US20190304707A1 - Photoelectric conversion element, solar cell and composition - Google Patents
Photoelectric conversion element, solar cell and composition Download PDFInfo
- Publication number
- US20190304707A1 US20190304707A1 US16/444,430 US201916444430A US2019304707A1 US 20190304707 A1 US20190304707 A1 US 20190304707A1 US 201916444430 A US201916444430 A US 201916444430A US 2019304707 A1 US2019304707 A1 US 2019304707A1
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- photoelectric conversion
- conversion element
- present
- electrode
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 170
- 239000000203 mixture Substances 0.000 title claims abstract description 37
- 150000001875 compounds Chemical class 0.000 claims abstract description 106
- 239000006096 absorbing agent Substances 0.000 claims abstract description 62
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- 125000005843 halogen group Chemical group 0.000 claims abstract description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 39
- 125000002947 alkylene group Chemical group 0.000 claims description 27
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 125000003342 alkenyl group Chemical group 0.000 claims description 22
- 125000000304 alkynyl group Chemical group 0.000 claims description 22
- 125000001072 heteroaryl group Chemical group 0.000 claims description 22
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 22
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 19
- 125000005647 linker group Chemical group 0.000 claims description 18
- 125000000732 arylene group Chemical group 0.000 claims description 15
- 125000001931 aliphatic group Chemical group 0.000 claims description 13
- 125000000623 heterocyclic group Chemical group 0.000 claims description 12
- 125000004450 alkenylene group Chemical group 0.000 claims description 11
- 125000004419 alkynylene group Chemical group 0.000 claims description 11
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 9
- 125000005549 heteroarylene group Chemical group 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 150000002892 organic cations Chemical class 0.000 abstract description 57
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 abstract description 41
- 239000013078 crystal Substances 0.000 abstract description 33
- 150000001450 anions Chemical class 0.000 abstract description 30
- 125000004429 atom Chemical group 0.000 abstract description 30
- 150000001768 cations Chemical class 0.000 abstract description 17
- 230000000737 periodic effect Effects 0.000 abstract description 17
- 239000010410 layer Substances 0.000 description 305
- 239000000243 solution Substances 0.000 description 51
- 230000005525 hole transport Effects 0.000 description 46
- 239000010408 film Substances 0.000 description 41
- 239000000463 material Substances 0.000 description 41
- 230000000903 blocking effect Effects 0.000 description 39
- 238000000034 method Methods 0.000 description 37
- 238000004519 manufacturing process Methods 0.000 description 28
- 239000002904 solvent Substances 0.000 description 24
- 239000010419 fine particle Substances 0.000 description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 16
- -1 for example Substances 0.000 description 16
- 125000001424 substituent group Chemical group 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 125000004432 carbon atom Chemical group C* 0.000 description 15
- 238000010304 firing Methods 0.000 description 15
- 125000005842 heteroatom Chemical group 0.000 description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 12
- 239000006185 dispersion Substances 0.000 description 12
- 230000007423 decrease Effects 0.000 description 11
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 239000011135 tin Substances 0.000 description 9
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 239000002041 carbon nanotube Substances 0.000 description 7
- 229910021393 carbon nanotube Inorganic materials 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- RQQRAHKHDFPBMC-UHFFFAOYSA-L lead(ii) iodide Chemical compound I[Pb]I RQQRAHKHDFPBMC-UHFFFAOYSA-L 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 229910001887 tin oxide Inorganic materials 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 150000004820 halides Chemical class 0.000 description 6
- 229910052740 iodine Inorganic materials 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011877 solvent mixture Substances 0.000 description 6
- 229910052718 tin Inorganic materials 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229910021389 graphene Inorganic materials 0.000 description 5
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000000962 organic group Chemical group 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 150000004770 chalcogenides Chemical class 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 229910052745 lead Inorganic materials 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 150000002825 nitriles Chemical class 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 125000003441 thioacyl group Chemical group 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 description 2
- NAZODJSYHDYJGP-UHFFFAOYSA-N 7,18-bis[2,6-di(propan-2-yl)phenyl]-7,18-diazaheptacyclo[14.6.2.22,5.03,12.04,9.013,23.020,24]hexacosa-1(23),2,4,9,11,13,15,20(24),21,25-decaene-6,8,17,19-tetrone Chemical compound CC(C)C1=CC=CC(C(C)C)=C1N(C(=O)C=1C2=C3C4=CC=1)C(=O)C2=CC=C3C(C=C1)=C2C4=CC=C3C(=O)N(C=4C(=CC=CC=4C(C)C)C(C)C)C(=O)C1=C23 NAZODJSYHDYJGP-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- YPWFISCTZQNZAU-UHFFFAOYSA-N Thiane Chemical group C1CCSCC1 YPWFISCTZQNZAU-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 150000001410 amidinium cations Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000002079 double walled nanotube Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004005 formimidoyl group Chemical group [H]\N=C(/[H])* 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229940071870 hydroiodic acid Drugs 0.000 description 2
- 150000004694 iodide salts Chemical class 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000002048 multi walled nanotube Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002109 single walled nanotube Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 2
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 2
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 2
- JTDNNCYXCFHBGG-UHFFFAOYSA-L tin(ii) iodide Chemical compound I[Sn]I JTDNNCYXCFHBGG-UHFFFAOYSA-L 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OLRBYEHWZZSYQQ-VVDZMTNVSA-N (e)-4-hydroxypent-3-en-2-one;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)O.C\C(O)=C/C(C)=O.C\C(O)=C/C(C)=O OLRBYEHWZZSYQQ-VVDZMTNVSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- FFQALBCXGPYQGT-UHFFFAOYSA-N 2,4-difluoro-5-(trifluoromethyl)aniline Chemical compound NC1=CC(C(F)(F)F)=C(F)C=C1F FFQALBCXGPYQGT-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- UUIMDJFBHNDZOW-UHFFFAOYSA-N 2-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=CC=N1 UUIMDJFBHNDZOW-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- MNFZZNNFORDXSV-UHFFFAOYSA-N 4-(diethylamino)benzaldehyde Chemical compound CCN(CC)C1=CC=C(C=O)C=C1 MNFZZNNFORDXSV-UHFFFAOYSA-N 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical group C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 125000002393 azetidinyl group Chemical group 0.000 description 1
- 125000004069 aziridinyl group Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- IQONKZQQCCPWMS-UHFFFAOYSA-N barium lanthanum Chemical compound [Ba].[La] IQONKZQQCCPWMS-UHFFFAOYSA-N 0.000 description 1
- 229910052454 barium strontium titanate Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 229910002115 bismuth titanate Inorganic materials 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- NCMHKCKGHRPLCM-UHFFFAOYSA-N caesium(1+) Chemical compound [Cs+] NCMHKCKGHRPLCM-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004980 cyclopropylene group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 125000000532 dioxanyl group Chemical group 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- IVUXZQJWTQMSQN-UHFFFAOYSA-N distrontium;oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Sr+2].[Sr+2].[Ta+5].[Ta+5] IVUXZQJWTQMSQN-UHFFFAOYSA-N 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 229910003473 lithium bis(trifluoromethanesulfonyl)imide Inorganic materials 0.000 description 1
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 150000001457 metallic cations Chemical class 0.000 description 1
- RIFHJAODNHLCBH-UHFFFAOYSA-N methanethione Chemical group S=[CH] RIFHJAODNHLCBH-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- JGOAZQAXRONCCI-SDNWHVSQSA-N n-[(e)-benzylideneamino]aniline Chemical compound C=1C=CC=CC=1N\N=C\C1=CC=CC=C1 JGOAZQAXRONCCI-SDNWHVSQSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- SBYHFKPVCBCYGV-UHFFFAOYSA-N quinuclidine Chemical group C1CC2CCN1CC2 SBYHFKPVCBCYGV-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- GROMGGTZECPEKN-UHFFFAOYSA-N sodium metatitanate Chemical compound [Na+].[Na+].[O-][Ti](=O)O[Ti](=O)O[Ti]([O-])=O GROMGGTZECPEKN-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 150000003413 spiro compounds Chemical class 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000001166 thiolanyl group Chemical group 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/211—Fullerenes, e.g. C60
- H10K85/215—Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2059—Light-sensitive devices comprising an organic dye as the active light absorbing material, e.g. adsorbed on an electrode or dissolved in solution
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- H01L51/0047—
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- H01L51/0094—
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/10—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
- H10K30/15—Sensitised wide-bandgap semiconductor devices, e.g. dye-sensitised TiO2
- H10K30/151—Sensitised wide-bandgap semiconductor devices, e.g. dye-sensitised TiO2 the wide bandgap semiconductor comprising titanium oxide, e.g. TiO2
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/50—Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
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- H01L51/422—
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/10—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising heterojunctions between organic semiconductors and inorganic semiconductors
- H10K30/15—Sensitised wide-bandgap semiconductor devices, e.g. dye-sensitised TiO2
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a photoelectric conversion element, a solar cell, and a composition.
- Photoelectric conversion elements are used in a variety of optical sensors, copiers, solar cells, and the like. It is anticipated that solar cells will be actively put into practical use as cells using non-exhaustible solar energy. Among them, active research and development is underway regarding dye sensitized solar cells in which an organic dye, a Ru bipyridyl complex, or the like is used as a sensitizer, and the photoelectric conversion efficiency thereof reaches approximately 11%.
- Photoelectric conversion elements or solar cells in which a compound having a perovskite-type crystal structure (hereinafter, also referred to as “perovskite compound”) is used have attained certain achievements in terms of the improvement of photoelectric conversion efficiencies.
- perovskite compound a compound having a perovskite-type crystal structure
- photoelectric conversion elements or solar cells in which a perovskite compound is used have recently attracted attention, and cell performance other than photoelectric conversion efficiencies are barely known.
- perovskite compounds are likely to be damaged in highly humid environments.
- the photoelectric conversion efficiencies of photoelectric conversion elements or solar cells in which a perovskite compound is used as a light absorber often significantly decrease in highly humid environments.
- An object of the present invention is to provide a photoelectric conversion element which has a perovskite compound in a photosensitive layer as a light absorber and has excellent moisture resistance.
- another object of the present invention is to provide a solar cell in which the photoelectric conversion element is used.
- a still another object of the present invention is to provide a composition preferable for forming the photosensitive layer in the photoelectric conversion element.
- the present inventors found that, when an organic cation having a silyl group is used as at least some of organic cations in photoelectric conversion elements or solar cells in which a perovskite compound having organic cations, specific metallic cations, and anions is used as a light absorber, photoelectric conversion elements or solar cells having a photoelectric conversion efficiency that does not easily decrease even in highly humid environments can be obtained.
- the present invention has been completed by repeating studies on the basis of the above-described finding.
- a photoelectric conversion element comprising: a first electrode having a photosensitive layer including a light absorber on a conductive support; and a second electrode facing the first electrode, in which the light absorber includes a compound having a perovskite-type crystal structure including organic cations, cations of a metallic atom other than elements belonging to Group I of the periodic table, and anions, and at least some of the organic cations constituting the compound are organic cations having a silyl group.
- the organic cation having a silyl group is represented by Formula (1),
- R 1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group
- R 2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group
- L represents a divalent linking group.
- R 1 is an alkyl group, an aryl group, or a heteroaryl group.
- L is a divalent linking group selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NR L — or a divalent linking group formed by combining two or more linking groups described above, and R L represents a hydrogen atom or an alkyl group.
- a composition comprising: a compound represented by Formula (1a); and a halogenated metal,
- R 1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group
- R 2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group
- L represents a divalent linking group
- Hal represents a halogen atom.
- composition according to [11] which is used to form a photosensitive layer in manufacturing of the photoelectric conversion element according to any one of [1] to [9].
- the photoelectric conversion element and the solar cell of the present invention are excellent in terms of moisture resistance while having a constitution in which a perovskite compound is provided as a light absorber.
- the composition of the present invention can be preferably used to form photosensitive layers in the manufacturing of the photoelectric conversion element of the present invention.
- FIG. 1 is a cross sectional view schematically illustrating a preferred aspect of a photoelectric conversion element of the present invention.
- FIG. 2 is a cross sectional view schematically illustrating a preferred aspect of the photoelectric conversion element of the present invention including a thick photosensitive layer.
- FIG. 3 is a cross sectional view schematically illustrating another preferred aspect of the photoelectric conversion element of the present invention.
- FIG. 4 is a cross sectional view schematically illustrating still another preferred aspect of the photoelectric conversion element of the present invention.
- FIG. 5 is a cross sectional view schematically illustrating far still another preferred aspect of the photoelectric conversion element of the present invention.
- a photoelectric conversion element of the present invention has a first electrode having a conductive support and a photosensitive layer including a light absorber and a second electrode facing the first electrode.
- the first electrode and the second electrode facing each other refers to both of an aspect in which the first electrode and the second electrode are laminated in a state of being in contact with each other and an aspect in which the first electrode and the second electrode are laminated through another layer (that is, an aspect in which the first electrode and the second electrode are provided so as to face each other while the first electrode and the second electrode sandwich another layer).
- the photoelectric conversion element of the present invention preferably has a hole transport layer provided between the first electrode and the second electrode.
- the photosensitive layer and the second electrode are provided in this order on the conductive support. That is, in a case in which the photoelectric conversion element has the hole transport layer, the photosensitive layer, the hole transport layer, and the second electrode are preferably provided on the conductive support in this order.
- the hole transport layer may be provided between the conductive support and the photosensitive layer.
- the hole transport layer, the photosensitive layer, and the second electrode are provided on the conductive support in this order.
- the light absorber includes at least one perovskite compound described below.
- the light absorber may also include a light absorber other than the perovskite compound together with the perovskite compound.
- Examples of the light absorber other than the perovskite compound include metallic complex dyes and organic dyes.
- the photosensitive layer being provided on the conductive support means that the photosensitive layer is provided in contact with the surface of the conductive support or the photosensitive layer is provided above the surface of the conductive support through another layer.
- examples of the layer provided between the conductive support and the photosensitive layer include a porous layer, a blocking layer, an electron transport layer, a hole transport layer, and the like.
- examples of the aspect in which the photosensitive layer is provided above the surface of the conductive support through another layer include an aspect in which the photosensitive layer is provided on the surface of a porous layer in a thin film shape or the like (refer to FIG. 1 ), an aspect in which the photosensitive layer is provided to be thick on the surface of a porous layer (refer to FIG. 2 ), an aspect in which the photosensitive layer is provided to be thin on the surface of a blocking layer, an aspect in which the photosensitive layer is provided on the surface of a blocking layer in a thick film shape (refer to FIG. 3 ), an aspect in which the photosensitive layer is provided on the surface of an electron transport layer in a thin film shape or thick film shape (refer to FIG.
- the photosensitive layer is provided on the surface of a hole transport layer in a thin film shape or thick film shape (refer to FIG. 5 ).
- the photosensitive layer may be provided in a linear shape or in a dispersed pattern, but is preferably provided in a film shape.
- fine particles forming a porous layer 12 are illustrated in an enlarged manner. These fine particles are preferably jammed with each other (accumulated or in close contact with each other) in the horizontal direction and the vertical direction with respect to a conductive support 11 and thus form a porous structure.
- a “photoelectric conversion element 10 ” refers to photoelectric conversion elements 10 A, 10 B, 10 C, 10 D, and 10 E unless particularly otherwise described. This is also true for a system 100 and a first electrode 1 .
- a “photosensitive layer 13 ” refers to photosensitive layers 13 A, 13 B, and 13 C unless particularly otherwise described.
- the “hole transport layer 3 ” refers to hole transport layers 3 A and 3 B unless particularly otherwise described.
- Examples of the preferred aspects of the photoelectric conversion element of the present invention include the photoelectric conversion element 10 A illustrated in FIG. 1 .
- a system 100 A illustrated in FIG. 1 is a system in which the photoelectric conversion element 10 A is applied as a cell that causes action means M (for example, an electric motor) to operate through an external circuit 6 .
- action means M for example, an electric motor
- the photoelectric conversion element 10 A includes a first electrode 1 A, a second electrode 2 , and the hole transport layer 3 A including a hole-transporting material described below between the first electrode 1 A and the second electrode 2 .
- the first electrode 1 A includes the conductive support 11 made up of a support 11 a and a transparent electrode 11 b , the porous layer 12 , and the photosensitive layer 13 A on the porous layer 12 .
- a blocking layer 14 is provided on the transparent electrode 11 b , and the porous layer 12 is formed on the blocking layer 14 .
- the photoelectric conversion element 10 A including the porous layer 12 as described above since the surface area of the photosensitive layer 13 A increases, it is assumed that the charge separation and charge transfer efficiency improves.
- the photoelectric conversion element 10 B illustrated in FIG. 2 is a schematic illustration of a preferred aspect in which the photosensitive layer 13 A in the photoelectric conversion element 10 A illustrated in FIG. 1 is provided to be thick. In this photoelectric conversion element 10 B, the hole transport layer 3 B is provided to be thin.
- the photoelectric conversion element 10 B is different from the photoelectric conversion element 10 A illustrated in FIG. 1 in terms of the film thicknesses of the photosensitive layer 13 B and the hole transport layer 3 B, but is constituted in the same manner as the photoelectric conversion element 10 A except for the film thicknesses.
- the photoelectric conversion element 10 C illustrated in FIG. 3 is a schematic illustration of another preferred aspect of the photoelectric conversion element of the present invention.
- the photoelectric conversion element 10 C is different from the photoelectric conversion element 10 B illustrated in FIG. 2 in terms of the porous layer 12 not being provided, but is constituted in the same manner as the photoelectric conversion element 10 B except for what has been described above. That is, in the photoelectric conversion element 10 C, the photosensitive layer 13 C is formed on the surface of the blocking layer 14 in a thick film shape.
- the photoelectric conversion element 10 D illustrated in FIG. 4 is a schematic illustration of still another preferred aspect of the photoelectric conversion element of the present invention.
- the photoelectric conversion element 10 D is different from the photoelectric conversion element 10 C illustrated in FIG. 3 in terms of the provision of an electron transport layer 15 instead of the blocking layer 14 , but is constituted in the same manner as the photoelectric conversion element 10 C except for what has been described above.
- the first electrode 1 D has the conductive support 11 and the electron transport layer 15 and the photosensitive layer 13 C which are sequentially formed on the conductive support 11 .
- This photoelectric conversion element 10 D is preferred since the respective layers can be formed using organic materials. Therefore, the productivity of the photoelectric conversion element improves, and furthermore, thickness reduction or flexibilization becomes possible.
- the photoelectric conversion element 10 E illustrated in FIG. 5 is a schematic illustration of far still another preferred aspect of the photoelectric conversion element of the present invention.
- a system 100 E including the photoelectric conversion element 10 E is, similar to the system 100 A, a system that is applied as a cell.
- the photoelectric conversion element 10 E has a first electrode 1 E, the second electrode 2 , and the electron transport layer 4 between the first electrode 1 E and the second electrode 2 .
- the first electrode 1 E has the conductive support 11 and the hole transport layer 16 and the photosensitive layer 13 C which are sequentially formed on the conductive support 11 .
- This photoelectric conversion element 10 E is preferred since, similar to the photoelectric conversion element 10 D, the respective layers can be formed using organic materials.
- the system 100 to which the photoelectric conversion element 10 is applied functions as a solar cell in the following manner.
- the photoelectric conversion element 10 A excites a light absorber.
- the excited light absorber has high-energy electrons and is capable of emitting the electrons.
- the light absorber which has emitted high-energy electrons turns into an oxidant.
- the photoelectric conversion elements 10 A to 10 D electrons emitted from the light absorber migrate among the light absorber particles and reach the conductive support 11 .
