US20130048208A1 - Method for fabricating camera module - Google Patents
Method for fabricating camera module Download PDFInfo
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- US20130048208A1 US20130048208A1 US13/219,948 US201113219948A US2013048208A1 US 20130048208 A1 US20130048208 A1 US 20130048208A1 US 201113219948 A US201113219948 A US 201113219948A US 2013048208 A1 US2013048208 A1 US 2013048208A1
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- dry film
- lens
- camera module
- wafer
- fabricating
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/804—Containers or encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8057—Optical shielding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
Definitions
- the present invention relates to applying the dry film material by a wafer level lithography process to fabricate a camera module.
- the conventional camera module is fabricated by laminating lenses on a substrate having optical devices thereon, and then the substrate laminated with the lenses is diced and divided into several individual camera module units. During the formation of the conventional camera module, a product yield thereof is lowered because the removal step of a protection film for the plurality of optical lenses of the plurality of lens cubes may destroy an aperture of the optical lens.
- a novel method for fabricating a camera module without destroying the apertures of the plurality of optical lenses is desired.
- An exemplary embodiment of the method for fabricating a camera module comprises providing plurality of lens sets.
- a dry film layer is formed on the plurality of lens sets.
- the dry film layer is patterned to form a plurality of dry film patterns respectively attaching to a plurality of lens sets.
- the plurality of lens sets are separated.
- a lens set separated from the plurality of lens sets is bonded to an image sensor device chip. The dry film pattern on the lens set is removed.
- Another exemplary embodiment of the method for fabricating a camera module comprises a first wafer having a plurality of first lens elements thereon.
- a first spacer element on the first wafer for isolating the first lens elements each other is formed.
- a dry film layer is formed on the first spacer element.
- the dry film layer is patterned to form a plurality of dry film patterns respectively attaching to a plurality of lens sets.
- the plurality of lens sets are separated.
- a lens set separated from the plurality of lens sets is bonded to an image sensor device chip. The dry film pattern on the lens set is removed.
- Yet another exemplary embodiment of the method for fabricating a camera module comprises a first wafer having a plurality of first lens elements thereon.
- a first spacer element on the first wafer for isolating the first lens elements each other is formed.
- a second wafer having a plurality of second lens elements thereon is bonded to the first spacer element, wherein the plurality of second lens elements aligns to the plurality of first lens elements.
- a second spacer element is formed on the second wafer for isolating the second lens elements each other.
- a dry film layer is formed on the second spacer element.
- the dry film layer is patterned to form a plurality of dry film patterns respectively attaching to a plurality of lens sets.
- the plurality of lens sets are separated.
- a lens set separated from the plurality of lens sets is bonded to an image sensor device chip. The dry film pattern on the lens set is removed
- FIGS. 1 a - 1 c, 2 a - 2 b, 3 a - 3 b and 4 - 9 are cross section views or top views showing exemplary embodiments of a method for fabricating a camera module of the invention.
- FIGS. 1 a - 1 c, 2 a - 2 b, 3 a - 3 b and 4 - 9 are cross section views or top views showing exemplary embodiments of a method for fabricating a camera module of the invention.
- the method for fabricating the camera module utilizes a dry film to prevent an optical lens set from being covered by coating materials, such as an electromagnetic interference (EMI) shielding material or a light shielding material applied during subsequent processes.
- EMI electromagnetic interference
- FIG. 1 a is a cross section view showing the exemplary embodiment of lens sets constituted by lens elements on a single wafer.
- a plurality of lens sets in wafer level are provided.
- a first wafer 200 b having first lens elements 202 b thereon is provided.
- a first spacer element 203 b is then formed on the first wafer 200 b for isolating the first lens elements 200 b each other.
- the lens sets are constituted by first lens elements 202 b on two sides of a first wafer 200 b and first spacer elements 203 b.
- the first wafer 200 b may comprise a transparent material.
- the first spacer elements 203 b may be arranged as an array on two sides of the first wafer 200 b.
- the first lens elements 202 b and the first spacer elements 203 b may be respectively arranged on one side of the first wafer 200 b.
