US20160108534A1 - Aluminum deposition devices and their use in spot electroplating of aluminum - Google Patents
Aluminum deposition devices and their use in spot electroplating of aluminum Download PDFInfo
- Publication number
- US20160108534A1 US20160108534A1 US14/516,608 US201414516608A US2016108534A1 US 20160108534 A1 US20160108534 A1 US 20160108534A1 US 201414516608 A US201414516608 A US 201414516608A US 2016108534 A1 US2016108534 A1 US 2016108534A1
- Authority
- US
- United States
- Prior art keywords
- aluminum
- electrolyte
- containing electrolyte
- metallic substrate
- aluminum ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 115
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 75
- 238000009713 electroplating Methods 0.000 title claims abstract description 40
- 230000008021 deposition Effects 0.000 title description 19
- 239000003792 electrolyte Substances 0.000 claims abstract description 143
- 239000000758 substrate Substances 0.000 claims abstract description 96
- 238000000034 method Methods 0.000 claims abstract description 60
- 238000000576 coating method Methods 0.000 claims abstract description 51
- 239000011248 coating agent Substances 0.000 claims abstract description 48
- 238000007747 plating Methods 0.000 claims abstract description 46
- 230000001681 protective effect Effects 0.000 claims abstract description 27
- 238000007598 dipping method Methods 0.000 claims abstract description 4
- -1 aluminum ion Chemical class 0.000 claims description 71
- 239000002608 ionic liquid Substances 0.000 claims description 52
- 229920005597 polymer membrane Polymers 0.000 claims description 50
- 229920000642 polymer Polymers 0.000 claims description 29
- 239000011148 porous material Substances 0.000 claims description 21
- 239000010949 copper Substances 0.000 claims description 15
- 229910052802 copper Inorganic materials 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 239000000835 fiber Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 239000011888 foil Substances 0.000 claims description 7
- 239000011261 inert gas Substances 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 239000003125 aqueous solvent Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 48
- 239000000203 mixture Substances 0.000 description 39
- 239000002904 solvent Substances 0.000 description 32
- 239000012528 membrane Substances 0.000 description 29
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- 230000008569 process Effects 0.000 description 27
- 125000000217 alkyl group Chemical group 0.000 description 24
- 229910052757 nitrogen Inorganic materials 0.000 description 22
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 21
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 20
- 238000000151 deposition Methods 0.000 description 19
- 239000003446 ligand Substances 0.000 description 18
- 125000004433 nitrogen atom Chemical group N* 0.000 description 17
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 16
- 239000000499 gel Substances 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 238000012546 transfer Methods 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- 230000009471 action Effects 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- QSVCPXPVEZVSPY-UHFFFAOYSA-N 2-ethyl-1-methyl-1h-imidazol-1-ium;chloride Chemical compound [Cl-].CCC1=[NH+]C=CN1C QSVCPXPVEZVSPY-UHFFFAOYSA-N 0.000 description 9
- 125000003342 alkenyl group Chemical group 0.000 description 9
- 238000002484 cyclic voltammetry Methods 0.000 description 9
- 125000005842 heteroatom Chemical group 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- JAWZAONCXMJLFT-UHFFFAOYSA-N 4-propylpyridine Chemical compound CCCC1=CC=NC=C1 JAWZAONCXMJLFT-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 238000004070 electrodeposition Methods 0.000 description 7
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 7
- 229910052717 sulfur Chemical group 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 125000004434 sulfur atom Chemical group 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- BMQZYMYBQZGEEY-UHFFFAOYSA-M 1-ethyl-3-methylimidazolium chloride Chemical compound [Cl-].CCN1C=C[N+](C)=C1 BMQZYMYBQZGEEY-UHFFFAOYSA-M 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 230000007480 spreading Effects 0.000 description 5
- 238000003892 spreading Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 230000001464 adherent effect Effects 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 125000005234 alkyl aluminium group Chemical group 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 150000004820 halides Chemical group 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 150000003222 pyridines Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000001680 brushing effect Effects 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000011245 gel electrolyte Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 125000002883 imidazolyl group Chemical class 0.000 description 3
- 229910001867 inorganic solvent Inorganic materials 0.000 description 3
- 239000003049 inorganic solvent Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229920002239 polyacrylonitrile Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 230000000717 retained effect Effects 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 150000003457 sulfones Chemical class 0.000 description 3
- 239000011593 sulfur Chemical group 0.000 description 3
- 231100000331 toxic Toxicity 0.000 description 3
- 230000002588 toxic effect Effects 0.000 description 3
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 2
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 2
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- POKOASTYJWUQJG-UHFFFAOYSA-M 1-butylpyridin-1-ium;chloride Chemical compound [Cl-].CCCC[N+]1=CC=CC=C1 POKOASTYJWUQJG-UHFFFAOYSA-M 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 244000137852 Petrea volubilis Species 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 238000001994 activation Methods 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- CECABOMBVQNBEC-UHFFFAOYSA-K aluminium iodide Chemical compound I[Al](I)I CECABOMBVQNBEC-UHFFFAOYSA-K 0.000 description 2
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000003841 chloride salts Chemical class 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 239000011244 liquid electrolyte Substances 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002717 polyvinylpyridine Polymers 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- LRANPJDWHYRCER-UHFFFAOYSA-N 1,2-diazepine Chemical compound N1C=CC=CC=N1 LRANPJDWHYRCER-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- AIDFJGKWTOULTC-UHFFFAOYSA-N 1-butylsulfonylbutane Chemical compound CCCCS(=O)(=O)CCCC AIDFJGKWTOULTC-UHFFFAOYSA-N 0.000 description 1
- CNMFDSPKMFKEOV-UHFFFAOYSA-N 1-ethylsulfinylpropane Chemical compound CCCS(=O)CC CNMFDSPKMFKEOV-UHFFFAOYSA-N 0.000 description 1
- VTRRCXRVEQTTOE-UHFFFAOYSA-N 1-methylsulfinylethane Chemical compound CCS(C)=O VTRRCXRVEQTTOE-UHFFFAOYSA-N 0.000 description 1
- WOBARLJSXVAEGX-UHFFFAOYSA-N 1-methylsulfinylpropane Chemical compound CCCS(C)=O WOBARLJSXVAEGX-UHFFFAOYSA-N 0.000 description 1
- YBJCDTIWNDBNTM-UHFFFAOYSA-N 1-methylsulfonylethane Chemical compound CCS(C)(=O)=O YBJCDTIWNDBNTM-UHFFFAOYSA-N 0.000 description 1
- JEXYCADTAFPULN-UHFFFAOYSA-N 1-propylsulfonylpropane Chemical compound CCCS(=O)(=O)CCC JEXYCADTAFPULN-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- POXWDTQUDZUOGP-UHFFFAOYSA-N 1h-1,4-diazepine Chemical compound N1C=CC=NC=C1 POXWDTQUDZUOGP-UHFFFAOYSA-N 0.000 description 1
- JDIIGWSSTNUWGK-UHFFFAOYSA-N 1h-imidazol-3-ium;chloride Chemical compound [Cl-].[NH2+]1C=CN=C1 JDIIGWSSTNUWGK-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- OIALIKXMLIAOSN-UHFFFAOYSA-N 2-Propylpyridine Chemical compound CCCC1=CC=CC=N1 OIALIKXMLIAOSN-UHFFFAOYSA-N 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- VTWYQAQIXXAXOR-UHFFFAOYSA-N 2-methylsulfonylpropane Chemical compound CC(C)S(C)(=O)=O VTWYQAQIXXAXOR-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 1
- MSRJJSCOWHWGGX-UHFFFAOYSA-N 2h-1,3-diazepine Chemical compound C1N=CC=CC=N1 MSRJJSCOWHWGGX-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical group N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- SBLRHMKNNHXPHG-UHFFFAOYSA-N 4-fluoro-1,3-dioxolan-2-one Chemical compound FC1COC(=O)O1 SBLRHMKNNHXPHG-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- 229910018131 Al-Mn Inorganic materials 0.000 description 1
- 229910018461 Al—Mn Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- JJTVNDXEOTUSGO-UHFFFAOYSA-N C(O)(O)=O.FC(F)(F)C=CC Chemical compound C(O)(O)=O.FC(F)(F)C=CC JJTVNDXEOTUSGO-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- WRYCSMQKUKOKBP-UHFFFAOYSA-N Imidazolidine Chemical compound C1CNCN1 WRYCSMQKUKOKBP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- WYNCHZVNFNFDNH-UHFFFAOYSA-N Oxazolidine Chemical compound C1COCN1 WYNCHZVNFNFDNH-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910006095 SO2F Inorganic materials 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- ZSIQJIWKELUFRJ-UHFFFAOYSA-N azepane Chemical compound C1CCCNCC1 ZSIQJIWKELUFRJ-UHFFFAOYSA-N 0.000 description 1
- XYOVOXDWRFGKEX-UHFFFAOYSA-N azepine Chemical compound N1C=CC=CC=C1 XYOVOXDWRFGKEX-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- QPMLSUSACCOBDK-UHFFFAOYSA-N diazepane Chemical group C1CCNNCC1 QPMLSUSACCOBDK-UHFFFAOYSA-N 0.000 description 1
- 125000002576 diazepinyl group Chemical group N1N=C(C=CC=C1)* 0.000 description 1
- ZTHNOZQGTXKVNZ-UHFFFAOYSA-L dichloroaluminum Chemical compound Cl[Al]Cl ZTHNOZQGTXKVNZ-UHFFFAOYSA-L 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- PXRMLPZQBFWPCV-UHFFFAOYSA-N dioxasilirane Chemical compound O1O[SiH2]1 PXRMLPZQBFWPCV-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000002001 electrolyte material Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 1
- UJTPZISIAWDGFF-UHFFFAOYSA-N ethenylsulfonylbenzene Chemical compound C=CS(=O)(=O)C1=CC=CC=C1 UJTPZISIAWDGFF-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000006261 foam material Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 1
- 229910001623 magnesium bromide Inorganic materials 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- JCDWETOKTFWTHA-UHFFFAOYSA-N methylsulfonylbenzene Chemical compound CS(=O)(=O)C1=CC=CC=C1 JCDWETOKTFWTHA-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000013110 organic ligand Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920005569 poly(vinylidene fluoride-co-hexafluoropropylene) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007614 solvation Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 125000001984 thiazolidinyl group Chemical group 0.000 description 1
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical group C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- IBBLKSWSCDAPIF-UHFFFAOYSA-N thiopyran Chemical group S1C=CC=C=C1 IBBLKSWSCDAPIF-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- ASMAGUQIXDEQHT-UHFFFAOYSA-H trichloroalumane Chemical compound [Al+3].[Al+3].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-] ASMAGUQIXDEQHT-UHFFFAOYSA-H 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/14—Electrodes, e.g. composition, counter electrode for pad-plating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/42—Electroplating: Baths therefor from solutions of light metals
- C25D3/44—Aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
- C25D5/06—Brush or pad plating
Definitions
- the present invention relates generally to methods and aluminum-containing electrolytes useful in the electroplating of aluminum, and more particularly, to devices useful in spot plating aluminum onto various metallic substrates.
- Metal surface coating has played an important role in extending the life cycle of structural materials commonly used in large rugged equipment for use on land, air, and sea.
- Aluminum and its many versatile alloys are routinely used as surface coatings for the corrosion protection of many metals, offering both barrier and sacrificial protection.
- aluminum and its alloys are being considered as favorable alternatives for cadmium coatings on the protective shells of electrical connectors in military ground systems in view of the known toxic and carcinogenic nature of cadmium and hexavalent chromium materials.
- Electrodeposition is an attractive technique because it generally leads to thin, economical coatings that are usually adherent and do not affect the structural and mechanical properties of the substrate. Moreover, the thickness and quality of the deposits can be controlled by adjustment of the deposition rate by tuning such experimental parameters as overvoltage, current density, electrolyte composition, and temperature.
- aluminum-containing ionic liquids i.e., aluminum-containing molten salts
- the ionic liquids possess an advantageous combination of physical properties, including non-flammability, negligible vapor pressure, high ionic conductivity, and high thermal, chemical, and electrochemical stability. Therefore, they are amenable for the electroplating of reactive elements, which is impossible using aqueous or other organic solvents.
- chloroaluminate anions which are typically obtained by mixing anhydrous AlCl 3 with an organic chloride salt, such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt.
- organic chloride salt such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt.
- EMImCl 1-ethyl-3-methyl imidazolium chloride
- N-BPCl 1-(1-butyl)pyridinium chloride
- the electroplating generally must be performed in an inert gas atmosphere, which significantly increases cost and complexity of the process.
- the instant disclosure overcomes the persistent problem in the art of having to implement costly precautions against moisture during aluminum electroplating.
- the invention achieves this by employing applicator devices that include a protective structure within which an aluminum ion-containing electrolyte is incorporated, with the provision of apertures in the protective structure to permit release of the electrolyte onto a metallic substrate.
- the applicator device can be, for example, a polymer membrane, a brush plating device, or a ball pen plating device in which the electrolyte is (or can be) impregnated or incorporated.
- the electrolyte is made to be in contact with an anode in the device at the time the electrolyte is released from the protective device and applied as a coating on the substrate.
- a voltage potential is then applied between the anode and the substrate (polarized as cathode) in order to produce a coating of aluminum within an area bounded by the coating of the electrolyte.
- FIG. 1 A general schematic depicting an exemplary electroplating process using a polymer membrane, such as an ionogel or polymer gel membrane, impregnated with an aluminum-containing electrolyte.
- a polymer membrane such as an ionogel or polymer gel membrane
- FIG. 2 A general schematic depicting a portable plating brush for spot electroplating aluminum.
- FIGS. 3A, 3B Graphs showing cyclic voltammograms of a) AlCl 3 -EMIC (1.5:1) and b) AlCl 3 -4-propylpyridine (1.4:1) molten mixtures on a Pt electrode (2 mm in diameter) under a scan rate of 100 mV/s at room temperature with Al wire used as the counter and the reference electrode, wherein EMIC is an acronym for ethylmethylimidazolium chloride.
- FIGS. 4A, 4B Graphs showing cyclic voltammograms of mixtures of AlCl 3 and acetamide at a) 1:1 and b) 1.2:1 ratios on a Pt working electrode (2 mm in diameter) with Al wire as the counter and reference electrode.
- the scan rate was 10 mV/s.
- FIGS. 5A, 5B, 5C, and 5D Graphs showing cyclic voltammograms of a mixture of AlCl 3 and 4-propylpyridine (1.5:1) in a) no solvent; b) dichloromethane (DCM); c) acetonitrile (AN), and d) tetrahydrofuran (THF) on a Pt working electrode (2 mm in diameter) with Al wire as counter and reference electrode.
- the scan rate was 100 mV/s.
- FIG. 6 Photo showing an acrylamide polymer membrane containing 60 wt % of AlCl 3 -EMIC (1.5:1).
- FIG. 7 Graph showing cyclic voltammograms of the polymer membrane containing 60 wt % of 1.5:1 AlCl 3 -EMIC molten mixture at 40° C. at a scan rate of 100 mV/s. Cu and Al plates were used as working and counter electrode, respectively. The area of the working electrode was 3.75 cm 2 .
- FIGS. 8A, 8B Graphs showing cyclic voltammograms of a polymer membrane containing 60 wt % of a) AlCl 3 -4-propylpyridine (1.4:1) and b) AlCl 3 -acetamide (1.2:1) at 40° C. at a scan rate of 100 mV/s.
- Cu and Al plates were used as working and counter electrode, respectively.
- the area of the working electrode was 1.68 cm 2 .
- FIG. 9 Photo showing a portable plating brush electroplating a coating of aluminum on a copper substrate.
