US5166024A - Photoelectrographic imaging with near-infrared sensitizing pigments - Google Patents
Photoelectrographic imaging with near-infrared sensitizing pigments Download PDFInfo
- Publication number
- US5166024A US5166024A US07/632,258 US63225890A US5166024A US 5166024 A US5166024 A US 5166024A US 63225890 A US63225890 A US 63225890A US 5166024 A US5166024 A US 5166024A
- Authority
- US
- United States
- Prior art keywords
- salts
- element according
- acid
- photoelectrographic
- photoelectrographic element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000049 pigment Substances 0.000 title claims abstract description 29
- 238000003384 imaging method Methods 0.000 title claims description 12
- 230000001235 sensitizing effect Effects 0.000 title 1
- 239000002253 acid Substances 0.000 claims abstract description 60
- 230000005855 radiation Effects 0.000 claims abstract description 38
- 239000011230 binding agent Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 13
- -1 aryl phosphonium salts Chemical class 0.000 claims description 25
- 150000003839 salts Chemical class 0.000 claims description 17
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical class [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 229920000728 polyester Polymers 0.000 claims description 9
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229920001568 phenolic resin Polymers 0.000 claims description 4
- 229920000515 polycarbonate Polymers 0.000 claims description 4
- 239000004417 polycarbonate Substances 0.000 claims description 4
- 230000006872 improvement Effects 0.000 claims description 3
- 239000012184 mineral wax Substances 0.000 claims description 3
- 239000005011 phenolic resin Substances 0.000 claims description 3
- 229920000098 polyolefin Polymers 0.000 claims description 3
- SPVXKVOXSXTJOY-UHFFFAOYSA-O selenonium Chemical class [SeH3+] SPVXKVOXSXTJOY-UHFFFAOYSA-O 0.000 claims description 3
- OXFZSJOUPRCPJO-UHFFFAOYSA-N copper ethyl 3-oxobutanoate Chemical group [Cu+2].CCOC(=O)[CH-]C(C)=O.CCOC(=O)[CH-]C(C)=O OXFZSJOUPRCPJO-UHFFFAOYSA-N 0.000 claims description 2
- HCRZXNOSPPHATK-UHFFFAOYSA-L copper;3-oxobutanoate Chemical class [Cu+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O HCRZXNOSPPHATK-UHFFFAOYSA-L 0.000 claims description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 2
- 239000012954 diazonium Substances 0.000 claims 3
- 125000005410 aryl sulfonium group Chemical group 0.000 claims 2
- 150000001989 diazonium salts Chemical class 0.000 claims 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical group CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 claims 1
- KLRHPHDUDFIRKB-UHFFFAOYSA-M indium(i) bromide Chemical compound [Br-].[In+] KLRHPHDUDFIRKB-UHFFFAOYSA-M 0.000 claims 1
- SJHHDDDGXWOYOE-UHFFFAOYSA-N oxytitamium phthalocyanine Chemical compound [Ti+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 SJHHDDDGXWOYOE-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 14
- 239000010410 layer Substances 0.000 description 56
- 238000000576 coating method Methods 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 13
- 238000007639 printing Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 5
- 239000000123 paper Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical group I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229920000180 alkyd Polymers 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000013034 phenoxy resin Substances 0.000 description 3
- 229920006287 phenoxy resin Polymers 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 229940117958 vinyl acetate Drugs 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 230000002085 persistent effect Effects 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 101150108015 STR6 gene Proteins 0.000 description 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- MUBKMWFYVHYZAI-UHFFFAOYSA-N [Al].[Cu].[Zn] Chemical compound [Al].[Cu].[Zn] MUBKMWFYVHYZAI-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- VGZKCAUAQHHGDK-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 VGZKCAUAQHHGDK-UHFFFAOYSA-M 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000011101 paper laminate Substances 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920000205 poly(isobutyl methacrylate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000004627 regenerated cellulose Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 101150035983 str1 gene Proteins 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/026—Layers in which during the irradiation a chemical reaction occurs whereby electrically conductive patterns are formed in the layers, e.g. for chemixerography
Definitions
- This invention relates to new photoelectrographic elements and an imaging method of exposing such elements with near-infrared radiation.
- Acid photogenerators are known for use in photoresist imaging elements.
- the acid photogenerator is coated on a support and imagewise exposed to actinic radiation.
- the layer containing the acid photogenerator is then contacted with a photopolymerizable or curable composition such as epoxy and epoxy-containing resins.
- a photopolymerizable or curable composition such as epoxy and epoxy-containing resins.
- the acid photogenerator generates protons which catalyze polymerization or curing of the photopolymerizable composition.
- Acid photogenerators are disclosed, for example, in U.S. Pat. Nos. 4,081,276, 4,058,401, 4,026,705, 2,807,648, 4,069,055, and 4,529,490.
- Acid photogenerators have been employed in photoelectrographic elements to be exposed with actinic or undefined radiation as shown, for example, in U.S. Pat. No. 3,316,088. Photoelectrographic elements have been found useful where multiple copies from a single exposure are desired. See e.g., U.S. Pat. Nos. 4,661,429 and 3,681,066 as well as German Democratic Republic Patent No. 226,067 and Japanese Patent No. 105,260. Sensitizer dyes have been disclosed with regard to such elements, but not for sensitization in the near-IR portion of the spectrum. See, for example, in U.S. Pat. No. 3,525,612 and Japanese Patent No. 280,793.
- the present invention relates to a photoelectrographic element comprising a conductive layer in electrical contact with an acid photogenerating layer.
- the acid photogenerating layer is free of photopolymerizable materials and includes an electrically insulating binder and an acid photogenerator in accordance with U.S. Pat. No. 4,661,429.
- the present invention constitutes an improvement over U.S. Pat. No. 4,661,429 by incorporating a pigment in the photoelectrographic element which absorbs near-infrared radiation. As a result, the element can be sensitized with such radiation.
- the present invention also provides a photoelectrographic imaging method which utilizes the above-described photoelectrographic element.
- This process comprises the steps of: exposing the acid photogenerating layer imagewise to near-infrared radiation without prior charging to create a latent conductivity pattern and printing by a sequence comprising: charging to create an electrostatic latent image, developing the electrostatic latent image with charged toner particles, transferring the toned image to a suitable receiver, and cleaning any residual, untransferred toner from the photoelectrographic element.
- the imaging method and elements of the present invention use acid photogenerators in thin layers coated over a conductive layer to form images.
