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WO2003017004A3 - Optische anordnung - Google Patents

Optische anordnung Download PDF

Info

Publication number
WO2003017004A3
WO2003017004A3 PCT/EP2002/008695 EP0208695W WO03017004A3 WO 2003017004 A3 WO2003017004 A3 WO 2003017004A3 EP 0208695 W EP0208695 W EP 0208695W WO 03017004 A3 WO03017004 A3 WO 03017004A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
correction beam
array
optical
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2002/008695
Other languages
English (en)
French (fr)
Other versions
WO2003017004A2 (de
Inventor
Markus Weiss
Ulrich Haag
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of WO2003017004A2 publication Critical patent/WO2003017004A2/de
Publication of WO2003017004A3 publication Critical patent/WO2003017004A3/de
Priority to US10/708,183 priority Critical patent/US6912077B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Eine optische Anordnung (1), insbesondere eine Projektionsbelichtungsanlage der Mikrolithographie, weist ein schlitzförmiges Bildfeld oder eine nicht rotationssymmetrische Beleuchtung (3) auf. Ferner umfasst sie mindestens ein optisches Element (4) und mindestens eine eine Korrekturstrahlungsquelle (6) umfassende Korrekturstrahlungseinrichtung (6 bis 13) die dem optischen Element (4) Korrekturstrahlung (5) derart zuführt, dass die Abbildungseigenschaften des optischen Elements (4) durch die Wärmebeaufschlagung des optischen Elements (4) mit Korrekturstrahlung (5) korrigert werden. Die Korrekturstrahlunseinrichtung (6 bis 13), umfasst eine Scaneinrichtung (8, 9, 10) mit mindestens einem Scanspiegel (8), wobei der Scanspiegel (8) derart bestrahlt und angesteuert ist, dass ein definierter Bereich einer optischen Oberfläche des optischen Elements (4) mit Korrekturstrahlung (5) abgescannt wird. Hierdurch lassen sich die Abbildungseigenschaften der optischen Anordnung (1) gezielt und flexibel korrigieren bzw. justieren.
PCT/EP2002/008695 2001-08-16 2002-08-05 Optische anordnung Ceased WO2003017004A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/708,183 US6912077B2 (en) 2001-08-16 2004-02-13 Optical system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10140208A DE10140208C2 (de) 2001-08-16 2001-08-16 Optische Anordnung
DE10140208.2 2001-08-16

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/708,183 Continuation US6912077B2 (en) 2001-08-16 2004-02-13 Optical system

Publications (2)

Publication Number Publication Date
WO2003017004A2 WO2003017004A2 (de) 2003-02-27
WO2003017004A3 true WO2003017004A3 (de) 2003-12-11

Family

ID=7695634

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008695 Ceased WO2003017004A2 (de) 2001-08-16 2002-08-05 Optische anordnung

Country Status (3)

