[go: up one dir, main page]

WO1986000649A1 - Method for improving the colour effect of titanium nitride layers - Google Patents

Method for improving the colour effect of titanium nitride layers Download PDF

Info

Publication number
WO1986000649A1
WO1986000649A1 PCT/EP1985/000324 EP8500324W WO8600649A1 WO 1986000649 A1 WO1986000649 A1 WO 1986000649A1 EP 8500324 W EP8500324 W EP 8500324W WO 8600649 A1 WO8600649 A1 WO 8600649A1
Authority
WO
WIPO (PCT)
Prior art keywords
coating
titanium nitride
nitride layers
improving
hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP1985/000324
Other languages
German (de)
French (fr)
Inventor
Helmut Steininger
Heinz-Werner Etzkorn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Battelle Institut eV
Original Assignee
Battelle Institut eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Institut eV filed Critical Battelle Institut eV
Publication of WO1986000649A1 publication Critical patent/WO1986000649A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B37/00Cases
    • G04B37/22Materials or processes of manufacturing pocket watch or wrist watch cases

Definitions

  • the invention relates to a method for improving the color impression of titanium nitride layers by means of plasma-supported coating methods, in particular by means of
  • Magnetron nuts using a process gas consisting of an inert gas and nitrogen.
  • Decorative hard material coatings made of titanium nitride on substrates made of any material such as plastic, ceramic, metal or metal alloy can be deposited using physical coating methods such as magnetron sputtering or ion plating.
  • the color scale of such layers ranges from white to yellow to rose gold. Compared to pure gold layers, however, gold-colored titanium nitride layers are generally perceived as cold. This fact is very disruptive when using titanium nitride for decorative applications, especially as a gold substitute.
  • the color impression of the titanium nitride layers can be influenced by varying the process conditions such as bias voltage and temperature.
  • the morphology of the layer is also changed.
  • the temperature is higher, so the layers show an undesirably stalky appearance.
  • Titanium nitride layers are desired that have the outstanding physical and chemical properties of titanium nitride such as great hardness and thus high scratch resistance and corrosion resistance and also show a warm gold color.
  • the subjective impression of a warm gold color is created e.g. B. by increasing the red value or by reducing the proportion of green, ie the black haze of the layer. This is not achieved by simply increasing the nitrogen content in the titanium nitride layer, since the associated increase in the red value always goes hand in hand with a decrease in the yellow content. Therefore, reddish-brown layers are increasingly obtained.
  • the object of the invention is to increase the red value of titanium nitride layers by a simple variation of the coating conditions, or to reduce the proportion of green without influencing the yellow value of the layer. Furthermore, the process should not cause any change in the physical and chemical properties, in particular the corrosion resistance and the scratch resistance of the titanium nitride.
  • This object is achieved in that carbon is introduced into the reaction space between a target and a substrate to be coated and. that the coating is carried out at substrate temperatures of less than 250 ° C, and that the properties of the layer depend on the substrate temperature and
  • Bias voltage and the color impression can be adjusted via the carbon content. Preferred embodiments of the method according to the invention are described in subclaims 2 to 11.
  • the titanium nitride layers are deposited in a manner known per se by plasma-assisted deposition methods in a vacuum coating apparatus, preferably by magnetron sputtering.
  • a hydrocarbon is admitted to the process gases argon and nitrogen which are usually used. All saturated and unsaturated substituted or unsubstituted hydrocarbons with 1 to 6, preferably 1 to 3, carbon atoms are suitable.
  • the reaction conditions, in particular the bias voltage and the temperature of the substrate, are set to values favorable for advantageous properties of use of the layer, such as adhesion, homogeneity and unity.
  • the red value of the deposited titanium nitride layers depends sensitively on the flow rate of the hydrocarbon introduced into the apparatus.
  • low substrate temperatures of less than 250 ° C, preferably 20 to 200 ° C, are used.
  • the flow rates of the hydrocarbons added to influence the color impression are between about 0.05 and 1 cm 3 / min.
  • carbon is supplied by using a titanium carbide target instead of a pure titanium target.
  • a titanium carbide target instead of a pure titanium target.
  • noble gases preferably argon
  • nitrogen are used as process gases.
  • the flow rate of the nitrogen can also be continuously reduced or increased from about the middle of the total coating time or towards the end of the coating, as a result of which the layer only has the desired color on the surface.
  • the coating is typically carried out at a residual gas pressure of less than 2.10 -6 torr.
  • Deposition rates are between 1 0 and 20 ⁇ / sec. , preferably 1 5 ⁇ / sec.
  • the argon flow rate is e.g. B. 1 0, 5 to 1 3, 5 cm 3 / min. who have favourited Sticks toff flow rate e.g. B. 2 to 1 0 cm 3 / min.
  • the flow rate of the hydrocarbon can be between 0.05 and 1 cm 3 / min. vary.
  • a gold-colored titanium nitride layer is obtained by reactive magnetron sputtering of a pure titanium target on a stainless steel workpiece.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

