US20140079877A1 - Magnetic recording medium fabrication method and apparatus - Google Patents
Magnetic recording medium fabrication method and apparatus Download PDFInfo
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- US20140079877A1 US20140079877A1 US14/017,387 US201314017387A US2014079877A1 US 20140079877 A1 US20140079877 A1 US 20140079877A1 US 201314017387 A US201314017387 A US 201314017387A US 2014079877 A1 US2014079877 A1 US 2014079877A1
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Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Definitions
- the present invention relates to a magnetic recording medium fabrication method and a magnetic recording medium fabrication apparatus.
- the magnetic storage apparatus includes a magnetic recording medium that magnetically stores electronic data by magnetic recording.
- Examples of the magnetic storage apparatus include a magnetic disk drive, a flexible disk drive, a magnetic tape apparatus, and the like.
- a HDD Hard Disk Drive
- a HDD Hard Disk Drive
- a general magnetic recording medium has a multi-layer stacked structure including an underlayer, an intermediate layer, a magnetic recording layer, and a protection layer that are deposited in this order on a nonmagnetic substrate, and a lubricant layer coated on a surface of the protection layer.
- an in-line vacuum deposition apparatus is used to continuously stack the layers under decompression, as described in Japanese Laid-Open Patent Publication No. 8-274142, for example.
- a plurality of deposition chambers having a deposition means capable of depositing a layer on the substrate are connected via a gate valve, together with a chamber for carrying out a thermal process and an auxiliary chamber, in order to form a single deposition line.
- the substrate is set on a carrier and passed through the deposition line, the layers are successively deposited on the substrate to fabricate the magnetic recording medium having the desired structure.
- the deposition line is arranged in a ring shape, and a substrate loading and unloading chamber is provided in the deposition line in order to load and unload the substrate with respect to the carrier.
- the carrier which passes through the deposition chambers of the deposition line reaches the substrate loading and unloading chamber where the substrate having the layers deposited thereon is unloaded from the carrier.
- a new substrate to be subjected to the deposition is loaded onto the carrier in the substrate loading and unloading chamber.
- a vapor-phase lubrication has been proposed in Japanese Laid-Open Patent Publication No. 2004-002971, for example.
- the vapor-phase lubrication places the magnetic recording medium within a vacuum chamber, and introduces gas lubricant into the vacuum chamber.
- a vacuum deposition apparatus that carries out sputtering is used to form the magnetic recording layer
- a vacuum deposition apparatus that carries out ion beam deposition is used to form the protection layer
- a vacuum deposition apparatus that carries out vapor-phase lubrication is used to form the lubricant layer, for example.
- process gas (or sputtering gas) used to form the magnetic recording layer is argon gas
- process gas used to form the protection layer is hydrocarbon gas, hydrogen gas, or argon gas, for example
- process gas used to form the lubricant layer is high molecular compound, for example.
- the process gases used in the two adjacent processes have considerably different physical properties, and the effects on the layers formed by the two adjacent processes may be large when the process gases mix between the two adjacent processes, to thereby deteriorate the quality of the layers that are formed.
- a relatively long exhaust time may be required to sufficiently exhaust the residual process gas within the deposition chamber, and productivity of the in-line vacuum deposition apparatus may deteriorate.
- a magnetic recording medium fabrication apparatus that continuously carries out the processes from the formation of the magnetic recording layer until the formation of the lubricant layer of the magnetic recording medium without exposing the stacked body to the atmosphere, it may be desirable to sufficiently exhaust the residual process gas within the deposition chamber after each layer forming process ends, in order to prevent the quality of the layers that are formed from deteriorating due to mixing of the processes gases between the adjacent processes.
- a relatively long exhaust time may be required to sufficiently exhaust the residual process gas within the deposition chamber, which in turn deteriorates the productivity of the magnetic recording medium fabrication process.
- Embodiments of the present invention may provide magnetic recording medium fabrication method and apparatus that may simultaneously prevent the quality of the formed layer from deteriorating and improve the productivity.
- a method of fabricating a magnetic recording medium by sequentially forming a magnetic recording layer, a protection layer, and a lubricant layer on a stacked body may include forming the lubricant layer by vapor-phase lubrication without exposing the stacked body to atmosphere after forming the protection layer on the stacked body; and providing a region having a gas pressure P 3 in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, satisfying relationships P 3 >P 1 and P 3 >P 2 , where P 1 denotes a process gas pressure at a time of forming the protection layer, and P 2 denotes a process gas pressure at a time of forming the lubricant layer.
- FIG. 1 is a schematic diagram illustrating an example of a magnetic recording medium fabrication apparatus in one embodiment of the present invention
- FIG. 2 is a cross sectional view illustrating an example of a magnetic recording medium fabricated by the fabrication apparatus illustrated in FIG. 1 ;
- FIG. 3 is a perspective view illustrating an example of a configuration of a magnetic storage apparatus having the magnetic recording medium fabricated in one embodiment of the present invention.
- the process gas (or sputtering gas) used to form the magnetic recording layer is argon gas
- the process gas used to form the protection layer is hydrocarbon gas, hydrogen gas, or argon gas, for example
- the process gas used to form the lubricant layer is high molecular compound, for example.
- the process gases used in the two adjacent processes have considerably different physical properties, and the effects on the layers formed by the two adjacent processes may be large when the process gases mix between the two adjacent processes, to thereby deteriorate the quality of the layers that are formed.
- the lubricant layer is formed by the vapor-phase lubrication without exposing a stacked body to the atmosphere after forming the protection layer on the stacked body, in order to prevent the impurities from mixing between the protection layer and the lubricant layer.
- a region having a gas pressure P 3 is provided in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, where relationships P 3 >P 1 and P 3 >P 2 are satisfied.
- the gas between two chambers flows from the chamber having the high pressure towards the chamber having the low pressure.
- the mixing of the process gas for forming the protection layer and the process gas for forming the lubricant layer may be prevented.
- the gas flowing into the chamber in which the protection layer is formed and the chamber in which the lubricant layer is formed becomes the inert gas.
- the effects on both the formation of the protection layer and the formation of the lubricant layer may be reduced.
- the gas pressure P 1 may be in a range of 1 Pa to 20 Pa
- the gas pressure P 2 may be in a range of 1 Pa to 50 Pa
- the gas pressure P 3 may be in a range of 10 P 1 to 500 Pa
- the relationships P 3 >P 1 and P 3 >P 2 are preferably satisfied.
- the effect of preventing the mixing of the process gas for forming the protection layer and the process gas for forming the lubricant layer increases as a difference between the gas pressures P 3 and P 1 and a difference between the gas pressures P 3 and P 2 increase.
- the gas pressure P 3 is preferably in a range of 10 Pa to 200 Pa, and the difference between the gas pressures P 3 and P 1 and the difference between the gas pressures P 3 and P 2 are preferably 150 Pa or less.
- FIG. 1 is a schematic diagram illustrating an example of the magnetic recording medium fabrication apparatus in one embodiment of the present invention.
- the magnetic recording medium fabrication apparatus illustrated in FIG. 1 may include a deposition apparatus 101 configured to form the layers of the magnetic recording medium up to the protection layer, and a vapor-phase lubrication deposition apparatus 102 configured to form the lubricant layer on the surface of the protection layer.
- the deposition apparatus 101 may include a substrate loading and unloading chamber 903 , a first corner chamber 904 , a first process chamber 905 , a second process chamber 906 , a second corner chamber 907 , a third process chamber 908 , a fourth process chamber 909 , a fifth process chamber 910 , a sixth process chamber 911 , a seventh process chamber 912 , an eighth process chamber 913 , a third corner chamber 914 , a ninth process chamber 915 , a tenth process chamber 916 , a fourth corner chamber 917 , an eleventh process chamber 918 , a twelfth process chamber 919 , a thirteenth process chamber 920 , and an auxiliary chamber 921 that are connected in a ring shape via inter-chamber gate valves G.
- Each of the chambers 903 through 921 is surrounded by a plurality of partitioning walls, and includes an internal space that may be put into a decompression state.
- the inter-chamber gate valve G which may freely open and close at a high speed, may be provided between two mutually adjacent chambers (for example, the chambers 905 and 906 ). All of the gate valves G are opened and closed at the same timing. Hence, each of a plurality of carriers 925 that transport substrates (not illustrated) may move from one to the other of the mutually adjacent chambers with regularity.
- Each of the first through thirteenth process chambers 905 , 906 , 908 through 913 , 915 , 916 , and 918 through 920 may be provided with a substrate heating means (or substrate heater), a deposition means (or deposition part), a process gas supplying means (or process gas supplying part), an exhaust means (or exhaust part), and the like.
- the deposition means may be formed by a sputtering apparatus, an ion beam deposition apparatus, or the like.
- the gas supplying means and the exhaust means may cause the process gas to flow when necessary.
- the first process chamber 905 up to the tenth process chamber 916 may be used to form the layers of the magnetic recording medium up to the magnetic recording layer.
- the eleventh and twelfth process chambers 918 and 919 may be used to form the protection layer, and the process gas pressure may be P 1 within the eleventh and twelfth process chambers 918 and 919 .
- the thirteenth process chamber 920 may be used as an auxiliary chamber.
- a base pressure (or reaching pressure) of each of the first through thirteenth process chambers 905 , 906 , 908 through 913 , 915 , 916 , and 918 through 920 may be set to 1 ⁇ 10 ⁇ 5 Pa, for example.
- the corner chambers 904 , 907 , 914 , and 917 may be arranged at corners of the magnetic recording medium deposition apparatus 101 , and change an orientation of the carrier 925 in accordance with a moving direction of the carrier 925 .
- the inside of each of the corner chambers 904 , 907 , 914 , and 917 may be set to vacuum, and each of the corner chambers 904 , 907 , 914 , and 917 may rotate the carrier 925 in a decompression state.
- the substrate loading and unloading chamber 903 is arranged between the first corner chamber 904 and the auxiliary chamber 921 .
- the internal space of the substrate loading and unloading chamber 903 may be larger than that of other chambers.
- Two carriers 925 may be arranged within the substrate loading and unloading chamber 903 , such that the substrate is loaded onto one of the two carriers 925 and the substrate is unloaded from the other of the two carriers 925 .
- Each of the carriers 925 may be transported simultaneously in a direction indicated by arrows in FIG. 1 .
- the substrate loading and unloading chamber 903 may be connected to a substrate input chamber 902 and a substrate output chamber 922 .
- a vacuum robot 111 may be arranged within the substrate input chamber 902 , and another vacuum robot 112 may be arranged within the substrate output chamber 922 .
