WO2000006391A1 - Information recording medium and information recording method - Google Patents
Information recording medium and information recording method Download PDFInfo
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- WO2000006391A1 WO2000006391A1 PCT/JP1999/004110 JP9904110W WO0006391A1 WO 2000006391 A1 WO2000006391 A1 WO 2000006391A1 JP 9904110 W JP9904110 W JP 9904110W WO 0006391 A1 WO0006391 A1 WO 0006391A1
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- recording layer
- recording
- layer
- information
- oxide
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0045—Recording
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24312—Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24314—Metals or metalloids group 15 elements (e.g. Sb, Bi)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24318—Non-metallic elements
- G11B2007/2432—Oxygen
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
Definitions
- the recording layer can be partially transformed between a crystalline state and an amorphous state by heating and cooling, and a signal is recorded in the recording layer by a partial transformation of the recording layer.
- the present invention relates to an information recording medium and a method of recording information on the information recording medium.
- JP-A-61-25894 discloses that a mixture of tellurium and tellurium oxide is deposited as an oxygen-containing recording layer on a recording medium substrate by electron beam evaporation or sputtering.
- JP—A—2—25 25 57 77 discloses that a tellurium-containing compound is deposited as a recording layer containing oxygen on a recording medium substrate by sputtering in a mixed gas of argon and oxygen.
- JP-A-63-3-5868636 discloses that a compound containing germanium oxide and tellurium is deposited as a recording layer containing oxygen on a recording medium substrate by electron beam evaporation; and Disclosed is that a tellurium-containing compound is deposited as a recording layer containing oxygen on a recording medium substrate by sputtering in a mixed gas of argon and oxygen.
- An object of the present invention is to suppress the change of recorded information with time, and to make clear reading of Z or recorded information clear. It is an object of the present invention to provide an information recording medium and an information recording method for ensuring the above.
- the recording layer in the crystalline state surrounding the recording layer in the amorphous state is prevented from growing and entering the crystal (epitaxial) inside the recording layer in the amorphous state, and / or the recording layer in the amorphous state
- the fact that the recording layer contains oxygen means that the transformed portion changes, in particular, a record that has been transformed from a crystalline state to an amorphous state. Suppresses recrystallization of a part of the layer and suppresses the change of recorded information over time.
- MA Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, Fe,
- the ratio of the content of oxygen in the recording layer to the content of all atoms in the recording layer is 2 atoms. If it is less than / 0, it will be difficult to obtain the effect of stabilizing the recording marks formed by the partial transformation of the recording layer. On the other hand, if it is higher than 20 atomic%, it is difficult to easily realize the transformation between the crystalline state and the amorphous state. In order to further enhance the recording mark stabilizing effect, the content is preferably 3 to 15 atomic%, and more preferably 8 to 14 atomic%.
- the recording layer contains oxygen as an oxide stably retains oxygen in the recording layer, and diffuses components from an amorphous state part and / or a crystal part and / or into or into the recording layer, and Suppresses crystal growth from Z or crystal part into amorphous state part.
- the recording layer contains Ge, Sb, and Te
- the content a of at least a portion of Ge as an oxide in the recording layer a, and the content b of other portions of Ge in the recording layer other than at least a portion of Ge as an oxide Is preferably in the range of 0.02 ⁇ aZ (a + b) ⁇ 0.5.
- the recording layer contains Ge, Sb, and Te
- the recording layer contains at least a part of Sb as an oxide.
- the content c of at least a part of Sb as an oxide in the recording layer and the content d of other parts of Sb in the recording layer other than at least a part of Sb as an oxide Is preferably in the range of 0.01 ⁇ c / (c + d) ⁇ 0.2.
- the content of each element is such that Ge is 10 to 30 atoms. /. 31) is a force in the range of 10 to 30 atomic% and Te is in the range of 40 to 80 atomic%, or Ge is 35 to 65 atomic%, 31) is 10 to 30 atomic%, and Te is 35 to 65 atomic%.
- the content is in the range of atomic%, the phase change between the amorphous phase and the crystalline phase can be easily performed, and the information can be rewritten.
- the recording layer when the recording layer contains Ag, In, Sb, and Te, the recording layer preferably contains at least a part of In as an oxide.
- the content e of at least a part of In as the oxide in the recording layer and the other part of In in the recording layer other than at least a part of In as the oxide The relationship between the content f and the content f is preferably in the range of 0.01 ⁇ e / (e + f) ⁇ 0.5.
- the recording layer preferably contains at least a part of Sb as an oxide.
- Content g of at least a part of Sb as an oxide in the recording layer, and content of other parts of Sb in a recording layer other than at least a part of Sb as an oxide Preferably, the relationship with h is in the range of 0.01 ⁇ g / (g + h) ⁇ 0.2.
- the recording layer comprises Ag, I n, S b, the Te, the content of each element
- S b is 45 to 80 atomic 0/0
- a phase change between an amorphous phase and a crystalline phase can be easily performed, and information can be rewritten.
- N is 1 to 10 atoms.
- Addition in the range of / 0 has the effects of increasing the crystallization temperature of the amorphous phase or increasing the activation energy.
- the recording layer is partially heated by light beam or electron beam irradiation.
- the oxygen or oxide inhibits at least partially the direct contact between the amorphous phase and the crystalline phase, thereby preventing the crystal growth like epitaxy. Therefore, it can be considered that the stability of the amorphous mark is improved.
- the recording layer contains oxygen as an oxide in the recording layer.
- the viscosity of a part of the recording layer is increased by the oxide contained in the part of the recording layer.
- At least part of the boundary between the surrounding recording layer and the rest of the recording layer should be round and smooth so that one of the "0" and "1" states of the signal to be recorded is
- One of the "0" state and the "1” state of the signal is caused by at least a part of the boundary between the round and smooth part of the recording layer and the other part of the recording layer to the signal recording medium.
- a part of the recording layer after being cooled so as to be solidified may be in an amorphous state, and the other part of the recording layer may be in a crystalline state, or the part after being cooled so as to be solidified.
- a part of the recording layer may be in a crystalline state, and the other part of the recording layer may be in an amorphous state.
- the above method is extremely effective especially when the recording density is increased.
- a spiral groove or a plurality of concentric grooves on the substrate, a plurality of grooves that extend substantially in the circumferential direction and are arranged in parallel in the radial direction, and between the grooves,
- a plurality of land areas extending in the circumferential direction and arranged in parallel in the radial direction
- at least one of the plurality of grooves and the plurality of land areas is a recording track for recording a signal.
- the smaller the radial spacing of the recording tracks the higher the recording density.
- the above-described method is more effective when the distance between the recording tracks in the radial direction is ⁇ or less, and is particularly effective when the distance is 0.7 ⁇ or less.
- the recording density increases as the area of the recording layer cooled so as to be solidified after heating and melting, that is, the minimum circumferential length of the recording mark decreases. If the minimum length of the recording mark in the circumferential direction is less than 0.7 ⁇ , the size of the mark shape distortion due to epitaxy-like crystal growth at the mark boundary with respect to the mark size will increase, and the change in the mark shape will increase.
- the above method is effective because the influence on the signal quality increases. It is more effective when the minimum length of the recording mark in the circumferential direction is 0.5 ⁇ or less.
- oxygen When oxygen is contained, diffusion of oxygen from the recording layer to the outside is suppressed, and oxygen is stably retained in the recording layer.
- the protective layer contains oxygen, the diffusion of oxygen from the protective layer into the recording layer is suppressed because the recording layer contains oxygen.
- the protective layer contains nitrogen, the change of the recording layer from the amorphous state to the crystalline state, that is, the crystal growth of the crystalline layer of the recording layer in the amorphous layer of the recording layer is suppressed.
- the ratio of the nitrogen content in the protective layer to the content of all atoms in the protective layer is 1 atomic% or more and 50 atomic% or less. It is preferable that the protective layer comprises a Z n S and S i 0 2. If the protective layer contains at least one of chromium oxide, tantalum oxide, aluminum oxide, and germanium nitride, component diffusion between the protective layer and the recording layer is suppressed, and the components of the recording layer are stable. When the protective layer contains nitrogen, its content is preferably 1 atomic% or more and 50 atomic% or less.
- the nitrogen content gradient in the film thickness direction in the region where the recording layer and the protective layer are in contact is 1 atomic% Z nm or more and 50 atomic% or less.
- the oxygen content of the recording layer and the nitrogen content of the protective layer it is possible to obtain the storage stability of the amorphous mark at room temperature and the excellent erasing performance at high temperature. It becomes possible to obtain a rewritable medium.
- a material for the protective film a mixture of ZnS and SiO 2 is preferable because of its low thermal conductivity and good recording sensitivity.
- S is diffused into the recording layer by rewriting many times more than 100,000 times, and the optical constant of the recording layer may be changed to cause a decrease in reflectance.
- Chromium oxide, tantalum oxide, aluminum oxide, and germanium nitride can be used as the protective layer material.
- chromium oxide has a large optical constant and is excellent in that a large difference in the reflectance between the amorphous phase and the crystal layer can be obtained due to the multiple interference effect.However, it has a disadvantage that stress is large depending on the film forming conditions. . Tantalum oxide is excellent in that it has a large heat capacity and therefore can have a large cooling effect after the recording film is heated and melted. Has the disadvantage of becoming Aluminum oxide is extremely stable Oxide but weak adhesion to the recording film. Germanium nitride is excellent in terms of adhesion to the recording film, but has a drawback in that it is brittle in bulk and difficult to form by sputtering or the like because it is a material.
- Each of these protective layer materials has superior and inferior points, but by mixing them, there are combinations that eliminate their respective disadvantages and show only advantages.
- a material other than the above-mentioned materials may be added to the above-mentioned protective layer material.
- B i 2 S e 3, B i 2 S 3, Mg F 2, Ce F 3, Ca F 2, Ta N, S i 3 N 4, A 1 N, C r N, BN, S i, T i B 2 , B 4 C, S i C, B, C and those having compositions similar to these can be used
- the oxygen concentration is the ratio of the number of oxygen atoms to the total number of atoms in a unit volume. If the oxygen concentration in the recording layer changes in the thickness direction of the recording layer, the oxygen concentration comes into contact with the recording layer
- the change in viscosity and the change in reflectance between the surface of the recording layer and the inside of the recording layer can be set as desired, while the component diffusion characteristics between the layer and the surface of the recording layer are set as desired.
- Adjustment of the oxygen concentration in the recording layer may be performed by oxidizing the recording layer in a gas containing oxygen after the recording layer is formed, or an atmosphere gas during the deposition of the recording layer.
- the control may be performed by controlling the oxygen concentration of the above.
- the oxygen concentration increases from approximately the center of the recording layer to at least one of the surfaces on both sides of the recording layer, one of the layers that contacts the recording layer if the oxygen concentration increases. Maintains a high reflectance under the amorphous state at a point almost at the center of the recording layer while suppressing component diffusion between the recording layer and the surface of the recording layer.- A point almost at the center of the recording layer in the thickness direction of the recording layer From both sides, if the oxygen concentration increases towards each of the surfaces on both sides of the recording layer, it is noted that both layers are in contact with the recording layer. While suppressing the diffusion of components to and from the recording layer surface, the reflectivity under the amorphous state at a substantially central point of the recording layer is kept high.
- the oxygen concentration increases from the point substantially at the center of the recording layer toward at least one of the surfaces on both sides of the recording layer.
- the increase is at least up to two times.
- the second surface has an oxygen concentration near the first surface (or oxygen concentration at the first depth from the first surface), the oxygen concentration at the second surface (or approximately the first depth from the second surface) If the oxygen concentration at the first surface is lower than the oxygen concentration at the second surface, the oxygen concentration at the first surface increases toward the oxygen concentration at the second surface due to oxidation of the first surface by oxygen passing through the resin substrate.
- the oxygen concentration on the surface on both sides in the thickness direction of the layer is made uniform.
- the reflective layer is generally metallic, and has a lower oxygen permeability than a resin substrate.
- the reflection layer As a material used for the reflection layer, Au, Ag, Cu, A1, or a material containing at least one of these elements as a main component is preferable because the reflectance is extremely high. When these elements are used alone, the reflectance is extremely high, but the recording sensitivity is reduced due to the extremely high thermal conductivity.
- Au-Ag and Au-Cu also have high reflectivity and can be reflective layers with low thermal conductivity.
- the oxygen concentration at the first surface is equal to the oxygen concentration at the second surface (or at a second depth approximately equal to the first depth from the second surface).
- the pair of recording layers is included in the information recording medium and the reflective layer is disposed relatively inward of the substrate in the information recording medium, and the information is recorded by recording and / or reproduction.
- the temperature of a relatively inner point in the medium becomes higher than the temperature of a relatively outer point, oxidation of the second surface proceeds due to diffusion of oxygen from the protective layer, so that oxygen on the second surface is increased.
- the concentration increases toward the oxygen concentration on the first surface, and the oxygen concentration on both surfaces in the thickness direction of the recording layer is made uniform.
- the pair of recording layers is included in the information recording medium and the reflective layer is included in the information recording medium.
- the temperature at the relatively inner point in the information recording medium becomes higher than the temperature at the relatively outer point in the information recording medium due to recording and Z or reproduction, Suppresses the progress of oxidation at substantially the center of the recording layer.
- the oxygen content of the recording layer in the first area and the second area The difference from the oxygen content of the recording layer is 18 atoms. It is preferably at most / 0 .
- the difference between the oxygen content of the recording layer in the region and the oxygen content of the recording layer in the second region is 18 atoms. It is preferably at most / 0 .
- the difference between the oxygen content of the recording layer in the first area where information can be recorded as described above and the oxygen content of the second area where only the predetermined information recorded in advance is reproduced is 18%. If it exceeds, the reflectance difference between the two will increase, and it will become difficult to reproduce the information in both the first and second areas in a similar manner.
- a recording layer is formed by a method such as sputtering on an information recording medium having the first region and the second region as described above, the oxygen content of the first region and the second region immediately after the formation is The values are almost equal, and the reflectances of the two are almost the same, so that there is no hindrance to reproduction.However, the predetermined information in the second area is recorded by embossed pits.
- the physical shape is different from the first area in which only the grooves for recording and the gap between the grooves are formed, so that the way of oxygen diffusion inside the recording layer over time and the way of intrusion of oxygen from outside Can be different.
- the recording layer in the first area undergoes an atomic arrangement change, so that oxidation is promoted as compared to the recording layer in the second area, Conversely, oxides can be eliminated. If the recording layer contains oxygen in advance, the above-mentioned problems are less likely to occur, and the difference between the oxygen content of the first area and the oxygen content of the second area after the time change or after multiple recordings is 18% or less. Can be held down.
- An information recording method for partially transforming the recording layer between a crystalline state and an amorphous state and recording a signal in the recording layer by partial transformation of the recording layer comprising:
- the signal has a state of "0" and a state of "1", and one of the states of "0" and "1" to be recorded is a part of the recording layer and another of the recording layer.
- One of the "0" state and the "1" state defined and recorded by at least a part of the boundary between the parts is recognized in at least part of the boundary.
- the recording layer contains oxygen as an oxide in the recording layer, and when a part of the recording layer is heated and melted, the oxide contained in the part of the recording layer causes a part of the recording layer to be melted.
- the viscosity is maintained to a high degree to maintain the surface tension of a part of the recording layer to a high degree, whereby the part of the recording layer that has been melted and then cooled so as to be solidified and the recording layer If at least part of the boundary between the other parts of the signal is round and smooth, one of the "0" and "1" states of the signal to be recorded is at least one of the boundaries One of the "0" state and the "1" state of the signal, defined and recorded by the part, is recognized in at least a part of the boundary when the "0" state of the signal is recognized.
- One of the states and the state of "1" is that at least the boundary between one part of the round and smooth recording layer and the other part of the recording layer In part by, and as it can be clearly reliably defined when recording to the signal recording medium, it can be clearly recognized reliably and when reading from the signal recording medium.
- a part of the recording layer after being cooled so as to be solidified is in an amorphous state;
- the other part of the recording layer may be in a crystalline state, or a part of the recording layer after being cooled to be solidified may be in a crystalline state, and the other part of the recording layer may be in an amorphous state. Les ,. It is preferable that a part of the recording layer is heated and melted by light beam irradiation.
- the recording layer has a first recording layer (4b) and a second recording layer (4a), and the oxygen concentration is sharp between the first recording layer and the second recording layer in the recording layer thickness direction. (Compared to the change in oxygen concentration in the first and second recording layers), the average oxygen concentration in the first recording layer, averaged along the thickness direction of the recording layer, is And the thickness of the first recording layer may be greater than the thickness of the second recording layer.
- the recording layer may have a plurality of second recording layers, and the first recording layer may be disposed between the second recording layers.
- FIG. 1 is a schematic sectional view showing the structure of a phase change (transformation) type information recording medium according to an embodiment of the present invention.
- FIG. 2a is a cross-sectional view of a radially cut substrate showing a groove of the substrate on which the recording layer according to the present invention is disposed and lands protruding from the groove.
