WO2002084303A1 - Device for measuring an acceleration and/or a yaw rate - Google Patents
Device for measuring an acceleration and/or a yaw rate Download PDFInfo
- Publication number
- WO2002084303A1 WO2002084303A1 PCT/DE2002/001021 DE0201021W WO02084303A1 WO 2002084303 A1 WO2002084303 A1 WO 2002084303A1 DE 0201021 W DE0201021 W DE 0201021W WO 02084303 A1 WO02084303 A1 WO 02084303A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- stop
- measuring body
- stop element
- substrate
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
- G01C19/5733—Structural details or topology
- G01C19/5755—Structural details or topology the devices having a single sensing mass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0242—Gyroscopes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/051—Translation according to an axis parallel to the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/056—Rotation in a plane parallel to the substrate
Definitions
- the invention relates to a device for measuring an acceleration and / or a rotation rate according to the preamble of claim 1.
- surfaces known as micromechanical sensors for detecting accelerations and rotation rates have, among other things, a seismic mass which is suspended as a sensor mass on spring elements. These spring elements hold the sensor mass in the central position in the idle state and enable the sensor mass to be deflected when acceleration or a rotation rate is present.
- the sensor mass comprises a plurality of electrode fingers which, together with electrode fingers of a counter electrode, form a capacitor.
- An electrical potential is present at the counter electrode, for example, which is different in relation to the remaining elements or structures.
- the inertia force that occurs due to an acceleration or rotation rate causes a displacement of the sensor mass, which is detected and evaluated via the change in the capacitance of the capacitor.
- the direction of movement and detection of the sensor mass is parallel to the substrate or surface plane of the sensor and transverse to the longitudinal direction of the electrode fingers.
- these sensors also have an overload stop, which, particularly in the case of large accelerations, prevents short circuits by touching the sensor mass with the counter electrode.
- the substrate includes the stop.
- micromechanical sensors cause lateral accelerations, i.e. Accelerations directed perpendicular to the surface of the sensor mass, lifting the sensor mass out of the surface plane. Even in this load case, the spring elements ensure that the sensor mass is returned to the rest position.
- the object of the invention is to propose a device for measuring an acceleration and / or a rotation rate with a substrate and a flat, flat measuring body arranged on at least one spring element, which significantly reduces the sensitivity to lateral accelerations, without being comparatively strong in production the device is intervened.
- a device is characterized in that at least in relation to the substrate and advantageously also to the measuring body partially movable stop element is provided to limit movement of the spring element and / or the measuring body.
- the stop element or a plurality of stop elements are at least partially movable both in a measuring plane and in a transverse direction arranged transversely thereto, the sensitivity to transverse accelerations can be decisively reduced without the manufacture of the device being affected comparatively strongly.
- the stop element can preferably be lifted or bent out of the measurement plane.
- the stop element at least in the case in which the measuring body and / or the spring element is lifted out completely above the measuring plane due to a comparatively strong transverse acceleration, can assume a bridging function between the measuring body and / or spring element and the substrate, at the same time by means of the stop element a striking of the measuring body and / or spring element on the substrate in the detection direction can be realized.
- the stop element can have two stops on the one hand for striking the substrate and also on the measuring body.
- the stop element is fixed at one end to the substrate and has only one stop for striking the measuring body.
- the stop element could preferably be bent out of the measuring plane with a correspondingly large lateral acceleration by means of a mass arranged on the stop, the stop element in particular being able to have a comparatively thin lever arm.
- the stop element on the measuring body is advantageous coupled so that the stop element is preferably movable at least in the transverse direction depending on the deflection of the measuring body.
- a deflection of the stop element is smaller than a deflection of the measuring body. This ensures that the measuring body in the detection direction can strike the stop element according to the invention and, if necessary, it can strike the substrate, even if the measuring body is raised completely in the transverse direction above the surface level of the substrate.
- the stop element is preferably arranged on the spring element, so that in particular the coupling of the stop element to the measuring body can be implemented with comparatively little effort.
- the stop element is arranged at least in the central region of the spring element.
- the coupling of the stop element to the measuring body can be realized in such a way that the deflection of the measuring body can take place in a ratio of almost 2: 1 to the deflection of the spring element.
- the stop element is raised by approximately half the deflection of the measuring body.
- the stop element is advantageously arranged in at least one area with a torsional moment of the spring element caused by the movement of the measuring body in the transverse direction. This advantageously makes the deflection of the stop element dependent on Deflection of the measuring body in the transverse direction can be realized, at the same time allowing the stop element to be rotated with respect to the measuring plane. In particular, by means of comparatively long arms of the stop element, the maximum permissible lateral acceleration of the device can optionally be increased due to its rotation.
- the latter arrangement of the stop element is advantageous not only in the case of an arrangement in the central region of the spring element.
- the stop element is designed to determine a maximum movement of the measuring body in the measuring plane, in particular in the detection direction. This advantageously essentially prevents a short circuit in the electrode fingers of the capacitor.
- a fixed stop according to the prior art can be omitted, as a result of which, above all, the design complexity of the device can be reduced and the corresponding possibility of hooking can be prevented.
- the stop element is preferably at least partially arranged between the measuring body and the substrate. This measure enables a particularly simple arrangement and thus design of the stop element as a fixing element for the maximum deflection of the measuring body in the detection direction.
- the spring element is folded several times. This ensures that, in particular, the detection range of the device can advantageously be expanded with respect to accelerations in the detection direction.
- the possibilities for arranging stop elements according to the invention on the spring element are significantly increased, in particular as a function of the dependence the number of folds. This preferably leads to an increase in flexibility in the design of the device according to the invention or in the arrangement of a plurality of stop elements.
- stop elements when using several stop elements, it is conceivable that a certain gradation of the stop elements in the transverse direction could be realized, that is to say that the stop elements have differently sized deflections or strokes in the transverse direction and thus, for example, the measuring body to a first stop element, this to a second, etc. until a last stop element strikes the substrate in the detection direction.
- the sensitivity of the device to lateral accelerations could possibly be increased significantly.
- the device is advantageously designed to be micromechanical, which in particular significantly increases the possible uses of the device according to the invention.
