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WO2003032351A3 - Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees - Google Patents

Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees Download PDF

Info

Publication number
WO2003032351A3
WO2003032351A3 PCT/IB2002/005792 IB0205792W WO03032351A3 WO 2003032351 A3 WO2003032351 A3 WO 2003032351A3 IB 0205792 W IB0205792 W IB 0205792W WO 03032351 A3 WO03032351 A3 WO 03032351A3
Authority
WO
WIPO (PCT)
Prior art keywords
aligning
charged particle
particle beam
beam column
stigmator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2002/005792
Other languages
English (en)
Other versions
WO2003032351A2 (fr
Inventor
Asher Pearl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Israel Ltd
Original Assignee
Applied Materials Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP02016839A external-priority patent/EP1302971B1/fr
Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Priority to JP2003535224A priority Critical patent/JP3959063B2/ja
Priority to US10/492,257 priority patent/US7335893B2/en
Priority to AU2002358245A priority patent/AU2002358245A1/en
Publication of WO2003032351A2 publication Critical patent/WO2003032351A2/fr
Publication of WO2003032351A3 publication Critical patent/WO2003032351A3/fr
Anticipated expiration legal-status Critical
Priority to US11/689,870 priority patent/US7385205B2/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

L'invention concerne un procédé d'alignement automatique pour faisceau de particules chargées qui présente une ouverture. Ce procédé consiste à introduire une défocalisation, puis à appliquer à un déviateur un signal calculé sur la base d'un décalage d'image. L'invention concerne également un procédé de correction d'astigmatisme, qui consiste à évaluer la netteté pour une série d'images produites tout en faisant varier les signaux fournis à un stigmateur.
PCT/IB2002/005792 2001-10-10 2002-10-04 Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees Ceased WO2003032351A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003535224A JP3959063B2 (ja) 2001-10-10 2002-10-04 荷電粒子ビームカラムのアライメント方法および装置
US10/492,257 US7335893B2 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column
AU2002358245A AU2002358245A1 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column
US11/689,870 US7385205B2 (en) 2001-10-10 2007-03-22 Method and device for aligning a charged particle beam column

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US32845201P 2001-10-10 2001-10-10
US60/328,452 2001-10-10
EP02016839.9 2002-07-29
EP02016839A EP1302971B1 (fr) 2001-10-10 2002-07-29 Procédé et dispositif pour la génération automatique d'images adapté pour l'alignement d'une colonne à faisceau de particules chargées

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/689,870 Division US7385205B2 (en) 2001-10-10 2007-03-22 Method and device for aligning a charged particle beam column

Publications (2)

Publication Number Publication Date
WO2003032351A2 WO2003032351A2 (fr) 2003-04-17
WO2003032351A3 true WO2003032351A3 (fr) 2003-10-02

Family

ID=26077582

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2002/005792 Ceased WO2003032351A2 (fr) 2001-10-10 2002-10-04 Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees

Country Status (4)

