US3993548A - Zinc electrodeposition process and bath for use therein - Google Patents
Zinc electrodeposition process and bath for use therein Download PDFInfo
- Publication number
- US3993548A US3993548A US05/579,529 US57952975A US3993548A US 3993548 A US3993548 A US 3993548A US 57952975 A US57952975 A US 57952975A US 3993548 A US3993548 A US 3993548A
- Authority
- US
- United States
- Prior art keywords
- sub
- silicate
- quaternary ammonium
- bath
- ammonium silicate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000011701 zinc Substances 0.000 title claims abstract description 24
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 229910052725 zinc Inorganic materials 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 12
- 238000004070 electrodeposition Methods 0.000 title claims 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 27
- -1 quaternary ammonium silicates Chemical class 0.000 claims abstract description 26
- 238000007747 plating Methods 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- APSPVJKFJYTCTN-UHFFFAOYSA-N tetramethylazanium;silicate Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.[O-][Si]([O-])([O-])[O-] APSPVJKFJYTCTN-UHFFFAOYSA-N 0.000 claims abstract description 7
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims description 15
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 6
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- ZNEOHLHCKGUAEB-UHFFFAOYSA-N trimethylphenylammonium Chemical compound C[N+](C)(C)C1=CC=CC=C1 ZNEOHLHCKGUAEB-UHFFFAOYSA-N 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 3
- BSVSPZGXUSFFEG-UHFFFAOYSA-N dihydroxy(oxo)silane;tetrakis(2-hydroxyethyl)azanium Chemical compound O[Si](O)=O.OCC[N+](CCO)(CCO)CCO BSVSPZGXUSFFEG-UHFFFAOYSA-N 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims 2
- 238000007670 refining Methods 0.000 claims 1
- 239000000654 additive Substances 0.000 abstract description 18
- 150000004760 silicates Chemical class 0.000 abstract description 5
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000002738 chelating agent Substances 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000000741 silica gel Substances 0.000 description 5
- 229910002027 silica gel Inorganic materials 0.000 description 5
- 229910052909 inorganic silicate Inorganic materials 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- 229920002873 Polyethylenimine Polymers 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- 229960003237 betaine Drugs 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- 150000002466 imines Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- RMHDCOAEUDZPQY-UHFFFAOYSA-N C(C1=CN=CC=C1)(=O)O.C(C1=CC=CC=C1)Cl Chemical compound C(C1=CN=CC=C1)(=O)O.C(C1=CC=CC=C1)Cl RMHDCOAEUDZPQY-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910020489 SiO3 Inorganic materials 0.000 description 1
- DMRGQPFLOCWLGB-UHFFFAOYSA-N [Si]([O-])([O-])([O-])O[Si]([O-])([O-])[O-].C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C Chemical compound [Si]([O-])([O-])([O-])O[Si]([O-])([O-])[O-].C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C.C(C1=CC=CC=C1)[N+](C)(C)C DMRGQPFLOCWLGB-UHFFFAOYSA-N 0.000 description 1
- ADEWJNQKRUGEAM-UHFFFAOYSA-N [Si]([O-])([O-])([O-])O[Si]([O-])([O-])[O-].C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C Chemical compound [Si]([O-])([O-])([O-])O[Si]([O-])([O-])[O-].C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C.C1(=CC=CC=C1)[N+](C)(C)C ADEWJNQKRUGEAM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007701 flash-distillation Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- PMYUVOOOQDGQNW-UHFFFAOYSA-N hexasodium;trioxido(trioxidosilyloxy)silane Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])O[Si]([O-])([O-])[O-] PMYUVOOOQDGQNW-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- QJQRNDGUWQVAEV-AAFSJPGBSA-M sodium bisulfite adduct Chemical compound [Na+].[O-]S(=O)(=O)C([C@H]1N(C(C2=C3)=O)C=C(C1)/C=C/C(=O)N(C)C)NC2=CC1=C3OCO1 QJQRNDGUWQVAEV-AAFSJPGBSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- GTLDTDOJJJZVBW-UHFFFAOYSA-N zinc cyanide Chemical compound [Zn+2].N#[C-].N#[C-] GTLDTDOJJJZVBW-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
Definitions
- the present invention is directed to composition and methods for electrodepositing zinc, and more particularly, to the use of certain additives in such baths to reduce the interference of heavy metal impurities with the electroplating function. Also, these additives brighten the electrodeposited zinc, and also serve to refine the grain structure of the zinc deposit.
