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WO1999035102A1 - Ultraviolet-absorbing fire-proof and -resistant transparent plate - Google Patents

Ultraviolet-absorbing fire-proof and -resistant transparent plate Download PDF

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Publication number
WO1999035102A1
WO1999035102A1 PCT/JP1999/000042 JP9900042W WO9935102A1 WO 1999035102 A1 WO1999035102 A1 WO 1999035102A1 JP 9900042 W JP9900042 W JP 9900042W WO 9935102 A1 WO9935102 A1 WO 9935102A1
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WO
WIPO (PCT)
Prior art keywords
group
ultraviolet
absorbing
carbon atoms
fire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP1999/000042
Other languages
French (fr)
Japanese (ja)
Inventor
Tsuyoshi Asano
Junichiro Tanimoto
Noboru Takaesu
Yoshinori Nishikitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mitsubishi Oil Corp
Nippon Oil Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mitsubishi Oil Corp, Nippon Oil Corp filed Critical Nippon Mitsubishi Oil Corp
Publication of WO1999035102A1 publication Critical patent/WO1999035102A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • EFIXED CONSTRUCTIONS
    • E04BUILDING
    • E04BGENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/62Insulation or other protection; Elements or use of specified material therefor
    • E04B1/92Protection against other undesired influences or dangers
    • E04B1/94Protection against other undesired influences or dangers against fire
    • E04B1/941Building elements specially adapted therefor
    • E04B1/942Building elements specially adapted therefor slab-shaped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/10009Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
    • B32B17/10036Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising two outer glass sheets
    • B32B17/10045Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising two outer glass sheets with at least one intermediate layer consisting of a glass sheet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/10165Functional features of the laminated safety glass or glazing
    • B32B17/10311Intumescent layers for fire protection
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00