- This imaging technique or method takes advantage of the discovery that exposure of the acid generator significantly increases the conductivity in the exposed area of the layer. Imagewise radiation of the acid photogenerator layer creates a persistent differential conductivity between exposed and unexposed areas. This allows for the subsequent use of the element for printing multiple copies from a single exposure with only multiple charging, developing, transferring, and cleaning steps. This is different from electrophotographic imaging techniques where the electrophotographic element must generally be charged electrostatically followed by imagewise exposure for each copy produced. As a result, maximum throughput tends to be limited, and energy consumption is likely to be greater.
- the charged toner may have the same sign as the electrographic latent image or the opposite sign. In the former case, a negative image is developed, while a positive image is developed in the latter.
- Such elements are no longer limited to exposure with ultraviolet and visible radiation.
- Such pigments instead permit exposure with radiation in the near-infrared region of the spectrum (having wavelengths of 650 to 1,000 nm).
- these pigments also have the ability to absorb near-ultraviolet radiation, thereby permitting exposure with a conventional U.V. radiation source or with a laser diode which emits radiation in the near-infrared part of the spectrum.
- the use of laser diodes is particularly advantageous, because they are relatively inexpensive and consume little energy.
- Pigments absorbing near-infrared radiation can be included in the same layer as the acid photogenerating compound or as a separate layer adjacent to the acid photogenerating layer.
- Certain copper (II) salts which are known to catalyze the thermal decomposition of iodonium salts especially when used in conjunction with compounds containing secondary hydroxyl groups, may also be included in the acid photogenerating layer.
- the present invention relates to a photoelectrographic element comprising a conductive layer in electrical contact with an acid photogenerating layer which is free of photopolymerizable materials and includes an electrically insulating binder and an acid photogenerator.
- the improvement resides in the use of a pigment which absorbs near-infrared radiation so that the element can be exposed with such radiation during electrostatic imaging or printing processes.
- the acid photogenerator and an electrically insulating binder are dissolved in a suitable solvent.
- a dispersion of pigment in the same or different solvent is added.
- Solvents of choice for preparing acid photogenerator coatings include a number of solvents including aromatic hydrocarbons such as toluene; ketones, such as acetone or 2-butanone; esters, such as ethyl acetate or methyl acetate chlorinated hydrocarbons such as ethylene dichloride, trichloroethane, and dichloromethane, ethers such as tetrahydrofuran; or mixtures of these solvents.
- aromatic hydrocarbons such as toluene
- ketones such as acetone or 2-butanone
- esters such as ethyl acetate or methyl acetate chlorinated hydrocarbons such as ethylene dichloride, trichloroethane, and dichloromethane
- ethers such as tetrahydrofuran
- the acid photogenerating layers are coated on a conducting support in any well-known manner such as by doctor-blade coating, swirling, dip-coating, and the like.
- the acid photogenerating materials should be selected to impart little or no conductivity before irradiation with the conductivity level increasing after exposure. Useful results are obtained when the coated layer contains at least about 1 weight percent of the acid photogenerator.
- the upper limit of acid photogenerator is not critical as long as no deleterious effect on the initial conductivity of the film is encountered.
- a preferred weight range for the acid photogenerator in the coated and dried composition is from 15 weight percent to about 30 weight percent.
- the thicknesses of the acid photogenerator layer can vary widely with dry coating thicknesses ranging from about 0.1 ⁇ m to about 50 ⁇ m. Coating thicknesses outside these ranges may also be useful.
- aromatic onium salt acid photogenerators include Group Va, Group VIa, and Group VIIa elements.
- Also useful as acid photogenerating compounds are:
- Aryldiazonium salts such as disclosed in U.S. Pat. Nos. 3,205,157; 3,711,396; 3,816,281; 3,817,840 and 3,829,369.
- the following salts are representative: ##STR4##
- a particularly preferred class of acid photogenerators are the diaryl iodonium salts, especially di-(4-t-butylphenyl)iodonium trifluoromethanesulfonate ("ITF").
- Useful electrically insulating binders for the acid photogenerating layers include polycarbonates, polyesters, polyolefins, phenolic resins, and the like. Desirably, the binders are film forming. Such polymers should be capable of supporting an electric field in excess of 1 ⁇ 10 5 V/cm and exhibit a low dark decay of electrical charge.
- Preferred binders are styrene-butadiene copolymers; silicone resins; styrene-alkyd resins; soya-alkyd resins; poly(vinyl chloride); poly(vinylidene chloride); vinylidene chloride, acrylonitrile copolymers; poly(vinyl acetate); vinyl acetate, vinyl chloride copolymers; poly(vinyl acetyls), such as poly(vinyl butyral); polyacrylic and methacrylic esters, such as poly(methyl methacrylate), poly(n-butyl methacrylate), poly(isobutyl methacrylate), etc; polystyrene; nitrated polystyrene; poly(vinylphenol)polymethylstyrene; isobutylene polymers; polyesters, such as phenol formaldehyde resins; ketone resins; polyamides; polycarbonates; etc.
- styrene-alkyd resins can be prepared according to the method described in U.S. Pat. Nos. 2,361,019 and 2,258,423.
- Suitable resins of the type contemplated for use in the photoactive layers of this invention are sold under such tradenames as Vitel PE 101-X, Cymac, Piccopale 100, Saran F-220.
- Other types of binders which can be used include such materials as paraffin, mineral waxes, etc.
- Particularly preferred binders are aromatic esters of polyvinyl alcohol polymers and copolymers, as disclosed in pending U.S. patent application Ser. No. 509,119, entitled "Photoelectrographic Elements".
- One example of such a polymer is poly (vinyl benzoate-co-vinyl acetate) (“PVBZ").
- the binder is present in the element in a concentration of 30 to 98 weight %, preferably 55 to 80 weight %.
- Useful conducting layers include any of the electrically conducting layers and supports used in electrophotography. These include, for example, paper (at a relative humidity above about 20 percent); aluminum paper laminates; metal foils, such as aluminum foil, zinc foil, etc.; metal plates, such as aluminum, copper, zinc, brass, and galvanized plates; regenerated cellulose and cellulose derivatives; certain polyesters, especially polyesters having a thin electroconductive layer (e.g., cuprous iodide) coated thereon; etc.
- paper at a relative humidity above about 20 percent
- metal foils such as aluminum foil, zinc foil, etc.
- metal plates such as aluminum, copper, zinc, brass, and galvanized plates
- regenerated cellulose and cellulose derivatives such as aluminum, copper, zinc, brass, and galvanized plates
- certain polyesters especially polyesters having a thin electroconductive layer (e.g., cuprous iodide) coated thereon; etc.
- the acid photogenerating layers of the present invention can be affixed, if desired, directly to a conducting substrate or support, it may be desirable to use one or more intermediate subbing layers between the conducting layer or substrate and the acid photogenerating layer to improve adhesion to the conducting substrate and/or to act as an electrical and/or chemical barrier between the acid photogenerating layer and the conducting layer or substrate.
