US2528601A - Copper-tin alloy plating - Google Patents
Copper-tin alloy plating Download PDFInfo
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- US2528601A US2528601A US639409A US63940946A US2528601A US 2528601 A US2528601 A US 2528601A US 639409 A US639409 A US 639409A US 63940946 A US63940946 A US 63940946A US 2528601 A US2528601 A US 2528601A
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- Prior art keywords
- copper
- bath
- tin
- plating
- stannate
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- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical class [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 title claims description 38
- 238000007747 plating Methods 0.000 title claims description 35
- 239000010949 copper Substances 0.000 claims description 55
- 229910052802 copper Inorganic materials 0.000 claims description 54
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 33
- 229940071182 stannate Drugs 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 17
- 229910052783 alkali metal Inorganic materials 0.000 claims description 14
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000956 alloy Substances 0.000 claims description 13
- 230000001172 regenerating effect Effects 0.000 claims description 12
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 11
- 239000007864 aqueous solution Substances 0.000 claims description 10
- 238000009713 electroplating Methods 0.000 claims description 9
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 7
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 229940108928 copper Drugs 0.000 description 52
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 27
- 239000000203 mixture Substances 0.000 description 24
- 239000000243 solution Substances 0.000 description 18
- -1 alkali metal cyanide Chemical class 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 7
- 229910000365 copper sulfate Inorganic materials 0.000 description 6
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 6
- 238000007792 addition Methods 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 150000001879 copper Chemical class 0.000 description 4
- JJLJMEJHUUYSSY-UHFFFAOYSA-L copper(II) hydroxide Inorganic materials [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 230000002939 deleterious effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000005750 Copper hydroxide Substances 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229940116318 copper carbonate Drugs 0.000 description 2
- 229910001956 copper hydroxide Inorganic materials 0.000 description 2
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 2
- AEJIMXVJZFYIHN-UHFFFAOYSA-N copper;dihydrate Chemical compound O.O.[Cu] AEJIMXVJZFYIHN-UHFFFAOYSA-N 0.000 description 2
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229940079864 sodium stannate Drugs 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000005402 stannate group Chemical group 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229910017755 Cu-Sn Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229910017927 Cu—Sn Inorganic materials 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- OVFCVRIJCCDFNQ-UHFFFAOYSA-N carbonic acid;copper Chemical compound [Cu].OC(O)=O OVFCVRIJCCDFNQ-UHFFFAOYSA-N 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 229910000009 copper(II) carbonate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000011646 cupric carbonate Substances 0.000 description 1
- 235000019854 cupric carbonate Nutrition 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000003112 potassium compounds Chemical class 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
Definitions
- This invention contemplates continuous plating with copper-tin alloys and preferably by means of a bath solution which-constitutes the sole source of plating metal, thus avoiding the necessity for using soluble anodes and eliminating the anode control problems which in the past have characterized the use of soluble anodes. Particular objects and advantages will appear hereinafter.
- any plating solution can be operated for a time with insoluble anodes, with the metal content of the bath being kept constant by means of the addition of metallic salts. In the great majority of cases this means of operation is impractical, however, because as the metal plates out the other ion or ions added with the salt continue to build up.
- a tin plating bathit is possible to regenerate the solution by continuously adding sodium stannate, but in 7 this event the sodium ion would build up continually and the free caustic content (resulting from the decomposition of the stannate) would gradually rise until the bath composition was completely out of adjustment.
- copper stannate is employed as one of the principal ingredients. It possesses a distinct advantage in the fact that both its anion and cation are useful as sources of plating metal. It is preferred to employ copper stannate as the sole source of the tin and either as the sole or the partial source of the copper. To increase the ratio of total copper to tin to any desired value over that present in copper stannate itself, there may be added to the copper stannate one or more copper salts in which copper is the cation and the anions of which do not adversely aiiect the bath. The mixture so obtained is dissolved, diluted with water, and employed as the bath solution.
- the copper salts mentioned may include materials like CuCOz, CuCn and Cu(OH)2, for example, and these may be added, alone or in combination, in solid form to the copper stannate in the desired amounts. It will be appreciated that there may be plated a range of copper-tin alloys from the corresponding baths in which the copper-tin ratio varies from that shown by copper stannate to any desired ratio of higher copper content.
