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USD1082731S1 - Susceptor - Google Patents

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Publication number
USD1082731S1
USD1082731S1 US29/896,281 US202329896281F USD1082731S US D1082731 S1 USD1082731 S1 US D1082731S1 US 202329896281 F US202329896281 F US 202329896281F US D1082731 S USD1082731 S US D1082731S
Authority
US
United States
Prior art keywords
susceptor
view
elevational view
ornamental design
side elevational
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/896,281
Inventor
Kunihiko Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nuflare Technology Inc
Original Assignee
Nuflare Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nuflare Technology Inc filed Critical Nuflare Technology Inc
Assigned to NUFLARE TECHNOLOGY, INC. reassignment NUFLARE TECHNOLOGY, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SUZUKI, KUNIHIKO
Application granted granted Critical
Publication of USD1082731S1 publication Critical patent/USD1082731S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a perspective view of a susceptor showing my new design
FIG. 2 is a front elevational view thereof,
FIG. 3 is a rear elevational view thereof,
FIG. 4 is a left side elevational view thereof,
FIG. 5 is a right side elevational view thereof,
FIG. 6 is a top plan view thereof thereof,
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is an enlarged end face view taken along line 8-8 thereof.

Claims (1)

    CLAIM
  1. The ornamental design for a susceptor as shown and described.
US29/896,281 2023-01-11 2023-06-30 Susceptor Active USD1082731S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023-000282D 2023-01-11
JP2023000282F JP1746403S (en) 2023-01-11 2023-01-11 Susceptor

Publications (1)

Publication Number Publication Date
USD1082731S1 true USD1082731S1 (en) 2025-07-08

Family

ID=86720908

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/896,281 Active USD1082731S1 (en) 2023-01-11 2023-06-30 Susceptor

Country Status (2)

Country Link
US (1) USD1082731S1 (en)
JP (1) JP1746403S (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1110977S1 (en) * 2024-02-13 2026-02-03 Nuflare Technology, Inc. Susceptor
USD1112119S1 (en) * 2024-02-13 2026-02-10 Nuflare Technology, Inc. Susceptor

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1746405S (en) * 2023-01-11 2023-06-15 Susceptor cover
JP1746404S (en) * 2023-01-11 2023-06-15 Susceptor cover base
JP1746403S (en) * 2023-01-11 2023-06-15 Susceptor
JP1746408S (en) * 2023-01-11 2023-06-15 Susceptor