- FIGS. 10A, 10B Photos showing (a) macroscopic view of the aluminum coating produced by the portable plating brush shown in FIG. 9 using AlCl 3 -EtMeImCl ionic liquid electrolyte, and (b) optical micrograph (500 ⁇ ) of the same aluminum coating, wherein EtMeImCl refers to 1-ethyl-3-methylimidazolium chloride.
- the invention is directed to devices useful for spot electroplating a metallic substrate (i.e., “substrate”) with an aluminum coating.
- the devices include a protective structure in which the aluminum ion-containing electrolyte (i.e., “electrolyte”) is contained.
- the term “protective”, as used herein, indicates an ability of the protective structure to provide substantial protection from air, and particularly, moisture, as commonly found in air.
- the protective structure should ideally be capable of substantially or completely surrounding or encasing the electrolyte housed therein, except that the protective structure includes at least one aperture to permit release of the electrolyte onto a substrate.
- the number of apertures are ideally limited to the extent possible while permitting suitable release of the electrolyte.
- the electrolyte will remain contained within the protective structure unless an action effecting release is taken.
- the action effecting release may be, for example, the application of pressure to the device as provided by, for example, pressing or other means for applying of pressure.
- the action effecting release may alternatively be provided by including a releasing (i.e., transfer) feature in the device, wherein the releasing feature serves to transfer the electrolyte from inside of the protective structure to the substrate by, for example, capillary action or other spreading mechanism.
- the device when ultimately assembled, necessarily includes electrical wiring means to permit a voltage potential and current to be transmitted between the anode and substrate polarized as cathode.
- the protective structure can be made of any material non-reactive with the electrolyte.
- Some materials suitable for the protective structure include, for example, plastic, metal, glass, or ceramic, provided that the material is appropriate for the intended means for release.
- the device when ultimately assembled, also includes an anode located in a position suitable for contact with the electrolyte when the electrolyte is incorporated into the device.
- the anode can be any of the anodes well known in the art for electroplating aluminum.
- the anode is an aluminum anode.
- the anode is an inert anode, such as a porous or non-porous graphite, titanium-containing, tantalum-containing, or platinum-containing anode.
- the protective structure is a porous polymer membrane.
- the pores in the membrane serve as the at least one aperture described above.
- the term “membrane”, as used herein, refers to a shape having two of its dimensions significantly larger (typically, at least 10, 20, 50, or 100 times) than the third dimension, which can be referred to as the thickness.
- the term “membrane” may adopt the shape of a film or a sheet.
- the membrane can have any suitable thickness.
- the thickness is precisely, about, at least, greater than, up to, or less than, for example, 1, 2, 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 200, 300, 400, 500, 600, 700, 800, 900, or 1000 microns (i.e., 1000 ⁇ m, where 1000 ⁇ m is equivalent to 1 mm).
- the thickness may also be significantly larger than 1 mm, such as 2, 3, 4, 5, 6, 7, 8, 9, or 10 mm (1 cm).
- the thickness may also be within a range bounded by any two of the foregoing values.
- the term “about”, as used herein, generally indicates no more than ⁇ 10, ⁇ 5, ⁇ 2, or ⁇ 1% from an indicated value.
- the polymer membrane is part of a layered or laminate structure in which the polymer membrane is in contact with or bonded to an anode layer, such as a layer (e.g., sheet or foil) of aluminum, aluminum alloy, or inert anode material.
- anode layer such as a layer (e.g., sheet or foil) of aluminum, aluminum alloy, or inert anode material.
- a portion of the polymer membrane should be left uncovered to permit the uncovered portion of the polymer membrane to make contact with the substrate.
- the anode layer can be in contact with or bonded with one side of the polymer membrane with the other side of the polymer membrane uncovered.
- the polymer membrane includes macropores, which are typically pores having a size (typically diameter, for circular pores) of above 50 nm.
- the macropores have a size of precisely, about, at least, or greater than 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm, 200 nm, 225 nm, 250 nm, 275 nm, 300 nm, 325 nm, 350 nm, 375 nm, 400 nm, 425 nm, 450 nm, 475 nm, 500 nm, 550 n
- the polymer membrane includes mesopores, which are typically pores having a size of at least 2 nm and up to 50 nm.
- the mesopores have a size of precisely or about 2 nm, 2.5 nm, 3 nm, 3.5 nm, 4 nm, 4.5 nm, 5 nm, 5.5 nm,6 nm, 6.5 nm, 7 nm, 7.5 nm, 8 nm, 8.5 nm, 9 nm, 9.5 nm, 10 nm, 11 nm, 12 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, or 50 nm, or a particular size, or a variation of sizes, within a range bounded by any two of the foregoing values.
- the polymer membrane includes micropores, which are typically pores having a size of less than 2 nm.
- the micropores have a size of precisely, about, up to, or less than 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7, 1.8, or 1.9 nm, or a particular size, or a variation of sizes, within a range bounded by any two of the foregoing values.
- only one type of pore is included in the polymer membrane, or one or more types of pores may be excluded.
- two or three of any of the types of pores are included, e.g., macropores and mesopores; or mesopores and micropores; or macropores, mesopores, and micropores.
- the pore sizes may be distributed within an overlapping range bounded by any two of the exemplary pore sizes provided above.
- the distribution of pore sizes may be within a single pore size distribution (i.e., monomodal) or be within more than one pore size distribution (e.g., bimodal or trimodal), as typically characterized by a pore volume vs. pore size distribution plot.
- the polymer membrane can have any polymeric composition, provided that it is substantially unreactive with all components of the electrolyte and can function to retain the electrolyte and release the electrolyte as intended.
- the polymer is preferably flexible to the extent that it can closely follow and make consistent contact with the contours of the substrate surface on which it is being applied.
- the polymer membrane may be required to bend or wrap around non-planar portions of the substrate.
- the polymer membrane can be constructed of, for example, a vinyl-addition polymer, polyalkylene oxide (e.g., polyethylene oxide or polypropylene oxide or co-polymer thereof), polyurethane, polyester, or polyurea.
- the polymer may include a substantial inorganic component, such as found in the sol gels, polysiloxanes (e.g., polyorganosiloxanes), and hybrid organic-inorganic materials.
- the polymer may be an ionogel, including those based on ionic liquid hybrid materials, as described, for example, in Chen et al., Applied Materials & Interfaces, vol. 6, pp. 7840-7845, 2014; Le Bideau, et al., Chem. Soc. Rev., 40(2):907-25, Feb. 2011; Neouze et al., Chem. Mater., 18(17), pp. 3931-3936, 2006; and U.S. Pat. No. 8,163,834, the contents of which are herein incorporated by reference in their entirety.
- the polymer membrane is constructed, at least partially, of a vinyl-addition polymer.
- a vinyl-addition polymer refers to any of those polymers, known in the art, derived from the addition polymerization of unsaturated monomers.
- vinyl-addition polymers include, polyacrylamide, polyethylene, polypropylene, polyvinylpyridine, polyacrylate, polymethacrylate, polybutadiene, polyacrylonitrile, polystyrene, and fluorinated versions (e.g., polyvinylidene fluoride and polyhexafluoropropylene).
- a homopolymer is used, while in other embodiments a copolymer is used, wherein the copolymer can include two, three, or more different monomers, and can be arranged, for example, as a block, alternating, graft, or periodic copolymer.
- porous polymer membranes are known in the art, with many of them suited to function as materials that can be impregnated with aluminum-containing electrolytes for purposes of the instant invention.
- the porous polymer membrane can be prepared by methods well known in the art, such as by polymerization in the presence of a templating agent or volatile or porogenic substance. Drying and/or heating may be employed to aid in the production of pores.
- the electrolyte is incorporated into the porous polymer membrane by impregnating the porous polymer membrane with the electrolyte, e.g., by absorption, which typically involves capillary action.
- the electrolyte is incorporated into the porous polymer membrane by forming the porous polymer membrane from a reaction solution that includes the monomers and the electrolyte. In the latter case, the electrolyte becomes entrapped within spaces of the polymer as the polymer is being formed from the monomers.
- the transferring means should be capable of transferring the electrolyte by a process in which the transferring means makes direct contact with the substrate on which the electrolyte is being applied. If the transferring means works by indirect application (e.g., by spraying), a voltage potential cannot be made between the cathodic substrate and anode. For this reason, spraying may not be considered. However, spraying may be considered if the coating of electrolyte made by spraying is subsequently made to be in electrical communication with the anode so that a voltage potential between the anode and cathodic substrate can be established.
- the electrolyte may be rendered highly viscous (e.g., by inclusion of viscosity enhancing agents or hardening agents) so as to form an adherent coating (i.e., retained film) that maintains its shape with minimal spreading over time, and the adherent coating subsequently contacted with an anode in interconnection with the cathodic substrate to form a coating of aluminum.
- adherent coating may be applied by, for example, spraying or painting (e.g., brushing or rolling).
- the coating may also include a component (e.g., photoresponsive ionogel or crosslinkable agent) that may function to harden the coating upon exposure to a stimulus, such as by irradiation or chemical treatment.
- the transferring means works by transferring the electrolyte by capillary action.
- Such transferring means may include, for example, fibers (e.g., filaments or strands), which may or may not be hollow.
- fibers e.g., filaments or strands
- the transferring means may be a soft foam material capable of becoming impregnated or saturated with the electrolyte.
- the transferring means works by transferring the electrolyte by active spreading.
- the active spreading is achieved by using mechanical action to move a transferring element in such a manner that movement of the transferring element transfers electrolyte from the compartment reservoir to an area outside the compartment.
- the spreading means can be, for example, a rotatable ball traversing an aperture in the compartment, wherein the rotatable ball is in contact with electrolyte in the compartment and can transfer electrolyte to a region outside of the compartment by being rotated, e.g., as in a ball point pen.
- the ball may be non-porous, in which case only the surface of the ball functions to spread the electrolyte.
- the ball may be porous, in which case the interior and surface of the ball function to transfer and spread the electrolyte.
- the above-described applicator device can be referred to as a “ball pen plating device”.
- the transferring means may be a roller, with a mechanism simulating a paint roller, instead of a ball.
- the roller may be porous or non-porous, as described above for the rotatable ball.
- the above-described applicator device can be referred to as a “roll plating device”.
- the ball pen or roll plating device may or may not work in concert with an active transfer element, such as a pumping element, to improve transfer of the electrolyte to the ball or roller element.
- the aluminum ion-containing electrolyte can be any of the liquid aluminum-containing electrolytes known in the art useful in electroplating a layer of aluminum onto a metallic substrate.
- the electrolyte should be suitably conductive.
- the electrolyte includes aluminum ions and counterions dissolved in a non-aqueous solvent, e.g., an alkyl aluminum or aluminum halide compound dissolved in an organic (non-aqueous) solvent, such as an alkyl aluminum fluoride dissolved in toluene (as in the SIGAL® process) or use of another organic solvent, such as benzene, cyclohexane, tetrahydrofuran, or dimethyl sulfide.
- a non-aqueous solvent e.g., an alkyl aluminum or aluminum halide compound dissolved in an organic (non-aqueous) solvent, such as an alkyl aluminum fluoride dissolved in toluene (as in the SIGAL® process) or use of another organic solvent, such as benzene, cyclohexane, tetrahydrofuran, or dimethyl sulfide.
- the electrolyte includes an aluminum-containing ionic liquid (i.e., as an aluminum-containing molten salt or solution of ionic liquid in a solvent).
- an aluminum-containing ionic liquid i.e., as an aluminum-containing molten salt or solution of ionic liquid in a solvent.
- the aluminum-containing ionic liquid can be those, well known in the art, which include chloroaluminate anions, such as those obtained by mixing anhydrous AlCl 3 with an organic chloride salt, such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt.
- chloroaluminate anions such as those obtained by mixing anhydrous AlCl 3 with an organic chloride salt, such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt.
- organic chloride salt such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt.
- EMImCl 1-ethyl-3-methyl imidazolium chloride
- the electrolyte is exclusively or includes an ionic liquid composition containing a trihalo aluminum (III) species complexed with at least one organic uncharged (neutral) ligand (also referred to as “ligand”).
- the halogen atoms in the trihalo aluminum (III) species can be selected from any of the halogens, i.e., fluorine, chlorine, bromine, and iodine, which respectively correspond to aluminum fluoride (AlF 3 ), aluminum chloride (AlCl 3 ), aluminum bromide (AlBr 3 ), and aluminum iodide (AlI 3 ), and multiples thereof, such as the dimer Al 2 Cl 6 .
- the ionic liquids described above can be conveniently described according to the general stoichiometric formula AlX 3 .L n , where X is a halogen atom, L is an organic uncharged ligand, and n is an integer of at least 1, typically 1, 2, or 3. Molecules of solvation (i.e., adducts) may or may not also be included in the formula. Multiples of the foregoing general formula (e.g., Al 2 X 6 .L 2n ) are also embraced by the general formula.
- the term “complex” or “complexed”, as used herein, indicates a bonding interaction between the neutral organic ligand and the aluminum ion.
- the association between the aluminum ion and ligand in the above-described ionic liquid is typically a dative covalent interaction, generally between the electron-deficient aluminum ion and electron-donating heteroatom in the ligand.
- the ligand considered in the above-described ionic liquid is uncharged, there is no ionic bonding between the aluminum ion and the ligand.
- an ionic association between the aluminum ion and the halide atoms which provides the ionic character of the composition.
- the organic uncharged ligand particularly considered herein is or includes a ring structure having at least three ring carbon atoms and at least one ring heteroatom selected from nitrogen and sulfur.
- the ring heteroatoms may be selected from only nitrogen atoms, or only sulfur atoms, or a combination of nitrogen and sulfur atoms, or a combination of nitrogen and oxygen atoms, or a combination of sulfur and oxygen atoms.
- the ring structure may be unsaturated (e.g., aliphatic or aromatic) or saturated.
- the ring structures generally contain a total of five, six, or seven ring atoms (i.e., five-, six-, or seven-membered rings), at least three of which are ring carbon atoms and at least one of which is a heteroatom.
- the ring structure includes one, two, or three ring heteroatoms.
- Some examples of five-membered unsaturated rings containing at least one ring nitrogen atom include pyrrole, imidazole, pyrazole, oxazole, isoxazole, thiazole, and the triazole rings (i.e., 1,2,3-triazole and 1,2,4-triazole).
- Some examples of six-membered unsaturated rings containing at least one ring nitrogen atom include pyridine, pyrazine, pyrimidine, pyridazine, 1,3,5-triazine, and oxazine rings.
- seven-membered unsaturated rings containing at least one ring nitrogen atom include azepine and the diazepine rings (e.g., 1,2-diazepine, 1,3-diazepine, and 1,4-diazepine).
- Some examples of five-membered saturated rings containing at least one ring nitrogen atom include pyrrolidine, imidazolidine, oxazolidine, and thiazolidine rings. Some examples of six-membered saturated rings containing at least one ring nitrogen atom include piperidine, piperazine, morpholine, and thiomorpholine rings. Some examples of seven-membered saturated rings containing at least one ring nitrogen atom include azepane and diazepane rings.
- unsaturated rings containing at least one ring sulfur atom include thiophene, thiazole, isothiazole, and thiadiazole rings.
- saturated rings containing at least one ring sulfur atom include tetrahydrothiophene and thiopyran rings.
- the ring structure containing the at least one heteroatom may or may not also be fused to another ring, thereby resulting in a fused ring structure.
- fused ring structures include indole, purine, quinoline (benzopyridine), isoquinoline, benzimidazole, benzoxazole, benzothiazole, benzoxazoline, benzothiophene, benzoxazine, and phenoxazine.
