US20190341435A1 - Display screens and electronic devices - Google Patents
Display screens and electronic devices Download PDFInfo
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- US20190341435A1 US20190341435A1 US16/511,003 US201916511003A US2019341435A1 US 20190341435 A1 US20190341435 A1 US 20190341435A1 US 201916511003 A US201916511003 A US 201916511003A US 2019341435 A1 US2019341435 A1 US 2019341435A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H01L27/3246—
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
- G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
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- H01L27/3234—
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- H01L51/5209—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/813—Anodes characterised by their shape
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
- H10K59/65—OLEDs integrated with inorganic image sensors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
- H10K59/8051—Anodes
- H10K59/80515—Anodes characterised by their shape
Definitions
- the present application relates to a technical field of electronic devices.
- a display screen has a first display region and a second display region; the display screen includes an anode layer, a pixel defining layer disposed on the anode layer, a plurality of isolation pillars disposed on the pixel defining layer, and a driving layer group; the pixel defining layer and the isolation pillars form a sub-pixel isolation structure, and the isolation pillars, the pixel defining layer, the driving layer group, and the anode layer are disposed in the first display region and the second display region; the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region.
- a plurality of surface plasmon resonance structures are disposed in the driving layer group corresponding to a region of the opening, and the surface plasmon resonance structures include a plurality of metal prisms spaced apart from each other; or a plurality of metal spirals are disposed in the anode layer corresponding to the region of the opening, to form the surface plasmon resonance structures.
- the metal spirals have a width of 150 nm to 400 nm.
- the metal spirals are two-dimensional spirals.
- an arm pitch between the metal spirals is 200 nm to 500 nm.
- a planarization layer is disposed under the anode layer, and the planarization layer is provided with a through hole; and the through hole corresponds to a central region of the metal spirals.
- a radius of the through hole is 20 nm to 150 nm.
- the metal prisms are close to each other.
- the number of the metal prisms is four, and lower bottoms of the trapezoidal cross sections of the four metal prisms are inwardly and centrally symmetrically distributed.
- a gap between adjacent metal prisms is 20 nm to 50 nm.
- the metal prisms have a thickness of 20 nm to 150 nm.
- the opening is square.
- a plurality of vacant regions are provided, and the vacant regions are arranged uniformly.
- a plurality of vacant regions are provided, and the vacant regions are arranged at an interval.
- the display screen is an OLED display screen;
- the OLED display screen includes an OLED device, and the OLED device includes a cathode layer, a sub-pixel light emitting structure, the anode a layer, the pixel defining layer, and the isolation pillars;
- the anode layer and the cathode layer are disposed oppositely, the sub-pixel light emitting structure, the pixel defining layer, and the isolation pillars are disposed between the anode layer and the cathode layer;
- the pixel defining layer is disposed on the anode layer, and the isolation pillars are disposed on the pixel defining layer.
- the plasmon resonance structures provided in the driving layer group are provided in the second metal layer.
- an electronic device includes: a display screen having a first display region and a second display region; the display screen comprising a plurality of isolation pillars, a pixel defining layer, a driving layer group, and an anode layer; the isolation pillars, the pixel defining layer, the driving layer group, and the anode layer being disposed in the first display region and the second display region; the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region; a plurality of surface plasmon resonance structures being disposed in the driving layer group corresponding to a region of the opening; the surface plasmon resonance structures comprising a plurality of metal prisms spaced apart from each other; or a plurality of metal spirals being disposed in the anode layer corresponding to the region of the opening, to form the surface plasmon resonance structures; and an under-screen
- the under-screen photosensitive module is at least one of a photosensor and a camera.
- the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region. Through the opening, the light passing through the vacant region propagates downward without blocking and absorbing the light entering through the opening, so that the imaging effect is improved.
- FIG. 2 is a partial cross-sectional view of a second display region of a display screen according to an embodiment of the present application.
- FIG. 3 is a partial cross-sectional view of a second display region of a display screen according to another embodiment of the present application.
- FIG. 4 is a schematic view according to an embodiment of the present application illustrating that the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein.
- FIG. 5 is a schematic view of a part of an anode layer of a display screen (a region corresponding to an opening) according to an embodiment of the present application.
- FIG. 6 is a schematic view of a surface plasmon resonance structure according to an embodiment of the present application.
- FIG. 7 is a simulation test view according to an embodiment of the present application.
- FIG. 8 is a schematic view of a part of a metal layer of a display screen (a region corresponding to an opening) according to an embodiment of the present application.
- FIG. 9 is a schematic view of the surface plasmon resonance structure according to an embodiment of the present application.
- FIG. 10 is a top view of an electronic device according to an embodiment of the present application.
- a display screen is divided into a first display region and a second display region, and the front camera is hidden under the second display region of the display screen; when the camera is required to take a picture, pixel dots of the second display region of the display screen are controlled to emit no light and be in a transparent state, so that the camera can take a picture.
- the second display region is normally displayed, and the full screen display is realized.
- a light passes through the second display region of the display screen to enter the camera for imaging, and the display screen partially blocks and absorbs the light, thereby resulting in a poor imaging effect.
- FIG. 1 shows a top view of a display screen 1000 according to an embodiment of the present application.
- the display screen 1000 has a first display region 1001 and a second display region 1002 .
- the second display region 1002 has a display mode and a camera mode.
- the display mode the second display region 1002 displays an image.
- the second display region 1002 and the first display region 1001 can display together, so as to achieve a full-screen display function.
- the second display region 1002 is in a transparent state so that a light outside can pass through the second display region 1002 , and the light passed through the second display region 1002 can enter a under-screen photosensitive module, so that recording and imaging functions can be realized.
- the transparent state of the second display region 1002 refers that it is transparent in a human perception, and a non-transparent region in the second display region 1002 that is not perceived by human vision is allowed.
- the second display region 1002 is circular, and more preferably, the second display region 1002 has a radius of 8. 5 mm to 11 mm.
- the second display region 1002 can also be other shapes, such as a square.
- the display screen is an OLED display screen.