- the light absorber that has emitted electrons having a high energy turns into an oxidant.
- the electrons that have reached the conductive support 11 do their work in the external circuit 6 and then return to the photosensitive layer 13 through the second electrode 2 (in a case in which the hole transport layer 3 is provided, through the hole transport layer 3 in addition to the second electrode).
- the light absorber is reduced by the electrons which have returned to the photosensitive layer 13 .
- the system 100 functions as a solar cell by repeating the cycle of the above-described excitation of the light absorber and electron migration.
- the flow direction of electrons from the photosensitive layer 13 to the conductive support 11 varies depending on the presence or absence, kind, and the like of the porous layer 12 .
- the porous layer 12 can be formed of an insulating body other than semiconductors in the related art.
- the porous layer 12 is formed of a semiconductor, electron conduction in which electrons migrate inside or among semiconductor fine particles in the porous layer 12 also occurs.
- the porous layer 12 is formed of an insulating body
- electron conduction does not occur in the porous layer 12 .
- the porous layer 12 is formed of an insulating body
- Al 2 O 3 aluminum oxide fine particles are used as insulating body fine particles
- a relatively high electromotive force (Voc) is obtained.
- the blocking layer 14 like other layers, is formed of a conductor or a semiconductor as well, electron conduction occurs in the blocking layer 14 .
- the photoelectric conversion element and the solar cell of the present invention are not limited to the above-described preferred aspects, and the constitutions and the like of the respective aspects can be appropriately combined together within the scope of the gist of the present invention.
- materials and the respective members which are used in the photoelectric conversion element and the solar cell can be prepared using ordinary methods except for the light absorber.
- photoelectric conversion elements or solar cells in which the perovskite compound is used it is possible to refer to, for example, Science, 2012, vol. 338, pp. 643 to 647.
- dye sensitized solar cells it is possible to refer to, for example, JP2001-291534A, the specification of U.S. Pat. No. 4,927,721A, the specification of U.S. Pat. No. 4,684,537A, the specification of U.S. Pat. No. 5,084,365A, the specification of U.S. Pat. No.
- the first electrode 1 includes the conductive support 11 and the photosensitive layer 13 and functions as a working electrode in the photoelectric conversion element 10 .
- the first electrode 1 preferably includes the porous layer 12 , the blocking layer 14 , and at least one layer of the electron transport layer 15 or the hole transport layer 16 .
- the first electrode 1 preferably includes at least the blocking layer 14 in terms of short circuit prevention and more preferably includes the porous layer 12 and the blocking layer 14 in terms of light absorption efficiency and short circuit prevention.
- the first electrode 1 preferably includes the electron transport layer 15 or the hole transport layer 16 since the first electrode can be formed of an organic material.
- the conductive support 11 is not particularly limited as long as the conductive support is conductive and is capable of supporting the photosensitive layer 13 or the like.
- the conductive support 11 preferably has a constitution in which the conductive support is formed of a conductive material, for example, metal or a constitution in which the glass or plastic support 11 a and the transparent electrode 11 b formed on the surface of the support 11 a as a conductive film are provided.
- the conductive support 11 in which a film of the transparent electrode 11 b is formed by applying a conductive metallic oxide onto the surface of the glass or plastic support 11 a as illustrated in FIGS. 1 to 5 is more preferred.
- the support 11 a formed of plastic include transparent polymer films described in Paragraph 0153 of JP2001-291534A.
- As a material used to form the support 11 a it is possible to use, in addition to glass or plastic, ceramics (JP2005-135902A) or conductive resins (JP2001-160425A).
- the metallic oxide is preferably a tin oxide (TO) and particularly preferably an indium-tin oxide (a tin-doped indium oxide, ITO) or a fluorine-doped tin oxide such as a fluorine-doped tin oxide (FTO).
- the amount of the metallic oxide applied is preferably 0.1 to 100 g per square meter of the surface area of the support 11 a .
- light preferably enters the conductive support through the support 11 a side.
- the conductive support 11 is preferably substantially transparent.
- “being substantially transparent” means that the transmittance of light (having a wavelength of 300 to 1,200 nm) is 10% or higher, preferably 50% or higher, and particularly preferably 80% or higher.
- the thicknesses of the support 11 a and the conductive support 11 are not particularly limited and are set to appropriate thicknesses.
- the thicknesses are preferably 0.01 ⁇ m to 10 mm, more preferably 0.1 ⁇ m to 5 mm, and particularly preferably 0.3 ⁇ m to 4 mm.
- the film thickness of the transparent electrode 11 b is not particularly limited and is, for example, preferably 0.01 to 30 ⁇ m, more preferably 0.03 to 25 ⁇ m, and particularly preferably 0.05 to 20 ⁇ m.
- the conductive support 11 or the support 11 a may have a light management function on the surface.
- the conductive support 11 or the support 11 a may have on the surface an antireflection film obtained by alternately laminating high-refractive index films and low-refractive index oxide films which is described in JP2003-123859A or may have a light guide function described in JP2002-260746A.
- the blocking layer 14 is preferably provided on the surface of the transparent electrode 11 b , that is, between the conductive support 11 and the porous layer 12 , the photosensitive layer 13 , the hole transport layer 3 , or the like.
- the blocking layer 14 performs a function of preventing these reverse currents.
- the blocking layer 14 is also referred to as a short circuit prevention layer.
- the blocking layer may also be provided in a case in which the photoelectric conversion element includes an electron transport layer.
- the blocking layer may be provided between the conductive support 11 and the electron transport layer 15
- the blocking layer may be provided between the second electrode 2 and the electron transport layer 4 .
- a material used to form the blocking layer 14 is not particularly limited as long as the material is capable of performing the above-described function, but is preferably a substance which transmits visible light and is insulating with respect to the conductive support 11 (the transparent electrode 11 b ).
- the “substance insulating with respect to the conductive support 11 (the transparent electrode 11 b )” specifically refers to a compound having an energy level of the conduction band which is equal to or higher than the energy level of the conduction band of a material used to form the conductive support 11 (a metallic oxide used to form the transparent electrode 11 b ) and is lower than the energy level of the conduction band of a material constituting the porous layer 12 or the ground state of the light absorber (n-type semiconductor compound).
- Examples of a material used to form the blocking layer 14 include silicon oxide, magnesium oxide, aluminum oxide, calcium carbonate, polyvinyl alcohols, polyurethanes, and the like.
- the material may be a material that is ordinarily used as a photoelectric conversion material, and examples thereof include titanium oxide, tin oxide, niobium oxide, tungsten oxide, and the like. Among these, titanium oxide, tin oxide, magnesium oxide, aluminum oxide, and the like are preferred.
- the film thickness of the blocking layer 14 is preferably 0.001 to 10 ⁇ m, more preferably 0.005 to 1 ⁇ m, and particularly preferably 0.01 to 0.1 ⁇ m.
- the film thicknesses of the respective layers can be measured by observing cross sections of the photoelectric conversion element 10 using a scanning electron microscope (SEM) or the like.
- the porous layer 12 is preferably provided on the transparent electrode 11 b .
- the porous layer 12 is preferably formed on the blocking layer 14 .
- the porous layer 12 is a layer that functions as a scaffold for carrying the photosensitive layer 13 on the surface.
- it is preferable to increase the surface area of at least a portion receiving light such as sunlight, and it is preferable to increase the surface area of the porous layer 12 as a whole.
- the porous layer 12 is preferably a fine particle layer having pores which is formed of fine particles of a material used to form the porous layer 12 being accumulated or in close contact with each other.
- the porous layer 12 may be a fine particle layer formed of two or more kinds of many fine particles being accumulated together. In a case in which the porous layer 12 is a fine particle layer having pores, it is possible to increase the amount of the light absorber carried (adsorption amount).
- the surface area of fine particles used to form the porous layer 12 in a state in which the fine particles are applied onto the conductive support 11 and the like is preferably 10 or more times and more preferably 100 or more times the projected area.
- the upper limit thereof is not particularly limited, but is, generally, approximately 5,000 times.
- the average particle diameter of the diameters of equivalent circles of the projected areas is preferably 0.001 to 1 ⁇ m for the primary particles.
- the average particle diameter of the fine particles is preferably 0.01 to 100 ⁇ m in terms of the average particle diameter in the dispersion.
- the material used to form the porous layer 12 there is no particular limitation regarding conductivity, and thus the material may be an insulating body (insulating material), a conductive material, or a semiconductor (semi-conductive material).
- the material used to form the porous layer 12 it is possible to use, for example, chalcogenides (for example, oxides, sulfides, selenides, and the like) of metal, compounds having a perovskite-type crystal structure (except for light absorbers described below), oxides of silicon (for example, silicon dioxide and zeolite), or carbon nanotubes (including carbon nanowires, carbon nanorods, and the like).
- chalcogenides for example, oxides, sulfides, selenides, and the like
- oxides of silicon for example, silicon dioxide and zeolite
- carbon nanotubes including carbon nanowires, carbon nanorods, and the like.
- the chalcogenides of metal are not particularly limited, and preferred examples thereof include individual oxides of titanium, tin, zinc, tungsten, zirconium, hafnium, strontium, indium, cerium, yttrium, lanthanum, vanadium, niobium, aluminum, or tantalum, cadmium sulfide, cadmium selenide, and the like.
- Examples of the crystal structure of the chalcogenides of metal include an anatase-type crystal structure, a brookite-type crystal structure, and a rutile-type crystal structure, and an anatase-type crystal structure and a brookite-type crystal structure are preferred.
- the compounds having a perovskite-type crystal structure are not particularly limited, and examples thereof include transition metal oxides and the like.
- Examples thereof include strontium titanate, calcium titanate, barium titanate, lead titanate, barium zirconate, barium stannate, lead zirconate, strontium zirconate, strontium tantalate, potassium niobate, bismuth ferrate, barium strontium titanate, lanthanum barium titanate, calcium titanate, sodium titanate, and bismuth titanate.
- strontium titanate, calcium titanate, and the like are preferred.
- the carbon nanotubes have a shape obtained by rolling a carbon film (graphene sheet) in a tubular shape.
- Carbon nanotubes are classified into single-walled carbon nanotubes (SWCNT) obtained by coiling one graphene sheet in a cylindrical shape, double-walled carbon nanotubes (DWCNT) obtained by coiling two graphene sheets in a concentric shape, and multi-walled carbon nanotubes (MWCNT) obtained by coiling multiple graphene sheets in a concentric shape.
- SWCNT single-walled carbon nanotubes
- DWCNT double-walled carbon nanotubes
- MWCNT multi-walled carbon nanotubes
- any carbon nanotubes can be used without any particular limitation.
- the material used to form the porous layer 12 is preferably an oxide of titanium, tin, zinc, zirconium, aluminum, or silicon or a carbon nanotube and more preferably titanium oxide or aluminum oxide.
- the porous layer 12 may be formed of at least one of the chalcogenide of metal, the compound having a perovskite-type crystal structure, the oxide of silicon, or the carbon nanotube or may be formed of a plurality thereof.
- the film thickness of the porous layer 12 is not particularly limited and is generally in a range of 0.1 to 100 ⁇ m, and, in the case of being used as a solar cell, the film thickness is preferably 0.1 to 50 ⁇ m and more preferably 0.2 to 30 ⁇ m.
- the electron transport layer 15 is preferably provided on the surface of the transparent electrode 11 b.
- the electron transport layer 15 has a function of transporting electrons generated in the photosensitive layer 13 to the conductive support 11 .
- the electron transport layer 15 is formed of an electron-transporting material capable of exhibiting the above-described function.
- the electron-transporting material is not particularly limited and is preferably an organic material (organic electron-transporting material).
- organic electron-transporting material include fullerene compounds such as [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), perylene compounds such as perylene tetracarboxylic diimide (PTCDI), additionally, low-molecular-weight compounds such as tetracyanoquinodimethane (TCNQ), high-molecular-weight compounds, and the like.
- the film thickness of the electron transport layer 15 is not particularly limited and is preferably 0.001 to 10 ⁇ m and more preferably 0.01 to 1 ⁇ m.
- the hole transport layer 16 is preferably provided on the surface of the transparent electrode 11 b.
- the hole transport layer 16 is the same as the hole transport layer 3 described below except for the fact that the hole transport layer is formed at a different location.
- a perovskite compound described below is preferably provided as a light absorber on the surface (including the inner surfaces in a case in which surfaces provided with the photosensitive layer 13 are uneven) of each of the porous layer 12 (in the photoelectric conversion elements 10 A and 10 B), the blocking layer 14 (in the photoelectric conversion element 10 C), the electron transport layer 15 (in the photoelectric conversion element 10 D), and the hole transport layer 16 (in the photoelectric conversion element 10 E).
- the light absorber needs to contain at least one perovskite compound described below and may contain two or more perovskite compounds.
- the photosensitive layer 13 may be a single layer or a laminate of two or more layers.
- the laminate structure may be a laminate of layers made of mutually different light absorbers or may have an interlayer including a hole-transporting material laminated between the photosensitive layer and the photosensitive layer.
- a form of the photosensitive layer 13 being present on the conductive support 11 is as described above.
- the photosensitive layer 13 is preferably provided on the surface of each of the above-described layers so that excited electrons flow into the conductive support 11 .
- the photosensitive layer 13 may be provided on the entire surface or on a part of the surface of the above-described layers.
- the film thickness of the photosensitive layer 13 is appropriately set according to aspects of the photosensitive layer 13 provided on the conductive support 11 and is not particularly limited.
- the film thickness of the photosensitive layer 13 (in a case in which the porous layer 12 is provided, the total film thickness including the film thickness of the porous layer 12 ) is, for example, preferably 0.1 to 100 ⁇ m, more preferably 0.1 to 50 ⁇ m, and particularly preferably 0.2 to 30 ⁇ m.
- the light absorber included in the photosensitive layer also functions as a hole-transporting material.
- the photosensitive layer 13 includes, as a light absorber, a perovskite compound having organic cations, cations of metallic atoms other than elements belonging to Group I of the periodic table, and anions.
- organic cations constituting the perovskite compound being used in the present invention are organic cations having a silyl group.
- the perovskite compound has the organic cations having a silyl group in the crystal structure, it is possible to significantly enhance the moisture resistance of photoelectric conversion elements to be obtained. The reason thereof is not clear, but is assumed that the silyl group serves as a hydrophobic component and effectively develops a barrier action against moisture.
- the organic cation having a silyl group is preferably represented by Formula (1).
- R 1 represents a hydrogen atom or a group selected from an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, and an aliphatic heterocyclic group.
- alkyl group examples include linear alkyl groups and branched alkyl groups.
- the number of carbon atoms in the alkyl group is preferably 1 to 18, more preferably 1 to 6, and still more preferably 1 to 3.
- Specific examples of preferred alkyl groups include methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, pentyl, and hexyl.
- two R 1 's which are linked to the Si atom and present adjacent to each other may be linked to each other and form a ring.
- the formed ring may have a hetero atom as a ring-constituting atom.
- the number of carbon atoms is preferably 3 to 8.
- Specific examples of preferred cycloalkyl groups include cyclopropyl, cyclopentyl, and cyclohexyl.
- alkenyl group examples include linear alkenyl groups and branched alkenyl groups.
- the number of carbon atoms in the alkenyl group is preferably 2 to 18, more preferably 2 to 7, and still more preferably 2 to 5.
- Specific examples of preferred alkenyl groups include vinyl, allyl, butenyl, and hexenyl.
- alkynyl group examples include linear alkynyl groups and branched alkynyl groups.
- the number of carbon atoms in the alkynyl group is preferably 2 to 18, more preferably 2 to 7, and still more preferably 2 to 5.
- Specific examples of preferred alkynyl groups include ethynyl, butynyl, and hexynyl.
- alkoxy group that can be employed as R 1 examples include linear alkoxy groups and branched alkoxy groups.
- the alkyl portion in the alkoxy group is the same as the alkyl group that can be employed as R 1 described above, and a preferred aspect is also identical.
- the number of carbon atoms is preferably 6 to 14.
- Specific examples of preferred aryl groups include phenyl and naphthyl, and phenyl is more preferred.
- heteroaryl group examples include groups formed of an aromatic hetero ring alone and groups formed of a condensed hetero ring obtained by condensing another ring, for example, an aromatic ring, an aliphatic ring, or a hetero ring with the aromatic hetero ring.
- the ring-constituting hetero atom constituting the aromatic hetero ring is preferably a nitrogen atom, an oxygen atom, or a sulfur atom.
- the number of ring members of the aromatic hetero ring five-membered rings or six-membered rings are preferred.
- Examples of the five-membered aromatic hetero ring and the condensed hetero ring including the five-membered aromatic hetero ring include a pyrrole ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a furan ring, a thiophene ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, an indoline ring, and an indazole ring.
- examples of the six-membered aromatic hetero ring and the condensed hetero ring including the six-membered aromatic hetero ring include a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a quinoline ring, and a quinazoline ring.
- the number of carbon atoms is preferably 0 to 24 and more preferably 1 to 18.
- Specific examples of preferred aliphatic hetero rings of the aliphatic heterocyclic group include a pyrrolidine ring, an oxolane ring, a thiolane ring, a piperidine ring, an oxane ring, a thiane ring, a piperazine ring, a morpholine ring, a quinuclidine ring, an azetidine ring, an oxetane ring, an aziridine ring, a dioxane ring, a pentamethylene sulfide ring, and the like.
- R 1 may further have a substituent, and examples of the substituent include the above-described substituent that can be employed as R 1 .
- the substituent that R 1 may have is also preferably -L-NR 2 3 + in Formula (1).
- R 1 is preferably an alkyl group, an aryl group, or a heteroaryl group and more preferably an alkyl group from the viewpoint of more effectively developing the barrier action against moisture.
- R 2 represents a hydrogen atom or a group selected from an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, and an aliphatic heterocyclic group.
- the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, the heteroaryl group, and the aliphatic heterocyclic group that can be employed as R 2 are respectively the same as the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, the heteroaryl group, and the aliphatic heterocyclic group that can be employed as R 1 , and preferred aspects thereof are also identical.
- Two R 2 's which are linked to the N atom and present adjacent to each other may be linked to each other and form a ring.
- the formed ring may have a hetero atom as a ring-constituting atom.
- R 2 is preferably a hydrogen atom or an alkyl group and more preferably a hydrogen atom.
- L is a divalent linking group.
- L is preferably a divalent linking group selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NR L — or a divalent linking group formed of a combination of divalent linking groups selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NR L —.
- R L is a hydrogen atom or an alkyl group, this alkyl group is the same as the above-described alkyl group that can be employed as R 1 , and a preferred aspect thereof is also identical.
- alkylene group that can be employed as L or a part of L include linear alkylene groups and branched alkylene groups.
- the number of carbon atoms in the alkylene group is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, still more preferably 1 to 5, and still more preferably 1 to 3.
- Specific examples of preferred alkylene groups include methylene, ethylene, propylene, butylene, pentylene, and hexylene.
- the number of carbon atoms is preferably 3 to 8.
- Specific examples of preferred cycloalkylene groups include cyclopropylene, cyclpentylene, and cyclohexylene.
- alkenylene group that can be employed as L or a part of L include linear alkenylene groups and branched alkenylene groups.
- the number of carbon atoms in the alkenylene group is preferably 2 to 20, more preferably 2 to 15, still more preferably 2 to 10, still more preferably 2 to 5, and still more preferably 2 or 3.
- alkynylene group that can be employed as L or a part of L include linear alkynylene groups and branched alkynylene groups.
