe card 50 and / or the electronic device 30 to a desired position, and electrically connects the plurality of probe pins 60 and the plurality of connection terminals 56. It is preferable to have In this example, the probe card 50 exchanges signals with one electronic device 30. In other examples, the probe card 50 exchanges signals with a plurality of electronic devices 30. May be performed. Further, the probe card 50 according to the present invention may be a part of a probe card. That is, the probe card 50 may be a replacement member of a probe card in which a plurality of probe pins 60 can be replaced.

図 3は、 プローブピン 6 0の構成の一例を示す。 図 3 ( a ) は、 プローブピン 6 0の構成の一例を示す模式図である。 プローブピン 6 0は、 接触部 6 4と弾性部 6 2とを有する。 接触部 6 4は、 電子デバィス 3 0 (図 2参照) の接続端子 5 6と接 触する。 また、 接触部 6 4は、 第 1の面と、 第 1の面と略平行な第 2の面とを有す る。 本例における接触部 6 4は、 図 3 ( a ) に示した接触点において、 接続端子 5 6と接触する。 JP02/10517 FIG. 3 shows an example of the configuration of the probe pin 60. FIG. 3A is a schematic diagram illustrating an example of the configuration of the probe pin 60. The probe pin 60 has a contact portion 64 and an elastic portion 62. The contact portion 64 contacts the connection terminal 56 of the electronic device 30 (see FIG. 2). In addition, the contact portion 64 has a first surface and a second surface substantially parallel to the first surface. The contact portion 64 in this example contacts the connection terminal 56 at the contact point shown in FIG. JP02 / 10517

7  7

弾性部 6 2は、 接触部 6 4が設けられる。 弾性部 6 2の一端には、 接触部 6 4が 設けられ、 他端は基板 5 2 (図 2参照) に接続されている。 弾性部 6 2の当該他端 は、 基板 5 2の伝送線路と接続される。 例えば、 弾性部 6 2の当該他端は、 半田等 によって、 基板 5 2の伝送線路と接続されてよい。 また、 弾性部 6 2は、 基板 5 2 に対して所定の角度を有することが好ましい。  The elastic portion 62 is provided with a contact portion 64. A contact portion 64 is provided at one end of the elastic portion 62, and the other end is connected to the substrate 52 (see FIG. 2). The other end of the elastic portion 62 is connected to the transmission line of the substrate 52. For example, the other end of the elastic portion 62 may be connected to the transmission line of the substrate 52 by solder or the like. Further, it is preferable that the elastic portion 62 has a predetermined angle with respect to the substrate 52.

また、 本例において、 接触部 6 4及び弾性部 6 2は、 導電性材料により形成され る。 プローブピン 6 0は基板 5 2の伝送線路から受け取つた試験信号を、 弾性部 6 2及び接触部 6 4を介して、 電子デバイス 3 0の接続端子 5 6に供給する。 また、 プローブピン 6 0は、 電子デバィス 3 0の出力信号を、 接触部 6 4及び弾性部 6 2 を介して基板 5 2の伝送線路に供給する。 また、 弾性部 6 2力 導電性材料で無レ、 場合、 弾性部 6 2及び接触部 6 4は、 信号を伝送する伝送線路を有することが好ま しい。  Further, in this example, the contact portion 64 and the elastic portion 62 are formed of a conductive material. The probe pin 60 supplies a test signal received from the transmission line of the substrate 52 to the connection terminal 56 of the electronic device 30 via the elastic portion 62 and the contact portion 64. The probe pin 60 supplies the output signal of the electronic device 30 to the transmission line of the substrate 52 via the contact portion 64 and the elastic portion 62. In the case where the elastic portion 62 is made of a conductive material, the elastic portion 62 and the contact portion 64 preferably have a transmission line for transmitting a signal.

図 3 ( b ) は、 接触部 6 4の一例の斜視図を示す。 また、'図 3 ( c ) に、 本例に おける接触部 6 4の上面図を示す。 また、 図 3 ( d ) に、 図 3 ( c ) の①の方向か ら見た接触部 6 4の側面図を、 図 3 ( e ) に、 図 3 ( c ) の②の方向から見た接触 部 6 4の側面図を示す。  FIG. 3B shows a perspective view of an example of the contact portion 64. FIG. 3C shows a top view of the contact portion 64 in this example. Further, FIG. 3 (d) shows a side view of the contact portion 64 viewed from the direction of ① in FIG. 3 (c), and FIG. 3 (e) shows a side view of the contact portion 64 as viewed from the direction of ② in FIG. The side view of the contact part 64 is shown.

