[go: up one dir, main page]

US20160211161A1 - Constrained die adhesion cure process - Google Patents

Constrained die adhesion cure process Download PDF

Info

Publication number
US20160211161A1
US20160211161A1 US15/084,893 US201615084893A US2016211161A1 US 20160211161 A1 US20160211161 A1 US 20160211161A1 US 201615084893 A US201615084893 A US 201615084893A US 2016211161 A1 US2016211161 A1 US 2016211161A1
Authority
US
United States
Prior art keywords
joined structure
base
adjustable mechanism
canceled
adjustable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US15/084,893
Inventor
Edmund Blackshear
Vijayeshwar D. Khanna
Oswald J. Mantilla
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alsephina Innovations Inc
Original Assignee
GlobalFoundries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GlobalFoundries Inc filed Critical GlobalFoundries Inc
Priority to US15/084,893 priority Critical patent/US20160211161A1/en
Publication of US20160211161A1 publication Critical patent/US20160211161A1/en
Assigned to GLOBALFOUNDRIES INC. reassignment GLOBALFOUNDRIES INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MANTILLA, OSWALD J., BLACKSHEAR, EDMUND, KHANNA, VIJAYESHWAR D.
Assigned to ALSEPHINA INNOVATIONS INC. reassignment ALSEPHINA INNOVATIONS INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: GLOBALFOUNDRIES INC.
Assigned to GLOBALFOUNDRIES INC. reassignment GLOBALFOUNDRIES INC. RELEASE OF SECURITY INTEREST Assignors: WILMINGTON TRUST, NATIONAL ASSOCIATION
Abandoned legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H10W72/0711
    • H10P72/76
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • H10P72/0428
    • H10W72/07178
    • H10W74/15
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49826Assembling or joining
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49998Work holding