- the mixture described above hereinafter referred to as the copper-tin mixture, may be prepared by simply mixing the dry salts, as described, or may be precipitated from solution by adding, for example, copper sulfate to a solution containing an alkali metal stannate and one or more soluble salts whose anions will form a precipitate with the copper of the copper sulfate and which, also, will not prove detrimental to the plating bath.
- soluble salts re the alkali metal hydroxides, and carbonates, the sodium and potassium compounds being especially suitable.
- This method has particular advantages arising from the fact that copper sulfate is relatively inexpensive compared with other copper pig tin.
- other copper salts such as copper chloride and copper nitrate may be used.
- any desired copper-tin ratio is obtainable by varying the amounts of copper salts (exclusive of copper stannate) employed to form the mixture.
- the plating bath is then made by dissolving the foregoing mixture in an aqueous solution of alkali metal cyanide and an alkali metal hydroxide.
- the resulting solution is diluted to a desired concentration and is then ready to be electrolyzed. Regeneration of this bath is accomplished simply by adding from time to time a quantity of the copper-tin mixture along with a small amount of alkali metal cyanide to dissolve it, solution of the mixture being preferably effected outside of the bath.
- the non-productive or non-metal-producing ions (those exclusive of the copper and stannate ions) introduced to the bath may include, for example, when the alkali metal employed is sodium, those contained in NaCN and NaOH, addedin the formation of the bath, and those in NaCN, added in the regeneration thereof.
- the ions added via the NaOH are limited to the amount of this compound necessary to form the 7 bath and do not interfere with practical operation of the same.
- the ions added via the NaCN tend to build up in concentration during continuous operation, since NaCN is employed to regenerate, as well as to form, the bath, but the amount of NaCN introduced to regenerate is comparatively small and does not impede practical operation.
- the total amount of NaCN present may be kept at a constant minimum by taking a small portion of the bath solution to dissolve the copper-tin mixture employed to regenerate the bath. This is permissible since the bath solution contains NaCN, which is a solvent for the copper-tin mixture, and since, furthermore, the copper-tin ratio in the bath is not changed either by removing bath solution, or by adding dissolved regenerating mixture as described above.
- the non-productive ions introduced via the copper-tin mixture may include, for example, carbonate, cyanide, or hydroxide or all three,
- hydroxide and cyanide concentrations although it is preferred to limit the hydroxide and cyanide concentrations. A certain amount of hydroxide ion from this source may be tolerated, this amount to be measured, in a particular instance, by the amount lost in carbonation, i. e.,
- the cyanide and hydroxyl ions are necessary constituents of the bath.
- the cyanide acts as a solvent for the cop-per ion and regulates the cathode efliciency of the deposition of the copper.
- the hydroxyl ion performs the same two functions with regard to the tin.
- Example 1 Method of making a solid copper-tin mixture in which the copper exceeds the tin:
- the follownate may be employed with CuCO3 alone, or with Cu(OH) 2 alone, and that other Cu-Sn ratios may be similarly obtained.
- Example 2 Method of making a mixed copper-tin precipitate in which the copper-tin ratio is increased ing compounds in the indicated amounts were mixed:
- the ratio of 1771118 is substantially a 60:40 ratio
- Example 3 Method offorming and regenerating the plating bath solution: gms. of a copper-tin mixture obtained according to Example 2 were dissolved in 30 gms..NaOH and an amount of NaCN sufficient to dissolve it, and the solution made up to 1 liter. This was then electrolyzed, using insoluble anodes of iron, 9. current density of 48 amps/sq. ft., and bath temperatures .of 70 to 85 C. During the electrolysis, the bath was regenerated from time to time by additions of the copper-tin mixture along with NaCN until at the end of the plating run, 90 gms. of mixture and 18 gms. of cyanide had been added. There were plated out 89 gms. of metaLwhich represents all the metal originally present in the bath plus a fair proportion of that added during the run. The plate was of satisfactory characteristics.