- the zinc plating bath is of the alkaline type, containing essentially zincate ions and an alkali, however, improved results may also be obtained by the incorporation of the additives in zinc plating solutions which contain cyanide.
- inorganic silicates to a low cyanide zinc plating bath containing less than about 15 grams per liter of free cyanide.
- soluble inorganic silicates generally include sodium silicate, sodium disilicate or sodium metasilicate.
- the prior art literature attributes the efficacy of the inorganic silicates as additives to some unexplained effect upon the water used either to make up the bath or to rinse the part to be plated. This same prior art indicates that the baths containing inorganic silicates will give essentially the same results as baths which were made up using distilled water, although free of the silicate additives.
- the additives of this invention preferably are quaternary ammonium silicates which are water soluble, and more particularly, quaternary ammonium silicates which include tetramethylammonium silicate, phenyltrimethylammonium silicate, disilicate and trisilicate, and benzyltrimethylammonium silicate and disilicate.
- quaternary ammonium silicates which include tetramethylammonium silicate, phenyltrimethylammonium silicate, disilicate and trisilicate, and benzyltrimethylammonium silicate and disilicate.
- R is a quaternary ammonium radical substituted with four organic groups selected from the groups alkyl, alkylene, alkanol, aryl, alkylaryl or mixtures thereof, where R' is either R or hydrogen, where x equals 1 to 3 and where y equals 0 to 15.
- compositions and methods of this invention broadly comprise zinc plating baths, which may or may not contain cyanide ions, and is further directed to additives for baths of the character mentioned.
- the compositions of this invention are especially useful in baths which contain no free cyanide, and which are referred to in the art as "alkaline zinc baths".
- the additives of the present invention produce improved results in cyanide-containing baths, although generally the results are less pronounced. It is therefore contemplated that the primary utilization of the additives of the present invention will be in alkaline zinc plating baths, however, this is not the only type of bath in which the additives disclosed herein may be effectively utilized.
- the baths of the instant invention include as additives quaternary ammonium silicates.
- quaternary ammonium silicates The synthesis and characterization of quaternary ammonium silicates appear in the literature as in the article by Merrill and Spencer, "Some Quaternary Ammonium Silicates", published in the Journal of Physical and Colloid Chemistry, 55, 187 (1951).
- quaternary ammonium silicates are manufactured by the dissolution of silica gel in solutions of quaternary ammonium hydroxides. Generally an excess of silica gel (2 moles of silica gel per mole of base) is revolved in a ball mill for about 48 hours at room temperature. The resultant solutions are concentrated by evaporation under vacuum and recrystallized in hot water before drying to a constant weight in a vacuum desiccator.
- R is a quaternary ammonium radical substituted with four methyl groups.
- tetramethylammonium silicate was predominately the salt of the monobasic acid having the formula (CH 3 ) 4 NH SiO 3 . 5H 2 O.
- the quaternary ammonium silicates of the present invention can be expressed either in terms of the compound obtained or in terms of the composition reaction ingredients.
- Tetramethylammonium silicate may be defined as either:
- R is the quaternary ammonium radical substituted with four methyl groups
- R' is hydrogen
- x equals 1
- y equals 5.
- Phenyltrimethylammonium silicate may be defined as either:
- R is the quaternary ammonium radical substituted with one phenyl group and three methyl groups
- R' is hydrogen
- x equals 1
- y equals 5.