接触部 6 4は、 第 1の面 6 6と、 第 1の面 6 6と略平行で、 第 1の面 6 6より面 積の大きい第 2の面 7 2を有する。 第 2の面 7 2は、 五角形以上の多角形状であつ てよい。 接触部 6 4は、 当該第 2の面において、 弾性部 6 2と接合されている。 接 触部 6 4は、 弾性部 6 2と一体に形成されてよく、 また、 接触部 6 4は、 弾性部 6 2と導電性接着材料で接着されていてもよい。また、接触部 6 4と弾性部 6 2とは、 同一の材料により形成されてよい。  The contact portion 64 has a first surface 66 and a second surface 72 substantially parallel to the first surface 66 and having a larger area than the first surface 66. The second surface 72 may be a pentagon or more polygonal shape. The contact portion 64 is joined to the elastic portion 62 on the second surface. The contact portion 64 may be formed integrally with the elastic portion 62, and the contact portion 64 may be bonded to the elastic portion 62 with a conductive adhesive material. Further, the contact portion 64 and the elastic portion 62 may be formed of the same material.

接触部 6 4は、 第 1の面 6 6と略垂直な第 3の面 6 8を更に有する。 接触部 6 4 の第 1の面 6 6は四角形状であり、第 2の面 7 2は八角形状である。接触部 6 4は、 第 3の面 6 8を 4面有する。第 3の面 6 8は、それぞれ第 1の面と略垂直であって、 それぞれの第 3の面 6 8は、 他の第 3の面 6 8のいずれかと略垂直である。 また、 それぞれの第 3の面 6 8は、 対向する他の第 3の面と略平行である。 また、 接触部 6 4は、 第 1の面 6 6に対する角度が、 第 3の面 6 8の第 1の面に 対する角度と異なる第 4の面 7 0を更に有する。 接触部 6 4は、 第 4の面 7 0を 4 面有する。 第 3の面 6 8と第 4の面 7 0とは、 接触部 6 4の側面に交互に配置され る。 第 3の面 6 8は、 第 1の面 6 6と 1つの頂点を共有し、 第 2の面 7 2と一辺を 共有する三角形状である。 また、 第 4の面 7 0は、 平行な辺のうち一辺を第 1の面 6 6と共有し、 他辺を第 2の面 7 2と共有する台形形状である。 The contact portion 64 further has a third surface 68 substantially perpendicular to the first surface 66. The first surface 66 of the contact portion 64 has a rectangular shape, and the second surface 72 has an octagonal shape. The contact portion 64 has four third surfaces 68. Each of the third surfaces 68 is substantially perpendicular to the first surface, and each of the third surfaces 68 is substantially perpendicular to any of the other third surfaces 68. Further, each third surface 68 is substantially parallel to the other opposing third surface. In addition, the contact portion 64 further has a fourth surface 70 whose angle with respect to the first surface 66 is different from the angle of the third surface 68 with respect to the first surface. The contact portion 64 has four fourth surfaces 70. The third surface 68 and the fourth surface 70 are alternately arranged on the side surface of the contact portion 64. The third surface 68 has a triangular shape that shares one vertex with the first surface 66 and shares one side with the second surface 72. The fourth surface 70 has a trapezoidal shape in which one side of the parallel sides is shared with the first surface 66 and the other side is shared with the second surface 72.

接触部 6 4は、 図 3に示した接触点において、 接続端子 5 6と接触する。 本例に おいて、 接触点は、 第 1の面 6 6と第 3の面 6 8とが共有する頂点のうちのいずれ かである。 第 3の面 6 8は、 弾性部 6 0に対して略垂直であり、 第 1の面 6 6は、 弾性部 6 0に対して略平行であるため、 図 3 ( a ) に示すように弾性部 6 0が接触 端子 5 6に対して傾きを有する場合、 つまり、 弾性部 6 0が接触端子 5 6に対して 斜行して設けられている場合、 接触部 6 4は、 当該接触点においてのみ、 接続端子 5 6と接触する。 このため、 プローブピン 6 0は、 容易に接続端子 5 6をスクラブ することができる。 このため、 プローブピン 6 0と、 接続端子 5 6とを、 特性良く 電気的に接続することができる。  The contact portion 64 contacts the connection terminal 56 at the contact point shown in FIG. In this example, the contact point is one of the vertices shared by the first surface 66 and the third surface 68. Since the third surface 68 is substantially perpendicular to the elastic portion 60 and the first surface 66 is substantially parallel to the elastic portion 60, as shown in FIG. When the elastic portion 60 has an inclination with respect to the contact terminal 56, that is, when the elastic portion 60 is provided obliquely with respect to the contact terminal 56, the contact portion 64 becomes Contact only with the connection terminal 56. Therefore, the probe pins 60 can easily scrub the connection terminals 56. Therefore, the probe pin 60 and the connection terminal 56 can be electrically connected with good characteristics.