- the OLED display screen includes OLED devices.
- the OLED devices include a cathode layer, a sub-pixel light emitting structure, an anode layer, a pixel defining layer, and a plurality of isolation pillars.
- the anode layer and the cathode layer are arranged oppositely, and the sub-pixel light emitting structure, the pixel defining layer and the isolation pillars are arranged between the anode layer and the cathode layer.
- the pixel defining layer is arranged on the anode layer, and the isolation pillars are arranged on the pixel defining layer.
- the pixel defining layer and the isolation pillars form a sub-pixel isolation structure together.
- an AMOLED display screen is taken as an example for illustration. It can be understood that the present application is not limited to an AMOLED display screen, and can also be a PMOLED display screen.
- FIG. 2 shows a cross-sectional view of a part of the second display region 1002 of the display screen 1000 according to an embodiment of the present application.
- the display screen 1000 includes a driving layer group 500 , and an OLED device 100 formed on the driving layer group 500 .
- the OLED device 100 includes an anode layer 110 , a cathode layer 120 opposite to the anode layer 110 , a sub-pixel light emitting structure 130 between the anode layer 110 and the cathode layer 120 , and the sub-pixel isolation structure located on two sides of the sub-pixel light emitting structure 130 .
- the sub-pixel isolation structure is also located between the anode layer 110 and the cathode layer 120 .
- the sub-pixel isolation structure includes a pixel defining layer 180 formed on the anode layer 110 and the isolation pillars 190 located on the pixel defining layer 180 .
- the anode layer 110 is a metal anode layer
- the cathode layer 120 is a metal cathode layer.
- the driving layer group 500 generally includes devices such as thin film transistors and capacitors.
- the driving layer group 500 includes a base layer 581 at the bottom, a buffer layer 582 located on the base layer 581 , a semiconductor silicon layer 530 formed on the buffer layer 582 , a gate insulating layer 577 (commonly referred to as GI) covering on the semiconductor silicon layer 530 , a first metal layer 520 (commonly referred to as a M 1 layer, which can form a lower electrode of a capacitor and a gate of a Thin film transistor) formed on the gate insulating layer 577 , a dielectric layer 573 (commonly referred to as CI) covering the first metal layer 520 , and a second metal layer 510 (commonly referred to as the M 2 , which can form an upper electrode of the capacitor) formed on the dielectric layer 573 , two interlayer insulating layers 571 and 572 (commonly referred to as ILD) covering on the second metal layer 510 , and a third metal layer 560 (commonly referred to as referred to as
- the specific structure of the afore-mentioned driving layer group 500 will be described as an example.
- the driving layer group 500 of the present application is not limited to the afore-mentioned structure, and can be other structures.
- Other structures can be understood by referring to the afore-mentioned structure and will not be repeated herein.
- the first display region 1001 is designed according to a normal display structure design.
- the display screen 1000 includes the isolation pillars 190 arranged in the first display region 1001 , the pixel defining layer 180 , the driving layer 500 , and the metal anode layer 110 .
- the pixel defining layer 180 is arranged on the metal anode layer 110
- the isolation pillars 190 is arranged on the pixel defining layer 180
- the pixel defining layer 180 and the isolation pillars 190 form the sub-pixel isolation structure.
- the second display region 1002 is specially designed. A structural design of the second display region 1002 of the display screen 1000 will be described in detail below.
- the second display region 1002 has a vacant region 190 ′ corresponding to a region forming the isolation pillar and without the isolation pillar formed therein.
- the pixel defining layer 180 is provided with an opening 183 under the vacant region 190 ′.
- a plurality of metal spirals 111 is provided on the metal anode layer 110 corresponding to a region of the opening 183 (i.e., a region marked in black in FIG. 2 ), so as to form a surface plasmon resonance structure 5 .
- the second display region 1002 has a vacant region 190 ′ corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer 180 is provided with an opening 183 under each vacant region 190 ′.
- the second metal layer 510 in the driving layer group 500 corresponding to a region of one opening 183 i.e., a black region in FIG. 3
- each surface plasmon resonance structure 5 includes metal prisms 511 arranged at an interval.
- FIG. 4 shows a schematic view according to an embodiment of the present application illustrating that the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein.
- a portion of the isolation pillars 190 are not designed.
- one vacant region can be provided corresponding to one sub-pixel unit, or two or more vacant regions 190 can be provided.
- at least one isolation pillar 190 corresponding to one sub-pixel unit should be provided.
- a plurality of vacant regions 190 ′ are provided in the second display region 1002 , and the vacant regions 190 ′ are arranged uniformly. It means that there is also a normal isolation pillar 190 in a middle of adjacent vacant regions 190 ′. This can help to minimize an adverse effect caused by providing the vacant regions 190 ′.
- the vacant regions 190 ′ of the second display region 1002 are arranged uniformly, that is, the vacant regions 190 are evenly distributed in the second display region 1002 . In this way, an antireflection of the light is enhanced more evenly, further improving the imaging effect.
- a primary function of the opening 183 is that the light passing through the vacant region 190 ′ can propagate downward through the opening 183 .
- a cross-sectional shape of the opening 183 is a square.
- the cross-sectional shape of the opening 183 is kept in conformity with the shape of the pixel defining layer, thereby facilitating the smooth formation of the opening 183 .
- the opening 183 has a size of 10 um to 20 um.
- cross section of the opening 183 is not limited to a square, and can be other shapes such as a circle, a triangle, etc.
- the light continues to propagate downward, and when the light passes through the surface plasmon resonance structures 5 , the surface plasmon resonance structures 5 enhances the antireflection of the light and the light is transmitted into interior of the display 1000 .
- FIG. 5 shows a schematic view of a part of the metal anode layer of the display screen (a region corresponding to the opening) according to an embodiment of this application
- FIG. 6 shows a schematic view of the plasmon resonance structure according to an embodiment of this application. Only a partial number of surface plasmon resonance structures 5 in the region corresponding to one opening 183 are shown in FIG. 5 .
