WO1999039333A1 - Air-conditioner, partition and exposure apparatus - Google Patents
Air-conditioner, partition and exposure apparatus Download PDFInfo
- Publication number
- WO1999039333A1 WO1999039333A1 PCT/JP1999/000345 JP9900345W WO9939333A1 WO 1999039333 A1 WO1999039333 A1 WO 1999039333A1 JP 9900345 W JP9900345 W JP 9900345W WO 9939333 A1 WO9939333 A1 WO 9939333A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chamber
- partition
- exposure apparatus
- plate
- air conditioner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/162—Selection of materials
- G10K11/168—Plural layers of different materials, e.g. sandwiches
-
- G—PHYSICS
- G10—MUSICAL INSTRUMENTS; ACOUSTICS
- G10K—SOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
- G10K11/00—Methods or devices for transmitting, conducting or directing sound in general; Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/16—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general
- G10K11/172—Methods or devices for protecting against, or for damping, noise or other acoustic waves in general using resonance effects
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F13/00—Details common to, or for air-conditioning, air-humidification, ventilation or use of air currents for screening
- F24F13/24—Means for preventing or suppressing noise
Definitions
- the present invention relates to an air conditioner used for temperature control of a machine tool, a measuring instrument, a semiconductor exposure apparatus, and the like, a partition, and an exposure apparatus.
- FIG. 4 shows an outline of the air conditioners used for temperature control of ultra-precision machine tools and measuring instruments.
- FIG. 4 shows an example of a reduction projection exposure apparatus including a reduction projection exposure apparatus body, a chamber, and an air conditioner used in an IC manufacturing process.
- Light or laser light 4 emitted from a light source 3 disposed in a case different from the chamber is irradiated on a reticle 6 on which an IC circuit pattern is formed.
- the light or laser beam 4 that has passed through the reticle 6 is incident on the projection lens 5, where it is reduced (for example, reduced to 1 Z 5), and irradiated on the silicon wafer 7 installed on the wafer stage 8. .
- the silicon wafer 7 is installed on the wafer stage 8, and can be moved by a moving mechanism of the wafer stage 8 in a plane perpendicular to the optical axis of the projection lens 5 by an external command.
- the light from the light source 3 is Alternatively, the reticle 6 is irradiated with the laser beam 4, the light is reduced by the projection lens 5, and the circuit pattern drawn on the reticle 6 is projected onto one chip area or one shot area on the silicon wafer 7, and the silicon wafer
- the wafer stage 8 is driven again, the positioning is performed, and further reduction projection exposure is performed.
- the circuit pattern of the IC is reduced and projected onto the silicon wafer 7.
- the reduced projection exposure apparatus is sensitive to changes in temperature and vibration, and is sensitive to line width. Failure to do so may result. Therefore, in order to eliminate these causes as much as possible, the main body of the reduction projection exposure apparatus is mounted on the vibration isolation table 2 and the entire apparatus is placed in the chamber 9.
- the chamber 9 receives air blow 12 from an air conditioner 10 consisting of a blower 13 and a heat exchanger 11 in which a blower and a blower are shared to perform temperature control. The separated air is supplied into the chamber 9 through the duct 15 and the filter 14.
- the temperature in the chamber 9 is constantly monitored by a sensor, and the signal of the sensor is fed back to the air conditioner 10 to control the air conditioner 10 so that the temperature in the chamber does not differ from the set temperature. Is done.
- the partition wall of the chamber is made of a material having high heat insulation so that an external temperature change does not reach the inside, and a partition wall having a sectional structure as shown in FIG. 5 is generally used.
- the bulkhead is made of a sandwich of hard foam urethane 17 sandwiched between two steel plates or aluminum plates 16 and is used not only to obtain the strength as a chamber, but also to obtain its heat insulation properties. ing.
- the main body of the reduction exposure apparatus in the chamber 9 is mounted so that the vibration isolation table 2 is placed on an independent foundation 21 on the ground 20.
- the chamber 9 and the air conditioner 10 are placed on a flooring 23 supported by a support 22 on the ground 20, and the space between the flooring 23 and the independent foundation 21 is filled with a cushioning material 24 such as rubber. Have been.
- the line width of the IC pattern required for the reduction projection exposure apparatus described in the previous section is 0. It is less than 35 ⁇ m.
