US20220078922A1 - Circuit board and manufacturing method thereof - Google Patents
Circuit board and manufacturing method thereof Download PDFInfo
- Publication number
- US20220078922A1 US20220078922A1 US17/527,320 US202117527320A US2022078922A1 US 20220078922 A1 US20220078922 A1 US 20220078922A1 US 202117527320 A US202117527320 A US 202117527320A US 2022078922 A1 US2022078922 A1 US 2022078922A1
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- Prior art keywords
- circuit board
- groove
- circuit
- substrate
- concave portion
- Prior art date
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Links
- 238000004519 manufacturing process Methods 0.000 title description 12
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 239000004020 conductor Substances 0.000 claims abstract description 31
- 230000000149 penetrating effect Effects 0.000 claims abstract description 4
- 238000001465 metallisation Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 238000000608 laser ablation Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000004381 surface treatment Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
- H05K1/112—Pads for surface mounting, e.g. lay-out directly combined with via connections
- H05K1/113—Via provided in pad; Pad over filled via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/107—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4007—Surface contacts, e.g. bumps
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
- H05K3/4617—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination characterized by laminating only or mainly similar single-sided circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0347—Overplating, e.g. for reinforcing conductors or bumps; Plating over filled vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0388—Other aspects of conductors
- H05K2201/0394—Conductor crossing over a hole in the substrate or a gap between two separate substrate parts
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09009—Substrate related
- H05K2201/09036—Recesses or grooves in insulating substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09563—Metal filled via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1461—Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4069—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
Definitions
- the disclosure relates to a circuit board and a manufacturing method thereof.
- the subtractive method and the improved semi-additive method have poor ability to produce fine circuit layers, and the cost of the semi-additive method is high.
- a circuit board manufacturing method includes the following steps:
- the groove includes a concave portion, the concave portion is located at the conductive hole, and the diameter of the concave portion is larger than the diameter of the conductive hole to expose a portion of the conductor;
- the circuit layer includes a connection pad located in the concave portion, the connection pad is shaped as a conductive protrusion which surrounds and is electrically connected to the conductor;
- step (1) Repeat step (1) to step (8) at least once;
- step (5) the side wall and bottom wall of the groove are processed by a plasma surface treatment machine.
- the seed layer is formed by chemical vapor deposition or physical vapor deposition.
- step (8) and before step (9), the method further includes the steps of: forming a metallization layer on the surface of the circuit layer.
- step (1) one side of the substrate is connected to a carrier board through a separable film.
- a circuit board includes at least two stacked circuit board units, and each of the circuit board units includes a substrate and a circuit layer.
- the substrate is provided with a conductive hole, and a conductor is provided in the conductive hole.
- a groove is provided on one side of the substrate.
- the groove includes a concave portion.
- the concave portion is located at the conductive hole, and the diameter of the concave portion is larger than the diameter of the conductive hole to expose a portion of the conductor.
- the circuit layer includes a connection pad located in the concave portion, and the connection pad is shaped as a conductive protrusion which surrounds and is electrically connected to the conductor.
- the circuit layer is located in the groove, and the conductive hole electrically connects the circuit layers of two adjacent circuit board units.
- a metallization layer is provided on the surface of the circuit layer.
- a circuit board manufacturing method includes the following steps:
- each groove including a concave portion, the concave portion located at the conductive hole, and the diameter of the concave portion larger than the diameter of the conductive hole to expose a portion of the conductor;
- circuit layer in each of the two grooves to obtain a circuit board, the circuit layer including a connection pad in the concave portion, the connection pad shaped as a conductive protrusion which surrounds and is electrically connected to the conductor.
- a circuit board includes a substrate and two circuit layers.
- the substrate is provided with a conductive hole.
- the conductive hole is provided with a conductor.
- the substrate is provided with a groove on both sides, and each of the two circuit layers is respectively provided in the corresponding one of the two grooves.
- the groove includes a concave portion.
- the concave portion is located at the conductive hole, and the diameter of the concave portion is larger than the diameter of the conductive hole to expose a portion of the conductor.
- the circuit layer includes a connection pad located in the concave portion.
- the connection pad is shaped as a conductive protrusion, and the conductive hole electrically connects the two circuit layers.
- the circuit of the manufactured circuit board is formed in the groove, and the groove is formed by laser ablation. Therefore, the line width of the circuit layer is stable and the precision is high.