図 4は、 接触部 6 4の他の例を示す。 図 4 ( a ) は、 接触部 6 4の一例の斜視図 を示す。 また、 図 4 ( b ) に、 本例における接触部 6 4の上面図を示す。 また、 図 4 ( c ) に、 図 4 ( b ) の①の方向から見た接触部 6 4の側面図を、 図 4 ( d ) に、 図 4 ( b ) の②の方向から見た接触部 6 4の側面図を示す。  FIG. 4 shows another example of the contact portion 64. FIG. 4A shows a perspective view of an example of the contact portion 64. FIG. 4B shows a top view of the contact portion 64 in this example. Further, FIG. 4 (c) shows a side view of the contact portion 64 viewed from the direction of ① in FIG. 4 (b), and FIG. 4 (d) shows a contact view viewed from the direction of ② in FIG. 4 (b). A side view of part 64 is shown.

図 4に示した接触部 6 4は、 図 3に示した接触部 6 4と同様に、 第 1の面 6 6、 第 2の面 7 2、 第 3の面 6 8、 及び第 4の面 7 0を有する。 第 2の面 7 2、 第 3の 面 6 8、 及び第 4の面 7 0は、 図 3に関連して説明した第 2の面 7 2、 第 3の面 6 8、 及び第 4の面 7 0と同様である。  The contact portion 64 shown in FIG. 4 is similar to the contact portion 64 shown in FIG. 3 in that the first surface 66, the second surface 72, the third surface 68, and the fourth surface Has 70. The second side 72, the third side 68, and the fourth side 70 are the second side 72, the third side 68, and the fourth side described with reference to FIG. Same as 70.

第 1の面 6 6は、 八角形状である。 また、 第 3の面 6 8は、 台形形状である。 第 3の面 6 8は、 平行な辺のうち一辺を第 1の面 6 6と共有し、 他辺を第 2の面 7 2 と共有する。 また、 接触部 6 4は、 図 4 ( a ) に示した接触部位において、 接続端 子 5 6 (図 2参照) と接触する。 当該接触部位は、 第 1の面 6 6と第 3の面 6 8と が共有する一辺である。 このため、 従来と比べ接触部 64と接続端子 5 6との接触 面積を低減でき、 また、 容易にスクラブすることができる。 The first surface 66 has an octagonal shape. The third surface 68 has a trapezoidal shape. The third surface 68 shares one side of the parallel sides with the first surface 66 and shares the other side with the second surface 72. The contact portion 64 contacts the connection terminal 56 (see FIG. 2) at the contact portion shown in FIG. 4 (a). The contact area includes the first surface 66 and the third surface 68. Is one side to share. For this reason, the contact area between the contact portion 64 and the connection terminal 56 can be reduced as compared with the conventional case, and scrubbing can be easily performed.

図 5は、 接触部 64の他の例を示す。 図 5 (a) は、 本例における接触部 64の 斜視図を示す。 また、 図 5 (b) に、 本例における接触部 64の上面図を示す。 ま た、図 5 (c) に、 図 5 (b) の①の方向から見た接触部 64の側面図を、図 5 (d) に、 図 5 (b) の②の方向から見た接触部 64の側面図を示す。  FIG. 5 shows another example of the contact portion 64. FIG. 5A shows a perspective view of the contact portion 64 in the present example. FIG. 5B shows a top view of the contact portion 64 in this example. FIG. 5 (c) shows a side view of the contact portion 64 viewed from the direction ① of FIG. 5 (b), and FIG. 5 (d) shows the contact portion 64 viewed from the direction ② of FIG. 5 (b). A side view of part 64 is shown.

図 5に示した接触部 64は、 図 3に示した接触部 64と同様に、 第 1の面 6 6、 第 2の面 72、 第 3の面 68、 及び第 4の面 70を有する。 第 1の面 6 6、 第 2の 面 7 2、第 3の面 6 8及び第 4の面 70は、図 3に関連して説明した第 1の面 6 6、 第 2の面 72、 第 3の面 6 8及び第 4の面 70と同様である。  The contact portion 64 shown in FIG. 5 has a first surface 66, a second surface 72, a third surface 68, and a fourth surface 70, similarly to the contact portion 64 shown in FIG. The first surface 66, the second surface 72, the third surface 68, and the fourth surface 70 correspond to the first surface 66, the second surface 72, Similar to the third surface 68 and the fourth surface 70.

