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WO1995018106A1 - 4-trifluoromethylpyridine derivative and process for producting the same - Google Patents

4-trifluoromethylpyridine derivative and process for producting the same Download PDF

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Publication number
WO1995018106A1
WO1995018106A1 PCT/JP1994/002287 JP9402287W WO9518106A1 WO 1995018106 A1 WO1995018106 A1 WO 1995018106A1 JP 9402287 W JP9402287 W JP 9402287W WO 9518106 A1 WO9518106 A1 WO 9518106A1
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group
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French (fr)
Japanese (ja)
Inventor
Masaharu Ishiguro
Tatsuyoshi Ishida
Ikuo Tomino
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Mitsui Petrochemical Industries Ltd
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Mitsui Petrochemical Industries Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62Oxygen or sulfur atoms
    • C07D213/63One oxygen atom
    • C07D213/64One oxygen atom attached in position 2 or 6
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62Oxygen or sulfur atoms
    • C07D213/69Two or more oxygen atoms

Definitions

  • the present invention provides a compound represented by the general formula (I):
  • X represents a halogen atom, a hydrogen atom or a lower alkoxy group
  • R 1 represents a hydrogen atom or a lower alkoxycarbonyl group
  • R 2 represents a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula:
  • R 3 is an alkyl group, a haloalkyl group, a lower alkoxy-substituted lower alkyl group, a lower alkoxycarbonyl group-substituted lower alkyl group, a carboxyl group-substituted lower alkyl group, a cycloalkyl group, a phenyl group (the phenyl group)
  • a pyridyl group, a furyl group, a phenyl group It represents an amino group or a di-lower alkylamino group.
  • the compounds of the present invention are useful as herbicides, and exhibit high herbicidal activity, particularly against various annual weeds in paddy fields or fields. Background art
  • Ar represents an optionally substituted aromatic or heteroaromatic compound (having one or more ⁇ , N and S), and R represents a hydrogen atom, an alkyl substitution force
  • R represents a hydrogen atom, an alkyl substitution force
  • hydroxylamine derivatives used as a growth factor for plants represented by the following are disclosed. And 3 ⁇ 4 to force, not described in detail for 4 one triflumizole Ruo b-piperidine lysine derivative of a specific structure of the present invention. Disclosure of the invention
  • the present inventors have synthesized a large number of various compounds for the purpose of developing a herbicide, and have conducted extensive screening tests. As a result, a novel 4-trifluoromethylpyridine derivative having a specific substituent has been obtained. Showed high herbicidal activity, and completed the present invention.
  • the present invention provides a compound represented by the general formula (I):
  • X represents a halogen atom, a hydrogen atom or a lower alkoxy group
  • R 1 represents a hydrogen atom or a lower alkoxycarbonyl group
  • R 2 represents a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula:
  • R 3 is an alkyl group, a haloalkyl group, a lower alkoxy-substituted lower alkyl group, a lower alkoxycarbonyl group-substituted lower alkyl group, a carboxyl group-substituted lower alkyl group, a cycloalkyl group, a phenyl group (the phenyl group)
  • the alkyl group may be substituted with 1 to 5 lower alkyl groups, halogen atoms, trifluoromethyl groups, nitro groups, cyano groups or lower alkoxy groups), pyridyl groups, furyl groups, chenyl groups, amino groups Or a di-lower alkylamino group).
  • -Trifluoromethylpyridine derivative represented by the formula:
  • the present invention relates to a method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:
  • the present invention relates to a process for producing a 4-trifluoromethylpyridine derivative represented by the following formula:
  • X represents a halogen atom, a hydrogen atom or a lower alkoxy group.
  • the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and among them, a chlorine atom is preferable.
  • the lower alkoxy group an alkoxy group having 1 to 4 carbon atoms, for example, methoxy group, ethoxy group, ⁇ -propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, sec-butoxy group or t-butoxy group Among them, a methoxy group is preferred.
  • X is preferably a halogen atom, particularly a chlorine atom.
  • R 1 represents a hydrogen atom or a lower alkoxycarbonyl group.
  • the lower alkoxycarbonyl group an alkoxycarbonyl group having 2 to 5 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, an n-propoxycarbonyl group, an isopropoxycarbonyl group, an n-butoxycarbonyl group, an isobutoxycarbonyl group, Examples thereof include a sec-butoxycarbonyl group and a t-butoxycarbonyl group.
  • R 2 is a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula:
  • examples of the lower alkanesulfonyl group include an alkanesulfonyl group having 1 to 4 carbon atoms, such as a methanesulfonyl group and an ethanesulfonyl group.
  • R 3 is an alkyl group, haloalkyl group, lower alkoxy C-substituted lower alkyl group, lower alkoxycarbonyl group-substituted lower alkyl group, methoxyl-substituted lower alkyl group, cycloalkyl group, phenyl group (the phenyl group is a lower alkylyl group, a halogen atom, a trifluoromethylyl group, a nitro group) , A cyano group or a lower alkoxy group which may be substituted by 1 to 5), a pyridyl group, a furyl group, a phenyl group, a phenyl group, an amino group or a di-lower alkylamino group.
  • Examples of the alkyl group represented by R 3 include an alkyl group having 1 to 10 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group.
  • Examples of the lower alkoxy-substituted lower alkyl group represented by R 3 include an alkyl group having 1 to 4 carbon atoms substituted with an alkoxy group having 1 to 4 carbon atoms, specifically, a methoxymethyl group and a 1-methoxyethyl group. , 2-methoxyl, 3-methoxypropyl, 4-methoxybutyl, 2-ethoxyl, isopropoxymethyl, 41-t-butoxybutyl and the like.
  • alkyl group having 1 to 4 carbon atoms which is substituted by an alkoxyl group having 2 to 5 carbon atoms, specifically, a methoxycarbonylmethyl group.
  • 2-methoxycarbonylethyl, 3-methoxycarbonylpropyl, 4-methoxycarbonylbutyl, 2-ethoxycarbonylethyl, isopropoxycarbonylmethyl, 4-t-butoxycarbonyl A butyl group and the like can be mentioned.
  • a carboxyl group-substituted alkyl group having 1 to 4 carbon atoms such as carboxymethyl group
  • Examples include a boxyshethyl group, a 3-carboxypropyl group, and a 4-carboxybutyl group.
  • the cycloalkyl group represented by R 3 can be exemplified a cycloalkyl group having 3 to 6 carbon atoms, specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, a key sill group cyclohexylene.
  • the lower alkyl group to be substituted includes an alkyl group having 1 to 4 carbon atoms, specifically the same as those described above, and the lower alkoxy group has 1 carbon atom.
  • the same alkoxy groups as described above in Examples 4 to 4 can be mentioned, and the halogen atom can be the same as described above.
  • Examples of the pyridyl group represented by R 3 include a 2-pyridyl group, a 3-pyridyl group and a 4-pyridyl group.
  • Examples of the furyl group include a 2-furyl group and a 3-furyl group.
  • Examples of the phenyl group include a 2-phenyl group and a 3-phenyl group.
  • di-lower alkylamino group examples include an amino group substituted with an alkyl group having 1 to 4 carbon atoms, such as a dimethylamino group, a getylamino group, a di-n-propylamino group, a diisopropylamino group, a di-n-butylamino group, Diisobutylamino group, di-sec-butylamino group, di-t-butylamino group and the like.
  • an amino group substituted with an alkyl group having 1 to 4 carbon atoms such as a dimethylamino group, a getylamino group, a di-n-propylamino group, a diisopropylamino group, a di-n-butylamino group, Diisobutylamino group, di-sec-butylamino group, di-t-butylamino group and the like.
  • preferred compounds include, for example, the compounds shown in Table 1.
  • the general formula (Ia) corresponds to the case where R 1 in the general formula (I) is a hydrogen atom and R 2 is —CO—R 3 .
  • the general formula (Ib) corresponds to the case where R 1 in the general formula (I) is a hydrogen atom.
  • H a1 represents a halogen atom, and includes a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
  • the compound (I) of the present invention can be synthesized by the following three methods.
  • the first method (hereinafter referred to as “method a” :) is represented by the general formula ( ⁇ ): CF
  • a base examples include sodium hydroxide, alkali metal hydroxides such as hydroxide hydroxide, alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide, and sodium hydride.
  • Metal hydrides such as hydrogen hydride and the like are preferred.
  • the amount of the base to be used is generally 0.5 to 5 mol, preferably 0.8 to 3 mol, particularly preferably 1 to 2 mol, per 1 mol of the compound represented by the formula (III).
  • reaction is carried out in the presence of hydrocarbons such as benzene and toluene, ethers such as methyl ether, tetrahydrofuran and dioxane, alcohols such as methanol, ethanol, isopropanol and t-butanol, or N, N-dimethylform.
  • hydrocarbons such as benzene and toluene
  • ethers such as methyl ether, tetrahydrofuran and dioxane
  • alcohols such as methanol, ethanol, isopropanol and t-butanol, or N, N-dimethylform.
  • the reaction temperature is usually from 20 ° C to 150 ° C, preferably from 0 ° C to 120 ° C, particularly preferably from 10 ° C to 100 ° C.
  • the compound represented by the formula (III) is usually used in an amount of 0.5 to 3 mol, preferably 0.7 to 2 mol, particularly preferably 0.1 to 2 mol per mol of the compound represented by the formula (II). Use 9 to 1.5 moles.
  • the compound (I) of the present invention can be produced by the second method (hereinafter, referred to as “method b”) in addition to the above method a.
  • This method b has the general formula (IV):
  • the base used is Amines such as gin, bicholine, lutidine, dimethylaminopyridine, trimethylamine and triethylamine; alkali metal carbonates such as carbon dioxide, sodium carbonate and sodium bicarbonate; sodium hydroxide; Alkali metal hydroxides such as potassium thiocyanate; alkaline earth metal hydroxides such as calcium hydroxide; alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide; Amines such as picoline and triethylamine are preferred.
  • Amines such as gin, bicholine, lutidine, dimethylaminopyridine, trimethylamine and triethylamine
  • alkali metal carbonates such as carbon dioxide, sodium carbonate and sodium bicarbonate
  • sodium hydroxide Alkali metal hydroxides such as potassium thiocyanate
  • alkaline earth metal hydroxides such as calcium hydroxide
  • alkali metal alkoxides such as sodium
  • the amount of the base to be used is generally 0.5 to 10 mol, preferably 0.8 to 8 mol, particularly preferably 1.0 to 6 mol, per 1 mol of the compound represented by the general formula (IV).
  • the reaction is carried out without solvent or in a solvent such as halogenated hydrocarbons such as dichloromethane, dichloroethane, and chloroform, hydrocarbons such as benzene and toluene, and ethers such as dimethyl ether, tetrahydrofuran, and dioxane. Is preferred.
  • the reaction temperature is usually from 150 ° C to 100 ° C, preferably from ⁇ 30 ° C to 80 ° C. C, particularly preferably 0 ° C to 60 ° C.
  • the compound represented by the formula (V) is usually 0.5 to 8 mol, preferably 1.0 to 6 mol, particularly preferably 1.0 to 1 mol of the compound represented by the formula (IV). Use 5-4 moles.
  • compound (I) of the present invention can also be produced by a third method (hereinafter, referred to as “method c”).
  • This method c has the general formula (VI):
  • a base For this reaction, it is preferable to use a base.
  • the base include alkali metal hydroxides such as hydroxydium hydroxide and potassium potassium hydroxide, and alkaline earth metal hydroxides such as calcium hydroxide.
  • Alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide, and alkali metal hydrides such as sodium hydride and potassium hydride are preferred.
  • the amount of base used is the general formula
  • the amount is generally 0.5 to 30 mol, preferably 1 to 15 mol, particularly preferably 3 to 10 mol, per 1 mol of the compound represented by (VI).
  • the reaction includes alcohols such as methanol, ethanol, isopropanol and t-butanol, water, halogenated hydrocarbons such as dichloromethane and dichloroethane, ethers such as dimethyl ether, tetrahydrofuran and dioxane, N, N-dimethylformamide, It is preferable to carry out the reaction in a solvent such as an aprotic polar solvent such as N, N-dimethylacetamide.
  • a solvent such as an aprotic polar solvent such as N, N-dimethylacetamide.
  • the reaction temperature is usually from 0 ° C to 150.
  • Z preferably from 10 ° C to 50 ° C, particularly preferably from 20 ° C to 40 ° C.
  • the compound of the present invention as a herbicide, the compound of the present invention alone, or a carrier, a surfactant, a dispersing agent, an auxiliary agent, and the like, and a wettable powder, an emulsion, a powder, a fine granule, or a granule in combination with the compound of the present invention And dilute it to an appropriate concentration before spraying or applying directly.
  • the compound of the present invention or a preparation containing the compound can be used as a surface treatment or admixed with soil, which can be directly sprayed and used on weeds.
  • the application rate is about 10 to 400 g / ha as a normally active ingredient amount that varies depending on the type of target weed, the type of target crop, and the mode of application.
  • Example 3 The same operation was performed in the same manner as in Example 3 except that methanesulfonyl chloride was replaced with acetyl, propionyl chloride, isobutyryl chloride, bivaloyl chloride, nonanoyl chloride, ethanesulfonyl chloride, or benzenesulfonyl chloride.
  • the results and physical properties data are shown in Table 3 (mp: ° C) o
  • a wettable powder was prepared by uniformly mixing and grinding 10% of the compound of the present invention, 3% of a sodium salt of a higher alcohol sulfate and 87% of kaolin.
  • Emulsion An emulsion was prepared by uniformly dissolving 20% of the compound of the present invention, 10% of polyoxyethylene alkylaryl ether, 30% of cyclohexanone and 40% of xylene.
  • Filter paper (2 sheets) was spread over a petri dish with a lid of 9 cm in diameter, and seeds of Nobie, Mehishiba, Aobu and Alfalpha were sown. 20 ml of a diluted aqueous solution of liquid fertilizer and a wettable powder of a test compound (prepared according to Example 7) were diluted with water at a rate of 1 OOg / lha as an active ingredient and sprayed. After 10 days at 30 ° C under light irradiation (3000 lux), the herbicidal effect was visually evaluated based on the criteria shown in Table 4.
  • a novel 4-trifluoromethylpyridine derivative is provided.
  • the 4-trifluoromethylpyridine derivative of the present invention is useful as a herbicide, and particularly exhibits a high herbicidal effect on various annual weeds in paddy fields or fields.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pyridine Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)