- FIG. 2b shows two embodiments of a substrate on which a recording layer according to the invention is arranged (a plurality of concentric grooves extending substantially radially parallel to a radial direction and a plurality of lands).
- FIG. 2 is a front view showing a concentric surface shape to be formed, and a spiral surface shape that forms a plurality of grooves and a plurality of lands that are arranged in the radial direction and that extend substantially in the circumferential direction.
- FIG. 3 is a schematic diagram showing a relationship between a recording mark and one of a “1” state and a “0” state of a signal to be read from or recorded by the recording mark. When the level of the recording signal changes, one of the "1" state and the "0" state of the signal is read and recorded.
- FIG. 4 is a schematic partial cross-sectional view showing that the recording layer may be composed of a plurality of layers so that the oxygen concentration differs in the thickness direction.
- Figure 5 shows the relationship between the oxygen concentration, the shortest recorded mark length, and the jitter after the acceleration test.
- Figure 6 shows the relationship between oxygen concentration, track pitch and jitter after the acceleration test.
- a substrate 1a was prepared in which a radially parallel groove 1 'extending and a radially parallel land portion 1 "extending substantially circumferentially were prepared in advance.
- a groove 1' The radial distance between the center and the center of the adjacent land 1 "was 0.74 / m.
- This substrate 1a was placed in a first sputtering chamber in a sputtering apparatus having a plurality of sputtering chambers and excellent in uniformity of layer thickness and reproducibility.
- a thickness of 90 nm by sputtering rings in argon gas (Z n S) 80 Mo and (S I_ ⁇ 2) 20 (80 and 20 %) Of the first overlay layer 2 was formed on the substrate 1a. Then, after moving the substrate to a second sputtering chamber, C r 2 0 3 was used, the first protective layer 3 of C r 2 O 3 of 20 nm thick was laminated by sputtering in an argon gas as a target Was. After moving this substrate to the third sputtering chamber,
- the recording layer 4 was laminated with a thickness of 16 nm by sputtering in argon gas. Then, a mixed gas of argon and oxygen having an oxygen partial pressure of 10% was introduced into the third sputtering chamber at a gas flow rate of 200 SCCM for a certain period of time to oxidize the surface of the recording layer 4. Next, the substrate was moved to the fourth sputtering chamber, and a thickness of 18 nm was formed by sputtering in the same manner as in the formation of the first overlay layer.
- a second protective layer 5 of (ZnS) 80 (Sio2) 20 (80 and 20 is mol%) was laminated. Then, using the A 1 C r alloy fifth sputtering chamber as data one Ggetto, A 1 94 C r 6 first thickness of the reflective layer 6 35 nm (atomic. / 0 and 94 and 6) by sputtering was laminated. Finally with A 1 T i alloy as Targ Tsu preparative sixth sputtering chamber chamber by sputtering A 1 99 T i! (99% and 1 are% by weight) of the second reflective layer 7 having a thickness of 35 nm. The substrate on which the protective layer, the reflective layer, and the overlay layer are laminated is removed from the sputtering apparatus, and an ultraviolet curable resin is placed on the uppermost layer The protective layer 8 was applied by spin coating.
- the resin protective layer 8 ' was laminated, and the two substrates la and 1b were opposed to each other with the ultraviolet curable resin protective layers 8 and 8' facing inside, and were bonded together with the adhesive layer 9.
- the diameter of the adhesive layer was set to 118 mm or more, peeling of the adhesive layer due to impacts such as dropping became difficult to occur.
- the same oxidation treatment as that of the recording layer 4 was performed on the recording layer 4 ′.
- the discs were prepared by changing the oxygen content or oxygen concentration in the recording layer by changing the time during which a mixed gas of argon and oxygen was added to the recording layer.
- initialization was performed by irradiating a laser beam having an elliptical beam with a wavelength of 810 nm, a beam major axis of 75 mm, and a minor axis of 1 mm.
- the disc is rotated to a linear velocity of about 6 m / s, and a semiconductor laser beam with a wavelength of 660 nm is condensed by an NA0.6 objective lens, irradiated onto the recording layer through the substrate, and recorded and reproduced.
- NA0.6 objective lens irradiated onto the recording layer through the substrate
- a random signal modulated with 8-16 modulation was recorded using a waveform in which the laser power was modulated between 111111 and 5111 ⁇ ⁇ .
- a record mark was formed at a power of llmW, and direct overwriting was performed to erase with a power of 5mW.
- a multipulse recording waveform that divides recording pulses other than the shortest mark into a plurality was used. Recording was performed both on the groove and on the land.
- Sample 8 in which the recording layer was not oxidized, the jitter after the accelerated test was significantly increased as compared with Samples 1 to 7.
- sample 1 which had the longest mixed gas inflow time, the jitter did not change before and after the accelerated test, but the initial jitter was significantly worse than in sample 28.
- Sample 17 the recording layer was oxidized by flowing a mixed gas containing oxygen after the recording layer was formed.However, the recording layer was formed by sputtering in a mixed gas atmosphere of argon and oxygen. Can also oxidize the recording layer.
- the Ge content is 10 30 atoms. /.
- the Sb content is 10 to 30 atoms. /.
- the Te content is changed in the range of 4080 at%, or the Ge content is 35 65 atoms. /.
- the Sb content is 10 30 atoms. /. The same results as above were obtained when using a recording layer in which the Te content was changed in the range of 3565 at%.
- a part or all of Ag is replaced to form Au, Cu Pd, Ta, W, IrScYTi, Z, VNbCr, MoMn, Fe, RuCoRhNi, Ag 110 atoms of at least one element of TlS, Se, Pt and N. Similar results were obtained when the addition was in the range of / 0 .
- a 2 nm-thick second recording layer 4a was formed using a mixed gas of argon and oxygen as a sputtering gas.
- the second recording layer 4a having a thickness of 2 nm is formed again by changing to a mixed gas of oxygen and oxygen, and the oxidation treatment is not performed by flowing the argon-oxygen mixed gas after the formation of the recording layer, the reflectivity of the disk is reduced. A higher effect was obtained.
- the average oxygen content of the first and second recording layers is adjusted from 2 atomic% to 20 atomic% by changing the oxygen partial pressure of the mixed gas when forming the second recording layer, the jitter due to the acceleration test The rise was similar to Table 1.
- the oxygen content of the first recording layer was 1/3 or less of the oxygen content of the second recording layer, the disk reflectance increased by 2%.
- the second recording layer 4a When the second recording layer 4a was formed on only one of the first recording layers 4b, characteristics similar to those formed on both sides were obtained. Similar characteristics were obtained when the film thickness of the second recording layer 4a was changed in the range of 1 to 10 nm.However, when the film thickness was increased to 5 nm or more, the recording sensitivity deteriorated, and it was necessary for recording. Power increased by about 1 mW.
- the same substrate 1a as in Example 1 was placed in a first sputtering chamber in a sputtering apparatus having a plurality of sputtering chambers and having excellent layer thickness uniformity and reproducibility.
- a thickness of 90 nm by sputtering in argon gas (Z n S) 80 (S i 0 2) 20 (80 A and 20 mole 0 / 0 ) was formed on the substrate 1a.
- Z n S argon gas
- Cr 2 O 3 was used as a target, and a 20 nm-thick first protective layer 3 of Cr 2 O 3 was deposited by sputtering in argon gas. did.
- An A 1 Ti alloy was used as a target, and a second reflective layer 7 having a thickness of 35 nm was deposited by sputtering with A 1 99 Ti ⁇ (99 and 1 being% by weight).
- the substrate on which the overlayer, the protective layer, the recording layer, and the reflective layer were laminated was taken out of the sputtering apparatus, and the ultraviolet curable resin protective layer 8 was formed on the second reflective layer 7 by spin coating.
- the substrate 1 b On another similar substrate 1 b,
- each sample disk was initialized in the same manner as in Example 1, and a drive signal was used to record a random signal 8-6-1 modulated. After that, an acceleration test was performed in which these disks were left in an environment of 70% and 90% for 40 days.After the acceleration test, a playback test was performed on the drive, and the number of disks whose error rate was at least twice as high as before the test Was examined.
- a is the content of Ge in oxide state
- b is the content of Ge in non-oxide state of metal or alloy
- c is the content of Sb in oxide state
- d is It is the content of Sb in the non-oxide state of the metal or alloy.
- the Ge content is 10 to 30 atom%, and 31) the content is 10 to 30 atom. /.
- T e when the content was used a recording layer was changed within a range of 40 to 80 atomic%, or G e content of 35 to 65 atomic%, S b content of 10-30 atomic 0/0, T The same results as above were obtained when using a recording layer in which the e content was changed in the range of 35 to 65 atomic%.
- a part or all of Ag is substituted to Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, F e, Ru, Co, At least one element of Rh, Ni, Ag, Tl, S, Se, Pt and N is 1 to 10 atoms. Similar results were obtained when the addition was in the range of / 0 .
- the first protective layer 2 was formed on the substrate 1a.
- argon As a sintered body, argon
- the recording layer 4 was laminated with a thickness of 20 nm by sputtering in a gas. Thereafter, the substrate was moved to an oxide formation chamber, and left in an oxygen atmosphere for a certain time to oxidize the recording layer 4. Next, the substrate is moved to the third sputter chamber, and a thickness of 20 nm is formed in the same manner as the formation of the first protective layer.
- Example 1 The technical limitation, except that recording was performed only on the groove, was as described in Example 1.
- the disc was placed in an environment at 80 ° C and 90%.
- An acceleration test in which the sample was allowed to stand for 200 hours was performed below, and the jitter was measured after the acceleration test.
- the oxygen partial pressure and the storage time were changed and the content of In oxide and Sb oxide in the recording layer was changed, the jitter before and after the acceleration test was as follows.
- the content of In oxide and Sb oxide in the recording layer was measured using an XPS apparatus, and the XPS spectra of In and Sb were separated by peaks.
- e is the In content in the oxide state
- f is the In content in the non-oxide state of the metal or alloy
- g is the Sb content in the oxide state
- h is The content of Sb in the non-oxide state of the metal or alloy.
- the recording layer was oxidized by leaving the recording layer in an oxygen atmosphere.However, the recording layer was also oxidized by forming the recording layer in a mixed gas atmosphere of argon and oxygen. Can be.
- the Ag content is 1 to 15 atoms. /.
- the content is 1 to 15 atom%, and the Sb content is 45 to 80 atom. /.
- the same results as described above were obtained when using a recording layer in which the Te content was changed in the range of 20 to 40 atomic%.
- Example 2 The same substrate 1a as that of Example 1 was placed in a first sparch chamber in a sputtering apparatus having a plurality of sputter chambers and having excellent film thickness uniformity and excellent reproducibility. Using a mixture of ZnS and SiO 2 as a target, a 90 nm thick
- a 1 94 C r 6 (atom. / 0) and the first reflective layer 6 was formed with a thickness of 35 nm.
- the laminated substrate was taken out from the sputtering apparatus, and an ultraviolet curable resin protective layer 8 was formed on the uppermost layer by spin coating.
- an ultraviolet curable resin protective layer 8 was formed on the uppermost layer by spin coating.
- Oxygen-containing organic content in the recording film is kept constant at 8 atomic%, Z n S- S i 0 2 - by changing the N nitrogen concentration in the mixed gas of argon emissions and nitrogen during deposition of the second protective layer Z n S- S i O 2 - when changing the n nitrogen content of the second protective layer, disc number of sheets after the acceleration test Erareto is increased more than 2 times were as follows.
- the oxygen content in the recording film and the nitrogen content in the second protective layer were measured by using forge electron spectroscopy.
- the reproduction error rate not only doubled or increased with nine out of ten discs but also with eight of those discs. A phenomenon that made it extremely difficult. Nitrogen content 50 atoms. In some cases, the reproduction error was more than doubled in the case of / 0 , 25 atomic%, but no phenomenon that made reproduction difficult in these disks occurred.
- Example 2 After recording on a disk manufactured in the same manner as in Example 1 with the shortest mark length changed, an acceleration test was performed in which the sample was left for 100 hours in an environment with a temperature of 90% and a relative humidity of 80% to accelerate. After the test, the jitter was measured. The radial distance between the center of the groove 1 'and the land 1 "adjacent to it is 0.74 ⁇ , and recording is performed both on the groove and on the land. I got it.
- the modulation method is a mark position method in which information of 1 is placed at the mark position and information of 0 is placed at other positions, and information 1 is placed at the end of the mark and information is placed at other positions. We examined both of the mark edge methods. When the oxygen content in the recording film was changed, the jitter after the acceleration test changed as shown in FIG.
- FIG. 2 It is made of a transparent material (eg, polycarbonate resin, glass, etc.) with a diameter of 120 mm and a thickness of 0.6 mm, as shown in FIG. 2 (ie, on a concentric or spiral surface).
- a radially extending groove 1 ′ extending substantially in the circumferential direction and a radially extending land 1 ′′ extending substantially in the circumferential direction are formed, and the center of the groove 1 ′ and the land adjacent thereto are formed.
- substrates 1a having different distances from the center of 1 "were prepared.
- the modulation method is a mark position method in which information of 1 is placed at the position of the mark and information of 0 is placed at the other position, and information 1 is placed at the end of the mark and information of 0 is placed at the other position. Both mark edge methods were studied.
- FIG. 2 It is made of a transparent material (eg, polycarbonate resin, glass, etc.) with a diameter of 120 mm and a thickness of 0.6 mm, as shown in FIG. 2 (ie, on a concentric or spiral surface).
- a transparent material eg, polycarbonate resin, glass, etc.
- lands 1 ′′ extending substantially in the circumferential direction
- these grooves 1 ′ or lands 1 ′′ are formed.
- the circumferential direction it is divided into a plurality of groove portions or a plurality of land portions, and in the region between the groove portions or the land portions, the groove 1 ′ or the land portion 1 ′′ extends in the circumferential direction along which it extends.
- substrate 1 a of the embossed pits are formed indicating, for example Adoresu information substantially along. both on the substrate, to prepare a disk in the same manner as in example 1, the groove 1 'and the land portion 1 " Record track After recording 10,000 times on multiple recording tracks, an acceleration test was performed in which the device was left in an environment at a temperature of 90 ° C and a relative humidity of 80% for a certain period of time.
- the relationship between the oxygen content in the recording layer of the area where the emboss pits indicating information and the like are formed, that is, the second area where only predetermined information is reproduced, and the reflectance of the first area and the second area is as follows. Has changed to
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Abstract
Description
明 細 書 情報記録媒体と情報記録方法 発明の属する技術分野と従来技術: Description Information recording medium and information recording method Technical field to which the invention pertains and prior art:
本発明は、 記録層が加熱及び冷却されることにより部分的に結晶状態とァモル ファス状態との間で変態可能であり、 信号が記録層の部分的変態により記録層内 に記録されるようにされるようにされた、 情報記録媒体と、 該情報記録媒体に情 報を記録する方法に関する。 According to the present invention, the recording layer can be partially transformed between a crystalline state and an amorphous state by heating and cooling, and a signal is recorded in the recording layer by a partial transformation of the recording layer. The present invention relates to an information recording medium and a method of recording information on the information recording medium.
J P— A— 6 1— 2 5 9 4は、 テルルとテルル酸化物との混合物を、 電子ビー ム蒸着又はスパッタリングにより、 記録媒体基板上に酸素を含む記録層として付 着させることを開示する。 JP-A-61-25894 discloses that a mixture of tellurium and tellurium oxide is deposited as an oxygen-containing recording layer on a recording medium substrate by electron beam evaporation or sputtering.
J P— A—2— 2 5 2 5 7 7は、 テルルを含む化合物を、 アルゴンと酸素との 混合ガス中でスパッタリングにより、 記録媒体基板上に酸素を含む記録層として 付着させることを開示する。 JP—A—2—25 25 57 77 discloses that a tellurium-containing compound is deposited as a recording layer containing oxygen on a recording medium substrate by sputtering in a mixed gas of argon and oxygen.
J P— A— 6 3— 5 8 6 3 6は、 ゲルマニウムの酸化物とテルルとを含む化合 物を、 電子ビーム蒸着により、 記録媒体基板上に酸素を含む記録層として付着さ せること、 並びに、 テルルを含む化合物を、 アルゴンと酸素との混合ガス中でス パッタリングにより、 記録媒体基板上に酸素を含む記録層として付着させること を開示する。 JP-A-63-3-5868636 discloses that a compound containing germanium oxide and tellurium is deposited as a recording layer containing oxygen on a recording medium substrate by electron beam evaporation; and Disclosed is that a tellurium-containing compound is deposited as a recording layer containing oxygen on a recording medium substrate by sputtering in a mixed gas of argon and oxygen.