Definitions

  • the present invention relates to a transparent laminated fireproof plate provided with an ultraviolet absorbing ability.
  • the method (1) of treating with an ultraviolet-absorbing substance is roughly classified into a method using an inorganic ultraviolet absorber and a method using an organic ultraviolet absorber.
  • the inorganic ultraviolet absorbers described in Although it has excellent weather resistance, heat resistance, and the like, the degree of freedom is small because the absorption wavelength is determined by the band gap of the compound, and the ultraviolet region near 400 nm cannot be clearly cut. In addition, many inorganic UV absorbers capable of cutting the long wavelength region are accompanied by coloring.
  • organic UV absorbers have a wide range of absorption bands, so that various types of absorption wavelengths can be obtained by selecting the type, concentration, and film thickness of the absorber.
  • systems using various organic UV absorbers have been studied.If the power is to be applied to the long wavelength region, use one having a maximum absorption wavelength in the long wavelength region or use a concentration or concentration.
  • those having a maximum absorption wavelength in a long wavelength region see, for example, Japanese Patent Application Laid-Open No. H6-1458787) have poor light resistance, and the absorption capacity decreases with time.
  • Japanese Patent Application Laid-Open No. 6-145,887 there is also a problem in that the use of a fluorescent whitening agent deteriorates the visibility due to fluorescence.
  • benzophenone-based and benzotriazole-based UV absorbers have relatively good light fastness, and can be cut relatively clearly up to the long wavelength region by increasing their concentration and film thickness.
  • the thickness of the coating film is limited to several m.
  • the concentration of the UV absorber in the coating film must be considerably increased, in which case the UV absorber precipitates and bleed out due to long-term use There is.
  • the present invention has been made in order to solve the above-mentioned problems, and an object of the present invention is to provide an ultraviolet absorber that is excellent in weather resistance and heat resistance, and that does not lead out even during long-term use. It is an object of the present invention to provide a UV-absorbing fire-resistant transparent plate that can be pumped to a long-wavelength region of UV light without lowering transmittance.
  • the ultraviolet-absorbing fire-resistant transparent plate according to the present invention is a laminated fire-resistant fire-resistant transparent plate provided with a foam layer containing a heat-sensitive foaming agent between a plurality of transparent substrates juxtaposed at intervals in the thickness direction.
  • the transparent substrates used for the laminated fireproof transparent plate has an ultraviolet absorbing layer on its surface, and the ultraviolet absorbing layer has
  • component A an aminosilane compound represented by the following general formula (1) or a derivative thereof (hereinafter referred to as component A):
  • component B A reaction product obtained by reacting an ultraviolet absorbing compound having a carboxyl group in the molecule (hereinafter referred to as component B) to form an amide bond derived from component A is placed on a transparent substrate. It is characterized by being manufactured by coating and curing.
  • R 1 is an alkylene group having 1 to 10 carbon atoms, or a divalent group represented by the general formula 1 (CH 2 ) m- NH-[m is an integer of l ⁇ m ⁇ 4]
  • each R 2 is the same or different, and represents a hydrogen atom, a hydroxyl group, a halogen atom,
  • the ultraviolet-absorbing fire-resistant transparent plate of the present invention has a structure in which a foam layer containing a heat-sensitive foaming agent is provided between a plurality of transparent substrates juxtaposed at an interval in the plate thickness direction. At least one of the transparent substrates used is provided with an ultraviolet absorbing layer between the transparent substrate and the foamed layer.
  • any plate having a transmittance of 10% to 100% in a visible light region and having a smooth surface at room temperature can be used. It may be deformed by stress.
  • colorless or colored glass, frosted glass, inorganic glass such as meshed glass can be used, and also colorless or colored synthetic resin, specifically, polyethylene terephthalate, polyimide Plates such as polysulfone, polysulfone, polyethersulfone, polyphenylene sulfide, polycarbonate, polyimide, polymethyl methacrylate, and polystyrene can be used.
  • inorganic glass is suitable for the transparent substrate used in the present invention because of its excellent fire and fire resistance.
  • the ultraviolet absorbing layer provided on the transparent substrate is obtained by applying the reaction product of the component A and the component B on the transparent substrate and curing the component.
  • R 1 is an alkylene group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or a general formula — (CH 2 ) m — NH— [m is an integer of l ⁇ m ⁇ 4] Represents a divalent group represented by Examples of the alkylene group include a methylene group, an ethylene group, a trimethylene group, and a propylene group.
  • R 2 are the same or different groups A hydrogen atom, a hydroxyl group, a halogen atom such as chlorine or bromine, an alkyl or alkoxy group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or an aryl group having 6 to 10 carbon atoms, preferably 6 to 8 carbon atoms. Represents an aryl group. However, at least one, preferably 2 to 5, of all R 2 is an alkoxy group. Examples of the alkyl group for R 2 include a methyl group, an ethyl group, a propyl group, and an i-propyl group. Examples of the aryl group include a phenyl group and a tolyl group. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group and an i-propoxy group. n represents n 0, preferably an integer of 0 ⁇ n ⁇ 3.
  • aminosilane compound represented by the general formula (1) are as follows: 3-aminopropyltriethoxysilane, 3-aminopropyldiisopropylethoxysilane, 3-aminopropylmethyljetoxysilane, -Aminopropyl trichlorosilane, 3-aminopropylpolydimethylsiloxane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltris (methoxetoxyhetoxy) silane, and the like. Any of them can be synthesized by a known method.
  • a derivative of the aminosilane compound represented by the general formula (1) can be used.
  • a hydrolyzate of the aminosilane compound represented by the general formula (1) is preferably used.
  • an ultraviolet absorbing compound having at least one carboxyl group in the molecule is used as the component B used together with the component A for forming the ultraviolet absorbing layer.
  • One of the ultraviolet absorbing compounds that can be suitably used as Component B is a compound having a benzotriazole skeleton represented by the following general formula (2).
  • R 3 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 10, preferably 1 to 6 carbon atoms.
  • the halogen atom may be any of fluorine, chlorine, bromine or iodine
  • the alkyl group may be a methyl group, an ethyl group, Any of a propyl group, an i-propyl group, a butyl group, a t-butyl group, a cyclohexyl group and the like may be used.
  • the substitution position of R 3 is at the 4- or 5-position of the benzotriazole skeleton, but the halogen atom and the alkyl group are usually located at the 4-position.
  • R 4 in the general formula (2) represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms.
  • the alkyl group include a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a t-butyl group, and a cyclohexyl group.
  • R 5 in the general formula (2) represents an alkylene group or an alkylidene group having 1 to 10, preferably 1 to 3 carbon atoms.
  • alkylene group examples include a methylene group, an ethylene group, a trimethylene group, and a propylene group
  • alkylidene group examples include an ethylidene group and a propylidene group.
  • Specific examples of the compound represented by the general formula (2) include the following: 3- (5-chloro-2H-benzotriazole-2-yl) -15- (1,1-dimethylethyl) -14 Hydroxy-1-benzenepropanoic acid, 3- (2H-benzotriazol-2-yl) -1-4-hydroxybenzenebenzoic acid, 3- (5-methyl-1H-benzotriazo-2-yl-2-yl) C) 1-4- (1-methylethyl) -14-hydroxybenzenepropanoic acid.
  • Another one of the ultraviolet absorbing compounds which can be suitably used as the component B is a compound having a benzophenone skeleton, which is represented by the following general formulas (3) to (6).
  • R 6 represents an alkylene group or an alkylidene group having 1 to 10 carbon atoms, preferably 1 to 3 carbon atoms.
  • alkylene group include a methylene group, an ethylene group, a trimethylene group, and a propylene group.
  • alkylidene group include an ethylidene group and a propylidene group.
  • R 7 and R 8 in the general formulas (3) to (6) are the same or different and represent a hydroxyl group, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms.
  • Alkyl groups include methyl, ethyl, propyl, i-propyl, butyl, t-butyl, cyclohexyl, etc.
  • Alkoxy groups include methoxy, ethoxy, propoxy, i -Specific examples include a propoxy group and a butoxy group.
  • n and m indicate integers in the range of 0 ⁇ m ⁇ 3 and 0 ⁇ n ⁇ 3.
  • Preferred specific examples of the compound having a benzophenone skeleton include 2-hydroxy-4-methoxybenzophenone-15-carboxylic acid, 2,2, dihydroxy-4-methoxybenzophenone-15-carboxylic acid, — (2-Hydroxybenzoyl) 1-3-Hydroxybenzenepropanoic acid.
  • Any of the compounds having a benzotriazole skeleton or a benzophenone skeleton used as the component B of the present invention can be produced by a known method.
  • Component A and Component B are mixed in a suitable solvent at room temperature to 350 ° C .; preferably at a temperature of 60 to 250 ° C., usually for 5 minutes to 50 hours, preferably 10 to 50 hours.
  • the reaction can be carried out by bringing both components into contact for a period of minutes to 15 hours, and this reaction is mainly a dehydration reaction.
  • the proportion of component A and component B used in the reaction is determined by the amount of component B used.
  • the amount is usually selected in the range of 5 to 90% by mass, preferably 10 to 80% by mass, based on the total amount of the component B, whereby 10 mol% or more of the aminosilane compound (or a hydrolyzed derivative thereof) is obtained.
  • amide bonds can be formed at 50 mol% or more.
  • the reaction product thus obtained may be one in which 100 mol% of the aminosilane compound (or a hydrolyzed derivative thereof) used as a raw material forms an amide bond.
  • reaction solvent any solvent can be used as long as the above dehydration reaction is not hindered.
  • aromatic solvents such as toluene and xylene, ketone solvents such as cyclohexane, and mixtures thereof are appropriately used.
  • ketone solvents such as cyclohexane, and mixtures thereof are appropriately used.
  • an optional component can be added as necessary.
  • One of the optional components is a silicone resin (hereinafter referred to as “Component C”).
  • Component C alkoxysilyl group moiety reactive (usually dehydration reaction and / or dealcoholization reaction, etc.) which may be functional groups of component A, for example, an alkoxysilyl group Ya reactive silicone resin having a silanol group and the like c as this
  • a reactive silicone resin can be easily synthesized by a partial hydrolysis reaction of an alkoxysilane or chlorosilane and a subsequent condensation reaction.
  • silicone varnish for example, trade name “X ⁇ 7931—Clear”: manufactured by Okitsumo Co., Ltd.
  • silicone resin for example, trade name “SR2410”: Toray's Daukoichi Nylon Silicone Co., Ltd.
  • acrylic-modified silicone resin for example, trade name "Silacoat 100": manufactured by Chidso Corp.
  • the silicone resin can be used in the form of a solution using various solvents as long as the object of the present invention is not impaired.
  • the solvent include, but are not particularly limited to, various hydrocarbon solvents, ketones, ethers, esters, ethers and esters.
  • a silicone resin modified in various ways may be used.
  • component C can be added to the reaction product of component A and component B, it is particularly preferable that both components coexist in the reaction system when reacting both components.
  • the amount of the silicone resin used is generally selected in the range of 5 to 300 parts by mass, preferably 20 to 150 parts by mass, based on the total amount of the components A and B.
  • component D Another one of the optional components is various epoxysilanes (hereinafter referred to as “component D”). And preferred are epoxysilanes represented by the following general formulas (7) and (8).
  • R 9 and R 11 are the same or different groups and have an alkylene group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or a compound of the formula R-0-R ' (Wherein, R and R, each represent an alkylene group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms).
  • each R 10 is the same or different and is a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or It represents an aryl group having 6 to 10 carbon atoms, preferably 6 to 8 carbon atoms.
  • at least one of all R 0 is an alkoxy group, preferably 1 to 5 is an alkoxy group.
  • n is an integer of n ⁇ 0, preferably 0 ⁇ n ⁇ 3.
  • Preferred examples of the alkylene group include a methylene group, a trimethylene group, and a tetramethylene group.
  • Preferred examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a t-butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group.
  • alkoxy group examples include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a t-butoxy group, a pentyloxy group, and a hexyloxy group.
  • aryl group examples include a phenyl group and a tril group. No.
  • epoxysilanes include 3-glycidoxyprovirt trimethoxysilane, dimethoxy-3-glycidoxypropylmethylsilane, 2- (3: 4-epoxycyclohexylethyl) trimethoxysilane, dimethylethoxy-3- Glycidoxypropyl silane, 1,3-bis (3-glycidoxypropyl) — 1,3-dimethyl-11,3-dimethoxydisiloxane or a mixture thereof is preferred.
  • the amount of the epoxysilane to be used is generally selected in the range of 100 to 500 parts by mass, preferably 100 to 400 parts by mass, based on the total amount of the components A and B.
  • the epoxysilanes of Component D may be used after being hydrolyzed in advance.
  • the epoxy group may be previously subjected to ring polymerization with an appropriate polymerization catalyst and used.
  • a Lewis acid catalyst such as boron trifluoride getyl ether complex, aluminum chloride, and getyl zinc is preferable.
  • the polymerization conditions for the cyclic polymerization of the epoxy group are not particularly limited, but are usually about -80 ° C to 130 ° C, preferably about -20 ° C to 80 ° C.
  • the time can be appropriately selected depending on the reaction conditions, reaction mode, and the like, and is usually about 10 minutes to 10 hours, preferably about 1 hour to 6 hours.
  • the solvent used at this time is not particularly limited, and examples thereof include aromatic hydrocarbon solvents such as toluene and xylene, and various ketones and esters.
  • Component D can be present in the reaction system of component A and component B, but is preferably added to the reaction product of both components. However, when the component D is obtained by preliminarily ring-opening polymerizing the epoxy group, it is preferably added during the reaction of the components A and B. Still another optional component is a polyether-modified polysiloxane (hereinafter referred to as “component E”), preferably a polyester-modified polysiloxane represented by the following general formula (9). It is.
  • component E polyether-modified polysiloxane
  • R 1 2, R 1 3 and R 1 4 are the same or different groups, 1 to carbon atoms 1 0, preferably an alkylene group of 1 to 5, R 1 3 are the same Or a different group, such as a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms,
  • n and p are each an integer m ⁇ 0, preferably 0 m ⁇ 100, n ⁇ 0, preferably 0 ⁇ n ⁇ 10, p ⁇ 0, preferably 0 ⁇ p ⁇ 10 Is shown.
  • Preferable examples of the alkylene group include a methylene group, a trimethylene group, and a tetramethylene group.
  • Preferred examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a t-butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group.
  • Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a t-butoxy group, a pentyloxy group, and a hexyloxy group.
  • Examples of the aryl group include a phenyl group and a tolyl group.
  • the amount of the polyether-modified polysiloxane to be used is generally selected in the range of 100 to 500 parts by mass, preferably 100 to 400 parts by mass, based on the total amount of the components A and B. .
  • polyether-modified polysiloxane represented by the above general formula (9) examples include tetraethylene glycol-bis (triethoxysilylethyl) ether and polyethylene glycol-bis (triethoxysilylethyl) A. And polypropylene glycol-bis (triethoxysilylethyl) ether or a mixture thereof.
  • the polyether-modified polysiloxane may be used after being hydrolyzed in advance.
  • component E can be added to the reaction product of component A and component B, it is preferable that component A and component B coexist in the reaction system when reacting.
  • component F an inorganic fine particle dispersion
  • component F includes, for example, silica, alumina, titanium oxide, and antimony oxide. And the like.
  • Fine particle size is 1 ⁇ It is about 100 nm, and examples of the dispersion medium include water, methanol, xylene, and methyl ethyl ketone.
  • Commercially available products include LUDOXLS (manufactured by DuPont) and XBA-ST (manufactured by Nissan Chemical Industries).
  • the amount used is generally selected from the range of 5 to 400 parts by mass, preferably 10 to 200 parts by mass, based on the total amount of the components A and B. .
  • Component F can coexist during the reaction of component A and component B, but is preferably added to the reaction product of component A and component B.
  • Component F has the effect of improving the surface hardness of the ultraviolet absorbing layer formed on the transparent substrate and improving the abrasion resistance, chemical resistance, and the like.
  • Each of the above-mentioned optional components can be manufactured by a known method.
  • the ultraviolet absorbing layer provided on the laminated fireproof plate of the present invention is obtained by reacting component A and component B in a reaction system in which one or more of the above-mentioned optional components coexist as necessary.
  • the obtained reaction product is used as a paint, or a composition obtained by adding one or more of the above-mentioned optional components to the reaction product of component A and component B as necessary is used as a paint, and this is made transparent. It can be formed by coating and curing the surface of the substrate. In this case, the reaction solvent contained in the paint can be partially or entirely removed prior to application.
  • Additives can be added to the above-mentioned paints as needed.
  • additives include antioxidants, quencher or radical scavengers, or hydrochloric acid, sulfuric acid, acetic acid, and the like.
  • the above-mentioned paint is usually in a liquid state, and when applying it to a transparent substrate, for example, a spin coat, a spray coat, a dip coat, a cast coat, a blade coat, a flow coat, etc. can be arbitrarily adopted. is there.
  • the curing of the coating film usually proceeds at room temperature to 250 ° C., preferably about 40 ° C. to 200 ° C. Further, even when no catalyst is contained, the reaction usually proceeds at room temperature to 350 ° C, preferably at about 60 ° C to 250 ° C.
  • the time required for curing is generally about 10 minutes to 5 hours in each case.
  • the thickness of the ultraviolet absorbing layer formed on the transparent substrate can be arbitrarily selected, but is usually selected within a range of about 0.5 to 50 zm. When the thickness is less than 0.5 m, it may be difficult to provide the cured coating film with a sufficient ultraviolet blocking ability, and when the thickness is more than 50 / m, cracks may occur in the cured coating film.
  • the UV-absorbing fireproof plate of the present invention can cut most or all of the transmitted light in the UV region of 300 to 40 O nm, specifically 95% or more, in a preferred embodiment.
  • the transmitted light in the ultraviolet region of 98% or more, more preferably 99% or more can be cut in a more preferred embodiment.
  • the ultraviolet absorbing layer formed on the transparent substrate of the present invention is substantially transparent, hardly or at all reduces the transmittance of the substrate in the visible region, and is transparent as a final ultraviolet absorbing fireproof plate. It is something.
  • the visible light transmittance of the UV-absorbing fireproof plate according to the present invention is in the range of 10 to 100%.
  • overcoating agents can be used, and among them, a silicon-based overcoating agent is most suitable.
  • silicone-based overcoating agent include silicone resin-based materials in which inorganic fine particles such as colloidal silica are dispersed, and products of partial hydrolysis and partial polycondensation of silanes such as alkoxysilane and chlorosilane.
  • commercially available products include Tosgard 510 (made by Toshiba Silicone), APZ7703, and APZ7705 (made by Nippon Tunicar).
  • the partial hydrolysis products of epoxy silane are abrasion resistant as overcoating agents. 51
  • the overcoat layer a known method can be appropriately adopted, and for example, a spin coat, a spray coat, a cast coat, a blade coat, a dip coat and the like can be arbitrarily selected.
  • the same method as in the case of the ultraviolet absorbing layer can be applied to the curing of the coating film.
  • the UV-absorbing layer is subjected to a light surface modification and primer treatment to improve the coatability of the overcoat material and the adhesion of the overcoat layer to the UV-absorbing layer. Can be improved.
  • a thin film of a metal oxide or the like having a heat ray reflecting function or a heat insulating function can be further formed on the surface thereof by a method such as vacuum evaporation, sputtering, or a sol-gel method.
  • a heat ray reflecting function and a heat insulating function can be provided.
  • the ultraviolet-absorbing fireproof fire-resistant plate of the present invention comprises a single-layer or two-layer laminate having a foam layer containing a heat-sensitive foaming agent between transparent substrates juxtaposed at intervals in the thickness direction. It consists of two or more layers, usually about 2 to 5 layers, and has an amide bond obtained by reacting component A and component B on at least one of the transparent substrates used. Except for providing a cured coating film of the reaction product, it can be produced by a known method.
  • the heat-sensitive foaming agent is not particularly limited as long as the object of the present invention is achieved, but is usually 30 ° ((800 ° C., preferably 100 ° C. to 600 ° C.).
  • Preferred are compounds that foam in response to heat in the temperature range of:
  • Examples include hydrated alkali metal salts such as aluminum potassium, sodium borate, potassium borate, and sodium orthophosphate; hydrated alkali metal silicates such as sodium silicate; and mixtures of two or more of these.
  • the foamed layer contains a heat-sensitive foaming agent, and is typically made of a heat-sensitive foaming agent, but may be composed of a composition of a heat-sensitive foaming agent and another compound. .
  • the thickness of the layer is not particularly limited as long as the object of the present invention is achieved, but is usually 0.1 to 50 mm, preferably 0.8 to 10 mm.
  • the light foam layer preferably has a light-transmitting property, and more preferably has transparency.
  • the method for forming the foamed layer is not particularly limited, but a method of applying and drying various solutions (typically, an aqueous solution) of the heat-sensitive foaming agent is mentioned as a suitable method.
  • FIG. 1 is a cross-sectional view of a UV-absorbing fireproof plate according to the present invention having a single foam layer.
  • FIG. 2 is a cross-sectional view of a UV-absorbing fireproof plate according to the present invention having a plurality of foam layers.
  • FIG. 3 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 1.
  • FIG. 4 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 3.
  • FIG. 5 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 4.
  • FIG. 6 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 5.
  • FIG. 7 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 6.
  • FIG. 8 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 7. Next, a typical structure of the ultraviolet-absorbing fire-resistant transparent plate according to the present invention will be described with reference to FIGS. 1 and 2.
  • FIG. 8 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 7.
  • the basic structure of the UV-absorbing fireproof plate of the present invention is such that a foamed layer 3 is provided between a transparent substrate 1 a having an ultraviolet-absorbing layer 2 and a transparent substrate 1 b opposed thereto. There is in the structure sandwiched.
  • the ultraviolet absorbing layer 2 provided on the transparent substrate may be located on the outside world side, but is preferably located on the foam layer side as shown in view of durability.
  • Fig. 2 shows a cross section of an ultraviolet-absorbing fire-resistant transparent plate obtained by laminating two foam layers on the basic structure shown in Fig. 1 with a transparent substrate interposed therebetween.
  • the number of foam layers may be one, or may be three or more.
  • the ultraviolet absorbing layer 2 is provided on the transparent substrate 1a located on the outdoor side, but the ultraviolet absorbing layer 2 is also provided on one or more of the transparent substrates lb, lc, 1d. Can be provided.
  • the ultraviolet-absorbing fire-resistant transparent plate of the present invention can be manufactured by any method. Taking the specific example shown in FIG. 1 as an example, a solution of a heat-sensitive foaming agent is applied on the ultraviolet absorbing layer formed on the transparent substrate la (that is, on the ultraviolet absorbing transparent plate) or on the transparent substrate 1b. After drying and forming a solid layer of a heat-sensitive foaming agent directly on the transparent substrate, the transparent substrate 1b or the transparent substrate 1a with an ultraviolet / ultraviolet absorbing layer can be produced by a method of combining. Also, a separately formed foam layer (film-like material) is applied on the ultraviolet absorbing layer formed on the transparent substrate 1a (that is, on the ultraviolet absorbing transparent plate) or on the transparent substrate 1b.
  • a fireproof plate having the structure shown in Fig. 2 can be manufactured by repeating the same procedure as above.
  • Preferred embodiments of the ultraviolet-absorbing fireproof plate of the present invention include the following embodiments.
  • the UV-absorbing layer-forming paint is reacted with at least (a) the aminosilane compound represented by the general formula (1) or a derivative thereof, and (b) the UV-absorbing compound having a carboxylic acid residue in the molecule.
  • the fireproof plate for absorbing ultraviolet light according to the present invention is obtained by performing the treatment in the presence of the silicone resin.
  • the ultraviolet-absorbing layer-forming paint is reacted with at least (a) an aminosilane compound or a derivative thereof represented by the general formula (1), and (b) an ultraviolet-absorbing compound having a carboxylic acid residue in the molecule;
  • the ultraviolet-absorbing fireproof plate according to the present invention which is obtained by forming an amide bond derived from the aminosilane and then further adding the epoxysilane.
  • the UV-absorbing layer forming paint is at least (a) represented by the general formula (1) An aminosilane compound or a derivative thereof, and (b) reacting an ultraviolet absorbing compound having a carboxylic acid residue in the molecule to form an amide bond derived from the aminosilane, and further adding colloidal silica.
  • An ultraviolet-absorbing fire-resistant plate according to the present invention which is obtained.
  • the UV-absorbing fireproof plate of the present invention maintains good durability even when a high concentration of the absorbing compound is contained, by bonding the UV-absorbing compound to the silicone resin as a base material through an amide bond. However, it is possible to cut clearly into the long wavelength region with almost no decrease in transmittance in the visible region.
  • the above-mentioned paint for forming an ultraviolet absorbing layer was spray-coated on a glass substrate, left at room temperature for 20 minutes, and then heated at 200 ° C for 20 minutes to produce an ultraviolet absorbing glass having an ultraviolet absorbing film having a thickness of about 1 am. .
  • FIG. 3 shows the ultraviolet-visible absorption spectrum of this ultraviolet absorbing glass. As shown in the spectrum, a glass substrate completely blocking ultraviolet light of 40 Onm or less was obtained.
  • the obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate.
  • a fire prevention test of JIS-R 3204 was conducted using this UV-absorbing fireproof glass, good results were obtained.
  • the coating solution was spray-coated on a glass substrate, allowed to stand at room temperature for 20 minutes, and then heated at 130 ° C. for 30 minutes to produce an ultraviolet absorbing glass having an ultraviolet absorbing film having a thickness of about 10 / m.
  • Example 1 When the UV-visible absorption spectrum of this UV-absorbing glass was measured, Example 1 was obtained. In the same manner as described above, a glass substrate capable of completely blocking ultraviolet rays was obtained.
  • an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.
  • the obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. Using this UV absorbing fireproof glass
  • Silicone varnish (XO-793 1-clear, manufactured by OKITSUMO) 17.7 g and 3 g of 3-aminopropyltriethoxysilane were dissolved in xylene 35, and compound I was heated at 80 ° C while heating. Was gradually added. After the addition was completed, the temperature was raised to 130 ° C., and the mixture was refluxed for 3 hours to obtain a solution-type ultraviolet absorbing coating solution.
  • the above-mentioned coating material for forming an ultraviolet absorbing layer is spray-coated on a glass substrate, left at room temperature for 20 minutes, and then heated at 200 ° C. for 20 minutes to obtain an ultraviolet ray having an ultraviolet absorbing film having a thickness of about 17 zm. An absorption glass was produced. When a cross-cut test was performed on this ultraviolet absorbing glass, 50% peeling was observed.
  • FIG. 4 shows the ultraviolet-visible absorption spectrum of this ultraviolet absorbing glass. As shown in the spectrum, a glass substrate that completely blocks ultraviolet light of 40 O nm or less was obtained. The pencil hardness was 2H.
  • an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.
  • the obtained UV-absorbing fireproof glass has transparency, and the UV-absorbing transparent glass described above. It had the same ultraviolet blocking ability as a bright plate. Using this UV absorbing fireproof glass
  • the ultraviolet-absorbing layer forming paint is spray-coated on a glass substrate, left at room temperature for 20 minutes, and then heated at 200 ° C for 20 minutes to produce an ultraviolet-absorbing glass having an ultraviolet-absorbing coating having a thickness of about 17 / m. did.
  • FIG. 5 shows the UV-visible absorption spectrum of this glass substrate. Further, as in Example 3, no peeling was observed in the cross-cut test.
  • an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.
  • the obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate.
  • a fire prevention test of JIS-R 3204 was conducted using this UV-absorbing fireproof glass, good results were obtained.
  • Silicone varnish (X-1 7931—clear, manufactured by Okitsumo) 17.7 g and 3 g of 3-aminopropyltriethoxysilane are dissolved in 35 g of xylene, and 5 g of compound I is gradually added while heating to 80 ° C. did. After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours. After cooling, add 16 g of 3-glycidoxyprovirt rimethoxysilane and 8 g of colloidal silica dispersion (Nissan Chemical Industries, MIBK-ST) and add purple. A paint for forming an external line absorbing layer was obtained.
  • the above-mentioned coating material for forming an ultraviolet absorbing layer was spray-coated on a glass substrate, allowed to stand at room temperature for 20 minutes, and then heated at 200 ° C. for 20 minutes to produce an ultraviolet absorbing glass having an ultraviolet absorbing film having a thickness of about 17 m. .
  • the pencil hardness was 4H.
  • FIG. 6 shows the UV-visible absorption spectrum of this glass substrate.
  • an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.
  • the obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate.
  • a fire prevention test of JIS-R3204 was performed using this UV-absorbing fireproof glass, good results were obtained.
  • Silicone varnish (XO-7931—clear, manufactured by OKIMO) 17.7 g and 3 g of 3-aminopropyltriethoxysilane were dissolved in 29 g of xylene, and 5 g of compound I was gradually added while heating to 80 ° C. . After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours. After cooling, 22 g of the above epoxysilane polymer solution was added to obtain a coating for forming an ultraviolet absorbing layer.
  • the coating solution for forming the UV absorbing layer in the form of a solution was applied as a coating solution on a glass substrate by spraying, left at room temperature for 20 minutes, and then heated at 150 ° C for 30 minutes to obtain a UV light having a thickness of about 15 / m.
  • a glass substrate having an absorption layer was produced. Pencil hardness is 6H Was.
  • FIG. 8 shows the UV-visible absorption spectrum of this glass substrate.
  • an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.
  • the obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. Using this UV-absorbing fire-resistant glass, a fire prevention test of JIS-R320 was performed, and good results were obtained.
  • the coating solution for forming the ultraviolet absorbing layer in the form of a solution was coated as a coating solution on a glass substrate by spraying, left at room temperature for 20 minutes, and then heated at 150 ° C. for 30 minutes to obtain a thickness of about 1
  • a glass substrate provided with a 5 ⁇ m ultraviolet absorbing layer was produced.
  • the pencil hardness was 5H.
  • FIG. 8 shows the UV-visible absorption spectrum of this glass substrate.
  • an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.
  • the obtained UV-absorbing fireproof glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. Using this UV-absorbing fireproof glass, a fireproof test of JIS-R320 was performed, and good results were obtained.