- the ring structure of the uncharged ligand includes at least one alkyl substituent (i.e., alkyl group) containing at least one carbon atom.
- the alkyl substituent can improve the properties of the ionic liquids, particularly by decreasing their melting points, and preferably making them room temperature ionic liquids.
- the alkyl group can include precisely or at least one, two, three, four, five, six, seven, eight, nine, ten, eleven, or twelve carbon atoms, or a number of carbon atoms within a range bounded by any two of the foregoing numbers.
- the alkyl group can be straight-chained or branched.
- straight-chained alkyl groups include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, and n-dodecyl groups.
- branched alkyl groups include isopropyl, isobutyl, sec-butyl, t-butyl, isopentyl, neopentyl, 2-methylpent-1-yl, 3-methylpent-1-yl, isohexyl, isoheptyl, and isooctyl groups.
- the ring structure of the uncharged ligand includes at least one alkenyl substituent (i.e., alkenyl group) containing at least two carbon atoms and the presence of at least one carbon-carbon double bond.
- the alkenyl substituent can also improve the properties of the ionic liquids, particularly by decreasing their melting points, and preferably making them room temperature ionic liquids.
- the alkenyl group can include precisely or at least two, three, four, five, six, seven, eight, nine, ten, eleven, or twelve carbon atoms, or a number of carbon atoms within a range bounded by any two of the foregoing numbers.
- the alkenyl group can be straight-chained or branched.
- straight-chained alkenyl groups include vinyl, propen-1-yl (allyl), 3-buten-1-yl (CH 2 ⁇ CH—CH 2 —CH 2 —), 2-buten-1-yl (CH 2 —CH ⁇ CH—CH 2 —), butadienyl, 4-penten-1-yl, 3-penten-1-yl, 2-penten-1-yl, 5-hexen-1-yl, 6-hepten-1-yl, and the like.
- branched alkenyl groups include propen-2-yl, 1-buten-3-yl (CH 2 ⁇ CH—CH.—CH 3 ), 1-buten-2-yl (CH 2 ⁇ C.—CH 2 —CH 3 ), 1-penten-4-yl, 1-penten-3-yl, 2-penten-4-yl, 2-penten-3-yl, and 1,4-pentadien-3-yl.
- the at least one alkyl or alkenyl group attached to the ring structure is composed of only carbon and hydrogen atoms.
- the alkyl or alkenyl group may include one or more heteroatoms, such as one or more selected from oxygen, nitrogen, sulfur, and halogen atoms.
- an alkyl group substituted with at least one heteroatom is an alkyl group containing at least one oxygen atom, e.g., a hydroxy group (OH), or ether group (—O—) as found in the alkoxides (i.e., —OR, where R is an alkyl group with or without further heteroatom substitution) or groups of the general formula —(CH 2 ) s —(O—CH 2 CH 2 ) t H, where s is 0 or an integer from 1 to 12 and t is 0 or an integer from 1-12.
- a protic group such as OH
- the alkyl group may be a partially or completely fluorinated alkyl group, such as CF 3 , or CF 2 CF 3 , or a fluorinated sulfone, such as —SO 2 F or —SO 2 CF 3 .
- the at least one alkyl or alkenyl substituent can be included on the ring structure provided that it does not result in a charged ligand.
- the alkyl or alkenyl substituent in the case of an unsaturated ring, the alkyl or alkenyl substituent must not be located on a ring nitrogen atom if the nitrogen atom is part of an unsaturated bond, since this would result in a positively charged ring nitrogen atom (i.e., the alkyl or alkenyl substituent can only be located on a ring carbon atom in that case).
- the ring nitrogen atom is not part of an unsaturated bond (either in an unsaturated or saturated ring), then the ring nitrogen atom can bear a single alkyl or alkenyl substituent while remaining uncharged, as long as the ring nitrogen atom is not part a fused side of a fused ring system.
- the alkyl or alkenyl substituent must not be located on a ring sulfur atom since this would result in a positively charged ring sulfur atom.
- the ionic liquid is or includes an alkyl-substituted or alkenyl-substituted pyridine or imidazole ring, wherein the alkyl or alkenyl substituent is on a ring carbon atom of the pyridine or imidazole ring.
- the alkyl-substituted pyridine ligand can be, for example, a 2-alkyl-pyridine, 3-alkyl-pyridine, 4-alkyl-pyridine, 2,3-dialkyl-pyridine, 2,4-dialkyl-pyridine, 3,4-dialkyl-pyridine, 2,3,4-trialkyl-pyridine, 3,4,5-trialkyl-pyridine, or 2,3,5-trialkyl-pyridine, wherein it is understood that the number designating the alkyl group is relative to the location of the ring nitrogen atom, where the ring nitrogen atom is designated as position 1 (thus, a 4-alkyl-pyridine contains the alkyl group in a position directly opposite from the ring nitrogen atom in the pyridine ring).
- the alkyl-substituted imidazole ligand can be, for example, a 2-alkylimidazole, 4-alkylimidazole, 2,4-dialkylimidazole, 4,5-dialkylimidazole, or, 2,4,5-trialkylimidazole, wherein it is understood that the number designating the alkyl group is relative to the location of the ring nitrogen atoms, which occupy positions 1 and 3 on the imidazole ring.
- the alkyl group in any of the above exemplary alkyl-substituted pyridine or imidazole ligands can be replaced with an alkenyl group to provide an equal number of exemplary alkenyl-substituted pyridine and imidazole ligands.
- the ring may also include a combination of alkyl and alkenyl groups.
- the alkyl-substituted ring contains no substituent other than one or more alkyl and/or alkenyl substituents, i.e., remaining positions on the ring are occupied by hydrogen atoms.
- the ionic liquid described herein is typically a liquid at room temperature (e.g., 15, 18, 20, 22, 25, or 30° C.) or lower. However, in some embodiments, the ionic liquid may not be a liquid at room temperature, but becomes a liquid at a higher temperature than 30° C. if it is used at an elevated temperature that melts the compound to be an ionic liquid. Thus, in some embodiments, the ionic liquid may have a melting point of up to or less than 100, 90, 80, 70, 60, 50, 40, or 35° C. In other embodiments, the ionic liquid may be a liquid at a temperature of or less than 100, 90, 80, 70, 60, 50, 40, or 35° C.
- the ionic liquid is a liquid at or below 10, 5, 0, ⁇ 10, ⁇ 20, ⁇ 30, or ⁇ 40° C.
- liquid indicates an ability of the substance to readily flow, typically no more than about 1,000 centipoise (1,000 cP).
- the viscosity of the ionic liquid is up to or less than, for example, 1,000, 800, 700, 600, 500, 400, 300, 200, 100, 50, 25, 10, 5, or 1 cP, or a viscosity within a range bounded by any two of these values.
- the ionic liquids described above are generally prepared by combining and mixing an aluminum trihalide (e.g., AlCl 3 ) and the organic neutral ligand in the liquid state in a molar ratio that produces a composition that behaves as an ionic liquid at a desired temperature, such as room temperature.
- the mixture is heated to ensure dissolution of the aluminum trihalide in the organic neutral ligand.
- the ratio of aluminum trihalide to organic neutral ligand is precisely or about, for example, 0.5:1, 0.6:1, 0.7:1, 0.8:1, 0.9:1, 1:1, 1.1:1, 1.2:1, 1.3:1, 1.4:1, 1.5:1, 1.6:1, 1.7:1, 1.8:1, 1.9:1, or 2:1, or a ratio within a range bounded by any two of the foregoing values.
- the electrolyte (electroplating solution) contains the ionic liquid in the substantial or complete absence of a solvent, i.e., typically as a molten form of the ionic liquid.
- the electrolyte contains the ionic liquid in admixture with one or more solvents.
- the solvent may function, for example, to help solubilize other components in the electrolyte (e.g., an electrolyte salt), improve wettability, or improve qualities of the aluminum deposit.
- the one or more solvents can be selected from any of the organic and inorganic solvents known in the art, provided that the solvent or solvent mixture does not adversely react or interact with the ionic liquid or the plating process.
- the solvent or solvent mixture should be completely miscible with the ionic liquid and any other components that may be included in the electrolyte.
- the organic solvent can be ionic or non-ionic.
- the ionic solvent can be any of the ionic liquids of the art or as described herein.
- the non-ionic solvent can be, for example, a hydrocarbon, alcohol, ketone, carbonate, sulfone, siloxane, ether, nitrile, sulfoxide, or amide solvent, or a mixture thereof.
- hydrocarbon solvents include hexanes, cyclohexane, benzene, toluene, decalin, and xylenes, or halogenated versions of hydrocarbons, e.g., methylene chloride, trichloroethylene, or perchlorethylene.
- alcohol solvents include methanol, ethanol, n-propanol, isopropanol, n-butanol, and isobutanol, and the diols, such as ethylene glycol, diethylene glycol, and triethylene glycol.
- ketone solvents include acetone and 2-butanone.
- carbonate solvents include propylene carbonate (PC), ethylene carbonate (EC), butylene carbonate (BC), dimethyl carbonate (DMC), and fluorocarbonate solvents (e.g., fluoroethylene carbonate and trifluoromethyl propylene carbonate).
- sulfone solvents include methyl sulfone, ethyl methyl sulfone, methyl phenyl sulfone, methyl isopropyl sulfone (MiPS), propyl sulfone, butyl sulfone, tetramethylene sulfone (sulfolane), and phenyl vinyl sulfone.
- siloxane solvents include hexamethyldisiloxane (HMDS), 1,3-divinyltetramethyldisiloxane, the polysiloxanes, and polysiloxane-polyoxyalkylene derivatives.
- HMDS hexamethyldisiloxane
- 1,3-divinyltetramethyldisiloxane 1,3-divinyltetramethyldisiloxane
- the polysiloxanes 1,3-divinyltetramethyldisiloxane
- polysiloxane-polyoxyalkylene derivatives examples include hexamethyldisiloxane (HMDS), 1,3-divinyltetramethyldisiloxane, the polysiloxanes, and polysiloxane-polyoxyalkylene derivatives.
- ether solvents include 1,2-dimethoxyethane, 1,2-diethoxyethane, 1,3-dioxolane, tetrahydrofuran, 2-methyltetrahydrofuran, tetrahydropyran, diglyme, triglyme, 1,3-dioxolane, and the fluorinated ethers (e.g., mono-, di-, tri-, tetra-, penta-, hexa- and per-fluoro derivatives of any of the foregoing ethers).
- fluorinated ethers e.g., mono-, di-, tri-, tetra-, penta-, hexa- and per-fluoro derivatives of any of the foregoing ethers.
- nitrile solvents include acetonitrile, propionitrile, and butyronitrile.
- sulfoxide solvents include dimethyl sulfoxide, ethyl methyl sulfoxide, diethyl sulfoxide, methyl propyl sulfoxide, and ethyl propyl sulfoxide.
- amide solvents include formamide, N,N-dimethylformamide, N,N-diethylformamide, acetamide, N,N-dimethylacetamide, N,N-diethylacetamide, gamma-butyrolactam, and N-methylpyrrolidone.
- organic solvents include hexamethylphosphoramide (HMPA) and 1,3-dimethyl-3,4,5,6-tetrahydro-2(1H)-pyrimidinone (DMPU).
- HMPA hexamethylphosphoramide
- DMPU 1,3-dimethyl-3,4,5,6-tetrahydro-2(1H)-pyrimidinone
- the inorganic solvent is other than water, such as carbon disulfide or supercritical carbon dioxide.
- any one or more of the above classes or specific types of solvents are excluded from the electroplating solution.
- the one or more ionic liquids can be included in any suitable amount, typically at least 10 wt % by weight of solvent and ionic liquid.
- the ionic liquid is included in an amount of precisely, about, at least, or above, for example, 10, 15, 20, 25, 30, 35, 40, 45, 50, 60, 70, 80, 90, 95, 98, or 100 wt % by weight of the ionic liquid plus solvent, or an amount within a range bounded by any two of the foregoing exemplary values.
- one or more salts of an alkali or alkaline earth metal is included in the electrolyte to increase the conductivity of the electrolyte or to improve aspects of the aluminum deposit.
- the salt should be completely dissolved in the electrolyte at the temperature employed for electroplating.
- the salt can be, for example, a halide of an alkali or alkaline earth metal.
- alkali halides include lithium chloride, lithium bromide, sodium fluoride, sodium chloride, sodium bromide, potassium chloride, and potassium bromide.
- alkaline earth halides include magnesium chloride, magnesium bromide, and calcium chloride.
- the salt can be included in any desired amount in the electrolyte to suitably adjust the conductivity of the electrolyte or other aspects of the process.
- the salt is included in an amount of 0.1, 0.5, 1, 2, 5, 10, 15, or 20 wt % by weight of the electrolyte, or in an amount within a range bounded by any two of the foregoing values.
- the instant disclosure is directed to methods for electroplating aluminum onto a metallic substrate by use of any of the spot plating applicator devices described above.
- spot electroplating (or equivalently, “spot plating”), as used herein, is meant to indicate a process of electroplating in which the substrate is not submerged or dipped into an electroplating bath, and instead, electroplated in one or more regions of the substrate outside of an electroplating bath.
- the one or more regions of the substrate being plated each typically define a surface area less than the total surface area of the substrate.
- the instant invention contemplates the possibility where a substantial or total platable surface area of a substrate is aluminum plated by the spot plating process disclosed herein, with a result similar or commensurate to what would be provided by the substrate being submerged in an aluminum electroplating bath.
- any of the applicator devices described above, charged with aluminum-containing electrolyte is manipulated to release the electrolyte to form a coating of the electrolyte on the metal substrate.
- a suitable voltage potential is maintained across the anode and the substrate polarized as cathode in order to convert the electrolyte coating into a coating of aluminum.
- the anode should be in contact with the electrolyte (typically, in contact with the electrolyte reservoir, but possibly in direct contact with the coating).
- the anode is at least partially submerged within the electrolyte contained in the compartment.
- the polymer membrane may be contacted with the substrate and suitably pressed to release the electrolyte from pores therein to form a coating on the substrate.
- the polymer membrane includes fastening means (e.g., tape, or hook and loop fastener, such as Velcro®) to keep the polymer membrane firmly applied onto the substrate (e.g., by wrapping onto itself) and to compress the polymer membrane to encourage egress of the electrolyte.
- the polymer membrane has a sticky or tacky quality that keeps it firmly affixed to the substrate.
- a voltage potential is applied between an aluminum anode (e.g., aluminum foil), which is in contact with the polymer membrane (typically, the side opposite to the side in contact with the substrate), and the metallic substrate polarized as cathode to form a coating of aluminum on the substrate.
- the aluminum coating is necessarily within or defined by the area bounded by the coating of electrolyte.
- the polymer membrane can then be removed to reveal the freshly coated layer of aluminum. If necessary, the polymer membrane can be recharged with electrolyte before being used to spot plate a different, overlapping, or same section of the substrate, or before spot plating a different substrate.
- the fibers of the brush once saturated with electrolyte by capillary action or by application of pressure (e.g., by a pump on the electrolyte reservoir), are contacted with the substrate to deposit a coating of electrolyte on the substrate.
- a voltage potential is applied between the anode (in contact with the electrolyte reservoir) and the metallic substrate polarized as cathode to form a coating of aluminum on the substrate.
- electrolyte is made to coat or saturate the ball or roller along with suitable mechanical action to transfer electrolyte from the ball or roller onto the substrate to deposit a coating of electrolyte on the substrate.
- a voltage potential is applied between the anode (in contact with the electrolyte reservoir) and the metallic substrate polarized as cathode to form a coating of aluminum on the substrate.