- This embodiment also improves the inclusion of the device according to the invention in micro-electro-mechanical systems.
- FIG. 1 shows a schematic top view of a device according to the invention
- Figure 2 is a schematic view of one further device according to the invention.
- FIG. 3 shows a schematic cross section of the device according to the invention according to FIG. 2.
- FIG. 1 shows a schematic top view of a sensor mass 1 which is held by springs 2a, b, c, d on an underlying substrate 3 or a border 3.
- the sensor mass 1 can be moved, in particular in a detection direction D.
- the sensor mass 1 has electrode fingers which, together with the electrode fingers of a counter electrode 4a, b, enable a measurement of a capacitance when different electrical potentials are present.
- the sensor mass 1 along the
- Moving detection direction D this changes the capacity of the device, which is detected and evaluated in particular by means of an evaluation unit, not shown in detail.
- FIG. 1 two immobile substrate stops or overload stops 5a, b are shown in FIG. 1, which in particular limit the maximum deflection of the sensor mass 1 in the detection direction D.
- This limitation of the design of the sensor mass 1 in the detection direction D is realized primarily by means of a stop bracket 6a or ⁇ b.
- the stop bracket ⁇ a, b performs a relative movement both with respect to the sensor mass 1 and the border 3 or the overload stop 5a, b through. This is made possible in particular by the fact that the
- Overload stop 5a, b is arranged on the springs 2a, d or 2b, c. Accordingly, the stop bracket 6a, b is coupled to the sensor mass 1, so that the movement of the stop bracket 6a, b takes place in dependence on the movement of the sensor mass 1.
- this coupling of the stop brackets 6a, b takes place both in a measuring plane which corresponds to the sheet plane of the drawing and in a transverse direction Q arranged transversely thereto in accordance with FIG. 1 or 2 in a direction Q directed out of the sheet plane.
- spring brackets 7a, b, c, d are arranged on the springs 2a, b, c, d, so that these, too, corresponding to the stop brackets 6a, b, relative to the sensor mass 1 or Move substrate 3.
- the spring clips 7a, b, c, d and the stop clips 6a, b are raised by about half the stroke of the sensor mass 1 in the transverse direction Q, so that neither the sensor mass 1 nor the springs 2a, b, c , d can rest on the border 3 or the substrate 3 or on the overload stops 5a, b, even if the sensor mass 1 is completely over the border 3 or the overload stops 5a, b, cf. in particular also FIG. 3.
- Figure 2 shows a further device according to the invention, wherein comparable elements are identified with corresponding reference numerals.
- the device according to FIG. 2 has no substrate stops or overload stops 5a, b on.
- the maximum deflection of the sensor mass 1 in the detection direction D is determined here by means of alternative and / or combined antenna-like external stops 8a, b, c, d and internal stops 9a, b, c, d.
- the outer stops 8a, b, c, d and inner stops 9a, b, c, d are preferably arranged at the points of the springs 2a, b, c, d with a comparatively large torsional moment when transverse accelerations are applied in the transverse direction Q.
- the outer stops 8a, b, c, d and inner stops 9a, b, c, d rise proportionally to the deflection of the sensor mass 1 out of the measuring plane and thereby prevent the sensor mass 1 or the springs 2a from getting caught.
- b, c, d the outer stops 8a, b, c, d and inner stops 9a, b, c, d.
- a sum of the distances between the substrate stop 5, the substrate 3 or the sensor mass 1 and the stop element 6, 7, 8, 9 is smaller than a distance between the electrode fingers of the sensor mass 1 and those of the counterelectrode 4, in order to prevent the electrode fingers from being short-circuited ,
- FIG. 3 shows a schematic cross section of the device according to FIG. 2, for example in the area of an inner stop 9 or outer stop 8.
- the antenna-shaped inner stop 9 or outer stop 8 By coupling the antenna-shaped inner stop 9 or outer stop 8 to the sensor mass 1, they are lifted out of the measurement plane somewhat less than the sensor mass 1 in the transverse direction Q and additionally rotated in a torsion direction T due to the torsional moment. If the acceleration in the detection direction D is comparatively strong, the sensor mass 1 strikes the substrate 3 or the border 3 by means of the inner stop 9 or the outer stop 8. If transverse acceleration is present at the same time, the sensor mass 1 or the spring 2 on the substrate 3 can be prevented from snagging according to the invention.
- the sensitivity of the device could also be achieved by increasing the spring stiffness, in particular in the direction of the lateral accelerations. For example, by thickening, reshaping or the like of the springs 2. As a result, the parameter range of the device, the manufacturing process or the like is usually also changed comparatively strongly, which may not have been desired in certain applications.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Pressure Sensors (AREA)
Abstract
Description
"Vorrichtung zur Messung einer Beschleunigung und/oder einer Drehrate""Device for measuring an acceleration and / or a rotation rate"
Die Erfindung betrifft eine Vorrichtung zur Messung einer Beschleunigung und/oder einer Drehrate nach dem Oberbegriff des Anspruchs 1.The invention relates to a device for measuring an acceleration and / or a rotation rate according to the preamble of claim 1.
Stand der TechnikState of the art
Bisher weisen sogenannte Oberflächen mikromechanische Sensoren zur Erfassung von Beschleunigungen und Drehraten unter anderem eine seismische Masse auf, die als Sensormasse an Federelementen aufgehängt ist. Diese Federelemente halten die Sensormasse im Ruhezustand in Mittellage und ermöglichen die Auslenkung der Sensormasse bei Anliegen einer Beschleunigung beziehungsweise einer Drehrate.So far, surfaces known as micromechanical sensors for detecting accelerations and rotation rates have, among other things, a seismic mass which is suspended as a sensor mass on spring elements. These spring elements hold the sensor mass in the central position in the idle state and enable the sensor mass to be deflected when acceleration or a rotation rate is present.