Abstract

A 4-trifluoromethylpyridine derivative represented by general formula (I) and useful as a herbicide wherein X represents halogen, hydrogen, hydrogen or lower alkoxy; R1 represents hydrogen or lower alkoxycarbonyl; and R2 represents lower alkanesulfonyl, benzenesulfonyl or -CO-R3, wherein R3 represents alkyl, haloalkyl, lower-alkoxy-substituted lower alkyl, lower-alkoxycarbonyl-substituted lower alkyl, carboxyl-substituted lower alkyl, cycloalkyl, phenyl (which may be substituted by one to five lower alkyl, halogen, trifluoromethyl, nitro, cyano or lower alkoxy groups), pyridyl, furyl, thienyl, amino or di(lower alkyl)amino.

Description

W 明 細 書  W Description

4一トリフルォロメチルピリジン誘導体及びその製造方法 技術分野  4. Trifluoromethylpyridine derivatives and their production

本発明は、 一般式 ( I )  The present invention provides a compound represented by the general formula (I):

Figure imgf000003_0001
Figure imgf000003_0001

[式中、 Xはハロゲン原子、 水素原子又は低級アルコキシ基を表し、 R 1 は水素 原子又は低級アルコキシカルボ二ル基を表し、 R 2 は低級アルカンスルホニル 基、 ベンゼンスルホニル基又は次式: [Wherein, X represents a halogen atom, a hydrogen atom or a lower alkoxy group, R 1 represents a hydrogen atom or a lower alkoxycarbonyl group, R 2 represents a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula:

- C 0 - R 3 -C 0-R 3

(式中、 R 3 はアルキル基、 ハロアルキル基、 低級アルコキシ基置換低級アルキ ル基、 低級アルコキシカルボニル基置換低級アルキル基、 カルボキシル基置換低 級アルキル基、 シクロアルキル基、 フヱニル基 (該フヱ二ル基は低級アルキル 基、 ハロゲン原子、 トリフルォロメチル基、 二卜口基、 シァノ基又は低級アルコ キシ基で 1〜 5個置換されていてもよい) 、 ピリジル基、 フリル基、 チェニル 基、 アミノ基又はジ低級アルキルアミノ基を表す。 ) で示される基を表す。 ] で 示される 4一トリフルォロメチルピリジン誘導体及びその製造方法に関する。 本発明の化合物は除草剤として有用であり、 特に水田又は畑地の種々の一年生 雑草に対して高い除草活性を示す。 背景技術 (Wherein, R 3 is an alkyl group, a haloalkyl group, a lower alkoxy-substituted lower alkyl group, a lower alkoxycarbonyl group-substituted lower alkyl group, a carboxyl group-substituted lower alkyl group, a cycloalkyl group, a phenyl group (the phenyl group) A lower alkyl group, a halogen atom, a trifluoromethyl group, a nitro group, a cyano group or a lower alkoxy group, which may be substituted by 1 to 5), a pyridyl group, a furyl group, a phenyl group, It represents an amino group or a di-lower alkylamino group. And a method for producing the same. The compounds of the present invention are useful as herbicides, and exhibit high herbicidal activity, particularly against various annual weeds in paddy fields or fields. Background art

近年、 数多くの除草剤が開発され、 農作業の省力化、 生産性の向上に寄与して きた。 し力 し、 これらの除草剤も実際の使用場面では除草効果、 安全性などの面 で必ずしも十分なものとは言い難く、 更に改良された除草剤の出現力 s望まれてい る。 Journal of Organic Chemistry, 39巻、 3956頁、 1973年には次式 ( N 0 2 ) n In recent years, a number of herbicides have been developed, contributing to labor saving in agricultural work and improvement in productivity. However, these herbicides are not necessarily sufficient in terms of herbicidal effect and safety in actual use, and the emergence of improved herbicides is desired. You. Journal of Organic Chemistry, 39, pp. 3956, the following formula in 1973 (N 0 2) n

〉ー 0 N H C〇〉 ー 0 N H C〇

Figure imgf000004_0001
で示される化合物力記載されている。 し力 し、 この化合物は除草活性を何ら有し ていないか、 有していてもわずかで除草剤としての有用性は認められない。 フランス公開特許第 2 5 4 1 2 8 2号には、 次式:
Figure imgf000004_0001
The compounds represented by are described. However, this compound has no or no herbicidal activity, and its usefulness as a herbicide is not recognized. French published patent no. 25 4 1 2 82 contains the following formula:

