US20160238900A1 - Array substrate and liquid crystal display panel using same - Google Patents
Array substrate and liquid crystal display panel using same Download PDFInfo
- Publication number
- US20160238900A1 US20160238900A1 US14/379,288 US201414379288A US2016238900A1 US 20160238900 A1 US20160238900 A1 US 20160238900A1 US 201414379288 A US201414379288 A US 201414379288A US 2016238900 A1 US2016238900 A1 US 2016238900A1
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- Prior art keywords
- layer
- liquid crystal
- array substrate
- color filter
- source
- Prior art date
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- 239000000758 substrate Substances 0.000 title claims abstract description 125
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 59
- 239000010410 layer Substances 0.000 claims abstract description 117
- 239000004065 semiconductor Substances 0.000 claims abstract description 45
- 239000011521 glass Substances 0.000 claims abstract description 37
- 238000009413 insulation Methods 0.000 claims abstract description 33
- 239000011241 protective layer Substances 0.000 claims abstract description 27
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 18
- 239000011159 matrix material Substances 0.000 claims description 15
- 125000006850 spacer group Chemical group 0.000 claims description 15
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 9
- 229910052733 gallium Inorganic materials 0.000 claims description 9
- 229910052738 indium Inorganic materials 0.000 claims description 9
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 9
- 239000011787 zinc oxide Substances 0.000 claims description 9
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 8
- 239000010409 thin film Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 239000007787 solid Substances 0.000 description 1
Images
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G02F1/134309—Electrodes characterised by their geometrical arrangement
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- G—PHYSICS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
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- H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
- H10D86/423—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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Definitions
- the present invention relates to the field of flat panel displaying, and in particular to an array substrate and a liquid crystal display panel using the array substrate.
- LCDs Liquid crystal displays
- PDAs personal digital assistants
- LCDs liquid crystal displays
- liquid crystal displays which comprise an enclosure, a liquid crystal display panel arranged in the enclosure, and a backlight module mounted in the enclosure.
- the structure of a conventional liquid crystal display panel is composed of a color filter (CF) substrate, a thin-film transistor (TFT) array substrate, and a liquid crystal layer arranged between the two substrates and the principle of operation is that a driving voltage is applied to the two glass substrates to control rotation of the liquid crystal molecules of the liquid crystal layer in order to refract out light emitting from the backlight module for generating images. Since the liquid crystal display panel itself does not emit light, light must be provided from the backlight module in order to normally display images.
- CF color filter
- TFT thin-film transistor
- the backlight module is one of the key components of the liquid crystal displays.
- the backlight modules can be classified in two types, namely a side-edge backlight module and a direct backlight module, according to the site where light gets incident.
- the direct backlight module comprises a light source, such as a cold cathode fluorescent lamp (CCFL) or a light-emitting diode (LED), which is arranged at the backside of the liquid crystal display panel to form a planar light source directly supplied to the liquid crystal display panel.
- the side-edge backlight module comprises an LED light bar, serving as a backlight source, which is arranged at an edge of a backplane to be located rearward of one side of the liquid crystal display panel.
- the LED light bar emits light that enters a light guide plate (LGP) through a light incident face at one side of the light guide plate and is projected out of a light emergence face of the light guide plate, after being reflected and diffused, to pass through an optic film assembly so as to form a planar light source for the liquid crystal display panel.
- LGP light guide plate
- FIG. 1 a schematic view is given to show the structure of a conventional liquid crystal display panel, which comprises an array substrate 100 , a color filter (CF) substrate 300 laminated to the array substrate 100 , and a liquid crystal (LC) layer 500 arranged between the array substrate 100 and the color filter substrate 300 , wherein the color filter substrate 300 comprises a pixel structure formed thereon to realize color displaying.
- CF color filter
- LC liquid crystal
- a coplanar liquid crystal display panel (as shown in FIG. 2 ) is available, which comprises: an array substrate 100 ′, a color filter substrate 300 ′ laminated to the array substrate 100 ′, and a liquid crystal layer 500 ′ arranged between the array substrate 100 ′ and the color filter substrate 300 ′, wherein the array substrate 100 ′ comprises a thin-film transistor (TFT) array and a pixel structure formed thereon.