- the connection pad of the circuit board of the present disclosure is a conductive protrusion to improve the conductive yield.
- FIG. 1 is a cross-sectional view of a through hole formed in a substrate according to a first embodiment of the present disclosure.
- FIG. 2 is a cross-sectional view of the through hole of the structure shown in FIG. 1 filled with a conductor.
- FIG. 3 is a cross-sectional view of the structure shown in FIG. 2 covered with a peelable film.
- FIG. 4 is a cross-sectional view of a groove formed in the peelable film and a cover layer of the structure shown in FIG. 3
- FIG. 5 is a cross-sectional view of the structure shown in FIG. 4 with the peelable film removed.
- FIG. 6 is a cross-sectional view of a seed layer formed in the groove of the structure shown in FIG. 5 .
- FIG. 7 is a cross-sectional view of a circuit layer formed in the groove of the structure shown in FIG. 6 .
- FIG. 8 is a cross-sectional view of the structure shown in FIG. 7 with a separable film and a carrier board removed.
- FIG. 9 is a cross-sectional view of a metallization layer formed on the circuit layer of the structure shown in FIG. 8 .
- FIG. 10 is a cross-sectional view of a circuit board according to the first embodiment and a third embodiment of the present disclosure.
- FIG. 11 is a cross-sectional view of a through hole formed in a substrate according to a second embodiment of the present disclosure.
- FIG. 12 is a cross-sectional view of the structure shown in FIG. 11 after a groove is formed.
- FIG. 13 is a cross-sectional view of a circuit board according to the second embodiment and a fourth embodiment of the present disclosure.
- an element when an element is considered to be “connected” to another element, it may be directly connected to another element or there may be an element that is centrally located at the same time. When an element is considered to be “provided on” another element, it may be placed directly on another element or there may be an element placed in the middle at the same time.
- FIGS. 1 to 10 refer to a first embodiment of the present disclosure of a method for manufacturing a circuit board, the method includes the following steps.
- a substrate 10 is provided, and a hole is formed in the substrate 10 to form a through hole 11 .
- one side of the substrate 10 is connected to a carrier board 102 through a separable film 101 to facilitate processing, but it is not limited to this. In other embodiments, the separable film 101 and the carrier board 102 may be omitted.
- the substrate 10 is a low dielectric resin material, preferably a polyester polymer base material or a polyether polymer base material, such as polyether ether ketone (PEEK), liquid crystal polymer (LCP), etc.
- the through hole 11 is formed by laser processing. It can be understood that, in other examples, the through hole 11 may also be formed by mechanical processing.
- the through hole 11 is filled with a conductor 111 to form a conductive hole 12 .
- the conductor 111 is a conductive material such as conductive paste.
- a peelable film 13 is provided for covering one side of the substrate 10 .
- the peelable film 13 covers the side of the substrate 10 facing away from the carrier board 102 .
- the peelable film 13 is a resin material such as polyimide (PI), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), etc.
- PI polyimide
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- a groove 15 is formed in the peelable film 13 and the substrate 10 by laser ablation.
- the groove 15 includes a concave portion 151 .
- the concave portion 151 is located at the conductive hole 12 , and the diameter of the concave portion 151 is larger than the diameter of the conductive hole 12 to expose a portion of the conductor 111 .
- the groove 15 is formed by laser ablation to accurately control the line width and stability and facilitate the impedance control tolerance.
- An excimer laser is preferably used to finely adjust the opening size of the groove 15 .
- a surface treatment is performed on a side wall and a bottom wall of the groove 15 to increase roughness.
- the side wall and the bottom wall of the groove 15 are processed by a plasma surface treatment machine to remove residue formed from laser ablation and improve the roughness and an activating effect.
- sandblasting may also be performed.
- the peelable film 13 is removed.
- a seed layer 16 is formed on the side wall and the bottom wall of the groove 15 .
- the seed layer 16 is formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD).
- the thickness of the seed layer 16 ranges from 0.08 microns to 2 microns.
- the seed layer 16 may be made of nickel, copper, gold, graphite, titanium, silver, or other materials.
- the side wall and the bottom wall of the groove 15 have high roughness, it is easy to form the seed layer 16 , while it is difficult to form the seed layer 16 on other parts.
- a circuit layer 20 is formed in the groove 15 .
- the circuit layer 20 includes a connection pad 21 formed in the concave portion 151 .