Definitions

  • the present disclosure relates to a clamping apparatus and method for clamping a workpiece during processing.
  • An example process in the field of semiconductor manufacturing includes the process of dispensing underfill material between a chip die and a substrate such as a laminate in Flip Chip manufacturing.
  • the laminate may include a thin core or coreless organic laminate.
  • Underfill reduces the effects of mismatched coefficients of thermal expansion (CTE) between the die and laminate materials. Therefore, after curing of the underfill, the substrate or laminate is very susceptible to warping.
  • the laminate material can warp when cooling from a cure temperature. Warping is undesirable because it can lead to die cracking, thermal interface material (TIM) tearing, and ball grid array (BGA) coplanarity failure. All of which are unacceptable in meeting chip quality control standards.
  • fabrication of organic flip chip electronic modules typically includes a chip join reflow on a laminate, such as a thin-laminate organic circuit board, for example, a printed wiring board (PWB) or printed circuit board (PCB).
  • a laminate such as a thin-laminate organic circuit board, for example, a printed wiring board (PWB) or printed circuit board (PCB).
  • PWB printed wiring board
  • PCB printed circuit board
  • undesirable warpage of the laminate can be a problem.
  • Undesirable die stresses can also result from variations in the laminate shape during reflow.
  • Undesirable laminate warpage can also occur during processing of a chip/die and a laminate, for example, during flip chip fabrication which can present itself in a variety of shapes and each shape can affect the process in a different way.
  • Laminate warpage or warping may be defined by the laminate's curvature from a flat surface of the bottom of the laminate.
  • laminate warpage may be defined by a planar surface mating with the bottom of the laminate, thereby providing a horizontal plane to reference any warping of the laminate.
  • a clamping apparatus applies a force to a workpiece during processing.
  • the clamping apparatus includes a base defining a work area configured to receive a joined structure having multiple elements.
  • the base defines a recess in the work area.
  • An adjustable mechanism is configured to releasably couple to the base and apply a adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process.
  • a resilient plunger is part of the adjustable mechanism. The resilient plunger extends downwardly from a top plate of the adjustable mechanism, and the resilient plunger is configured to contact a top of a first element of the joined structure to apply the downward force.
  • a method of manufacturing a clamping apparatus for applying a force to a workpiece during processing includes the steps of: defining a work area in a base, wherein the work area is configured to receive a joined structure having multiple elements; creating a recess in the work area of the base; attaching a resilient plunger extending downwardly from a top plate of an adjustable mechanism.
  • the resilient plunger is configured to contact a top of a first element of the joined structure to apply an adjustable downward force
  • the adjustable mechanism is releasably couplable to the base for applying the adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process.
  • a method of applying a force to a workpiece during processing includes: positioning a joined structure having multiple elements in a work area of a base, wherein the base defines a recess in the work area; releasably coupling an adjustable mechanism to the base and to apply a adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process; and applying the downward force to a top of a first element of the joined structure using a resilient plunger being part of the adjustable mechanism, the resilient plunger extending downwardly from a top plate of the adjustable mechanism to contact the top of the first element apply the downward force.
  • FIG. 1 is an isometric view of a base for a clamping apparatus, according to according to an embodiment of the disclosure
  • FIG. 2 is an isometric view of the base shown in FIG. 1 holding a joined structure
  • FIG. 3 is an isometric view of the clamping apparatus including the base shown in FIGS. 1 and 2 , according to an embodiment of the disclosure, wherein an adjustable mechanism is attached to the base in an unlocked position;
  • FIG. 4 is an isometric view of the clamping apparatus as shown in FIG. 3 , wherein the adjustable mechanism is in a locked position;
  • FIG. 5 is a isometric view of a rectangular end plate according to an embodiment of the disclosure.
  • FIG. 6 is a isometric view of a circular end plate according to an embodiment of the disclosure.
  • FIG. 7 is a isometric view of a dome shaped end plate according to an embodiment of the disclosure.
  • FIG. 8 is a side elevational view of a joined structure before a curing process, according to the prior art.
  • FIG. 9 is a side elevational view of a joined structure of FIG. 8 after the curing process, according to the prior art.
  • FIG. 10 is a side elevational view of a joined structure before a curing process, according to an embodiment of the disclosure.
  • FIG. 11 is a side elevational view of the joined structure of FIG. 10 after the curing process, according to an embodiment of the disclosure.
  • the apparatus 100 (shown in FIG. 3 ) includes a base 10 defining multiple work areas 12 configured to each receive a joined structure having multiple elements.
  • the elements of the apparatus may be applied to a single workpiece using a single work area, or may have multiple work areas or be a multi module apparatus or fixture, as in the embodiment shown herein.
  • the present disclosure may refer to the apparatus elements singularly, however, it is understood that the elements may be duplicated in a multi work area apparatus as in the embodiment of the present disclosure.
  • the joined structure is a joined die 50 (shown in FIG.
  • the laminate can be an embodiment of a substrate for a joined structure, and can be a coreless laminate.
  • the base 10 includes a recess 14 in the work area 12 .
  • a frame 70 is received by the base 10 and work area 12 .
  • the frame 70 includes a receiving area for receiving the joined die 50 .
  • the receiving area of the frame 70 may include a central recessed portion such that the joined die 50 is received in a central recessed portion and flush with a perimeter of the frame 70 .
  • an adjustable mechanism 104 includes a plate 110 having resilient plungers (also can be referred to as resilient members) embodied as springs 120 attached thereto.
  • the adjustable mechanism 104 removably couples to the base 10 using opposing flanges 112 attached to opposing ends of the plate 110 .
  • the flanges 112 include attachment pins 114 for removably attaching the adjustable mechanism 104 to the base.
  • the pins 114 are threaded into the base in aligning threaded holes.
  • the springs 120 are aligned over the chips 54 .
  • the distal ends of the springs 120 mate with an end plate 130 .
  • the combination of the spring 120 and the end plate 130 form a resilient plunger which can be used to apply a downward force to the die.