- the number of carbon atoms in the alkynylene group is preferably 2 to 20, more preferably 2 to 15, still more preferably 2 to 10, far still more preferably 2 to 5, and particularly preferably 2 to 4.
- the number of carbon atoms in the arylene group that can be employed as L or a part of L is preferably 6 to 14.
- the arylene group is preferably phenylene or naphthylene and more preferably phenylene.
- the number of carbon atoms is preferably 0 to 24 and more preferably 1 to 18.
- Rings constituting the heteroarylene group are preferably condensed hetero rings including a five-membered aromatic hetero ring or a five-membered aromatic hetero ring or condensed hetero rings including a six-membered aromatic hetero ring or a six-membered aromatic hetero ring.
- Preferred examples of the five-membered aromatic hetero ring, the condensed hetero rings including the five-membered aromatic hetero ring, the six-membered aromatic hetero ring, and the condensed hetero rings including the six-membered aromatic hetero ring are the same as the preferred aspects of the condensed hetero rings including the five-membered aromatic hetero ring, the condensed hetero rings including the five-membered aromatic hetero ring, the six-membered aromatic hetero ring, and the condensed hetero rings including the six-membered aromatic hetero ring described in the section of the above-described heteroaryl group that can be employed as R 1 .
- L is preferably an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, or a divalent linking group formed of a combination of two or more (preferably two) groups selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, and a heteroarylene group.
- L is more preferably an alkylene group, an arylene group, or a divalent linking group formed of a combination of an alkylene group and an arylene group.
- L and NR 2 3 + are preferably linked to each other through the alkylene group. That is, in a case in which the organic cation having a silyl group represented by Formula (1) has an alkylene group in L, the organic cation is preferably represented by R 1 3 Si-L 1 - L 2 -NR 2 3 + .
- L 1 represents a divalent linking group selected from a single bond, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NR L —
- L 2 represents an alkylene group.
- R 1 , R 2 , and R L are respectively the same as R 1 , R 2 , and R L described above, and preferred aspects thereof are also identical.
- a preferred aspect of the alkylene group L 2 is the same as the above-described preferred aspect of the alkylene group that can be employed as L.
- the organic cation having a silyl group is also preferably an organic cation represented by Formula (RI) in addition to the organic cation represented by Formula (1).
- R 1 and R 2 each are the same as R 1 and R 2 in Formula (1), and preferred aspects thereof are also identical.
- the organic cation constituting the perovskite compound being used in the present invention preferably includes an organic cation not having a silyl group in addition to the organic cation having a silyl group.
- the organic cation not having a silyl group is preferably an organic cation represented by Formula (2).
- R A is preferably an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a group that can be represented by Formula (3).
- an alkyl group and the group that can be represented by Formula (3) are more preferred, and an alkyl group is still more preferred.
- the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group that can be employed by R A are the same as the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group that can be respectively employed by R 1 in Formula (1) respectively, and preferred groups are also identical thereto.
- X a represents NR 1c , an oxygen atom, or a sulfur atom.
- R 1b and R 1c each independently represent a hydrogen atom or a substituent.
- * represents a bonding location with an N atom in Formula (2).
- the organic ammonium cation may have a resonance structure.
- X a in the group that can be represented by Formula (3) is NH (R 1c is a hydrogen atom)
- examples of the organic cation include not only organic ammonium cations formed by bonding the group that can be represented by Formula (3) and NH 3 + but also organic amidinium cations which are one of the resonance structures of the organic ammonium cation.
- Examples of the organic amidinium cations include cations represented by Formula (A am ).
- the cations represented by Formula (A am ) are expressed as “R 1b C( ⁇ NH)—NH 3 ” for convenience.
- X a represents NR 1c , an oxygen atom, or a sulfur atom and is preferably NR 1c .
- R 1c represents a hydrogen atom or substituent and is preferably a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group and more preferably a hydrogen atom.
- R 1b represents a hydrogen atom or a substituent and is preferably a hydrogen atom.
- a substituent that can be employed by R 1b include an amino group, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, and a heteroaryl group.
- An alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, and a heteroaryl group that can be respectively employed by R 1b and R 1c are the same as the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group that can be respectively employed by R 1 in Formula (1) respectively, and preferred groups are also identical thereto.
- Examples of the group that can be represented by Formula (3) include a (thio)acyl group, a (thio)carbamoyl group, an imidoyl group, and an amidino group.
- Examples of the (thio)acyl group include an acyl group and a thioacyl group.
- the acyl group is preferably an acyl group having a total of 1 to 7 carbon atoms, and examples thereof include formyl, acetyl (CH 3 C( ⁇ O)—), propionyl, hexanoyl, and the like.
- the thioacyl group is preferably a thioacyl group having a total of 1 to 7 carbon atoms, and examples thereof include thioformyl, thioacetyl (CH 3 C( ⁇ S)—), thiopropionyl, and the like.
- Examples of the (thio)carbamoyl group include a carbamoyl group (H 2 NC( ⁇ O)—) and thiocarbamoyl group (H 2 NC( ⁇ S)—).
- the imidoyl group is a group represented by R 1b —C( ⁇ NR 1c )—, R 1b and R 1c each are preferably a hydrogen atom or an alkyl group, and the alkyl group is more preferably the same as the alkyl group as R 1 .
- R 1b and R 1c each are preferably a hydrogen atom or an alkyl group, and the alkyl group is more preferably the same as the alkyl group as R 1 .
- Examples thereof include formimidoyl (HC( ⁇ NH)—), acetoimidoyl (CH 3 C( ⁇ NH)—), propionimidoyl (CH 3 CH 2 C( ⁇ NH)—), and the like. Among these, formimidoyl is preferred.
- the amidino group as the group that can be represented by Formula (3) has a structure in which R 1b of the imidoyl group is an amino group and R 1c is a hydrogen atom (—C( ⁇ NH)NH 2 ).
- the molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group preferably satisfies Numerical Expression (i), more preferably satisfies Numerical Expression (ii), and still more preferably satisfies Numerical Expression (iii).
- the perovskite compound being used in the present invention has cations of metallic atoms other than elements belonging to Group I of the periodic table in the crystal structure.
- the metallic atoms other than elements belonging to Group I of the periodic table include metallic atoms such as calcium (Ca), strontium (Sr), cadmium (Cd), copper (Cu), nickel (Ni), manganese (Mn), iron (Fe), cobalt (Co), palladium (Pd), germanium (Ge), tin (Sn), lead (Pb), ytterbium (Yb), europium (Eu), indium (In), titanium (Ti), and bismuth (Bi), among these, at least one selected from the group consisting of a Pb atom, a Cu atom, a Ge atom, and a Sn atom is more preferred, a Pb atom or a Sn atom is still more preferred, and a Pb atom is particularly preferred.
- the perovskite compound being used in the present invention may have one or two or more kinds of cations of metallic atoms other than elements belonging to Group I of the periodic table in the crystal structure.
- the perovskite compound preferably has a Pb atom and a Sn atom.
- the presence fractions of two or more kinds of these cations are not particularly limited.
- Anions constituting the perovskite compound being used in the present invention may be monoatomic anions or polyatomic anions.
- the monoatomic anions include anions of halogen atoms.
- preferred examples of the polyatomic anions include NCS ⁇ , NCO ⁇ , HO ⁇ , NO 3 ⁇ , and COO ⁇ .
- the anions constituting the perovskite compound are preferably anions of halogen atoms.
- the halogen atoms include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a bromine atom or an iodine atom is preferred.
- the anions constituting the perovskite compound being used in the present invention may be one kind of anions or two or more kinds of anions.
- anions of an iodine atom are preferred.
- aspects having anions of two or more kinds of halogen atoms is preferred, and, among these, an aspect having two kinds of anions of a chlorine atom and anions of an iodine atom is more preferred.
- the proportions thereof are not particularly limited.
- the perovskite compound being used in the present invention may have cations of elements belonging to Group I of the periodic table in the structure.
- the cations of elements belonging to Group I of the periodic table are preferably a lithium ion (Li + ), a sodium ion (Na + ), a potassium ion (K + ), and a cesium ion (Cs + ), and, among these, Cs + is more preferred.
- the perovskite compound that is used in the present invention has a perovskite-type crystal structure having the respective constituent ions described above.
- the perovskite compound that is used in the present invention is preferably a perovskite compound represented by Formula (I).
- A represents an element in Group I of the periodic table or a cationic organic group.
- M represents a metallic atom that is not an element in Group I of the periodic table.
- X represents an anionic atom or anionic atomic group.
- a 1 or 2
- m 1
- the cationic organic group refers to an organic group being present as a cation in the perovskite-type crystal structure
- the anionic atom refers to an atom being present as a monoatomic anion in the perovskite-type crystal structure
- the anionic atomic group refers to an atomic group being present as a polyatomic anion in the perovskite-type crystal structure.
- an element A belonging to Group I of the periodic table is present as a cation in the perovskite-type crystal structure.
- a cationic organic group A is present as the above-described organic cation in the perovskite-type crystal structure.
- a metallic atom M is present in the perovskite-type crystal structure as the above-described cation of a metallic atom other than elements belonging to Group I of the periodic table.
- an anionic atom X is present as the above-described monoatomic anion in the perovskite-type crystal structure.
- an anionic atom group X is present as the above-described polyatomic anion in the perovskite-type crystal structure.
- At least a part of A is a cationic organic group having a silyl group.
- the perovskite compound being used in the present invention may also be a mixture of a perovskite compound represented by Formula (I) in which a is 1 and a perovskite compound represented by Formula (I) in which a is 2.
- the perovskite compound can be synthesized from MX 2 and AX.
- the perovskite compound can be synthesized with reference to Science, 2012, vol. 338, pp. 643 to 647.
- the perovskite compound can be synthesized with appropriate reference to Akihiro Kojima, Kenjiro Teshima, Yasuo Shirai, and Tsutomu Miyasaka, “Organometal Halide Perovskites as Visible-Light Sensitizers for Photovoltaic Cells”, J. Am. Chem. Soc., 2009, 131 (17), pp. 6050 and 6051.
- the proportion of the total molar quantity of the organic cation represented by Formula (1), the organic cation represented by Formula (RI), the organic cation represented by Formula (2), and the cations of metallic atoms other than elements belonging to Group I of the periodic table in the total molar quantity of the cations constituting the perovskite compound is preferably 90 to 100% by mol and more preferably 95 to 100% by mol.
- the proportion of the total molar quantity of the anions of the halogen atoms in the total molar quantity of the anions constituting the perovskite compound is preferably 90 to 100% by mol, more preferably 95 to 100% by mol, and still more preferably 98 to 100% by mol.
- the amount of the light absorber used needs to be an amount at which, out of the surface of the porous layer 12 or the blocking layer 14 , at least some of the surface on which light is incident is covered and is preferably an amount at which the surface is fully covered.
- the content of the perovskite compound in the photosensitive layer 13 is generally 1 to 100% by mass.
- the photoelectric conversion element of the present invention preferably has the hole transport layer 3 between the first electrode and the second electrode.
- the hole transport layer 3 has a function of supplementing electrons to oxidants of the light absorber and is preferably a solid-form layer.
- the hole transport layer 3 is preferably provided between the photosensitive layer 13 in the first electrode 1 and the second electrode 2 .
- a hole-transporting material that forms the hole transport layer 3 is not particularly limited, and examples thereof include inorganic materials such as CuI and CuNCS, organic hole-transporting materials described in Paragraphs 0209 to 0212 of JP2001-291534A, and the like.
- Preferred examples of the organic hole-transporting material include conductive polymers such as polythiophene, polyaniline, polypyrrole, and polysilane, spiro compounds in which two rings share a central atom having a tetrahedral structure such as C or Si, aromatic amine compounds such as triarylamine, triphenylene compounds, nitrogen-containing heterocyclic compounds, and liquid-crystalline cyano compounds.
- the hole-transporting material is preferably an organic hole-transporting material which can be applied in a solution and turns into solid, and examples thereof include 2,2′,7,7′-tetrakis-(N,N-di-p-methoxyphenylamine)-9,9-spirobifluorene (also referred to as Spiro-OMeTAD), poly(3-hexylthiophene-2,5-diyl), 4-(diethylamino)benzoaldehyde, diphenylhydrazone, polyethylene dioxythiophene (PEDOT), and the like.
- organic hole-transporting material which can be applied in a solution and turns into solid, and examples thereof include 2,2′,7,7′-tetrakis-(N,N-di-p-methoxyphenylamine)-9,9-spirobifluorene (also referred to as Spiro-OMeTAD), poly(3-hexylthiophene-2,5-
- the film thickness of the hole transport layer 3 is not particularly limited, but is preferably 50 ⁇ m or less, more preferably 1 nm to 10 ⁇ m, still more preferably 5 nm to 5 ⁇ m, and particularly preferably 10 nm to 1 ⁇ m.
- the total film thickness of the porous layer 12 , the photosensitive layer 13 , and the hole transport layer 3 is not particularly limited, but is, for example, preferably 0.1 to 200 ⁇ m, more preferably 0.1 to 50 ⁇ m, and still more preferably 0.2 to 5 ⁇ m.
- the electron transport layer 4 is preferably provided between the photosensitive layer 13 C and the second electrode 2 .
- the electron transport layer 4 is the same as the electron transport layer 15 except for the fact that electrons are transferred to the second electrode and the electron transport layer is formed at a different location.
- the second electrode 2 functions as a positive electrode in solar cells.
- the second electrode 2 is not particularly limited as long as the second electrode is conductive and, generally, can be provided with the same constitution as that of the conductive support 11 . In a case in which a sufficient strength is maintained, the support 11 a is not essentially required.
- the structure of the second electrode 2 is preferably a structure having a strong power-collection effect.
- at least one of the conductive support 11 or the second electrode 2 needs to be substantially transparent.
- the conductive support 11 is transparent and sunlight enters the solar cell through the support 11 a side.
- the second electrode 2 more preferably has a property of reflecting light.
- Examples a material used to form the second electrode 2 include metal such as platinum (Pt), gold (Au), nickel (Ni), copper (Cu), silver (Ag), indium (In), ruthenium (Ru), palladium (Pd), rhodium (Rh), iridium (Jr), osmium (Os), and aluminum (Al), the above-described conductive metallic oxides, carbon materials, conductive polymers, and the like.
- the carbon materials need to be conductive materials formed of carbon atoms bonded together, and examples thereof include fullerene, carbon nanotubes, graphite, graphene, carbon black, and the like.
- the second electrode 2 is preferably a thin film (including a thin film obtained by means of vapor deposition) of metal or a conductive metallic oxide or a glass or plastic substrate having this thin film.
- the glass or plastic substrate is preferably a glass substrate having a gold or platinum thin film or a glass substrate on which platinum is vapor-deposited.
- the film thickness of the second electrode 2 is not particularly limited, but is preferably 0.01 to 100 ⁇ m, more preferably 0.01 to 10 ⁇ m, and particularly preferably 0.01 to 1 ⁇ m.
- a spacer or a separator can also be used instead of the blocking layer 14 and the like or together with the blocking layer 14 and the like.
- a hole-blocking layer may be provided between the second electrode 2 and the hole transport layer 3 .
- the solar cell of the present invention is constituted using the photoelectric conversion element of the present invention.
- the photoelectric conversion element 10 constituted by providing the external circuit 6 can be used as a solar cell.
- a well-known circuit can be used without any particular limitation.
- the solar cell of the present invention preferably has a side surface that is sealed with a polymer, an adhesive, or the like.
- the photoelectric conversion element and the solar cell of the present invention can be manufactured according to well-known manufacturing methods, for example, the methods described in Science, 2012, vol. 338, pp. 643 to 647.
- the blocking layer 14 , the porous layer 12 , and at least one of the electron transport layer 15 or the hole transport layer 16 is formed on the surface of the conductive support 11 as desired.
- the blocking layer 14 can be formed by, for example, applying a dispersion including the above-described insulating substance, a precursor compound thereof, or the like onto the surface of the conductive support 11 and firing the dispersion or thermally decomposing the dispersion by means of spraying.
- a material used to form the porous layer 12 is preferably used in a fine particle form and more preferably used in a form of fine particles in a dispersion.
- a method for forming the porous layer 12 is not particularly limited, and examples thereof include wet-type methods, dry-type methods, and other methods (for example, methods described in Chemical Review, Vol. 110, p. 6595 (published on 2010)). In these methods, it is preferable to apply the dispersion (paste) onto the surface of the conductive support 11 or the surface of the blocking layer 14 and then fire the dispersion at a temperature 100° C. to 800° C. for ten minutes to ten hours. In such a case, it is possible to bring the fine particles into close contact with each other.
- the temperature of firing that is not the final firing is preferably set to be lower than the temperature of the final firing (the final firing temperature).
- the non-final firing temperature can be set in a range of 50° C. to 300° C.
- the final firing temperature can be set to be higher than the non-firing firing temperature in a range of 100° C. to 600° C.
- the firing temperature is preferably 60° C. to 500° C.
- the amount of a porous material applied to form the porous layer 12 is appropriately set depending on the film thickness of the porous layer 12 , the number of times of coating, and the like and is not particularly limited.
- the amount of the porous material applied to square meter of the surface area of the conductive support 11 is, for example, preferably 0.5 to 500 g and more preferably 5 to 100 g.
- the layer can be formed in the same manner as the hole transport layer 3 or the electron transport layer 4 described below.
- the photosensitive layer 13 is provided.
- a method for providing the photosensitive layer 13 is not particularly limited, and examples thereof include wet-type methods and dry-type methods.
- wet-type methods are preferred, and, for example, a method in which the surface is brought into contact with a light absorber solution including the absorber is preferred.
- the light absorber solution for forming the photosensitive layer 13 is prepared.
- the light absorber solution includes MX 2 and AX which are raw materials of the perovskite compound.
- A, M, and X are the same as A, M, and X in Formula (I).
- the molar ratio between MX 2 and AX is appropriately adjusted depending on the purpose.
- the molar ratio between MX 2 and AX is preferably 1:1 to 10:1.
- the light absorber solution can be prepared by mixing AX and MX 2 in a predetermined molar ratio and then, preferably, heating the components.
- This forming liquid is generally a solution, but may be a suspension. Heating conditions are not particularly limited, but the heating temperature is preferably 30° C. to 200° C. and more preferably 60° C. to 150° C.
- the heating duration is preferably 0.5 to 100 hours and more preferably 1 to 3 hours.
- a solvent or a dispersion medium substances described below can be used.
- the prepared light absorber solution is brought into contact with the surface of a layer forming the photosensitive layer 13 on the surface thereof (in the photoelectric conversion element 10 , any layer of the porous layer 12 , the blocking layer 14 , the electron transport layer 15 , or the hole transport layer 16 ).
- the light absorber solution onto the surface or immerse the surface in the forming liquid. Therefore, a perovskite compound is formed on the surface of the porous layer 12 , the blocking layer 14 , the electron transport layer 15 , or the hole transport layer 16 .
- the temperature at which the forming liquid is brought into contact with the surface is preferably 5° C.
- the immersion duration is preferably 5 seconds to 24 hours and more preferably 20 seconds to 1 hour.
- the forming liquid is preferably dried using heat and is generally dried by being generally heated at 20° C. to 300° C. and being preferably heated at 50° C. to 170° C.
- the photosensitive layer according to a method for synthesizing the above-described perovskite compound.
- examples thereof also include a method in which an AX solution including the AX and an MX 2 solution including the MX 2 are separately applied (including the immersion method) and are dried as necessary.
- any solution may be applied in advance, but the MX 2 solution is preferably applied in advance.
- the molar ratio between AX and MX 2 , coating conditions, and drying conditions are the same as those in the above-described method.