- the vacuum robots 111 and 112 are examples of a transport apparatus.
- the substrate input chamber 902 may load the substrate onto the carrier 925 within the substrate loading and unloading chamber 903 , using the vacuum robot 111 .
- the substrate output chamber 922 may unload the substrate from the carrier 925 within the substrate loading and unloading chamber 903 , using the vacuum robot 112 .
- the substrate input chamber 902 may be connected to an airlock chamber 12 via the inter-chamber gate valve G.
- the substrate output chamber 922 may be connected to an airlock chamber 13 via the inter-chamber gate valve G.
- Each of the airlock chambers 12 and 13 may store or accommodate therein a plurality of substrates (for example, 50 substrates).
- Each of the airlock chambers 12 and 13 may include a function to receive the substrate to be stored at one end and to supply the stored substrate at the other end.
- Each of the airlock chambers 12 and 13 may operate so that the following processes are repeated.
- the input of the substrate to the deposition apparatus 101 may be carried out by the process including the following steps s 1 through s 9 .
- Step s 1 Gate values G 1 and G 2 are closed.
- Step s 2 The inside of the airlock chamber 12 is set to atmospheric pressure.
- Step s 3 The gate valve G 1 is opened.
- Step s 5 The plurality of substrates (for example, 50 substrates) are input to the airlock chamber 12 by a substrate input robot 940 which is an example of a transport apparatus.
- Step s 6 The gate valve G 1 is closed.
- Step s 7 The inside of the airlock chamber 12 is decompressed to vacuum.
- Step s 8 The gate valve G 2 is opened.
- Step s 9 The substrate within the airlock chamber 12 is loaded onto the carrier 925 within the substrate loading and unloading chamber 903 by the vacuum robot 111 .
- the output of the stacked body from the deposition apparatus 101 and the input of the stacked body to the vapor-phase lubrication deposition apparatus 102 may be carried out by the process including the following steps s 11 through s 18 .
- Step s 11 Gate valves G 3 and G 4 are closed.
- Step s 12 The inside of the airlock chamber 13 is decompressed to vacuum.
- Step s 13 The gate valve G 3 is opened.
- Step s 14 The substrate is removed from the carrier 925 within the substrate loading and unloading chamber 903 , and stored within the airlock chamber 12 , using the vacuum robot 112 .
- Step s 15 The gate valve G 3 is closed until the inside of the airlock chamber 12 becomes full of substrates (for example, 50 substrates are stored).
- Step s 16 The inside of the airlock chamber 13 is decompressed to vacuum.
- Step s 17 The gate valve G 4 is opened.
- Step s 18 The substrates (for example, 50 substrates) within the airlock chamber 12 are input to the vapor-phase lubrication deposition apparatus 102 using a vacuum robot 941 provided within a vacuum chamber 942 .
- the vacuum robot 941 is an example of the transport apparatus.
- the vapor-phase lubrication deposition apparatus 102 may include an isolation chamber 943 to be filled with inert gas, a vapor-phase lubrication process chamber 944 , an airlock chamber 945 , and a transport cassette return path chamber 947 that are connected via gate valves G.
- a substrate output robot 946 for outputting the stacked body formed with the lubricant layer may be provided adjacent to the airlock chamber 945 .
- the substrate output robot 946 is an example of the transport apparatus.
- a transport cassette 948 configured to transport a plurality of stacked bodies (for example, 50 stacked bodies) may be transported amongst each of the chambers 943 through 945 , and 947 .
- the process gas pressure within the vapor-phase lubrication process chamber 944 is set to P 2
- the process gas pressure within the isolation chamber 943 filled with the inert gas is set to P 3 .
- the stacked bodies (hereinafter also referred to as “substrate”) within the vapor-phase lubrication deposition apparatus 102 may move so that the following processes are repeated, and processes including the following steps s 21 through s 39 may be performed continuously.
- Step s 21 Gate valves G 5 and G 6 are closed.
- Step s 22 The inside of the isolation chamber 943 is decompressed to vacuum.
- Step s 23 The gate valve G 5 is opened.
- Step s 24 The substrates (for example, 50 substrates) within the airlock chamber 12 are set into the transport cassette 948 within the isolation chamber 943 , using the vacuum robot 941 .
- Step s 25 The gate valve is closed.
- Step s 26 The inert gas is supplied into the isolation chamber 943 , to make the internal gas pressure P 3 inside the isolation chamber 943 .
- Step s 27 The gate valve G 6 is opened.
- Step s 28 The transport cassette 948 within the isolation chamber 943 is supplied into the vapor-phase lubrication process chamber 944 .
- Step s 29 The lubricant layer is formed on the stacked bodies within the transport cassette 948 inside the vapor-phase lubrication process chamber 944 .
- Step s 30 A gate valve G 7 is opened, and the transport cassette 948 accommodating the stacked bodies formed with the lubricant layer is moved to the airlock chamber 945 .
- Step s 31 The gate valve G 7 is closed.
- Step s 32 The inside of the airlock chamber 945 is set to atmospheric pressure.
- Step s 33 A gate valve G 8 is opened.
- Step s 34 The processed stacked bodies are extracted by the substrate output robot 946 .
- Step s 35 The gate valve G 8 is closed.
- Step s 36 The inside of the airlock chamber 945 is decompressed to vacuum.
- Step s 37 A gate valve G 9 is opened.
- Step s 38 The empty transport cassette 948 is moved to the isolation chamber 943 via the return path chamber 947 .
- the inside of the return path chamber 947 is decompressed to vacuum.
- Step s 39 A gate valve G 10 is opened in the decompression state of the isolation chamber 943 , and the empty transport cassette 948 is supplied into the isolation chamber 943 .
- FIG. 2 is a cross sectional view illustrating an example of a magnetic recording medium 1 fabricated by the fabrication apparatus illustrated in FIG. 1 .
- the data recording system with respect to the magnetic recording medium 1 may be an in-plane (or longitudinal) recording system or a perpendicular recording system, however, it is assumed for the sake of convenience that the magnetic recording medium 1 in this embodiment employs the perpendicular recording system.
- the magnetic recording medium 1 may include a substrate 100 , a bonding layer 110 formed on the substrate 100 , a soft magnetic underlayer 120 formed on the bonding layer 110 , an orientation control layer 130 formed on the soft magnetic underlayer 120 , a nonmagnetic underlayer 140 formed on the orientation control layer 130 , a perpendicular recording layer 150 formed on the nonmagnetic underlayer 140 , a protection layer 160 formed on the perpendicular recording layer 150 , and a lubricant layer 170 formed on the protection layer 160 .
- the perpendicular recording layer 150 is an example of a magnetic recording layer.
- the magnetic recording medium 1 has a configuration in which the bonding layer 110 , the soft magnetic underlayer 120 , the orientation control layer 130 , the nonmagnetic underlayer 140 , the perpendicular recording layer 150 , the protection layer 160 , and the lubricant layer 170 are formed on both sides of the substrate 100 .
- a stacked structure in which the bonding layer 110 up to the protection layer 160 are stacked on both sides of the substrate 100 that is, the stacked structure in which all of the layers of the magnetic recording medium 1 except the lubricant layer 170 are formed on both sides of the substrate 100 , may also be referred to as a “stacked substrate 180 ”, where appropriate.
- a stacked structure in which the bonding layer up to the perpendicular recording layer 150 are stacked on both sides of the substrate 100 may also be referred to as a “stacked body 190 ”, where appropriate.
- the substrate 100 may be made of a nonmagnetic material.
- the substrate 100 may be formed by a metal substrate made of a metal material such as aluminum, aluminum alloy, and the like.
- the substrate 100 may be formed by a nonmetallic substrate made of a nonmetallic material such as glass, ceramics, silicon, silicon carbide, carbon, and the like.
- the substrate 100 may have a NiP layer or a NiP alloy layer, formed on the surface of the metal substrate or the nonmetallic substrate, by plating, sputtering, or the like.
- the glass substrate may also be made of float glass, glass ceramics, and the like.
- general-purpose soda-lime glass, aluminosilicate glass, and the like may be used for the flat glass.
- lithium glass ceramics, and the like for example, may be used for the glass ceramics.
- a sintered body having general-purpose aluminum oxide, aluminum nitride, silicon nitride, or the like as its main component, or a fiber reinforced material of such materials, for example, may be used for the ceramic substrate.
- the bonding layer 110 may preferably be provided between the substrate 100 and the soft magnetic underlayer 120 .
- the material used for the bonding layer 110 may suitably be selected from Cr, Cr alloy, Ti, Ti alloy, and the like, for example.
- the bonding layer 110 may preferably have a thickness of 2 nm (20 ⁇ ) or greater.
- the soft magnetic underlayer 120 may be provided to reduce noise at the time of recording and reproduction, in a case in which the perpendicular recording system is employed.
- the soft magnetic underlayer 120 may include a first soft magnetic layer 121 formed on the bonding layer 110 , a spacer layer 122 formed on the first soft magnetic layer 121 , and a second soft magnetic layer 123 formed on the spacer layer 122 .
- the soft magnetic underlayer 120 may have a structure in which the spacer layer 122 is sandwiched between the first soft magnetic layer 121 and the second soft magnetic layer 123 .
- the first soft magnetic layer 121 and the second soft magnetic layer 123 may preferably be made of a material including Fe:Co in a range of 40:60 to 70:30 in atomic ratio (at %).
- the first soft magnetic layer 121 and the second soft magnetic layer 123 may preferably include an element selected from a group consisting of Ta, Nb, Zr, and Cr in a range of 1 at % to 8 at %.
- the spacer layer 122 may be made of Ru, Re, Cu, or the like, and may preferably be made of Ru in particular.
- the orientation control layer 130 may be provided to improve the recording and reproducing characteristics, by reducing crystal grain sizes of the perpendicular recording layer 150 that is formed via the nonmagnetic underlayer 140 .
- the material used for the orientation control layer 130 is not limited to a particular material, however, a material having a hcp structure, a fcc structure, or an amorphous structure may preferably be used for the orientation control layer 130 .
- the orientation control layer 130 may preferably be made of an Ru alloy, Ni alloy, Co alloy, Pt alloy, or Cu alloy in particular, and the orientation control layer 130 may have a multi-layer structure in which such alloys are stacked. For example, a multi-layer structure formed by Ni alloy and Ru alloy, a multi-layer structure formed by Co alloy and Ru alloy, or a multi-layer structure formed by Pt alloy and Ru alloy, may preferably be formed from the side of the substrate 100 .