発明が解決しょうとする課題と、 課題を解決するための手段及びその作用: 本発明の目的は、 記録された情報の経時的変化を抑制し、 及び Z又は記録され た情報の明瞭な読み出しを確実にする、 情報記録媒体並びに情報記録方法を提供 することである。 特に、 アモルファス状態の記録層部分内に、 アモルファス状態 の記録層部分を取り巻く結晶状態の記録層部分が結晶 (エピタキシー) 成長して 侵入することが防止される、 及び又は、 アモルファス状態の記録層部分とァモル ファス状態の記録層部分を取り巻く結晶状態の記録層部分との間の境界が明瞭で 滑らかな情報記録媒体並びに情報記録方法を提供することである。 Problems to be Solved by the Invention, Means for Solving the Problems and Actions of the Problems: An object of the present invention is to suppress the change of recorded information with time, and to make clear reading of Z or recorded information clear. It is an object of the present invention to provide an information recording medium and an information recording method for ensuring the above. In particular, the recording layer in the crystalline state surrounding the recording layer in the amorphous state is prevented from growing and entering the crystal (epitaxial) inside the recording layer in the amorphous state, and / or the recording layer in the amorphous state It is an object of the present invention to provide an information recording medium and an information recording method in which the boundary between the recording layer in the amorphous state and the crystalline layer surrounding the recording layer in the amorphous state is clear and smooth.
近年、 いわゆる光ディスクが広く普及してきており、 これに伴ってより過酷な 環境下で光ディスクが使用、 保存されるようになってきた。 したがって、 これま で以上に光ディスクの信頼性を向上させる必要が生じてきている。 このような観 点から上記した材料について種々の耐久性試験を行った結果、 一旦情報を記録し たディスクを高温かつ多湿な過酷環境下に長時間保管した後、 ジッタ一などの信 号品質が劣化するといつた問題が見出された。 これを詳細に調べたところ、 ァモ ルファスマークと結晶相とが接している部分で結晶相の一部がヱピタキシャル成 長的に結晶成長し、 ァモルファスマークの形状が変化していることがわかつた。 また、 アモルファスマーク中央付近、 すなわち結晶相と接していない部分ではま つたく変化が生じていないことがわかった。 この問題を解決するために、 記録膜 の材料、 組成を種々変えて検討し、 活性化エネルギーの大きな記録膜を用いてァ モルファスマークの安定性向上を図ったが、 やはり同様の現象が生じた。 これら のことから、 この現象はアモルファスの活性化エネルギーを大きくしてァモルフ ァス相の熱力学的安定性を向上させても解決にいたらず、 これまでに着目されて こなかつた視点から改善を行う必要があることがわかつた。 本発明者らは上記の 問題を解決すべく、 種々の検討を行ったところ、 記録膜のアモルファスマークと 結晶相とが接している界面の改善がきわめて重要であり、 記録膜に含まれる酸素 含有量を工夫することによつて上記の問題を解決することができることを見出し た。 In recent years, so-called optical disks have become widespread, and with this, more severe Optical discs have been used and stored under environmental conditions. Therefore, there is a need to further improve the reliability of the optical disk. From these viewpoints, various durability tests were conducted on the above-mentioned materials. As a result, once the disk on which information was recorded was stored for a long time in a high-temperature and humid severe environment, the signal quality such as jitter was reduced. A problem was found when it deteriorated. Inspection of this in detail revealed that a portion of the crystal phase grew epitaxially at the point where the amorphous mark was in contact with the crystal phase, and that the shape of the amorphous mark changed. Wakata. It was also found that no change occurred in the vicinity of the center of the amorphous mark, that is, in the portion not in contact with the crystal phase. In order to solve this problem, we investigated various materials and compositions of the recording film and tried to improve the stability of amorphous marks using a recording film with a large activation energy, but the same phenomenon also occurred . For these reasons, this phenomenon has not been solved even if the activation energy of the amorphous phase is increased to improve the thermodynamic stability of the amorphous phase, and this phenomenon has not been solved from a viewpoint that has been focused on so far. I knew I needed to do it. The present inventors have conducted various studies in order to solve the above-mentioned problem. As a result, it is extremely important to improve the interface between the amorphous mark and the crystalline phase of the recording film, and the oxygen content of the recording film It has been found that the above problem can be solved by modifying the amount.
基板と基板上の記録層とを有し、 記録層は部分的に加熱および冷却されること により部分的に結晶状態とアモルファス状態との間で変態可能であり、 信号が記 録層の部分的変態により記録層内に記録されるようにされるようにされた、 情報 記録媒体において、 該記録層が酸素を含むことは、 変態した部分の変化、 特に、 結晶状態からアモルファス状態に変態した記録層の一部の再結晶化を抑制し、 記 録された情報の経時的変化を抑制する。 本発明の記録層としては、 Ge—S b— Te系、 I n— S b— Te系、 Ag— I n— S b— Te系、 MA— G e— S b— T e系 (MAは Au、 Cu、 P d、 Ta、 W、 I r、 S c、 Y、 T i、 Z r、 V、 Nb、 C r、 Mo、 Mn、 F e、 Ru、 Co、 Rh、 N i、 Ag、 T l、 S、 S eおよび P tのうちの少なくとも 1元素) 、 S n— S b— Te系、 I n— S e— T l系、 I n— S e— T l— MB系 (MBは Au、 Cu、 P d、 Ta、 W、 I r、 S c、 Y、 T i、 Z r、 V、 Nb、 C r、 Mo、 Mn、 F e、 Ru、 Co、 Rh、 N i、 Ag、 T l、 S、 T eおよび P tのうちの少なくとも 1元素) 、 S n— S b— S e系などの材料が使用可能である。 A substrate and a recording layer on the substrate, wherein the recording layer can be partially transformed between a crystalline state and an amorphous state by being partially heated and cooled, and a signal is partially transmitted to the recording layer. In an information recording medium, which is adapted to be recorded in a recording layer by transformation, the fact that the recording layer contains oxygen means that the transformed portion changes, in particular, a record that has been transformed from a crystalline state to an amorphous state. Suppresses recrystallization of a part of the layer and suppresses the change of recorded information over time. As the recording layer of the present invention, Ge—Sb—Te system, In—Sb—Te system, Ag—In—Sb—Te system, MA—Ge—Sb—Te system (MA is Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, Fe, Ru, Co, Rh, Ni, Ag, At least one element of Tl, S, Se and Pt), Sn—Sb—Te, In—Se—Tl, In—Se—Tl—MB (MB Are Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, Fe, Ru, Co, Rh, Ni, Ag, Tl, S, Te and at least one of Pt Materials such as one element), Sn—Sb—Se can be used.
記録層内の全原子の含有量に対する該記録層内の酸素の含有量の割合が、 2原 子。 /0よりも少ないと記録層の部分的変態により形成された記録マークの安定効果 を得ることが困難となる。 また 20原子%よりも高すぎると結晶状態と非晶質状 態の変態を容易に実現することが困難となる。 記録マークの安定効果をより一層 高めるには、 3〜1 5原子%であることが好ましく、 更に好ましくは 8〜 14原 子%である。 The ratio of the content of oxygen in the recording layer to the content of all atoms in the recording layer is 2 atoms. If it is less than / 0, it will be difficult to obtain the effect of stabilizing the recording marks formed by the partial transformation of the recording layer. On the other hand, if it is higher than 20 atomic%, it is difficult to easily realize the transformation between the crystalline state and the amorphous state. In order to further enhance the recording mark stabilizing effect, the content is preferably 3 to 15 atomic%, and more preferably 8 to 14 atomic%.
記録層が酸素を酸化物として含有することが、 酸素を安定して記録層内に保持 し、 記録層内でのアモルファス状態部分及び/又は結晶部分からの及び Z又は内 への成分拡散、 及び Z又は結晶部分からアモルファス状態部分内への結晶成長を 抑制する。 The fact that the recording layer contains oxygen as an oxide stably retains oxygen in the recording layer, and diffuses components from an amorphous state part and / or a crystal part and / or into or into the recording layer, and Suppresses crystal growth from Z or crystal part into amorphous state part.
記録層が G eと S bと T eとを含む場合、 記録層は、 Geの少なくても一部を 酸化物として含むことが好適である。 記録層中の酸化物としての G eの少なくて も一部の含有量 aと、 酸化物としての G eの少なくても一部以外の記録層中の G eのその他の部分の含有量 bとの間の関係は、 0. 02≤aZ (a + b) ≤0. 5の範囲内にあることが好適である。 When the recording layer contains Ge, Sb, and Te, it is preferable that the recording layer contains at least a part of Ge as an oxide. The content a of at least a portion of Ge as an oxide in the recording layer a, and the content b of other portions of Ge in the recording layer other than at least a portion of Ge as an oxide Is preferably in the range of 0.02≤aZ (a + b) ≤0.5.
記録層が G eと S bと T eとを含む場合、 記録層は S bの少なくても一部を酸 化物として含むことが好適である。 記録層中の酸化物としての S bの少なくても 一部の含有量 cと、 酸化物としての S bの少なくても一部以外の記録層内の S b のその他の部分の含有量 dとの間の関係は、 0. 01≤c/ (c + d) ≤ 0. 2 の範囲内にあることが好適である。 When the recording layer contains Ge, Sb, and Te, it is preferable that the recording layer contains at least a part of Sb as an oxide. The content c of at least a part of Sb as an oxide in the recording layer and the content d of other parts of Sb in the recording layer other than at least a part of Sb as an oxide Is preferably in the range of 0.01 ≤ c / (c + d) ≤ 0.2.
記録層が G e、 S b、 T eを含む場合、 それぞれの元素の含有量は、 G eが 1 0〜30.原子。/。、 31)が10〜30原子%、 T eが 40〜 80原子%の範囲にあ る力、 あるいは、 Geが 35〜65原子%、 31)が10〜30原子%、 Teが 3 5〜65原子%の範囲にあると、 アモルファス相と結晶相との間の相変化を容易 に行うことができ、 情報の書換が可能になる。 さらに、 他の元素たとえば A u、 Cu、 P d、 Ta、 W、 I r、 S c、 Y、 T i、 Z r、 V、 Nb、 C r、 Mo、 Mn、 F e、 Ru、 Co、 Rh、 N i、 Ag、 T l、 S、 S e、 P tおよび Nの うちの少なくとも 1元素を 1〜 10原子。 /0の範囲で添カ卩するとアモルファス相の 結晶化温度が上昇する、 あるいは活性化エネルギーが大きくなるなどの効果があ る。 When the recording layer contains Ge, Sb, and Te, the content of each element is such that Ge is 10 to 30 atoms. /. 31) is a force in the range of 10 to 30 atomic% and Te is in the range of 40 to 80 atomic%, or Ge is 35 to 65 atomic%, 31) is 10 to 30 atomic%, and Te is 35 to 65 atomic%. When the content is in the range of atomic%, the phase change between the amorphous phase and the crystalline phase can be easily performed, and the information can be rewritten. In addition, other elements such as Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, 1 to 10 atoms of at least one of Mn, Fe, Ru, Co, Rh, Ni, Ag, Tl, S, Se, Pt and N. Addition in the range of / 0 has the effect of increasing the crystallization temperature of the amorphous phase or increasing the activation energy.
記録層が A gと I nと S bと Teとを含む場合、 記録層は I nの少なくても一 部を酸化物として含むことが好適である。 記録層中の該酸化物としての I nの少 なくても一部の含有量 eと、 該酸化物としての I nの少なくても一部以外の記録 層内の I nのその他の部分の含有量 f との間の関係は、 0. 0 1≤ e/ (e + f ) ≤0. 5の範囲内にあることが好適である。 When the recording layer contains Ag, In, Sb, and Te, the recording layer preferably contains at least a part of In as an oxide. The content e of at least a part of In as the oxide in the recording layer and the other part of In in the recording layer other than at least a part of In as the oxide The relationship between the content f and the content f is preferably in the range of 0.01≤e / (e + f) ≤0.5.
記録層が A gと I nと S bと T eとを含む場合、 記録層は S bの少なくても一 部を酸化物として含むことが好適である。 記録層中の酸化物としての S bの少な くても一部の含有量 gと、 酸化物としての S bの少なくても一部以外の記録層内 の S bのその他の部分の含有量 hとの間の関係は、 0. 01≤g/ (g + h) ≤ 0. 2の範囲内にあることが好適である。 When the recording layer contains Ag, In, Sb, and Te, the recording layer preferably contains at least a part of Sb as an oxide. Content g of at least a part of Sb as an oxide in the recording layer, and content of other parts of Sb in a recording layer other than at least a part of Sb as an oxide Preferably, the relationship with h is in the range of 0.01 ≤ g / (g + h) ≤ 0.2.
記録層が Ag、 I n、 S b、 Teを含む場合、 それぞれの元素の含有量は、 A g力 S 1〜 1 5原子0 /0、 I n力';:!〜 1 5原子0 /0、 S bが 45〜 80原子0 /0、 T e力 S 20〜40原子。 /0の範囲にあると、 アモルファス相と結晶相との間の相変化を容 易に行うことができ、 情報の書換が可能になる。 さらに、 他の元素たとえば Au、 Cu、 P d、 Ta、 W、 I r、 S c、 Y、 T i、 Z r、 V、 Nb、 C r、 Mo、 Mn、 F e、 Ru、 Co、 Rh、 N i、 T l、 S、 S e、 P tおよび Nのうちの 少なくとも 1元素を 1〜 1 0原子。 /0の範囲で添加するとァモルファス相の結晶化 温度が上昇する、 あるいは活性化エネルギーが大きくなるなどの効果がある。 光ビーム或いは電子ビームの照射により記録層は部分的に加熱される。 When the recording layer comprises Ag, I n, S b, the Te, the content of each element, A g force S. 1 to 1 5 atoms 0/0, I n force ';:! ~ 1 5 atoms 0/0, S b is 45 to 80 atomic 0/0, T e force S 20 to 40 atoms. In the range of / 0 , a phase change between an amorphous phase and a crystalline phase can be easily performed, and information can be rewritten. In addition, other elements such as Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, Fe, Ru, Co, Rh , N i, T l, S, S e, P t, and at least one element of N is 1 to 10 atoms. Addition in the range of / 0 has the effects of increasing the crystallization temperature of the amorphous phase or increasing the activation energy. The recording layer is partially heated by light beam or electron beam irradiation.
上記のように記録膜に酸素を含ませることによって、 酸素あるいは酸化物が、 アモルファス相と結晶相との直接接触を少なくとも一部で阻害し、 そのことによ つてェピタキシャル成長的な結晶成長を防ぎ、 アモルファスマークの安定性が向 上していると考えることができる。 By including oxygen in the recording film as described above, the oxygen or oxide inhibits at least partially the direct contact between the amorphous phase and the crystalline phase, thereby preventing the crystal growth like epitaxy. Therefore, it can be considered that the stability of the amorphous mark is improved.
記録層は酸素を酸化物として記録層内に含んで、 記録層の一部が加熱されて溶 融される時に、 該記録層の一部に含まれる酸化物により該記録層の一部の粘度を 高い程度に保持して該記録層の一部の表面張力を高い程度に保持し、 それにより、 溶融された後固化されるように冷却された該記録層の一部と該記録層の一部を取 り囲む記録層の他の部分との間の境界の少なくとも一部は、 丸く滑らかであるな らば、 記録されるべき信号の 「0」 の状態と 「1」 の状態の一方が、 該境界の少 なくても一部により定義され、 且つ記録された該信号の 「0」 の状態と 「1」 の 状態の一方が、 該境界の少なくても一部において認識される時、 該信号の 「0」 の状態と 「1」 の状態の一方は、 丸く滑らかな該記録層の一部と該記録層の他の 部分との間の境界の少なくとも一部により、 信号の記録媒体への記録時に明瞭確 実に定義され得るのであり、 且つ信号の記録媒体からの読み出し時に明瞭確実に 認識され得る。 固化されるよう冷却された後の該記録層の一部はアモルファス状 態であり、 該記録層の他の部分は結晶状態であっても良いし、 固化されるよう冷 却された後の該記録層の一部は結晶状態であり、 該記録層の他の部分はァモルフ ァス状態であっても良い。 The recording layer contains oxygen as an oxide in the recording layer. When a part of the recording layer is heated and melted, the viscosity of a part of the recording layer is increased by the oxide contained in the part of the recording layer. To A high degree of holding the surface tension of a portion of the recording layer to a high degree, whereby the part of the recording layer and the part of the recording layer that have been melted and then cooled so as to be solidified At least part of the boundary between the surrounding recording layer and the rest of the recording layer should be round and smooth so that one of the "0" and "1" states of the signal to be recorded is When one of the "0" state and the "1" state of the signal defined and recorded by at least a part of the boundary is recognized at least in part of the boundary, One of the "0" state and the "1" state of the signal is caused by at least a part of the boundary between the round and smooth part of the recording layer and the other part of the recording layer to the signal recording medium. Can be clearly and reliably defined when recording signals, and clearly and clearly recognized when reading signals from the recording medium. It can be. A part of the recording layer after being cooled so as to be solidified may be in an amorphous state, and the other part of the recording layer may be in a crystalline state, or the part after being cooled so as to be solidified. A part of the recording layer may be in a crystalline state, and the other part of the recording layer may be in an amorphous state.
