US8783319B2 - Foreign substance removing device and die bonder equipped with the same - Google Patents
Foreign substance removing device and die bonder equipped with the same Download PDFInfo
- Publication number
- US8783319B2 US8783319B2 US13/224,536 US201113224536A US8783319B2 US 8783319 B2 US8783319 B2 US 8783319B2 US 201113224536 A US201113224536 A US 201113224536A US 8783319 B2 US8783319 B2 US 8783319B2
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- US
- United States
- Prior art keywords
- substrate
- cleaning nozzle
- cleaning
- transport path
- air outlet
- Prior art date
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- H10W72/071—
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- H10P72/0406—
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- H10P72/0446—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H10W72/0711—
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/14—Surface bonding means and/or assembly means with shaping, scarifying, or cleaning joining surface only
Definitions
- the present invention relates to a foreign substance removing device and a die bonder equipped with the same.
- the die bonder is an apparatus which bonds a die (silicon wafer chip integrating electric circuits) to a lead frame, substrate or the like (hereinafter, referred to as “substrate”) using solder, gold plate or resin as a bonding material.
- substrate a lead frame, substrate or the like
- solder gold plate or resin
- An engineering plastic is used as a die bond material (paste, film) for bonding the die and the substrate together. After positioning, the die is bonded to the lead frame or the like.
- a method of implementing bonding by using a resin as the bonding material is now predominant.
- solder or resin paste for die bonding (Ag epoxy and Ag polyimide) is used as an adhesive for fixing a semiconductor chip (IC, LSI) to the lead frame, ceramic case, substrate or the like.
- Dusts on a substrate surface lower the bonding force of an adhesive. It is therefore quite important in die mounting to remove the dusts (hereinafter, referred to as “foreign substances”) from the substrate before bonding the die onto the substrate. In addition, foreign particles of sizes in the range of 5 to 10 ⁇ m also cause voids in the adhesive.
- JP-A No. 2002-50655 discloses an arrangement wherein plural types of cleaning devices are arranged along a transport path for horizontally transporting the substrate so that the substrate being transported is subjected to cleaning before chips are mounted thereon.
- JP-A No. 2002-186923 discloses an arrangement wherein the foreign substances adhered to the substrate surface is vacuumed off by a dust collector.
- JP-A No. 2000-5715 discloses an apparatus wherein a dust removing device integrating an air outlet chamber and an air inlet chamber is disposed in a moving direction of a work piece.
- JP-A No. 2007-115979 discloses an arrangement wherein the foreign substances adhered to a surface of a wafer ring carrying a chip array thereon are removed by blasting an ionized gas followed by sucking.
- the removal of the foreign substances on the substrate surface is generally accomplished by a method wherein the foreign substances are blown off by applying an air flow and the blown foreign substances are collected by air suction.
- all these patent documents adopt a stationary system of foreign substance removal, which comes short of ensuring an efficient foreign-substance removal across the full width of substrate and preventing the readhesion of once removed foreign substances.
- a foreign substance removing device comprises: a pickup device to which a dicing film carrying dies thereon is fixed; a collet for picking up a die separated from the dicing film and placing the die on a substrate having an adhesive applied thereon; and a cleaning nozzle integrating an air outlet orifice and an air inlet orifice and applying air flow for removal of foreign substances on the substrate before the die is bonded onto the substrate.
- the cleaning nozzle includes a plurality of air outlet orifices formed in an elliptical form and a plurality of air inlet orifices formed in an elliptical arrangement to surround the air outlet orifices.
- the cleaning nozzle is elongated in a moving direction of the substrate and moved in a direction perpendicular to the moving direction of the substrate.
- the cleaning nozzle is elongated in a direction perpendicular to a moving direction of the substrate and moved in the direction perpendicular to the moving direction of the substrate and that the two cleaning nozzles are provided.
- the cleaning nozzles are arranged in a staggered form.
- the cleaning nozzle rotates about a longitudinal end thereof in a direction perpendicular to a moving direction of the substrate.