Entsprechende Sensoren werden mittels in derAppropriate sensors are in the
Halbleitertechnologie, insbesondere der Siliziumtechnologie, gebräuchlicher Verfahren hergestellt, wie z.B. lithografische und chemische Verfahren. Diese Sensoren weisen im Allgemeinen ebene, flache, oberflachenparallele Strukturen mit vergleichsweise kleinen Abmessungen im Mikrometerbereich auf.Semiconductor technology, in particular silicon technology, commonly used processes, such as lithographic and chemical processes. These sensors generally point flat, flat, surface-parallel structures with comparatively small dimensions in the micrometer range.
Die Sensormasse umfasst mehrere Elektrodenfinger, die zusammen mit Elektrodenfinger einer Gegenelektrode ein Kondensator bilden. An der Gegenelektrode liegt beispielsweise ein elektrisches Potential an, das m Bezug zu den restlichen Elementen beziehungsweise Strukturen verschieden ist. Die aufgrund einer Beschleunigung beziehungsweise Drehrate auftretende Tragheitskraft bewirkt eine Verschiebung der Sensormasse, die über die Änderung der Kapazitäten des Kondensators erfasst und ausgewertet wird.The sensor mass comprises a plurality of electrode fingers which, together with electrode fingers of a counter electrode, form a capacitor. An electrical potential is present at the counter electrode, for example, which is different in relation to the remaining elements or structures. The inertia force that occurs due to an acceleration or rotation rate causes a displacement of the sensor mass, which is detected and evaluated via the change in the capacitance of the capacitor.
Die Bewegungs- und Detektionsrichtung der Sensormasse liegt im Fall von sogenannten lateralen Sensoren parallel zur Substrat- beziehungsweise Oberflachenebene des Sensors und quer zur Längsrichtung der Ξlektrodenfinger .In the case of so-called lateral sensors, the direction of movement and detection of the sensor mass is parallel to the substrate or surface plane of the sensor and transverse to the longitudinal direction of the electrode fingers.
Im Allgemeinen weisen diese Sensoren auch einen Überlastanschlag auf, der, insbesondere bei großen Beschleunigungen, Kurzschlüsse durch Berührung der Sensormasse mit der Gegenelektrode verhindert. Das Substrat umfasst hierbei den Anschlag.In general, these sensors also have an overload stop, which, particularly in the case of large accelerations, prevents short circuits by touching the sensor mass with the counter electrode. The substrate includes the stop.
Bei diesen Oberflachen mikromechanischen Sensoren bewirken Querbeschleunigungen, d.h. senkrecht zur Oberflache der Sensormasse gerichtete Beschleunigungen, ein Herausheben der Sensormasse aus der Oberflachenebene. Die Federelemente gewahrleisten auch m diesem Belastungsfall, dass die Sensormasse wieder zurück in die Ruhelage gefuhrt wird.With these surfaces micromechanical sensors cause lateral accelerations, i.e. Accelerations directed perpendicular to the surface of the sensor mass, lifting the sensor mass out of the surface plane. Even in this load case, the spring elements ensure that the sensor mass is returned to the rest position.
Treten hohe Beschleunigungen m Detektionsrichtung zusammen mit hohen Querbeschleunigungen auf, so ist bei bisherigen Oberflachen mikromechanischen Sensoren nachteilig, dass insbesondere die Sensormasse sowie die Federelemente an Strukturen beziehungsweise Elemente des Substrates verhaken, wie z.B. an dem Uberlastanschlag, einer Umrandung oder einem festen Elektrodenfinger. Dies erfolgt im Allgemeinen dadurch, dass Abschnitte der Sensormasse beziehungsweise der Feder über deren Schichtdicke aus der Oberflächenebene herausgehoben und gleichzeitig vergleichsweise weit in Detektionsrichtung verschoben werden und somit auf z.B. dem Uberlastanschlag oder der Umrandung aufliegen beziehungsweise verhaken. Kommt die Sensormasse, deren Elektrodenfinger beziehungsweise die Feder auf dem Substrat bzw. dem Uberlastanschlag, der Umrandung oder dem festen Elektrodenfinger zum Liegen, so kann die Sensormasse nicht mehr durch die Federn in ihre Ruhelage zurückgezogen werden, wodurch der Sensor seine Funktion nicht mehr erfüllen kann.If high accelerations occur in the detection direction together with high transverse accelerations, then it has been disadvantageous in previous surfaces of micromechanical sensors that in particular the sensor mass and the spring elements get caught on structures or elements of the substrate. such as on the overload stop, a border or a fixed electrode finger. This generally takes place in that sections of the sensor mass or the spring are lifted out of the surface plane via their layer thickness and at the same time are displaced comparatively far in the detection direction and thus rest or get caught on, for example, the overload stop or the border. If the sensor mass, its electrode finger or the spring comes to rest on the substrate or the overload stop, the border or the fixed electrode finger, the sensor mass can no longer be pulled back into its rest position by the springs, as a result of which the sensor can no longer perform its function ,
Aufgabe und Vorteile der Erfindung:Object and advantages of the invention:
Aufgabe der Erfindung ist es demgegenüber, eine Vorrichtung zur Messung einer Beschleunigung und/oder einer Drehrate mit einem Substrat und einem an wenigstens einem Federelement angeordneten flachen, ebenen Messkörper vorzuschlagen, die die Empfindlichkeit gegenüber Querbeschleunigungen entscheidend reduziert, ohne dass hierbei vergleichsweise stark in die Fertigung der Vorrichtung eingegriffen wird.In contrast, the object of the invention is to propose a device for measuring an acceleration and / or a rotation rate with a substrate and a flat, flat measuring body arranged on at least one spring element, which significantly reduces the sensitivity to lateral accelerations, without being comparatively strong in production the device is intervened.
Diese Aufgabe wird, ausgehend von einer Vorrichtung der einleitend genannten Art, durch die kennzeichnenden Merkmale des Anspruchs 1 gelöst.Starting from a device of the type mentioned in the introduction, this object is achieved by the characterizing features of claim 1.
Durch die in den Unteransprüchen genannten Maßnahmen sind vorteilhafte Ausführungen und Weiterbildungen der Erfindung möglich.Advantageous designs and developments of the invention are possible through the measures mentioned in the subclaims.