- subbing layers typically have a dry thickness in the range of about 0.1 to about 5 ⁇ m.
- Useful subbing layer materials include film-forming polymers such as cellulose nitrate, polyesters, copolymers or poly(vinyl pyrrolidone) and vinylacetate, and various vinylidene chloride-containing polymers including two, three and four component polymers prepared from a polymerizable blend of monomers or prepolymers containing at least 60 percent by weight of vinylidene chloride.
- Other useful subbing materials include the so-called tergals which are described in Nadeau et al, U.S. Pat. No. 3,501,301.
- Optional overcoat layers are useful with the present invention, if desired.
- the surface layer of the photoelectrographic element of the invention may be coated with one or more organic polymer coatings or inorganic coatings.
- organic polymer coatings or inorganic coatings are well known in the art and accordingly an extended discussion thereof is unnecessary.
- overcoats are described, for example, in Research Disclosure, "Electrophotographic Elements, Materials, and Processes", Vol. 109, page 63, Paragraph V, May, 1973, which is incorporated herein by reference.
- the pigment which absorbs near-infrared radiation can be any such material possessing this property but must not adversely interfere with the operation of the acid photogenerating layer.
- Suitable pigments include those selected from the phthalocyanine pigment family. Particularly useful phthalocyanine pigments include: ##STR6## Use of these pigments in photoelectrographic elements is particularly advantageous, because they not only absorb near-infrared radiation (i.e. 600 to 900 nm) which can be produced by laser diodes, but also near-ultraviolet radiation (i.e. 250 to 450 nm) produced by conventional sources of exposure. As a result, these photoelectrographic elements have great flexibility. Typically, near-infrared radiation absorptive pigments are included in the photoelectrographic element of the present invention at concentrations 1 to 20 weight %, preferably 5 to 15 weight %, of the element.
- the acid generating layer contains iodonium salts
- a compound with secondary hydroxyl groups and a copper (II) salt which, when used together, are known to catalyze thermal decomposition of iodonium salts.
- Suitable copper (II) salts are disclosed by J. V. Crivello, T. P. Lockhart, and J. L. Lee, J. Polym. Sci., Polym. Chem. Ed., 21, 97 (1983). These include copper (II) arylates, copper (II) alkanoates, copper (II) acetonates, copper (II) acetoacetates, and mixtures thereof.
- a particularly preferred example of a copper (II) salt useful for this invention is copper (II) ethyl acetoacetate.
- This salt is soluble in organic solvents such as dichloromethane and can be homogeneously incorporated at concentrations as high as 18% by weight of the dry photoelectrographic element.
- the compound with secondary hydroxyl groups include those which contain dialkyl-, diaryl-, alkylaryl-, and hydroxymethane moieties.
- a particularly preferred compound with secondary hydroxyl groups is the binder polymer having the following formula: ##STR7## This is a copolymer of bisphenol A and epichlorohydrin, and may be obtained from Aldrich Chemical Company, Milwaukee, Wis. under the trade name PHENOXY RESIN.
- the pigment can either be included in the acid photogenerating layer or in an adjacent separate layer.
- the acid generating layer contains 0.1 to 30, preferably 1-15, weight percent of pigment.
- the copper (II) salt is present in an amount of 1 to 20, preferably 10-15, weight percent and, except when PHENOXY RESIN is used, the compound with secondary hydroxyl groups is present in an amount of 1 to 10, preferably 2-4, weight percent.
- PHENOXY RESIN is used as the compound with secondary hydroxyl groups, it is also functioning as the binder and then is used, in a concentration of 30-98 weight %, preferably 55 to 80 weight %.
- the thickness of the acid generating layer ranges from 1 to 30 ⁇ m, preferably 5 to 10 ⁇ m.
- the pigment is utilized as a separate layer, that layer is positioned adjacent to the acid photogenerating layer, preferably between the conductive layer and the acid Photogenerating layer.
- the pigment-containing layer has a thickness of 0.05 to 5, preferably .5 to 2.0, ⁇ m.
- the photoelectrographic elements of the present invention are employed in the photoelectrographic process summarized above. This process involves a 2-step sequence--i.e. an exposing phase followed by a printing phase.
- the acid photogenerating layer is exposed imagewise to near-infrared radiation without prior charging to create a latent conductivity pattern.
- a persistent latent conductivity pattern exists on the element, and no further exposure is needed.
- the element can then be subjected to the printing phase either immediately or after some period of time has passed.
- the element is given a blanket electrostatic charge, for example, by passing it under a corona discharge device, which uniformly charges the surface of the acid photogenerator layer.
- the charge is dissipated by the layer in the exposed areas, creating an electrostatic latent image.
- the electrostatic latent image is developed with charged toner particles, and the toned image is transferred to a suitable receiver (e.g., paper).
- the toner particles can be fused either to a material (e.g., paper) on which prints are actually made or to an element to create an optical master or a transparency for overhead projection. Any residual, untransferred toner is then cleaned away from the photoelectrographic element.
- the toner particles are in the form of a dust, a powder, a pigment in a resinous carrier, or a liquid developer in which the toner particles are carried in an electrically insulating liquid carrier.
- Methods of such development are widely known and described as, for example, in U.S. Pat. Nos. 2,296,691, 3,893,935, 4,076,857, and 4,546,060.
- multiple prints from a single exposure can be prepared by subjecting the photoelectrographic element only once to the exposing phase and then subjecting the element to the printing phase once for each print made.
- the photoelectrographic layer can be developed with a charged toner having the same polarity as the latent electrostatic image or with a charged toner having a different polarity from the latent electrostatic image. In one case, a positive image is formed. In the other case, a negative image is formed.
- the photoelectrographic layer can be charged either positively or negatively and the resulting electrostatic latent images can be developed with a toner of given polarity to yield either a positively or negatively appearing image.
- this pattern can be erased by heating to a temperature of 110° to 130° C., preferably 120° C., for several seconds.
- the element is then available for reuse as a master for printing a different image according to the above-described process.
- the photoelectrographic element of the present invention can be imaged with a laser, which emits radiation most efficiently at near-infrared wavelengths.
- a laser diode with about 200 mW peak power output at 827 nm and a spot size of about 30 ⁇ m can be used to image the photoelectrographic element.
- the element is mounted on a rotating drum, and the laser is stepped across the length of the drum in lines about 20 ⁇ m from center to center.
- the image is written by modulating the output of the laser in an imagewise manner.
- photoelectrographic elements of the present invention are imaged in this manner, an imagewise conductivity pattern is formed from which toned images can be produced, as described above.