- insoluble anode Any suitable type of insoluble anode may be used, such as, for example, those of iron or nickel.
- the current density may be varied widely and will, of course, be correlated with thebath composition and temperature to obtain efiicient plating.
- the tin content of the copper-tin mixture may be increased when necessary, as by adding hydrous tin oxide to the mixture. This procedure may be used in plating alloys having a high tin content.
- anodes becompletely insoluble.
- copper anodes may be used, and reliance placed upon the cop--.
- Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath.
- Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate and copper hydroxide thereto, and plating said alloy from said bath.
- Method of electroplating a copper-tin alloy from a plating bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath using material that is insoluble in the bath as the only anode material.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
Patented Nov. 7, 1950 COPPER-TIN ALLOY PLATING Frederick A. Lowenheim, Plainfield, N. J assignor to Metal & Thermit Corporation, New York, N. Y., a corporation of New Jersey No Drawing. Application January 5, 1946, Serial No. 639,409
8 Claims.
This invention contemplates continuous plating with copper-tin alloys and preferably by means of a bath solution which-constitutes the sole source of plating metal, thus avoiding the necessity for using soluble anodes and eliminating the anode control problems which in the past have characterized the use of soluble anodes. Particular objects and advantages will appear hereinafter.
Heretofore the production of satisfactory copper-tin, alloy plate has been complicated by the necessity of using soluble anodes of copper and tin or of copper-tin alloy. Problems of anode .control are multiplied when more than one metal is employed as anode, and several methods have been introduced to overcome these problems. However, all of these methods in their turn have given rise to additional problems. Considerations such as the size and composition of the anodes, their time of immersion in the bath, the maintenance of polarizing films on the tin anodes while avoiding them on the copper anodes, the use of separate circuits with individual control, the tendency to form divalent tin in the bath and so on, have each introduced additional control problems and thereby rendered operation of the bath more and more inflexible.
To avoid the foregoing diiliculties and disadvantages, the problem of simplifying the production of satisfactory copper-tin alloy plate has been approached herein by way of the bath solution, to the end of eliminating the need for soluble anodes and making it practical to rely on the bath itself as the sole source of the alloy deposit.
Almost any plating solution can be operated for a time with insoluble anodes, with the metal content of the bath being kept constant by means of the addition of metallic salts. In the great majority of cases this means of operation is impractical, however, because as the metal plates out the other ion or ions added with the salt continue to build up. For example, in a tin plating bathit is possible to regenerate the solution by continuously adding sodium stannate, but in 7 this event the sodium ion would build up continually and the free caustic content (resulting from the decomposition of the stannate) would gradually rise until the bath composition was completely out of adjustment.
Inthe preferred application of the invention it-"is proposed to use a plating bath containing copper stannate and other copper compounds in which the ratio of copper to tin is maintained at a value to produce a desired plate and which, duringcontinuous operation, is regenerated by addition of copper and tin in the same ratio. At the same time the addition of any deleterious anions or cations to the bath is minimized or avoided entirely. A deleterious ion is defined as one which tends to build up continuously, thereby throwing the bath composition permanently out of adjustment. The fact that the bath can be formed and regenerated while avoiding high concentrations therein of anions and cations which are deleterious as before defined constitutes a feature of this invention which, so far as is known, has not hitherto been used in plating copper-tin alloys.
In the formation and regeneration of the bath, copper stannate is employed as one of the principal ingredients. It possesses a distinct advantage in the fact that both its anion and cation are useful as sources of plating metal. It is preferred to employ copper stannate as the sole source of the tin and either as the sole or the partial source of the copper. To increase the ratio of total copper to tin to any desired value over that present in copper stannate itself, there may be added to the copper stannate one or more copper salts in which copper is the cation and the anions of which do not adversely aiiect the bath. The mixture so obtained is dissolved, diluted with water, and employed as the bath solution. The copper salts mentioned may include materials like CuCOz, CuCn and Cu(OH)2, for example, and these may be added, alone or in combination, in solid form to the copper stannate in the desired amounts. It will be appreciated that there may be plated a range of copper-tin alloys from the corresponding baths in which the copper-tin ratio varies from that shown by copper stannate to any desired ratio of higher copper content.