- the metallic (conductive) substrate can have any composition for which deposition of aluminum may be desired.
- the metallic substrate may include, for example, one or more metals selected from titanium, tantalum, iron, cobalt, nickel, copper, and zinc, and thus, may be a substantially pure metal or a binary, ternary, or higher alloy.
- the metallic substrate is iron, or an iron-containing alloy, such as a steel.
- the electroplating process can employ any of the conditions (e.g., temperature, concentration, voltage, current density, etc.) commonly used in the art of aluminum electroplating, provided that the conditions are suitably adjusted and modified, if necessary, to accommodate the novel electroplating processes and/or aluminum-containing electrolytes described herein.
- the conditions can be as disclosed, for example, in U.S. Pat. Nos. 4,003,804, 4,071,415, 4,126,523, 4,152,220, 4,379,030, and 5,041,194, the contents of which are herein incorporated by reference in their entirety.
- the spot electroplating process is conducted in air without alteration of the atmosphere.
- the electroplating process is conducted under a modified atmosphere, which can be partially or completely composed of an inert gas.
- the inert gas may be, for example, nitrogen or argon.
- the use of an inert gas may be helpful in preventing or lessening exposure of the electrolyte to moisture and oxygen.
- the compartment housing the electrolyte is initially or repetitively flushed with an inert gas to further ensure protection of the electrolyte from air.
- the electroplating process is conducted with the electrolyte being at or below room temperature, e.g., a temperature of about, up to, or less than 15, 20, 25, or 30° C. In other embodiments, the electroplating process is conducted with the electrolyte being at an elevated temperature, such as a temperature of about, at least, or above 40, 50, 60, 70, 80, 90, 100, 110, or 120° C. In other embodiments, the electroplating process is conducted with the electrolyte being at temperature within a range bounded by any two of the foregoing exemplary temperatures.
- any of the applicator devices described above can be configured to include a heating or cooling element either inside or outside of the compartment (and optionally, a temperature measuring device) to achieve an electrolyte temperature lower or higher than ambient temperature.
- the substrate may be suitably heated or cooled to a desired temperature before, during, or after coating the substrate with the electrolyte.
- the electroplating process may use direct or pulse current. Any suitable current density may also be used, such as a current density of at least 0.01, 0.05, 0.1, 0.5, or 1 A/dm 2 and up to 2, 5, 10, 15, 20, 25, 30, 40, or 50 A/dm 2 .
- the electroplating time may be suitably varied and used in conjunction with a particular current density and temperature to achieve a desired thickness of the aluminum coating.
- the electroplating time may be, for example, 1, 5, 10, 20, 30, 40, 50, 60, 90, or 120 minutes depending on the current density and temperature to achieve a desired thickness.
- the thickness of the aluminum coating for the initial (first plate) or final (i.e., total of one or successively layered plates) may be precisely, about, at least, above, up to, or less than, for example, 1, 2, 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 150, 200, 250, or 300 microns, or a thickness within a range bounded by any two of the foregoing values.
- polymer gel electrolytes polymer membranes
- the polymer gel membranes can be cast directly onto aluminum foil, and the resulting layered composite wrapped around a substrate to perform the plating.
- the aluminum foil serves as the anode and the substrate as the cathode during the electroplating process.
- FIG. 1 A general depiction of the process using a polymer gel electrolyte is provided in FIG. 1 .
- the moisture sensitivity of the chloroaluminate-based ionic liquids was significantly reduced by sealing the ionic liquid electrolyte inside the reservoir of a portable plating brush.
- the device can be conveniently used when plating is desired at a particular location of a large substrate.
- a depiction of the process using a portable plating brush is provided in FIG. 2 .
- the above two methodologies, and variants thereof, can facilitate the electroplating process particularly in situations where the substrate is either too large to fit into a conventional plating bath or the configuration of the substrate prohibits such a plating process.
- These portable plating devices for electrodeposition of Al will benefit coating manufacturers and electronics assembly by reducing or eliminating the use of pyrophoric and/or toxic materials while being convenient and integratable into conventional manufacturing processes.
- Ethylmethylimidazolium chloride (EMIC) was purified by recrystallization and vacuum drying before use.
- 4-propylpyridine was purified by distillation.
- Acetamide and AlCl 3 were purified by sublimation.
- the AlCl 3 -containing mixtures were prepared by slowly adding AlCl 3 to the imidazolium chloride (or the organic solvent) inside an argon-filled glove box.
- the molar mixing ratio for EMIC was fixed at an AlCl 3 : EMIC ratio of 1.5:1, while that for 4-propylpyridine was fixed at an AlCl 3 :4-propylpyridine ratio of 1.4:1.
- the portable plating brush was made by inserting a short length of fiberglass rope into the end of plastic or glass tubing so as to provide a brush-type tip. Lodging a ceramic ball into the end of the tube provided a ball pen. A suitable amount of the AlCl 3 -EtMeImCl ionic liquid was added into the barrel/reservoir of the brushes, which soaked into the rope by capillary action or was retained as a liquid in the ballpoint pen. Leaking of ionic liquid from the brush was avoided by using a high-density rope, with care taken to not add an excessive amount of electrolyte.
- the ceramic ball was retained loosely to permit it to rotate and provide fresh electrolyte.
- a plug of potting epoxy was cast into the tube barrel and drilled with a small orifice to allow the ionic liquid to flow slowly around the ball tip without draining quickly from the reservoir.
- the anode used was a large spiral of high purity 1-mm diameter aluminum wire or other source of pure Al. To incorporate the anode, the anode was forced into the end of the rope inside the barrel of the brush or immersed in the liquid contents of the ball pen. Because the devices were being tested under ambient conditions in the open atmosphere, they were flooded with an inert shielding gas (dry nitrogen or even very dry air is sufficient) to exclude moisture.
- an inert shielding gas dry nitrogen or even very dry air is sufficient
- Electrochemical measurement Cyclic voltammetry (CV) was performed inside an argon-filled glove box under different scan rates.
- Pt was used for the working electrode.
- Al was used as counter and reference electrode.
- a two-electrode system was used system in which copper (Cu) plate was used as the working electrode and Al plate as the anode.
- Platinum was treated by polishing with Al 2 O 3 , followed by washing with deionized water and drying.
- the copper electrode was treated by polishing with sand paper, followed by degreasing in acetone under ultrasonic exposure for 15 minutes, and then activated in 5 wt % HCl aqueous solution for two minutes to remove any oxide layer that may have formed.
- the copper electrode was rinsed thoroughly with deionized water and degreased in dichloromethane for 10 minutes to remove organic impurities and form a chloride layer resistant to oxide formation.
- the Al electrode was treated by polishing with sand paper, followed by activation in an acidic solution composed of 1% HNO 3 , 65% H 3 PO 4 , 5% acetic acid, and water for 5 minutes.
- the Al electrode was then rinsed thoroughly with deionized water and degreased in acetone for 5 minutes. Controlled-current electrolysis experiments were performed with a simple adjustable DC power supply.
- FIGS. 3A and 3B show the cyclic voltammograms of a) AlCl 3 -EMIC (1.5:1) and b) AlCl 3 -4-Propylpyridine (1.4:1) molten mixtures on a Pt electrode (2 mm in diameter) under a scan rate of 100 mV/s at room temperature. In both mixtures, the reduction peaks attributed to Al deposition and the oxidation peaks attributed to the stripping of Al were observed.
- FIGS. 4A and 4B show the CVs of the mixtures of AlCl 3 and acetamide at different ratios (1:1 and 1.2:1 AlCl 3 to acetamide) on a Pt working electrode (2 mm in diameter) under a scan rate of 10 mV/s.
- Al wire was used as the counter and reference electrode.
- the deposition and stripping of Al were observed for these two mixtures.
- the current densities were found to be much higher for the 1.2:1 mixture than for the 1:1 mixture, which indicates more cation complex [AlCl 2 (Acetamide) 2 ] + in the former solution.
- the overpotential for Al deposition was found to be only ⁇ 80 mV for the 1.2:1 mixture while it was found to be ⁇ 180 mV for the 1:1 mixture, suggesting that a higher amount of AlCl 3 is more favorable for Al deposition.
- FIGS. 5A-5D show the comparison of the CVs.
- the results obtained without solvent indicate a well defined Al deposition and stripping peak.
- DCM dichloromethane
- FIG. 5B the current densities became significantly increased, which indicates a much improved ionic conductivity due to reduced viscosity.
- acetonitrile (AN) was added to the mixture, as shown in FIG.
- Self-standing polymer gel membranes containing AlCl 3 -based molten mixture When AlCl 3 was mixed with acrylamide directly, a solid was formed, indicating that a polymerization reaction occurred due to the exothermal reaction. To avoid such side reaction, AlCl 3 was added to acrylamide/DCM solution at 0° C. using an ice bath. After mixing them at 0° C., AICl 3 -containing mixtures were added, followed by addition of AIBN as initiator and polymerization at room temperature for 24 hours.
- FIG. 6 shows a typical picture of the polymer gel membrane containing 60 wt % of AlCl 3 -EMIC (1.5:1) mixture.
- FIG. 7 shows the CVs of the membrane containing 60 wt % of AlCl 3 -EMIC (1.5:1) mixture with Cu plate as the working electrode and Al plate as the counter electrode.
- the membrane exhibited good electrochemical behavior for the deposition and stripping of Al. It was noticed that the current densities increased with increasing scan cycles, which indicates an activation process, probably due to the residual surface oxide on the Al plate. Nevertheless, this was the first example of the membrane showing the deposition and stripping of Al. An additional reduction peak was observed at 0.1 V, which may be due to the reduction of residual double bond (acryl group) within the membrane.
- Polymer gel membranes containing 60 wt % of AlCl 3 -4-propylpyridine (1.4:1) and AlCl 3 -acetamide (1.2:1) were also prepared.
- the corresponding CVs are provided in FIGS. 8A and 8B , respectively.
- the deposition and stripping peaks of Al were observed in both membranes.
- the current densities were much smaller than that based on the AlCl 3 -EMIC mixture, mainly due to the intrinsic lower ionic conductivities of the latter two membranes.
- FIG. 9 shows a photo of the portable brush-type pen during plating of aluminum on a copper substrate.
- a small amount of ionic liquid was deposited onto the substrate.
- the power supply was active, the electrodeposition of Al began.
- the Al film was produced in a very short amount of time (about 5 seconds), and the total plating process lasted about 10 minutes.
- FIG. 10A provides a photo of Al deposited on a Cu coupon with the portable plating brush.
- An optical microscope image of the film is shown in FIG. 10B .
- the Al films deposited on Cu have a specular appearance.
- polymer gel membranes containing AlCl 3 -EMIC (1.5:1), AlCl 3 -acetamide (1.2:1), and AlCl 3 -4-propylpyridine (1.4:1) were successfully prepared for the first time.
- These polymer gel membranes exhibited good electrochemical behavior for the deposition and stripping of Al. It has been shown that the selection of solvent in the process of preparation of the polymer gel membrane affects the electrochemical properties of the membrane, and that the intrinsic ionic conductivity of the ionic liquid plays a key role in the performance of the final polymer gel membrane. Another way to increase the electrochemical performance of the polymer gel membrane is to use a higher temperature.
- PVdF(HFP) poly(vinylidene fluoride-hexafluoropropylene)
- PVdF(HFP) polyvinylpyridine
- PAN polyacrylate
- PEO polyethylene oxide
- polyethylene polypropylene membranes, and the like
- a portable plating brush using an Al-based ionic liquid (AlCl 3 -EtMeImCl) electrolyte was also successfully prepared.
- the process was used to successfully plate Al on Cu or steel substrates.
- Al films can be produced in a very short time ( ⁇ 5 seconds), and after 5 minutes of plating time, a dense specular film of Al was obtained on Cu or steel.
- the portable plating brush can find a wide variety of applications in various industries, including the defense industry.
- the plating process can be extended to aluminum alloy plating, such as Al—Mn, Al—Nb, Al—W plating, by controlling the composition of the ionic liquid and with addition of the appropriate alloying metals and other components.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
- This invention was made with government support under Prime Contract No. DE-AC05-00OR22725 awarded by the U.S. Department of Energy. The government has certain rights in the invention.
- The present invention relates generally to methods and aluminum-containing electrolytes useful in the electroplating of aluminum, and more particularly, to devices useful in spot plating aluminum onto various metallic substrates.
- Metal surface coating has played an important role in extending the life cycle of structural materials commonly used in large rugged equipment for use on land, air, and sea. Aluminum and its many versatile alloys are routinely used as surface coatings for the corrosion protection of many metals, offering both barrier and sacrificial protection. In addition, aluminum and its alloys are being considered as favorable alternatives for cadmium coatings on the protective shells of electrical connectors in military ground systems in view of the known toxic and carcinogenic nature of cadmium and hexavalent chromium materials.
- Currently, there are various methods for aluminum deposition, such as hot dipping, thermal spraying, sputter deposition, vapor deposition, and electrodeposition. However, a particularly attractive method for depositing aluminum and its alloys is isothermal electrodeposition, either by tank or brush plating. Electrodeposition is an attractive technique because it generally leads to thin, economical coatings that are usually adherent and do not affect the structural and mechanical properties of the substrate. Moreover, the thickness and quality of the deposits can be controlled by adjustment of the deposition rate by tuning such experimental parameters as overvoltage, current density, electrolyte composition, and temperature.
- Unfortunately, neither aluminum nor its alloys can be electrodeposited from aqueous solutions because hydrogen is evolved before aluminum can be plated. Thus, it is necessary to employ non-aqueous solvents (both molecular and ionic) for this purpose. On a commercial basis, aluminum is plated by using the well known SIGAL® process. Although known to be very effective, the SIGAL® process requires a plating bath composed of alkyl aluminum fluorides dissolved in toluene. Not surprisingly, the technique raises a number of environmental and safety objections because the alkyl aluminum compounds are pyrophoric and toxic, and the toluene solvent is flammable and can lead to volatile organic compound (VOC) emissions. The inefficiency of aqueous electroplating also makes it a major energy consumer. For example, in electrolytic hard chrome plating, only 10-20% of the power supplied is used for actual deposition; the remaining power is consumed through hydrogen generation and other losses.
- More recently, aluminum-containing ionic liquids (i.e., aluminum-containing molten salts) have gained increasing prominence as substantially improved electrolytes for the deposition of aluminum. The ionic liquids possess an advantageous combination of physical properties, including non-flammability, negligible vapor pressure, high ionic conductivity, and high thermal, chemical, and electrochemical stability. Therefore, they are amenable for the electroplating of reactive elements, which is impossible using aqueous or other organic solvents. Thus far, the ionic liquids used for the electrodeposition of aluminum has focused on chloroaluminate anions, which are typically obtained by mixing anhydrous AlCl3 with an organic chloride salt, such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt. However, because of the hygroscopic nature of AlCl3 and the resulting chloroaluminate, the electroplating generally must be performed in an inert gas atmosphere, which significantly increases cost and complexity of the process.
- By use of novel applicator devices and methods for their use, the instant disclosure overcomes the persistent problem in the art of having to implement costly precautions against moisture during aluminum electroplating. The invention achieves this by employing applicator devices that include a protective structure within which an aluminum ion-containing electrolyte is incorporated, with the provision of apertures in the protective structure to permit release of the electrolyte onto a metallic substrate. The applicator device can be, for example, a polymer membrane, a brush plating device, or a ball pen plating device in which the electrolyte is (or can be) impregnated or incorporated.
- In the electroplating method, the electrolyte is made to be in contact with an anode in the device at the time the electrolyte is released from the protective device and applied as a coating on the substrate. A voltage potential is then applied between the anode and the substrate (polarized as cathode) in order to produce a coating of aluminum within an area bounded by the coating of the electrolyte. A further advantage of the methods described herein is the ability to spot electroplate metallic substrates that are generally too large or cumbersome to electroplate by immersing or dipping into a bath.