- Phenyltrimethyl ammonium disilicate may be defined as either:
- R and R' are both the quaternary ammonium radical substituted with one phenyl groups and three methyl groups, x equals 3 and y equals 13.
- Tetraethanolammonium silicate may be defined as either:
- R is the quaternary ammonium radical substituted with four hydroxyethyl groups
- R' is hydrogen
- x equals 1
- y 0.
- Tetramethanol ammonium silicate may be defined as either:
- R is the quaternary ammonium radical substituted with four hydroxylmethyl groups
- R' is hydrogen
- x equals 1
- y 0.
- benzyltrimethylammonium silicate or benzyltrimethylammonium disilicate may be utilized.
- ammonium silicates corresponding to the formula
- R is a quaternary ammonium radical substituted with four organic groups selected from the groups alkylene, alkyl, alkanol, aryl, alkylaryl or mixtures thereof, where R' is either R or hydrogen, where x equals 1 to 3 and where y equals 0 to 15, may be utilized, so long as the quaternary ammonium silicate is water soluble or is soluble in the bath.
- polymeric ammonium silicates may be prepared by the same general procedure as exemplified below.
- polymeric quaternary ammonium hydroxide (220 ml, 0.25 mole-units) there was added 33 grams of silica gel (70-325 mesh; E. Merck). The mixture was rotated in a ball mill at room temperature for 48 hours, and the excess, finely ground silica gel removed by filtration. There was obtained 250 ml of a solution of the polymeric quaternary ammonium silicate.
- the quaternary ammonium silicates are added to the bath in an amount ranging from about 0.01 grams to about 100 grams per liter of bath, and additions of about 1 gram per liter are preferred.
- Organic silicates function well in plating baths operated under normal production temperatures of about 60° F to 140° F, preferably about 70° F to 100° F.
- the bath may well include other ingredients which serve to modify the bath.
- inclusions of betaine of nicotinic acid benzylchloride can be utilized as a modifing agent.
- polyethylene imines molecular weight approximately 1800
- reaction products of epichlorohydrin and amines such as hexamethylene tetraamine, imidazole, ammonia, ethylene diamine.
- a standard Hull cell containing 267cc of the above solution was utilized to plate a standard steel panel at ambient room temperature for 15 minutes at 2 amps.
- the plated panel was dark in the low current density of the panel and stained otherwise.
- Example I A solution as set forth in Example I was prepared, however, in this instance 2cc of a quaternary ammonium silicate was obtained by reacting SiO 2 powder with tetramethyl ammonium hydroxide.
- Example II The same plating procedure as in Example I was followed, and the test panel after 15 minutes of plating at ambient room temperature at 2 amps was free of stains, much brighter, and had a bright low current density recess.
- a polymeric quaternary base and the ammonium silicate of the base was prepared in the manner earlier described and tested in a zincate solution.
- a zincate solution was charged with 3 g/l of the polymeric quaternary ammonium silicate plus 150 mg/l of the sodium bisulfite adduct of anisaldehyde.
- a steel cathode was plated at 1 amps for 10 minutes at room temperature.
- composition of the zincate solution was:
- Plating was performed in a 267cc standard Hull Cell, and was noted that the zinc plated panel had a bright current density range from about 5 to 30 amps/sq.ft. and the rest of the deposit was semi-bright.
- quaternary ammonium silicates preferably of the alkaline type are utilized.
- exemplary of such additives are tetramethylammonium silicate, phenyltrimethyl silicate, disilicate and trisilicate, benzyltrimethylammonium silicate and disilicate, and silicates of polymeric quaternary bases.
- Quaternary ammonium silicates are water soluble, function as chelating agents for metallic impurities in the bath, refine the grain structure of the zinc deposit, and are also effective as auxiliary brighteners.
- an advantage of utilizing polymeric ammonium silicates lies in the fact that only a single additive is necessary in order to obtain sound zinc deposits.