- the photoelectrographic element of the present invention can also be used as an electrophotographic element, as described above in the Summary of the Invention section.
- This has the added advantage of permitting differential annotation of each image produced during the printing phase. For example, address information can be varied from one print to the next.
- the support comprises a flexible polyester base which is overcoated with (a) cuprous iodide (3.4 wt%) and poly(vinyl formal) (0.32 wt%) in acetonitrile (96.3 wt%), and (b) cellulose nitrate (6 wt%) in 2-butanone (94 wt%) over (a).
- Hand coatings were carried out by drawing the experimental coating solutions over the support with a doctor blade such that the thickness of the dried films were between 5 and 10 microns.
- Machine coatings were performed by pumping the coating solutions through an extrusion hopper (5 mil slot width) onto the moving support (20 ft/min). Dried film thicknesses between 5 and 10 microns were achieved by adjusting the pump speed.
- the sensitivity of the coatings to near-IR exposure was evaluated in the following manner.
- the film was exposed on a breadboard equipped with a 200 mW IR laser diode (827 nm output), and the output beam focused to a 30 ⁇ m spot.
- the breadboard consists of a rotating drum, upon which the film is mounted, and a translation stage which moves the laser beam along the drum length.
- the drum rotation, the laser beam location, and the laser beam intensity are all controlled by an IBM-AT computer.
- the drum was rotated at a speed of 120 rpm, and the film was exposed to an electronically generated graduated exposure consisting of 11 exposure steps.
- the line spacing (distance between scan lines in the continuous tone step-wedge) was 20 ⁇ m, and the maximum intensity was about 100 mW with an exposure time of about 30 ⁇ sec/pixel.
- the sample was mounted and tested on a separate linear breadboard. The sample was corona charged with a grid controlled charger set at a grid potential of+500 V. The surface potential was then measured at 1 sec after charging.
- the near-UV sensitivity was measured by the following procedure. Each film sample was evaluated by mounting it in electrical contact with a metal drum, and rotating the drum past a corona charger and an electrostatic voltmeter. The configuration is such that a given area of the film passes in front of the charger and voltmeter once every second, with the time between the charger and voltmeter being about 200 milliseconds.
- the grid potential on the charger is set at+700 volts, with 0.40 ma current.
- the voltmeter measures the surface potential on both the exposed and unexposed regions of the film each cycle After several cycles, both exposed and unexposed regions of the film reach equilibrium potentials.
- V max When measuring either IR or UV sensitivity, the potential in an unexposed region is termed V max and the potential in a maximally exposed region is termed V min .
- ⁇ V The difference between V max and V min is called ⁇ V, and represents the potential available for development.
- V max varies with relative humidity (“RH"), film thickness, and specific formulation and since ⁇ V is a function of V max , it is difficult to compare ⁇ V s by themselves from one measurement to the next.
- RH relative humidity
- Fm degree of discharge
- the ratio of ⁇ V to V max is independent of V max and is in the range of 400 to 800 volts. Therefore, for the Purpose of comparing the photoelectrographic behavior of the various inventive formulations, the values of V max and Fm will be used. Ideally, Fm should not change in response to changes in RH, but should remain constant.
- a solution comprising 3.75 wt% ITF, 1.5 wt% TiOPcF 4 , and 9.75 wt% PVBZ in 85 wt% dichloromethane (“DCM”) was hand-coated using a 6 mil blade. The coating was allowed to dry overnight under ambient conditions. Preliminary evaluation of the film revealed the photoactive layer to be 9.2 ⁇ m thick and the optical density to be 1.80 at 825 nm. When the film was exposed to near-infrared radiation, as described above, the results set forth in Table 1 were achieved using various drum speeds.
- a mixture comprising 3.22 wt% ITF, 1.29 wt% BrInPc, and 8.39 wt% PVBZ in 87.1 wt% DCM was machine-coated under the general conditions described above. The drying conditions were adjusted such that the film was gradually warmed to 160° F., held at that temperature briefly, then cooled down to room temperature. This film was found to possess a photoactive layer 9.8 ⁇ m thick and which displays an optical density of 1.50 at 825 nm.
- This example shows that a film of the present invention displays high Fm's with either near-IR or near-UV exposures, can be run for hundreds of cycles at high speed, has a stable memory, can be erased and reused, and displays good conventional photoconductivity.
- This example illustrates the use of a master made from the film of Example 2 to prepare high quality color images.
- Halftone color prints (1800 dpi, 150 lpi) were made by imagewise exposing a film prepared according to Example 2 on the above-described breadboard. Three masters were imaged in register, corresponding to cyan, magenta, and yellow separations. Prints were made by registering the masters on a color, electrophotographic linear breadboard. Ground, polyester toners (6 microns in diameter) containing either cyan, magenta, yellow, or black colorants were used to develop the images. The toned images were electrostatically transferred in register to clay-coated paper, and the transferred images were fused in an oven at 120° C. for 20 sec. The image quality of the resulting 150 line screen halftone prints was excellent.
