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WO2001000538A2 - Substrat en verre et composition de verre destinee a etre utilisee dans un affichage a cristaux liquides - Google Patents

Substrat en verre et composition de verre destinee a etre utilisee dans un affichage a cristaux liquides Download PDF

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Publication number
WO2001000538A2
WO2001000538A2 PCT/JP2000/004309 JP0004309W WO0100538A2 WO 2001000538 A2 WO2001000538 A2 WO 2001000538A2 JP 0004309 W JP0004309 W JP 0004309W WO 0100538 A2 WO0100538 A2 WO 0100538A2
Authority
WO
WIPO (PCT)
Prior art keywords
glass composition
mol
mgo
cao
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2000/004309
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English (en)
Other versions
WO2001000538A3 (fr
Inventor
Kazuo Tachiwana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Avanstrate Inc
Original Assignee
Hoya Corp
NH Techno Glass Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, NH Techno Glass Corp filed Critical Hoya Corp
Priority to JP2001506957A priority Critical patent/JP4445176B2/ja
Priority to DE10084754.4T priority patent/DE10084754B3/de
Publication of WO2001000538A2 publication Critical patent/WO2001000538A2/fr
Publication of WO2001000538A3 publication Critical patent/WO2001000538A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods

Definitions

  • This invention relates to a glass substrate and a glass composition which is for use in a liquid crystal panel and which will be often simply called a glass substrate and a glass composition throughout the instant specification, respectively.
  • liquid crystal panel or display tends to be widely used in various fields.
  • a liquid crystal panel has been also used in a laptop computer and a digital video disk (DVD) player. From this fact, it is required that the liquid crystal panel is light in weight, compact in size, and can display very fine images.
  • DVD digital video disk
  • liquid crystal panel glass composition which has a high strain point, a light weight, and a high strength such that thin film transistors (TFT) can be formed on the liquid crystal panel.
  • conventional TFTs are classified into amorphous silicon TFT and polysilicon TFT.
  • the amorphous TFT can realize a wide screen and can be manufactured at a low temperature process. Therefore, the amorphous TFT has thus far been widely used in comparison with the polysilicon TFT.
  • such amorphous TFT inevitably makes a drive circuit complex in structure due to characteristics of materials used therein and, as a result, make fine integration difficult.
  • the polysilicon TFT is advantageous in that it is possible to simplify a drive circuit in structure and, therefore, to form pixels at a high density.
  • the polysilicon TFT has a drawback that a high temperature process is necessary on manufacturing the polysilicon TFT.
  • recent studies have been directed to a polysilicon TFT which can be manufactured at a low temperature, they have reported that a process between 600°C and 650°C is indispensably necessary.
  • the liquid crystal panel glass has been usually formed by quartz glass which has high stability such that neither thermal shrinkage nor deformation takes place.
  • quartz glass is suitable for the liquid crystal panel because of its properties but it is expensive.
  • non alkali glass glass which includes no alkali components and which will be called non alkali glass has been also used as the liquid crystal panel glass.
  • non alkali glass having a high strain point which can withstand the manufacturing process of the polysilicon TFT.
  • the liquid crystal glass is light in weight because the liquid crystal panel has been often utilized in portable devices, such as a mobile device, a laptop computer. Moreover, it is required that the liquid crystal panel glass has low specific gravity and low flexibility so as to easily handle the glass during a manufacturing process and a test process. Such low flexibility leads to a high Young's modulus.
  • liquid crystal panel glass has a strain point not lower than 680'C, specific gravity not higher than 2.45, and a Young' modulus not smaller than 76GPa.
  • the liquid crystal panel glass has the strain point not lower than 6900, the specific gravity not higher than 2.42, and the Young 1 modulus not smaller than 77GPa.
  • Fig. 1 shows a schematic sectional view of a liquid crystal display which uses a pair of glass substrates according to this invention.
  • liquid crystal panel glass substrate or composition for polysilicon TFT might have a strain point not lower than 680'C (preferably, 690 * 0), specific gravity not higher than 2.45 (preferably, 2.42), and a Young's modulus not lower than 76 GPa (preferably, 77 GPa).
  • a specific modulus can be calculated because the specific modulus is given by a ratio of the Young's modulus (E) to specific gravity.
  • E Young's modulus
  • the glass substrate or composition according to this invention has the specific modulus not lower than 31 GPa.
  • G is representative of a shear modulus or a modulus of rigidity.
  • strain point, specific gravity, and Young's modulus have been realized by glass which comprises 67-72mol% of Si0 2 , 6- 10mol% of B 2 0 3 , 9-15mol% of Al 2 0 3 , 3-13.5mol% of MgO, 0-6mol% of CaO, 0- 0.3mol% of SrO, 0-0.2mol% of BaO, and 0-0.5mol% of As 2 0 3 .
  • each of Sb 2 0 3 and Sn0 2 may be added up to 1 mol%.
  • a first sum amount of Al 2 0 3 , MgO, and CaO falls within a range between 20mol% and 24mol%.
  • a second sum amount of Si0 2 , B 2 0 3 , Al 2 0 3 , MgO, and CaO (namely, Si0 2 -rB 2 0 3 -rAI 2 0 3 -rMgO+CaO) may be not smaller than 97 mol%, preferably, 98.5 mol%, and more preferably, more than 99 mol%. At any rate, the second sum amount may fall within a range between 97mol% and 99.5mol%.
  • a first ratio of AI 2 O 3 to B 2 0 3 may be present in mol ratio between 1.1 and 2.2 while a second ratio of the first sum amount (AI 2 O 3 +MgO+CaO) to a third amount of (Si0 2 +B 2 0 3 ) may be present in mol ratio between 0.25 and 0.32.
