US20110259567A1 - Thermal conductive sheet - Google Patents
Thermal conductive sheet Download PDFInfo
- Publication number
- US20110259567A1 US20110259567A1 US13/016,549 US201113016549A US2011259567A1 US 20110259567 A1 US20110259567 A1 US 20110259567A1 US 201113016549 A US201113016549 A US 201113016549A US 2011259567 A1 US2011259567 A1 US 2011259567A1
- Authority
- US
- United States
- Prior art keywords
- thermal conductive
- conductive sheet
- epoxy resin
- boron nitride
- vol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000002245 particle Substances 0.000 claims abstract description 74
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims abstract description 60
- 229910052582 BN Inorganic materials 0.000 claims abstract description 59
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000010521 absorption reaction Methods 0.000 claims abstract description 15
- 230000004580 weight loss Effects 0.000 claims abstract description 11
- 229920000647 polyepoxide Polymers 0.000 description 93
- 239000003822 epoxy resin Substances 0.000 description 90
- 229920005989 resin Polymers 0.000 description 47
- 239000011347 resin Substances 0.000 description 47
- 238000012360 testing method Methods 0.000 description 44
- 239000007787 solid Substances 0.000 description 41
- -1 acrylic ester Chemical class 0.000 description 32
- 238000000034 method Methods 0.000 description 29
- 239000003795 chemical substances by application Substances 0.000 description 27
- 239000000203 mixture Substances 0.000 description 24
- 238000007731 hot pressing Methods 0.000 description 22
- 238000002156 mixing Methods 0.000 description 21
- 239000002904 solvent Substances 0.000 description 20
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- 229920001187 thermosetting polymer Polymers 0.000 description 15
- 239000007788 liquid Substances 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 239000004698 Polyethylene Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 229920000573 polyethylene Polymers 0.000 description 10
- 238000007639 printing Methods 0.000 description 10
- 150000004767 nitrides Chemical class 0.000 description 9
- 238000013001 point bending Methods 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- 230000017525 heat dissipation Effects 0.000 description 7
- 238000010030 laminating Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000149 argon plasma sintering Methods 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 229920000098 polyolefin Polymers 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000009472 formulation Methods 0.000 description 5
- 238000007641 inkjet printing Methods 0.000 description 5
- 238000007648 laser printing Methods 0.000 description 5
- 229920005992 thermoplastic resin Polymers 0.000 description 5
- 229930185605 Bisphenol Natural products 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 230000000630 rising effect Effects 0.000 description 4
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000013500 performance material Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000002411 thermogravimetry Methods 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 239000004416 thermosoftening plastic Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000000881 depressing effect Effects 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 2
- 229920001684 low density polyethylene Polymers 0.000 description 2
- 239000004702 low-density polyethylene Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- ASLICXGLMBICCD-UHFFFAOYSA-N 1-ethyl-4,5-dihydroimidazole Chemical compound CCN1CCN=C1 ASLICXGLMBICCD-UHFFFAOYSA-N 0.000 description 1
- SPBJUTVLDJRGSY-UHFFFAOYSA-N 1-heptadecyl-4,5-dihydroimidazole Chemical compound CCCCCCCCCCCCCCCCCN1CCN=C1 SPBJUTVLDJRGSY-UHFFFAOYSA-N 0.000 description 1
- ANFXTILBDGTSEG-UHFFFAOYSA-N 1-methyl-4,5-dihydroimidazole Chemical compound CN1CCN=C1 ANFXTILBDGTSEG-UHFFFAOYSA-N 0.000 description 1
- YJBAUTPCBIGXHL-UHFFFAOYSA-N 1-phenyl-4,5-dihydroimidazole Chemical compound C1=NCCN1C1=CC=CC=C1 YJBAUTPCBIGXHL-UHFFFAOYSA-N 0.000 description 1
- VUDCHJYPASPIJR-UHFFFAOYSA-N 1-propan-2-yl-4,5-dihydroimidazole Chemical compound CC(C)N1CCN=C1 VUDCHJYPASPIJR-UHFFFAOYSA-N 0.000 description 1
- RDBONSWKYPUHCS-UHFFFAOYSA-N 1-undecyl-4,5-dihydroimidazole Chemical compound CCCCCCCCCCCN1CCN=C1 RDBONSWKYPUHCS-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SHYARJUKNREDGB-UHFFFAOYSA-N 2-ethyl-5-methyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCC(C)N1 SHYARJUKNREDGB-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- HGFWTERYDVYMMD-UHFFFAOYSA-N 3,3-dichlorooxolane-2,5-dione Chemical compound ClC1(Cl)CC(=O)OC1=O HGFWTERYDVYMMD-UHFFFAOYSA-N 0.000 description 1
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 229920001923 acrylonitrile-ethylene-styrene Polymers 0.000 description 1
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 238000010147 laser engraving Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
- C09K5/14—Solid materials, e.g. powdery or granular
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/38—Boron-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/16—Solid spheres
- C08K7/18—Solid spheres inorganic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/302—Conductive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/38—Boron-containing compounds
- C08K2003/382—Boron-containing compounds and nitrogen
Definitions
- the present invention relates to a thermal conductive sheet, to be specific, to a thermal conductive sheet for use in power electronics technology.
- Japanese Unexamined Patent Publication No. 2008-280496 has proposed a thermal conductive sheet containing a plate-like boron nitride powder and an acrylic ester copolymer resin.
- the boron nitride powder is oriented so as to orient its major axis direction (direction perpendicular to the plate thickness of the boron nitride powder) in the thickness direction of the sheet, and thermal conductivity in the thickness direction of the thermal conductive sheet is improved in this way.
- the thermal conductive sheet is required to have a high thermal conductivity in a direction (plane direction) perpendicular to the thickness direction depending on its use and purpose.
- the thermal conductive sheet of Japanese Unexamined Patent Publication No. 2008-280496 is disadvantageous in that the major axis direction of the boron nitride powder is perpendicular to (crossing) the plane direction, and therefore the thermal conductivity in the plane direction is insufficient.
- thermal conductive sheet is used for conducting (dissipating) heat generated from, for example, various devises, and therefore excellent heat resistance is required so that the thermal conductive sheet is not decomposed by the heat.
- thermal conductive sheet is mounted, for example, on electronic components, and the electronic components are sometimes exposed to high temperature, for example, in soldering such as reflow soldering of the electronic components. Therefore, water absorbency of the thermal conductive sheet is required to be suppressed so as to avoid damages from the heat causing rapid vaporization of the moisture contained in the thermal conductive sheet.
- An object of the present invention is to provide a thermal conductive sheet that is excellent in thermal conductivity in a plane direction, and also excellent in heat resistance.
- Another object of the present invention is to provide a thermal conductive sheet that is excellent in thermal conductivity in a plane direction, and can also achieve a low water absorbency.
- a thermal conductive sheet of the present invention contains a plate-like boron nitride particle, wherein the thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet is 4 W/m ⁇ K or more, and the 5% weight loss temperature is 250° C. or more.
- the thermal conductive sheet of the present invention is excellent in thermal conductivity in a direction (plane direction) perpendicular to the thickness direction, and also excellent in heat resistance.
- the thermal conductive sheet of the present invention can be applied in various heat dissipation uses as a thermal conductive sheet in which decomposition is suppressed even under exposure to high temperature, that is excellent in handleability, and excellent in thermal conductivity in a plane direction.
- a thermal conductive sheet of the present invention contains a plate-like boron nitride particle, wherein the thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet is 4 W/m ⁇ K or more, and the water absorption is 3 vol % or less.
- thermal conductivity in a direction (plane direction) perpendicular to the thickness direction is excellent, and furthermore, water absorbency is suppressed.
- the thermal conductive sheet of the present invention can be applied in various heat dissipation uses as a thermal conductive sheet in which damage when exposed to high temperature can be suppressed, that is excellent in handleability, and excellent in thermal conductivity in a plane direction.
- FIG. 1 shows a perspective view of an embodiment of a thermal conductive sheet of the present invention.
- FIG. 2 shows process drawings for describing a method for producing the thermal conductive sheet shown in FIG. 1 :
- FIG. 3 shows a perspective view of a test device (Type I, before bend test) of a bend test.
- FIG. 4 shows a perspective view of a test device (Type I, during bend test) of a bend test.
- a thermal conductive sheet of the present invention contains boron nitride particles.
- the thermal conductive sheet contains boron nitride (BN) particles as an essential component, and further contains, for example, a resin component.
- BN boron nitride
- the boron nitride particles are formed into a plate-like (or flake-like) shape, and are dispersed so as to be orientated in a predetermined direction (described later) in the thermal conductive sheet.
- the boron nitride particles have an average length in the longitudinal direction (maximum length in the direction perpendicular to the plate thickness direction) of, for example, 1 to 100 ⁇ m, or preferably 3 to 90 ⁇ m.
- the boron nitride particles have an average length in the longitudinal direction of, 5 ⁇ m or more, preferably 10 ⁇ m or more, more preferably 20 ⁇ m or more, even more preferably 30 ⁇ m or more, or most preferably 40 ⁇ m or more, and usually has an average length in the longitudinal direction of, for example, 100 ⁇ m or less, or preferably 90 ⁇ m or less.
- the average thickness (the length in the thickness direction of the plate, that is, the length in the short-side direction of the particles) of the boron nitride particles is, for example, 0.01 to 20 ⁇ m, or preferably 0.1 to 15 ⁇ m.
- the aspect ratio (length in the longitudinal direction/thickness) of the boron nitride particles is, for example, 2 to 10000, or preferably 10 to 5000.
- the average particle size of the boron nitride particles as measured by a light scattering method is, for example, 5 ⁇ m or more, preferably 10 ⁇ m or more, more preferably 20 ⁇ m or more, particularly preferably 30 ⁇ m or more, or most preferably 40 ⁇ m or more, and usually is 100 ⁇ m or less.
- the average particle size as measured by the light scattering method is a volume average particle size measured with a dynamic light scattering type particle size distribution analyzer.
- the thermal conductive sheet When the average particle size of the boron nitride particles as measured by the light scattering method is below the above-described range, the thermal conductive sheet may become fragile, and handleability may be reduced.
- the bulk density (JIS K 5101, apparent density) of the boron nitride particles is, for example, 0.3 to 1.5 g/cm 3 , or preferably 0.5 to 1.0 g/cm 3 .
- boron nitride particles a commercially available product or processed goods thereof can be used.
- examples of commercially available products of the boron nitride particles include the “PT” series (for example, “PT-110”) manufactured by Momentive Performance Materials Inc., and the “SHOBN®UHP” series (for example, “SHOBN®UHP-1”) manufactured by Showa Denko K.K.
- the resin component is a component that is capable of dispersing the boron nitride particles, i.e., a dispersion medium (matrix) in which the boron nitride particles are dispersed, including, for example, resin components such as a thermosetting resin component and a thermoplastic resin component.
- thermosetting resin component examples include epoxy resin, thermosetting polyimide, phenol resin, urea resin, melamine resin, unsaturated polyester resin, diallyl phthalate resin, silicone resin, and thermosetting urethane resin.
- thermoplastic resin component examples include polyolefin (for example, polyethylene, polypropylene, and ethylene-propylene copolymer), acrylic resin (for example, polymethyl methacrylate), polyvinyl acetate, ethylene-vinyl acetate copolymer, polyvinyl chloride, polystyrene, polyacrylonitrile, polyamide (Nylon®), polycarbonate, polyacetal, polyethylene terephthalate, polyphenylene oxide, polyphenylene sulfide, polysulfone, polyether sulfone, poly ether ether ketone (PEEK), polyallyl sulfone, thermoplastic polyimide, thermoplastic urethane resin, polyamino-bismaleimide, polyamide-imide, polyether-imide, bismaleimide-triazine resin, polymethylpentene, fluorine resin, liquid crystal polymer, olefin-vinyl alcohol copolymer, ionomer, polyarylate,
- resin components can be used alone or in combination of two or more.
- thermosetting resin components preferably, the epoxy resin is used.
- the epoxy resin is in a state of liquid, semi-solid, or solid under normal temperature.
- examples of the epoxy resin include aromatic epoxy resins such as bisphenol epoxy resin (e.g., bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, hydrogenated bisphenol A epoxy resin, dimer acid-modified bisphenol epoxy resin, and the like), novolak epoxy resin (e.g., phenol novolak epoxy resin, cresol novolak epoxy resin, biphenyl epoxy resin, and the like), naphthalene epoxy resin, fluorene epoxy resin (e.g., bisaryl fluorene epoxy resin and the like), and triphenylmethane epoxy resin (e.g., trishydroxyphenylmethane epoxy resin and the like); nitrogen-containing-cyclic epoxy resins such as triepoxypropyl isocyanurate (triglycidyl isocyanurate) and hydantoin epoxy resin; aliphatic epoxy resin; alicyclic epoxy resin (e.g., dicyclo ring-type epoxy resin and the like); glycidylether
- epoxy resins can be used alone or in combination of two or more.