The mixture described above, hereinafter referred to as the copper-tin mixture, may be prepared by simply mixing the dry salts, as described, or may be precipitated from solution by adding, for example, copper sulfate to a solution containing an alkali metal stannate and one or more soluble salts whose anions will form a precipitate with the copper of the copper sulfate and which, also, will not prove detrimental to the plating bath. Examples of such soluble salts re the alkali metal hydroxides, and carbonates, the sodium and potassium compounds being especially suitable. This method has particular advantages arising from the fact that copper sulfate is relatively inexpensive compared with other copper pig tin. Besides copper sulfate, other copper salts such as copper chloride and copper nitrate may be used.
Regarding the copper-tin mixture obtained by either of the above-mentioned methods, it can be seen that any desired copper-tin ratio is obtainable by varying the amounts of copper salts (exclusive of copper stannate) employed to form the mixture.
The plating bath is then made by dissolving the foregoing mixture in an aqueous solution of alkali metal cyanide and an alkali metal hydroxide. The resulting solution is diluted to a desired concentration and is then ready to be electrolyzed. Regeneration of this bath is accomplished simply by adding from time to time a quantity of the copper-tin mixture along with a small amount of alkali metal cyanide to dissolve it, solution of the mixture being preferably effected outside of the bath.
The non-productive or non-metal-producing ions (those exclusive of the copper and stannate ions) introduced to the bath may include, for example, when the alkali metal employed is sodium, those contained in NaCN and NaOH, addedin the formation of the bath, and those in NaCN, added in the regeneration thereof. The ions added via the NaOH are limited to the amount of this compound necessary to form the 7 bath and do not interfere with practical operation of the same. The ions added via the NaCN tend to build up in concentration during continuous operation, since NaCN is employed to regenerate, as well as to form, the bath, but the amount of NaCN introduced to regenerate is comparatively small and does not impede practical operation. Moreover, a certain amount of cyanide ion is lost by anodic action, when insoluble anodes are used, and this tends to oiTset the build up in concentration. The total amount of NaCN present, however, may be kept at a constant minimum by taking a small portion of the bath solution to dissolve the copper-tin mixture employed to regenerate the bath. This is permissible since the bath solution contains NaCN, which is a solvent for the copper-tin mixture, and since, furthermore, the copper-tin ratio in the bath is not changed either by removing bath solution, or by adding dissolved regenerating mixture as described above.
The non-productive ions introduced via the copper-tin mixture may include, for example, carbonate, cyanide, or hydroxide or all three,
, although it is preferred to limit the hydroxide and cyanide concentrations. A certain amount of hydroxide ion from this source may be tolerated, this amount to be measured, in a particular instance, by the amount lost in carbonation, i. e.,
by reaction with atmospheric carbon dioxide, and drag-out. The cyanide and hydroxyl ions are necessary constituents of the bath. The cyanide acts as a solvent for the cop-per ion and regulates the cathode efliciency of the deposition of the copper. The hydroxyl ion performs the same two functions with regard to the tin.
The following examples are submitted to illustrate the invention:
Example 1 Method of making a solid copper-tin mixture in which the copper exceeds the tin: The follownate may be employed with CuCO3 alone, or with Cu(OH) 2 alone, and that other Cu-Sn ratios may be similarly obtained.
Example 2 Method of making a mixed copper-tin precipitate in which the copper-tin ratio is increased ing compounds in the indicated amounts were mixed:
No. Compound Weight in grams gggg Copper stannate 230 (1 mol) 64:118 C11 3 124 (1 mol) 1282118 3.. C I1(OH) z 76 (.78 11101) 2 177:118
1 Sum of Nos. 1 and 2. 2 Sum of Nos. 1, 2 and 3.
The ratio of 1771118 is substantially a 60:40 ratio,
is to be understood, of course, that copper stanover that present in copper stannate but in which tin exceeds copper: Six liters of copper sulfate solution containing 2.5 kg. CuSO4.5H2O were added with stirring to 8 liters of a solution containing gms./l. tin as sodium stannate and gms./l. total N aOH. There was obtained a mixed precipitate of copper stannate, CuCOs, and Cu(OH)2 having a copper-tin ratio of about 45:53. The precipitate was washed a few times by decantation and sucked dry on a filter. It can be used in this air-dried condition or it may be dried at a moderate temperature such as 105 C. in an oven. By proceeding in a similar way there may be obtained precipitates having lower and higher copper-tin ratios, including precipitates in which the copper exceeds the tin.
