US20190004248A1 - Optical waveguide and optical circuit board - Google Patents
Optical waveguide and optical circuit board Download PDFInfo
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- US20190004248A1 US20190004248A1 US16/001,343 US201816001343A US2019004248A1 US 20190004248 A1 US20190004248 A1 US 20190004248A1 US 201816001343 A US201816001343 A US 201816001343A US 2019004248 A1 US2019004248 A1 US 2019004248A1
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Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12104—Mirror; Reflectors or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4274—Electrical aspects
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0274—Optical details, e.g. printed circuits comprising integral optical means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
- H05K1/112—Pads for surface mounting, e.g. lay-out directly combined with via connections
- H05K1/113—Via provided in pad; Pad over filled via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/181—Printed circuits structurally associated with non-printed electric components associated with surface mounted components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10007—Types of components
- H05K2201/10121—Optical component, e.g. opto-electronic component
Definitions
- the present disclosure relates to an optical waveguide and an optical circuit board including the optical waveguide.
- the optical waveguide includes a laminate including a lower cladding, a core including a reflective surface, and an upper cladding.
- the optical waveguide further includes via holes located in the laminate in a spaced state opposing to each other with the core interposed therebetween when viewed in plan. See Japanese Patent No. 2985791.
- An optical waveguide includes a laminate including a lower cladding, a core on the lower cladding, and an upper cladding positioned on the lower cladding and covering the core, via holes positioned in the laminate in a spaced opposing relation to each other, a cavity positioned over a span from an upper surface of the upper cladding to the lower cladding, the cavity including a sectional surface sectioning the core obliquely relative to the upper surface of the upper cladding, and a reflective surface positioned in the core and defined by part of the sectional surface, wherein the cavity extends from a region between the via holes in the spaced opposing relation toward the outside of the region, and an opening size of the cavity in the region is smaller than an opening size of the cavity outside the region when viewed in an opposing direction of the via holes.
- the cavity can be positioned while an arrangement interval between the via holes is reduced. Therefore, a highly-functional optical waveguide can be obtained.
- An optical circuit board includes the above-described optical waveguide, and a wiring board including pads on a surface of the wiring board at intervals between the pads, wherein the optical waveguide is positioned on the wiring board in a state of the pads being positioned just under lower openings of the via holes.
- a highly-functional optical circuit board can be obtained because of including the highly-functional optical waveguide constituted as described above.
- FIG. 1 is a schematic sectional view illustrating an embodiment of an optical waveguide according to the present disclosure
- FIG. 2 is a schematic plan view illustrating the embodiment of the optical waveguide according to the present disclosure
- FIG. 3 is a schematic sectional view illustrating an embodiment of an optical circuit board according to the present disclosure
- FIG. 4 is a schematic plan view illustrating another embodiment of the optical waveguide according to the present disclosure.
- FIG. 5 is a schematic plan view illustrating still another embodiment of the optical waveguide according to the present disclosure.
- FIG. 6 is a schematic plan view illustrating still another embodiment of the optical waveguide according to the present disclosure.
- FIG. 7 is a schematic plan view illustrating still another embodiment of the optical waveguide according to the present disclosure.
- FIG. 8 is a schematic sectional view illustrating still another embodiment of the optical waveguide according to the present disclosure.
- FIG. 1 is a sectional view taken along a plane I-I illustrated in FIG. 2 .
- the optical waveguide 20 includes a laminate 4 including a lower cladding 1 , a core 2 , and an upper cladding 3 , via holes 5 , a cavity 6 , and a reflective surface 7 .
- the lower cladding 1 has a flat shape with a thickness of 10 to 20 ⁇ m, for example.
- the lower cladding 1 is formed by joining or coating a photosensitive sheet or a photosensitive paste containing an epoxy resin or a polyimide resin, for example, onto or over a substrate, for example, by shaping the joined sheet or the coated paste into a predetermined shape through exposure and development, and then by thermally curing it.
- the core 2 has an elongate band-like shape with a rectangular cross-section and a thickness of 20 to 40 ⁇ m, for example.
- the core 2 is formed by joining a photosensitive sheet containing an epoxy resin or a polyimide resin, for example, onto the lower cladding 1 in a vacuum state, by shaping the joined sheet into the band-like shape through exposure and development, and then by thermally curing it.
- the refractive index of the resin constituting the photosensitive sheet for the core 2 is greater than that of the resin constituting the photosensitive sheet or paste for each of the lower cladding 1 and the upper cladding 3 .