- the nonmagnetic underlayer 140 may be provided to suppress disturbance in crystal growth at an initial stacked part of the perpendicular recording layer 150 that is stacked on the nonmagnetic underlayer 140 , and to suppress noise generation at the time of the recording and reproduction. However, the nonmagnetic underlayer 140 may be omitted.
- the nonmagnetic underlayer 140 may preferably be made of a material including a metal having Co as its main component, and additionally including an oxide.
- a Cr-content of the nonmagnetic underlayer 140 may preferably be in a range of 25 at % to 50 at %.
- the oxide included in the nonmagnetic underlayer 140 may preferably be an oxide of Cr, Si, Ta, Al, Ti, Mg, Co, or the like. TiO 2 , Cr 2 O 3 , SiO 2 , or the like may particularly be preferable for use as the oxide included in the nonmagnetic underlayer 140 .
- the oxide-content of the nonmagnetic underlayer 140 may preferably be in a range of 3 mol % to 18 mol %, with respect to a mol total calculated by regarding an alloy of Co, Cr, Pt, or the like, for example, forming the magnetic grains (or particles), as one compound.
- the perpendicular recording layer 150 may include a first magnetic layer 151 formed on the nonmagnetic underlayer 140 , a first nonmagnetic layer 152 formed on the first magnetic layer 151 , a second magnetic layer 153 formed on the first nonmagnetic layer 152 , a second nonmagnetic layer 154 formed on the second magnetic layer 153 , and a third magnetic layer 155 formed on the second nonmagnetic layer 154 .
- the first nonmagnetic layer 152 is sandwiched between the first magnetic layer 151 and the second magnetic layer 153
- the second nonmagnetic layer 154 is sandwiched between the second magnetic layer 153 and the third magnetic layer 155 .
- the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 may be provided to store data by inverting the magnetization direction in a direction taken along the thickness of the perpendicular recording layer 150 by the magnetic energy supplied from a magnetic head 3 (illustrated in FIG. 3 which will be described later) and maintaining the state of the magnetization.
- the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 may form the magnetic layer of this embodiment.
- the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 may preferably include metal magnetic grains having Co as its main component, and a nonmagnetic oxide, and have a granular structure in which the magnetic grains are surrounded by the oxide.
- the oxide included in the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 may preferably be Cr, Si, Ta, Al, Ti, Mg, Co, or the like. TiO 2 , Cr 2 O 3 , SiO 2 , or the like may particularly be preferable for use as the oxide included in the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 .
- the lowermost first magnetic layer 151 of the perpendicular recording layer 150 may preferably include a complex (or composite) oxide made up of two or more kinds of oxides.
- the complex oxide included in the first magnetic layer 151 may preferably be Cr 2 O 3 —SiO 2 , Cr 2 O 3 —TiO 2 , Cr 2 O 3 —SiO 2 —TiO 2 , or the like.
- the material used for the magnetic grains of the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 may preferably include compositions such as 90(Co14Cr18Pt)-10(SiO 2 ) ⁇ mol concentration of 90 mol % calculated using magnetic particles having a Cr-content of 14 at %, a Pt-content of 18 at %, and the remainder Co as one compound, and 10 mol % of an oxide component having SiO 2 ⁇ , 92(Co10Cr16Pt)-8(SiO 2 ), 94(Co8Cr14Pt4Nb)-6(Cr 2 O 3 ), (CoCrPt)—(Ta 2 O 5 ), (CoCrPt)—(Cr 2 O 3 )—(TiO 2 ) (CoCrPt)—(Cr 2 O 3 )—(SiO 2 ), (CoCrPt)—(Cr 2 O 3 )—(SiO 2 )—(Si
- the first nonmagnetic layer 152 and the second nonmagnetic layer 154 may be provided to facilitate the magnetic inversion in each of the magnetic layers, namely, the first magnetic layer 151 , the second magnetic layer 153 , and the third magnetic layer 155 forming the perpendicular recording layer 150 , and to reduce noise by reducing variance of the magnetic inversions of the magnetic particles as a whole.
- the first nonmagnetic layer 152 and the second nonmagnetic layer 154 may preferably include Ru and Co, for example.
- the perpendicular recording layer 150 includes magnetic layers (first, second, and third magnetic layers 151 , 153 , and 155 ) forming the 3-layer structure, however, the structure of the magnetic layers is not limited to the 3-layer structure, and the magnetic layers may form a multi-layer structure of four (4) or more layers.
- a nonmagnetic layer (a corresponding one of first and second nonmagnetic layers 152 and 154 ) is interposed between two adjacent magnetic layers (two adjacent ones of first, second, and third magnetic layers 151 , 153 , and 155 ) forming the perpendicular recording layer 150
- the structure of the magnetic layers forming the perpendicular recording layer 150 is not limited to such a structure.
- the perpendicular recording layer 150 may have a structure in which two magnetic layers having mutually different compositions are stacked.
- the protection layer 160 may be provided to prevent corrosion of the perpendicular recording layer 150 , and to prevent damage to the medium surface or the magnetic head 3 itself when the magnetic head 3 and the magnetic recording medium 1 make contact.
- the protection layer 160 may be provided to also improve the corrosion resistance of the magnetic recording medium 1 .
- the protection layer 160 may be made of a known material.
- the protection layer 160 may be made of a material including C, SiO 2 or ZrO 2 , for example.
- the protection layer 160 may preferably be made of amorphous hard carbon or DLC (Diamond Like Carbon).
- the protection layer 160 may preferably have a thickness of 1 nm to 10 nm, for example, in order to reduce the distance between the magnetic head 3 and the magnetic recording medium 1 in a magnetic storage apparatus which will be described later in conjunction with FIG. 3 .
- the lubricant layer 170 may be provided to suppress friction between the magnetic head 3 and the surface of the magnetic recording medium 1 when the magnetic head 3 makes contact with the magnetic recording medium 1 , and to improve the corrosion resistance of the magnetic recording medium 1 .
- the lubricant layer 170 may be made of a known lubricant material.
- the lubricant layer 170 may preferably be made of a lubricant such as perfluoropolyether, fluorinated alcohol, fluorinated carboxylic acid, or the like.
- the lubricant layer 170 may preferably have a thickness of 1 nm to 2 nm, for example, in order to reduce the distance between the magnetic head 3 and the magnetic recording medium 1 in the magnetic storage apparatus which will be described later in conjunction with FIG. 3 .
- the lubricant When forming the lubricant layer 170 by the vapor-phase lubrication, the lubricant is heated to a temperature in a range of 90° C. to 150° C., and vapor of the lubricant is introduced into the reaction chamber.
- the pressure within the reaction chamber is set to approximately 10 Pa, for example, and an exposure time of the stacked body in the reaction chamber is set to approximately 10 seconds, for example, in order to form the lubricant layer 170 on the surface of the protection layer 160 to a thickness of approximately 1 nm, for example.
- FIG. 3 is a perspective view illustrating an example of a configuration of the magnetic storage apparatus having the magnetic recording medium 1 fabricated in this embodiment of the present invention.
- a magnetic storage apparatus 50 illustrated in FIG. 3 may be provided with the magnetic recording medium 1 that magnetically records data, a rotary driving part 2 that rotationally drives the magnetic recording medium 1 , the magnetic head 3 that writes (or records) data to and reads (or reproduces) the data from the magnetic recording medium 1 , a carriage 4 mounted with the magnetic head 3 , a head driving part 5 that moves the magnetic head 3 via the carriage 4 relative to the magnetic recording medium 1 , and a signal processor 6 .
- the signal processor 6 may subject data input from an external host unit (not illustrated) or the like to a known signal processing, in order to supply recording signals suited for the recording on the magnetic recording medium 1 to the magnetic head 3 .
- the signal processor 6 may subject the signals read from the magnetic recording medium 1 by the magnetic head 3 to a known signal processing, and output reproduced data to the external host unit or the like.
- the magnetic recording medium 1 is a magnetic disk having a disk shape.
- the magnetic disk includes a magnetic recording layer to record the data, on at least one of the two sides (or surfaces) of the magnetic disk.
- the magnetic recording layer may be provided on both sides (or both surfaces) of the magnetic disk, as illustrated in FIG. 2 .
- a plurality of magnetic recording media in this example, three (3) magnetic recording media are provided in the magnetic storage apparatus 50 .
- the number of magnetic recording media 1 provided in the magnetic storage apparatus 50 may be one (1) or greater.
- a cleaned glass substrate manufactured by Konica Minolta, Inc. and having an outer diameter of 2.5 inches
- the inside of the deposition chambers are decompressed (or evacuated) to a vacuum (or base pressure) of 1 ⁇ 10 ⁇ 5 Pa.
- a bonding layer having a thickness of 10 nm is deposited on the glass substrate within the process chamber 905 in which the argon gas pressure is 1 Pa, using a 60Cr-50Ti target.
- a first soft magnetic layer having a thickness of 34 nm is deposited on the bonding layer within the process chamber 906 in which the argon gas pressure is 1 Pa and the substrate temperature is 100° C. or lower, using a 46Fe-46Co-5Zr-3B ⁇ Fe-content of 46 at %, Co-content of 46 at %, Zr-content of 5 at %, and B-content of 3 at % ⁇ target.
- an Ru layer having a thickness of 0.76 nm is deposited on the first soft magnetic layer within the process chamber 908 , using an Ru target.
- a second soft magnetic layer having a thickness of 34 nm is deposited on the Ru layer within the process chamber 909 , using a 46Fe-46Co-5Zr-3B target.
- the first and second soft magnetic layers sandwiching the Ru layer are formed as the soft magnetic underlayer.
- a first underlayer having a thickness of 5 nm is deposited on the soft magnetic underlayer within the process chamber 910 in which the argon gas pressure is 1 Pa, using a Ni-6W ⁇ W-content of 6 at %, and the remainder Ni ⁇ target.
- a second underlayer having a thickness of 10 nm is deposited on the first underlayer within the process chamber 911 , using an Ru target.
- a third underlayer having a thickness of 10 nm is deposited within the process chamber 912 in which the argon gas pressure is 1 Pa, using an Ru target.
- An underlayer having a 3-layer structure is formed by the first, second, and third underlayers.
- a magnetic layer having a multi-layer structure is deposited on the underlayer having the S-layer structure. More particularly, a Co6Cr16Pt6Ru-4SiO 2 -3Cr 2 O 3 -2TiO 2 layer having a thickness of 6 nm is deposited on the third underlayer within the process chamber 913 in which the argon gas pressure is 1 Pa. In addition, a Co11-5Cr13Pt10Ru-4SiO 2 -3Cr 2 O 3 -2TiO 2 layer having a thickness of 6 nm is deposited on the Co6Cr16Pt6Ru-4SiO 2 -3Cr 2 O 3 -2TiO 2 layer within the process chamber 915 in which the argon gas pressure is 1 Pa.
