US3440151A - Electrodeposition of copper-tin alloys - Google Patents
Electrodeposition of copper-tin alloys Download PDFInfo
- Publication number
- US3440151A US3440151A US460852A US3440151DA US3440151A US 3440151 A US3440151 A US 3440151A US 460852 A US460852 A US 460852A US 3440151D A US3440151D A US 3440151DA US 3440151 A US3440151 A US 3440151A
- Authority
- US
- United States
- Prior art keywords
- bath
- copper
- tin
- alkali
- cyanide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical group [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 title description 8
- 229910001128 Sn alloy Inorganic materials 0.000 title description 3
- 238000004070 electrodeposition Methods 0.000 title 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 12
- 239000003513 alkali Substances 0.000 description 11
- 229910052783 alkali metal Inorganic materials 0.000 description 10
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 9
- 229960001484 edetic acid Drugs 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 238000007747 plating Methods 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 7
- 229940108928 copper Drugs 0.000 description 7
- 239000010802 sludge Substances 0.000 description 7
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 6
- 239000004615 ingredient Substances 0.000 description 6
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229940071182 stannate Drugs 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 3
- -1 aliphatic amines Chemical class 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 239000010974 bronze Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-M Aminoacetate Chemical compound NCC([O-])=O DHMQDGOQFOQNFH-UHFFFAOYSA-M 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- MJOQJPYNENPSSS-XQHKEYJVSA-N [(3r,4s,5r,6s)-4,5,6-triacetyloxyoxan-3-yl] acetate Chemical compound CC(=O)O[C@@H]1CO[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O MJOQJPYNENPSSS-XQHKEYJVSA-N 0.000 description 2
- 125000005238 alkylenediamino group Chemical group 0.000 description 2
- GRKUXCWELVWVMZ-UHFFFAOYSA-N amino acetate Chemical class CC(=O)ON GRKUXCWELVWVMZ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- IOUCSUBTZWXKTA-UHFFFAOYSA-N dipotassium;dioxido(oxo)tin Chemical compound [K+].[K+].[O-][Sn]([O-])=O IOUCSUBTZWXKTA-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical class OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 235000014987 copper Nutrition 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
Definitions
- This invention relates to an improved process .of electroplating copper-tin alloys, i.e. bronzes and to electrolytic compositions for plating such alloys.
- aqueous electrolytic bath composition containing tin and copper in which the tendency for tin to sludge out is nullified.
- This invention is based on the discovery that the tendency of tin to sludge out of a copper-tin bath can be prevented by incorporating considerable quantities of the salts of acetic acid substituted aliphatic amines, such as the salts of ethylenediaminetetracetic acid (EDTA) and diethylenetriaminepentaacetate, into the plating bath.
- EDTA ethylenediaminetetracetic acid
- the addition of small quantities of EDTA and similar compounds in acid-tin baths has been described to function as a brightener, and such addition has also been disclosed for extending the bright range of brass solutions but the discovery of the effectiveness of relatively large quantities of this material as a sludge inhibitor was totally unexpected.
- aqueous electrolytic bath composition for plating bright bronze in which the tendency for tin to sludgeout is nullified.
- This the bath of the invention comprises the following ingredients:
- Copper cyanide (g./l.) Alkali Stannate (g./l.) Alkali cyanide (g./l.) Alkali hydroxide (g./l.) Agali aminoaeetates (g p
- the copper cyanide is at least partially present in said bath as the double cyanide of copper and alkali and the copper may be added in the form of said double cyanide.
- Potassium and sodium are the usual alkalis re ferred in the table but ammonium and lithium compounds can also be employed.
- alkali amino acetates will be understood to include the ammonium compounds, and to include such amines carrying acetate groups having a pK value between about 12 and 22.
- the acid amino acetates (instead of salts) can be added and the tin can be added as the stannic oxide provided the additional alkali hydroxide necessary to form the corresponding salts is taken into account to provide the required pH.
- the deposits obtained from this bath are smooth, but not fully bright.
- the bath is operated above room temperature (approx. 110-160 F.) preferably at a current density of 1 to 10 amp/dm.
- the pH is higher than 12.5 as stated above.
- Example 1 A bath is made of the following components:
- Example 2 The process was conducted as in Example 1 except that 0.1 g./l. of lead as lead acetate was added to the bath. The panels obtained were fully bright. The bath has the same stability as that of Example 1.