- the upper cladding 3 is positioned on the lower cladding 1 and covers the core 2 .
- the upper cladding 3 has a thickness of 10 to 20 ⁇ m, for example, at a position above the core 2 and includes a flat upper surface.
- surface roughness in a region opposing to a light emitting portion D 1 or a light receiving portion D 2 of an optical element D, described later is 10 nm or less in terms of arithmetic average roughness Ra.
- the arithmetic average roughness Ra of 30 to 100 nm is advantageous from the viewpoint of, when the optical waveguide is integrally encapsulated with, e.g., resin in a covering relation to both the optical element D and the upper surface of the upper cladding 3 , increasing a contact area between the resin and the upper surface of the upper cladding 3 , and increasing adhesion intensity between them.
- the upper cladding 3 is formed by joining or coating a photosensitive sheet or a photosensitive paste containing an epoxy resin or a polyimide resin, for example, onto or over the lower cladding 1 in a state covering the core 2 , by performing exposure and development of the joined sheet or the coated paste, and then by thermally curing it.
- the via holes 5 are located in the laminate 4 in a spaced state opposing to each other in a direction perpendicular to an extending direction of the core 2 when viewed in plan.
- two via holes 5 are opposed to each other in the spaced state with the core 2 interposed therebetween, and a reflective surface 7 a is located in the core 2 .
- the two via holes 5 and the reflective surface 7 a correspond to arrangement of two electrodes D 3 of the optical element D and the light emitting portion D 1 or the light receiving portion D 2 of the optical element D.
- the optical element D is arranged such that, when viewed in plan, the electrodes D 3 overlap the via holes 5 in a one-to-one relation, and the light emitting portion D 1 or the light receiving portion D 2 overlaps the reflective surface 7 a. Distances from the core 2 to the via holes 5 are substantially the same.
- the via holes 5 penetrate from an upper surface to a lower surface of the laminate 4 . In other words, the via holes 5 are positioned over a span from the upper surface of the upper cladding 3 to a lower surface of the lower cladding 1 .
- the via holes 5 are formed by laser processing or blast processing, for example. Alternatively, the via holes 5 may be formed through exposure and development at the time when the lower cladding 1 and the upper cladding 3 are formed. An opening size of each via hole 5 is set to 50 to 80 ⁇ m, for example. An interval between opening centers of the opposing via holes 5 is set to 80 to 110 ⁇ m, for example.
- the cavity 6 extends from a region between the opposing via holes 5 toward the outside of the region when viewed in plan.
- the cavity 6 is positioned over a span from the upper surface of the upper cladding 3 to the lower cladding 1 , and it includes a sectional surface 8 sectioning the core 2 obliquely relative to the upper surface of the upper cladding 3 when viewed in cross-section.
- the cavity 6 includes an opening 9 in the upper surface of the upper cladding 3 .
- An opening size L 1 of the cavity 6 in the region between the opposing via holes 5 is smaller than an opening size L 2 outside the region. Therefore, the cavity 6 can be positioned in the region between the via holes 5 even when the arrangement interval between the via holes 5 is reduced.
- the opening size L 1 is set to 10 to 40 ⁇ m, for example.
- the opening size L 2 is set to 70 to 110 ⁇ m, for example.
- the cavity 6 is formed by laser processing, for example. Surface treatment may be performed on the sectional surface 8 by plasma processing or blast processing, for example.
- the reflective surface 7 is located in the core 2 .
- the reflective surface 7 includes, by way of example, a first reflective surface 7 a just under the optical element D to be connected to the optical waveguide 20 , and a second reflective surface 7 b just under a connector C to be connected to the optical waveguide 20 .
- the first reflective surface 7 a is constituted by part of the sectional surface 8 of the cavity 6 .
- the reflective surface 7 has the function of changing the direction of an optical signal emitted from the optical element D, and transferring the optical signal to the connector C.
- the reflective surface 7 has the function of changing the direction of an optical signal sent from the connector C, and causing the optical signal to be received by the optical element D.
- a center axis of the core 2 is aligned with a center position of the reflective surface 7 , and the optical signal is transferred with the center axis and the center position being a reference.
- the center axis stands for a position at which a pair of diagonal lines of a rectangular cross-section of the core 2 intersects.
- the center position stands for a position at which a pair of diagonal lines of the reflective surface 7 having a rectangular shape intersects.