- the epoxy resin has an epoxy equivalent of, for example, 100 to 1000 g/eqiv., or preferably 180 to 700 g/eqiv., and has a softening temperature (ring and ball test) of, for example, 80° C. or less (to be specific, 20 to 80° C.), or preferably 70° C. or less (to be specific, 35 to 70° C.).
- the epoxy resin has a melt viscosity at 80° C. of, for example, 10 to 20,000 mPa ⁇ s, or preferably 50 to 10,000 mPa ⁇ s.
- the melt viscosity of the mixture of these epoxy resins is set within the above-described range.
- a combination of liquid epoxy resin and solid epoxy resin for example, a combination of liquid epoxy resin and solid epoxy resin, or more preferably, a combination of a liquid aromatic epoxy resin and a solid aromatic epoxy resin is used.
- a combination include, to be more specific, a combination of a liquid bisphenol epoxy resin and a solid triphenylmethane epoxy resin, and a combination of a liquid bisphenol epoxy resin and a solid bisphenol epoxy resin.
- a semi-solid epoxy resin is used alone, or more preferably, a semi-solid aromatic epoxy resin is used alone.
- examples of those epoxy resins include, in particular, a semi-solid fluorene epoxy resin.
- a combination of a liquid epoxy resin and a solid epoxy resin, or a semi-solid epoxy resin can improve conformability to irregularities (described later) of the thermal conductive sheet.
- a first epoxy resin having a softening temperature of, for example, below 45° C., or preferably 35° C. or less, and a second epoxy resin having a softening temperature of, for example, 45° C. or more, or preferably 55° C. or more are used in combination.
- the kinetic viscosity (in conformity with JIS K 7233, described later) of the resin component (mixture) can be set to a desired range, and also, conformability to irregularities of the thermal conductive sheet can be improved.
- the epoxy resin can also be prepared as an epoxy resin composition containing, for example, an epoxy resin, a curing agent, and a curing accelerator.
- the curing agent is a latent curing agent (epoxy resin curing agent) that can cure the epoxy resin by heating, and examples thereof include an imidazole compound, an amine compound, an acid anhydride compound, an amide compound, a hydrazide compound, and an imidazoline compound.
- a phenol compound, a urea compound, and a polysulfide compound can also be used.
- imidazole compound examples include 2-phenyl imidazole, 2-methyl imidazole, 2-ethyl-4-methyl imidazole, and 2-phenyl-4-methyl-5-hydroxymethyl imidazole.
- amine compound examples include aliphatic polyamines such as ethylene diamine, propylene diamine, diethylene triamine, and triethylene tetramine; and aromatic polyamines such as metha phenylenediamine, diaminodiphenyl methane, and diaminodiphenyl sulfone.
- Examples of the acid anhydride compound include phthalic anhydride, maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, methyl nadic anhydride, pyromelletic anhydride, dodecenylsuccinic anhydride, dichloro succinic anhydride, benzophenone tetracarboxylic anhydride, and chlorendic anhydride.
- amide compound examples include dicyandiamide and polyamide.
- hydrazide compound includes adipic acid dihydrazide.
- imidazoline compound examples include methylimidazoline, 2-ethyl-4-methylimidazoline, ethylimidazoline, isopropylimidazoline, 2,4-dimethylimidazoline, phenylimidazoline, undecylimidazoline, heptadecylimidazoline, and 2-phenyl-4-methylimidazoline.
- These curing agents can be used alone or in combination of two or more.
- a preferable example of the curing agent is an imidazole compound.
- curing accelerator examples include tertiary amine compounds such as triethylenediamine and tri-2,4,6-dimethylaminomethylphenol; phosphorus compounds such as triphenylphosphine, tetraphenylphosphoniumtetraphenylborate, and tetra-n-butylphosphonium-o,o-diethylphosphorodithioate; a quaternary ammonium salt compound; an organic metal salt compound; and derivatives thereof.
- tertiary amine compounds such as triethylenediamine and tri-2,4,6-dimethylaminomethylphenol
- phosphorus compounds such as triphenylphosphine, tetraphenylphosphoniumtetraphenylborate, and tetra-n-butylphosphonium-o,o-diethylphosphorodithioate
- a quaternary ammonium salt compound an organic metal salt compound; and derivatives thereof.
- the mixing ratio of the curing agent is, for example, 0.5 to 50 parts by mass, or preferably 1 to 10 parts by mass per 100 parts by mass of the epoxy resin
- the mixing ratio of the curing accelerator is, for example, 0.1 to 10 parts by mass, or preferably 0.2 to 5 parts by mass per 100 parts by mass of the epoxy resin.
- the above-described curing agent, and/or the curing accelerator can be prepared and used, as necessary, as a solution, i.e., the curing agent and/or the curing accelerator dissolved in a solvent; and/or as a dispersion liquid, i.e., the curing agent and/or the curing accelerator dispersed in a solvent.
- the solvent examples include organic solvents including ketones such as acetone and methyl ethyl ketone, ester such as ethyl acetate, and amide such as N,N-dimethylformamide.
- examples of the solvent also include aqueous solvents including water, and alcohols such as methanol, ethanol, propanol, and isopropanol.
- a preferable example of the solvent is an organic solvent, and more preferable examples are ketones and amides.
- thermoplastic resin component preferably, polyolefin is used.
- polyolefin are polyethylene and ethylene-propylene copolymer.
- polyethylene examples include a low density polyethylene and a high density polyethylene.
- ethylene-propylene copolymer examples include a random copolymer, a block copolymer, or a graft copolymer of ethylene and propylene.
- polyolefins can be used alone or in combination of two or more.
- the polyolefins have a weight average molecular weight and/or a number average molecular weight of, for example, 1000 to 10000.
- the polyolefin can be used alone, or can be used in combination.
- the resin component has a kinetic viscosity as measured in conformity with the kinetic viscosity test of JIS K 7233 (bubble viscometer method) (temperature: 25° C. ⁇ 0.5° C., solvent: butyl carbitol, resin component (solid content) concentration: 40 mass %) of, for example, 0.22 ⁇ 10 ⁇ 4 to 2.00 ⁇ 10 ⁇ 4 m 2 /s, preferably 0.3 ⁇ 10 ⁇ 4 to 1.9 ⁇ 10 ⁇ 4 m 2 /s, or more preferably 0.4 ⁇ 10 ⁇ 4 to 1.8 ⁇ 10 ⁇ 4 m 2 /s.
- the above-described kinetic viscosity can also be set to, for example, 0.22 ⁇ 10 ⁇ 4 to 1.00 ⁇ 10 ⁇ 4 m 2 /s, preferably 0.3 ⁇ 10 ⁇ 4 to 0.9 ⁇ 10 ⁇ 4 m 2 /s, or more preferably 0.4 ⁇ 10 ⁇ 4 to 0.8 ⁇ 10 ⁇ 4 m 2 /s.
- the kinetic viscosity of the resin component is measured by comparing the bubble rising speed of a resin component sample with the bubble rising speed of criterion samples (having a known kinetic viscosity), and determining the kinetic viscosity of the criterion sample having a matching rising speed to be the kinetic viscosity of the resin component.
- the proportion of the volume-based boron nitride particle content (solid content, that is, the volume percentage of boron nitride particles relative to a total volume of the resin component and the boron nitride particles) is, for example, 35 vol % or more, preferably 60 vol % or more, or more preferably 75 vol % or more, and usually, for example, 95 vol % or less, or preferably 90 vol % or less.
- the boron nitride particles may not be oriented in a predetermined direction in the thermal conductive sheet.
- the proportion of the volume-based boron nitride particle content exceeds the above-described range, the thermal conductive sheet may become fragile, and handleability and conformability to irregularities may be reduced.
- the mass-based mixing ratio of the boron nitride particles relative to 100 parts by mass of the total amount (total solid content) of the components (boron nitride particles and resin component) forming the thermal conductive sheet is, for example, 40 to 95 parts by mass, or preferably 65 to 90 parts by mass, and the mass-based mixing ratio of the resin component relative to 100 parts by mass of the total amount of the components forming the thermal conductive sheet is, for example, 5 to 60 parts by mass, or preferably 10 to 35 parts by mass.
- the mass-based mixing ratio of the boron nitride particles relative to 100 parts by mass of the resin component is, for example, 60 to 1900 parts by mass, or preferably 185 to 900 parts by mass.
- the mass ratio (mass of the first epoxy resin/mass of the second epoxy resin) of the first epoxy resin relative to the second epoxy resin can be set appropriately in accordance with the softening temperature and the like of the epoxy resins (the first epoxy resin and the second epoxy resin).
- the mass ratio of the first epoxy resin relative to the second epoxy resin is 1/99 to 99/1, or preferably 10/90 to 90/10.
- a polymer precursor for example, a low molecular weight polymer including oligomer
- a monomer for example, a polymer precursor, a low molecular weight polymer including oligomer, and/or a monomer
- FIG. 1 shows a perspective view of an embodiment of a thermal conductive sheet of the present invention
- FIG. 2 shows process drawings for describing a method for producing the thermal conductive sheet shown in FIG. 1 .
- the above-described components are blended at the above-described mixing ratio and are stirred and mixed, thereby preparing a mixture.
- the solvent in order to mix the components efficiently, for example, can be blended therein with the above-described components, or, for example, the resin component (preferably, the thermoplastic resin component) can be melted by heating.
- the solvent examples include the above-described organic solvents.
- the solvent of the solvent solution and/or the solvent dispersion liquid can also serve as a mixing solvent for the stirring and mixing without adding a solvent during the stirring and mixing.
- a solvent can be further added as a mixing solvent.
- the solvent is removed after the stirring and mixing.
- the mixture is allowed to stand at room temperature for 1 to 48 hours; heated at 40 to 100° C. for 0.5 to 3 hours; or heated under a reduced pressure atmosphere of, for example, 0.001 to 50 kPa, at 20 to 60° C., for 0.5 to 3 hours.
- the heating temperature is, for example, a temperature in the neighborhood of or exceeding the softening temperature of the resin component, to be specific, 40 to 150° C., or preferably 70 to 140° C.
- the mixture is hot-pressed with two releasing films 4 sandwiching the mixture, thereby producing a pressed sheet 1 A.
- Conditions for the hot-pressing are as follows: a temperature of, for example, 50 to 150° C., or preferably 60 to 140° C.; a pressure of, for example, 1 to 100 MPa, or preferably 5 to 50 MPa; and a duration of, for example, 0.1 to 100 minutes, or preferably 1 to 30 minutes.
- the mixture is hot-pressed under vacuum.
- the degree of vacuum in the vacuum hot-pressing is, for example, 1 to 100 Pa, or preferably 5 to 50 Pa, and the temperature, the pressure, and the duration are the same as those described above for the hot-pressing.
- the pressed sheet 1 A obtained by the hot-pressing has a thickness of, for example, 50 to 1000 ⁇ m, or preferably 100 to 800 ⁇ m.
- the pressed sheet 1 A is divided into a plurality of pieces (for example, four pieces), thereby producing a divided sheet 1 B (dividing step).
- the pressed sheet 1 A is cut along the thickness direction so that the pressed sheet 1 A is divided into a plurality of pieces when the pressed sheet 1 A is projected in the thickness direction.
- the pressed sheet 1 A is cut so that the respective divided sheets 1 B have the same shape when the divided sheets 1 B are projected in the thickness direction.
- the laminated sheet 1 C is hot-pressed (preferably hot-pressed under vacuum) (hot-pressing step).
- the conditions for the hot-pressing are the same as the conditions for the above-described hot-pressing of the mixture.
- the thickness of the hot-pressed laminated sheet 1 C is, for example, 1 mm or less, or preferably 0.8 mm or less, and usually is, for example, 0.05 mm or more, or preferably 0.1 mm or more.
- the series of the steps of the above-described dividing step ( FIG. 2 ( b )), laminating step ( FIG. 2 ( c )), and hot-pressing step ( FIG. 2 ( a )) are performed repeatedly, so as to allow boron nitride particles 2 to be efficiently oriented in a predetermined direction in the resin component 3 in the thermal conductive sheet 1 .
- the number of the repetition is not particularly limited, and can be set appropriately according to the charging state of the boron nitride particles.
- the number of the repetition is, for example, 1 to 10 times, or preferably 2 to 7 times.
- the thermal conductive sheet 1 can be obtained in this manner.
- the thickness of the obtained thermal conductive sheet 1 is, for example, 1 mm or less, or preferably 0.8 mm or less, and usually, for example, 0.05 mm or more, or preferably 0.1 mm or more.
- the proportion of the volume-based boron nitride particle content (solid content, that is, volume percentage of boron nitride particles relative to the total volume of the resin component and the boron nitride particles) is, as described above, for example, 35 vol % or more (preferably 60 vol % or more, or more preferably 75 vol % or more), and usually 95 vol % or less (preferably 90 vol % or less).