- FIG. 1 b is a cross section view showing another exemplary embodiment of lens sets, in which the lens sets are constituted by lens elements on two wafers.
- a second wafer 200 a having second lens elements 202 a thereon is bonded to the first spacer elements 203 b on the first wafer 200 b so that the first wafer 200 b and the second wafer 200 a are stacked together.
- a spacer element 203 a is then formed on the second wafer 200 a for isolating second lens elements 202 a each other.
- the second wafer 200 a may comprise a transparent material.
- the second spacer elements 203 a may be arranged as an array on the upper surface of the second wafer 200 a.
- FIG. 1 c is a top view showing the exemplary embodiment of lens sets constituted by two wafers and lens elements thereon. Alternatively, one more wafer with lens elements thereon may bond to the second wafer 200 a or first wafer 200 b.
- the following description will take one embodiment as shown in 1 b and l c, but is not limited to the disclosed embodiments.
- a dry film layer 204 is laminated on the second spacer element 203 a by a pressing process.
- the dry film layer 204 covers an entire region of the wafer-level lens sets constituted by the first wafer 200 b and the second wafer 200 a.
- FIGS. 3 a and 3 b show a process step to form dry film patterns 204 a respectively attaching to the lens sets.
- the dry film layer 204 may be formed of a photosensitive material, therefore the dry film layer 204 may serve as a photoresist layer.
- a lithography process is performed to remove a portion of the dry film layer 204 thereby patterning the dry film layer 204 into dry film patterns 204 a.
- the lithography process may include alignment, exposing, and developing the dry film layer 204 .
- a curing process may be performed to fully cure the dry film patterns 204 a below 75° C.
- the dry film patterns 204 a respectively cover each of the lens sets.
- the dry film patterns 204 a have a protection function for the underlying lens elements 202 a.
- the dry film layer 204 is processed below 75° C. for the steps of lamination, exposure, development, and so forth.
- the dry film layer 204 is not flowable below 75° C., therefore the individual lens set can be covered with a solidified dry film pattern 204 a without being contaminated by a fluid dry film materials or other particles and impurities.
- the wafer-level lens sets covered with dry film patterns 204 a are separated by a sawing process along first spacer element 203 b and second spacer element 203 a.
- wafer-level lens sets are divided along the scribe line, dotted line as shown in FIG. 3 b.
- the first wafer 200 b with lens elements 202 b thereon and the second wafer 200 a with lens elements 202 b thereon are divided into individual lens sets.
- FIG. 4 illustrates one of the individual lens sets.
- the lens set as shown in FIG. 4 has first lens elements 202 b on two sides of the first wafer 200 b and second lens elements 202 a on two sides of the second wafer 200 a.
- the dry film pattern 204 a faces and overlies the second lens elements 202 a of the lens set.
- a mounting process may be performed, by placing and pressing an image sensor device chip 210 , having a plurality of solder balls 216 on a bottom surface of the image sensor device chip 210 on a carrier 213 .
- the carrier 213 may be a thermal tape comprising a flexible film 212 and a glue 214 thereon to fix the image sensor device chip 210 .
- the image sensor device chip 210 may comprise complementary metal-oxide-semiconductor (CMOS) devices or charge-coupled devices (CCDs).
- CMOS complementary metal-oxide-semiconductor
- CCDs charge-coupled devices
- a dispensing process is performed to apply an adhesive 220 to a top surface 218 of the image sensor device chip 210 for bonding of the lens set as shown in FIG. 4 .
- the adhesive 220 may comprise resin, epoxy adhesive polymer.
- the lens set may be bonded onto the top surface 218 of the image sensor device chip 210 , by placing and pressing the lens set on the image sensor device chip 210 , centrally.
- a protective film 230 is formed covering the lens set.
- the formation of the protective film 230 may comprise performing a coating process, such as a spray coating process, to coat a metal material entirely over the lens set and the dry film pattern 204 a to form a metal layer 222 .
- the metal layer 222 may comprise Al, Cu or the like (Ag, Iron coating).
- the metal layer 222 may serve as an electromagnetic interference (EMI) shield to provide an electromagnetic interference (EMI) shielding function for the image sensor device chip 210 .