  • the end plate 130 may have a predetermined shape, for example, a contour to provide an appropriate distribution of force across the die surface. For example, planar, convex, concave, or domed shaped.
  • the controlled magnitude and direction of the force is applied to the top of the die using the end plate of the plunger.
  • the amount of the force applied to the die is determined by how much biasing (bending) is desired of the joined structure to achieve the post curing affect desired. Further, the biasing or bending of the joined structure is designed to compensate for the post curing warping that occurs to achieve a flattening and a substantially planar structure after cooling from the curing process.
  • the adjustable mechanism 104 is shown being positioned in FIG. 3 , before it is in its locked position which is shown in FIG. 4 .
  • the locked position is achieved when the pins 114 are completely threaded into the holes such that the flanges 112 rest on the ledges 16 of the base 10 , as shown in FIG. 4 , and the plate 110 thereby applies a downward force 140 to the springs 120 .
  • the springs 120 apply the downward force 140 to the top of the die 54 via the end plate 130 .
  • the force applied to the die is distributed across the joined structure (or package surface), that is, the laminate.
  • the joined structure, i.e., the laminate 58 and die 54 are bent or flexed downwardly as shown in FIG.
  • the laminate of the joined structure may be bent downwardly about 50 microns from a horizontal plane.
  • the downwardly applied force 140 can also be described as bending the structure into a preflexed or prestressed or biased shape.
  • the apparatus 100 with the joined structure can be processed, for example, in a processing chamber.
  • the process can be an underfill (resin material) cure process, wherein a material is positioned between the die and the laminate. After underfill is dispensed it requires a bake operation to cure the resin or material. Underfilling with a material reduces the effects of a mismatch of coefficients of thermal expansion (CTE) between the die and laminate materials during curing. Cooling after the curing process can results in warping of a substrate, for example, the laminate 58 .
  • CTE coefficients of thermal expansion
  • the curing process can have a temperature of about 150 degrees Celsius.
  • the biased laminate 58 shown in FIG. 10 is thus processed at temperatures of about 150 degrees Celsius. After cooling from the processing, the laminate bends or warps. However, as a result of the biasing of the joined structure using the clamping apparatus, the laminate is substantially flat as shown in FIG. 11 .
  • the pre biasing of the joined structure results in a substantially planar end product after processing, in this case, a joined laminate and die, by restricting the warp effects of underfill curing.
  • the adjustable mechanism 104 is adjustable over the base by adjusting the pins 114 in the threaded holes on the ledges of the base. When the pins 114 are fully threaded and the flanges 112 are in contact with the ledges 16 of the base 10 , the adjustable mechanism is in the locked position, to apply the downward force to the joined structure. The adjustable mechanism is in an unlocked position when the side flanges 112 of the mechanism 104 are not coupled to the ledges 16 of the base 10 .
  • the end plate may be a selected shape to facilitate the joining processes and to maintain a consistent pressure on the die when the die flexes with the laminate.
  • a planar end plate 200 or a circular end plate 204 as shown in FIGS. 5 and 6 may be used.
  • a dome shaped end plate 208 as shown in FIG. 7 may also be used.
  • the dome area 212 is positioned on the top of the chip 54 .
  • One of the advantages of the present disclosure is the reduction or elimination of warping of the laminate of the joined structure as a result of curing the underfill between the die and the laminate, for example during a FCBGA (Flip Chip Ball Grid Array) semiconductor processing.
  • the present disclosure utilizes a downward force, a load, which is controlled by the apparatus 100 to control the shape of the die and laminate, or a chip substrate subassembly, during an underfill cure process.
  • the downward force as described in the present disclosure minimizes die camber and module warpage resulting from underfill cure shrinkage and differential expansion when cooling from a cure temperature.
  • a load can be applied to the laminate (or a substrate) bottom using a vacuum.
  • the present disclosure provides a clamping apparatus 100 for providing a force 140 to a workpiece, for example, a joined structure during processing according to an embodiment of the invention.
  • the clamping apparatus includes the base 10 defining the work area 12 configured to receive the joined structure having multiple elements.
  • the base defines a recess 14 in the work area of the base 10 .
  • the adjustable mechanism 110 is configured to releasably couple to the base and apply the adjustable downward force 140 to the joined structure to bend the joined structure downwardly into the recess during a process.
  • the resilient plunger 120 is part of the adjustable mechanism, and the resilient plunger extends downwardly from a top plate 111 of the adjustable mechanism 110 .
  • the resilient plunger is configured to contact a top of the first element, embodied as the die 54 , of the joined structure to apply the downward force.
  • the resilient plunger can be embodied as the spring 120 and can include the end plate attached to the distal end of the spring.
  • the apparatus and method of the present disclosure constrains the joined structure along a vertical axis, while allowing for movement along a horizontal plane due to thermal expansion, while biasing the joined structure as desired and described above.
  • the present disclosure provides a method of using a clamping apparatus for applying a force to a workpiece during processing, according to an embodiment of the invention.
  • the method of applying a force to a workpiece during processing can include positioning the joined structure 50 having multiple elements, i.e., the laminate 58 and the die 54 , in the work area 12 of the base 10 .
  • the method includes releasably coupling the adjustable mechanism 110 to the base 12 , to apply an adjustable downward force to the joined structure 50 to bend the joined structure downwardly into the recess 14 during a process.
  • the downward force 140 is applied to the top of the first element, that is, the die 54 , using the resilient plunger, for example the spring 120 and the end plate 130 , wherein the resilient plunger extends downwardly from the top plate 111 of the adjustable mechanism 110 to contact the top of the die and apply the downward force 140 .
  • the adjustable mechanism is in a locked position when the side flanges 112 attached to opposite ends of the top plate 111 are releasable coupled to the mating ledges 16 of the base 10 to apply the adjustable downward force to the joined structure.
  • ipso facto, unlocking, or the adjustable mechanism in an unlocked position includes when the side flanges of the adjustable mechanism are not coupled to the ledges.
  • the resilient member that is, the spring 120 can have a specified stiffness to exert the desired downward force.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