- the shape of the connection pad 21 is a conductive protrusion, which surrounds and is electrically connected to the conductor 111 .
- the circuit layer 20 can be formed by chemical plating, electroplating, sputtering, ion plating, or the like. It can be understood that during plating, the circuit layer 20 is connected to the plating power source by adding leads.
- a ninth step referring to FIG. 8 , the separable film 101 and the carrier board 102 are removed to obtain a circuit board unit 100 .
- the ninth step is omitted.
- a metallization layer 22 is formed on the surface of the circuit layer 20 .
- the metallization layer 22 is formed by tin (immersion tin). In other embodiments, it may also be silver or other soft metals.
- the metallization layer 22 is used to ensure the reliability of electrical conduction of multiple layers of the circuit board units 100 in subsequent steps. It can be understood that in other embodiments, the tenth step may be omitted.
- the first through tenth steps are repeated at least once.
- a twelfth step referring to FIG. 10 , at least two of the circuit board units 100 are laminated to obtain the circuit board 200 .
- a second embodiment of the present disclosure of a method for manufacturing a circuit board is provided, which includes following steps.
- a substrate 10 is provided, and a hole is formed in the substrate 10 to form a through hole 11 .
- the through hole 11 is filled with a conductor 111 to form a conductive hole 12 .
- two peelable films 13 are provided to cover opposite sides of the substrate 10 .
- a groove 15 is formed in each of the opposite sides of the substrate 10 and each of the two peelable films 13 by laser ablation.
- the groove 15 includes a concave portion 151 .
- the concave portion 151 is located at the conductive hole 12 , and the diameter of the concave portion 151 is larger than the diameter of the conductive hole 12 .
- a surface treatment is performed on a side wall and a bottom wall of each of the two grooves 15 to increase roughness.
- the two peelable films 13 are removed.
- a seed layer is formed on the side wall and bottom wall of each of the two grooves 15 .
- a circuit layer 20 is formed in each of the two grooves 15 to obtain a circuit board 300 .
- Each of the circuit layers 20 includes a connection pad 21 located in the concave portion 151 .
- the shape of the connection pad 21 is a conductive protrusion, and the two circuit layers 20 are electrically connected through the conductor 111 .
- FIG. 10 is a third embodiment of the present disclosure of the circuit board 200 .
- the circuit board 200 includes at least two stacked circuit board units 100 .
- Each of the circuit board units 100 includes a substrate 10 and a circuit layer 20 .
- the substrate 10 has a conductive hole 12 penetrating therethrough.
- a conductor 111 is provided in the conductive hole 12 .
- a groove 15 is provided on one side of the substrate 10 .
- the groove 15 includes a concave portion 151 .
- the concave portion 151 is located at the conductive hole 12 , and the diameter of the concave portion 151 is larger than the diameter of the conductive hole 12 to form a stepped hole structure, to expose a portion of the conductor 111 .
- the circuit layer 20 is located in the groove 15 .
- the circuit layer 20 includes a connection pad 21 located in the concave portion 151 .
- the shape of the connection pad 21 is a conductive protrusion.
- the connection pad 21 surrounds and is electrically connected to the conductor 111 .
- a metallization layer 22 is provided on the surface of the circuit layer 20 .
- the metallization layer 22 is a metal such as tin or silver.
- FIG. 13 is a fourth embodiment of the circuit board 300 of the present disclosure.
- the circuit board 300 includes a substrate 10 and two circuit layers 20 disposed on both sides of the substrate 10 .
- the substrate 10 has a conductive hole 12 penetrating therethrough.
- a conductor 111 is provided in the conductive hole 12 .
- the substrate 10 is provided with a groove 15 on both sides.
- the groove 15 includes a concave portion 151 .
- the concave portion 151 is located at the conductive hole 12 , and the diameter of the concave portion 151 is larger than the diameter of the conductive hole 12 .
- Each of the two circuit layers 20 is disposed in a corresponding one of the grooves 15 .
- Each of the two circuit layers 20 includes a connection pad 21 located in the concave portion 151 .
- the two circuit layers 20 are electrically connected through the conductor 111 .
- the manufacturing method of the circuit board of the present disclosure is relatively simple and the manufacturing cost is low.
- the circuit of the manufactured circuit board 200 / 300 is formed in the groove 15 , and the groove 15 is formed by laser ablation, therefore, the line thickness of the circuit layer 20 is stable and the precision is higher.