Dementsprechend zeichnet sich eine erfindungsgemäße Vorrichtung dadurch aus, dass ein in Bezug auf das Substrat und in vorteilhafter Weise auch auf den Messkörper wenigstens teilweise bewegbares Anschlagelement zur Begrenzung einer Bewegung des Federelementes und/oder des Messkorpers vorgesehen ist.Accordingly, a device according to the invention is characterized in that at least in relation to the substrate and advantageously also to the measuring body partially movable stop element is provided to limit movement of the spring element and / or the measuring body.
Erfmdungsgemaß kann, insbesondere dadurch, dass das Anschlagelement oder mehrere Anschlagelemente sowohl m einer Messebene als auch in einer hierzu quer angeordneten Querrichtung wenigstens teilweise bewegbar ausgebildet sind, die Empfindlichkeit gegenüber Querbeschleunigungen entscheidend verringert werden, ohne dass vergleichsweise stark m die Fertigung der Vorrichtung eingegriffen wird.According to the invention, in particular in that the stop element or a plurality of stop elements are at least partially movable both in a measuring plane and in a transverse direction arranged transversely thereto, the sensitivity to transverse accelerations can be decisively reduced without the manufacture of the device being affected comparatively strongly.
Demgemass kann das Anschlagelement vorzugsweise aus der Messebene herausgehoben beziehungsweise herausgebogen werden. Hierdurch kann das Anschlagelement, zumindest in dem Fall, bei dem der Messkorper und/oder das Federelement aufgrund einer vergleichsweise starken Querbeschleunigung vollständig über der Messebene herausgehoben wird, eine Bruckenfunktion zwischen dem Messkorper und/oder Federelement sowie dem Substrat einnehmen, wobei gleichzeitig mittels dem Anschlagelement ein Anschlagen des Messkorpers und/oder Federelements am Substrat in Detektionsrichtung realisierbar ist .Accordingly, the stop element can preferably be lifted or bent out of the measurement plane. As a result, the stop element, at least in the case in which the measuring body and / or the spring element is lifted out completely above the measuring plane due to a comparatively strong transverse acceleration, can assume a bridging function between the measuring body and / or spring element and the substrate, at the same time by means of the stop element a striking of the measuring body and / or spring element on the substrate in the detection direction can be realized.
Gemäß der Erfindung kann das Anschlagelement einerseits zwei Anschlage zum Anschlagen am Substrat als auch am Messkorper aufweisen. Andererseits ist auch denkbar, dass das Anschlagelement an einem Ende am Substrat fixiert ist und lediglich ein Anschlag zum Anschlagen am Messkorper aufweist. Im letztgenannten Fall konnte vorzugsweise mittels einer am Anschlag angeordneten Masse das Anschlagelement bei entsprechend großer Querbeschleunigung aus der Messebene herausgebogen werden, wobei das Anschlagelement insbesondere einen vergleichsweise dünnen Hebelarm aufweisen konnte.According to the invention, the stop element can have two stops on the one hand for striking the substrate and also on the measuring body. On the other hand, it is also conceivable that the stop element is fixed at one end to the substrate and has only one stop for striking the measuring body. In the latter case, the stop element could preferably be bent out of the measuring plane with a correspondingly large lateral acceleration by means of a mass arranged on the stop, the stop element in particular being able to have a comparatively thin lever arm.
Vorteilhafterweise ist das Anschlagelement an den Messkorper gekoppelt, so dass das Anschlagelement vorzugsweise in Abhängigkeit der Auslenkung des Messkorpers wenigstens m Querrichtung bewegbar ist.The stop element on the measuring body is advantageous coupled so that the stop element is preferably movable at least in the transverse direction depending on the deflection of the measuring body.
In vorteilhafter Weise ist eine Auslenk ng des Anschlagelements kleiner als eine Auslenkung des Messkorpers. Hierdurch wird gewährleistet, dass der Messkorper m Detektionsrichtung am erfmdungsgemaßen Anschlagelement und dieses gegebenenfalls am Substrat anschlagen kann, auch wenn der Messkorper m Querrichtung vollständig über das Oberflachenniveau des Substrates herausgehoben wird.Advantageously, a deflection of the stop element is smaller than a deflection of the measuring body. This ensures that the measuring body in the detection direction can strike the stop element according to the invention and, if necessary, it can strike the substrate, even if the measuring body is raised completely in the transverse direction above the surface level of the substrate.
Vorzugsweise ist das Anschlagelement am Federelement angeordnet, so dass insbesondere die Kopplung des Anschlagelements an den Messkorper mit vergleichsweise geringem Aufwand realisiert werden kann.The stop element is preferably arranged on the spring element, so that in particular the coupling of the stop element to the measuring body can be implemented with comparatively little effort.
In einer besonderen Weiterbildung der Erfindung ist das Anschlagelement wenigstens im mittleren Bereich des Federelementes angeordnet. Hierdurch wird die Kopplung des Anschlagelementes an den Messkorper m der Weise realisierbar, dass die Auslenkung des Messkorpers nahezu im Verhältnis 2:1 zur Auslenkung des Federelementes erfolgen kann. Das heißt, dass beim Herausheben des Messkorpers das Anschlagelement ungefähr um die Hälfte der Auslenkung des Messkorpers angehoben wird. Mit dieser Maßnahme wird die maximal zulassige Querbeschleunigung, d.h. die Querbeschleunigung bei der ein Verhaken des Messkorpers und/oder des Federelementes gerade noch verhindert wird, um den Faktor 2 erhöht.In a special development of the invention, the stop element is arranged at least in the central region of the spring element. As a result, the coupling of the stop element to the measuring body can be realized in such a way that the deflection of the measuring body can take place in a ratio of almost 2: 1 to the deflection of the spring element. This means that when the measuring body is lifted out, the stop element is raised by approximately half the deflection of the measuring body. With this measure, the maximum permissible lateral acceleration, i.e. the lateral acceleration at which a snagging of the measuring body and / or the spring element is just prevented is increased by a factor of 2.