上記の方法は、 特に記録密度が高くなったときにきわめて有効な方法となる。 基板上に、 螺旋状の溝もしくは同心円状の複数の溝を形成することにより、 ほ ぼ円周方向に延び半径方向に並列されるような複数の溝と、 該溝と溝との間でほ ぼ円周方向に延び半径方向に並列されるような複数のランド領域とを有し、 複数 の溝と複数のランド領域の少なくても一方が、 信号を記録するための記録トラッ クであるときに、 記録トラックの半径方向の間隔が小さくなるほど記録密度は高 くなることになる。 この記録トラックの半径方向の間隔が Ι μπ以下であれば上 記の方法は効果が高くなり、 0 . 7 μιη以下であれば特に効果が高くなる。 The above method is extremely effective especially when the recording density is increased. By forming a spiral groove or a plurality of concentric grooves on the substrate, a plurality of grooves that extend substantially in the circumferential direction and are arranged in parallel in the radial direction, and between the grooves, When there are a plurality of land areas extending in the circumferential direction and arranged in parallel in the radial direction, and at least one of the plurality of grooves and the plurality of land areas is a recording track for recording a signal. In addition, the smaller the radial spacing of the recording tracks, the higher the recording density. The above-described method is more effective when the distance between the recording tracks in the radial direction is Ιμπ or less, and is particularly effective when the distance is 0.7 μιη or less.
また、 加熱溶融後固化されるように冷却された記録層の一部の領域、 すなわち 記録マークの円周方向の最小長さが小さくなるほど記録密度は高くなることにな る。 記録マークの円周方向の最小長さ 0 . 7 μπι以下となると、 マークの大きさ に対するマーク境界でのェピタキシャル成長的な結晶成長によるマーク形状歪み の大きさが大きくなり、 マーク形状の変化が信号品質に与える影響が大きくなる ため上記の方法が有効になる。 記録マークの円周方向の最小長さが 0 . 5 μπι以 下の場合にはさらに有効になる。 In addition, the recording density increases as the area of the recording layer cooled so as to be solidified after heating and melting, that is, the minimum circumferential length of the recording mark decreases. If the minimum length of the recording mark in the circumferential direction is less than 0.7 μπι, the size of the mark shape distortion due to epitaxy-like crystal growth at the mark boundary with respect to the mark size will increase, and the change in the mark shape will increase. The above method is effective because the influence on the signal quality increases. It is more effective when the minimum length of the recording mark in the circumferential direction is 0.5 μπι or less.
記録層に接する保護層を更に有し、 該保護層が酸素と窒素との少なくても一方 を含むならば、 記録層から外への酸素の拡散が抑制され、 記録層中に酸素は安定 して保持される。 保護層が酸素を含む場合、 記録層が酸素を含むので、 保護層か ら記録層内への酸素の拡散が抑制される。 保護層が窒素を含む場合、 記録層のァ モルファス状態から結晶状態への変化、 即ち、 結晶状態の記録層部分のァモルフ ァス状態の記録層部分内への結晶成長が抑制される。 A protective layer in contact with the recording layer, wherein the protective layer has at least one of oxygen and nitrogen; When oxygen is contained, diffusion of oxygen from the recording layer to the outside is suppressed, and oxygen is stably retained in the recording layer. When the protective layer contains oxygen, the diffusion of oxygen from the protective layer into the recording layer is suppressed because the recording layer contains oxygen. When the protective layer contains nitrogen, the change of the recording layer from the amorphous state to the crystalline state, that is, the crystal growth of the crystalline layer of the recording layer in the amorphous layer of the recording layer is suppressed.
保護層内の全原子の含有量に対する該保護層内の窒素含有量の割合が、 1原子 %以上 5 0原子%以下であることが好適である。 保護層が Z n Sと S i 0 2とを 含むことが好適である。 保護層が酸化クロム、 酸化タンタル、 酸化アルミニウム、 窒化ゲルマニウムのうちの少なくとも 1つを含むならば、 保護層と記録層との間 の成分拡散が抑制され、 記録層の成分は安定している。 保護層が窒素を含む場合、 その含有量は 1原子%以上 5 0原子%以下が好ましい。 さらに、 記録層と保護層 とが接する領域で膜厚方向の窒素含有量勾配が 1原子%Z n m以上 5 0原子%ノ n m以下であればさらに好ましい。 このような条件にあれば、 レーザ光などのェ ネルギービームの照射によつて記録膜を融点以下の高温に熱した場合、 保護層と 記録層との接する領域で結晶核が生成されやすく、 アモルファス相から結晶相へ の相変化、 すなわち記録マークの消去が容易になる。 すなわち、 記録層の酸素含 有量と保護層の窒素含有量をコントロールすることによって、 アモルファスマー クの室温での保存安定性と、 高温での優れた消去性能を得ることができるため、 優れた書換可能媒体を得ることが可能になる。 保護膜材料としては Z n Sと S i O 2の混合物が熱伝導率が低く記録感度が良好であるという点で好ましい。 ただしこの材料は 1 0万回以上の多数回書換によって Sが記録層中に拡散し、 記 録層の光学定数を変化させて反射率低下をまねく場合がある。 また、 保護層材料 としては、 酸化クロム、 酸化タンタル、 酸化アルミニウム、 窒化ゲルマニウムを 用いることができる。 これらのうち、 酸化クロムは光学定数が大きいため多重干 渉効果によってァモルファス相と結晶層との間の反射率差を大きく取れるという 点で優れるが、 成膜条件によっては応力が大きいという欠点を持つ。 酸化タンタ ルは熱容量が大きいため記録膜を加熱溶融した後の冷却効果を大きくとることが できる点で優れるが、 酸素の欠損が生じやすく、 そのためそれ自身が光を吸収し てしまい反射率が低くなるという欠点を持つ。 酸化アルミニウムはきわめて安定 な酸化物であるが記録膜との密着力が弱い。 窒化ゲルマ -ゥムは記録膜との密着 力の点で優れるがバルクでは脆レ、材料であるためスパッタ等による成膜が難しレヽ という欠点を持つ。 これらの保護層材料はそれぞれに優れた点、 劣った点を持つ ているが、 これらを混合させることでそれぞれの欠点をなくし、 利点のみが現れ る組み合わせが存在する。 たとえば、 酸化クロムと酸化アルミニウム、 酸化クロ ムと窒化ゲルマニウム、 酸化タンタルと酸化アルミニウム、 酸化アルミニウムと 窒化ゲルマニウムなどである。 また、 上記の保護層材料に上記した材料以外の材 料を添カ卩してもよい。 上記した材料以外の材料としては、 Ce 02、 L a 203、 S i 0、 l n 203、 GeO、 GeOり、 P b 0、 SnO、 S n〇2、 B i 203、 Te〇2、 S c 203、 Y2〇3、 T i 02、 Z r〇2、 V205、 Nb 205、 W02、 W03、 Cd S、 Cd S e、 Zn S e、 I n2S 3、 I n 2S e 3、 S bつ S3、 S b 2 S e 3 Ga 9. S3、 G a 2 S e 3 ^ Ge S、 Ge S e、 It is preferable that the ratio of the nitrogen content in the protective layer to the content of all atoms in the protective layer is 1 atomic% or more and 50 atomic% or less. It is preferable that the protective layer comprises a Z n S and S i 0 2. If the protective layer contains at least one of chromium oxide, tantalum oxide, aluminum oxide, and germanium nitride, component diffusion between the protective layer and the recording layer is suppressed, and the components of the recording layer are stable. When the protective layer contains nitrogen, its content is preferably 1 atomic% or more and 50 atomic% or less. Further, it is more preferable that the nitrogen content gradient in the film thickness direction in the region where the recording layer and the protective layer are in contact is 1 atomic% Z nm or more and 50 atomic% or less. Under these conditions, if the recording film is heated to a high temperature below the melting point by irradiation with an energy beam such as a laser beam, crystal nuclei are likely to be generated in a region where the protective layer and the recording layer are in contact with each other. The phase change from the phase to the crystalline phase, that is, the erasure of the recording mark becomes easy. In other words, by controlling the oxygen content of the recording layer and the nitrogen content of the protective layer, it is possible to obtain the storage stability of the amorphous mark at room temperature and the excellent erasing performance at high temperature. It becomes possible to obtain a rewritable medium. As a material for the protective film, a mixture of ZnS and SiO 2 is preferable because of its low thermal conductivity and good recording sensitivity. However, in this material, S is diffused into the recording layer by rewriting many times more than 100,000 times, and the optical constant of the recording layer may be changed to cause a decrease in reflectance. Chromium oxide, tantalum oxide, aluminum oxide, and germanium nitride can be used as the protective layer material. Of these, chromium oxide has a large optical constant and is excellent in that a large difference in the reflectance between the amorphous phase and the crystal layer can be obtained due to the multiple interference effect.However, it has a disadvantage that stress is large depending on the film forming conditions. . Tantalum oxide is excellent in that it has a large heat capacity and therefore can have a large cooling effect after the recording film is heated and melted. Has the disadvantage of becoming Aluminum oxide is extremely stable Oxide but weak adhesion to the recording film. Germanium nitride is excellent in terms of adhesion to the recording film, but has a drawback in that it is brittle in bulk and difficult to form by sputtering or the like because it is a material. Each of these protective layer materials has superior and inferior points, but by mixing them, there are combinations that eliminate their respective disadvantages and show only advantages. For example, chromium oxide and aluminum oxide, chromium oxide and germanium nitride, tantalum oxide and aluminum oxide, aluminum oxide and germanium nitride, and the like. Further, a material other than the above-mentioned materials may be added to the above-mentioned protective layer material. As a material other than materials described above, Ce 0 2, L a 2 0 3, S i 0, ln 2 0 3, GeO, Ri GeO, P b 0, SnO, S N_〇 2, B i 2 0 3, Te_〇 2, S c 2 0 3, Y 2 Rei_3, T i 0 2, Z R_〇 2, V 2 0 5, Nb 2 0 5, W0 2, W0 3, Cd S, Cd S e, Zn S e, I n 2 S 3, I n 2 S e 3, S b one S 3, S b 2 S e 3 Ga 9. S 3, G a 2 S e 3 ^ Ge S, Ge S e,
Ge S e 2、 Sn S、 S n S2、 S n S e、 S n S e 2、 Pb S、 Pb S e、 Ge S e 2, Sn S, S n S 2, S n S e, S n S e 2, Pb S, Pb S e,
B i 2S e 3、 B i 2S 3、 Mg F2、 Ce F3、 Ca F2、 Ta N、 S i 3N4、 A 1 N、 C r N、 BN、 S i、 T i B2、 B4C、 S i C、 B、 Cおよびこれら に類似した組成を有するものを用いることができる = B i 2 S e 3, B i 2 S 3, Mg F 2, Ce F 3, Ca F 2, Ta N, S i 3 N 4, A 1 N, C r N, BN, S i, T i B 2 , B 4 C, S i C, B, C and those having compositions similar to these can be used =
酸素濃度とは、 単位体積内における全原子の数量に対する酸素原子の数量の割 合であり、 記録層の厚さ方向において、 該記録層内の酸素濃度が変化するならば、 記録層に接触する層と記録層表面との間の成分拡散特性を所望に設定しつつ、 記 録層表面と記録層内部との間の粘度における変化及び反射率の変化を所望に設定 可能である。 記録層内の酸素濃度の調節は、 記録層を作成後の、 酸素を含むガス 中での記録層の酸化処理によつて行われても良いし、 記録層を堆積している間の 雰囲気ガスの酸素濃度の制御によつて行われても良い。 The oxygen concentration is the ratio of the number of oxygen atoms to the total number of atoms in a unit volume. If the oxygen concentration in the recording layer changes in the thickness direction of the recording layer, the oxygen concentration comes into contact with the recording layer The change in viscosity and the change in reflectance between the surface of the recording layer and the inside of the recording layer can be set as desired, while the component diffusion characteristics between the layer and the surface of the recording layer are set as desired. Adjustment of the oxygen concentration in the recording layer may be performed by oxidizing the recording layer in a gas containing oxygen after the recording layer is formed, or an atmosphere gas during the deposition of the recording layer. The control may be performed by controlling the oxygen concentration of the above.
記録層の厚さ方向において、 記録層のほぼ中央の地点から、 記録層の両側の表 面の少なくても一方に向けて、 酸素濃度が増加するならば、 記録層に接触する一 方の層と記録層表面との間の成分拡散を抑制しつつ、 記録層のほぼ中央の地点に おけるァモルファス状態下の反射率を高く保持する- 記録層の厚さ方向において、 記録層のほぼ中央の地点から、 記録層の両側の表 面の各々に向けて、 酸素濃度が増加するならば、 記録層に接触する両方の層と記 録層表面との間の成分拡散を抑制しつつ、 記録層のほぼ中央の地点におけるァモ ルファス状態下の反射率を高く保持する。 In the thickness direction of the recording layer, if the oxygen concentration increases from approximately the center of the recording layer to at least one of the surfaces on both sides of the recording layer, one of the layers that contacts the recording layer if the oxygen concentration increases. Maintains a high reflectance under the amorphous state at a point almost at the center of the recording layer while suppressing component diffusion between the recording layer and the surface of the recording layer.- A point almost at the center of the recording layer in the thickness direction of the recording layer From both sides, if the oxygen concentration increases towards each of the surfaces on both sides of the recording layer, it is noted that both layers are in contact with the recording layer. While suppressing the diffusion of components to and from the recording layer surface, the reflectivity under the amorphous state at a substantially central point of the recording layer is kept high.
記録層の厚さ方向において、 記録層のほぼ中央の地点から、 記録層の両側の表 面の少なくても一方に向けて、 酸素濃度が、 該記録層のほぼ中央の地点の酸素濃 度の少なくても 2倍まで増加することが好適である。 In the thickness direction of the recording layer, the oxygen concentration increases from the point substantially at the center of the recording layer toward at least one of the surfaces on both sides of the recording layer. Preferably, the increase is at least up to two times.
更に光を反射する反射層を備え、 反射層と基板の間に記録層が配置され、 記録 層は記録層の厚さ方向において、 基板に相対的に近い第一表面と、 反射層に相対 的に近い第二表面とを有する時、 第一表面の酸素濃度 (或いは第一表面から第一 の深さにおける酸素濃度) は第二表面の酸素濃度 (或いは第二表面から第一深さ にほぼ等しい第二の深さにおける酸素濃度) より低いならば、 樹脂基板を通過す る酸素による第一表面の酸化により、 第一表面の酸素濃度は第二表面の酸素濃度 に向けて増加し、 記録層の厚さ方向両側の表面の酸素濃度は均一化される。 反射 層は一般的にメタリックであり、 酸素透過性は樹脂製の基板に比して小さい。 反射層に用いられる材料として、 Au、 Ag、 Cu、 A 1あるいはこれらの元 素のうち少なくとも 1つを主成分とするものが、 反射率がきわめて高いという点 で好ましい。 これらの元素を単独で用いる場合、 反射率はきわめて高くなるが、 熱伝導率がきわめて大きいため記録感度が低下する。 一方、 T i、 C r、 Co、 N i、 S b、 B i、 I n、 Te、 S e、 S i、 Ge、 P b、 G a、 As、 Z n、 Cd、 S c、 V、 Mn、 F e、 Y、 Z r、 Nb、 Mo、 Tc、 Ru、 Rh、 P d、 H f 、 Ta、 W、 Re、 O s、 I r、 P t、 ランタノィ ド元素、 ァクチノィド元 素のうちの少なくとも 1つを主成分とするものは、 反射率は低いが熱伝導率がき わめて低く記録感度が良好である。 Auなど前者のグループの元素と T iなど後 者のグループの元素を混ぜることによって、 反射率が高く、 熱伝導率が低い反射 層を得ることができる。 具体的には Au— Co、 Au— C r、 Au— T i、 Au — N i、 Ag— C r、 Ag— T i、 Ag— Ru、 Ag— P d、 Ag— Cu— P d、 A l—T i、 A l— C r、 A l— Co、 A l— N i、 A l— Nbなどである。 ま た、 Au— Ag、 Au— C uも反射率が高く、 熱伝導率が低い反射層となり得る。 該第一表面の酸素濃度 (或いは第一表面から第一の深さにおける酸素濃度) は 該第二表面の酸素濃度 (或いは第二表面から第一深さにほぼ等しい第二の深さに おける酸素濃度) より高いならば、 一対の記録層が情報記録媒体に含まれ反射層 が情報記録媒体内で基板に比して相対的に内方に配置され、 記録及び/又は再生 により情報記録媒体中で相対的に内方の地点の温度が相対的に外方の地点の温度 より高くなる時、 保護層からの酸素拡散により第二表面の酸化が進行することに より第二表面の酸素濃度は第一表面の酸素濃度に向けて増加し、 記録層の厚さ方 向両側の表面の酸素濃度は均一化される。 A recording layer disposed between the reflection layer and the substrate, wherein the recording layer has a first surface relatively close to the substrate in a thickness direction of the recording layer; When the second surface has an oxygen concentration near the first surface (or oxygen concentration at the first depth from the first surface), the oxygen concentration at the second surface (or approximately the first depth from the second surface) If the oxygen concentration at the first surface is lower than the oxygen concentration at the second surface, the oxygen concentration at the first surface increases toward the oxygen concentration at the second surface due to oxidation of the first surface by oxygen passing through the resin substrate. The oxygen concentration on the surface on both sides in the thickness direction of the layer is made uniform. The reflective layer is generally metallic, and has a lower oxygen permeability than a resin substrate. As a material used for the reflection layer, Au, Ag, Cu, A1, or a material containing at least one of these elements as a main component is preferable because the reflectance is extremely high. When these elements are used alone, the reflectance is extremely high, but the recording sensitivity is reduced due to the extremely high thermal conductivity. On the other hand, Ti, Cr, Co, Ni, Sb, Bi, In, Te, Se, Si, Ge, Pb, Ga, As, Zn, Cd, Sc, V, Mn, Fe, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Hf, Ta, W, Re, Os, Ir, Pt, Lanthanide element, Actinide element Those having at least one of them as the main components have low reflectance but extremely low thermal conductivity and good recording sensitivity. By mixing elements of the former group such as Au with elements of the latter group such as Ti, a reflective layer having high reflectance and low thermal conductivity can be obtained. Specifically, Au—Co, Au—Cr, Au—Ti, Au—Ni, Ag—Cr, Ag—Ti, Ag—Ru, Ag—Pd, Ag—Cu—Pd, A l—Ti, Al—Cr, Al—Co, Al—Ni, Al—Nb, and the like. Au-Ag and Au-Cu also have high reflectivity and can be reflective layers with low thermal conductivity. The oxygen concentration at the first surface (or oxygen concentration at a first depth from the first surface) is equal to the oxygen concentration at the second surface (or at a second depth approximately equal to the first depth from the second surface). (Oxygen concentration in the recording medium), the pair of recording layers is included in the information recording medium and the reflective layer is disposed relatively inward of the substrate in the information recording medium, and the information is recorded by recording and / or reproduction. When the temperature of a relatively inner point in the medium becomes higher than the temperature of a relatively outer point, oxidation of the second surface proceeds due to diffusion of oxygen from the protective layer, so that oxygen on the second surface is increased. The concentration increases toward the oxygen concentration on the first surface, and the oxygen concentration on both surfaces in the thickness direction of the recording layer is made uniform.