A r - 0 - N H - R  A r-0-N H-R

(式中、 A rは必要に応じ置換された芳香族あるいはヘテロ芳香族化合物 (〇, N , Sを 1個もしくはそれ以上有する) を表し、 Rは水素原子、 アルキル置換力 ルポニル基又は置換されていてもよい芳香族基置換カルボ二ル基を表す。 ) で示 される、 植物に対する成長因子として使用される種々のヒドロキシルァミン誘導 体が開示されている。 し力 ¾し、 本発明の特定の構造の 4一トリフルォロメチルピ リジン誘導体については具体的には記載されていない。 発明の開示 Wherein Ar represents an optionally substituted aromatic or heteroaromatic compound (having one or more 〇, N and S), and R represents a hydrogen atom, an alkyl substitution force Various hydroxylamine derivatives used as a growth factor for plants represented by the following are disclosed. And ¾ to force, not described in detail for 4 one triflumizole Ruo b-piperidine lysine derivative of a specific structure of the present invention. Disclosure of the invention

本発明者等は、 除草剤を開発することを目的として、 多種多様な化合物を多数 合成し、 鋭意スクリーニング試験を重ねた結果、 特定の置換基を持った新規 4 - 卜リフルォロメチルピリジン誘導体が高い除草活性を示すことを見出し、 本発明 を完成するに至った。  The present inventors have synthesized a large number of various compounds for the purpose of developing a herbicide, and have conducted extensive screening tests. As a result, a novel 4-trifluoromethylpyridine derivative having a specific substituent has been obtained. Showed high herbicidal activity, and completed the present invention.

本発明は、 一般式 ( I ) :  The present invention provides a compound represented by the general formula (I):

Figure imgf000004_0002
[式中、 Xはハロゲン原子、 水素原子又は低級アルコキシ基を表し、 R1 は水素 原子又は低級アルコキシカルボ二ル基を表し、 R2 は低級アルカンスルホニル 基、 ベンゼンスルホニル基又は次式:
Figure imgf000004_0002
[Wherein, X represents a halogen atom, a hydrogen atom or a lower alkoxy group, R 1 represents a hydrogen atom or a lower alkoxycarbonyl group, R 2 represents a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula:

一 CO - R3 One CO-R 3

(式中、 R3 はアルキル基、 ハロアルキル基、 低級アルコキシ基置換低級アルキ ル基、 低級アルコキシカルボニル基置換低級アルキル基、 カルボキシル基置換低 級アルキル基、 シクロアルキル基、 フヱニル基 (該フヱ二ル基は低級アルキル 基、 ハロゲン原子、 トリフルォロメチル基、 ニトロ基、 シァノ基又は低級アルコ キシ基で 1〜 5個置換されていてもよい) 、 ピリジル基、 フリル基、 チェニル 基、 アミノ基又はジ低級アルキルアミノ基を表す。 ) で示される基を表す。 ] で 示される 4—卜リフルォロメチルピリジン誘導体に関する。 (Wherein, R 3 is an alkyl group, a haloalkyl group, a lower alkoxy-substituted lower alkyl group, a lower alkoxycarbonyl group-substituted lower alkyl group, a carboxyl group-substituted lower alkyl group, a cycloalkyl group, a phenyl group (the phenyl group) The alkyl group may be substituted with 1 to 5 lower alkyl groups, halogen atoms, trifluoromethyl groups, nitro groups, cyano groups or lower alkoxy groups), pyridyl groups, furyl groups, chenyl groups, amino groups Or a di-lower alkylamino group). 4] -Trifluoromethylpyridine derivative represented by the formula:

また、 本発明は、 一般式 (II) :  Further, the present invention provides a compound represented by the following general formula (II):

Figure imgf000005_0001
Figure imgf000005_0001

(式中、 Xは前記と同じ意味を表し、 Ha 1はハロゲン原子を表す。 ) で示され る化合物と一般式(III) : (Wherein X has the same meaning as described above, and Ha 1 represents a halogen atom.) And a compound represented by the following general formula (III):

H0NHC0R3 (III) H0NHC0R 3 (III)

(式中、 R3 は前記と同じ意味を表す。 ) で示されるヒドロキサム酸類とを反応 させることを特徴とする一般式 (I- a) : (Wherein, R 3 has the same meaning as described above.) Wherein the compound is reacted with a hydroxamic acid represented by the following general formula (Ia):

Figure imgf000005_0002
(式中、 X及び R3 は前記と同じ意味を表す。 ) で示される 4一トリフルォロメ チルピリジン誘導体の製造方法に関するものである。
Figure imgf000005_0002
(Wherein, X and R 3 have the same meanings as described above.) The present invention relates to a method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:

また、 本発明は、 一般式 (IV) :  Further, the present invention provides a compound represented by the following general formula (IV):

Figure imgf000006_0001
Figure imgf000006_0001

(式中、 X及び R1 は前記と同じ意味を表す。 ) で示される化合物と一般式 (V) : (Wherein X and R 1 have the same meanings as described above) and a compound represented by the general formula (V):

Ha l - R2 (V) Ha l-R 2 (V)

(式中、 R2 及び Ha 1は前記と同じ意味を表す。 ) で示される酸ハライド類と を反応させることを特徴とする一般式 (I ) : (Wherein, R 2 and Ha 1 have the same meanings as described above.) A compound represented by the general formula (I):

Figure imgf000006_0002
Figure imgf000006_0002

(式中、 X、 R1 及び R2 は前記と同じ意味を表す。 ) で示される 4—トリフル ォロメチルピリジン誘導体の製造方法に関する。 (Wherein, X, R 1 and R 2 have the same meanings as described above.) A method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:

更に、 本発明は、 一般式 (VI) :  Further, the present invention provides a compound represented by the general formula (VI):

CF CF

Υ Υ

(V I ) (V I)

X' 、Ν. X ', Ν .

ひ 、R (式中、 X及び R 2 は前記と同じ意味を表し、 Yは低級アルコキシカルボニル基 を表す。 ) で示される化合物を加水分解することを特徴とする"^式 (I-b) : Hi, R (Wherein, X and R 2 have the same meanings as described above, and Y represents a lower alkoxycarbonyl group.) The compound represented by the formula (Ib):

( I一 b )(I-Ib)

Figure imgf000007_0001
Figure imgf000007_0001

(式中、 X及び R 2 は前記と同じ意味を表す。 ) で示される 4一トリフルォロメ チルピリジン誘導体の製造方法に関する。 (Wherein, X and R 2 have the same meanings as described above.) The present invention relates to a process for producing a 4-trifluoromethylpyridine derivative represented by the following formula:

前記一般式 (I ) で示される化合物について説明する。  The compound represented by the general formula (I) will be described.

前記一般式 (I ) 中、 Xはハロゲン原子、 水素原子又は低級アルコキシ基を表 す。 ここで、 ハロゲン原子としてはフッ素原子、 塩素原子、 臭素原子、 ヨウ素原 子が挙げられ、 中でも塩素原子が好ましい。 低級アルコキシ基としては炭素数 1 〜4のアルコキシ基、 例えばメ卜キシ基、 エトキシ基、 π -プロポキシ基、 イソプ 口ポキシ基、 n-ブトキシ基、 イソブトキシ基、 sec-ブトキシ基又は t-ブトキシ基 を挙げることができ、 中でもメ卜キシ基カ好ましい。 Xの中ではハロゲン原子、 特に塩素原子が好ましい。  In the above general formula (I), X represents a halogen atom, a hydrogen atom or a lower alkoxy group. Here, examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and among them, a chlorine atom is preferable. As the lower alkoxy group, an alkoxy group having 1 to 4 carbon atoms, for example, methoxy group, ethoxy group, π-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, sec-butoxy group or t-butoxy group Among them, a methoxy group is preferred. X is preferably a halogen atom, particularly a chlorine atom.

R 1 は水素原子又は低級アルコキシカルボ二ル基を表す。 低級アルコキシカル ボニル基としては炭素数 2 ~ 5のアルコキシカルボニル基、 例えばメ卜キシカル ボニル基、 エトキシカルボニル基、 n-プロポキシカルボニル基、 イソプロポキシ カルボニル基、 n-ブトキシカルボニル基、 イソブトキシカルボニル基、 sec-ブト キシカルボニル基又は t-ブ卜キシカルボ二ル基を挙げることができる。 R 1 represents a hydrogen atom or a lower alkoxycarbonyl group. As the lower alkoxycarbonyl group, an alkoxycarbonyl group having 2 to 5 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, an n-propoxycarbonyl group, an isopropoxycarbonyl group, an n-butoxycarbonyl group, an isobutoxycarbonyl group, Examples thereof include a sec-butoxycarbonyl group and a t-butoxycarbonyl group.

R 2 は低級アルカンスルホニル基、 ベンゼンスルホニル基又は次式: R 2 is a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula:

- C 0 - R 3 -C 0-R 3

で示される基を表す。 ここで、 低級アルカンスルホニル基としては炭素数 1〜4 アルカンスルホニル基、 例えばメタンスルホニル基、 エタンスルホニル基等を挙 げることができる。 Represents a group represented by Here, examples of the lower alkanesulfonyl group include an alkanesulfonyl group having 1 to 4 carbon atoms, such as a methanesulfonyl group and an ethanesulfonyl group.