- the electrostatic latent image exhibits excellent stability.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Liquid Crystal (AREA)
Abstract
Description
TABLE 1 ______________________________________ Drum Speed Vmax Fm ______________________________________ 120 rpm +540V 0.79 360 rpm +463V 0.79 600 rpm +464V 0.37 ______________________________________
TABLE 2 ______________________________________ Day Vmax Fm ______________________________________ 2 +552V 0.76 6 +564V 0.73 9 +476V 0.82 ______________________________________
TABLE 3 ______________________________________ Drum Speed Vmax Fm ______________________________________ 120 +581V 0.79 240 +582V 0.78 360 +554V 0.73 ______________________________________
Claims (17)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/632,258 US5166024A (en) | 1990-12-21 | 1990-12-21 | Photoelectrographic imaging with near-infrared sensitizing pigments |
EP92901710A EP0516796A1 (en) | 1990-12-21 | 1991-12-17 | Photoelectrographic imaging with near-infrared sensitizing pigments |
JP4502416A JPH05504215A (en) | 1990-12-21 | 1991-12-17 | Photoelectronic image formation using near-infrared sensitive pigments |
PCT/US1991/009496 WO1992011582A1 (en) | 1990-12-21 | 1991-12-17 | Photoelectrographic imaging with near-infrared sensitizing pigments |
US07/903,652 US5244767A (en) | 1990-12-21 | 1992-06-24 | Photoelectrographic imaging with near-infrared sensitizing pigments |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/632,258 US5166024A (en) | 1990-12-21 | 1990-12-21 | Photoelectrographic imaging with near-infrared sensitizing pigments |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/903,652 Division US5244767A (en) | 1990-12-21 | 1992-06-24 | Photoelectrographic imaging with near-infrared sensitizing pigments |
Publications (1)
Publication Number | Publication Date |
---|---|
US5166024A true US5166024A (en) | 1992-11-24 |
Family
ID=24534779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/632,258 Expired - Lifetime US5166024A (en) | 1990-12-21 | 1990-12-21 | Photoelectrographic imaging with near-infrared sensitizing pigments |
Country Status (4)
Country | Link |
---|---|
US (1) | US5166024A (en) |
EP (1) | EP0516796A1 (en) |
JP (1) | JPH05504215A (en) |
WO (1) | WO1992011582A1 (en) |
Cited By (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401607A (en) * | 1991-04-17 | 1995-03-28 | Polaroid Corporation | Processes and compositions for photogeneration of acid |
EP0672954A2 (en) | 1994-03-14 | 1995-09-20 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a traizine and use thereof in lithographic printing plates |
EP0689096A1 (en) | 1994-06-16 | 1995-12-27 | Eastman Kodak Company | Lithographic printing plates utilizing an oleophilic imaging layer |
EP0795420A1 (en) | 1996-03-12 | 1997-09-17 | Eastman Kodak Company | Lithographic printing plate adapted to be imaged by ablation |
US5691098A (en) * | 1996-04-03 | 1997-11-25 | Minnesota Mining And Manufacturing Company | Laser-Induced mass transfer imaging materials utilizing diazo compounds |
US5747217A (en) * | 1996-04-03 | 1998-05-05 | Minnesota Mining And Manufacturing Company | Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds |
US5981136A (en) * | 1996-04-15 | 1999-11-09 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US5998085A (en) * | 1996-07-23 | 1999-12-07 | 3M Innovative Properties | Process for preparing high resolution emissive arrays and corresponding articles |
US6114088A (en) * | 1999-01-15 | 2000-09-05 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
US6228555B1 (en) | 1999-12-28 | 2001-05-08 | 3M Innovative Properties Company | Thermal mass transfer donor element |
US6228543B1 (en) | 1999-09-09 | 2001-05-08 | 3M Innovative Properties Company | Thermal transfer with a plasticizer-containing transfer layer |
US6242152B1 (en) | 2000-05-03 | 2001-06-05 | 3M Innovative Properties | Thermal transfer of crosslinked materials from a donor to a receptor |
US6284425B1 (en) | 1999-12-28 | 2001-09-04 | 3M Innovative Properties | Thermal transfer donor element having a heat management underlayer |
US6358664B1 (en) | 2000-09-15 | 2002-03-19 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US6410201B2 (en) | 1999-01-15 | 2002-06-25 | 3M Innovative Properties Company | Thermal transfer element and process for forming organic electroluminescent devices |
US6485884B2 (en) | 2001-04-27 | 2002-11-26 | 3M Innovative Properties Company | Method for patterning oriented materials for organic electronic displays and devices |
US6521324B1 (en) | 1999-11-30 | 2003-02-18 | 3M Innovative Properties Company | Thermal transfer of microstructured layers |
US20030124265A1 (en) * | 2001-12-04 | 2003-07-03 | 3M Innovative Properties Company | Method and materials for transferring a material onto a plasma treated surface according to a pattern |
US6596460B2 (en) | 2000-12-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Polyvinyl acetals having azido groups and use thereof in radiation-sensitive compositions |
US6617093B2 (en) | 1999-05-14 | 2003-09-09 | 3M Innovative Properties Company | Thermal transfer of a black matrix containing carbon black |
US20030219625A1 (en) * | 2002-04-19 | 2003-11-27 | 3M Innovative Properties Company | Materials for organic electronic devices |
US20030224205A1 (en) * | 2002-04-19 | 2003-12-04 | 3M Innovative Properties Company | Electroluminescent materials and methods of manufacture and use |
US6699597B2 (en) | 2001-08-16 | 2004-03-02 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US20040062947A1 (en) * | 2002-09-25 | 2004-04-01 | Lamansky Sergey A. | Organic electroluminescent compositions |
US20040214036A1 (en) * | 2003-04-15 | 2004-10-28 | 3M Innovative Properties Company | Electron transport agents for organic electronic devices |
US20040214037A1 (en) * | 2003-04-15 | 2004-10-28 | Roberts Ralph R. | Ethynyl containing electron transport dyes and compositions |
US6855384B1 (en) | 2000-09-15 | 2005-02-15 | 3M Innovative Properties Company | Selective thermal transfer of light emitting polymer blends |
US20050116621A1 (en) * | 2003-11-18 | 2005-06-02 | Erika Bellmann | Electroluminescent devices and methods of making electroluminescent devices including a color conversion element |
US20050118923A1 (en) * | 2003-11-18 | 2005-06-02 | Erika Bellmann | Method of making an electroluminescent device including a color filter |
US20050287315A1 (en) * | 1996-04-15 | 2005-12-29 | 3M Innovative Properties Company | Texture control of thin film layers prepared via laser induced thermal imaging |
US20060138945A1 (en) * | 2004-12-28 | 2006-06-29 | Wolk Martin B | Electroluminescent devices and methods of making electroluminescent devices including an optical spacer |
US20060228974A1 (en) * | 2005-03-31 | 2006-10-12 | Theiss Steven D | Methods of making displays |
US20070082288A1 (en) * | 2005-10-07 | 2007-04-12 | Wright Robin E | Radiation curable thermal transfer elements |