Country Link
US (1) US6912077B2 (de)
DE (1) DE10140208C2 (de)
WO (1) WO2003017004A2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10301799B4 (de) * 2003-01-20 2005-08-11 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Verfahren zur Homogenisierung optischer Eigenschaften einer optischen Komponente
DE10317662A1 (de) * 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung
JP4378109B2 (ja) 2003-05-30 2009-12-02 キヤノン株式会社 露光装置、投影光学系、デバイスの製造方法
EP1670041A4 (de) * 2003-08-28 2007-10-17 Nikon Corp Belichtungsverfahren und -vorrichtung und bauelemente-herstellungsverfahren
US8111378B2 (en) 2004-02-13 2012-02-07 Nikon Corporation Exposure method and apparatus, and device production method
DE102004046542A1 (de) 2004-09-21 2006-03-23 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Einstellung optischer Abbildungseigenschaften durch Strahlungsbehandlung
US20080049202A1 (en) * 2006-08-22 2008-02-28 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography
DE102006039895A1 (de) * 2006-08-25 2008-03-13 Carl Zeiss Smt Ag Verfahren zur Korrektur von durch Intensitätsverteilungen in optischen Systemen erzeugten Abbildungsveränderungen sowie entsprechendes optisches System
JP5329520B2 (ja) 2007-03-27 2013-10-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 低角度で入射する補正光を用いる補正光学素子
DE102007032801A1 (de) * 2007-07-10 2009-01-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zum Projizieren elektromagnetischer Strahlung
EP2048540A1 (de) * 2007-10-09 2009-04-15 Carl Zeiss SMT AG Mikrolithographisches Projektionsbelichtungsgerät
WO2009152959A1 (en) 2008-06-17 2009-12-23 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element
EP2169464A1 (de) * 2008-09-29 2010-03-31 Carl Zeiss SMT AG Beleuchtungssystem eines mikrolithografischen Projektionsbelichtungsgerätes
DE102008049616B4 (de) * 2008-09-30 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen
DE102009029776B3 (de) * 2009-06-18 2010-12-02 Carl Zeiss Smt Ag Optisches Element
WO2011116792A1 (en) 2010-03-26 2011-09-29 Carl Zeiss Smt Gmbh Optical system, exposure apparatus, and waverfront correction method
DE102010041298A1 (de) 2010-09-24 2012-03-29 Carl Zeiss Smt Gmbh EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle
NL2007498A (en) 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
WO2012123000A1 (en) 2011-03-15 2012-09-20 Carl Zeiss Smt Gmbh Method of operating a microlithographic projection exposure apparatus
DE102011113521A1 (de) * 2011-09-15 2013-01-03 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage
WO2013041134A1 (en) 2011-09-21 2013-03-28 Carl Zeiss Smt Gmbh Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus
KR101693950B1 (ko) 2011-09-29 2017-01-06 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피 투영 노광 장치의 투영 대물 렌즈
DE102011088740A1 (de) 2011-12-15 2013-01-17 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Manipulieren des thermischen Zustandes eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102022114974A1 (de) 2022-06-14 2023-12-14 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements sowie optisches System

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02185016A (ja) * 1989-01-12 1990-07-19 Nikon Corp 投影光学装置
EP0678768A2 (de) * 1994-04-22 1995-10-25 Canon Kabushiki Kaisha Projektionsbelichtungsgerät und Herstellungsverfahren für eine Mikrovorrichtung
JPH0982599A (ja) * 1995-09-11 1997-03-28 Nikon Corp 投影露光装置
EP0823662A2 (de) * 1996-08-07 1998-02-11 Nikon Corporation Projektionsbelichtungsapparat
US20020000507A1 (en) * 2000-06-19 2002-01-03 Leica Microsystems Heidelberg Gmbh Method, apparatus and scanning microscope with means for stabilizing the temperature of optical components

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3548464B2 (ja) * 1999-09-01 2004-07-28 キヤノン株式会社 露光方法及び走査型露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02185016A (ja) * 1989-01-12 1990-07-19 Nikon Corp 投影光学装置
EP0678768A2 (de) * 1994-04-22 1995-10-25 Canon Kabushiki Kaisha Projektionsbelichtungsgerät und Herstellungsverfahren für eine Mikrovorrichtung
JPH0982599A (ja) * 1995-09-11 1997-03-28 Nikon Corp 投影露光装置
EP0823662A2 (de) * 1996-08-07 1998-02-11 Nikon Corporation Projektionsbelichtungsapparat
US20020000507A1 (en) * 2000-06-19 2002-01-03 Leica Microsystems Heidelberg Gmbh Method, apparatus and scanning microscope with means for stabilizing the temperature of optical components

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 014, no. 457 (E - 0986) 2 October 1990 (1990-10-02) *
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31) *

Also Published As

Publication number Publication date
US6912077B2 (en) 2005-06-28
DE10140208C2 (de) 2003-11-06
WO2003017004A2 (de) 2003-02-27
US20050018269A1 (en) 2005-01-27
DE10140208A1 (de) 2003-03-13

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