基一 C O— R 3 において、 R 3 はアルキル基、 ハロアルキル基、 低級アルコキ シ基置換低級アルキル基、 低級アルコキシカルボニル基置換低級アルキル基、 力 ルポキシル基置換低級アルキル基、 シクロアルキル基、 フエニル基 (該フエニル 基は低級アルキリレ基、 ハロゲン原子、 トリフルォロメチリレ基、 ニトロ基、 シァノ 基又は低級アルコキシ基で 1〜5個置換されていてもよい) 、 ピリジル基、 フリ ル基、 チェニル基、 アミノ基又はジ低級アルキルアミノ基を表す。 Group 1 CO— In R 3 , R 3 is an alkyl group, haloalkyl group, lower alkoxy C-substituted lower alkyl group, lower alkoxycarbonyl group-substituted lower alkyl group, methoxyl-substituted lower alkyl group, cycloalkyl group, phenyl group (the phenyl group is a lower alkylyl group, a halogen atom, a trifluoromethylyl group, a nitro group) , A cyano group or a lower alkoxy group which may be substituted by 1 to 5), a pyridyl group, a furyl group, a phenyl group, a phenyl group, an amino group or a di-lower alkylamino group.

R 3 で表されるアルキル基としては炭素数 1〜1 0のアルキル基、 例えばメチ ル基、 ェチル基、 プロピル基、 イソプロピル基、 n-ブチル基、 イソブチル基、 sec-ブチル基、 t-ブチル基、 n-ペンチル基、 イソペンチル基、 t-ペンチル基、 ネ ォペンチル基、 n-へキシル基、 π-ヘプチル基、 π-ォクチル基、 n-ノニル基、 π -デ シル基などを挙げることができる。 Examples of the alkyl group represented by R 3 include an alkyl group having 1 to 10 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group. Group, n-pentyl group, isopentyl group, t-pentyl group, neopentyl group, n-hexyl group, π-heptyl group, π-octyl group, n-nonyl group, π-decyl group, etc. it can.

R 3 で表されるハロアルキル基としては、 前記の例示と同様のハロゲン原子で 1 ~ 5個置換された炭素数 1〜 2のアルキル基、 具体的にはフルォロメチル基、 クロロメチル基、 ジクロロメチル基、 トリフルォロメチル基、 1一フルォロェチ ル基、 1一クロ口ェチル基、 2—フルォロェチル基、 2—クロ口ェチル基、 トリ クロ口ェチル基、 卜リフルォロェチル基又はペン夕フルォロェチル基などを挙げ ることができる。 The haloalkyl group represented by R 3, the exemplary similar 1-5-substituted number 1-2 alkyl carbon with a halogen atom, specifically Furuoromechiru group, chloromethyl group, dichloromethyl group Trifluoromethyl group, 1-fluoroethyl group, 1-chloroethyl group, 2-fluoroethyl group, 2-chloroethyl group, trichloroethyl group, trifluoroethyl group, and pentafluoroethyl group. be able to.

R 3 で表される低級アルコキシ基置換低級アルキル基としては、 炭素数 1〜4 のアルコキシ基で置換された炭素数 1〜4のアルキル基、 具体的にはメ卜キシメ チル基、 1ーメトキシェチル基、 2—メ 卜キシェチル基、 3—メ トキシプロピル 基、 4ーメトキシブチル基、 2—エトキシェチル基、 イソプロポキシメチル基、 4一 t-ブ卜キシブチル基などを挙げることができる。 Examples of the lower alkoxy-substituted lower alkyl group represented by R 3 include an alkyl group having 1 to 4 carbon atoms substituted with an alkoxy group having 1 to 4 carbon atoms, specifically, a methoxymethyl group and a 1-methoxyethyl group. , 2-methoxyl, 3-methoxypropyl, 4-methoxybutyl, 2-ethoxyl, isopropoxymethyl, 41-t-butoxybutyl and the like.

R 3 で表される低級アルコキシカルボニル基置換低級アルキル基としては、 炭 素数 2〜 5のアルコキシ力ルポニル基で置換された炭素数 1〜 4のアルキル基、 具体的にはメ卜キシカルボニルメチル基、 2—メ 卜キシカルボニルェチル基、 3 ーメ卜キシカルボ二ルブロピル基、 4—メ卜キシカルボニルブチル基、 2—エト キシカルボニルェチル基、 イソプロポキシカルボニルメチル基、 4一 t-ブトキシ カルボニルブチル基などを挙げることができる。 As the lower alkoxycarbonyl group-substituted lower alkyl group represented by R 3, there can be mentioned an alkyl group having 1 to 4 carbon atoms, which is substituted by an alkoxyl group having 2 to 5 carbon atoms, specifically, a methoxycarbonylmethyl group. , 2-methoxycarbonylethyl, 3-methoxycarbonylpropyl, 4-methoxycarbonylbutyl, 2-ethoxycarbonylethyl, isopropoxycarbonylmethyl, 4-t-butoxycarbonyl A butyl group and the like can be mentioned.

R 3 で表されるカルボキシル基置換低級アルキル基としては、 カルボキシル基 で置換された炭素数 1〜4のアルキル基、 例えばカルボキシメチル基、 2—カル ボキシェチル基、 3一カルボキシブロピル基、 4一カルボキシブチル基等を挙げ ることができる。 As the carboxyl group-substituted lower alkyl group represented by R 3 , a carboxyl group-substituted alkyl group having 1 to 4 carbon atoms, such as carboxymethyl group, Examples include a boxyshethyl group, a 3-carboxypropyl group, and a 4-carboxybutyl group.

R 3 で表されるシクロアルキル基としては炭素数 3〜6のシクロアルキル基、 具体的にはシクロプロピル基、 シクロブチル基、 シクロペンチル基、 シクロへキ シル基を挙げることができる。 The cycloalkyl group represented by R 3 can be exemplified a cycloalkyl group having 3 to 6 carbon atoms, specifically, cyclopropyl group, cyclobutyl group, cyclopentyl group, a key sill group cyclohexylene.

R 3 で表されるフエニル基において、 置換する低級アルキル基としては炭素数 1〜4のアルキル基、 具体的には前記の例示と同様のものが挙げられ、 低級アル コキシ基としては炭素数 1〜 4の前記と同様のアルコキシ基を挙げることがで き、 ハロゲン原子としては前記と同様のものを挙げることができる。 In the phenyl group represented by R 3 , the lower alkyl group to be substituted includes an alkyl group having 1 to 4 carbon atoms, specifically the same as those described above, and the lower alkoxy group has 1 carbon atom. And the same alkoxy groups as described above in Examples 4 to 4 can be mentioned, and the halogen atom can be the same as described above.

R 3 で表されるピリジル基としては、 2—ピリジル基、 3—ピリジル基又は 4 一ピリジル基を挙げることができる。 フリル基としては、 2—フリル基又は 3— フリル基を挙げることができる。 チェニル基としては、 2—チェニル基又は 3— チェ二ル基を挙げることができる。 ジ低級アルキルアミノ基としては、 炭素数 1 〜 4のアルキル基で置換されたァミノ基、 例えばジメチルァミノ基、 ジェチルァ ミノ基、 ジ一 n—プロピルアミノ基、 ジイソプロピルアミノ基、 ジー n—ブチル アミノ基、 ジイソプチルァミノ基、 ジー s e c—プチルァミノ基、 ジー t—プチ ルァミノ基等を挙げることができる Examples of the pyridyl group represented by R 3 include a 2-pyridyl group, a 3-pyridyl group and a 4-pyridyl group. Examples of the furyl group include a 2-furyl group and a 3-furyl group. Examples of the phenyl group include a 2-phenyl group and a 3-phenyl group. Examples of the di-lower alkylamino group include an amino group substituted with an alkyl group having 1 to 4 carbon atoms, such as a dimethylamino group, a getylamino group, a di-n-propylamino group, a diisopropylamino group, a di-n-butylamino group, Diisobutylamino group, di-sec-butylamino group, di-t-butylamino group and the like.

—般式 (I ) で示される化合物のうち、 好ましい化合物としては、 例えば表 1 に示す化合物が挙げられる。 Among the compounds represented by formula (I), preferred compounds include, for example, the compounds shown in Table 1.

Figure imgf000010_0001
Figure imgf000010_0001

ニル Nil

Figure imgf000010_0002
Figure imgf000010_0002

表 1 (航さ. Table 1.

Figure imgf000011_0001
Figure imgf000011_0001

—般式(I-a) は、 一般式 (I ) の R1 が水素原子であり、 R2 が— CO— R3 である場合に相当する。 —The general formula (Ia) corresponds to the case where R 1 in the general formula (I) is a hydrogen atom and R 2 is —CO—R 3 .

一般式 (I-b) は、 一般式 (I ) の R1 が水素原子である場合に相当する。The general formula (Ib) corresponds to the case where R 1 in the general formula (I) is a hydrogen atom.

—般式 (II) の Xは、 前記と同様である。 H a 1はハロゲン原子を表し、 フッ 素原子、 塩素原子、 臭素原子、 ヨウ素原子が挙げられる。 —X in the general formula (II) is the same as described above. H a1 represents a halogen atom, and includes a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

—般式(III) の 、 一般式 (IV) の X及び R1 、 一般式 (V) の 、 一般 式 (VI) の X及び R2 は、 前記と同様である。 一般式 (VI) の Yで表される低級 アルコキシカルボニル基としては、 R' で例示したものと同様のものが挙げられ る。 —X and R 1 in the general formula (III), general formula (IV), and X and R 2 in the general formula (VI) in the general formula (V) are the same as described above. As the lower alkoxycarbonyl group represented by Y in the general formula (VI), the same as those exemplified for R ′ can be mentioned.