Vorteilhafterweise ist das Anschlagelement wenigstens m einem Bereich mit einem aufgrund der Bewegung des Messkorpers in Querrichtung hervorgerufenen Torsionsmoment des Federelementes angeordnet. Hierdurch wird in vorteilhafter Weise das Auslenken des Anschlagelementes m Abhängigkeit zur Auslenkung des Messkorpers m Querrichtung realisierbar, wobei gleichzeitig ein Verdrehen des Anschlagelementes bezuglich der Messebene ermöglicht wird. Insbesondere mittels vergleichsweise langer Arme des Anschlagelementes kann aufgrund dessen Verdrehung gegebenenfalls die maximal zulassige Querbeschleunigung der Vorrichtung zusätzlich erhöht werden.The stop element is advantageously arranged in at least one area with a torsional moment of the spring element caused by the movement of the measuring body in the transverse direction. This advantageously makes the deflection of the stop element dependent on Deflection of the measuring body in the transverse direction can be realized, at the same time allowing the stop element to be rotated with respect to the measuring plane. In particular, by means of comparatively long arms of the stop element, the maximum permissible lateral acceleration of the device can optionally be increased due to its rotation.
Grundsätzlich ist die letztgenannte Anordnung des Anschlagelementes nicht nur bei einer Anordnung im mittleren Bereich des Federelementes von Vorteil.In principle, the latter arrangement of the stop element is advantageous not only in the case of an arrangement in the central region of the spring element.
In einer besonderen Weiterbildung der Erfindung ist das Anschlagelement zum Festlegen einer maximalen Bewegung des Messkorpers m der Messebene, insbesondere m Detektionsrichtung, ausgebildet. Vorteilhafterweise wird hierdurch im Wesentlichen ein Kurzschluss der Elektrodenfinger des Kondensators verhindert. Gleichzeitig kann ein fester Anschlag gemäß dem Stand der Technik entfallen, wodurch vor allem der konstruktive Aufwand der Vorrichtung verringert und die entsprechende Möglichkeit des Verhakens verhindert werden kann.In a special development of the invention, the stop element is designed to determine a maximum movement of the measuring body in the measuring plane, in particular in the detection direction. This advantageously essentially prevents a short circuit in the electrode fingers of the capacitor. At the same time, a fixed stop according to the prior art can be omitted, as a result of which, above all, the design complexity of the device can be reduced and the corresponding possibility of hooking can be prevented.
Vorzugsweise ist wenigstens teilweise das Anschlagelement zwischen dem Messkorper und dem Substrat angeordnet. Diese Maßnahme ermöglicht eine besonders einfache Anordnung und somit Ausbildung des Anschlagelements als Festlegeelement der maximalen Auslenkung des Messkorpers in Detektionsrichtung.The stop element is preferably at least partially arranged between the measuring body and the substrate. This measure enables a particularly simple arrangement and thus design of the stop element as a fixing element for the maximum deflection of the measuring body in the detection direction.
In einer vorteilhaften Ausfuhrungsform der Erfindung ist das Federelement mehrfach gefaltet. Hierdurch wird gewährleistet, dass insbesondere der Detektionsbereich der Vorrichtung bezuglich Beschleunigungen in Detektionsrichtung vorteilhaft erweitert werden kann. Gleichzeitig werden die Möglichkeiten zur Anordnung erfmdungsgemaßer Anschlagelemente am Federelement wesentlich erhöht, insbesondere m Abhängigkeit der Anzahl der Faltungen. Dies fuhrt vorzugsweise zu einer Erhöhung der Flexibilität in der Ausgestaltung der erfindungsgemaßen Vorrichtung beziehungsweise bei der Anordnung mehrerer Anschlagelemente.In an advantageous embodiment of the invention, the spring element is folded several times. This ensures that, in particular, the detection range of the device can advantageously be expanded with respect to accelerations in the detection direction. At the same time, the possibilities for arranging stop elements according to the invention on the spring element are significantly increased, in particular as a function of the dependence the number of folds. This preferably leads to an increase in flexibility in the design of the device according to the invention or in the arrangement of a plurality of stop elements.
Grundsatzlich ist bei Verwendung mehrerer Anschlagelemente denkbar, dass eine gewisse Stufung der Anschlagelemente in Querrichtung realisiert werden konnte, das heißt, dass die Änschlagelemente unterschiedlich große Ausschlage bzw. Hube in Querrichtung aufweisen und somit beispielsweise der Messkorper an ein erstes Anschlagelement, dieses an ein zweites, u.s.w., bis ein letztes Anschlagelement an das Substrat in Detektionsrichtung anschlagt. Hierdurch konnte die Empfindlichkeit der Vorrichtung gegenüber Querbeschleunigungen gegebenenfalls zusätzlich deutlich erhöht werden.In principle, when using several stop elements, it is conceivable that a certain gradation of the stop elements in the transverse direction could be realized, that is to say that the stop elements have differently sized deflections or strokes in the transverse direction and thus, for example, the measuring body to a first stop element, this to a second, etc. until a last stop element strikes the substrate in the detection direction. As a result, the sensitivity of the device to lateral accelerations could possibly be increased significantly.
Vorteilhafterweise ist die Vorrichtung mikromechanisch ausgebildet, was insbesondere die Einsatzmoglichkeiten der erfindungsgemaßen Vorrichtung deutlich erhöht. Diese Ausfuhrungsform verbessert zudem die Einbeziehung der erfindungsgemaßen Vorrichtung in mikro-elektro-mechanische Systeme.The device is advantageously designed to be micromechanical, which in particular significantly increases the possible uses of the device according to the invention. This embodiment also improves the inclusion of the device according to the invention in micro-electro-mechanical systems.
Ausfuhrungsbeispiel :Practical example:
Ein Ausfuhrungsbeispiel ist in der Zeichnung dargestellt und wird anhand der Figuren nachfolgend naher erläutert.An exemplary embodiment is shown in the drawing and is explained in more detail below with reference to the figures.
Im Einzelnen zeigtIn detail shows
Figur 1 eine schematische Draufsicht einer erfindungsgemäßen Vorrichtung,FIG. 1 shows a schematic top view of a device according to the invention,
Figur 2 eine schematische -Draufsieht einer weiteren erfindungsgemaßen Vorrichtung undFigure 2 is a schematic view of one further device according to the invention and
Figur 3 ein schematischer Querschnitt der erfindungsgemaßen Vorrichtung gemäß Figur 2.FIG. 3 shows a schematic cross section of the device according to the invention according to FIG. 2.