- the boron nitride particles may not be oriented in a predetermined direction in the thermal conductive sheet.
- a cured thermal conductive sheet 1 is produced by, for example, repeatedly performing the series of the steps of the above-described dividing step ( FIG. 2 ( b )), laminating step ( FIG. 2 ( c )), and hot-pressing step ( FIG. 2 ( a )) for an uncured (or semi-cured (in B-stage)) thermal conductive sheet 1 ; and then curing the uncured (or semi-cured (in B-stage)) thermal conductive sheet 1 by heat after the hot-pressing step ( FIG. 2( a )), i.e., after the final step.
- the above-described hot-press or a dryer is used.
- a dryer is used.
- the conditions for the curing by heat are as follows: a temperature of, for example, 60 to 250° C., or preferably 80 to 200° C.; and a pressure of, for example, 100 MPa or less, or preferably 50 MPa or less.
- the longitudinal direction LD of the boron nitride particle 2 is oriented along a plane (surface) direction SD that crosses (is perpendicular to) the thickness direction TD of the thermal conductive sheet 1 .
- the calculated average of the angle formed between the longitudinal direction LD of the boron nitride particle 2 and the plane direction SD of the thermal conductive sheet 1 is, for example, 25 degrees or less, or preferably 20 degrees or less, and usually 0 degree or more.
- the orientation angle ⁇ of the boron nitride particle 2 relative to the thermal conductive sheet 1 is obtained as follows: the thermal conductive sheet 1 is cut along the thickness direction with a cross section polisher (CP); the cross section thus appeared is photographed with a scanning electron microscope (SEM) at a magnification that enables observation of 200 or more boron nitride particles 2 in the field of view; a tilt angle ⁇ between the longitudinal direction LD of the boron nitride particle 2 and the plane direction SD (direction perpendicular to the thickness direction TD) of the thermal conductive sheet 1 is obtained from the obtained SEM photograph; and the average value of the tilt angles ⁇ is calculated.
- SEM scanning electron microscope
- the thermal conductivity in the plane direction SD of the thermal conductive sheet 1 is 4 W/m ⁇ K or more, preferably 5 W/m ⁇ K or more, more preferably 10 W/m ⁇ K or more, even more preferably 15 W/m ⁇ K or more, or particularly preferably 25 W/m ⁇ K or more, and usually 200 W/m ⁇ K or less.
- the thermal conductivity in the plane direction SD of the thermal conductive sheet 1 is substantially the same before and after the curing by heat when the resin component 3 is the thermosetting resin component.
- thermal conductivity in the plane direction SD of the thermal conductive sheet 1 is below the above-described range, thermal conductivity in the plane direction SD is insufficient, and therefore there is a case where the thermal conductive sheet 1 cannot be used for heat dissipation that requires thermal conductivity in such a plane direction SD.
- the thermal conductivity in the plane direction SD of the thermal conductive sheet 1 is measured by a pulse heating method.
- the xenonflash analyzer “LFA-447” manufactured by Erich NETZSCH GmbH & Co. Holding KG is used.
- the thermal conductivity in the thickness direction TD of the thermal conductive sheet 1 is, for example, 0.5 to 15 W/m ⁇ K, or preferably 1 to 10 W/m ⁇ K.
- the thermal conductivity in the thickness direction TD of the thermal conductive sheet 1 is measured by a pulse heating method, a laser flash method, or a TWA method.
- a pulse heating method the above-described device is used
- the laser flash method “TC-9000” (manufactured by Ulvac, Inc.) is used
- the TWA method “ai-Phase mobile” (manufactured by ai-Phase Co., Ltd) is used.
- the ratio of the thermal conductivity in the plane direction SD of the thermal conductive sheet 1 relative to the thermal conductivity in the thickness direction TD of the thermal conductive sheet 1 is, for example, 1.5 or more, preferably 3 or more, or more preferably 4 or more, and usually 20 or less.
- pores are formed in the thermal conductive sheet 1 .
- the proportion of the pores in the thermal conductive sheet 1 can be adjusted by setting the proportion of the boron nitride particle 2 content (volume-based), and further setting the temperature, the pressure, and/or the duration at the time of hot pressing the mixture of the boron nitride particle 2 and the resin component 3 ( FIG. 2( a )).
- the porosity P can be adjusted by setting the temperature, the pressure, and/or the duration of the hot pressing ( FIG. 2( a )) within the above-described range.
- the porosity P of the thermal conductive sheet 1 is, for example, 30 vol % or less, or preferably 10 vol % or less.
- the porosity P is measured by, for example, as follows: the thermal conductive sheet 1 is cut along the thickness direction with a cross section polisher (CP); the cross section thus appeared is observed with a scanning electron microscope (SEM) at a magnification of 200 to obtain an image; the obtained image is binarized based on the pore portion and the non-pore portion; and the area ratio, i.e., the ratio of the pore portion area to the total area of the cross section of the thermal conductive sheet 1 is determined by calculation.
- CP cross section polisher
- SEM scanning electron microscope
- the thermal conductive sheet 1 has a porosity P 2 after curing of, relative to a porosity P 1 before curing, for example, 100% or less, or preferably 50% or less.
- the thermal conductive sheet 1 before curing by heat is used.
- the conformability to irregularities (described later) of the thermal conductive sheet 1 can be improved.
- the thermal conductive sheet 1 has a 5% weight loss temperature of 250° C. or more, preferably 300° C. or more, and usually 450° C. or less.
- the 5% weight loss temperature is equal to or more than the above-described lower limit, decomposition can be suppressed even when exposed to high temperature, and heat generated from various devices can be conducted efficiently.
- the 5% weight loss temperature can be measured by thermogravimetric analysis (temperature rising speed 10° C./min, under nitrogen atmosphere) in conformity with JIS K 7120.
- Test Device Type I
- Thickness of the thermal conductive sheet 1 0.3 mm
- FIGS. 3 and 4 show perspective views of the Type I test device. In the following, the Type I test device is described.
- a Type I test device 10 includes a first flat plate 11 ; a second flat plate 12 disposed in parallel with the first flat plate 11 ; and a mandrel (rotation axis) 13 provided for allowing the first flat plate 11 and the second flat plate 12 to rotate relatively.
- the first flat plate 11 is formed into a generally rectangular flat plate.
- a stopper 14 is provided at one end portion (free end portion) of the first flat plate 11 .
- the stopper 14 is formed on the surface of the second flat plate 12 so as to extend along the one end portion of the second flat plate 12 .
- the second flat plate 12 is formed into a generally rectangular flat plate, and one side thereof is disposed so as to be adjacent to one side (the other end portion (proximal end portion) that is opposite to the one end portion where the stopper 14 is provided) of the first flat plate 11 .
- the mandrel 13 is formed so as to extend along one side of the first flat plate 11 and one side of the second flat plate 12 that are adjacent to each other.
- the surface of the first flat plate 11 is flush with the surface of the second flat plate 12 before the start of the bend test.
- the thermal conductive sheet 1 is placed on the surface of the first flat plate 11 and the surface of the second flat plate 12 .
- the thermal conductive sheet 1 is placed so that one side of the thermal conductive sheet 1 is in contact with the stopper 14 .
- the first flat plate 11 and the second flat plate 12 are rotated relatively.
- the free end portion of the first flat plate 11 and the free end portion of the second flat plate 12 are rotated to a predetermined angle with the mandrel 13 as the center.
- the first flat plate 11 and the second flat plate 12 are rotated so as to bring the surface of the free end portions thereof closer (oppose each other).
- the thermal conductive sheet 1 is bent with the mandrel 13 as the center, conforming to the rotation of the first flat plate 11 and the second flat plate 12 .
- thermosetting resin component When the resin component 3 is the thermosetting resin component, a semi-cured (in B-stage) thermal conductive sheet 1 (that is, the thermal conductive sheet 1 before curing by heat) is tested in the bend test.
- the thermal conductive sheet 1 has a water absorption of 3 vol % or less, or preferably 2 vol % or less.
- the water absorption can be measured by the following procedures.
- the sample is dried at 120° C. for 3 hours in a vacuum dryer, and after cooling in a desiccator, the dry mass was measured and named M 1 .
- the sample was immersed in distilled water at room temperature for 24 hours and then taken out. The surface of the sample was wiped off with filter paper, and quickly weighed and named M 2 . Then, the water absorption is calculated using the formula below with the density of the thermal conductive sheet 1 as d.
- the density d can be obtained by measuring the volume and the mass.
- Test piece size 20 mm ⁇ 15 mm
- Evaluation method Presence or absence of fracture such as cracks at the center of the test piece is observed visually when tested under the above-described test conditions.
- the thermal conductive sheet 1 before curing by heat is used.
- the thermal conductive sheet 1 is excellent in conformability to irregularities because no fracture is observed in the above-described 3-point bending test.
- the conformability to irregularities is, when the thermal conductive sheet 1 is provided on an object with irregularities, a property of the thermal conductive sheet 1 that conforms to be in close contact with the irregularities.
- a mark such as, for example, letters and symbols can be given to the thermal conductive sheet 1 . That is, the thermal conductive sheet 1 is excellent in mark adhesion.
- the mark adhesion is a property of the thermal conductive sheet 1 that allows reliable adhesion of the above-described mark thereon.
- the mark can be adhered (applied, fixed, or firmly fixed) to the thermal conductive sheet 1 , to be specific, by printing, engraving, or the like.
- printing examples include, for example, inkjet printing, relief printing, intaglio printing, and laser printing.
- an ink fixing layer for improving mark's fixed state can be provided on the surface (printing side) of the thermal conductive sheet 1 .
- a toner fixing layer for improving mark's fixed state can be provided on the surface (printing side) of the thermal conductive sheet 1 .
- Examples of engraving include laser engraving and punching.
- the thermal conductive sheet 1 is excellent in flexibility and thermal conductivity in a plane direction SD, and also excellent in heat resistance.
- the thermal conductive sheet 1 can be used for various heat dissipation applications, for example, as a thermal conductive sheet that allows suppression of decomposition even if exposed to a high temperature of 200° C. or more, that is excellent in handleability, and that is excellent in thermal conductivity in the plane direction SD.
- the thermal conductive sheet 1 can be used as a thermal conductive sheet that is applied in power electronics technology generating a high temperature of 200 to 250° C.
- the thermal conductive sheet 1 can be used as a thermal conductive sheet used for SiC chips, LED heat dissipation substrates, or heat dissipation materials for batteries.
- a plurality of calendering rolls and the like can also be used for rolling the mixture and the laminated sheet 1 C.
- the thermal conductive sheet can also be obtained as the uncured thermal conductive sheet 1 .
- the thermal conductive sheet of the present invention when the resin component is the thermosetting resin component, there is no particular limitation as to whether or not curing by heat is carried out or when curing by heat is carried out.
- the curing by heat can be performed after the laminating step ( FIG. 2 ( c )) as described above, or can be performed after the elapse of a predetermined period from the above-described hot-pressing step ( FIG. 2 ( a ), hot-pressing of the mixture but the hot-pressing does not allow curing by heat).
- the curing by heat can be performed at the time when the sheet is applied in power electronics technology, or after the elapse of a predetermined period after such application.
- PT-110 (trade name, plate-like boron nitride particles, average particle size (light scattering method) 45 ⁇ m, manufactured by Momentive Performance Materials Inc.)
- 1 g of jER®828 (trade name, bisphenol A epoxy resin, liquid, epoxy equivalent 184 to 194 g/eqiv., softening temperature (ring and ball method) below 25° C., melt viscosity (80° C.) 70 mPa ⁇ s, manufactured by Japan Epoxy Resins Co., Ltd.)
- EPPN-501HY (trade name, triphenylmethane epoxy resin, solid, epoxy equivalent 163 to 175 g/eqiv., softening temperature (ring and ball method) 57 to 63° C., manufactured by NIPPON KAYAKU Co., Ltd), and 3 g (solid content 0.15 g) (5 mass % per total amount of epoxy resins of jER®828 and EPPN-501
- the volume percentage (vol %) of the boron nitride particles relative to the total volume of the solid content excluding the curing agent was 70 vol %.
- the obtained thermal conductive sheet was introduced into a dryer, and heated at 150° C. for 120 minutes so as to be cured by heat.
- Thermal conductive sheets were obtained in the same manner as in Example 1 in conformity with the mixing formulation and production conditions shown in Table 1 to Table 3.
- a mixture was prepared by blending and stirring components (boron nitride particles and polyethylene) in accordance with the mixing formulation of Table 2. That is, during the stirring of the components, the mixture was heated to 130° C., and polyethylene was melted.
- the thermal conductivity of the thermal conductive sheets obtained in Examples 1 to 16 was measured.
- the thermal conductivity in the plane direction (SD) was measured by a pulse heating method using a xenon flash analyzer “LFA-447” (manufactured by Erich NETZSCH GmbH & Co. Holding KG).