- the optical waveguide 20 includes the cavity 6 including the opening 9 in the upper surface of the upper cladding 3 . Furthermore, the opening size L 1 of the cavity 6 in the region between the opposing via holes 5 is smaller than the opening size L 2 outside the region. Thus, even when the arrangement interval between the opposing via holes 5 is small, the cavity 6 can be positioned in the region between the via holes 5 , and the optical waveguide 20 can be provided as a highly-functional optical waveguide. Moreover, the opening size L 2 outside the region is relatively large, and this point is advantageous in making the reflective surface 7 positioned entirely over the core 2 in a width direction thereof. In that case, a difference between the opening size L 1 in the region and the opening size L 2 outside the region is set to about 30 to 100 ⁇ m, for example.
- optical circuit board 40 including the optical waveguide 20 according to the present disclosure will be described below with reference to FIG. 3 .
- detailed description of the optical waveguide 20 is omitted.
- the optical circuit board 40 includes a wiring board 30 and the optical waveguide 20 .
- the wiring board 30 has the function of fixedly positioning the optical waveguide 20 , the optical element D, and the connector C, and electrically connecting the optical element D to the outside (such as a mother board).
- An optical signal is transferred between the optical element D and the outside (such as an optical device) via the optical waveguide 20 .
- the optical element D may be a vertical cavity surface emitting laser or a photodiode, for example, and may be used for conversion between an optical signal and an electrical signal.
- the wiring board 30 includes an insulating substrate 31 and wiring conductors 32 .
- the insulating substrate 31 includes a core insulating layer 31 a and buildup insulating layers 31 b.
- the core insulating layer 31 a includes a plurality of through-holes 33 .
- the core insulating layer 31 a has the function of, for example, ensuring rigidity of the insulating substrate 31 and holding flatness.
- the core insulating layer 31 a is formed by pressing a semi-hard prepreg made of a glass cloth impregnated with an epoxy resin or a bismaleimide triazine resin, for example, into a flat shape under heating.
- the buildup insulating layers 31 b include a plurality of via holes 34 .
- the buildup insulating layers 31 b have the function of, for example, securing a space for routing the wiring conductors 32 described in detail below, etc.
- the buildup insulating layers 31 b are each formed by bonding a resin film containing an epoxy resin or a polyimide resin, for example, to the core insulating layer 31 a under vacuum, and by thermally curing the bonded resin film.
- the wiring conductors 32 are positioned on a surface of the core insulating layer 31 a, on surfaces of the buildup insulating layers 31 b, inside the through-holes 33 , and inside the via holes 34 .
- the wiring conductor 32 inside the through-holes 33 establishes electrical continuity between the wiring conductors 32 on the upper and lower surfaces of the core insulating layer 31 a.
- the wiring conductor 32 inside the via holes 34 establishes electrical continuity between the wiring conductor 32 on the surface of one buildup insulating layer 31 b and the wiring conductor 32 on the surface of the core insulating layer 31 a.
- the wiring conductors 32 are made of a highly conductive metal, such as a copper plating, formed by a semi-additive process or a subtractive process.
- the wiring board 30 includes a plurality of first pads 35 on its upper surface.
- the first pads 35 are connected to the pads D 3 of the optical element D through conductive material such as solders.
- the wiring board 30 further includes a plurality of second pads 36 on its upper surface and a plurality of third pads 37 on its lower surface.
- the second pads 36 are connected to an electronic component S such as a semiconductor device, and the third pads 37 are connected to a mother board, for example.
- the first pads 35 , the second pads 36 , and the third pads 37 are parts of the wiring conductors 32 and are formed at the same time as when the wiring conductors 32 are formed.
- the optical waveguide 20 is positioned on the upper surface of the wiring board 30 , the upper surface including a region where the first pads 35 are positioned.
- the via holes 5 in the optical waveguide 20 include bottom surfaces defined by the first pads 35 .
- the optical waveguide 20 includes the cavity 6 including the opening 9 in the upper surface of the upper cladding 3 .
- the opening size L 1 of the cavity 6 in the region between the opposing via holes 5 is smaller than the opening size L 2 outside the region.
- the cavity 6 can be positioned while the interval between the opposing via holes 5 is reduced. As a result, the functionality of the optical waveguide 20 can be increased.
- the optical circuit board 40 according to the present disclosure includes the highly-functional optical waveguide 20 on the upper surface of the wiring board 30 , the functionality of the optical circuit board can also be increased.
- FIG. 2 illustrates the case in which the opening 9 of the cavity 6 has a trapezoidal shape
- the opening 9 may have a triangular shape with one of three apexes being positioned between the opposing via holes 5 , as illustrated in FIG. 4 .