- another coating process such as a spray coating process is performed to coat a first light shielding material covering the metal layer 222 to form a light shielding layer 224 .
- the light shielding layer 224 may comprise a black paint to prevent internal reflections.
- the protective film 230 comprising the metal layer 222 and the light shielding layer 224 , has a protection function for the lens set.
- a laser cutting process is performed to cut a portion of the metal layer 222 , the light shielding layer 224 and the dry film pattern 204 a.
- the remainder the dry film pattern 204 a over the lens set is dipped in a solution containing an organic solvent such as acetone.
- the dry film pattern 204 a may be removed and stripped by oscillating in the solution containing the organic solvent.
- the metal layer 222 , the light shielding layer 224 over the dry film pattern 204 a may simultaneously be taken out.
- Oscillation of the solution facilitates removal efficiency of the dry film pattern 204 a, a portion of the metal layer 222 and the light shielding layer 224 over the lens element 202 a.
- a cleaning process may be performed to remove residue of the dry film pattern 204 a, the metal layer 222 and the light shielding layer 224 over the lens set.
- the metal layer 222 and the light shielding layer 224 shield the camera module, except for the solder balls 216 and the aperture of the lens set.
- the carrier 213 as shown in FIG. 8 is torn off from the image sensor device chip 210 . Therefore, the description of fabrication of one exemplary embodiment of a camera module of the invention is completed.
- the method for fabricating the camera module utilizes a dry film as a protection film to prevent an aperture of a lens set from being covered by coating materials such as an electromagnetic interference (EMI) shielding material or a light shielding material applied during subsequent processes.
- the dry film layer is formed on the lens set in by a wafer-level lithography process before dividing the wafer level lens sets into individual lens sets. Therefore, the process using the dry film layer in wafer level has high throughput. Because dry film layer is formed by the wafer level lithography process, dry film patterns can be located exactly on lens sets by an alignment step of the wafer level lithography process. Also, the dry film layer has good dimension control ability. Moreover, during the step of forming lens set, the dry film patterns for the lens sets may be easily removed without additional process steps.
- EMI electromagnetic interference
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Abstract
Description
- 1. Field of the Invention
- The present invention relates to applying the dry film material by a wafer level lithography process to fabricate a camera module.
- 2. Description of the Related Art
- The conventional camera module is fabricated by laminating lenses on a substrate having optical devices thereon, and then the substrate laminated with the lenses is diced and divided into several individual camera module units. During the formation of the conventional camera module, a product yield thereof is lowered because the removal step of a protection film for the plurality of optical lenses of the plurality of lens cubes may destroy an aperture of the optical lens.
- A novel method for fabricating a camera module without destroying the apertures of the plurality of optical lenses is desired.
- Methods for fabricating a camera module are provided. An exemplary embodiment of the method for fabricating a camera module comprises providing plurality of lens sets. A dry film layer is formed on the plurality of lens sets. The dry film layer is patterned to form a plurality of dry film patterns respectively attaching to a plurality of lens sets. The plurality of lens sets are separated. A lens set separated from the plurality of lens sets is bonded to an image sensor device chip. The dry film pattern on the lens set is removed.
- Another exemplary embodiment of the method for fabricating a camera module comprises a first wafer having a plurality of first lens elements thereon. A first spacer element on the first wafer for isolating the first lens elements each other is formed. A dry film layer is formed on the first spacer element. The dry film layer is patterned to form a plurality of dry film patterns respectively attaching to a plurality of lens sets. The plurality of lens sets are separated. A lens set separated from the plurality of lens sets is bonded to an image sensor device chip. The dry film pattern on the lens set is removed.
- Yet another exemplary embodiment of the method for fabricating a camera module comprises a first wafer having a plurality of first lens elements thereon. A first spacer element on the first wafer for isolating the first lens elements each other is formed. A second wafer having a plurality of second lens elements thereon is bonded to the first spacer element, wherein the plurality of second lens elements aligns to the plurality of first lens elements. A second spacer element is formed on the second wafer for isolating the second lens elements each other. A dry film layer is formed on the second spacer element. The dry film layer is patterned to form a plurality of dry film patterns respectively attaching to a plurality of lens sets. The plurality of lens sets are separated. A lens set separated from the plurality of lens sets is bonded to an image sensor device chip. The dry film pattern on the lens set is removed
- A detailed description is given in the following embodiments with reference to the accompanying drawings.
