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WO1990013000A1 - Dispositif et procede de projection/exposition - Google Patents

Dispositif et procede de projection/exposition Download PDF

Info

Publication number
WO1990013000A1
WO1990013000A1 PCT/JP1990/000520 JP9000520W WO9013000A1 WO 1990013000 A1 WO1990013000 A1 WO 1990013000A1 JP 9000520 W JP9000520 W JP 9000520W WO 9013000 A1 WO9013000 A1 WO 9013000A1
Authority
WO
WIPO (PCT)
Prior art keywords
projection
exposed object
exposure
stage
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP1990/000520
Other languages
English (en)
French (fr)
Inventor
Yoshitada Oshida
Tetsuzo Tanimoto
Minoru Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1100026A external-priority patent/JP2796347B2/ja
Priority claimed from JP1249123A external-priority patent/JP2786270B2/ja
Priority claimed from JP1257033A external-priority patent/JP2895874B2/ja
Priority claimed from JP2045387A external-priority patent/JP2892747B2/ja
Priority claimed from JP2064155A external-priority patent/JPH0828319B2/ja
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to DE69027738T priority Critical patent/DE69027738T2/de
Priority to KR1019900702643A priority patent/KR930011884B1/ko
Priority to EP90906337A priority patent/EP0426866B1/en
Publication of WO1990013000A1 publication Critical patent/WO1990013000A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
PCT/JP1990/000520 1989-04-21 1990-04-20 Dispositif et procede de projection/exposition Ceased WO1990013000A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE69027738T DE69027738T2 (de) 1989-04-21 1990-04-20 Projektions- und wiedergabeschaltung sowie projektions- und wiedergabeverfahren
KR1019900702643A KR930011884B1 (ko) 1989-04-21 1990-04-20 투영 노출 장치 및 투영 노출 방법
EP90906337A EP0426866B1 (en) 1989-04-21 1990-04-20 Projection/exposure device and projection/exposure method

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP1/100026 1989-04-21
JP10002589 1989-04-21
JP1100026A JP2796347B2 (ja) 1989-04-21 1989-04-21 投影露光方法及びその装置
JP1/100025 1989-04-21
JP1/249123 1989-09-27
JP1249123A JP2786270B2 (ja) 1989-09-27 1989-09-27 干渉式傾きもしくは高さ検出装置並びに縮小投影式露光装置及びその方法
JP1257033A JP2895874B2 (ja) 1989-10-03 1989-10-03 干渉縞信号の周期と位相の検出方法及び装置並びに面の傾きと高さの測定装置
JP1/257033 1989-10-03
JP2/45387 1990-02-28
JP2045387A JP2892747B2 (ja) 1990-02-28 1990-02-28 傾き若しくは高さ検出方法及びその装置並びに投影露光方法及びその装置
JP2/64155 1990-03-16
JP2064155A JPH0828319B2 (ja) 1989-04-21 1990-03-16 投影露光装置

Publications (1)

Publication Number Publication Date
WO1990013000A1 true WO1990013000A1 (fr) 1990-11-01

Family

ID=27550187

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1990/000520 Ceased WO1990013000A1 (fr) 1989-04-21 1990-04-20 Dispositif et procede de projection/exposition

Country Status (4)

Country Link
US (1) US5227862A (ja)
EP (1) EP0426866B1 (ja)
DE (1) DE69027738T2 (ja)
WO (1) WO1990013000A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103529650A (zh) * 2012-07-02 2014-01-22 上海微电子装备有限公司 一种高度测量装置及其测量方法
CN107148550A (zh) * 2014-08-29 2017-09-08 株式会社尼康 表面形状测定装置

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5392115A (en) * 1989-04-21 1995-02-21 Hitachi, Ltd. Method of detecting inclination of a specimen and a projection exposure device as well as method of detecting period of periodically varying signal
JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JPH05312549A (ja) * 1992-02-06 1993-11-22 Hitachi Ltd パターン検出方法及びその装置
JP2913984B2 (ja) * 1992-03-11 1999-06-28 株式会社ニコン 傾斜角測定装置
FR2697351B1 (fr) * 1992-10-28 1996-09-13 Us Energy Dispositif de determination de plan pupillaire a division de champ.
JPH06189194A (ja) * 1992-12-17 1994-07-08 Pioneer Electron Corp 映像合成装置
US5455679A (en) * 1993-02-22 1995-10-03 Canon Kabushiki Kaisha Position detecting system
JP3060357B2 (ja) * 1994-06-22 2000-07-10 キヤノン株式会社 走査型露光装置及び該走査型露光装置を用いてデバイスを製造する方法
US6099596A (en) 1997-07-23 2000-08-08 Applied Materials, Inc. Wafer out-of-pocket detection tool
US6197117B1 (en) 1997-07-23 2001-03-06 Applied Materials, Inc. Wafer out-of-pocket detector and susceptor leveling tool
JP2001284210A (ja) * 2000-03-30 2001-10-12 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP3406577B2 (ja) * 2000-07-19 2003-05-12 技研トラステム株式会社 物体認識方法
US7322250B1 (en) * 2002-04-09 2008-01-29 Rockwell Automation Technologies, Inc. System and method for sensing torque on a rotating shaft
JP5224667B2 (ja) * 2005-09-29 2013-07-03 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US20080105825A1 (en) * 2006-11-08 2008-05-08 Taejoon Han Laser scanning apparatus and method using diffractive optical elements
JP5690268B2 (ja) * 2008-08-26 2015-03-25 ザ ユニバーシティー コート オブザ ユニバーシティー オブ グラスゴー 測定システム、位置決定装置、波長決定装置、及び屈折率決定装置
JP2010080712A (ja) * 2008-09-26 2010-04-08 Canon Inc 情報処理装置、露光装置、デバイス製造方法、情報処理方法およびプログラム
JP2010192470A (ja) * 2009-02-13 2010-09-02 Canon Inc 計測装置、露光装置及びデバイスの製造方法
CN102109769B (zh) * 2009-12-29 2012-10-03 上海微电子装备有限公司 工件台干涉仪和掩模台干涉仪的联调装置及联调方法
US20120008150A1 (en) * 2010-04-23 2012-01-12 Nikon Corporation Autofocus system and method
DE102010041558A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zur mikrolithographischen Belichtung
DE102010041556A1 (de) 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung
JP6632128B2 (ja) * 2016-01-18 2020-01-15 株式会社トプコン 液面反射式傾斜センサにおける容器の設計方法、該容器を有する傾斜センサ、及び該容器を有する傾斜センサの生産方法
CN108121179A (zh) * 2016-11-30 2018-06-05 上海微电子装备（集团）股份有限公司 一种调焦调平装置
US11473901B2 (en) * 2018-05-29 2022-10-18 Hitachi High-Tech Corporation Height measurement device in which optical paths projected on the sample at different incidence angles
CN109059777B (zh) * 2018-08-08 2019-10-29 中国十七冶集团有限公司 一种全自动激光干涉观测的方法
CN110967943B (zh) * 2019-11-28 2022-02-08 中国科学院微电子研究所 用于光刻机调焦调平系统的光电探测器及其使用方法

Citations (4)

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Publication number Priority date Publication date Assignee Title
JPS56118609A (en) * 1980-02-25 1981-09-17 Matsushita Electric Ind Co Ltd Measuring method for azimuth angle of magnetic head
JPS62115310A (ja) * 1985-11-14 1987-05-27 Mitsubishi Electric Corp パタ−ン認識装置
JPS62135708A (ja) * 1985-12-10 1987-06-18 Yokogawa Electric Corp ３次元形状測定装置
JPH06263802A (ja) * 1993-03-16 1994-09-20 Mitsubishi Kasei Corp 分枝環状イヌロオリゴ糖及びその製造方法

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US2911880A (en) * 1955-08-27 1959-11-10 Zeiss Carl Interferometer
US3601490A (en) * 1966-12-30 1971-08-24 Keuffel & Esser Co Laser interferometer
US4013366A (en) * 1973-05-23 1977-03-22 Office National D'etudes Et De Recherches Aerospatiales (O.N.E.R.A.) Method and apparatus for investigation of small displacements of a solid body by means of coherent light
FR2445512A1 (en) * 1978-12-27 1980-07-25 Thomson Csf Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error
NL186353C (nl) * 1979-06-12 1990-11-01 Philips Nv Inrichting voor het afbeelden van een maskerpatroon op een substraat voorzien van een opto-elektronisch detektiestelsel voor het bepalen van een afwijking tussen het beeldvlak van een projektielenzenstelsel en het substraatvlak.
US4626103A (en) * 1984-03-29 1986-12-02 At&T Bell Laboratories Focus tracking system
US4744659A (en) * 1985-03-20 1988-05-17 Ricoh Company, Ltd. Method of and apparatus for measuring the shape of a wavefront
US4704033A (en) * 1986-03-06 1987-11-03 Micronix Corporation Multiple wavelength linear zone plate alignment apparatus and method
JPH07105327B2 (ja) * 1986-06-27 1995-11-13 キヤノン株式会社 面位置検知装置
SU1413547A1 (ru) * 1986-09-25 1988-07-30 Воронежский Политехнический Институт Цифровой панорамный измеритель частоты

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118609A (en) * 1980-02-25 1981-09-17 Matsushita Electric Ind Co Ltd Measuring method for azimuth angle of magnetic head
JPS62115310A (ja) * 1985-11-14 1987-05-27 Mitsubishi Electric Corp パタ−ン認識装置
JPS62135708A (ja) * 1985-12-10 1987-06-18 Yokogawa Electric Corp ３次元形状測定装置
JPH06263802A (ja) * 1993-03-16 1994-09-20 Mitsubishi Kasei Corp 分枝環状イヌロオリゴ糖及びその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0426866A4 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103529650A (zh) * 2012-07-02 2014-01-22 上海微电子装备有限公司 一种高度测量装置及其测量方法
CN107148550A (zh) * 2014-08-29 2017-09-08 株式会社尼康 表面形状测定装置

Also Published As

Publication number Publication date
DE69027738T2 (de) 1996-11-28
EP0426866A4 (en) 1992-12-30
EP0426866A1 (en) 1991-05-15
DE69027738D1 (de) 1996-08-14
EP0426866B1 (en) 1996-07-10
US5227862A (en) 1993-07-13

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