本発明の化合物 (I ) は、 以下の 3種類の方法で合成すること力可能である。 第 1の方法 (以下 「方法 a」 という。 :) は、 一般式 (Π) : C F The compound (I) of the present invention can be synthesized by the following three methods. The first method (hereinafter referred to as “method a” :) is represented by the general formula (Π): CF

( I I ) (I I)

H a 1  H a 1

(式中、 Xは前記と同じ意味を表し、 Ha lはハロゲン原子を表す。 ) で示され る化合物と一般式 (III) : (Wherein X represents the same meaning as described above, and Ha represents a halogen atom.) And a compound represented by the general formula (III):

HONHCO R3 (III) HONHCO R 3 (III)

(式中、 R3 は前記と同じ意味を表す。 ) で示されるヒドロキサム酸類とを反応 させることによって一般式(I-a) : (Wherein R 3 has the same meaning as described above.) By reacting with a hydroxamic acid represented by the following formula (Ia):

Figure imgf000012_0001
Figure imgf000012_0001

(式中、 X及び R3 は前記と同じ意味を表す。 ) で示される 4—トリフルォロメ チルピリジン誘導体を製造する方法である。 (Wherein, X and R 3 have the same meanings as described above.) A method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:

この反応では、 塩基を使用することが好ましい。 使用する塩基としては、 水酸 化ナトリウム、 水酸化力リゥムなどのアル力リ金属水酸化物、 ナトリウムメ卜キ シド、 ナトリウムェ卜キシド、 カリウム t-ブトキシドなどのアルカリ金属アルコ キシド、 水素化ナトリウム、 水素化力リゥムなどのアル力リ金属水素化物などが 好ましい。 塩基の使用量は一般式(III) で示される化合物 1モルに対し、 通常 0. 5〜5モル、 好ましくは 0. 8〜3モル、 特に好ましくは 1〜2モルであ る。  In this reaction, it is preferable to use a base. Examples of the base to be used include sodium hydroxide, alkali metal hydroxides such as hydroxide hydroxide, alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide, and sodium hydride. Metal hydrides such as hydrogen hydride and the like are preferred. The amount of the base to be used is generally 0.5 to 5 mol, preferably 0.8 to 3 mol, particularly preferably 1 to 2 mol, per 1 mol of the compound represented by the formula (III).

反応は、 ベンゼン、 トルエンなどの炭化水素、 ジェチルェ一テル、 テ卜ラヒド 口フラン、 ジォキサンなどのエーテル類、 メタノール、 エタノール、 イソブロパ ノール、 t-ブ夕ノールなどのアルコール類又は N, N—ジメチルホルムアミ ド  The reaction is carried out in the presence of hydrocarbons such as benzene and toluene, ethers such as methyl ether, tetrahydrofuran and dioxane, alcohols such as methanol, ethanol, isopropanol and t-butanol, or N, N-dimethylform. Amid

1 〇 (DMF) 、 ジメチルスルホキシド、 ジメチルァセ卜アミド、 テ卜ラメチル尿素 などの非プロ卜ン性極性溶媒中で実施するの力好ましい。 1 〇 (DMF), dimethylsulfoxide, dimethylacetamide, tetramethylurea, and the like, it is preferable to carry out in a nonprotonic polar solvent.

反応温度は、 通常一 20°C〜150°C、 好ましくは 0°C〜120°C、 特に好ま しくは 10°C〜100°Cである。 また、 本反応は式 (II) で示される化合物 1モ ルに対し、 式(III) で示される化合物を通常 0. 5ないし 3モル、 好ましくは 0. 7ないし 2モル、 特に好ましくは 0. 9ないし 1. 5モル使用する。  The reaction temperature is usually from 20 ° C to 150 ° C, preferably from 0 ° C to 120 ° C, particularly preferably from 10 ° C to 100 ° C. In this reaction, the compound represented by the formula (III) is usually used in an amount of 0.5 to 3 mol, preferably 0.7 to 2 mol, particularly preferably 0.1 to 2 mol per mol of the compound represented by the formula (II). Use 9 to 1.5 moles.

また、 本発明の化合物 (I) は、 前記の方法 aのほか、 第 2の方法 (以下 「方 法 b」 という。 ) によっても製造することができる。  In addition, the compound (I) of the present invention can be produced by the second method (hereinafter, referred to as “method b”) in addition to the above method a.

この方法 bは一般式 (IV) :  This method b has the general formula (IV):

Figure imgf000013_0001
Figure imgf000013_0001

(式中、 X及び R1 は前記と同じ意味を表す。 】 で示される化合物と.一般式 (V) : (Wherein X and R 1 have the same meanings as described above.) And a compound represented by the general formula (V):

Ha 1 -R2 (V) Ha 1 -R 2 (V)

(式中、 R2 及び Ha 1は前記と同じ意味を表す。 で示される酸ハライ ド類と を反応させることによって一般式 ( I ) : (Wherein, R 2 and Ha 1 have the same meaning as described above. By reacting with an acid halide represented by the general formula (I):

Figure imgf000013_0002
Figure imgf000013_0002

(式中、 X、 R1 及び R2 は前記と同じ意味を表す。 ) で示される 4一トリフル ォロメチルピリジン誘導体を製造する方法である。 (Wherein, X, R 1 and R 2 have the same meanings as described above.) A method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:

この反応では、 塩基を使用すること力 s好ましい。 使用する塩基としては、 ピリ ジン、 ビコリン、 ルチジン、 ジメチルァミノピリジン、 卜リメチルァミン、 トリ ェチルァミンなどのアミン類、 炭酸力リゥム、 炭酸ナ卜リゥム、 炭酸水素ナ卜リ ゥムなどのアルカリ金属炭酸塩、 水酸化ナトリウム、 水酸ィヒカリウムなどのアル カリ金属水酸化物、 水酸化カルシウム等のアルカリ土類金属水酸化物、 ナ卜リウ ムメトキシド、 ナトリウムェ卜キシド、 カリウム t-ブトキシドなどのアルカリ金 属アルコキシドなど力好ましく、 特にピリジン、 ピコリン、 卜リエチルァミンな どのアミン類が好ましい。 In this reaction, the use of a base is preferred. The base used is Amines such as gin, bicholine, lutidine, dimethylaminopyridine, trimethylamine and triethylamine; alkali metal carbonates such as carbon dioxide, sodium carbonate and sodium bicarbonate; sodium hydroxide; Alkali metal hydroxides such as potassium thiocyanate; alkaline earth metal hydroxides such as calcium hydroxide; alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide; Amines such as picoline and triethylamine are preferred.

塩基の使用量は一般式 (IV) で示される化合物 1モルに対し、 通常 0 . 5〜 1 0モル、 好ましくは 0 . 8〜8モル、 特に好ましくは 1 . 0 ~ 6モルである。 反応は、 無溶媒又はジクロロメタン、 ジクロロェタン、 クロ口ホルムなどのハ ロゲン化炭化水素、 ベンゼン、 トルエンなどの炭化水素、 ジェチルエーテル、 テ トラヒドロフラン、 ジォキサンなどのエーテル類などの溶媒中で実施するのが好 ましい。  The amount of the base to be used is generally 0.5 to 10 mol, preferably 0.8 to 8 mol, particularly preferably 1.0 to 6 mol, per 1 mol of the compound represented by the general formula (IV). The reaction is carried out without solvent or in a solvent such as halogenated hydrocarbons such as dichloromethane, dichloroethane, and chloroform, hydrocarbons such as benzene and toluene, and ethers such as dimethyl ether, tetrahydrofuran, and dioxane. Is preferred.

反応温度は、 通常一 5 0 °C〜1 0 0 °C、 好ましくは— 3 0 °C〜8 0。C、 特に好 ましくは 0 °C〜6 0 °Cである。 また、 本反応は式 (IV) で示される化合物 1モ ルに対し、 式 (V ) で示される化合物を通常 0 . 5ないし 8モル、 好ましくは 1 . 0ないし 6モル、 特に好ましくは 1 . 5ないし 4モル使用する。  The reaction temperature is usually from 150 ° C to 100 ° C, preferably from −30 ° C to 80 ° C. C, particularly preferably 0 ° C to 60 ° C. In this reaction, the compound represented by the formula (V) is usually 0.5 to 8 mol, preferably 1.0 to 6 mol, particularly preferably 1.0 to 1 mol of the compound represented by the formula (IV). Use 5-4 moles.