記録層の厚さ方向において、 記録層のほぼ中央の地点から、 第一表面に向けて、 酸素濃度が増加するならば、 基板を通過する酸素が記録層のほぼ中央の地点に到 達することを抑制する。 In the thickness direction of the recording layer, if the oxygen concentration increases from a point approximately at the center of the recording layer toward the first surface, it is confirmed that oxygen passing through the substrate reaches a point approximately at the center of the recording layer. Suppress.
記録層の厚さ方向において、 記録層のほぼ中央の地点から、 第二表面に向けて、 酸素濃度が増加するならば、 一対の記録層が情報記録媒体に含まれ反射層が情報 記録媒体内で基板に比して相対的に内方に配置され、 記録及び Z又は再生により 情報記録媒体中で相対的に内方の地点の温度が相対的に外方の地点の温度より高 くなる時、 記録層のほぼ中央の地点における酸化の進行を抑制する。 In the thickness direction of the recording layer, if the oxygen concentration increases from the substantially central point of the recording layer toward the second surface, the pair of recording layers is included in the information recording medium and the reflective layer is included in the information recording medium. When the temperature at the relatively inner point in the information recording medium becomes higher than the temperature at the relatively outer point in the information recording medium due to recording and Z or reproduction, Suppresses the progress of oxidation at substantially the center of the recording layer.
記録層が、 情報の記録が可能な第 1領域と、 あらかじめ記録された所定の情報 の再生のみを行う第 2領域とを備える場合、 第 1領域における記録層の酸素含有 量と第 2領域における記録層の酸素含有量との差が 1 8原子。 /0以下であることが 好適である。 第 1領域において記録された信号の消去及び信号の記録を複数回行 い、 第 1領域における記録層の少なくとも一部が結晶状態とアモルファス状態と の間の変態を複数回繰り返した後に、 第 1領域内の記録層の酸素含有量と、 第 2 領域内の記録層の酸素含有量との差が 1 8原子。 /0以下であることが好適である。 上記のような情報の記録が可能な第 1領域の記録層の酸素含有量と、 あらかじ め記録された所定の情報の再生のみを行う第 2領域の酸素含有量との差が 1 8 % を超えた場合、 両者の反射率差が大きくなり、 第 1領域と第 2領域の両方の情報 を同様の方法で再生することが難しくなつてくる。 通常、 上記のような第 1領域 と第 2領域とを備えた情報記録媒体に、 スパッタリングなどの方法によって記録 層を形成する場合、 形成直後においては第 1領域と第 2領域の酸素含有量はほぼ 等しい値となっており、 両者の反射率もほぼ等しいため再生に支障を来たすこと はないが、 上記第 2領域の所定の情報がエンボスピットによって記録されている ' 場合、 記録のための溝や溝間のみが形成された第 1領域と物理的な形状が異なる ため、 径時的な記録層内部での酸素拡散の仕方や、 外部からの酸素の侵入の仕方 が異なることが起こり得る。 また、 第 1領域に記録を 1回あるいは複数数回行つ た場合に、 第 1領域の記録層のみが原子配列変化を生じるため、 第 2領域の記録 層に比べて酸化が促進されたり、 逆に酸化物が排除されたりすることが起こり得 る。 記録層にあらかじめ酸素を含ませておけば上記のような問題は起こりにくく なり、 径時変化後あるいは複数回の記録後も第 1領域と第 2領域の酸素含有量の 差を 1 8 %以下に押さえることができる。 When the recording layer has a first area in which information can be recorded and a second area in which only the pre-recorded predetermined information is reproduced, the oxygen content of the recording layer in the first area and the second area The difference from the oxygen content of the recording layer is 18 atoms. It is preferably at most / 0 . After erasing a signal recorded in the first area and recording the signal a plurality of times, at least a part of the recording layer in the first area repeats a transformation between a crystalline state and an amorphous state a plurality of times. The difference between the oxygen content of the recording layer in the region and the oxygen content of the recording layer in the second region is 18 atoms. It is preferably at most / 0 . The difference between the oxygen content of the recording layer in the first area where information can be recorded as described above and the oxygen content of the second area where only the predetermined information recorded in advance is reproduced is 18%. If it exceeds, the reflectance difference between the two will increase, and it will become difficult to reproduce the information in both the first and second areas in a similar manner. Usually, when a recording layer is formed by a method such as sputtering on an information recording medium having the first region and the second region as described above, the oxygen content of the first region and the second region immediately after the formation is The values are almost equal, and the reflectances of the two are almost the same, so that there is no hindrance to reproduction.However, the predetermined information in the second area is recorded by embossed pits. In this case, the physical shape is different from the first area in which only the grooves for recording and the gap between the grooves are formed, so that the way of oxygen diffusion inside the recording layer over time and the way of intrusion of oxygen from outside Can be different. Also, when recording is performed once or several times in the first area, only the recording layer in the first area undergoes an atomic arrangement change, so that oxidation is promoted as compared to the recording layer in the second area, Conversely, oxides can be eliminated. If the recording layer contains oxygen in advance, the above-mentioned problems are less likely to occur, and the difference between the oxygen content of the first area and the oxygen content of the second area after the time change or after multiple recordings is 18% or less. Can be held down.
記録層の一部を加熱溶融させる段階と、 加熱溶融される記録層の一部を冷却固 化して、 該記録層の一部以外の記録層の他の部分に取り囲まれる信号マークを形 成する段階と、 を有する、 記録層を部分的に結晶状態とアモルファス状態との間 で変態させて信号を記録層の部分的変態により記録層内に記録するための、 情報 記録方法にして、 記録される信号は 「0」 の状態と 「1」 の状態とを有し、 記録 される 「0」 の状態と 「1」 の状態の一方が、 該記録層の一部と該記録層の他の 部分との間の境界の少なくても一部により定義され、 且つ記録された該 「0」 の 状態と 「1」 の状態の一方は、 該境界の少なくても一部において認識される、 情 報記録方法において、 Heating and melting a part of the recording layer; and cooling and solidifying a part of the recording layer to be heated and melted to form a signal mark surrounded by another part of the recording layer other than the part of the recording layer. An information recording method for partially transforming the recording layer between a crystalline state and an amorphous state and recording a signal in the recording layer by partial transformation of the recording layer, the method comprising: The signal has a state of "0" and a state of "1", and one of the states of "0" and "1" to be recorded is a part of the recording layer and another of the recording layer. One of the "0" state and the "1" state defined and recorded by at least a part of the boundary between the parts is recognized in at least part of the boundary. In the report recording method,
該記録層は酸素を酸化物として記録層内に含んで、 該記録層の一部が加熱され て溶融される時に、 該記録層の一部に含まれる酸化物により該記録層の一部の粘 度を高い程度に保持して該記録層の一部の表面張力を高い程度に保持し、 それに より、 溶融された後固化されるように冷却された該記録層の一部と該記録層の他 の部分との間の該境界の少なくとも一部は、 丸く滑らかであるならば、 記録され るべき信号の 「0」 の状態と 「1」 の状態の一方は該境界の少なくても一部によ り定義され、 且つ記録された該信号の 「0」 の状態と 「1」 の状態の一方は該境 界の少なくても一部において認識される時、 該信号の 「0」 の状態と 「1」 の状 態の一方は、 丸く滑らかな該記録層の一部と該記録層の他の部分との間の境界の 少なくとも一部により、 信号の記録媒体への記録時に明瞭確実に定義され得るの であり、 且つ信号の記録媒体からの読み出し時に明瞭確実に認識され得る。 固化 されるよう冷却された後の該記録層の一部はアモルファス状態であり、 該記録層 の他の部分は結晶状態であっても良いし、 固化されるよう冷却された後の該記録 層の一部は結晶状態であり、 該記録層の他の部分はアモルファス状態であっても 良レ、。 記録層の一部は光ビームの照射により、 加熱溶融されることが好適である。 記録層は、 第一記録層 ( 4 b ) と第二記録層 (4 a ) とを有し、 記録層厚さ方 向において第一記録層と第二記録層との間で酸素濃度は急峻に (第一記録層と第 二記録層内の酸素濃度変化に比し) 変化し、 記録層の厚さ方向に沿って平均化し た第一記録層の平均酸素濃度は記録層の厚さ方向に沿って平均化した第二記録層 の平均酸素濃度の 1 Z 3以下であり、 第一記録層の厚さは第二記録層の厚さより 大きくても良い。 記録層は、 複数の第二記録層を有し、 第一記録層は第二記録層 の間に配置されても良い。 The recording layer contains oxygen as an oxide in the recording layer, and when a part of the recording layer is heated and melted, the oxide contained in the part of the recording layer causes a part of the recording layer to be melted. The viscosity is maintained to a high degree to maintain the surface tension of a part of the recording layer to a high degree, whereby the part of the recording layer that has been melted and then cooled so as to be solidified and the recording layer If at least part of the boundary between the other parts of the signal is round and smooth, one of the "0" and "1" states of the signal to be recorded is at least one of the boundaries One of the "0" state and the "1" state of the signal, defined and recorded by the part, is recognized in at least a part of the boundary when the "0" state of the signal is recognized. One of the states and the state of "1" is that at least the boundary between one part of the round and smooth recording layer and the other part of the recording layer In part by, and as it can be clearly reliably defined when recording to the signal recording medium, it can be clearly recognized reliably and when reading from the signal recording medium. A part of the recording layer after being cooled so as to be solidified is in an amorphous state; The other part of the recording layer may be in a crystalline state, or a part of the recording layer after being cooled to be solidified may be in a crystalline state, and the other part of the recording layer may be in an amorphous state. Les ,. It is preferable that a part of the recording layer is heated and melted by light beam irradiation. The recording layer has a first recording layer (4b) and a second recording layer (4a), and the oxygen concentration is sharp between the first recording layer and the second recording layer in the recording layer thickness direction. (Compared to the change in oxygen concentration in the first and second recording layers), the average oxygen concentration in the first recording layer, averaged along the thickness direction of the recording layer, is And the thickness of the first recording layer may be greater than the thickness of the second recording layer. The recording layer may have a plurality of second recording layers, and the first recording layer may be disposed between the second recording layers.
図面の簡単な説明: BRIEF DESCRIPTION OF THE DRAWINGS:
図 1は、 本発明の実施例である相変化 (変態) 型情報記録媒体の構造を示す概 略断面図。 FIG. 1 is a schematic sectional view showing the structure of a phase change (transformation) type information recording medium according to an embodiment of the present invention.
図 2 aは、 本発明による記録層がその上に配置される基板の溝と溝に対して隆 起するランド部とを示す、 基板を半径方向に切り取った断面図。 FIG. 2a is a cross-sectional view of a radially cut substrate showing a groove of the substrate on which the recording layer according to the present invention is disposed and lands protruding from the groove.
図 2 bは、 本発明による記録層がその上に配置される基板の二つの実施例 (半 径方向に並列されたほぼ円周方向に伸びる同心円状の複数の溝と複数のランド部 とを形成する同心円状の表面形状、 半径方向に並列されたほぼ円周方向に伸びる 複数の溝と複数のランド部とを形成する螺旋状の表面形状) を示す、 正面図。 図 3は、 記録マークと、 記録マークから読み取られる或いは記録マークにより 記録されるべき信号の 「1」 の状態と 「0」 の状態の一方と、 の関係を示す、 概 略図。 記録信号のレベル変化時に、 信号の 「1」 の状態と 「0」 の状態の一方が 読み取られ且つ記録される。 FIG. 2b shows two embodiments of a substrate on which a recording layer according to the invention is arranged (a plurality of concentric grooves extending substantially radially parallel to a radial direction and a plurality of lands). FIG. 2 is a front view showing a concentric surface shape to be formed, and a spiral surface shape that forms a plurality of grooves and a plurality of lands that are arranged in the radial direction and that extend substantially in the circumferential direction. FIG. 3 is a schematic diagram showing a relationship between a recording mark and one of a “1” state and a “0” state of a signal to be read from or recorded by the recording mark. When the level of the recording signal changes, one of the "1" state and the "0" state of the signal is read and recorded.
図 4は、 記録層が、 厚さ方向において酸素濃度が異なるよう、 複数の層により 構成されても良いことを示す、 概略部分断面図。 FIG. 4 is a schematic partial cross-sectional view showing that the recording layer may be composed of a plurality of layers so that the oxygen concentration differs in the thickness direction.
図 5は、 酸素濃度と、 最短記録マーク長さと、 加速試験後のジッターとの関係 を示す、 図。 Figure 5 shows the relationship between the oxygen concentration, the shortest recorded mark length, and the jitter after the acceleration test.
図 6は、 酸素濃度と、 トラックピッチと加速試験後のジッターとの関係を示す、 好適実施例の詳細な説明: Figure 6 shows the relationship between oxygen concentration, track pitch and jitter after the acceleration test. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS:
以下に本発明を実施例によって詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to Examples.
