[go: up one dir, main page]

USD664172S1 - Dome assembly for a deposition chamber - Google Patents

Dome assembly for a deposition chamber Download PDF

Info

Publication number
USD664172S1
USD664172S1 US29/350,406 US35040609F USD664172S US D664172 S1 USD664172 S1 US D664172S1 US 35040609 F US35040609 F US 35040609F US D664172 S USD664172 S US D664172S
Authority
US
United States
Prior art keywords
deposition chamber
dome assembly
view
dome
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/350,406
Inventor
Tetsuya Ishikawa
David H. Quach
Anzhong Chang
Olga Kryliouk
Yuriy Melnik
Harsukhdeep S. Ratia
Son T. Nguyen
Lily Pang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/350,406 priority Critical patent/USD664172S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NGUYEN, SON T., RATIA, HARSUKHDEEP S., CHANG, ANZHONG, ISHIKAWA, TETSUYA, KRYLIOUK, OLGA, MELNIK, YURIY, PANG, LILY, QUACH, DAVID H.
Priority to TW099301936F priority patent/TWD142477S1/en
Application granted granted Critical
Publication of USD664172S1 publication Critical patent/USD664172S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

FIG. 1 is an isometric bottom view of a dome assembly for a deposition chamber.
FIG. 2 is an isometric top view of the dome assembly for a deposition chamber of FIG. 1.
FIG. 3 is a top plan view of the dome assembly for a deposition chamber of FIG. 2.
FIG. 4 is a front elevation view of the dome assembly for a deposition chamber of FIG. 2.
FIG. 5 is a back elevation view of the dome assembly for a deposition chamber of FIG. 2.
FIG. 6 is a side elevation view of the dome assembly for a deposition chamber of FIG. 2. The opposing side elevation view is a mirror-image.
FIG. 7 is a side elevation view of the dome assembly for a deposition chamber of FIG. 1.
FIG. 8 is a bottom plan view of the dome assembly for a deposition chamber of FIG. 1.
FIG. 9 is a cross-sectional view taken along section 9-9 of FIG. 3.
FIG. 10 is a cross-sectional view taken along section 10-10 of FIG. 3.
FIG. 11 is a cross-sectional view taken along section 11-11 of FIG. 6.
FIG. 12 is a cross-sectional view taken along section 12-12 of FIG. 6; and,
FIG. 13 is a cross-sectional view taken along section 13-13 of FIG. 7.
The broken lines in the Figures indicating tubular elements disposed internal to other tubular elements do not form part of the claimed design. Transparent materials included in certain elements are indicated by surface treatment and/or are apparent from the Figures.

Claims (1)

  1. The ornamental design for a dome assembly for a deposition chamber, as shown and described.
US29/350,406 2009-11-16 2009-11-16 Dome assembly for a deposition chamber Active USD664172S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US29/350,406 USD664172S1 (en) 2009-11-16 2009-11-16 Dome assembly for a deposition chamber
TW099301936F TWD142477S1 (en) 2009-11-16 2010-04-16 Dome assembly for a deposition chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/350,406 USD664172S1 (en) 2009-11-16 2009-11-16 Dome assembly for a deposition chamber

Publications (1)

Publication Number Publication Date
USD664172S1 true USD664172S1 (en) 2012-07-24

Family

ID=46513464

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/350,406 Active USD664172S1 (en) 2009-11-16 2009-11-16 Dome assembly for a deposition chamber

Country Status (2)

Country Link
US (1) USD664172S1 (en)
TW (1) TWD142477S1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD717850S1 (en) * 2013-03-13 2014-11-18 Shimadzu Corporation Deposition machine