本例における接触部 64は、 図 5 (a) に示すように、 第 3の面 68の頂点と第 1の面 66の頂点とを結ぶ稜線 74を更に有する。 稜線 74は、 第 3の面 6 8の頂 点のうち、 第 2の面 7 2と共有していない頂点と、 第 1の面 66の頂点とを結ぶ。 接触部 64は、稜線 74において接続端子 56 (図 2参照) と接触する。 このため、 従来と比べ接触部 64と接続端子 5 6との接触面積を低減でき、 また、 容易にスク ラブすることができる。  As shown in FIG. 5 (a), the contact portion 64 in this example further has a ridge line 74 connecting the vertex of the third surface 68 and the vertex of the first surface 66. The ridge 74 connects a vertex of the third surface 68 that is not shared with the second surface 72 and a vertex of the first surface 66. The contact portion 64 comes into contact with the connection terminal 56 (see FIG. 2) at the ridge line 74. For this reason, the contact area between the contact portion 64 and the connection terminal 56 can be reduced as compared with the related art, and the scrub can be easily performed.

図 6は、 本発明に係るプローブピン製造方法の一例を説明する。 本例では、 プロ ープピンの接触部を製造する方法について説明する。 まず、 図 6 (a) に示すよう に、 表面が { 1 00} 面であるシリコン基板 200を用意する。 また、 図 6 (a) に示したシリコン基板 200の断面図を図 6 (b)に示す。ここで、 { 1 00}面は、 ミラー指数で表される面であって、 (1 00) 面と対称性を有する全ての面を含む。 次に、エッチング用マスク形成段階で、シリコン基板 200の表面に、四辺が〈1 00〉 方向である矩形状の開口部 2 1 0を有するエッチング用マスク 202を形成 する。 エッチング用マスク 202は、 シリコン酸化膜であってよい。 当該エツチン グ用マスク形成段階は、 熱酸化によって、 エッチング用マスク 202を形成してよ レ、。 ここで、 〈1 0 0〉 方向は、 ミラー指数で表される方向であって、 [1 00] 方 向と対称性を有する全ての方向を含む。 次に、 図 6 (c) に示すように、 エッチング段階で、 開口部 2 1 0から異方性ゥ エツトエッチングにより、 シリコン基板 200に、 シリコン基板 200の表面と略 平行である底面 2 1 2を有する溝部 204を形成する。 本例において、 エッチング 段階は、 溝部 204の開口部 2 14の面積より小さい面積の底面 2 1 2を有する溝 部 204を形成する。 FIG. 6 illustrates an example of the probe pin manufacturing method according to the present invention. In this example, a method of manufacturing a contact portion of a prop pin will be described. First, as shown in FIG. 6A, a silicon substrate 200 having a {100} surface is prepared. FIG. 6B is a cross-sectional view of the silicon substrate 200 shown in FIG. Here, the {100} plane is a plane represented by the Miller index, and includes all the planes having symmetry with the (100) plane. Next, in an etching mask formation step, an etching mask 202 having a rectangular opening 210 having four sides in the <100> direction is formed on the surface of the silicon substrate 200. The etching mask 202 may be a silicon oxide film. In the step of forming the etching mask, the etching mask 202 is formed by thermal oxidation. Here, the <100> direction is a direction represented by the Miller index, and includes all directions having symmetry with the [100] direction. Next, as shown in FIG. 6 (c), in the etching step, the bottom surface 2 1 2 which is substantially parallel to the surface of the silicon Is formed. In this example, the etching step forms a trench 204 having a bottom surface 212 having an area smaller than the area of the opening 214 of the trench 204.

図 6 (c) の断面図で示した溝部 204の上面図を、 図 6 (c) の右図に示す。 図 6 ( c ) における溝部 204の形状は、 図 4において説明した接触部 64の形状 と同一である。溝部 204の側面には、異方性ゥエツトエッチングにより、 { 1 00} 面と、 { 1 1 1 }面とが形成される。 溝部 204の { 1 00} 面は、 図 4において説 明した接触部 64の第 3の面 6 8に対応する。また、溝部 204の { 1 1 1 }面は、 図 4において説明した接触部 64の第 4の面 70に対応する。  A top view of the groove 204 shown in the sectional view of FIG. 6C is shown in the right view of FIG. 6C. The shape of the groove portion 204 in FIG. 6C is the same as the shape of the contact portion 64 described in FIG. A {100} plane and a {111} plane are formed on the side surfaces of the groove 204 by anisotropic jet etching. The {100} face of the groove 204 corresponds to the third face 68 of the contact portion 64 described in FIG. Further, the {111} surface of the groove 204 corresponds to the fourth surface 70 of the contact portion 64 described in FIG.