US20080026306A1 (en) * | 2006-07-31 | 2008-01-31 | 3M Innovative Properties Company | Patterning and treatment methods for organic light emitting diode devices |
US20080241733A1 (en) * | 2005-10-07 | 2008-10-02 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
US20090023587A1 (en) * | 2007-07-17 | 2009-01-22 | 3M Innovative Properties Company | Method of patterning a substrate |
WO2011049782A1 (en) | 2009-10-20 | 2011-04-28 | Eastman Kodak Company | Laser-ablatable elements and methods of use |
WO2012027196A1 (en) | 2010-08-25 | 2012-03-01 | Eastman Kodak Company | Flexographic printing members |
WO2012115888A1 (en) | 2011-02-21 | 2012-08-30 | Eastman Kodak Company | Floor relief for dot improvement |
WO2012128953A1 (en) | 2011-03-22 | 2012-09-27 | Eastman Kodak Company | Laser-engraveable flexographic printing precursors |
WO2013016044A1 (en) | 2011-07-28 | 2013-01-31 | Eastman Kodak Company | Laser-engraveable compositions and flexographic printing precursors |
WO2013016060A1 (en) | 2011-07-28 | 2013-01-31 | Eastman Kodak Company | Laser engraveable compositions and flexographic printing precursors |
US8520041B2 (en) | 2011-02-21 | 2013-08-27 | Eastman Kodak Company | Floor relief for dot improvement |
US8539881B2 (en) | 2011-01-21 | 2013-09-24 | Eastman Kodak Company | Laser leveling highlight control |
US8561538B2 (en) | 2011-01-21 | 2013-10-22 | Eastman Kodak Company | Laser leveling highlight control |
WO2013158408A1 (en) | 2012-04-17 | 2013-10-24 | Eastman Kodak Company | Direct engraving of flexographic printing members |
US8709327B2 (en) | 2011-02-21 | 2014-04-29 | Eastman Kodak Company | Floor relief for dot improvement |
US8941028B2 (en) | 2012-04-17 | 2015-01-27 | Eastman Kodak Company | System for direct engraving of flexographic printing members |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3316088A (en) * | 1963-02-11 | 1967-04-25 | Ibm | Process of electrophotography based on electrophotolytic reactions and element therefor |
US3525612A (en) * | 1965-06-16 | 1970-08-25 | Eastman Kodak Co | Electrophotographic reproduction process employing a light sensitive material and a photoconductive material |
US3681066A (en) * | 1970-06-30 | 1972-08-01 | Eastman Kodak Co | Process whereby a diazo-containing material exhibits an imagewise change in triboelectric charging properties |
US4501808A (en) * | 1982-08-30 | 1985-02-26 | Canon Kabushiki Kaisha | Recording medium and process employing a photosensitive organic film |
US4650734A (en) * | 1986-06-09 | 1987-03-17 | Eastman Kodak Company | Color filter elements and electrophotographic method of making same |
US4661429A (en) * | 1986-04-28 | 1987-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
US4680244A (en) * | 1984-03-17 | 1987-07-14 | Hoechst Aktiengesellschaft | Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
US4882254A (en) * | 1988-07-05 | 1989-11-21 | Xerox Corporation | Photoconductive imaging members with mixtures of photogenerator pigment compositions |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2106659B (en) * | 1981-07-28 | 1985-02-20 | Fuji Xerox Co Ltd | Electrophotographic photosensitive materials |
US4471039A (en) * | 1982-11-22 | 1984-09-11 | Eastman Kodak Company | Photoconductive elements sensitive to radiation in the infrared region of the spectrum |
US4701396A (en) * | 1986-05-06 | 1987-10-20 | Eastman Kodak Company | Photoconductive phthalocyanine pigments, electrophotographic elements containing them and a method of use |
US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
-
1990
- 1990-12-21 US US07/632,258 patent/US5166024A/en not_active Expired - Lifetime
-
1991
- 1991-12-17 EP EP92901710A patent/EP0516796A1/en not_active Withdrawn
- 1991-12-17 JP JP4502416A patent/JPH05504215A/en active Pending
- 1991-12-17 WO PCT/US1991/009496 patent/WO1992011582A1/en not_active Application Discontinuation
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3316088A (en) * | 1963-02-11 | 1967-04-25 | Ibm | Process of electrophotography based on electrophotolytic reactions and element therefor |
US3525612A (en) * | 1965-06-16 | 1970-08-25 | Eastman Kodak Co | Electrophotographic reproduction process employing a light sensitive material and a photoconductive material |
US3681066A (en) * | 1970-06-30 | 1972-08-01 | Eastman Kodak Co | Process whereby a diazo-containing material exhibits an imagewise change in triboelectric charging properties |
US4501808A (en) * | 1982-08-30 | 1985-02-26 | Canon Kabushiki Kaisha | Recording medium and process employing a photosensitive organic film |
US4680244A (en) * | 1984-03-17 | 1987-07-14 | Hoechst Aktiengesellschaft | Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer and light-sensitive overlayer |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
US4661429A (en) * | 1986-04-28 | 1987-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
US4650734A (en) * | 1986-06-09 | 1987-03-17 | Eastman Kodak Company | Color filter elements and electrophotographic method of making same |
US4882254A (en) * | 1988-07-05 | 1989-11-21 | Xerox Corporation | Photoconductive imaging members with mixtures of photogenerator pigment compositions |
Cited By (99)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401607A (en) * | 1991-04-17 | 1995-03-28 | Polaroid Corporation | Processes and compositions for photogeneration of acid |
EP0672954A2 (en) | 1994-03-14 | 1995-09-20 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a traizine and use thereof in lithographic printing plates |
EP0689096A1 (en) | 1994-06-16 | 1995-12-27 | Eastman Kodak Company | Lithographic printing plates utilizing an oleophilic imaging layer |
EP0795420A1 (en) | 1996-03-12 | 1997-09-17 | Eastman Kodak Company | Lithographic printing plate adapted to be imaged by ablation |
US5691098A (en) * | 1996-04-03 | 1997-11-25 | Minnesota Mining And Manufacturing Company | Laser-Induced mass transfer imaging materials utilizing diazo compounds |
US5747217A (en) * | 1996-04-03 | 1998-05-05 | Minnesota Mining And Manufacturing Company | Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds |
US6461793B2 (en) | 1996-04-15 | 2002-10-08 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US20050287315A1 (en) * | 1996-04-15 | 2005-12-29 | 3M Innovative Properties Company | Texture control of thin film layers prepared via laser induced thermal imaging |
US6099994A (en) * | 1996-04-15 | 2000-08-08 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US6866979B2 (en) | 1996-04-15 | 2005-03-15 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US20050153081A1 (en) * | 1996-04-15 | 2005-07-14 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US6190826B1 (en) | 1996-04-15 | 2001-02-20 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US20040110083A1 (en) * | 1996-04-15 | 2004-06-10 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US5981136A (en) * | 1996-04-15 | 1999-11-09 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US20060063672A1 (en) * | 1996-04-15 | 2006-03-23 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US7226716B2 (en) | 1996-04-15 | 2007-06-05 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US20070128383A1 (en) * | 1996-04-15 | 2007-06-07 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US6582877B2 (en) | 1996-04-15 | 2003-06-24 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US6270934B1 (en) | 1996-04-15 | 2001-08-07 | 3M Innovative Properties Company | Laser addressable thermal transfer imaging element with an interlayer |