  • the mol ratio of (AI 2 0 3 +MgO+CaO)/(Si ⁇ 2 +B 2 0 3 ) may be not smaller than 0.25 on the condition that AI 2 0 3 +MgO+CaO is not smaller than 20 mol%.
  • AI 2 O 3 +MgO+CaO may fall within a range between 20-22.5 mol% while the mol ratio of AI 2 O 3 /B 2 O 3 is between 1.1 and 1.7. In this event, it is preferable that (Si ⁇ 2 +B 2 0 3 +AI 2 0 3 +MgO+CaO) is not lower than 99 mol% and (AI 2 0 3 -rMgO-rCaO)/(Si ⁇ 2 +B 2 0 3 ) is between 0.25 and 3.0.
  • the glass may preferably have an average thermal expansion coefficient not greater than 35 x 10 "7 /°C within a temperature range between 100 and 300°C. More preferably, the thermal expansion coefficient may be not greater than 31 x 10 "7 /°C within a temperature range between 100 and 300°C.
  • Table shows any other examples 1 through 4.
  • the glass substrate or the glass composition for the liquid crystal panel may comprise 65- 75mol% of Si0 2 , 6-11 mol% of B 2 0 3 , 8-15 mol% of Al 2 0 3 , 3-15 mol% of MgO, 0- 8 mol% of CaO, 0-1 mol% of SrO, 0-1 mol% of BaO, 0-1 mol% of As 2 0 3 , 0-1 mol% of Sb 2 0 3 , and 0-1 mol% of Sn0 2 .
  • the first sum amount (AI 2 0 3 +MgO+CaO) might fall within a range between 20 mol% and 25 mol% while the first ratio is present within a range between 1.1 and 2.2.
  • the second sum amount (SiO 2 +B 2 0 3 +AI 2 0 3 +MgO+CaO) may not be smaller than 98.5 mol% while the second ratio (the first sum amount to the third sum amount of Si0 2 and B 2 0 3 ), namely, (AI 2 0 3 +MgO+CaO)/(Si0 +B 2 0 3 ) may not be smaller than 0.25.
  • the glass substrate or composition may comprise, by mol%, 68-72% of Si0 2 , 7-9% of B 2 0 3 , 9-13% of Al 2 0 3 , 5-13.5% of MgO, 0-3.4% of CaO, 0-0.4% of SrO, 0-0.1% of BaO, 0-0.5% of As 2 0 3 , 0-0.5% of Sb 2 0 3 , and 0-0.5% of Sn0 2 .
  • not less than 8mol% of Al 2 0 3 and not greater than 11 mol% of B 2 0 3 are to be included in the glass with a first ratio of Al 2 0 3 to B 2 0 3 (A ⁇ Os/B ⁇ ) kept in a range not be smaller than 1.1.
  • alkali metal oxide may not be included in the glass.
  • the specific gravity which is not greater than 2.45 can be achieved by keeping the first sum amount (AI 2 0 3 +MgO+CaO) within a range which is not greater than 25mol% and by keeping the second sum amount (Si0 2 +B 2 0 3 +AI 2 0 3 +MgO+CaO) within a range which is not smaller than 97mol%.
  • the Young's modulus which is not smaller than 76GPa can be obtained when the first sum amount (AI 2 0 3 +MgO+CaO) is not smaller than 20mol% and when the second ratio (AI 2 0 3 +MgO+CaO)/(SiO 2 +B 2 0 3 ) is equal to or greater than 0.25.
  • the devitrification proof can be maintained when Si0 2 and B 2 0 3 are equal to or greater than 65mol% and 6mol%, respectively, on the assumption that Al 2 0 3 does not exceed 15mol%. In this event, it is necessary to keep the first ratio (AI 2 ⁇ 3 /B 2 0 3 ) equal to or less than 2.2. CaO, SrO, and BaO are added up to 8mol%, 1 mol%, and 1 mol%, respectively.
  • the solubility can be desirably kept when Si0 2 and Al 2 0 3 are not greater than 80mol% and 15mol%, respectively, and when B 2 0 3 and MgO are not smaller than 6mol% and 3mol%, respectively.
  • the solubility is unchanged even when CaO, SrO, and BaO are added up to 8mol%, 1 mol%, and 1 mol%, respectively.
  • less than 65 mol% of Si0 2 undesirably lowers the strain point while more than 75 mol% of Si0 2 inappropriately increases a viscosity of the glass composition.
  • Less than 6 mol% of B 2 0 3 results in a decrease of solubility while more than 11 mol% of B 2 0 3 results in lowering a fluoric acid proof.
  • Exceeding the range between 5 mol% and 15mol% of Al 2 0 3 brings about a reduction of the strain point and gives rise to devitrification, respectively.
  • Less than 3 mol% of MgO increases the viscosity while more than 15 mol% of MgO brings about the devitrification in the glass substrate.
  • more than 8 mol% of CaO results in the devitrification.
  • Both SrO and BaO may be added in the form of Ba(N0 3 ) 2 and Sr(N0 3 ) 2 and effective to improve the refining property even when only 0.1 mol% is added, to suppress tendency of the devitrification and phase separation.
  • more than 0.4 mol% of SrO and more than 0.2 mol% of BaO result in an increase of the viscosity and deteriorate the devitrification.
  • As 2 0 3 , Sb 2 0 3 , and Sn0 2 serve as refining agents but an excessive amount of As 2 0 3 causes an environmental pollution to occur, as mentioned in the preamble of the instant specification, while excessive amounts of Sb 2 0 3 and Sn0 2 result in a reduction of the strain point.
  • the glass substrate can be manufactured by a down drawing method, a flowing method, or the like, as known in the art.
  • the glass composition mentioned above can be readily shaped into a plate for the liquid crystal panel by the use of the conventional down drawing method, flowing method, or the like.
  • a liquid crystal display is schematically and partially illustrated which has a pair of glass substrates 11 mentioned above.
  • the glass substrates 11 are opposed to each other with an inside gap left therebetween.
  • the inside gap is sealed by a sealing agent 14 and is supported by spacers 15 located within the inside gap.
  • an electrode film 12 and an alignment film 13 are successively deposited by a CVD or the like.
  • the electrode film 12 may form a transistor, a diode, and/or a picture element electrode in an active matrix LCD and may be a transparent film in a simple matrix LCD.
  • a liquid crystal layer 16 is interposed between the alignment films 13.
  • a polarizer film 17 is located on each outside surface of the glass substrates 11 .
  • Such a liquid crystal display is manufactured by preparing each glass substrate 11 with the electrode film 12 and the alignment film 13, applying the sealing agent 14, and positioning the spacers 15. Thereafter, both the glass substrates 11 are assembled together and are bonded by the sealing agent 14.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)