- the connection pad 21 of the circuit board 200 / 300 of the present disclosure is a conductive protrusion to improve the conductive yield.
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- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
- The disclosure relates to a circuit board and a manufacturing method thereof.
- As the frequency of signal transmission and the number of input/output interfaces increase, higher requirements are placed on the signal transmission loss of the circuit board and the reliability of the circuit layer. In the traditional circuit layer manufacturing method, the subtractive method and the improved semi-additive method have poor ability to produce fine circuit layers, and the cost of the semi-additive method is high.
- In view of the above, it is necessary to provide a circuit board and a manufacturing method thereof to solve the above problems.
- A circuit board manufacturing method includes the following steps:
- (1) Provide a substrate, and make a hole in the substrate to form a through hole;
- (2) Fill the through hole with a conductor to form a conductive hole;
- (3) Provide a peelable film to cover one side of the substrate;
- (4) Form a groove in the peelable film and the substrate by laser ablation, the groove includes a concave portion, the concave portion is located at the conductive hole, and the diameter of the concave portion is larger than the diameter of the conductive hole to expose a portion of the conductor;
- (5) Perform a surface treatment on a side wall and bottom wall of the groove to improve roughness;
- (6) Remove the peelable film;
- (7) Form a seed layer on the side wall and bottom wall of the groove;
- (8) Make a circuit layer in the groove to obtain a circuit board unit, the circuit layer includes a connection pad located in the concave portion, the connection pad is shaped as a conductive protrusion which surrounds and is electrically connected to the conductor;
- (9) Repeat step (1) to step (8) at least once; and
- (10) Laminate the at least two of the circuit board units.
- Further, in step (5), the side wall and bottom wall of the groove are processed by a plasma surface treatment machine.
- Further, in step (7), the seed layer is formed by chemical vapor deposition or physical vapor deposition.
- Further, after step (8) and before step (9), the method further includes the steps of: forming a metallization layer on the surface of the circuit layer.
- Further, in step (1), one side of the substrate is connected to a carrier board through a separable film.
- A circuit board includes at least two stacked circuit board units, and each of the circuit board units includes a substrate and a circuit layer. The substrate is provided with a conductive hole, and a conductor is provided in the conductive hole. A groove is provided on one side of the substrate. The groove includes a concave portion. The concave portion is located at the conductive hole, and the diameter of the concave portion is larger than the diameter of the conductive hole to expose a portion of the conductor. The circuit layer includes a connection pad located in the concave portion, and the connection pad is shaped as a conductive protrusion which surrounds and is electrically connected to the conductor. The circuit layer is located in the groove, and the conductive hole electrically connects the circuit layers of two adjacent circuit board units.
- Further, a metallization layer is provided on the surface of the circuit layer.
- A circuit board manufacturing method includes the following steps:
- Providing a substrate, and opening a hole in the substrate to form a through hole;
- Filling the through hole with a conductor to form a conductive hole;
- Providing two peelable films covering opposite sides of the substrate, respectively;
- Forming grooves in the two peelable films and two sides of the substrate by laser ablation, each groove including a concave portion, the concave portion located at the conductive hole, and the diameter of the concave portion larger than the diameter of the conductive hole to expose a portion of the conductor;
- Performing a surface treatment on a side wall and a bottom wall of each of the two grooves to improve roughness;
- Removing the two peelable films;
- Forming a seed layer on the side wall and the bottom wall of each of the two grooves;
- Forming a circuit layer in each of the two grooves to obtain a circuit board, the circuit layer including a connection pad in the concave portion, the connection pad shaped as a conductive protrusion which surrounds and is electrically connected to the conductor.
- A circuit board includes a substrate and two circuit layers. The substrate is provided with a conductive hole. The conductive hole is provided with a conductor. The substrate is provided with a groove on both sides, and each of the two circuit layers is respectively provided in the corresponding one of the two grooves. The groove includes a concave portion. The concave portion is located at the conductive hole, and the diameter of the concave portion is larger than the diameter of the conductive hole to expose a portion of the conductor. The circuit layer includes a connection pad located in the concave portion. The connection pad is shaped as a conductive protrusion, and the conductive hole electrically connects the two circuit layers. The manufacturing method of the circuit board of the present disclosure is relatively simple and the manufacturing cost is low. The circuit of the manufactured circuit board is formed in the groove, and the groove is formed by laser ablation. Therefore, the line width of the circuit layer is stable and the precision is high. The connection pad of the circuit board of the present disclosure is a conductive protrusion to improve the conductive yield.