- the plural cleaning nozzles are arranged in a direction perpendicular to a moving direction of the substrate.
- the cleaning nozzle periodically performs air blasting and air sucking.
- the invention can provide a die bonder and a foreign substance removing device that are adapted for quick and efficient cleaning of the substrate surface regardless of the size thereof and for prevention of readhesion of once removed foreign substances.
- FIG. 1 is a conceptual diagram of a die bonder as seen from above;
- FIG. 2 is an external perspective view showing a pickup device mounted in the die bonder of FIG. 1 ;
- FIG. 3 is a schematic diagram showing a structure of a cleaning nozzle according to a first embodiment of the invention
- FIG. 4 is a diagram showing movement and configuration of an air nozzle of the cleaning nozzle according to the first embodiment
- FIG. 5 is a schematic diagram showing a structure of a cleaning nozzle according to a second embodiment of the invention.
- FIG. 6 is a schematic diagram showing a structure of a cleaning nozzle according to a third embodiment of the invention.
- FIG. 7 is a schematic diagram showing a structure of a cleaning nozzle according to a fourth embodiment of the invention.
- FIG. 8 is a schematic diagram showing a structure of a cleaning nozzle according to a fifth embodiment of the invention.
- a nozzle which ejects air for removal of foreign substances on the substrate may have a configuration wherein a circular air outlet orifice is formed at the center and is surrounded by an air inlet orifice in the form of a ring.
- Such a nozzle can suck in dust particles at once before the dust particles are stirred up by the air flow. It is therefore ensured that the once removed dust particles are prevented from adhering again onto the substrate.
- the substrate to receive the die does not always have a constant width. Since the die bonder bonds dies to substrates of different widths, the cleaning operation need to deal with the substrates having various widths.
- the cleaning nozzle has the circular air outlet orifice and the ring-like air inlet orifice, as described above, the nozzle must move over a longer distance to clean the substrate having a maximum width. This results in increased cleaning time.
- FIG. 1 and FIG. 2 an embodiment of a die bonder is described as below.
- FIG. 1 is a conceptual diagram of the die bonder as seen from above.
- the die bonder principally includes a wafer feeder 1 , a work-piece feeding/transporting portion 2 and a die bonding portion 3 .
- the wafer feeder 1 includes a wafer cassette lifter 11 and a pickup device 12 .
- the wafer cassette lifter 11 includes a wafer cassette loaded with wafer rings (not shown) for sequentially feeding the wafer rings to the pickup device 12 .
- the pickup device 12 is adapted to move the wafer ring for picking up a desired die from the wafer ring.
- the work-piece feeding/transporting portion 2 includes a stack loader 21 , a frame feeder (not shown) and an unloader 23 .
- the stack loader 21 transports a substrate (not shown) to receive a die in a direction of an arrow A in the figure by means of substrate guides 22 a , 22 b .
- the substrate guides 22 a , 22 b transports the substrate to the unloader 23 via two processing positions on the frame feeder 22 .
- the unloader 23 defines a portion to store the delivered substrates.
- a cleaning nozzle (foreign substance removing device) 5 is installed at place above the substrate guides 22 a , 22 b and the substrate transported.
- the die bonding portion 3 includes a preform portion (die paste applicator) 31 and a bonding head portion 32 .
- FIG. 2 is an external perspective view showing the pickup device mounted in the die bonder.
- the pickup device 12 includes: an expand ring 15 for retaining a wafer ring 14 , and a support ring (not shown) for horizontally positioning a dicing tape 16 retained by the wafer ring 14 and having a plurality of dies (chips) 4 adherent thereto.
- a plurality of formed dies 4 are extracted one by one by means of the preform portion 31 and bonded to a surface of the substrate with an adhesive applied thereto, the substrate transported by means of the substrate guides 22 a , 22 b shown in FIG. 1 .
- FIG. 3 is a schematic diagram showing a structure of a cleaning nozzle according to a first embodiment of the invention.
- FIG. 4 is a diagram showing movement and configuration of a cleaning nozzle of the cleaning nozzle according to the first embodiment.