- thermogravimetric analysis temperature-rising speed of 10° C./min, under nitrogen atmosphere
- thermogravimetric analysis apparatus in conformity with JIS K 7120 (2010).
- the density of the thermal conductive sheets is shown in Tables 1 to 3.
- the thermal conductive sheet 1 was processed to give a size of 50 ⁇ 50 mm, and this was used as a sample.
- the sample was dried at 120° C. for 3 hours in a vacuum dryer, and after cooling in a desiccator, the dry mass was measured and named M 1 .
- the sample was immersed in distilled water at room temperature for 24 hours and then taken out.
- the surface of the sample was wiped off with filter paper, and quickly weighed and named M 2 .
- the water absorption was calculated using the formula below.
- the porosity (P 1 ) of the thermal conductive sheets before curing by heat in Examples 1 to 16 was measured by the following method.
- the thermal conductive sheet was cut along the thickness direction with a cross section polisher (CP); and the cross section thus appeared was observed with a scanning electron microscope (SEM) at a magnification of 200.
- SEM scanning electron microscope
- the obtained image was binarized based on the pore portion and the non-pore portion; and the area ratio, i.e., the ratio of the pore portion area to the total area of the cross section of the thermal conductive sheet was calculated.
- Test Piece size 20 mm ⁇ 15 mm
- values on the top represent the Blended Weight (g) of the boron nitride particles; values in the middle represent the volume percentage (vol %) of the boron nitride particles relative to the total volume of the solid content excluding the curing agent in the thermal conductive sheet (that is, solid content of the boron nitride particles, and epoxy resin or polyethylene); and values at the bottom represent the volume percentage (vol %) of the boron nitride particles relative to the total volume of the solid content in the thermal conductive sheet (that is, solid content of boron nitride particles, epoxy resin, and curing agent).
- PT-110* 1 trade name, plate-like boron nitride particles, average particle size (light scattering method) 45 ⁇ m, manufactured by Momentive Performance Materials Inc.
- UHP-1* 2 trade name: SHOBN®UHP-1, plate-like boron nitride particles, average particle size (light scattering method) 9 ⁇ m, manufactured by Showa Denko K.K.
- Epoxy Resin A* 3 OGSOL EG (trade name), bisarylfluorene epoxy resin, semi-solid, epoxy equivalent 294 g/eqiv., softening temperature (ring and ball test) 47° C., melt viscosity (80° C.) 1360 mPa ⁇ s, manufactured by Osaka Gas Chemicals Co., Ltd.
- Epoxy Resin B* 4 jER® 828 (trade name), bisphenol A epoxy resin, liquid, epoxy equivalent 184 to 194 g/eqiv., softening temperature (ring and ball test) below 25° C., melt viscosity (80° C.) 70 mPa ⁇ s, manufactured by Japan Epoxy Resins Co., Ltd.
- Epoxy Resin C* 5 jER® 1002 (trade name), bisphenol A epoxy resin, solid, epoxy equivalent 600 to 700 g/eqiv., softening temperature (ring and ball test) 78° C., melt viscosity (80° C.) 10000 mPa ⁇ s or more (measurement limit or more), manufactured by Japan Epoxy Resins Co., Ltd.
- Epoxy Resin D* 6 EPPN-501HY (trade name), triphenylmethane epoxy resin, solid, epoxy equivalent 163 to 175 g/eqiv., softening temperature (ring and ball test) 57 to 63° C., manufactured by NIPPON KAYAKU Co., Ltd.
- Curing Agent* 7 a solution of 5 mass % Curezol® 2PZ (trade name, manufactured by Shikoku Chemicals Corporation) in methyl ethyl ketone.
- Curing Agent* 8 a dispersion of 5 mass % Curezol® 2P4 MHZ-PW (trade name, manufactured by Shikoku Chemicals Corporation) in methyl ethyl ketone.
- Polyethylene* 9 low density polyethylene, weight average molecular weight (Mw) 4000, number average molecular weight (Mn) 1700, manufactured by Sigma-Aldrich Co.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Fluid Mechanics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Laminated Bodies (AREA)
Abstract
A thermal conductive sheet includes a plate-like boron nitride particle. The thermal conductive sheet has a thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet of 4 W/m·K or more, and the 5% weight loss temperature of 250° C. or more. The thermal conductive sheet has a water absorption of 3 vol % or less.
Description
- The present application claims priority from Japanese Patent Applications No. 2010-018256 filed on Jan. 29, 2010; No. 2010-090908 filed on Apr. 9, 2010; No. 2010-161849 filed on Jul. 16, 2010; and No. 2010-161852 filed on Jul. 16, 2010, the contents of which are hereby incorporated by reference into this application.
- 1. Field of the Invention
- The present invention relates to a thermal conductive sheet, to be specific, to a thermal conductive sheet for use in power electronics technology.
- 2. Description of Related Art
- In recent years, power electronics technology which uses semiconductor elements to convert and control electric power is applied in hybrid devices, high-brightness LED devices, and electromagnetic induction heating devices. In power electronics technology, a high current is converted to, for example, heat, and therefore materials that are disposed near the semiconductor element are required to have excellent heat dissipation characteristics (excellent heat conductivity).
- For example, Japanese Unexamined Patent Publication No. 2008-280496 has proposed a thermal conductive sheet containing a plate-like boron nitride powder and an acrylic ester copolymer resin.
- In the thermal conductive sheet of Japanese Unexamined Patent Publication No. 2008-280496, the boron nitride powder is oriented so as to orient its major axis direction (direction perpendicular to the plate thickness of the boron nitride powder) in the thickness direction of the sheet, and thermal conductivity in the thickness direction of the thermal conductive sheet is improved in this way.
- However, there are cases where the thermal conductive sheet is required to have a high thermal conductivity in a direction (plane direction) perpendicular to the thickness direction depending on its use and purpose. In such a case, the thermal conductive sheet of Japanese Unexamined Patent Publication No. 2008-280496 is disadvantageous in that the major axis direction of the boron nitride powder is perpendicular to (crossing) the plane direction, and therefore the thermal conductivity in the plane direction is insufficient.
- Furthermore, such a thermal conductive sheet is used for conducting (dissipating) heat generated from, for example, various devises, and therefore excellent heat resistance is required so that the thermal conductive sheet is not decomposed by the heat.
- Such a thermal conductive sheet is mounted, for example, on electronic components, and the electronic components are sometimes exposed to high temperature, for example, in soldering such as reflow soldering of the electronic components. Therefore, water absorbency of the thermal conductive sheet is required to be suppressed so as to avoid damages from the heat causing rapid vaporization of the moisture contained in the thermal conductive sheet.
- An object of the present invention is to provide a thermal conductive sheet that is excellent in thermal conductivity in a plane direction, and also excellent in heat resistance.
- Another object of the present invention is to provide a thermal conductive sheet that is excellent in thermal conductivity in a plane direction, and can also achieve a low water absorbency.
- A thermal conductive sheet of the present invention contains a plate-like boron nitride particle, wherein the thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet is 4 W/m·K or more, and the 5% weight loss temperature is 250° C. or more.
- The thermal conductive sheet of the present invention is excellent in thermal conductivity in a direction (plane direction) perpendicular to the thickness direction, and also excellent in heat resistance.
- Therefore, the thermal conductive sheet of the present invention can be applied in various heat dissipation uses as a thermal conductive sheet in which decomposition is suppressed even under exposure to high temperature, that is excellent in handleability, and excellent in thermal conductivity in a plane direction.
- A thermal conductive sheet of the present invention contains a plate-like boron nitride particle, wherein the thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet is 4 W/m·K or more, and the water absorption is 3 vol % or less.
- In the thermal conductive sheet of the present invention, thermal conductivity in a direction (plane direction) perpendicular to the thickness direction is excellent, and furthermore, water absorbency is suppressed.
- Therefore, the thermal conductive sheet of the present invention can be applied in various heat dissipation uses as a thermal conductive sheet in which damage when exposed to high temperature can be suppressed, that is excellent in handleability, and excellent in thermal conductivity in a plane direction.
-
FIG. 1 shows a perspective view of an embodiment of a thermal conductive sheet of the present invention. -
FIG. 2 shows process drawings for describing a method for producing the thermal conductive sheet shown inFIG. 1 : - (a) illustrating a step of hot pressing a mixture or a laminated sheet,
- (b) illustrating a step of dividing the pressed sheet into a plurality of pieces, and
- (c) illustrating a step of laminating the divided sheets.
-
FIG. 3 shows a perspective view of a test device (Type I, before bend test) of a bend test. -
FIG. 4 shows a perspective view of a test device (Type I, during bend test) of a bend test. - A thermal conductive sheet of the present invention contains boron nitride particles.
- To be specific, the thermal conductive sheet contains boron nitride (BN) particles as an essential component, and further contains, for example, a resin component.
- The boron nitride particles are formed into a plate-like (or flake-like) shape, and are dispersed so as to be orientated in a predetermined direction (described later) in the thermal conductive sheet.
- The boron nitride particles have an average length in the longitudinal direction (maximum length in the direction perpendicular to the plate thickness direction) of, for example, 1 to 100 μm, or preferably 3 to 90 μm. The boron nitride particles have an average length in the longitudinal direction of, 5 μm or more, preferably 10 μm or more, more preferably 20 μm or more, even more preferably 30 μm or more, or most preferably 40 μm or more, and usually has an average length in the longitudinal direction of, for example, 100 μm or less, or preferably 90 μm or less.
- The average thickness (the length in the thickness direction of the plate, that is, the length in the short-side direction of the particles) of the boron nitride particles is, for example, 0.01 to 20 μm, or preferably 0.1 to 15 μm.
- The aspect ratio (length in the longitudinal direction/thickness) of the boron nitride particles is, for example, 2 to 10000, or preferably 10 to 5000.
- The average particle size of the boron nitride particles as measured by a light scattering method is, for example, 5 μm or more, preferably 10 μm or more, more preferably 20 μm or more, particularly preferably 30 μm or more, or most preferably 40 μm or more, and usually is 100 μm or less.
- The average particle size as measured by the light scattering method is a volume average particle size measured with a dynamic light scattering type particle size distribution analyzer.
- When the average particle size of the boron nitride particles as measured by the light scattering method is below the above-described range, the thermal conductive sheet may become fragile, and handleability may be reduced.
- The bulk density (JIS K 5101, apparent density) of the boron nitride particles is, for example, 0.3 to 1.5 g/cm3, or preferably 0.5 to 1.0 g/cm3.
- As the boron nitride particles, a commercially available product or processed goods thereof can be used. Examples of commercially available products of the boron nitride particles include the “PT” series (for example, “PT-110”) manufactured by Momentive Performance Materials Inc., and the “SHOBN®UHP” series (for example, “SHOBN®UHP-1”) manufactured by Showa Denko K.K.
- The resin component is a component that is capable of dispersing the boron nitride particles, i.e., a dispersion medium (matrix) in which the boron nitride particles are dispersed, including, for example, resin components such as a thermosetting resin component and a thermoplastic resin component.
- Examples of the thermosetting resin component include epoxy resin, thermosetting polyimide, phenol resin, urea resin, melamine resin, unsaturated polyester resin, diallyl phthalate resin, silicone resin, and thermosetting urethane resin.
- Examples of the thermoplastic resin component include polyolefin (for example, polyethylene, polypropylene, and ethylene-propylene copolymer), acrylic resin (for example, polymethyl methacrylate), polyvinyl acetate, ethylene-vinyl acetate copolymer, polyvinyl chloride, polystyrene, polyacrylonitrile, polyamide (Nylon®), polycarbonate, polyacetal, polyethylene terephthalate, polyphenylene oxide, polyphenylene sulfide, polysulfone, polyether sulfone, poly ether ether ketone (PEEK), polyallyl sulfone, thermoplastic polyimide, thermoplastic urethane resin, polyamino-bismaleimide, polyamide-imide, polyether-imide, bismaleimide-triazine resin, polymethylpentene, fluorine resin, liquid crystal polymer, olefin-vinyl alcohol copolymer, ionomer, polyarylate, acrylonitrile-ethylene-styrene copolymer, acrylonitrile-butadiene-styrene copolymer, and acrylonitrile-styrene copolymer.
- These resin components can be used alone or in combination of two or more.
- Of the thermosetting resin components, preferably, the epoxy resin is used.
- The epoxy resin is in a state of liquid, semi-solid, or solid under normal temperature.
- To be specific, examples of the epoxy resin include aromatic epoxy resins such as bisphenol epoxy resin (e.g., bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, hydrogenated bisphenol A epoxy resin, dimer acid-modified bisphenol epoxy resin, and the like), novolak epoxy resin (e.g., phenol novolak epoxy resin, cresol novolak epoxy resin, biphenyl epoxy resin, and the like), naphthalene epoxy resin, fluorene epoxy resin (e.g., bisaryl fluorene epoxy resin and the like), and triphenylmethane epoxy resin (e.g., trishydroxyphenylmethane epoxy resin and the like); nitrogen-containing-cyclic epoxy resins such as triepoxypropyl isocyanurate (triglycidyl isocyanurate) and hydantoin epoxy resin; aliphatic epoxy resin; alicyclic epoxy resin (e.g., dicyclo ring-type epoxy resin and the like); glycidylether epoxy resin; and glycidylamine epoxy resin.