-
FIG. 1 is a cross-sectional view of a through hole formed in a substrate according to a first embodiment of the present disclosure. -
FIG. 2 is a cross-sectional view of the through hole of the structure shown inFIG. 1 filled with a conductor. -
FIG. 3 is a cross-sectional view of the structure shown inFIG. 2 covered with a peelable film. -
FIG. 4 is a cross-sectional view of a groove formed in the peelable film and a cover layer of the structure shown inFIG. 3 -
FIG. 5 is a cross-sectional view of the structure shown inFIG. 4 with the peelable film removed. -
FIG. 6 is a cross-sectional view of a seed layer formed in the groove of the structure shown inFIG. 5 . -
FIG. 7 is a cross-sectional view of a circuit layer formed in the groove of the structure shown inFIG. 6 . -
FIG. 8 is a cross-sectional view of the structure shown inFIG. 7 with a separable film and a carrier board removed. -
FIG. 9 is a cross-sectional view of a metallization layer formed on the circuit layer of the structure shown inFIG. 8 . -
FIG. 10 is a cross-sectional view of a circuit board according to the first embodiment and a third embodiment of the present disclosure. -
FIG. 11 is a cross-sectional view of a through hole formed in a substrate according to a second embodiment of the present disclosure. -
FIG. 12 is a cross-sectional view of the structure shown inFIG. 11 after a groove is formed. -
FIG. 13 is a cross-sectional view of a circuit board according to the second embodiment and a fourth embodiment of the present disclosure. -
200, 300Circuit board -
Circuit board unit 100 -
Substrate 10 -
Separable film 101 -
Carrier board 102 - Through
hole 11 -
Conductor 111 -
Conductive hole 12 -
Peelable film 13 -
Groove 15 -
Concave portion 151 -
Seed layer 16 -
Circuit layer 20 -
Connection pad 21 -
Metallization layer 22 - The following specific embodiments will further illustrate the present disclosure with reference to the above drawings. The technical solutions in the embodiments of the present disclosure will be described clearly and completely in conjunction with the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only a part of the embodiments of the present disclosure, not all of them. Based on the embodiments of the present disclosure, all other embodiments obtained by a person of ordinary skill in the art without creative work fall within the protection scope of the present disclosure.
- It should be noted that when an element is considered to be “connected” to another element, it may be directly connected to another element or there may be an element that is centrally located at the same time. When an element is considered to be “provided on” another element, it may be placed directly on another element or there may be an element placed in the middle at the same time.
- Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the technical field of the present disclosure. The terminology used in the description of the present disclosure herein is for the purpose of describing specific embodiments, and is not intended to limit the present disclosure. The term “and/or” as used herein includes any and all combinations of one or more related listed items.
-
FIGS. 1 to 10 refer to a first embodiment of the present disclosure of a method for manufacturing a circuit board, the method includes the following steps. - In a first step, referring to
FIG. 1 , asubstrate 10 is provided, and a hole is formed in thesubstrate 10 to form a throughhole 11. - In this embodiment, one side of the
substrate 10 is connected to acarrier board 102 through aseparable film 101 to facilitate processing, but it is not limited to this. In other embodiments, theseparable film 101 and thecarrier board 102 may be omitted. Thesubstrate 10 is a low dielectric resin material, preferably a polyester polymer base material or a polyether polymer base material, such as polyether ether ketone (PEEK), liquid crystal polymer (LCP), etc. - In this embodiment, the through
hole 11 is formed by laser processing. It can be understood that, in other examples, the throughhole 11 may also be formed by mechanical processing. - In a second step, referring to
FIG. 2 , the throughhole 11 is filled with aconductor 111 to form aconductive hole 12. - The
conductor 111 is a conductive material such as conductive paste. - In a third step, referring to
FIG. 3 , apeelable film 13 is provided for covering one side of thesubstrate 10. - In this embodiment, the
peelable film 13 covers the side of thesubstrate 10 facing away from thecarrier board 102. - The
peelable film 13 is a resin material such as polyimide (PI), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), etc. - In a fourth step, referring to
FIG. 4 , agroove 15 is formed in thepeelable film 13 and thesubstrate 10 by laser ablation. - The
groove 15 includes aconcave portion 151. Theconcave portion 151 is located at theconductive hole 12, and the diameter of theconcave portion 151 is larger than the diameter of theconductive hole 12 to expose a portion of theconductor 111. - The
groove 15 is formed by laser ablation to accurately control the line width and stability and facilitate the impedance control tolerance. An excimer laser is preferably used to finely adjust the opening size of thegroove 15. - In a fifth step, a surface treatment is performed on a side wall and a bottom wall of the
groove 15 to increase roughness. - In this embodiment, the side wall and the bottom wall of the
groove 15 are processed by a plasma surface treatment machine to remove residue formed from laser ablation and improve the roughness and an activating effect. - It can be understood that, in other embodiments, sandblasting may also be performed.