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Abstract

An ultraviolet-absorbing fire-proof and -resistant transparent plate consituted of a plurality of transparent base sheets spaced in the direction of plate thickness, one or more expandable layers which lie between (or among) the base sheets and contain a heat-sensitive expanding agent, and an ultraviolet-absorbing layer which has amide linkages of an aminosilane compound and lies on at least one of the base sheets.

Description

明 細 書 紫外線吸収防耐火透明板  Description Ultraviolet absorbing fireproof transparent board

〔技術分野〕  〔Technical field〕

本発明は紫外線吸収能が付与された透明な積層防耐火板に関する。  The present invention relates to a transparent laminated fireproof plate provided with an ultraviolet absorbing ability.

〔従来の技術〕  [Conventional technology]

ガラス板等の透明基板に紫外線吸収性を付与する方法としては、 ( 1 ) 紫外線 吸収性の物質を用いて透明基板を処理する方法と、 ( 2 ) 多層膜による多重反射 を利用する方法とが一般に知られている。 ( 2 ) の多層膜による多重反射は、 力 ッ ト波長を自由に調節でき、クリァカッ トが可能であるという点で優れているが、 多層膜の形成は作業工程が多くコス ト的に問題がある。 ( 1 ) の紫外線吸収性の 物質で処理する方法は、 無機系紫外線吸収剤を用いる方法と有機系紫外線吸収剤 を用いる方法に大別される。  There are two methods for imparting UV-absorbing property to a transparent substrate such as a glass plate: (1) a method of treating a transparent substrate with an ultraviolet-absorbing substance, and (2) a method of using multiple reflection by a multilayer film. Generally known. The multi-reflection by the multilayer film (2) is excellent in that the cutoff wavelength can be freely adjusted and the clear cut is possible, but the formation of the multilayer film requires many work steps and is costly. is there. The method (1) of treating with an ultraviolet-absorbing substance is roughly classified into a method using an inorganic ultraviolet absorber and a method using an organic ultraviolet absorber.

特開平 5— 3 3 9 0 3 3号公報、 特開平 5— 3 4 5 6 3 9号公報、 特開平 6— 5 6 4 6 6号号公報等に記載されている無機系紫外線吸収剤は、 耐候性、 耐熱性 等が優れている反面、 吸収波長が化合物のバンドギャップによって決定されるた めに自由度が少なく、 また 4 0 0 n m近辺の紫外線領域をクリアにカヅ トできな い。 加えて、 長波長領域をカツ トできる無機系紫外線吸収剤は、 着色を伴うもの が多い。  JP-A-5-339033, JP-A-5-345639, JP-A-6-56464, etc.The inorganic ultraviolet absorbers described in Although it has excellent weather resistance, heat resistance, and the like, the degree of freedom is small because the absorption wavelength is determined by the band gap of the compound, and the ultraviolet region near 400 nm cannot be clearly cut. In addition, many inorganic UV absorbers capable of cutting the long wavelength region are accompanied by coloring.

これに対して有機系の紫外線吸収剤は吸収帯に幅があるため、 吸収剤の種類や 濃度、 膜厚を選ぶことにより様々な吸収波長のものを得ることができる。 これま で種々の有機系紫外線吸収剤を用いた系が検討されており、 長波長領域まで力ツ 卜する場合には、 最大吸収波長が長波長領域にあるものを用いるか、 濃度もしく は膜厚を大きくするかの 2通りが考えられている。 しかし、 最大吸収波長が長波 長領域にあるもの (例えば、 特開平 6 - 1 4 5 3 8 7号公報参照) は耐光性が悪 く、 吸収能が時間とともに減少してしまう。 また、 特開平 6— 1 4 5 3 8 7号公 報に記載された技術では、 蛍光増白剤を用いるため蛍光により透視性が悪くなる という問題もある。  On the other hand, organic UV absorbers have a wide range of absorption bands, so that various types of absorption wavelengths can be obtained by selecting the type, concentration, and film thickness of the absorber. To date, systems using various organic UV absorbers have been studied.If the power is to be applied to the long wavelength region, use one having a maximum absorption wavelength in the long wavelength region or use a concentration or concentration. There are two ways to increase the film thickness. However, those having a maximum absorption wavelength in a long wavelength region (see, for example, Japanese Patent Application Laid-Open No. H6-1458787) have poor light resistance, and the absorption capacity decreases with time. In addition, in the technique described in Japanese Patent Application Laid-Open No. 6-145,887, there is also a problem in that the use of a fluorescent whitening agent deteriorates the visibility due to fluorescence.

有機系紫外線吸収剤のなかでも、 ベンゾフエノン系やべンゾトリァゾ一ル系の 紫外線吸収剤は比較的耐光性も良く、 濃度や膜厚を大きくすれば長波長領域まで 比較的クリアにカッ トできる。 しかし、 これらの紫外線吸収剤を樹脂等に混ぜて 塗布する場合、 塗膜の厚さは数拾 m程度が限界である。 この膜厚で長波長領域 までカツ トしょうとすると、 塗膜中の紫外線吸収剤濃度をかなり高くする必要が あるが、 その場合には、 紫外線吸収剤の析出や長期使用によるブリードアウ トが 起こる問題がある。 Among organic UV absorbers, benzophenone-based and benzotriazole-based UV absorbers have relatively good light fastness, and can be cut relatively clearly up to the long wavelength region by increasing their concentration and film thickness. However, when these UV absorbers are mixed with resin and applied, the thickness of the coating film is limited to several m. To cut to the long wavelength region with this film thickness, the concentration of the UV absorber in the coating film must be considerably increased, in which case the UV absorber precipitates and bleed out due to long-term use There is.

そこで紫外線吸収剤を樹脂と反応させて上記のような不都合を回避する試みが 多くなされている。 その一例は、 アクリル樹脂などに紫外線吸収剤を共重合させ ることであるが(特開平 2— 2 4 8 4 1 2号、特開平 6 - 8 8 0 6 4号等参照), アクリル樹脂自体が耐候性、 耐熱性に難があるため、 とても長期使用には耐え得 る紫外線吸収層を得ることができない。 また、 耐候性、 耐熱性に優れるシリコー ン樹脂と反応し得る紫外線吸収剤についても種々検討がなされている (特公昭 6 Therefore, many attempts have been made to react the ultraviolet absorber with the resin to avoid the above-mentioned disadvantages. One example is the copolymerization of an acrylic resin or the like with an ultraviolet absorber (see Japanese Patent Application Laid-Open Nos. 2-248412 and 6-88064), but the acrylic resin itself. However, due to poor weather resistance and heat resistance, it is not possible to obtain an ultraviolet absorbing layer that can withstand very long-term use. In addition, various studies have been made on ultraviolet absorbers that can react with silicone resins having excellent weather resistance and heat resistance.

1 _ 5 4 8 0 0号、特閧平 2— 1 1 7 9 2 8号、特公平 3— 4 5 0 9 4号等参照) c しかし、 この種の紫外線吸収剤はその合成が工業的に難しく、 合成できても耐久 性に問題があるのが実状である。 1 _ 5480 0, No. 2-1 1 7 9 28, No. 3-4 5 0 9 4) c However, the synthesis of this type of UV absorber is industrial In practice, it is difficult to combine them, and there is a problem in durability even if they can be synthesized.

〔発明の詳述〕  [Detailed Description of the Invention]

本発明は上記問題点を解決するためになされたものであり、 その目的は、 耐候 性、 耐熱性に優れ、 且つ長期使用においても紫外線吸収剤がプリ一ドアウトする ことがなく、 しかも可視領域の透過率を低下させずに紫外線の長波長領域まで力 ッ 卜することが可能な紫外線吸収防耐火透明板を提供することにある。  The present invention has been made in order to solve the above-mentioned problems, and an object of the present invention is to provide an ultraviolet absorber that is excellent in weather resistance and heat resistance, and that does not lead out even during long-term use. It is an object of the present invention to provide a UV-absorbing fire-resistant transparent plate that can be pumped to a long-wavelength region of UV light without lowering transmittance.

すなわち、 本発明に係る紫外線吸収防耐火透明板は、 板厚方向に間隔を隔てて 並置された複数枚の透明基板の間に熱感応発泡剤を含む発泡層を設けた積層防耐 火透明板であって、 該積層防耐火透明板に使用される透明基板の少なくとも 1枚 がその表面に紫外線吸収層を備え、 該紫外線吸収層が、  That is, the ultraviolet-absorbing fire-resistant transparent plate according to the present invention is a laminated fire-resistant fire-resistant transparent plate provided with a foam layer containing a heat-sensitive foaming agent between a plurality of transparent substrates juxtaposed at intervals in the thickness direction. Wherein at least one of the transparent substrates used for the laminated fireproof transparent plate has an ultraviolet absorbing layer on its surface, and the ultraviolet absorbing layer has

( a ) 下記の一般式 ( 1 ) に示されるアミノシラン化合物またはその誘導体 (以 下、 成分 Aと呼ぶ) と、  (a) an aminosilane compound represented by the following general formula (1) or a derivative thereof (hereinafter referred to as component A):

( b ) 分子内にカルボキシル基を有する紫外線吸収性化合物 (以下、 成分 Bと呼 ぶ) を反応させ、 成分 Aに由来するアミ ド結合を生成せしめた反応生成物を、 透 明基板の上に塗布、 硬化させて作製されていることを特徴とする。

Figure imgf000005_0001
(b) A reaction product obtained by reacting an ultraviolet absorbing compound having a carboxyl group in the molecule (hereinafter referred to as component B) to form an amide bond derived from component A is placed on a transparent substrate. It is characterized by being manufactured by coating and curing.
Figure imgf000005_0001

(式中、 ; R 1 は炭素数 1〜 1 0のアルキレン基、 または一般式一 ( C H 2 ) m - N H - [ mは l≤m≤ 4の整数] で表される 2価の基を示し、 各々の R 2は同 一若しくは異なる基であって、 水素原子、 水酸基、 ハロゲン原子、 炭素数 1 ~ 1(Wherein, R 1 is an alkylene group having 1 to 10 carbon atoms, or a divalent group represented by the general formula 1 (CH 2 ) m- NH-[m is an integer of l≤m≤4] And each R 2 is the same or different, and represents a hydrogen atom, a hydroxyl group, a halogen atom,

0のアルキル基又は炭素数 1〜 1 0のアルコキシ基を示す。 但し、 全ての R 2 のうち少なくとも一つはアルコキシ基を示す。 nは n≥ 0の整数を示す。) 本発明の紫外線吸収防耐火透明板は、 板厚方向に間隔を隔てて並置された複数 枚の透明基板の間に熱感応発泡剤を含む発泡層を設けた構造にあるが、 ここで使 用される透明基板の少なくとも 1枚は、 前記発泡層との間に紫外線吸収層を備え ている。 And represents an alkyl group having 0 or an alkoxy group having 1 to 10 carbon atoms. However, at least one of all R 2 represents an alkoxy group. n represents an integer of n≥0. The ultraviolet-absorbing fire-resistant transparent plate of the present invention has a structure in which a foam layer containing a heat-sensitive foaming agent is provided between a plurality of transparent substrates juxtaposed at an interval in the plate thickness direction. At least one of the transparent substrates used is provided with an ultraviolet absorbing layer between the transparent substrate and the foamed layer.

上記の透明基板には、 可視光領域において 1 0〜 1 0 0 %の透過率を有し、 常 温において平滑な面を有する板状体が何れも使用可能であって、 この板状体は応 力によって変形するものであっても差し支えない。 具体的には、 例えば、 無色あ るいは有色ガラス、 曇りガラス、網入りガラス等の無機質ガラスが使用できる外、 無色あるいは有色の合成樹脂、 具体的には、 ポリエチレンテレフ夕レート、 ポリ ァミ ド、 ポリサルフォン、 ポリエーテルサルホン、 ポリフエ二レンサルフアイ ド、 ポリカーボネート、 ポリイミ ド、 ポリメチルメタクリレート、 ポリスチレン等の 板状体が使用可能である。 しかし、 防耐火耐火性に優れる点から本発明で使用す る透明基板には無機質ガラスが適している。  As the transparent substrate, any plate having a transmittance of 10% to 100% in a visible light region and having a smooth surface at room temperature can be used. It may be deformed by stress. Specifically, for example, colorless or colored glass, frosted glass, inorganic glass such as meshed glass can be used, and also colorless or colored synthetic resin, specifically, polyethylene terephthalate, polyimide Plates such as polysulfone, polysulfone, polyethersulfone, polyphenylene sulfide, polycarbonate, polyimide, polymethyl methacrylate, and polystyrene can be used. However, inorganic glass is suitable for the transparent substrate used in the present invention because of its excellent fire and fire resistance.

透明基板上に設けられる紫外線吸収層は、 上記した通り、 成分 Aと成分 Bの反 応生成物を、 透明基板上に塗布して硬化させることで得られるが、 成分 Aは上記 の一般式 ( 1 ) で示されるアミノシラン化合物又はその誘導体からなる。  As described above, the ultraviolet absorbing layer provided on the transparent substrate is obtained by applying the reaction product of the component A and the component B on the transparent substrate and curing the component. 1) An aminosilane compound represented by the formula or a derivative thereof.

一般式 ( 1 ) において、 R 1 は炭素数 1〜 1 0、 好ましくは 1〜 5のアルキ レン基、 または一般式— (C H 2 ) m— N H— [ mは l≤m≤ 4の整数] で表さ れる 2価の基を示す。 該アルキレン基としては、 メチレン基、 エチレン基、 トリ メチレン基、 プロピレン基等が例示できる。 R 2は同一若しくは異なる基であ つて、 水素原子、 水酸基、 塩素、 臭素等のハロゲン原子、 炭素数 1〜10、 好ま しくは 1~5のアルキル基若しくはアルコキシ基、 または炭素数 6〜10、 好ま しくは 6 ~ 8のァリ一ル基を示す。 但し、 全ての R 2のうち少なく とも一つ、 好ましくは 2〜 5個はアルコキシ基である。 前記 R 2のアルキル基としてはメ チル基、 ェチル基、 プロピル基、 i-プロピル基等が例示でき、 ァリール基として はフエニル基、 トリル基などが例示できる。 アルコキシ基としてはメ トキシ基、 エトキシ基、 プロポキシ基、 i-プロポキシ基等が例示できる。 nは n 0、 好ま しくは 0≤n≤3の整数を示す。 In the general formula (1), R 1 is an alkylene group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or a general formula — (CH 2 ) m — NH— [m is an integer of l≤m≤4] Represents a divalent group represented by Examples of the alkylene group include a methylene group, an ethylene group, a trimethylene group, and a propylene group. R 2 are the same or different groups A hydrogen atom, a hydroxyl group, a halogen atom such as chlorine or bromine, an alkyl or alkoxy group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or an aryl group having 6 to 10 carbon atoms, preferably 6 to 8 carbon atoms. Represents an aryl group. However, at least one, preferably 2 to 5, of all R 2 is an alkoxy group. Examples of the alkyl group for R 2 include a methyl group, an ethyl group, a propyl group, and an i-propyl group. Examples of the aryl group include a phenyl group and a tolyl group. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group and an i-propoxy group. n represents n 0, preferably an integer of 0≤n≤3.

一般式 ( 1) で示されるアミノシラン化合物の好適な具体例を摘記すると、 3 - ァミノプロピルトリエトキシシラン、 3- ァミノプロピルジイソプロビルェ トキシシラン、 3- ァミノプロピルメチルジェトキシシラン、 3- ァミノプロ ビルトリククロシラン、 3- ァミノプロピルポリジメチルシロキサン、 N- (2 - アミノエチル) - 3- ァミノプロビルト リメ トキシシラン、 3- ァミノプロ ビルトリス (メ トキシェトキシェトキシ) シラン等が挙げられ、 これらは何れも 公知の方法で合成することができる。  Preferable specific examples of the aminosilane compound represented by the general formula (1) are as follows: 3-aminopropyltriethoxysilane, 3-aminopropyldiisopropylethoxysilane, 3-aminopropylmethyljetoxysilane, -Aminopropyl trichlorosilane, 3-aminopropylpolydimethylsiloxane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltris (methoxetoxyhetoxy) silane, and the like. Any of them can be synthesized by a known method.