A clamping apparatus applies a force to a workpiece during processing. The clamping apparatus includes a base defining a work area configured to receive a joined structure having multiple elements. The base defines a recess in the work area. An adjustable mechanism is configured to releasably couple to the base and apply a adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process. A resilient plunger is part of the adjustable mechanism. The resilient plunger extends downwardly from a top plate of the adjustable mechanism, and the resilient plunger is configured to contact a top of a first element of the joined structure to apply the downward force.

Description

    CROSS REFERENCE TO RELATED APPLICATION
  • This application is a divisional of U.S. patent application Ser. No. 13/910,152 filed Jun. 5, 2013 for “CONSTRAINED DIE ADHESION CURE PROCESS” the entire contents and disclosure of which is expressly incorporated by reference herein. This application and the aforesaid U.S. patent application Ser. No. 13/910,152 are related to the following commonly-owned U.S. Patent Application filed on Jun. 5, 2013, the entire contents and disclosure of which is expressly incorporated by reference herein: U.S. patent application Ser. No. 13/910,169, for “LAMINATE PERIPHERAL CLAMPING TO CONTROL MICROELECTRONIC MODULE BSM WARPAGE”.
  • BACKGROUND
  • 1. Field
  • The present disclosure relates to a clamping apparatus and method for clamping a workpiece during processing.
  • 2. Background of the Disclosure
  • An example process in the field of semiconductor manufacturing includes the process of dispensing underfill material between a chip die and a substrate such as a laminate in Flip Chip manufacturing. The laminate may include a thin core or coreless organic laminate. Underfill reduces the effects of mismatched coefficients of thermal expansion (CTE) between the die and laminate materials. Therefore, after curing of the underfill, the substrate or laminate is very susceptible to warping. For example, the laminate material can warp when cooling from a cure temperature. Warping is undesirable because it can lead to die cracking, thermal interface material (TIM) tearing, and ball grid array (BGA) coplanarity failure. All of which are unacceptable in meeting chip quality control standards.
  • Further, fabrication of organic flip chip electronic modules typically includes a chip join reflow on a laminate, such as a thin-laminate organic circuit board, for example, a printed wiring board (PWB) or printed circuit board (PCB). During fabrication of an organic flip chip electronic module, particularly those modules using thin core and coreless organic laminates, undesirable warpage of the laminate can be a problem. Undesirable die stresses can also result from variations in the laminate shape during reflow. Undesirable laminate warpage can also occur during processing of a chip/die and a laminate, for example, during flip chip fabrication which can present itself in a variety of shapes and each shape can affect the process in a different way. Die stresses can manifest themselves as a cracked die, or separations of the dielectric layers within the die (e.g., typically, white bumps). Increased laminate warpage (also referred to as warping) during die reflow can also lead to increased module warpage at the end of a bond and assembly process, which can cause the module to fail final co-planarity specifications.
  • Laminate warpage or warping may be defined by the laminate's curvature from a flat surface of the bottom of the laminate. Alternatively, laminate warpage may be defined by a planar surface mating with the bottom of the laminate, thereby providing a horizontal plane to reference any warping of the laminate.
  • BRIEF SUMMARY
  • It would be desirable to reduces the warping of substrates such as a laminate after curing of the a joined structure including the laminate. It would therefore also be desirable to provide an apparatus and method for constraining a laminate and a joined structure or joined die.
  • In an embodiment of the present invention, a clamping apparatus applies a force to a workpiece during processing. The clamping apparatus includes a base defining a work area configured to receive a joined structure having multiple elements. The base defines a recess in the work area. An adjustable mechanism is configured to releasably couple to the base and apply a adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process. A resilient plunger is part of the adjustable mechanism. The resilient plunger extends downwardly from a top plate of the adjustable mechanism, and the resilient plunger is configured to contact a top of a first element of the joined structure to apply the downward force.
  • In another embodiment of the present invention, a method of manufacturing a clamping apparatus for applying a force to a workpiece during processing includes the steps of: defining a work area in a base, wherein the work area is configured to receive a joined structure having multiple elements; creating a recess in the work area of the base; attaching a resilient plunger extending downwardly from a top plate of an adjustable mechanism. The resilient plunger is configured to contact a top of a first element of the joined structure to apply an adjustable downward force, and the adjustable mechanism is releasably couplable to the base for applying the adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process.
  • In another embodiment of the present invention, a method of applying a force to a workpiece during processing includes: positioning a joined structure having multiple elements in a work area of a base, wherein the base defines a recess in the work area; releasably coupling an adjustable mechanism to the base and to apply a adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process; and applying the downward force to a top of a first element of the joined structure using a resilient plunger being part of the adjustable mechanism, the resilient plunger extending downwardly from a top plate of the adjustable mechanism to contact the top of the first element apply the downward force.
  • BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
  • These and other objects, features and advantages of the present invention will become apparent from the following detailed description of illustrative embodiments thereof, which is to be read in connection with the accompanying drawings. The various features of the drawings are not to scale as the illustrations are for clarity in facilitating one skilled in the art in understanding the invention in conjunction with the detailed description. In the drawings:
  • FIG. 1 is an isometric view of a base for a clamping apparatus, according to according to an embodiment of the disclosure;
  • FIG. 2 is an isometric view of the base shown in FIG. 1 holding a joined structure;
  • FIG. 3 is an isometric view of the clamping apparatus including the base shown in FIGS. 1 and 2, according to an embodiment of the disclosure, wherein an adjustable mechanism is attached to the base in an unlocked position;
  • FIG. 4 is an isometric view of the clamping apparatus as shown in FIG. 3, wherein the adjustable mechanism is in a locked position;;
  • FIG. 5 is a isometric view of a rectangular end plate according to an embodiment of the disclosure;
  • FIG. 6 is a isometric view of a circular end plate according to an embodiment of the disclosure;
  • FIG. 7 is a isometric view of a dome shaped end plate according to an embodiment of the disclosure;
  • FIG. 8 is a side elevational view of a joined structure before a curing process, according to the prior art;
  • FIG. 9 is a side elevational view of a joined structure of FIG. 8 after the curing process, according to the prior art;
  • FIG. 10 is a side elevational view of a joined structure before a curing process, according to an embodiment of the disclosure; and
  • FIG. 11 is a side elevational view of the joined structure of FIG. 10 after the curing process, according to an embodiment of the disclosure.
  • DETAILED DESCRIPTION
  • Referring to FIGS. 1-4, a clamping apparatus 100 according to an embodiment of the invention for applying a force to a workpiece during processing is discussed below. The apparatus 100 (shown in FIG. 3) includes a base 10 defining multiple work areas 12 configured to each receive a joined structure having multiple elements. The elements of the apparatus may be applied to a single workpiece using a single work area, or may have multiple work areas or be a multi module apparatus or fixture, as in the embodiment shown herein. The present disclosure may refer to the apparatus elements singularly, however, it is understood that the elements may be duplicated in a multi work area apparatus as in the embodiment of the present disclosure. In the embodiment of the present disclosure, the joined structure is a joined die 50 (shown in FIG. 2) which includes a semiconductor chip 54 on a laminate 58. The laminate can be an embodiment of a substrate for a joined structure, and can be a coreless laminate. The base 10 includes a recess 14 in the work area 12. A frame 70 is received by the base 10 and work area 12. The frame 70 includes a receiving area for receiving the joined die 50. The receiving area of the frame 70 may include a central recessed portion such that the joined die 50 is received in a central recessed portion and flush with a perimeter of the frame 70.