- a dry-type method such as vapor deposition in a vacuum in which a compound or a mixture obtained by removing the solvent from the light absorber solution is used.
- a method in which the AX and the MX 2 are simultaneously or sequentially vapor-deposited it is possible to use a dry-type method such as vapor deposition in a vacuum in which a compound or a mixture obtained by removing the solvent from the light absorber solution is used.
- the light absorber is formed and turns into the photosensitive layer 13 .
- the hole transport layer 3 or the electron transport layer 4 is formed.
- the hole transport layer 3 can be formed by applying and drying a hole-transporting material solution including a hole-transporting material.
- the concentration of the hole-transporting material is preferably 0.01 to 1.0 M (mol/L) since coatability is excellent and, in a case in which the porous layer 12 is provided and pores are present, the hole-transporting material is capable of easily intruding into the inside of pores in the porous layer 12 .
- the electron transport layer 4 can be formed by applying and drying an electron-transporting material solution including an electron-transporting material.
- the second electrode 2 is formed, thereby manufacturing the photoelectric conversion element and the solar cell.
- the film thicknesses of the respective layers can be adjusted by appropriately changing the concentrations of the respective dispersion liquids or solutions and the number of times of coating.
- the light absorber solution may be applied and dried multiple times.
- the respective dispersion liquids and solutions described above may respectively include additives such as a dispersion aid and a surfactant.
- Examples of the solvent or dispersion medium that is used in the method for manufacturing the photoelectric conversion element and the solar cell include solvents described in JP2001-291534A, but the solvent or dispersion medium is not limited thereto.
- organic solvents are preferred, and alcohol solvents, amide solvents, nitrile solvents, hydrocarbon solvents, lactone solvents, halogen solvents, sulfide solvents, and solvent mixtures of two or more thereof are preferred.
- the solvent mixture is preferably a solvent mixture of an alcohol solvent and a solvent selected from amide solvents, nitrile solvents, and hydrocarbon solvents.
- methanol, ethanol, isopropanol, ⁇ -butyrolactone, chlorobenzene, acetonitrile, dimethylformamide (DMF) or dimethylacetamide, or a solvent mixture thereof is preferred.
- a method for applying the solutions or dispersants used to form the respective layers is not particularly limited, and it is possible to use a well-known coating method such as spin coating, extrusion die coating, blade coating, bar coating, screen printing, stencil printing, roll coating, curtain coating, spray coating, dip coating, an inkjet printing method, or an immersion method. Among these, spin coating, screen printing, an immersion method, and the like are preferred.
- the photoelectric conversion element produced as described above can be used as a solar cell by connecting the external circuit 6 to the first electrode 1 and the second electrode 2 .
- a composition of the present invention includes a compound represented by Formula (1a) and a halogenated metal.
- R 1 , R 2 , and L are the same as R 1 , R 2 , and L in Formula (1) respectively, and preferred aspects thereof are also identical.
- Hal represents a halogen atom (preferably an iodine atom, a chlorine atom, or a bromine atom).
- composition of the present invention may include one or more compounds represented by Formula (1a).
- halogenated metal included in the composition of the present invention include halides of the above-described metallic atoms M other than elements belonging to Group I of the periodic table which the perovskite compound being used in the present invention has (that is, compounds represented by M(Hal) 2 ; Hal represents a halogen atom), at least one selected from halides of Pb and halides of Sn is more preferred, at least one selected from iodides or chlorides of Pb and iodides or chlorides of Sn is still more preferred, and at least one selected from PbI 2 and SnI 2 is particularly preferred.
- the composition of the present invention may be a solid (powder, granule, or the like) or a solution.
- an organic solvent is preferably used as the medium.
- the organic solvent is not particularly limited, and examples thereof include alcohol solvents, amide solvents, nitrile solvents, hydrocarbon solvents, lactone solvents, halogen solvents, and solvent mixtures of two or more solvents described above.
- the organic solvent that the composition of the present invention may have is more preferably methanol, ethanol, isopropanol, ⁇ -butyrolactone, chlorobenzene, acetonitrile, DMF, dimethylacetamide, dimethyl sulfoxide, or a solvent mixture thereof.
- composition of the present invention may further have additional components other than the compound represented by Formula (1a) and the halogenated metal.
- the composition of the present invention preferably includes at least one compound represented by R A —NH 3 Hal (R A is the same as R A in Formula (2), and a preferred aspect thereof is also identical; Hal represents a halogen atom and is preferably an iodine atom, a chlorine atom, or a bromine atom).
- R A —NH 3 Hal is more preferably CH 3 NH 3 Hal or CH 3 CH 2 NH 3 Hal.
- the molar ratio of the content a of the compound represented by Formula (Ia) to the content b of the halogenated metal is preferably 0.001 ⁇ a/b ⁇ 10, more preferably 0.01 ⁇ a/b ⁇ 10, and still more preferably 0.01 ⁇ a/b ⁇ 3.
- the molar ratio of the content c of R A —NH 3 Hal to the content a of the compound represented by Formula (1a) is preferably 4 ⁇ c/a ⁇ 999, more preferably 19 ⁇ c/a ⁇ 499, and particularly preferably 49 ⁇ c/a ⁇ 199.
- the composition of the present invention includes the compound represented by Formula (Ia) and R A —NH 3 Hal
- the molar ratio of the total of the content a of the compound represented by Formula (1a) and the content c of R A —NH 3 Hal to the content b of the halogenated metal is preferably 1 ⁇ (a+c)/b ⁇ 10 and more preferably 1 ⁇ (a+c)/b ⁇ 5.
- composition of the present invention may also include a halide of an element belonging to Group I of the periodic table as the additional component.
- the composition of the present invention can be preferably used as supply sources of MX 2 and AX described above in the formation of the photosensitive layer of the photoelectric conversion element of the present invention.
- the composition of the present invention is powder, granules, or the like
- the composition of the present invention can be used as the above-described light absorber solution after being dissolved in a solvent so as to prepare a solution having an appropriate concentration and carrying out filtration, purification, and the like as necessary.
- the composition of the present invention is a solution
- the composition can be used as the above-described light absorber solution as it is or after being condensed, diluted, filtered, purified, or the like.
- composition of the present invention can be preferably used to form the photosensitive layer in the manufacturing of the photoelectric conversion element of the present invention.
- the photoelectric conversion element 10 A illustrated in FIG. 1 was manufactured in an order described below. Meanwhile, in a case in which the film thickness of the photosensitive layer 13 is large, the photoelectric conversion element corresponds to the photoelectric conversion element 10 B illustrated in FIG. 2 .
- a fluorine-doped SnO 2 conductive film (the transparent electrode 11 b ) was formed on a glass substrate (the support 11 a , thickness: 2.2 mm), thereby producing a conductive support 11 .
- An isopropanol solution containing 15% by mass of titanium diisopropoxide bis(acetylacetonate) (manufactured by Sigma-Aldrich Japan K.K.) was diluted with 1-butanol, thereby preparing 0.02 M of a solution for a blocking layer.
- a blocking layer 14 made of titanium oxide (having a film thickness of 50 nm) was formed on the SnO 2 conductive film of the conductive support 11 using 0.02 M of the solution for the blocking layer at 450° C. by means of a spray thermal decomposition method.
- Ethyl cellulose, lauric acid, and terpineol were added to an ethanol dispersion liquid of titanium oxide (anatase, an average particle diameter of 20 nm), thereby preparing titanium oxide paste.
- the prepared titanium oxide paste was applied onto the blocking layer 14 by means of a screen printing method and was fired. The application and firing of the titanium oxide paste were repeated again. Meanwhile, the first firing was carried out at 130° C. for one hour, and the second firing was carried out at 500° C. for one hour.
- the obtained titanium oxide fired body was immersed in an aqueous solution of 40 mM of TiCl 4 , then, was heated at 60° C. for one hour, and, continuously, was heated at 500° C. for 30 minutes, thereby forming the porous layer 12 (having a film thickness of 250 nm) made of TiO 2 .
- the molar ratios among the purified CH 3 NH 3 I, Compound (a2), and PbI 2 were set to 99.8:0.2:50, and the components were stirred and mixed together at 60° C. in dimethylformamide (DMF) for 12 hours, and then filtered using a polytetrafluoroethylene (PTFE) syringe filter, thereby preparing 40% by mass of a light absorber solution A.
- DMF dimethylformamide
- PTFE polytetrafluoroethylene
- the prepared light absorber solution A was applied onto the porous layer 12 using a spin coating method (at 2,000 rpm for 60 seconds), and the light absorber solution A was dried at 100° C. for 90 minutes using a hot plate, thereby forming a photosensitive layer A (having a film thickness of 300 nm (including the film thickness of the porous layer 12 of 250 nm)) as the photosensitive layer 13 A having a perovskite compound.
- a first electrode 1 was produced in the above-described manner.
- the hole-transporting material solution was applied onto the photosensitive layer 13 in the first electrode 1 using a spin coating, and the applied hole-transporting material solution was dried, thereby forming a hole transport layer 3 (film thickness: 0.1 ⁇ m).
- Gold (film thickness: 0.1 ⁇ m) was vapor-deposited on the hole transport layer 3 using a vapor deposition method, thereby producing a second electrode 2 .
- a photoelectric conversion element 10 with Specimen No. 101 was manufactured in the above-described manner.
- Photoelectric conversion elements 10 with Specimen Nos. 102 to 104 were manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the ⁇ formation of photosensitive layer 13 A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, the mixing molar ratio between the purified CH 3 NH 3 I and Compound (a2) was changed as shown in the table below. Meanwhile, the mixing molar ratio between the total amount of the purified CH 3 NH 3 I and Compound (a2) and PbI 2 was set, similar to that in the manufacturing with Specimen No. 101, to 2:1.
- a photoelectric conversion element 10 with Specimen No. 105 was manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the ⁇ formation of photosensitive layer 13 A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, methylamine was changed to ethylamine, and the molar ratios among the purified CH 3 CH 2 NH 3 I, Compound (a2), and PbI 2 were set to 98:2:50.
- Photoelectric conversion elements 10 with Specimen Nos. 106 to 133 were manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the ⁇ formation of photosensitive layer 13 A> during the manufacturing of the above-described photoelectric conversion element with Specimen No.
- Compound (b1), (g1), (s1), (w1), (x1), (y1), (z1), (aa1), (bb1), (cc1), or (dd1) was used instead of Compound (a1), each of Compound (b2), (g2), (s2), (w2), (x2), (y2), (z2), (aa2), (bb2), (cc2), or (dd2) was obtained, and the mixing molar ratio between each of these compounds and the purified CH 3 NH 3 I was changed as shown in the table below.
- the mixing molar ratio between the total amount of the purified CH 3 NH 3 I and Compound (b2), (g2), (s2), (w2), (x2), (y2), (z2), (aa2), (bb2), (cc2), or (dd2) and PbI 2 was set, similar to that in the manufacturing of Specimen No. 101, to 2:1.
- a photoelectric conversion element 10 with Specimen No. 201 was manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the ⁇ formation of photosensitive layer 13 A>during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, the following process was carried out.
- the molar ratio between the purified CH 3 NH 3 I and PbI 2 was set to 2:1, the components were stirred and mixed together at 60° C. in ⁇ -butyrolactone for 12 hours and then filtered using a polytetrafluoroethylene (PTFE) syringe filter, thereby preparing 40% by mass of a light absorber solution B.
- PTFE polytetrafluoroethylene
- the prepared light absorber solution B was applied onto the porous layer 12 using a spin coating method (at 2,000 rpm for 60 seconds and subsequently at 3,000 rpm for 60 seconds), and the applied light absorber solution B was dried at 100° C. for 40 minutes using a hot plate, thereby forming a photosensitive layer A (having a film thickness of 600 nm (including the film thickness of the porous layer 12 of 500 nm)) as the photosensitive layer 13 A having a perovskite compound.
- a photoelectric conversion element 10 with Specimen No. 202 was manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 201 except for the fact that, in the ⁇ formation of photosensitive layer 13 A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 201, methylamine was changed to a mixture of methylamine and ethylamine (the molar ratio of methylamine to ethylamine was set to 9), and the molar ratios among CH 3 NH 3 I:CH 3 CH 2 NH 3 I:PbI 2 were set to 1.8:0.2:1 in the case of the preparation of the light absorber solution B.
- the cell characteristics testing was carried out by radiating 1,000 W/m 2 of quasi-sunlight from a xenon lamp through an AM1.5 filter using a solar simulator “WXS-85H” (Wacom). Current-voltage characteristics were measured using an I-V tester, and photoelectric conversion efficiencies ( ⁇ %) were obtained.
- the moisture resistance of the photoelectric conversion element was measured in the following manner.
- the moisture resistance of the photoelectric conversion element was evaluated from the decline percentage of the photoelectric conversion efficiency computed using the following expression according to the following evaluation standards.
- Decline percentage (%) 100 ⁇ 100 ⁇ (photoelectric conversion efficiency after storage)/(initial photoelectric conversion efficiency) ⁇
- the decline percentage is 29% or more and less than 33%
- the decline percentage is 33% or more and less than 37%
- [A], [B], [C], and [D] are pass levels, [A], [B], and [C] are preferred, and [A] is more preferred.
- [E] level the decline percentage is large, and the moisture resistance fails to reach the pass level (required level) of the present invention.
- [A2]/[A1] shown in Table 1 corresponds to the molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group which constitute the perovskite compound.
- the perovskite compound in the light absorber included the organic cations having a silyl group in the crystal structure, it was found that the photoelectric conversion efficiency of the photoelectric conversion element did not easily decrease even under high-humidity conditions and the moisture resistance was excellent.
- the photoelectric conversion element or the solar cell of the present invention exhibit excellent moisture resistance.
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Abstract
Provided are a photoelectric conversion element including a first electrode having a photosensitive layer including a light absorber on a conductive support and a second electrode facing the first electrode, in which the light absorber includes a compound having a perovskite-type crystal structure including organic cations, cations of a metallic atom other than elements belonging to Group I of the periodic table, and anions, and at least some of the organic cations constituting the compound are organic cations having a silyl group and a solar cell using the photoelectric conversion element. Also provided is a composition containing a compound represented by Formula (1a) and a halogenated metal:
R1 3Si-L-NR2 3Hal Formula (1a)
in the formula, R1, R2, and L are specific groups; and Hal represents a halogen atom.
Description
- This application is a Divisional Application of U.S. application Ser. No. 15/658,995 filed on Jul. 25, 2017, which is a Continuation of PCT International Application No. PCT/JP2016/055520 filed on Feb. 24, 2016, which claims priority under 35 U.S.C. § 119 (a) to Japanese Patent Application No. 2015-045167 filed on Mar. 6, 2015, and to Japanese Patent Application No. 2016-010695 filed on Jan. 22, 2016. Each of the above applications is hereby expressly incorporated by reference, in its entirety, into the present application.
- The present invention relates to a photoelectric conversion element, a solar cell, and a composition.
- Photoelectric conversion elements are used in a variety of optical sensors, copiers, solar cells, and the like. It is anticipated that solar cells will be actively put into practical use as cells using non-exhaustible solar energy. Among them, active research and development is underway regarding dye sensitized solar cells in which an organic dye, a Ru bipyridyl complex, or the like is used as a sensitizer, and the photoelectric conversion efficiency thereof reaches approximately 11%.
- Meanwhile, in recent years, research results that solar cells in which a metallic halide is used as a compound having a perovskite-type crystal structure are capable of achieving a relatively high photoelectric conversion efficiency have been reported and attracted attention (for example, Science, 2012, vol. 338, pp. 643 to 647).
- Photoelectric conversion elements or solar cells in which a compound having a perovskite-type crystal structure (hereinafter, also referred to as “perovskite compound”) is used have attained certain achievements in terms of the improvement of photoelectric conversion efficiencies. However, photoelectric conversion elements or solar cells in which a perovskite compound is used have recently attracted attention, and cell performance other than photoelectric conversion efficiencies are barely known.
- For photoelectric conversion elements and solar cells, there is a demand not only for a high photoelectric conversion efficiency but also for durability sufficient to maintain initial performance in on-site environments in which the photoelectric conversion elements and solar cells are actually used.
- However, it is known that perovskite compounds are likely to be damaged in highly humid environments. In actual cases, the photoelectric conversion efficiencies of photoelectric conversion elements or solar cells in which a perovskite compound is used as a light absorber often significantly decrease in highly humid environments.
- An object of the present invention is to provide a photoelectric conversion element which has a perovskite compound in a photosensitive layer as a light absorber and has excellent moisture resistance. In addition, another object of the present invention is to provide a solar cell in which the photoelectric conversion element is used. In addition, a still another object of the present invention is to provide a composition preferable for forming the photosensitive layer in the photoelectric conversion element.
- The present inventors found that, when an organic cation having a silyl group is used as at least some of organic cations in photoelectric conversion elements or solar cells in which a perovskite compound having organic cations, specific metallic cations, and anions is used as a light absorber, photoelectric conversion elements or solar cells having a photoelectric conversion efficiency that does not easily decrease even in highly humid environments can be obtained. The present invention has been completed by repeating studies on the basis of the above-described finding.
- That is, the above-described objects of the present invention have been achieved by the following means.
- [1] A photoelectric conversion element comprising: a first electrode having a photosensitive layer including a light absorber on a conductive support; and a second electrode facing the first electrode, in which the light absorber includes a compound having a perovskite-type crystal structure including organic cations, cations of a metallic atom other than elements belonging to Group I of the periodic table, and anions, and at least some of the organic cations constituting the compound are organic cations having a silyl group.
[2] The photoelectric conversion element according to [1], in which the organic cation having a silyl group is represented by Formula (1), -
R1 3Si-L-NR2 3 + Formula (1) - in the formula, R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group, R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group, and L represents a divalent linking group.
- [3] The photoelectric conversion element according to [2], in which R1 is an alkyl group, an aryl group, or a heteroaryl group.
[4] The photoelectric conversion element according to [2] or [3], in which L is a divalent linking group selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NRL— or a divalent linking group formed by combining two or more linking groups described above, and RL represents a hydrogen atom or an alkyl group.
[5] The photoelectric conversion element according to [4], in which L is an alkylene group, an arylene group, or a divalent linking group formed of a combination of an alkylene group and an arylene group.
[6] The photoelectric conversion element according to any one of [2] to [5], in which the organic cation having a silyl group represented by Formula (1) has an alkylene group in L, and L and NR2 3 + are linked to each other through the alkylene group.
[7] The photoelectric conversion element according to any one of [1] to [6], in which the compound having a perovskite-type crystal structure has organic cations not having a silyl group.
[8] The photoelectric conversion element according to [7], in which, in the compound having a perovskite-type crystal structure, a molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group satisfies the following expression, -
19≤[organic cations not having silyl group]/[organic cations having silyl group]≤499. - [9] The photoelectric conversion element according to [8], in which, in the compound having a perovskite-type crystal structure, the molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group satisfies the following expression,
-
49≤[organic cations not having silyl group]/[organic cations having silyl group]≤199. - [10] A solar cell using the photoelectric conversion element according to any one of [1] to [9].
[11] A composition comprising: a compound represented by Formula (1a); and a halogenated metal, -
R1 3Si-L-NR2 3Hal Formula (1a) - in the formula, R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group, R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group, L represents a divalent linking group, and Hal represents a halogen atom.
- [12] The composition according to [11] which is used to form a photosensitive layer in manufacturing of the photoelectric conversion element according to any one of [1] to [9].