- the use of inorganic or non-polymeric organic silicates requires at least two additives, namely, an effective amine plus the inorganic or non-polymeric organic silicate.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
ROR' : xSiO.sub.2 : yH.sub.2 O
1.00 ROH : 1.00 SiO.sub.2 : 4.30 H.sub.2 O
(CH.sub.3).sub.4 NH SiO.sub.3 . 5H.sub.2 O
ROR' : xSiO.sub.2 : yH.sub.2 O
C.sub.6 H.sub.5 (CH.sub.3).sub.3 NH SiO.sub.3 . 5H.sub.2 O
ROR' : xSiO.sub.2 : yH.sub.2 O
[C.sub.6 H.sub.5 (CH.sub. 3).sub.3 N].sub.2 Si.sub.2 O.sub.5 . 3H.sub.2 O
ROR' : xSiO.sub.2 : yH.sub.2 O
(C.sub.2 H.sub.4 OH).sub.4 NH SiO.sub.3
ROR' : xSiO.sub.2 : y H.sub.2 O
(CH.sub.2 OH).sub.4 NH SiO.sub.3
ROR' : xSiO.sub.2 : yH.sub.2 O
ROR' : xSiO.sub.2 : yH.sub.2 O
[Cl -- CH.sub.2 -- CHOH -- CH.sub.2 -- N (CH.sub.3).sub.3 ].sup.+Cl.sup.-
______________________________________ Zn.sup.- 1.3 oz/gal NaOH 14.6 oz/gal Benzyl betaine of nicotinic acid 100 mg/l Polyethlene imine (MW 1000) 5 g/l ______________________________________
______________________________________ 1.0 oz/gal Zinc 11.0 oz/gal NaOH ______________________________________
Claims (5)
ROR' : xSiO.sub.2 : yH.sub.2 O
ROR' : xSiO.sub.2 : yH.sub.2 O
ROR' : xSiO.sub.2 : yH.sub.2 O
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/579,529 US3993548A (en) | 1975-05-21 | 1975-05-21 | Zinc electrodeposition process and bath for use therein |
| GB48381/75A GB1529229A (en) | 1975-05-21 | 1975-11-25 | Zinc electrodeposition process and bath for use therein |
| CA240,521A CA1050472A (en) | 1975-05-21 | 1975-11-26 | Zinc electrodeposition process and bath for use therein |
| JP50144583A JPS51138540A (en) | 1975-05-21 | 1975-12-04 | Method of electrodepositing zinc and bath composition therefor |
| FR7537371A FR2311865A1 (en) | 1975-05-21 | 1975-12-05 | ZINC ELECTROLYTIC DEPOSIT PROCESS AND BATHS USED FOR THIS PURPOSE |
| DE19762612227 DE2612227A1 (en) | 1975-05-21 | 1976-03-23 | GALVANIC PROCESS FOR ZINC DEPOSITION, AND CORRESPONDING ELECTROLYSIS BATH |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/579,529 US3993548A (en) | 1975-05-21 | 1975-05-21 | Zinc electrodeposition process and bath for use therein |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3993548A true US3993548A (en) | 1976-11-23 |
Family
ID=24317274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US05/579,529 Expired - Lifetime US3993548A (en) | 1975-05-21 | 1975-05-21 | Zinc electrodeposition process and bath for use therein |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3993548A (en) |
| JP (1) | JPS51138540A (en) |
| CA (1) | CA1050472A (en) |
| DE (1) | DE2612227A1 (en) |
| FR (1) | FR2311865A1 (en) |
| GB (1) | GB1529229A (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4135992A (en) * | 1976-12-24 | 1979-01-23 | Basf Aktiengesellschaft | Zinc electroplating bath |
| US4857159A (en) * | 1987-03-25 | 1989-08-15 | The Standard Oil Company | Electrodeposition recovery method for metals in polymer chelates |
| US5489373A (en) * | 1995-02-02 | 1996-02-06 | Olin Corporation | Aqueous zinc solution resistant to precipitation |
| WO1999031301A1 (en) * | 1997-12-12 | 1999-06-24 | Wm. Canning Ltd. | Method for coating aluminium products with zinc |