US7534543B2 (en) | 1996-04-15 | 2009-05-19 | 3M Innovative Properties Company | Texture control of thin film layers prepared via laser induced thermal imaging |
US5998085A (en) * | 1996-07-23 | 1999-12-07 | 3M Innovative Properties | Process for preparing high resolution emissive arrays and corresponding articles |
US6270944B1 (en) | 1999-01-15 | 2001-08-07 | 3M Innovative Properties Company | Thermal transfer element for forming multilayers devices |
EP1342585A1 (en) | 1999-01-15 | 2003-09-10 | 3M Innovative Properties Company | Method of making an electroluminescent device |
US6114088A (en) * | 1999-01-15 | 2000-09-05 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
US6140009A (en) * | 1999-01-15 | 2000-10-31 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
US6214520B1 (en) | 1999-01-15 | 2001-04-10 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
US6410201B2 (en) | 1999-01-15 | 2002-06-25 | 3M Innovative Properties Company | Thermal transfer element and process for forming organic electroluminescent devices |
US6221553B1 (en) | 1999-01-15 | 2001-04-24 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
US6582876B2 (en) | 1999-01-15 | 2003-06-24 | 3M Innovative Properties Company | Thermal transfer element and process for forming organic electroluminescent devices |
US6586153B2 (en) | 1999-01-15 | 2003-07-01 | 3M Innovative Properties Company | Multilayer devices formed by multilayer thermal transfer |
US20040095457A1 (en) * | 1999-05-14 | 2004-05-20 | 3M Innovative Properties Company | Thermal transfer of a black matrix containing carbon black |
US6617093B2 (en) | 1999-05-14 | 2003-09-09 | 3M Innovative Properties Company | Thermal transfer of a black matrix containing carbon black |
US6783915B2 (en) | 1999-05-14 | 2004-08-31 | 3M Innovative Properties Company | Thermal transfer of a black matrix containing carbon black |
US6228543B1 (en) | 1999-09-09 | 2001-05-08 | 3M Innovative Properties Company | Thermal transfer with a plasticizer-containing transfer layer |
US6770337B2 (en) | 1999-11-30 | 2004-08-03 | 3M Innovative Properties Company | Thermal transfer of microstructured layers |
US6521324B1 (en) | 1999-11-30 | 2003-02-18 | 3M Innovative Properties Company | Thermal transfer of microstructured layers |
US6689538B2 (en) | 1999-12-28 | 2004-02-10 | 3M Innovative Properties Company | Thermal mass transfer donor element |
US6228555B1 (en) | 1999-12-28 | 2001-05-08 | 3M Innovative Properties Company | Thermal mass transfer donor element |
US6468715B2 (en) | 1999-12-28 | 2002-10-22 | 3M Innovative Properties Company | Thermal mass transfer donor element |
US6284425B1 (en) | 1999-12-28 | 2001-09-04 | 3M Innovative Properties | Thermal transfer donor element having a heat management underlayer |
US6242152B1 (en) | 2000-05-03 | 2001-06-05 | 3M Innovative Properties | Thermal transfer of crosslinked materials from a donor to a receptor |
US6667143B2 (en) | 2000-09-15 | 2003-12-23 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US6358664B1 (en) | 2000-09-15 | 2002-03-19 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US6482564B2 (en) | 2000-09-15 | 2002-11-19 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US6855384B1 (en) | 2000-09-15 | 2005-02-15 | 3M Innovative Properties Company | Selective thermal transfer of light emitting polymer blends |
US6596460B2 (en) | 2000-12-29 | 2003-07-22 | Kodak Polychrome Graphics Llc | Polyvinyl acetals having azido groups and use thereof in radiation-sensitive compositions |
US6485884B2 (en) | 2001-04-27 | 2002-11-26 | 3M Innovative Properties Company | Method for patterning oriented materials for organic electronic displays and devices |
US6844128B2 (en) | 2001-08-16 | 2005-01-18 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US20070080634A1 (en) * | 2001-08-16 | 2007-04-12 | 3M Innovative Properties Company | Thermal transfer of light-emitting dendrimers |
US20040161696A1 (en) * | 2001-08-16 | 2004-08-19 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US7445825B2 (en) | 2001-08-16 | 2008-11-04 | 3M Innovative Properties Company | Donor sheet having a polymerizable, amorphous matrix with electrically active material disposed therein |
US7977864B2 (en) | 2001-08-16 | 2011-07-12 | Samsung Mobile Display Co., Ltd. | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US20040121068A1 (en) * | 2001-08-16 | 2004-06-24 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US20080007166A1 (en) * | 2001-08-16 | 2008-01-10 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US7014978B2 (en) | 2001-08-16 | 2006-03-21 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US6699597B2 (en) | 2001-08-16 | 2004-03-02 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US20060127797A1 (en) * | 2001-08-16 | 2006-06-15 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US7276322B2 (en) | 2001-08-16 | 2007-10-02 | 3M Innovative Properties Company | Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein |
US20030124265A1 (en) * | 2001-12-04 | 2003-07-03 | 3M Innovative Properties Company | Method and materials for transferring a material onto a plasma treated surface according to a pattern |
US20070237983A1 (en) * | 2002-04-19 | 2007-10-11 | 3M Innovative Properties Company | Electroluminescent materials and methods of manufacture and use |
US7241512B2 (en) | 2002-04-19 | 2007-07-10 | 3M Innovative Properties Company | Electroluminescent materials and methods of manufacture and use |
US7442421B2 (en) | 2002-04-19 | 2008-10-28 | 3M Innovative Properties Company | Electroluminescent materials and methods of manufacture and use |
US7282275B2 (en) | 2002-04-19 | 2007-10-16 | 3M Innovative Properties Company | Materials for organic electronic devices |
US20030224205A1 (en) * | 2002-04-19 | 2003-12-04 | 3M Innovative Properties Company | Electroluminescent materials and methods of manufacture and use |
US20030219625A1 (en) * | 2002-04-19 | 2003-11-27 | 3M Innovative Properties Company | Materials for organic electronic devices |
US20040062947A1 (en) * | 2002-09-25 | 2004-04-01 | Lamansky Sergey A. | Organic electroluminescent compositions |
US20070107835A1 (en) * | 2003-04-15 | 2007-05-17 | 3M Innovative Properties Company | Ethynyl containing electron transport dyes and compositions |
US7271406B2 (en) | 2003-04-15 | 2007-09-18 | 3M Innovative Properties Company | Electron transport agents for organic electronic devices |
US7192657B2 (en) | 2003-04-15 | 2007-03-20 | 3M Innovative Properties Company | Ethynyl containing electron transport dyes and compositions |