- The invention can be more fully understood by reading the subsequent detailed description and examples with references made to the accompanying drawings, wherein:
-
FIGS. 1 a-1 c, 2 a-2 b, 3 a-3 b and 4-9 are cross section views or top views showing exemplary embodiments of a method for fabricating a camera module of the invention. - The following description is of a mode for carrying out the invention. This description is made for the purpose of illustrating the general principles of the invention and should not be taken in a limiting sense. The scope of the invention is best determined by reference to the appended claims. Wherever possible, the same reference numbers are used in the drawings and the descriptions to refer the same or like parts.
- The present invention will be described with respect to particular embodiments and with reference to certain drawings, but the invention is not limited thereto and is only limited by the claims. The drawings described are only schematic and are non-limiting. In the drawings, the size of some of the elements may be exaggerated and not drawn to scale for illustrative purposes. The dimensions and the relative dimensions do not correspond to actual dimensions to practice the invention.
-
FIGS. 1 a-1 c, 2 a-2 b, 3 a-3 b and 4-9 are cross section views or top views showing exemplary embodiments of a method for fabricating a camera module of the invention. The method for fabricating the camera module utilizes a dry film to prevent an optical lens set from being covered by coating materials, such as an electromagnetic interference (EMI) shielding material or a light shielding material applied during subsequent processes. -
FIG. 1 a is a cross section view showing the exemplary embodiment of lens sets constituted by lens elements on a single wafer. - Referring to
FIG. 1 a, a plurality of lens sets in wafer level are provided. Afirst wafer 200 b havingfirst lens elements 202 b thereon is provided. Afirst spacer element 203 b is then formed on thefirst wafer 200 b for isolating thefirst lens elements 200 b each other. The lens sets are constituted byfirst lens elements 202 b on two sides of afirst wafer 200 b andfirst spacer elements 203 b. Thefirst wafer 200 b may comprise a transparent material. Thefirst spacer elements 203 b may be arranged as an array on two sides of thefirst wafer 200 b. Alternatively, thefirst lens elements 202 b and thefirst spacer elements 203 b may be respectively arranged on one side of thefirst wafer 200 b. - Alternatively,
FIG. 1 b is a cross section view showing another exemplary embodiment of lens sets, in which the lens sets are constituted by lens elements on two wafers. As shown inFIG. 1 b, asecond wafer 200 a havingsecond lens elements 202 a thereon is bonded to thefirst spacer elements 203 b on thefirst wafer 200 b so that thefirst wafer 200 b and thesecond wafer 200 a are stacked together. Aspacer element 203 a is then formed on thesecond wafer 200 a for isolatingsecond lens elements 202 a each other. Thesecond wafer 200 a may comprise a transparent material. Thesecond spacer elements 203 a may be arranged as an array on the upper surface of thesecond wafer 200 a. Thesecond lens elements 202 a align to thefirst lens elements 202 b.FIG. 1 c is a top view showing the exemplary embodiment of lens sets constituted by two wafers and lens elements thereon. Alternatively, one more wafer with lens elements thereon may bond to thesecond wafer 200 a orfirst wafer 200 b. The following description will take one embodiment as shown in 1 b and lc, but is not limited to the disclosed embodiments. - Next, referring to
FIGS. 2 a and 2 b, adry film layer 204 is laminated on thesecond spacer element 203 a by a pressing process. In one embodiment, thedry film layer 204 covers an entire region of the wafer-level lens sets constituted by thefirst wafer 200 b and thesecond wafer 200 a. -