- a Co15Cr16Pt6B layer having a thickness of 3 nm is deposited on the Co11-5Cr13Pt10Ru-4SiO 2 -3Cr 2 O 3 -2TiO 2 layer within the process chamber 916 in which the argon gas pressure is 1 Pa.
- a carbon protection layer having a thickness of 2.5 nm is deposited on the magnetic layer within the process chambers 918 and 919 , using an ion beam, in order to obtain the stacked body (or magnetic recording medium).
- the base pressure within the process chambers 918 and 919 is 1 ⁇ 10 ⁇ 5 Pa
- a mixture gas in which 4% methane is mixed to hydrogen gas is used for the process gas
- the gas pressure (P 1 ) is 8 Pa.
- the chambers 920 and 921 are used as auxiliary chambers, and no process gas is supplied to the auxiliary chambers, and the base pressure within the auxiliary chambers is 1 ⁇ 10 ⁇ 5 Pa.
- the stacked body that is obtained is removed from the carrier 925 by the vacuum robot 112 , and is supplied into the vapor-phase lubrication deposition apparatus 102 by the vacuum robot 941 .
- the base pressure within each of the isolation chamber 943 , the vapor-phase lubrication process chamber 944 , the airlock chamber 945 , and the return path chamber 947 forming the vapor-phase lubrication deposition apparatus 102 is set to 1 ⁇ 10 ⁇ 5 Pa.
- argon gas is supplied at 50 Pa (gas pressure P 3 ) into the isolation chamber 943
- perfluoropolyether gas is supplied at 20 Pa (gas pressure P 2 ) into the vapor-phase lubrication process chamber 944
- no process gas is supplied to the airlock chamber 945 and the return path chamber 947 .
- a perfluoropolyether lubricant layer having a thickness of 15 ⁇ is formed on the surface of the stacked body by the vapor-phase lubrication deposition apparatus 102 .
- the stacked body (or magnetic recording medium) formed with the lubricant layer is removed outside the fabrication apparatus, to the atmosphere, using the substrate output robot 946 .
- the method described above is used to fabricate 10 , 000 magnetic recording media, and the inconsistency in the thickness of the lubricant layer, the recording and reproducing characteristics (SNR: Signal-to-Noise Ratio), and the OW (Over-Write) performance of the 10,000 magnetic recording media are evaluated.
- the thickness of the lubricant layer is measured at twenty (20) locations on the surface of the magnetic recording medium using a FT-IR (Fourier Transform-Infra-Red Spectrometer), and the variance with respect to the average value of the measured thicknesses is evaluated.
- FT-IR Fastier Transform-Infra-Red Spectrometer
- GMR Giant Magneto Resistive
- a signal of 500 kFCI is written on the magnetic recording medium, a signal of 67 kFCI is written over the signal of 500 kFCI, and the remaining component of the first written signal of 500 kFCI is measured.
- the process gas pressures P 1 , P 2 , and P 3 are changed as shown in Table 1 for a second practical example PE2 and comparison examples CE1, CE2, and CE3.
- the inconsistency in the thickness of the lubricant layer, the recording and reproducing characteristics (SNR), and the OW performance magnetic recording media are evaluated in a manner similar to the practical example PE1, and evaluation results of the second practical example PE2 and the comparison examples CE1 through CE3 are also shown in Table 1.
- the argon gas within the isolation chamber may flow into the vapor-phase lubrication process chamber, or the lubricant gas within the vapor-phase lubrication process chamber flows into the isolation chamber, and the lubricant gas pressure within the vapor-phase lubrication process chamber varies, to thereby cause the inconsistency in the thickness of the lubricant layer.
- the inconsistency in the thickness of the lubricant layer in each of the comparison example CE3 and the practical example PE2 is within a tolerable range for use as the magnetic recording medium.
- the magnetic recording medium fabricated by the magnetic recording medium fabrication method in the embodiment has superior electromagnetic conversion characteristics and small and tolerable inconsistency in the thickness of the lubricant layer.
- the quality of the formed layer may be prevented from deteriorating, and the productivity may be improved, simultaneously.
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Abstract
A method of fabricating a magnetic recording medium sequentially forms a magnetic recording layer, a protection layer, and a lubricant layer on a stacked body. The lubricant layer is formed by vapor-phase lubrication without exposing the stacked body to atmosphere after forming the protection layer on the stacked body. A region having a gas pressure P3 is provided in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, satisfying relationships P3>P1 and P3>P2, where P1 denotes a process gas pressure at a time of forming the protection layer, and P2 denotes a process gas pressure at a time of forming the lubricant layer.
Description
- This application is based upon and claims the benefit of priority of the prior Japanese Patent Application No. 2012-202998 filed on Sep. 14, 2012, the entire contents of which are incorporated herein by reference.
- 1. Field of the Invention
- The present invention relates to a magnetic recording medium fabrication method and a magnetic recording medium fabrication apparatus.
- 2. Description of the Related Art
- Recently, a magnetic storage apparatus may be provided in various products, including a personal computer, a video recorder, a data server, and the like, and the importance of the magnetic storage apparatus is increasing. The magnetic storage apparatus includes a magnetic recording medium that magnetically stores electronic data by magnetic recording. Examples of the magnetic storage apparatus include a magnetic disk drive, a flexible disk drive, a magnetic tape apparatus, and the like. A HDD (Hard Disk Drive) is an example of the magnetic disk drive.
- For example, a general magnetic recording medium has a multi-layer stacked structure including an underlayer, an intermediate layer, a magnetic recording layer, and a protection layer that are deposited in this order on a nonmagnetic substrate, and a lubricant layer coated on a surface of the protection layer. In order to prevent mixing of impurities between the layers forming the magnetic recording medium during fabrication of the magnetic recording medium, an in-line vacuum deposition apparatus is used to continuously stack the layers under decompression, as described in Japanese Laid-Open Patent Publication No. 8-274142, for example.
- In the in-line vacuum deposition apparatus, a plurality of deposition chambers having a deposition means capable of depositing a layer on the substrate are connected via a gate valve, together with a chamber for carrying out a thermal process and an auxiliary chamber, in order to form a single deposition line. When the substrate is set on a carrier and passed through the deposition line, the layers are successively deposited on the substrate to fabricate the magnetic recording medium having the desired structure.
- Generally, the deposition line is arranged in a ring shape, and a substrate loading and unloading chamber is provided in the deposition line in order to load and unload the substrate with respect to the carrier. The carrier which passes through the deposition chambers of the deposition line reaches the substrate loading and unloading chamber where the substrate having the layers deposited thereon is unloaded from the carrier. In addition, after removing the substrate from the carrier, a new substrate to be subjected to the deposition is loaded onto the carrier in the substrate loading and unloading chamber.
- In addition, as a method of forming the lubricant layer on the surface of the magnetic recording medium, a vapor-phase lubrication has been proposed in Japanese Laid-Open Patent Publication No. 2004-002971, for example. The vapor-phase lubrication places the magnetic recording medium within a vacuum chamber, and introduces gas lubricant into the vacuum chamber.
- In a case in which the magnetic recording medium having the multi-layer stacked structure described above is fabricated by the in-line vacuum deposition apparatus, a vacuum deposition apparatus that carries out sputtering is used to form the magnetic recording layer, a vacuum deposition apparatus that carries out ion beam deposition is used to form the protection layer, and a vacuum deposition apparatus that carries out vapor-phase lubrication is used to form the lubricant layer, for example. Hence, the layer forming processes (or deposition steps) from the formation of the magnetic recording layer until the formation of the lubricant layer can be carried out without exposing a stacked body to the atmosphere.
- However, process gas (or sputtering gas) used to form the magnetic recording layer is argon gas, for example, process gas used to form the protection layer is hydrocarbon gas, hydrogen gas, or argon gas, for example, and process gas used to form the lubricant layer is high molecular compound, for example. For this reason, between the process to form the magnetic recording layer and the process to form the protection layer, the effects of the process gases mixing between the two adjacent processes may be relatively small. On the other hand, between the process to form the protection layer and the process to form the lubricant layer, the process gases used in the two adjacent processes have considerably different physical properties, and the effects on the layers formed by the two adjacent processes may be large when the process gases mix between the two adjacent processes, to thereby deteriorate the quality of the layers that are formed. In order to prevent the quality of the layers that are formed from deteriorating due to the mixing of the gases between the two adjacent processes, it may be desirable to sufficiently exhaust the residual process gas remaining within the deposition chamber after each layer forming process ends, for example. However, a relatively long exhaust time may be required to sufficiently exhaust the residual process gas within the deposition chamber, and productivity of the in-line vacuum deposition apparatus may deteriorate.
- In a magnetic recording medium fabrication apparatus that continuously carries out the processes from the formation of the magnetic recording layer until the formation of the lubricant layer of the magnetic recording medium without exposing the stacked body to the atmosphere, it may be desirable to sufficiently exhaust the residual process gas within the deposition chamber after each layer forming process ends, in order to prevent the quality of the layers that are formed from deteriorating due to mixing of the processes gases between the adjacent processes. However, a relatively long exhaust time may be required to sufficiently exhaust the residual process gas within the deposition chamber, which in turn deteriorates the productivity of the magnetic recording medium fabrication process. Hence, in the conventional magnetic recording medium fabrication method and apparatus, it may be difficult to simultaneously prevent the quality of the formed layer from deteriorating and improve the productivity.
- Embodiments of the present invention may provide magnetic recording medium fabrication method and apparatus that may simultaneously prevent the quality of the formed layer from deteriorating and improve the productivity.
- According to one aspect of the present invention, a method of fabricating a magnetic recording medium by sequentially forming a magnetic recording layer, a protection layer, and a lubricant layer on a stacked body, may include forming the lubricant layer by vapor-phase lubrication without exposing the stacked body to atmosphere after forming the protection layer on the stacked body; and providing a region having a gas pressure P3 in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, satisfying relationships P3>P1 and P3>P2, where P1 denotes a process gas pressure at a time of forming the protection layer, and P2 denotes a process gas pressure at a time of forming the lubricant layer.
- Other objects and further features of the present invention will be apparent from the following detailed description when read in conjunction with the accompanying drawings.
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FIG. 1 is a schematic diagram illustrating an example of a magnetic recording medium fabrication apparatus in one embodiment of the present invention; -
FIG. 2 is a cross sectional view illustrating an example of a magnetic recording medium fabricated by the fabrication apparatus illustrated inFIG. 1 ; and -
FIG. 3 is a perspective view illustrating an example of a configuration of a magnetic storage apparatus having the magnetic recording medium fabricated in one embodiment of the present invention. - A description will be given of the magnetic recording medium fabrication method and apparatus in each embodiment of the present invention, by referring to the drawings.