- Copper cyanide -70 Alkali metal stannate -90 Alkali cyanide -1 60-120 Alkali hydroxide (to pH l2.5) 10-80 Alkali metal alkylene aminoacetates selected from the group consisting of alkali metal alkylene diamino tetra acetate and alkali metal alkylene triamino penta acetate 25-200 3.
- An aqueous electrolytic bath for co-electrodepositing copper and tin containing the following ingredients:
- Alkali metal alkylene aminoacetates selected from the group consisting of alkali metal alkylene diamino tetra acetate and alkali metal alkylene triamino penta acetate 725-200 5.
- An aqueous electrolytic bath according to claim 4 containing in addition a lead compound in the amount of about 0.05 to 0.75 g./l. calculated as lead.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46085265A | 1965-06-02 | 1965-06-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3440151A true US3440151A (en) | 1969-04-22 |
Family
ID=23830322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US460852A Expired - Lifetime US3440151A (en) | 1965-06-02 | 1965-06-02 | Electrodeposition of copper-tin alloys |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US3440151A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3769181A (en) * | 1971-07-21 | 1973-10-30 | Richardson Chemical Co | Method of simultaneously electroplating and machining a metal surface |
| FR2244832A1 (en) * | 1973-09-25 | 1975-04-18 | Richardson Chemical Co | Electroplating and machining process - using tool as anode |
| US4223826A (en) * | 1979-01-29 | 1980-09-23 | Usui Kokusai Sangyo Kabushiki Kaisha | Method of brazing stainless steels |
| DE3346721A1 (en) * | 1983-12-23 | 1985-06-27 | Fa. Karl-Wilh. Hen, 5820 Gevelsberg | Alkaline bath for depositing a high-lustre electroplated coating on a substrate |
| US4565608A (en) * | 1983-11-02 | 1986-01-21 | Degussa Aktiengesellschaft | Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings |
| FR2688234A1 (en) * | 1992-03-03 | 1993-09-10 | Sarrel | Process for protecting a silver or silver-coated article |
| WO1997021852A1 (en) * | 1995-12-09 | 1997-06-19 | Metallveredlung Gmbh & Co. Kg | Method of forming an alloy layer |
| US20100323115A1 (en) * | 2005-12-05 | 2010-12-23 | Rohm And Haas Electronic Materials Llc | Metallization of dielectrics |
| CN108138346A (en) * | 2015-09-30 | 2018-06-08 | 科文特亚股份公司 | The purposes of the electrochemical deposition method of electroplating bath, the alloy for electrochemical deposition Cu-Sn-Zn-Pd alloys, the base material comprising the alloy and base material |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2436316A (en) * | 1946-04-25 | 1948-02-17 | Westinghouse Electric Corp | Bright alloy plating |
| US2658032A (en) * | 1949-06-11 | 1953-11-03 | City Auto Stamping Co | Electrodeposition of bright copper-tin alloy |
| US2854388A (en) * | 1955-03-14 | 1958-09-30 | City Auto Stamping Co | Electrodeposition of copper-tin alloys |
| US2886500A (en) * | 1956-11-01 | 1959-05-12 | Battelle Development Corp | Electroplating of copper alloys |
| US2989448A (en) * | 1959-04-08 | 1961-06-20 | Daniel R France | Brass, copper-tin, and copper plating bath brightener |
| CA655356A (en) * | 1963-01-08 | Flack Arnold | Electrodeposition of metals having two valences and alloys thereof | |
| US3108006A (en) * | 1959-07-13 | 1963-10-22 | M & T Chemicals Inc | Plating on aluminum |
| US3120550A (en) * | 1960-05-27 | 1964-02-04 | Dow Chemical Co | Organo-tin and lead chelates |
| US3152155A (en) * | 1960-01-04 | 1964-10-06 | Dow Chemical Co | Insoluble chelates of divalent tin, germanium, and lead |
-
1965
- 1965-06-02 US US460852A patent/US3440151A/en not_active Expired - Lifetime
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA655356A (en) * | 1963-01-08 | Flack Arnold | Electrodeposition of metals having two valences and alloys thereof | |
| US2436316A (en) * | 1946-04-25 | 1948-02-17 | Westinghouse Electric Corp | Bright alloy plating |