- a substrate 10 supported in grooves of the substrate guides 22 a , 22 b is transported in a backward direction as seen on the drawing surface (shown in FIG. 3 ).
- the cleaning nozzle 5 is provided with an air feed pipe 5 a and an air discharge pipe 5 b .
- the air discharge pipe 5 b has a larger diameter than the air feed pipe 5 a . This is because the air discharge pipe 5 b also serves to transport the foreign substances.
- a nozzle face 5 c is closest to a surface of the substrate 10 .
- the nozzle face 5 a is centrally formed with a plurality of air outlet orifices 5 d .
- the nozzle face is also formed with a plurality of air inlet orifices 5 e around the air outlet orifices 5 d.
- the cleaning nozzle 5 moves up and down as indicated by an arrow B in FIG. 3 .
- Indicated at 51 is the cleaning nozzle that stops at an upper position.
- the cleaning nozzle 5 is normally lowered to a proper position (e.g., 2 mm above the substrate) above the substrate 10 .
- the cleaning nozzle is moved up.
- the cleaning nozzle 5 performs an operation of removing the foreign substances as moved in a width direction of the substrate 10 .
- Indicated at 52 is the cleaning nozzle moved in the width direction.
- the rectangular cleaning nozzle 5 is moved in a direction perpendicular to a moving direction of the substrate 10 , while the rectangular cleaning nozzle 5 orients the long side thereof in the same direction as the moving direction of the substrate.
- the width of the nozzle face 5 c of the cleaning nozzle 5 is set to a required value according to a cleaning process time (required throughput). This provides for the setting of a desired amount of movement of the cleaning nozzle 5 according to the width of the substrate 10 . Therefore, the cleaning according to the embodiment can deal with the substrates having various widths. In addition, the cleaning according to the embodiment can be carried out under an optimum cleaning condition that an optimum distance is maintained between the substrate 10 and the cleaning nozzle 5 while preventing failure caused by contact between the substrate being transported and the nozzle.
- the nozzle face 5 c of the cleaning nozzle 5 has the rectangular shape thereby providing an increased width for foreign substance cleaning and hence, cleaning efficiency can be notably increased through cleaning time reduction.
- FIG. 5 is a diagram showing an exemplary cleaning nozzle layout according to a second embodiment of the invention.
- two cleaning nozzles 53 , 54 are arranged in parallel in the direction perpendicular to the moving direction of the substrate 10 .
- the cleaning nozzles 53 , 54 are supported by the substrate guides 22 a , 22 b .
- the two cleaning nozzles 53 , 54 have the long sides directed in the direction perpendicular to the moving direction of the substrate. Furthermore, the two cleaning nozzles 53 , 54 are adapted to operate in the direction of the long side.
- cleaning in X-direction and cleaning in Y-direction shown in FIG. 1 are simultaneously accomplished by moving the substrate 10 .
- FIG. 6 is a diagram showing an exemplary cleaning nozzle layout according to a third embodiment of the invention.
- three cleaning nozzles 55 , 56 , 57 are arranged in parallel in the direction perpendicular to the moving direction of the substrate 10 and in staggered relation.
- the three cleaning nozzles 55 , 56 , 57 have the long sides oriented in the direction perpendicular to the moving direction of the substrate.
- the central cleaning nozzle 57 is fixed to place while the cleaning nozzles 55 , 56 on either side are adapted to operate in the direction of the long sides thereof just as in the second embodiment.
- the embodiment permits the cleaning nozzle 57 , which is not provided with an operating mechanism, to follow the operations of the cleaning nozzles 55 , 56 with respect to the width of the substrate, also offering cost advantage. Further, the substrate 10 is subjected to the cleaning while passed under the cleaning nozzles 55 , 56 , 57 . Therefore, the cleaning process time cannot be a causal factor of lowering the throughput.
- FIG. 7 is a diagram showing an exemplary cleaning nozzle layout according to a fourth embodiment of the invention.