- TFT thin-film transistor
- the thin-film transistor array comprises: a gate terminal 102 , a gate insulation layer 104 formed on the gate terminal 102 , an oxide semiconductor 106 formed on the gate insulation layer 104 , and source/drain terminals 108 formed on the gate insulation layer 104 and the oxide semiconductor layer 106 .
- the oxide semiconductor layer 106 is generally formed of indium gallium zinc oxide (IGZO) and in the manufacturing process thereof, after formation of the oxide semiconductor layer 106 , a second metal (M 2 ) layer is formed on the oxide semiconductor layer 106 and the gate insulation layer 104 and then subjected to etching.
- IGZO indium gallium zinc oxide
- M 2 second metal
- forming of the second metal (M 2 ) layer readily causes damages to the surface of the oxide semiconductor layer 106 , making the surface of the oxide semiconductor layer 106 relatively roughened, thereby leading to worsened property of the thin-film transistor.
- the pixel structure of a pixel electrode 109 (as shown in FIG. 3 ) is an entire solid surface structure. Such a structure leads to a relatively small aperture ratio of the liquid crystal display panel, thereby resulting in poor displaying performance of the liquid crystal display panel.
- An object of the present invention is to provide an array substrate, which has a simple structure and excellent electrical property.
- Another object of the present invention is to provide a liquid crystal display panel, which has a simple structure, a large aperture ratio, and excellent displaying performance.
- the present invention provides an array substrate, which comprises: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer.
- the pixel electrode is electrically connected to the source/drain terminals.
- the pixel electrode comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
- the oxide semiconductor layer comprises an indium gallium zinc oxide layer.
- the pixel electrode is formed of nano indium tin oxide.
- the present invention also provides a liquid crystal display panel, which comprises: an array substrate, a color filter substrate laminated to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate.
- the array substrate comprises: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer.
- the pixel electrode is electrically connected to the source/drain terminals.
- the pixel electrode comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
- the oxide semiconductor layer comprises an indium gallium zinc oxide layer.
- the pixel electrode is formed of nano indium tin oxide.
- the liquid crystal display panel further comprises a black matrix and a spacer arranged between the array substrate and the color filter substrate.
- the black matrix and the spacer are formed on the color filter substrate.
- the black matrix and the spacer are formed on the array substrate.
- the present invention further provides a liquid crystal display panel, which comprises: an array substrate, a color filter substrate laminated to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate, the array substrate comprising: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer, the pixel electrode being electrically connected to the source/drain terminals, the pixel electrode comprising an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure;
- oxide semiconductor layer comprises an indium gallium zinc oxide layer.
- the pixel electrode is formed of nano indium tin oxide.
- the liquid crystal display panel further comprises a black matrix and a spacer arranged between the array substrate and the color filter substrate.
- the black matrix and the spacer are formed on the color filter substrate.
- the black matrix and the spacer are formed on the array substrate.
- the efficacy of the present invention is that the present invention provides an array substrate and a liquid crystal display panel using the array substrate, in which a color filter is arranged on the array substrate and a pixel electrode is provided in an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance. Further, a top gate structure is adopted, where source/drain terminals are formed first and then an oxide semiconductor layer is formed so as to prevent damage of the oxide semiconductor resulting from the forming of the source/drain terminals found in the known techniques, thereby effectively improving electrical property and enhancing the quality of the liquid crystal display panel.
- FIG. 1 is a cross-sectional view showing the structure of a conventional liquid crystal display panel
- FIG. 2 is a schematic view showing a conventional liquid crystal display panel having a COA (Color Filter On Array) structure
- FIG. 3 is a schematic view showing a pixel structure of the liquid crystal display panel of FIG. 2 ;
- FIG. 4 is a schematic view showing the structure of an array substrate according to the present invention.
- FIG. 5 is a schematic view showing a pixel structure of the array substrate according to the present invention.
- FIG. 6 is a schematic view showing the structure of a liquid crystal display panel according to the present invention.
- the present invention provides an array substrate, which comprises: a glass substrate 20 , source/drain terminals 22 formed on the glass substrate 20 , an oxide semiconductor layer 23 formed on the glass substrate 20 and the source/drain terminals 22 , a gate insulation layer 24 formed on the glass substrate 20 , the source/drain terminals 22 , and the oxide semiconductor layer 23 , a gate terminal 25 formed on the gate insulation layer 24 , a protective layer 26 formed on the gate insulation layer 24 and the gate terminal 25 , a color filter 27 formed on the protective layer 26 , a planarization layer 28 formed on the protective layer 26 and the color filter 27 , and a pixel electrode 29 formed on the planarization layer 28 .