- In the present specification, regarding individual chemical formulae, there are cases in which a part of the chemical formula is expressed as a rational formula for understanding of the chemical structures of perovskite compounds. Accordingly, in the individual chemical formulae, partial structures are called groups (substituents), ions, atoms, or the like; however, in the present specification, there are cases in which the partial structures will refer to element groups or elements constituting groups (substituents) or ions represented by the above-illustrated formulae in addition to groups (substituents), ions, atoms, or the like.
- In the present specification, the expression of compounds is used to indicate not only the compounds themselves but also salts or ions thereof. Furthermore, groups or compounds that are not clearly described as being substituted or unsubstituted refer to groups or compounds having an arbitrary substituent as long as desired effects are exhibited.
- In the present specification, when there are a plurality of substituents and the like expressed using a specific reference symbol or a plurality of substituents and the like are specified at the same time, the respective substituents and the like may be identical to or different from each other unless particularly otherwise described. What has been described above is also true for the specification regarding the number of substituents and the like. In addition, rings, for example, alicycles, aromatic rings, and hetero rings may be further fused together and thus form a fused ring.
- In addition, in the present specification, numerical ranges expressed using “to” include numerical values before and after the “to” as the lower limit value and the upper limit value.
- The photoelectric conversion element and the solar cell of the present invention are excellent in terms of moisture resistance while having a constitution in which a perovskite compound is provided as a light absorber. In addition, the composition of the present invention can be preferably used to form photosensitive layers in the manufacturing of the photoelectric conversion element of the present invention.
- The above-described and other characteristics and advantages of the present invention will be further clarified from the following description with appropriate reference to the accompanying drawings.
-
FIG. 1 is a cross sectional view schematically illustrating a preferred aspect of a photoelectric conversion element of the present invention. -
FIG. 2 is a cross sectional view schematically illustrating a preferred aspect of the photoelectric conversion element of the present invention including a thick photosensitive layer. -
FIG. 3 is a cross sectional view schematically illustrating another preferred aspect of the photoelectric conversion element of the present invention. -
FIG. 4 is a cross sectional view schematically illustrating still another preferred aspect of the photoelectric conversion element of the present invention. -
FIG. 5 is a cross sectional view schematically illustrating far still another preferred aspect of the photoelectric conversion element of the present invention. - A photoelectric conversion element of the present invention has a first electrode having a conductive support and a photosensitive layer including a light absorber and a second electrode facing the first electrode. Here, the first electrode and the second electrode facing each other refers to both of an aspect in which the first electrode and the second electrode are laminated in a state of being in contact with each other and an aspect in which the first electrode and the second electrode are laminated through another layer (that is, an aspect in which the first electrode and the second electrode are provided so as to face each other while the first electrode and the second electrode sandwich another layer).
- The photoelectric conversion element of the present invention preferably has a hole transport layer provided between the first electrode and the second electrode. The photosensitive layer and the second electrode are provided in this order on the conductive support. That is, in a case in which the photoelectric conversion element has the hole transport layer, the photosensitive layer, the hole transport layer, and the second electrode are preferably provided on the conductive support in this order.
- In addition, the hole transport layer may be provided between the conductive support and the photosensitive layer. In this case, the hole transport layer, the photosensitive layer, and the second electrode are provided on the conductive support in this order.
- The light absorber includes at least one perovskite compound described below. The light absorber may also include a light absorber other than the perovskite compound together with the perovskite compound. Examples of the light absorber other than the perovskite compound include metallic complex dyes and organic dyes.
- In the present invention, “the photosensitive layer being provided on the conductive support” means that the photosensitive layer is provided in contact with the surface of the conductive support or the photosensitive layer is provided above the surface of the conductive support through another layer.
- In the aspect in which the photosensitive layer is provided above the surface of the conductive support through another layer, examples of the layer provided between the conductive support and the photosensitive layer include a porous layer, a blocking layer, an electron transport layer, a hole transport layer, and the like.
- In the present invention, examples of the aspect in which the photosensitive layer is provided above the surface of the conductive support through another layer include an aspect in which the photosensitive layer is provided on the surface of a porous layer in a thin film shape or the like (refer to
FIG. 1 ), an aspect in which the photosensitive layer is provided to be thick on the surface of a porous layer (refer toFIG. 2 ), an aspect in which the photosensitive layer is provided to be thin on the surface of a blocking layer, an aspect in which the photosensitive layer is provided on the surface of a blocking layer in a thick film shape (refer toFIG. 3 ), an aspect in which the photosensitive layer is provided on the surface of an electron transport layer in a thin film shape or thick film shape (refer toFIG. 4 ), and an aspect in which the photosensitive layer is provided on the surface of a hole transport layer in a thin film shape or thick film shape (refer toFIG. 5 ). The photosensitive layer may be provided in a linear shape or in a dispersed pattern, but is preferably provided in a film shape. - There is no particular limitation regarding constitutions other than constitutions specified in the present invention for the photoelectric conversion element of the present invention, and well-known constitutions relating to photoelectric conversion elements and solar cells can be employed. Individual layers constituting the photoelectric conversion element of the present invention are designed according to their purposes and may be formed in, for example, a monolayer or multilayers.
- Hereinafter, preferred aspects of the photoelectric conversion element of the present invention will be described.
- In
FIGS. 1 to 5 , the same reference symbol indicates the same constituent element (member). - Meanwhile, in
FIGS. 1 and 2 , fine particles forming aporous layer 12 are illustrated in an enlarged manner. These fine particles are preferably jammed with each other (accumulated or in close contact with each other) in the horizontal direction and the vertical direction with respect to aconductive support 11 and thus form a porous structure. - In the present specification, in the case of being simply described, a “photoelectric conversion element 10” refers to
10A, 10B, 10C, 10D, and 10E unless particularly otherwise described. This is also true for aphotoelectric conversion elements system 100 and a first electrode 1. In addition, in the case of being simply described, a “photosensitive layer 13” refers to 13A, 13B, and 13C unless particularly otherwise described. Similarly, in the case of being described as a “hole transport layer 3”, the “hole transport layer 3” refers to holephotosensitive layers 3A and 3B unless particularly otherwise described.transport layers - Examples of the preferred aspects of the photoelectric conversion element of the present invention include the
photoelectric conversion element 10A illustrated inFIG. 1 . Asystem 100A illustrated inFIG. 1 is a system in which thephotoelectric conversion element 10A is applied as a cell that causes action means M (for example, an electric motor) to operate through anexternal circuit 6. - The
photoelectric conversion element 10A includes afirst electrode 1A, asecond electrode 2, and thehole transport layer 3A including a hole-transporting material described below between thefirst electrode 1A and thesecond electrode 2. - The
first electrode 1A includes theconductive support 11 made up of asupport 11 a and atransparent electrode 11 b, theporous layer 12, and thephotosensitive layer 13A on theporous layer 12. In addition, ablocking layer 14 is provided on thetransparent electrode 11 b, and theporous layer 12 is formed on theblocking layer 14. In thephotoelectric conversion element 10A including theporous layer 12 as described above, since the surface area of thephotosensitive layer 13A increases, it is assumed that the charge separation and charge transfer efficiency improves. - The
photoelectric conversion element 10B illustrated inFIG. 2 is a schematic illustration of a preferred aspect in which thephotosensitive layer 13A in thephotoelectric conversion element 10A illustrated inFIG. 1 is provided to be thick. In thisphotoelectric conversion element 10B, thehole transport layer 3B is provided to be thin. Thephotoelectric conversion element 10B is different from thephotoelectric conversion element 10A illustrated inFIG. 1 in terms of the film thicknesses of thephotosensitive layer 13B and thehole transport layer 3B, but is constituted in the same manner as thephotoelectric conversion element 10A except for the film thicknesses. - The photoelectric conversion element 10C illustrated in
FIG. 3 is a schematic illustration of another preferred aspect of the photoelectric conversion element of the present invention. The photoelectric conversion element 10C is different from thephotoelectric conversion element 10B illustrated inFIG. 2 in terms of theporous layer 12 not being provided, but is constituted in the same manner as thephotoelectric conversion element 10B except for what has been described above. That is, in the photoelectric conversion element 10C, thephotosensitive layer 13C is formed on the surface of theblocking layer 14 in a thick film shape. - The
photoelectric conversion element 10D illustrated inFIG. 4 is a schematic illustration of still another preferred aspect of the photoelectric conversion element of the present invention. Thephotoelectric conversion element 10D is different from the photoelectric conversion element 10C illustrated inFIG. 3 in terms of the provision of anelectron transport layer 15 instead of theblocking layer 14, but is constituted in the same manner as the photoelectric conversion element 10C except for what has been described above. Thefirst electrode 1D has theconductive support 11 and theelectron transport layer 15 and thephotosensitive layer 13C which are sequentially formed on theconductive support 11. Thisphotoelectric conversion element 10D is preferred since the respective layers can be formed using organic materials. Therefore, the productivity of the photoelectric conversion element improves, and furthermore, thickness reduction or flexibilization becomes possible. - The
photoelectric conversion element 10E illustrated inFIG. 5 is a schematic illustration of far still another preferred aspect of the photoelectric conversion element of the present invention. Asystem 100E including thephotoelectric conversion element 10E is, similar to thesystem 100A, a system that is applied as a cell. - The
photoelectric conversion element 10E has afirst electrode 1E, thesecond electrode 2, and theelectron transport layer 4 between thefirst electrode 1E and thesecond electrode 2. Thefirst electrode 1E has theconductive support 11 and thehole transport layer 16 and thephotosensitive layer 13C which are sequentially formed on theconductive support 11. Thisphotoelectric conversion element 10E is preferred since, similar to thephotoelectric conversion element 10D, the respective layers can be formed using organic materials. - In the present invention, the
system 100 to which the photoelectric conversion element 10 is applied functions as a solar cell in the following manner. - That is, in the
photoelectric conversion element 10A, light that has passed through theconductive support 11 or thesecond electrode 2 and has entered the photosensitive layer 13 excites a light absorber. The excited light absorber has high-energy electrons and is capable of emitting the electrons. The light absorber which has emitted high-energy electrons turns into an oxidant. - In the
photoelectric conversion elements 10A to 10D, electrons emitted from the light absorber migrate among the light absorber particles and reach theconductive support 11. At this time, the light absorber that has emitted electrons having a high energy turns into an oxidant. The electrons that have reached theconductive support 11 do their work in theexternal circuit 6 and then return to the photosensitive layer 13 through the second electrode 2 (in a case in which the hole transport layer 3 is provided, through the hole transport layer 3 in addition to the second electrode). The light absorber is reduced by the electrons which have returned to the photosensitive layer 13. - Meanwhile, in the
photoelectric conversion element 10E, electrons emitted from the light absorber reach thesecond electrode 2 from thephotosensitive layer 13C through theelectron transport layer 4, do their work in theexternal circuit 6, and then return to the photosensitive layer 13 through theconductive support 11. The light absorber is reduced by the electrons which have returned to the photosensitive layer 13. - In the photoelectric conversion element 10, the
system 100 functions as a solar cell by repeating the cycle of the above-described excitation of the light absorber and electron migration. - In the
photoelectric conversion elements 10A to 10D, the flow direction of electrons from the photosensitive layer 13 to theconductive support 11 varies depending on the presence or absence, kind, and the like of theporous layer 12. In the photoelectric conversion element 10 of the present invention, electron conduction in which electrons migrate among the light absorber particles occurs. Therefore, in a case in which theporous layer 12 is provided, theporous layer 12 can be formed of an insulating body other than semiconductors in the related art. In a case in which theporous layer 12 is formed of a semiconductor, electron conduction in which electrons migrate inside or among semiconductor fine particles in theporous layer 12 also occurs. On the other hand, in a case in which theporous layer 12 is formed of an insulating body, electron conduction does not occur in theporous layer 12. In a case in which theporous layer 12 is formed of an insulating body, in a case in which aluminum oxide (Al2O3) fine particles are used as insulating body fine particles, a relatively high electromotive force (Voc) is obtained. - Meanwhile, in a case in which the
blocking layer 14, like other layers, is formed of a conductor or a semiconductor as well, electron conduction occurs in theblocking layer 14. - In addition, electron conduction occurs even in the
electron transport layer 15. - The photoelectric conversion element and the solar cell of the present invention are not limited to the above-described preferred aspects, and the constitutions and the like of the respective aspects can be appropriately combined together within the scope of the gist of the present invention.
- In the present invention, materials and the respective members which are used in the photoelectric conversion element and the solar cell can be prepared using ordinary methods except for the light absorber. Regarding photoelectric conversion elements or solar cells in which the perovskite compound is used, it is possible to refer to, for example, Science, 2012, vol. 338, pp. 643 to 647. In addition, regarding dye sensitized solar cells, it is possible to refer to, for example, JP2001-291534A, the specification of U.S. Pat. No. 4,927,721A, the specification of U.S. Pat. No. 4,684,537A, the specification of U.S. Pat. No. 5,084,365A, the specification of U.S. Pat. No. 5,350,644A, the specification of U.S. Pat. No. 5,463,057A, the specification of U.S. Pat. No. 5,525,440A, JP1995-249790A (JP-H7-249790A), JP2004-220974A, and JP2008-135197A.
- Hereinafter, preferred aspects of the main members and compounds of the photoelectric conversion element and the solar cell of the present invention will be described.
- <First Electrode 1>
- The first electrode 1 includes the
conductive support 11 and the photosensitive layer 13 and functions as a working electrode in the photoelectric conversion element 10. - As illustrated in
FIGS. 1 to 5 , the first electrode 1 preferably includes theporous layer 12, theblocking layer 14, and at least one layer of theelectron transport layer 15 or thehole transport layer 16. - The first electrode 1 preferably includes at least the
blocking layer 14 in terms of short circuit prevention and more preferably includes theporous layer 12 and theblocking layer 14 in terms of light absorption efficiency and short circuit prevention. - In addition, the first electrode 1 preferably includes the
electron transport layer 15 or thehole transport layer 16 since the first electrode can be formed of an organic material. - —
Conductive Support 11— - The
conductive support 11 is not particularly limited as long as the conductive support is conductive and is capable of supporting the photosensitive layer 13 or the like. Theconductive support 11 preferably has a constitution in which the conductive support is formed of a conductive material, for example, metal or a constitution in which the glass orplastic support 11 a and thetransparent electrode 11 b formed on the surface of thesupport 11 a as a conductive film are provided. - Among these, the
conductive support 11 in which a film of thetransparent electrode 11 b is formed by applying a conductive metallic oxide onto the surface of the glass orplastic support 11 a as illustrated inFIGS. 1 to 5 is more preferred. Examples of thesupport 11 a formed of plastic include transparent polymer films described in Paragraph 0153 of JP2001-291534A. As a material used to form thesupport 11 a, it is possible to use, in addition to glass or plastic, ceramics (JP2005-135902A) or conductive resins (JP2001-160425A). The metallic oxide is preferably a tin oxide (TO) and particularly preferably an indium-tin oxide (a tin-doped indium oxide, ITO) or a fluorine-doped tin oxide such as a fluorine-doped tin oxide (FTO). At this time, the amount of the metallic oxide applied is preferably 0.1 to 100 g per square meter of the surface area of thesupport 11 a. In a case in which theconductive support 11 is used, light preferably enters the conductive support through thesupport 11 a side. - The
conductive support 11 is preferably substantially transparent. In the present invention, “being substantially transparent” means that the transmittance of light (having a wavelength of 300 to 1,200 nm) is 10% or higher, preferably 50% or higher, and particularly preferably 80% or higher. - The thicknesses of the
support 11 a and theconductive support 11 are not particularly limited and are set to appropriate thicknesses. For example, the thicknesses are preferably 0.01 μm to 10 mm, more preferably 0.1 μm to 5 mm, and particularly preferably 0.3 μm to 4 mm. - In a case in which the
transparent electrode 11 b is provided, the film thickness of thetransparent electrode 11 b is not particularly limited and is, for example, preferably 0.01 to 30 μm, more preferably 0.03 to 25 μm, and particularly preferably 0.05 to 20 μm. - The
conductive support 11 or thesupport 11 a may have a light management function on the surface. For example, theconductive support 11 or thesupport 11 a may have on the surface an antireflection film obtained by alternately laminating high-refractive index films and low-refractive index oxide films which is described in JP2003-123859A or may have a light guide function described in JP2002-260746A. - —Blocking
Layer 14— - In the present invention, as in the
photoelectric conversion elements 10A to 10C, theblocking layer 14 is preferably provided on the surface of thetransparent electrode 11 b, that is, between theconductive support 11 and theporous layer 12, the photosensitive layer 13, the hole transport layer 3, or the like. - In the photoelectric conversion element and the solar cell, for example, in a case in which the photosensitive layer 13 or the hole transport layer 3 and the
transparent electrode 11 b are electrically connected with each other, reverse currents are generated. Theblocking layer 14 performs a function of preventing these reverse currents. Theblocking layer 14 is also referred to as a short circuit prevention layer. - The blocking layer may also be provided in a case in which the photoelectric conversion element includes an electron transport layer. For example, in the case of the
photoelectric conversion element 10D, the blocking layer may be provided between theconductive support 11 and theelectron transport layer 15, and in the case of thephotoelectric conversion element 10E, the blocking layer may be provided between thesecond electrode 2 and theelectron transport layer 4. - A material used to form the
blocking layer 14 is not particularly limited as long as the material is capable of performing the above-described function, but is preferably a substance which transmits visible light and is insulating with respect to the conductive support 11 (thetransparent electrode 11 b). The “substance insulating with respect to the conductive support 11 (thetransparent electrode 11 b)” specifically refers to a compound having an energy level of the conduction band which is equal to or higher than the energy level of the conduction band of a material used to form the conductive support 11 (a metallic oxide used to form thetransparent electrode 11 b) and is lower than the energy level of the conduction band of a material constituting theporous layer 12 or the ground state of the light absorber (n-type semiconductor compound). - Examples of a material used to form the
blocking layer 14 include silicon oxide, magnesium oxide, aluminum oxide, calcium carbonate, polyvinyl alcohols, polyurethanes, and the like. In addition, the material may be a material that is ordinarily used as a photoelectric conversion material, and examples thereof include titanium oxide, tin oxide, niobium oxide, tungsten oxide, and the like. Among these, titanium oxide, tin oxide, magnesium oxide, aluminum oxide, and the like are preferred. - The film thickness of the
blocking layer 14 is preferably 0.001 to 10 μm, more preferably 0.005 to 1 μm, and particularly preferably 0.01 to 0.1 μm. - In the present invention, the film thicknesses of the respective layers can be measured by observing cross sections of the photoelectric conversion element 10 using a scanning electron microscope (SEM) or the like.