In Figur 1 ist in schematischer Draufsicht eine Ξensormasse 1 dargestellt, die mittels Federn 2a, b, c, d an einem darunterliegenden Substrat 3 bzw. einer Umrandung 3 gehaltert wird. Hierdurch ist die Sensormasse 1, insbesondere in eine Detektionsrichtung D, bewegbar. Zur Messung einer Beschleunigung und/oder einer Drehrate weist die Sensormasse 1 Elektrodenfinger auf, die zusammen mit Elektrodenfinger einer Gegenelektrode 4a, b eine Messung einer Kapazität bei einem Anliegen unterschiedlicher elektrischer Potentiale ermöglichen .FIG. 1 shows a schematic top view of a sensor mass 1 which is held by springs 2a, b, c, d on an underlying substrate 3 or a border 3. As a result, the sensor mass 1 can be moved, in particular in a detection direction D. To measure an acceleration and / or a rotation rate, the sensor mass 1 has electrode fingers which, together with the electrode fingers of a counter electrode 4a, b, enable a measurement of a capacitance when different electrical potentials are present.
Wird beispielsweise aufgrund einer Beschleunigung und/oder einer Drehrate die Sensormasse 1 entlang derFor example, due to an acceleration and / or a rotation rate, the sensor mass 1 along the
Detektionsrichtung D bewegt, so wird hierdurch die Kapazität der Vorrichtung verändert, was insbesondere mittels einer nicht naher dargestellten Auswerteeinheit erfasst und ausgewertet wird.Moving detection direction D, this changes the capacity of the device, which is detected and evaluated in particular by means of an evaluation unit, not shown in detail.
Weiterhin sind zwei unbewegliche Substratanschläge oder Überlastanschläge 5a, b in Figur 1 dargestellt, die insbesondere die maximale Auslenkung der Sensormasse 1 in Detektionsrichtung D begrenzen. Diese Begrenzung der Auslegung der Sensormasse 1 in Detektionsrichtung D wird vor allem mittels einem Anschlagbügel 6a beziehungsweise βb realisiert .Furthermore, two immobile substrate stops or overload stops 5a, b are shown in FIG. 1, which in particular limit the maximum deflection of the sensor mass 1 in the detection direction D. This limitation of the design of the sensor mass 1 in the detection direction D is realized primarily by means of a stop bracket 6a or βb.
Der Anschlagbügel βa, b führt eine Relativbewegung sowohl bezüglich der Sensormasse 1 sowie der Umrandung 3 beziehungsweise dem Uberlastanschlag 5a, b durch. Dies wird insbesondere dadurch ermöglicht, dass derThe stop bracket βa, b performs a relative movement both with respect to the sensor mass 1 and the border 3 or the overload stop 5a, b through. This is made possible in particular by the fact that the
Uberlastanschlag 5a, b an den Federn 2a, d beziehungsweise 2b, c angeordnet ist. Dementsprechend ist der Anschlagbügel 6a, b mit der Sensormasse 1 gekoppelt, so dass die Bewegung des Anschlagbügels 6a, b in Abhängigkeit zur Bewegung der Sensormasse 1 erfolgt.Overload stop 5a, b is arranged on the springs 2a, d or 2b, c. Accordingly, the stop bracket 6a, b is coupled to the sensor mass 1, so that the movement of the stop bracket 6a, b takes place in dependence on the movement of the sensor mass 1.
Gemäß der Erfindung erfolgt diese Kopplung der Anschlagbügel 6a, b sowohl in einer Messebene, die der Blattebene der Zeichnung entspricht, als auch in einer hierzu quer angeordneten Querrichtung Q gemäß Figur 3, d.h. gemäß Figur 1 oder 2 in eine aus der Blattebene herausgerichtete Richtung Q.According to the invention, this coupling of the stop brackets 6a, b takes place both in a measuring plane which corresponds to the sheet plane of the drawing and in a transverse direction Q arranged transversely thereto in accordance with FIG. 1 or 2 in a direction Q directed out of the sheet plane.
In einer mit den Anschlagbügeln 6a, b vergleichbaren Weise sind Federbügel 7a, b, c, d an den Federn 2a, b, c, d angeordnet, so dass auch diese sich, entsprechend den Anschlagbügeln 6a, b, relativ zur Sensormasse 1 beziehungsweise zum Substrat 3 bewegen.In a manner comparable to the stop brackets 6a, b, spring brackets 7a, b, c, d are arranged on the springs 2a, b, c, d, so that these, too, corresponding to the stop brackets 6a, b, relative to the sensor mass 1 or Move substrate 3.
Beim Herausheben der Sensormasse 1 werden die Federbügel 7a, b, c, d sowie die Anschlagbügel 6a, b etwa um die Hälfte des Hubs der Sensormasse 1 in Querrichtung Q angehoben, so dass weder die Sensormasse 1, noch die Federn 2a, b, c, d auf der Umrandung 3 oder dem Substrat 3 beziehungsweise auf den Überlastanschlägen 5a, b aufliegen können, auch wenn die Sensormasse 1 vollständig über die Umrandung 3 beziehungsweise die Überlastanschläge 5a, b, vgl. insbesondere auch Figur 3, herausgehoben wird.When the sensor mass 1 is lifted out, the spring clips 7a, b, c, d and the stop clips 6a, b are raised by about half the stroke of the sensor mass 1 in the transverse direction Q, so that neither the sensor mass 1 nor the springs 2a, b, c , d can rest on the border 3 or the substrate 3 or on the overload stops 5a, b, even if the sensor mass 1 is completely over the border 3 or the overload stops 5a, b, cf. in particular also FIG. 3.