| DE19848467A1 (en) * | 1998-10-21 | 2000-04-27 | Hillebrand Walter Gmbh & Co Kg | Alkaline zinc-nickel bath for cathodic separation of zinc/nickel alloy coatings contains polyethylene imines and N-benzyl-nicotinate betaine |
| US6468411B1 (en) | 2001-07-11 | 2002-10-22 | Taskem Inc. | Brightener for zinc-nickel plating bath and method of electroplating |
| WO2001071067A3 (en) * | 2000-03-22 | 2003-02-06 | Elisha Technologies Co Llc | An energy enhanced process for treating a conductive surface and products formed thereby |
| US6572756B2 (en) | 1997-01-31 | 2003-06-03 | Elisha Holding Llc | Aqueous electrolytic medium |
| US6599643B2 (en) | 1997-01-31 | 2003-07-29 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
| US20030165627A1 (en) * | 2002-02-05 | 2003-09-04 | Heimann Robert L. | Method for treating metallic surfaces and products formed thereby |
| EP1816234A1 (en) | 2006-01-31 | 2007-08-08 | Atotech Deutschland Gmbh | Aqueous passivating coating composition for zinc or zinc alloys and method for using same as well as the use of a compound selected from the group comprising nicotinic acid, its salts and derivates |
| US20100155257A1 (en) * | 2006-06-21 | 2010-06-24 | Atotech Deutschland Gmbh | Aqueous, alkaline, cyanide-free bath for the galvanic deposition of zinc alloy coatings |
| CN105463521A (en) * | 2016-01-07 | 2016-04-06 | 杭州东方表面技术有限公司 | Environment-friendly cyanide-free alkaline zinc plating purification additive |
| CN107937941A (en) * | 2017-12-07 | 2018-04-20 | 江门市高信科技有限公司 | A kind of preparation method of the dedicated non-cyanogen galvanization brightener of potassium salt system |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011057936A (en) * | 2009-09-14 | 2011-03-24 | Sony Corp | Curing accelerator, epoxy resin molding, epoxy resin-based adhesive, curing agent, and solid crystal |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3856637A (en) * | 1973-07-09 | 1974-12-24 | Lea Ronaf Inc | Methods of electroplating zinc and cyanide free or low cyanide zinc plating baths therefor |
-
1975
- 1975-05-21 US US05/579,529 patent/US3993548A/en not_active Expired - Lifetime
- 1975-11-25 GB GB48381/75A patent/GB1529229A/en not_active Expired
- 1975-11-26 CA CA240,521A patent/CA1050472A/en not_active Expired
- 1975-12-04 JP JP50144583A patent/JPS51138540A/en active Pending
- 1975-12-05 FR FR7537371A patent/FR2311865A1/en not_active Withdrawn
-
1976
- 1976-03-23 DE DE19762612227 patent/DE2612227A1/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3856637A (en) * | 1973-07-09 | 1974-12-24 | Lea Ronaf Inc | Methods of electroplating zinc and cyanide free or low cyanide zinc plating baths therefor |
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4135992A (en) * | 1976-12-24 | 1979-01-23 | Basf Aktiengesellschaft | Zinc electroplating bath |
| US4857159A (en) * | 1987-03-25 | 1989-08-15 | The Standard Oil Company | Electrodeposition recovery method for metals in polymer chelates |
| US5489373A (en) * | 1995-02-02 | 1996-02-06 | Olin Corporation | Aqueous zinc solution resistant to precipitation |
| US6592738B2 (en) | 1997-01-31 | 2003-07-15 | Elisha Holding Llc | Electrolytic process for treating a conductive surface and products formed thereby |
| US6994779B2 (en) | 1997-01-31 | 2006-02-07 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