- —
Porous Layer 12— - In the present invention, as in the
10A and 10B, thephotoelectric conversion elements porous layer 12 is preferably provided on thetransparent electrode 11 b. In a case in which the photoelectric conversion element includes theblocking layer 14, theporous layer 12 is preferably formed on theblocking layer 14. - The
porous layer 12 is a layer that functions as a scaffold for carrying the photosensitive layer 13 on the surface. In solar cells, in order to increase the light absorption efficiency, it is preferable to increase the surface area of at least a portion receiving light such as sunlight, and it is preferable to increase the surface area of theporous layer 12 as a whole. - The
porous layer 12 is preferably a fine particle layer having pores which is formed of fine particles of a material used to form theporous layer 12 being accumulated or in close contact with each other. Theporous layer 12 may be a fine particle layer formed of two or more kinds of many fine particles being accumulated together. In a case in which theporous layer 12 is a fine particle layer having pores, it is possible to increase the amount of the light absorber carried (adsorption amount). - In order to increase the surface area of the
porous layer 12, it is preferable to increase the surface area of individual fine particles that constitute theporous layer 12. In the present invention, the surface area of fine particles used to form theporous layer 12 in a state in which the fine particles are applied onto theconductive support 11 and the like is preferably 10 or more times and more preferably 100 or more times the projected area. The upper limit thereof is not particularly limited, but is, generally, approximately 5,000 times. Regarding the particle diameters of the fine particles used to form theporous layer 12, the average particle diameter of the diameters of equivalent circles of the projected areas is preferably 0.001 to 1 μm for the primary particles. In a case in which theporous layer 12 is formed using a dispersion of the fine particles, the average particle diameter of the fine particles is preferably 0.01 to 100 μm in terms of the average particle diameter in the dispersion. - For the material used to form the
porous layer 12, there is no particular limitation regarding conductivity, and thus the material may be an insulating body (insulating material), a conductive material, or a semiconductor (semi-conductive material). - As the material used to form the
porous layer 12, it is possible to use, for example, chalcogenides (for example, oxides, sulfides, selenides, and the like) of metal, compounds having a perovskite-type crystal structure (except for light absorbers described below), oxides of silicon (for example, silicon dioxide and zeolite), or carbon nanotubes (including carbon nanowires, carbon nanorods, and the like). - The chalcogenides of metal are not particularly limited, and preferred examples thereof include individual oxides of titanium, tin, zinc, tungsten, zirconium, hafnium, strontium, indium, cerium, yttrium, lanthanum, vanadium, niobium, aluminum, or tantalum, cadmium sulfide, cadmium selenide, and the like. Examples of the crystal structure of the chalcogenides of metal include an anatase-type crystal structure, a brookite-type crystal structure, and a rutile-type crystal structure, and an anatase-type crystal structure and a brookite-type crystal structure are preferred.
- The compounds having a perovskite-type crystal structure are not particularly limited, and examples thereof include transition metal oxides and the like. Examples thereof include strontium titanate, calcium titanate, barium titanate, lead titanate, barium zirconate, barium stannate, lead zirconate, strontium zirconate, strontium tantalate, potassium niobate, bismuth ferrate, barium strontium titanate, lanthanum barium titanate, calcium titanate, sodium titanate, and bismuth titanate. Among these, strontium titanate, calcium titanate, and the like are preferred.
- The carbon nanotubes have a shape obtained by rolling a carbon film (graphene sheet) in a tubular shape. Carbon nanotubes are classified into single-walled carbon nanotubes (SWCNT) obtained by coiling one graphene sheet in a cylindrical shape, double-walled carbon nanotubes (DWCNT) obtained by coiling two graphene sheets in a concentric shape, and multi-walled carbon nanotubes (MWCNT) obtained by coiling multiple graphene sheets in a concentric shape. As the
porous layer 12, any carbon nanotubes can be used without any particular limitation. - Among these, the material used to form the
porous layer 12 is preferably an oxide of titanium, tin, zinc, zirconium, aluminum, or silicon or a carbon nanotube and more preferably titanium oxide or aluminum oxide. - The
porous layer 12 may be formed of at least one of the chalcogenide of metal, the compound having a perovskite-type crystal structure, the oxide of silicon, or the carbon nanotube or may be formed of a plurality thereof. - The film thickness of the
porous layer 12 is not particularly limited and is generally in a range of 0.1 to 100 μm, and, in the case of being used as a solar cell, the film thickness is preferably 0.1 to 50 μm and more preferably 0.2 to 30 μm. - —
Electron Transport Layer 15— - In the present invention, as in the
photoelectric conversion element 10D, theelectron transport layer 15 is preferably provided on the surface of thetransparent electrode 11 b. - The
electron transport layer 15 has a function of transporting electrons generated in the photosensitive layer 13 to theconductive support 11. Theelectron transport layer 15 is formed of an electron-transporting material capable of exhibiting the above-described function. The electron-transporting material is not particularly limited and is preferably an organic material (organic electron-transporting material). Examples of the organic electron-transporting material include fullerene compounds such as [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), perylene compounds such as perylene tetracarboxylic diimide (PTCDI), additionally, low-molecular-weight compounds such as tetracyanoquinodimethane (TCNQ), high-molecular-weight compounds, and the like. - The film thickness of the
electron transport layer 15 is not particularly limited and is preferably 0.001 to 10 μm and more preferably 0.01 to 1 μm. - —
Hole Transport Layer 16— - In the present invention, as in the
photoelectric conversion element 10E, thehole transport layer 16 is preferably provided on the surface of thetransparent electrode 11 b. - The
hole transport layer 16 is the same as the hole transport layer 3 described below except for the fact that the hole transport layer is formed at a different location. - —Photosensitive Layer (Light-Absorbing Layer) 13—
- In the photosensitive layer 13, a perovskite compound described below is preferably provided as a light absorber on the surface (including the inner surfaces in a case in which surfaces provided with the photosensitive layer 13 are uneven) of each of the porous layer 12 (in the
10A and 10B), the blocking layer 14 (in the photoelectric conversion element 10C), the electron transport layer 15 (in thephotoelectric conversion elements photoelectric conversion element 10D), and the hole transport layer 16 (in thephotoelectric conversion element 10E). - In the present invention, the light absorber needs to contain at least one perovskite compound described below and may contain two or more perovskite compounds.
- The photosensitive layer 13 may be a single layer or a laminate of two or more layers. In a case in which the photosensitive layer 13 is a laminate structure of two or more layers, the laminate structure may be a laminate of layers made of mutually different light absorbers or may have an interlayer including a hole-transporting material laminated between the photosensitive layer and the photosensitive layer.
- A form of the photosensitive layer 13 being present on the
conductive support 11 is as described above. The photosensitive layer 13 is preferably provided on the surface of each of the above-described layers so that excited electrons flow into theconductive support 11. At this time, the photosensitive layer 13 may be provided on the entire surface or on a part of the surface of the above-described layers. - The film thickness of the photosensitive layer 13 is appropriately set according to aspects of the photosensitive layer 13 provided on the
conductive support 11 and is not particularly limited. The film thickness of the photosensitive layer 13 (in a case in which theporous layer 12 is provided, the total film thickness including the film thickness of the porous layer 12) is, for example, preferably 0.1 to 100 μm, more preferably 0.1 to 50 μm, and particularly preferably 0.2 to 30 μm. - In the present invention, in a case in which the photosensitive layer is provided in a thick film shape (the
13B and 13C), the light absorber included in the photosensitive layer also functions as a hole-transporting material.photosensitive layers - [Light Absorber in Photosensitive Layer]
- The photosensitive layer 13 includes, as a light absorber, a perovskite compound having organic cations, cations of metallic atoms other than elements belonging to Group I of the periodic table, and anions.
- Some of the organic cations constituting the perovskite compound being used in the present invention are organic cations having a silyl group. When the perovskite compound has the organic cations having a silyl group in the crystal structure, it is possible to significantly enhance the moisture resistance of photoelectric conversion elements to be obtained. The reason thereof is not clear, but is assumed that the silyl group serves as a hydrophobic component and effectively develops a barrier action against moisture. The organic cation having a silyl group is preferably represented by Formula (1).
-
R1 3Si-L-NR2 3 + Formula (1) - In Formula (1), R1 represents a hydrogen atom or a group selected from an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, and an aliphatic heterocyclic group.
- Examples of the alkyl group that can be employed as R1 include linear alkyl groups and branched alkyl groups. The number of carbon atoms in the alkyl group is preferably 1 to 18, more preferably 1 to 6, and still more preferably 1 to 3. Specific examples of preferred alkyl groups include methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, pentyl, and hexyl.
- In Formula (1), two R1's which are linked to the Si atom and present adjacent to each other may be linked to each other and form a ring. In this case, the formed ring may have a hetero atom as a ring-constituting atom.
- In the cycloalkyl group that can be employed as R1, the number of carbon atoms is preferably 3 to 8. Specific examples of preferred cycloalkyl groups include cyclopropyl, cyclopentyl, and cyclohexyl.
- Examples of the alkenyl group that can be employed as R1 include linear alkenyl groups and branched alkenyl groups. The number of carbon atoms in the alkenyl group is preferably 2 to 18, more preferably 2 to 7, and still more preferably 2 to 5. Specific examples of preferred alkenyl groups include vinyl, allyl, butenyl, and hexenyl.
- Examples of the alkynyl group that can be employed as R1 include linear alkynyl groups and branched alkynyl groups. The number of carbon atoms in the alkynyl group is preferably 2 to 18, more preferably 2 to 7, and still more preferably 2 to 5. Specific examples of preferred alkynyl groups include ethynyl, butynyl, and hexynyl.
- Examples of the alkoxy group that can be employed as R1 include linear alkoxy groups and branched alkoxy groups. The alkyl portion in the alkoxy group is the same as the alkyl group that can be employed as R1 described above, and a preferred aspect is also identical.
- In the aryl group that can be employed as R1, the number of carbon atoms is preferably 6 to 14. Specific examples of preferred aryl groups include phenyl and naphthyl, and phenyl is more preferred.
- Examples of the heteroaryl group that can be employed as R1 include groups formed of an aromatic hetero ring alone and groups formed of a condensed hetero ring obtained by condensing another ring, for example, an aromatic ring, an aliphatic ring, or a hetero ring with the aromatic hetero ring.
- The ring-constituting hetero atom constituting the aromatic hetero ring is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. In addition, regarding the number of ring members of the aromatic hetero ring, five-membered rings or six-membered rings are preferred.
- Examples of the five-membered aromatic hetero ring and the condensed hetero ring including the five-membered aromatic hetero ring include a pyrrole ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a furan ring, a thiophene ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, an indoline ring, and an indazole ring. In addition, examples of the six-membered aromatic hetero ring and the condensed hetero ring including the six-membered aromatic hetero ring include a pyridine ring, a pyrimidine ring, a pyrazine ring, a triazine ring, a quinoline ring, and a quinazoline ring.
- In the aliphatic heterocyclic group that can be employed as R1, the number of carbon atoms is preferably 0 to 24 and more preferably 1 to 18. Specific examples of preferred aliphatic hetero rings of the aliphatic heterocyclic group include a pyrrolidine ring, an oxolane ring, a thiolane ring, a piperidine ring, an oxane ring, a thiane ring, a piperazine ring, a morpholine ring, a quinuclidine ring, an azetidine ring, an oxetane ring, an aziridine ring, a dioxane ring, a pentamethylene sulfide ring, and the like.
- R1 may further have a substituent, and examples of the substituent include the above-described substituent that can be employed as R1. In addition, the substituent that R1 may have is also preferably -L-NR2 3 + in Formula (1).
- R1 is preferably an alkyl group, an aryl group, or a heteroaryl group and more preferably an alkyl group from the viewpoint of more effectively developing the barrier action against moisture.
- In Formula (1), R2 represents a hydrogen atom or a group selected from an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, and an aliphatic heterocyclic group.
- The alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, the heteroaryl group, and the aliphatic heterocyclic group that can be employed as R2 are respectively the same as the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, the heteroaryl group, and the aliphatic heterocyclic group that can be employed as R1, and preferred aspects thereof are also identical. Two R2's which are linked to the N atom and present adjacent to each other may be linked to each other and form a ring. In this case, the formed ring may have a hetero atom as a ring-constituting atom.
- R2 is preferably a hydrogen atom or an alkyl group and more preferably a hydrogen atom.
- In Formula (1), L is a divalent linking group. L is preferably a divalent linking group selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NRL— or a divalent linking group formed of a combination of divalent linking groups selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NRL—. RL is a hydrogen atom or an alkyl group, this alkyl group is the same as the above-described alkyl group that can be employed as R1, and a preferred aspect thereof is also identical.
- Examples of the alkylene group that can be employed as L or a part of L include linear alkylene groups and branched alkylene groups. The number of carbon atoms in the alkylene group is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, still more preferably 1 to 5, and still more preferably 1 to 3. Specific examples of preferred alkylene groups include methylene, ethylene, propylene, butylene, pentylene, and hexylene.
- In the cycloalkylene group that can be employed as L or a part of L, the number of carbon atoms is preferably 3 to 8. Specific examples of preferred cycloalkylene groups include cyclopropylene, cyclpentylene, and cyclohexylene.
- Examples of the alkenylene group that can be employed as L or a part of L include linear alkenylene groups and branched alkenylene groups. The number of carbon atoms in the alkenylene group is preferably 2 to 20, more preferably 2 to 15, still more preferably 2 to 10, still more preferably 2 to 5, and still more preferably 2 or 3.
- Examples of the alkynylene group that can be employed as L or a part of L include linear alkynylene groups and branched alkynylene groups. The number of carbon atoms in the alkynylene group is preferably 2 to 20, more preferably 2 to 15, still more preferably 2 to 10, far still more preferably 2 to 5, and particularly preferably 2 to 4.
- The number of carbon atoms in the arylene group that can be employed as L or a part of L is preferably 6 to 14. The arylene group is preferably phenylene or naphthylene and more preferably phenylene.
- In the heteroarylene group that can be employed as L or a part of L, the number of carbon atoms is preferably 0 to 24 and more preferably 1 to 18. Rings constituting the heteroarylene group are preferably condensed hetero rings including a five-membered aromatic hetero ring or a five-membered aromatic hetero ring or condensed hetero rings including a six-membered aromatic hetero ring or a six-membered aromatic hetero ring. Preferred examples of the five-membered aromatic hetero ring, the condensed hetero rings including the five-membered aromatic hetero ring, the six-membered aromatic hetero ring, and the condensed hetero rings including the six-membered aromatic hetero ring are the same as the preferred aspects of the condensed hetero rings including the five-membered aromatic hetero ring, the condensed hetero rings including the five-membered aromatic hetero ring, the six-membered aromatic hetero ring, and the condensed hetero rings including the six-membered aromatic hetero ring described in the section of the above-described heteroaryl group that can be employed as R1.
- Among these, L is preferably an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, or a divalent linking group formed of a combination of two or more (preferably two) groups selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, and a heteroarylene group. L is more preferably an alkylene group, an arylene group, or a divalent linking group formed of a combination of an alkylene group and an arylene group.
- In a case in which the organic cation having a silyl group represented by Formula (1) has an alkylene group in L, L and NR2 3 + are preferably linked to each other through the alkylene group. That is, in a case in which the organic cation having a silyl group represented by Formula (1) has an alkylene group in L, the organic cation is preferably represented by R1 3Si-L1- L2-NR2 3 +. Here, L1 represents a divalent linking group selected from a single bond, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NRL—, and L2 represents an alkylene group. R1, R2, and RL are respectively the same as R1, R2, and RL described above, and preferred aspects thereof are also identical. In addition, a preferred aspect of the alkylene group L2 is the same as the above-described preferred aspect of the alkylene group that can be employed as L.
- The organic cation having a silyl group is also preferably an organic cation represented by Formula (RI) in addition to the organic cation represented by Formula (1).
- In Formula (RI), R1 and R2 each are the same as R1 and R2 in Formula (1), and preferred aspects thereof are also identical.
- Hereinafter, specific examples of the organic cation having a silyl group which the perovskite compound being used in the present invention may have will be described, but the present invention is not limited thereto. In the present specification, in structural formulae, “Bu” represents butyl, and “Me” represents methyl.
- The organic cation constituting the perovskite compound being used in the present invention preferably includes an organic cation not having a silyl group in addition to the organic cation having a silyl group. The organic cation not having a silyl group is preferably an organic cation represented by Formula (2).
-
RA—NH3 + Formula (2) - In Formula (2), RA is preferably an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or a group that can be represented by Formula (3). Among these, an alkyl group and the group that can be represented by Formula (3) are more preferred, and an alkyl group is still more preferred.
- The alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group that can be employed by RA are the same as the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group that can be respectively employed by R1 in Formula (1) respectively, and preferred groups are also identical thereto.
- In the formula, Xa represents NR1c, an oxygen atom, or a sulfur atom. R1b and R1c each independently represent a hydrogen atom or a substituent. * represents a bonding location with an N atom in Formula (2).
- In the present invention, in a case in which the organic cation not having a silyl group is an organic ammonium cation formed by bonding RA and NH3 + in Formula (2), the organic ammonium cation may have a resonance structure. For example, in a case in which Xa in the group that can be represented by Formula (3) is NH (R1c is a hydrogen atom), examples of the organic cation include not only organic ammonium cations formed by bonding the group that can be represented by Formula (3) and NH3 + but also organic amidinium cations which are one of the resonance structures of the organic ammonium cation. Examples of the organic amidinium cations include cations represented by Formula (Aam). Meanwhile, in the present specification, there are cases in which the cations represented by Formula (Aam) are expressed as “R1bC(═NH)—NH3” for convenience.
- In the group that can be represented by Formula (3), Xa represents NR1c, an oxygen atom, or a sulfur atom and is preferably NR1c. Here, R1c represents a hydrogen atom or substituent and is preferably a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group and more preferably a hydrogen atom.
- R1b represents a hydrogen atom or a substituent and is preferably a hydrogen atom. Examples of a substituent that can be employed by R1b include an amino group, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, and a heteroaryl group.
- An alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, and a heteroaryl group that can be respectively employed by R1b and R1c are the same as the alkyl group, the cycloalkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group that can be respectively employed by R1 in Formula (1) respectively, and preferred groups are also identical thereto.
- Examples of the group that can be represented by Formula (3) include a (thio)acyl group, a (thio)carbamoyl group, an imidoyl group, and an amidino group.
- Examples of the (thio)acyl group include an acyl group and a thioacyl group. The acyl group is preferably an acyl group having a total of 1 to 7 carbon atoms, and examples thereof include formyl, acetyl (CH3C(═O)—), propionyl, hexanoyl, and the like. The thioacyl group is preferably a thioacyl group having a total of 1 to 7 carbon atoms, and examples thereof include thioformyl, thioacetyl (CH3C(═S)—), thiopropionyl, and the like.
- Examples of the (thio)carbamoyl group include a carbamoyl group (H2NC(═O)—) and thiocarbamoyl group (H2NC(═S)—).
- The imidoyl group is a group represented by R1b—C(═NR1c)—, R1b and R1c each are preferably a hydrogen atom or an alkyl group, and the alkyl group is more preferably the same as the alkyl group as R1. Examples thereof include formimidoyl (HC(═NH)—), acetoimidoyl (CH3C(═NH)—), propionimidoyl (CH3CH2C(═NH)—), and the like. Among these, formimidoyl is preferred.
- The amidino group as the group that can be represented by Formula (3) has a structure in which R1b of the imidoyl group is an amino group and R1c is a hydrogen atom (—C(═NH)NH2).
- In the crystal structure of the perovskite compound being used in the present invention, the molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group preferably satisfies Numerical Expression (i), more preferably satisfies Numerical Expression (ii), and still more preferably satisfies Numerical Expression (iii).
-
4≤[organic cations not having silyl group]/[organic cations having silyl group]≤999 Numerical Expression (i) -
19≤[organic cations not having silyl group]/[organic cations having silyl group]≤499 Numerical Expression (ii) -
49≤[organic cations not having silyl group]/[organic cations having silyl group]≤199 Numerical Expression (iii) - When the molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group satisfies the above-described expression, it is possible to further enhance the moisture resistance of photoelectric conversion elements.