Figur 2 zeigt eine weitere Vorrichtung gemäß der Erfindung, wobei vergleichbare Elemente mit sich entsprechenden Bezugszeichen gekennzeichnet sind. Im Unterschied zur Vorrichtung gemäß Figur 1 weist jedoch die Vorrichtung gemäß Figur 2 keine Substrat-anschläge bzw. Überlastanschläge 5a, b auf. Die Festlegung der maximalen Auslenkung der Sensormasse 1 in Detektionsrichtung D erfolgt hierbei mittels alternativ und/oder kombiniert zu verwendenden, antennenartigen Außenanschläge 8a, b, c, d sowie Innenanschläge 9a, b, c, d.Figure 2 shows a further device according to the invention, wherein comparable elements are identified with corresponding reference numerals. In contrast to the device according to FIG. 1, however, the device according to FIG. 2 has no substrate stops or overload stops 5a, b on. The maximum deflection of the sensor mass 1 in the detection direction D is determined here by means of alternative and / or combined antenna-like external stops 8a, b, c, d and internal stops 9a, b, c, d.
Die Außenanschläge 8a, b, c, d sowie Innenanschläge 9a, b, c, d sind hierbei vorzugsweise an Stellen der Federn 2a, b, c, d mit vergleichsweise großem Torsionsmoment bei Anliegen von Querbeschleunigungen in Querrichtung Q angeordnet. Bei einer entsprechenden Auslenkung der Sensormasse 1 heben sich die Außenanschläge 8a, b, c, d sowie Innenanschläge 9a, b, c, d proportional zur Auslenkung der Sensormasse 1 aus der Messebene heraus und verhindern hierdurch ein Verhaken der Sensormasse 1 beziehungsweise der Federn 2a, b, c, d.The outer stops 8a, b, c, d and inner stops 9a, b, c, d are preferably arranged at the points of the springs 2a, b, c, d with a comparatively large torsional moment when transverse accelerations are applied in the transverse direction Q. With a corresponding deflection of the sensor mass 1, the outer stops 8a, b, c, d and inner stops 9a, b, c, d rise proportionally to the deflection of the sensor mass 1 out of the measuring plane and thereby prevent the sensor mass 1 or the springs 2a from getting caught. b, c, d.
Grundsätzlich ist eine Summe der Abstände zwischen dem Substratanschlag 5, dem Substrat 3 beziehungsweise der Sensormasse 1 und dem Anschlagelement 6, 7, 8, 9 kleiner als ein Abstand der Elektrodenfinger der Sensormasse 1 zu den der Gegenelektrode 4, um ein Kurzschließen der Elektrodenfinger zu verhindern.In principle, a sum of the distances between the substrate stop 5, the substrate 3 or the sensor mass 1 and the stop element 6, 7, 8, 9 is smaller than a distance between the electrode fingers of the sensor mass 1 and those of the counterelectrode 4, in order to prevent the electrode fingers from being short-circuited ,
In Figur 3 ist ein schematischer Querschnitt der Vorrichtung gemäß Figur 2 beispielhaft im Bereich eines Innenanschlages 9 oder Außenanschlages 8 dargestellt. Durch die Kopplung des antennenförmigen Innenanschlages 9 oder Außenanschlages 8 mit der Sensormasse 1 werden diese aus der Messebene etwas weniger stark als die Sensormasse 1 in Querrichtung Q herausgehoben und zusätzlich aufgrund des Torsionsmomentes in eine Torsionsrichtung T verdreht. Bei vergleichsweise starker Beschleunigung in Detektionsrichtung D schlägt die Sensormasse 1 mittels dem Innenanschlag 9 oder Außenanschlag 8 am Substrat 3 bzw. der Umrandung 3. Bei gleichzeitig vorhandener Querbeschleunigung ist hiermit das Verhaken der Sensormasse 1 beziehungsweise der Feder 2 am Substrat 3 gemäß der Erfindung verhinderbar. Darüber hinaus konnte die Empfindlichkeit der Vorrichtung alternativ und/oder m Kombination mit dem bewegbaren Anschlagelement 6, 7, 8, 9 auch durch Erhöhung der Federsteiflgkeit, insbesondere m Richtung der Querbeschleunigungen, erreicht werden. Beispielsweise durch Verdickung, Umgestaltung oder Ahnlichem der Federn 2. Hierdurch wird meistens auch der Parameterbereich der Vorrichtung, der Fertigungsprozess oder dergleichen vergleichsweise stark verändert, was gegebenenfalls in bestimmten Anwendungsfallen nicht gewünscht sein konnte. FIG. 3 shows a schematic cross section of the device according to FIG. 2, for example in the area of an inner stop 9 or outer stop 8. By coupling the antenna-shaped inner stop 9 or outer stop 8 to the sensor mass 1, they are lifted out of the measurement plane somewhat less than the sensor mass 1 in the transverse direction Q and additionally rotated in a torsion direction T due to the torsional moment. If the acceleration in the detection direction D is comparatively strong, the sensor mass 1 strikes the substrate 3 or the border 3 by means of the inner stop 9 or the outer stop 8. If transverse acceleration is present at the same time, the sensor mass 1 or the spring 2 on the substrate 3 can be prevented from snagging according to the invention. In addition, as an alternative and / or in combination with the movable stop element 6, 7, 8, 9, the sensitivity of the device could also be achieved by increasing the spring stiffness, in particular in the direction of the lateral accelerations. For example, by thickening, reshaping or the like of the springs 2. As a result, the parameter range of the device, the manufacturing process or the like is usually also changed comparatively strongly, which may not have been desired in certain applications.