- Such a case is advantageous in further reducing a value of the opening size L 1 in comparison with that when the opening 9 has the trapezoidal shape, and further reducing the arrangement interval between the via holes 5 .
- sides of the cavity 6 except for an opening side 9 a defining one side of the sectional surface 8 may have curved shapes. Such a curved shape is advantageous in increasing workability because narrowing of a region near a corner of the opening 9 , for example, is suppressed.
- one optical waveguide 20 may include a plurality of cores 2 as illustrated in FIG. 6 .
- Such a case is advantageous in further increasing the functionality of the optical waveguide 20 and the optical circuit board 40 because a larger number of optical signals can be transferred.
- the wiring board 30 may include solder resist layers on both or either one of upper and lower surfaces of the insulating substrate 31 , the solder resist layers including openings where the second pads 36 and the third pads 37 are exposed.
- the solder resist layers With the presence of the solder resist layers, damage of the wiring conductors 32 can be suppressed, the damage being caused, for example, by heat treatment performed when the electronic component S is mounted.
- the openings in each solder resist layer may have different shapes from one another. The opening having the different shapes can also be used as alignment marks, for example, when the electronic component S is mounted.
- a corner portion 10 of the opening 9 may have a curved shape when viewed in plan.
- the radius of curvature of the corner portion 10 is set to about 5 to 10 ⁇ m, for example.
- stress generated in the corner portion 10 upon the optical waveguide 20 receiving external pressure or heat can be reduced to 40 to 60%.
- cracking of the laminate 4 in the corner portion 10 can be suppressed, and the highly-functional optical waveguide 20 can be obtained with good reliability.
- the cavity 6 may include a lateral surface 11 spanning from the upper surface of the upper cladding 3 to the sectional surface 8 including the reflective surface 7 , the lateral surface 11 intersecting each of the upper surface of the upper cladding 3 and the sectional surface 8 at an angle of 90 degrees or larger when viewed in cross-section.
- the optical waveguide 20 can be obtained as an optical waveguide capable of accurately changing the direction of an optical signal and exhibiting good transmission characteristics.
- An upper limit value of the angle at which the lateral surface 11 intersects the upper surface of the upper cladding 3 and an upper limit value of the angle at which the lateral surface 11 intersects the sectional surface 8 including the reflective surface 7 depend on the angle at which the upper surface of the upper cladding 3 intersects the sectional surface 8 including the reflective surface 7 .
- the angle at which the upper surface of the upper cladding 3 intersects the sectional surface 8 including the reflective surface 7 is 45 degrees, for example, the above-mentioned upper limit value is 135 degrees.
- the above-described corner portion 10 and lateral surface 11 each having the curved shape is formed, for example, by applying, after forming the cavity 6 , a laser beam to a region where the upper surface of the upper cladding 3 intersects the sectional surface 8 including the reflective surface 7 .
- the structure in which the corner portion 10 of the opening 9 has the curved shape, and the structure in which each of the angles of the lateral surface 11 intersecting the upper surface of the upper cladding 3 and the sectional surface 8 is 90 degrees or larger when viewed in cross-section can be formed at the same time as when carrying out the above-described laser processing.
- the optical waveguide 20 may include both of the above-mentioned structures.
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Abstract
Description
- The present disclosure relates to an optical waveguide and an optical circuit board including the optical waveguide.
- Development of a highly-functional optical waveguide capable of transferring a lot of information at high speed and a highly-functional optical circuit board including such an optical waveguide has been progressed with increasing sophistication of electronic devices represented by a server and a supercomputer. The optical waveguide includes a laminate including a lower cladding, a core including a reflective surface, and an upper cladding. For mounting of an optical element to the optical waveguide, the optical waveguide further includes via holes located in the laminate in a spaced state opposing to each other with the core interposed therebetween when viewed in plan. See Japanese Patent No. 2985791.
- With the increasing sophistication of electronic devices, downsizing of each optical element has been progressed for the reason that a plurality of optical elements is mounted to the optical waveguide. Corresponding to such a trend, an arrangement interval between the via holes has also been reduced. The above-mentioned reflective surface is positioned just under the optical element and is defined by part of a sectional surface of a cavity spanning from a region between the opposing via holes toward the outside of the region. With a decrease in the arrangement interval between the via holes, however, a difficulty arises in securing a region where the cavity is to be positioned, and in making the optical waveguide adaptable for the downsizing of the optical element. Thus, there is a possibility that it would be difficult to increase the functionality of the optical waveguide.