-
FIG. 1 . A general schematic depicting an exemplary electroplating process using a polymer membrane, such as an ionogel or polymer gel membrane, impregnated with an aluminum-containing electrolyte. -
FIG. 2 . A general schematic depicting a portable plating brush for spot electroplating aluminum. -
FIGS. 3A, 3B . Graphs showing cyclic voltammograms of a) AlCl3-EMIC (1.5:1) and b) AlCl3-4-propylpyridine (1.4:1) molten mixtures on a Pt electrode (2 mm in diameter) under a scan rate of 100 mV/s at room temperature with Al wire used as the counter and the reference electrode, wherein EMIC is an acronym for ethylmethylimidazolium chloride. -
FIGS. 4A, 4B . Graphs showing cyclic voltammograms of mixtures of AlCl3 and acetamide at a) 1:1 and b) 1.2:1 ratios on a Pt working electrode (2 mm in diameter) with Al wire as the counter and reference electrode. The scan rate was 10 mV/s. -
FIGS. 5A, 5B, 5C, and 5D . Graphs showing cyclic voltammograms of a mixture of AlCl3 and 4-propylpyridine (1.5:1) in a) no solvent; b) dichloromethane (DCM); c) acetonitrile (AN), and d) tetrahydrofuran (THF) on a Pt working electrode (2 mm in diameter) with Al wire as counter and reference electrode. The scan rate was 100 mV/s. -
FIG. 6 . Photo showing an acrylamide polymer membrane containing 60 wt % of AlCl3-EMIC (1.5:1). -
FIG. 7 . Graph showing cyclic voltammograms of the polymer membrane containing 60 wt % of 1.5:1 AlCl3-EMIC molten mixture at 40° C. at a scan rate of 100 mV/s. Cu and Al plates were used as working and counter electrode, respectively. The area of the working electrode was 3.75 cm2. -
FIGS. 8A, 8B . Graphs showing cyclic voltammograms of a polymer membrane containing 60 wt % of a) AlCl3-4-propylpyridine (1.4:1) and b) AlCl3-acetamide (1.2:1) at 40° C. at a scan rate of 100 mV/s. Cu and Al plates were used as working and counter electrode, respectively. The area of the working electrode was 1.68 cm2. -
FIG. 9 . Photo showing a portable plating brush electroplating a coating of aluminum on a copper substrate. -
FIGS. 10A, 10B . Photos showing (a) macroscopic view of the aluminum coating produced by the portable plating brush shown inFIG. 9 using AlCl3-EtMeImCl ionic liquid electrolyte, and (b) optical micrograph (500× ) of the same aluminum coating, wherein EtMeImCl refers to 1-ethyl-3-methylimidazolium chloride. - In a first aspect, the invention is directed to devices useful for spot electroplating a metallic substrate (i.e., “substrate”) with an aluminum coating. The devices include a protective structure in which the aluminum ion-containing electrolyte (i.e., “electrolyte”) is contained. The term “protective”, as used herein, indicates an ability of the protective structure to provide substantial protection from air, and particularly, moisture, as commonly found in air. Thus, to be optimally protective, the protective structure should ideally be capable of substantially or completely surrounding or encasing the electrolyte housed therein, except that the protective structure includes at least one aperture to permit release of the electrolyte onto a substrate. For optimal effect, the number of apertures are ideally limited to the extent possible while permitting suitable release of the electrolyte. Typically, the electrolyte will remain contained within the protective structure unless an action effecting release is taken. The action effecting release may be, for example, the application of pressure to the device as provided by, for example, pressing or other means for applying of pressure. The action effecting release may alternatively be provided by including a releasing (i.e., transfer) feature in the device, wherein the releasing feature serves to transfer the electrolyte from inside of the protective structure to the substrate by, for example, capillary action or other spreading mechanism. The device, when ultimately assembled, necessarily includes electrical wiring means to permit a voltage potential and current to be transmitted between the anode and substrate polarized as cathode.
- The protective structure can be made of any material non-reactive with the electrolyte. Some materials suitable for the protective structure include, for example, plastic, metal, glass, or ceramic, provided that the material is appropriate for the intended means for release.
- The device, when ultimately assembled, also includes an anode located in a position suitable for contact with the electrolyte when the electrolyte is incorporated into the device. The anode can be any of the anodes well known in the art for electroplating aluminum. In one embodiment, the anode is an aluminum anode. In another embodiment, the anode is an inert anode, such as a porous or non-porous graphite, titanium-containing, tantalum-containing, or platinum-containing anode.
- In a first embodiment, the protective structure is a porous polymer membrane. the pores in the membrane serve as the at least one aperture described above. The term “membrane”, as used herein, refers to a shape having two of its dimensions significantly larger (typically, at least 10, 20, 50, or 100 times) than the third dimension, which can be referred to as the thickness. Thus, the term “membrane” may adopt the shape of a film or a sheet. The membrane can have any suitable thickness. In different embodiments, the thickness is precisely, about, at least, greater than, up to, or less than, for example, 1, 2, 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 200, 300, 400, 500, 600, 700, 800, 900, or 1000 microns (i.e., 1000 μm, where 1000 μm is equivalent to 1 mm). The thickness may also be significantly larger than 1 mm, such as 2, 3, 4, 5, 6, 7, 8, 9, or 10 mm (1 cm). The thickness may also be within a range bounded by any two of the foregoing values. The term “about”, as used herein, generally indicates no more than ±10, ±5, ±2, or ±1% from an indicated value. In some embodiments, the polymer membrane is part of a layered or laminate structure in which the polymer membrane is in contact with or bonded to an anode layer, such as a layer (e.g., sheet or foil) of aluminum, aluminum alloy, or inert anode material. A portion of the polymer membrane should be left uncovered to permit the uncovered portion of the polymer membrane to make contact with the substrate. For example, the anode layer can be in contact with or bonded with one side of the polymer membrane with the other side of the polymer membrane uncovered.
- The pores in the polymer membrane are of suitable size to release the electrolyte material at an acceptable rate. In a first embodiment, the polymer membrane includes macropores, which are typically pores having a size (typically diameter, for circular pores) of above 50 nm. In different embodiments, the macropores have a size of precisely, about, at least, or greater than 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm, 200 nm, 225 nm, 250 nm, 275 nm, 300 nm, 325 nm, 350 nm, 375 nm, 400 nm, 425 nm, 450 nm, 475 nm, 500 nm, 550 nm, 600 nm, 650 nm, 700 nm, 750 nm, 800 nm, 850 nm, 900 nm, 950 nm, 1000 nm (1 μm), 2 μm, 5 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 100 μm, 200 μm, 300 μm, 400 μm, or 500 μm, or a particular size, or a variation of sizes, within a range bounded by any two of the foregoing values. In a second embodiment, the polymer membrane includes mesopores, which are typically pores having a size of at least 2 nm and up to 50 nm. In different embodiments, the mesopores have a size of precisely or about 2 nm, 2.5 nm, 3 nm, 3.5 nm, 4 nm, 4.5 nm, 5 nm, 5.5 nm,6 nm, 6.5 nm, 7 nm, 7.5 nm, 8 nm, 8.5 nm, 9 nm, 9.5 nm, 10 nm, 11 nm, 12 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, or 50 nm, or a particular size, or a variation of sizes, within a range bounded by any two of the foregoing values. In a third embodiment, the polymer membrane includes micropores, which are typically pores having a size of less than 2 nm. In different embodiments, the micropores have a size of precisely, about, up to, or less than 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7, 1.8, or 1.9 nm, or a particular size, or a variation of sizes, within a range bounded by any two of the foregoing values. In some embodiments, only one type of pore is included in the polymer membrane, or one or more types of pores may be excluded. In other embodiments, two or three of any of the types of pores are included, e.g., macropores and mesopores; or mesopores and micropores; or macropores, mesopores, and micropores. When two or more pore types are present, the pore sizes may be distributed within an overlapping range bounded by any two of the exemplary pore sizes provided above. Moreover, the distribution of pore sizes may be within a single pore size distribution (i.e., monomodal) or be within more than one pore size distribution (e.g., bimodal or trimodal), as typically characterized by a pore volume vs. pore size distribution plot.
- The polymer membrane can have any polymeric composition, provided that it is substantially unreactive with all components of the electrolyte and can function to retain the electrolyte and release the electrolyte as intended. For most applications, the polymer is preferably flexible to the extent that it can closely follow and make consistent contact with the contours of the substrate surface on which it is being applied. In some embodiments, the polymer membrane may be required to bend or wrap around non-planar portions of the substrate. The polymer membrane can be constructed of, for example, a vinyl-addition polymer, polyalkylene oxide (e.g., polyethylene oxide or polypropylene oxide or co-polymer thereof), polyurethane, polyester, or polyurea. In other embodiments, the polymer may include a substantial inorganic component, such as found in the sol gels, polysiloxanes (e.g., polyorganosiloxanes), and hybrid organic-inorganic materials. In yet other embodiments, the polymer may be an ionogel, including those based on ionic liquid hybrid materials, as described, for example, in Chen et al., Applied Materials & Interfaces, vol. 6, pp. 7840-7845, 2014; Le Bideau, et al., Chem. Soc. Rev., 40(2):907-25, Feb. 2011; Neouze et al., Chem. Mater., 18(17), pp. 3931-3936, 2006; and U.S. Pat. No. 8,163,834, the contents of which are herein incorporated by reference in their entirety.
- In particular embodiments, the polymer membrane is constructed, at least partially, of a vinyl-addition polymer. The term “vinyl-addition polymer”, as used herein, refers to any of those polymers, known in the art, derived from the addition polymerization of unsaturated monomers. Some examples of vinyl-addition polymers include, polyacrylamide, polyethylene, polypropylene, polyvinylpyridine, polyacrylate, polymethacrylate, polybutadiene, polyacrylonitrile, polystyrene, and fluorinated versions (e.g., polyvinylidene fluoride and polyhexafluoropropylene). In some embodiments, a homopolymer is used, while in other embodiments a copolymer is used, wherein the copolymer can include two, three, or more different monomers, and can be arranged, for example, as a block, alternating, graft, or periodic copolymer.
- Numerous porous polymer membranes are known in the art, with many of them suited to function as materials that can be impregnated with aluminum-containing electrolytes for purposes of the instant invention. Alternatively, the porous polymer membrane can be prepared by methods well known in the art, such as by polymerization in the presence of a templating agent or volatile or porogenic substance. Drying and/or heating may be employed to aid in the production of pores. In some embodiments, the electrolyte is incorporated into the porous polymer membrane by impregnating the porous polymer membrane with the electrolyte, e.g., by absorption, which typically involves capillary action. In other embodiments, the electrolyte is incorporated into the porous polymer membrane by forming the porous polymer membrane from a reaction solution that includes the monomers and the electrolyte. In the latter case, the electrolyte becomes entrapped within spaces of the polymer as the polymer is being formed from the monomers.
- In another embodiment, the protective structure is an applicator device that includes (i) a compartment in which the aluminum ion-containing electrolyte and the anode is contained, and (ii) transferring means for transferring the electrolyte from the compartment through the at least one aperture onto the metallic substrate. The compartment can be of any suitable size and shape, provided that it can hold a reservoir of the electrolyte. The compartment can be made of any suitable material, such as any of those described above for the protective structures. The transferring means is any physical feature incorporated into or integrated with the compartment that can transfer electrolyte from within the compartment to an area external from the compartment and onto a substrate. Since a voltage potential needs to be established across the substrate to the anode via the coating of electrolyte, the transferring means should be capable of transferring the electrolyte by a process in which the transferring means makes direct contact with the substrate on which the electrolyte is being applied. If the transferring means works by indirect application (e.g., by spraying), a voltage potential cannot be made between the cathodic substrate and anode. For this reason, spraying may not be considered. However, spraying may be considered if the coating of electrolyte made by spraying is subsequently made to be in electrical communication with the anode so that a voltage potential between the anode and cathodic substrate can be established. In some embodiments, the electrolyte may be rendered highly viscous (e.g., by inclusion of viscosity enhancing agents or hardening agents) so as to form an adherent coating (i.e., retained film) that maintains its shape with minimal spreading over time, and the adherent coating subsequently contacted with an anode in interconnection with the cathodic substrate to form a coating of aluminum. Such adherent coating may be applied by, for example, spraying or painting (e.g., brushing or rolling). The coating may also include a component (e.g., photoresponsive ionogel or crosslinkable agent) that may function to harden the coating upon exposure to a stimulus, such as by irradiation or chemical treatment.
- In one embodiment, the transferring means works by transferring the electrolyte by capillary action. Such transferring means may include, for example, fibers (e.g., filaments or strands), which may or may not be hollow. When the electrolyte is placed in the compartment, one end of the fibers should be in contact with the electrolyte, with the remaining length of the fibers traversing the aperture and extending to a region outside of the compartment. In another embodiment, the transferring means may be a soft foam material capable of becoming impregnated or saturated with the electrolyte. As the electrolyte can be transferred onto a substrate by brushing with fibers or a foam saturated with electrolyte, the above-described applicator device can be referred to as a “brush plating device”. In some embodiments, the applicator device relies only on the passive transferring means (e.g., brushing) to transfer the electrolyte. In other embodiments, the applicator device further includes an active transferring means to aid in transfer of the electrolyte through the passive transferring means. The active transferring means can be, for example, a pumping element that serves to apply pressure on the electrolyte reservoir to encourage movement of the electrolyte into the passive transferring means.
- In another embodiment, the transferring means works by transferring the electrolyte by active spreading. The active spreading is achieved by using mechanical action to move a transferring element in such a manner that movement of the transferring element transfers electrolyte from the compartment reservoir to an area outside the compartment. The spreading means can be, for example, a rotatable ball traversing an aperture in the compartment, wherein the rotatable ball is in contact with electrolyte in the compartment and can transfer electrolyte to a region outside of the compartment by being rotated, e.g., as in a ball point pen. The ball may be non-porous, in which case only the surface of the ball functions to spread the electrolyte. Alternatively, the ball may be porous, in which case the interior and surface of the ball function to transfer and spread the electrolyte. As the electrolyte can be transferred onto the substrate by contacting the ball with the substrate and employing ball rotation (e.g., by friction), the above-described applicator device can be referred to as a “ball pen plating device”. In another embodiment, the transferring means may be a roller, with a mechanism simulating a paint roller, instead of a ball. The roller may be porous or non-porous, as described above for the rotatable ball. In the case of a roller, as the electrolyte can be transferred onto the substrate by contacting the roller with the substrate and rolling the roller (e.g., by friction), the above-described applicator device can be referred to as a “roll plating device”. As in the case of the brush plating device, the ball pen or roll plating device may or may not work in concert with an active transfer element, such as a pumping element, to improve transfer of the electrolyte to the ball or roller element.