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2001118340 DE10118340A1 (en) | 2001-04-12 | 2001-04-12 | Measurement of acceleration or rotation using a micro-mechanical sensor that has a flat measurement body attached by fastening elements and springs to a substrate so that movement of the spring elements and measurement body is limited |
| DE10118340.2 | 2001-04-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2002084303A1 true WO2002084303A1 (en) | 2002-10-24 |
Family
ID=7681405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE2002/001021 Ceased WO2002084303A1 (en) | 2001-04-12 | 2002-03-21 | Device for measuring an acceleration and/or a yaw rate |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE10118340A1 (en) |
| WO (1) | WO2002084303A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005059569A3 (en) * | 2003-12-15 | 2005-10-13 | Honeywell Int Inc | Internally shock caged serpentine flexure for micro-machined accelerometer |
| WO2010136222A1 (en) * | 2009-05-26 | 2010-12-02 | Robert Bosch Gmbh | Micromechanical structure |
| CN103557853A (en) * | 2013-10-24 | 2014-02-05 | 华东光电集成器件研究所 | High-overload-resistant micro electro mechanical system (MEMS) gyroscope |
| JP2022099269A (en) * | 2020-12-22 | 2022-07-04 | 株式会社村田製作所 | Low-impact motion limiter |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7036374B2 (en) * | 2002-01-25 | 2006-05-02 | William Thomas Pike | Micro-machined suspension plate with integral proof mass for use in a seismometer or other device |
| DE102011006397B4 (en) | 2011-03-30 | 2020-06-04 | Robert Bosch Gmbh | Micromechanical component with an interlocking structure |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5542295A (en) * | 1994-12-01 | 1996-08-06 | Analog Devices, Inc. | Apparatus to minimize stiction in micromachined structures |
| DE10024698A1 (en) * | 2000-05-18 | 2001-11-22 | Bosch Gmbh Robert | Micromechanical component, has seismic weight with deflection stop, flexural spring device laterally attached to seismic weight, second stop for restricting bending of flexural spring device |
| WO2002012905A1 (en) * | 2000-08-09 | 2002-02-14 | Robert Bosch Gmbh | Acceleration sensor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6065341A (en) * | 1998-02-18 | 2000-05-23 | Denso Corporation | Semiconductor physical quantity sensor with stopper portion |
-
2001
- 2001-04-12 DE DE2001118340 patent/DE10118340A1/en not_active Ceased
-
2002
- 2002-03-21 WO PCT/DE2002/001021 patent/WO2002084303A1/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5542295A (en) * | 1994-12-01 | 1996-08-06 | Analog Devices, Inc. | Apparatus to minimize stiction in micromachined structures |
| DE10024698A1 (en) * | 2000-05-18 | 2001-11-22 | Bosch Gmbh Robert | Micromechanical component, has seismic weight with deflection stop, flexural spring device laterally attached to seismic weight, second stop for restricting bending of flexural spring device |
| WO2002012905A1 (en) * | 2000-08-09 | 2002-02-14 | Robert Bosch Gmbh | Acceleration sensor |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005059569A3 (en) * | 2003-12-15 | 2005-10-13 | Honeywell Int Inc | Internally shock caged serpentine flexure for micro-machined accelerometer |
| US7013730B2 (en) | 2003-12-15 | 2006-03-21 | Honeywell International, Inc. | Internally shock caged serpentine flexure for micro-machined accelerometer |
| US7024933B2 (en) | 2003-12-15 | 2006-04-11 | Honeywell International, Inc. | Internally shock caged serpentine flexure for micro-machined accelerometer |
| WO2010136222A1 (en) * | 2009-05-26 | 2010-12-02 | Robert Bosch Gmbh | Micromechanical structure |
| CN103557853A (en) * | 2013-10-24 | 2014-02-05 | 华东光电集成器件研究所 | High-overload-resistant micro electro mechanical system (MEMS) gyroscope |
| JP2022099269A (en) * | 2020-12-22 | 2022-07-04 | 株式会社村田製作所 | Low-impact motion limiter |
| JP7235095B2 (en) | 2020-12-22 | 2023-03-08 | 株式会社村田製作所 | low impact motion limiter |
| US12139395B2 (en) | 2020-12-22 | 2024-11-12 | Murata Manufacturing Co., Ltd. | Low-impact motion limiter |
Also Published As
| Publication number | Publication date |
|---|---|
| DE10118340A1 (en) | 2002-10-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102008040855B4 (en) | Triaxial accelerometer | |
| EP2394177B1 (en) | Acceleration sensor and method for operating an acceleration sensor | |
| DE102012207939B4 (en) | Spring-loaded stop for acceleration sensor | |
| EP3698195B1 (en) | Micromechanical micromirror array | |
| DE102017219901B3 (en) | Micromechanical z-inertial sensor | |
| DE102009026476A1 (en) | Micromechanical structure | |
| DE19520004C2 (en) | Acceleration sensor | |
| DE102011076008B4 (en) | Force transducer, in particular load cell | |
| WO2014177243A1 (en) | Acceleration sensor and method for producing an acceleration sensor | |
| DE102016210479A1 (en) | Micromechanical component for a pressure sensor device | |
| WO2002084303A1 (en) | Device for measuring an acceleration and/or a yaw rate | |
| DE102017219929B4 (en) | Micromechanical z-inertial sensor | |
| DE102008040567B4 (en) | Method for operating a sensor module and a sensor module | |
| WO2004019048A1 (en) | Micromechanical component | |
| DE69611328T2 (en) | Impact sensor | |
| EP2593760B1 (en) | Infrared sensor having tunnel contact for measuring the deformation of a membrane | |
| DE102020212998A1 (en) | Micromechanical z-inertial sensor | |
| DE102020214019A1 (en) | Micromechanical sensor element | |
| DE102010012701A1 (en) | Microforce sensor for measuring micro forces at nano range and milli Newton range, has spring region provided between two support regions and stiffener marking unit, respectively, where spring regions comprise two-winged meander shape | |
| DE102009045645A1 (en) | Sensor device has base plate, inertial mass and spring, where distance of counter electrode from rotation axis is less than distance of another counter electrode from rotational axis | |
| DE102011080982A1 (en) | Sensor arrangement i.e. acceleration sensor arrangement, has cantilevered measuring electrode performing capacitive measurement of deflection of seismic mass relative to electrode, where mass is movable around main extension plane | |
| DE102010030878B4 (en) | Micromechanical sensor device for measuring an acceleration, a pressure and the like | |
| DE102010002992B4 (en) | Piezoresistive micromechanical sensor component and corresponding manufacturing method | |
| EP2545386B1 (en) | Accelerometer comprising a piezoresistive transducer | |
| DE102020215238A1 (en) | Micromechanical sensor structure with damping structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): KR US |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR |
|
| DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| 122 | Ep: pct application non-entry in european phase |