US20040214036A1 (en) * | 2003-04-15 | 2004-10-28 | 3M Innovative Properties Company | Electron transport agents for organic electronic devices |
US20040214037A1 (en) * | 2003-04-15 | 2004-10-28 | Roberts Ralph R. | Ethynyl containing electron transport dyes and compositions |
US20050116621A1 (en) * | 2003-11-18 | 2005-06-02 | Erika Bellmann | Electroluminescent devices and methods of making electroluminescent devices including a color conversion element |
US20050118923A1 (en) * | 2003-11-18 | 2005-06-02 | Erika Bellmann | Method of making an electroluminescent device including a color filter |
US7892382B2 (en) | 2003-11-18 | 2011-02-22 | Samsung Mobile Display Co., Ltd. | Electroluminescent devices and methods of making electroluminescent devices including a color conversion element |
US20060138945A1 (en) * | 2004-12-28 | 2006-06-29 | Wolk Martin B | Electroluminescent devices and methods of making electroluminescent devices including an optical spacer |
US8569948B2 (en) | 2004-12-28 | 2013-10-29 | Samsung Display Co., Ltd. | Electroluminescent devices and methods of making electroluminescent devices including an optical spacer |
US9918370B2 (en) | 2004-12-28 | 2018-03-13 | Samsung Display Co., Ltd. | Electroluminescent devices and methods of making electroluminescent devices including an optical spacer |
US7645478B2 (en) | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
US20060228974A1 (en) * | 2005-03-31 | 2006-10-12 | Theiss Steven D | Methods of making displays |
US7396631B2 (en) | 2005-10-07 | 2008-07-08 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
US7678526B2 (en) | 2005-10-07 | 2010-03-16 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
US20080241733A1 (en) * | 2005-10-07 | 2008-10-02 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
US20070082288A1 (en) * | 2005-10-07 | 2007-04-12 | Wright Robin E | Radiation curable thermal transfer elements |
US7670450B2 (en) | 2006-07-31 | 2010-03-02 | 3M Innovative Properties Company | Patterning and treatment methods for organic light emitting diode devices |
US20080026306A1 (en) * | 2006-07-31 | 2008-01-31 | 3M Innovative Properties Company | Patterning and treatment methods for organic light emitting diode devices |
US20090023587A1 (en) * | 2007-07-17 | 2009-01-22 | 3M Innovative Properties Company | Method of patterning a substrate |
US7927454B2 (en) | 2007-07-17 | 2011-04-19 | Samsung Mobile Display Co., Ltd. | Method of patterning a substrate |
WO2011049782A1 (en) | 2009-10-20 | 2011-04-28 | Eastman Kodak Company | Laser-ablatable elements and methods of use |
WO2012027196A1 (en) | 2010-08-25 | 2012-03-01 | Eastman Kodak Company | Flexographic printing members |
US8539881B2 (en) | 2011-01-21 | 2013-09-24 | Eastman Kodak Company | Laser leveling highlight control |
US8561538B2 (en) | 2011-01-21 | 2013-10-22 | Eastman Kodak Company | Laser leveling highlight control |
US8520041B2 (en) | 2011-02-21 | 2013-08-27 | Eastman Kodak Company | Floor relief for dot improvement |
US8709327B2 (en) | 2011-02-21 | 2014-04-29 | Eastman Kodak Company | Floor relief for dot improvement |
WO2012115888A1 (en) | 2011-02-21 | 2012-08-30 | Eastman Kodak Company | Floor relief for dot improvement |
WO2012128953A1 (en) | 2011-03-22 | 2012-09-27 | Eastman Kodak Company | Laser-engraveable flexographic printing precursors |
WO2013016060A1 (en) | 2011-07-28 | 2013-01-31 | Eastman Kodak Company | Laser engraveable compositions and flexographic printing precursors |
WO2013016044A1 (en) | 2011-07-28 | 2013-01-31 | Eastman Kodak Company | Laser-engraveable compositions and flexographic printing precursors |
WO2013158408A1 (en) | 2012-04-17 | 2013-10-24 | Eastman Kodak Company | Direct engraving of flexographic printing members |
US8941028B2 (en) | 2012-04-17 | 2015-01-27 | Eastman Kodak Company | System for direct engraving of flexographic printing members |
Also Published As
Publication number | Publication date |
---|---|
WO1992011582A1 (en) | 1992-07-09 |
EP0516796A1 (en) | 1992-12-09 |
JPH05504215A (en) | 1993-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5166024A (en) | Photoelectrographic imaging with near-infrared sensitizing pigments | |
US5204198A (en) | Photoelectrographic elements utilizing nonionic sulfonic acid photogenerators | |
US4661429A (en) | Photoelectrographic elements and imaging method | |
US5681678A (en) | Charge generation layer containing hydroxyalkyl acrylate reaction product | |
US3533783A (en) | Light adapted photoconductive elements | |
GB1560496A (en) | Photoconductive compositions | |
US5256510A (en) | Photoelectrographic imaging with near-infrared sensitizing dyes | |
US4390610A (en) | Layered electrophotographic imaging element, apparatus and method sensitive to gallium arsenide laser, the element including two charge generation layers and a polycarbonate adhesive layer | |
US5403686A (en) | Electrophotographic element and imaging method exhibiting reduced incidence of laser interference patterns | |
US5324604A (en) | Multi-active electrophotographic element and imaging process using free radicals as charge transport material | |
US5221591A (en) | Photoelectrographic imaging with a multi-active element containing near-infrared sensitizing pigments | |
US3615418A (en) | Heterogeneous dye-binder photoconductive compositions | |
US5240800A (en) | Near-infrared radiation sensitive photoelectrographic master and imaging method | |
US5221590A (en) | Photoelectrographic imaging with dyes or pigments to effect a color density or hue shift | |
US5244767A (en) | Photoelectrographic imaging with near-infrared sensitizing pigments | |
US3784376A (en) | Photoconductive element containing furans, indoles, or thiophenes | |
US3810759A (en) | Matte photoconductive layers for use in electrophotography | |
EP0402979A1 (en) | Electrophotographic recording material | |
WO1992011581A1 (en) | Photoelectrographic imaging with near-infrared sensitizing dyes | |
US3671233A (en) | Photoconductive elements containing alkali-release materials | |
EP0525117B1 (en) | Photoelectrographic elements | |
WO1992022856A1 (en) | Photoelectrographic imaging with a multi-active element containing near-infrared sensitizing pigments | |
JPS63178240A (en) | electrophotographic photoreceptor | |
US5288582A (en) | Photoelectrographic method for printing | |
US4429030A (en) | Photoconductive compositions |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: EASTMAN KODAK COMPANY, ROCHESTER, NY A CORP. OF NJ Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:BUGNER, DOUGLAS E.;MEY, WILLIAM;FULMER, G. GARY;REEL/FRAME:005561/0043;SIGNING DATES FROM 19901202 TO 19901218 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Free format text: PAYER NUMBER DE-ASSIGNED (ORIGINAL EVENT CODE: RMPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
FPAY | Fee payment |
Year of fee payment: 4 |
|
FPAY | Fee payment |
Year of fee payment: 8 |
|
FPAY | Fee payment |
Year of fee payment: 12 |