- a cleaning nozzle 58 of this embodiment is adapted to rotate about a fulcrum 58 a just like an automotive wiper to be positioned as a cleaning nozzle 58 ′ as indicated by a dotted line in the figure.
- the cleaning nozzle 58 having a longitudinal length to cover the width of the substrate 10 can be rotated in a ⁇ direction from a parallel (horizontal) position to a perpendicular position relative to the substrate 10 . Therefore, the cleaning nozzle can deal with substrates having various widths. Further, the cleaning nozzle 58 of the embodiment is adapted for the change of the substrate width simply by mounting a rotation mechanism thereto. Hence, the cleaning device per se can achieve size reduction. This also leads to cost reduction.
- FIG. 8 is a diagram showing an exemplary cleaning nozzle layout according to a fifth embodiment of the invention.
- the embodiment has an arrangement wherein cleaning nozzles 59 , 60 rotatable about respective fulcrums 59 a , 60 a just as in the fourth embodiment are provided in two stages. Indicated at 59 ′ and 60 ′ are cleaning nozzles rotated to respective positions.
- the substrate guides are movable to places, as indicated by 22 a ′ and 22 b ′, according to the width of the substrate.
- the embodiment is adapted not only to operate the both cleaning nozzles to deal with the substrate having a large width but also to operate only either the cleaning nozzle 59 or the cleaning nozzle 60 depending upon the width of the delivered substrate.
- the cleaning nozzles of this embodiment are flexible to operate with freedom from restriction by the width of the substrate, so as to accomplish any cleaning jobs regardless of the substrate width.
- the cleaning nozzle is adapted to apply pulsed air in order to further enhance the foreign substance removing effect of the cleaning nozzles of the first to sixth embodiments described above.
- the foreign substances firmly adhered to the substrate surface can be forcibly removed by dynamically and periodically repeating air blasting and air sucking.
- the embodiment can achieve improvement in foreign substance removal ability.
- a distance sensor may be mounted to a tip of the cleaning nozzle 5 for the purpose of protecting the substrate and the dies 4 previously bonded thereto for lamination.
- a distance to the substrate or the surface of the laminated dies can be measured by means of the distance sensor and hence, determination can be made as to whether the cleaning nozzle is deviated from a proper distance or not. Measure for creating an alarm in response to the deviation from the proper distance may also be provided.
- an interlock function may be provided such as to deactivate the die bonder in response to the deviation from the proper distance.
- This system can prevent the substrate or substrate product carrying the dies from suffering failure caused by contact with the nozzle and can also ensure the proper foreign substance removal ability even if the substrate is deformed or the substrate or the nozzle is displaced due to physical effect.
- a flow sensor or pressure sensor may also be employed for detecting a flow rate of air from the cleaning nozzle 5 and a suction flow rate of air into the inlet orifices. An alarm is created in response to deviation from a proper flow rate.
- an interlock function may be provided such as to deactivate the die bonder in response to the deviation from the proper flow rate.
- There may also be provided a function to maintain a constant flow rate by detecting the flow rate by means of the flow sensor or pressure sensor.
- This system can prevent the decrease in the foreign substance removal ability which results from abnormal air flow rate or suction flow rate, or can prevent the substrate or substrate product carrying the dies from being damaged due to excessive flow rate. Furthermore, the system can also maintain the proper foreign substance removal ability.
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- Die Bonding (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Supply And Installment Of Electrical Components (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-063592 | 2011-03-23 | ||
| JP2011063592A JP5889537B2 (en) | 2011-03-23 | 2011-03-23 | Die bonder |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20120241096A1 US20120241096A1 (en) | 2012-09-27 |
| US8783319B2 true US8783319B2 (en) | 2014-07-22 |
Family
ID=46859284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US13/224,536 Active 2031-12-10 US8783319B2 (en) | 2011-03-23 | 2011-09-02 | Foreign substance removing device and die bonder equipped with the same |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8783319B2 (en) |
| JP (1) | JP5889537B2 (en) |
| KR (1) | KR101332986B1 (en) |
| CN (1) | CN102693921B (en) |
| TW (1) | TWI453808B (en) |
Cited By (1)
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|---|---|---|---|---|
| TWI710034B (en) * | 2017-05-31 | 2020-11-11 | 日商捷進科技有限公司 | Semiconductor manufacturing device and semiconductor device manufacturing method |
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| JP5813432B2 (en) * | 2011-09-19 | 2015-11-17 | ファスフォードテクノロジ株式会社 | Die bonder and bonding method |
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| JP6064831B2 (en) * | 2013-08-08 | 2017-01-25 | 三菱電機株式会社 | Test equipment, test method |
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| JP6173404B2 (en) * | 2015-10-07 | 2017-08-02 | 有限会社タクショー | Dust removal nozzle and dust removal device |
| JP6660219B2 (en) * | 2016-03-25 | 2020-03-11 | ファスフォードテクノロジ株式会社 | Die bonder |
| WO2017204333A1 (en) * | 2016-05-27 | 2017-11-30 | 株式会社新川 | Foreign matter removal device |
| JP6389988B2 (en) | 2016-06-14 | 2018-09-19 | 株式会社新川 | Foreign matter removal device |
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| JP6975953B2 (en) * | 2016-12-28 | 2021-12-01 | ヒューグル開発株式会社 | Foreign matter removal device and foreign matter removal method |
| JP6722614B2 (en) * | 2017-03-28 | 2020-07-15 | ファスフォードテクノロジ株式会社 | Die bonding apparatus and semiconductor device manufacturing method |
| KR102323539B1 (en) * | 2017-06-29 | 2021-11-09 | 한미반도체 주식회사 | Thermocompression Bonding Apparatus and Thermocompression Bonding Method |
| KR102000079B1 (en) * | 2017-07-19 | 2019-07-18 | 세메스 주식회사 | Die bonding apparatus |
| KR102401361B1 (en) * | 2017-07-19 | 2022-05-24 | 세메스 주식회사 | Die bonding apparatus |
| KR102401362B1 (en) * | 2017-10-19 | 2022-05-24 | 세메스 주식회사 | Die bonding apparatus |
| JP7065650B2 (en) * | 2018-03-12 | 2022-05-12 | ファスフォードテクノロジ株式会社 | Manufacturing method of die bonding equipment and semiconductor equipment |
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| JP7217604B2 (en) * | 2018-09-18 | 2023-02-03 | キヤノンマシナリー株式会社 | Foreign matter removing device, die bonder, and foreign matter removing method |
| JP7432869B2 (en) * | 2020-04-27 | 2024-02-19 | パナソニックIpマネジメント株式会社 | Component crimping device and cleaning method for component crimping device |
| JP7520637B2 (en) * | 2020-08-18 | 2024-07-23 | ファスフォードテクノロジ株式会社 | Die bonding apparatus, cleaning head, and method for manufacturing semiconductor device |
| CN112293863B (en) * | 2020-11-04 | 2022-04-08 | 湖南嘉泰鞋业有限公司 | Shoe processing is with operation panel that has a garbage collection function |
| CN112928052B (en) * | 2021-02-04 | 2021-10-01 | 深圳新益昌科技股份有限公司 | Die bonder |
| US12482683B2 (en) * | 2021-09-29 | 2025-11-25 | Advanced Micro Devices, Inc. | Carrier boat for die package flux cleaning |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI710034B (en) * | 2017-05-31 | 2020-11-11 | 日商捷進科技有限公司 | Semiconductor manufacturing device and semiconductor device manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102693921B (en) | 2015-03-11 |
| TW201239966A (en) | 2012-10-01 |
| CN102693921A (en) | 2012-09-26 |
| KR101332986B1 (en) | 2013-11-25 |
| KR20120108896A (en) | 2012-10-05 |
| JP2012199458A (en) | 2012-10-18 |
| TWI453808B (en) | 2014-09-21 |
| JP5889537B2 (en) | 2016-03-22 |
| US20120241096A1 (en) | 2012-09-27 |
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