Citations (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3295559A (en) * 1962-09-17 1967-01-03 Union Carbide Corp Induction heating susceptor and method for producing same
US4978567A (en) * 1988-03-31 1990-12-18 Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc. Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
US5584936A (en) * 1995-12-14 1996-12-17 Cvd, Incorporated Susceptor for semiconductor wafer processing
USD404370S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Cap for use in a semiconductor wafer heat processing apparatus
US6214122B1 (en) * 1997-03-17 2001-04-10 Motorola, Inc. Rapid thermal processing susceptor
US20030085223A1 (en) * 2001-09-28 2003-05-08 Neilson Zeng Patterned microwave susceptor element and microwave container incorporating same
US20040011293A1 (en) * 2002-07-16 2004-01-22 International Business Machines Corporation Susceptor pocket with beveled projection sidewall
US6815352B1 (en) * 1999-11-09 2004-11-09 Shin-Etsu Chemical Co., Ltd. Silicon focus ring and method for producing the same
US20050152089A1 (en) * 2003-12-26 2005-07-14 Ngk Insulators, Ltd. Electrostatic chuck and manufacturing method for the same, and alumina sintered member and manufacturing method for the same
US20050217585A1 (en) * 2004-04-01 2005-10-06 Blomiley Eric R Substrate susceptor for receiving a substrate to be deposited upon
US20050223994A1 (en) * 2004-04-08 2005-10-13 Blomiley Eric R Substrate susceptors for receiving semiconductor substrates to be deposited upon and methods of depositing materials over semiconductor substrates
US20060057826A1 (en) * 2002-12-09 2006-03-16 Koninklijke Philips Electronics N.V. System and method for suppression of wafer temperature drift in cold-wall cvd systems
US20070144442A1 (en) * 2005-12-22 2007-06-28 Kyocera Corporation Susceptor
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD557226S1 (en) * 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD559994S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
USD559993S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
US7459057B2 (en) * 1998-05-15 2008-12-02 Applied Materials, Inc. Substrate retainer
US20090050272A1 (en) * 2007-08-24 2009-02-26 Applied Materials, Inc. Deposition ring and cover ring to extend process components life and performance for process chambers
US20100044974A1 (en) * 2008-08-19 2010-02-25 Lam Research Corporation Edge rings for electrostatic chucks
USD646764S1 (en) * 2010-11-04 2011-10-11 Faster S.P.A. Sealing gasket
US20120263569A1 (en) * 2011-04-14 2012-10-18 Scott Wayne Priddy Substrate holders and methods of substrate mounting
TWD155015S (en) * 2011-09-30 2013-08-01 東京威力科創股份有限公司 Focusing ring
USD709538S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709537S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709539S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
US20140262193A1 (en) * 2013-03-13 2014-09-18 Techest Co., Ltd. Edge ring cooling module for semi-conductor manufacture chuck
USD724553S1 (en) * 2013-09-13 2015-03-17 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
US20160083840A1 (en) * 2014-09-24 2016-03-24 Applied Materials, Inc. Graphite susceptor
US20160133504A1 (en) * 2014-11-12 2016-05-12 Applied Materials, Inc. Susceptor design to reduce edge thermal peak
US9376752B2 (en) * 2012-04-06 2016-06-28 Applied Materials, Inc. Edge ring for a deposition chamber
USD767234S1 (en) * 2015-03-02 2016-09-20 Entegris, Inc. Wafer support ring
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
US9558982B2 (en) * 2012-10-24 2017-01-31 Applied Materials, Inc. Minimal contact edge ring for rapid thermal processing
USD783922S1 (en) * 2014-12-08 2017-04-11 Entegris, Inc. Wafer support ring
US20170117228A1 (en) * 2015-10-27 2017-04-27 Siltronic Ag Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
TWD189313S (en) * 2017-04-07 2018-03-21 Ａｓｍ知識產權私人控股有限公司 Susceptor for semiconductor substrate processing apparatus