Citations (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3063867A (en) 1958-12-16 1962-11-13 Western Electric Co Deposition and measurement of layer thickness
USD329839S (en) 1990-01-31 1992-09-29 Hohner Automation Societe Anonyme Incremental coder
US5167718A (en) * 1988-06-23 1992-12-01 Jeffrey Stewart Parylene deposition chamber and method of use
US5306345A (en) * 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers
US5359788A (en) 1993-12-22 1994-11-01 Gell Jr Harold A Coffee roaster
US5636320A (en) 1995-05-26 1997-06-03 International Business Machines Corporation Sealed chamber with heating lamps provided within transparent tubes
US5641358A (en) * 1995-10-10 1997-06-24 Stewart; Jeffrey Modular parylene deposition apparatus having vapor deposition chamber extension
US6286451B1 (en) 1997-05-29 2001-09-11 Applied Materials, Inc. Dome: shape and temperature controlled surfaces
US6406544B1 (en) * 1988-06-23 2002-06-18 Jeffrey Stewart Parylene deposition chamber and method of use
US20020164423A1 (en) 2001-03-19 2002-11-07 Chiang Tony P. Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
US20030000545A1 (en) * 2001-06-28 2003-01-02 International Business Machines Corporation Method for cleaning and preconditioning a chemical vapor deposition chamber dome
US6517634B2 (en) 2000-02-28 2003-02-11 Applied Materials, Inc. Chemical vapor deposition chamber lid assembly
TW555877B (en) 2000-08-07 2003-10-01 Shipley Co Llc A method of producing high aspect ratio domes by vapor deposition
US20040134427A1 (en) * 2003-01-09 2004-07-15 Derderian Garo J. Deposition chamber surface enhancement and resulting deposition chambers
US20050150452A1 (en) * 2004-01-14 2005-07-14 Soovo Sen Process kit design for deposition chamber
KR100578089B1 (en) 2004-12-22 2006-05-10 주식회사 시스넥스 Hydride Vapor Deposition Reactor
US20060096857A1 (en) * 2004-11-08 2006-05-11 Ilya Lavitsky Physical vapor deposition chamber having a rotatable substrate pedestal
US20060162661A1 (en) 2005-01-22 2006-07-27 Applied Materials, Inc. Mixing energized and non-energized gases for silicon nitride deposition
JP2007039272A (en) 2005-08-03 2007-02-15 Furukawa Co Ltd Hydride vapor growth system, method for producing group iii nitride semiconductor substrate and group iii nitride semiconductor substrate
US20070119373A1 (en) * 2005-07-29 2007-05-31 Ajay Kumar Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same
JP2007154297A (en) 2005-12-08 2007-06-21 Tokyo Electron Ltd Film deposition method and film deposition system
US20070227878A1 (en) * 2006-03-29 2007-10-04 Roger Hamamjy Forming ovonic threshold switches with reduced deposition chamber gas pressure
US20080050889A1 (en) 2006-08-24 2008-02-28 Applied Materials, Inc. Hotwall reactor and method for reducing particle formation in GaN MOCVD
JP2008066490A (en) 2006-09-06 2008-03-21 Nippon Emc Ltd Vapor phase growing device
US7364991B2 (en) 2006-04-27 2008-04-29 Applied Materials, Inc. Buffer-layer treatment of MOCVD-grown nitride structures
US7368368B2 (en) 2004-08-18 2008-05-06 Cree, Inc. Multi-chamber MOCVD growth apparatus for high performance/high throughput
US20080220150A1 (en) * 2007-03-05 2008-09-11 Applied Materials, Inc. Microbatch deposition chamber with radiant heating
US20100272893A1 (en) * 2009-04-28 2010-10-28 Ferrotec (Usa) Corporation Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber

Patent Citations (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3063867A (en) 1958-12-16 1962-11-13 Western Electric Co Deposition and measurement of layer thickness
US6406544B1 (en) * 1988-06-23 2002-06-18 Jeffrey Stewart Parylene deposition chamber and method of use
US5167718A (en) * 1988-06-23 1992-12-01 Jeffrey Stewart Parylene deposition chamber and method of use
USD329839S (en) 1990-01-31 1992-09-29 Hohner Automation Societe Anonyme Incremental coder
US5306345A (en) * 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers
US5359788A (en) 1993-12-22 1994-11-01 Gell Jr Harold A Coffee roaster
US5636320A (en) 1995-05-26 1997-06-03 International Business Machines Corporation Sealed chamber with heating lamps provided within transparent tubes
US5641358A (en) * 1995-10-10 1997-06-24 Stewart; Jeffrey Modular parylene deposition apparatus having vapor deposition chamber extension
US6286451B1 (en) 1997-05-29 2001-09-11 Applied Materials, Inc. Dome: shape and temperature controlled surfaces
US6517634B2 (en) 2000-02-28 2003-02-11 Applied Materials, Inc. Chemical vapor deposition chamber lid assembly
TW555877B (en) 2000-08-07 2003-10-01 Shipley Co Llc A method of producing high aspect ratio domes by vapor deposition
US20020164423A1 (en) 2001-03-19 2002-11-07 Chiang Tony P. Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
US20030000545A1 (en) * 2001-06-28 2003-01-02 International Business Machines Corporation Method for cleaning and preconditioning a chemical vapor deposition chamber dome
US20040134427A1 (en) * 2003-01-09 2004-07-15 Derderian Garo J. Deposition chamber surface enhancement and resulting deposition chambers
US20050150452A1 (en) * 2004-01-14 2005-07-14 Soovo Sen Process kit design for deposition chamber
US7368368B2 (en) 2004-08-18 2008-05-06 Cree, Inc. Multi-chamber MOCVD growth apparatus for high performance/high throughput
US20060096857A1 (en) * 2004-11-08 2006-05-11 Ilya Lavitsky Physical vapor deposition chamber having a rotatable substrate pedestal
KR100578089B1 (en) 2004-12-22 2006-05-10 주식회사 시스넥스 Hydride Vapor Deposition Reactor
US20060162661A1 (en) 2005-01-22 2006-07-27 Applied Materials, Inc. Mixing energized and non-energized gases for silicon nitride deposition
US20070119373A1 (en) * 2005-07-29 2007-05-31 Ajay Kumar Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same
JP2007039272A (en) 2005-08-03 2007-02-15 Furukawa Co Ltd Hydride vapor growth system, method for producing group iii nitride semiconductor substrate and group iii nitride semiconductor substrate
JP2007154297A (en) 2005-12-08 2007-06-21 Tokyo Electron Ltd Film deposition method and film deposition system
US20070227878A1 (en) * 2006-03-29 2007-10-04 Roger Hamamjy Forming ovonic threshold switches with reduced deposition chamber gas pressure
US7364991B2 (en) 2006-04-27 2008-04-29 Applied Materials, Inc. Buffer-layer treatment of MOCVD-grown nitride structures
US20080050889A1 (en) 2006-08-24 2008-02-28 Applied Materials, Inc. Hotwall reactor and method for reducing particle formation in GaN MOCVD
JP2008066490A (en) 2006-09-06 2008-03-21 Nippon Emc Ltd Vapor phase growing device
US20080220150A1 (en) * 2007-03-05 2008-09-11 Applied Materials, Inc. Microbatch deposition chamber with radiant heating
US20100272893A1 (en) * 2009-04-28 2010-10-28 Ferrotec (Usa) Corporation Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
International search report and written opinion for PCT/US2010/030492 dated Oct. 27, 2010.
International search report and written opinion for PCT/US2010/030496 dated Oct. 27, 2010.
International search report and written opinion for PCT/US2010/032597 dated Dec. 1, 2010.
Office action for Taiwan patent application No. 099301936 dated Sep. 27, 2010.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD717850S1 (en) * 2013-03-13 2014-11-18 Shimadzu Corporation Deposition machine

Also Published As

Publication number Publication date
TWD142477S1 (en) 2011-09-01

Similar Documents

Publication Publication Date Title
USD563560S1 (en) Petri dish
USD655260S1 (en) Gas-separating plate for reactor for manufacturing semiconductor
USD655261S1 (en) Gas-separating plate for reactor for manufacturing semiconductor
USD632354S1 (en) Water float
USD681804S1 (en) Inhaler
USD605795S1 (en) Flashlight
USD648427S1 (en) Ring gasket
USD610878S1 (en) Food container
USD597791S1 (en) Double-walled glass
USD597792S1 (en) Double-walled glass
USD652596S1 (en) Handle
USD646150S1 (en) Grommet
USD594695S1 (en) Upper housing of a grill
USD625776S1 (en) Showerhead
USD635668S1 (en) Endoscope sheath assembly
USD616268S1 (en) Flat top rounded cup tray
USD616165S1 (en) Part of a vacuum cleaner
USD611759S1 (en) Multi-bone themed baking pan
USD599610S1 (en) Insulated baking pan
USD604572S1 (en) Excavator spade
USD609981S1 (en) Salad spinner
USD614451S1 (en) Wine cover
USD623488S1 (en) Drain spade
USD616265S1 (en) Flat top rounded cup tray
USD605797S1 (en) Flashlight