- the metal anode layer 110 When manufacturing the metal anode layer 110 , the metal anode layer 110 corresponding to the region of the opening 183 is patterned to form the plurality metal spirals 111 .
- the metal spirals 111 constitute the surface plasmon resonance structures 5 .
- an outer side of the metal spiral 111 in the surface plasmon resonance structure 5 is blank, that is, the surface plasmon resonance structures 5 are separated from the anode of the OLED device, and the surface plasmon resonance structures 5 do not affect a normal operation of the anode.
- the metal spiral 111 has a width of 150 nm to 400 nm. In this way, it is more beneficial for an excitation of surface plasmon polaritons.
- the metal spiral 111 is an Archimedes spiral.
- the metal spiral 111 can also be other two-dimensional spirals, such as isometric spirals.
- an arm pitch between the metal spirals 111 is 200 nm to 500 nm. In this way, it is more beneficial for the excitation of the surface plasmon polaritons.
- an initial radius of the metal spiral 111 is 200 nm to 500 nm. In this way, it is more beneficial for the excitation of the surface plasmon polaritons.
- the number of turns of the metal spirals 111 is at least one turn. In this way, it is easy to manufacture.
- the metal spiral 111 has a thickness of 50 nm to 200 nm. In this way, it is beneficial for the excitation of surface plasmon polaritons on the one hand and beneficial for transmission of light field energy on the other hand.
- the planarization layer 170 under the metal anode layer 110 is provided with a through hole 171 ; and the through hole 171 is located within a region corresponding to the central region of the metal spiral 111 .
- the through hole 171 can be coupled to the surface plasmon resonance structures 5 , so that the light field energy can be better coupled to an underside.
- the planarization layer 170 is disposed in contact with the third metal layer 560 and the interlayer insulating layer 571 in the driving layer group 500 .
- the through hole is circular, which has the advantage that a field distribution of the metal spiral 111 formed in its central region is circular, and the circular through holes allow the light field energy to be better coupled to the underside.
- the through hole 171 has a radius of 50 nm to 150 nm. In this way, a coupling effect of the through hole 171 to the surface plasmon resonance structures 5 can be further improved.
- the light When the light is emitted downward from an upper side in FIG. 2 , the light passes through the vacant region 190 ′ firstly, and then through the opening 183 of the pixel defining layer 180 .
- a fading wave is generated in a direction perpendicular to a light propagating direction on the surface of the metal anode layer 110 .
- the fading wave can cause free electrons on a metal surface to generate a surface plasma polariton.
- a frequency and wave number of the fading wave and the surface plasmon polariton are equal, and the surface plasmon polariton resonates with the fading wave, which enhances the light transmission.
- a simulation test is carried out using a finite element numerical calculation method. Parameters are set as follows: a width of the metal spiral is 275 nm, an initial radius of the metal spiral is 380 nm, an arm pitch of the metal spiral is 380 nm, and a film thickness of the metal spiral is 100 nm. A test result is shown in FIG. 7 .
- a color bar on the right side represents a relative intensity of the electric field
- the left side represents a relative intensity distribution of the electric field. It can be seen from FIG. 7 that a color of the middle region (at the metal spiral) is redder than a color of a region of the two sides, which indicates that the relative intensity of the electric field here is stronger, and further indicates that the energy of the light is large, and a projection of the light is enhanced here.
- FIG. 8 is a schematic view of a part of the metal layer of the display screen (an region corresponding to an opening) according to an embodiment of the present application. Only a partial number of the surface plasmon resonance structures 5 in the region corresponding to one opening 183 are shown in FIG. 8 .
- the plasmon resonance structure 5 provided in the driving layer group 500 is provided in the second metal layer 510 .
- the second metal layer 510 corresponding to the region of the predetermined opening 183 is patterned to form the plurality of metal prisms 511 arranged at an interval.
- the patterned second metal layer 510 constitutes the surface plasmon resonance structures 5 .
- the second metal layer 510 is located in the same layer as the upper electrode of the capacitor in the driving layer group 500 .
- a pattering density of this layer is relatively low, which is good for patterning.
- the number of the metal prisms 511 is multiple and the metal prisms are close to each other. In this way, it is beneficial for the excitation of the surface plasmon polaritons.
- the metal prisms 511 have trapezoidal cross sections.
- the trapezoids can be formed as a shape similar to a bow, which is more beneficial for the excitation of the surface plasmon polaritons.
- a lower bottom of the trapezoid is 100 to 150 nm
- an upper bottom of the trapezoid is 20 to 50 nm
- a height of the trapezoid is 40 to 65 nm
- a gap between adjacent trapezoids is 20 to 50 nm.
- trapezoids More preferably, four trapezoids are provided; the lower bottoms of the four trapezoids are inwardly and centrally symmetrically distributed. In this way, the surface plasmon polaritons generated between two trapezoids are coupled to each other, which can further enhance an antireflection of the field strength.
- the metal prism 511 has a thickness of 20 nm to 150 nm. It is beneficial for the excitation of surface plasmon polaritons on one hand, and beneficial for the transmission of the light field energy on the other hand.
- the surface plasmon resonance structure of the present application is not limited to the structure formed by two metal prisms, and can be other numbers of metal prisms.
- a plurality of through holes 171 are formed in the planarization layer 170 on the second metal layer 510 , which are corresponding to the openings 183 of the pixel defining layer 180 .
- the through holes 171 are corresponding to the openings 183 and have the same size and shape.
- the planarization layer 170 is disposed in contact with the third metal layer 560 and the interlayer insulating layer 571 in the driving layer group 500 .
- the light When the light is emitted downward from an upper side in FIG. 3 , the light passes through a region of the vacant regions 190 ′ firstly, and then through the opening 183 of the pixel defining layer 180 and enters into the driving layer group 500 .
- the fading wave When the light emits to the second metal layer 510 below the opening 183 , due to the presence of the surface plasmon resonance structures 5 , the fading wave is generated in the direction perpendicular to the light propagating direction on the surface of the second metal layer 510 .
- the fading wave can cause the free electrons on the metal surface to generate the excitation of the surface plasma polaritons.