Country Link
JP (1) JP3959063B2 (fr)
CN (1) CN100341106C (fr)
AU (1) AU2002358245A1 (fr)
WO (1) WO2003032351A2 (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4652830B2 (ja) * 2005-01-26 2011-03-16 キヤノン株式会社 収差調整方法、デバイス製造方法及び荷電粒子線露光装置
JP4708854B2 (ja) 2005-05-13 2011-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
EP1783811A3 (fr) 2005-11-02 2008-02-27 FEI Company Correcteur pour la correction d'aberrations chromatiques dans un appareil optique à particules
JP4538472B2 (ja) * 2007-03-15 2010-09-08 株式会社日立ハイテクノロジーズ 画像形成方法、及び電子顕微鏡
EP2091062A1 (fr) 2008-02-13 2009-08-19 FEI Company TEM avec correcteur d'aberrations et lame de phase
EP2131385A1 (fr) 2008-06-05 2009-12-09 FEI Company Plaque de phase hybride
EP2166557A1 (fr) * 2008-09-22 2010-03-24 FEI Company Procédé de correction de distorsions dans un appareil optique corpusculaire
EP2197018A1 (fr) 2008-12-12 2010-06-16 FEI Company Procédé pour déterminer les distorsions dans un appareil optique corpusculaire
EP2325862A1 (fr) 2009-11-18 2011-05-25 Fei Company Correcteur pour aberrations axiales d'une lentille à particules chargées
EP2511936B1 (fr) 2011-04-13 2013-10-02 Fei Company Correction d'astigmatisme sans distorsion d'un TEM
DE102012102608B4 (de) * 2012-03-27 2016-07-21 Aixacct Systems Gmbh Verfahren zur Ermittlung von Strahlparametern eines Ladungsträgerstrahls, Messeinrichtung sowie Ladungsträgerstrahlvorrichtung
CN103456590B (zh) * 2012-05-31 2016-08-24 睿励科学仪器（上海）有限公司 扫描电镜中具有多级机械对准机构的对准装置及其方法
US9589762B2 (en) * 2012-06-01 2017-03-07 Siemens Aktiengesellschaft Deflection plate and deflection device for deflecting charged particles
EP3016130A1 (fr) * 2014-10-28 2016-05-04 Fei Company Trajet de balayage composite dans un microscope à particules chargées
US10573489B2 (en) * 2016-01-29 2020-02-25 Hitachi High-Technologies Corporation Charged particle beam device and optical-axis adjusting method thereof
US10790114B2 (en) * 2017-06-29 2020-09-29 Kla-Tencor Corporation Scanning electron microscope objective lens calibration using X-Y voltages iteratively determined from images obtained using said voltages
JP6863208B2 (ja) * 2017-09-29 2021-04-21 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
EP3651182A1 (fr) * 2018-11-12 2020-05-13 FEI Company Microscope à particules chargées servant à l'examen d'un échantillon et procédé de détermination d'une aberration dudit microscope à particules chargées
US10923318B2 (en) * 2018-12-20 2021-02-16 Fei Company Optical alignment correction using convolutional neural network evaluation of a beam image
DE102019204575B3 (de) * 2019-04-01 2020-08-06 Carl Zeiss Smt Gmbh Verfahren, Vorrichtung und Computerprogramm zum Bestimmen einer Wellenfront eines massebehafteten Teilchenstrahls
JP7391735B2 (ja) * 2019-09-25 2023-12-05 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP7413105B2 (ja) * 2019-09-25 2024-01-15 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
DE102020211900A1 (de) * 2019-09-25 2021-03-25 Hitachi High-Tech Science Corporation Ladungsträgerstrahlvorrichtung
US11361951B2 (en) * 2019-10-03 2022-06-14 Kla Corporation System and method for photomultiplier tube image correction
US12237142B2 (en) * 2022-06-16 2025-02-25 Fei Company Methods for determining the virtual source location of a liquid metal ion source

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism
US4451737A (en) * 1981-06-24 1984-05-29 Hitachi, Ltd. Electron beam control device for electron microscopes
US5627373A (en) * 1996-06-17 1997-05-06 Hewlett-Packard Company Automatic electron beam alignment and astigmatism correction in scanning electron microscope

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism
US4451737A (en) * 1981-06-24 1984-05-29 Hitachi, Ltd. Electron beam control device for electron microscopes
US5627373A (en) * 1996-06-17 1997-05-06 Hewlett-Packard Company Automatic electron beam alignment and astigmatism correction in scanning electron microscope

Also Published As

Publication number Publication date
AU2002358245A1 (en) 2003-04-22
JP2005505899A (ja) 2005-02-24
JP3959063B2 (ja) 2007-08-15
WO2003032351A2 (fr) 2003-04-17
CN100341106C (zh) 2007-10-03
CN1589490A (zh) 2005-03-02

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