USD840364S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD861757S1 (en) * 2015-12-28 2019-10-01 Ntn Corporation Inner ring for tapered roller bearing
USD870314S1 (en) * 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD871609S1 (en) * 2017-08-31 2019-12-31 Hitachi High-Technologies Corporation Electrode plate peripheral ring for a plasma processing apparatus
USD876504S1 (en) * 2017-04-03 2020-02-25 Asm Ip Holding B.V. Exhaust flow control ring for semiconductor deposition apparatus
USD888903S1 (en) * 2018-12-17 2020-06-30 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
US20210066113A1 (en) * 2017-09-07 2021-03-04 Showa Denko K.K. Susceptor, cvd apparatus, and method for manufacturing epitaxial wafer
US20210202294A1 (en) * 2019-12-26 2021-07-01 Showa Denko K.K. Susceptor
US20210225688A1 (en) * 2020-01-21 2021-07-22 Asm Ip Holding B.V. Susceptor with sidewall humps for uniform deposition
USD933619S1 (en) * 2018-10-12 2021-10-19 Valqua, Ltd. Seal member for semiconductor production apparatus
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
US20210375591A1 (en) * 2018-04-20 2021-12-02 Lam Research Corporation Edge exclusion control
US20210375663A1 (en) * 2018-10-04 2021-12-02 Toyo Tanso Co., Ltd. Susceptor
US20220013337A1 (en) * 2020-07-08 2022-01-13 Taiwan Semiconductor Manufacturing Company Limited Plasma etcher edge ring with a chamfer geometry and impedance design
USD948463S1 (en) * 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US20220246462A1 (en) * 2019-04-16 2022-08-04 Tokai Carbon Korea Co., Ltd Sic edge ring
US11469118B2 (en) * 2017-06-13 2022-10-11 Ngk Insulators, Ltd. Member for semiconductor manufacturing apparatus
US20220361300A1 (en) * 2021-05-10 2022-11-10 The Boeing Company Induction-heating system including a susceptor for generating induction heating below a selected curie temperature
US20220380263A1 (en) * 2020-02-12 2022-12-01 Skc Solmics Co., Ltd. Ceramic component and plasma etching apparatus comprising same
US20220399190A1 (en) * 2021-06-10 2022-12-15 Ngk Insulators, Ltd. Focus ring placement table
JP1741176S (en) * 2022-10-20 2023-04-06 Cover base for susceptor
JP1741174S (en) 2022-10-20 2023-04-06 Susceptor
JP1741173S (en) * 2022-10-20 2023-04-06 Heaters for heating semiconductor wafers and susceptors
JP1741175S (en) * 2022-10-20 2023-04-06 Susceptor
JP1745924S (en) 2022-10-20 2023-06-08 Susceptor
JP1745873S (en) 2022-10-20 2023-06-08 Susceptor
JP1746403S (en) * 2023-01-11 2023-06-15 Susceptor
JP1746406S (en) * 2023-01-11 2023-06-15 Susceptor unit
USD992615S1 (en) * 2018-12-07 2023-07-18 Tokyo Electron Limited Focus ring
USD992614S1 (en) * 2018-12-06 2023-07-18 Tokyo Electron Limited Focus ring
USD1016761S1 (en) * 2020-12-10 2024-03-05 Nuflare Technology, Inc. Top plate for semiconductor manufacturaing equipment
US20240134292A1 (en) * 2022-10-20 2024-04-25 Semes Co., Ltd. Apparatus for treating a substrate and method for improving cooling efficiency thereof
US20240145281A1 (en) * 2022-10-27 2024-05-02 Applied Materials, Inc. Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging
USD1034491S1 (en) * 2020-07-27 2024-07-09 Applied Materials, Inc. Edge ring
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus
US20240243002A1 (en) * 2023-01-16 2024-07-18 Ngk Insulators, Ltd. Ceramic susceptor
USD1037186S1 (en) * 2021-10-22 2024-07-30 Nuflare Technology, Inc. Susceptor ring
US20240258154A1 (en) * 2023-02-01 2024-08-01 Asm Ip Holding B.V. Method, assembly and system for film deposition and control
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
US20240282618A1 (en) * 2023-02-20 2024-08-22 Kioxia Corporation Jig, semiconductor manufacturing apparatus, and method of operating semiconductor manufacturing apparatus
USD1040304S1 (en) * 2018-12-17 2024-08-27 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD1047884S1 (en) * 2021-10-22 2024-10-22 Nuflare Technology, Inc. Susceptor cover
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1053230S1 (en) * 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber

Patent Citations (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3295559A (en) * 1962-09-17 1967-01-03 Union Carbide Corp Induction heating susceptor and method for producing same
US4978567A (en) * 1988-03-31 1990-12-18 Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc. Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
US5584936A (en) * 1995-12-14 1996-12-17 Cvd, Incorporated Susceptor for semiconductor wafer processing
US6214122B1 (en) * 1997-03-17 2001-04-10 Motorola, Inc. Rapid thermal processing susceptor
USD404370S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Cap for use in a semiconductor wafer heat processing apparatus
US7459057B2 (en) * 1998-05-15 2008-12-02 Applied Materials, Inc. Substrate retainer
US6815352B1 (en) * 1999-11-09 2004-11-09 Shin-Etsu Chemical Co., Ltd. Silicon focus ring and method for producing the same
US20030085223A1 (en) * 2001-09-28 2003-05-08 Neilson Zeng Patterned microwave susceptor element and microwave container incorporating same
US20040011293A1 (en) * 2002-07-16 2004-01-22 International Business Machines Corporation Susceptor pocket with beveled projection sidewall
US20060057826A1 (en) * 2002-12-09 2006-03-16 Koninklijke Philips Electronics N.V. System and method for suppression of wafer temperature drift in cold-wall cvd systems
US20050152089A1 (en) * 2003-12-26 2005-07-14 Ngk Insulators, Ltd. Electrostatic chuck and manufacturing method for the same, and alumina sintered member and manufacturing method for the same
US20050217585A1 (en) * 2004-04-01 2005-10-06 Blomiley Eric R Substrate susceptor for receiving a substrate to be deposited upon
US20050223994A1 (en) * 2004-04-08 2005-10-13 Blomiley Eric R Substrate susceptors for receiving semiconductor substrates to be deposited upon and methods of depositing materials over semiconductor substrates
USD559994S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
USD559993S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
USD557226S1 (en) * 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
US20070144442A1 (en) * 2005-12-22 2007-06-28 Kyocera Corporation Susceptor
US20090050272A1 (en) * 2007-08-24 2009-02-26 Applied Materials, Inc. Deposition ring and cover ring to extend process components life and performance for process chambers
US20100044974A1 (en) * 2008-08-19 2010-02-25 Lam Research Corporation Edge rings for electrostatic chucks
USD646764S1 (en) * 2010-11-04 2011-10-11 Faster S.P.A. Sealing gasket
US20120263569A1 (en) * 2011-04-14 2012-10-18 Scott Wayne Priddy Substrate holders and methods of substrate mounting
TWD155015S (en) * 2011-09-30 2013-08-01 東京威力科創股份有限公司 Focusing ring
USD709536S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709537S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709539S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709538S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
US9376752B2 (en) * 2012-04-06 2016-06-28 Applied Materials, Inc. Edge ring for a deposition chamber
US9558982B2 (en) * 2012-10-24 2017-01-31 Applied Materials, Inc. Minimal contact edge ring for rapid thermal processing
US20140262193A1 (en) * 2013-03-13 2014-09-18 Techest Co., Ltd. Edge ring cooling module for semi-conductor manufacture chuck
USD724553S1 (en) * 2013-09-13 2015-03-17 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
US20160083840A1 (en) * 2014-09-24 2016-03-24 Applied Materials, Inc. Graphite susceptor
US20160133504A1 (en) * 2014-11-12 2016-05-12 Applied Materials, Inc. Susceptor design to reduce edge thermal peak
USD783922S1 (en) * 2014-12-08 2017-04-11 Entegris, Inc. Wafer support ring
USD767234S1 (en) * 2015-03-02 2016-09-20 Entegris, Inc. Wafer support ring
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
US20170117228A1 (en) * 2015-10-27 2017-04-27 Siltronic Ag Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer
US11380621B2 (en) * 2015-10-27 2022-07-05 Siltronic Ag Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer
USD861757S1 (en) * 2015-12-28 2019-10-01 Ntn Corporation Inner ring for tapered roller bearing
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD840364S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD876504S1 (en) * 2017-04-03 2020-02-25 Asm Ip Holding B.V. Exhaust flow control ring for semiconductor deposition apparatus