- The perovskite compound being used in the present invention has cations of metallic atoms other than elements belonging to Group I of the periodic table in the crystal structure. Examples of the metallic atoms other than elements belonging to Group I of the periodic table include metallic atoms such as calcium (Ca), strontium (Sr), cadmium (Cd), copper (Cu), nickel (Ni), manganese (Mn), iron (Fe), cobalt (Co), palladium (Pd), germanium (Ge), tin (Sn), lead (Pb), ytterbium (Yb), europium (Eu), indium (In), titanium (Ti), and bismuth (Bi), among these, at least one selected from the group consisting of a Pb atom, a Cu atom, a Ge atom, and a Sn atom is more preferred, a Pb atom or a Sn atom is still more preferred, and a Pb atom is particularly preferred. The perovskite compound being used in the present invention may have one or two or more kinds of cations of metallic atoms other than elements belonging to Group I of the periodic table in the crystal structure. In the case of having two or more kinds of cations of metallic atoms other than elements belonging to Group I of the periodic table, the perovskite compound preferably has a Pb atom and a Sn atom. In a case in which the perovskite compound has two or more kinds of cations of metallic atoms other than elements belonging to Group I of the periodic table, the presence fractions of two or more kinds of these cations are not particularly limited.
- Anions constituting the perovskite compound being used in the present invention may be monoatomic anions or polyatomic anions. Examples of the monoatomic anions include anions of halogen atoms. In addition, preferred examples of the polyatomic anions include NCS−, NCO−, HO−, NO3 −, and COO−. Among these, the anions constituting the perovskite compound are preferably anions of halogen atoms. Examples of the halogen atoms include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a bromine atom or an iodine atom is preferred.
- The anions constituting the perovskite compound being used in the present invention may be one kind of anions or two or more kinds of anions. In a case in which the anions constituting the perovskite compound is one kind of anions, anions of an iodine atom are preferred. In addition, in a case in which the anions constituting the perovskite compound are two kinds of anions, aspects having anions of two or more kinds of halogen atoms is preferred, and, among these, an aspect having two kinds of anions of a chlorine atom and anions of an iodine atom is more preferred. In a case in which the perovskite compound has two or more kinds of anions, the proportions thereof are not particularly limited.
- The perovskite compound being used in the present invention may have cations of elements belonging to Group I of the periodic table in the structure. The cations of elements belonging to Group I of the periodic table are preferably a lithium ion (Li+), a sodium ion (Na+), a potassium ion (K+), and a cesium ion (Cs+), and, among these, Cs+ is more preferred.
- The perovskite compound that is used in the present invention has a perovskite-type crystal structure having the respective constituent ions described above. The perovskite compound that is used in the present invention is preferably a perovskite compound represented by Formula (I).
-
AaMmXx Formula (I) - In the formula, A represents an element in Group I of the periodic table or a cationic organic group. M represents a metallic atom that is not an element in Group I of the periodic table. X represents an anionic atom or anionic atomic group.
- a represents 1 or 2, m represents 1, and a, m, and x satisfy a+2m=x.
- In the present specification, the cationic organic group refers to an organic group being present as a cation in the perovskite-type crystal structure, the anionic atom refers to an atom being present as a monoatomic anion in the perovskite-type crystal structure, and the anionic atomic group refers to an atomic group being present as a polyatomic anion in the perovskite-type crystal structure.
- In Formula (I), an element A belonging to Group I of the periodic table is present as a cation in the perovskite-type crystal structure.
- In Formula (I), a cationic organic group A is present as the above-described organic cation in the perovskite-type crystal structure.
- In Formula (I), a metallic atom M is present in the perovskite-type crystal structure as the above-described cation of a metallic atom other than elements belonging to Group I of the periodic table.
- In Formula (I), an anionic atom X is present as the above-described monoatomic anion in the perovskite-type crystal structure.
- In Formula (I), an anionic atom group X is present as the above-described polyatomic anion in the perovskite-type crystal structure.
- In the perovskite compound represented by Formula (I), at least a part of A is a cationic organic group having a silyl group.
- The perovskite compound being used in the present invention may also be a mixture of a perovskite compound represented by Formula (I) in which a is 1 and a perovskite compound represented by Formula (I) in which a is 2.
- The perovskite compound can be synthesized from MX2 and AX. For example, the perovskite compound can be synthesized with reference to Science, 2012, vol. 338, pp. 643 to 647. In addition, the perovskite compound can be synthesized with appropriate reference to Akihiro Kojima, Kenjiro Teshima, Yasuo Shirai, and Tsutomu Miyasaka, “Organometal Halide Perovskites as Visible-Light Sensitizers for Photovoltaic Cells”, J. Am. Chem. Soc., 2009, 131 (17), pp. 6050 and 6051.
- In the perovskite compound being used in the present invention, the proportion of the total molar quantity of the organic cation represented by Formula (1), the organic cation represented by Formula (RI), the organic cation represented by Formula (2), and the cations of metallic atoms other than elements belonging to Group I of the periodic table in the total molar quantity of the cations constituting the perovskite compound is preferably 90 to 100% by mol and more preferably 95 to 100% by mol. In addition, in the perovskite compound being used in the present invention, the proportion of the total molar quantity of the anions of the halogen atoms in the total molar quantity of the anions constituting the perovskite compound is preferably 90 to 100% by mol, more preferably 95 to 100% by mol, and still more preferably 98 to 100% by mol.
- The amount of the light absorber used needs to be an amount at which, out of the surface of the
porous layer 12 or theblocking layer 14, at least some of the surface on which light is incident is covered and is preferably an amount at which the surface is fully covered. - The content of the perovskite compound in the photosensitive layer 13 is generally 1 to 100% by mass.
- <Hole Transport Layer 3>
- The photoelectric conversion element of the present invention preferably has the hole transport layer 3 between the first electrode and the second electrode.
- The hole transport layer 3 has a function of supplementing electrons to oxidants of the light absorber and is preferably a solid-form layer. The hole transport layer 3 is preferably provided between the photosensitive layer 13 in the first electrode 1 and the
second electrode 2. - A hole-transporting material that forms the hole transport layer 3 is not particularly limited, and examples thereof include inorganic materials such as CuI and CuNCS, organic hole-transporting materials described in Paragraphs 0209 to 0212 of JP2001-291534A, and the like. Preferred examples of the organic hole-transporting material include conductive polymers such as polythiophene, polyaniline, polypyrrole, and polysilane, spiro compounds in which two rings share a central atom having a tetrahedral structure such as C or Si, aromatic amine compounds such as triarylamine, triphenylene compounds, nitrogen-containing heterocyclic compounds, and liquid-crystalline cyano compounds.
- The hole-transporting material is preferably an organic hole-transporting material which can be applied in a solution and turns into solid, and examples thereof include 2,2′,7,7′-tetrakis-(N,N-di-p-methoxyphenylamine)-9,9-spirobifluorene (also referred to as Spiro-OMeTAD), poly(3-hexylthiophene-2,5-diyl), 4-(diethylamino)benzoaldehyde, diphenylhydrazone, polyethylene dioxythiophene (PEDOT), and the like.
- The film thickness of the hole transport layer 3 is not particularly limited, but is preferably 50 μm or less, more preferably 1 nm to 10 μm, still more preferably 5 nm to 5 μm, and particularly preferably 10 nm to 1 μm.
- In the present invention, in a case in which the
porous layer 12 is included, the total film thickness of theporous layer 12, the photosensitive layer 13, and the hole transport layer 3 is not particularly limited, but is, for example, preferably 0.1 to 200 μm, more preferably 0.1 to 50 μm, and still more preferably 0.2 to 5 μm. - <
Electron Transport Layer 4> - In the present invention, as the
photoelectric conversion element 10E, theelectron transport layer 4 is preferably provided between thephotosensitive layer 13C and thesecond electrode 2. - The
electron transport layer 4 is the same as theelectron transport layer 15 except for the fact that electrons are transferred to the second electrode and the electron transport layer is formed at a different location. - <
Second Electrode 2> - The
second electrode 2 functions as a positive electrode in solar cells. Thesecond electrode 2 is not particularly limited as long as the second electrode is conductive and, generally, can be provided with the same constitution as that of theconductive support 11. In a case in which a sufficient strength is maintained, thesupport 11 a is not essentially required. - The structure of the
second electrode 2 is preferably a structure having a strong power-collection effect. In order to allow light to reach the photosensitive layer 13, at least one of theconductive support 11 or thesecond electrode 2 needs to be substantially transparent. In the solar cell of the present invention, it is preferable that theconductive support 11 is transparent and sunlight enters the solar cell through thesupport 11 a side. In this case, thesecond electrode 2 more preferably has a property of reflecting light. - Examples a material used to form the
second electrode 2 include metal such as platinum (Pt), gold (Au), nickel (Ni), copper (Cu), silver (Ag), indium (In), ruthenium (Ru), palladium (Pd), rhodium (Rh), iridium (Jr), osmium (Os), and aluminum (Al), the above-described conductive metallic oxides, carbon materials, conductive polymers, and the like. The carbon materials need to be conductive materials formed of carbon atoms bonded together, and examples thereof include fullerene, carbon nanotubes, graphite, graphene, carbon black, and the like. - The
second electrode 2 is preferably a thin film (including a thin film obtained by means of vapor deposition) of metal or a conductive metallic oxide or a glass or plastic substrate having this thin film. The glass or plastic substrate is preferably a glass substrate having a gold or platinum thin film or a glass substrate on which platinum is vapor-deposited. - The film thickness of the
second electrode 2 is not particularly limited, but is preferably 0.01 to 100 μm, more preferably 0.01 to 10 μm, and particularly preferably 0.01 to 1 μm. - <Other Constitutions>
- In the present invention, in order to prevent the first electrode 1 and the
second electrode 2 from coming into contact with each other, a spacer or a separator can also be used instead of theblocking layer 14 and the like or together with theblocking layer 14 and the like. - In addition, a hole-blocking layer may be provided between the
second electrode 2 and the hole transport layer 3. - «Solar Cell»
- The solar cell of the present invention is constituted using the photoelectric conversion element of the present invention. For example, as illustrated in
FIGS. 1 to 5 , the photoelectric conversion element 10 constituted by providing theexternal circuit 6 can be used as a solar cell. As the external circuit which comes into contact with the first electrode 1 (the conductive support 11) and thesecond electrode 2, a well-known circuit can be used without any particular limitation. - In order to prevent the deterioration, evaporation, and the like of constituent substances, the solar cell of the present invention preferably has a side surface that is sealed with a polymer, an adhesive, or the like.
- «Method for Manufacturing Photoelectric Conversion Element and Solar Cell»
- The photoelectric conversion element and the solar cell of the present invention can be manufactured according to well-known manufacturing methods, for example, the methods described in Science, 2012, vol. 338, pp. 643 to 647.
- Hereinafter, a method for manufacturing a photoelectric conversion element and a solar cell of the present invention will be briefly described.
- The
blocking layer 14, theporous layer 12, and at least one of theelectron transport layer 15 or thehole transport layer 16 is formed on the surface of theconductive support 11 as desired. - The
blocking layer 14 can be formed by, for example, applying a dispersion including the above-described insulating substance, a precursor compound thereof, or the like onto the surface of theconductive support 11 and firing the dispersion or thermally decomposing the dispersion by means of spraying. - A material used to form the
porous layer 12 is preferably used in a fine particle form and more preferably used in a form of fine particles in a dispersion. - A method for forming the
porous layer 12 is not particularly limited, and examples thereof include wet-type methods, dry-type methods, and other methods (for example, methods described in Chemical Review, Vol. 110, p. 6595 (published on 2010)). In these methods, it is preferable to apply the dispersion (paste) onto the surface of theconductive support 11 or the surface of theblocking layer 14 and then fire the dispersion at atemperature 100° C. to 800° C. for ten minutes to ten hours. In such a case, it is possible to bring the fine particles into close contact with each other. - In a case in which firing is performed multiple times, the temperature of firing that is not the final firing (the non-final firing temperature) is preferably set to be lower than the temperature of the final firing (the final firing temperature). For example, in a case in which titanium oxide paste is used, the non-final firing temperature can be set in a range of 50° C. to 300° C. In addition, the final firing temperature can be set to be higher than the non-firing firing temperature in a range of 100° C. to 600° C. In a case in which a glass support is used as the
support 11 a, the firing temperature is preferably 60° C. to 500° C. - The amount of a porous material applied to form the
porous layer 12 is appropriately set depending on the film thickness of theporous layer 12, the number of times of coating, and the like and is not particularly limited. The amount of the porous material applied to square meter of the surface area of theconductive support 11 is, for example, preferably 0.5 to 500 g and more preferably 5 to 100 g. - In a case in which the
electron transport layer 15 or thehole transport layer 16 is provided, the layer can be formed in the same manner as the hole transport layer 3 or theelectron transport layer 4 described below. - Next, the photosensitive layer 13 is provided.
- A method for providing the photosensitive layer 13 is not particularly limited, and examples thereof include wet-type methods and dry-type methods. In the present invention, wet-type methods are preferred, and, for example, a method in which the surface is brought into contact with a light absorber solution including the absorber is preferred. In this method, first, the light absorber solution for forming the photosensitive layer 13 is prepared. The light absorber solution includes MX2 and AX which are raw materials of the perovskite compound. Here, A, M, and X are the same as A, M, and X in Formula (I). In this light absorber solution, the molar ratio between MX2 and AX is appropriately adjusted depending on the purpose. In a case in which a perovskite compound is formed as the light absorber, the molar ratio between MX2 and AX is preferably 1:1 to 10:1. The light absorber solution can be prepared by mixing AX and MX2 in a predetermined molar ratio and then, preferably, heating the components. This forming liquid is generally a solution, but may be a suspension. Heating conditions are not particularly limited, but the heating temperature is preferably 30° C. to 200° C. and more preferably 60° C. to 150° C. The heating duration is preferably 0.5 to 100 hours and more preferably 1 to 3 hours. As a solvent or a dispersion medium, substances described below can be used.
- Next, the prepared light absorber solution is brought into contact with the surface of a layer forming the photosensitive layer 13 on the surface thereof (in the photoelectric conversion element 10, any layer of the
porous layer 12, theblocking layer 14, theelectron transport layer 15, or the hole transport layer 16). Specifically, it is preferable to apply the light absorber solution onto the surface or immerse the surface in the forming liquid. Therefore, a perovskite compound is formed on the surface of theporous layer 12, theblocking layer 14, theelectron transport layer 15, or thehole transport layer 16. The temperature at which the forming liquid is brought into contact with the surface is preferably 5° C. to 100° C., and the immersion duration is preferably 5 seconds to 24 hours and more preferably 20 seconds to 1 hour. In a case in which the applied light absorber solution is dried, the forming liquid is preferably dried using heat and is generally dried by being generally heated at 20° C. to 300° C. and being preferably heated at 50° C. to 170° C. - In addition, it is also possible to for the photosensitive layer according to a method for synthesizing the above-described perovskite compound.
- Furthermore, examples thereof also include a method in which an AX solution including the AX and an MX2 solution including the MX2 are separately applied (including the immersion method) and are dried as necessary. In this method, any solution may be applied in advance, but the MX2 solution is preferably applied in advance. In this method, the molar ratio between AX and MX2, coating conditions, and drying conditions are the same as those in the above-described method. In this method, instead of applying the AX solution and the MX2 solution, it is also possible to vapor-deposit AX or MX2.
- Furthermore, as another method, it is possible to use a dry-type method such as vapor deposition in a vacuum in which a compound or a mixture obtained by removing the solvent from the light absorber solution is used. For example, it is possible to use a method in which the AX and the MX2 are simultaneously or sequentially vapor-deposited.
- Therefore, the light absorber is formed and turns into the photosensitive layer 13.
- On the photosensitive layer 13 provided as described above, preferably, the hole transport layer 3 or the
electron transport layer 4 is formed. - The hole transport layer 3 can be formed by applying and drying a hole-transporting material solution including a hole-transporting material. In the hole-transporting material solution, the concentration of the hole-transporting material is preferably 0.01 to 1.0 M (mol/L) since coatability is excellent and, in a case in which the
porous layer 12 is provided and pores are present, the hole-transporting material is capable of easily intruding into the inside of pores in theporous layer 12. - The
electron transport layer 4 can be formed by applying and drying an electron-transporting material solution including an electron-transporting material. - After the hole transport layer 3 or the
electron transport layer 4 is formed, thesecond electrode 2 is formed, thereby manufacturing the photoelectric conversion element and the solar cell. - The film thicknesses of the respective layers can be adjusted by appropriately changing the concentrations of the respective dispersion liquids or solutions and the number of times of coating. For example, in a case in which the
13B and 13C having a thick film thickness are provided, the light absorber solution may be applied and dried multiple times.photosensitive layers - The respective dispersion liquids and solutions described above may respectively include additives such as a dispersion aid and a surfactant.
- Examples of the solvent or dispersion medium that is used in the method for manufacturing the photoelectric conversion element and the solar cell include solvents described in JP2001-291534A, but the solvent or dispersion medium is not limited thereto. In the present invention, organic solvents are preferred, and alcohol solvents, amide solvents, nitrile solvents, hydrocarbon solvents, lactone solvents, halogen solvents, sulfide solvents, and solvent mixtures of two or more thereof are preferred. The solvent mixture is preferably a solvent mixture of an alcohol solvent and a solvent selected from amide solvents, nitrile solvents, and hydrocarbon solvents. Specifically, methanol, ethanol, isopropanol, γ-butyrolactone, chlorobenzene, acetonitrile, dimethylformamide (DMF) or dimethylacetamide, or a solvent mixture thereof is preferred.
- A method for applying the solutions or dispersants used to form the respective layers is not particularly limited, and it is possible to use a well-known coating method such as spin coating, extrusion die coating, blade coating, bar coating, screen printing, stencil printing, roll coating, curtain coating, spray coating, dip coating, an inkjet printing method, or an immersion method. Among these, spin coating, screen printing, an immersion method, and the like are preferred.
- The photoelectric conversion element produced as described above can be used as a solar cell by connecting the
external circuit 6 to the first electrode 1 and thesecond electrode 2. - «Composition»
- A composition of the present invention includes a compound represented by Formula (1a) and a halogenated metal.
-
R1 3Si-L-NR2 3Hal Formula (1a) - In the formula, R1, R2, and L are the same as R1, R2, and L in Formula (1) respectively, and preferred aspects thereof are also identical. Hal represents a halogen atom (preferably an iodine atom, a chlorine atom, or a bromine atom).
- The composition of the present invention may include one or more compounds represented by Formula (1a).
- Examples of the halogenated metal included in the composition of the present invention include halides of the above-described metallic atoms M other than elements belonging to Group I of the periodic table which the perovskite compound being used in the present invention has (that is, compounds represented by M(Hal)2; Hal represents a halogen atom), at least one selected from halides of Pb and halides of Sn is more preferred, at least one selected from iodides or chlorides of Pb and iodides or chlorides of Sn is still more preferred, and at least one selected from PbI2 and SnI2 is particularly preferred.
- The composition of the present invention may be a solid (powder, granule, or the like) or a solution. In a case in which the composition of the present invention is a solution, an organic solvent is preferably used as the medium. The organic solvent is not particularly limited, and examples thereof include alcohol solvents, amide solvents, nitrile solvents, hydrocarbon solvents, lactone solvents, halogen solvents, and solvent mixtures of two or more solvents described above. The organic solvent that the composition of the present invention may have is more preferably methanol, ethanol, isopropanol, γ-butyrolactone, chlorobenzene, acetonitrile, DMF, dimethylacetamide, dimethyl sulfoxide, or a solvent mixture thereof.
- The composition of the present invention may further have additional components other than the compound represented by Formula (1a) and the halogenated metal. As the additional components, the composition of the present invention preferably includes at least one compound represented by RA—NH3Hal (RA is the same as RA in Formula (2), and a preferred aspect thereof is also identical; Hal represents a halogen atom and is preferably an iodine atom, a chlorine atom, or a bromine atom). RA—NH3Hal is more preferably CH3NH3Hal or CH3CH2NH3Hal.