- The aluminum ion-containing electrolyte can be any of the liquid aluminum-containing electrolytes known in the art useful in electroplating a layer of aluminum onto a metallic substrate. In order to conduct electrical current between the anode and substrate, the electrolyte should be suitably conductive. In a first embodiment, the electrolyte includes aluminum ions and counterions dissolved in a non-aqueous solvent, e.g., an alkyl aluminum or aluminum halide compound dissolved in an organic (non-aqueous) solvent, such as an alkyl aluminum fluoride dissolved in toluene (as in the SIGAL® process) or use of another organic solvent, such as benzene, cyclohexane, tetrahydrofuran, or dimethyl sulfide. Such electrolytes are described, for example, in U.S. Pat. Nos. 4,003,804, 4,032,413, 4,071,415, 4,126,523, 4,152,220, 4,379,030, 4,721,656, and U.S. Application Publication No. 2011/0253543, the contents of which are herein incorporated by reference in their entirety. In a second embodiment, the electrolyte includes an aluminum-containing ionic liquid (i.e., as an aluminum-containing molten salt or solution of ionic liquid in a solvent). The aluminum-containing ionic liquid can be those, well known in the art, which include chloroaluminate anions, such as those obtained by mixing anhydrous AlCl3 with an organic chloride salt, such as 1-ethyl-3-methyl imidazolium chloride (EMImCl), 1-(1-butyl)pyridinium chloride (N-BPCl), or other related salt. Such ionic liquid electrolytes are described, for example, in U.S. Pat. Nos. 2,446,331, 5,041,194, 5,827,602, 7,915,426, 8,778,163, U.S. Application Publication No. 2012/0189778, and Q. Liao, et al., I. Electrochem. Soc., vol. 144, no. 3, March 1997, the contents of which are herein incorporated by reference in their entirety.
- In particular embodiments, the electrolyte is exclusively or includes an ionic liquid composition containing a trihalo aluminum (III) species complexed with at least one organic uncharged (neutral) ligand (also referred to as “ligand”). The halogen atoms in the trihalo aluminum (III) species can be selected from any of the halogens, i.e., fluorine, chlorine, bromine, and iodine, which respectively correspond to aluminum fluoride (AlF3), aluminum chloride (AlCl3), aluminum bromide (AlBr3), and aluminum iodide (AlI3), and multiples thereof, such as the dimer Al2Cl6. Thus, the ionic liquids described above can be conveniently described according to the general stoichiometric formula AlX3.Ln, where X is a halogen atom, L is an organic uncharged ligand, and n is an integer of at least 1, typically 1, 2, or 3. Molecules of solvation (i.e., adducts) may or may not also be included in the formula. Multiples of the foregoing general formula (e.g., Al2X6.L2n) are also embraced by the general formula. The term “complex” or “complexed”, as used herein, indicates a bonding interaction between the neutral organic ligand and the aluminum ion. The association between the aluminum ion and ligand in the above-described ionic liquid is typically a dative covalent interaction, generally between the electron-deficient aluminum ion and electron-donating heteroatom in the ligand. As the ligand considered in the above-described ionic liquid is uncharged, there is no ionic bonding between the aluminum ion and the ligand. There is, however, an ionic association between the aluminum ion and the halide atoms, which provides the ionic character of the composition.
- The organic uncharged ligand particularly considered herein is or includes a ring structure having at least three ring carbon atoms and at least one ring heteroatom selected from nitrogen and sulfur. In different embodiments, the ring heteroatoms may be selected from only nitrogen atoms, or only sulfur atoms, or a combination of nitrogen and sulfur atoms, or a combination of nitrogen and oxygen atoms, or a combination of sulfur and oxygen atoms. The ring structure may be unsaturated (e.g., aliphatic or aromatic) or saturated. The ring structures generally contain a total of five, six, or seven ring atoms (i.e., five-, six-, or seven-membered rings), at least three of which are ring carbon atoms and at least one of which is a heteroatom. Generally, the ring structure includes one, two, or three ring heteroatoms.
- Some examples of five-membered unsaturated rings containing at least one ring nitrogen atom include pyrrole, imidazole, pyrazole, oxazole, isoxazole, thiazole, and the triazole rings (i.e., 1,2,3-triazole and 1,2,4-triazole). Some examples of six-membered unsaturated rings containing at least one ring nitrogen atom include pyridine, pyrazine, pyrimidine, pyridazine, 1,3,5-triazine, and oxazine rings. Some examples of seven-membered unsaturated rings containing at least one ring nitrogen atom include azepine and the diazepine rings (e.g., 1,2-diazepine, 1,3-diazepine, and 1,4-diazepine).
- Some examples of five-membered saturated rings containing at least one ring nitrogen atom include pyrrolidine, imidazolidine, oxazolidine, and thiazolidine rings. Some examples of six-membered saturated rings containing at least one ring nitrogen atom include piperidine, piperazine, morpholine, and thiomorpholine rings. Some examples of seven-membered saturated rings containing at least one ring nitrogen atom include azepane and diazepane rings.
- Some examples of unsaturated rings containing at least one ring sulfur atom include thiophene, thiazole, isothiazole, and thiadiazole rings. Some examples of saturated rings containing at least one ring sulfur atom include tetrahydrothiophene and thiopyran rings.
- The ring structure containing the at least one heteroatom may or may not also be fused to another ring, thereby resulting in a fused ring structure. Some examples of fused ring structures include indole, purine, quinoline (benzopyridine), isoquinoline, benzimidazole, benzoxazole, benzothiazole, benzoxazoline, benzothiophene, benzoxazine, and phenoxazine.
- In some embodiments, the ring structure of the uncharged ligand includes at least one alkyl substituent (i.e., alkyl group) containing at least one carbon atom. The alkyl substituent can improve the properties of the ionic liquids, particularly by decreasing their melting points, and preferably making them room temperature ionic liquids. In different embodiments, the alkyl group can include precisely or at least one, two, three, four, five, six, seven, eight, nine, ten, eleven, or twelve carbon atoms, or a number of carbon atoms within a range bounded by any two of the foregoing numbers. The alkyl group can be straight-chained or branched. Some examples of straight-chained alkyl groups include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, and n-dodecyl groups. Some examples of branched alkyl groups include isopropyl, isobutyl, sec-butyl, t-butyl, isopentyl, neopentyl, 2-methylpent-1-yl, 3-methylpent-1-yl, isohexyl, isoheptyl, and isooctyl groups.
- In other embodiments, the ring structure of the uncharged ligand includes at least one alkenyl substituent (i.e., alkenyl group) containing at least two carbon atoms and the presence of at least one carbon-carbon double bond. The alkenyl substituent can also improve the properties of the ionic liquids, particularly by decreasing their melting points, and preferably making them room temperature ionic liquids. In different embodiments, the alkenyl group can include precisely or at least two, three, four, five, six, seven, eight, nine, ten, eleven, or twelve carbon atoms, or a number of carbon atoms within a range bounded by any two of the foregoing numbers. The alkenyl group can be straight-chained or branched. Some examples of straight-chained alkenyl groups include vinyl, propen-1-yl (allyl), 3-buten-1-yl (CH2═CH—CH2—CH2—), 2-buten-1-yl (CH2—CH═CH—CH2—), butadienyl, 4-penten-1-yl, 3-penten-1-yl, 2-penten-1-yl, 5-hexen-1-yl, 6-hepten-1-yl, and the like. Some examples of branched alkenyl groups include propen-2-yl, 1-buten-3-yl (CH2═CH—CH.—CH3), 1-buten-2-yl (CH2═C.—CH2—CH3), 1-penten-4-yl, 1-penten-3-yl, 2-penten-4-yl, 2-penten-3-yl, and 1,4-pentadien-3-yl.
- In some embodiments, the at least one alkyl or alkenyl group attached to the ring structure is composed of only carbon and hydrogen atoms. In other embodiments, the alkyl or alkenyl group may include one or more heteroatoms, such as one or more selected from oxygen, nitrogen, sulfur, and halogen atoms. A particular example of an alkyl group substituted with at least one heteroatom is an alkyl group containing at least one oxygen atom, e.g., a hydroxy group (OH), or ether group (—O—) as found in the alkoxides (i.e., —OR, where R is an alkyl group with or without further heteroatom substitution) or groups of the general formula —(CH2)s—(O—CH2CH2)tH, where s is 0 or an integer from 1 to 12 and t is 0 or an integer from 1-12. A protic group, such as OH, should not be present in the ionic liquid if it becomes deprotonated by other groups in the ionic liquid or by another component in contact with the ionic liquid. In some embodiments, the alkyl group may be a partially or completely fluorinated alkyl group, such as CF3, or CF2CF3, or a fluorinated sulfone, such as —SO2F or —SO2CF3.
- The at least one alkyl or alkenyl substituent can be included on the ring structure provided that it does not result in a charged ligand. For example, in the case of an unsaturated ring, the alkyl or alkenyl substituent must not be located on a ring nitrogen atom if the nitrogen atom is part of an unsaturated bond, since this would result in a positively charged ring nitrogen atom (i.e., the alkyl or alkenyl substituent can only be located on a ring carbon atom in that case). If the ring nitrogen atom is not part of an unsaturated bond (either in an unsaturated or saturated ring), then the ring nitrogen atom can bear a single alkyl or alkenyl substituent while remaining uncharged, as long as the ring nitrogen atom is not part a fused side of a fused ring system. The alkyl or alkenyl substituent must not be located on a ring sulfur atom since this would result in a positively charged ring sulfur atom.
- In particular embodiments, the ionic liquid is or includes an alkyl-substituted or alkenyl-substituted pyridine or imidazole ring, wherein the alkyl or alkenyl substituent is on a ring carbon atom of the pyridine or imidazole ring. The alkyl-substituted pyridine ligand can be, for example, a 2-alkyl-pyridine, 3-alkyl-pyridine, 4-alkyl-pyridine, 2,3-dialkyl-pyridine, 2,4-dialkyl-pyridine, 3,4-dialkyl-pyridine, 2,3,4-trialkyl-pyridine, 3,4,5-trialkyl-pyridine, or 2,3,5-trialkyl-pyridine, wherein it is understood that the number designating the alkyl group is relative to the location of the ring nitrogen atom, where the ring nitrogen atom is designated as position 1 (thus, a 4-alkyl-pyridine contains the alkyl group in a position directly opposite from the ring nitrogen atom in the pyridine ring). In similar fashion, the alkyl-substituted imidazole ligand can be, for example, a 2-alkylimidazole, 4-alkylimidazole, 2,4-dialkylimidazole, 4,5-dialkylimidazole, or, 2,4,5-trialkylimidazole, wherein it is understood that the number designating the alkyl group is relative to the location of the ring nitrogen atoms, which occupy
1 and 3 on the imidazole ring. The alkyl group in any of the above exemplary alkyl-substituted pyridine or imidazole ligands can be replaced with an alkenyl group to provide an equal number of exemplary alkenyl-substituted pyridine and imidazole ligands. The ring may also include a combination of alkyl and alkenyl groups. In some embodiments, the alkyl-substituted ring contains no substituent other than one or more alkyl and/or alkenyl substituents, i.e., remaining positions on the ring are occupied by hydrogen atoms.positions - The ionic liquid described herein is typically a liquid at room temperature (e.g., 15, 18, 20, 22, 25, or 30° C.) or lower. However, in some embodiments, the ionic liquid may not be a liquid at room temperature, but becomes a liquid at a higher temperature than 30° C. if it is used at an elevated temperature that melts the compound to be an ionic liquid. Thus, in some embodiments, the ionic liquid may have a melting point of up to or less than 100, 90, 80, 70, 60, 50, 40, or 35° C. In other embodiments, the ionic liquid may be a liquid at a temperature of or less than 100, 90, 80, 70, 60, 50, 40, or 35° C. In other embodiments, the ionic liquid is a liquid at or below 10, 5, 0, −10, −20, −30, or −40° C. The term “liquid”, as used herein, indicates an ability of the substance to readily flow, typically no more than about 1,000 centipoise (1,000 cP). In different embodiments, the viscosity of the ionic liquid is up to or less than, for example, 1,000, 800, 700, 600, 500, 400, 300, 200, 100, 50, 25, 10, 5, or 1 cP, or a viscosity within a range bounded by any two of these values.
- The ionic liquids described above are generally prepared by combining and mixing an aluminum trihalide (e.g., AlCl3) and the organic neutral ligand in the liquid state in a molar ratio that produces a composition that behaves as an ionic liquid at a desired temperature, such as room temperature. In some embodiments, the mixture is heated to ensure dissolution of the aluminum trihalide in the organic neutral ligand. In particular embodiments, the ratio of aluminum trihalide to organic neutral ligand is precisely or about, for example, 0.5:1, 0.6:1, 0.7:1, 0.8:1, 0.9:1, 1:1, 1.1:1, 1.2:1, 1.3:1, 1.4:1, 1.5:1, 1.6:1, 1.7:1, 1.8:1, 1.9:1, or 2:1, or a ratio within a range bounded by any two of the foregoing values.
- In one embodiment, the electrolyte (electroplating solution) contains the ionic liquid in the substantial or complete absence of a solvent, i.e., typically as a molten form of the ionic liquid. In another embodiment, the electrolyte contains the ionic liquid in admixture with one or more solvents. The solvent may function, for example, to help solubilize other components in the electrolyte (e.g., an electrolyte salt), improve wettability, or improve qualities of the aluminum deposit. The one or more solvents can be selected from any of the organic and inorganic solvents known in the art, provided that the solvent or solvent mixture does not adversely react or interact with the ionic liquid or the plating process. The solvent or solvent mixture should be completely miscible with the ionic liquid and any other components that may be included in the electrolyte.
- The organic solvent can be ionic or non-ionic. In the case of an ionic solvent, the ionic solvent can be any of the ionic liquids of the art or as described herein. In the case of a non-ionic solvent, the non-ionic solvent can be, for example, a hydrocarbon, alcohol, ketone, carbonate, sulfone, siloxane, ether, nitrile, sulfoxide, or amide solvent, or a mixture thereof. Some examples of hydrocarbon solvents include hexanes, cyclohexane, benzene, toluene, decalin, and xylenes, or halogenated versions of hydrocarbons, e.g., methylene chloride, trichloroethylene, or perchlorethylene. Some examples of alcohol solvents include methanol, ethanol, n-propanol, isopropanol, n-butanol, and isobutanol, and the diols, such as ethylene glycol, diethylene glycol, and triethylene glycol. Some examples of ketone solvents include acetone and 2-butanone. Some examples of carbonate solvents include propylene carbonate (PC), ethylene carbonate (EC), butylene carbonate (BC), dimethyl carbonate (DMC), and fluorocarbonate solvents (e.g., fluoroethylene carbonate and trifluoromethyl propylene carbonate). Some examples of sulfone solvents include methyl sulfone, ethyl methyl sulfone, methyl phenyl sulfone, methyl isopropyl sulfone (MiPS), propyl sulfone, butyl sulfone, tetramethylene sulfone (sulfolane), and phenyl vinyl sulfone. Some examples of siloxane solvents include hexamethyldisiloxane (HMDS), 1,3-divinyltetramethyldisiloxane, the polysiloxanes, and polysiloxane-polyoxyalkylene derivatives. Some examples of ether solvents include 1,2-dimethoxyethane, 1,2-diethoxyethane, 1,3-dioxolane, tetrahydrofuran, 2-methyltetrahydrofuran, tetrahydropyran, diglyme, triglyme, 1,3-dioxolane, and the fluorinated ethers (e.g., mono-, di-, tri-, tetra-, penta-, hexa- and per-fluoro derivatives of any of the foregoing ethers). Some examples of nitrile solvents include acetonitrile, propionitrile, and butyronitrile. Some examples of sulfoxide solvents include dimethyl sulfoxide, ethyl methyl sulfoxide, diethyl sulfoxide, methyl propyl sulfoxide, and ethyl propyl sulfoxide. Some examples of amide solvents include formamide, N,N-dimethylformamide, N,N-diethylformamide, acetamide, N,N-dimethylacetamide, N,N-diethylacetamide, gamma-butyrolactam, and N-methylpyrrolidone. Other organic solvents include hexamethylphosphoramide (HMPA) and 1,3-dimethyl-3,4,5,6-tetrahydro-2(1H)-pyrimidinone (DMPU). In the case of an inorganic solvent, the inorganic solvent is other than water, such as carbon disulfide or supercritical carbon dioxide. In some embodiments, any one or more of the above classes or specific types of solvents are excluded from the electroplating solution.