成分 Aには一般式 ( 1) で示されるアミノシラン化合物の誘導体も使用可能で あって、 該誘導体としては、 一般式 ( 1) で示されるアミノシラン化合物の加水 分解物が好ましく使用される。  As the component A, a derivative of the aminosilane compound represented by the general formula (1) can be used. As the derivative, a hydrolyzate of the aminosilane compound represented by the general formula (1) is preferably used.

紫外線吸収層の形成に成分 Aと共に使用される成分 Bには、 分子内に少なくと も 1個のカルボキシル基を有する紫外線吸収性化合物が使用される。 成分 Bとし て好適に使用できる紫外線吸収性化合物の一つは、 下記の一般式 (2) で示され るところの、 ベンゾトリァゾ一ル骨格を有する化合物である。  As the component B used together with the component A for forming the ultraviolet absorbing layer, an ultraviolet absorbing compound having at least one carboxyl group in the molecule is used. One of the ultraviolet absorbing compounds that can be suitably used as Component B is a compound having a benzotriazole skeleton represented by the following general formula (2).

Figure imgf000006_0001
Figure imgf000006_0001

一般式 (2) において、 R 3は水素原子、 ハロゲン原子または炭素数 1〜 1 0、 好ましくは 1〜 6のアルキル基を示す。 ハロゲン原子はフッ素、 塩素、 臭素 又はヨウ素の何れであっても差し支えなく、 アルキル基はメチル基、 ェチル基、 プロピル基、 i-プロピル基、 ブチル基、 t-ブチル基、 シクロへキシル基等の何れ であっても差し支えない。 R 3の置換位置はべンゾト リアゾール骨格の 4位ま たは 5位であるが、 ハロゲン原子及びアルキル基は通常 4位に位置する。 In the general formula (2), R 3 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 10, preferably 1 to 6 carbon atoms. The halogen atom may be any of fluorine, chlorine, bromine or iodine, and the alkyl group may be a methyl group, an ethyl group, Any of a propyl group, an i-propyl group, a butyl group, a t-butyl group, a cyclohexyl group and the like may be used. The substitution position of R 3 is at the 4- or 5-position of the benzotriazole skeleton, but the halogen atom and the alkyl group are usually located at the 4-position.

一般式 ( 2 ) の R 4は、 水素原子または炭素数 1〜 1 0、 好ましくは 1〜 6 のアルキル基を示す。 このアルキル基としては、 メチル基、 ェチル基、 プロピル 基、 i-プロピル基、 ブチル基、 t-ブチル基、 シクロへキシル基等が例示できる。 一般式 (2) の R 5は、 炭素数 1〜 10、 好ましくは 1〜3のアルキレン基 またはアルキリデン基を示す。 このアルキレン基としては、 メチレン基、 ェチレ ン基、 トリメチレン基、 プロピレン基等が例示でき、 アルキリデン基としては、 ェチリデン、 プロピリデン基等が例示できる。 R 4 in the general formula (2) represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a t-butyl group, and a cyclohexyl group. R 5 in the general formula (2) represents an alkylene group or an alkylidene group having 1 to 10, preferably 1 to 3 carbon atoms. Examples of the alkylene group include a methylene group, an ethylene group, a trimethylene group, and a propylene group, and examples of the alkylidene group include an ethylidene group and a propylidene group.

一般式 (2) で示される化合物の具体例を列記すると、 3— (5—クロ口— 2 H—べンゾトリァゾールー 2—ィル) 一 5— ( 1, 1ージメチルェチル) 一4一 ヒ ドロキシ一ベンゼンプロパン酸、 3— ( 2 H—ベンゾトリァゾ一ル一 2—ィル) 一 4—ヒ ドロキシベンゼンェ夕ン酸、 3— (5—メチル一 2H—ベンゾトリアゾ —ル一2—ィル) 一 5— (1ーメチルェチル) 一 4—ヒ ドロキシベンゼンプロパ ン酸等が挙げられる。  Specific examples of the compound represented by the general formula (2) include the following: 3- (5-chloro-2H-benzotriazole-2-yl) -15- (1,1-dimethylethyl) -14 Hydroxy-1-benzenepropanoic acid, 3- (2H-benzotriazol-2-yl) -1-4-hydroxybenzenebenzoic acid, 3- (5-methyl-1H-benzotriazo-2-yl-2-yl) C) 1-4- (1-methylethyl) -14-hydroxybenzenepropanoic acid.

成分 Bとして好適に使用できる紫外線吸収性化合物の他の一つは、 ベンゾフェ ノン骨格を有する化合物であって、 これらは下記の一般式 (3) 〜 (6) で示さ れる。  Another one of the ultraviolet absorbing compounds which can be suitably used as the component B is a compound having a benzophenone skeleton, which is represented by the following general formulas (3) to (6).

Figure imgf000007_0001
Figure imgf000007_0001

OH 0 OH 0

(4) W /351

Figure imgf000008_0001
(Four) W / 351
Figure imgf000008_0001

Figure imgf000008_0002
一般式 ( 3 ) 〜 ( 6 ) において、 R 6は炭素数 1〜 1 0、 好ましくは 1〜 3 のアルキレン基又はアルキリデン基を示す。アルキレン基としては、 メチレン基、 エチレン基、 トリメチレン基、 プロピレン基等が、 アルキリデン基としてはェチ リデン基、 プロピリデン基等が挙げられる。
Figure imgf000008_0002
In the general formulas (3) to (6), R 6 represents an alkylene group or an alkylidene group having 1 to 10 carbon atoms, preferably 1 to 3 carbon atoms. Examples of the alkylene group include a methylene group, an ethylene group, a trimethylene group, and a propylene group. Examples of the alkylidene group include an ethylidene group and a propylidene group.

一般式 ( 3 ) 〜 ( 6 ) における R 7及び R 8は同一若しくは異なる基であつ て、 水酸基、 炭素数 1〜 1 0、 好ましくは 1〜 6のアルキル基又はアルコキシ基 を示す。 アルキル基としては、 メチル基、 ェチル基、 プロピル基、 i プロピル基、 ブチル基、 t-ブチル基、 シクロへキシル基等が、 アルコキシ基としては、 メ トキ シ基、 エトキシ基、 プロポキシ基、 i-プロポキシ基、 ブトキシ基等が具体的に例 示される。 R 7 and R 8 in the general formulas (3) to (6) are the same or different and represent a hydroxyl group, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms. Alkyl groups include methyl, ethyl, propyl, i-propyl, butyl, t-butyl, cyclohexyl, etc.Alkoxy groups include methoxy, ethoxy, propoxy, i -Specific examples include a propoxy group and a butoxy group.

n、 mは、 0≤m≤3、 0≤ n≤ 3の範囲の整数を示す。  n and m indicate integers in the range of 0≤m≤3 and 0≤n≤3.

このようなペンゾフエノン骨格を有する化合物の好ましい具体例としては、 2 ーヒドロキシー 4—メ トキシベンゾフエノン一 5 —カルボン酸、 2, 2, ージヒ ドロキシー 4—メ トキシベンゾフエノン一 5 —カルボン酸、 4— ( 2—ヒ ドロキ シベンゾィル) 一 3—ヒ ドロキシベンゼンプロパン酸等を挙げることができる。 本発明の成分 Bとして使用されるべンゾトリァゾ一ル骨格又はべンゾフエノン骨 格を有する化合物は、 何れも公知の方法で製造することができる。  Preferred specific examples of the compound having a benzophenone skeleton include 2-hydroxy-4-methoxybenzophenone-15-carboxylic acid, 2,2, dihydroxy-4-methoxybenzophenone-15-carboxylic acid, — (2-Hydroxybenzoyl) 1-3-Hydroxybenzenepropanoic acid. Any of the compounds having a benzotriazole skeleton or a benzophenone skeleton used as the component B of the present invention can be produced by a known method.

成分 Aと成分 Bとは、 適当な溶媒中にて、 室温〜 3 5 0 °C;、 好ましくは 6 0〜 2 5 0 °Cの温度で、 通常 5分〜 5 0時間、 好ましくは 1 0分〜 1 5時間両成分を 接触させる方法で反応させることができ、 この反応は主として脱水反応である。 反応に際しての成分 Aと成分 Bとの使用割合は、 成分 Bの使用量が成分 A及び成 分 Bの総量に対して、 通常 5〜9 0質量%、 好ましくは 1 0〜8 0質量%の範囲 で選択され、 これによつてアミノシラン化合物 (又はその加水分解誘導体) の 1 0モル%以上、 好ましくは 5 0モル%以上にアミ ド結合を形成させることができ る。 こうして得られる反応生成物は、 原料に使用したアミノシラン化合物 (又は その加水分解誘導体) の 1 0 0モル%がアミ ド結合を形成したものであっても良 いことはもちろんである。 Component A and Component B are mixed in a suitable solvent at room temperature to 350 ° C .; preferably at a temperature of 60 to 250 ° C., usually for 5 minutes to 50 hours, preferably 10 to 50 hours. The reaction can be carried out by bringing both components into contact for a period of minutes to 15 hours, and this reaction is mainly a dehydration reaction. The proportion of component A and component B used in the reaction is determined by the amount of component B used. The amount is usually selected in the range of 5 to 90% by mass, preferably 10 to 80% by mass, based on the total amount of the component B, whereby 10 mol% or more of the aminosilane compound (or a hydrolyzed derivative thereof) is obtained. Preferably, amide bonds can be formed at 50 mol% or more. Needless to say, the reaction product thus obtained may be one in which 100 mol% of the aminosilane compound (or a hydrolyzed derivative thereof) used as a raw material forms an amide bond.

反応溶媒には、 上記の脱水反応が阻害されない限り任意の溶媒が使用可能であ つて、 例えば、 トルエン、 キシレン等の芳香族系溶媒、 シクロへキサン等のケト ン系溶媒またはこれらの混合物が適宜使用できる。  As the reaction solvent, any solvent can be used as long as the above dehydration reaction is not hindered.For example, aromatic solvents such as toluene and xylene, ketone solvents such as cyclohexane, and mixtures thereof are appropriately used. Can be used.

成分 Aと成分 Bとの反応に際しては、 あるいはその反応生成物には、 必要に応 じて任意成分を添加することができる。 任意成分の一つは、 シリコーン樹脂 (以 下、 「成分 C」 と称す) である。 なかでも、 成分 Aのアルコキシシリル基部分と 反応(通常脱水反応および/または脱アルコール反応等) し得る官能基、 例えば、 アルコキシシリル基ゃシラノール基等を有する反応性シリコーン樹脂が好ましい c このような反応性シリコーン樹脂は、 一般的にアルコキシシランやクロロシラ ン類の部分加水分解反応と、 それに続く縮合反応によって容易に合成することが できる。 市販品では、 純シリコーンワニス (例えば、 商品名 「X〇 7 9 3 1—ク リヤー」:ォキツモ (株) 製)、 シリコーンレジン (例えば、 商品名 「S R 2 4 1 0」:東レ ' ダウコ一ニングシリコーン (株) 製)、 アクリル変性シリコーン樹脂 (例えば、 商品名 「サイラコート 1 0 0 0」 : チヅソ (株) 製) 等が好適に挙げ られる。 また、 シリコーン樹脂を本発明の目的を損なわない範囲で各種溶剤を用 いた溶液の形で用いることができる。 溶剤としては、 特に限定されないが、 各種 炭化水素系溶剤、 ケトン類、 エーテル類、 エステル類、 エーテル .エステル類な どが挙げられる。 また、 シリコーン樹脂を各種変性したものを用いても良い。 成 分 Cは、 成分 Aと成分 Bの反応生成物に添加することもできるが、 両成分を反応 せしめる際に、 反応系に共存させることが特に好ましい。 Upon the reaction between the component A and the component B, or to the reaction product, an optional component can be added as necessary. One of the optional components is a silicone resin (hereinafter referred to as “Component C”). Of these, alkoxysilyl group moiety reactive (usually dehydration reaction and / or dealcoholization reaction, etc.) which may be functional groups of component A, for example, an alkoxysilyl group Ya reactive silicone resin having a silanol group and the like c as this In general, a reactive silicone resin can be easily synthesized by a partial hydrolysis reaction of an alkoxysilane or chlorosilane and a subsequent condensation reaction. Commercially available products include pure silicone varnish (for example, trade name “X〇7931—Clear”: manufactured by Okitsumo Co., Ltd.) and silicone resin (for example, trade name “SR2410”: Toray's Daukoichi Nylon Silicone Co., Ltd.), and acrylic-modified silicone resin (for example, trade name "Silacoat 100": manufactured by Chidso Corp.). The silicone resin can be used in the form of a solution using various solvents as long as the object of the present invention is not impaired. Examples of the solvent include, but are not particularly limited to, various hydrocarbon solvents, ketones, ethers, esters, ethers and esters. Further, a silicone resin modified in various ways may be used. Although component C can be added to the reaction product of component A and component B, it is particularly preferable that both components coexist in the reaction system when reacting both components.

シリコーン樹脂の使用量は、 一般に、 成分 Aと成分 Bの総量に対して、 5〜3 0 0質量部、 好ましくは 2 0〜 1 5 0質量部の範囲で選ばれる。  The amount of the silicone resin used is generally selected in the range of 5 to 300 parts by mass, preferably 20 to 150 parts by mass, based on the total amount of the components A and B.

前記任意成分の他の一つは、 各種のエポキシシラン類 (以下 「成分 D」 と称す) であって、 好ましくは下記の一般式 ( 7 ) 及び ( 8 ) で示されるエポキシシラン 類である。

Figure imgf000010_0001
Figure imgf000010_0002
一般式 ( 7 ) 〜 ( 8 ) において、 R 9および R 1 1は同一若しくは異なる基 であって、 炭素数 1〜 1 0、 好ましくは 1〜 5のアルキレン基又は式一 R— 0— R ' 一 (但し、 R及び R, は各々炭素数 1〜 1 0、 好ましくは 1〜 5のアルキ レン基を示す) で示される 2価の基を示す。 また、 各々の R 1 0は、 同一若し くは異なる基であって、 水素原子、 水酸基、 ハロゲン原子、 炭素数 1〜 1 0、 好 ましくは 1〜 5のアルキル基若しくはアルコキシ基、 または炭素数 6〜 1 0好ま しくは 6〜 8のァリール基を示す。 但し、 全ての R 0のうち少なく とも 1つ はアルコキシ基、 好ましくは 1〜 5個はアルコキシ基である。 nは n≥0、 好ま しくは 0≤n≤ 3の整数を示す。 Another one of the optional components is various epoxysilanes (hereinafter referred to as “component D”). And preferred are epoxysilanes represented by the following general formulas (7) and (8).
Figure imgf000010_0001
Figure imgf000010_0002
In the general formulas (7) to (8), R 9 and R 11 are the same or different groups and have an alkylene group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or a compound of the formula R-0-R ' (Wherein, R and R, each represent an alkylene group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms). Further, each R 10 is the same or different and is a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms, or It represents an aryl group having 6 to 10 carbon atoms, preferably 6 to 8 carbon atoms. However, at least one of all R 0 is an alkoxy group, preferably 1 to 5 is an alkoxy group. n is an integer of n≥0, preferably 0≤n≤3.

前記のアルキレン基としては、 メチレン基、 トリメチレン基、 テトラメチレン 基等が好適に例示できる。 前記アルキル基としては、 メチル基、 ェチル基、 プロ ピル基、 i-プロピル基、 プチル基、 t-ブチル基、 ペンチル基、 へキシル基、 ヘプ チル基、、 ォクチル基等が好適に挙げられ、 前記アルコキシ基としては、 メ トキ シ基、 エトキシ基、 プロポキシ基、 ブトキシ基、 t-ブトキシ基、 ペンチルォキシ 基、 へキシルォキシ基等が挙げられ、 前記ァリール基としては、 フヱニル基、 ト リル基等が挙げられる。  Preferred examples of the alkylene group include a methylene group, a trimethylene group, and a tetramethylene group. Preferred examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a t-butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a t-butoxy group, a pentyloxy group, and a hexyloxy group.Examples of the aryl group include a phenyl group and a tril group. No.