更に、 本発明の化合物 ( I ) は、 第 3の方法 (以下 「方法 c」 という。 ) に よっても製造することができる。 この方法 cは一般式 (VI) :  Furthermore, compound (I) of the present invention can also be produced by a third method (hereinafter, referred to as “method c”). This method c has the general formula (VI):

Figure imgf000014_0001
Figure imgf000014_0001

(式中、 X及び R 2 は前記と同じ意味を表し、 Yは低級アルコキシカルボニル基 を表す。 ) で示される化合物を加水分解することによって、 一般式(I- b) : ( I一 b )(Wherein, X and R 2 have the same meanings as described above, and Y represents a lower alkoxycarbonyl group.) By hydrolyzing the compound represented by the formula (I-b): (I-Ib)

Figure imgf000015_0001
Figure imgf000015_0001

(式中、 X及び R 2 は前記と同じ意味を表す。 ) で示される 4一トリフルォロメ チルピリジン誘導体を製造する方法である。 (Wherein, X and R 2 have the same meanings as described above.) A method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:

この反応には、 塩基を使用すること力好ましく、 塩基としては、 水酸ィヒナ卜リ ゥム、 水酸ィヒカリウムなどのアルカリ金属水酸化物、 水酸化カルシウム等のアル カリ土類金属水酸化物、 ナトリウムメトキシド、 ナトリウムェ卜キシド、 力リウ ム t-ブ卜キシドなどのアルカリ金属アルコキシド、 水素化ナトリウム、 水素化 力リウムなどのアル力リ金属水素化物などが好ましい。 塩基の使用量は一般式 For this reaction, it is preferable to use a base. Examples of the base include alkali metal hydroxides such as hydroxydium hydroxide and potassium potassium hydroxide, and alkaline earth metal hydroxides such as calcium hydroxide. Alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide, and alkali metal hydrides such as sodium hydride and potassium hydride are preferred. The amount of base used is the general formula

(VI) で示される化合物 1モルに対し、 通常 0 . 5〜3 0モル、 好ましくは 1〜 1 5モル、 特に好ましくは 3〜1 0モルである。 The amount is generally 0.5 to 30 mol, preferably 1 to 15 mol, particularly preferably 3 to 10 mol, per 1 mol of the compound represented by (VI).

反応は、 メタノール、 エタノール、 イソプロパノール、 t-ブタノールなどのァ ルコール類、 水、 ジクロロメタン、 ジクロロェタン等のハロゲンィヒ炭化水素、 ジ ェチルエーテル、 テ卜ラヒドロフラン、 ジォキサン等のエーテル類、 N, N—ジ メチルホルムアミド、 N , N -ジメチルァセ卜アミド等の非プロトン性極性溶媒 等の溶媒中で実施するのが好ましい。  The reaction includes alcohols such as methanol, ethanol, isopropanol and t-butanol, water, halogenated hydrocarbons such as dichloromethane and dichloroethane, ethers such as dimethyl ether, tetrahydrofuran and dioxane, N, N-dimethylformamide, It is preferable to carry out the reaction in a solvent such as an aprotic polar solvent such as N, N-dimethylacetamide.

反応温度は、 通常 0 °C~ 1 5 0。Z、 好ましくは 1 0 °C〜 5 0 、 特に好ましく は 2 0 °C〜4 0 °Cである。  The reaction temperature is usually from 0 ° C to 150. Z, preferably from 10 ° C to 50 ° C, particularly preferably from 20 ° C to 40 ° C.

本発明の化合物を除草剤として用いるには、 本発明の化合物のみ、 又はこれに 担体、 界面活性剤、 分散剤、 補助剤などを配合して水和剤、 乳剤、 粉剤、 微粒剤 又は粒剤に製剤し、 適当な濃度に希釈して散布するか又は直接施用する。  To use the compound of the present invention as a herbicide, the compound of the present invention alone, or a carrier, a surfactant, a dispersing agent, an auxiliary agent, and the like, and a wettable powder, an emulsion, a powder, a fine granule, or a granule in combination with the compound of the present invention And dilute it to an appropriate concentration before spraying or applying directly.

本発明の化合物又は該化合物を含む製剤は、 雑草に対し直接散布して用いるこ とができるほ力 土壌に表面処理又は土壌中に混和して用いることができる。 施用量は、 対象雑草の種類や対象作物の種類、 施用態様によって異なる力 通 常有効成分量として、 約 1 0ないし 4 0 0 0 g/haである。 発明を実施するための最良の形態 The compound of the present invention or a preparation containing the compound can be used as a surface treatment or admixed with soil, which can be directly sprayed and used on weeds. The application rate is about 10 to 400 g / ha as a normally active ingredient amount that varies depending on the type of target weed, the type of target crop, and the mode of application. BEST MODE FOR CARRYING OUT THE INVENTION

以下、 実施例及び試験例により本発明を更に具体的に説明するが、 本発明の範 囲はこれらに限定されるものではない。  Hereinafter, the present invention will be described more specifically with reference to Examples and Test Examples, but the scope of the present invention is not limited thereto.

(実施例 1 )  (Example 1)

N— (6—クロロー 4一トリフルォロメチルー 2—ピリジルォキシ) ァセ卜ァ ミド (化合物番号 1 ) の合成  Synthesis of N- (6-chloro-4-1-trifluoromethyl-2-pyridyloxy) acetamide (Compound No. 1)

温度計、 滴下口一卜を備えた 10 Omlフラスコの中に、 2, 6—ジクロロ— 4 一トリフルォロメチルピリジン 4. 32 g (20隱 ol) 、 ァセ卜ヒドロキサム酸 1. 5 g (2 Ommol) 及びエタノール 7 Otnlを加え、 20。Cで撹拌しながら 85 %水酸化カリウム 2. 64 g (20隱 ol) のエタノール溶液 3 Omlを 25分間か けて滴下した。 滴下終了後、 更に 20°Cで 1時間した後、 酢酸 3. 6 gを加え、 反応混合物中のエタノールの大部分を減圧下で留去した。 得られた残渣の中に、 水 200mlを加え、 酢酸ェチル 20 Omlで 2回抽出を行った。 酢酸ェチル抽出液 を飽和食塩水で洗浄し、 無水硫酸マグネシウムで乾燥後、 酢酸ェチルを減圧留去 した。 得られた残渣をトルエン—へキサンから再結晶すると、 目的物が 2. 79 g得られた (収率 55%) 。  In a 10 Oml flask equipped with a thermometer and a dropper, 4.32 g of 2,6-dichloro-4-trifluoromethylpyridine (20 liters) and 1.5 g of acetate hydroxamic acid (20 liters) 2 Ommol) and 7 Otnl of ethanol. While stirring with C, 3 Oml of an ethanol solution of 2.64 g (20 conceivable) of 85% potassium hydroxide was added dropwise over 25 minutes. After the addition was completed, the mixture was further kept at 20 ° C. for 1 hour. Then, 3.6 g of acetic acid was added, and most of the ethanol in the reaction mixture was distilled off under reduced pressure. 200 ml of water was added to the obtained residue, and extraction was performed twice with 20 ml of ethyl acetate. The ethyl acetate extract was washed with saturated saline, dried over anhydrous magnesium sulfate, and then ethyl acetate was distilled off under reduced pressure. The obtained residue was recrystallized from toluene-hexane to give 2.79 g of the desired product (yield 55%).

融点: 122〜 123 °C  Melting point: 122-123 ° C

MS (フィールドデソーブシヨン (FD) 法) : 254 (M+ )  MS (Field Desorption (FD) method): 254 (M +)

I R (KB r錠剤、 cm-リ :  I R (KB r tablets, cm-ri:

3190, 1665, 1575, 1393, 1335, 1201 ,  3190, 1665, 1575, 1393, 1335, 1201,

1 138, 1078, 860, 703  1 138, 1078, 860, 703

Ή-NMR (CDC 13 , ppm ) :  Ή-NMR (CDC 13, ppm):

2. 16 (3 H, s) , 7. 12 ( 1 H, s) , 7. 27 ( 1 H, s) , 9. 8 ( 1 Η, broad s )  2.16 (3 H, s), 7.12 (1 H, s), 7.27 (1 H, s), 9.8 (1Η, broad s)

(実施例 2)  (Example 2)

実施例 1の方法 (明細書本文中、 方法 aに対応) に従って、 表 2に示す化合物 を合成した。 9 T The compounds shown in Table 2 were synthesized according to the method of Example 1 (corresponding to method a in the text of the specification). 9 T

Figure imgf000017_0001
Figure imgf000017_0001

ζ  ζ

LSZZ0IP6d£fIDd 90I8I/S6 OAS. 表 2 (続き) LSZZ0IP6d £ fIDd 90I8I / S6 OAS. Table 2 (continued)

Figure imgf000018_0001
Figure imgf000018_0001

(実施例 3 )  (Example 3)

N- (6—クロロー 4一トリフルォロメチルー 2—ピリ.ジルォキシ) — N—ェ トキシカルボ二ルーメタンスルホンアミド (化合物番号 33) の合成  Synthesis of N- (6-chloro-4-1-trifluoromethyl-2-pyri.ziloxy) -N-ethoxycarbonemethanesulfonamide (Compound No. 33)

N- (6—クロロー 4一トリフルォロメチルー 2—ピリ ルォキシ) 力ルバ ミン酸ェチル 1. 43 g (5mmo 1 ) 、 卜リエチルァミン 3. 03 g (30 mmo 1 ) 及びテトラヒドロフラン 20m lを 100 m lナスフラスコ中に一括 に仕込み、 窒素下、 室温にて 5分攪拌後、 メタンスルホニルクロリ ド 1. 73 g ( 1 5 mmo 1 ) のテトラヒドロフラン ( 1 0m l ) 溶液を 3分かけて滴下し た。 更に 10分反応させた後、 酢酸ェチル 30ml、 水 30mlを加え抽出し、 酢酸ェチル層は水 30mlで洗浄後、 無水硫酸ナトリウムで乾燥させ、 濃縮後、 へキサン 20mlを用いてリンスし、 濾過、 真空乾燥させることにより N— (6 一クロロー 4一トリフルォロメチルー 2—ピリジルォキシ) 一 N—ェ卜キシカル ボニルーメタンスルホンアミド 1. 74 g (収率 96%) を淡黄色結晶として得 た。 1.43 g (5 mmo 1) of N- (6-chloro-4-1-trifluoromethyl-2-pyrroloxy) ethyl rubinate, 3.03 g (30 mmo 1) of triethylamine and 20 ml of tetrahydrofuran in 100 ml eggplant The batch was charged into a flask, stirred at room temperature under nitrogen for 5 minutes, and then a solution of 1.73 g (15 mmo 1) of methanesulfonyl chloride in tetrahydrofuran (10 ml) was added dropwise over 3 minutes. Was. After further reacting for 10 minutes, 30 ml of ethyl acetate and 30 ml of water were added and extracted.The ethyl acetate layer was washed with 30 ml of water, dried over anhydrous sodium sulfate, concentrated, rinsed with 20 ml of hexane, filtered, By vacuum drying, 1.74 g (96% yield) of N- (6-chloro-4-1-trifluoromethyl-2-pyridyloxy) -1-N-ethoxycarbonyl-methanesulfonamide was obtained as pale yellow crystals.