  • Referring to FIGS. 3 and 4, an adjustable mechanism 104 includes a plate 110 having resilient plungers (also can be referred to as resilient members) embodied as springs 120 attached thereto. The adjustable mechanism 104 removably couples to the base 10 using opposing flanges 112 attached to opposing ends of the plate 110. The flanges 112 include attachment pins 114 for removably attaching the adjustable mechanism 104 to the base. The pins 114 are threaded into the base in aligning threaded holes.
  • The springs 120 are aligned over the chips 54. The distal ends of the springs 120 mate with an end plate 130. The combination of the spring 120 and the end plate 130 form a resilient plunger which can be used to apply a downward force to the die. The end plate 130 may have a predetermined shape, for example, a contour to provide an appropriate distribution of force across the die surface. For example, planar, convex, concave, or domed shaped. The controlled magnitude and direction of the force is applied to the top of the die using the end plate of the plunger. The amount of the force applied to the die is determined by how much biasing (bending) is desired of the joined structure to achieve the post curing affect desired. Further, the biasing or bending of the joined structure is designed to compensate for the post curing warping that occurs to achieve a flattening and a substantially planar structure after cooling from the curing process.
  • The adjustable mechanism 104 is shown being positioned in FIG. 3, before it is in its locked position which is shown in FIG. 4. The locked position is achieved when the pins 114 are completely threaded into the holes such that the flanges 112 rest on the ledges 16 of the base 10, as shown in FIG. 4, and the plate 110 thereby applies a downward force 140 to the springs 120. In the locked position of the apparatus 100 shown in FIG. 4, the springs 120 apply the downward force 140 to the top of the die 54 via the end plate 130. The force applied to the die is distributed across the joined structure (or package surface), that is, the laminate. The joined structure, i.e., the laminate 58 and die 54 are bent or flexed downwardly as shown in FIG. 10. For example, the laminate of the joined structure may be bent downwardly about 50 microns from a horizontal plane. The downwardly applied force 140 can also be described as bending the structure into a preflexed or prestressed or biased shape. The apparatus 100 with the joined structure can be processed, for example, in a processing chamber. The process can be an underfill (resin material) cure process, wherein a material is positioned between the die and the laminate. After underfill is dispensed it requires a bake operation to cure the resin or material. Underfilling with a material reduces the effects of a mismatch of coefficients of thermal expansion (CTE) between the die and laminate materials during curing. Cooling after the curing process can results in warping of a substrate, for example, the laminate 58.
  • The curing process can have a temperature of about 150 degrees Celsius. The biased laminate 58 shown in FIG. 10, is thus processed at temperatures of about 150 degrees Celsius. After cooling from the processing, the laminate bends or warps. However, as a result of the biasing of the joined structure using the clamping apparatus, the laminate is substantially flat as shown in FIG. 11. Thus, the pre biasing of the joined structure results in a substantially planar end product after processing, in this case, a joined laminate and die, by restricting the warp effects of underfill curing.
  • The adjustable mechanism 104 is adjustable over the base by adjusting the pins 114 in the threaded holes on the ledges of the base. When the pins 114 are fully threaded and the flanges 112 are in contact with the ledges 16 of the base 10, the adjustable mechanism is in the locked position, to apply the downward force to the joined structure. The adjustable mechanism is in an unlocked position when the side flanges 112 of the mechanism 104 are not coupled to the ledges 16 of the base 10.
  • The end plate may be a selected shape to facilitate the joining processes and to maintain a consistent pressure on the die when the die flexes with the laminate. For example, a planar end plate 200 or a circular end plate 204 as shown in FIGS. 5 and 6 may be used. A dome shaped end plate 208 as shown in FIG. 7 may also be used. The dome area 212 is positioned on the top of the chip 54. Thus, when the joined structure is pre stressed or biased, the dome fits into the contour of the die, which is now slightly convex.
  • One of the advantages of the present disclosure is the reduction or elimination of warping of the laminate of the joined structure as a result of curing the underfill between the die and the laminate, for example during a FCBGA (Flip Chip Ball Grid Array) semiconductor processing. The present disclosure utilizes a downward force, a load, which is controlled by the apparatus 100 to control the shape of the die and laminate, or a chip substrate subassembly, during an underfill cure process. The downward force as described in the present disclosure minimizes die camber and module warpage resulting from underfill cure shrinkage and differential expansion when cooling from a cure temperature.
  • In an alternative implementation, a load can be applied to the laminate (or a substrate) bottom using a vacuum.
  • Thereby, the present disclosure provides a clamping apparatus 100 for providing a force 140 to a workpiece, for example, a joined structure during processing according to an embodiment of the invention. The clamping apparatus includes the base 10 defining the work area 12 configured to receive the joined structure having multiple elements. The base defines a recess 14 in the work area of the base 10. The adjustable mechanism 110 is configured to releasably couple to the base and apply the adjustable downward force 140 to the joined structure to bend the joined structure downwardly into the recess during a process. The resilient plunger 120 is part of the adjustable mechanism, and the resilient plunger extends downwardly from a top plate 111 of the adjustable mechanism 110. The resilient plunger is configured to contact a top of the first element, embodied as the die 54, of the joined structure to apply the downward force. The resilient plunger can be embodied as the spring 120 and can include the end plate attached to the distal end of the spring.
  • Further, the apparatus and method of the present disclosure constrains the joined structure along a vertical axis, while allowing for movement along a horizontal plane due to thermal expansion, while biasing the joined structure as desired and described above.
  • In operation, the present disclosure provides a method of using a clamping apparatus for applying a force to a workpiece during processing, according to an embodiment of the invention. The method of applying a force to a workpiece during processing can include positioning the joined structure 50 having multiple elements, i.e., the laminate 58 and the die 54, in the work area 12 of the base 10. The method includes releasably coupling the adjustable mechanism 110 to the base 12, to apply an adjustable downward force to the joined structure 50 to bend the joined structure downwardly into the recess 14 during a process. The downward force 140 is applied to the top of the first element, that is, the die 54, using the resilient plunger, for example the spring 120 and the end plate 130, wherein the resilient plunger extends downwardly from the top plate 111 of the adjustable mechanism 110 to contact the top of the die and apply the downward force 140.
  • The adjustable mechanism is in a locked position when the side flanges 112 attached to opposite ends of the top plate 111 are releasable coupled to the mating ledges 16 of the base 10 to apply the adjustable downward force to the joined structure. Thereby, ipso facto, unlocking, or the adjustable mechanism in an unlocked position, includes when the side flanges of the adjustable mechanism are not coupled to the ledges.
  • The resilient member, that is, the spring 120 can have a specified stiffness to exert the desired downward force.
  • While embodiments of the present invention has been particularly shown and described with respect to preferred embodiments thereof, it will be understood by those skilled in the art that changes in forms and details may be made without departing from the spirit and scope of the present application. It is therefore intended that the present invention not be limited to the exact forms and details described and illustrated herein, but falls within the scope of the appended claims.