| US20030178317A1 (en) * | 1997-01-31 | 2003-09-25 | Heimann Robert I. | Energy enhanced process for treating a conductive surface and products formed thereby |
| US6599643B2 (en) | 1997-01-31 | 2003-07-29 | Elisha Holding Llc | Energy enhanced process for treating a conductive surface and products formed thereby |
| US6572756B2 (en) | 1997-01-31 | 2003-06-03 | Elisha Holding Llc | Aqueous electrolytic medium |
| WO1999031301A1 (en) * | 1997-12-12 | 1999-06-24 | Wm. Canning Ltd. | Method for coating aluminium products with zinc |
| DE19848467C5 (en) * | 1998-10-21 | 2006-04-27 | Walter Hillebrand Gmbh & Co. Kg Galvanotechnik | Alkaline zinc-nickel bath |
| DE19848467C2 (en) * | 1998-10-21 | 2003-02-27 | Hillebrand Walter Gmbh & Co Kg | Alkaline zinc-nickel bath |
| DE19848467A1 (en) * | 1998-10-21 | 2000-04-27 | Hillebrand Walter Gmbh & Co Kg | Alkaline zinc-nickel bath for cathodic separation of zinc/nickel alloy coatings contains polyethylene imines and N-benzyl-nicotinate betaine |
| WO2001071067A3 (en) * | 2000-03-22 | 2003-02-06 | Elisha Technologies Co Llc | An energy enhanced process for treating a conductive surface and products formed thereby |
| US6468411B1 (en) | 2001-07-11 | 2002-10-22 | Taskem Inc. | Brightener for zinc-nickel plating bath and method of electroplating |
| US20030165627A1 (en) * | 2002-02-05 | 2003-09-04 | Heimann Robert L. | Method for treating metallic surfaces and products formed thereby |
| US6866896B2 (en) | 2002-02-05 | 2005-03-15 | Elisha Holding Llc | Method for treating metallic surfaces and products formed thereby |
| EP1816234A1 (en) | 2006-01-31 | 2007-08-08 | Atotech Deutschland Gmbh | Aqueous passivating coating composition for zinc or zinc alloys and method for using same as well as the use of a compound selected from the group comprising nicotinic acid, its salts and derivates |
| US20090032146A1 (en) * | 2006-01-31 | 2009-02-05 | Atotech Deutschland Gmbh | Aqueous Reaction Solution and Method of Passivating Workpieces Having Zinc or Zinc Alloy Surfaces and Use of a Heteroaromatic Compound |
| US8262811B2 (en) | 2006-01-31 | 2012-09-11 | Atotech Deutschland Gmbh | Aqueous reaction solution and method of passivating workpieces having zinc or zinc alloy surfaces and use of a heteroaromatic compound |
| US20100155257A1 (en) * | 2006-06-21 | 2010-06-24 | Atotech Deutschland Gmbh | Aqueous, alkaline, cyanide-free bath for the galvanic deposition of zinc alloy coatings |
| CN105463521A (en) * | 2016-01-07 | 2016-04-06 | 杭州东方表面技术有限公司 | Environment-friendly cyanide-free alkaline zinc plating purification additive |
| CN107937941A (en) * | 2017-12-07 | 2018-04-20 | 江门市高信科技有限公司 | A kind of preparation method of the dedicated non-cyanogen galvanization brightener of potassium salt system |
| CN107937941B (en) * | 2017-12-07 | 2019-06-11 | 江门市高信科技有限公司 | A kind of preparation method of the dedicated non-cyanogen galvanization brightener of potassium salt system |
Also Published As
| Publication number | Publication date |
|---|---|
| CA1050472A (en) | 1979-03-13 |
| GB1529229A (en) | 1978-10-18 |
| DE2612227A1 (en) | 1976-12-02 |
| FR2311865A1 (en) | 1976-12-17 |
| JPS51138540A (en) | 1976-11-30 |
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