- These epoxy resins can be used alone or in combination of two or more.
- The epoxy resin has an epoxy equivalent of, for example, 100 to 1000 g/eqiv., or preferably 180 to 700 g/eqiv., and has a softening temperature (ring and ball test) of, for example, 80° C. or less (to be specific, 20 to 80° C.), or preferably 70° C. or less (to be specific, 35 to 70° C.).
- The epoxy resin has a melt viscosity at 80° C. of, for example, 10 to 20,000 mPa·s, or preferably 50 to 10,000 mPa·s. When two or more epoxy resins are used in combination, the melt viscosity of the mixture of these epoxy resins is set within the above-described range.
- Furthermore, when two or more epoxy resins are used in combination, for example, a combination of liquid epoxy resin and solid epoxy resin, or more preferably, a combination of a liquid aromatic epoxy resin and a solid aromatic epoxy resin is used. Examples of such a combination include, to be more specific, a combination of a liquid bisphenol epoxy resin and a solid triphenylmethane epoxy resin, and a combination of a liquid bisphenol epoxy resin and a solid bisphenol epoxy resin.
- Preferably, a semi-solid epoxy resin is used alone, or more preferably, a semi-solid aromatic epoxy resin is used alone. Examples of those epoxy resins include, in particular, a semi-solid fluorene epoxy resin.
- A combination of a liquid epoxy resin and a solid epoxy resin, or a semi-solid epoxy resin can improve conformability to irregularities (described later) of the thermal conductive sheet.
- Furthermore, when two or more epoxy resins are used in combination, a first epoxy resin having a softening temperature of, for example, below 45° C., or preferably 35° C. or less, and a second epoxy resin having a softening temperature of, for example, 45° C. or more, or preferably 55° C. or more are used in combination. In this way, the kinetic viscosity (in conformity with JIS K 7233, described later) of the resin component (mixture) can be set to a desired range, and also, conformability to irregularities of the thermal conductive sheet can be improved.
- The epoxy resin can also be prepared as an epoxy resin composition containing, for example, an epoxy resin, a curing agent, and a curing accelerator.
- The curing agent is a latent curing agent (epoxy resin curing agent) that can cure the epoxy resin by heating, and examples thereof include an imidazole compound, an amine compound, an acid anhydride compound, an amide compound, a hydrazide compound, and an imidazoline compound. In addition to the above-described compounds, a phenol compound, a urea compound, and a polysulfide compound can also be used.
- Examples of the imidazole compound include 2-phenyl imidazole, 2-methyl imidazole, 2-ethyl-4-methyl imidazole, and 2-phenyl-4-methyl-5-hydroxymethyl imidazole.
- Examples of the amine compound include aliphatic polyamines such as ethylene diamine, propylene diamine, diethylene triamine, and triethylene tetramine; and aromatic polyamines such as metha phenylenediamine, diaminodiphenyl methane, and diaminodiphenyl sulfone.
- Examples of the acid anhydride compound include phthalic anhydride, maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, methyl nadic anhydride, pyromelletic anhydride, dodecenylsuccinic anhydride, dichloro succinic anhydride, benzophenone tetracarboxylic anhydride, and chlorendic anhydride.
- Examples of the amide compound include dicyandiamide and polyamide.
- An example of the hydrazide compound includes adipic acid dihydrazide.
- Examples of the imidazoline compound include methylimidazoline, 2-ethyl-4-methylimidazoline, ethylimidazoline, isopropylimidazoline, 2,4-dimethylimidazoline, phenylimidazoline, undecylimidazoline, heptadecylimidazoline, and 2-phenyl-4-methylimidazoline.
- These curing agents can be used alone or in combination of two or more.
- A preferable example of the curing agent is an imidazole compound.
- Examples of the curing accelerator include tertiary amine compounds such as triethylenediamine and tri-2,4,6-dimethylaminomethylphenol; phosphorus compounds such as triphenylphosphine, tetraphenylphosphoniumtetraphenylborate, and tetra-n-butylphosphonium-o,o-diethylphosphorodithioate; a quaternary ammonium salt compound; an organic metal salt compound; and derivatives thereof. These curing accelerators can be used alone or in combination of two or more.
- In the epoxy resin composition, the mixing ratio of the curing agent is, for example, 0.5 to 50 parts by mass, or preferably 1 to 10 parts by mass per 100 parts by mass of the epoxy resin, and the mixing ratio of the curing accelerator is, for example, 0.1 to 10 parts by mass, or preferably 0.2 to 5 parts by mass per 100 parts by mass of the epoxy resin.
- The above-described curing agent, and/or the curing accelerator can be prepared and used, as necessary, as a solution, i.e., the curing agent and/or the curing accelerator dissolved in a solvent; and/or as a dispersion liquid, i.e., the curing agent and/or the curing accelerator dispersed in a solvent.
- Examples of the solvent include organic solvents including ketones such as acetone and methyl ethyl ketone, ester such as ethyl acetate, and amide such as N,N-dimethylformamide. Examples of the solvent also include aqueous solvents including water, and alcohols such as methanol, ethanol, propanol, and isopropanol. A preferable example of the solvent is an organic solvent, and more preferable examples are ketones and amides.
- Of the thermoplastic resin component, preferably, polyolefin is used.
- Preferable examples of polyolefin are polyethylene and ethylene-propylene copolymer.
- Examples of polyethylene include a low density polyethylene and a high density polyethylene.
- Examples of ethylene-propylene copolymer include a random copolymer, a block copolymer, or a graft copolymer of ethylene and propylene.
- These polyolefins can be used alone or in combination of two or more.
- The polyolefins have a weight average molecular weight and/or a number average molecular weight of, for example, 1000 to 10000.
- The polyolefin can be used alone, or can be used in combination.
- The resin component has a kinetic viscosity as measured in conformity with the kinetic viscosity test of JIS K 7233 (bubble viscometer method) (temperature: 25° C.±0.5° C., solvent: butyl carbitol, resin component (solid content) concentration: 40 mass %) of, for example, 0.22×10−4 to 2.00×10−4 m2/s, preferably 0.3×10−4 to 1.9×10−4 m2/s, or more preferably 0.4×10−4 to 1.8×10−4 m2/s. The above-described kinetic viscosity can also be set to, for example, 0.22×10−4 to 1.00×10−4 m2/s, preferably 0.3×10−4 to 0.9×10−4 m2/s, or more preferably 0.4×10−4 to 0.8×10−4 m2/s.
- When the kinetic viscosity of the resin component exceeds the above-described range, excellent flexibility and conformability to irregularities (described later) may not be given to the thermal conductive sheet. On the other hand, when the kinetic viscosity of the resin component is below the above-described range, boron nitride particles may not be oriented in a predetermined direction.
- In the kinetic viscosity test in conformity with JIS K 7233 (bubble viscometer method), the kinetic viscosity of the resin component is measured by comparing the bubble rising speed of a resin component sample with the bubble rising speed of criterion samples (having a known kinetic viscosity), and determining the kinetic viscosity of the criterion sample having a matching rising speed to be the kinetic viscosity of the resin component.
- In the thermal conductive sheet, the proportion of the volume-based boron nitride particle content (solid content, that is, the volume percentage of boron nitride particles relative to a total volume of the resin component and the boron nitride particles) is, for example, 35 vol % or more, preferably 60 vol % or more, or more preferably 75 vol % or more, and usually, for example, 95 vol % or less, or preferably 90 vol % or less.
- When the proportion of the volume-based boron nitride particle content is below the above-described range, the boron nitride particles may not be oriented in a predetermined direction in the thermal conductive sheet. On the other hand, when the proportion of the volume-based boron nitride particle content exceeds the above-described range, the thermal conductive sheet may become fragile, and handleability and conformability to irregularities may be reduced.
- The mass-based mixing ratio of the boron nitride particles relative to 100 parts by mass of the total amount (total solid content) of the components (boron nitride particles and resin component) forming the thermal conductive sheet is, for example, 40 to 95 parts by mass, or preferably 65 to 90 parts by mass, and the mass-based mixing ratio of the resin component relative to 100 parts by mass of the total amount of the components forming the thermal conductive sheet is, for example, 5 to 60 parts by mass, or preferably 10 to 35 parts by mass. The mass-based mixing ratio of the boron nitride particles relative to 100 parts by mass of the resin component is, for example, 60 to 1900 parts by mass, or preferably 185 to 900 parts by mass.
- When two epoxy resins (a first epoxy resin and a second epoxy resin) are used in combination, the mass ratio (mass of the first epoxy resin/mass of the second epoxy resin) of the first epoxy resin relative to the second epoxy resin can be set appropriately in accordance with the softening temperature and the like of the epoxy resins (the first epoxy resin and the second epoxy resin). For example, the mass ratio of the first epoxy resin relative to the second epoxy resin is 1/99 to 99/1, or preferably 10/90 to 90/10.
- In the resin component, in addition to the above-described components (polymer), for example, a polymer precursor (for example, a low molecular weight polymer including oligomer), and/or a monomer are contained.
-
FIG. 1 shows a perspective view of an embodiment of a thermal conductive sheet of the present invention, andFIG. 2 shows process drawings for describing a method for producing the thermal conductive sheet shown inFIG. 1 . - Next, a method for producing a thermal conductive sheet as an embodiment of the present invention is described with reference to
FIG. 1 andFIG. 2 . - In this method, first, the above-described components are blended at the above-described mixing ratio and are stirred and mixed, thereby preparing a mixture.
- In the stirring and mixing, in order to mix the components efficiently, for example, the solvent can be blended therein with the above-described components, or, for example, the resin component (preferably, the thermoplastic resin component) can be melted by heating.
- Examples of the solvent include the above-described organic solvents. When the above-described curing agent and/or the curing accelerator are prepared as a solvent solution and/or a solvent dispersion liquid, the solvent of the solvent solution and/or the solvent dispersion liquid can also serve as a mixing solvent for the stirring and mixing without adding a solvent during the stirring and mixing. Alternatively, in the stirring and mixing, a solvent can be further added as a mixing solvent.
- In the case when the stirring and mixing is performed using a solvent, the solvent is removed after the stirring and mixing.
- To remove the solvent, for example, the mixture is allowed to stand at room temperature for 1 to 48 hours; heated at 40 to 100° C. for 0.5 to 3 hours; or heated under a reduced pressure atmosphere of, for example, 0.001 to 50 kPa, at 20 to 60° C., for 0.5 to 3 hours.
- When the resin component (preferably, a thermoplastic resin component) is to be melted by heating, the heating temperature is, for example, a temperature in the neighborhood of or exceeding the softening temperature of the resin component, to be specific, 40 to 150° C., or preferably 70 to 140° C.
- Next, in this method, the obtained mixture is hot-pressed.
- To be specific, as shown in
FIG. 2 (a), as necessary, for example, the mixture is hot-pressed with two releasingfilms 4 sandwiching the mixture, thereby producing a pressed sheet 1A. Conditions for the hot-pressing are as follows: a temperature of, for example, 50 to 150° C., or preferably 60 to 140° C.; a pressure of, for example, 1 to 100 MPa, or preferably 5 to 50 MPa; and a duration of, for example, 0.1 to 100 minutes, or preferably 1 to 30 minutes. - More preferably, the mixture is hot-pressed under vacuum. The degree of vacuum in the vacuum hot-pressing is, for example, 1 to 100 Pa, or preferably 5 to 50 Pa, and the temperature, the pressure, and the duration are the same as those described above for the hot-pressing.
- When the temperature, the pressure, and/or the duration in the hot-pressing is outside the above-described range, there is a case where a porosity P (described later) of the thermal
conductive sheet 1 cannot be adjusted to a desired value. - The pressed sheet 1A obtained by the hot-pressing has a thickness of, for example, 50 to 1000 μm, or preferably 100 to 800 μm.