- In a sixth step, referring to
FIG. 5 , thepeelable film 13 is removed. - In a seventh step, referring to
FIG. 6 , aseed layer 16 is formed on the side wall and the bottom wall of thegroove 15. - In the present embodiment, the
seed layer 16 is formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD). The thickness of theseed layer 16 ranges from 0.08 microns to 2 microns. Theseed layer 16 may be made of nickel, copper, gold, graphite, titanium, silver, or other materials. - Since the side wall and the bottom wall of the
groove 15 have high roughness, it is easy to form theseed layer 16, while it is difficult to form theseed layer 16 on other parts. - In an eighth step, referring to
FIG. 7 , acircuit layer 20 is formed in thegroove 15. - The
circuit layer 20 includes aconnection pad 21 formed in theconcave portion 151. The shape of theconnection pad 21 is a conductive protrusion, which surrounds and is electrically connected to theconductor 111. - The
circuit layer 20 can be formed by chemical plating, electroplating, sputtering, ion plating, or the like. It can be understood that during plating, thecircuit layer 20 is connected to the plating power source by adding leads. - In a ninth step, referring to
FIG. 8 , theseparable film 101 and thecarrier board 102 are removed to obtain acircuit board unit 100. - It can be understood that in other embodiments, if the
separable film 101 and thecarrier board 102 are omitted, the ninth step is omitted. - In a tenth step, referring to
FIG. 9 , ametallization layer 22 is formed on the surface of thecircuit layer 20. Themetallization layer 22 is formed by tin (immersion tin). In other embodiments, it may also be silver or other soft metals. Themetallization layer 22 is used to ensure the reliability of electrical conduction of multiple layers of thecircuit board units 100 in subsequent steps. It can be understood that in other embodiments, the tenth step may be omitted. - In an eleventh step, the first through tenth steps are repeated at least once.
- In a twelfth step, referring to
FIG. 10 , at least two of thecircuit board units 100 are laminated to obtain thecircuit board 200. - Referring to
FIG. 11 toFIG. 13 , a second embodiment of the present disclosure of a method for manufacturing a circuit board is provided, which includes following steps. - In a first step, referring to
FIG. 11 , asubstrate 10 is provided, and a hole is formed in thesubstrate 10 to form a throughhole 11. - In a second step, the through
hole 11 is filled with aconductor 111 to form aconductive hole 12. - In a third step, two
peelable films 13 are provided to cover opposite sides of thesubstrate 10. - In a fourth step, referring to
FIG. 12 , agroove 15 is formed in each of the opposite sides of thesubstrate 10 and each of the twopeelable films 13 by laser ablation. - The
groove 15 includes aconcave portion 151. Theconcave portion 151 is located at theconductive hole 12, and the diameter of theconcave portion 151 is larger than the diameter of theconductive hole 12. - In a fifth step, a surface treatment is performed on a side wall and a bottom wall of each of the two
grooves 15 to increase roughness. - In a sixth step, the two
peelable films 13 are removed. - In a seventh step, a seed layer is formed on the side wall and bottom wall of each of the two
grooves 15. - In an eighth step, referring to
FIG. 13 , acircuit layer 20 is formed in each of the twogrooves 15 to obtain acircuit board 300. - Each of the circuit layers 20 includes a
connection pad 21 located in theconcave portion 151. The shape of theconnection pad 21 is a conductive protrusion, and the twocircuit layers 20 are electrically connected through theconductor 111. -
FIG. 10 is a third embodiment of the present disclosure of thecircuit board 200. Thecircuit board 200 includes at least two stackedcircuit board units 100. Each of thecircuit board units 100 includes asubstrate 10 and acircuit layer 20. - The
substrate 10 has aconductive hole 12 penetrating therethrough. Aconductor 111 is provided in theconductive hole 12. - A