【実施例 1】 [Example 1]
直径 1 20mm、 厚さ 0. 6mmの透明材料 (例えば、 ポリカーボネート樹脂、 ガラス等) からなる、 図 2に示されるようなほぼ円周方向 (即ち、 同心円状の、 或レヽは螺旋状の) に延びる半径方向に並列された溝 1 'とほぼ円周方向に延びる 半径方向に並列されたランド部 1 "とがあらかじめ形成された基板 1 aを用意し た。 一実施例では、 溝 1'の中心とそれに隣接するランド部 1"の中心との半径方 向距離は 0. 74 / mとした。 この基板 1 aを、 複数のスパッタ室を持ち、 層厚 の均一性および再現性に優れたスパッタ装置内の第 1スパッタ室に配置した。 タ 一ゲットとして Z n Sと S i O 2の混合物を用い、 アルゴンガス中でのスパッタ リングにより厚さ 90 nmの (Z n S) 80 (S i〇2) 20 (80と 20とはモ ル%) の第 1オーバーレイ層 2を基板 1 a上に形成した。 次いでこの基板を第 2 のスパッタ室に移動した後、 ターゲットとして C r 203を用い、 アルゴンガス 中でのスパッタリングにより厚さ 20 nmの C r 2 O 3の第一保護層 3を積層し た。 さらにこの基板を第 3スパッタ室に移動した後、 ターゲットを It is made of a transparent material (eg, polycarbonate resin, glass, etc.) having a diameter of 120 mm and a thickness of 0.6 mm in a substantially circumferential direction (ie, concentric or spiral) as shown in FIG. A substrate 1a was prepared in which a radially parallel groove 1 'extending and a radially parallel land portion 1 "extending substantially circumferentially were prepared in advance. In one embodiment, a groove 1' The radial distance between the center and the center of the adjacent land 1 "was 0.74 / m. This substrate 1a was placed in a first sputtering chamber in a sputtering apparatus having a plurality of sputtering chambers and excellent in uniformity of layer thickness and reproducibility. Using a mixture of Z n S and S i O 2 as data one target, a thickness of 90 nm by sputtering rings in argon gas (Z n S) 80 Mo and (S I_〇 2) 20 (80 and 20 %) Of the first overlay layer 2 was formed on the substrate 1a. Then, after moving the substrate to a second sputtering chamber, C r 2 0 3 was used, the first protective layer 3 of C r 2 O 3 of 20 nm thick was laminated by sputtering in an argon gas as a target Was. After moving this substrate to the third sputtering chamber,
A § 2. 5 G e 20 S b 22. 5 T e 55 (2· 5, 2 0, 22. 5, 55は原子 A § 2. 5 G e 20 S b 22. 5 T e 55 (2 · 5, 2 0, 22. 5, 55 atomic
%) 焼結体として、 アルゴンガス中でのスパッタリングにより記録層 4を 16 nmの厚さで積層した。 その後第 3スパッタ室内に酸素分圧 1 0%のアルゴンと 酸素の混合ガスをガス流量 200 S C CMにて一定時間流入させて記録層 4の表 面を酸化処理した。 次いで第 4スパッタ室に基板を移動し、 第 1オーバーレイ層 形成と同様の要領でスパッタリングにより厚さ 18 nmの %) As a sintered body, the recording layer 4 was laminated with a thickness of 16 nm by sputtering in argon gas. Then, a mixed gas of argon and oxygen having an oxygen partial pressure of 10% was introduced into the third sputtering chamber at a gas flow rate of 200 SCCM for a certain period of time to oxidize the surface of the recording layer 4. Next, the substrate was moved to the fourth sputtering chamber, and a thickness of 18 nm was formed by sputtering in the same manner as in the formation of the first overlay layer.
(Z n S) 80 (S i O 2) 20 (80と 20とはモル%) の第 2保護層 5を積 層した。 次いで、 第 5スパッタ室内で A 1 C r合金をタ一ッゲットとして用い、 スパッタリングにより A 1 94 C r 6 (94と 6とは原子。 /0) の第 1反射層 6を 35 nmの厚さで積層した。 最後に第 6スパッタ室室内で A 1 T i合金をターグ ットとして用い、 スパッタリングにより A 1 99T i ! (99と 1とは重量%) の第 2反射層 7を 35 nmの厚さで積層した。 保護層と反射層とオーバーレイ層 とが積層された基板をスパッタ装置から取り出し、 最上層の上に紫外線硬化樹脂 保護層 8をスピンコ一トによって塗布した。 A second protective layer 5 of (ZnS) 80 (Sio2) 20 (80 and 20 is mol%) was laminated. Then, using the A 1 C r alloy fifth sputtering chamber as data one Ggetto, A 1 94 C r 6 first thickness of the reflective layer 6 35 nm (atomic. / 0 and 94 and 6) by sputtering Was laminated. Finally with A 1 T i alloy as Targ Tsu preparative sixth sputtering chamber chamber by sputtering A 1 99 T i! (99% and 1 are% by weight) of the second reflective layer 7 having a thickness of 35 nm. The substrate on which the protective layer, the reflective layer, and the overlay layer are laminated is removed from the sputtering apparatus, and an ultraviolet curable resin is placed on the uppermost layer The protective layer 8 was applied by spin coating.
同様にしてもう一枚の同様な基板 1 b上に (Z n S) go (S i 02) 2 o (8 0と 20とはモル0 /0) の第 1オーバーレイ層 2 '、 〇 203の保護層3'、 Ag 2. 5G e 20S b 22. 5Te 55の記録層 4 '、 Similarly to the other piece of the same substrate 1 on b (Z n S) go ( S i 0 2) 2 o (8 0 the molar 0/0 and 20) first overlay layer of 2 ', 〇 2 0 3 protective layer 3 ', Ag 2. 5 G e 20 S b 22. 5 recording layer 4 Te 55',
(Z n S) 80 (S i 02) 20 (80と 20とはモル0 /0) の第 2保護層 5'、 (Z n S) 80 (S i 0 2) 20 (80 and mole 0/0 and 20) the second protective layer 5 of the '
A 1 94C r 6 (94と 6とは原子。 /0) の第 1反射層 6,、 A 1 99T i x (99と 1とは重量%) の第 2反射層 7'、 紫外線硬化樹脂保護層 8'とを積層し、 2枚の 基板 l a, 1 bを、 紫外線硬化樹脂保護層 8, 8'を内側にして対面させ接着 剤層 9によって貼り合わせを行った。 この時、 接着剤層の直径を 1 18mm以上 にすると落下などの衝撃による接着剤層の剥離が起こりにくくなつた。 記録層 4'に対しては、 記録層 4と同様な酸化処理を行った。 A 1 94 Cr 6 (94 and 6 are atoms. / 0 ) first reflective layer 6, A 1 99 Tix (99 and 1 are% by weight) second reflective layer 7 ′, UV cured The resin protective layer 8 'was laminated, and the two substrates la and 1b were opposed to each other with the ultraviolet curable resin protective layers 8 and 8' facing inside, and were bonded together with the adhesive layer 9. At this time, if the diameter of the adhesive layer was set to 118 mm or more, peeling of the adhesive layer due to impacts such as dropping became difficult to occur. The same oxidation treatment as that of the recording layer 4 was performed on the recording layer 4 ′.
記録層 4、 4'の製層後、 アルゴンと酸素の混合ガスを記録層上に加えた時間 を変えることにより記録層中の酸素含有量或いは酸素濃度を変えて作製したディ スクの数種類のサンプルを、 まず、 波長 810 nm, ビーム長径 75mm, 短径 1 mmの楕円ビームを持つレーザ光を照射することによって初期化を行った。 次 いで、 ディスクを線速度約 6m/ sとなるように回転させ、 波長 660 nmの半 導体レーザ光を NA0. 6の対物レンズで集光して基板を通して記録層上に照射 し、 記録及び再生を行った。 記録にはレーザパワーを 1 1 111^ と 5111\^の間で変 調した波形を用い、 8— 1 6変調されたランダム信号を記録した。 l lmWのパ ヮ一で記録マークを形成し、 5mWのパワーで消去を行うダイレクトオーバライ トを行った。 ただし、 最短マーク以外の記録パルスを複数に分割するマルチパル ス記録波形を用いた。 記録は、 溝上とランド部上との両方に行った。 After the recording layers 4 and 4 'were formed, several samples of the discs were prepared by changing the oxygen content or oxygen concentration in the recording layer by changing the time during which a mixed gas of argon and oxygen was added to the recording layer. First, initialization was performed by irradiating a laser beam having an elliptical beam with a wavelength of 810 nm, a beam major axis of 75 mm, and a minor axis of 1 mm. Next, the disc is rotated to a linear velocity of about 6 m / s, and a semiconductor laser beam with a wavelength of 660 nm is condensed by an NA0.6 objective lens, irradiated onto the recording layer through the substrate, and recorded and reproduced. Was done. For the recording, a random signal modulated with 8-16 modulation was recorded using a waveform in which the laser power was modulated between 111111 and 5111 \ ^. A record mark was formed at a power of llmW, and direct overwriting was performed to erase with a power of 5mW. However, a multipulse recording waveform that divides recording pulses other than the shortest mark into a plurality was used. Recording was performed both on the groove and on the land.
上記のように記録された信号のジッターを測定した後、 ディスクを 90°C80 %の環境下に 100時間放置する加速試験を行い、 加速試験後再度ジッターの測 定を行った。 記録層中の酸素含有量或いは濃度を変えたとき、 加速試験前後での ジッターは以下のようになった。 なお、 記録層中の酸素含有量の測定にはォージ ェ電子分光法を用いた。 【表 1】 After measuring the jitter of the signal recorded as described above, an acceleration test was performed in which the disc was left in an environment of 90 ° C and 80% for 100 hours, and the jitter was measured again after the acceleration test. When the oxygen content or concentration in the recording layer was changed, the jitter before and after the acceleration test was as follows. The oxygen content in the recording layer was measured by the Auger electron spectroscopy. 【table 1】
記録層の酸化処理を確実に行わなかったサンプル 8は、 サンプル 1〜 7に比べ て加速試験後のジッターが著しく増大した。 また、 混合ガス流入時間を最も長く したサンプル 1は、 加速試験前後でジッターの変化はなかったが、 初期ジッター がサンプル 2 8に比べて著しく悪くなつた。 なお、 上記サンプル 1 7では記 録層の成層後に酸素を含む混合ガスを流入させて記録層の酸化処理を行ったが、 アルゴンと酸素の混合ガス雰囲気中で記録層をスパッタリングにより形成するこ とによっても記録層を酸化させることができる。 In Sample 8, in which the recording layer was not oxidized, the jitter after the accelerated test was significantly increased as compared with Samples 1 to 7. In sample 1, which had the longest mixed gas inflow time, the jitter did not change before and after the accelerated test, but the initial jitter was significantly worse than in sample 28. In Sample 17, the recording layer was oxidized by flowing a mixed gas containing oxygen after the recording layer was formed.However, the recording layer was formed by sputtering in a mixed gas atmosphere of argon and oxygen. Can also oxidize the recording layer.
なお上記において、 G e含有量を 10 30原子。/。、 S b含有量を 10~30 原子。 /。、 T e含有量を 40 80原子%の範囲で変化させた記録層を用いた場合、 あるいは G e含有量を 35 65原子。/。、 S b含有量を 10 30原子。 /。、 T e 含有量を 35 65原子%の範囲で変化させた記録層を用いた場合にも上記と同 様の結果が得られた。 In the above, the Ge content is 10 30 atoms. /. The Sb content is 10 to 30 atoms. /. When using a recording layer in which the Te content is changed in the range of 4080 at%, or the Ge content is 35 65 atoms. /. The Sb content is 10 30 atoms. /. The same results as above were obtained when using a recording layer in which the Te content was changed in the range of 3565 at%.
また、 A gを含まない記録膜を用いた場合、 あるいは Agの含有量を 1 1 0 原子%の範囲で変化させた記録膜を用い場合にも同様の結果が得られた。 Similar results were obtained when a recording film containing no Ag was used, or when a recording film was used in which the Ag content was changed in the range of 110 atomic%.
さらに、 Agの一部もしくは全部を置換して Au、 Cu P d、 Ta、 W、 I r S c Y T i、 Zて、 V Nb C r、 Mo Mn、 F e、 Ru Co Rh N i、 Ag T l S、 S e、 P tおよび Nのうちの少なくとも 1元素を 1 10原子。 /0の範囲で添加した場合にも同様の結果が得られた。 なお、 記録層 4を形成する際、 スパッタガスとしてアルゴンと酸素の混合ガス を用いて厚さ 2 nmの第 2記録層 4 aを形成し Further, a part or all of Ag is replaced to form Au, Cu Pd, Ta, W, IrScYTi, Z, VNbCr, MoMn, Fe, RuCoRhNi, Ag 110 atoms of at least one element of TlS, Se, Pt and N. Similar results were obtained when the addition was in the range of / 0 . When forming the recording layer 4, a 2 nm-thick second recording layer 4a was formed using a mixed gas of argon and oxygen as a sputtering gas.
変更して厚さ 16 nmの第 1記録層 4 bを形成 Modified to form the first recording layer 4 b with a thickness of 16 nm
と酸素の混合ガスに変更して厚さ 2 nmの第 2記録層 4 aを再び形成し、 記録層 形成後のアルゴン酸素混合ガス流入による酸化処理を行わなかった場合、 デイス クの反射率が高くなる効果が得られた。 第 2記録層を形成するときの混合ガスの 酸素分圧を変えて第 1記録層と第 2記録層の平均的な酸素含有量を 2原子%から 20原子%に調整すると、 加速試験によるジッター上昇は表 1と同様の結果とな つた。 第 1記録層の酸素含有量が第 2記録層の酸素含有量の 1 / 3以下であった 場合にディスク反射率は 2 %高くなつた。 第 2記録層 4 aを第 1記録層 4 bのど ちらか一方にのみ形成したときも両側に形成した場合にと良く似た特性が得られ た。 また、 第 2記録層 4 aの膜厚を 1〜10 nmの範囲で変えたときにも良く似 た特性が得られたが膜厚を 5 n m以上にすると記録感度が悪くなり、 記録に必要 なパワーが約 1 mW上昇した。 When the second recording layer 4a having a thickness of 2 nm is formed again by changing to a mixed gas of oxygen and oxygen, and the oxidation treatment is not performed by flowing the argon-oxygen mixed gas after the formation of the recording layer, the reflectivity of the disk is reduced. A higher effect was obtained. When the average oxygen content of the first and second recording layers is adjusted from 2 atomic% to 20 atomic% by changing the oxygen partial pressure of the mixed gas when forming the second recording layer, the jitter due to the acceleration test The rise was similar to Table 1. When the oxygen content of the first recording layer was 1/3 or less of the oxygen content of the second recording layer, the disk reflectance increased by 2%. When the second recording layer 4a was formed on only one of the first recording layers 4b, characteristics similar to those formed on both sides were obtained. Similar characteristics were obtained when the film thickness of the second recording layer 4a was changed in the range of 1 to 10 nm.However, when the film thickness was increased to 5 nm or more, the recording sensitivity deteriorated, and it was necessary for recording. Power increased by about 1 mW.
【実施例 2】 [Example 2]
実施例 1と同様の基板 1 aを、 複数のスパッタ室を持ち、 層厚の均一性および 再現性に優れたスパッタ装置内の第 1スパッタ室に配置した。 タ一ゲットとして Zn Sと S i O 2の混合物を用い、 アルゴンガス中でのスパッタリングにより厚 さ 90 nmの (Z n S) 80 (S i 02) 20 (80と 20とはモル0 /0) の第 1ォ 一バーレイ層 2を基板 1 a上に形成した。 次いでこの基板を第 2のスパッタ室に 移動した後、 ターゲットとして C r 2〇3を用い、 アルゴンガス中でのスパッタ リングにより厚さ 20 nmの C r 2 O 3の第一保護層 3を積層した。 さらにこの 基板を第 3スパッタ室に移動した後、 ターゲットを The same substrate 1a as in Example 1 was placed in a first sputtering chamber in a sputtering apparatus having a plurality of sputtering chambers and having excellent layer thickness uniformity and reproducibility. Using a mixture of Zn S and S i O 2 as data one target, a thickness of 90 nm by sputtering in argon gas (Z n S) 80 (S i 0 2) 20 (80 A and 20 mole 0 / 0 ) was formed on the substrate 1a. Next, after moving this substrate to the second sputtering chamber, Cr 2 O 3 was used as a target, and a 20 nm-thick first protective layer 3 of Cr 2 O 3 was deposited by sputtering in argon gas. did. After moving this substrate to the third sputtering chamber,
Ag 2. 5G e 20 S b 22. 5T e 5 5 (2. 5, 20, 22. 5, 55は原子 %) の焼結体として、 アルゴンガス中でのスパッタリングにより記録層 4を 1 6 n mの厚さで積層した。 その後、 基板を酸化物形成室に移動し、 酸素雰囲気中に 一定時間放置して記録層 4を酸化処理した。 次いで第 4スパッタ室に基板を移動 し、 第 1オーバーレイ層形成と同様に厚さ 1 8 nmの Ag 2. 5 G e 2 0 S b 2 2. 5 T e 5 5 (2. 5, 20, 22. 5, 55 atomic%) as a sintered body of the recording layer 4 by sputtering in an argon gas Was laminated with a thickness of 16 nm . Thereafter, the substrate was moved to an oxide formation chamber, and left for a certain period of time in an oxygen atmosphere to oxidize the recording layer 4. Next, the substrate was moved to the fourth sputtering chamber, and a thickness of 18 nm was formed similarly to the formation of the first overlay layer.