In order to improve the colour effect of titanium nitride layers prepared according to plasma coating methods with the use of a process gas comprised of rare gas and nitrogen, carbon is introduced in the reaction chamber between a target and a substrate to be coated. Alternatively, hydrocarbons are directed to this effect into the reaction chamber. In another embodiment, a target of titanium carbide is used.

Description

Verfahren zur Verbesserung des Farbeindrucks von Titannitridschichten Process for improving the color impression of titanium nitride layers

Beschreibung:Description:

Die Erfindung betrifft ein Verfahren zur Verbesserung des Farbeindrucks von Titannitrid-Schichten mittels plasmagestützter Beschichtungsmethoden, insbesondere mittelsThe invention relates to a method for improving the color impression of titanium nitride layers by means of plasma-supported coating methods, in particular by means of

MagnetronsDuttern, unter Verwendung eines Prozeßgases aus einem Edelgas und Stickstoff.Magnetron nuts, using a process gas consisting of an inert gas and nitrogen.

Dekorative Hartstoffbeschichtungen aus Titannitrid auf Substraten aus beliebigen Materialien wie Kunststoff, Keramik, Metall oder Metallegierung, können durch physikalische Beschichtungsmethoden wie Magnetronsputtern oder Ionenplattieren abgeschieden werden. Die Farbskala solcher Schichten reicht von Weiß- über Gelb- bis Rotgold. Gegenüber reinen Goldschichten werden goldfarbene Titannitrid-Schichten jedoch im allgemeinen ais kalt empfunden. Dieser Umstand wirkt sich beim Einsatz von Titannitrid für dekorative Anwendungen, insbesondere als Goldersatz, sehr störend aus.Decorative hard material coatings made of titanium nitride on substrates made of any material such as plastic, ceramic, metal or metal alloy can be deposited using physical coating methods such as magnetron sputtering or ion plating. The color scale of such layers ranges from white to yellow to rose gold. Compared to pure gold layers, however, gold-colored titanium nitride layers are generally perceived as cold. This fact is very disruptive when using titanium nitride for decorative applications, especially as a gold substitute.

Es ist bekannt, daß durch Variation der Verfahrensbedingungen wie Biasspannung und Temperatur, der Farbeindruck der Titannitrid-Schichten beeinflußt werden kann. Dabei wird jedoch auch die Morphologie der Schicht geändert. Bei niedriger Biasspannung und/oder niedrigen Temperaturen erhält man z. B. poröse Schichten, ist die Temperatur höher, so zeigen die Schichten ein unerwünscht stengeliges Aussehen.It is known that the color impression of the titanium nitride layers can be influenced by varying the process conditions such as bias voltage and temperature. However, the morphology of the layer is also changed. At low bias voltage and / or low temperatures you get e.g. B. porous layers, the temperature is higher, so the layers show an undesirably stalky appearance.