Example 3 Method offorming and regenerating the plating bath solution: gms. of a copper-tin mixture obtained according to Example 2 were dissolved in 30 gms..NaOH and an amount of NaCN sufficient to dissolve it, and the solution made up to 1 liter. This was then electrolyzed, using insoluble anodes of iron, 9. current density of 48 amps/sq. ft., and bath temperatures .of 70 to 85 C. During the electrolysis, the bath was regenerated from time to time by additions of the copper-tin mixture along with NaCN until at the end of the plating run, 90 gms. of mixture and 18 gms. of cyanide had been added. There were plated out 89 gms. of metaLwhich represents all the metal originally present in the bath plus a fair proportion of that added during the run. The plate was of satisfactory characteristics.
Any suitable type of insoluble anode may be used, such as, for example, those of iron or nickel. V
The current density may be varied widely and will, of course, be correlated with thebath composition and temperature to obtain efiicient plating.
As will be understood, the tin content of the copper-tin mixture may be increased when necessary, as by adding hydrous tin oxide to the mixture. This procedure may be used in plating alloys having a high tin content.
It is thus apparent that a copper-tin alloy plating bath can be kept operating simply, by periodically replenishing it with additions of copper and tin in the proper ratio, as illustrated in the foregoing examples. The simplicity of control and flexibility of the present bath, as compared with the old soluble-anode baths, will also be apparent.
The use of solid copper-tin mixtures or mixed precipitates as a regenerating material is not confined to. baths originally formed from such mixtures but extends to other copper-tin plating baths containing. copper andtin compounds in solution as previously pointed out. With these baths, as well as with the type of bath described in Example 3, the herein-described method of regeneration represents an accurate method of replenishing such baths and eliminates the difficulties encountered when using soluble anodes.
It is not necessary that the anodes becompletely insoluble. For example, copper anodes may be used, and reliance placed upon the cop--.
per stannate to supply some of the copper content and all of the tin content to the bath; or conversely, tin anodes could be employed and the copper content gained from the copper stannate. Thus the problems involved in controlling alloy anodes or anodes of two difierent metals would be obviated.
In the light of the foregoing description, the following is claimed:
1. Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath.
2. Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate and copper hydroxide thereto, and plating said alloy from said bath.
3. Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate and copper carbonate thereto, and plating said alloy from said bath.
4. Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate, copper hydroxide, and copper carbonate thereto, and plating said alloy from said bath.
5. Method of electroplating a copper-tin alloy from a plating bath with which only a single anode circuit is used, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath, said copper stannate having been formed as a precipitate by adding copper sulfate to a solution containing alkali metal stannate.
6. Method of electroplating a copper-tin alloy from a plating bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath using material that is insoluble in the bath as the only anode material.
7. Method of electroplating a copper-tin alloy from a plating bath using only a single anode circuit having anodes composed of insoluble material and of copper connected in said single circuit, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath.
8. Method of electroplating a copper-tin alloy from a plating bath using only a single anode circuit having one or more anodes composed of copper connected in said single circuit, said bath containing an aqueous solution of alkali metal cyanide and alkali metal hydroxide and having copper and tin dissolved therein, which comprises regenerating the bath by adding copper stannate thereto, and plating said alloy from said bath.
FREDERICK A. LOWENHEIM.
REFERENCES CITED The following references are of record in the file of this patent:
UNITED STATES PATENTS Number Name Date 1,970,548 Batten Aug. 21, 1934 1,970,549 Batten Aug. 21, 1934 2,079,842 Cinamon May 11, 1937 2,198,365 Cinamon Apr. 23, 1940 2,216,605 Sklarew et a1. Oct. 1, 1940 2,397,522 Baier Apr. 2, 1946 OTHER REFERENCES Mellor, vol. 7, Treatise on Inorganic Chemistry, page 418 (1927).