- a frequency and wave number of the fading wave and the surface plasmon polariton are equal, and the surface plasmon polariton resonates with the fading wave, which enhances the light transmission.
- the application also provides an electronic device.
- an electronic device 3000 includes a display screen 1000 and an under-screen photosensitive module 2000 ; the display screen is a display screen provided in the present application; the under-screen photosensitive module 2000 is disposed corresponding to the second display region 1002 of the display screen 1000 , so that the light passing through the second display region 1002 enters into the under-screen photosensitive module 2000 .
- the under-screen photosensitive module 1002 is at least one of a photoelectric sensor and a camera.
- the electronic device is a mobile phone or a tablet.
- the electronic device of the present application is not limited thereto, and may be other electronic products, such as a computer display with a camera.
- the electronic device includes other components such as a casing, a power source, or the like in addition to the display screen and the under-screen photosensitive module.
- a casing such as a LCD, LCD, or the like
- a power source such as a battery, or the like
- the specific structure and the connection relationship of these other components can be set by the person skilled in the art according to an actual situation, and details are not described herein.
- the display screen provided in the present application since the display screen provided in the present application is used, the light intensity of the light entering the under-screen photosensitive module is increased, thereby improving the imaging effect.
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Abstract
A display screen and an electronic device are disclosed. The display screen has a first display region and a second display region. The display screen includes an anode layer, a pixel defining layer disposed on the anode layer, a number of isolation pillars disposed on the pixel defining layer, and a driving layer group. The pixel defining layer and the isolation pillars form a sub-pixel isolation structure, and the isolation pillars, the pixel defining layer, the driving layer group, and the anode layer are disposed in the first display region and the second display region. The second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region.
Description
- This application is a continuation application for International Application PCT/CN2018/092037, filed on Jun. 20, 2018, which claims priority to Chinese Patent Applications No. 201710938804. X and Chinese Patent Applications No. 201710944080. X filed on Sep. 30, 2017, entitled “DISPLAY SCREENS AND ELECTRONIC PRODUCTS” and “DISPLAY SCREENS AND ELECTRONIC PRODUCTS”. The entire contents of both applications are incorporated herein by reference.
- The present application relates to a technical field of electronic devices.
- Current electronic device (such as mobile phones, tablets, etc.) are usually equipped with a front camera on a front surface thereof, and the camera is installed in a non-display region of the front surface. These electronic devices cannot be displayed in full screen.
- Accordingly, in view of a problem of poor imaging effect in the prior art, it is necessary to provide a display screen and an electronic device for improving the imaging effect.
- According to an aspect of the present application, a display screen is provided. The display screen has a first display region and a second display region; the display screen includes an anode layer, a pixel defining layer disposed on the anode layer, a plurality of isolation pillars disposed on the pixel defining layer, and a driving layer group; the pixel defining layer and the isolation pillars form a sub-pixel isolation structure, and the isolation pillars, the pixel defining layer, the driving layer group, and the anode layer are disposed in the first display region and the second display region; the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region.
- In one of the embodiments, a plurality of surface plasmon resonance structures are disposed in the driving layer group corresponding to a region of the opening, and the surface plasmon resonance structures include a plurality of metal prisms spaced apart from each other; or a plurality of metal spirals are disposed in the anode layer corresponding to the region of the opening, to form the surface plasmon resonance structures.
- In one of the embodiments, the metal spirals have a width of 150 nm to 400 nm.
- In one of the embodiments, the metal spirals are two-dimensional spirals.
- In one of the embodiments, an arm pitch between the metal spirals is 200 nm to 500 nm.
- In one of the embodiments, a planarization layer is disposed under the anode layer, and the planarization layer is provided with a through hole; and the through hole corresponds to a central region of the metal spirals.
- In one of the embodiments, a radius of the through hole is 20 nm to 150 nm.
- In one of the embodiments, the metal prisms are close to each other.
- In one of the embodiments, the number of the metal prisms is four, and lower bottoms of the trapezoidal cross sections of the four metal prisms are inwardly and centrally symmetrically distributed.
- In one of the embodiments, a gap between adjacent metal prisms is 20 nm to 50 nm.
- In one of the embodiments, the metal prisms have a thickness of 20 nm to 150 nm.
- In one of the embodiments, the opening is square.
- In one of the embodiments, a plurality of vacant regions are provided, and the vacant regions are arranged uniformly.
- In one of the embodiments, a plurality of vacant regions are provided, and the vacant regions are arranged at an interval.
- In one embodiment, the display screen is an OLED display screen; the OLED display screen includes an OLED device, and the OLED device includes a cathode layer, a sub-pixel light emitting structure, the anode a layer, the pixel defining layer, and the isolation pillars; the anode layer and the cathode layer are disposed oppositely, the sub-pixel light emitting structure, the pixel defining layer, and the isolation pillars are disposed between the anode layer and the cathode layer; the pixel defining layer is disposed on the anode layer, and the isolation pillars are disposed on the pixel defining layer.
- In one of the embodiments, the driving layer group includes a base layer, a buffer layer located on the base layer, a semiconductor silicon layer formed on the buffer layer, a gate insulating layer covering on the semiconductor silicon layer, a first metal layer formed on the gate insulating layer, a dielectric layer covering the first metal layer, a second metal layer formed on the dielectric layer, two interlayer insulating layers covering on the second metal layer, and a third metal layer formed on the interlayer insulating layers.
- In one of the embodiments, the plasmon resonance structures provided in the driving layer group are provided in the second metal layer.
- According to another aspect of the present application, an electronic device is provided. The electronic device includes: a display screen having a first display region and a second display region; the display screen comprising a plurality of isolation pillars, a pixel defining layer, a driving layer group, and an anode layer; the isolation pillars, the pixel defining layer, the driving layer group, and the anode layer being disposed in the first display region and the second display region; the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region; a plurality of surface plasmon resonance structures being disposed in the driving layer group corresponding to a region of the opening; the surface plasmon resonance structures comprising a plurality of metal prisms spaced apart from each other; or a plurality of metal spirals being disposed in the anode layer corresponding to the region of the opening, to form the surface plasmon resonance structures; and an under-screen photosensitive module being disposed corresponding to the second display region and being capable of sensing light that is incident through the display screen.