- the pixel electrode 29 is electrically connected to the source/drain terminals 22 and the pixel electrode 29 comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance.
- the gate terminal 25 , the gate insulation layer 24 , the oxide semiconductor layer 23 , and the source/drain terminals 22 collectively constitute a thin-film transistor for realizing control of driving.
- the color filter 27 functions to realize color displaying.
- the oxide semiconductor layer 23 is formed on the source/drain terminals 22 so that the phenomenon of deterioration of the thin-film transistor caused by the oxide semiconductor being bombarded by the second metal layer (that is used to form the source/drain terminals specifically through the process of first forming the second metal layer through sputtering and then applying etching to pattern the second metal layer so as to form the source/drain terminals) that is found in the conventional way of forming the source/drain terminals on the oxide semiconductor layer, thereby ensuing the property of the thin-film transistor.
- the oxide semiconductor layer 23 is an indium gallium zinc oxide (IGZO) layer.
- the pixel electrode 29 is formed of nano indium tin oxide (ITO).
- the present invention further provides a liquid crystal display panel, which comprises: an array substrate 40 , a color filter substrate 60 laminated to the array substrate 40 , and a liquid crystal layer 80 arranged between the array substrate 40 and the color filter substrate 60 .
- the array substrate 40 comprises: a glass substrate 20 , source/drain terminals 22 formed on the glass substrate 20 , an oxide semiconductor layer 23 formed on the glass substrate 20 and the source/drain terminals 22 , a gate insulation layer 24 formed on the glass substrate 20 , the source/drain terminals 22 , and the oxide semiconductor layer 23 , a gate terminal 25 formed on the gate insulation layer 24 , a protective layer 26 formed on the gate insulation layer 24 and the gate terminal 25 , a color filter 27 formed on the protective layer 26 , a planarization layer 28 formed on the protective layer 26 and the color filter 27 , and a pixel electrode 29 formed on the planarization layer 28 .
- the pixel electrode 29 is electrically connected to the source/drain terminals 22 and the pixel electrode 29 comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance.
- the gate terminal 25 , the gate insulation layer 24 , the oxide semiconductor layer 23 , and the source/drain terminals 22 collectively constitute a thin-film transistor, which drives liquid crystal molecules contained in the liquid crystal layer 80 to rotate so as to realize selection of light and thus achieve displaying.
- the color filter 27 functions to realize color displaying.
- the oxide semiconductor layer 23 is formed on the source/drain terminals 22 so that the phenomenon of deterioration of the thin-film transistor caused by the oxide semiconductor being bombarded by the second metal layer (that is used to form the source/drain terminals specifically through the process of first forming the second metal layer through sputtering and then applying etching to pattern the second metal layer so as to form the source/drain terminals) that is found in the conventional way of forming the source/drain terminals on the oxide semiconductor layer, thereby ensuing the property of the thin-film transistor.
- the oxide semiconductor layer 23 is an indium gallium zinc oxide (IGZO) layer.
- the pixel electrode 29 is formed of nano indium tin oxide (ITO).
- the liquid crystal display panel of the present invention further comprises a black matrix 50 and a spacer 70 arranged between the array substrate 40 and the color filter substrate 60 .
- the black matrix 50 and the spacer 70 are formed on the color filter substrate 60 or the array substrate 40 .
- the black matrix 50 and the spacer 70 are formed on the color filter substrate 60 and are located under a common electrode 72 that is formed on the color filter substrate 60 .
- the present invention provides an array substrate and a liquid crystal display panel using the array substrate, in which a color filter is arranged on the array substrate and a pixel electrode is provided in an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance. Further, a top gate structure is adopted, where source/drain terminals are formed first and then an oxide semiconductor layer is formed so as to prevent damage of the oxide semiconductor resulting from the forming of the source/drain terminals found in the known techniques, thereby effectively improving electrical property and enhancing the quality of the liquid crystal display panel.