Claims (20)

1. (canceled)
2. (canceled)
3. (canceled)
4. (canceled)
5. (canceled)
6. (canceled)
7. (canceled)
8. (canceled)
9. (canceled)
10. (canceled)
11. (canceled)
12. A method of manufacturing a clamping apparatus for applying a force to a workpiece during processing, comprising the steps of:
defining a work area in a base, the work area being configured to receive a joined structure having multiple elements;
creating a recess in the work area of the base; and
attaching a resilient plunger extending downwardly from a top plate of an adjustable mechanism, the resilient plunger being configured to contact a top of a first element of the joined structure to apply an adjustable downward force, the adjustable mechanism being releasably couplable to the base for applying the adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process.
13. The method of claim 12, wherein the resilient plunger includes an end plate coupled to a distal end thereof.
14. The method of claim 12, wherein the plunger includes a contoured end plate coupled to a distal end thereof, the end plate configured to contact the top of the first element of the joined structure.
15. The method of claim 12, wherein the plunger includes a convex or a concave end plate coupled to a distal end thereof, the end plate configured to contact the top of the first element of the joined structure.
16. The method of claim 12, wherein the plunger includes a dome shaped end plate coupled to a distal end thereof, the end plate configured to contact the top of the first element of the joined structure.
17. The method of claim 12, wherein the adjustable mechanism and the resilient plunger are configured to selectively apply and release the downward force to the joined structure.
18. The method of claim 12, wherein the adjustable mechanism includes a locked position wherein side flanges attached to opposite ends of the top plate are releasable coupled to mating ledges of the base to apply the adjustable downward force to the joined structure, and the adjustable mechanism includes an unlocked position wherein the side flanges are not coupled to the ledges.
19. A method of applying a force to a workpiece during processing, comprising:
positioning a joined structure having multiple elements in a work area of a base, the base defining a recess in the work area;
releasably coupling an adjustable mechanism to the base and to apply a adjustable downward force to the joined structure to bend the joined structure downwardly into the recess during a process; and
applying the downward force to a top of a first element of the joined structure using a resilient plunger being part of the adjustable mechanism, the resilient plunger extending downwardly from a top plate of the adjustable mechanism to contact the top of the first element apply the downward force.
20. The method of claim 19, further comprising:
locking the adjustable mechanism when side flanges attached to opposite ends of the top plate are releasable coupled to mating ledges of the base to apply the adjustable downward force to the joined structure; and
unlocking the adjustable mechanism when the side flanges are not coupled to the ledges.
US15/084,893 2013-06-05 2016-03-30 Constrained die adhesion cure process Abandoned US20160211161A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/084,893 US20160211161A1 (en) 2013-06-05 2016-03-30 Constrained die adhesion cure process