融点: 1 12〜 1 14。C  Melting point: 112-114. C

Ή-NMR (CDC 13 , ppm ) :  Ή-NMR (CDC 13, ppm):

1. 33 (3H, t, J = 7Hz) 3. 57 (3 H, s  1.33 (3H, t, J = 7Hz) 3.57 (3H, s

4. 39 (2H, q, J = 7Hz) 7. 22 ( 1 H, s  4.39 (2H, q, J = 7Hz) 7.22 (1H, s

7. 39 (1 H, s)  7.39 (1 H, s)

(実施例 4)  (Example 4)

実施例 3のメタンスルホニルクロリ ドを塩化ァセチル、 塩化プロピオニル、 塩 化イソブチリル、 塩化ビバロイル、 塩化ノナノィル、 エタンスルホニルクロリ ド、 又はベンゼンスルホニルクロリ ドに代えて同様に実施した。 結果及び物性 データを表 3に示した (mp: °C) o The same operation was performed in the same manner as in Example 3 except that methanesulfonyl chloride was replaced with acetyl, propionyl chloride, isobutyryl chloride, bivaloyl chloride, nonanoyl chloride, ethanesulfonyl chloride, or benzenesulfonyl chloride. The results and physical properties data are shown in Table 3 (mp: ° C) o

表 3 Table 3

Figure imgf000020_0001
Figure imgf000020_0001

(実施例 5 )  (Example 5)

N— (6—クロ 4一トリフルォロメチルー 2—ピリジルォキシ) メタンス ルホンアミド (化合物番号 15) の合成  Synthesis of N— (6-chloro 4-trifluoromethyl-2-pyridyloxy) methanesulfonamide (Compound No. 15)

実施例 3で合成した N— (6—クロ口— 4一卜リフルォロメチルー 2—ピリジ ルォキシ) 一 N—エトキシカルボ二ルーメタンスルホンアミ ド 1. 08 g (3 mmo 1 ) をメタノール 10 m 1に溶解させた後、 20 %水酸化力リゥム水溶液 10mlを室温で加え、 30分攪拌後濃縮し、 酢酸ェチル 50ml、 水 5 Oml で抽出後、 酢酸ェチル層を水 50 m 1で洗浄し、 無水硫酸ナトリゥムで乾燥 ίき濃 縮し、 濃縮物をへキサン 1 Om 1でリンスし、 真空乾燥させることにより N— (6—クロロー 4一卜リフルォロメチル一 2—ピリジルォキシ) メタンスルホン アミド 0. 75 gを淡黄色結晶として得た (収率 86%) 。 1.08 g (3 mmo 1) of N— (6—black mouth—4—trifluoromethyl-2-pyridyloxy) —N—ethoxycarbonylmethanesulfonamide synthesized in Example 3 was converted to methanol 10 m After dissolving in water, add 10 ml of a 20% aqueous hydroxide solution at room temperature, stir for 30 minutes, concentrate, extract with 50 ml of ethyl acetate and 5 Oml of water, and wash the ethyl acetate layer with 50 ml of water. Concentrate by drying over anhydrous sodium sulfate. Rinse the concentrate with 1 Om 1 of hexane and vacuum dry to obtain N- (6-chloro-4-trifluoromethyl-12-pyridyloxy) methanesulfone. 0.75 g of the amide was obtained as pale yellow crystals (86% yield).

融点: 109~1 10°C  Melting point: 109 ~ 1 10 ° C

Ή-NMR (CDC 13 , ppm ) :  Ή-NMR (CDC 13, ppm):

2. 92 (3H, s) , 7. 14 ( 1 H, s) , 7. 63 ( 1 H, s) (実施例 6 )  2.92 (3H, s), 7.14 (1H, s), 7.63 (1H, s) (Example 6)

N- (6—クロロー 4一トリフルォロメチル一 2—ピリジルォキシ) エタンス ルホンアミド (化合物番号 16 ) 及び N— (6—クロロー 4一トリフルォロメチ ル—2—ピリジルォキシ) ベンゼンスルホンアミド (化合物番号 17) の合成 実施例 5の N— (6—クロロー 4—卜リフルォロメチルー 2—ピリジルォキ シ) 一 N—エトキシカルボ二ルーメタンスルホンアミドを N— (6—クロロー 4 一トリフルォロメチルー 2—ピリジルォキシ) —N—ェ卜キシカルボ二ルーエタ ンスルホンアミド及び N— (6—クロロー 4—卜リフルォロメチルー 2—ピリジ ルォキシ) 一 N—ェ卜キシカルボ二ルーベンゼンスルホンアミドに代えて同様に 実施した。 その結果、 収率 41 % (化合物番号 16、 融点: 60〜61°C) 、 67% (化合物番号 17、 融点: 57〜58°C、 潮解性) でそれぞれ目的物が淡 黄色結晶として得られた。 また、 各々の化合物の 'Η— NMRスペクトルのデー 夕を以下に示した。 .  Synthesis of N- (6-chloro-4-1-trifluoromethyl-12-pyridyloxy) ethanesulfonamide (Compound No. 16) and N- (6-chloro-4-1-trifluoromethyl-2-pyridyloxy) benzenesulfonamide (Compound No. 17) N- (6-chloro-4-trifluoromethyl-2-pyridyloxy) -N-ethoxycarbonyl-2-methanesulfonamide of Example 5 was converted to N- (6-chloro-4-trifluoromethyl-2-pyridyloxy)- The same procedure was carried out in place of N-ethoxycarbonyl-2-ethanesulfonamide and N- (6-chloro-4-trifluoromethyl-2-pyridyloxy) -1-N-ethoxycarbonyl-2-benzenesulfonamide. As a result, the desired product was obtained as pale yellow crystals in 41% yield (compound No. 16, melting point: 60-61 ° C) and 67% (compound No. 17, melting point: 57-58 ° C, deliquescent). Was. The data of 'Η-NMR spectrum of each compound are shown below. .

化合物番号 16 (CDC 13 , ppm ) : Compound No. 16 (CDC 1 3, ppm) :

1. 31 (3 H, t , J = 7 H z) , 4. 29 (2 H, q, J = 7Hz) , 7. 21 ( 1 H, s) , 7. 30 ( 1 H, s) ,  1.31 (3H, t, J = 7Hz), 4.29 (2H, q, J = 7Hz), 7.21 (1H, s), 7.30 (1H, s),

7. 5〜7. 9 ( 1 H, b r)  7.5 to 7.9 (1H, br)

化合物番号 17 (CDC 13 , ppm ) :  Compound No. 17 (CDC 13, ppm):

5. 0— 6. 0 ( 1 H, b r ) , 6. 69 ( 1 H, s) ,  5.0—6.0 (1H, br), 6.69 (1H, s),

6. 77 ( 1 H, s) , 6. 8〜7. 4 (3 H, m) ,  6.77 (1H, s), 6.8 to 7.4 (3H, m),

7. 74 (2 H, d, J = 8Hz)  7.74 (2 H, d, J = 8 Hz)

(実施例 7) 水和剤 ·  (Example 7) Wetting agent

本発明の化合物 10%、 高級アルコール硫酸エステルのナ卜リゥム塩 3%及び カオリン 87 %を均一に混合粉砕して水和剤とした。  A wettable powder was prepared by uniformly mixing and grinding 10% of the compound of the present invention, 3% of a sodium salt of a higher alcohol sulfate and 87% of kaolin.

(実施例 8) 乳 剤 本発明の化合物 20%、 ポリォキシエチレンアルキルァリールエーテル 10 %、 シクロへキサノン 30 %及びキシレン 40 %を均一に溶解して乳剤とした。 (Example 8) Emulsion An emulsion was prepared by uniformly dissolving 20% of the compound of the present invention, 10% of polyoxyethylene alkylaryl ether, 30% of cyclohexanone and 40% of xylene.

(実施例 9 ) 粒 剤  (Example 9) Granules

本発明のィヒ合物 5 %、 ベン卜ナイ 卜 40%、 クレー 50%及びリグニンスルホ ン酸ナ卜リゥム 5%を均一に混合粉砕し水を加えて練り合わせた後、 造粒乾燥し て粒剤とした。  5% of the inventive compound of the present invention, 40% of bentonite, 50% of clay and 5% of sodium ligninsulfonate are uniformly mixed and pulverized, kneaded by adding water, granulated and dried by granulation. Agent.

(実施例 10 ) 粉 剤  (Example 10) Powder

本発明の化合物 3 %及びクレー 97 %を均一に混合粉砕して粉剤とした。 次に、 本発明の化合物の除草効果を試験例を挙げて説明する。  3% of the compound of the present invention and 97% of clay were uniformly mixed and pulverized to obtain a powder. Next, the herbicidal effect of the compound of the present invention will be described with reference to test examples.