(Zn S) 80 (S i〇2) 2 o (80と 20とはモル0 /0) の第 2保護層 5をスノ、。 ッタリングにより積層した。 次いで、 第 5スパッタ室内で A 1 C r合金をターッ ゲットとして用い、 スパッタリングにより A l 94C r 6 (94と 6とは原子 %) の第 1反射層 6を 35 nmの厚さで積層した。 最後に第 6スパッタ室室内で(Zn S) 80 (S I_〇 2) 2 o Sno the second protective layer 5 (80 and 20 and the mole 0/0),. The layers were laminated by the cutter. Then, using the A 1 C r alloy fifth sputtering chamber as Ta' target was laminated first reflective layer 6 of A l 94 C r 6 (94 and atomic% and 6) in a thickness of 35 nm by sputtering . Finally, in the sixth sputtering chamber
A 1 T i合金をタ一ゲッ トとして用い、 スパッタリングにより A 1 99T i 丄 ( 99と 1とは重量%) 第 2反射層 7を 35 n mの厚さで積層した。 ォ一バーレ ィ層と保護層と記録層と反射層とが積層された基板をスパッタ装置から取り出し、 第 2反射層 7の上に紫外線硬化樹脂保護層 8をスピンコートによつて形成した。 同様にして、 もう一枚の同様な基板 1 b上に、 An A 1 Ti alloy was used as a target, and a second reflective layer 7 having a thickness of 35 nm was deposited by sputtering with A 1 99 Ti 丄 (99 and 1 being% by weight). The substrate on which the overlayer, the protective layer, the recording layer, and the reflective layer were laminated was taken out of the sputtering apparatus, and the ultraviolet curable resin protective layer 8 was formed on the second reflective layer 7 by spin coating. Similarly, on another similar substrate 1 b,
(Z n S) 80 (S i 02) 2 o (80と 20とはモル0 /0) の第 1オーバ一レイ 層 2 '、 C r 2 O 3の保護層 3 '、 記録層 4'、 (Zn S) 80 (S i O2) 20 (8 0と 20とはモル%) の第 2保護層 5,、 A 1 94 C r 6 (94と 6とは原子0 /0) の第 1反射層 6'、 A 1 99T i ! (99と 1とは重量。 /0) の第 2反射層 7'、 紫外 線硬化樹脂保護層 8'を順次積層し、 2枚の基板を、 紫外線硬化樹脂保護層 8、 8 'を内側にして対面させて接着剤層 9によって貼り合わせを行つた。 この時、 接着剤層の直径を 1 1 8 mm以上にすると落下などの衝撃による接着剤層の剥離 が起こりにくくなつた。 記録層 4'に対しては、 記録層 4と同様な酸化処理を行 つた (Z n S) 8 0 ( S i 02) 2 o (80 and 20 mole 0/0 and) first over one laid layer 2 ', the protective layer 3 of C r 2 O 3', recording layer 4 ' , first the (Zn S) 80 (S i O 2) 20 ( atomic 0/0 94 6) second protective layer 5 ,, a 1 94 C r 6 (8 0 mol% and 20) 1 Reflective layer 6 ', A 1 99 Ti! (99 and 1 are weight./ 0 ) The second reflective layer 7 ′ and the ultraviolet curing resin protective layer 8 ′ are sequentially laminated, and the two substrates are placed with the ultraviolet curing resin protective layers 8 and 8 ′ inside. And bonded together by the adhesive layer 9. At this time, if the diameter of the adhesive layer was set to 118 mm or more, peeling of the adhesive layer due to impact such as dropping was less likely to occur. The same oxidation treatment as that for the recording layer 4 was performed on the recording layer 4 '.
記録層 4, 4'の製層後、 酸素分圧と放置時間を変え、 記録層中の G e酸化物 および S b酸化物の含有量を変えたディスクの複数の種類のサンプルの各々につ き複数枚のサンプルディスクを用意し、 それぞれのサンプルディスクを実施例 1 と同様の方法で初期化を行った後、 ドライブを用いて 8— 1 6変調されたランダ ム信号を記録した。 その後、 これらのディスクを 70°C 90%の環境下に 40日 間放置する加速試験を行い、 加速試験後ドライブでの再生テストを行い、 エラー レートが試験前の 2倍以上になるディスクの枚数を調べた。 更に、 初期化を行つ た後の各サンプルについて、 ドライブを用いて 8— 16変調されたランダム信号 の記録をディスクの同一箇所に繰り返し行い、 再生もしくは記録エラーが発生す る回数を調べた。 記録層中の G e酸化物および S b酸化物の含有量を変えたとき、 エラーが 2倍以上になったディスク枚数は表 2のようになった。 記録層中の G e 酸化物および S b酸化物の含有量を変えたとき、 繰り返し記録の回数は表 2のよ ' うになつた。 記録層中の G e酸化物および S b酸化物の含有量の測定には XP S 装置を用い、 Geおよび S bの XPSスぺク トルをピーク分離することにより求 めた。 なお、 表 2において、 aは酸化物状態の G eの含有量、 bは金属または合 金の非酸化物状態の G eの含有量、 cは酸化物状態の S bの含有量、 dは金属ま たは合金の非酸化物状態の S bの含有量である。 After the formation of the recording layers 4 and 4 ', the oxygen partial pressure and the storage time were changed, and the content of Ge oxide and Sb oxide in the recording layer was changed for each of a plurality of types of disc samples. After preparing a plurality of sample disks, each sample disk was initialized in the same manner as in Example 1, and a drive signal was used to record a random signal 8-6-1 modulated. After that, an acceleration test was performed in which these disks were left in an environment of 70% and 90% for 40 days.After the acceleration test, a playback test was performed on the drive, and the number of disks whose error rate was at least twice as high as before the test Was examined. Furthermore, for each sample after initialization, recording of a 8-16 modulated random signal was repeatedly performed on the same portion of the disk using a drive, and the number of times a reproduction or recording error occurred was examined. Table 2 shows the number of disks where the error more than doubled when the content of Ge oxide and Sb oxide in the recording layer was changed. When the content of Ge oxide and Sb oxide in the recording layer was changed, the number of repetitive recordings was as shown in Table 2. Unagi. The content of the Ge oxide and the Sb oxide in the recording layer was measured using an XPS apparatus, and the peaks of the XPS spectra of Ge and Sb were obtained. In Table 2, a is the content of Ge in oxide state, b is the content of Ge in non-oxide state of metal or alloy, c is the content of Sb in oxide state, and d is It is the content of Sb in the non-oxide state of the metal or alloy.
【表 2】 [Table 2]
記録層の酸化処理を確実に行わなかったサンプル 7は、 サンプル:!〜 6に比べ て加速試験後のエラ一レートが著しく増大し、 10枚中 8枚が 2倍以上にエラー レートが増大しただけでなく、 そのうちの 4枚で再生そのものが著しく困難にな る現象が生じた。 Sample 7 in which the recording layer was not oxidized was sample:! The error rate after the accelerated test was significantly increased compared to that of ~ 6, and the error rate was increased more than twice in 8 out of 10 images, and the reproduction itself became extremely difficult in 4 of them. Occurred.
なお上記において、 G e含有量を 10〜30原子%、 31)含有量を10〜30 原子。/。、 T e含有量を 40〜 80原子%の範囲で変化させた記録層を用いた場合、 あるいは G e含有量を 35〜65原子%、 S b含有量を 10〜 30原子0 /0、 T e 含有量を 35〜65原子%の範囲で変化させた記録層を用いた場合にも上記と同 様の結果が得られた。 In the above, the Ge content is 10 to 30 atom%, and 31) the content is 10 to 30 atom. /. , T e when the content was used a recording layer was changed within a range of 40 to 80 atomic%, or G e content of 35 to 65 atomic%, S b content of 10-30 atomic 0/0, T The same results as above were obtained when using a recording layer in which the e content was changed in the range of 35 to 65 atomic%.
また、 A gを含まない記録膜を用いた場合、 あるいは Agの含有量を 1〜10 原子%の範囲で変化させた記録膜を用い場合にも同様の結果が得られた。 Similar results were obtained when a recording film containing no Ag was used, or when a recording film was used in which the Ag content was changed in the range of 1 to 10 atomic%.
さらに、 A gの一部もしくは全部を置換して A u、 Cu、 P d、 Ta、 W、 I r、 S c、 Y、 T i、 Z r、 V、 Nb、 C r、 Mo、 Mn、 F e、 Ru、 Co、 Rh、 N i、 Ag、 T l、 S、 S e、 P tおよび Nのうちの少なくとも 1元素を 1〜1 0原子。 /0の範囲で添加した場合にも同様の結果が得られた。 Further, a part or all of Ag is substituted to Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, F e, Ru, Co, At least one element of Rh, Ni, Ag, Tl, S, Se, Pt and N is 1 to 10 atoms. Similar results were obtained when the addition was in the range of / 0 .
【実施例 3】 [Embodiment 3]
溝 1 'の中心とその隣の溝の中心との間の半径方向感覚が 0. 75 //mとした 以外の技術的限定は、 実施例 1と同様にして、 基板 1 aを、 複数のスパッタ室を 持ち、 層厚の均一性および再現性に優れたスパッタ装置内の第 1スパッタ室に配 置した。 ターゲットとして Z n Sと S i 02の混合物を用い、 アルゴンガス中で のスパッタリングにより厚さ 90 nmの (Z n S) 80 (S i 02) 2 o (80と 20とはモル%) の第 1保護層 2を基板 1 a上に形成した。 次いでこの基板を第 2のスパッタ室に移動した後、 ターゲットを Ag 4 I n 7 S b 62T e 2 7 (4, 7, 6 2, 2 7は原子。/。) 焼結体として、 アルゴンガス中でのスパッタリングに より記録層 4を 20 nmの厚さで積層した。 その後、 基板を酸化物形成室に移動 し、 酸素雰囲気中に一定時間放置して記録層 4を酸化処理した。 次いで第 3スパ ッタ室に基板を移動し、 第 1保護層形成と同様の要領で厚さ 20 nmの The technical limitation, except that the radial sense between the center of the groove 1 'and the center of the adjacent groove was 0.75 // m, was the same as in Example 1, except that the substrate 1a was It has a sputter chamber, and was placed in the first sputter chamber in a sputter apparatus with excellent layer thickness uniformity and reproducibility. Using a mixture of Z n S and S i 0 2 as a target, a thickness of 90 nm by sputtering in argon gas (Z n S) 80 (S i 0 2) 2 o (80 molar% and 20) The first protective layer 2 was formed on the substrate 1a. Then, after moving the substrate to a second sputtering chamber, a target Ag 4 I n 7 S b 62 T e 2 7 (4, 7, 6 2, 2 7 atomic ./.) As a sintered body, argon The recording layer 4 was laminated with a thickness of 20 nm by sputtering in a gas. Thereafter, the substrate was moved to an oxide formation chamber, and left in an oxygen atmosphere for a certain time to oxidize the recording layer 4. Next, the substrate is moved to the third sputter chamber, and a thickness of 20 nm is formed in the same manner as the formation of the first protective layer.
(Z n S) 80 (S i 02) 20 (モル。 /0) の第 2保護層 5を積層した。 次いで、 第 4スパッタ室内で A 1 T i合金をターッゲットとして用い、 A 1 9 9 T i ェ ( 9 9と 1とは重量。 /0) 反射層 7を l O O nmの厚さで積層した。 保護層と記録 層と反射層が積層された基板をスパッタ装置から取り出し、 最上層の上に紫外線 硬化樹脂保護層 8をスピンコートによって塗布した。 (Z n S) 80 (S it 02) 20 ( mol. / 0) a second protective layer 5 is laminated in. Then, using the A 1 T i alloy as Taggetto fourth sputtering chamber, A 1 9 9 T i E (9 9 1 The weight. / 0) a reflective layer 7 was laminated with a thickness of l OO nm. The substrate on which the protective layer, the recording layer, and the reflective layer were laminated was taken out of the sputtering apparatus, and the ultraviolet curable resin protective layer 8 was applied on the uppermost layer by spin coating.
同様にして、 もう一枚の同様な基板 1 b上に (Z n S) 80 (S i〇2) 2 0 ( 80と 20とはモル。 /0) の第 1保護層 2 '、 記録層 4 '、 Similarly, the other piece of the same substrate 1 on b (Z n S) 8 0 (S I_〇 2) 2 0 (80 and moles. / 0 and 20) first protective layer 2 ', the recording Tier 4 ',
(Z n S) 80 (S i O 2) 20 (80と 20とはモル。 /0) の第 2保護層 5 A 1 9 9T i ! (9 9と 1とは重量。 /。) の反射層 6 '、 紫外線硬化樹脂保護層 8 'を 順次積層し、 2枚の基板を、 紫外線硬化樹脂保護層 8、 8'を内側にして対面さ せて接着剤層 9によって貼り合わせを行った。 この時、 接着剤層の直径を 1 1 8 mm以上にすると落下などの衝撃による接着剤層の剥離が起こりにくくなった。 記録層 4'に対しては、 記録層 4と同様な酸化処理を行った。 (Z n S) 8 0 ( S i O 2) 20 (80 molar and 20. / 0) a second protective layer 5 A 1 9 9 of T i! (The weight of 9 and 1 is weight. /.) Reflective layer 6 ′ and UV curable resin protective layer 8 ′ are sequentially laminated, and two substrates face each other with UV curable resin protective layers 8 and 8 ′ inside. Then, bonding was performed using the adhesive layer 9. At this time, if the diameter of the adhesive layer was set to 118 mm or more, peeling of the adhesive layer due to impacts such as dropping became difficult to occur. The same oxidation treatment as that of the recording layer 4 was performed on the recording layer 4 ′.
記録を溝上にのみ行った以外の技術的限定は、 実施例 1と同様にして、 上記の ように記録された信号のジッターを測定した後、 ディスクを 80 °C 90 %の環境 · 下に 2 0 0時間放置する加速試験を行い、 加速試験後ジッターの測定を行った。 酸素分圧と放置時間を変え、 記録層中の I n酸化物および S b酸化物の含有量を 変えたとき、 加速試験前後でのジッターは以下のようになった。 記録層中の I n 酸化物および S b酸化物の含有量の測定には X P S装置を用い、 I nおよび S b の X P Sスペク トルをピーク分離することにより求めた。 なお、 表 3において、 eは酸化物状態の I nの含有量、 f は金属または合金の非酸化物状態の I nの含 有量、 gは酸化物状態の S bの含有量、 hは金属または合金の非酸化物状態の S bの含有量である。 The technical limitation, except that recording was performed only on the groove, was as described in Example 1. After measuring the jitter of the signal recorded as described above, the disc was placed in an environment at 80 ° C and 90%. An acceleration test in which the sample was allowed to stand for 200 hours was performed below, and the jitter was measured after the acceleration test. When the oxygen partial pressure and the storage time were changed and the content of In oxide and Sb oxide in the recording layer was changed, the jitter before and after the acceleration test was as follows. The content of In oxide and Sb oxide in the recording layer was measured using an XPS apparatus, and the XPS spectra of In and Sb were separated by peaks. In Table 3, e is the In content in the oxide state, f is the In content in the non-oxide state of the metal or alloy, g is the Sb content in the oxide state, and h is The content of Sb in the non-oxide state of the metal or alloy.
【表 3】 [Table 3]
記録層の酸化処理を確実に行わなかつたサンプル 7は、 サンプル 1〜 6に比べ て加速試験後のジッターが著しく増大した。 また、 放置時間を最も長くしたサン プル 1は、 加速試験前後でジッターの変化はなかったが、 初期ジッターがサンプ ル 2〜 7に比べて著しく悪くなつた。 In Sample 7, in which the recording layer was not oxidized, the jitter after the accelerated test was significantly increased as compared with Samples 1 to 6. In Sample 1, which had the longest standing time, the jitter did not change before and after the accelerated test, but the initial jitter was significantly worse than Samples 2 to 7.
なお、 上記サンプル:!〜 6では記録層を酸素雰囲気中に放置することによって 記録層の酸化処理を行つたが、 アルゴンと酸素の混合ガス雰囲気中で記録層を形 成することによつても記録層を酸化させることができる。 The above sample :! In Nos. 6 to 6, the recording layer was oxidized by leaving the recording layer in an oxygen atmosphere.However, the recording layer was also oxidized by forming the recording layer in a mixed gas atmosphere of argon and oxygen. Can be.
なお上記において、 A g含有量を 1〜1 5原子。/。、 1 !含有量を1〜 1 5原子 %、 S b含有量を 4 5〜8 0原子。/。、 T e含有量を 2 0〜4 0原子%の範囲で変 化させた記録層を用いた場合にも上記と同様の結果が得られた。 In the above, the Ag content is 1 to 15 atoms. /. The content is 1 to 15 atom%, and the Sb content is 45 to 80 atom. /. The same results as described above were obtained when using a recording layer in which the Te content was changed in the range of 20 to 40 atomic%.
さらに、 他の元素、 たとえば A u、 C u、 P d、 T a、 W、 I r、 S c、 Y、 T i、 Z r、 V、 Nb、 C r、 Mo、 Mn、 F e、 Ru、 Co、 Rh、 N i、 T し S、 S e、 P tおよび Nのうちの少なくとも 1元素を 1〜 10原子%の範囲 で添加した場合にも同様の結果が得られた。 In addition, other elements such as Au, Cu, Pd, Ta, W, Ir, Sc, Y, Ti, Zr, V, Nb, Cr, Mo, Mn, Fe, Ru, Co, Rh, Ni, T, and at least one element of S, Se, Pt, and N are 1 to 10 Similar results were obtained with the addition in the range of atomic%.