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Abstract
The present invention provides an array substrate and a liquid crystal display panel using the array substrate. The array substrate includes: a glass substrate (20), source/drain terminals (22) formed on the glass substrate (20), an oxide semiconductor layer (23) formed on the glass substrate (20) and the source/drain terminals (22), a gate insulation layer (24) formed on the glass substrate (20), the source/drain terminals (22), and the oxide semiconductor layer (23), a gate terminal (25) formed on the gate insulation layer (24), a protective layer (26) formed on the gate insulation layer (24) and the gate terminal (25), a color filter (27) formed on the protective layer (26), a planarization layer (28) formed on the protective layer 26 and the color filter (27), and a pixel electrode (29) formed on the planarization layer (28). The pixel electrode (29) is electrically connected to the source/drain terminals (22). The pixel electrode (29) includes an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
Description
- 1. Field of the Invention
- The present invention relates to the field of flat panel displaying, and in particular to an array substrate and a liquid crystal display panel using the array substrate.
- 2. The Related Arts
- Liquid crystal displays (LCDs) have a variety of advantages, such as thin device body, low power consumption, and being free of radiation, and are thus of wide applications, such as mobile phones, personal digital assistants (PDAs), digital cameras, computer monitors, and notebook computer screens.
- Most of the liquid crystal displays that are currently available in the market are backlighting liquid crystal displays, which comprise an enclosure, a liquid crystal display panel arranged in the enclosure, and a backlight module mounted in the enclosure. The structure of a conventional liquid crystal display panel is composed of a color filter (CF) substrate, a thin-film transistor (TFT) array substrate, and a liquid crystal layer arranged between the two substrates and the principle of operation is that a driving voltage is applied to the two glass substrates to control rotation of the liquid crystal molecules of the liquid crystal layer in order to refract out light emitting from the backlight module for generating images. Since the liquid crystal display panel itself does not emit light, light must be provided from the backlight module in order to normally display images. Thus, the backlight module is one of the key components of the liquid crystal displays. The backlight modules can be classified in two types, namely a side-edge backlight module and a direct backlight module, according to the site where light gets incident. The direct backlight module comprises a light source, such as a cold cathode fluorescent lamp (CCFL) or a light-emitting diode (LED), which is arranged at the backside of the liquid crystal display panel to form a planar light source directly supplied to the liquid crystal display panel. The side-edge backlight module comprises an LED light bar, serving as a backlight source, which is arranged at an edge of a backplane to be located rearward of one side of the liquid crystal display panel. The LED light bar emits light that enters a light guide plate (LGP) through a light incident face at one side of the light guide plate and is projected out of a light emergence face of the light guide plate, after being reflected and diffused, to pass through an optic film assembly so as to form a planar light source for the liquid crystal display panel.
- Referring to
FIG. 1 , a schematic view is given to show the structure of a conventional liquid crystal display panel, which comprises anarray substrate 100, a color filter (CF)substrate 300 laminated to thearray substrate 100, and a liquid crystal (LC)layer 500 arranged between thearray substrate 100 and thecolor filter substrate 300, wherein thecolor filter substrate 300 comprises a pixel structure formed thereon to realize color displaying. - With the progress of technology, what is currently available in a liquid crystal display panel that combines a pixel structure with an array substrate and is referred to as COA (Color Filter On Array) technology. Based on such technology, a coplanar liquid crystal display panel (as shown in
FIG. 2 ) is available, which comprises: anarray substrate 100′, acolor filter substrate 300′ laminated to thearray substrate 100′, and aliquid crystal layer 500′ arranged between thearray substrate 100′ and thecolor filter substrate 300′, wherein thearray substrate 100′ comprises a thin-film transistor (TFT) array and a pixel structure formed thereon. The thin-film transistor array comprises: agate terminal 102, agate insulation layer 104 formed on thegate terminal 102, anoxide semiconductor 106 formed on thegate insulation layer 104, and source/drain terminals 108 formed on thegate insulation layer 104 and theoxide semiconductor layer 106. Theoxide semiconductor layer 106 is generally formed of indium gallium zinc oxide (IGZO) and in the manufacturing process thereof, after formation of theoxide semiconductor layer 106, a second metal (M2) layer is formed on theoxide semiconductor layer 106 and thegate insulation layer 104 and then subjected to etching. However, forming of the second metal (M2) layer readily causes damages to the surface of theoxide semiconductor layer 106, making the surface of theoxide semiconductor layer 106 relatively roughened, thereby leading to worsened property of the thin-film transistor. - Further, in such a liquid crystal display panel, the pixel structure of a pixel electrode 109 (as shown in
FIG. 3 ) is an entire solid surface structure. Such a structure leads to a relatively small aperture ratio of the liquid crystal display panel, thereby resulting in poor displaying performance of the liquid crystal display panel. - An object of the present invention is to provide an array substrate, which has a simple structure and excellent electrical property.