シリコン基板の異方性ゥヱットエッチングにおいては、 〈1 00〉 方向に比べ、 〈1 1 1〉 方向は浸食されにくい。 そのため、 異方性ゥヱットエッチングを行うに 従って、 { 1 1 1 } 面の、 { 1 00} 面に対する面積比は徐々に大きくなる。 そのた め、 図 6 (c) に示した溝部 204を更に異方性ウエットエッチングした場合、 溝 部 204の形状は、 図 3において説明した接触部 64の形状と同一となる。 また、 図 3において説明した接触部 64の形状と同一形状の溝部 204を更に異方性ゥェ ットエッチングした場合を、 図 6 (d) に示す。  In anisotropic wet etching of a silicon substrate, the <111> direction is less likely to be eroded than the <100> direction. Therefore, as the anisotropic wet etching is performed, the area ratio of the {111} plane to the {100} plane gradually increases. Therefore, when the groove 204 shown in FIG. 6C is further anisotropically wet-etched, the shape of the groove 204 becomes the same as the shape of the contact portion 64 described in FIG. FIG. 6D shows a case where the groove 204 having the same shape as the contact portion 64 described in FIG. 3 is further subjected to anisotropic wet etching.

図 6 (d) における溝部 204の形状は、 図 5において説明した接触部 64の形 状と同一形状である。 溝部 204には稜線 2 1 6が形成される。 稜線 2 1 6は、 図 5において説明した接触部 64の稜線 74に対応し、 〈1 1 0〉 方向である。  The shape of the groove portion 204 in FIG. 6D is the same as the shape of the contact portion 64 described in FIG. A ridgeline 2 16 is formed in the groove 204. The ridge line 2 16 corresponds to the ridge line 74 of the contact portion 64 described in FIG. 5 and is in the <1 110> direction.

次に、 図 6 (e) に示すように、 エッチング用マスクを除去する。 次に、 充填段 階で、 溝部 204に導電材料 2 1 8を充填する。 当該段階では、 溝部 204に導電 材料 2 1 8を充填する前に、 溝部 204に導電材料 2 1 8を充填するためのマスク を形成する段階を有してよい。 この場合、 溝部 204に導電材料 2 1 8を充填した 後に、当該マスクを除去する段階を更に有する。また、当該マスクを除去した後に、 シリコン基板 200の表面を研磨する段階を更に有してよい。 次に、 図 6 ( f ) に示すように、 シリコン基板 2 0◦を除去し、 プローブピンの 接触部を生成する。 以上説明したプローブピン製造方法によれば、 本発明に係るプ ローブピンの接触部を容易に製造することができる。 また、 エッチング時間等のェ ツチング条件を制御することにより、 図 3力 ら図 5において説明した接触部 6 4の うち、 所望の接触部 6 4を容易に製造することができる。 また、 図 3において説明 した弾性部 6 2を準備する段階と、 本例において製造した接触部と弾性部 6 2とを 接着する段階とを更に備えてよい。 Next, as shown in FIG. 6E, the etching mask is removed. Next, in the filling step, the groove 204 is filled with the conductive material 218. This step may include the step of forming a mask for filling the groove 204 with the conductive material 218 before filling the groove 204 with the conductive material 218. In this case, the method further includes a step of removing the mask after filling the groove 204 with the conductive material 218. Further, the method may further include a step of polishing the surface of the silicon substrate 200 after removing the mask. Next, as shown in FIG. 6 (f), the silicon substrate 20 ° is removed to form a contact portion of the probe pin. According to the probe pin manufacturing method described above, the probe pin contact portion according to the present invention can be easily manufactured. In addition, by controlling the etching conditions such as the etching time, a desired contact portion 64 among the contact portions 64 described in FIGS. 3 to 5 can be easily manufactured. Further, the method may further include a step of preparing the elastic portion 62 described in FIG. 3 and a step of bonding the contact portion and the elastic portion 62 manufactured in this example.

図 7は、 本発明に係るプローブピン製造方法の他の例を説明する。 本例における 製造方法は、図 6において説明したプローブピン製造方法の図 6 ( a )から図 6 ( e ) に関連して説明した段階を有する。 本例においては、 図 6 ( e ) において説明した 段階の次に、 図 7 ( a ) に示すように、 シリコン基板 2 0 0の表面に、 所望の形状 の弾性部を形成するためのマスク 2 0 8を形成する段階を更に有する。 マスク 2 0 8は、 長方形の開口部を有するマスクであってよい。  FIG. 7 illustrates another example of the probe pin manufacturing method according to the present invention. The manufacturing method in this example has the steps described with reference to FIGS. 6A to 6E of the probe pin manufacturing method described in FIG. In this example, after the step described with reference to FIG. 6 (e), as shown in FIG. 7 (a), a mask 2 for forming an elastic portion having a desired shape on the surface of the silicon substrate 200. There is further the step of forming 08. The mask 208 may be a mask having a rectangular opening.