エポキシシラン類の具体例を摘記すると、 3 - グリシ ドキシプロビルト リメ トキシシラン、 ジメ トキシ- 3 - グリシドキシプロピルメチルシラン、 2 - ( 3 : 4 -エポキシシクロへキシルェチル) トリメ トキシシラン、 ジメチルェトキシ- 3 - グリシドキシプロビルシラン、 1, 3—ビス ( 3—グリシドキシプロピル) — 1, 3—ジメチル一 1, 3—ジメ トキシジシロキサン又はこれらの混合物等が 好適に挙げられる。 Specific examples of epoxysilanes include 3-glycidoxyprovirt trimethoxysilane, dimethoxy-3-glycidoxypropylmethylsilane, 2- (3: 4-epoxycyclohexylethyl) trimethoxysilane, dimethylethoxy-3- Glycidoxypropyl silane, 1,3-bis (3-glycidoxypropyl) — 1,3-dimethyl-11,3-dimethoxydisiloxane or a mixture thereof is preferred.

エポキシシラン類の使用量は、 一般に、 成分 Aと成分 Bの総量に対して、 1 0 〜 5 0 0質量部、 好ま し く は 1 0 0〜 4 0 0質量部の範囲で選ばれる。 成分 Dのエポキシシラン類は予め加水分解して用いても良い。 また予め適当な重 合触媒でエポキシ基を閧環重合させて用いることもできる。 重合触媒としては、 三フッ化ホウ素ジェチルェ一テル錯体、 塩化アルミニウム、 ジェチル亜鉛等のル イス酸触媒が好適である。 エポキシ基を閧環重合させる際の重合条件は特に限定 されないが、 通常、 — 8 0 °C〜 1 3 0 °C、 好ましくは— 2 0 °C〜 8 0 °C程度が望 ましく、 反応時間は反応条件、 反応様式等により適宜選択でき、 通常 1 0分〜 1 0時間、 好ましくは 1時間〜 6時間程度が望ましい。 この際用いる溶媒は特に限 定されないが、 例えば、 トルエン、 キシレン等の芳香族炭化水素溶媒、 各種のケ トン類ゃエステル類等が挙げられる。  The amount of the epoxysilane to be used is generally selected in the range of 100 to 500 parts by mass, preferably 100 to 400 parts by mass, based on the total amount of the components A and B. The epoxysilanes of Component D may be used after being hydrolyzed in advance. Further, the epoxy group may be previously subjected to ring polymerization with an appropriate polymerization catalyst and used. As the polymerization catalyst, a Lewis acid catalyst such as boron trifluoride getyl ether complex, aluminum chloride, and getyl zinc is preferable. The polymerization conditions for the cyclic polymerization of the epoxy group are not particularly limited, but are usually about -80 ° C to 130 ° C, preferably about -20 ° C to 80 ° C. The time can be appropriately selected depending on the reaction conditions, reaction mode, and the like, and is usually about 10 minutes to 10 hours, preferably about 1 hour to 6 hours. The solvent used at this time is not particularly limited, and examples thereof include aromatic hydrocarbon solvents such as toluene and xylene, and various ketones and esters.

成分 Dは、 成分 Aと成分 Bとの反応系に共存させることもできるが、 両成分の 反応生成物に添加することが好ましい。 但し、 前記予め成分 Dのエポキシ基を開 環重合させたものを用いる場合には、 成分 A及び成分 Bの反応の際に加えるのが 好ましい。 任意成分のさらに別の一つは、 ポリエーテル変性ポリシロキサン類 (以下 「成 分 E」 と称す) であって、 好ましくは、 下記一般式 ( 9 ) で示されるポリェ一テ ル変性ポリシロキサン類である。 (9)

Figure imgf000011_0001
一般式 ( 9 ) において、 R 1 2、 R 1 3および R 1 4は同一若しくは異なる 基であって、 炭素数 1〜 1 0、 好ましくは 1〜 5のアルキレン基を示し、 R 1 3は同一若しくは異なる基であって、 水素原子、 水酸基、 ハロゲン原子、 炭素 数 1〜 1 0、 好ましくは 1〜 5のアルキル基若しくはアルコキシ基または炭素数Component D can be present in the reaction system of component A and component B, but is preferably added to the reaction product of both components. However, when the component D is obtained by preliminarily ring-opening polymerizing the epoxy group, it is preferably added during the reaction of the components A and B. Still another optional component is a polyether-modified polysiloxane (hereinafter referred to as “component E”), preferably a polyester-modified polysiloxane represented by the following general formula (9). It is. (9)
Figure imgf000011_0001
In the general formula (9), R 1 2, R 1 3 and R 1 4 are the same or different groups, 1 to carbon atoms 1 0, preferably an alkylene group of 1 to 5, R 1 3 are the same Or a different group, such as a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms,

6〜 1 0、 好ましくは 6〜8のァリ一ル基を示すが、 R 1 3のうち少なく とも 一つ、 好ましくは 2〜 1 0個はアルコキシ基である。 m、 n、 pは、 各々 m≥0、 好ましくは 0 m≤ 1 0 0、 n≥ 0 , 好ましくは 0≤n≤ 1 0、 p≥ 0 , 好まし くは 0≤p≤ 1 0の整数を示す。 6 to 10, preferably 6 to 8 aryl groups, at least one of R 13 One, preferably 2 to 10, is an alkoxy group. m, n and p are each an integer m≥0, preferably 0 m≤100, n≥0, preferably 0≤n≤10, p≥0, preferably 0≤p≤10 Is shown.

前記アルキレン基としては、 メチレン基、 トリメチレン基、 テトラメチレン基 などが好適に挙げられる。 前記アルキル基としては、 メチル基、 ェチル基、 プロ ピル基、 i-プロピル基、 ブチル基、 t-ブチル基、 ペンチル基、 へキシル基、 ヘプ チル基、 ォクチル基等が好適に挙げられる。 前記アルコキシ基としては、 メ トキ シ基、 エトキシ基、 プロポキシ基、 ブトキシ基、 t-ブトキシ基、 ペンチルォキシ 基、 へキシルォキシ基等が挙げられる。 前記ァリール基としては、 フエニル基、 トリル基等が挙げられる。  Preferable examples of the alkylene group include a methylene group, a trimethylene group, and a tetramethylene group. Preferred examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an i-propyl group, a butyl group, a t-butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a t-butoxy group, a pentyloxy group, and a hexyloxy group. Examples of the aryl group include a phenyl group and a tolyl group.

ポリエーテル変性ポリシロキサン類の使用量は、 一般に、 成分 Aと成分 Bの総 量に対して、 1 0〜5 0 0質量部、 好ましくは 1 0 0〜4 0 0質量部の範囲で選 ばれる。  The amount of the polyether-modified polysiloxane to be used is generally selected in the range of 100 to 500 parts by mass, preferably 100 to 400 parts by mass, based on the total amount of the components A and B. .

上記の一般式 ( 9 ) で示されるポリエーテル変性ポリシロキサン類の具体例を 列挙すると、 テトラエチレングリコール- ビス (トリエトキシシリルェチル) エーテル、 ポリエチレングリコール- ビス ( ト リエトキシシリルェチル) エー テル、 ポリプロピレングリコール- ビス (ト リエトキシシリルェチル) ェ一テ ル又はこれらの混合物が挙げられる。 成分 Eであるポリエーテル変性ポリシロキ サン類は、 予め加水分解したものを用いても良い。  Specific examples of the polyether-modified polysiloxane represented by the above general formula (9) include tetraethylene glycol-bis (triethoxysilylethyl) ether and polyethylene glycol-bis (triethoxysilylethyl) A. And polypropylene glycol-bis (triethoxysilylethyl) ether or a mixture thereof. As the component E, the polyether-modified polysiloxane may be used after being hydrolyzed in advance.

成分 Eは成分 Aと成分 Bの反応生成物に添加することもできるが、 成分 Aと成 分 Bを反応させる際に、 その反応系に共存させることが好ましい。  Although component E can be added to the reaction product of component A and component B, it is preferable that component A and component B coexist in the reaction system when reacting.

上記した任意成分のなかにあって、 特に成分 Dのエポキシシラン類や成分 Eの ポリエーテル変性ポリシロキサン類は、 透明基板上に形成される紫外線吸収層に 対し、 その耐熱性を損なうことなく透明基板への密着性を向上させ、 紫外線吸収 層の亀裂発生を抑制する等の優れた効果を奏するものである。 本発明で使用可能な任意成分のさらに別の一つは、 無機微粒子分散液 (以下、 「成分 F」 と称す) であって、 これには、 例えば、 シリカ、 アルミナ、 酸化チタ ン、 酸化アンチモン等の微粒子の分散液等が挙げられる。 微粒子の粒子径は 1〜 l O O nm 程度であり、 分散媒としては水、 メタノール、 キシレン、 メチルェチ ルケトン等が例示できる。 市販品では L U D O X L S (デュポン社製) や、 X B A—S T (日産化学社製) などが好適に挙げられる。 Among the above optional components, particularly the epoxysilanes of component D and the polyether-modified polysiloxanes of component E are transparent to the ultraviolet absorbing layer formed on the transparent substrate without impairing the heat resistance. It has excellent effects such as improving the adhesion to the substrate and suppressing the occurrence of cracks in the ultraviolet absorbing layer. Still another optional component that can be used in the present invention is an inorganic fine particle dispersion (hereinafter, referred to as “component F”), which includes, for example, silica, alumina, titanium oxide, and antimony oxide. And the like. Fine particle size is 1 ~ It is about 100 nm, and examples of the dispersion medium include water, methanol, xylene, and methyl ethyl ketone. Commercially available products include LUDOXLS (manufactured by DuPont) and XBA-ST (manufactured by Nissan Chemical Industries).

成分 Fとしてコロイダルシリカの使用する場合、 その使用量は、 一般に成分 A と成分 Bの総量に対して、 5〜4 0 0質量部、 好ましくは 1 0〜2 0 0質量部の 範囲で選ばれる。  When colloidal silica is used as the component F, the amount used is generally selected from the range of 5 to 400 parts by mass, preferably 10 to 200 parts by mass, based on the total amount of the components A and B. .

成分 Fは、 成分 Aと成分 Bの反応時に共存させることもできるが、 成分 Aと成 分 Bの反応生成物に添加することが好ましい。 成分 Fは、 透明基板上に形成され る紫外線吸収層の表面硬度を改善し、 耐摩耗性, 耐薬品性などを向上させる効果 を奏する。  Component F can coexist during the reaction of component A and component B, but is preferably added to the reaction product of component A and component B. Component F has the effect of improving the surface hardness of the ultraviolet absorbing layer formed on the transparent substrate and improving the abrasion resistance, chemical resistance, and the like.

なお、 上記した各任意成分は何れも公知の方法により製造できる。 本発明の積層型防耐火板に揷設される紫外線吸収層は、 前記した任意成分の 1 種又は 2種以上が必要に応じて共存する反応系にて、 成分 Aと成分 Bを反応させ て得た反応生成物を塗料として、 あるいは成分 Aと成分 Bとの反応生成物に、 前 記した任意成分の 1種又は 2種以上を必要に応じて添加した組成物を塗料として、 これを透明基板の表面に塗布し、 硬化させることで形成させることができる。 こ の場合、 塗料に含まれる反応溶媒は、 その一部又は全部を塗布に先立ち除去する ことができる。  Each of the above-mentioned optional components can be manufactured by a known method. The ultraviolet absorbing layer provided on the laminated fireproof plate of the present invention is obtained by reacting component A and component B in a reaction system in which one or more of the above-mentioned optional components coexist as necessary. The obtained reaction product is used as a paint, or a composition obtained by adding one or more of the above-mentioned optional components to the reaction product of component A and component B as necessary is used as a paint, and this is made transparent. It can be formed by coating and curing the surface of the substrate. In this case, the reaction solvent contained in the paint can be partially or entirely removed prior to application.

前記の塗料には、 必要に応じて添加物を配合することが可能であり、 この種の 添加物としては、 例えば、 酸化防止剤、 クェンチヤ一もしくはラジカル捕捉剤、 または塩酸、 硫酸、 酢酸などの無機酸や有機酸、 3フッ化ホウ素 · ジェチルェ一 テル錯体、 6フヅ化アンチモン酸ナトリウム等のルイス酸、 水酸化カリウム、 水 酸化ナトリウム、 トリェチルァミン、 ァニリンなどの塩基、 ジブチルスズジラウ レート、 チタンテトライソプロポキサイ ドなどの有機金属で例示されるような、 硬化促進作用を有する触媒 (その使用量は紫外線吸収材料に対して、 通常 0 . 1 〜5 . 0質量%であることが好ましい)、 トルエン、 キシレン、 エタノール、 ィ ソプロパノール、 ジメチルホルムアミ ド、 シクロへキサノン、 1ーメ トキシー 2 —ァセ トキシプロパン等、 各種シンナー等の溶剤を例示することができる。 上記した塗料は、 通常、 液状であり、 これを透明基板に塗布するに当たっては、 例えば、 スピンコート、 スプレーコート、 ディ ヅプコート、 キャストコート、 ブ レードコ一ト、 フロ一コートなどが任意に採用可能である。 Additives can be added to the above-mentioned paints as needed. Examples of such additives include antioxidants, quencher or radical scavengers, or hydrochloric acid, sulfuric acid, acetic acid, and the like. Inorganic acids, organic acids, boron trifluoride / ethyl ester complex, Lewis acids such as sodium antimonate hexafluoride, bases such as potassium hydroxide, sodium hydroxide, triethylamine, aniline, dibutyltin dilaurate, titanium tetra A catalyst having a curing promoting action as exemplified by an organic metal such as isopropoxide (the amount used is usually preferably 0.1 to 5.0% by mass based on the ultraviolet absorbing material); Toluene, xylene, ethanol, isopropanol, dimethylformamide, cyclohexanone, 1-methoxy 2-a Tokishipuropan like, a solvent such as various thinners may be exemplified. The above-mentioned paint is usually in a liquid state, and when applying it to a transparent substrate, for example, a spin coat, a spray coat, a dip coat, a cast coat, a blade coat, a flow coat, etc. can be arbitrarily adopted. is there.

塗膜中に硬化促進作用を有する触媒が含まれている場合、 塗膜の硬化は通常、 室温から 2 5 0 °C、 好ましくは 4 0 °C ~ 2 0 0 °C程度で進行する。 また、 触媒が 含まれていない場合でも、 通常、 室温〜 3 5 0 °C、 好ましくは 6 0 °C〜 2 5 0 °C 程度で進行する。 硬化に要する時間は、 何れの場合とも、 通常、 1 0分〜 5時間 程度である。  When a catalyst having a curing promoting action is contained in the coating film, the curing of the coating film usually proceeds at room temperature to 250 ° C., preferably about 40 ° C. to 200 ° C. Further, even when no catalyst is contained, the reaction usually proceeds at room temperature to 350 ° C, preferably at about 60 ° C to 250 ° C. The time required for curing is generally about 10 minutes to 5 hours in each case.

透明基板上に形成される紫外線吸収層の膜厚は、 任意に選ぶことができるが、 通常は 0 . 5〜 5 0 z m程度の範囲内で選ばれる。 0 . 5 m以下では硬化塗 膜に充分な紫外線遮断能力を出すことが難しい場合があり、 5 0 / m以上では硬 化塗膜に亀裂が発生する虞がある。  The thickness of the ultraviolet absorbing layer formed on the transparent substrate can be arbitrarily selected, but is usually selected within a range of about 0.5 to 50 zm. When the thickness is less than 0.5 m, it may be difficult to provide the cured coating film with a sufficient ultraviolet blocking ability, and when the thickness is more than 50 / m, cracks may occur in the cured coating film.

本発明の紫外線吸収防耐火板は、 3 0 0〜4 0 O nm の紫外線領域の透過光を 大部分または完全にカッ トすることができ、 具体的には 9 5 %以上、 好ましい態 様では 9 8 %以上、 さらに好ましい態様では 9 9 %以上の紫外線領域の透過光を カッ トすることができる。  The UV-absorbing fireproof plate of the present invention can cut most or all of the transmitted light in the UV region of 300 to 40 O nm, specifically 95% or more, in a preferred embodiment. The transmitted light in the ultraviolet region of 98% or more, more preferably 99% or more can be cut in a more preferred embodiment.