| US2658032A (en) * | 1949-06-11 | 1953-11-03 | City Auto Stamping Co | Electrodeposition of bright copper-tin alloy |
| US2854388A (en) * | 1955-03-14 | 1958-09-30 | City Auto Stamping Co | Electrodeposition of copper-tin alloys |
| US2886500A (en) * | 1956-11-01 | 1959-05-12 | Battelle Development Corp | Electroplating of copper alloys |
| US2989448A (en) * | 1959-04-08 | 1961-06-20 | Daniel R France | Brass, copper-tin, and copper plating bath brightener |
| US3108006A (en) * | 1959-07-13 | 1963-10-22 | M & T Chemicals Inc | Plating on aluminum |
| US3152155A (en) * | 1960-01-04 | 1964-10-06 | Dow Chemical Co | Insoluble chelates of divalent tin, germanium, and lead |
| US3120550A (en) * | 1960-05-27 | 1964-02-04 | Dow Chemical Co | Organo-tin and lead chelates |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3769181A (en) * | 1971-07-21 | 1973-10-30 | Richardson Chemical Co | Method of simultaneously electroplating and machining a metal surface |
| FR2244832A1 (en) * | 1973-09-25 | 1975-04-18 | Richardson Chemical Co | Electroplating and machining process - using tool as anode |
| US4223826A (en) * | 1979-01-29 | 1980-09-23 | Usui Kokusai Sangyo Kabushiki Kaisha | Method of brazing stainless steels |
| US4565608A (en) * | 1983-11-02 | 1986-01-21 | Degussa Aktiengesellschaft | Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings |
| US4605474A (en) * | 1983-11-02 | 1986-08-12 | Gerd Hoffacker | Alkaline cyanide bath for electrolytic deposition of copper-tin-alloy coatings |
| DE3346721A1 (en) * | 1983-12-23 | 1985-06-27 | Fa. Karl-Wilh. Hen, 5820 Gevelsberg | Alkaline bath for depositing a high-lustre electroplated coating on a substrate |
| FR2688234A1 (en) * | 1992-03-03 | 1993-09-10 | Sarrel | Process for protecting a silver or silver-coated article |
| WO1997021852A1 (en) * | 1995-12-09 | 1997-06-19 | Metallveredlung Gmbh & Co. Kg | Method of forming an alloy layer |
| US20100323115A1 (en) * | 2005-12-05 | 2010-12-23 | Rohm And Haas Electronic Materials Llc | Metallization of dielectrics |
| CN108138346A (en) * | 2015-09-30 | 2018-06-08 | 科文特亚股份公司 | The purposes of the electrochemical deposition method of electroplating bath, the alloy for electrochemical deposition Cu-Sn-Zn-Pd alloys, the base material comprising the alloy and base material |
| EP3150744B1 (en) | 2015-09-30 | 2020-02-12 | COVENTYA S.p.A. | Electroplating bath for electrochemical deposition of a cu-sn-zn-pd alloy layer, method for electrochemical deposition of said alloy layer, substrate comprising said alloy layer and uses of the coated substrate |
| CN108138346B (en) * | 2015-09-30 | 2021-03-05 | 科文特亚股份公司 | Electroplating bath for the electrochemical deposition of a Cu-Sn-Zn-Pd alloy, method for the electrochemical deposition of said alloy, substrate comprising said alloy and use of the substrate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: OXY METAL INDUSTRIES CORPORATION Free format text: CHANGE OF NAME;ASSIGNOR:OXY METAL FINISHING CORPORATION;REEL/FRAME:003967/0084 Effective date: 19741220 |
|
| AS | Assignment |
Owner name: HOOKER CHEMICALS & PLASTICS CORP. Free format text: MERGER;ASSIGNOR:OXY METAL INDUSTRIES CORPORATION;REEL/FRAME:004075/0885 Effective date: 19801222 |
|
| AS | Assignment |
Owner name: OCCIDENTAL CHEMICAL CORPORATION Free format text: CHANGE OF NAME;ASSIGNOR:HOOKER CHEMICAS & PLASTICS CORP.;REEL/FRAME:004126/0054 Effective date: 19820330 |
|
| AS | Assignment |
Owner name: OMI INTERNATIONAL CORPORATION, 21441 HOOVER ROAD, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:OCCIDENTAL CHEMICAL CORPORATION;REEL/FRAME:004190/0827 Effective date: 19830915 |
|
| AS | Assignment |
Owner name: MANUFACTURERS HANOVER TRUST COMPANY, A CORP OF NY Free format text: SECURITY INTEREST;ASSIGNOR:INTERNATIONAL CORPORATION, A CORP OF DE;REEL/FRAME:004201/0733 Effective date: 19830930 |