Claims (1)
1. METHOD OF ELECTROPLATING A COPPER-TIN ALLOY FROM A PLATING BATH WITH WHICH ONLY A SINGLE ANODE CIRCUIT IS USED, SAID BATH CONTAINING AN AQUEOUS SOLUTION OF ALKALI METAL CYANIDE AND ALKALI METAL HYDROXIDE AND HAVING COPPER AND TIN DISSOLVED THEREIN, WHICH COMPRISES REGENERATING THE BATH BY ADDING COPPER STANNATE THERETO, AND PLATING SAID ALLOY FROM SAID BATH.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US639409A US2528601A (en) | 1946-01-05 | 1946-01-05 | Copper-tin alloy plating |
| GB19300/46A GB621217A (en) | 1946-01-05 | 1946-06-27 | Improvements in copper-tin alloy plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US639409A US2528601A (en) | 1946-01-05 | 1946-01-05 | Copper-tin alloy plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2528601A true US2528601A (en) | 1950-11-07 |
Family
ID=24563974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US639409A Expired - Lifetime US2528601A (en) | 1946-01-05 | 1946-01-05 | Copper-tin alloy plating |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US2528601A (en) |
| GB (1) | GB621217A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997021852A1 (en) * | 1995-12-09 | 1997-06-19 | Metallveredlung Gmbh & Co. Kg | Method of forming an alloy layer |
| CN115233026A (en) * | 2022-05-30 | 2022-10-25 | 广东华诺勤耕材料科技有限公司 | Preparation method of copper-tin alloy |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1970549A (en) * | 1932-10-18 | 1934-08-21 | City Auto Stamping Co | Process of electroplating bronze |
| US1970548A (en) * | 1931-10-19 | 1934-08-21 | City Auto Stamping Co | Metal finish |
| US2079842A (en) * | 1935-11-16 | 1937-05-11 | Cinamon Lionel | Electroplating bath composition and method of producing the same |
| US2198365A (en) * | 1938-06-29 | 1940-04-23 | Special Chemicals Corp | Electroplating |
| US2216605A (en) * | 1938-03-30 | 1940-10-01 | Special Chemicals Corp | Electroplating |
| US2397522A (en) * | 1939-10-25 | 1946-04-02 | City Auto Stamping Co | Process for the electrodeposition of tin alloys |
-
1946
- 1946-01-05 US US639409A patent/US2528601A/en not_active Expired - Lifetime
- 1946-06-27 GB GB19300/46A patent/GB621217A/en not_active Expired
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1970548A (en) * | 1931-10-19 | 1934-08-21 | City Auto Stamping Co | Metal finish |
| US1970549A (en) * | 1932-10-18 | 1934-08-21 | City Auto Stamping Co | Process of electroplating bronze |
| US2079842A (en) * | 1935-11-16 | 1937-05-11 | Cinamon Lionel | Electroplating bath composition and method of producing the same |
| US2216605A (en) * | 1938-03-30 | 1940-10-01 | Special Chemicals Corp | Electroplating |
| US2198365A (en) * | 1938-06-29 | 1940-04-23 | Special Chemicals Corp | Electroplating |
| US2397522A (en) * | 1939-10-25 | 1946-04-02 | City Auto Stamping Co | Process for the electrodeposition of tin alloys |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997021852A1 (en) * | 1995-12-09 | 1997-06-19 | Metallveredlung Gmbh & Co. Kg | Method of forming an alloy layer |
| CN115233026A (en) * | 2022-05-30 | 2022-10-25 | 广东华诺勤耕材料科技有限公司 | Preparation method of copper-tin alloy |
| CN115233026B (en) * | 2022-05-30 | 2024-04-12 | 广东华诺勤耕材料科技有限公司 | Preparation method of copper-tin alloy |
Also Published As
| Publication number | Publication date |
|---|---|
| GB621217A (en) | 1949-04-06 |
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