- In one of the embodiments, the under-screen photosensitive module is at least one of a photosensor and a camera.
- According to the display screen and electronic device of the above aspects of the present application, the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region. Through the opening, the light passing through the vacant region propagates downward without blocking and absorbing the light entering through the opening, so that the imaging effect is improved.
- To illustrate the technical solutions according to the embodiments of the present disclosure or in the prior art more clearly, the accompanying drawings for describing the embodiments or the prior art are introduced briefly in the following. Apparently, the accompanying drawings in the following description are only some embodiments of the present disclosure, and persons of ordinary skill in the art can derive other drawings from the accompanying drawings without creative efforts.
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FIG. 1 is a top view of a display screen according to one embodiment of the present application. -
FIG. 2 is a partial cross-sectional view of a second display region of a display screen according to an embodiment of the present application. -
FIG. 3 is a partial cross-sectional view of a second display region of a display screen according to another embodiment of the present application. -
FIG. 4 is a schematic view according to an embodiment of the present application illustrating that the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein. -
FIG. 5 is a schematic view of a part of an anode layer of a display screen (a region corresponding to an opening) according to an embodiment of the present application. -
FIG. 6 is a schematic view of a surface plasmon resonance structure according to an embodiment of the present application. -
FIG. 7 is a simulation test view according to an embodiment of the present application. -
FIG. 8 is a schematic view of a part of a metal layer of a display screen (a region corresponding to an opening) according to an embodiment of the present application. -
FIG. 9 is a schematic view of the surface plasmon resonance structure according to an embodiment of the present application. -
FIG. 10 is a top view of an electronic device according to an embodiment of the present application. - At present, a display screen is divided into a first display region and a second display region, and the front camera is hidden under the second display region of the display screen; when the camera is required to take a picture, pixel dots of the second display region of the display screen are controlled to emit no light and be in a transparent state, so that the camera can take a picture. When the camera is not required to take a picture, the second display region is normally displayed, and the full screen display is realized.
- However, in the above solution, a light passes through the second display region of the display screen to enter the camera for imaging, and the display screen partially blocks and absorbs the light, thereby resulting in a poor imaging effect.
- The present application will be further described in detail below with reference to the accompanying drawings and embodiments to make the objects, features and advantages of the present disclosure more comprehensive and apparent. It should be understood that the specific embodiments described herein are merely illustrative of the application and are not intended to limit the scope of the application.
-
FIG. 1 shows a top view of adisplay screen 1000 according to an embodiment of the present application. As shown inFIG. 1 , thedisplay screen 1000 has afirst display region 1001 and asecond display region 1002. Thesecond display region 1002 has a display mode and a camera mode. In the display mode, thesecond display region 1002 displays an image. At this point, thesecond display region 1002 and thefirst display region 1001 can display together, so as to achieve a full-screen display function. In the camera mode, thesecond display region 1002 is in a transparent state so that a light outside can pass through thesecond display region 1002, and the light passed through thesecond display region 1002 can enter a under-screen photosensitive module, so that recording and imaging functions can be realized. - It can be understood that the transparent state of the
second display region 1002 refers that it is transparent in a human perception, and a non-transparent region in thesecond display region 1002 that is not perceived by human vision is allowed. - Preferably, the
second display region 1002 is circular, and more preferably, thesecond display region 1002 has a radius of 8. 5 mm to 11 mm. Of course, it can be understood that thesecond display region 1002 can also be other shapes, such as a square. - In an embodiment, the display screen is an OLED display screen. The OLED display screen includes OLED devices. The OLED devices include a cathode layer, a sub-pixel light emitting structure, an anode layer, a pixel defining layer, and a plurality of isolation pillars. The anode layer and the cathode layer are arranged oppositely, and the sub-pixel light emitting structure, the pixel defining layer and the isolation pillars are arranged between the anode layer and the cathode layer. The pixel defining layer is arranged on the anode layer, and the isolation pillars are arranged on the pixel defining layer. The pixel defining layer and the isolation pillars form a sub-pixel isolation structure together.
- In the present embodiment, an AMOLED display screen is taken as an example for illustration. It can be understood that the present application is not limited to an AMOLED display screen, and can also be a PMOLED display screen.