次に、 図 7 ( b ) に示すように、 シリコン基板 2 0 0の表面に、 導電†生材料 2 2 0を形成する。 導電性材料 2 2 0は、 メッキ法ゃ蒸着法等により、 シリコン基板 2 0 0の表面に形成されてよい。  Next, as shown in FIG. 7B, a conductive regenerated material 220 is formed on the surface of the silicon substrate 200. The conductive material 220 may be formed on the surface of the silicon substrate 200 by plating or evaporation.

次に、 図 7 ( c ) に示すように、 シリコン基板 2 0 0及びマスク 2 0 8を除去す る。 シリコン基板 2 0 0及びマスク 2 0 8を除去することにより、 プローブピンを 得ることができる。  Next, as shown in FIG. 7 (c), the silicon substrate 200 and the mask 208 are removed. By removing the silicon substrate 200 and the mask 208, a probe pin can be obtained.

以上説明したプローブピン製造方法によれば、 図 3から図 5に関連して説明した プローブピンを容易に製造することができる。  According to the probe pin manufacturing method described above, the probe pins described with reference to FIGS. 3 to 5 can be easily manufactured.

以上、 本発明を実施の形態を用いて説明したが、 本発明の技術的範囲は上記実施 の形態に記載の範囲には限定されない。 上記実施の形態に、 多様な変更又は改良を 加えることが可能であることが当業者に明らかである。 その様な変更又は改良を加 えた形態も本発明の技術的範囲に含まれ得ることが、 請求の範囲の記載から明らか である。 産業上の利用可能性 As described above, the present invention has been described using the embodiment, but the technical scope of the present invention is not limited to the scope described in the above embodiment. It is apparent to those skilled in the art that various changes or improvements can be added to the above embodiment. It is apparent from the description of the appended claims that embodiments with such modifications or improvements can be included in the technical scope of the present invention. Industrial applicability

上記説明から明らかなように、本発明に係るプローブピン、及ぴプロープカー ドによれば、電子デバイスの接続端子に対して良好な接触特性を得ることができ る。 また、試験装置においては、 電子デバイスと良好な接触特性が得られるため 、精度よく電子デバイスの試験を行うことができる。 また、本発明に係るプロ一 プピン製造方法によれば、電子デバイスの接続端子に対して良好な接触特性を得 ることができるプローブピンを容易に製造することができる。  As is clear from the above description, according to the probe pin and the probe card according to the present invention, good contact characteristics can be obtained with respect to the connection terminal of the electronic device. In the test apparatus, since good contact characteristics with the electronic device can be obtained, the test of the electronic device can be performed with high accuracy. Further, according to the method of manufacturing a probe pin according to the present invention, it is possible to easily manufacture a probe pin capable of obtaining good contact characteristics with a connection terminal of an electronic device.