Abstract

Dans du verre destiné à un affichage à cristaux liquides adapté à un substrat TFT en polysilicium, un point de déformation, une densité et un module de Young sont déterminés pour obtenir la solubilité pertinente, un poids léger et une résistance pour le substrat TFT en polysilicium. Spécifiquement, le point de déformation n'est pas inférieur à 680 DEG C et la densité n'est pas supérieure à 2,45, le module de Young n'étant pas inférieur à 7600 GPA. Le verre peut contenir une combinaison de SiO2, B2O3, Al2O3 et MgO.
PCT/JP2000/004309 1999-06-29 2000-06-29 Substrat en verre et composition de verre destinee a etre utilisee dans un affichage a cristaux liquides Ceased WO2001000538A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001506957A JP4445176B2 (ja) 1999-06-29 2000-06-29 液晶パネル用ガラス基板およびガラス組成物
DE10084754.4T DE10084754B3 (de) 1999-06-29 2000-06-29 Glassubstrat zur Verwendung in einem Flüssigkristallfeld sowie dessen Verwendung und Herstellung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14098699P 1999-06-29 1999-06-29
US60/140,986 1999-06-29

Publications (2)

Publication Number Publication Date
WO2001000538A2 true WO2001000538A2 (fr) 2001-01-04
WO2001000538A3 WO2001000538A3 (fr) 2001-07-05

Family

ID=22493652

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2000/004309 Ceased WO2001000538A2 (fr) 1999-06-29 2000-06-29 Substrat en verre et composition de verre destinee a etre utilisee dans un affichage a cristaux liquides

Country Status (5)