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/910,152 US9305894B2 (en) 2013-06-05 2013-06-05 Constrained die adhesion cure process
US15/084,893 US20160211161A1 (en) 2013-06-05 2016-03-30 Constrained die adhesion cure process

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US13/910,152 Division US9305894B2 (en) 2013-06-05 2013-06-05 Constrained die adhesion cure process

Publications (1)

Publication Number Publication Date
US20160211161A1 true US20160211161A1 (en) 2016-07-21

Family

ID=52004165

Family Applications (2)

Application Number Title Priority Date Filing Date
US13/910,152 Expired - Fee Related US9305894B2 (en) 2013-06-05 2013-06-05 Constrained die adhesion cure process
US15/084,893 Abandoned US20160211161A1 (en) 2013-06-05 2016-03-30 Constrained die adhesion cure process

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US13/910,152 Expired - Fee Related US9305894B2 (en) 2013-06-05 2013-06-05 Constrained die adhesion cure process

Country Status (1)

Country Link
US (2) US9305894B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9305894B2 (en) * 2013-06-05 2016-04-05 Globalfoundries Inc. Constrained die adhesion cure process
US9219051B2 (en) * 2013-06-05 2015-12-22 Globalfoundries Inc. Laminate peripheral clamping to control microelectronic module BSM warpage
US10170339B2 (en) * 2016-10-25 2019-01-01 Nanya Technology Corporation Semiconductor structure and a manufacturing method thereof
CN111315541B (en) * 2017-11-02 2023-09-01 环球仪器公司 Clamp and method for clamping parts before and after reflow soldering
US12249589B2 (en) * 2022-06-06 2025-03-11 Nvidia Corporation Apparatus and method for BGA coplanarity and warpage control

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4348951A (en) * 1980-11-10 1982-09-14 Lapaglia Angelo F Cottage cheese processor
US5519928A (en) * 1994-11-14 1996-05-28 Hardy; Henry R. Dental press apparatus
US5711845A (en) * 1995-03-31 1998-01-27 Sintokogio, Ltd. Device for gluing an ornamental body
US7762535B1 (en) * 2005-06-01 2010-07-27 Warwick Ideas, LLC Stave press
US20100252139A1 (en) * 2009-04-07 2010-10-07 Denso Corporation Apparatus and method for shaping electric wire for stator coil of electric rotating machine
US20140359995A1 (en) * 2013-06-05 2014-12-11 International Business Machines Corporation Constrained die adhesion cure process

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4189230A (en) 1977-10-26 1980-02-19 Fujitsu Limited Wafer holder with spring-loaded wafer-holding means
US4473455A (en) 1981-12-21 1984-09-25 At&T Bell Laboratories Wafer holding apparatus and method
US4508161A (en) 1982-05-25 1985-04-02 Varian Associates, Inc. Method for gas-assisted, solid-to-solid thermal transfer with a semiconductor wafer
US4458746A (en) 1982-05-25 1984-07-10 Varian Associates, Inc. Optimum surface contour for conductive heat transfer with a thin flexible workpiece
TW221318B (en) 1990-07-31 1994-02-21 Tokyo Electron Co Ltd
DE4100393C2 (en) 1991-01-09 1994-03-24 Rheinmetall Gmbh Process for the treatment of steel hybrid printed circuit boards
US6123864A (en) 1993-06-02 2000-09-26 Applied Materials, Inc. Etch chamber
WO1996008838A1 (en) 1994-09-15 1996-03-21 Materials Research Corporation Apparatus and method for clampling a substrate
US5817545A (en) 1996-01-24 1998-10-06 Cornell Research Foundation, Inc. Pressurized underfill encapsulation of integrated circuits
US6224936B1 (en) 1998-10-07 2001-05-01 Micron Technology, Inc. Method for reducing warpage during application and curing of encapsulant materials on a printed circuit board
US6113088A (en) * 1998-11-06 2000-09-05 Vermont American Corporation Adjustable workbench having quick action clamps
EP1220309A1 (en) 2000-12-28 2002-07-03 STMicroelectronics S.r.l. Manufacturing method of an electronic device package
US6860731B2 (en) 2001-07-09 2005-03-01 Asm Technology Singapore Pte Ltd. Mold for encapsulating a semiconductor chip
NL1019042C2 (en) 2001-09-26 2003-03-27 Europ Semiconductor Assembly E Method for encapsulating a chip and / or other object.
US6988879B2 (en) 2002-10-18 2006-01-24 Asm Technology Singapore Pte Ltd Apparatus and method for reducing substrate warpage
US6969641B2 (en) 2003-08-27 2005-11-29 Texas Instruments Incorporated Method and system for integrated circuit packaging
US7172927B2 (en) 2003-12-18 2007-02-06 Freescale Semiconductor, Inc. Warpage control of array packaging
DE102004018249B3 (en) 2004-04-15 2006-03-16 Infineon Technologies Ag Method for processing a workpiece on a workpiece carrier
DE102004020723B4 (en) 2004-04-28 2016-06-23 Thielenhaus Technologies Gmbh Method and device for clamping and subsequent machining of a workpiece
JP4353100B2 (en) 2005-01-21 2009-10-28 パナソニック株式会社 Electronic component mounting system and electronic component mounting method
JP4474303B2 (en) * 2005-03-04 2010-06-02 株式会社コガネイ Work support device
US7128313B1 (en) * 2006-02-28 2006-10-31 Pliley Larry E Support system of a tabletop vise
US7964444B2 (en) 2007-02-15 2011-06-21 International Business Machines Corporation Method and apparatus for manufacturing electronic integrated circuit chip
US7900898B2 (en) * 2007-10-12 2011-03-08 GM Global Technology Operations LLC Method and apparatus for fixturing a panel
US7926797B2 (en) * 2007-10-17 2011-04-19 Adc Telecommunications, Inc. Cable splint
US8118940B2 (en) 2008-02-07 2012-02-21 Asm Japan K.K. Clamping mechanism for semiconductor device
CN101650464B (en) * 2008-08-14 2012-06-20 鸿富锦精密工业(深圳)有限公司 Assembling device
CN101587867B (en) 2009-04-02 2011-08-24 嘉兴斯达微电子有限公司 Substrate for insulated gate bipolar type transistor module
CN101987435B (en) * 2009-07-29 2014-02-19 鸿富锦精密工业(深圳)有限公司 fixture
US20120229999A1 (en) 2011-03-08 2012-09-13 Rafiqul Hussain Circuit board clamping mechanism
US9219051B2 (en) 2013-06-05 2015-12-22 Globalfoundries Inc. Laminate peripheral clamping to control microelectronic module BSM warpage