- An optical waveguide according to the present disclosure includes a laminate including a lower cladding, a core on the lower cladding, and an upper cladding positioned on the lower cladding and covering the core, via holes positioned in the laminate in a spaced opposing relation to each other, a cavity positioned over a span from an upper surface of the upper cladding to the lower cladding, the cavity including a sectional surface sectioning the core obliquely relative to the upper surface of the upper cladding, and a reflective surface positioned in the core and defined by part of the sectional surface, wherein the cavity extends from a region between the via holes in the spaced opposing relation toward the outside of the region, and an opening size of the cavity in the region is smaller than an opening size of the cavity outside the region when viewed in an opposing direction of the via holes.
- With the optical waveguide according to the present disclosure, the cavity can be positioned while an arrangement interval between the via holes is reduced. Therefore, a highly-functional optical waveguide can be obtained.
- An optical circuit board according to the present disclosure includes the above-described optical waveguide, and a wiring board including pads on a surface of the wiring board at intervals between the pads, wherein the optical waveguide is positioned on the wiring board in a state of the pads being positioned just under lower openings of the via holes.
- With the optical circuit board according to the present disclosure, a highly-functional optical circuit board can be obtained because of including the highly-functional optical waveguide constituted as described above.
-
FIG. 1 is a schematic sectional view illustrating an embodiment of an optical waveguide according to the present disclosure; -
FIG. 2 is a schematic plan view illustrating the embodiment of the optical waveguide according to the present disclosure; -
FIG. 3 is a schematic sectional view illustrating an embodiment of an optical circuit board according to the present disclosure; -
FIG. 4 is a schematic plan view illustrating another embodiment of the optical waveguide according to the present disclosure; -
FIG. 5 is a schematic plan view illustrating still another embodiment of the optical waveguide according to the present disclosure; -
FIG. 6 is a schematic plan view illustrating still another embodiment of the optical waveguide according to the present disclosure; -
FIG. 7 is a schematic plan view illustrating still another embodiment of the optical waveguide according to the present disclosure; and -
FIG. 8 is a schematic sectional view illustrating still another embodiment of the optical waveguide according to the present disclosure. - An embodiment of an
optical waveguide 20 according to the present disclosure will be described below with reference toFIGS. 1 and 2 .FIG. 1 is a sectional view taken along a plane I-I illustrated inFIG. 2 . Theoptical waveguide 20 includes alaminate 4 including alower cladding 1, acore 2, and anupper cladding 3, viaholes 5, acavity 6, and areflective surface 7. - The
lower cladding 1 has a flat shape with a thickness of 10 to 20 μm, for example. Thelower cladding 1 is formed by joining or coating a photosensitive sheet or a photosensitive paste containing an epoxy resin or a polyimide resin, for example, onto or over a substrate, for example, by shaping the joined sheet or the coated paste into a predetermined shape through exposure and development, and then by thermally curing it. - The
core 2 has an elongate band-like shape with a rectangular cross-section and a thickness of 20 to 40 μm, for example. Thecore 2 is formed by joining a photosensitive sheet containing an epoxy resin or a polyimide resin, for example, onto thelower cladding 1 in a vacuum state, by shaping the joined sheet into the band-like shape through exposure and development, and then by thermally curing it. The refractive index of the resin constituting the photosensitive sheet for thecore 2 is greater than that of the resin constituting the photosensitive sheet or paste for each of thelower cladding 1 and theupper cladding 3. - The
upper cladding 3 is positioned on thelower cladding 1 and covers thecore 2. Theupper cladding 3 has a thickness of 10 to 20 μm, for example, at a position above thecore 2 and includes a flat upper surface. In the upper surface of theupper cladding 3, from the viewpoint of reducing irregular reflection and diffusion of an optical signal, it is advantageous that surface roughness in a region opposing to a light emitting portion D1 or a light receiving portion D2 of an optical element D, described later, is 10 nm or less in terms of arithmetic average roughness Ra. Regarding surface roughness in a region other than the above region, the arithmetic average roughness Ra of 30 to 100 nm is advantageous from the viewpoint of, when the optical waveguide is integrally encapsulated with, e.g., resin in a covering relation to both the optical element D and the upper surface of theupper cladding 3, increasing a contact area between the resin and the upper surface of theupper cladding 3, and increasing adhesion intensity between them. Theupper cladding 3 is formed by joining or coating a photosensitive sheet or a photosensitive paste containing an epoxy resin or a polyimide resin, for example, onto or over thelower cladding 1 in a state covering thecore 2, by performing exposure and development of the joined sheet or the coated paste, and then by thermally curing it. - The