- Next, in this method, as shown in
FIG. 2 (b), the pressed sheet 1A is divided into a plurality of pieces (for example, four pieces), thereby producing a divided sheet 1B (dividing step). In the division of the pressed sheet 1A, the pressed sheet 1A is cut along the thickness direction so that the pressed sheet 1A is divided into a plurality of pieces when the pressed sheet 1A is projected in the thickness direction. The pressed sheet 1A is cut so that the respective divided sheets 1B have the same shape when the divided sheets 1B are projected in the thickness direction. - Next, in this method, as shown in
FIG. 2( c), the respective divided sheets 1B are laminated in the thickness direction, thereby producing alaminated sheet 1C (laminating step). - Thereafter, in this method, as shown in
FIG. 2( a), thelaminated sheet 1C is hot-pressed (preferably hot-pressed under vacuum) (hot-pressing step). The conditions for the hot-pressing are the same as the conditions for the above-described hot-pressing of the mixture. - The thickness of the hot-pressed
laminated sheet 1C is, for example, 1 mm or less, or preferably 0.8 mm or less, and usually is, for example, 0.05 mm or more, or preferably 0.1 mm or more. - Thereafter, the series of the steps of the above-described dividing step (
FIG. 2 (b)), laminating step (FIG. 2 (c)), and hot-pressing step (FIG. 2 (a)) are performed repeatedly, so as to allowboron nitride particles 2 to be efficiently oriented in a predetermined direction in theresin component 3 in the thermalconductive sheet 1. The number of the repetition is not particularly limited, and can be set appropriately according to the charging state of the boron nitride particles. The number of the repetition is, for example, 1 to 10 times, or preferably 2 to 7 times. - The thermal
conductive sheet 1 can be obtained in this manner. - The thickness of the obtained thermal
conductive sheet 1 is, for example, 1 mm or less, or preferably 0.8 mm or less, and usually, for example, 0.05 mm or more, or preferably 0.1 mm or more. - In the thermal
conductive sheet 1, the proportion of the volume-based boron nitride particle content (solid content, that is, volume percentage of boron nitride particles relative to the total volume of the resin component and the boron nitride particles) is, as described above, for example, 35 vol % or more (preferably 60 vol % or more, or more preferably 75 vol % or more), and usually 95 vol % or less (preferably 90 vol % or less). - When the proportion of the boron nitride particle content is below the above-described range, the boron nitride particles may not be oriented in a predetermined direction in the thermal conductive sheet.
- When the
resin component 3 is the thermosetting resin component, a cured thermalconductive sheet 1 is produced by, for example, repeatedly performing the series of the steps of the above-described dividing step (FIG. 2 (b)), laminating step (FIG. 2 (c)), and hot-pressing step (FIG. 2 (a)) for an uncured (or semi-cured (in B-stage)) thermalconductive sheet 1; and then curing the uncured (or semi-cured (in B-stage)) thermalconductive sheet 1 by heat after the hot-pressing step (FIG. 2( a)), i.e., after the final step. - To cure the thermal
conductive sheet 1 by heat, the above-described hot-press or a dryer is used. Preferably, a dryer is used. The conditions for the curing by heat are as follows: a temperature of, for example, 60 to 250° C., or preferably 80 to 200° C.; and a pressure of, for example, 100 MPa or less, or preferably 50 MPa or less. - In the thus obtained thermal
conductive sheet 1, as shown inFIG. 1 and its partially enlarged schematic view, the longitudinal direction LD of theboron nitride particle 2 is oriented along a plane (surface) direction SD that crosses (is perpendicular to) the thickness direction TD of the thermalconductive sheet 1. - The calculated average of the angle formed between the longitudinal direction LD of the
boron nitride particle 2 and the plane direction SD of the thermal conductive sheet 1 (orientation angle α of theboron nitride particles 2 relative to the thermal conductive sheet 1) is, for example, 25 degrees or less, or preferably 20 degrees or less, and usually 0 degree or more. - The orientation angle α of the
boron nitride particle 2 relative to the thermalconductive sheet 1 is obtained as follows: the thermalconductive sheet 1 is cut along the thickness direction with a cross section polisher (CP); the cross section thus appeared is photographed with a scanning electron microscope (SEM) at a magnification that enables observation of 200 or moreboron nitride particles 2 in the field of view; a tilt angle α between the longitudinal direction LD of theboron nitride particle 2 and the plane direction SD (direction perpendicular to the thickness direction TD) of the thermalconductive sheet 1 is obtained from the obtained SEM photograph; and the average value of the tilt angles α is calculated. - Thus, the thermal conductivity in the plane direction SD of the thermal
conductive sheet 1 is 4 W/m·K or more, preferably 5 W/m·K or more, more preferably 10 W/m·K or more, even more preferably 15 W/m·K or more, or particularly preferably 25 W/m·K or more, and usually 200 W/m·K or less. - The thermal conductivity in the plane direction SD of the thermal
conductive sheet 1 is substantially the same before and after the curing by heat when theresin component 3 is the thermosetting resin component. - When the thermal conductivity in the plane direction SD of the thermal
conductive sheet 1 is below the above-described range, thermal conductivity in the plane direction SD is insufficient, and therefore there is a case where the thermalconductive sheet 1 cannot be used for heat dissipation that requires thermal conductivity in such a plane direction SD. - The thermal conductivity in the plane direction SD of the thermal
conductive sheet 1 is measured by a pulse heating method. In the pulse heating method, the xenonflash analyzer “LFA-447” (manufactured by Erich NETZSCH GmbH & Co. Holding KG) is used. - The thermal conductivity in the thickness direction TD of the thermal
conductive sheet 1 is, for example, 0.5 to 15 W/m·K, or preferably 1 to 10 W/m·K. - The thermal conductivity in the thickness direction TD of the thermal
conductive sheet 1 is measured by a pulse heating method, a laser flash method, or a TWA method. In the pulse heating method, the above-described device is used, in the laser flash method, “TC-9000” (manufactured by Ulvac, Inc.) is used, and in the TWA method, “ai-Phase mobile” (manufactured by ai-Phase Co., Ltd) is used. - Thus, the ratio of the thermal conductivity in the plane direction SD of the thermal
conductive sheet 1 relative to the thermal conductivity in the thickness direction TD of the thermal conductive sheet 1 (thermal conductivity in the plane direction SD/thermal conductivity in the thickness direction TD) is, for example, 1.5 or more, preferably 3 or more, or more preferably 4 or more, and usually 20 or less. - Although not shown in
FIG. 1 , for example, pores (gaps) are formed in the thermalconductive sheet 1. - The proportion of the pores in the thermal
conductive sheet 1, that is, a porosity P, can be adjusted by setting the proportion of theboron nitride particle 2 content (volume-based), and further setting the temperature, the pressure, and/or the duration at the time of hot pressing the mixture of theboron nitride particle 2 and the resin component 3 (FIG. 2( a)). To be specific, the porosity P can be adjusted by setting the temperature, the pressure, and/or the duration of the hot pressing (FIG. 2( a)) within the above-described range. - The porosity P of the thermal
conductive sheet 1 is, for example, 30 vol % or less, or preferably 10 vol % or less. - The porosity P is measured by, for example, as follows: the thermal
conductive sheet 1 is cut along the thickness direction with a cross section polisher (CP); the cross section thus appeared is observed with a scanning electron microscope (SEM) at a magnification of 200 to obtain an image; the obtained image is binarized based on the pore portion and the non-pore portion; and the area ratio, i.e., the ratio of the pore portion area to the total area of the cross section of the thermalconductive sheet 1 is determined by calculation. - The thermal
conductive sheet 1 has a porosity P2 after curing of, relative to a porosity P1 before curing, for example, 100% or less, or preferably 50% or less. - For the measurement of the porosity P(P1), when the
resin component 3 is a thermosetting resin component, the thermalconductive sheet 1 before curing by heat is used. - When the porosity P of the thermal
conductive sheet 1 is within the above-described range, the conformability to irregularities (described later) of the thermalconductive sheet 1 can be improved. - The thermal
conductive sheet 1 has a 5% weight loss temperature of 250° C. or more, preferably 300° C. or more, and usually 450° C. or less. - When the 5% weight loss temperature is equal to or more than the above-described lower limit, decomposition can be suppressed even when exposed to high temperature, and heat generated from various devices can be conducted efficiently.
- The 5% weight loss temperature can be measured by thermogravimetric analysis (
temperature rising speed 10° C./min, under nitrogen atmosphere) in conformity with JIS K 7120. - When the thermal
conductive sheet 1 is evaluated in the bend test in conformity with the cylindrical mandrel method of JIS K 5600-5-1 under the test conditions shown below, preferably, no fracture is observed. - Test Device: Type I
- Mandrel:
diameter 10 mm - Bending Angle: 90 degrees or more
- Thickness of the thermal conductive sheet 1: 0.3 mm
-
FIGS. 3 and 4 show perspective views of the Type I test device. In the following, the Type I test device is described. - In
FIGS. 3 and 4 , a Type I testdevice 10 includes a firstflat plate 11; a secondflat plate 12 disposed in parallel with the firstflat plate 11; and a mandrel (rotation axis) 13 provided for allowing the firstflat plate 11 and the secondflat plate 12 to rotate relatively. - The first
flat plate 11 is formed into a generally rectangular flat plate. Astopper 14 is provided at one end portion (free end portion) of the firstflat plate 11. Thestopper 14 is formed on the surface of the secondflat plate 12 so as to extend along the one end portion of the secondflat plate 12. - The second
flat plate 12 is formed into a generally rectangular flat plate, and one side thereof is disposed so as to be adjacent to one side (the other end portion (proximal end portion) that is opposite to the one end portion where thestopper 14 is provided) of the firstflat plate 11. - The
mandrel 13 is formed so as to extend along one side of the firstflat plate 11 and one side of the secondflat plate 12 that are adjacent to each other. - In the Type I test
device 10, as shown inFIG. 3 , the surface of the firstflat plate 11 is flush with the surface of the secondflat plate 12 before the start of the bend test. - To perform the bend test, the thermal
conductive sheet 1 is placed on the surface of the firstflat plate 11 and the surface of the secondflat plate 12. The thermalconductive sheet 1 is placed so that one side of the thermalconductive sheet 1 is in contact with thestopper 14. - Then, as shown in
FIG. 4 , the firstflat plate 11 and the secondflat plate 12 are rotated relatively. In particular, the free end portion of the firstflat plate 11 and the free end portion of the secondflat plate 12 are rotated to a predetermined angle with themandrel 13 as the center. To be specific, the firstflat plate 11 and the secondflat plate 12 are rotated so as to bring the surface of the free end portions thereof closer (oppose each other). - In this way, the thermal
conductive sheet 1 is bent with themandrel 13 as the center, conforming to the rotation of the firstflat plate 11 and the secondflat plate 12. - More preferably, no fracture is observed in the thermal
conductive sheet 1 even when the bending angle is set to 180 degrees under the above-described test conditions. - When the
resin component 3 is the thermosetting resin component, a semi-cured (in B-stage) thermal conductive sheet 1 (that is, the thermalconductive sheet 1 before curing by heat) is tested in the bend test. - When the fracture is observed in the bend test at the above bending angle in the thermal
conductive sheet 1, there is a case where excellent flexibility cannot be given to the thermalconductive sheet 1. - The thermal
conductive sheet 1 has a water absorption of 3 vol % or less, or preferably 2 vol % or less. - The water absorption can be measured by the following procedures.
- That is, using a thermal
conductive sheet 1 having a size of 50×50 mm as a sample, the sample is dried at 120° C. for 3 hours in a vacuum dryer, and after cooling in a desiccator, the dry mass was measured and named M1. The sample was immersed in distilled water at room temperature for 24 hours and then taken out. The surface of the sample was wiped off with filter paper, and quickly weighed and named M2. Then, the water absorption is calculated using the formula below with the density of the thermalconductive sheet 1 as d. -
[(M2−M1)/(M1/d)]×100=water absorption(vol %) - The density d can be obtained by measuring the volume and the mass.
- When the water absorption is equal to or below the above-described upper limit, for example, damages to the thermal
conductive sheet 1 can be suppressed even if the thermalconductive sheet 1 is exposed to high temperature, for example, when mounted on the electronic components and the electronic components are soldered by, for example, reflow soldering. - Furthermore, for example, when the thermal
conductive sheet 1 is evaluated in the 3-point bending test in conformity with JIS K 7171 (2008) under the test conditions shown below, no fracture is observed. - Test piece: size 20 mm×15 mm
- Distance between supporting points: 5 mm
- Testing speed: 20 mm/min (indenter depressing speed)
- Bending angle: 120 degrees
- Evaluation method: Presence or absence of fracture such as cracks at the center of the test piece is observed visually when tested under the above-described test conditions.
- In the 3-point bending test, when the
resin component 3 is a thermosetting resin component, the thermalconductive sheet 1 before curing by heat is used. - Therefore, the thermal
conductive sheet 1 is excellent in conformability to irregularities because no fracture is observed in the above-described 3-point bending test. The conformability to irregularities is, when the thermalconductive sheet 1 is provided on an object with irregularities, a property of the thermalconductive sheet 1 that conforms to be in close contact with the irregularities. - A mark such as, for example, letters and symbols can be given to the thermal
conductive sheet 1. That is, the thermalconductive sheet 1 is excellent in mark adhesion. The mark adhesion is a property of the thermalconductive sheet 1 that allows reliable adhesion of the above-described mark thereon. - The mark can be adhered (applied, fixed, or firmly fixed) to the thermal
conductive sheet 1, to be specific, by printing, engraving, or the like. - Examples of printing include, for example, inkjet printing, relief printing, intaglio printing, and laser printing.