また、 本発明の透明基板上に形成される紫外線吸収層は実質的に透明であり、 基板の可視領域透過率を殆ど又は全く低下させることがなく、 最終的な紫外線吸 収防耐火板として透明なものである。 ちなみに、 本発明に係る紫外線吸収防耐火 板の可視光透過率は 1 0〜 1 0 0 %の範囲にある。  Further, the ultraviolet absorbing layer formed on the transparent substrate of the present invention is substantially transparent, hardly or at all reduces the transmittance of the substrate in the visible region, and is transparent as a final ultraviolet absorbing fireproof plate. It is something. Incidentally, the visible light transmittance of the UV-absorbing fireproof plate according to the present invention is in the range of 10 to 100%.

透明基板上に設けた紫外線吸収層には、 さらにオーバ一コート層を設けること で耐摩耗性、 耐薬品性などの機能を付与することができる。  By providing an overcoat layer on the ultraviolet absorbing layer provided on the transparent substrate, functions such as abrasion resistance and chemical resistance can be imparted.

オーバーコート剤としては一般的に知られている様々なものが使用できるが、 その中でもシリコ一ン系のォ一バーコ一ト剤が最適である。 シリコーン系オーバ 一コート剤としてはコロイダルシリカなどの無機微粒子を分散させたシリコ一ン レジン系やアルコキシシラン、 クロロシランなどのシラン類の部分加水分解生成 物及び部分重縮合生成物などが挙げられる。 具体的には, 市販品ではトスガード 510 (東芝シリコーン製) や APZ7703、 APZ7705 (日本ュニカー製) が挙げられる。 またエポキシシランの部分加水分解生成物もオーバ一コート剤として耐摩耗性な 51 Various commonly known overcoating agents can be used, and among them, a silicon-based overcoating agent is most suitable. Examples of the silicone-based overcoating agent include silicone resin-based materials in which inorganic fine particles such as colloidal silica are dispersed, and products of partial hydrolysis and partial polycondensation of silanes such as alkoxysilane and chlorosilane. Specifically, commercially available products include Tosgard 510 (made by Toshiba Silicone), APZ7703, and APZ7705 (made by Nippon Tunicar). Also, the partial hydrolysis products of epoxy silane are abrasion resistant as overcoating agents. 51

どが優れていることが知られている。 オーバーコート層の形成には、 適宜公知の 方法が採用可能であって、 例えば、 スピンコート、 スプレーコート、 キャス トコ ート、 ブレードコート、 ディ ップコートなどを任意に選ぶことができる。 It is known that they are superior. For forming the overcoat layer, a known method can be appropriately adopted, and for example, a spin coat, a spray coat, a cast coat, a blade coat, a dip coat and the like can be arbitrarily selected.

塗膜の硬化も紫外線吸収層の場合と同様の方法が適用できる。 また、 オーバ一 コート作製前に、 紫外線吸収層に光表面改質ゃプライマ一処理を施すことで、 ォ —バーコ一ト材の塗れ性改善や、 オーバ一コート層の紫外線吸収層への密着性を 改善することができる。  The same method as in the case of the ultraviolet absorbing layer can be applied to the curing of the coating film. In addition, before the overcoat is produced, the UV-absorbing layer is subjected to a light surface modification and primer treatment to improve the coatability of the overcoat material and the adhesion of the overcoat layer to the UV-absorbing layer. Can be improved.

オーバ—コート層には、 さらにその表面上に熱線反射機能や断熱機能のある金 属酸化物等の薄膜を真空蒸着やスパッ夕リング、 ゾルゲル法等の方法により成膜 させることができ、 これによつて熱線反射機能や断熱機能を付与することもでき る。  In the overcoat layer, a thin film of a metal oxide or the like having a heat ray reflecting function or a heat insulating function can be further formed on the surface thereof by a method such as vacuum evaporation, sputtering, or a sol-gel method. Thus, a heat ray reflecting function and a heat insulating function can be provided.

【 0 0 1 5】  [0 0 1 5]

本発明の紫外線吸収防耐火板は、 前述の通り、 板厚方向に間隔を隔てて並置さ れた透明基板同士の間に熱感応発泡剤を含む発泡層を設けた積層板を単層または 2層以上、 通常 2〜 5層程度複数層重層してなるものであり、 使用する透明基板 の少なく とも 1枚に、 成分 Aと成分 Bを反応させて得られるところの、 アミ ド結 合を有する反応生成物の硬化塗膜を設けている点を除くと、 公知の方法により作 製することができる。  As described above, the ultraviolet-absorbing fireproof fire-resistant plate of the present invention comprises a single-layer or two-layer laminate having a foam layer containing a heat-sensitive foaming agent between transparent substrates juxtaposed at intervals in the thickness direction. It consists of two or more layers, usually about 2 to 5 layers, and has an amide bond obtained by reacting component A and component B on at least one of the transparent substrates used. Except for providing a cured coating film of the reaction product, it can be produced by a known method.

熱感応発泡剤としては、 本発明の目的を達成するものである限り特に限定され ないが、 通常、 3 0 ° ( 〜 8 0 0 °C、 好ましくは 1 0 0 °C〜 6 0 0 °Cの温度範囲の 熱に感応し発泡するものが好適である。 具体的な化合物としては、 例えば、 アル ミン酸カリウム、 鉛酸カリウム、 錫酸ナトリウム、 錫酸カリウム、 硫酸アルミ二 ゥムナトリウム、 硫酸アルミニウムカリウム、 硼酸ナトリウム、 硼酸カリウム、 オルトリン酸ナトリウム等の水和アル力リ金属塩や、 珪酸ナト リゥム等の水和ァ ルカリ金属珪酸塩、 またはこれらの二種以上の混合物等が挙げられる。  The heat-sensitive foaming agent is not particularly limited as long as the object of the present invention is achieved, but is usually 30 ° ((800 ° C., preferably 100 ° C. to 600 ° C.). Preferred are compounds that foam in response to heat in the temperature range of: For example, potassium aluminate, potassium plumbate, sodium stannate, potassium stannate, sodium aluminum sulfate, sulfuric acid Examples include hydrated alkali metal salts such as aluminum potassium, sodium borate, potassium borate, and sodium orthophosphate; hydrated alkali metal silicates such as sodium silicate; and mixtures of two or more of these.

発泡層としては、 熱感応発泡剤を含むものであり、 典型的には熱感応発泡剤か らなるものであるが、 熱感応発泡剤と他の化合物との組成物から構成されてもよ い。 層の厚みとしては、 本発明の目的を達成するものである限り特に限定されな いが、 通常 0 . 1〜 5 0 mm、 好ましくは 0 . 8〜 1 0 mmである。 また、 本発 明の発泡層は、 透光性を有することが好ましく、 さらに好ましくは透明性を具備 することが望ましい。 発泡層の形成方法は、 特に限定されないが、 前記熱感能発 泡剤の各種溶液 (典型的には水溶液) を塗布、 乾燥等する方法が好適な方法とし て挙げられる。 The foamed layer contains a heat-sensitive foaming agent, and is typically made of a heat-sensitive foaming agent, but may be composed of a composition of a heat-sensitive foaming agent and another compound. . The thickness of the layer is not particularly limited as long as the object of the present invention is achieved, but is usually 0.1 to 50 mm, preferably 0.8 to 10 mm. In addition, The light foam layer preferably has a light-transmitting property, and more preferably has transparency. The method for forming the foamed layer is not particularly limited, but a method of applying and drying various solutions (typically, an aqueous solution) of the heat-sensitive foaming agent is mentioned as a suitable method.

〔図面の簡単な説明〕  [Brief description of drawings]

第 1図は単層の発泡層を備えた本発明に係る紫外線吸収防耐火板の断面図であ る  FIG. 1 is a cross-sectional view of a UV-absorbing fireproof plate according to the present invention having a single foam layer.

第 2図は複数層の発泡層を備えた本発明に係る紫外線吸収防耐火板の断面図で める。  FIG. 2 is a cross-sectional view of a UV-absorbing fireproof plate according to the present invention having a plurality of foam layers.

第 3図は実施例 1で作製した紫外線吸収透明板の紫外可視吸収スぺク トルを示 すグラフである。  FIG. 3 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 1.

第 4図は実施例 3で作製した紫外線吸収透明板の紫外可視吸収スぺク トルを示 すグラフである。  FIG. 4 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 3.

第 5図は実施例 4で作製した紫外線吸収透明板の紫外可視吸収スぺク トルを示 すグラフである。  FIG. 5 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 4.

第 6図は実施例 5で作製した紫外線吸収透明板の紫外可視吸収スぺク トルを示 すグラフである。  FIG. 6 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 5.

第 7図は実施例 6で作製した紫外線吸収透明板の紫外可視吸収スぺク トルを示 すグラフである。  FIG. 7 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 6.

第 8図は実施例 7で作製した紫外線吸収透明板の紫外可視吸収スぺク トルを示 すグラフである。 次に本発明に係る紫外線吸収防耐火透明板の代表的構造を、 第 1図及び第 2図 にそって説明する。  FIG. 8 is a graph showing an ultraviolet-visible absorption spectrum of the ultraviolet absorbing transparent plate produced in Example 7. Next, a typical structure of the ultraviolet-absorbing fire-resistant transparent plate according to the present invention will be described with reference to FIGS. 1 and 2. FIG.

本発明の紫外線吸収防耐火板の基本構造は、 第 1図に示すように、 紫外線吸収 層 2を備えた透明基板 1 aと、 これに対向する透明基板 1 bとの間に、 発泡層 3 が挟まれた構造にある。 透明基板に設けられる紫外線吸収層 2は、 外界側に位置 してもかまわないが、 図示のように発泡層側に位置している方が耐久性の面から も好ましい。 第 2図は、 第 1図に示す基本構造に、 透明基板を介して 2つの発泡層を積層さ せた紫外線吸収防耐火透明板の断面を示すものであるが、 透明基板を介し積層さ せる発泡層の数は、 1つでもよく、 3個以上であっても差し支えない。 図示の例 では、 室外側に位置する透明基板 1 aに紫外線吸収層 2が設けられているが、 透 明基板 l b、 l c、 1 dの 1つ又は 2つ以上にも、 紫外線吸収層 2を設けること ができる。 As shown in FIG. 1, the basic structure of the UV-absorbing fireproof plate of the present invention is such that a foamed layer 3 is provided between a transparent substrate 1 a having an ultraviolet-absorbing layer 2 and a transparent substrate 1 b opposed thereto. There is in the structure sandwiched. The ultraviolet absorbing layer 2 provided on the transparent substrate may be located on the outside world side, but is preferably located on the foam layer side as shown in view of durability. Fig. 2 shows a cross section of an ultraviolet-absorbing fire-resistant transparent plate obtained by laminating two foam layers on the basic structure shown in Fig. 1 with a transparent substrate interposed therebetween. The number of foam layers may be one, or may be three or more. In the example shown in the figure, the ultraviolet absorbing layer 2 is provided on the transparent substrate 1a located on the outdoor side, but the ultraviolet absorbing layer 2 is also provided on one or more of the transparent substrates lb, lc, 1d. Can be provided.

本発明の紫外線吸収防耐火透明板は、 任意の方法で製造することができる。 第 1図に示す具体例を例にとれば、 熱感応性発泡剤の溶液を、 透明基板 l aに形成 された紫外線吸収層上(即ち紫外線吸収透明板上) または透明基板 1 b上に塗布、 乾燥して透明基板上に直接熱感応性発泡剤の固体層を形成した後、 透明基板 1 b または紫外線紫外線吸収層付透明基板 1 aを合わせる方法で作製できる。 また、 別途形成した発泡層(膜状物)を、透明基板 1 aに形成された紫外線吸収層上(即 ち紫外線吸収透明板上) または透明基板 1 b上に付与し、 その後、 透明板 lb ま たは紫外線紫外線吸収層付透明基板 1 aを発泡層上に付与する方法などによって 作製される。 第 2図のような構造を備えた防耐火板も、 上と同様な手順を繰り返 すことで製造できることは言うまでもない。  The ultraviolet-absorbing fire-resistant transparent plate of the present invention can be manufactured by any method. Taking the specific example shown in FIG. 1 as an example, a solution of a heat-sensitive foaming agent is applied on the ultraviolet absorbing layer formed on the transparent substrate la (that is, on the ultraviolet absorbing transparent plate) or on the transparent substrate 1b. After drying and forming a solid layer of a heat-sensitive foaming agent directly on the transparent substrate, the transparent substrate 1b or the transparent substrate 1a with an ultraviolet / ultraviolet absorbing layer can be produced by a method of combining. Also, a separately formed foam layer (film-like material) is applied on the ultraviolet absorbing layer formed on the transparent substrate 1a (that is, on the ultraviolet absorbing transparent plate) or on the transparent substrate 1b. Alternatively, it is manufactured by a method of applying the transparent substrate 1a with an ultraviolet-ultraviolet absorbing layer on a foam layer. It goes without saying that a fireproof plate having the structure shown in Fig. 2 can be manufactured by repeating the same procedure as above.

以上、 本発明について詳細に説明してきたが、 本発明の紫外線吸収防耐火板に 関して好適な実施態様としては以下の態様が挙げられる。  As described above, the present invention has been described in detail. Preferred embodiments of the ultraviolet-absorbing fireproof plate of the present invention include the following embodiments.

① 紫外線吸収層形成用塗料が、 少なく とも ( a ) 前記一般式 ( 1 ) に示される アミノシラン化合物またはその誘導体、 および (b ) 前記分子内にカルボン酸残 基を有する紫外線吸収性化合物を反応させる際に、 前記シリコーン樹脂の存在下 で行うことにより得られるものであることを特徴とする本願発明の紫外線吸収防 耐火板。  (1) The UV-absorbing layer-forming paint is reacted with at least (a) the aminosilane compound represented by the general formula (1) or a derivative thereof, and (b) the UV-absorbing compound having a carboxylic acid residue in the molecule. In this case, the fireproof plate for absorbing ultraviolet light according to the present invention is obtained by performing the treatment in the presence of the silicone resin.

② 紫外線吸収層形成用塗料が、 少なくとも (a ) 前記一般式 ( 1 ) に示される アミノシラン化合物またはその誘導体、 および (b ) 前記分子内にカルボン酸残 基を有する紫外線吸収性化合物を反応させ、 該ァミノシランに由来するアミ ド結 合を生成せしめたのち、 前記エポキシシラン類をさらに加えることにより得られ るものであることを特徴とする本願発明の紫外線吸収防耐火板。  (2) the ultraviolet-absorbing layer-forming paint is reacted with at least (a) an aminosilane compound or a derivative thereof represented by the general formula (1), and (b) an ultraviolet-absorbing compound having a carboxylic acid residue in the molecule; The ultraviolet-absorbing fireproof plate according to the present invention, which is obtained by forming an amide bond derived from the aminosilane and then further adding the epoxysilane.

③ 紫外線吸収層形成用塗料が、 少なくとも (a ) 前記一般式 ( 1 ) に示される アミノシラン化合物またはその誘導体、 および (b) 前記分子内にカルボン酸残 基を有する紫外線吸収性化合物を反応させ、 前記アミノシラン類に由来するアミ ド結合を生成せしめたのち、 コロイダルシリカをさらに加えることにより得られ るものであることを特徴とする本願発明の紫外線吸収防耐火板。 本発明の紫外線吸収防耐火板は、 紫外線吸収性化合物を母材であるシリコーン 樹脂とアミ ド結合を介して結合させることにより、 高濃度に吸収性化合物を含有 させても良好な耐久性を維持し、 可視領域の透過率低下をほとんど起こさず長波 長領域までクリアにカツ トできるものである。 (3) The UV-absorbing layer forming paint is at least (a) represented by the general formula (1) An aminosilane compound or a derivative thereof, and (b) reacting an ultraviolet absorbing compound having a carboxylic acid residue in the molecule to form an amide bond derived from the aminosilane, and further adding colloidal silica. An ultraviolet-absorbing fire-resistant plate according to the present invention, which is obtained. The UV-absorbing fireproof plate of the present invention maintains good durability even when a high concentration of the absorbing compound is contained, by bonding the UV-absorbing compound to the silicone resin as a base material through an amide bond. However, it is possible to cut clearly into the long wavelength region with almost no decrease in transmittance in the visible region.