Gewünscht werden Titannitrid-Schichten, die die herausragenden physikalischen und chemischen Eigenschaften von Titannitrid wie große Härte und damit hohe Kratzfestigkeit und Korrosionsbeständigkeit aufweisen und zudem einen warmen Goldfarbton zeigen. Der subjektive Eindruck eines warmen Goldfarbtons entsteht z. B. durch Erhöhung des Rotwertes beziehungsweise durch eine Verringerung des Grünanteils, d. h. des Schwarzschleiers der Schicht. Dies wird durch bloße Erhöhung des Stickstoffgehalts in der Titannitrid-Schicht nicht erreicht, da die damit verbundene Erhöhung des Rotwertes stets mit einer Abnahme des Gelbanteils einhergeh.t. Daher werden zunehmend rötlich-braune Schichten erhalten.Titanium nitride layers are desired that have the outstanding physical and chemical properties of titanium nitride such as great hardness and thus high scratch resistance and corrosion resistance and also show a warm gold color. The subjective impression of a warm gold color is created e.g. B. by increasing the red value or by reducing the proportion of green, ie the black haze of the layer. This is not achieved by simply increasing the nitrogen content in the titanium nitride layer, since the associated increase in the red value always goes hand in hand with a decrease in the yellow content. Therefore, reddish-brown layers are increasingly obtained.

Der Erfindung liegt die Aufgabe zugrunde, den Rotwert von Titannitrid-Schichten durch eine einfache durchzuführende Variation der Beschichtungsbedingungen zu erhöhen, beziehungsweise den Grünanteil zu senken, ohne den Gelbwert der Schicht zu beeinflussen. Ferner sollte das Verfahren keine Änderung der physikalischen und chemischen Eigenschaften, insbesondere der Korrosionsbeständigkeit und der Kratzfestigkeit des Titannitrids, bewirken.The object of the invention is to increase the red value of titanium nitride layers by a simple variation of the coating conditions, or to reduce the proportion of green without influencing the yellow value of the layer. Furthermore, the process should not cause any change in the physical and chemical properties, in particular the corrosion resistance and the scratch resistance of the titanium nitride.

Diese Aufgabe ist erfindungsgemäß dadurch gelöst, daß in den Reaktionsraum zwischen einem Target und einem zu beschichtenden Substrat Kohlenstoff eingebracht wird und. daß die Beschichtung bei Substrattemperatu ren von weniger als 250 ºC durchgeführt wird, und daß die Gebrauchseigenschaften der Schicht über die Substrattemperatur undThis object is achieved in that carbon is introduced into the reaction space between a target and a substrate to be coated and. that the coating is carried out at substrate temperatures of less than 250 ° C, and that the properties of the layer depend on the substrate temperature and

Biasspannung und der Farbeindruck über den Kohlenstoffanteil eingestellt werden. Bevorzugte Ausführungsformen des erfindungsgemäßen Verfahrens sind in den ünteransprüchen 2 bis 11 beschrieben.Bias voltage and the color impression can be adjusted via the carbon content. Preferred embodiments of the method according to the invention are described in subclaims 2 to 11.