- When the mark is to be printed by inkjet printing, relief printing, or intaglio printing, for example, an ink fixing layer for improving mark's fixed state can be provided on the surface (printing side) of the thermal
conductive sheet 1. - When the mark is to be printed by laser printing, for example, a toner fixing layer for improving mark's fixed state can be provided on the surface (printing side) of the thermal
conductive sheet 1. - Examples of engraving include laser engraving and punching.
- The thermal
conductive sheet 1 is excellent in flexibility and thermal conductivity in a plane direction SD, and also excellent in heat resistance. - That is, the thermal
conductive sheet 1 can be used for various heat dissipation applications, for example, as a thermal conductive sheet that allows suppression of decomposition even if exposed to a high temperature of 200° C. or more, that is excellent in handleability, and that is excellent in thermal conductivity in the plane direction SD. To be specific, the thermalconductive sheet 1 can be used as a thermal conductive sheet that is applied in power electronics technology generating a high temperature of 200 to 250° C. To be more specific, for example, the thermalconductive sheet 1 can be used as a thermal conductive sheet used for SiC chips, LED heat dissipation substrates, or heat dissipation materials for batteries. - In the above-described hot-pressing step (
FIG. 2 (a)), for example, a plurality of calendering rolls and the like can also be used for rolling the mixture and thelaminated sheet 1C. - When the
resin component 3 is the thermosetting resin component, without curing by heat as described above, the thermal conductive sheet can also be obtained as the uncured thermalconductive sheet 1. - That is, with the thermal conductive sheet of the present invention, when the resin component is the thermosetting resin component, there is no particular limitation as to whether or not curing by heat is carried out or when curing by heat is carried out. For example, the curing by heat can be performed after the laminating step (
FIG. 2 (c)) as described above, or can be performed after the elapse of a predetermined period from the above-described hot-pressing step (FIG. 2 (a), hot-pressing of the mixture but the hot-pressing does not allow curing by heat). To be specific, the curing by heat can be performed at the time when the sheet is applied in power electronics technology, or after the elapse of a predetermined period after such application. - Hereinafter, the present invention is described in further detail with reference to Examples. However, the present invention is not limited to those described in Examples.
- The components described below were blended, stirred, and allowed to stand at room temperature (23° C.) for one night, thereby allowing methyl ethyl ketone (dispersion medium for the curing agent) to volatilize and preparing a semi-solid mixture. The details of the components are as follows: 13.42 g of PT-110 (trade name, plate-like boron nitride particles, average particle size (light scattering method) 45 μm, manufactured by Momentive Performance Materials Inc.), 1 g of jER®828 (trade name, bisphenol A epoxy resin, liquid, epoxy equivalent 184 to 194 g/eqiv., softening temperature (ring and ball method) below 25° C., melt viscosity (80° C.) 70 mPa·s, manufactured by Japan Epoxy Resins Co., Ltd.), 2 g of EPPN-501HY (trade name, triphenylmethane epoxy resin, solid, epoxy equivalent 163 to 175 g/eqiv., softening temperature (ring and ball method) 57 to 63° C., manufactured by NIPPON KAYAKU Co., Ltd), and 3 g (solid content 0.15 g) (5 mass % per total amount of epoxy resins of jER®828 and EPPN-501HY) of a curing agent (a solution of 5 mass % Curezol® 2PZ (trade name, manufactured by Shikoku Chemicals Corporation.) in methyl ethyl ketone).
- In the above-described blending, the volume percentage (vol %) of the boron nitride particles relative to the total volume of the solid content excluding the curing agent (that is, solid content of the boron nitride particle and epoxy resin) was 70 vol %.
- Then, the obtained mixture was sandwiched by two silicone-treated releasing films, and then these were hot-pressed with a vacuum hot-press at 80° C. under an atmosphere (vacuum atmosphere) of 10 Pa with a load of 5 tons (20 MPa) for 2 minutes. A pressed sheet having a thickness of 0.3 mm was thus obtained (ref:
FIG. 2 (a)). - Thereafter, the obtained pressed sheet was cut so as to be divided into a plurality of pieces when projected in the thickness direction of the pressed sheet. Divided sheets were thus obtained (ref:
FIG. 2 (b)). Next, the divided sheets were laminated in the thickness direction. A laminated sheet was thus obtained (ref:FIG. 2 (c)). - Then, the obtained laminated sheet was hot-pressed under the same conditions as described above with the above-described vacuum hot-press (ref:
FIG. 2 (a)). - Then, a series of the above-described operations of cutting, laminating, and hot-pressing (ref:
FIG. 2 ) was repeated four times. A thermal conductive sheet (B-STAGE) having a thickness of 0.3 mm was thus obtained. - Thereafter, the obtained thermal conductive sheet was introduced into a dryer, and heated at 150° C. for 120 minutes so as to be cured by heat.
- Thermal conductive sheets were obtained in the same manner as in Example 1 in conformity with the mixing formulation and production conditions shown in Table 1 to Table 3.
- A mixture was prepared by blending and stirring components (boron nitride particles and polyethylene) in accordance with the mixing formulation of Table 2. That is, during the stirring of the components, the mixture was heated to 130° C., and polyethylene was melted.
- Then, the obtained mixture was sandwiched by two silicone-treated releasing films, and then these were hot-pressed with a vacuum hot-press at 120° C. under an atmosphere (vacuum atmosphere) of 10 Pa with a load of 1 ton (4 MPa) for 2 minutes. A pressed sheet having a thickness of 0.3 mm was thus obtained (ref:
FIG. 2 (a)). - Thereafter, the obtained pressed sheet was cut so as to be divided into a plurality of pieces when projected in the thickness direction of the pressed sheet. Divided sheets were thus obtained (ref:
FIG. 2 (b)). Next, the divided sheets were laminated in the thickness direction. A laminated sheet was thus obtained (ref:FIG. 2 (c)). - Then, the obtained laminated sheet was hot-pressed under the same conditions as described above with the above-described vacuum hot-press (ref:
FIG. 2 (a)). - Then, a series of the above-described operations of cutting, laminating, and pressing (ref:
FIG. 2 ) was repeated four times. A thermal conductive sheet having a thickness of 0.3 mm was thus obtained. - The thermal conductivity of the thermal conductive sheets obtained in Examples 1 to 16 was measured.
- That is, the thermal conductivity in the plane direction (SD) was measured by a pulse heating method using a xenon flash analyzer “LFA-447” (manufactured by Erich NETZSCH GmbH & Co. Holding KG).
- The results are shown in Tables 1 to 3.
- The 5% weight loss temperature of the thermal conductive sheets obtained in Examples 1 to 16 was measured by thermogravimetric analysis (temperature-rising speed of 10° C./min, under nitrogen atmosphere) using a thermogravimetric analysis apparatus in conformity with JIS K 7120 (2010).
- The results are shown in Tables 1 to 3.
- The water absorption of the thermal conductive sheets obtained in Examples 1 to 16 was measured.
- The density of the thermal conductive sheets is shown in Tables 1 to 3.
- The thermal
conductive sheet 1 was processed to give a size of 50×50 mm, and this was used as a sample. The sample was dried at 120° C. for 3 hours in a vacuum dryer, and after cooling in a desiccator, the dry mass was measured and named M1. - Thereafter, the sample was immersed in distilled water at room temperature for 24 hours and then taken out. The surface of the sample was wiped off with filter paper, and quickly weighed and named M2. The water absorption was calculated using the formula below.
-
[(M2−M1)/(M1/d)]×100=water absorption(vol %) - The results are shown in Tables 1 to 3.
- The porosity (P1) of the thermal conductive sheets before curing by heat in Examples 1 to 16 was measured by the following method.
- Measurement method of porosity: The thermal conductive sheet was cut along the thickness direction with a cross section polisher (CP); and the cross section thus appeared was observed with a scanning electron microscope (SEM) at a magnification of 200. The obtained image was binarized based on the pore portion and the non-pore portion; and the area ratio, i.e., the ratio of the pore portion area to the total area of the cross section of the thermal conductive sheet was calculated.
- The results are shown in Tables 1 to 3.
- The 3-point bending test in conformity with JIS K 7171 (2010) was carried out for the thermal conductive sheets before curing by heat of Examples 1 to 16 with the following test conditions, thus evaluating conformability to irregularities with the following evaluation criteria. The results are shown in Tables 1 to 3.
- Test Piece: size 20 mm×15 mm
- Distance Between Supporting Points: 5 mm
- Testing Speed: 20 mm/min (indenter depressing speed)
- Bending Angle: 120 degrees
- Excellent: No fracture was observed.
- Good: Almost no fracture was observed.
- Bad: Fracture was clearly observed.
- Marks were printed on the thermal conductive sheets of Examples 1 to 16 by inkjet printing and laser printing, and the marks were observed.
- As a result, it was confirmed that the marks were excellently visible in both cases of inkjet printing and laser printing, and that mark adhesion by printing was excellent in any of the thermal conductive sheets of Examples 1 to 16.
-
TABLE 1 Average Particle Example Size(μm) Ex. 1 Ex. 2 Ex. 3 Ex. 4 Ex. 5 Ex. 6 Mixing Boron PT-110*1 45 13.42 3.83 5.75 12.22 23 — Formulation Nitride [70] [40] [50] [68] [80] of Particle/g*A/ [69] [38.8] [48.8] [66.9] [79.2] Components [vol %]*B/ UHP-1*2 9 — — — — — 12.22 [vol %]*C [68] [66.9] Polymer Thermosetting Epoxy Resin Epoxy Resin A*3 — 3 3 3 3 3 Resin Composition (Semi-solid) Epoxy Resin B*4 1 — — — — — (Liquid) Epoxy Resin C*5 — — — — — — (Solid) Epoxy Resin D*6 2 — — — — — (Solid) Curing Agent*7 — 3 3 3 3 3 (Solid Content in (0.15) (0.15) (0.15) (0.15) (0.15) Grams) Curing Agent*8 3 — — — — — (Solid Content in (0.15) Grams) Thermoplastic Polyethylene*9 — — — — — — Resin Production Hot- Temperature(° C.) 80 80 80 80 80 80 Conditions pressing Number of Time(times)*D 5 5 5 5 5 5 Load(MPa)/(tons) 20/5 20/5 20/5 20/5 20/5 20/5 Evaluation Thermal Thermal Conductivity Plane Direction 30 4.5 6.0 30.0 32.5 17.0 Conductive (W/m · K) (SD) Sheet Thickness 2.0 1.3 3.3 5.0 5.5 5.8 Direction (TD) Ratio (SD/TD) 15.0 3.5 1.8 6.0 5.9 2.9 5% Weight Loss Temperature (° C.) 362 318 327 333 381 341 JIS K 7120 (2010) Density (g/m3) 2.0 1.6 1.8 1.9 2.1 1.9 Water Absorption (vol %) 2 0 0 1 2 1 Porosity (vol %) 4 0 0 5 12 6 Conformability to Irregularities/ Excellent Good Good Good Good Good 3-point bending test JIS K 7171 (2008) Boron Orientation Angle (α)(degrees) 12 18 18 15 13 20 Nitride Particle g*A: Blended Weight [vol %]*B: Percentage relative to the total volume of the thermal conductive sheet (excluding curing agent) [vol %]*C: Percentage relative to the total volume of the thermal conductive sheet Number of Time*D: Number of times of hot-pressing of laminated sheet -
TABLE 2 Average Particle Example Size(μm) Ex. 7 Ex. 8 Ex. 9 Ex. 10 Ex. 11 Mixing Boron PT-110*1 45 12.22 12.22 12.22 3.83 13.42 Formulation Nitride [68] [68] [68] [60] [70] of Particle/g*A/ [66.9] [66.9] [66.9] [60] [69] Components [vol %]*B/ UHP-1*2 9 — — — — — [vol %]*C Polymer Thermosetting Epoxy Resin Epoxy Resin A*3 — — — — — Resin Composition (Semi-solid) Epoxy Resin B*4 1.5 3 — — — (Liquid) Epoxy Resin C*5 1.5 — 3 — — (Solid) Epoxy Resin D*6 — — — — 3 (Solid) Curing Agent*7 3 3 3 — 3 (Solid Content in (0.15) (0.15) (0.15) (0.15) Grams) Curing Agent*8 — — — — — (Solid Content in Grams) Thermoplastic Polyethylene*9 — — — 1 — Resin Production Hot- Temperature (° C.) 80 80 80 120 80 Conditions pressing Number of Time (times)*D 5 5 5 5 5 Load (MPa)/(tons) 20/5 20/5 20/5 4/1 20/5 Evaluation Thermal Thermal Conductivity Plane Direction 30.0 30.0 30.0 20 24.5 Conductive (W/m · K) (SD) Sheet Thickness 5.0 5.0 5.0 2.0 2.1 Direction (TD) Ratio (SD/TD) 6.0 6.0 6.0 10.0 11.7 5% Weight Loss Temperature (° C.) 344 357 325 430 370 JIS K 7120 (2010) Density (g/m3) 2.0 2.0 1.9 1.8 2.0 Water Absorption (vol %) 1 1 2 0 2 Porosity (vol %) 4 2 13 1 10 Conformability to Irregularities/ Good Good Bad Bad Bad 3-point bending test JIS K 7171 (2008) Boron Orientation Angle (α)(degrees) 15 16 16 15 16 Nitride Particle g*A: Blended Weight [vol %]*B: Percentage relative to the total volume of the thermal conductive sheet (excluding curing agent) [vol %]*C: Percentage relative to the total volume of the thermal conductive sheet Number of Time*D: Number of times of hot-pressing of laminated sheet -
TABLE 3 Average Particle Example Size(μm) Ex. 12 Ex. 13 Ex. 14 Ex. 15 Ex. 16 Mixing Boron PT-110*1 45 3.83 13.42 13.42 13.42 13.42 Formulation Nitride [40] [70] [70] [70] [70] of Particle/g*A/ [37.7] [69] [69] [69] [69] Components [vol %]*B/ UHP-1*2 9 — — — — — [vol %]*C Polymer Thermosetting Epoxy Resin Epoxy Resin A*3 3 3 3 3 3 Resin Composition (Semi-solid) Epoxy Resin B*4 — — — — — (Liquid) Epoxy Resin C*5 — — — — — (Solid) Epoxy Resin D*6 — — — — — (Solid) Curing Agent*7 6 3 3 3 3 (Solid Content in (0.3) (0.15) (0.15) (0.15) (0.15) Grams) Curing Agent*8 — — — — — (Solid Content in Grams) Thermoplastic Polyethylene*9 — — — — — Resin Production Hot- Temperature (° C.) 80 60 70 80 80 Conditions pressing Number of Time (times)*D 5 5 5 5 5 Load (MPa)/(tons) 20/5 20/5 20/5 20/5 40/10 Evaluation Thermal Thermal Conductivity Plane Direction 4.1 10.5 11.2 32.5 50.7 Conductive (W/m · K) (SD) Sheet Thickness 1.1 2.2 3.0 5.5 7.3 Direction (TD) Ratio (SD/TD) 3.7 4.8 3.7 5.9 6.9 5% Weight Loss Temperature (° C.) 310 352 348 355 350 JIS K 7120(2010) Density (g/m3) 1.6 1.8 1.8 1.9 2.0 Water Absorption (vol %) 0 3 3 2 1 Porosity (vol %) 0 29 26 8 3 Conformability to Irregularities/ Excellent Excellent Excellent Excellent Good 3-point bending test JIS K 7171 (2008) Boron Orientation Angle (α)(degrees) 20 17 15 15 13 Nitride Particle g*A: Blended Weight [vol %]*B: Percentage relative to the total volume of the thermal conductive sheet (excluding curing agent) [vol %]*C: Percentage relative to the total volume of the thermal conductive sheet Number of Time*D: Number of times of hot-pressing of laminated sheet - In Tables 1 to 3, values for the components are in grams unless otherwise specified.