groove 15 is provided on one side of thesubstrate 10. Thegroove 15 includes aconcave portion 151. Theconcave portion 151 is located at theconductive hole 12, and the diameter of theconcave portion 151 is larger than the diameter of theconductive hole 12 to form a stepped hole structure, to expose a portion of theconductor 111. - The
circuit layer 20 is located in thegroove 15. Thecircuit layer 20 includes aconnection pad 21 located in theconcave portion 151. The shape of theconnection pad 21 is a conductive protrusion. Theconnection pad 21 surrounds and is electrically connected to theconductor 111. - In this embodiment, a
metallization layer 22 is provided on the surface of thecircuit layer 20. Themetallization layer 22 is a metal such as tin or silver. -
FIG. 13 is a fourth embodiment of thecircuit board 300 of the present disclosure. Thecircuit board 300 includes asubstrate 10 and twocircuit layers 20 disposed on both sides of thesubstrate 10. - The
substrate 10 has aconductive hole 12 penetrating therethrough. Aconductor 111 is provided in theconductive hole 12. - The
substrate 10 is provided with agroove 15 on both sides. Thegroove 15 includes aconcave portion 151. Theconcave portion 151 is located at theconductive hole 12, and the diameter of theconcave portion 151 is larger than the diameter of theconductive hole 12. - Each of the two
circuit layers 20 is disposed in a corresponding one of thegrooves 15. Each of the twocircuit layers 20 includes aconnection pad 21 located in theconcave portion 151. The twocircuit layers 20 are electrically connected through theconductor 111. - The manufacturing method of the circuit board of the present disclosure is relatively simple and the manufacturing cost is low. The circuit of the manufactured
circuit board 200/300 is formed in thegroove 15, and thegroove 15 is formed by laser ablation, therefore, the line thickness of thecircuit layer 20 is stable and the precision is higher. Theconnection pad 21 of thecircuit board 200/300 of the present disclosure is a conductive protrusion to improve the conductive yield. - In addition, those skilled in the art can also make other changes within the spirit of the present disclosure. Of course, these changes made in accordance with the spirit of the present disclosure should be included in the scope claimed by the present disclosure.
Claims (6)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/527,320 US11665833B2 (en) | 2019-04-23 | 2021-11-16 | Circuit board and manufacturing method thereof |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2019/083965 WO2020215225A1 (en) | 2019-04-23 | 2019-04-23 | Circuit board and fabricating method therefor |
| US202016767870A | 2020-05-28 | 2020-05-28 | |
| US17/527,320 US11665833B2 (en) | 2019-04-23 | 2021-11-16 | Circuit board and manufacturing method thereof |
Related Parent Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CN2019/083965 Division WO2020215225A1 (en) | 2019-04-23 | 2019-04-23 | Circuit board and fabricating method therefor |
| US16/767,870 Division US11212922B2 (en) | 2019-04-23 | 2019-04-23 | Circuit board and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20220078922A1 true US20220078922A1 (en) | 2022-03-10 |
| US11665833B2 US11665833B2 (en) | 2023-05-30 |
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/767,870 Active US11212922B2 (en) | 2019-04-23 | 2019-04-23 | Circuit board and manufacturing method thereof |
| US17/527,320 Active 2039-07-09 US11665833B2 (en) | 2019-04-23 | 2021-11-16 | Circuit board and manufacturing method thereof |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US16/767,870 Active US11212922B2 (en) | 2019-04-23 | 2019-04-23 | Circuit board and manufacturing method thereof |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US11212922B2 (en) |
| CN (1) | CN112205082B (en) |
| WO (1) | WO2020215225A1 (en) |
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| US20040119166A1 (en) * | 2002-11-05 | 2004-06-24 | Masahiro Sunohara | Semiconductor device and method of manufacturing the same |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20210235590A1 (en) | 2021-07-29 |
| CN112205082B (en) | 2022-08-09 |
| WO2020215225A1 (en) | 2020-10-29 |
| CN112205082A (en) | 2021-01-08 |
| US11212922B2 (en) | 2021-12-28 |
| US11665833B2 (en) | 2023-05-30 |
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