FIGS. 3 a and 3 b show a process step to formdry film patterns 204 a respectively attaching to the lens sets. Thedry film layer 204 may be formed of a photosensitive material, therefore thedry film layer 204 may serve as a photoresist layer. As shown inFIGS. 3 a and 3 b, a lithography process is performed to remove a portion of thedry film layer 204 thereby patterning thedry film layer 204 intodry film patterns 204 a. In one embodiment, the lithography process may include alignment, exposing, and developing thedry film layer 204. Next, a curing process may be performed to fully cure thedry film patterns 204 a below 75° C. In one embodiment, thedry film patterns 204 a respectively cover each of the lens sets. Thedry film patterns 204 a have a protection function for theunderlying lens elements 202 a. In one embodiment, thedry film layer 204 is processed below 75° C. for the steps of lamination, exposure, development, and so forth. Thedry film layer 204 is not flowable below 75° C., therefore the individual lens set can be covered with a solidifieddry film pattern 204 a without being contaminated by a fluid dry film materials or other particles and impurities. - Next, the wafer-level lens sets covered with
dry film patterns 204 a are separated by a sawing process alongfirst spacer element 203 b andsecond spacer element 203 a. For example, wafer-level lens sets are divided along the scribe line, dotted line as shown inFIG. 3 b. In one embodiment, thefirst wafer 200 b withlens elements 202 b thereon and thesecond wafer 200 a withlens elements 202 b thereon are divided into individual lens sets.FIG. 4 illustrates one of the individual lens sets. The lens set as shown inFIG. 4 hasfirst lens elements 202 b on two sides of thefirst wafer 200 b andsecond lens elements 202 a on two sides of thesecond wafer 200 a. Also, thedry film pattern 204 a faces and overlies thesecond lens elements 202 a of the lens set. - Next, referring to
FIG. 5 , a mounting process may be performed, by placing and pressing an imagesensor device chip 210, having a plurality ofsolder balls 216 on a bottom surface of the imagesensor device chip 210 on acarrier 213. In one embodiment, thecarrier 213 may be a thermal tape comprising aflexible film 212 and aglue 214 thereon to fix the imagesensor device chip 210. In one embodiment, the imagesensor device chip 210 may comprise complementary metal-oxide-semiconductor (CMOS) devices or charge-coupled devices (CCDs). - Next, referring to
FIG. 6 , a dispensing process is performed to apply an adhesive 220 to atop surface 218 of the imagesensor device chip 210 for bonding of the lens set as shown inFIG. 4 . In one embodiment, the adhesive 220 may comprise resin, epoxy adhesive polymer. - Next, referring to
FIG. 7 , the lens set may be bonded onto thetop surface 218 of the imagesensor device chip 210, by placing and pressing the lens set on the imagesensor device chip 210, centrally. - Next, referring to
FIG. 8 , aprotective film 230 is formed covering the lens set. The formation of theprotective film 230 may comprise performing a coating process, such as a spray coating process, to coat a metal material entirely over the lens set and thedry film pattern 204 a to form ametal layer 222. In one embodiment, themetal layer 222 may comprise Al, Cu or the like (Ag, Iron coating). Themetal layer 222 may serve as an electromagnetic interference (EMI) shield to provide an electromagnetic interference (EMI) shielding function for the imagesensor device chip 210. Next, another coating process such as a spray coating process is performed to coat a first light shielding material covering themetal layer 222 to form alight shielding layer 224. In one embodiment, thelight shielding layer 224 may comprise a black paint to prevent internal reflections. In one embodiment, theprotective film 230, comprising themetal layer 222 and thelight shielding layer 224, has a protection function for the lens set. - Next, referring to
FIG. 9 , a laser cutting process is performed to cut a portion of themetal layer 222, thelight shielding layer 224 and thedry film pattern 204 a. The remainder thedry film pattern 204 a over the lens set is dipped in a solution containing an organic solvent such as acetone. Next, thedry film pattern 204 a may be removed and stripped by oscillating in the solution containing the organic solvent. In this step, themetal layer 222, thelight shielding layer 224 over thedry film pattern 204 a may simultaneously be taken out. Moreover, Oscillation of the solution facilitates removal efficiency of thedry film pattern 204 a, a portion of themetal layer 222 and thelight shielding layer 224 over thelens element 202 a. Afterdry film pattern 204 a is removed by the solution containing the organic solvent, no residue will be left inside of lens set. - Alternatively, a cleaning process may be performed to remove residue of the