-
FIG. 2 shows a cross-sectional view of a part of thesecond display region 1002 of thedisplay screen 1000 according to an embodiment of the present application. Thedisplay screen 1000 includes adriving layer group 500, and anOLED device 100 formed on thedriving layer group 500. - The
OLED device 100 includes ananode layer 110, acathode layer 120 opposite to theanode layer 110, a sub-pixellight emitting structure 130 between theanode layer 110 and thecathode layer 120, and the sub-pixel isolation structure located on two sides of the sub-pixellight emitting structure 130. The sub-pixel isolation structure is also located between theanode layer 110 and thecathode layer 120. The sub-pixel isolation structure includes apixel defining layer 180 formed on theanode layer 110 and theisolation pillars 190 located on thepixel defining layer 180. Further, theanode layer 110 is a metal anode layer, and thecathode layer 120 is a metal cathode layer. - The
driving layer group 500 generally includes devices such as thin film transistors and capacitors. - In this embodiment, in particular, the
driving layer group 500 includes abase layer 581 at the bottom, abuffer layer 582 located on thebase layer 581, asemiconductor silicon layer 530 formed on thebuffer layer 582, a gate insulating layer 577 (commonly referred to as GI) covering on thesemiconductor silicon layer 530, a first metal layer 520 (commonly referred to as a M1 layer, which can form a lower electrode of a capacitor and a gate of a Thin film transistor) formed on thegate insulating layer 577, a dielectric layer 573 (commonly referred to as CI) covering thefirst metal layer 520, and a second metal layer 510 (commonly referred to as the M2, which can form an upper electrode of the capacitor) formed on thedielectric layer 573, two interlayer insulatinglayers 571 and 572 (commonly referred to as ILD) covering on thesecond metal layer 510, and a third metal layer 560 (commonly referred to as M3) formed on the 571 and 572.interlayer insulating layers - Hereinafter, the specific structure of the afore-mentioned
driving layer group 500 will be described as an example. However, it can be understood that thedriving layer group 500 of the present application is not limited to the afore-mentioned structure, and can be other structures. Other structures can be understood by referring to the afore-mentioned structure and will not be repeated herein. - In this application, the
first display region 1001 is designed according to a normal display structure design. Thedisplay screen 1000 includes theisolation pillars 190 arranged in thefirst display region 1001, thepixel defining layer 180, thedriving layer 500, and themetal anode layer 110. Thepixel defining layer 180 is arranged on themetal anode layer 110, theisolation pillars 190 is arranged on thepixel defining layer 180, and thepixel defining layer 180 and theisolation pillars 190 form the sub-pixel isolation structure. Thesecond display region 1002 is specially designed. A structural design of thesecond display region 1002 of thedisplay screen 1000 will be described in detail below. - The
second display region 1002 has avacant region 190′ corresponding to a region forming the isolation pillar and without the isolation pillar formed therein. Thepixel defining layer 180 is provided with anopening 183 under thevacant region 190′. - Further, a plurality of metal spirals 111 is provided on the
metal anode layer 110 corresponding to a region of the opening 183 (i.e., a region marked in black inFIG. 2 ), so as to form a surfaceplasmon resonance structure 5. Alternatively, thesecond display region 1002 has avacant region 190′ corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and thepixel defining layer 180 is provided with anopening 183 under eachvacant region 190′. Thesecond metal layer 510 in thedriving layer group 500 corresponding to a region of one opening 183 (i.e., a black region inFIG. 3 ) is provided with a plurality of surfaceplasmon resonance structures 5, and each surfaceplasmon resonance structure 5 includesmetal prisms 511 arranged at an interval. -
FIG. 4 shows a schematic view according to an embodiment of the present application illustrating that the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein. When designing thesecond display region 1002 of thedisplay screen 1000, a portion of theisolation pillars 190 are not designed. In thesecond display region 1002, one vacant region can be provided corresponding to one sub-pixel unit, or two or morevacant regions 190 can be provided. However, it can be understood that at least oneisolation pillar 190 corresponding to one sub-pixel unit should be provided. - Preferably, a plurality of
vacant regions 190′ are provided in thesecond display region 1002, and thevacant regions 190′ are arranged uniformly. It means that there is also anormal isolation pillar 190 in a middle of adjacentvacant regions 190′. This can help to minimize an adverse effect caused by providing thevacant regions 190′. - More preferably, the
vacant regions 190′ of thesecond display region 1002 are arranged uniformly, that is, thevacant regions 190 are evenly distributed in thesecond display region 1002. In this way, an antireflection of the light is enhanced more evenly, further improving the imaging effect. - Referring to
FIG. 2 again, a primary function of theopening 183 is that the light passing through thevacant region 190′ can propagate downward through theopening 183. - In the present embodiment, a cross-sectional shape of the
opening 183 is a square. Thus, the cross-sectional shape of theopening 183 is kept in conformity with the shape of the pixel defining layer, thereby facilitating the smooth formation of theopening 183. Preferably, theopening 183 has a size of 10 um to 20 um. - Of course, it can be understood that the cross section of the
opening 183 is not limited to a square, and can be other shapes such as a circle, a triangle, etc. - The light continues to propagate downward, and when the light passes through the surface
plasmon resonance structures 5, the surfaceplasmon resonance structures 5 enhances the antireflection of the light and the light is transmitted into interior of thedisplay 1000. -
FIG. 5 shows a schematic view of a part of the metal anode layer of the display screen (a region corresponding to the opening) according to an embodiment of this application;FIG. 6 shows a schematic view of the plasmon resonance structure according to an embodiment of this application. Only a partial number of surfaceplasmon resonance structures 5 in the region corresponding to oneopening 183 are shown inFIG. 5 . - When manufacturing the
metal anode layer 110, themetal anode layer 110 corresponding to the region of theopening 183 is patterned to form the plurality metal spirals 111. The metal spirals 111 constitute the surfaceplasmon resonance structures 5. - It can be understood that an outer side of the
metal spiral 111 in the surfaceplasmon resonance structure 5 is blank, that is, the surfaceplasmon resonance structures 5 are separated from the anode of the OLED device, and the surfaceplasmon resonance structures 5 do not affect a normal operation of the anode. - Preferably, the
metal spiral 111 has a width of 150 nm to 400 nm. In this way, it is more beneficial for an excitation of surface plasmon polaritons. - In the present embodiment, the
metal spiral 111 is an Archimedes spiral. Of course, it can be understood that themetal spiral 111 can also be other two-dimensional spirals, such as isometric spirals. - Preferably, an arm pitch between the metal spirals 111 is 200 nm to 500 nm. In this way, it is more beneficial for the excitation of the surface plasmon polaritons.
- Preferably, an initial radius of the
metal spiral 111 is 200 nm to 500 nm. In this way, it is more beneficial for the excitation of the surface plasmon polaritons. - Preferably, the number of turns of the metal spirals 111 is at least one turn. In this way, it is easy to manufacture.
- Preferably, the
metal spiral 111 has a thickness of 50 nm to 200 nm. In this way, it is beneficial for the excitation of surface plasmon polaritons on the one hand and beneficial for transmission of light field energy on the other hand. - In an embodiment, the
planarization layer 170 under themetal anode layer 110 is provided with a throughhole 171; and the throughhole 171 is located within a region corresponding to the central region of themetal spiral 111. Thus, the throughhole 171 can be coupled to the surfaceplasmon resonance structures 5, so that the light field energy can be better coupled to an underside. Further, theplanarization layer 170 is disposed in contact with thethird metal layer 560 and the interlayer insulatinglayer 571 in thedriving layer group 500. - Preferably, the through hole is circular, which has the advantage that a field distribution of the
metal spiral 111 formed in its central region is circular, and the circular through holes allow the light field energy to be better coupled to the underside. - Preferably, the through
hole 171 has a radius of 50 nm to 150 nm. In this way, a coupling effect of the throughhole 171 to the surfaceplasmon resonance structures 5 can be further improved. - A light antireflection process of the present application will be described below.