via holes 5 are located in thelaminate 4 in a spaced state opposing to each other in a direction perpendicular to an extending direction of thecore 2 when viewed in plan. In an example illustrated inFIG. 2 , two viaholes 5 are opposed to each other in the spaced state with thecore 2 interposed therebetween, and areflective surface 7 a is located in thecore 2. The two viaholes 5 and thereflective surface 7 a correspond to arrangement of two electrodes D3 of the optical element D and the light emitting portion D1 or the light receiving portion D2 of the optical element D. More specifically, the optical element D is arranged such that, when viewed in plan, the electrodes D3 overlap thevia holes 5 in a one-to-one relation, and the light emitting portion D1 or the light receiving portion D2 overlaps thereflective surface 7 a. Distances from thecore 2 to thevia holes 5 are substantially the same. Thevia holes 5 penetrate from an upper surface to a lower surface of thelaminate 4. In other words, thevia holes 5 are positioned over a span from the upper surface of theupper cladding 3 to a lower surface of thelower cladding 1. - The
via holes 5 are formed by laser processing or blast processing, for example. Alternatively, thevia holes 5 may be formed through exposure and development at the time when thelower cladding 1 and theupper cladding 3 are formed. An opening size of eachvia hole 5 is set to 50 to 80 μm, for example. An interval between opening centers of the opposing viaholes 5 is set to 80 to 110 μm, for example. - The
cavity 6 extends from a region between the opposing viaholes 5 toward the outside of the region when viewed in plan. Thecavity 6 is positioned over a span from the upper surface of theupper cladding 3 to thelower cladding 1, and it includes asectional surface 8 sectioning thecore 2 obliquely relative to the upper surface of theupper cladding 3 when viewed in cross-section. - The
cavity 6 includes anopening 9 in the upper surface of theupper cladding 3. An opening size L1 of thecavity 6 in the region between the opposingvia holes 5 is smaller than an opening size L2 outside the region. Therefore, thecavity 6 can be positioned in the region between thevia holes 5 even when the arrangement interval between thevia holes 5 is reduced. The opening size L1 is set to 10 to 40 μm, for example. The opening size L2 is set to 70 to 110 μm, for example. Thecavity 6 is formed by laser processing, for example. Surface treatment may be performed on thesectional surface 8 by plasma processing or blast processing, for example. - The
reflective surface 7 is located in thecore 2. Thereflective surface 7 includes, by way of example, a firstreflective surface 7 a just under the optical element D to be connected to theoptical waveguide 20, and a secondreflective surface 7 b just under a connector C to be connected to theoptical waveguide 20. The firstreflective surface 7 a is constituted by part of thesectional surface 8 of thecavity 6. Thereflective surface 7 has the function of changing the direction of an optical signal emitted from the optical element D, and transferring the optical signal to the connector C. Alternatively, thereflective surface 7 has the function of changing the direction of an optical signal sent from the connector C, and causing the optical signal to be received by the optical element D. - A center axis of the
core 2 is aligned with a center position of thereflective surface 7, and the optical signal is transferred with the center axis and the center position being a reference. Here, the center axis stands for a position at which a pair of diagonal lines of a rectangular cross-section of thecore 2 intersects. The center position stands for a position at which a pair of diagonal lines of thereflective surface 7 having a rectangular shape intersects. - As described above, the
optical waveguide 20 according to the present disclosure includes thecavity 6 including theopening 9 in the upper surface of theupper cladding 3. Furthermore, the opening size L1 of thecavity 6 in the region between the opposing viaholes 5 is smaller than the opening size L2 outside the region. Thus, even when the arrangement interval between the opposing viaholes 5 is small, thecavity 6 can be positioned in the region between the via holes 5, and theoptical waveguide 20 can be provided as a highly-functional optical waveguide. Moreover, the opening size L2 outside the region is relatively large, and this point is advantageous in making thereflective surface 7 positioned entirely over thecore 2 in a width direction thereof. In that case, a difference between the opening size L1 in the region and the opening size L2 outside the region is set to about 30 to 100 μm, for example. - An embodiment of the
optical circuit board 40 including theoptical waveguide 20 according to the present disclosure will be described below with reference toFIG. 3 . In the following, detailed description of theoptical waveguide 20 is omitted. - The
