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WO1999008134A3 - Systeme d'imagerie comprenant un microscope a u.v. a tres grande largeur de bande et a effet de zoom a grande portee - Google Patents

Systeme d'imagerie comprenant un microscope a u.v. a tres grande largeur de bande et a effet de zoom a grande portee Download PDF

Info

Publication number
WO1999008134A3
WO1999008134A3 PCT/US1998/016568 US9816568W WO9908134A3 WO 1999008134 A3 WO1999008134 A3 WO 1999008134A3 US 9816568 W US9816568 W US 9816568W WO 9908134 A3 WO9908134 A3 WO 9908134A3
Authority
WO
WIPO (PCT)
Prior art keywords
ultra
broadband
tube lens
microscope
wide range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1998/016568
Other languages
English (en)
Other versions
WO1999008134A2 (fr
Inventor
David Ross Shafer
Yung-Ho Chuang
Bin-Ming Benjamin Tsai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Priority to EP98942028.6A priority Critical patent/EP1000371B1/fr
Priority to JP2000506547A priority patent/JP2001517806A/ja
Priority to AU90167/98A priority patent/AU9016798A/en
Publication of WO1999008134A2 publication Critical patent/WO1999008134A2/fr
Publication of WO1999008134A3 publication Critical patent/WO1999008134A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/16—Microscopes adapted for ultraviolet illumination ; Fluorescence microscopes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

Ce système de microscope d'imagerie catadioptrique, à ultraviolets (U.V.) et à très grande largeur de bande, est doté d'un effet de zoom à grande portée, il comprend un groupe de lentilles catadioptriques ainsi qu'un groupe de lentilles de tube zoom, et il possède une résolution optique élevée dans les longueurs d'ondes U.V. courtes, un grossissement réglable en continu ainsi qu'une ouverture numérique élevée. Ce système comporte des modules de microscope, tels que des objectifs, des lentilles de tube et des optiques à effet de zoom, ce qui permet de réduire le nombre de composants et de simplifier le procédé de fabrication du système. Le mode de réalisation préféré de l'invention offre excellente qualité d'image sur une gamme spectrale très large d'ultraviolets à courte longueur d'onde, grâce à la combinaison d'une lentille de tube zoom à matériau totalement réfléchissant. On a modifié la lentille du tube zoom pour compenser les aberrations chromatiques d'ordre élevé, lesquelles limitent normalement les performances de ce type de système.
PCT/US1998/016568 1997-08-07 1998-08-07 Systeme d'imagerie comprenant un microscope a u.v. a tres grande largeur de bande et a effet de zoom a grande portee Ceased WO1999008134A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP98942028.6A EP1000371B1 (fr) 1997-08-07 1998-08-07 Systeme d'imagerie comprenant un microscope a u.v. a tres grande largeur de bande et a effet de zoom a grande portee
JP2000506547A JP2001517806A (ja) 1997-08-07 1998-08-07 広範囲ズーム機能を備えた超広帯域紫外顕微鏡映像システム
AU90167/98A AU9016798A (en) 1997-08-07 1998-08-07 Ultra-broadband uv microscope imaging system with wide range zoom capability

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/908,247 1997-08-07
US08/908,247 US5999310A (en) 1996-07-22 1997-08-07 Ultra-broadband UV microscope imaging system with wide range zoom capability

Publications (2)

Publication Number Publication Date
WO1999008134A2 WO1999008134A2 (fr) 1999-02-18
WO1999008134A3 true WO1999008134A3 (fr) 1999-04-29

Family

ID=25425441

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/016568 Ceased WO1999008134A2 (fr) 1997-08-07 1998-08-07 Systeme d'imagerie comprenant un microscope a u.v. a tres grande largeur de bande et a effet de zoom a grande portee

Country Status (5)

Country Link
US (1) US5999310A (fr)
EP (1) EP1000371B1 (fr)
JP (6) JP2001517806A (fr)
AU (1) AU9016798A (fr)
WO (1) WO1999008134A2 (fr)

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US5999310A (en) 1999-12-07
WO1999008134A2 (fr) 1999-02-18
JP2005115394A (ja) 2005-04-28
JP2011070230A (ja) 2011-04-07
JP2015018279A (ja) 2015-01-29
EP1000371A4 (fr) 2008-03-19
JP2012247811A (ja) 2012-12-13
JP2008276272A (ja) 2008-11-13
EP1000371A2 (fr) 2000-05-17
JP2001517806A (ja) 2001-10-09
AU9016798A (en) 1999-03-01
EP1000371B1 (fr) 2017-12-13

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