- In a case in which the magnetic recording medium having the multi-layer stacked structure described above is fabricated using the in-line vacuum deposition apparatus, the process gas (or sputtering gas) used to form the magnetic recording layer is argon gas, for example, the process gas used to form the protection layer is hydrocarbon gas, hydrogen gas, or argon gas, for example, and the process gas used to form the lubricant layer is high molecular compound, for example. For this reason, between the process to form the magnetic recording layer and the process to form the protection layer, the effects of the process gases mixing between the two adjacent processes may be relatively small. On the other hand, between the process to form the protection layer and the process to form the lubricant layer, the process gases used in the two adjacent processes have considerably different physical properties, and the effects on the layers formed by the two adjacent processes may be large when the process gases mix between the two adjacent processes, to thereby deteriorate the quality of the layers that are formed. In order to prevent the quality of the layers that are formed from deteriorating due to the mixing of the gases between the two adjacent processes, it may be desirable to sufficiently exhaust the residual process gas remaining within the deposition chamber after each layer forming process ends, for example.
- In order to prevent the quality of the layers that are formed from deteriorating due to the mixing of the gases between the two adjacent processes, it is conceivable to sufficiently exhaust the residual process gas remaining within the deposition chamber after each layer forming process ends, and to thereafter open a gate valve between the two adjacent deposition chambers to transfer the substrate from one deposition chamber to the other. However, a relatively long exhaust time may be required to sufficiently exhaust the residual process gas within the deposition chamber, and productivity of the in-line vacuum deposition apparatus may deteriorate.
- It is also conceivable to provide an auxiliary vacuum chamber between the two adjacent deposition chambers, in order to increase the distance between the two adjacent deposition chambers. However, according to experiments conducted by the present inventors, it was confirmed that slight mixture of the process gases occurs between the two adjacent deposition chambers, even when the distance between the two adjacent deposition chambers is increased. Further, according to experiments conducted by the present inventors, it was confirmed that the process gas adheres onto the carrier that transports the substrate, and the mixture of the process gases occurs via the carrier having the process gas adhered thereon.
- Accordingly, in one embodiment of the present invention, in the fabrication method and apparatus that fabricates the magnetic recording medium having the multi-layer stacked body by sequentially forming the magnetic recording layer, the protection layer, and the lubricant layer in this order, the lubricant layer is formed by the vapor-phase lubrication without exposing a stacked body to the atmosphere after forming the protection layer on the stacked body, in order to prevent the impurities from mixing between the protection layer and the lubricant layer. When a process gas pressure at the time of forming the protection layer is denoted by P1, and the process gas pressure at the time of forming the lubricant layer by the vapor-phase lubrication is denoted by P2, a region having a gas pressure P3 is provided in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, where relationships P3>P1 and P3>P2 are satisfied. By satisfying these relationships, the process gas for forming the protection layer and the process gas for forming the lubricant layer may be prevented from mixing, in order to prevent the quality of the protection layer and the lubricant layer that are formed from deteriorating due to mixing of the process gases.
- In other words, when the chamber having a pressure higher than the chamber in which the protection layer is formed and the chamber in which the lubricant layer is formed, is provided between the chamber in which the protection layer is formed and the chamber in which the lubricant layer is formed, the gas between two chambers flows from the chamber having the high pressure towards the chamber having the low pressure. As a result, the mixing of the process gas for forming the protection layer and the process gas for forming the lubricant layer may be prevented.
- Particularly when inert gas is used as the gas forming the gas pressure P3, the gas flowing into the chamber in which the protection layer is formed and the chamber in which the lubricant layer is formed becomes the inert gas. Hence, the effects on both the formation of the protection layer and the formation of the lubricant layer may be reduced.
- In this embodiment, the gas pressure P1 may be in a range of 1 Pa to 20 Pa, the gas pressure P2 may be in a range of 1 Pa to 50 Pa, and the gas pressure P3 may be in a range of 10 P1 to 500 Pa, and the relationships P3>P1 and P3>P2 are preferably satisfied. In addition, the effect of preventing the mixing of the process gas for forming the protection layer and the process gas for forming the lubricant layer increases as a difference between the gas pressures P3 and P1 and a difference between the gas pressures P3 and P2 increase. However, when the difference between the gas pressures P3 and P1 is too large, the effect of the gas flowing into each process gas increases, and the quality of the protection layer and the lubricant layer may deteriorate. Accordingly, the gas pressure P3 is preferably in a range of 10 Pa to 200 Pa, and the difference between the gas pressures P3 and P1 and the difference between the gas pressures P3 and P2 are preferably 150 Pa or less.
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FIG. 1 is a schematic diagram illustrating an example of the magnetic recording medium fabrication apparatus in one embodiment of the present invention. The magnetic recording medium fabrication apparatus illustrated inFIG. 1 may include adeposition apparatus 101 configured to form the layers of the magnetic recording medium up to the protection layer, and a vapor-phaselubrication deposition apparatus 102 configured to form the lubricant layer on the surface of the protection layer. - The
deposition apparatus 101 may include a substrate loading andunloading chamber 903, afirst corner chamber 904, afirst process chamber 905, asecond process chamber 906, asecond corner chamber 907, athird process chamber 908, afourth process chamber 909, afifth process chamber 910, asixth process chamber 911, aseventh process chamber 912, aneighth process chamber 913, athird corner chamber 914, aninth process chamber 915, atenth process chamber 916, afourth corner chamber 917, aneleventh process chamber 918, atwelfth process chamber 919, athirteenth process chamber 920, and anauxiliary chamber 921 that are connected in a ring shape via inter-chamber gate valves G. Each of thechambers 903 through 921 is surrounded by a plurality of partitioning walls, and includes an internal space that may be put into a decompression state. - The inter-chamber gate valve G, which may freely open and close at a high speed, may be provided between two mutually adjacent chambers (for example, the
chambers 905 and 906). All of the gate valves G are opened and closed at the same timing. Hence, each of a plurality ofcarriers 925 that transport substrates (not illustrated) may move from one to the other of the mutually adjacent chambers with regularity. - Each of the first through
905, 906, 908 through 913, 915, 916, and 918 through 920 may be provided with a substrate heating means (or substrate heater), a deposition means (or deposition part), a process gas supplying means (or process gas supplying part), an exhaust means (or exhaust part), and the like. The deposition means may be formed by a sputtering apparatus, an ion beam deposition apparatus, or the like. The gas supplying means and the exhaust means may cause the process gas to flow when necessary. For example, thethirteenth process chambers first process chamber 905 up to thetenth process chamber 916 may be used to form the layers of the magnetic recording medium up to the magnetic recording layer. The eleventh and 918 and 919 may be used to form the protection layer, and the process gas pressure may be P1 within the eleventh andtwelfth process chambers 918 and 919. In this example, thetwelfth process chambers thirteenth process chamber 920 may be used as an auxiliary chamber. - A base pressure (or reaching pressure) of each of the first through
905, 906, 908 through 913, 915, 916, and 918 through 920 may be set to 1×10−5 Pa, for example.thirteenth process chambers - The
904, 907, 914, and 917 may be arranged at corners of the magnetic recordingcorner chambers medium deposition apparatus 101, and change an orientation of thecarrier 925 in accordance with a moving direction of thecarrier 925. The inside of each of the 904, 907, 914, and 917 may be set to vacuum, and each of thecorner chambers 904, 907, 914, and 917 may rotate thecorner chambers carrier 925 in a decompression state. - As illustrated in
FIG. 1 , the substrate loading and unloadingchamber 903 is arranged between thefirst corner chamber 904 and theauxiliary chamber 921. The internal space of the substrate loading and unloadingchamber 903 may be larger than that of other chambers. Twocarriers 925 may be arranged within the substrate loading and unloadingchamber 903, such that the substrate is loaded onto one of the twocarriers 925 and the substrate is unloaded from the other of the twocarriers 925. Each of thecarriers 925 may be transported simultaneously in a direction indicated by arrows inFIG. 1 . The substrate loading and unloadingchamber 903 may be connected to asubstrate input chamber 902 and asubstrate output chamber 922. - A
vacuum robot 111 may be arranged within thesubstrate input chamber 902, and anothervacuum robot 112 may be arranged within thesubstrate output chamber 922. The 111 and 112 are examples of a transport apparatus. Thevacuum robots substrate input chamber 902 may load the substrate onto thecarrier 925 within the substrate loading and unloadingchamber 903, using thevacuum robot 111. In addition, Thesubstrate output chamber 922 may unload the substrate from thecarrier 925 within the substrate loading and unloadingchamber 903, using thevacuum robot 112. - The
substrate input chamber 902 may be connected to anairlock chamber 12 via the inter-chamber gate valve G. Thesubstrate output chamber 922 may be connected to anairlock chamber 13 via the inter-chamber gate valve G. Each of the 12 and 13 may store or accommodate therein a plurality of substrates (for example, 50 substrates). Each of theairlock chambers 12 and 13 may include a function to receive the substrate to be stored at one end and to supply the stored substrate at the other end. Each of theairlock chambers 12 and 13 may operate so that the following processes are repeated.airlock chambers - (Input of Substrate to Deposition Apparatus)
- The input of the substrate to the
deposition apparatus 101 may be carried out by the process including the following steps s1 through s9. - Step s1: Gate values G1 and G2 are closed.
- Step s2: The inside of the
airlock chamber 12 is set to atmospheric pressure. - Step s3: The gate valve G1 is opened.
- Step s5: The plurality of substrates (for example, 50 substrates) are input to the
airlock chamber 12 by asubstrate input robot 940 which is an example of a transport apparatus. - Step s6: The gate valve G1 is closed.
- Step s7: The inside of the
airlock chamber 12 is decompressed to vacuum. - Step s8: The gate valve G2 is opened.
- Step s9: The substrate within the
airlock chamber 12 is loaded onto thecarrier 925 within the substrate loading and unloadingchamber 903 by thevacuum robot 111. - (Output of Stacked Body from Deposition Apparatus and Input of Stacked Body to Vapor-Phase Lubrication Deposition Apparatus)
- The output of the stacked body from the
deposition apparatus 101 and the input of the stacked body to the vapor-phaselubrication deposition apparatus 102 may be carried out by the process including the following steps s11 through s18. - Step s11: Gate valves G3 and G4 are closed.
