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WO2002033469A3 - Procede de fabrication d'une membrane de polysilicium erectrice - Google Patents

Procede de fabrication d'une membrane de polysilicium erectrice Download PDF

Info

Publication number
WO2002033469A3
WO2002033469A3 PCT/US2001/032513 US0132513W WO0233469A3 WO 2002033469 A3 WO2002033469 A3 WO 2002033469A3 US 0132513 W US0132513 W US 0132513W WO 0233469 A3 WO0233469 A3 WO 0233469A3
Authority
WO
WIPO (PCT)
Prior art keywords
membrane
layer
sacrificial layer
polysilicon
concavities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2001/032513
Other languages
English (en)
Other versions
WO2002033469A2 (fr
Inventor
Dale C Flanders
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Axsun Technologies LLC
Original Assignee
Axsun Technologies LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axsun Technologies LLC filed Critical Axsun Technologies LLC
Priority to AU2002225591A priority Critical patent/AU2002225591A1/en
Publication of WO2002033469A2 publication Critical patent/WO2002033469A2/fr
Publication of WO2002033469A3 publication Critical patent/WO2002033469A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

L'invention concerne un procédé de fabrication d'une membrane optique à partir de silicium polycristallin consistant en premier lieu à former une couche sacrificielle sur une tranche de poignée. On grave des concavités sur la couche sacrificielle. On forme ensuite la couche de membrane de silicium polycristallin sur ladite couche sacrificielle. La couche de membrane polycristalline est ensuite polie afin d'obtenir l'épaisseur de membrane prédéterminée et l'aspect lisse de la surface, annelée puis dotée d'un motif. Enfin, on retire la couche sacrificielle afin de libérer la membrane. Les concavités dans la couche sacrificielle produisent des convexités sur la couche de polysilicium afin d'empêcher le blocage par adhérence avec la tranche de poignée. Lors du traitement, on emploie un masque afin de concevoir les fonctions de couche de membrane pour protéger un revêtement hautement réfléchissant (HR) de la membrane.
PCT/US2001/032513 2000-10-19 2001-10-17 Procede de fabrication d'une membrane de polysilicium erectrice Ceased WO2002033469A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002225591A AU2002225591A1 (en) 2000-10-19 2001-10-17 Fabrication process for polysilicon deflectable membrane

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69263800A 2000-10-19 2000-10-19
US09/692,638 2000-10-19

Publications (2)

Publication Number Publication Date
WO2002033469A2 WO2002033469A2 (fr) 2002-04-25
WO2002033469A3 true WO2002033469A3 (fr) 2003-03-20

Family

ID=24781406

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/032513 Ceased WO2002033469A2 (fr) 2000-10-19 2001-10-17 Procede de fabrication d'une membrane de polysilicium erectrice

Country Status (2)

Country Link
AU (1) AU2002225591A1 (fr)
WO (1) WO2002033469A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI432788B (zh) 2008-01-16 2014-04-01 Omnivision Tech Inc 膜懸置光學元件與相關方法
US8885272B2 (en) 2011-05-03 2014-11-11 Omnivision Technologies, Inc. Flexible membrane and lens assembly and associated method of lens replication

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993021536A1 (fr) * 1992-04-22 1993-10-28 Analog Devices, Inc. Procede de fabrication de microstructures
US5774252A (en) * 1994-01-07 1998-06-30 Texas Instruments Incorporated Membrane device with recessed electrodes and method of making
DE19829609A1 (de) * 1998-07-02 2000-01-05 Bosch Gmbh Robert Verfahren zur Herstellung eines Mikrosystems sowie ein Mikrosystem
US6046840A (en) * 1995-06-19 2000-04-04 Reflectivity, Inc. Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements
WO2001077007A1 (fr) * 2000-04-10 2001-10-18 Onix Microsystems, Inc. Tampon de butee mecanique forme sur la face inferieure d'un dispositif mems

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993021536A1 (fr) * 1992-04-22 1993-10-28 Analog Devices, Inc. Procede de fabrication de microstructures
US5774252A (en) * 1994-01-07 1998-06-30 Texas Instruments Incorporated Membrane device with recessed electrodes and method of making
US6046840A (en) * 1995-06-19 2000-04-04 Reflectivity, Inc. Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements
DE19829609A1 (de) * 1998-07-02 2000-01-05 Bosch Gmbh Robert Verfahren zur Herstellung eines Mikrosystems sowie ein Mikrosystem
WO2001077007A1 (fr) * 2000-04-10 2001-10-18 Onix Microsystems, Inc. Tampon de butee mecanique forme sur la face inferieure d'un dispositif mems

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
ARATANI K ET AL: "SURFACE MICROMACHINED TUNEABLE INTERFEROMETER ARRAY", SENSORS AND ACTUATORS A, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, vol. A43, no. 1/3, 1 May 1994 (1994-05-01), pages 17 - 23, XP000454081, ISSN: 0924-4247 *
BIFANO T G ET AL: "CONTINUOUS-MEMBRANE SURFACE-MICROMACHINED SILICON DEFORMABLE MIRROR", OPTICAL ENGINEERING, SOC. OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS. BELLINGHAM, US, vol. 36, no. 5, 1 May 1997 (1997-05-01), pages 1354 - 1359, XP000692365, ISSN: 0091-3286 *
FISCHER M ET AL: "ELECTROSTATICALLY DEFLECTABLE POLYISILICON TORSIONAL MIRRORS", SENSORS AND ACTUATORS A, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, vol. A44, no. 1, 1 July 1994 (1994-07-01), pages 83 - 88, XP000469159, ISSN: 0924-4247 *

Also Published As

Publication number Publication date
WO2002033469A2 (fr) 2002-04-25
AU2002225591A1 (en) 2002-04-29

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