- When the light is emitted downward from an upper side in
FIG. 2 , the light passes through thevacant region 190′ firstly, and then through theopening 183 of thepixel defining layer 180. When the light emits to themetal anode layer 110 below theopening 183, due to the presence of the surfaceplasmon resonance structures 5, a fading wave is generated in a direction perpendicular to a light propagating direction on the surface of themetal anode layer 110. The fading wave can cause free electrons on a metal surface to generate a surface plasma polariton. A frequency and wave number of the fading wave and the surface plasmon polariton are equal, and the surface plasmon polariton resonates with the fading wave, which enhances the light transmission. - A simulation test is carried out using a finite element numerical calculation method. Parameters are set as follows: a width of the metal spiral is 275 nm, an initial radius of the metal spiral is 380 nm, an arm pitch of the metal spiral is 380 nm, and a film thickness of the metal spiral is 100 nm. A test result is shown in
FIG. 7 . - In
FIG. 7 , a color bar on the right side represents a relative intensity of the electric field, and the left side represents a relative intensity distribution of the electric field. It can be seen fromFIG. 7 that a color of the middle region (at the metal spiral) is redder than a color of a region of the two sides, which indicates that the relative intensity of the electric field here is stronger, and further indicates that the energy of the light is large, and a projection of the light is enhanced here. - Alternatively, referring to
FIG. 8 andFIG. 9 ,FIG. 8 is a schematic view of a part of the metal layer of the display screen (an region corresponding to an opening) according to an embodiment of the present application. Only a partial number of the surfaceplasmon resonance structures 5 in the region corresponding to oneopening 183 are shown inFIG. 8 . - The
plasmon resonance structure 5 provided in thedriving layer group 500 is provided in thesecond metal layer 510. When manufacturing thedriving layer group 500, thesecond metal layer 510 corresponding to the region of thepredetermined opening 183 is patterned to form the plurality ofmetal prisms 511 arranged at an interval. The patternedsecond metal layer 510 constitutes the surfaceplasmon resonance structures 5. - In the present embodiment, the
second metal layer 510 is located in the same layer as the upper electrode of the capacitor in thedriving layer group 500. A pattering density of this layer is relatively low, which is good for patterning. - In the surface
plasmon resonance structures 5, the number of themetal prisms 511 is multiple and the metal prisms are close to each other. In this way, it is beneficial for the excitation of the surface plasmon polaritons. - Preferably, the
metal prisms 511 have trapezoidal cross sections. The trapezoids can be formed as a shape similar to a bow, which is more beneficial for the excitation of the surface plasmon polaritons. - More preferably, a lower bottom of the trapezoid is 100 to 150 nm, an upper bottom of the trapezoid is 20 to 50 nm, a height of the trapezoid is 40 to 65 nm, and a gap between adjacent trapezoids is 20 to 50 nm. In this way, it can be beneficial for the excitation of the plasmon polaritons on the metal surface.
- More preferably, four trapezoids are provided; the lower bottoms of the four trapezoids are inwardly and centrally symmetrically distributed. In this way, the surface plasmon polaritons generated between two trapezoids are coupled to each other, which can further enhance an antireflection of the field strength.
- Preferably, the
metal prism 511 has a thickness of 20 nm to 150 nm. It is beneficial for the excitation of surface plasmon polaritons on one hand, and beneficial for the transmission of the light field energy on the other hand. - Of course, it can be understood that the surface plasmon resonance structure of the present application is not limited to the structure formed by two metal prisms, and can be other numbers of metal prisms.
- In another preferred embodiment, a plurality of through
holes 171 are formed in theplanarization layer 170 on thesecond metal layer 510, which are corresponding to theopenings 183 of thepixel defining layer 180. In this way, light absorption of theplanarization layer 170 can be further reduced, and is more beneficial for antireflection. More preferably, the throughholes 171 are corresponding to theopenings 183 and have the same size and shape. Further, theplanarization layer 170 is disposed in contact with thethird metal layer 560 and the interlayer insulatinglayer 571 in thedriving layer group 500. - Of course, it can be understood that the through hole may not be provided in the present application.
- The antireflection process of the light of the present application will be described below.
- When the light is emitted downward from an upper side in
FIG. 3 , the light passes through a region of thevacant regions 190′ firstly, and then through theopening 183 of thepixel defining layer 180 and enters into thedriving layer group 500. When the light emits to thesecond metal layer 510 below theopening 183, due to the presence of the surfaceplasmon resonance structures 5, the fading wave is generated in the direction perpendicular to the light propagating direction on the surface of thesecond metal layer 510. The fading wave can cause the free electrons on the metal surface to generate the excitation of the surface plasma polaritons. A frequency and wave number of the fading wave and the surface plasmon polariton are equal, and the surface plasmon polariton resonates with the fading wave, which enhances the light transmission. - The application also provides an electronic device.
- Referring to
FIG. 10 , anelectronic device 3000 includes adisplay screen 1000 and an under-screenphotosensitive module 2000; the display screen is a display screen provided in the present application; the under-screenphotosensitive module 2000 is disposed corresponding to thesecond display region 1002 of thedisplay screen 1000, so that the light passing through thesecond display region 1002 enters into the under-screenphotosensitive module 2000. - Preferably, the under-screen
photosensitive module 1002 is at least one of a photoelectric sensor and a camera. - Preferably, the electronic device is a mobile phone or a tablet. Of course, it can be understood that the electronic device of the present application is not limited thereto, and may be other electronic products, such as a computer display with a camera.
- Of course, it can be understood that the electronic device includes other components such as a casing, a power source, or the like in addition to the display screen and the under-screen photosensitive module. The specific structure and the connection relationship of these other components can be set by the person skilled in the art according to an actual situation, and details are not described herein.