- In the rows of “boron nitride particles” in Tables 1 to 3, values on the top represent the Blended Weight (g) of the boron nitride particles; values in the middle represent the volume percentage (vol %) of the boron nitride particles relative to the total volume of the solid content excluding the curing agent in the thermal conductive sheet (that is, solid content of the boron nitride particles, and epoxy resin or polyethylene); and values at the bottom represent the volume percentage (vol %) of the boron nitride particles relative to the total volume of the solid content in the thermal conductive sheet (that is, solid content of boron nitride particles, epoxy resin, and curing agent).
- For the components with “*” added in Tables 1 to 3, details are given below.
- PT-110*1: trade name, plate-like boron nitride particles, average particle size (light scattering method) 45 μm, manufactured by Momentive Performance Materials Inc.
UHP-1*2: trade name: SHOBN®UHP-1, plate-like boron nitride particles, average particle size (light scattering method) 9 μm, manufactured by Showa Denko K.K.
Epoxy Resin A*3: OGSOL EG (trade name), bisarylfluorene epoxy resin, semi-solid, epoxy equivalent 294 g/eqiv., softening temperature (ring and ball test) 47° C., melt viscosity (80° C.) 1360 mPa·s, manufactured by Osaka Gas Chemicals Co., Ltd.
Epoxy Resin B*4: jER® 828 (trade name), bisphenol A epoxy resin, liquid, epoxy equivalent 184 to 194 g/eqiv., softening temperature (ring and ball test) below 25° C., melt viscosity (80° C.) 70 mPa·s, manufactured by Japan Epoxy Resins Co., Ltd.
Epoxy Resin C*5: jER® 1002 (trade name), bisphenol A epoxy resin, solid, epoxy equivalent 600 to 700 g/eqiv., softening temperature (ring and ball test) 78° C., melt viscosity (80° C.) 10000 mPa·s or more (measurement limit or more), manufactured by Japan Epoxy Resins Co., Ltd.
Epoxy Resin D*6: EPPN-501HY (trade name), triphenylmethane epoxy resin, solid, epoxy equivalent 163 to 175 g/eqiv., softening temperature (ring and ball test) 57 to 63° C., manufactured by NIPPON KAYAKU Co., Ltd.
Curing Agent*7: a solution of 5 mass % Curezol® 2PZ (trade name, manufactured by Shikoku Chemicals Corporation) in methyl ethyl ketone.
Curing Agent*8: a dispersion of 5 mass % Curezol® 2P4 MHZ-PW (trade name, manufactured by Shikoku Chemicals Corporation) in methyl ethyl ketone.
Polyethylene*9: low density polyethylene, weight average molecular weight (Mw) 4000, number average molecular weight (Mn) 1700, manufactured by Sigma-Aldrich Co. - While the illustrative embodiments of the present invention are provided in the above description, such is for illustrative purpose only and it is not to be construed as limiting the scope of the present invention. Modification and variation of the present invention that will be obvious to those skilled in the art is to be covered by the following claims.
Claims (2)
1. A thermal conductive sheet comprising a plate-like boron nitride particle, wherein
the thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet is 4 W/m·K or more, and
the 5% weight loss temperature is 250° C. or more.
2. A thermal conductive sheet comprising a plate-like boron nitride particle, wherein
the thermal conductivity in a direction perpendicular to the thickness direction of the thermal conductive sheet is 4 W/m·K or more, and
the water absorption is 3 vol % or less.
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010018256 | 2010-01-29 | ||
| JP2010-018256 | 2010-01-29 | ||
| JP2010090908 | 2010-04-09 | ||
| JP2010-090908 | 2010-04-09 | ||
| JP2010161852 | 2010-07-16 | ||
| JP2010-161852 | 2010-07-16 | ||
| JP2010161849 | 2010-07-16 | ||
| JP2010-161849 | 2010-07-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20110259567A1 true US20110259567A1 (en) | 2011-10-27 |
Family
ID=44408129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US13/016,549 Abandoned US20110259567A1 (en) | 2010-01-29 | 2011-01-28 | Thermal conductive sheet |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20110259567A1 (en) |
| KR (1) | KR20110089101A (en) |
| CN (1) | CN102140331A (en) |
| TW (1) | TW201137010A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8592844B2 (en) | 2010-01-29 | 2013-11-26 | Nitto Denko Corporation | Light-emitting diode device |
| US8749978B2 (en) | 2010-01-29 | 2014-06-10 | Nitto Denko Corporation | Power module |
| US9859484B2 (en) | 2012-10-24 | 2018-01-02 | Sharp Kabushiki Kaisha | Light emitting apparatus |
| US11884039B2 (en) | 2017-05-10 | 2024-01-30 | Sekisui Chemical Co., Ltd. | Insulating sheet and laminate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6162849A (en) * | 1999-01-11 | 2000-12-19 | Ferro Corporation | Thermally conductive thermoplastic |
| US20040118579A1 (en) * | 2002-12-19 | 2004-06-24 | 3M Innovative Properties Company | Flexible heat sink |
| US20080271832A1 (en) * | 2007-05-04 | 2008-11-06 | Tyco Electronics Corporation | Thermo-conductive, heat-shrinkable, dual-wall tubing |
| WO2008139968A1 (en) * | 2007-05-15 | 2008-11-20 | Idemitsu Kosan Co., Ltd. | Polyarylene sulfide resin composition and molded article made of the same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005146057A (en) * | 2003-11-12 | 2005-06-09 | Polymatech Co Ltd | High-thermal-conductivity molding and method for producing the same |
| US20070259211A1 (en) * | 2006-05-06 | 2007-11-08 | Ning Wang | Heat spread sheet with anisotropic thermal conductivity |
| JP5031450B2 (en) * | 2007-06-12 | 2012-09-19 | 富士フイルム株式会社 | Composite piezoelectric material, ultrasonic probe, ultrasonic endoscope, and ultrasonic diagnostic apparatus |
| CN101809734B (en) * | 2007-09-26 | 2012-01-25 | 三菱电机株式会社 | Thermally conductive sheet, manufacturing method thereof, and power module |
-
2011
- 2011-01-28 TW TW100103572A patent/TW201137010A/en unknown
- 2011-01-28 US US13/016,549 patent/US20110259567A1/en not_active Abandoned
- 2011-01-30 CN CN2011100346114A patent/CN102140331A/en active Pending
- 2011-01-31 KR KR1020110009619A patent/KR20110089101A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6162849A (en) * | 1999-01-11 | 2000-12-19 | Ferro Corporation | Thermally conductive thermoplastic |
| US20040118579A1 (en) * | 2002-12-19 | 2004-06-24 | 3M Innovative Properties Company | Flexible heat sink |
| US20080271832A1 (en) * | 2007-05-04 | 2008-11-06 | Tyco Electronics Corporation | Thermo-conductive, heat-shrinkable, dual-wall tubing |
| WO2008139968A1 (en) * | 2007-05-15 | 2008-11-20 | Idemitsu Kosan Co., Ltd. | Polyarylene sulfide resin composition and molded article made of the same |
| US20100063192A1 (en) * | 2007-05-15 | 2010-03-11 | Idemitsu Kosan Co., Ltd. | Polyarylene sulfide resin composition and a molded article formed therefrom |
Non-Patent Citations (1)
| Title |
|---|
| H.W. Hill, Jr., D.G. Brady, "Poly(arylene sulfide)s," 15 May 2008, Encyclopedia of Polymer Science and Technology, http://onlinelibrary.wiley.com/doi/10.1002/0471440264.pst246/abstract * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8592844B2 (en) | 2010-01-29 | 2013-11-26 | Nitto Denko Corporation | Light-emitting diode device |
| US8749978B2 (en) | 2010-01-29 | 2014-06-10 | Nitto Denko Corporation | Power module |
| US9859484B2 (en) | 2012-10-24 | 2018-01-02 | Sharp Kabushiki Kaisha | Light emitting apparatus |
| US11884039B2 (en) | 2017-05-10 | 2024-01-30 | Sekisui Chemical Co., Ltd. | Insulating sheet and laminate |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201137010A (en) | 2011-11-01 |
| KR20110089101A (en) | 2011-08-04 |
| CN102140331A (en) | 2011-08-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8749978B2 (en) | Power module | |
| US20110259564A1 (en) | Thermal conductive sheet | |
| US20110259569A1 (en) | Thermal conductive sheet | |
| US20110259568A1 (en) | Thermal conductive sheet | |
| US20110259565A1 (en) | Heat dissipation structure | |
| US20110259566A1 (en) | Thermal conductive sheet | |
| US20140008566A1 (en) | Producing method of thermally conductive sheet and thermally conductive sheet | |
| US20110262728A1 (en) | Thermal conductive sheet, light-emitting diode mounting substrate, and thermal conductive adhesive sheet | |
| US20110260185A1 (en) | Light-emitting diode device | |
| US20120286194A1 (en) | Thermal conductive sheet, insulating sheet, and heat dissipating member | |
| US20130200298A1 (en) | Thermal conductive sheet | |
| US8547465B2 (en) | Imaging device module | |
| US20120285674A1 (en) | Thermal conductive sheet, insulating sheet, and heat dissipating member | |
| JP2012039067A (en) | Heat-conductive sheet and light-emitting diode packaging substrate | |
| US20110259567A1 (en) | Thermal conductive sheet | |
| JP5587220B2 (en) | Thermally conductive adhesive sheet | |
| JP2012039064A (en) | Heat-conductive sheet | |
| JP2012039066A (en) | Heat-conductive sheet | |
| JP2012036365A (en) | Thermally conductive sheet | |
| JP2012039065A (en) | Heat-conductive sheet |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: NITTO DENKO CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:IZUTANI, SEIJI;UCHIYAMA, HISAE;FUKUOKA, TAKAHIRO;AND OTHERS;SIGNING DATES FROM 20110530 TO 20110608;REEL/FRAME:026575/0162 |
|
| STCB | Information on status: application discontinuation |
Free format text: EXPRESSLY ABANDONED -- DURING EXAMINATION |