- If a solvent is included, the one or more ionic liquids can be included in any suitable amount, typically at least 10 wt % by weight of solvent and ionic liquid. In different embodiments, the ionic liquid is included in an amount of precisely, about, at least, or above, for example, 10, 15, 20, 25, 30, 35, 40, 45, 50, 60, 70, 80, 90, 95, 98, or 100 wt % by weight of the ionic liquid plus solvent, or an amount within a range bounded by any two of the foregoing exemplary values.
- In some embodiments, one or more salts of an alkali or alkaline earth metal is included in the electrolyte to increase the conductivity of the electrolyte or to improve aspects of the aluminum deposit. The salt should be completely dissolved in the electrolyte at the temperature employed for electroplating. The salt can be, for example, a halide of an alkali or alkaline earth metal. Some examples of alkali halides include lithium chloride, lithium bromide, sodium fluoride, sodium chloride, sodium bromide, potassium chloride, and potassium bromide. Some examples of alkaline earth halides include magnesium chloride, magnesium bromide, and calcium chloride. The salt can be included in any desired amount in the electrolyte to suitably adjust the conductivity of the electrolyte or other aspects of the process. In some embodiments, the salt is included in an amount of 0.1, 0.5, 1, 2, 5, 10, 15, or 20 wt % by weight of the electrolyte, or in an amount within a range bounded by any two of the foregoing values.
- In another aspect, the instant disclosure is directed to methods for electroplating aluminum onto a metallic substrate by use of any of the spot plating applicator devices described above. The term “spot electroplating” (or equivalently, “spot plating”), as used herein, is meant to indicate a process of electroplating in which the substrate is not submerged or dipped into an electroplating bath, and instead, electroplated in one or more regions of the substrate outside of an electroplating bath. The one or more regions of the substrate being plated each typically define a surface area less than the total surface area of the substrate. However, the instant invention contemplates the possibility where a substantial or total platable surface area of a substrate is aluminum plated by the spot plating process disclosed herein, with a result similar or commensurate to what would be provided by the substrate being submerged in an aluminum electroplating bath.
- In the method, any of the applicator devices described above, charged with aluminum-containing electrolyte, is manipulated to release the electrolyte to form a coating of the electrolyte on the metal substrate. Before, during, or after a coating of the electrolyte is formed on the substrate, a suitable voltage potential is maintained across the anode and the substrate polarized as cathode in order to convert the electrolyte coating into a coating of aluminum. To achieve this, the anode should be in contact with the electrolyte (typically, in contact with the electrolyte reservoir, but possibly in direct contact with the coating). In some embodiments, as applied to those devices containing compartments, the anode is at least partially submerged within the electrolyte contained in the compartment.
- In the case of an electrolyte-impregnated polymer membrane, the polymer membrane may be contacted with the substrate and suitably pressed to release the electrolyte from pores therein to form a coating on the substrate. In some embodiments, the polymer membrane includes fastening means (e.g., tape, or hook and loop fastener, such as Velcro®) to keep the polymer membrane firmly applied onto the substrate (e.g., by wrapping onto itself) and to compress the polymer membrane to encourage egress of the electrolyte. In some embodiments, the polymer membrane has a sticky or tacky quality that keeps it firmly affixed to the substrate.
- Before or after a coating has been formed, and with the polymer membrane still in contact with the electrolyte coating, a voltage potential is applied between an aluminum anode (e.g., aluminum foil), which is in contact with the polymer membrane (typically, the side opposite to the side in contact with the substrate), and the metallic substrate polarized as cathode to form a coating of aluminum on the substrate. The aluminum coating is necessarily within or defined by the area bounded by the coating of electrolyte. The polymer membrane can then be removed to reveal the freshly coated layer of aluminum. If necessary, the polymer membrane can be recharged with electrolyte before being used to spot plate a different, overlapping, or same section of the substrate, or before spot plating a different substrate.
- In the case of a brush plating device, the fibers of the brush, once saturated with electrolyte by capillary action or by application of pressure (e.g., by a pump on the electrolyte reservoir), are contacted with the substrate to deposit a coating of electrolyte on the substrate. With the fibers in contact with the electrolyte coating, a voltage potential is applied between the anode (in contact with the electrolyte reservoir) and the metallic substrate polarized as cathode to form a coating of aluminum on the substrate.
- Similarly, by use of a ball pen or roller plating device, electrolyte is made to coat or saturate the ball or roller along with suitable mechanical action to transfer electrolyte from the ball or roller onto the substrate to deposit a coating of electrolyte on the substrate. With the ball or roller in contact with the electrolyte coating, a voltage potential is applied between the anode (in contact with the electrolyte reservoir) and the metallic substrate polarized as cathode to form a coating of aluminum on the substrate.
- The metallic (conductive) substrate can have any composition for which deposition of aluminum may be desired. The metallic substrate may include, for example, one or more metals selected from titanium, tantalum, iron, cobalt, nickel, copper, and zinc, and thus, may be a substantially pure metal or a binary, ternary, or higher alloy. In particular embodiments, the metallic substrate is iron, or an iron-containing alloy, such as a steel.
- The electroplating process can employ any of the conditions (e.g., temperature, concentration, voltage, current density, etc.) commonly used in the art of aluminum electroplating, provided that the conditions are suitably adjusted and modified, if necessary, to accommodate the novel electroplating processes and/or aluminum-containing electrolytes described herein. The conditions can be as disclosed, for example, in U.S. Pat. Nos. 4,003,804, 4,071,415, 4,126,523, 4,152,220, 4,379,030, and 5,041,194, the contents of which are herein incorporated by reference in their entirety.
- In some embodiments, the spot electroplating process is conducted in air without alteration of the atmosphere. In other embodiments, the electroplating process is conducted under a modified atmosphere, which can be partially or completely composed of an inert gas. The inert gas may be, for example, nitrogen or argon. The use of an inert gas may be helpful in preventing or lessening exposure of the electrolyte to moisture and oxygen. In the case of a brush, ball pen, or roller plating device, in some embodiments the compartment housing the electrolyte is initially or repetitively flushed with an inert gas to further ensure protection of the electrolyte from air.
- In some embodiments, the electroplating process is conducted with the electrolyte being at or below room temperature, e.g., a temperature of about, up to, or less than 15, 20, 25, or 30° C. In other embodiments, the electroplating process is conducted with the electrolyte being at an elevated temperature, such as a temperature of about, at least, or above 40, 50, 60, 70, 80, 90, 100, 110, or 120° C. In other embodiments, the electroplating process is conducted with the electrolyte being at temperature within a range bounded by any two of the foregoing exemplary temperatures. Any of the applicator devices described above can be configured to include a heating or cooling element either inside or outside of the compartment (and optionally, a temperature measuring device) to achieve an electrolyte temperature lower or higher than ambient temperature. Alternatively, or in addition, the substrate may be suitably heated or cooled to a desired temperature before, during, or after coating the substrate with the electrolyte.
- The electroplating process may use direct or pulse current. Any suitable current density may also be used, such as a current density of at least 0.01, 0.05, 0.1, 0.5, or 1 A/dm2 and up to 2, 5, 10, 15, 20, 25, 30, 40, or 50 A/dm2. The electroplating time may be suitably varied and used in conjunction with a particular current density and temperature to achieve a desired thickness of the aluminum coating. The electroplating time may be, for example, 1, 5, 10, 20, 30, 40, 50, 60, 90, or 120 minutes depending on the current density and temperature to achieve a desired thickness. The thickness of the aluminum coating for the initial (first plate) or final (i.e., total of one or successively layered plates) may be precisely, about, at least, above, up to, or less than, for example, 1, 2, 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 150, 200, 250, or 300 microns, or a thickness within a range bounded by any two of the foregoing values.
- Examples have been set forth below for the purpose of illustration and to describe certain specific embodiments of the invention. However, the scope of this invention is not to be in any way limited by the examples set forth herein.
- By one methodology, the moisture sensitivity of chloroaluminate-based ionic liquids was significantly reduced by forming polymer gel electrolytes (polymer membranes), either by impregnating liquid electrolytes into preformed membranes, or by co-casting polymer and liquid electrolytes, or by copolymerization of monomers in the presence of plasticizers. For more practical applications, the polymer gel membranes can be cast directly onto aluminum foil, and the resulting layered composite wrapped around a substrate to perform the plating. In this configuration, the aluminum foil serves as the anode and the substrate as the cathode during the electroplating process. A general depiction of the process using a polymer gel electrolyte is provided in
FIG. 1 . - By another methodology, the moisture sensitivity of the chloroaluminate-based ionic liquids was significantly reduced by sealing the ionic liquid electrolyte inside the reservoir of a portable plating brush. The device can be conveniently used when plating is desired at a particular location of a large substrate. A depiction of the process using a portable plating brush is provided in
FIG. 2 . - The above two methodologies, and variants thereof, can facilitate the electroplating process particularly in situations where the substrate is either too large to fit into a conventional plating bath or the configuration of the substrate prohibits such a plating process. These portable plating devices for electrodeposition of Al will benefit coating manufacturers and electronics assembly by reducing or eliminating the use of pyrophoric and/or toxic materials while being convenient and integratable into conventional manufacturing processes.
- Preparation of a room temperature molten mixture: Ethylmethylimidazolium chloride (EMIC) was purified by recrystallization and vacuum drying before use. 4-propylpyridine was purified by distillation. Acetamide and AlCl3 were purified by sublimation. The AlCl3-containing mixtures were prepared by slowly adding AlCl3 to the imidazolium chloride (or the organic solvent) inside an argon-filled glove box. The molar mixing ratio for EMIC was fixed at an AlCl3: EMIC ratio of 1.5:1, while that for 4-propylpyridine was fixed at an AlCl3:4-propylpyridine ratio of 1.4:1. For acetamide, the mixing ratio was fixed at AlCl3:Acetamide=1.2:1.
- Preparation of a self-standing membrane using AlCl3-based molten mixture: To a cooled solution of AlCl3 in dichloromethane was slowly added an equal molar amount of acrylamide with stirring. After addition, the mixture changed to a clear yellow solution. Under the protection of nitrogen, a calculated amount of AlCl3-based molten mixture was added to this solution, followed by addition of the initiator AIBN (1 wt % of monomer). Finally, the solution was cast into a Teflon®-coated aluminum Petri dish and evaporated at room temperature to result in a self-standing membrane after 24 hrs.
- Preparation of portable plating brushes for the electrodeposition of Al: The portable plating brush was made by inserting a short length of fiberglass rope into the end of plastic or glass tubing so as to provide a brush-type tip. Lodging a ceramic ball into the end of the tube provided a ball pen. A suitable amount of the AlCl3-EtMeImCl ionic liquid was added into the barrel/reservoir of the brushes, which soaked into the rope by capillary action or was retained as a liquid in the ballpoint pen. Leaking of ionic liquid from the brush was avoided by using a high-density rope, with care taken to not add an excessive amount of electrolyte. For the ball pen, the ceramic ball was retained loosely to permit it to rotate and provide fresh electrolyte. However, a plug of potting epoxy was cast into the tube barrel and drilled with a small orifice to allow the ionic liquid to flow slowly around the ball tip without draining quickly from the reservoir.
- The anode used was a large spiral of high purity 1-mm diameter aluminum wire or other source of pure Al. To incorporate the anode, the anode was forced into the end of the rope inside the barrel of the brush or immersed in the liquid contents of the ball pen. Because the devices were being tested under ambient conditions in the open atmosphere, they were flooded with an inert shielding gas (dry nitrogen or even very dry air is sufficient) to exclude moisture.
- Electrochemical measurement: Cyclic voltammetry (CV) was performed inside an argon-filled glove box under different scan rates. For the three-electrode system, Pt was used for the working electrode. Al was used as counter and reference electrode. For the polymer gel membranes, a two-electrode system was used system in which copper (Cu) plate was used as the working electrode and Al plate as the anode. Platinum was treated by polishing with Al2O3, followed by washing with deionized water and drying. The copper electrode was treated by polishing with sand paper, followed by degreasing in acetone under ultrasonic exposure for 15 minutes, and then activated in 5 wt % HCl aqueous solution for two minutes to remove any oxide layer that may have formed. Finally, the copper electrode was rinsed thoroughly with deionized water and degreased in dichloromethane for 10 minutes to remove organic impurities and form a chloride layer resistant to oxide formation. The Al electrode was treated by polishing with sand paper, followed by activation in an acidic solution composed of 1% HNO3, 65% H3PO4, 5% acetic acid, and water for 5 minutes. The Al electrode was then rinsed thoroughly with deionized water and degreased in acetone for 5 minutes. Controlled-current electrolysis experiments were performed with a simple adjustable DC power supply.
- Cyclic voltammetry of molten mixtures:
FIGS. 3A and 3B show the cyclic voltammograms of a) AlCl3-EMIC (1.5:1) and b) AlCl3-4-Propylpyridine (1.4:1) molten mixtures on a Pt electrode (2 mm in diameter) under a scan rate of 100 mV/s at room temperature. In both mixtures, the reduction peaks attributed to Al deposition and the oxidation peaks attributed to the stripping of Al were observed. The overpotential for deposition of Al in EMIC mixture was observed to be −100 mV while that in 4-propylpyridine was observed to be −125 mV, which indicates that the former (EMIC mixture) is more kinetically favorable for aluminum deposition. In addition, by comparing these two CVs, it is found that the current densities of the EMIC-based mixture are significantly higher than the current densities of the 4-propylpyridine-based mixture, which indicates a much higher ionic conductivity in the former solution. -
FIGS. 4A and 4B show the CVs of the mixtures of AlCl3 and acetamide at different ratios (1:1 and 1.2:1 AlCl3 to acetamide) on a Pt working electrode (2 mm in diameter) under a scan rate of 10 mV/s. Al wire was used as the counter and reference electrode. Under similar conditions as used for the EMIC- and 4-propylpyridine-based mixtures, the deposition and stripping of Al were observed for these two mixtures. However, the current densities were found to be much higher for the 1.2:1 mixture than for the 1:1 mixture, which indicates more cation complex [AlCl2(Acetamide)2]+ in the former solution. In addition, the overpotential for Al deposition was found to be only −80 mV for the 1.2:1 mixture while it was found to be −180 mV for the 1:1 mixture, suggesting that a higher amount of AlCl3 is more favorable for Al deposition. - In order to cast the polymer gel electrolyte membrane, a suitable or optimal solvent was first sought. To do this, different solvents were added to the mixture of AlCl3-4-propylpyridine (1.5:1), and the CV was scanned at 100 mV/s at room temperature.
FIGS. 5A-5D show the comparison of the CVs. The results obtained without solvent (FIG. 5A ) indicate a well defined Al deposition and stripping peak. With addition of dichloromethane (DCM), as shown inFIG. 5B , the current densities became significantly increased, which indicates a much improved ionic conductivity due to reduced viscosity. However, when acetonitrile (AN) was added to the mixture, as shown inFIG. 5C , it became separated into two layers, which indicates that the coordination between AN and AlCl3 is much stronger than between AN and propylpyridine, and as a result no reversible Al deposition/stripping was observed. The same result was observed when tetrahydrofuran (THF) was used as solvent, as shown inFIG. 5D . Thus, when preparing polymer gel membranes, DCM was used as a solvent. - Self-standing polymer gel membranes containing AlCl3-based molten mixture: When AlCl3 was mixed with acrylamide directly, a solid was formed, indicating that a polymerization reaction occurred due to the exothermal reaction. To avoid such side reaction, AlCl3 was added to acrylamide/DCM solution at 0° C. using an ice bath. After mixing them at 0° C., AICl3-containing mixtures were added, followed by addition of AIBN as initiator and polymerization at room temperature for 24 hours.