- line widths of 0.25 m and even 0.15 zm are expected to fall within the range of the reduced projection exposure apparatus.
- disturbance factors that have not been a problem until now have been greatly highlighted, and situations have arisen in which it is necessary to take countermeasures.
- One of the disturbance factors is noise reaching the chamber from the environment in which the chamber is installed through the partition of the chamber.
- the chamber When applied to a reduction projection exposure apparatus, the chamber is usually installed in a clean room, but the noise in the clean room is transmitted to the partition of the chamber using air as a medium, and the air is further removed therefrom.
- a medium components such as a reduction projection exposure apparatus main body or a projection lens and a stage lens are vibrated, thereby causing relative displacement between the respective components of the reduction projection exposure apparatus, A problem arises when it becomes difficult to maintain a constant fine line width on the exposed surface.
- Figure 6 shows the results of noise measurements inside and outside the chamber installed in the clean room.
- the air conditioner blowing into the chamber was stopped, and only the noise entering from outside the chamber was measured.
- the partition walls of the chamber are those conventionally used having the cross-sectional configuration shown in FIG.
- extremely low out-of-audible noise (low-frequency vibration transmitted as compressional air waves) has a maximum sound pressure value of about 69 dB.
- This low-frequency noise is generated by a large blower for controlling the temperature of the clean room and a duct that guides the temperature-controlled air, and the noise released into the clean room is transmitted to the chamber through the partition of the chamber. It seems to have been.
- Equation (1) shows the relationship between the sound pressure level (SPL) in the chamber and the force generated in a unit area by the sound pressure value.
- FIG. 7 shows the relationship between the sound pressure level calculated from equation (1) and the acceleration due to vibration on the vibration isolator 2 on which the reduced projection exposure apparatus body is installed.
- the anti-vibration table 2 was of the type that performed active control, and the calculation was performed assuming that it had a damping capacity of about ⁇ 30 dB even in the low-frequency vibration region. From the noise measurement results shown in Fig. 6 and the calculated values in Fig. 7, it is considered that the maximum acceleration due to vibration on the anti-vibration table 2 where the reduced projection exposure apparatus main body is installed is about 1 mga1 at the maximum. .
- the value of 1 mga 1 which is usually considered as an acceleration value, is considered to be a very small value that has almost no effect, but has a meaning for a reduction projection exposure apparatus installed on the assumption that fine processing is performed. Value. Furthermore, the acceleration value of 1 mg a 1 is induced only by noise, and in fact, vibrations transmitted from the ground 20 through an independent foundation 21 are also added to this value. However, the situation will be even more severe and some measures will be required. Disclosure of the invention
- An air conditioner includes a partition having a first plate member disposed on a space side air-conditioned by an air conditioner and a second plate member disposed on a space side different from the space.
- a plurality of intermediate members disposed between the first plate member and the second plate member, wherein the intermediate member includes opposing portions having predetermined shapes opposing the first plate member and the second plate member, respectively. It has a cell.
- the partition wall of the present invention comprises a first plate member arranged on the air-conditioned space side and a second member arranged on a space side different from the space, wherein the first member is provided. And an intermediate member disposed between the first and second plate members, wherein the intermediate member has a number of cells each having an opposing portion having a predetermined shape facing each of the first and second members. It is.
- the exposure apparatus of the present invention includes an exposure apparatus for exposing a pattern on an original onto a photosensitive substrate.
- an intermediate member disposed between the first plate member and the second plate member, wherein the intermediate member has opposed portions of a predetermined shape facing the first plate member and the second plate member, respectively, and And a plurality of cells arranged between the second material.
- the cell is preferably formed of a hollow member having the opposing portion having the predetermined shape, and it is preferable because the cell can be reduced in weight.
- the intermediate material is a ceramic honeycomb structural material, since the intermediate material can have particularly high rigidity.
- the air conditioner of the present invention includes a chamber, a duct, and an air conditioner, and uses a wall material having a cellular material such as a honeycomb structure for a wall of the chamber.
- the exposure apparatus of the present invention uses a wall material having a cellular material such as a honeycomb structure for a wall of a chamber.
- FIG. 1 is a perspective view of a chamber partition according to the present invention.
- FIG. 2 is a schematic configuration diagram of a reduction projection exposure apparatus using a chamber according to the present invention.
- FIG. 3 shows the measurement results of the noise reduction effect of the present invention.
- FIG. 4 is a schematic configuration diagram of a reduction projection exposure apparatus using a conventional chamber.
- FIG. 5 is a perspective view of a conventional chamber partition.
- Fig. 6 shows the sound pressure level measurement results inside and outside the chamber constructed using the conventional partition walls.
- Fig. 7 shows the relationship (calculated value) between the sound pressure level and the vibration acceleration on the vibration isolation table.
- the present invention relates to a machine tool and a measuring device that require high precision, when performing ultra-precision processing and measurement in a chamber in which the air inside is kept clean and at a constant temperature by an air conditioner, when the chamber is used.
- the partition has a soundproofing effect (effect of insulating low-frequency noise).
- a considerable part of the noise transmitted from outside the chamber is considered to be caused by air conditioners for constant temperature, such as clean rooms, and ducts associated therewith. Therefore, the larger the size of the clean room, the larger the air-conditioner duct, and low frequency vibration of more than 10 Hz is generated.
- the low-frequency vibrations almost pass through the partition walls of the chamber using the conventional hard foamed polyurethane.
- the natural vibration frequency of the mechanical part of the equipment installed in the chamber is generally 100 Hz or less, and resonates with low-frequency noise coming from outside the chamber, causing unexpected vibration inside the chamber. It may occur in the equipment and cause a reduction in machining accuracy and measurement accuracy. Therefore, soundproofing of low-frequency noise is extremely important for equipment that pursues precision.
- the frequency of the noise in the clean room is clearly biased to the low frequency range as shown in Fig. 6, and only the low frequency noise is cut by the partition wall of the chamber. If this can be done, the effect on the equipment installed in the chamber can be greatly reduced.
- FIG. 2 illustrates one embodiment of the present invention.
- the reduction projection exposure apparatus main body of the reduction projection exposure apparatus is the same as the conventional example described with reference to FIG.
- the partition shown in FIG. 1 is used as the partition wall of the chamber 1, the duct 15 and the external panel of the air conditioner 10.
- the partition wall is composed of two steel plates or aluminum plates 16 as first and second plates, and a ceramic honeycomb structure material 18 as an intermediate material. It is a sandwich.
- the honeycomb structure material 18 is made of a cellular material having a predetermined shape. More specifically, the honeycomb structural material 18 is composed of an aggregate of rectangular cylinders (cells) having a hexagonal cross-sectional shape in the partition wall thickness direction. For example, as shown in FIG.
- each cell has a hexagonal shape with a side of about 10 mm and a thickness of about 0.25 mm.
- the size of the cell is not limited to this value, and may be larger or smaller.
- the cell assembly is also called a porous plate.
- the hexagonal hollow surface faces the first plate and the second plate, respectively, and the first plate and the second plate extend in the direction in which the cells extend (the X direction in FIG. 1).
- the thickness of the partition wall is suitably 30 to 60 mm as a whole in order to achieve a small bulk and high rigidity.
- a honeycomb structure material made of ceramic is used for the partition walls.
- a non-combustible magne 'honeycomb panel AW type manufactured by Showa Aluminum
- a measurement device for measuring noise is arranged in the chamber according to the present embodiment, and the noise measurement results measured by the measurement device and the noise measurement results measured outside the chamber are shown in FIG.
- FIG. 3 according to the chamber of the present embodiment, it is possible to confirm the soundproofing effect in a low-frequency range even with a chamber formed of a conventional steel plate made of hard foamed polyurethane 17.
- the honeycomb structural material Ceramic necessary rigidity as the chamber (e.g., the Young's modulus 1 5 X 1 0 7 N / m 2) Chikaraku, be obtained at a thickness 4 2 mm positions of the partition wall it can. This is about 10 times different in rigidity than the conventional partition wall using urethane. That is, in the partition wall using a urethane, a thickness of 4 4 mm position of the partition wall, the Young's modulus Ru 1 5 X 1 O s NZm 2 about der. That is, the honeycomb structural material of the present embodiment has a bending rigidity about 10 times that of the conventional partition wall for the chamber. Therefore, by using a honeycomb structure material as a partition for the chamber, the rigidity is increased, and an extremely high soundproofing effect against noise in a low frequency range can be expected.
- the honeycomb structural material Ceramic necessary rigidity as the chamber (e.g., the Young's modulus 1 5 X 1 0 7 N / m 2) Chikaraku, be obtained at
- the partition according to the present embodiment may be particularly used only for the partition of chamber 1.
- a typical projection exposure apparatus is roughly composed of three parts.
- a light source device that accommodates a light source that emits exposure light
- second a light-sending optical system that guides exposure light from the light source device to an illumination optical system described below
- third a mask is illuminated. It is composed of an illumination optical system, a mask stage on which the mask is mounted, a projection optical system for transferring the pattern formed on the mask onto the substrate, and an apparatus body including a substrate stage on which the substrate is mounted.
- the light source device is housed in a light source chamber
- the light transmitting optical system is housed in a connection unit
- the device main body is housed in the main body chamber.
- the partition in the present embodiment may be applied to at least one of the light source chamber, the connection unit, and the main body chamber. In a preferred embodiment, it is desirable to apply to all.
- the partition wall in this embodiment is preferably used for the entire chamber, but may be a part thereof.
- a partition having an intermediate material of a high-rigidity honeycomb structure material that is particularly effective for noise in a low frequency range is used, but the soundproofing method using the partition is not limited to this.
- the cell may be a hollow member as described above, or the inside of the cell may be filled with a filler.
- a filled configuration may be used.
- a filler it is preferable to use a sponge-like foam or a resin.
- the foam a hard or soft polyurethane foam is preferable, and as the resin, rubber is preferable.
- the cell may be configured by a hollow member as described above, or may be configured to have an internal space by closing an opening of the hollow member.
- the cell may be filled with a foam in the hollow portion or the internal space to have a nest (hollow), and the resin may be formed in the hollow portion or the internal space so that no nest (hollow) is generated. It may be a configuration that fills closely. According to this configuration, improvement in heat insulation and prevention of low-frequency noise can be expected.
- a soundproofing effect is expected for noise in the frequency range from low frequencies to the order of kHz. it can.
- the configuration of the partition wall in the present embodiment is a configuration in which two steel plates or aluminum plates and the intermediate material are in contact with each other.
- the configuration is not limited to this configuration. Is also good.
- honeycomb structural material is a hexagonal cellular material, it is not necessarily required to be a hexagonal material. Therefore, the expression “cellular material” is used in the claims.
- a partition wall of a chamber of an exposure apparatus an outer panel of an air conditioner that supplies air into a chamber accommodating the exposure apparatus, and a partition wall of a duct provided between the air conditioner and the chamber
- an aggregate (honeycomb structural material) of prisms (cells) having a hexagonal cross-sectional shape was used in the above, the present invention can be applied to other than those described in the present embodiment. For example, it can be applied to a partition wall of a room isolated from the outside. Further, the present invention can be applied to a partition wall between a room in which an air conditioner is arranged and a room to be air-conditioned by the air conditioner.
- the cell shape and the cellular material of the intermediate material according to the present embodiment are hexagonal as described above, but are not particularly limited to this shape, and may be polygonal shapes such as triangles, pentagons, and octagons, circles, and the like. It may be constituted by an ellipse or the like.
- the cellular material an aggregate of hexagonal cylinders (cells) is shown, but the present invention is not limited to this.
- it may be composed of an aggregate of shells wrapping the filler.
- a material constituting the shell it is preferable to use ceramic, an aluminum alloy or the like.
- the shape of the shell may be spherical or cubic. In this case, the shells are preferably arranged regularly, but may be arranged randomly.
- low-frequency noise which is difficult to insulate and has a great influence on the device, can be reduced by about 6 dB to 12 dB. It is possible to reduce the acceleration value due to the vibration on the vibration isolation table caused by the above to about 1/2 to 1/10. As a result, an extremely effective environment can be provided for machine tools, interferometers and other measuring instruments that are expected to become even more precise in the future, and for reduced projection exposure equipment.
- region which cannot be prevented by the conventional partition can be sound-proofed.
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- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Multimedia (AREA)
- Environmental & Geological Engineering (AREA)
- Acoustics & Sound (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Description
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU20759/99A AU2075999A (en) | 1998-01-28 | 1999-01-27 | Air-conditioner, partition and exposure apparatus |
| US09/628,320 US6450288B1 (en) | 1998-01-28 | 2000-07-28 | Air-conditioning apparatus, partition and exposure apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10/15884 | 1998-01-28 | ||
| JP10015884A JPH11210109A (ja) | 1998-01-28 | 1998-01-28 | 空調装置、隔壁及び露光装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/628,320 Continuation US6450288B1 (en) | 1998-01-28 | 2000-07-28 | Air-conditioning apparatus, partition and exposure apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1999039333A1 true WO1999039333A1 (en) | 1999-08-05 |
Family
ID=11901229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1999/000345 Ceased WO1999039333A1 (en) | 1998-01-28 | 1999-01-27 | Air-conditioner, partition and exposure apparatus |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6450288B1 (ja) |
| JP (1) | JPH11210109A (ja) |
| AU (1) | AU2075999A (ja) |
| WO (1) | WO1999039333A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009182326A (ja) * | 2008-01-31 | 2009-08-13 | Asml Netherlands Bv | リソグラフィ装置、方法、およびデバイス製造方法 |
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| JP2002257502A (ja) * | 2001-03-05 | 2002-09-11 | Junichi Kushibiki | 厚さ測定装置及び測定方法 |
| JP4303183B2 (ja) * | 2004-09-03 | 2009-07-29 | 株式会社神戸製鋼所 | 二重壁構造体 |
| EP1903157A3 (de) * | 2006-09-19 | 2008-05-14 | Integrated Dynamics Engineering GmbH | Umgebungslärmabschirmvorrichtung |
| US8170225B2 (en) * | 2007-02-14 | 2012-05-01 | Integrated Dynamics Engineering Gmbh | Method for adapting a vibration isolation system |
| US7969550B2 (en) * | 2007-04-19 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8835883B2 (en) | 2010-06-16 | 2014-09-16 | Hitachi High-Technologies Corporation | Charged particle radiation device and soundproof cover |
| JP5709487B2 (ja) * | 2010-11-26 | 2015-04-30 | 三菱重工業株式会社 | 遮音壁の設計方法および遮音壁 |
| TW201346205A (zh) * | 2012-01-13 | 2013-11-16 | 尼康股份有限公司 | 箱室裝置及隔熱板 |
| JP5916828B2 (ja) * | 2014-10-27 | 2016-05-11 | 三菱重工業株式会社 | 遮音壁の設計方法および遮音壁 |
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| JPH09260279A (ja) | 1996-03-26 | 1997-10-03 | Nikon Corp | 露光装置 |
| JP3837773B2 (ja) | 1996-03-28 | 2006-10-25 | 株式会社ニコン | 露光装置の環境制御方法及び装置 |
| JP3437406B2 (ja) * | 1997-04-22 | 2003-08-18 | キヤノン株式会社 | 投影露光装置 |
| JPH11325655A (ja) * | 1998-05-14 | 1999-11-26 | Matsushita Seiko Co Ltd | 消音器および空気調和機 |
-
1998
- 1998-01-28 JP JP10015884A patent/JPH11210109A/ja active Pending
-
1999
- 1999-01-27 AU AU20759/99A patent/AU2075999A/en not_active Abandoned
- 1999-01-27 WO PCT/JP1999/000345 patent/WO1999039333A1/ja not_active Ceased
-
2000
- 2000-07-28 US US09/628,320 patent/US6450288B1/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61207747A (ja) * | 1985-03-11 | 1986-09-16 | 株式会社イナックス | 音響タイル |
| JPH04303897A (ja) * | 1991-04-01 | 1992-10-27 | Matsushita Electric Ind Co Ltd | 遮音材 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009182326A (ja) * | 2008-01-31 | 2009-08-13 | Asml Netherlands Bv | リソグラフィ装置、方法、およびデバイス製造方法 |
| US8310651B2 (en) | 2008-01-31 | 2012-11-13 | Asml Netherlands B.V. | Lithographic apparatus, method and device manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| US6450288B1 (en) | 2002-09-17 |
| JPH11210109A (ja) | 1999-08-03 |
| AU2075999A (en) | 1999-08-16 |
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