- Another object of the present invention is to provide a liquid crystal display panel, which has a simple structure, a large aperture ratio, and excellent displaying performance.
- To achieve the above objects, the present invention provides an array substrate, which comprises: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer. The pixel electrode is electrically connected to the source/drain terminals. The pixel electrode comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
- The oxide semiconductor layer comprises an indium gallium zinc oxide layer.
- The pixel electrode is formed of nano indium tin oxide.
- The present invention also provides a liquid crystal display panel, which comprises: an array substrate, a color filter substrate laminated to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate. The array substrate comprises: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer. The pixel electrode is electrically connected to the source/drain terminals. The pixel electrode comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
- The oxide semiconductor layer comprises an indium gallium zinc oxide layer.
- The pixel electrode is formed of nano indium tin oxide.
- The liquid crystal display panel further comprises a black matrix and a spacer arranged between the array substrate and the color filter substrate.
- The black matrix and the spacer are formed on the color filter substrate.
- The black matrix and the spacer are formed on the array substrate.
- The present invention further provides a liquid crystal display panel, which comprises: an array substrate, a color filter substrate laminated to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate, the array substrate comprising: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer, the pixel electrode being electrically connected to the source/drain terminals, the pixel electrode comprising an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure;
- wherein the oxide semiconductor layer comprises an indium gallium zinc oxide layer.
- The pixel electrode is formed of nano indium tin oxide.
- The liquid crystal display panel further comprises a black matrix and a spacer arranged between the array substrate and the color filter substrate.
- The black matrix and the spacer are formed on the color filter substrate.
- The black matrix and the spacer are formed on the array substrate.
- The efficacy of the present invention is that the present invention provides an array substrate and a liquid crystal display panel using the array substrate, in which a color filter is arranged on the array substrate and a pixel electrode is provided in an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance. Further, a top gate structure is adopted, where source/drain terminals are formed first and then an oxide semiconductor layer is formed so as to prevent damage of the oxide semiconductor resulting from the forming of the source/drain terminals found in the known techniques, thereby effectively improving electrical property and enhancing the quality of the liquid crystal display panel.
- For better understanding of the features and technical contents of the present invention, reference will be made to the following detailed description of the present invention and the attached drawings. However, the drawings are provided for the purposes of reference and illustration and are not intended to impose limitations to the present invention.
- The technical solution, as well as other beneficial advantages, of the present invention will be apparent from the following detailed description of embodiments of the present invention, with reference to the attached drawing. In the drawing:
-
FIG. 1 is a cross-sectional view showing the structure of a conventional liquid crystal display panel; -
FIG. 2 is a schematic view showing a conventional liquid crystal display panel having a COA (Color Filter On Array) structure; -
FIG. 3 is a schematic view showing a pixel structure of the liquid crystal display panel ofFIG. 2 ; -
FIG. 4 is a schematic view showing the structure of an array substrate according to the present invention; -
FIG. 5 is a schematic view showing a pixel structure of the array substrate according to the present invention; and -
FIG. 6 is a schematic view showing the structure of a liquid crystal display panel according to the present invention. - To further expound the technical solution adopted in the present invention and the advantages thereof, a detailed description is given to a preferred embodiment of the present invention and the attached drawings.