以下に実施例を挙げて本発明を具体的に説明するが、 本発明は実施例に限定さ れるものではない。  Hereinafter, the present invention will be described specifically with reference to examples, but the present invention is not limited to the examples.

[実施例 1 ]  [Example 1]

カルボン酸残基含有紫外線吸収性化合物の合成 Synthesis of UV absorbing compounds containing carboxylic acid residues

225 g ( 0. 46モル) の 3- (5 -クロ口- 2 H-ベンゾトリァゾ一ル- 2 - ィル) - 5- ( 1, 1- ジメチルェチル) - 4- ヒ ドロキシ- ベンゼンプロ パン酸ォクチルエステル (T INUVI N 109、 商標名、 C i ba— Ge i gy社製) を 700 mlのアセ トンに溶解し、 2 N水酸化ナトリウム水溶液 60 0mlを加えて室温で 24時間撹拌した。 2N塩酸 650mlを加えて酸性にし た後、 不溶化した生成物を濾別し、 蒸留水で濾液が中性になるまで洗浄した。 こ の生成物を真空乾燥した後、 トルエンからの再結晶を行うことで 3- ( 5- ク ロロ- 2 H- ベンゾトリアゾール- 2- ィル) - 5- ( 1, 1- ジメチルェチ ル) - 4- ヒドロキシ- ベンゼンプロパン酸 [化合物 I] を得た。  225 g (0.46 mol) of 3- (5-chloro-2H-benzotriazol-2-yl) -5- (1,1-dimethylethyl) -4-hydroxy-benzenepropanoate Cutyl ester (TINUVIN 109, trade name, manufactured by Ciba-Geigy) was dissolved in 700 ml of acetone, 600 ml of a 2N aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 24 hours. After adding 650 ml of 2N hydrochloric acid to make it acidic, the insolubilized product was separated by filtration and washed with distilled water until the filtrate became neutral. The product is vacuum dried and recrystallized from toluene to give 3- (5-chloro-2H-benzotriazol-2-yl) -5- (1,1-dimethylethyl)- 4-Hydroxy-benzenepropanoic acid [Compound I] was obtained.

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

3—ァミノプロビルト リエトキシシラン 3 gをキシレン 35 gに溶解し、 8 0°Cに加熱しながら、 5 gの前記化合物 Iを徐々に添加した。 添加終了後、 13 0°Cまで昇温し、 3時間還流した。 放冷後、 3—グリシドキシプロビルトリメ ト キシシランを 16 g添カ卩し、 これを紫外線吸収層形成用塗料とした。  3 g of 3-aminopropyl ethoxysilane was dissolved in 35 g of xylene, and 5 g of the compound I was gradually added while heating to 80 ° C. After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours. After standing to cool, 16 g of 3-glycidoxypropyltrimethoxysilane was added to the mixture, and this was used as a coating for forming an ultraviolet absorbing layer.

得られた塗料を l ci C一 NMRにより分析したところ、 アミ ド結合に由来す るカルボニルのピーク (約 173 ppm) が観測され、 原料のアミノシラン類に 99/351 When the obtained paint was analyzed by lciC- NMR, a carbonyl peak (about 173 ppm) derived from an amide bond was observed. 99/351

由来するアミ ド結合が存在していることを確認した。 It was confirmed that there was an amide bond derived therefrom.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記紫外線吸収層形成用塗料をガラス基板上にスプレー塗布し、 室温で 20分 放置後 200°Cで 20分加熱し、 厚さ約 1ア mの紫外線吸収被膜を有する紫外 線吸収ガラスを作製した。  The above-mentioned paint for forming an ultraviolet absorbing layer was spray-coated on a glass substrate, left at room temperature for 20 minutes, and then heated at 200 ° C for 20 minutes to produce an ultraviolet absorbing glass having an ultraviolet absorbing film having a thickness of about 1 am. .

この紫外線吸収ガラスの紫外可視吸収スぺク トルを第 3図に示した。 スぺク ト ルに示されるように、 40 Onm以下の紫外線を完全に遮断するガラス基板が得 られた。  FIG. 3 shows the ultraviolet-visible absorption spectrum of this ultraviolet absorbing glass. As shown in the spectrum, a glass substrate completely blocking ultraviolet light of 40 Onm or less was obtained.

紫外線吸収防耐火ガラスの作製 Preparation of UV absorbing fireproof glass

発泡材料として珪酸ソーダ水溶液を用い、 上記紫外線吸収ガラスと市販のソ一 ダライムガラスを合わせガラス化し、 発泡層として珪酸ナト リゥム水和物層を有 する第 2図に示す構造の紫外線吸収防耐火ガラスを作製した。  Using an aqueous solution of sodium silicate as the foaming material, combining the above-mentioned ultraviolet absorbing glass and commercially available soda lime glass into a glass, and having a sodium silicate hydrate layer as the foaming layer. Glass was prepared.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いて J I S-R 3204の防火試験を行ったところ、 良好な結果を得た。  The obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. When a fire prevention test of JIS-R 3204 was conducted using this UV-absorbing fireproof glass, good results were obtained.

[実施例 2] [Example 2]

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

3 gの 3- ァミノプロピルト リエ トキシシランをキシレン 40 gに溶解し 6 0°Cに加熱しつつ、 実施例 1で得た化合物 Iを 5 g徐々に加えた。 添加終了後、 130°Cまで昇温し、 3時間還流し、 溶液状の紫外線吸収層形成用塗料を得た。 得られた塗料溶液を 1 3 C— NMRにより分析したところ、 アミ ド結合に由 来するカルボニルのピーク (約 173 ppm) が観測され、 原料のアミノシラン 類に由来するアミ ド結合が存在していることを確認した。 3 g of 3-aminopropyltriethoxysilane was dissolved in 40 g of xylene, and while heating to 60 ° C., 5 g of the compound I obtained in Example 1 was gradually added. After the addition was completed, the temperature was raised to 130 ° C., and the mixture was refluxed for 3 hours to obtain a solution-like coating for forming an ultraviolet absorbing layer. When the obtained coating solution was analyzed by 13 C-NMR, a carbonyl peak (about 173 ppm) derived from amide bonds was observed, and amide bonds derived from the raw material aminosilanes were present. It was confirmed.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記塗布液をガラス基板上にスプレー塗布し、 室温で 20分放置後 130°Cで 30分加熱し、 厚さ約 10 /mの紫外線吸収被膜を有する紫外線吸収ガラスを作 製した。  The coating solution was spray-coated on a glass substrate, allowed to stand at room temperature for 20 minutes, and then heated at 130 ° C. for 30 minutes to produce an ultraviolet absorbing glass having an ultraviolet absorbing film having a thickness of about 10 / m.

この紫外線吸収ガラスの紫外可視吸収スぺク トルを測定したところ、 実施例 1 と同様に紫外線を完全に遮断するガラス基板が得られた。 When the UV-visible absorption spectrum of this UV-absorbing glass was measured, Example 1 was obtained. In the same manner as described above, a glass substrate capable of completely blocking ultraviolet rays was obtained.

紫外線吸収防耐火ガラスの作製 Preparation of UV absorbing fireproof glass

上記紫外線吸収ガラスと市販のソ一ダライムガラスを用い、 実施例 1 と同様に 紫外線吸収防耐火ガラスを作製した。  Using the above-mentioned ultraviolet absorbing glass and commercially available soda lime glass, an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いて The obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. Using this UV absorbing fireproof glass

J I S - R 3 2 0 4の防火試験を行ったところ、 良好な結果を得た。 [実施例 3 ] When a fire prevention test was performed on JIS-R 3204, good results were obtained. [Example 3]

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

シリコーンワニス (X O— 7 9 3 1ークリャ一、 ォキツモ製) 1 7 . 7 gと 3 - ァミノプロビルトリエトキシシラン 3 gをキシレン 3 5 に溶解し、 8 0 °C に加熱しながら化合物 Iを 5 g徐々に添加した。 添加終了後、 1 3 0 °Cまで昇温 し 3時間還流し、 溶液状の紫外線吸収性塗布液を得た。  Silicone varnish (XO-793 1-clear, manufactured by OKITSUMO) 17.7 g and 3 g of 3-aminopropyltriethoxysilane were dissolved in xylene 35, and compound I was heated at 80 ° C while heating. Was gradually added. After the addition was completed, the temperature was raised to 130 ° C., and the mixture was refluxed for 3 hours to obtain a solution-type ultraviolet absorbing coating solution.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記紫外線吸収層形成用塗料をガラス基板上にスプレー塗布し、 室温で 2 0分 放置後、 2 0 0 °Cで 2 0分加熱し、 厚さ約 1 7 z mの紫外線吸収被膜を有する紫 外線吸収ガラスを作製した。 この紫外線吸収ガラスに対して碁盤目試験を行った ところ、 5 0 %剥離が見られた。  The above-mentioned coating material for forming an ultraviolet absorbing layer is spray-coated on a glass substrate, left at room temperature for 20 minutes, and then heated at 200 ° C. for 20 minutes to obtain an ultraviolet ray having an ultraviolet absorbing film having a thickness of about 17 zm. An absorption glass was produced. When a cross-cut test was performed on this ultraviolet absorbing glass, 50% peeling was observed.

この紫外線吸収ガラスの紫外可視吸収スぺク トルを第 4図に示した。 スぺク ト ルに示されるように 4 0 O nm 以下の紫外線を完全に遮断するガラス基板が得ら れた。 鉛筆硬度は 2 Hだった。  FIG. 4 shows the ultraviolet-visible absorption spectrum of this ultraviolet absorbing glass. As shown in the spectrum, a glass substrate that completely blocks ultraviolet light of 40 O nm or less was obtained. The pencil hardness was 2H.

また、この紫外線吸収透明基板を沸騰ァセ トンで 2 4時間抽出を行ったところ、 重量減少はほとんどなかった。 このことから、 紫外線吸収性化合物はアミノシラ ンを介して樹脂と結合していることがわかった。  Extraction of this UV-absorbing transparent substrate with boiling acetone for 24 hours showed almost no weight loss. From this, it was found that the ultraviolet absorbing compound was bonded to the resin via aminosilane.

紫外線吸収防耐火ガラスの作製 Preparation of UV absorbing fireproof glass

上記紫外線吸収ガラスと市販のソ一ダライムガラスを用い、 実施例 1と同様に 紫外線吸収防耐火ガラスを作製した。  Using the above ultraviolet absorbing glass and commercially available soda lime glass, an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いてThe obtained UV-absorbing fireproof glass has transparency, and the UV-absorbing transparent glass described above. It had the same ultraviolet blocking ability as a bright plate. Using this UV absorbing fireproof glass

J I S -R 3204の防火試験を行ったところ、 良好な結果を得た。 [実施例 4] When a fire prevention test was performed on JIS-R 3204, good results were obtained. [Example 4]

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

シリコーンワニス (XO— 7931—クリヤー、 ォキツモ製) 17. 7 gと 3 - ァミノプロビルト リエトキシシラン 3 gをキシレン 35 に溶解し、 80 °C に加熱しながら 5 gの化合物 Iを徐々に添加した。 添加終了後、 130°Cまで昇 温し 3時間還流した。 放冷後、 3- グリシドキシプロピルト リメ トキシシラン を 16 g添加し、 紫外線吸収層形成用塗料を得た。  17.7 g of silicone varnish (XO-7931-Clear, manufactured by Okitsumo) and 3 g of 3-aminopropyl ethoxysilane were dissolved in xylene 35, and 5 g of compound I was gradually added while heating to 80 ° C. After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours. After standing to cool, 16 g of 3-glycidoxypropyltrimethoxysilane was added to obtain a coating for forming an ultraviolet absorbing layer.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記紫外線吸収層形成用塗料をガラス基板上にスプレー塗布し、 室温で 20分 放置後、 200°Cで 20分加熱し、 厚さ約 17 / mの紫外線吸収被膜を有する紫 外線吸収ガラスを作製した。 このガラス基板の紫外可視吸収スぺク トルを第 5図 に示す。 また、 実施例 3のように碁盤目試験での剥離は認められなかった。  The ultraviolet-absorbing layer forming paint is spray-coated on a glass substrate, left at room temperature for 20 minutes, and then heated at 200 ° C for 20 minutes to produce an ultraviolet-absorbing glass having an ultraviolet-absorbing coating having a thickness of about 17 / m. did. FIG. 5 shows the UV-visible absorption spectrum of this glass substrate. Further, as in Example 3, no peeling was observed in the cross-cut test.

紫外線吸収防耐火ガラスの作製 Preparation of UV absorbing fireproof glass

上記紫外線吸収ガラスと市販のソーダライムガラスを用い、 実施例 1と同様に 紫外線吸収防耐火ガラスを作製した。  Using the above-mentioned ultraviolet absorbing glass and commercially available soda lime glass, an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いて J I S-R 3204の防火試験を行ったところ、 良好な結果を得た。  The obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. When a fire prevention test of JIS-R 3204 was conducted using this UV-absorbing fireproof glass, good results were obtained.

[実施例 5] [Example 5]

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

シリコーンワニス (X〇一 7931—クリヤー、 ォキツモ製) 17. 7 gと 3 - ァミノプロピルト リエトキシシラン 3 gをキシレン 35 gに溶解し、 80 °C に加熱しながら 5 gの化合物 Iを徐々に添加した。 添加終了後、 130°Cまで昇 温し 3時間還流した。 放冷後、 3- グリシドキシプロビルト リメ トキシシラン を 1 6 g、 コロイダルシリカ分散液 (日産化学製、 MIBK- ST ) を 8 g添加し紫 外線吸収層形成用塗料を得た。 Silicone varnish (X-1 7931—clear, manufactured by Okitsumo) 17.7 g and 3 g of 3-aminopropyltriethoxysilane are dissolved in 35 g of xylene, and 5 g of compound I is gradually added while heating to 80 ° C. did. After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours. After cooling, add 16 g of 3-glycidoxyprovirt rimethoxysilane and 8 g of colloidal silica dispersion (Nissan Chemical Industries, MIBK-ST) and add purple. A paint for forming an external line absorbing layer was obtained.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記紫外線吸収層形成用塗料をガラス基板上にスプレー塗布し、 室温で 20分 放置後、 200°Cで 20分加熱し、 厚さ約 17 mの紫外線吸収被膜を有する紫 外線吸収ガラスを作製した。 鉛筆硬度は 4 Hであった。 このガラス基板の紫外可 視吸収スぺク トルを第 6図に示した。  The above-mentioned coating material for forming an ultraviolet absorbing layer was spray-coated on a glass substrate, allowed to stand at room temperature for 20 minutes, and then heated at 200 ° C. for 20 minutes to produce an ultraviolet absorbing glass having an ultraviolet absorbing film having a thickness of about 17 m. . The pencil hardness was 4H. FIG. 6 shows the UV-visible absorption spectrum of this glass substrate.

紫外線吸収複層ガラスの作製 Preparation of UV absorbing double glazing

上記紫外線吸収ガラスと市販のソーダライムガラスを用い、 実施例 1と同様に 紫外線吸収防耐火ガラスを作製した。  Using the above-mentioned ultraviolet absorbing glass and commercially available soda lime glass, an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いて J I S-R3204の防火試験を行ったところ、 良好な結果を得た。  The obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. When a fire prevention test of JIS-R3204 was performed using this UV-absorbing fireproof glass, good results were obtained.

[実施例 6] [Example 6]

エポキシシランの重合 Epoxysilane polymerization

3- グリシドキシプロビルト リメ トキシシラン 200 gをキシレン 75 gに 溶解させ、 3フッ化ホウ素 · ジェチルエーテル錯体 4 mlを室温で徐々に加えた 後、 4時間攪拌しエポキシ基の閧璟重合を行った。 得られたポリマーの分子量は Mw= 3300 (ポリスチレン換算) であった。  Dissolve 200 g of 3-glycidoxyprovirtrimethoxysilane in 75 g of xylene, slowly add 4 ml of boron trifluoride / getyl ether complex at room temperature, and stir for 4 hours to allow polymerization of epoxy groups. went. The molecular weight of the obtained polymer was Mw = 3300 (in terms of polystyrene).