dry film pattern 204 a, themetal layer 222 and thelight shielding layer 224 over the lens set. - As shown in
FIG. 9 , themetal layer 222 and thelight shielding layer 224 shield the camera module, except for thesolder balls 216 and the aperture of the lens set. Next, thecarrier 213 as shown inFIG. 8 is torn off from the imagesensor device chip 210. Therefore, the description of fabrication of one exemplary embodiment of a camera module of the invention is completed. - One exemplary embodiment of a method for fabricating a camera module is provided. The method for fabricating the camera module utilizes a dry film as a protection film to prevent an aperture of a lens set from being covered by coating materials such as an electromagnetic interference (EMI) shielding material or a light shielding material applied during subsequent processes. The dry film layer is formed on the lens set in by a wafer-level lithography process before dividing the wafer level lens sets into individual lens sets. Therefore, the process using the dry film layer in wafer level has high throughput. Because dry film layer is formed by the wafer level lithography process, dry film patterns can be located exactly on lens sets by an alignment step of the wafer level lithography process. Also, the dry film layer has good dimension control ability. Moreover, during the step of forming lens set, the dry film patterns for the lens sets may be easily removed without additional process steps.
- While the invention has been described by way of example and in terms of the preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments. To the contrary, it is intended to cover various modifications and similar arrangements (as would be apparent to those skilled in the art). Therefore, the scope of the appended claims should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements.
Claims (16)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/219,948 US8388793B1 (en) | 2011-08-29 | 2011-08-29 | Method for fabricating camera module |
| TW100144313A TWI460485B (en) | 2011-08-29 | 2011-12-02 | Camera module manufacturing method |
| CN201110461196.0A CN102969321B (en) | 2011-08-29 | 2011-12-26 | Method of manufacturing camera module |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/219,948 US8388793B1 (en) | 2011-08-29 | 2011-08-29 | Method for fabricating camera module |
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| US20130048208A1 true US20130048208A1 (en) | 2013-02-28 |
| US8388793B1 US8388793B1 (en) | 2013-03-05 |
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| US13/219,948 Active US8388793B1 (en) | 2011-08-29 | 2011-08-29 | Method for fabricating camera module |
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| US (1) | US8388793B1 (en) |
| CN (1) | CN102969321B (en) |
| TW (1) | TWI460485B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016060615A1 (en) * | 2014-10-14 | 2016-04-21 | Heptagon Micro Optics Pte. Ltd. | Optical element stack assemblies |
| WO2017022190A1 (en) * | 2015-07-31 | 2017-02-09 | Sony Semiconductor Solutions Corporation | Manufacturing method for lens substrate |
| US20190189662A1 (en) * | 2016-10-04 | 2019-06-20 | Semiconductor Components Industries, Llc | Image sensor packages formed using temporary protection layers and related methods |
| US10877239B2 (en) | 2015-11-12 | 2020-12-29 | Ams Sensors Singapore Pte. Ltd. | Optical element stack assemblies |
| US11137581B2 (en) * | 2018-09-27 | 2021-10-05 | Himax Technologies Limited | Wafer-level homogeneous bonding optical structure and method to form the same |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9094593B2 (en) * | 2013-07-30 | 2015-07-28 | Heptagon Micro Optics Pte. Ltd. | Optoelectronic modules that have shielding to reduce light leakage or stray light, and fabrication methods for such modules |
| US9467606B2 (en) * | 2014-06-10 | 2016-10-11 | Omnivision Technologies, Inc. | Wafer level stepped sensor holder |
| TWI741988B (en) * | 2015-07-31 | 2021-10-11 | 日商新力股份有限公司 | Stacked lens structure, method of manufacturing the same, and electronic apparatus |
| WO2017203593A1 (en) * | 2016-05-24 | 2017-11-30 | オリンパス株式会社 | Method for manufacturing endoscope optical unit, endoscope optical unit, and endoscope |
| CN106791340B (en) * | 2017-03-22 | 2022-12-27 | 蓝思科技股份有限公司 | Camera assembly with protective film |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3938253B2 (en) * | 1997-12-26 | 2007-06-27 | 日本板硝子株式会社 | Resin erecting equal-magnification lens array and manufacturing method thereof |
| US6306694B1 (en) * | 1999-03-12 | 2001-10-23 | Semiconductor Energy Laboratory Co., Ltd. | Process of fabricating a semiconductor device |
| JP4562835B2 (en) * | 1999-11-05 | 2010-10-13 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
| US6483101B1 (en) * | 1999-12-08 | 2002-11-19 | Amkor Technology, Inc. | Molded image sensor package having lens holder |
| US20020020840A1 (en) * | 2000-03-10 | 2002-02-21 | Setsuo Nakajima | Semiconductor device and manufacturing method thereof |
| US6821810B1 (en) * | 2000-08-07 | 2004-11-23 | Taiwan Semiconductor Manufacturing Company | High transmittance overcoat for optimization of long focal length microlens arrays in semiconductor color imagers |
| US6635941B2 (en) * | 2001-03-21 | 2003-10-21 | Canon Kabushiki Kaisha | Structure of semiconductor device with improved reliability |
| JP4213897B2 (en) * | 2001-08-07 | 2009-01-21 | 株式会社日立製作所 | Method of manufacturing transfer pattern of microlens array |
| CN100440544C (en) * | 2002-09-17 | 2008-12-03 | 安特约恩股份有限公司 | Camera device, method of manufacturing camera device, and wafer-scale packaging |
| US7329861B2 (en) * | 2003-10-14 | 2008-02-12 | Micron Technology, Inc. | Integrally packaged imaging module |
| US7968461B2 (en) * | 2003-10-28 | 2011-06-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming wiring, method for manufacturing thin film transistor and droplet discharging method |
| US8049806B2 (en) * | 2004-09-27 | 2011-11-01 | Digitaloptics Corporation East | Thin camera and associated methods |
| CN1969539A (en) * | 2004-05-04 | 2007-05-23 | 德塞拉股份有限公司 | Compact lens turret assembly |
| US20070014018A1 (en) * | 2004-12-30 | 2007-01-18 | Wheatley John A | Internal components of optical device comprising hardcoat |
| JP2007129164A (en) * | 2005-11-07 | 2007-05-24 | Sharp Corp | Optical device module, optical device module manufacturing method, and structure |
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| US7335870B1 (en) * | 2006-10-06 | 2008-02-26 | Advanced Chip Engineering Technology Inc. | Method for image sensor protection |
| WO2008120425A1 (en) * | 2007-03-28 | 2008-10-09 | Sharp Kabushiki Kaisha | Liquid crystal display panel with microlens array and method for manufacturing the same |
| KR100959922B1 (en) * | 2007-11-20 | 2010-05-26 | 삼성전자주식회사 | Camera module and manufacturing method |
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| US9350906B2 (en) * | 2008-10-02 | 2016-05-24 | Omnivision Technologies, Inc. | Encapsulant module with opaque coating |
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| CN101990058A (en) * | 2009-07-30 | 2011-03-23 | 鸿富锦精密工业(深圳)有限公司 | Method of coating wafer-level camera module and wafer-level camera module |
| US8193599B2 (en) * | 2009-09-02 | 2012-06-05 | Himax Semiconductor, Inc. | Fabricating method and structure of a wafer level module |
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| US8796798B2 (en) * | 2010-01-27 | 2014-08-05 | Ricoh Company, Ltd. | Imaging module, fabricating method therefor, and imaging device |
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-
2011
- 2011-08-29 US US13/219,948 patent/US8388793B1/en active Active
- 2011-12-02 TW TW100144313A patent/TWI460485B/en active
- 2011-12-26 CN CN201110461196.0A patent/CN102969321B/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201310106A (en) | 2013-03-01 |
| US8388793B1 (en) | 2013-03-05 |
| CN102969321B (en) | 2015-02-11 |
| CN102969321A (en) | 2013-03-13 |
| TWI460485B (en) | 2014-11-11 |
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