- Referring to
FIGS. 4 and 5 , the present invention provides an array substrate, which comprises: aglass substrate 20, source/drain terminals 22 formed on theglass substrate 20, anoxide semiconductor layer 23 formed on theglass substrate 20 and the source/drain terminals 22, agate insulation layer 24 formed on theglass substrate 20, the source/drain terminals 22, and theoxide semiconductor layer 23, agate terminal 25 formed on thegate insulation layer 24, aprotective layer 26 formed on thegate insulation layer 24 and thegate terminal 25, acolor filter 27 formed on theprotective layer 26, aplanarization layer 28 formed on theprotective layer 26 and thecolor filter 27, and apixel electrode 29 formed on theplanarization layer 28. Thepixel electrode 29 is electrically connected to the source/drain terminals 22 and thepixel electrode 29 comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance. - The
gate terminal 25, thegate insulation layer 24, theoxide semiconductor layer 23, and the source/drain terminals 22 collectively constitute a thin-film transistor for realizing control of driving. Thecolor filter 27 functions to realize color displaying. - Further, since the present invention adopts a top gate structure, the
oxide semiconductor layer 23 is formed on the source/drain terminals 22 so that the phenomenon of deterioration of the thin-film transistor caused by the oxide semiconductor being bombarded by the second metal layer (that is used to form the source/drain terminals specifically through the process of first forming the second metal layer through sputtering and then applying etching to pattern the second metal layer so as to form the source/drain terminals) that is found in the conventional way of forming the source/drain terminals on the oxide semiconductor layer, thereby ensuing the property of the thin-film transistor. - In the instant embodiment, the
oxide semiconductor layer 23 is an indium gallium zinc oxide (IGZO) layer. Thepixel electrode 29 is formed of nano indium tin oxide (ITO). - Referring to
FIG. 6 , as well asFIGS. 4 and 5 , the present invention further provides a liquid crystal display panel, which comprises: anarray substrate 40, acolor filter substrate 60 laminated to thearray substrate 40, and aliquid crystal layer 80 arranged between thearray substrate 40 and thecolor filter substrate 60. Thearray substrate 40 comprises: aglass substrate 20, source/drain terminals 22 formed on theglass substrate 20, anoxide semiconductor layer 23 formed on theglass substrate 20 and the source/drain terminals 22, agate insulation layer 24 formed on theglass substrate 20, the source/drain terminals 22, and theoxide semiconductor layer 23, agate terminal 25 formed on thegate insulation layer 24, aprotective layer 26 formed on thegate insulation layer 24 and thegate terminal 25, acolor filter 27 formed on theprotective layer 26, aplanarization layer 28 formed on theprotective layer 26 and thecolor filter 27, and apixel electrode 29 formed on theplanarization layer 28. Thepixel electrode 29 is electrically connected to the source/drain terminals 22 and thepixel electrode 29 comprises an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance. - The
gate terminal 25, thegate insulation layer 24, theoxide semiconductor layer 23, and the source/drain terminals 22 collectively constitute a thin-film transistor, which drives liquid crystal molecules contained in theliquid crystal layer 80 to rotate so as to realize selection of light and thus achieve displaying. Thecolor filter 27 functions to realize color displaying. - Further, since the present invention adopts a top gate structure, the
oxide semiconductor layer 23 is formed on the source/drain terminals 22 so that the phenomenon of deterioration of the thin-film transistor caused by the oxide semiconductor being bombarded by the second metal layer (that is used to form the source/drain terminals specifically through the process of first forming the second metal layer through sputtering and then applying etching to pattern the second metal layer so as to form the source/drain terminals) that is found in the conventional way of forming the source/drain terminals on the oxide semiconductor layer, thereby ensuing the property of the thin-film transistor. - In the instant embodiment, the
oxide semiconductor layer 23 is an indium gallium zinc oxide (IGZO) layer. Thepixel electrode 29 is formed of nano indium tin oxide (ITO). - Further, the liquid crystal display panel of the present invention further comprises a
black matrix 50 and aspacer 70 arranged between thearray substrate 40 and thecolor filter substrate 60. Theblack matrix 50 and thespacer 70 are formed on thecolor filter substrate 60 or thearray substrate 40. In the instant embodiment, theblack matrix 50 and thespacer 70 are formed on thecolor filter substrate 60 and are located under acommon electrode 72 that is formed on thecolor filter substrate 60. - In summary, the present invention provides an array substrate and a liquid crystal display panel using the array substrate, in which a color filter is arranged on the array substrate and a pixel electrode is provided in an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure so as to effectively increase the aperture ratio and enhance the displaying performance. Further, a top gate structure is adopted, where source/drain terminals are formed first and then an oxide semiconductor layer is formed so as to prevent damage of the oxide semiconductor resulting from the forming of the source/drain terminals found in the known techniques, thereby effectively improving electrical property and enhancing the quality of the liquid crystal display panel.
- Based on the description given above, those having ordinary skills of the art may easily contemplate various changes and modifications of the technical solution and technical ideas of the present invention and all these changes and modifications are considered within the protection scope of right for the present invention.
Claims (14)
1. An array substrate, comprising: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer, the pixel electrode being electrically connected to the source/drain terminals, the pixel electrode comprising an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
2. The array substrate as claimed in claim 1 , wherein the oxide semiconductor layer comprises an indium gallium zinc oxide layer.
3. The array substrate as claimed in claim 1 , wherein the pixel electrode is formed of nano indium tin oxide.
4. A liquid crystal display panel, comprising: an array substrate, a color filter substrate laminated to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate, the array substrate comprising: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer, the pixel electrode being electrically connected to the source/drain terminals, the pixel electrode comprising an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure.
5. The liquid crystal display panel as claimed in claim 4 , wherein the oxide semiconductor layer comprises an indium gallium zinc oxide layer.
6. The liquid crystal display panel as claimed in claim 4 , wherein the pixel electrode is formed of nano indium tin oxide.
7. The liquid crystal display panel as claimed in claim 4 further comprising a black matrix and a spacer arranged between the array substrate and the color filter substrate.
8. The liquid crystal display panel as claimed in claim 7 , wherein the black matrix and the spacer are formed on the color filter substrate.
9. The liquid crystal display panel as claimed in claim 7 , wherein the black matrix and the spacer are formed on the array substrate.
10. A liquid crystal display panel, comprising: an array substrate, a color filter substrate laminated to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate, the array substrate comprising: a glass substrate, source/drain terminals formed on the glass substrate, an oxide semiconductor layer formed on the glass substrate and the source/drain terminals, a gate insulation layer formed on the glass substrate, the source/drain terminals, and the oxide semiconductor layer, a gate terminal formed on the gate insulation layer, a protective layer formed on the gate insulation layer and the gate terminal, a color filter formed on the protective layer, a planarization layer formed on the protective layer and the color filter, and a pixel electrode formed on the planarization layer, the pixel electrode being electrically connected to the source/drain terminals, the pixel electrode comprising an arrangement of lines that forms a radiating structure surrounding a center defined by a cross-shaped structure;
wherein the oxide semiconductor layer comprises an indium gallium zinc oxide layer.
11. The liquid crystal display panel as claimed in claim 10 , wherein the pixel electrode is formed of nano indium tin oxide.
12. The liquid crystal display panel as claimed in claim 10 further comprising a black matrix and a spacer arranged between the array substrate and the color filter substrate.
13. The liquid crystal display panel as claimed in claim 12 , wherein the black matrix and the spacer are formed on the color filter substrate.
14. The liquid crystal display panel as claimed in claim 12 , wherein the black matrix and the spacer are formed on the array substrate.
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| CN201310739586.9 | 2013-12-27 | ||
| CN201310739586.9A CN103744224A (en) | 2013-12-27 | 2013-12-27 | Array substrate and liquid crystal display panel using the same |
| PCT/CN2014/070424 WO2015096221A1 (en) | 2013-12-27 | 2014-01-09 | Array substrate and liquid crystal display panel using array substrate |
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| US20210286115A1 (en) * | 2020-03-11 | 2021-09-16 | E Ink Holdings Inc. | Display device |
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| CN106773411A (en) * | 2016-12-30 | 2017-05-31 | 深圳市华星光电技术有限公司 | Array base palte and preparation method thereof |
| CN107170754B (en) * | 2017-05-15 | 2021-04-23 | 京东方科技集团股份有限公司 | Display device, array substrate and array substrate fabrication method |
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- 2013-12-27 CN CN201310739586.9A patent/CN103744224A/en active Pending
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- 2014-01-09 WO PCT/CN2014/070424 patent/WO2015096221A1/en not_active Ceased
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| US20030071944A1 (en) * | 2001-10-11 | 2003-04-17 | Heum-Il Baek | Transflective liquid crystal display device and fabricating method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20210286115A1 (en) * | 2020-03-11 | 2021-09-16 | E Ink Holdings Inc. | Display device |
| US12276817B2 (en) * | 2020-03-11 | 2025-04-15 | E Ink Holdings Inc. | Display device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015096221A1 (en) | 2015-07-02 |
| CN103744224A (en) | 2014-04-23 |
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| AS | Assignment |
Owner name: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:TSENG, CHIHYUAN;LIEN, SHUICHIH;LO, CHANGCHENG;REEL/FRAME:033550/0421 Effective date: 20140305 |
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| STCB | Information on status: application discontinuation |
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