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USD710062S1 - Roller shaft for semiconductor cleaning - Google Patents

Roller shaft for semiconductor cleaning Download PDF

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Publication number
USD710062S1
USD710062S1 US29/408,194 US201129408194F USD710062S US D710062 S1 USD710062 S1 US D710062S1 US 201129408194 F US201129408194 F US 201129408194F US D710062 S USD710062 S US D710062S
Authority
US
United States
Prior art keywords
roller shaft
semiconductor cleaning
view
semiconductor
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/408,194
Inventor
Tomoatsu Ishibashi
Fumitoshi Oikawa
Hideaki Tanaka
Teruaki HOMBO
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Assigned to EBARA CORPORATION reassignment EBARA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HOMBO, TERUAKI, ISHIBASHI, TOMOATSU, OIKAWA, FUMITOSHI, TANAKA, HIDEAKI
Application granted granted Critical
Publication of USD710062S1 publication Critical patent/USD710062S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a front elevational view of a roller shaft for semiconductor cleaning showing our new design;
FIG. 2 is a rear elevation view thereof;
FIG. 3 is a top plan view thereof, the bottom view being a mirror image thereof;
FIG. 4 is a right side view thereof, the left side view being a mirror image thereof;
FIG. 5 is a cross sectional view taken along the line 5-5 of FIG. 1;
FIG. 6 is a front perspective view, at an enlarged scale;
FIG. 7 is a front elevational view thereof, at an enlarged scale;
FIG. 8 is an enlarged view of the area 8 seen in FIG. 3; and,
FIG. 9 is an enlarged view of the area 9 seen in FIG. 4.
The broken line showing depicts environmental subject matter only and forms no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a roller shaft for semiconductor cleaning, as shown and described.
US29/408,194 2011-06-09 2011-12-08 Roller shaft for semiconductor cleaning Active USD710062S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-013045 2011-06-09
JP2011013045 2011-06-09

Publications (1)

Publication Number Publication Date
USD710062S1 true USD710062S1 (en) 2014-07-29

Family

ID=51212585

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/408,194 Active USD710062S1 (en) 2011-06-09 2011-12-08 Roller shaft for semiconductor cleaning

Country Status (2)

Country Link
US (1) USD710062S1 (en)
TW (1) TWD148170S (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD728177S1 (en) * 2013-02-01 2015-04-28 Ebara Corporation Roller shaft for substrate cleaning
USD735427S1 (en) * 2013-02-01 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
USD769108S1 (en) * 2014-08-06 2016-10-18 Eberl Iron Works, Inc. Rooftop support base
USD959374S1 (en) * 2020-11-13 2022-08-02 Electrical Grid Monitoring Ltd. BNC cap assembly
USD961516S1 (en) * 2020-06-26 2022-08-23 Omron Corporation Insulation monitoring device
USD992845S1 (en) * 2020-05-15 2023-07-18 Ebara Corporation Roller shaft for substrate cleaning
USD994604S1 (en) * 2020-09-25 2023-08-08 Easytork Automation Corporation Actuator vane shaft
USD1078818S1 (en) * 2024-10-28 2025-06-10 Xiaoqiang Lin Jack block
USD1080366S1 (en) * 2023-05-09 2025-06-24 Duet Doctor Limited Tool bracket