(試験例)  (Test example)

直径 9cmのフタ付きシャーレに濾紙 (2枚) を敷き、 ノビエ、 メヒシバ、 ァォ ビュ、 アルフアルファの種子を播種した。 これに液肥希釈水溶液 20 ml及び試験 化合物の水和剤 (実施例 7に従って調製) を有効成分量として 1 O OOg/lhaの 割合に水で希釈して散布した。 光照射 (3000ルクス) 下、 30°Cに 10日間 置いた後、 除草効果を表 4に示す基準で目視評価した。  Filter paper (2 sheets) was spread over a petri dish with a lid of 9 cm in diameter, and seeds of Nobie, Mehishiba, Aobu and Alfalpha were sown. 20 ml of a diluted aqueous solution of liquid fertilizer and a wettable powder of a test compound (prepared according to Example 7) were diluted with water at a rate of 1 OOg / lha as an active ingredient and sprayed. After 10 days at 30 ° C under light irradiation (3000 lux), the herbicidal effect was visually evaluated based on the criteria shown in Table 4.

表 4 指 数 除 草 効 果  Table 4 Index Weeding effect

5 完全枯死 5 Complete withering

4. 5 9〇%以上 99%迄  4. 5 9% to 99%

4 80%以上 89%迄  4 80% or more and up to 89%

3. 5 70%以上 79%迄  3.5 5% or more up to 79%

3 60%以上 69%迄  3 60% or more and up to 69%

2. 5 50%以上 59%迄  2.5 5% to 59%

2 40%以上 49%迄  2 40% or more up to 49%

1, 5 30%以上 39%迄  1, 5 30% or more up to 39%

1 20%以上 29%迄  1 20% to 29%

0. 5 19 %以下 1 %迄  0.5 19% or less 1% or less

0 な し 結果な表 5に示す c 表 5 0 None Result c shown in Table 5 Table 5

Figure imgf000023_0003
Figure imgf000023_0003

* 比較化合物には、 下記式で示される既知化合物を用いた 比較化合物 1 * Comparative compound 1 using a known compound represented by the following formula

0 9 N0 9 N

Figure imgf000023_0001
Figure imgf000023_0001

比較化合物 2 Comparative compound 2

2 N2 N

Figure imgf000023_0002
Figure imgf000023_0002

産業上の利用可能性 Industrial applicability

本発明により、 新規な 4—卜リフルォロメチルピリジン誘導体力 s提供される。 本発明の 4一卜リフルォロメチルピリジン誘導体は、 除草剤として有用であり、 特に、 水田又は畑地の種々の一年生雑草に対して高い除草効果を示す。  According to the present invention, a novel 4-trifluoromethylpyridine derivative is provided. The 4-trifluoromethylpyridine derivative of the present invention is useful as a herbicide, and particularly exhibits a high herbicidal effect on various annual weeds in paddy fields or fields.

Claims

1. —般式 ( 1. —General formula (
Figure imgf000024_0001
Figure imgf000024_0001
[式中、 Xはハロゲン原子、 水素原子又は低級アルコキシ基を表し、 R1 は水素 Wherein X represents a halogen atom, a hydrogen atom or a lower alkoxy group, and R 1 is hydrogen  car 原子又は低級アルコキシカルボ二ル基を表し、 R2 は低級アルカンスルホニル 基、 ベンゼンスルホニル基又は次式: 囲 R 2 represents a lower alkanesulfonyl group, a benzenesulfonyl group or the following formula: -C0-R3 -C0-R 3 (式中、 R3 はアルキル基、 ハロアルキル基、 低級アルコキシ基置換低級アルキ ル基、 低級アルコキシカルボニル基置換低級アルキル基、 カルボキシル基置換低 級アルキル基、 シクロアルキル基、 フヱニル基 (該フユ二ル基は低級アルキル 基、 ハロゲン原子、 トリフルォロメチル基、 ニトロ基、 シァノ基又は低級アルコ キシ基で 1〜 5個置換されていてもよい) 、 ピリジル基、 フリル基、 チェニル 基、 アミノ基又はジ低級アルキルアミノ基を表す。 ) で示される基を表す。 ] で 示される 4一トリフルォロメチルピリジン誘導体。 Wherein R 3 is an alkyl group, a haloalkyl group, a lower alkoxy-substituted lower alkyl group, a lower alkoxycarbonyl group-substituted lower alkyl group, a carboxyl group-substituted lower alkyl group, a cycloalkyl group, a phenyl group (the The group may be substituted with 1 to 5 lower alkyl groups, halogen atoms, trifluoromethyl groups, nitro groups, cyano groups or lower alkoxy groups), pyridyl groups, furyl groups, chenyl groups, amino groups or It represents a di-lower alkylamino group. ] 4-trifluoromethylpyridine derivative represented by the formula:
2. 一般式 (II) : 2. General formula (II):
Figure imgf000024_0002
Figure imgf000024_0002
(式中、 Xは前記と同じ意味を表し、 Ha 1はハロゲン原子を表す。 ) で示され る化合物と一般式 (ΠΙ) : HONHCO R3 (III) (Wherein, X represents the same meaning as described above, and Ha 1 represents a halogen atom.) And a compound represented by the following general formula (ΠΙ): HONHCO R 3 (III) (式中、 R3 は前記と同じ意味を表す。 ) で示されるヒドロキサム酸類とを反応 させることを特徴とする一般式(ト a) : (Wherein, R 3 represents the same meaning as described above.) A general formula (g) characterized by reacting with a hydroxamic acid represented by the following formula: C F 3 C F 3 H H ,Ν. ( I一 a ) , Ν. (I-a) 、Ν' 〇' 、C〇R 3 , Ν '〇', C〇R 3 (式中、 X及び R3 は前記と同じ意味を表す。 ) で示される 4—トリフルォロメ チルピリジン誘導体の製造方法。 (Wherein, X and R 3 have the same meanings as described above.) A method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:
3 - 塩基の存在下で反応させることを特徴とする請求の範囲第 2項記載の方法。  3. The method according to claim 2, wherein the reaction is carried out in the presence of a 3-base. 4. 一般式 (IV) : 4. General formula (IV): χχ
Figure imgf000025_0001
Figure imgf000025_0001
(式中、 X及び R1 は前記と同じ意味を表す。 ) で示される化合物と一般式 (V) : (Wherein X and R 1 have the same meanings as described above) and a compound represented by the general formula (V): Ha l - R2 (V) Ha l-R 2 (V) (式中、 R2 及び Ha 1は前記と同じ意味を表す。 ) で示される酸ハライド類と を反応させることを特徴とする一般式 (I) :
Figure imgf000026_0001
(Wherein, R 2 and Ha 1 have the same meanings as described above.) A compound represented by the general formula (I):
Figure imgf000026_0001
(式中、 X、 R 1 及び R 2 は前記と同じ意味を表す。 ) で示される 4一トリフル ォロメチルピリジン誘導体の製造方法。 (Wherein, X, R 1 and R 2 have the same meanings as described above.) A method for producing a 4-trifluoromethylpyridine derivative represented by the following formula:
5 . 塩基の存在下で反応させることを特徴とする請求の範囲第 4項記載の方法。  5. The method according to claim 4, wherein the reaction is carried out in the presence of a base. 6 . 一般式 (VI) : 6. General formula (VI):
Figure imgf000026_0002
Figure imgf000026_0002
(式中、 X及び R 2 は前記と同じ意味を表し、 Yは低級アルコキシカルボニル基 を表す。 ) で示される化合物を加水分解することを特徴とする一般式(I-b) : (Wherein, X and R 2 have the same meaning as described above, and Y represents a lower alkoxycarbonyl group.) A compound represented by the general formula (Ib): ( I一 b )
Figure imgf000026_0003
(I-Ib)
Figure imgf000026_0003
(式中、 X及び R 2 は前記と同じ意味を表す。 ) で示される 4一トリフルォロメ チルピリジン誘導体の製造方法。 (Wherein, X and R 2 have the same meanings as described above.).
7 . 塩基の存在下で反応させることを特徴とする請求の範囲第 6項記載の方法。  7. The method according to claim 6, wherein the reaction is carried out in the presence of a base.
PCT/JP1994/002287 1993-12-28 1994-12-28 4-trifluoromethylpyridine derivative and process for producting the same Ceased WO1995018106A1 (en)

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JP5/338665 1993-12-28

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987007269A1 (en) * 1986-05-26 1987-12-03 Mitsui Petrochemical Industries, Ltd. Aryloxyureas, process for their preparation, and their use
JPS649969A (en) * 1987-07-02 1989-01-13 Mitsui Petrochemical Ind N-aryloxycarbamic acid esters, production thereof and herbicide comprising said esters as active ingredient
JPH01131146A (en) * 1987-07-02 1989-05-24 Mitsui Petrochem Ind Ltd Aryloxyureas, their production methods, and herbicides containing them as active ingredients

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1987007269A1 (en) * 1986-05-26 1987-12-03 Mitsui Petrochemical Industries, Ltd. Aryloxyureas, process for their preparation, and their use
JPS649969A (en) * 1987-07-02 1989-01-13 Mitsui Petrochemical Ind N-aryloxycarbamic acid esters, production thereof and herbicide comprising said esters as active ingredient
JPH01131146A (en) * 1987-07-02 1989-05-24 Mitsui Petrochem Ind Ltd Aryloxyureas, their production methods, and herbicides containing them as active ingredients

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