optical circuit board 40 includes awiring board 30 and theoptical waveguide 20. Thewiring board 30 has the function of fixedly positioning theoptical waveguide 20, the optical element D, and the connector C, and electrically connecting the optical element D to the outside (such as a mother board). An optical signal is transferred between the optical element D and the outside (such as an optical device) via theoptical waveguide 20. The optical element D may be a vertical cavity surface emitting laser or a photodiode, for example, and may be used for conversion between an optical signal and an electrical signal. - The
wiring board 30 includes an insulatingsubstrate 31 andwiring conductors 32. The insulatingsubstrate 31 includes a core insulatinglayer 31 a andbuildup insulating layers 31 b. The core insulatinglayer 31a includes a plurality of through-holes 33. - The core insulating
layer 31 a has the function of, for example, ensuring rigidity of the insulatingsubstrate 31 and holding flatness. The core insulatinglayer 31 a is formed by pressing a semi-hard prepreg made of a glass cloth impregnated with an epoxy resin or a bismaleimide triazine resin, for example, into a flat shape under heating. - The
buildup insulating layers 31 b include a plurality of via holes 34. Thebuildup insulating layers 31 b have the function of, for example, securing a space for routing thewiring conductors 32 described in detail below, etc. Thebuildup insulating layers 31 b are each formed by bonding a resin film containing an epoxy resin or a polyimide resin, for example, to the core insulatinglayer 31 a under vacuum, and by thermally curing the bonded resin film. - The
wiring conductors 32 are positioned on a surface of the core insulatinglayer 31 a, on surfaces of thebuildup insulating layers 31 b, inside the through-holes 33, and inside the via holes 34. Thewiring conductor 32 inside the through-holes 33 establishes electrical continuity between the wiringconductors 32 on the upper and lower surfaces of the core insulatinglayer 31 a. Thewiring conductor 32 inside the via holes 34 establishes electrical continuity between thewiring conductor 32 on the surface of onebuildup insulating layer 31 b and thewiring conductor 32 on the surface of the core insulatinglayer 31 a. Thewiring conductors 32 are made of a highly conductive metal, such as a copper plating, formed by a semi-additive process or a subtractive process. - The
wiring board 30 includes a plurality offirst pads 35 on its upper surface. Thefirst pads 35 are connected to the pads D3 of the optical element D through conductive material such as solders. Thewiring board 30 further includes a plurality ofsecond pads 36 on its upper surface and a plurality ofthird pads 37 on its lower surface. Thesecond pads 36 are connected to an electronic component S such as a semiconductor device, and thethird pads 37 are connected to a mother board, for example. Thefirst pads 35, thesecond pads 36, and thethird pads 37 are parts of thewiring conductors 32 and are formed at the same time as when thewiring conductors 32 are formed. - The
optical waveguide 20 is positioned on the upper surface of thewiring board 30, the upper surface including a region where thefirst pads 35 are positioned. The via holes 5 in theoptical waveguide 20 include bottom surfaces defined by thefirst pads 35. Theoptical waveguide 20 includes thecavity 6 including theopening 9 in the upper surface of theupper cladding 3. The opening size L1 of thecavity 6 in the region between the opposing viaholes 5 is smaller than the opening size L2 outside the region. Thus, thecavity 6 can be positioned while the interval between the opposing viaholes 5 is reduced. As a result, the functionality of theoptical waveguide 20 can be increased. - As described above, since the
optical circuit board 40 according to the present disclosure includes the highly-functionaloptical waveguide 20 on the upper surface of thewiring board 30, the functionality of the optical circuit board can also be increased. - The present disclosure is not limited to the above-described embodiment, and it can be variously modified within the scope not departing from the gist of the present disclosure. For instance, while
FIG. 2 illustrates the case in which theopening 9 of thecavity 6 has a trapezoidal shape, theopening 9 may have a triangular shape with one of three apexes being positioned between the opposing viaholes 5, as illustrated inFIG. 4 . Such a case is advantageous in further reducing a value of the opening size L1 in comparison with that when theopening 9 has the trapezoidal shape, and further reducing the arrangement interval between the via holes 5. - Furthermore, as illustrated in
FIG. 5 , sides of thecavity 6 except for anopening side 9 a defining one side of thesectional surface 8 may have curved shapes. Such a curved shape is advantageous in increasing workability because narrowing of a region near a corner of theopening 9, for example, is suppressed. - While the embodiment has been described in connection with the case in which one
optical waveguide 20 includes onecore 2, oneoptical waveguide 20 may include a plurality ofcores 2 as illustrated inFIG. 6 . Such a case is advantageous in further increasing the functionality of theoptical waveguide 20 and theoptical circuit board 40 because a larger number of optical signals can be transferred. - While the embodiment has been described in connection with an example in which the
wiring board 30 does not include a solder resist layer, thewiring board 30 may include solder resist layers on both or either one of upper and lower surfaces of the insulatingsubstrate 31, the solder resist layers including openings where thesecond pads 36 and thethird pads 37 are exposed. With the presence of the solder resist layers, damage of thewiring conductors 32 can be suppressed, the damage being caused, for example, by heat treatment performed when the electronic component S is mounted. The openings in each solder resist layer may have different shapes from one another. The opening having the different shapes can also be used as alignment marks, for example, when the electronic component S is mounted. - As illustrated in
FIG. 7 , in thecavity 6, acorner portion 10 of theopening 9 may have a curved shape when viewed in plan. The radius of curvature of thecorner portion 10 is set to about 5 to 10 μm, for example. In such a case, stress generated in thecorner portion 10 upon theoptical waveguide 20 receiving external pressure or heat can be reduced to 40 to 60%. As a result, cracking of thelaminate 4 in thecorner portion 10 can be suppressed, and the highly-functionaloptical waveguide 20 can be obtained with good reliability. - As illustrated in
FIG. 8 , thecavity 6 may include alateral surface 11 spanning from the upper surface of theupper cladding 3 to thesectional surface 8 including thereflective surface 7, thelateral surface 11 intersecting each of the upper surface of theupper cladding 3 and thesectional surface 8 at an angle of 90 degrees or larger when viewed in cross-section. In such a case, since there is no longer present a portion where the upper surface of theupper cladding 3 and thesectional surface 8 including thereflective surface 7 intersect at an acute angle, it is possible to suppress chipping of thelaminate 4, and to avoid cracking caused by the chipping from reaching thereflective surface 7. As a result, theoptical waveguide 20 can be obtained as an optical waveguide capable of accurately changing the direction of an optical signal and exhibiting good transmission characteristics. - An upper limit value of the angle at which the
lateral surface 11 intersects the upper surface of theupper cladding 3 and an upper limit value of the angle at which thelateral surface 11 intersects thesectional surface 8 including thereflective surface 7 depend on the angle at which the upper surface of theupper cladding 3 intersects thesectional surface 8 including thereflective surface 7. When the angle at which the upper surface of theupper cladding 3 intersects thesectional surface 8 including thereflective surface 7 is 45 degrees, for example, the above-mentioned upper limit value is 135 degrees. - The above-described
corner portion 10 andlateral surface 11 each having the curved shape is formed, for example, by applying, after forming thecavity 6, a laser beam to a region where the upper surface of theupper cladding 3 intersects thesectional surface 8 including thereflective surface 7. - Regarding the
cavity 6, the structure in which thecorner portion 10 of theopening 9 has the curved shape, and the structure in which each of the angles of thelateral surface 11 intersecting the upper surface of theupper cladding 3 and thesectional surface 8 is 90 degrees or larger when viewed in cross-section can be formed at the same time as when carrying out the above-described laser processing. Theoptical waveguide 20 may include both of the above-mentioned structures.
Claims (5)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017126064 | 2017-06-28 | ||
| JP2017-126064 | 2017-06-28 | ||
| JP2018-010462 | 2018-01-25 | ||
| JP2018010462A JP7032942B2 (en) | 2017-06-28 | 2018-01-25 | Optical waveguide and optical circuit board |
| JP2018/010462 | 2018-01-25 |
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| Publication Number | Publication Date |
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| US10168495B1 US10168495B1 (en) | 2019-01-01 |
| US20190004248A1 true US20190004248A1 (en) | 2019-01-03 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20220317358A1 (en) * | 2021-03-30 | 2022-10-06 | Tdk Corporation | Optical device |
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| JP7118731B2 (en) | 2018-05-18 | 2022-08-16 | 新光電気工業株式会社 | Optical waveguide mounting board, optical transceiver |
| JP7280031B2 (en) * | 2018-11-14 | 2023-05-23 | 新光電気工業株式会社 | Optical waveguide mounting substrate, optical communication device, and method for manufacturing optical waveguide mounting substrate |
| US10989885B2 (en) * | 2019-05-15 | 2021-04-27 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structure and method for manufacturing the same |
| JP7352653B2 (en) * | 2019-12-20 | 2023-09-28 | 京セラ株式会社 | optical circuit board |
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