- According to the electronic device of the present application, since the display screen provided in the present application is used, the light intensity of the light entering the under-screen photosensitive module is increased, thereby improving the imaging effect.
- The forgoing embodiments are merely illustrative of several embodiments of the present disclosure, and the description thereof is more specific and detailed, but is not intended to limit the scope of the present disclosure. It should be noted that a number of variations and modifications can be made by those skilled in the art without departing from the spirit and scope of the present disclosure. Therefore, the scope of the present disclosure should be determined by the appended claims.
Claims (20)
1. A display screen having a first display region and a second display region, comprising:
an anode layer;
a pixel defining layer disposed on the anode layer;
a plurality of isolation pillars disposed on the pixel defining layer; and
a driving layer group;
wherein the pixel defining layer and the isolation pillars form a sub-pixel isolation structure, and the isolation pillars, the pixel defining layer, the driving layer group, and the anode layer are disposed in the first display region and the second display region; the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region.
2. The display screen of claim 1 , wherein
a plurality of surface plasmon resonance structures are disposed in the driving layer group corresponding to a region of the opening, and the surface plasmon resonance structures comprise a plurality of metal prisms spaced apart from each other;
or a plurality of metal spirals are disposed in the anode layer corresponding to the region of the opening, to form the surface plasmon resonance structures.
3. The display screen of claim 2 , wherein the metal spirals have a width of 150 nm to 400 nm.
4. The display screen of claim 2 , wherein the metal spirals are two-dimensional spirals.
5. The display screen of claim 2 wherein the metal spirals are Archimedes spirals.
6. The display screen of claim 2 , wherein a planarization layer is disposed under the anode layer, and the planarization layer is provided with a through hole; and the through hole corresponds to a central region of the metal spirals.
7. The display screen of claim 6 , wherein a radius of the through hole is 20 nm to 150 nm.
8. The display screen of claim 2 , wherein the metal prisms are close to each other.
9. The display screen of claim 8 , wherein the metal prisms have trapezoidal cross sections.
10. The display screen of claim 9 , wherein the number of the metal prisms is four, and lower bottoms of the trapezoidal cross sections of the four metal prisms are inwardly and centrally symmetrically distributed.
11. The display screen of claim 8 , wherein a gap between adjacent metal prisms is 20 nm to 50 nm.
12. The display screen of claim 2 , wherein the metal prisms have a thickness of 20 nm to 150 nm.
13. The display screen of claim 1 , wherein the opening is square.
14. The display screen of claim 1 , wherein a plurality of vacant regions are provided, and the vacant regions are arranged uniformly.
15. The display screen of claim 1 , wherein a plurality of vacant regions are provided, and the vacant regions are arranged at an interval.
16. The display screen of claim 1 , wherein the display screen is an OLED display screen; the OLED display screen comprises an OLED device, and the OLED device comprises a cathode layer, a sub-pixel light emitting structure, the anode a layer, the pixel defining layer, and the isolation pillars; the anode layer and the cathode layer are disposed oppositely, the sub-pixel light emitting structure, the pixel defining layer, and the isolation pillars are disposed between the anode layer and the cathode layer; the pixel defining layer is disposed on the anode layer, and the isolation pillars are disposed on the pixel defining layer.
17. The display screen of claim 1 , wherein the driving layer group comprises a base layer, a buffer layer located on the base layer, a semiconductor silicon layer formed on the buffer layer, a gate insulating layer covering on the semiconductor silicon layer, a first metal layer formed on the gate insulating layer, a dielectric layer covering the first metal layer, a second metal layer formed on the dielectric layer, two interlayer insulating layers covering on the second metal layer, and a third metal layer formed on the interlayer insulating layers.
18. The display screen of claim 17 , wherein the plasmon resonance structures provided in the driving layer group are provided in the second metal layer.
19. An electronic device, comprising:
a display screen having a first display region and a second display region; the display screen comprising a plurality of isolation pillars, a pixel defining layer, a driving layer group and an anode layer; the isolation pillars, the pixel defining layer, the driving layer group and the anode layer being disposed in the first display region and the second display region;
the second display region has a vacant region corresponding to a region forming the isolation pillar and without the isolation pillar formed therein, and the pixel defining layer is provided with an opening under the vacant region;
a plurality of surface plasmon resonance structures being disposed in the driving layer group corresponding to a region of the opening; the surface plasmon resonance structures comprising a plurality of metal prisms spaced apart;
or a plurality of metal spirals being disposed in the anode layer corresponding to the region of the opening, to form the surface plasmon resonance structures; and
an under-screen photosensitive module being disposed corresponding to the second display region and being capable of sensing light that is incident through the display screen.
20. The electronic device of claim 19 , wherein the under-screen photosensitive module is at least one of a photosensor and a camera.
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| CN105590954A (en) * | 2015-12-22 | 2016-05-18 | 昆山国显光电有限公司 | Oled display panel and manufacturing method thereof |
| KR102417986B1 (en) * | 2015-12-28 | 2022-07-07 | 삼성디스플레이 주식회사 | Display device |
| CN107146809A (en) * | 2017-05-16 | 2017-09-08 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof |
| CN107015409B (en) * | 2017-05-18 | 2020-08-14 | 上海天马微电子有限公司 | Spatial light modulator and display device |
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2018
- 2018-06-20 WO PCT/CN2018/092037 patent/WO2019062223A1/en not_active Ceased
- 2018-07-30 TW TW107126356A patent/TWI668683B/en active
-
2019
- 2019-07-15 US US16/511,003 patent/US20190341435A1/en not_active Abandoned
-
2021
- 2021-10-09 US US17/497,897 patent/US11647651B2/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| US20220028943A1 (en) | 2022-01-27 |
| TWI668683B (en) | 2019-08-11 |
| US11647651B2 (en) | 2023-05-09 |
| WO2019062223A1 (en) | 2019-04-04 |
| TW201839743A (en) | 2018-11-01 |
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