【実施例 4】 [Example 4]
実施例 1と同様の基板 1 aを、 複数のスパッタ室を持ち、 膜厚の均一性および 再現性に優れたスパッタ装置内の第 1スパック室に配置した。 ターゲットとして Z n Sと S i O 2の混合物を用い、 アルゴンガス中で厚さ 90 nmの The same substrate 1a as that of Example 1 was placed in a first sparch chamber in a sputtering apparatus having a plurality of sputter chambers and having excellent film thickness uniformity and excellent reproducibility. Using a mixture of ZnS and SiO 2 as a target, a 90 nm thick
(Z n S) so (S i 02) 20 (モル0 /0) 第 1オーバーレイ層 2を形成した。 次 いでこの基板を第 2のスパッタ室に移動した後、 ターゲットとして C r 203を 用い、 アルゴンガス中で厚さ 20 nmの C r 203の第一保護層 3を形成した。 さらにこの基板を第 3スパッタ室に移動した後、 タ一ゲットを (Z n S) so (S i 0 2) 20 ( mol 0/0) to form a first overlay layer 2. After the next Ide The substrate was moved to a second sputtering chamber, a C r 2 0 3 used as a target, to form a C r 2 0 first protective layer 3 of 3 of 20 nm thick in argon gas. After moving this substrate to the third sputtering chamber,
Ag 2. 5Ge 20S b 22. 5T e 55 (原子。 /0) 焼結体として、 アルゴンガス中 で記録膜 4を 16 nmの厚さで形成した。 その後第 3スパッタ室内に酸素分圧 1 0%のアルゴンと酸素の混合ガスをガス流量 200 S CCMにて一定時間流入さ せて記録膜 4を酸化処理した。 次いで第 4スパッタ室に基板を移動し、 アルゴン と窒素の混合ガス中で厚さ 1 8!!^の n S -S i O 2— Nの第 2保護層 5を形 成した。 次いで、 第 5スパッタ室内で A 1 C r合金をターッゲットとして用い、Ag 2. As 5 Ge 20 S b 22. 5 T e 55 ( atom. / 0) sintered body was formed in the thickness of the recording film 4 of 16 nm in an argon gas. Thereafter, a recording gas 4 was oxidized by flowing a mixed gas of argon and oxygen having a partial pressure of oxygen of 10% into the third sputtering chamber at a gas flow rate of 200 SCCM for a certain period of time. Next, the substrate was moved to the fourth sputtering chamber, and a thickness of 18! ! ^ Formed a second protective layer 5 of n S -S i O 2 —N. Next, using the A 1 Cr alloy as a target in the fifth sputtering chamber,
A 1 94C r 6 (原子。 /0) 第 1反射層 6を 35 nmの厚さで形成した。 最後に第 6スパッタ室室内で A 1 T i合金をターッゲッ トとして用い、 A 1 99 T i ェ (重量。 /0) の第 2反射層 7を 35 nm形成した。 積層された基板をスパッタ装置 力 ら取り出し、 最上層の上に紫外線硬化樹脂保護層 8をスピンコートによって形 成した。 同様にしてもう一枚の同様な基板 1 b上に A 1 94 C r 6 (atom. / 0) and the first reflective layer 6 was formed with a thickness of 35 nm. Finally with A 1 T i alloy sixth sputtering chamber interior as Tagge' bets, and the second reflection layer 7 of A 1 99 T i E (wt. / 0) to 35 nm formed. The laminated substrate was taken out from the sputtering apparatus, and an ultraviolet curable resin protective layer 8 was formed on the uppermost layer by spin coating. Similarly, on another similar substrate 1 b
(ZnS) 80 (S i O 2) 20 (モル%) 第 1オーバーレイ層 2'、 C r 203保 護膜 3'、 記録膜 4'、 Z n S— S i 02— N第 2保護層 5'、 A 1 94C r 6 (原子 %) 第 1反射層 6'を、 A l 99T i i (重量%) 第 2反射層 7 '、 紫外線硬化樹脂 保護層 8'を形成し、 2枚の基板を、 紫外線硬化樹脂保護層 8、 8'を内側にして 接着剤層 9によって貼り合わせを行った。 この時、 接着剤層の直径を 1 18 mm 以上にすると落下などの衝撃による接着剤層の剥離が起こりにくくなった。 上記のようなディスクを数種類準備し、 ドライブを用いて 8— 16変調された ランダム信号を記録してエラ一レートを測定した後、 ディスクを 9 0 °C 8 0 %の 環境下に 1 0 0時間放置する加速試験を行い、 加速試験後、 同一個所のエラーレ ート再生エラ一レート) を測定した後、 その場所にランダム信号をオーバライ ト してエラ一レート (オーバライ トエラーレート) を測定した。 記録膜中の酸素含 有量を 8原子%と一定にし、 Z n S— S i 0 2— N第 2保護層の成膜時のアルゴ ンと窒素の混合ガス中の窒素濃度を変えて Z n S— S i O 2— N第 2保護層中の 窒素含有量を変えたときに、 加速試験後ェラーレートが 2倍以上に増大したディ スク枚数は以下のようになった。 なお、 記録膜中の酸素含有量および第 2保護層 中の窒素含有量の測定にはォージ 電子分光法を用いた。 (ZnS) 8 0 (S i O 2) 20 ( mol%) first overlay layer 2 ', C r 2 0 3 coercive Mamorumaku 3', recording layer 4 ', Z n S- S i 0 2 - N a 2 Protective layer 5 ', A 1 94 Cr 6 (atomic%) First reflective layer 6', Al 99 T ii (wt%) Second reflective layer 7 ', UV curable resin Protective layer 8' Then, the two substrates were bonded together with the adhesive layer 9 with the UV-curable resin protective layers 8 and 8 ′ inside. At this time, if the diameter of the adhesive layer was set to 118 mm or more, peeling of the adhesive layer due to an impact such as dropping became difficult to occur. Prepare several types of discs as described above, and 8-16 modulated using a drive After recording a random signal and measuring the error rate, an acceleration test is performed in which the disc is left for 100 hours in an environment of 90 ° C and 80%, and after the acceleration test, the error rate reproduction error at the same location is performed. After measuring the error rate, the random signal was overwritten at that location and the error rate (overwrite error rate) was measured. Oxygen-containing organic content in the recording film is kept constant at 8 atomic%, Z n S- S i 0 2 - by changing the N nitrogen concentration in the mixed gas of argon emissions and nitrogen during deposition of the second protective layer Z n S- S i O 2 - when changing the n nitrogen content of the second protective layer, disc number of sheets after the acceleration test Erareto is increased more than 2 times were as follows. The oxygen content in the recording film and the nitrogen content in the second protective layer were measured by using forge electron spectroscopy.
【表 4】 [Table 4]
第 2保護層中の窒素含有量を 6 0原子%とした場合には 1 0枚中 9枚のディス クで再生エラーレートが 2倍以上になっただけでなく、 そのうちの 8枚で再生そ のものが極めて困難になる現象が生じた。 窒素含有量 5 0原子。 /0、 2 5原子%の 場合にも再生エラーが 2倍以上になるディスクが生じたが、 これらのディスクに おいては再生が困難になるような現象は生じなかった。 When the nitrogen content in the second protective layer was 60 atomic%, the reproduction error rate not only doubled or increased with nine out of ten discs but also with eight of those discs. A phenomenon that made it extremely difficult. Nitrogen content 50 atoms. In some cases, the reproduction error was more than doubled in the case of / 0 , 25 atomic%, but no phenomenon that made reproduction difficult in these disks occurred.
【実施例 5】 [Example 5]
実施例 1と同様の方法で作製したディスクに、 最短マーク長を変えて記録を行 つた後、 温度 9 0 相対湿度 8 0 %の環境に 1 0 0時間放置する加速試験を行つ て、 加速試験後ジッターを測定した。 溝 1 'の中心とそれに隣接するランド部 1 " との間の半径方向距離は 0 . 7 4 μ πιとし、 記録は溝上とランド部上の両方に行 つた。 なお、 変調方式としては、 マークの位置に情報の 1を、 そうでない部分に 情報の 0を持たせるマークポジション方式と、 マークの端に情報の 1を、 そうで ない部分に情報の 0を持たせるマークエッジ方式の両方について検討を行った。 記録膜中の酸素含有量を変えたとき加速試験後のジッターは図 5のように変化し た。 After recording on a disk manufactured in the same manner as in Example 1 with the shortest mark length changed, an acceleration test was performed in which the sample was left for 100 hours in an environment with a temperature of 90% and a relative humidity of 80% to accelerate. After the test, the jitter was measured. The radial distance between the center of the groove 1 'and the land 1 "adjacent to it is 0.74 μππ, and recording is performed both on the groove and on the land. I got it. The modulation method is a mark position method in which information of 1 is placed at the mark position and information of 0 is placed at other positions, and information 1 is placed at the end of the mark and information is placed at other positions. We examined both of the mark edge methods. When the oxygen content in the recording film was changed, the jitter after the acceleration test changed as shown in FIG.
【実施例 6】 [Example 6]
直径 1 2 0 m m、 厚さ 0 . 6 mmの透明材料 (例えば、 ポリカーボネート樹脂、 ガラス等) からなり、 図 2に示されるような (即ち、 同心円状の、 或いは螺旋状 の表面形状上の) ほぼ円周方向に延びる半径方向に並列された溝 1 'とほぼ円周 方向に延びる半径方向に並列されたランド部 1 "とが形成され、 溝 1 'の中心とそ れと隣接するランド部 1 "の中心との距離が異なる基板 1 aを数種類用意した。 これらの基板上に、 実施例 1と同様の方法で作製したディスクに、 最短マーク長 0 . 7 μηιとして記録を行った後、 温度 9 0 °C相対湿度 8 0 %の環境に 1 0 0時 間放置する加速試験を行って、 加速試験後ジッターを測定した。 なお、 変調方式 としては、 マークの位置に情報の 1を、 そうでない部分に情報の 0を持たせるマ ークポジション方式と、 マークの端に情報の 1を、 そうでない部分に情報の 0を 持たせるマークエッジ方式の両方について検討を行った。 It is made of a transparent material (eg, polycarbonate resin, glass, etc.) with a diameter of 120 mm and a thickness of 0.6 mm, as shown in FIG. 2 (ie, on a concentric or spiral surface). A radially extending groove 1 ′ extending substantially in the circumferential direction and a radially extending land 1 ″ extending substantially in the circumferential direction are formed, and the center of the groove 1 ′ and the land adjacent thereto are formed. Several types of substrates 1a having different distances from the center of 1 "were prepared. After recording on these substrates with the shortest mark length of 0.7 μηι on a disk fabricated in the same manner as in Example 1, the disk was placed in an environment at a temperature of 90 ° C and a relative humidity of 80% for 100 hours. An acceleration test in which the sample was left for a while was performed, and the jitter was measured after the acceleration test. The modulation method is a mark position method in which information of 1 is placed at the position of the mark and information of 0 is placed at the other position, and information 1 is placed at the end of the mark and information of 0 is placed at the other position. Both mark edge methods were studied.
記録膜中の酸素含有量を変えたとき加速試験後のジッターは図 6のように変化 した。 When the oxygen content in the recording film was changed, the jitter after the acceleration test changed as shown in FIG.
【実施例 7】 [Example 7]
直径 1 2 0 mm、 厚さ 0 . 6 mmの透明材料 (例えば、 ポリカーボネート樹脂、 ガラス等) からなり、 図 2に示されるような (即ち、 同心円状の、 或いは螺旋状 の表面形状上の) ほぼ円周方向に延びる半径方向に並列された溝 1 'とほぼ円周 方向に延びる半径方向に並列されたランド部 1 "とが形成され、 さらに、 これら の溝 1 'あるいはランド部 1 "が円周方向において複数の溝部分或いは複数のラン ド部分に分割されており、 溝部分或いはランド部分の間の領域に、 溝 1 'あるい はランド部 1 "がそれに沿って延びる円周方向にほぼ沿ってァドレス情報などを 示すエンボスピットが形成された基板 1 aを用意した。 この基板上に、 実施例 1 と同様の方法でディスクを作製し、 上記溝 1 'とランド部 1 "の両方を記録トラッ クとして、 複数の記録トラックに 1万回記録を行つた後、 温度 90 °C相対湿度 8 0 %の環境に一定時間放置する加速試験を行った。 加速環境に放置する時間を変 えて、 1万回記録を行った溝 1'あるいはランド部 1"の領域、 すなわち情報の記 録が可能な第 1領域の記録層中の酸素含有量と、 ァドレス情報などを示すェンボ スピットを形成した領域、 すなわち所定の情報の再生のみを行う第 2領域の記録 層中の酸素含有量と、 第 1領域と第 2領域の反射率との関係は以下のように変化 した。 It is made of a transparent material (eg, polycarbonate resin, glass, etc.) with a diameter of 120 mm and a thickness of 0.6 mm, as shown in FIG. 2 (ie, on a concentric or spiral surface). Radially juxtaposed grooves 1 ′ extending substantially in the circumferential direction and radially juxtaposed lands 1 ″ extending substantially in the circumferential direction are formed. Further, these grooves 1 ′ or lands 1 ″ are formed. In the circumferential direction, it is divided into a plurality of groove portions or a plurality of land portions, and in the region between the groove portions or the land portions, the groove 1 ′ or the land portion 1 ″ extends in the circumferential direction along which it extends. was prepared substrate 1 a of the embossed pits are formed indicating, for example Adoresu information substantially along. both on the substrate, to prepare a disk in the same manner as in example 1, the groove 1 'and the land portion 1 " Record track After recording 10,000 times on multiple recording tracks, an acceleration test was performed in which the device was left in an environment at a temperature of 90 ° C and a relative humidity of 80% for a certain period of time. Oxygen content in the recording layer of the groove 1 'or land 1 "area where the recording was performed 10,000 times, that is, the first area where information can be recorded, and the address The relationship between the oxygen content in the recording layer of the area where the emboss pits indicating information and the like are formed, that is, the second area where only predetermined information is reproduced, and the reflectance of the first area and the second area is as follows. Has changed to
【表 5】 [Table 5]
放置時間 第 1領域 第 2領域 第 1領域と第 2領域 第 1領域と第 2領域 の酸素含 の酸素含 の酸素含有量の差 の反射率の差 有量 有量 Leaving time 1st area 2nd area 1st area and 2nd area 1st area and 2nd area Oxygen-containing oxygen content difference of oxygen content Difference in reflectance
0時間 4 % 2% 2% 0 % 0 hours 4% 2% 2% 0%
50時間 8 % 2% 6 % 0〜; 1 % 50 hours 8% 2% 6% 0 ~; 1%
100時間 10 % 2% 8% 1 % 100 hours 10% 2% 8% 1%
200時間 1 5% 2% 13% 2% 200 hours 1 5% 2% 13% 2%
300時間 20 % 3 % 1 7% 4 % 300 hours 20% 3% 1 7% 4%
500時間 22% 4 % 1 8 % 5% 500 hours 22% 4% 1 8% 5%
1000時間 25 % 5 % 20 % 8 % 1000 hours 25% 5% 20% 8%
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU49313/99A AU4931399A (en) | 1998-07-31 | 1999-07-30 | Information recording medium and information recording method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10/229535 | 1998-07-31 | ||
| JP22953598 | 1998-07-31 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09744883 A-371-Of-International | 2001-01-31 | ||
| US10/330,245 Division US20030124458A1 (en) | 1998-07-31 | 2002-12-30 | Information recording medium and information recording method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2000006391A1 true WO2000006391A1 (en) | 2000-02-10 |
Family
ID=16893702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1999/004110 Ceased WO2000006391A1 (en) | 1998-07-31 | 1999-07-30 | Information recording medium and information recording method |
Country Status (4)
| Country | Link |
|---|---|
| CN (1) | CN1180942C (en) |
| AU (1) | AU4931399A (en) |
| TW (1) | TW518588B (en) |
| WO (1) | WO2000006391A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007061021A1 (en) * | 2005-11-22 | 2007-05-31 | Sony Corporation | Recordable optical recording medium and method for manufacturing same |
| JP2007293949A (en) * | 2006-04-21 | 2007-11-08 | Toshiba Corp | Optical recording medium, information recording / reproducing apparatus and method |
| US7352680B2 (en) | 2001-06-26 | 2008-04-01 | Ricoh Company, Ltd. | Optical recording medium having relation between reflection layer and pit length |
| JP2008217858A (en) * | 2007-02-28 | 2008-09-18 | Toshiba Corp | Phase change recording medium and information recording / reproducing apparatus using the medium |
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- 1999-07-30 WO PCT/JP1999/004110 patent/WO2000006391A1/en not_active Ceased
- 1999-07-30 AU AU49313/99A patent/AU4931399A/en not_active Abandoned
- 1999-07-30 CN CNB998091456A patent/CN1180942C/en not_active Expired - Fee Related
- 1999-07-31 TW TW088113122A patent/TW518588B/en not_active IP Right Cessation
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| US7352680B2 (en) | 2001-06-26 | 2008-04-01 | Ricoh Company, Ltd. | Optical recording medium having relation between reflection layer and pit length |
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| JP2008217858A (en) * | 2007-02-28 | 2008-09-18 | Toshiba Corp | Phase change recording medium and information recording / reproducing apparatus using the medium |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1180942C (en) | 2004-12-22 |
| AU4931399A (en) | 2000-02-21 |
| TW518588B (en) | 2003-01-21 |
| CN1311739A (en) | 2001-09-05 |
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