TWD189313S (en) * 2017-04-07 2018-03-21 Ａｓｍ知識產權私人控股有限公司 Susceptor for semiconductor substrate processing apparatus
USD830981S1 (en) * 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus
US11469118B2 (en) * 2017-06-13 2022-10-11 Ngk Insulators, Ltd. Member for semiconductor manufacturing apparatus
USD870314S1 (en) * 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD871609S1 (en) * 2017-08-31 2019-12-31 Hitachi High-Technologies Corporation Electrode plate peripheral ring for a plasma processing apparatus
US20210066113A1 (en) * 2017-09-07 2021-03-04 Showa Denko K.K. Susceptor, cvd apparatus, and method for manufacturing epitaxial wafer
US20210375591A1 (en) * 2018-04-20 2021-12-02 Lam Research Corporation Edge exclusion control
US20210375663A1 (en) * 2018-10-04 2021-12-02 Toyo Tanso Co., Ltd. Susceptor
USD933619S1 (en) * 2018-10-12 2021-10-19 Valqua, Ltd. Seal member for semiconductor production apparatus
USD948463S1 (en) * 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
USD992614S1 (en) * 2018-12-06 2023-07-18 Tokyo Electron Limited Focus ring
USD992615S1 (en) * 2018-12-07 2023-07-18 Tokyo Electron Limited Focus ring
USD1040304S1 (en) * 2018-12-17 2024-08-27 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD888903S1 (en) * 2018-12-17 2020-06-30 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
US20220246462A1 (en) * 2019-04-16 2022-08-04 Tokai Carbon Korea Co., Ltd Sic edge ring
US20210202294A1 (en) * 2019-12-26 2021-07-01 Showa Denko K.K. Susceptor
US20210225688A1 (en) * 2020-01-21 2021-07-22 Asm Ip Holding B.V. Susceptor with sidewall humps for uniform deposition
US20220380263A1 (en) * 2020-02-12 2022-12-01 Skc Solmics Co., Ltd. Ceramic component and plasma etching apparatus comprising same
US20220013337A1 (en) * 2020-07-08 2022-01-13 Taiwan Semiconductor Manufacturing Company Limited Plasma etcher edge ring with a chamfer geometry and impedance design
USD1034491S1 (en) * 2020-07-27 2024-07-09 Applied Materials, Inc. Edge ring
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD1016761S1 (en) * 2020-12-10 2024-03-05 Nuflare Technology, Inc. Top plate for semiconductor manufacturaing equipment
US20220361300A1 (en) * 2021-05-10 2022-11-10 The Boeing Company Induction-heating system including a susceptor for generating induction heating below a selected curie temperature
US20220399190A1 (en) * 2021-06-10 2022-12-15 Ngk Insulators, Ltd. Focus ring placement table
USD1047884S1 (en) * 2021-10-22 2024-10-22 Nuflare Technology, Inc. Susceptor cover
USD1037186S1 (en) * 2021-10-22 2024-07-30 Nuflare Technology, Inc. Susceptor ring
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1053230S1 (en) * 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
JP1741175S (en) * 2022-10-20 2023-04-06 Susceptor
JP1745873S (en) 2022-10-20 2023-06-08 Susceptor
JP1741176S (en) * 2022-10-20 2023-04-06 Cover base for susceptor
US20240134292A1 (en) * 2022-10-20 2024-04-25 Semes Co., Ltd. Apparatus for treating a substrate and method for improving cooling efficiency thereof
JP1741174S (en) 2022-10-20 2023-04-06 Susceptor
JP1741173S (en) * 2022-10-20 2023-04-06 Heaters for heating semiconductor wafers and susceptors
JP1745924S (en) 2022-10-20 2023-06-08 Susceptor
US20240145281A1 (en) * 2022-10-27 2024-05-02 Applied Materials, Inc. Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus
JP1746403S (en) * 2023-01-11 2023-06-15 Susceptor
JP1746406S (en) * 2023-01-11 2023-06-15 Susceptor unit
US20240243002A1 (en) * 2023-01-16 2024-07-18 Ngk Insulators, Ltd. Ceramic susceptor
US20240258154A1 (en) * 2023-02-01 2024-08-01 Asm Ip Holding B.V. Method, assembly and system for film deposition and control
US20240282618A1 (en) * 2023-02-20 2024-08-22 Kioxia Corporation Jig, semiconductor manufacturing apparatus, and method of operating semiconductor manufacturing apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Wafer Susceptor Semicorex, Date Mar. 13, 2023 [online], [retrieved Mar. 6, 2025], https://www.semicorex.com/products/Wafer-Susceptor.html (Year: 2023). *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1110977S1 (en) * 2024-02-13 2026-02-03 Nuflare Technology, Inc. Susceptor
USD1112119S1 (en) * 2024-02-13 2026-02-10 Nuflare Technology, Inc. Susceptor

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