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6330729B1 (en) * 1998-04-06 2001-12-18 Micron Technology, Inc. Brush alignment platform
US6467120B1 (en) * 1999-09-08 2002-10-22 International Business Machines Corporation Wafer cleaning brush profile modification
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6523210B1 (en) * 2000-04-05 2003-02-25 Nicholas Andros Surface charge controlling apparatus for wafer cleaning
US6598255B1 (en) * 1998-05-22 2003-07-29 Aion Co., Ltd. Cleaning rotary brush
US6802099B2 (en) * 2000-04-12 2004-10-12 Ebara Corporation Cleaning member and cylindrical cleaning element
US6842933B2 (en) * 2000-07-14 2005-01-18 Ebara Corporation Substrate cleaning apparatus and cleaning member
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
US8092730B2 (en) * 2005-12-06 2012-01-10 Entegris, Inc. Molded rotatable base for a porous pad
US8372210B2 (en) * 2003-10-27 2013-02-12 Applied Materials, Inc. Post CMP scrubbing of substrates
US8496758B2 (en) * 2006-01-17 2013-07-30 Fujitsu Semiconductor Limited Cleaning apparatus and cleaning method for wafer
US8533895B2 (en) * 2003-08-08 2013-09-17 Entegris, Inc. Methods and materials for making a monolithic porous pad cast onto a rotatable base
US20130255721A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Concave nodule sponge brush
US20130255720A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers

Patent Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
US6684447B2 (en) * 1996-11-08 2004-02-03 Aion Co., Ltd. Cleaning sponge roller
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6330729B1 (en) * 1998-04-06 2001-12-18 Micron Technology, Inc. Brush alignment platform
US6598255B1 (en) * 1998-05-22 2003-07-29 Aion Co., Ltd. Cleaning rotary brush
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6464796B2 (en) * 1998-07-09 2002-10-15 Lam Research Corporation Methods for applying fluid through a brush interflow distributor
US6467120B1 (en) * 1999-09-08 2002-10-22 International Business Machines Corporation Wafer cleaning brush profile modification
US6543084B2 (en) * 1999-12-03 2003-04-08 Lam Research Corporation Wafer scrubbing brush core
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6523210B1 (en) * 2000-04-05 2003-02-25 Nicholas Andros Surface charge controlling apparatus for wafer cleaning
US6802099B2 (en) * 2000-04-12 2004-10-12 Ebara Corporation Cleaning member and cylindrical cleaning element
US6842933B2 (en) * 2000-07-14 2005-01-18 Ebara Corporation Substrate cleaning apparatus and cleaning member
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
US8444890B2 (en) * 2001-04-20 2013-05-21 Hydrofera, Llc Method of manufacturing a foam composition roller brush
US8533895B2 (en) * 2003-08-08 2013-09-17 Entegris, Inc. Methods and materials for making a monolithic porous pad cast onto a rotatable base
US8372210B2 (en) * 2003-10-27 2013-02-12 Applied Materials, Inc. Post CMP scrubbing of substrates
US8092730B2 (en) * 2005-12-06 2012-01-10 Entegris, Inc. Molded rotatable base for a porous pad
US8460475B2 (en) * 2005-12-06 2013-06-11 Entegris, Inc. Molded rotatable base for a porous pad
US8496758B2 (en) * 2006-01-17 2013-07-30 Fujitsu Semiconductor Limited Cleaning apparatus and cleaning method for wafer
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
US20130255721A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Concave nodule sponge brush
US20130255720A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD728177S1 (en) * 2013-02-01 2015-04-28 Ebara Corporation Roller shaft for substrate cleaning
USD735427S1 (en) * 2013-02-01 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
USD769108S1 (en) * 2014-08-06 2016-10-18 Eberl Iron Works, Inc. Rooftop support base
USD992845S1 (en) * 2020-05-15 2023-07-18 Ebara Corporation Roller shaft for substrate cleaning
USD961516S1 (en) * 2020-06-26 2022-08-23 Omron Corporation Insulation monitoring device
USD994604S1 (en) * 2020-09-25 2023-08-08 Easytork Automation Corporation Actuator vane shaft
USD959374S1 (en) * 2020-11-13 2022-08-02 Electrical Grid Monitoring Ltd. BNC cap assembly
USD1080366S1 (en) * 2023-05-09 2025-06-24 Duet Doctor Limited Tool bracket
USD1078818S1 (en) * 2024-10-28 2025-06-10 Xiaoqiang Lin Jack block

Also Published As

Publication number Publication date
TWD148170S (en) 2012-07-11

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