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

シリコーンワニス (XO— 7931—クリヤー、 ォキヅモ製) 17. 7 gと 3 - ァミノプロピルト リエトキシシラン 3 gをキシレン 29 gに溶解し、 80 °C に加熱しながら 5 gの化合物 Iを徐々に添加した。 添加終了後、 130°Cまで昇 温し 3時間還流した。 放冷後、 上記エポキシシラン重合体溶液を 22 g加え紫外 線吸収層形成用塗料を得た。  Silicone varnish (XO-7931—clear, manufactured by OKIMO) 17.7 g and 3 g of 3-aminopropyltriethoxysilane were dissolved in 29 g of xylene, and 5 g of compound I was gradually added while heating to 80 ° C. . After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours. After cooling, 22 g of the above epoxysilane polymer solution was added to obtain a coating for forming an ultraviolet absorbing layer.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記溶液状の紫外線吸収層形成用塗料をコーテング液として、 これをガラス基 板上にスプレー塗布し、 室温で 20分放置後、 150°Cで 30分加熱し、 厚さ約 15 /mの紫外線吸収層のついたガラス基板を作製した。 鉛筆硬度は 6 Hであつ た。 このガラス基板の紫外可視吸収スぺク トルを第 8図に示した。 The coating solution for forming the UV absorbing layer in the form of a solution was applied as a coating solution on a glass substrate by spraying, left at room temperature for 20 minutes, and then heated at 150 ° C for 30 minutes to obtain a UV light having a thickness of about 15 / m. A glass substrate having an absorption layer was produced. Pencil hardness is 6H Was. FIG. 8 shows the UV-visible absorption spectrum of this glass substrate.

紫外線吸収防耐火ガラスの作製 Preparation of UV absorbing fireproof glass

上記紫外線吸収ガラスと市販のソーダライムガラスを用い、 実施例 1 と同様に 紫外線吸収防耐火ガラスを作製した。  Using the above-mentioned ultraviolet absorbing glass and commercially available soda-lime glass, an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いて J I S - R 3 2 0 4の防火試験を行ったところ、 良好な結果を得た。  The obtained UV-absorbing fire-resistant glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. Using this UV-absorbing fire-resistant glass, a fire prevention test of JIS-R320 was performed, and good results were obtained.

[実施例 7 ] [Example 7]

紫外線吸収層形成用塗料の製造 Manufacture of paint for forming UV absorbing layer

3 - ァミノプロピルト リエトキシシラン 3 gと実施例 6のエポキシシラン重 合体溶液 1 l gをキシレン 3 2 gに溶解し、 8 0 °Cに加熱しながら 5 gの化合物 Iを徐々に添加した。 添加終了後、 1 3 0 °Cまで昇温し 3時間還流し、 紫外線吸 収材料を得た。  3 g of 3-aminopropyltriethoxysilane and 1 lg of the epoxysilane polymer solution of Example 6 were dissolved in 32 g of xylene, and 5 g of Compound I was gradually added while heating to 80 ° C. After the addition was completed, the temperature was raised to 130 ° C and refluxed for 3 hours to obtain an ultraviolet ray absorbing material.

透明基板上への紫外線吸収層形成 Formation of UV absorbing layer on transparent substrate

前記溶液状の紫外線吸収層形成用塗料をコーテング液として、 これをガラス基 板上にスプレー塗布し、 室温で 2 0分放置後、 1 5 0 °Cで 3 0分加熱し、 厚さ約 1 5〃mの紫外線吸収層のついたガラス基板を作製した。 鉛筆硬度は 5 Hであつ た。 このガラス基板の紫外可視吸収スぺク トルを第 8図に示した。  The coating solution for forming the ultraviolet absorbing layer in the form of a solution was coated as a coating solution on a glass substrate by spraying, left at room temperature for 20 minutes, and then heated at 150 ° C. for 30 minutes to obtain a thickness of about 1 A glass substrate provided with a 5 μm ultraviolet absorbing layer was produced. The pencil hardness was 5H. FIG. 8 shows the UV-visible absorption spectrum of this glass substrate.

紫外線吸収防耐火ガラスの作製 Preparation of UV absorbing fireproof glass

上記紫外線吸収ガラスと市販のソ一ダライムガラスを用い、 実施例 1 と同様に 紫外線吸収防耐火ガラスを作製した。  Using the above-mentioned ultraviolet absorbing glass and commercially available soda lime glass, an ultraviolet absorbing fireproof glass was produced in the same manner as in Example 1.

得られた紫外線吸収防耐火ガラスは、 透明性を有し、 また前記の紫外線吸収透 明板と同等の紫外線遮断能を有していた。 この紫外線吸収防耐火ガラスを用いて J I S - R 3 2 0 4の防火試験を行ったところ、 良好な結果を得た。  The obtained UV-absorbing fireproof glass had transparency and had the same UV-blocking ability as the above-mentioned UV-absorbing transparent plate. Using this UV-absorbing fireproof glass, a fireproof test of JIS-R320 was performed, and good results were obtained.

Claims

請 求 の 範 囲 The scope of the claims 1. 板厚方向に間隔を隔てて並置された複数枚の透明基板の間に熱感応発 泡剤を含む発泡層を設けた積層防耐火透明板であって、 該防耐火透明板に使用さ れる透明基板の少なく とも 1枚がその表面に紫外線吸収層を備え、 該紫外線吸収 層が 1. A laminated fire-resistant fire-resistant transparent plate provided with a foam layer containing a heat-sensitive foaming agent between a plurality of transparent substrates juxtaposed at an interval in the thickness direction of the fire-resistant transparent plate. At least one of the transparent substrates to be provided has an ultraviolet absorbing layer on its surface, and the ultraviolet absorbing layer (a) 下記の一般式 ( 1) に示されるアミノシラン化合物またはその誘導体と、  (a) an aminosilane compound represented by the following general formula (1) or a derivative thereof, R2 R2 R 2 R 2 H2N - R1- Si-† 0— Si- - R2 (1) H 2 N-R 1 -Si- † 0— Si--R 2 (1) R2 R2n R 2 R 2 No n (式中、 R 1は炭素数 1〜 10のアルキレン基、 または一般式— (CH2) m - NH- [mは l≤m≤4の整数] で表される 2価の基を示し、 各々の R 2は同 一若しくは異なる基であって、 水素原子、 水酸基、 ハロゲン原子、 炭素数 1〜1(Wherein, R 1 represents an alkylene group having 1 to 10 carbon atoms, or a divalent group represented by the general formula — (CH 2 ) m -NH- [m is an integer of l≤m≤4], Each R 2 is the same or different, and includes a hydrogen atom, a hydroxyl group, a halogen atom, 0のアルキル基又は炭素数 1〜 10のアルコキシ基を示す。 但し、 全ての; 2 のうち少なくとも一つはアルコキシ基を示す。 nは n≥ 0の整数を示す。)And represents an alkyl group having 0 or an alkoxy group having 1 to 10 carbon atoms. However, at least one of all; 2 represents an alkoxy group. n represents an integer of n≥0. ) (b) 分子内にカルボキシル基を有する紫外線吸収性化合物 (b) UV absorbing compound having a carboxyl group in the molecule を反応させ、 アミノシラン化合物またはその誘導体に由来するアミ ド結合を生成 せしめた反応生成物を、 透明基板の表面に塗布、 硬化させることで形成されてい ることを特徴とする紫外線吸収防耐火透明板。 A UV-absorbing fire-resistant fire-resistant transparent plate characterized by being formed by applying and curing a reaction product, which is obtained by reacting with an aminosilane compound or a derivative thereof to form an amide bond derived from an aminosilane compound, on the surface of a transparent substrate. . 2. 前記のアミノシラン化合物又はその誘導体が、 3-ァミノプロビルト リエトキシシラン、 3-ァミノプロビルジイソプロビルエトキシシラン、 3-アミ ノプロピルメチルジェトキシシラン、 3-ァミノプロビルトリククロシラン、 3- ァミノプロピルポリジメチルシロキサン、 N- (2- アミノエチル) -3-ァミノ プロピルトリメ トキシシラン、 3 -ァミノプロピルト リス (メ トキシェトキシェ トキシ) シラン及びこれらの加水分解物から選ばれる請求項 1記載の紫外線吸収 防耐火透明板。 2. The above-mentioned aminosilane compound or a derivative thereof is 3-aminopropyl ethoxysilane, 3-aminopropyldiisopropylethoxysilane, 3-aminopropylmethyljetoxysilane, 3-aminopropyl trichlorosilane, The ultraviolet absorption according to claim 1, wherein the ultraviolet absorption is selected from -aminopropylpolydimethylsiloxane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltris (methoxetoxyhetoxy) silane, and a hydrolyzate thereof. Fireproof transparent board. 3. 分子内にカルボキシル基を有する紫外線吸収性化合物が、 下記の一般 式 (2) で示されるベンゾトリアゾール化合物である請求項 1記載の紫外線吸収 防耐火透明板。 3. The ultraviolet-absorbing fire-resistant transparent plate according to claim 1, wherein the ultraviolet-absorbing compound having a carboxyl group in the molecule is a benzotriazole compound represented by the following general formula (2).
Figure imgf000025_0001
Figure imgf000025_0001
(式中、 R 3は水素原子、 ハロゲン原子または炭素数 1~10のアルキル基を、(Wherein, R 3 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 10 carbon atoms, R 4は水素原子または炭素数 1〜 10のアルキル基を、 R 5は炭素数 1〜 10 のアルキレン基またはアルキリデン基を示す。) R 4 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and R 5 represents an alkylene group or an alkylidene group having 1 to 10 carbon atoms. )
4。 分子内にカルボキシル基を有する紫外線吸収性化合物が、 下記の一般 式 (3) 〜 (6) で示されるベンゾフエノン化合物の何れか 1つである請求項 1 記載の紫外線吸収防耐火透明板。 Four. The UV-absorbing fire-resistant transparent plate according to claim 1, wherein the UV-absorbing compound having a carboxyl group in the molecule is any one of benzophenone compounds represented by the following general formulas (3) to (6).
Figure imgf000025_0002
Figure imgf000025_0002
OH 0 HO OH 0 HO R6— COOH R 6 — COOH
(5) 6 OH O HO (Five) 6 OH O HO HOOC- R  HOOC- R (6) (6) (式中、 R 6は炭素数 1 ~ 1 0のアルキレン基又はアルキリデン基を示し、 R(In the formula, R 6 represents an alkylene group or an alkylidene group having 1 to 10 carbon atoms; ' 及び R 8は同一若しくは異なる基であって、 水酸基、 炭素数 1 〜 1 0のアル キル基又はアルコキシ基を示し、 n、 mは、 0≤m≤3 、 0 ^ η≤3の範囲の整 数を示す。) 'And R 8 are the same or different and represent a hydroxyl group, an alkyl group or an alkoxy group having 1 to 10 carbon atoms, and n and m are in the range of 0≤m≤3, 0 ^ η≤3. Indicates an integer. ) 5 . 前記の紫外線吸収層が、 アルコキシシリル基またはシラノール基を含 有する反応性シリコーン樹脂の存在下に、 成分(a)と成分(b)とを反応させて得ら れる反応生成物を、 透明基板の表面に塗布、 硬化させることで形成されている請 求項 1記載の紫外線吸収防耐火透明板。 5. The reaction product obtained by reacting the component (a) with the component (b) in the presence of a reactive silicone resin having an alkoxysilyl group or a silanol group in the ultraviolet absorbing layer is transparent. 3. The ultraviolet-absorbing fire-resistant transparent plate according to claim 1, which is formed by applying and curing the surface of the substrate. 6。 透明基板の表面に塗布される前記反応生成物が、 一般式 (7 ) 及び/ 又は一般式 ( 8 ) で示されるエポキシシランをさらに含有する請求項 1記載の紫 外線吸収防耐火透明板。 6. 2. The ultraviolet absorbing and fireproof transparent plate according to claim 1, wherein the reaction product applied to the surface of the transparent substrate further contains an epoxysilane represented by the general formula (7) and / or (8).
Figure imgf000026_0001
Figure imgf000026_0001
Figure imgf000026_0002
Figure imgf000026_0002
(式中、 R 9および R 1 1は同一若しくは異なる基であって、 炭素数 1 〜 1 0 のアルキレン基又は式一 R— 0— R, - (但し、 R及び R, は各々炭素数 1 〜 1 0、 好ましくは 1 〜 5のアルキレン基を示す) で示される 2価の基を示し、 R(Wherein, R 9 and R 11 are the same or different groups, and are an alkylene group having 1 to 10 carbon atoms or a group represented by the formula: R—0—R,-(where R and R are To 10 and preferably 1 to 5 alkylene groups). 1 0は、 同一若しくは異なる基であって、 水素原子、 水酸基、 ハロゲン原子、 炭素数 1〜 1 0のアルキル基、 アルコキシ基、 または炭素数 6〜 1 0のァリール 基を示す。 但し、 全ての R 1 0のうち少なく とも 1つはアルコキシ基であり、 nは n 0、 好ましくは 0≤n≤ 3の整数を示す。) 10 are the same or different groups, and each represents a hydrogen atom, a hydroxyl group, a halogen atom, And represents an alkyl group or an alkoxy group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms. However, at least one of all R 10 is an alkoxy group, and n represents n 0, preferably an integer of 0 ≦ n ≦ 3. )
7 . 透明基板の表面に塗布される前記反応生成物が、 コロイダルシリカを さらに含有する請求項 1記載の紫外線吸収防耐火透明板。 7. The ultraviolet-absorbing fire-resistant transparent plate according to claim 1, wherein the reaction product applied to the surface of the transparent substrate further contains colloidal silica.
PCT/JP1999/000042 1998-01-09 1999-01-08 Ultraviolet-absorbing fire-proof and -resistant transparent plate Ceased WO1999035102A1 (en)

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JP1494398A JPH11199278A (en) 1998-01-09 1998-01-09 UV absorption fireproof transparent board
JP10/14943 1998-01-09

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EP1398147A1 (en) 2002-09-13 2004-03-17 Scheuten Glasgroep Fire-screening glazing unit

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JP4730886B2 (en) * 2005-06-01 2011-07-20 信越化学工業株式会社 UV-absorbing group-containing organopolysiloxane, method for producing the polysiloxane, and treatment agent comprising the polysiloxane
WO2007099784A1 (en) * 2006-02-24 2007-09-07 Idemitsu Kosan Co., Ltd. Coating composition, hardened film and resin laminate
TW201204820A (en) * 2010-07-16 2012-02-01 Sequoia Radcure Co Ltd Heat dissipation formulation
JP6557075B2 (en) * 2015-07-06 2019-08-07 株式会社日本触媒 Method for producing siloxane compound

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JPH0340944A (en) * 1989-07-06 1991-02-21 Fujita Corp Multifunctional glass
JPH05238785A (en) * 1992-03-02 1993-09-17 Sekisui Chem Co Ltd Photochromic glass and photochromic laminated glass
JPH08210041A (en) * 1994-10-07 1996-08-13 Flachglas Ag Fireproof glazing unit

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JPH0340944A (en) * 1989-07-06 1991-02-21 Fujita Corp Multifunctional glass
JPH05238785A (en) * 1992-03-02 1993-09-17 Sekisui Chem Co Ltd Photochromic glass and photochromic laminated glass
JPH08210041A (en) * 1994-10-07 1996-08-13 Flachglas Ag Fireproof glazing unit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1398147A1 (en) 2002-09-13 2004-03-17 Scheuten Glasgroep Fire-screening glazing unit
WO2004024441A1 (en) * 2002-09-13 2004-03-25 Scheuten Glasgroep Fireproof glazing unit
JP2006506302A (en) * 2002-09-13 2006-02-23 ショイテン グラースグループ Fireproof glass unit
US7340869B2 (en) 2002-09-13 2008-03-11 Scheuten Glagroep Bv Fireproof glazing unit

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