Die Abscheidung der Titannitrid-Schichten erfolgt auf an sich bekannte Weise durch plasmagestützte Abscheidemethoden in einer Vakuumbeschichtungsapparatur, vorzugsweise durch Magnetronsputtern. In einer Variante des erfin dungsgemäßen Verfahrens wird zu den üblicherweise verwendeten Prozeßgasen Argon und Stickstoff ein Kohlenwasserstoff eingelassen. Geeignet sind alle gesättigten und ungesättigten substituierten oder unsubstituierten KohlenWasserstoffe mit 1 bis 6, vorzugsweise 1 bis 3 Kohlenstoff-Atomen. Die Reaktionsbedingungen, insbesondere die Biasspannung und die Temperatur des Substrats werden auf für vorteilhafte Gebrauchseigenschaften der Schicht, wie Haftung, Homo genität und Geschlossenheit, günstige Werte eingestellt. Überraschenderweise zeigt es sich, daß bei vorgegebenen Abscheidearten und konstant gehaltenem Argon- und Stickstoffdurchfluß der Rotwert der abgeschiedenen Titannitrid-Schichten empfindlich von der Durchflußmenge des in die Apparatur eingeleiteten KohlenWasserstoffs abhängt. Erfindungsgemäß werden, verglichen mit bekannten Verfahren, niedrige Substrattemperaturen von weniger als 250 ºC, vorzugsweise 20 bis 200 °C, verwendet. Die Durchflußmengen der zur Beeinflussung des Farbeindrucks zugesetzten Kohlenwasserstoffe liegen zwischen etwa 0,05 und 1 cm3/Min. Nach dem erfindungsgemäßen Verfahren ist es auch möglich, den Kohlenwasserstoff erst etwa ab der Mitte der gesamten Beschichtungszeit oder gar erst gegen Ende der Beschichtung dem Reaktionsraum zuzuführen und dabei die Durchflußmenge kontinuierlich von null bis auf etwa 1 cm3/Min. zu steigern. Dadurch wird der Farbeindruck lediglich in dem äußeren Teil der Schicht verbessert.The titanium nitride layers are deposited in a manner known per se by plasma-assisted deposition methods in a vacuum coating apparatus, preferably by magnetron sputtering. In a variant of the invent In accordance with the method according to the invention, a hydrocarbon is admitted to the process gases argon and nitrogen which are usually used. All saturated and unsaturated substituted or unsubstituted hydrocarbons with 1 to 6, preferably 1 to 3, carbon atoms are suitable. The reaction conditions, in particular the bias voltage and the temperature of the substrate, are set to values favorable for advantageous properties of use of the layer, such as adhesion, homogeneity and unity. Surprisingly, it turns out that, with given types of separation and constant argon and nitrogen flow, the red value of the deposited titanium nitride layers depends sensitively on the flow rate of the hydrocarbon introduced into the apparatus. According to the invention, compared to known methods, low substrate temperatures of less than 250 ° C, preferably 20 to 200 ° C, are used. The flow rates of the hydrocarbons added to influence the color impression are between about 0.05 and 1 cm 3 / min. According to the method according to the invention, it is also possible to supply the hydrocarbon to the reaction space only from about the middle of the total coating time or even towards the end of the coating, and the flow rate continuously from zero to about 1 cm 3 / min. to increase. As a result, the color impression is only improved in the outer part of the layer.

Nach einer weiteren Ausführungsform des erfindunsgemäßen Verfahrens wird Kohlenstoff durch Verwendung eines Titancarbid-Targets anstelle eines reinen Titan-Targets zugeführt. In diesem Fall werden als Prozeßgase nur Edelgase, vorzugsweise Argon, und Stickstoff eingesetzt. Bei vorgegebenen Abscheideparametern wie Abscheiderate, Edelgas durchfluß und Biasspannung usw. hängt der Farbton der abgeschiedenen Titannitrid-Schicht allein von dem eingestellten Stickstoff-Durchfluß ab. Die Durchflußmenge des Stickstoffs kann auch hier ab etwa der Mitte der gesamten Beschichtungszeit oder gegen Ende der Beschichtung kontinuierlich reduziert oder erhöht werden, wodurch die Schicht erst an der Oberfläche den erwünschten Farbton aufweist.According to a further embodiment of the method according to the invention, carbon is supplied by using a titanium carbide target instead of a pure titanium target. In this case, only noble gases, preferably argon, and nitrogen are used as process gases. With specified separation parameters such as separation rate, inert gas flow and bias voltage, etc., the color of the deposited titanium nitride layer depends solely on the set nitrogen flow. The flow rate of the nitrogen can also be continuously reduced or increased from about the middle of the total coating time or towards the end of the coating, as a result of which the layer only has the desired color on the surface.

Die Beschichtung wird typischerweise bei einem Restgasdruck von weniger als 2,10-6 Torr durchgeführt. DieThe coating is typically carried out at a residual gas pressure of less than 2.10 -6 torr. The

Abscheideraten liegen zwischen 1 0 und 20 Å/Sek. , vorzugsweise 1 5 Å/Sek . Die Argon-Durchf lußrate beträgt z. B. 1 0 , 5 b is 1 3 , 5 cm3/Min. , die Sticks toff-Durchflußrate z . B. 2 b is 1 0 cm3/Min. Die Durchf lußmenge des KohlenWasserstoffs kann zwischen 0 , 05 und 1 cm3/Min. variieren.Deposition rates are between 1 0 and 20 Å / sec. , preferably 1 5 Å / sec. The argon flow rate is e.g. B. 1 0, 5 to 1 3, 5 cm 3 / min. who have favourited Sticks toff flow rate e.g. B. 2 to 1 0 cm 3 / min. The flow rate of the hydrocarbon can be between 0.05 and 1 cm 3 / min. vary.

Die Erfindung wird anhand des nachfolgenden Beispiels näher erläutert:The invention is illustrated by the following example:

Beispiel:Example:

Bei einer Abscheiderate- von 15 Å/Sek. und einem Argonund Stickstoffdurchfluß von 13,5 cm3/Min. bzw. 3,06 cm3/ Min. wird durch reaktives Magnetronsputtern eines reinen Titan-Targets auf einem Edelstahl-Werkstück eine goldfarbene Titannitrid-Schicht erhalten. Die an dieser Schicht unter Verwendung einer D65 Lichtguelle gemessenen Farbkoordinaten (CIE 1976) L* (Brillanz), a* (Rotwert) und b* (Gelbwert) betragen L* = 59,9, a* = 3,0 und b* = 30,3. Läßt man unter sonst gleichen Bedingungen zusätzlich einen Kohlenwasserstoff z. B. Acetylen mit Durchflußraten von beispielsweise 0,25 und 0,50 cm3/Min. ein, so erhält man für die abgeschiedenen Titannitrid- Schichten Farbkoordinaten von L* = 55,7, a* = 5,8 und b* = 30,3 bzw. L* = 55,0, a* = 7,5 und b* = 25,4. Die Zunahme des Rotwertes a* bei Kohlenstoffzugäbe während der Titannitrid-Abscheidung ohne Änderung des Gelbwertes b* ist im ersteren Fall signifikant. Das Beispiel macht aber auch deutlich, daß bei ansonsten vorgegebenen Prozeßbedingungen ein Maximum der Kohlenwasserstoff-Zugabe existiert, oberhalb dessen der Gelbwert abzunehmen beginnt. At a deposition rate of 15 Å / sec. and an argon and nitrogen flow of 13.5 cm 3 / min. or 3.06 cm 3 / min., a gold-colored titanium nitride layer is obtained by reactive magnetron sputtering of a pure titanium target on a stainless steel workpiece. The color coordinates measured on this layer using a D65 light source (CIE 1976) L * (brilliance), a * (red value) and b * (yellow value) are L * = 59.9, a * = 3.0 and b * = 30.3. If you leave a hydrocarbon under otherwise identical conditions z. B. acetylene with flow rates of, for example, 0.25 and 0.50 cm 3 / min. one, one obtains for the deposited titanium nitride Layers of color coordinates of L * = 55.7, a * = 5.8 and b * = 30.3 or L * = 55.0, a * = 7.5 and b * = 25.4. The increase in the red value a * with carbon additions during the titanium nitride deposition without changing the yellow value b * is significant in the former case. However, the example also makes it clear that under otherwise specified process conditions there is a maximum hydrocarbon addition above which the yellowness index begins to decrease.

