[go: up one dir, main page]

WO2002046490A3 - Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat - Google Patents

Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat Download PDF

Info

Publication number
WO2002046490A3
WO2002046490A3 PCT/EP2001/014304 EP0114304W WO0246490A3 WO 2002046490 A3 WO2002046490 A3 WO 2002046490A3 EP 0114304 W EP0114304 W EP 0114304W WO 0246490 A3 WO0246490 A3 WO 0246490A3
Authority
WO
WIPO (PCT)
Prior art keywords
coated substrate
low emissivity
substrate
substrates
conductive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2001/014304
Other languages
German (de)
English (en)
Other versions
WO2002046490A2 (fr
Inventor
Bernd Szyszka
Andreas Bierhals
Udo Bringmann
Thomas Hoeing
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority to EP01986851A priority Critical patent/EP1341947A2/fr
Priority to AU2002238412A priority patent/AU2002238412A1/en
Publication of WO2002046490A2 publication Critical patent/WO2002046490A2/fr
Publication of WO2002046490A3 publication Critical patent/WO2002046490A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)

Abstract

L'invention concerne un substrat revêtu sur au moins une surface duquel est déposée une couche sous forme d'un système optiquement transparent et électroconducteur. L'invention concerne également un procédé de réduction de l'émissivité de substrats, selon lequel un système sous forme de couche optiquement transparent et électroconducteur est déposé sur au moins une surface du substrat. Des substrats selon l'invention peuvent être utilisés pour la réalisation d'isolations thermiques dans des bâtiments ou pour éviter la condensation sur des substrats présentant une capacité d'émission thermique élevée, en particulier pour empêcher la condensation sur des vitrages de véhicules automobiles.
PCT/EP2001/014304 2000-12-06 2001-12-06 Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat Ceased WO2002046490A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP01986851A EP1341947A2 (fr) 2000-12-06 2001-12-06 Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat
AU2002238412A AU2002238412A1 (en) 2000-12-06 2001-12-06 Coated substrate having a low emissivity

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10060681 2000-12-06
DE10060681.4 2000-12-06

Publications (2)

Publication Number Publication Date
WO2002046490A2 WO2002046490A2 (fr) 2002-06-13
WO2002046490A3 true WO2002046490A3 (fr) 2003-02-13

Family

ID=7666034

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/014304 Ceased WO2002046490A2 (fr) 2000-12-06 2001-12-06 Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat

Country Status (3)

Country Link
EP (1) EP1341947A2 (fr)
AU (1) AU2002238412A1 (fr)
WO (1) WO2002046490A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004003760B4 (de) * 2004-01-23 2014-05-22 Forschungszentrum Jülich GmbH Verfahren zur Herstellung einer leitfähigen und transparenten Zinkoxidschicht und Verwendung derselben in einer Dünnschichtsolarzelle

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4769291A (en) * 1987-02-02 1988-09-06 The Boc Group, Inc. Transparent coatings by reactive sputtering
US4835061A (en) * 1984-11-09 1989-05-30 Konishiroku Photo Industry Co., Ltd. Conductive laminate
EP0814351A2 (fr) * 1996-06-21 1997-12-29 Semco Glasbeschichtung GmbH Couche antiréflechissante thermiquement isolante et méthode pour sa fabrication
WO1998018374A1 (fr) * 1996-10-28 1998-05-07 Gunder Karlsson Bouteille thermos
US5976683A (en) * 1996-10-24 1999-11-02 Leybold Systems Gmbh Coating system transparent to light and reflecting thermal radiation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4835061A (en) * 1984-11-09 1989-05-30 Konishiroku Photo Industry Co., Ltd. Conductive laminate
US4769291A (en) * 1987-02-02 1988-09-06 The Boc Group, Inc. Transparent coatings by reactive sputtering
EP0814351A2 (fr) * 1996-06-21 1997-12-29 Semco Glasbeschichtung GmbH Couche antiréflechissante thermiquement isolante et méthode pour sa fabrication
US5976683A (en) * 1996-10-24 1999-11-02 Leybold Systems Gmbh Coating system transparent to light and reflecting thermal radiation
WO1998018374A1 (fr) * 1996-10-28 1998-05-07 Gunder Karlsson Bouteille thermos

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SZCZYRBOWSKI J ET AL: "New low emissivity coating based on TwinMagR) sputtered TiO2 and Si3N4 layers", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 351, no. 1-2, 30 August 1999 (1999-08-30), pages 254 - 259, XP004183104, ISSN: 0040-6090 *

Also Published As

Publication number Publication date
AU2002238412A1 (en) 2002-06-18
EP1341947A2 (fr) 2003-09-10
WO2002046490A2 (fr) 2002-06-13

Similar Documents

Publication Publication Date Title
AU2003222246A1 (en) Insulating glass (ig) window unit including heat treatable coating with silicon-rich silicon nitride layer
CA2466715A1 (fr) Article revetu apte au traitement thermique avec barriere anti-migration entre la couche dielectrique et la couche de controle solaire, et procedes de fabrication correspondants
WO2007005368A8 (fr) Panneau de regard a primaire multicouche
EP1514451B1 (fr) Panneau vitre chauffant
EP0866037A3 (fr) Film repellant d'eau multicouche et procédé pour sa formation sur un substrat de verre
WO2001082336A3 (fr) Couches de lissage et barriere sur des substrats resistant aux temperatures elevees
WO2004049042A3 (fr) Guide d'ondes dielectrique et son procede de production
PL1758829T3 (pl) Sposób wytwarzania powlekanych produktów z dolną warstwą traktowaną wiązką jonów
WO2002009478A1 (fr) Dispositif luminescent
WO2005007398A3 (fr) Vitrage de securite fonctionnalise
EP0813246A3 (fr) Dispositif semi-conducteur comprenant deux substrats semi-conducteurs
WO1999055640A8 (fr) Article enduit et procede de fabrication correspondant
CA2443843A1 (fr) Articles revetus pouvant etre traites a la chaleur, avec couche barriere anti-migration comprise entre une couche dielectrique et une couche de gestion solaire, et procedes de fabrication
PL367323A1 (en) Heat treatable coated articles with metal nitride layer and methods of making same
WO2002036511A3 (fr) Procede de depot d'un systeme de revetement renfermant du dlc sur un substrat, comprenant une etape de chauffage du substrat lors du depot par faisceau ionique d'un systeme de revetement renfermant du dlc
AU2002323449A1 (en) Masking for insulating glass units, monolithic panes, and other substrates
WO2004011382A3 (fr) Revetements a performance d'ombrage elevee trempables
EP0992610A3 (fr) Couche-barrière sur substrats polymériques et procédé pour sa production
AU5844698A (en) Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate
AU3984199A (en) Gap drying with insulation layer between substrate and heated platen
WO2000008523A3 (fr) Electrode electrochrome autocollante et dispositifs la contenant
WO2003019649A8 (fr) Ensemble pistes conductrices et procede de fabrication dudit ensemble
EP0839856A3 (fr) Film de polyester pour plaque décorative ou feuille décorative
CA2166166A1 (fr) Ensemble isolant et methode pour l'application d'un adhesif sur ledit isolant
WO2006041924A3 (fr) Revetement en couche mince et technologie de protection temporaire, unites de vitrage isolant et procedes associes

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2001986851

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 2001986851

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

WWW Wipo information: withdrawn in national office

Ref document number: 2001986851

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP