US6911269B2 - Lead-free chemical nickel alloy - Google Patents
Lead-free chemical nickel alloy Download PDFInfo
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- US6911269B2 US6911269B2 US10/399,464 US39946403A US6911269B2 US 6911269 B2 US6911269 B2 US 6911269B2 US 39946403 A US39946403 A US 39946403A US 6911269 B2 US6911269 B2 US 6911269B2
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- United States
- Prior art keywords
- bismuth
- nickel
- nickel alloy
- antimony
- weight
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- 229910000990 Ni alloy Inorganic materials 0.000 title claims abstract description 49
- 239000000126 substance Substances 0.000 title description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 62
- 239000003792 electrolyte Substances 0.000 claims abstract description 38
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 29
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 28
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 25
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 25
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 19
- 239000011574 phosphorus Substances 0.000 claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 239000000470 constituent Substances 0.000 claims description 20
- -1 nickel cations Chemical class 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 10
- 229910001451 bismuth ion Inorganic materials 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 229910001439 antimony ion Inorganic materials 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 229910000014 Bismuth subcarbonate Inorganic materials 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 238000010924 continuous production Methods 0.000 claims description 2
- XQRLCLUYWUNEEH-UHFFFAOYSA-N diphosphonic acid Chemical compound OP(=O)OP(O)=O XQRLCLUYWUNEEH-UHFFFAOYSA-N 0.000 claims description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 2
- 150000007513 acids Chemical class 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 238000000454 electroless metal deposition Methods 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 description 15
- 230000007797 corrosion Effects 0.000 description 15
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- 241001156002 Anthonomus pomorum Species 0.000 description 3
- 229910021205 NaH2PO2 Inorganic materials 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 3
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000011835 investigation Methods 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- SIGUVTURIMRFDD-UHFFFAOYSA-M sodium dioxidophosphanium Chemical compound [Na+].[O-][PH2]=O SIGUVTURIMRFDD-UHFFFAOYSA-M 0.000 description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- HTKFORQRBXIQHD-UHFFFAOYSA-N allylthiourea Chemical compound NC(=S)NCC=C HTKFORQRBXIQHD-UHFFFAOYSA-N 0.000 description 2
- 229960001748 allylthiourea Drugs 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002269 spontaneous effect Effects 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229910004039 HBF4 Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910004749 OS(O)2 Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 1
- GUNJVIDCYZYFGV-UHFFFAOYSA-K antimony trifluoride Chemical compound F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical compound Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 description 1
- 150000001622 bismuth compounds Chemical class 0.000 description 1
- MNMKEULGSNUTIA-UHFFFAOYSA-K bismuth;methanesulfonate Chemical compound [Bi+3].CS([O-])(=O)=O.CS([O-])(=O)=O.CS([O-])(=O)=O MNMKEULGSNUTIA-UHFFFAOYSA-K 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- FWIZHMQARNODNX-UHFFFAOYSA-L dibismuth;oxygen(2-);carbonate Chemical compound [O-2].[O-2].[Bi+3].[Bi+3].[O-]C([O-])=O FWIZHMQARNODNX-UHFFFAOYSA-L 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 238000000275 quality assurance Methods 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/936—Chemical deposition, e.g. electroless plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
Definitions
- the present invention relates to a lead-free nickel alloy produced chemically, i.e. by an externally electroless method, a process for the production of such a nickel alloy by electroless metal deposition in an aqueous electrolyte and articles plated therewith.
- the externally electroless chemical nickel plating of metal surfaces is a process for the protection of metals against corrosion which is frequently used on an industrial scale.
- edge passivity can be increasingly observed when the value specified for the lead concentration is exceeded.
- Edge passivity means that a reduced layer structure can be observed at the edges of structural parts. This results in a reduced resistance to corrosion in the areas concerned.
- An electrolyte for the production of lead-free nickel layers produced by an externally electroless method is known from U.S. Pat. No. 2,884,344. According to the process described therein, at least two cations are added to the electrolyte which are selected from the group of antimony, arsenic and bismuth.
- the concentration of antimony and bismuth ions is at least 5 ppm, the ratio between antimony and bismuth being between 1:5 and 1:0.5.
- the layers produced according to this process exhibit a proportion of bismuth in the nickel alloy of at least 0.5% by weight and a proportion of antimony of maximum of 0.1% by weight of all constituents of the nickel alloy, have a matt surface, exhibit a distinct inherent tensile stress and have an unsatisfactory resistance to corrosion.
- FIG. 1 depicts the electrochemical potential of the nickel alloy of this invention vis-à-vis the standard hydrogen electrode. As shown in this figure, the nickel alloy according to the invention has a positive potential.
- FIG. 2 depicts the electrochemical potential of the nickel alloy according to U.S. Pat. No. 2,844,344 vis-à-vis the standard hydrogen electrode. As shown in this figure, the nickel alloy according to the invention has a negative potential.
- the object of the present invention is the provision of a chemical nickel layer which contains no lead, is affected by inherent compressive stress and, at the same time, has a sufficiently high resistance to corrosion for it to be used in the electronics industry for the manufacture of printed circuits.
- a further object of this invention is the provision of a process by means of which such a layer can be produced on an industrial scale without the lead-free electrolyte decomposing.
- the first object is solved by way of a nickel alloy present on a metallic substrate surface, the nickel alloy, containing
- metal substrate surface should be understood to mean also plastic surfaces which are first activated by means of processes known to the person skilled in the art and subsequently nickel plated.
- both the resistance to corrosion and the stability of the electrolyte are measurably increased.
- a conventional layer thickness of this nickel alloy of between 2 and 50 ⁇ m is sufficient to achieve resistance to corrosion.
- layer thicknesses of more than 100 ⁇ m can also be achieved by way of suitable processes.
- a layer thickness of more than 40 ⁇ m provides a stability of stage 4 of the very strong corrosion stress according to DIN 50 966. This is particularly important for plating hydraulic cylinders. All suitable materials or their alloys can be used as substrate. In view of the environmental problems connected with lead-containing nickel layers, the nickel alloy according to the invention is used in particular as protection against corrosion and diffusion barrier in the electronics industry for the manufacture of printed circuits boards.
- the proportion of phosphorus in the resulting nickel alloy can be between 2 and 15% by weight of all the constituents of the nickel alloy, based on all the constituents of the nickel alloy, i.e. on the elements nickel, phosphorus, bismuth and antimony contained in the alloy formed.
- the proportion of bismuth can be between 0.01 and 0.2% by weight of all the constituents of the nickel alloy.
- a preferred embodiment of the nickel alloy according to the invention is obtained if the constituents nickel, phosphorus, bismuth and antimony are evenly distributed in the alloy layer.
- the term “evenly” means here and in the following a distribution of the corresponding elements in the nickel matrix typical of the alloy. As result of this even distribution, a homogeneous structure is achieved in the alloy so that the mechanical and electrical properties of this layer are constant even within narrow tolerance ranges, this being particularly important for the electronics industry in connection with the quality assurance which is commonly carried out in the latter.
- the second object of the invention is solved by a process in which a metallic substrate is immersed into an aqueous electrolyte and the aqueous electrolyte contains nickel cations, phosphinate ions, bismuth ions in a concentration of bismuth of maximum 0.3 ppm and antimony ions in a concentration of antimony of at least 10 ppm, based on the electrolyte.
- the proportion of nickel cations is the electrolyte can be between 79 and 97% by weight, based on the sum total of the constituents nickel, phosphorus, bismuth and antimony present in the aqueous electrolyte.
- the proportion of phosphinate ions in the electrolyte can be between 2 and 15% by weight, based on the weight ratio of phosphorus to the sum total of the constituents nickel, phosphorus, bismuth and antimony present in the aqueous electrolyte.
- the proportion of bismuth in the electrolyte can be between 0.01 and 0.4% by weight, in particular between 0.1 and 0.2% by weight, based on the sum total of the constituents nickel, phosphorus, bismuth and antimony present in the aqueous electrolyte; that of antimony can be between 1 and 3% by weight.
- a continuous process is involved in which, in order to maintain the desired concentration of the components concerned in the aqueous electrolyte, at least
- a base in the form of a solution (III) is added to the aqueous electrolyte, which solution contains in particular ammonia and/or an alkali carbonate, in particular sodium carbonate.
- Maintaining the desired concentration and/or the pH is effected by common methods known to the person skilled in the art, e.g. by using metering pumps.
- Any compound can be used as suitable bismuth compound which provides a sufficient concentration of bismuth ions under the process conditions for externally electroless deposition.
- antimony compound Any substance can be used as antimony compound which provides a sufficient concentration of antimony cations under the process conditions.
- Those compounds are particularly preferred which are obtainable by converting a water-soluble antimony(III) compound with an aliphatic branched or unbranched carboxylic or hydrocarboxylic acid with 2 to 8 carbon atoms.
- the invention moreover, relates to articles which have been plated with a chemical nickel layer by means of the process according to the invention described above, in particular printed circuits boards in the electronics industry.
- the pH is then adjusted to a value of 4.3 by adding a 25% aqueous ammonia solution and the solution is made up to 1000 ml by adding fully demineralised water.
- sheet steel sections of alloy St 37, 1 mm thick and with the dimension 50 ⁇ 50 mm are suspended in the bath after the usual pre-treatment (degreasing, rinsing, activating, rinsing) for 60 minutes.
- the layer thickness achieved is 12 ⁇ m.
- the electrolyte is maintained at operating temperature (88° C.) for a further 8 hours. No decomposition can be observed.
- the resistance to corrosion is determined in accordance with the provisions of DIN 50 018 KFW 0,2S (Kesternich Test).
- the electrochemical potential of the resulting nickel alloy vis-à-vis the standard hydrogen electrode was determined. As shown in FIG. 1 , the nickel alloy according to the invention has a positive potential.
- the internal stress of a nickel alloy thus produced is determined using a spiral contractometer according to Brenner/Senderoff (A. Brenner, S. Senderoff, Proc. Amer. Electropol. Soc. 35 (1948) p. 53).
- the layer deposited is dissolved in concentrated HNO 3 and the individual elements are determined by atomic absorption spectroscopy.
- the pH is adjusted to a value of 4.3 by adding a 25% aqueous ammonia solution and the solution is made up to 1000 ml by adding fully demineralised water.
- sheet steel sections of alloy St 37, 1 mm thick and with the dimension 50 ⁇ 50 mm are suspended in the bath after the usual pre-treatment (degreasing, rinsing, activating, rinsing) for 60 minutes.
- the layer thickness achieved is 12 ⁇ m.
- the electrolyte After plating, as described above, the electrolyte is maintained further at operating temperature (88° C.). The onset of decomposition is observed after only one hour. After three hours, an almost complete decomposition of the electrolyte can be observed.
- the internal stress of a nickel alloy thus produced is determined using a spiral contractometer according to Brenner/Senderoff (A. Brenner, S. Senderoff, Proc. Amer. Electropol. Soc. 35 (1948) p. 53).
- the layer deposited is dissolved in concentrated HNO 3 and the individual elements are determined by atomic absorption spectroscopy.
- the solution is made up to 1000 ml by adding fully demineralised water.
- the pH of the solution is 5.1.
- sheet steel sections of alloy St 37, 1 mm thick and with the dimension 50 ⁇ 50 mm are suspended in the bath after the usual pre-treatment (degreasing, rinsing, activating, rinsing) for 60 minutes.
- the layer thickness achieved is 13 ⁇ m.
- the resistance to corrosion is determined in accordance with the provisions of DIN 50 018 KFW 0,2S (Kesternich Test).
- the electrochemical potential of the resulting nickel alloy according to U.S. 2,844,344 vis-à-vis the standard hydrogen electrode was determined. As shown in FIG. 2 , the nickel alloy has a negative potential.
- the internal stress of a nickel alloy thus produced is determined using a spiral contractometer according to Brenner/Senderoff (A. Brenner, S. Senderoff, Proc. Amer. Electropol. Soc. 35 (1948) p. 53).
- the layer deposited is dissolved in concentrated HNO 3 and the individual elements are determined by atomic absorption spectroscopy.
- the table shows substantially improved properties of the nickel alloy according to the invention compared with the nickel layers of the state of the art.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Connection Of Batteries Or Terminals (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Contacts (AREA)
- Electroplating Methods And Accessories (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
-
- nickel
- phosphorus
- bismuth in a proportion of maximum 0.4% by weight, and
- antimony in a proportion of at least 1% by weight,
the % by weight relating to all the above-mentioned constituents of the nickel alloy, i.e. to the elements nickel, phosphorus, bismuth and antimony present in the alloy.
-
- i. one solution containing the nickel cations and bismuth ions (I); and
- ii. one solution containing the phosphinate ions and antimony ions (II) is added to the aqueous electrolyte.
-
- 30 g nickel sulphate (NiSO4*6H2O)
- 35 g sodium phosphinate (NaH2PO2*H2O)
- 30 g malonic acid (CH2(COOH)2)
- 30 g succinic acid (HOOCCH2CH2COOH)
- 2 g toluene-4-sulphonic acid amide (H3C—C6H4—S(O)2NH2)
- 0.5 mg bismuth methane sulphonate (Bi(OS(O)2CH3)3)
-
- 30 g nickel sulphate (NiSO4*6H2O)
- 35 g sodium phosphinate (NaH2PO2*H2O)
- 30 g malonic acid (CH2(COOH)2)
- 30 g succinic acid (HOOCCH2CH2COOH)
- 2 g toluene-4-sulphonic acid amide (H3C—C6H4—S(O)2NH2)
- 2 mg lead acetate (PB(CH3COO)2)
- 1 mg allyl thiourea
-
- 25 g nickel sulphate (NiSO4*7H2O)
- 23 g sodium phosphinate (NaH2PO2*H2O)
- 8 g sodium citrate
- 1 g sodium tartrate
- 8 g sodium acetate
- 3.7 mg antimony(III) chloride
- 15.0 mg bismuth(III) chloride
| TABLE | ||||
| Example | Reference example 1 | Reference example 2 | ||
| Resistance to | 2 | 1 | 0 |
| corrosion | |||
| (in cycles) | |||
| Internal | −30 | −10 | +50 |
| stress | |||
| (in N/mm2) | |||
| Ni content* | 86.5 | 87.8 | 91.6 |
| P content* | 12.1 | 12.0 | 7.6 |
| Bi content* | 0.1 | 0 | 0.7 |
| Sb content | 1.3 | 0 | 0.05 |
| Pb content* | 0 | 0.2 | 0 |
| *in % by weight, based on all the elements contained in the nickel alloy | |||
Claims (17)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10052960A DE10052960C9 (en) | 2000-10-25 | 2000-10-25 | Lead-free nickel alloy |
| DEDE10052960.7 | 2000-10-25 | ||
| PCT/DE2001/004014 WO2002034964A1 (en) | 2000-10-25 | 2001-10-25 | Leadfree chemical nickel alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20040007472A1 US20040007472A1 (en) | 2004-01-15 |
| US6911269B2 true US6911269B2 (en) | 2005-06-28 |
Family
ID=7661055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/399,464 Expired - Fee Related US6911269B2 (en) | 2000-10-25 | 2001-10-25 | Lead-free chemical nickel alloy |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6911269B2 (en) |
| EP (1) | EP1330558B1 (en) |
| JP (1) | JP4023796B2 (en) |
| AT (1) | ATE350511T1 (en) |
| AU (1) | AU2002220500A1 (en) |
| CA (1) | CA2432333A1 (en) |
| DE (2) | DE10052960C9 (en) |
| HU (1) | HUP0301340A3 (en) |
| WO (1) | WO2002034964A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110077338A1 (en) * | 2005-05-06 | 2011-03-31 | Michael Feldstein | Composite electroless plating with ptfe |
| US8936672B1 (en) * | 2012-06-22 | 2015-01-20 | Accu-Labs, Inc. | Polishing and electroless nickel compositions, kits, and methods |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100590751C (en) * | 2004-09-02 | 2010-02-17 | 积水化学工业株式会社 | Conductive fine particles and anisotropic conductive material |
| DE102004047423C5 (en) * | 2004-09-28 | 2011-04-21 | AHC-Oberflächentechnik GmbH & Co. OHG | Externally applied Nickel alloy and its use |
| JP4430570B2 (en) * | 2005-03-15 | 2010-03-10 | 荏原ユージライト株式会社 | Electroless nickel composite plating bath and electroless nickel alloy composite plating bath |
| KR101058635B1 (en) * | 2008-12-23 | 2011-08-22 | 와이엠티 주식회사 | Electroless Nickel Plating Solution Composition, Flexible Printed Circuit Board and Manufacturing Method Thereof |
| JP6061369B2 (en) * | 2012-01-30 | 2017-01-18 | 凸版印刷株式会社 | WIRING BOARD AND ITS MANUFACTURING METHOD, AND SOLDERED WIRING BOARD MANUFACTURING METHOD |
| EP4166695A1 (en) * | 2015-12-18 | 2023-04-19 | Rolex Sa | Method for manufacturing a timepiece component |
| DE102017125954A1 (en) | 2017-11-07 | 2019-05-09 | RIAG Oberflächentechnik AG | External electroless process for producing a nickel alloy and corresponding electrolyte |
| CN113355618A (en) * | 2021-03-26 | 2021-09-07 | 中国科学院金属研究所 | Research method and application of trace element phosphorus in deformation high-temperature alloy |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2884344A (en) * | 1957-10-07 | 1959-04-28 | Reynolds Metals Co | Nickel plating |
| GB845648A (en) | 1957-10-07 | 1960-08-24 | Reynolds Metals Co | Nickel plating |
| US3764380A (en) * | 1971-06-03 | 1973-10-09 | Gates Rubber Co | Electrode having a coated positive contact surface |
| US4483711A (en) * | 1983-06-17 | 1984-11-20 | Omi International Corporation | Aqueous electroless nickel plating bath and process |
| US4600609A (en) * | 1985-05-03 | 1986-07-15 | Macdermid, Incorporated | Method and composition for electroless nickel deposition |
| US4699811A (en) * | 1986-09-16 | 1987-10-13 | Macdermid, Incorporated | Chromium mask for electroless nickel or copper plating |
| US5091225A (en) * | 1988-08-24 | 1992-02-25 | Nec Corporation | Magnetic disc member and process for manufacturing the same |
| JPH06131659A (en) | 1992-10-15 | 1994-05-13 | C Uyemura & Co Ltd | Memory Hard Disk Manufacturing Method |
| US5437887A (en) * | 1993-12-22 | 1995-08-01 | Enthone-Omi, Inc. | Method of preparing aluminum memory disks |
| US20030232148A1 (en) * | 2002-06-18 | 2003-12-18 | Shahin George E | Electroless nickel plating solutions |
-
2000
- 2000-10-25 DE DE10052960A patent/DE10052960C9/en not_active Expired - Lifetime
-
2001
- 2001-10-25 DE DE50111820T patent/DE50111820D1/en not_active Expired - Lifetime
- 2001-10-25 US US10/399,464 patent/US6911269B2/en not_active Expired - Fee Related
- 2001-10-25 HU HU0301340A patent/HUP0301340A3/en unknown
- 2001-10-25 CA CA002432333A patent/CA2432333A1/en not_active Abandoned
- 2001-10-25 EP EP01988508A patent/EP1330558B1/en not_active Revoked
- 2001-10-25 AT AT01988508T patent/ATE350511T1/en not_active IP Right Cessation
- 2001-10-25 AU AU2002220500A patent/AU2002220500A1/en not_active Abandoned
- 2001-10-25 JP JP2002537928A patent/JP4023796B2/en not_active Expired - Fee Related
- 2001-10-25 WO PCT/DE2001/004014 patent/WO2002034964A1/en not_active Ceased
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2884344A (en) * | 1957-10-07 | 1959-04-28 | Reynolds Metals Co | Nickel plating |
| GB845648A (en) | 1957-10-07 | 1960-08-24 | Reynolds Metals Co | Nickel plating |
| US3764380A (en) * | 1971-06-03 | 1973-10-09 | Gates Rubber Co | Electrode having a coated positive contact surface |
| US4483711A (en) * | 1983-06-17 | 1984-11-20 | Omi International Corporation | Aqueous electroless nickel plating bath and process |
| US4600609A (en) * | 1985-05-03 | 1986-07-15 | Macdermid, Incorporated | Method and composition for electroless nickel deposition |
| US4699811A (en) * | 1986-09-16 | 1987-10-13 | Macdermid, Incorporated | Chromium mask for electroless nickel or copper plating |
| US5091225A (en) * | 1988-08-24 | 1992-02-25 | Nec Corporation | Magnetic disc member and process for manufacturing the same |
| JPH06131659A (en) | 1992-10-15 | 1994-05-13 | C Uyemura & Co Ltd | Memory Hard Disk Manufacturing Method |
| US5437887A (en) * | 1993-12-22 | 1995-08-01 | Enthone-Omi, Inc. | Method of preparing aluminum memory disks |
| US20030232148A1 (en) * | 2002-06-18 | 2003-12-18 | Shahin George E | Electroless nickel plating solutions |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110077338A1 (en) * | 2005-05-06 | 2011-03-31 | Michael Feldstein | Composite electroless plating with ptfe |
| US8147601B2 (en) | 2005-05-06 | 2012-04-03 | Surface Technology, Inc. | Composite electroless plating |
| US8936672B1 (en) * | 2012-06-22 | 2015-01-20 | Accu-Labs, Inc. | Polishing and electroless nickel compositions, kits, and methods |
| US20150093514A1 (en) * | 2012-06-22 | 2015-04-02 | Accu-Labs, Inc. | Polishing And Electroless Nickel Compositions, Kits, And Methods |
| US9103027B2 (en) * | 2012-06-22 | 2015-08-11 | Accu-Labs, Inc. | Polishing and electroless nickel compositions, kits, and methods |
Also Published As
| Publication number | Publication date |
|---|---|
| DE10052960C9 (en) | 2008-07-03 |
| DE10052960B4 (en) | 2004-11-18 |
| JP4023796B2 (en) | 2007-12-19 |
| AU2002220500A1 (en) | 2002-05-06 |
| WO2002034964A1 (en) | 2002-05-02 |
| DE10052960A1 (en) | 2002-05-16 |
| HUP0301340A2 (en) | 2003-09-29 |
| DE10052960C5 (en) | 2007-10-31 |
| US20040007472A1 (en) | 2004-01-15 |
| CA2432333A1 (en) | 2002-05-02 |
| HUP0301340A3 (en) | 2007-05-02 |
| EP1330558B1 (en) | 2007-01-03 |
| DE50111820D1 (en) | 2007-02-15 |
| JP2004512429A (en) | 2004-04-22 |
| ATE350511T1 (en) | 2007-01-15 |
| EP1330558A1 (en) | 2003-07-30 |
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