Claims

Verfahren zur Verbesserung des Farbeindrucks von Titannitrid-Schichten Patentansprüche Process for improving the color impression of titanium nitride layers 1. Verfahren zur Verbesserung des Farbeindrucks von1. Process for improving the color impression of Titannitrid-Schichten mittels plasmagestützter Beschichtungsmethoden, insbesondere mittels Magnetronsputtern, unter Verwendung eines Prozeßgases aus einem Edelgas und Stickstoff, dadurch gekennzeichnet, daß in den Reaktiαnsraum zwischen einem Target und einem zu beschichtenden Substrat Kohlenstoff eingebracht wird, und daß die Beschichtung bei Substrattemperaturen: von weniger als 250°C durchgeführt wird und daß die Gebrauchseigenschaften der Schicht über die Substrattemperatur und Biasspannung und der Farbeindruck über den Kohlenstoffanteil eingestellt werden.Titanium nitride layers by means of plasma-supported coating methods, in particular by means of magnetron sputtering, using a process gas consisting of an inert gas and nitrogen, characterized in that carbon is introduced into the reaction space between a target and a substrate to be coated, and that the coating at substrate temperatures: less than 250 ° C is carried out and that the properties of the layer are adjusted via the substrate temperature and bias voltage and the color impression via the carbon content. 2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Beschichtung bei Substrattemperaturen von 20 bis 200°C, vorzugsweise 150°C, durchgeführt wird.2. The method according to claim 1, characterized in that the coating is carried out at substrate temperatures of 20 to 200 ° C, preferably 150 ° C. 3. Verfahren nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß die Biasspannung 50 bis 200 V, vorzugsweise 80 bis 150 V, beträgt. 3. The method according to claim 1 or 2, characterized in that the bias voltage is 50 to 200 V, preferably 80 to 150 V. 4. Verfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß in den Reaktionsraum gesättigte oder ungesättigte substituierte oder unsubstituierte Kohlenwasserstoffe mit 1 bis 6, vorzugsweise 1 bis 3 C-Atomen eingeleitet werden.4. The method according to any one of claims 1 to 3, characterized in that saturated or unsaturated substituted or unsubstituted hydrocarbons having 1 to 6, preferably 1 to 3, carbon atoms are introduced into the reaction space. 5. Verfahren nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß als Kohlenwasserstoff Acetylen eingeleitet wird.5. The method according to any one of claims 1 to 4, characterized in that acetylene is introduced as the hydrocarbon. 6. Verfahren nach einem der Ansprüche 1 bis 5, dadurch gekennzeichnet, daß die Kohlenwasserstoffe ab etwa der Mitte der gesamten Beschichtungszeit oder gegen Ende der Beschichtung zugeführt werden.6. The method according to any one of claims 1 to 5, characterized in that the hydrocarbons are supplied from about the middle of the total coating time or towards the end of the coating. 7. Verfahren nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß die Durchflußmenge des Kohlenwasserstoffs kontinuierlich gesteigert wird.7. The method according to any one of claims 1 to 6, characterized in that the flow rate of the hydrocarbon is continuously increased. 8. Verfahren nach einem der Ansprüche 1 bis dadurch gekennzeichnet, daß die Durchflußmenge des KohlenWasserstoffs 0,05 bis 1 cm3/Min. beträgt.8. The method according to any one of claims 1 to characterized in that the flow rate of the hydrocarbon 0.05 to 1 cm 3 / min. is. 9. Verfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß das Target aus Titancarbid besteht.9. The method according to any one of claims 1 to 3, characterized in that the target consists of titanium carbide. 10. Verfahren nach Anspruch 9, dadurch gekennzeichnet, daß ab etwa der Mitte der gesamten Beschichtungszeit oder gegen Ende der Beschichtung die Durchflußmenge des Stickstoffs kontinuierlich verändert wird. 10. The method according to claim 9, characterized in that from about the middle of the total coating time or towards the end of the coating, the flow rate of the nitrogen is continuously changed. 11. Verfahren nach einem der Ansprüche 1 bis 10, dadurch gekennzeichnet, daß die Biasspannung während der Beschichtung, vorzugsweise stetig, geändert wird. 11. The method according to any one of claims 1 to 10, characterized in that the bias voltage during the coating, preferably continuously, is changed.
PCT/EP1985/000324 1984-07-11 1985-07-04 Method for improving the colour effect of titanium nitride layers Ceased WO1986000649A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3425467.6 1984-07-11
DE19843425467 DE3425467A1 (en) 1984-07-11 1984-07-11 METHOD FOR IMPROVING THE COLOR IMPRESSION OF TITAN NITRIDE LAYERS