- In the composition of the present invention, the molar ratio of the content a of the compound represented by Formula (Ia) to the content b of the halogenated metal is preferably 0.001≤a/b≤10, more preferably 0.01≤a/b≤10, and still more preferably 0.01≤a/b≤3.
- In addition, in a case in which the composition of the present invention includes RA—NH3Hal, in the composition of the present invention, the molar ratio of the content c of RA—NH3Hal to the content a of the compound represented by Formula (1a) is preferably 4≤c/a≤999, more preferably 19≤c/a≤499, and particularly preferably 49≤c/a≤199.
- In addition, in a case in which the composition of the present invention includes the compound represented by Formula (Ia) and RA—NH3Hal, in the composition of the present invention, the molar ratio of the total of the content a of the compound represented by Formula (1a) and the content c of RA—NH3Hal to the content b of the halogenated metal is preferably 1≤(a+c)/b≤10 and more preferably 1≤(a+c)/b≤5.
- In addition, the composition of the present invention may also include a halide of an element belonging to Group I of the periodic table as the additional component.
- The composition of the present invention can be preferably used as supply sources of MX2 and AX described above in the formation of the photosensitive layer of the photoelectric conversion element of the present invention. In a case in which the composition of the present invention is powder, granules, or the like, the composition of the present invention can be used as the above-described light absorber solution after being dissolved in a solvent so as to prepare a solution having an appropriate concentration and carrying out filtration, purification, and the like as necessary. In addition, in a case in which the composition of the present invention is a solution, the composition can be used as the above-described light absorber solution as it is or after being condensed, diluted, filtered, purified, or the like.
- That is, the composition of the present invention can be preferably used to form the photosensitive layer in the manufacturing of the photoelectric conversion element of the present invention.
- Hereinafter, the present invention will be described in more detail on the basis of examples, but the present invention is not limited thereto.
- [Manufacturing of Photoelectric Conversion Element (Specimen No. 101)]
- The
photoelectric conversion element 10A illustrated inFIG. 1 was manufactured in an order described below. Meanwhile, in a case in which the film thickness of the photosensitive layer 13 is large, the photoelectric conversion element corresponds to thephotoelectric conversion element 10B illustrated inFIG. 2 . - <Production of
Conductive Support 11> - A fluorine-doped SnO2 conductive film (the
transparent electrode 11 b) was formed on a glass substrate (thesupport 11 a, thickness: 2.2 mm), thereby producing aconductive support 11. - <Preparation of Solution for Blocking Layer>
- An isopropanol solution containing 15% by mass of titanium diisopropoxide bis(acetylacetonate) (manufactured by Sigma-Aldrich Japan K.K.) was diluted with 1-butanol, thereby preparing 0.02 M of a solution for a blocking layer.
- <Formation of
Blocking Layer 14> - A
blocking layer 14 made of titanium oxide (having a film thickness of 50 nm) was formed on the SnO2 conductive film of theconductive support 11 using 0.02 M of the solution for the blocking layer at 450° C. by means of a spray thermal decomposition method. - <Preparation of Titanium Oxide Paste>
- Ethyl cellulose, lauric acid, and terpineol were added to an ethanol dispersion liquid of titanium oxide (anatase, an average particle diameter of 20 nm), thereby preparing titanium oxide paste.
- <Formation of
Porous Layer 12> - The prepared titanium oxide paste was applied onto the
blocking layer 14 by means of a screen printing method and was fired. The application and firing of the titanium oxide paste were repeated again. Meanwhile, the first firing was carried out at 130° C. for one hour, and the second firing was carried out at 500° C. for one hour. The obtained titanium oxide fired body was immersed in an aqueous solution of 40 mM of TiCl4, then, was heated at 60° C. for one hour, and, continuously, was heated at 500° C. for 30 minutes, thereby forming the porous layer 12 (having a film thickness of 250 nm) made of TiO2. - <Formation of
Photosensitive Layer 13A> - (Synthesis of CH3NH3I)
- A 40% methanol solution of methyl amine (27.86 mL) and an aqueous solution of 57% by mass of hydrogen iodide (hydroiodic acid, 30 mL) were stirred in a flask at 0° C. for two hours and then condensed, thereby obtaining a CH3NH3I coarse body. The obtained CH3NH3I coarse body was dissolved in ethanol and was recrystallized with diethyl ether. The precipitated crystals were filtered and were dried at 60° C. for 24 hours under reduced pressure, thereby obtaining purified CH3NH3I.
- (Synthesis of Compound (a1))
- Compound (a1) was synthesized as illustrated in the following synthesis scheme.
- (Synthesis of Compound (a2))
- A 10% ethanol solution of Compound (a1) synthesized above (117 g) and an aqueous solution of 57% by mass of hydrogen iodide (23 g) were stirred in a flask at 0° C. for two hours, then, the solvent was removed by means of condensation, and then the components were further dried at 60° C. for 24 hours under reduced pressure, thereby obtaining Compound (a2).
- (Preparation of Light Absorber Solution A)
- Next, the molar ratios among the purified CH3NH3I, Compound (a2), and PbI2 were set to 99.8:0.2:50, and the components were stirred and mixed together at 60° C. in dimethylformamide (DMF) for 12 hours, and then filtered using a polytetrafluoroethylene (PTFE) syringe filter, thereby preparing 40% by mass of a light absorber solution A.
- The prepared light absorber solution A was applied onto the
porous layer 12 using a spin coating method (at 2,000 rpm for 60 seconds), and the light absorber solution A was dried at 100° C. for 90 minutes using a hot plate, thereby forming a photosensitive layer A (having a film thickness of 300 nm (including the film thickness of theporous layer 12 of 250 nm)) as thephotosensitive layer 13A having a perovskite compound. - A first electrode 1 was produced in the above-described manner.
- <Preparation of Hole-Transporting Material Solution>
- Spiro-OMeTAD (180 mg) as a hole-transporting material was dissolved in chlorobenzene (1 mL). An acetonitrile solution (37.5 μL) obtained by dissolving lithium-bis(trifluoromethanesulfonyl)imide (170 mg) in acetonitrile (1 mL) and t-butylpyridine (TBP, 17.5 μL) were added to and mixed with the chlorobenzene solution, thereby preparing a hole-transporting material solution.
- <Formation of Hole Transport Layer 3>
- Next, the hole-transporting material solution was applied onto the photosensitive layer 13 in the first electrode 1 using a spin coating, and the applied hole-transporting material solution was dried, thereby forming a hole transport layer 3 (film thickness: 0.1 μm).
- <Production of
Second Electrode 2> - Gold (film thickness: 0.1 μm) was vapor-deposited on the hole transport layer 3 using a vapor deposition method, thereby producing a
second electrode 2. - A photoelectric conversion element 10 with Specimen No. 101 was manufactured in the above-described manner.
- [Manufacturing of Photoelectric Conversion Elements (Specimen Nos. 102 to 104)]
- Photoelectric conversion elements 10 with Specimen Nos. 102 to 104 were manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the <formation of
photosensitive layer 13A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, the mixing molar ratio between the purified CH3NH3I and Compound (a2) was changed as shown in the table below. Meanwhile, the mixing molar ratio between the total amount of the purified CH3NH3I and Compound (a2) and PbI2 was set, similar to that in the manufacturing with Specimen No. 101, to 2:1. - [Manufacturing of Photoelectric Conversion Element (Specimen No. 105)]
- A photoelectric conversion element 10 with Specimen No. 105 was manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the <formation of
photosensitive layer 13A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, methylamine was changed to ethylamine, and the molar ratios among the purified CH3CH2NH3I, Compound (a2), and PbI2 were set to 98:2:50. - [Manufacturing of Photoelectric Conversion Elements (Specimen Nos. 106 to 133)]
- Photoelectric conversion elements 10 with Specimen Nos. 106 to 133 were manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the <formation of
photosensitive layer 13A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, Compound (b1), (g1), (s1), (w1), (x1), (y1), (z1), (aa1), (bb1), (cc1), or (dd1) was used instead of Compound (a1), each of Compound (b2), (g2), (s2), (w2), (x2), (y2), (z2), (aa2), (bb2), (cc2), or (dd2) was obtained, and the mixing molar ratio between each of these compounds and the purified CH3NH3I was changed as shown in the table below. Meanwhile, the mixing molar ratio between the total amount of the purified CH3NH3I and Compound (b2), (g2), (s2), (w2), (x2), (y2), (z2), (aa2), (bb2), (cc2), or (dd2) and PbI2 was set, similar to that in the manufacturing of Specimen No. 101, to 2:1. - [Manufacturing of Photoelectric Conversion Element (Specimen No. 201)]
- A photoelectric conversion element 10 with Specimen No. 201 was manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 101 except for the fact that, in the <formation of
photosensitive layer 13A>during the manufacturing of the above-described photoelectric conversion element with Specimen No. 101, the following process was carried out. - A 40% methanol solution of methyl amine (27.86 mL) and an aqueous solution of 57% by mass of hydrogen iodide (hydroiodic acid, 30 mL) were stirred in a flask at 0° C. for two hours and then condensed, thereby obtaining a CH3NH3I coarse body. The obtained CH3NH3I coarse body was dissolved in ethanol and was recrystallized with diethyl ether. The precipitated crystals were filtered and were dried at 60° C. for 24 hours under reduced pressure, thereby obtaining purified CH3NH3I.
- Next, the molar ratio between the purified CH3NH3I and PbI2 was set to 2:1, the components were stirred and mixed together at 60° C. in γ-butyrolactone for 12 hours and then filtered using a polytetrafluoroethylene (PTFE) syringe filter, thereby preparing 40% by mass of a light absorber solution B.
- The prepared light absorber solution B was applied onto the
porous layer 12 using a spin coating method (at 2,000 rpm for 60 seconds and subsequently at 3,000 rpm for 60 seconds), and the applied light absorber solution B was dried at 100° C. for 40 minutes using a hot plate, thereby forming a photosensitive layer A (having a film thickness of 600 nm (including the film thickness of theporous layer 12 of 500 nm)) as thephotosensitive layer 13A having a perovskite compound. - [Manufacturing of Photoelectric Conversion Element (Specimen No. 202)]
- A photoelectric conversion element 10 with Specimen No. 202 was manufactured in the same manner as in the manufacturing of the photoelectric conversion element with Specimen No. 201 except for the fact that, in the <formation of
photosensitive layer 13A> during the manufacturing of the above-described photoelectric conversion element with Specimen No. 201, methylamine was changed to a mixture of methylamine and ethylamine (the molar ratio of methylamine to ethylamine was set to 9), and the molar ratios among CH3NH3I:CH3CH2NH3I:PbI2 were set to 1.8:0.2:1 in the case of the preparation of the light absorber solution B. - [Evaluation of Moisture Resistance]
- <Measurement of Initial Photoelectric Conversion Efficiency>
- Photoelectric conversion efficiencies were evaluated in the following manner.
- Three testing pieces of the photoelectric conversion element with each specimen number were manufactured. Cell characteristics testing was carried out on the three testing pieces respectively, and photoelectric conversion efficiencies (η%) were measured. In addition, the average value of the values of these three testing pieces was considered as the initial photoelectric conversion efficiency (η%) of the photoelectric conversion element with each specimen number. The cell characteristics testing was carried out by radiating 1,000 W/m2 of quasi-sunlight from a xenon lamp through an AM1.5 filter using a solar simulator “WXS-85H” (Wacom). Current-voltage characteristics were measured using an I-V tester, and photoelectric conversion efficiencies (η%) were obtained.
- <Evaluation of Moisture Resistance>
- The moisture resistance of the photoelectric conversion element was measured in the following manner.
- Three testing pieces of each specimen number were stored in a constant temperature and humidity tank with a temperature of 25° C. and a humidity of 60% RH for 24 hours respectively, cell characteristics testing was carried out in the same manner as described above, and photoelectric conversion efficiencies (η%) were measured. The average value of the values of the three testing pieces was considered as the photoelectric conversion efficiency (η%) of the photoelectric conversion element with each specimen number after the storage.
- The moisture resistance of the photoelectric conversion element was evaluated from the decline percentage of the photoelectric conversion efficiency computed using the following expression according to the following evaluation standards.
-
Decline percentage (%)=100−{100×(photoelectric conversion efficiency after storage)/(initial photoelectric conversion efficiency)} - —Moisture Resistance Evaluation Standards—
- A: The decline percentage is less than 25%
- B: The decline percentage is 25% or more and less than 29%
- C: The decline percentage is 29% or more and less than 33%
- D: The decline percentage is 33% or more and less than 37%
- E: The decline percentage is 37% or more
- In the moisture resistance evaluation standards, [A], [B], [C], and [D] are pass levels, [A], [B], and [C] are preferred, and [A] is more preferred. On the other hand, at [E] level, the decline percentage is large, and the moisture resistance fails to reach the pass level (required level) of the present invention.
- The results are shown in Table 1.
- Meanwhile, [A2]/[A1] shown in Table 1 corresponds to the molar ratio of the organic cations not having a silyl group to the organic cations having a silyl group which constitute the perovskite compound.
-
TABLE 1 Specimen RA-NH3I R1 3Si-L-NR2 3I Molar ratio Moisture No. [A2] [A1] [A2]/[A1] resistance 101 CH3NH3I (a2) 499 B Present Invention 102 CH3NH3I (a2) 199 A Present Invention 103 CH3NH3I (a2) 49 A Present Invention 104 CH3NH3I (a2) 19 B Present Invention 105 CH3CH2NH3I (a2) 49 A Present Invention 106 CH3NH3I (b2) 49 B Present Invention 107 CH3NH3I (b2) 199 B Present Invention 108 CH3NH3I (b2) 499 C Present Invention 109 CH3NH3I (w2) 49 A Present Invention 110 CH3NH3I (w2) 199 A Present Invention 111 CH3NH3I (w2) 499 B Present Invention 112 CH3NH3I (x2) 49 A Present Invention 113 CH3NH3I (x2) 199 A Present Invention 114 CH3NH3I (x2) 499 B Present Invention 115 CH3NH3I (y2) 49 A Present Invention 116 CH3NH3I (y2) 199 A Present Invention 117 CH3NH3I (y2) 499 B Present Invention 118 CH3NH3I (z2) 49 A Present Invention 119 CH3NH3I (z2) 199 A Present Invention 120 CH3NH3I (z2) 499 B Present Invention 121 CH3NH3I (aa2) 499 B Present Invention 122 None (w2) 0 D Present Invention 123 CH3NH3I (w2) 0.67 D Present Invention 124 CH3NH3I (w2) 9 C Present Invention 125 CH3NH3I (w2) 24 B Present Invention 126 CH3NH3I (w2) 99 A Present Invention 127 CH3NH3I (w2) 249 B Present Invention 128 CH3NH3I (w2) 999 C Present Invention 129 CH3NH3I (g2) 49 B Present Invention 130 CH3NH3I (s2) 49 A Present Invention 131 CH3NH3I (bb2) 49 A Present Invention 132 CH3NH3I (cc2) 49 A Present Invention 133 CH3NH3I (dd2) 49 A Present Invention 201 CH3NH3I None — E Comparative Example 202 CH3NH3I None — E Comparative CH3CH2NH3I Example - As shown in Table 1, in a case in which the perovskite compound in the light absorber did not include the organic cations having a silyl group in the crystal structure, it was turned out that the photoelectric conversion efficiency of the photoelectric conversion element significantly decreased under high-humidity conditions.
- In contrast, in a case in which the perovskite compound in the light absorber included the organic cations having a silyl group in the crystal structure, it was found that the photoelectric conversion efficiency of the photoelectric conversion element did not easily decrease even under high-humidity conditions and the moisture resistance was excellent.
- From the above-described results, it is found that the photoelectric conversion element or the solar cell of the present invention exhibit excellent moisture resistance.
- The present invention has been described together with embodiments thereof and drawings, but the present inventors do not limit the present invention in any detailed part of the description unless particularly otherwise described and consider that the present invention is supposed to be widely interpreted within the scope of the concept of the present invention which is described in the accompanying claims.
-
-
- 1A, 1B, 1C, 1D, 1E: first electrode
- 11: conductive support
- 11 a: support
- 11 b: transparent electrode
- 12: porous layer
- 13A, 13B, 13C: photosensitive layer
- 14: blocking layer
- 15: electron transport layer
- 16: hole transport layer
- 2: second electrode
- 3A, 3B: hole transport layer
- 4: electron transport layer
- 6: external circuit (lead)
- 10A, 10B, 10C, 10D, 10E: photoelectric conversion element
- 100A, 100B, 100C, 100D, 100E: system in which photoelectric conversion element is applied as cell
- M: electric motor
Claims (6)
1. A composition comprising:
a compound represented by Formula (1a); and
a halogenated metal,
R1 3Si-L-NR2 3Hal Formula (1a)
R1 3Si-L-NR2 3Hal Formula (1a)
in the formula, R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group, R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, or an aliphatic heterocyclic group, L represents a divalent linking group, and Hal represents a halogen atom.
2. A photoelectric conversion element comprising:
a first electrode having a photosensitive layer including a light absorber on a conductive support; and
a second electrode facing the first electrode,
wherein the photosensitive layer is formed from the composition according to claim 1 .
3. The composition according to claim 1 ,
wherein R1 is an alkyl group, an aryl group, or a heteroaryl group.
4. The composition according to claim 1 ,
wherein L is a divalent linking group selected from an alkylene group, a cycloalkylene group, an alkenylene group, an alkynylene group, an arylene group, a heteroarylene group, —O—, —S—, and —NRL— or a divalent linking group formed by combining two or more linking groups, and
R1 represents a hydrogen atom or an alkyl group.
5. The composition according to claim 4 ,
wherein L is an alkylene group, an arylene group, or a divalent linking group formed of a combination of an alkylene group and an arylene group.
6. The composition according to claim 1 ,
wherein the compound represented by Formula (1a) has an alkylene group in L, and L and NR2 3 are linked to each other through the alkylene group.
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| PCT/JP2016/055520 WO2016143526A1 (en) | 2015-03-06 | 2016-02-24 | Photoelectric conversion element, solar cell and composition |
| US15/658,995 US10418186B2 (en) | 2015-03-06 | 2017-07-25 | Photoelectric conversion element, solar cell and composition |
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| CN107833969B (en) * | 2017-09-28 | 2019-05-10 | 西北工业大学 | A high-efficiency planar heterojunction perovskite thin-film solar cell and preparation method thereof |
| CN117156875B (en) * | 2023-10-31 | 2024-01-23 | 电子科技大学 | High-performance solar cell based on non-contact passivation |
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| GB0503939D0 (en) * | 2005-02-25 | 2005-04-06 | Cambridge Theranostics Ltd | Chlamydia detection |
| EP2019425A1 (en) * | 2007-07-27 | 2009-01-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
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| WO2014151522A1 (en) * | 2013-03-15 | 2014-09-25 | Hunt Energy Enterprises, L.L.C. | Perovskite and other solar cell materials |
| JP6089009B2 (en) * | 2013-07-31 | 2017-03-01 | 富士フイルム株式会社 | Photoelectric conversion element and solar cell |
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| CN107210370A (en) | 2017-09-26 |
| US20170330694A1 (en) | 2017-11-16 |
| KR20170108109A (en) | 2017-09-26 |
| WO2016143526A1 (en) | 2016-09-15 |
| JPWO2016143526A1 (en) | 2017-07-20 |
| EP3267504A1 (en) | 2018-01-10 |
| US10418186B2 (en) | 2019-09-17 |
| JP6229991B2 (en) | 2017-11-15 |
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