Country Link
JP (1) JP4445176B2 (fr)
KR (1) KR100623805B1 (fr)
DE (2) DE10085618B4 (fr)
TW (1) TW544445B (fr)
WO (1) WO2001000538A2 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004061991A1 (fr) * 2003-01-07 2004-07-22 Samsung Electronics Co., Ltd. Substrat de transistor a couches minces et procede de formation de fil metallique associe
DE102008005857A1 (de) 2008-01-17 2009-07-23 Schott Ag Alkalifreies Glas
US7727916B2 (en) 2001-03-24 2010-06-01 Schott Ag Alkali-free aluminoborosilicate glass, and uses thereof
US8785336B2 (en) 2011-03-14 2014-07-22 Nippon Electric Glass Co., Ltd. Alkali-free glass
US9586854B2 (en) 2011-12-29 2017-03-07 Nippon Electric Glass Co., Ltd. Alkali-free glass
CN118834016A (zh) * 2024-07-19 2024-10-25 湖南邵虹特种玻璃股份有限公司 一种液晶显示器基板玻璃及其制备方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4534282B2 (ja) * 1999-12-14 2010-09-01 旭硝子株式会社 液晶ディスプレイ基板用ガラス
KR20060094164A (ko) * 2005-02-23 2006-08-29 피크뷰 옵토일렉트로닉스 인터내셔널 인코포레이티드 유리기판 제조용 조성물
JP5743125B2 (ja) * 2007-09-27 2015-07-01 日本電気硝子株式会社 強化ガラス及び強化ガラス基板
JPWO2013005402A1 (ja) * 2011-07-01 2015-02-23 ＡｖａｎＳｔｒａｔｅ株式会社 フラットパネルディスプレイ用ガラス基板およびその製造方法
KR102006563B1 (ko) 2015-06-30 2019-08-01 아반스트레이트 가부시키가이샤 디스플레이용 유리 기판의 제조 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2719504B2 (ja) * 1995-02-27 1998-02-25 ホーヤ株式会社 液晶ディスプレイ基板用ガラス
JP3666608B2 (ja) * 1995-04-27 2005-06-29 日本電気硝子株式会社 無アルカリガラス基板
JP3666610B2 (ja) * 1995-08-02 2005-06-29 日本電気硝子株式会社 無アルカリガラス基板
JP3858293B2 (ja) * 1995-12-11 2006-12-13 日本電気硝子株式会社 無アルカリガラス基板
US5824127A (en) * 1996-07-19 1998-10-20 Corning Incorporated Arsenic-free glasses
JP3897194B2 (ja) * 1997-07-24 2007-03-22 日本電気硝子株式会社 無アルカリガラス及びその製造方法
JP3800440B2 (ja) * 1996-08-21 2006-07-26 日本電気硝子株式会社 無アルカリガラス及びその製造方法
JP3800443B2 (ja) * 1996-10-22 2006-07-26 日本電気硝子株式会社 ディスプレイ用無アルカリガラス基板及びその製造方法
US6060168A (en) * 1996-12-17 2000-05-09 Corning Incorporated Glasses for display panels and photovoltaic devices

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7727916B2 (en) 2001-03-24 2010-06-01 Schott Ag Alkali-free aluminoborosilicate glass, and uses thereof
WO2004061991A1 (fr) * 2003-01-07 2004-07-22 Samsung Electronics Co., Ltd. Substrat de transistor a couches minces et procede de formation de fil metallique associe
US7211898B2 (en) 2003-01-07 2007-05-01 Samsung Electronics Co., Ltd. Thin film transistor substrate and method for forming metal wire thereof
DE102008005857A1 (de) 2008-01-17 2009-07-23 Schott Ag Alkalifreies Glas
WO2009090013A1 (fr) * 2008-01-17 2009-07-23 Schott Ag Verre non alcalin
US8785336B2 (en) 2011-03-14 2014-07-22 Nippon Electric Glass Co., Ltd. Alkali-free glass
US9586854B2 (en) 2011-12-29 2017-03-07 Nippon Electric Glass Co., Ltd. Alkali-free glass
CN118834016A (zh) * 2024-07-19 2024-10-25 湖南邵虹特种玻璃股份有限公司 一种液晶显示器基板玻璃及其制备方法
CN118834016B (zh) * 2024-07-19 2025-09-23 湖南邵虹特种玻璃股份有限公司 一种液晶显示器基板玻璃及其制备方法

Also Published As

Publication number Publication date
TW544445B (en) 2003-08-01
DE10084754B3 (de) 2014-07-31
WO2001000538A3 (fr) 2001-07-05
JP2003503301A (ja) 2003-01-28
KR100623805B1 (ko) 2006-09-18
DE10085618B4 (de) 2016-09-29
DE10084754T1 (de) 2003-02-20
KR20020019933A (ko) 2002-03-13
JP4445176B2 (ja) 2010-04-07

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