Publications (1)

Publication Number Publication Date
WO1986000649A1 true WO1986000649A1 (en) 1986-01-30

Family

ID=6240323

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1985/000324 Ceased WO1986000649A1 (en) 1984-07-11 1985-07-04 Method for improving the colour effect of titanium nitride layers

Country Status (3)

Country Link
EP (1) EP0190179A1 (en)
DE (1) DE3425467A1 (en)
WO (1) WO1986000649A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0413853A1 (en) * 1989-08-21 1991-02-27 Balzers Aktiengesellschaft Workpiece coated with a solid solution crystalline layer, process and apparatus for its manufacture
DE4020595A1 (en) * 1990-06-28 1992-01-09 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Electric reflector lamp for accent lighting
CN108505004A (en) * 2018-05-04 2018-09-07 武汉理工大学 Stainless steel knife preparation method with chromatic colour TiN coatings

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3890319C2 (en) * 1987-04-23 1994-08-25 Nisshin Steel Co Ltd Decorative panel as building material
CA1296289C (en) * 1987-06-30 1992-02-25 Inco Limited Process for producing gold-colored coinage
DE3726731A1 (en) * 1987-08-11 1989-02-23 Hartec Ges Fuer Hartstoffe Und METHOD FOR APPLYING COATS TO OBJECTS BY MEANS OF MAGNETIC FIELD SUPPORTED CATHODE SPRAYING IN A VACUUM
DE4205017A1 (en) * 1992-02-19 1993-08-26 Leybold Ag Prodn. of decorative gold@ alloy layers - with process parameter alteration to modify layer characteristics

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1951362A1 (en) * 1969-10-11 1971-06-16 Heraeus Gmbh W C Coated writing pens

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE787599A (en) * 1971-08-16 1973-02-16 Battelle Memorial Institute ANTISOLAR FILTERING AND THERMAL INSULATION GLASS
CH624817B (en) * 1979-09-04 Balzers Hochvakuum PROCESS FOR PRODUCING GOLD-COLORED COATINGS.

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1951362A1 (en) * 1969-10-11 1971-06-16 Heraeus Gmbh W C Coated writing pens

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
CHEMICAL ABSTRACTS, Volume 102, No. 8, 25 February 1985, Columbus, Ohio (US) J. GOEBEL: "Some Examples for the Application of Surface Analysis in Thin Film Technology", see page 561, Abstract 70473e, & Fresenius Zeitschrift fur Analytische Chemie, 1984, 319(6,7) 771-6 *
CHEMICAL ABSTRACTS, Volume 91, No. 6, 06 August 1979, Columbus, Ohio (US) J.J. CUOMO et al.: "Reactive Sputtering of Carbon and Carbide Targets in Nitrogen", see page 576, Abstract 47995x, & J. Vac. Sci. Technol. 1979, 16(2) 299-302 (Eng) *
CHEMICAL ABSTRACTS, Volume 96, No. 22, 31 May 1982, Columbus, Ohio (US) A. MUMTAZ et al.: "Color of Titanium Nitride Prepared by Reactived d.c. Magnetron Sputtering", see page 683, Abstract 190846h, & J. Vac. Sci. Tchnol. 1982, 20(3) 345-8 (Eng.) *
Metal Science & Heat Treatment, Volume 22, No 3/4, March/April 1980, New York (US), G.F. PROSTASEVICH et al.: "Decorative Diffusion Coating", pages 179-184, see pages 183, 184: "Deposition of Titanium Carbonitride" *
Thin Solid Films, Volume 105, published by Elsevier 1983, (NL) J.E. SUNDGREN et al.: "Mechanism of Reactive Sputtering of Titanium Nitride and Titanium Carbide II: Morphology and Structure", pages 367-384, see page 368 "Experimental Details", page 376; page 377; figure 10 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0413853A1 (en) * 1989-08-21 1991-02-27 Balzers Aktiengesellschaft Workpiece coated with a solid solution crystalline layer, process and apparatus for its manufacture
AU645758B2 (en) * 1989-08-21 1994-01-27 Balzers Aktiengesellschaft Workpiece coated with a solid solution layer, method for its production, use of the workpiece, and apparatus for carrying out the method
DE4020595A1 (en) * 1990-06-28 1992-01-09 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Electric reflector lamp for accent lighting
CN108505004A (en) * 2018-05-04 2018-09-07 武汉理工大学 Stainless steel knife preparation method with chromatic colour TiN coatings