Claims

請 求 の 範 囲 The scope of the claims 1 . 電子部品に接触することにより、 前記電子部品に信号を供給するプローブピ ンであって、 1. A probe pin for supplying a signal to the electronic component by contacting the electronic component, 第 1の面と、 前記第 1の面と略平行であって、 前記第 1の面より面積の大きい第 2の面とを有し、 前記電子部品と接触する接触部と、  A first surface; a second surface that is substantially parallel to the first surface and has a larger area than the first surface; and a contact portion that contacts the electronic component; 前記接触部が設けられた弾性部と  An elastic portion provided with the contact portion; を備えることを特徴とするプローブピン。 A probe pin comprising: 2 . 前記接触部は、 前記第 1の面と略垂直な第 3の面を更に有することを特徴と する請求項 1に記載のプローブピン。  2. The probe pin according to claim 1, wherein the contact portion further has a third surface substantially perpendicular to the first surface. 3 . 前記接触部は、 前記第 3の面を 4面有することを特徴とする請求項 2に記載 のプローブピン。  3. The probe pin according to claim 2, wherein the contact portion has four surfaces of the third surface. 4 . 前記第 1の面は、 四角形状であり、  4. The first surface has a square shape, 前記第 2の面は五角形以上の多角^状であることを特徴とする請求項 3に記載の プローブピン。  The probe pin according to claim 3, wherein the second surface has a polygonal shape of a pentagon or more. 5 . 前記第 2の面は八角形状であることを特徴とする請求項 4に記載のプローブ ピン。  5. The probe pin according to claim 4, wherein the second surface has an octagonal shape. 6 . 前記接触部は、 前記第 1の面に対する角度が、 前記第 3の面の前記第 1の面 に対する角度と異なる第 4の面を更に有することを特徴とする請求項 5に記載のプ ロープピン。  6. The plug according to claim 5, wherein the contact portion further has a fourth surface having an angle with respect to the first surface different from an angle of the third surface with respect to the first surface. Rope pin. 7 . 前記接触部は、 前記第 4の面を 4面有することを特徴とする請求項 6に記載 のプローブピン。  7. The probe pin according to claim 6, wherein the contact portion has four surfaces of the fourth surface. 8 . 前記接触部と前記弾性部とは同一の材料により形成されることを特徴とする 請求項 1から 7のいずれかに記載のプローブピン。  8. The probe pin according to claim 1, wherein the contact portion and the elastic portion are formed of the same material. 9 . 電子部品に接触することにより、 前記電子部品に信号を供給するプローブピ ンであって、 9. A probe pin for supplying a signal to the electronic component by contacting the electronic component, 前記電子部品と接触し、 第 1の面と前記第 1の面と略垂直な第 2の面とを有する 接触部と、 A first surface which is in contact with the electronic component and has a second surface substantially perpendicular to the first surface; A contact part, 前記接触部が設けられた弾性部と  An elastic portion provided with the contact portion; を備えることを特 = [敷とするプローブピン。 Special feature = [Probe pin to be laid. 1 0 . 電子デバイスに設けられた複数の接続端子と電気的に接続し、 前記電子デ バイスに信号を供給するためのプローブカードであって、  10. A probe card which is electrically connected to a plurality of connection terminals provided on an electronic device and supplies a signal to the electronic device, 基板と、  Board and 前記基板に設けられ、 前記電子デバィスの前記接続端子と電気的に接続する複数 のプローブピンと、  A plurality of probe pins provided on the substrate and electrically connected to the connection terminals of the electronic device; 前記複数のプローブピンと電気的に接続された伝送線路と  A transmission line electrically connected to the plurality of probe pins; を備え、 With 前記プローブピンは、  The probe pin is 前記接続端子と接触し、 第 1の面と前記第 1の面と略平行な第 2の面とを有する 接触部と、  A contact portion that contacts the connection terminal and has a first surface and a second surface substantially parallel to the first surface; 前記接触部が設けられた弾性部と  An elastic portion provided with the contact portion; を有することを特徴とするプローブカード。 A probe card, comprising: 1 1 . 電子デパイスに設けられた複数の接続端子と電気的に接続し、 前記電子デ バイスに信号を供給するためのプローブカードであって、  11. A probe card electrically connected to a plurality of connection terminals provided on an electronic device to supply signals to the electronic device, 基板と、  Board and 前記基板に設けられ、 前記電子デパイスの前記接続端子と電気的に接続する複数 のプローブピンと、  A plurality of probe pins provided on the substrate and electrically connected to the connection terminals of the electronic device; 前記複数のプローブピンと電気的に接続された伝送線路と  A transmission line electrically connected to the plurality of probe pins; を備え、 With 前記プローブピンは、  The probe pin is 前記接続端子と接触し、 第 1の面と前記第 1の面と略垂直な第 2の面とを有する 接触部と、  A contact portion that contacts the connection terminal and has a first surface and a second surface substantially perpendicular to the first surface; 前記接触部が設けられた弹性部と  An elastic part provided with the contact part; を有することを特徴とするプローブカード。 A probe card, comprising: 1 2 . 電子デバイスを試験するための試験装置であって、 1 2. A test apparatus for testing an electronic device, .