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WO2002049009A3 - Procede photolithographique permettant de produire des disques, cartes et autres elements optiques originaux pourvus de micro-reliefs et dispositifs microminiaturises - Google Patents

Procede photolithographique permettant de produire des disques, cartes et autres elements optiques originaux pourvus de micro-reliefs et dispositifs microminiaturises Download PDF

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Publication number
WO2002049009A3
WO2002049009A3 PCT/IL2001/001156 IL0101156W WO0249009A3 WO 2002049009 A3 WO2002049009 A3 WO 2002049009A3 IL 0101156 W IL0101156 W IL 0101156W WO 0249009 A3 WO0249009 A3 WO 0249009A3
Authority
WO
WIPO (PCT)
Prior art keywords
latent image
measurement
method including
photolithographic method
including measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IL2001/001156
Other languages
English (en)
Other versions
WO2002049009A2 (fr
Inventor
Eugene Levich
Sergei Magnitskii
Vladimir Kozenkov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CONSELLATION TRID Inc
Original Assignee
CONSELLATION TRID Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CONSELLATION TRID Inc filed Critical CONSELLATION TRID Inc
Priority to AU2002222484A priority Critical patent/AU2002222484A1/en
Priority to AU2002222484A priority patent/AU2002222484A8/en
Publication of WO2002049009A2 publication Critical patent/WO2002049009A2/fr
Anticipated expiration legal-status Critical
Publication of WO2002049009A3 publication Critical patent/WO2002049009A3/fr
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

La présente invention concerne un procédé non destructif et sans contact permettant de vérifier et de régler la qualité d'une topologie volumétrique spatiale de l'image modèle latente servant de modèle spatial de micro-cuvettes d'informations de précurseurs originaux de disque optique ou de modèle de précurseurs de régions à micro-reliefs de divers éléments optiques à diffraction et de dispositifs originaux microminiaturisés qui sont produits par voie photolithographique dans une couche de résine photosensible et sont conçus pour une production ultérieure de matrices de ceux-ci et pour une reproduction en masse mettant en oeuvre un moulage par injection ou une photopolymérisation. Ce procédé consiste à éclairer la couche de résine photosensible en utilisant un rayonnement polarisé chimiquement actif, qui porte des informations concernant la future microstructure spatiale de divers produits originaux à micro-reliefs, puis à reproduire la topologie spatiale produite dans la couche avant le développement de la couche exposée, en utilisant un rayonnement à nouveau polarisé, mais cette fois non chimiquement actif.
PCT/IL2001/001156 2000-12-12 2001-12-12 Procede photolithographique permettant de produire des disques, cartes et autres elements optiques originaux pourvus de micro-reliefs et dispositifs microminiaturises Ceased WO2002049009A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2002222484A AU2002222484A1 (en) 2000-12-12 2001-12-12 Photolithographic method including measurement of the latent image
AU2002222484A AU2002222484A8 (en) 2000-12-12 2001-12-12 Photolithographic method including measurement of the latent image

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25453900P 2000-12-12 2000-12-12
US60/254,539 2000-12-12

Publications (2)

Publication Number Publication Date
WO2002049009A2 WO2002049009A2 (fr) 2002-06-20
WO2002049009A3 true WO2002049009A3 (fr) 2012-01-05

Family

ID=22964665

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2001/001156 Ceased WO2002049009A2 (fr) 2000-12-12 2001-12-12 Procede photolithographique permettant de produire des disques, cartes et autres elements optiques originaux pourvus de micro-reliefs et dispositifs microminiaturises

Country Status (2)

Country Link
AU (2) AU2002222484A8 (fr)
WO (1) WO2002049009A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI261835B (en) * 2002-11-20 2006-09-11 Sony Corp Method for producing a stamper used for producing an optical disc and optical disc producing method
KR101047255B1 (ko) * 2003-01-09 2011-07-06 소니 주식회사 광 디스크 제조용 원반의 제작 방법 및 광 디스크의 제조방법
WO2006045332A1 (fr) * 2004-10-27 2006-05-04 Singulus Mastering B.V. Processus de masterisation utilisant des materiaux a changement de phase
EP1965383A1 (fr) * 2007-03-02 2008-09-03 Singulus Mastering B.V. Mesure d'ordre de diffraction
US9275671B2 (en) 2011-06-09 2016-03-01 Case Western Reserve University Optical information storage medium

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3920457A (en) * 1974-03-04 1975-11-18 Eastman Kodak Co Photographic leuco-dye compositions containing reductones as stabilizers
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US5283141A (en) * 1992-03-05 1994-02-01 National Semiconductor Photolithography control system and method using latent image measurements
US5376227A (en) * 1992-11-12 1994-12-27 Goldstar Electron Co., Ltd. Multilevel resist process
US5581531A (en) * 1989-08-02 1996-12-03 Hitachi, Ltd. Method of making optical disk master and an optical disk
US5674652A (en) * 1991-02-28 1997-10-07 University Of New Mexico Diffracted light from latent images in photoresist for exposure control
US5703692A (en) * 1995-08-03 1997-12-30 Bio-Rad Laboratories, Inc. Lens scatterometer system employing source light beam scanning means
US5968693A (en) * 1991-03-04 1999-10-19 Lucent Technologies Inc. Lithography tool adjustment utilizing latent imagery
US6025118A (en) * 1998-05-12 2000-02-15 Sony Corporation Glassmastering photoresist read after write method and system
US6051349A (en) * 1997-01-30 2000-04-18 Tokyo Electron Limited Apparatus for coating resist and developing the coated resist

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3920457A (en) * 1974-03-04 1975-11-18 Eastman Kodak Co Photographic leuco-dye compositions containing reductones as stabilizers
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US5581531A (en) * 1989-08-02 1996-12-03 Hitachi, Ltd. Method of making optical disk master and an optical disk
US5674652A (en) * 1991-02-28 1997-10-07 University Of New Mexico Diffracted light from latent images in photoresist for exposure control
US5968693A (en) * 1991-03-04 1999-10-19 Lucent Technologies Inc. Lithography tool adjustment utilizing latent imagery
US5283141A (en) * 1992-03-05 1994-02-01 National Semiconductor Photolithography control system and method using latent image measurements
US5376227A (en) * 1992-11-12 1994-12-27 Goldstar Electron Co., Ltd. Multilevel resist process
US5703692A (en) * 1995-08-03 1997-12-30 Bio-Rad Laboratories, Inc. Lens scatterometer system employing source light beam scanning means
US6051349A (en) * 1997-01-30 2000-04-18 Tokyo Electron Limited Apparatus for coating resist and developing the coated resist
US6025118A (en) * 1998-05-12 2000-02-15 Sony Corporation Glassmastering photoresist read after write method and system

Also Published As

Publication number Publication date
AU2002222484A8 (en) 2012-02-02
AU2002222484A1 (en) 2002-06-24
WO2002049009A2 (fr) 2002-06-20

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