Also Published As

Publication number Publication date
DE3425467C2 (en) 1988-06-30
EP0190179A1 (en) 1986-08-13
DE3425467A1 (en) 1986-01-23

Similar Documents

Publication Publication Date Title
DE3428951C2 (en)
DE3535022C2 (en) Metallic article with coating layers and method for the production by ion vapor deposition
WO1997023661A2 (en) Process for producing organically mofified oxide, oxynitride or nitride layers by vacuum deposition
EP0625588B1 (en) Plasmapolymer layer sequence as hard material layer with specifically adjustable adhesion behaviour
WO1986000649A1 (en) Method for improving the colour effect of titanium nitride layers
CH664377A5 (en) DECORATIVE BLACK WEAR PROTECTIVE LAYER.
EP0924316B1 (en) Method for depositing coating systems
CH675258A5 (en)
EP0832993A1 (en) Layer system, process for manufacturing it and metal substrate with such a layer system
DE3017713A1 (en) Metallising polymer films - by sputtering adhesion promoting layer onto film and then vacuum depositing metal, used for resistance layers
DE3728836C2 (en) GOLD-COLORED COATING. METHOD FOR THEIR PRODUCTION AND THEIR APPLICATION TO ARTICLES
DE4417235A1 (en) Plasma polymer layer sequence as hard material layer having adhesion behaviour which can be set in a defined way
DE3907693A1 (en) METHOD FOR PRODUCING TUNGSTEN CARBIDE BY CHEMICAL VAPOR DEPOSITION
DE4205017A1 (en) Prodn. of decorative gold@ alloy layers - with process parameter alteration to modify layer characteristics
WO2021032493A1 (en) Temperable coatings having diamond-like carbon and deposition by means of high-power impulse magnetron sputtering
DE2830723A1 (en) METHOD FOR PRODUCING INFRARED REFLECTING DISCS BY CATODENSION
EP2753727A1 (en) Decorative part for motor vehicles
DE3413663A1 (en) ALLOY AND GOLD PLATING METHOD
DE19544498C2 (en) Process for the plasma-assisted deposition of thin layers
EP0793735A1 (en) Packing element, in particular for shutting-off and regulating means, and process for producing the same
EP2468915B1 (en) Method for separating dielectric layers in a vacuum and use of the method
DE3727279C2 (en) Black-silver-colored coating for articles, process for producing such a coating and its application
EP0201508B1 (en) Method for the preparation of gold-coloured titanium nitride layers
DE19634334C1 (en) Reflection coating on surface of optical reflectors
WO1996016202A1 (en) Packing element, in particular for shutting-off and regulating means, and process for producing the same

Legal Events

Date Code Title Description
AK Designated states

Designated state(s): DK JP US

AL Designated countries for regional patents

Designated state(s): AT BE CH DE FR GB IT LU NL SE