WO1992016014A3 - Procede de production de substrats concaves et dispositif conçu a cet effet - Google Patents
Procede de production de substrats concaves et dispositif conçu a cet effet Download PDFInfo
- Publication number
- WO1992016014A3 WO1992016014A3 PCT/US1992/001484 US9201484W WO9216014A3 WO 1992016014 A3 WO1992016014 A3 WO 1992016014A3 US 9201484 W US9201484 W US 9201484W WO 9216014 A3 WO9216014 A3 WO 9216014A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- concave
- deposition material
- concave substrates
- base
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Lasers (AREA)
Abstract
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4509669A JPH06503209A (ja) | 1991-03-07 | 1992-02-27 | 凹面状基板のための方法及び装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US666,135 | 1984-10-30 | ||
| US66613591A | 1991-03-07 | 1991-03-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO1992016014A2 WO1992016014A2 (fr) | 1992-09-17 |
| WO1992016014A3 true WO1992016014A3 (fr) | 1992-10-29 |
Family
ID=24672969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US1992/001484 Ceased WO1992016014A2 (fr) | 1991-03-07 | 1992-02-27 | Procede de production de substrats concaves et dispositif conçu a cet effet |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH06503209A (fr) |
| WO (1) | WO1992016014A2 (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6197164B1 (en) * | 1997-10-10 | 2001-03-06 | International Business Machines Corporation | Method and apparatus to improve the uniformity of ion beam deposited films in an ion beam sputtering system |
| US6086727A (en) | 1998-06-05 | 2000-07-11 | International Business Machines Corporation | Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system |
| US6783635B2 (en) | 1999-12-09 | 2004-08-31 | International Business Machines Corporation | Spin valve sensor free layer structure with a cobalt based layer that promotes magnetic stability and high magnetoresistance |
| DE102006024068A1 (de) * | 2006-05-23 | 2007-11-29 | Oerlikon Leybold Vacuum Gmbh | Beschichtungsanlage |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1545890A (fr) * | 1967-10-05 | 1968-11-15 | Centre Nat Rech Scient | Perfectionnements aux procédés et dispositifs de projection de molécules et aux supports revêtus par les molécules ainsi projetées |
| GB1265834A (fr) * | 1969-10-13 | 1972-03-08 | ||
| US3900585A (en) * | 1972-02-12 | 1975-08-19 | Agency Ind Science Techn | Method for control of ionization electrostatic plating |
| USRE32849E (en) * | 1978-04-13 | 1989-01-31 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
| EP0354195A2 (fr) * | 1988-08-03 | 1990-02-07 | ENEA-Comitato Nazionale per la Ricerca e per lo Sviluppo dell'Energia Nucleare e delle Energie Alternative | Procédé de fabrication pour un miroir laser à réflectance variable dans le sens radial |
-
1992
- 1992-02-27 JP JP4509669A patent/JPH06503209A/ja active Pending
- 1992-02-27 WO PCT/US1992/001484 patent/WO1992016014A2/fr not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1545890A (fr) * | 1967-10-05 | 1968-11-15 | Centre Nat Rech Scient | Perfectionnements aux procédés et dispositifs de projection de molécules et aux supports revêtus par les molécules ainsi projetées |
| GB1265834A (fr) * | 1969-10-13 | 1972-03-08 | ||
| US3900585A (en) * | 1972-02-12 | 1975-08-19 | Agency Ind Science Techn | Method for control of ionization electrostatic plating |
| USRE32849E (en) * | 1978-04-13 | 1989-01-31 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
| EP0354195A2 (fr) * | 1988-08-03 | 1990-02-07 | ENEA-Comitato Nazionale per la Ricerca e per lo Sviluppo dell'Energia Nucleare e delle Energie Alternative | Procédé de fabrication pour un miroir laser à réflectance variable dans le sens radial |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06503209A (ja) | 1994-04-07 |
| WO1992016014A2 (fr) | 1992-09-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
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| CFP | Corrected version of a pamphlet front page |
Free format text: REVISED ABSTRACT RECEIVED BY THE INTERNATIONAL BUREAU AFTER COMPLETION OF THE TECHNICAL PREPARATIONS FOR INTERNATIONAL PUBLICATION;DRAWING ADDED |
|
| DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
| 122 | Ep: pct application non-entry in european phase | ||
| NENP | Non-entry into the national phase |
Ref country code: CA |