前記電子デバィスを試験するための試験信号を発生するパターン発生部と、 前記パタ一ン発生部が発生する前記試験信号の波形を整形する波形整形器と、 前記波形整形器によつて整形された前記試験信号を、前記電子デバィスに供給し、 前記電子デバイスから出力される出力信号を受け取るプローブカードと、  A pattern generator for generating a test signal for testing the electronic device; a waveform shaper for shaping the waveform of the test signal generated by the pattern generator; A probe card that supplies the test signal to the electronic device and receives an output signal output from the electronic device; 前記電子デバイスが前記試験信号に基づいて出力した前記出力信号に基づいて、 前記電子デバィスの良否を判定する判定部と  A determination unit configured to determine whether the electronic device is acceptable based on the output signal output by the electronic device based on the test signal; を備え、 With 前記プローブカードは、  The probe card, 基板と、 '  Board and the ' 前記基板に設けられ、 前記電子デパイスの接続端子と電気的に接続する複数のプ ロープピンと、  A plurality of probe pins provided on the substrate and electrically connected to connection terminals of the electronic device; 前記複数のプローブピンと電気的に接続された伝送線路と  A transmission line electrically connected to the plurality of probe pins; を備え、 With 前記プローブピンは、 ' 前記接続端子と接触し、 第 1の面と前記第 1の面と略平行な第 2の面とを有する 接触部と、  A contact portion having a first surface and a second surface substantially parallel to the first surface, the contact portion being in contact with the connection terminal; 前記接触部が設けられた弾性部と  An elastic portion provided with the contact portion; を含むことを特 =ί敷とする試験装置。 A test device that specially includes: 1 3 . 電子デバイスを試験するための試験装置であって、 1 3. A test apparatus for testing an electronic device, 前記電子デバィス .を試験するための試験信号を発生するパターン発生部と、 前記パタ一ン発生部が発生する前記試験信号の波形を整形する波形整形器と、 前記波形整形器によつて整形された前記試験信号を、前記電子デバィスに供給し、 前記電子デバィスから出力される出力信号を受け取るプローブカードと、  A pattern generator for generating a test signal for testing the electronic device, a waveform shaper for shaping the waveform of the test signal generated by the pattern generator, and a waveform shaper. A probe card for supplying the test signal to the electronic device and receiving an output signal output from the electronic device; 前記電子デバイスが前記試験信号に基づいて出力した前記出力信号に基づいて、 前記電子デパイスの良否を判定する判定部と  Based on the output signal that the electronic device has output based on the test signal, a determination unit that determines the quality of the electronic device. を備え、 前記プローブカードは、 With The probe card, 基板と、  Board and 前記基板に設けられ、 前記電子デバィスの接続端子と電気的に接続する複数のプ ローブピンと、  A plurality of probe pins provided on the substrate and electrically connected to connection terminals of the electronic device; 前記複数のプローブピンと電気的に接続された伝送線路と  A transmission line electrically connected to the plurality of probe pins; を備 、 , 前記プローブピンは、  The probe pin is 前記接続端子と接触し、 第 1の面と前記第 1の面と略垂直な第 2の面とを有する 接触部と、  A contact portion that contacts the connection terminal and has a first surface and a second surface substantially perpendicular to the first surface; 前記接触部が設けられた弾性部と  An elastic portion provided with the contact portion; を有することを特徴とする試験装置。 A test apparatus comprising: 1 4 . 電子部品に信号を供給するプローブピンを製造するためのプローブピン製 造方法であって、  14. A probe pin manufacturing method for manufacturing a probe pin for supplying a signal to an electronic component, シリコン基板を用意する基板準備段階と、  A substrate preparation stage for preparing a silicon substrate, 異方性ゥヱットエッチングにより、 前記シリコン基板の表面に、 前記シリコン基 板の前記表面と略平行であって、 開口部より面積の小さい底面を有する溝部を形成 するエッチング段階と、  An etching step of forming a groove having a bottom surface that is substantially parallel to the surface of the silicon substrate and has a smaller area than the opening, on the surface of the silicon substrate by anisotropic wet etching; 前記溝部に導電材料を充填する充填段階と、  A filling step of filling the groove with a conductive material, 前記シリコン基板を除去する段階と  Removing the silicon substrate; を備えることを特徴とするプローブピン製造方法。 A method of manufacturing a probe pin, comprising: 1 5 . 前記基板準備段階は、 表面が { 1 0 0 } 面であるシリコン基板を用意し、 前記プローブピン製造方法は、  15. In the substrate preparing step, a silicon substrate having a {100} surface is prepared. 前記エッチング段階の前に、 前記シリコン基板の前記表面に、 四辺が 〈1 0 0〉 方向である矩形状の開口部を有するエッチング用マスクを形成するエッチングマス ク形成段階と、  Before the etching step, an etching mask forming step of forming an etching mask having a rectangular opening having four sides in the <100> direction on the surface of the silicon substrate; 前記ェッチング段階の後に、 前記ェツチング用マスクを除去するマスク除去段階 と を更に備え、 A mask removing step of removing the etching mask after the etching step; Further comprising 前記エッチング段階は、 前記エッチング用マスクの開口部から、 前記シリコン基 板をエッチングすることを特徴とする請求項 1 4に記載のプローブピン製造方法。  15. The method according to claim 14, wherein in the etching step, the silicon substrate is etched from an opening of the etching mask. 1 6 . 前記ェツチング段階は、 前記シリコン基板に、 前記シリコン基板の前記 表面と略垂直な面を更に有する溝部を形成することを特徴とする請求項 1 5に 記載のプロ一ブピン製造方法。 16. The probe pin manufacturing method according to claim 15, wherein in the etching step, a groove having a surface substantially perpendicular to the surface of the silicon substrate is further formed in the silicon substrate.
PCT/JP2002/010517 2001-10-12 2002-10-10 Probe pin, probe card, test apparatus, and method of manufacturing probe pin Ceased WO2003034078A1 (en)

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