- Step s12: The inside of the
airlock chamber 13 is decompressed to vacuum. - Step s13: The gate valve G3 is opened.
- Step s14: The substrate is removed from the
carrier 925 within the substrate loading and unloadingchamber 903, and stored within theairlock chamber 12, using thevacuum robot 112. - Step s15: The gate valve G3 is closed until the inside of the
airlock chamber 12 becomes full of substrates (for example, 50 substrates are stored). - Step s16: The inside of the
airlock chamber 13 is decompressed to vacuum. - Step s17: The gate valve G4 is opened.
- Step s18: The substrates (for example, 50 substrates) within the
airlock chamber 12 are input to the vapor-phaselubrication deposition apparatus 102 using avacuum robot 941 provided within avacuum chamber 942. Thevacuum robot 941 is an example of the transport apparatus. - Returning now to the description of
FIG. 1 , the vapor-phaselubrication deposition apparatus 102 may include anisolation chamber 943 to be filled with inert gas, a vapor-phaselubrication process chamber 944, anairlock chamber 945, and a transport cassette returnpath chamber 947 that are connected via gate valves G. Asubstrate output robot 946 for outputting the stacked body formed with the lubricant layer may be provided adjacent to theairlock chamber 945. Thesubstrate output robot 946 is an example of the transport apparatus. Atransport cassette 948 configured to transport a plurality of stacked bodies (for example, 50 stacked bodies) may be transported amongst each of thechambers 943 through 945, and 947. - In the magnetic recording medium fabrication apparatus in this embodiment, the process gas pressure within the vapor-phase
lubrication process chamber 944 is set to P2, and the process gas pressure within theisolation chamber 943 filled with the inert gas is set to P3. - The stacked bodies (hereinafter also referred to as “substrate”) within the vapor-phase
lubrication deposition apparatus 102 may move so that the following processes are repeated, and processes including the following steps s21 through s39 may be performed continuously. - Step s21: Gate valves G5 and G6 are closed.
- Step s22: The inside of the
isolation chamber 943 is decompressed to vacuum. - Step s23: The gate valve G5 is opened.
- Step s24: The substrates (for example, 50 substrates) within the
airlock chamber 12 are set into thetransport cassette 948 within theisolation chamber 943, using thevacuum robot 941. - Step s25: The gate valve is closed.
- Step s26: The inert gas is supplied into the
isolation chamber 943, to make the internal gas pressure P3 inside theisolation chamber 943. - Step s27: The gate valve G6 is opened.
- Step s28: The
transport cassette 948 within theisolation chamber 943 is supplied into the vapor-phaselubrication process chamber 944. - Step s29: The lubricant layer is formed on the stacked bodies within the
transport cassette 948 inside the vapor-phaselubrication process chamber 944. - Step s30: A gate valve G7 is opened, and the
transport cassette 948 accommodating the stacked bodies formed with the lubricant layer is moved to theairlock chamber 945. - Step s31: The gate valve G7 is closed.
- Step s32: The inside of the
airlock chamber 945 is set to atmospheric pressure. - Step s33: A gate valve G8 is opened.
- Step s34: The processed stacked bodies are extracted by the
substrate output robot 946. - Step s35: The gate valve G8 is closed.
- Step s36: The inside of the
airlock chamber 945 is decompressed to vacuum. - Step s37: A gate valve G9 is opened.
- Step s38: The
empty transport cassette 948 is moved to theisolation chamber 943 via thereturn path chamber 947. The inside of thereturn path chamber 947 is decompressed to vacuum. - Step s39: A gate valve G10 is opened in the decompression state of the
isolation chamber 943, and theempty transport cassette 948 is supplied into theisolation chamber 943. -
FIG. 2 is a cross sectional view illustrating an example of amagnetic recording medium 1 fabricated by the fabrication apparatus illustrated inFIG. 1 . The data recording system with respect to themagnetic recording medium 1 may be an in-plane (or longitudinal) recording system or a perpendicular recording system, however, it is assumed for the sake of convenience that themagnetic recording medium 1 in this embodiment employs the perpendicular recording system. - The
magnetic recording medium 1 may include asubstrate 100, abonding layer 110 formed on thesubstrate 100, a softmagnetic underlayer 120 formed on thebonding layer 110, anorientation control layer 130 formed on the softmagnetic underlayer 120, anonmagnetic underlayer 140 formed on theorientation control layer 130, aperpendicular recording layer 150 formed on thenonmagnetic underlayer 140, aprotection layer 160 formed on theperpendicular recording layer 150, and alubricant layer 170 formed on theprotection layer 160. Theperpendicular recording layer 150 is an example of a magnetic recording layer. In this embodiment, themagnetic recording medium 1 has a configuration in which thebonding layer 110, the softmagnetic underlayer 120, theorientation control layer 130, thenonmagnetic underlayer 140, theperpendicular recording layer 150, theprotection layer 160, and thelubricant layer 170 are formed on both sides of thesubstrate 100. In the following description, a stacked structure in which thebonding layer 110 up to theprotection layer 160 are stacked on both sides of thesubstrate 100, that is, the stacked structure in which all of the layers of themagnetic recording medium 1 except thelubricant layer 170 are formed on both sides of thesubstrate 100, may also be referred to as a “stackedsubstrate 180”, where appropriate. Further, in the following description, a stacked structure in which the bonding layer up to theperpendicular recording layer 150 are stacked on both sides of thesubstrate 100, that is, the stacked structure in which all of the layers of themagnetic recording medium 1 except theprotection layer 160 and thelubricant layer 170 are formed on both sides of thesubstrate 100, may also be referred to as a “stacked body 190”, where appropriate. - In this embodiment, the
substrate 100 may be made of a nonmagnetic material. For example, thesubstrate 100 may be formed by a metal substrate made of a metal material such as aluminum, aluminum alloy, and the like. For example, thesubstrate 100 may be formed by a nonmetallic substrate made of a nonmetallic material such as glass, ceramics, silicon, silicon carbide, carbon, and the like. In addition, thesubstrate 100 may have a NiP layer or a NiP alloy layer, formed on the surface of the metal substrate or the nonmetallic substrate, by plating, sputtering, or the like. - For example, the glass substrate may also be made of float glass, glass ceramics, and the like. For example, general-purpose soda-lime glass, aluminosilicate glass, and the like may be used for the flat glass. In addition, lithium glass ceramics, and the like, for example, may be used for the glass ceramics. Further, a sintered body having general-purpose aluminum oxide, aluminum nitride, silicon nitride, or the like as its main component, or a fiber reinforced material of such materials, for example, may be used for the ceramic substrate.
- Corrosion of the
substrate 100 may progress due to the effects of adsorbed gas or moisture on the surface, diffusion of the substrate component, and the like when thesubstrate 100 makes contact with the softmagnetic underlayer 120 having Co or Fe as its main component as will be described later. For this reason, thebonding layer 110 may preferably be provided between thesubstrate 100 and the softmagnetic underlayer 120. The material used for thebonding layer 110 may suitably be selected from Cr, Cr alloy, Ti, Ti alloy, and the like, for example. Thebonding layer 110 may preferably have a thickness of 2 nm (20 Å) or greater. - The soft
magnetic underlayer 120 may be provided to reduce noise at the time of recording and reproduction, in a case in which the perpendicular recording system is employed. In this embodiment, the softmagnetic underlayer 120 may include a first softmagnetic layer 121 formed on thebonding layer 110, aspacer layer 122 formed on the first softmagnetic layer 121, and a second softmagnetic layer 123 formed on thespacer layer 122. In other words, the softmagnetic underlayer 120 may have a structure in which thespacer layer 122 is sandwiched between the first softmagnetic layer 121 and the second softmagnetic layer 123. - The first soft
magnetic layer 121 and the second softmagnetic layer 123 may preferably be made of a material including Fe:Co in a range of 40:60 to 70:30 in atomic ratio (at %). In order to improve the permeability and corrosion resistance, the first softmagnetic layer 121 and the second softmagnetic layer 123 may preferably include an element selected from a group consisting of Ta, Nb, Zr, and Cr in a range of 1 at % to 8 at %. In addition, thespacer layer 122 may be made of Ru, Re, Cu, or the like, and may preferably be made of Ru in particular. - The
orientation control layer 130 may be provided to improve the recording and reproducing characteristics, by reducing crystal grain sizes of theperpendicular recording layer 150 that is formed via thenonmagnetic underlayer 140. The material used for theorientation control layer 130 is not limited to a particular material, however, a material having a hcp structure, a fcc structure, or an amorphous structure may preferably be used for theorientation control layer 130. Theorientation control layer 130 may preferably be made of an Ru alloy, Ni alloy, Co alloy, Pt alloy, or Cu alloy in particular, and theorientation control layer 130 may have a multi-layer structure in which such alloys are stacked. For example, a multi-layer structure formed by Ni alloy and Ru alloy, a multi-layer structure formed by Co alloy and Ru alloy, or a multi-layer structure formed by Pt alloy and Ru alloy, may preferably be formed from the side of thesubstrate 100. - The
nonmagnetic underlayer 140 may be provided to suppress disturbance in crystal growth at an initial stacked part of theperpendicular recording layer 150 that is stacked on thenonmagnetic underlayer 140, and to suppress noise generation at the time of the recording and reproduction. However, thenonmagnetic underlayer 140 may be omitted. - In this embodiment, the
nonmagnetic underlayer 140 may preferably be made of a material including a metal having Co as its main component, and additionally including an oxide. A Cr-content of thenonmagnetic underlayer 140 may preferably be in a range of 25 at % to 50 at %. For example, the oxide included in thenonmagnetic underlayer 140 may preferably be an oxide of Cr, Si, Ta, Al, Ti, Mg, Co, or the like. TiO2, Cr2O3, SiO2, or the like may particularly be preferable for use as the oxide included in thenonmagnetic underlayer 140. The oxide-content of thenonmagnetic underlayer 140 may preferably be in a range of 3 mol % to 18 mol %, with respect to a mol total calculated by regarding an alloy of Co, Cr, Pt, or the like, for example, forming the magnetic grains (or particles), as one compound. - In this embodiment, the
perpendicular recording layer 150 may include a firstmagnetic layer 151 formed on thenonmagnetic underlayer 140, a firstnonmagnetic layer 152 formed on the firstmagnetic layer 151, a secondmagnetic layer 153 formed on the firstnonmagnetic layer 152, a secondnonmagnetic layer 154 formed on the secondmagnetic layer 153, and a thirdmagnetic layer 155 formed on the secondnonmagnetic layer 154. In other words, in theperpendicular recording layer 150, the firstnonmagnetic layer 152 is sandwiched between the firstmagnetic layer 151 and the secondmagnetic layer 153, and the secondnonmagnetic layer 154 is sandwiched between the secondmagnetic layer 153 and the thirdmagnetic layer 155. - The first
magnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155 may be provided to store data by inverting the magnetization direction in a direction taken along the thickness of theperpendicular recording layer 150 by the magnetic energy supplied from a magnetic head 3 (illustrated inFIG. 3 which will be described later) and maintaining the state of the magnetization. The firstmagnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155 may form the magnetic layer of this embodiment. - The first
magnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155 may preferably include metal magnetic grains having Co as its main component, and a nonmagnetic oxide, and have a granular structure in which the magnetic grains are surrounded by the oxide. - For example, the oxide included in the first
magnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155 may preferably be Cr, Si, Ta, Al, Ti, Mg, Co, or the like. TiO2, Cr2O3, SiO2, or the like may particularly be preferable for use as the oxide included in the firstmagnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155. In addition, the lowermost firstmagnetic layer 151 of theperpendicular recording layer 150 may preferably include a complex (or composite) oxide made up of two or more kinds of oxides. The complex oxide included in the firstmagnetic layer 151 may preferably be Cr2O3—SiO2, Cr2O3—TiO2, Cr2O3—SiO2—TiO2, or the like. - In addition, the material used for the magnetic grains of the first
magnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155 may preferably include compositions such as 90(Co14Cr18Pt)-10(SiO2) {mol concentration of 90 mol % calculated using magnetic particles having a Cr-content of 14 at %, a Pt-content of 18 at %, and the remainder Co as one compound, and 10 mol % of an oxide component having SiO2}, 92(Co10Cr16Pt)-8(SiO2), 94(Co8Cr14Pt4Nb)-6(Cr2O3), (CoCrPt)—(Ta2O5), (CoCrPt)—(Cr2O3)—(TiO2) (CoCrPt)—(Cr2O3)—(SiO2), (CoCrPt)—(Cr2O3)—(SiO2)—(TiO2), (CoCrPtMo)—(Ti), (CoCrPtW)—(TiO2), (CoCrPtB)—(Al2O3), (CoCrPtTaNd)—(MgO), (CoCrPtBCu)—(Y2O3), (CoCrPtRu)—(SiO2), and the like. - The first
nonmagnetic layer 152 and the secondnonmagnetic layer 154 may be provided to facilitate the magnetic inversion in each of the magnetic layers, namely, the firstmagnetic layer 151, the secondmagnetic layer 153, and the thirdmagnetic layer 155 forming theperpendicular recording layer 150, and to reduce noise by reducing variance of the magnetic inversions of the magnetic particles as a whole. In this embodiment, the firstnonmagnetic layer 152 and the secondnonmagnetic layer 154 may preferably include Ru and Co, for example. - In the example illustrated in
FIG. 2 , theperpendicular recording layer 150 includes magnetic layers (first, second, and third 151, 153, and 155) forming the 3-layer structure, however, the structure of the magnetic layers is not limited to the 3-layer structure, and the magnetic layers may form a multi-layer structure of four (4) or more layers. In addition, although a nonmagnetic layer (a corresponding one of first and secondmagnetic layers nonmagnetic layers 152 and 154) is interposed between two adjacent magnetic layers (two adjacent ones of first, second, and third 151, 153, and 155) forming themagnetic layers perpendicular recording layer 150, the structure of the magnetic layers forming theperpendicular recording layer 150 is not limited to such a structure. For example, theperpendicular recording layer 150 may have a structure in which two magnetic layers having mutually different compositions are stacked. - The
protection layer 160 may be provided to prevent corrosion of theperpendicular recording layer 150, and to prevent damage to the medium surface or themagnetic head 3 itself when themagnetic head 3 and themagnetic recording medium 1 make contact. Theprotection layer 160 may be provided to also improve the corrosion resistance of themagnetic recording medium 1. - The
protection layer 160 may be made of a known material. For example, theprotection layer 160 may be made of a material including C, SiO2 or ZrO2, for example. From the point of view of maintaining the hardness of theprotection layer 160 and making theprotection layer 160 relatively thin, theprotection layer 160 may preferably be made of amorphous hard carbon or DLC (Diamond Like Carbon). From the point of view of realizing a high recording density, theprotection layer 160 may preferably have a thickness of 1 nm to 10 nm, for example, in order to reduce the distance between themagnetic head 3 and themagnetic recording medium 1 in a magnetic storage apparatus which will be described later in conjunction withFIG. 3 . - The
lubricant layer 170 may be provided to suppress friction between themagnetic head 3 and the surface of themagnetic recording medium 1 when themagnetic head 3 makes contact with themagnetic recording medium 1, and to improve the corrosion resistance of themagnetic recording medium 1. Thelubricant layer 170 may be made of a known lubricant material. For example, thelubricant layer 170 may preferably be made of a lubricant such as perfluoropolyether, fluorinated alcohol, fluorinated carboxylic acid, or the like. From the point of view of realizing a high recording density, thelubricant layer 170 may preferably have a thickness of 1 nm to 2 nm, for example, in order to reduce the distance between themagnetic head 3 and themagnetic recording medium 1 in the magnetic storage apparatus which will be described later in conjunction withFIG. 3 . - When forming the
lubricant layer 170 by the vapor-phase lubrication, the lubricant is heated to a temperature in a range of 90° C. to 150° C., and vapor of the lubricant is introduced into the reaction chamber. The pressure within the reaction chamber is set to approximately 10 Pa, for example, and an exposure time of the stacked body in the reaction chamber is set to approximately 10 seconds, for example, in order to form thelubricant layer 170 on the surface of theprotection layer 160 to a thickness of approximately 1 nm, for example. -
FIG. 3 is a perspective view illustrating an example of a configuration of the magnetic storage apparatus having themagnetic recording medium 1 fabricated in this embodiment of the present invention. - A
magnetic storage apparatus 50 illustrated inFIG. 3 may be provided with themagnetic recording medium 1 that magnetically records data, arotary driving part 2 that rotationally drives themagnetic recording medium 1, themagnetic head 3 that writes (or records) data to and reads (or reproduces) the data from themagnetic recording medium 1, acarriage 4 mounted with themagnetic head 3, ahead driving part 5 that moves themagnetic head 3 via thecarriage 4 relative to themagnetic recording medium 1, and asignal processor 6. Thesignal processor 6 may subject data input from an external host unit (not illustrated) or the like to a known signal processing, in order to supply recording signals suited for the recording on themagnetic recording medium 1 to themagnetic head 3. Thesignal processor 6 may subject the signals read from themagnetic recording medium 1 by themagnetic head 3 to a known signal processing, and output reproduced data to the external host unit or the like. - In the example illustrated in
FIG. 3 , themagnetic recording medium 1 is a magnetic disk having a disk shape. The magnetic disk includes a magnetic recording layer to record the data, on at least one of the two sides (or surfaces) of the magnetic disk. The magnetic recording layer may be provided on both sides (or both surfaces) of the magnetic disk, as illustrated inFIG. 2 . Further, in the example illustrated inFIG. 3 , a plurality of magnetic recording media (in this example, three (3) magnetic recording media) are provided in themagnetic storage apparatus 50. However, the number ofmagnetic recording media 1 provided in themagnetic storage apparatus 50 may be one (1) or greater. - Further, the present invention is not limited to the embodiment, but various variations and modifications may be made without departing from the scope of the present invention.
- Next, a description will be given of a practical example PE1 in which a magnetic recording medium is fabricated by the following fabrication method and evaluated. More particularly, the magnetic recording medium is fabricated using the fabrication apparatus illustrated in
FIG. 1 . First, a cleaned glass substrate (manufactured by Konica Minolta, Inc. and having an outer diameter of 2.5 inches) is placed within theairlock chamber 12 of the fabrication apparatus illustrated inFIG. 1 , and thereafter placed into thecarrier 925 using thevacuum robot 111, in order to form stacked layers on the substrate surface. The inside of the deposition chambers are decompressed (or evacuated) to a vacuum (or base pressure) of 1×10−5 Pa. - Next, a bonding layer having a thickness of 10 nm is deposited on the glass substrate within the
process chamber 905 in which the argon gas pressure is 1 Pa, using a 60Cr-50Ti target. In addition, a first soft magnetic layer having a thickness of 34 nm is deposited on the bonding layer within theprocess chamber 906 in which the argon gas pressure is 1 Pa and the substrate temperature is 100° C. or lower, using a 46Fe-46Co-5Zr-3B{Fe-content of 46 at %, Co-content of 46 at %, Zr-content of 5 at %, and B-content of 3 at %} target. In addition, an Ru layer having a thickness of 0.76 nm is deposited on the first soft magnetic layer within theprocess chamber 908, using an Ru target. Further, a second soft magnetic layer having a thickness of 34 nm is deposited on the Ru layer within theprocess chamber 909, using a 46Fe-46Co-5Zr-3B target. The first and second soft magnetic layers sandwiching the Ru layer are formed as the soft magnetic underlayer. - Next, a first underlayer having a thickness of 5 nm is deposited on the soft magnetic underlayer within the
process chamber 910 in which the argon gas pressure is 1 Pa, using a Ni-6W{W-content of 6 at %, and the remainder Ni} target. A second underlayer having a thickness of 10 nm is deposited on the first underlayer within theprocess chamber 911, using an Ru target. A third underlayer having a thickness of 10 nm is deposited within theprocess chamber 912 in which the argon gas pressure is 1 Pa, using an Ru target. An underlayer having a 3-layer structure is formed by the first, second, and third underlayers. - Next, a magnetic layer having a multi-layer structure is deposited on the underlayer having the S-layer structure. More particularly, a Co6Cr16Pt6Ru-4SiO2-3Cr2O3-2TiO2 layer having a thickness of 6 nm is deposited on the third underlayer within the
process chamber 913 in which the argon gas pressure is 1 Pa. In addition, a Co11-5Cr13Pt10Ru-4SiO2-3Cr2O3-2TiO2 layer having a thickness of 6 nm is deposited on the Co6Cr16Pt6Ru-4SiO2-3Cr2O3-2TiO2 layer within theprocess chamber 915 in which the argon gas pressure is 1 Pa. Further, a Co15Cr16Pt6B layer having a thickness of 3 nm is deposited on the Co11-5Cr13Pt10Ru-4SiO2-3Cr2O3-2TiO2 layer within theprocess chamber 916 in which the argon gas pressure is 1 Pa. - Next, a carbon protection layer having a thickness of 2.5 nm is deposited on the magnetic layer within the
918 and 919, using an ion beam, in order to obtain the stacked body (or magnetic recording medium). The base pressure within theprocess chambers 918 and 919 is 1×10−5 Pa, a mixture gas in which 4% methane is mixed to hydrogen gas is used for the process gas, and the gas pressure (P1) is 8 Pa. Theprocess chambers 920 and 921 are used as auxiliary chambers, and no process gas is supplied to the auxiliary chambers, and the base pressure within the auxiliary chambers is 1×10−5 Pa.chambers - The stacked body that is obtained is removed from the
carrier 925 by thevacuum robot 112, and is supplied into the vapor-phaselubrication deposition apparatus 102 by thevacuum robot 941. The base pressure within each of theisolation chamber 943, the vapor-phaselubrication process chamber 944, theairlock chamber 945, and thereturn path chamber 947 forming the vapor-phaselubrication deposition apparatus 102 is set to 1×10−5 Pa. In addition, argon gas is supplied at 50 Pa (gas pressure P3) into theisolation chamber 943, perfluoropolyether gas is supplied at 20 Pa (gas pressure P2) into the vapor-phaselubrication process chamber 944, and no process gas is supplied to theairlock chamber 945 and thereturn path chamber 947. As a result, a perfluoropolyether lubricant layer having a thickness of 15 Å is formed on the surface of the stacked body by the vapor-phaselubrication deposition apparatus 102. - The stacked body (or magnetic recording medium) formed with the lubricant layer is removed outside the fabrication apparatus, to the atmosphere, using the
substrate output robot 946. The method described above is used to fabricate 10,000 magnetic recording media, and the inconsistency in the thickness of the lubricant layer, the recording and reproducing characteristics (SNR: Signal-to-Noise Ratio), and the OW (Over-Write) performance of the 10,000 magnetic recording media are evaluated. An evaluation result of the first practical example PE1 is shown in the following Table 1, where the P1, P2, and P3 denote the process gas pressure in Pa, ±A denotes the inconsistency in the thickness of the lubricant layer, SNR denotes the SNR in dB, and OW denotes the OW in dB. -
TABLE 1 P1 P2 P3 ±A SNR OW PE1 8 20 50 0.5 25.3 39.2 CE1 8 20 15 0.4 24.8 37.9 CE2 8 20 5 0.5 24.6 37.2 CE3 8 20 0.01 0.8 23.8 36.4 PE2 8 20 100 1.1 25.1 39.1 - With regard to the evaluation of the inconsistency in the thickness of the lubricant layer, the thickness of the lubricant layer is measured at twenty (20) locations on the surface of the magnetic recording medium using a FT-IR (Fourier Transform-Infra-Red Spectrometer), and the variance with respect to the average value of the measured thicknesses is evaluated. With regard to the evaluation of the recording and reproducing characteristics, a magnetic head having a single magnetic pole in a recording part and a GMR (Giant Magneto Resistive) element in a reproducing part is used for the measurement, by setting the recording frequency condition to a linear recording density of 1000 kFCI.
- On the other hand, with regard to the evaluation of the OW performance, a signal of 500 kFCI is written on the magnetic recording medium, a signal of 67 kFCI is written over the signal of 500 kFCI, and the remaining component of the first written signal of 500 kFCI is measured.
- In a fabrication process similar to that of the practical example PE1, the process gas pressures P1, P2, and P3 are changed as shown in Table 1 for a second practical example PE2 and comparison examples CE1, CE2, and CE3. The inconsistency in the thickness of the lubricant layer, the recording and reproducing characteristics (SNR), and the OW performance magnetic recording media are evaluated in a manner similar to the practical example PE1, and evaluation results of the second practical example PE2 and the comparison examples CE1 through CE3 are also shown in Table 1.
- When P3>P2 as in the case of the comparison examples CE1 through CE3 shown in Table 1, the lubricant gas within the vapor-phase lubrication process chamber flows into the deposition chambers for the magnetic layer or the like. Consequently, the quality of the stacked body forming the magnetic recording medium deteriorates, and the electromagnetic conversion characteristics of the magnetic recording medium, including the recording and reproducing characteristics (SNR) and the OW characteristic, deteriorate. In addition, when the difference between the process gas pressures P2 and P3 is large as in the case of the comparison example CE3 and the practical example PE2, a tendency for the inconsistency in the thickness of the lubricant layer to increase is observed. It may be regarded that, when the gate valve between the vapor-phase lubrication process chamber and the isolation chamber is opened, the argon gas within the isolation chamber may flow into the vapor-phase lubrication process chamber, or the lubricant gas within the vapor-phase lubrication process chamber flows into the isolation chamber, and the lubricant gas pressure within the vapor-phase lubrication process chamber varies, to thereby cause the inconsistency in the thickness of the lubricant layer. The inconsistency in the thickness of the lubricant layer in each of the comparison example CE3 and the practical example PE2 is within a tolerable range for use as the magnetic recording medium. In other words, as may be seen from the evaluation results for the practical examples PE1 and PE2 in Table 1, it may be confirmed that the magnetic recording medium fabricated by the magnetic recording medium fabrication method in the embodiment has superior electromagnetic conversion characteristics and small and tolerable inconsistency in the thickness of the lubricant layer.
- According to the embodiment and practical examples described above, the quality of the formed layer may be prevented from deteriorating, and the productivity may be improved, simultaneously.
- Further, the present invention is not limited to these practical examples, but various variations and modifications may be made without departing from the scope of the present invention.
Claims (10)
1. A method of fabricating a magnetic recording medium by sequentially forming a magnetic recording layer, a protection layer, and a lubricant layer on a stacked body, comprising:
forming the lubricant layer by vapor-phase lubrication without exposing the stacked body to atmosphere after forming the protection layer on the stacked body; and
providing a region having a gas pressure P3 in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, satisfying relationships P3>P1 and P3>P2, where P1 denotes a process gas pressure at a time of forming the protection layer, and P2 denotes a process gas pressure at a time of forming the lubricant layer.
2. The method of fabricating the magnetic recording medium as claimed in claim 1 , wherein the process gas pressure P3 is formed by inert gas.
3. The method of fabricating the magnetic recording medium as claimed in claim 1 , wherein the process gas pressure P1 is in a range of 1 Pa to 20 Pa, the process gas pressure P2 is in a range of 1 Pa to 50 Pa, and the process gas pressure P3 is in a range of 10 Pa to 500 Pa.
4. The method of fabricating the magnetic recording medium as claimed in claim 3 , wherein the process gas pressure P3 is in a range of 10 Pa to 200 Pa.
5. The method of fabricating the magnetic recording medium as claimed in claim 1 , further comprising:
transporting the stacked body by a first transport apparatus until forming the protection layer; and
transporting the stacked body to be formed with the lubricant layer by a second transport apparatus different from the first transport apparatus.
6. An apparatus to fabricate a magnetic recording medium, comprising:
a deposition apparatus configured to sequentially form a magnetic recording layer and a protection layer on a stacked body; and
a vapor-phase lubrication deposition apparatus configured to form a lubricant layer on the stacked body formed with the protection layer, by vapor-phase lubrication without exposing the stacked body to atmosphere,
wherein a region having a gas pressure P3 is provided in a transport path of the stacked body after the formation of the protection layer and before the formation of the lubricant layer, satisfying relationships P3>P1 and P3>P2, where P1 denotes a process gas pressure at a time of forming the protection layer, and P2 denotes a process gas pressure at a time of forming the lubricant layer.
7. The apparatus to fabricate the magnetic recording medium as claimed in claim 6 , wherein the process gas pressure P3 is formed by inert gas.
8. The apparatus to fabricate the magnetic recording medium as claimed in claim 6 , wherein the process gas pressure P1 is in a range of 1 Pa to 20 Pa, the process gas pressure P2 is in a range of 1 Pa to 50 Pa, and the process gas pressure P3 is in a range of 10 Pa to 500 Pa.
9. The apparatus to fabricate the magnetic recording medium as claimed in claim 8 , wherein the process gas pressure P3 is in a range of 10 Pa to 200 Pa.
10. The apparatus to fabricate the magnetic recording medium as claimed in claim 6 , further comprising:
a first transport apparatus configured to transport the stacked body until forming the protection layer; and
a second transport apparatus, different from the first transport apparatus, configured to transport the stacked body to be formed with the lubricant layer.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012202998A JP2014059924A (en) | 2012-09-14 | 2012-09-14 | Method and apparatus for manufacturing magnetic recording medium |
| JP2012-202998 | 2012-09-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20140079877A1 true US20140079877A1 (en) | 2014-03-20 |
Family
ID=50274756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US14/017,387 Abandoned US20140079877A1 (en) | 2012-09-14 | 2013-09-04 | Magnetic recording medium fabrication method and apparatus |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20140079877A1 (en) |
| JP (1) | JP2014059924A (en) |
| CN (1) | CN103680526A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6001446A (en) * | 1996-06-27 | 1999-12-14 | Fuji Photo Film Co., Ltd. | Magnetic recording medium |
| US6335284B1 (en) * | 1998-09-24 | 2002-01-01 | Samsung Electronics Co., Ltd. | Metallization process for manufacturing semiconductor devices |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3486821B2 (en) * | 1994-01-21 | 2004-01-13 | 東京エレクトロン株式会社 | Processing apparatus and method of transporting object to be processed in processing apparatus |
| JPH10270527A (en) * | 1997-03-21 | 1998-10-09 | Ulvac Japan Ltd | Composite type vacuum processor |
| JP4268303B2 (en) * | 2000-02-01 | 2009-05-27 | キヤノンアネルバ株式会社 | Inline type substrate processing equipment |
| US6808741B1 (en) * | 2001-10-26 | 2004-10-26 | Seagate Technology Llc | In-line, pass-by method for vapor lubrication |
| TW200715448A (en) * | 2005-07-25 | 2007-04-16 | Canon Anelva Corp | Vacuum processing apparatus, semiconductor device manufacturing method and semiconductor device manufacturing system |
-
2012
- 2012-09-14 JP JP2012202998A patent/JP2014059924A/en active Pending
-
2013
- 2013-09-04 US US14/017,387 patent/US20140079877A1/en not_active Abandoned
- 2013-09-11 CN CN201310410975.7A patent/CN103680526A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6001446A (en) * | 1996-06-27 | 1999-12-14 | Fuji Photo Film Co., Ltd. | Magnetic recording medium |
| US6335284B1 (en) * | 1998-09-24 | 2002-01-01 | Samsung Electronics Co., Ltd. | Metallization process for manufacturing semiconductor devices |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103680526A (en) | 2014-03-26 |
| JP2014059924A (en) | 2014-04-03 |
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