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4348951A (en) * 1980-11-10 1982-09-14 Lapaglia Angelo F Cottage cheese processor
US5519928A (en) * 1994-11-14 1996-05-28 Hardy; Henry R. Dental press apparatus
US5711845A (en) * 1995-03-31 1998-01-27 Sintokogio, Ltd. Device for gluing an ornamental body
US7762535B1 (en) * 2005-06-01 2010-07-27 Warwick Ideas, LLC Stave press
US20100252139A1 (en) * 2009-04-07 2010-10-07 Denso Corporation Apparatus and method for shaping electric wire for stator coil of electric rotating machine
US20140359995A1 (en) * 2013-06-05 2014-12-11 International Business Machines Corporation Constrained die adhesion cure process
US9305894B2 (en) * 2013-06-05 2016-04-05 Globalfoundries Inc. Constrained die adhesion cure process

Also Published As

Publication number Publication date
US20140359995A1 (en) 2014-12-11
US9305894B2 (en) 2016-04-05

Similar Documents

Publication Publication Date Title
US20160211161A1 (en) Constrained die adhesion cure process
US8278142B2 (en) Combined metallic bonding and molding for electronic assemblies including void-reduced underfill
US8381963B2 (en) Compression-bonding apparatus
US9349628B2 (en) Method and an alignment plate for engaging a stiffener frame and a circuit board
US20110049221A1 (en) Method of joining a chip on a substrate
US7517230B2 (en) Customizable backer for achieving consistent loading and engagement of array package connections
US20070205501A1 (en) Package warpage control
US9219051B2 (en) Laminate peripheral clamping to control microelectronic module BSM warpage
US8651359B2 (en) Flip chip bonder head for forming a uniform fillet
US11621212B2 (en) Backing plate with manufactured features on top surface
EP2057672A1 (en) Method and apparatus for making semiconductor packages
US6936501B1 (en) Semiconductor component and method of manufacture
US20110147918A1 (en) Electronic device and method of producing the same
US9129942B2 (en) Method for shaping a laminate substrate
JP2015520519A (en) Fixture for forming laminated substrates
US20030027371A1 (en) Method for fabricating semiconductor-mounting body and apparatus for fabricating semiconductor-mounting body
EP1894239B1 (en) Flip chip die assembly using thin flexible substrates
US7443026B2 (en) IC chip package having force-adjustable member between stiffener and printed circuit board
US20110049702A1 (en) Semiconductor package and method of producing the same
TWI473176B (en) Package carrier board, semiconductor package support device and cleaning system
KR20150105587A (en) Apparatus for preventing warpage of semiconductor package module
US9209051B2 (en) Mounting apparatus and mounting method for flip chip bonding semiconductor chips using two-step pressing process
JP3780214B2 (en) IC pressure bonding method
JP2008210842A (en) Mounting method of electronic components with bumps
US10014273B2 (en) Fixture to constrain laminate and method of assembly

Legal Events

Date Code Title Description
AS Assignment

Owner name: GLOBALFOUNDRIES INC., CAYMAN ISLANDS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BLACKSHEAR, EDMUND;KHANNA, VIJAYESHWAR D.;MANTILLA, OSWALD J.;SIGNING DATES FROM 20160622 TO 20160921;REEL/FRAME:039958/0493

STPP Information on status: patent application and granting procedure in general

Free format text: NON FINAL ACTION MAILED

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION

AS Assignment

Owner name: ALSEPHINA INNOVATIONS INC., CANADA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:GLOBALFOUNDRIES INC.;REEL/FRAME:049709/0871

Effective date: 20181126

AS Assignment

Owner name: GLOBALFOUNDRIES INC., CAYMAN ISLANDS

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:WILMINGTON TRUST, NATIONAL ASSOCIATION;REEL/FRAME:054636/0001

Effective date: 20201117