FIG. 6 shows a typical picture of the polymer gel membrane containing 60 wt % of AlCl3-EMIC (1.5:1) mixture. -
FIG. 7 shows the CVs of the membrane containing 60 wt % of AlCl3-EMIC (1.5:1) mixture with Cu plate as the working electrode and Al plate as the counter electrode. Generally, the membrane exhibited good electrochemical behavior for the deposition and stripping of Al. It was noticed that the current densities increased with increasing scan cycles, which indicates an activation process, probably due to the residual surface oxide on the Al plate. Nevertheless, this was the first example of the membrane showing the deposition and stripping of Al. An additional reduction peak was observed at 0.1 V, which may be due to the reduction of residual double bond (acryl group) within the membrane. - Polymer gel membranes containing 60 wt % of AlCl3-4-propylpyridine (1.4:1) and AlCl3-acetamide (1.2:1) were also prepared. The corresponding CVs are provided in
FIGS. 8A and 8B , respectively. The deposition and stripping peaks of Al were observed in both membranes. However, the current densities were much smaller than that based on the AlCl3-EMIC mixture, mainly due to the intrinsic lower ionic conductivities of the latter two membranes. - Aluminum deposition using portable plating brush:
FIG. 9 shows a photo of the portable brush-type pen during plating of aluminum on a copper substrate. When the brush was pressed against the substrate, a small amount of ionic liquid was deposited onto the substrate. When the power supply was active, the electrodeposition of Al began. The Al film was produced in a very short amount of time (about 5 seconds), and the total plating process lasted about 10 minutes.FIG. 10A provides a photo of Al deposited on a Cu coupon with the portable plating brush. An optical microscope image of the film is shown inFIG. 10B . Visually, the Al films deposited on Cu have a specular appearance. - In summary, polymer gel membranes containing AlCl3-EMIC (1.5:1), AlCl3-acetamide (1.2:1), and AlCl3-4-propylpyridine (1.4:1) were successfully prepared for the first time. These polymer gel membranes exhibited good electrochemical behavior for the deposition and stripping of Al. It has been shown that the selection of solvent in the process of preparation of the polymer gel membrane affects the electrochemical properties of the membrane, and that the intrinsic ionic conductivity of the ionic liquid plays a key role in the performance of the final polymer gel membrane. Another way to increase the electrochemical performance of the polymer gel membrane is to use a higher temperature. For practical applications, other polymer matrixes such as poly(vinylidene fluoride-hexafluoropropylene) (PVdF(HFP)), polyvinylpyridine, polyacrylate, polymethacrylate, polyacrylonitrile (PAN), polyethylene oxide (PEO), polyethylene, polypropylene membranes, and the like, can also be used.
- In addition, a portable plating brush using an Al-based ionic liquid (AlCl3-EtMeImCl) electrolyte was also successfully prepared. The process was used to successfully plate Al on Cu or steel substrates. Al films can be produced in a very short time (˜5 seconds), and after 5 minutes of plating time, a dense specular film of Al was obtained on Cu or steel. The portable plating brush can find a wide variety of applications in various industries, including the defense industry. Moreover, the plating process can be extended to aluminum alloy plating, such as Al—Mn, Al—Nb, Al—W plating, by controlling the composition of the ionic liquid and with addition of the appropriate alloying metals and other components.
- While there have been shown and described what are at present considered the preferred embodiments of the invention, those skilled in the art may make various changes and modifications which remain within the scope of the invention defined by the appended claims.
Claims (23)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/516,608 US20160108534A1 (en) | 2014-10-17 | 2014-10-17 | Aluminum deposition devices and their use in spot electroplating of aluminum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/516,608 US20160108534A1 (en) | 2014-10-17 | 2014-10-17 | Aluminum deposition devices and their use in spot electroplating of aluminum |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20160108534A1 true US20160108534A1 (en) | 2016-04-21 |
Family
ID=55748579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US14/516,608 Abandoned US20160108534A1 (en) | 2014-10-17 | 2014-10-17 | Aluminum deposition devices and their use in spot electroplating of aluminum |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US20160108534A1 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160201210A1 (en) * | 2013-08-20 | 2016-07-14 | Toyota Jidosha Kabushiki Kaisha | Film formation system and film formation method for forming metal film |
| US20160237580A1 (en) * | 2015-02-17 | 2016-08-18 | Honeywell International Inc. | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same |
| US9771661B2 (en) | 2012-02-06 | 2017-09-26 | Honeywell International Inc. | Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates |
| EP3336224A1 (en) * | 2016-12-16 | 2018-06-20 | Hamilton Sundstrand Corporation | Electroplating systems and methods |
| WO2018017379A3 (en) * | 2016-07-18 | 2018-07-26 | ECSI Fibrotools, Inc. | Apparatus and method of contact electroplating of isolated structures |
| CN109338427A (en) * | 2018-12-04 | 2019-02-15 | 南京航空航天大学 | Electroplating pen device, intelligent electrochemical coating and 3D printing device and method of using the same |
| US10233554B2 (en) * | 2016-03-11 | 2019-03-19 | Applied Materials, Inc. | Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment |
| US10253406B2 (en) * | 2016-03-11 | 2019-04-09 | Applied Materials, Inc. | Method for forming yttrium oxide on semiconductor processing equipment |
| US10920331B2 (en) | 2013-08-07 | 2021-02-16 | Toyota Jidosha Kabushiki Kaisha | Film deposition device of metal film and metal film deposition method |
| US11296329B2 (en) | 2016-12-16 | 2022-04-05 | Industrial Technology Research Institute | Metal-ion battery |
| US11991836B2 (en) | 2016-10-28 | 2024-05-21 | Board Of Regents, The University Of Texas System | Electrical devices with electrodes on softening polymers and methods of manufacturing thereof |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3268421A (en) * | 1961-12-04 | 1966-08-23 | Nat Steel Corp | Electrodeposition of metals from a fused bath of aluminum halohydride organic complex and composition therefor |
| JPS491440A (en) * | 1972-04-25 | 1974-01-08 | ||
| US3997410A (en) * | 1974-02-06 | 1976-12-14 | Eliezer Gileadi | Electrodeposition of aluminum |
| US4145261A (en) * | 1977-02-25 | 1979-03-20 | U.S. Philips Corporation | Electrolyte-liquid for the electrodeposition of aluminum |
| US4226696A (en) * | 1978-06-02 | 1980-10-07 | Vera Paul J | Electrolysis foil |
| US5225059A (en) * | 1992-08-03 | 1993-07-06 | W. R. Associates | Apparatus for single anode brush electroplating |
| JPH07180092A (en) * | 1993-12-22 | 1995-07-18 | Sumitomo Special Metals Co Ltd | Continuous surface treating device |
| US20010024691A1 (en) * | 1999-12-24 | 2001-09-27 | Norio Kimura | Semiconductor substrate processing apparatus and method |
| US20050102819A1 (en) * | 2003-11-18 | 2005-05-19 | Yuan Ze University | Surface film structure of a metallic bipolar plate for fuel cells and a method for producing the same |
| US20090277793A1 (en) * | 2005-09-07 | 2009-11-12 | Nissan Motor Co., Ltd | Nanocarbon/aluminum composite material, process for producing the same, and plating liquid for use in said process |
| US20100032306A1 (en) * | 2008-08-08 | 2010-02-11 | Gm Global Technology Operations, Inc. | Electrochemical deposition of conductive coatings on fuel cell bipolar plates |
| US20110171564A1 (en) * | 2010-01-08 | 2011-07-14 | Gm Global Technology Operations, Inc. | Reversible superhydrophilic-superhydrophobic coating for fuel cell bipolar plates and method of making the same |
-
2014
- 2014-10-17 US US14/516,608 patent/US20160108534A1/en not_active Abandoned
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3268421A (en) * | 1961-12-04 | 1966-08-23 | Nat Steel Corp | Electrodeposition of metals from a fused bath of aluminum halohydride organic complex and composition therefor |
| JPS491440A (en) * | 1972-04-25 | 1974-01-08 | ||
| US3997410A (en) * | 1974-02-06 | 1976-12-14 | Eliezer Gileadi | Electrodeposition of aluminum |
| US4145261A (en) * | 1977-02-25 | 1979-03-20 | U.S. Philips Corporation | Electrolyte-liquid for the electrodeposition of aluminum |
| US4226696A (en) * | 1978-06-02 | 1980-10-07 | Vera Paul J | Electrolysis foil |
| US5225059A (en) * | 1992-08-03 | 1993-07-06 | W. R. Associates | Apparatus for single anode brush electroplating |
| JPH07180092A (en) * | 1993-12-22 | 1995-07-18 | Sumitomo Special Metals Co Ltd | Continuous surface treating device |
| US20010024691A1 (en) * | 1999-12-24 | 2001-09-27 | Norio Kimura | Semiconductor substrate processing apparatus and method |
| US20050102819A1 (en) * | 2003-11-18 | 2005-05-19 | Yuan Ze University | Surface film structure of a metallic bipolar plate for fuel cells and a method for producing the same |
| US20090277793A1 (en) * | 2005-09-07 | 2009-11-12 | Nissan Motor Co., Ltd | Nanocarbon/aluminum composite material, process for producing the same, and plating liquid for use in said process |
| US20100032306A1 (en) * | 2008-08-08 | 2010-02-11 | Gm Global Technology Operations, Inc. | Electrochemical deposition of conductive coatings on fuel cell bipolar plates |
| US20110171564A1 (en) * | 2010-01-08 | 2011-07-14 | Gm Global Technology Operations, Inc. | Reversible superhydrophilic-superhydrophobic coating for fuel cell bipolar plates and method of making the same |
Non-Patent Citations (2)
| Title |
|---|
| Kitada et al., English abstract and machine translation, JP H7-180092 A (1995) * |
| Nisshin Steel Co., English abstract and machine translation, JP S49-1440 (1974) * |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9771661B2 (en) | 2012-02-06 | 2017-09-26 | Honeywell International Inc. | Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates |
| US10920331B2 (en) | 2013-08-07 | 2021-02-16 | Toyota Jidosha Kabushiki Kaisha | Film deposition device of metal film and metal film deposition method |
| US9909226B2 (en) * | 2013-08-20 | 2018-03-06 | Toyota Jidosha Kabushiki Kaisha | Film formation system and film formation method for forming metal film |
| US20160201210A1 (en) * | 2013-08-20 | 2016-07-14 | Toyota Jidosha Kabushiki Kaisha | Film formation system and film formation method for forming metal film |
| US20160237580A1 (en) * | 2015-02-17 | 2016-08-18 | Honeywell International Inc. | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same |
| US10087540B2 (en) * | 2015-02-17 | 2018-10-02 | Honeywell International Inc. | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same |
| US10233554B2 (en) * | 2016-03-11 | 2019-03-19 | Applied Materials, Inc. | Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment |
| US10253406B2 (en) * | 2016-03-11 | 2019-04-09 | Applied Materials, Inc. | Method for forming yttrium oxide on semiconductor processing equipment |
| WO2018017379A3 (en) * | 2016-07-18 | 2018-07-26 | ECSI Fibrotools, Inc. | Apparatus and method of contact electroplating of isolated structures |
| US10184189B2 (en) | 2016-07-18 | 2019-01-22 | ECSI Fibrotools, Inc. | Apparatus and method of contact electroplating of isolated structures |
| US10480092B2 (en) | 2016-07-18 | 2019-11-19 | ECSI Fibrotools Inc. | Apparatus and method of contact electroplating of isolated structures |
| US11991836B2 (en) | 2016-10-28 | 2024-05-21 | Board Of Regents, The University Of Texas System | Electrical devices with electrodes on softening polymers and methods of manufacturing thereof |
| EP3336224A1 (en) * | 2016-12-16 | 2018-06-20 | Hamilton Sundstrand Corporation | Electroplating systems and methods |
| US10954600B2 (en) * | 2016-12-16 | 2021-03-23 | Hamilton Sundstrand Corporation | Electroplating systems and methods |
| US11296329B2 (en) | 2016-12-16 | 2022-04-05 | Industrial Technology Research Institute | Metal-ion battery |
| US11542617B2 (en) * | 2016-12-16 | 2023-01-03 | Hamilton Sundstrand Corporation | Electroplating systems and methods |
| EP4209623A1 (en) * | 2016-12-16 | 2023-07-12 | Hamilton Sundstrand Corporation | Electroplating systems and methods |
| CN109338427A (en) * | 2018-12-04 | 2019-02-15 | 南京航空航天大学 | Electroplating pen device, intelligent electrochemical coating and 3D printing device and method of using the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20160108534A1 (en) | Aluminum deposition devices and their use in spot electroplating of aluminum | |
| US10781525B2 (en) | Aluminum trihalide-neutral ligand ionic liquids and their use in aluminum deposition | |
| Sun et al. | Polymer gel electrolytes for application in aluminum deposition and rechargeable aluminum ion batteries | |
| JP5369050B2 (en) | Metal porous body with high corrosion resistance | |
| JP5703739B2 (en) | Method for producing porous aluminum body, battery electrode material using porous aluminum body, and electrode material for electric double layer capacitor | |
| TW201241243A (en) | Process for production of aluminum structure, and aluminum structure | |
| CN104641022B (en) | The manufacture method of aluminum film | |
| CN102839403B (en) | Method for electroplating aluminum in ionic liquid | |
| CN103582721B (en) | Manufacturing method of aluminum structure and aluminum structure | |
| KR20130069539A (en) | Method of manufacturing aluminum structure, and aluminum structure | |
| US20130122375A1 (en) | Porous metal body, and electrode material and battery both incorporating the body | |
| KR101768560B1 (en) | Method for producing aluminum structure | |
| JP5692233B2 (en) | Aluminum structure manufacturing method and aluminum structure | |
| JP5704026B2 (en) | Method for manufacturing aluminum structure | |
| JPH01238110A (en) | Method of impregnating electrolytic capacitor with tetracyanoquinodimethanate | |
| JPS63102309A (en) | Solid electrolyte capacitor and manufacture of the same | |
| JP2023109717A (en) | Electrode coating | |
| JP2015083716A (en) | Electrode material including aluminum structure, battery and electric double layer capacitor using the same, and filter and catalyst support using aluminum structure | |
| PL128978B1 (en) | Bath for chemical coating of cathode surfaces with pd or pt black in electrolytic capacitors | |
| JPH02192109A (en) | Solid electrolytic capacitor | |
| JPH02292809A (en) | Solid electrolytic capacitor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: UT-BATTELLE, LLC, TENNESSEE Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:DAI, SHENG;SUN, XIAO-GUANG;SIGNING DATES FROM 20150127 TO 20150129;REEL/FRAME:034904/0681 |
|
| AS | Assignment |
Owner name: U.S. DEPARTMENT OF ENERGY, DISTRICT OF COLUMBIA Free format text: CONFIRMATORY LICENSE;ASSIGNOR:UT-BATTELLE, LLC;REEL/FRAME:037161/0540 Effective date: 20150304 |
|
| AS | Assignment |
Owner name: UNIVERSITY OF MISSISSIPPI, MISSISSIPPI Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CHOU, LI-HSIEN;HUSSEY, CHARLES L.;REEL/FRAME:043721/0845 Effective date: 20141029 |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE AFTER FINAL ACTION FORWARDED TO EXAMINER |
|
| STPP | Information on status: patent application and granting procedure in general |
Free format text: ADVISORY ACTION MAILED |
|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |