US20090086394A1 - Protection circuit and semiconductor integrated circuit - Google Patents
Protection circuit and semiconductor integrated circuit Download PDFInfo
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- US20090086394A1 US20090086394A1 US12/237,066 US23706608A US2009086394A1 US 20090086394 A1 US20090086394 A1 US 20090086394A1 US 23706608 A US23706608 A US 23706608A US 2009086394 A1 US2009086394 A1 US 2009086394A1
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- effect transistor
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- 230000004224 protection Effects 0.000 title claims abstract description 80
- 239000004065 semiconductor Substances 0.000 title claims description 44
- 230000005669 field effect Effects 0.000 claims abstract description 107
- 239000003990 capacitor Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 14
- 230000015556 catabolic process Effects 0.000 description 12
- 230000000694 effects Effects 0.000 description 3
- 230000010485 coping Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
- H02H9/00—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection
- H02H9/04—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess voltage
- H02H9/045—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess voltage adapted to a particular application and not provided for elsewhere
- H02H9/046—Emergency protective circuit arrangements for limiting excess current or voltage without disconnection responsive to excess voltage adapted to a particular application and not provided for elsewhere responsive to excess voltage appearing at terminals of integrated circuits
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/811—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements
Definitions
- the present invention relates to a protection circuit for preventing electrostatic breakdown, and a semiconductor integrated circuit including the protection circuit.
- a mobile communication apparatus has its size reduced and its performance enhanced, and therefore a radio frequency semiconductor device having enhanced performance is strongly required.
- a radio frequency semiconductor device needs to trade off improvement of breakdown voltage of a transistor thereof for enhancement of its performance, so that its weakness in electrical stress from the outside, in particular, its weakness in electrostatic discharge (ESD), is increased. Accordingly, it is suggested that a technique using an enhancement-mode transistor is applied to a protection circuit so as to cope with the ESD.
- FIG. 7 is a diagram illustrating a configuration of a semiconductor integrated circuit 100 including a conventional protection circuit 150 for coping with the ESD by using an enhancement-mode transistor.
- a protected element 110 such as a radio frequency circuit is connected to a terminal (electrode pad) 120 which is electrically connected to the outside via a lead wire.
- the terminal 120 is used as a digital signal terminal, an analog signal terminal, a power supply terminal, a grounding terminal, or the like.
- a drain of a transistor 130 is connected to the terminal 120 , a gate thereof is grounded through a resistance 140 , and a source thereof is directly grounded.
- the transistor 130 and the resistance 140 forms the protection circuit 150 for suppressing ESD voltage applied to the protected element 110 through the terminal 120 due to static electricity.
- the transistor 130 can be in the conducting state before the drain voltage of the transistor 130 reaches breakdown voltage of the protected element 110 , thereby preventing the protected element 110 from being broken down due to the ESD voltage.
- the conventional semiconductor integrated circuit 100 shown in FIG. 7 needs some time period until the protection circuit 150 starts to operate after application of the ESD voltage to the terminal 120 .
- the reason therefor is as follows.
- the ESD voltage is applied to the terminal 120 , reverse leakage current is initially generated between the drain and the gate in the transistor 130 .
- the reverse leakage current flowing through the resistance 140 causes generation of a voltage.
- the generated voltage becomes greater than the threshold voltage set for the transistor 130 , a channel of the transistor 130 is on.
- some time period is needed until the transistor 130 causes the ESD current to bypass the protected element.
- an object of the present invention is to provide a protection circuit capable of shortening a time period required from application of the ESD voltage to start of the operation of the protection circuit, and improving the resistance of voltage to ESD.
- the present invention is directed to a protection circuit connected to a protected element.
- the protection circuit of the present invention uses a basic circuit including: an enhancement-mode field-effect transistor; a first resistance having one end connected to a gate of the field-effect transistor; a second resistance for connecting the other end of the first resistance to a source of the field-effect transmitter; and a capacitor for connecting the other end of the first resistance to a drain of the field-effect transistor, so as to realize various circuit configurations.
- one of the drain and the source of the field-effect transistor is connected to the protected element, and the other of the drain and the source thereof is connected to a reference potential.
- the drains of the two field-effect transistors When the number of the basic circuits used is two, one of the drains of the two field-effect transistors is connected to the protected element, and the other of the drains thereof is connected to a reference potential, and the sources of the two field-effect transistors are connected to each other.
- the number of the basic circuits used is two, one of the sources of the two field-effect transistors is connected to the protected element, and the other of the sources thereof is connected to a reference potential, and the drains of the two field-effect transistors are connected to each other.
- another basic circuit including: a first enhancement-mode field-effect transistor; a second field-effect transistor having a drain connected to a source of the first field-effect transistor; a first resistance having one end connected to a gate of the first field-effect transistor; a second resistance having one end connected to a gate of the second field-effect transistor; a third resistance for connecting the other end of the first resistance to the other end of the second resistance; a fourth resistance for connecting the other end of the second resistance to a source of the second field-effect transistor; and a capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor, may be used.
- one of the drain of the first field-effect transistor and the source of the second field-effect transistor is connected to the protected element, and the other of the drain of the first field-effect transistor and the source of the second field-effect transistor is connected to a reference potential.
- the drains of the two first field-effect transistors When the number of the another basic circuits used is two, one of the drains of the two first field-effect transistors is connected to the protected element, and the other of the drains thereof is connected to a reference potential, and the sources of the two second field-effect transistors are connected to each other.
- the number of the another basic circuits used is two, one of the sources of the two second field-effect transistors is connected to the protected element, and the other of the sources thereof is connected to a reference potential, and the drains of the two first field-effect transistors are connected to each other.
- each of the various protections circuits described above and the protected element are formed on a same semiconductor substrate.
- the semiconductor substrate is a compound semiconductor substrate.
- a speed for responding to the ESD voltage applied to a protected element is enhanced, thereby enabling improvement of resistance of voltage to ESD.
- FIG. 1 is a diagram illustrating a configuration of a semiconductor integrated circuit 1 including a protection circuit 51 according to a first embodiment of the present invention
- FIG. 2 is a diagram illustrating a configuration of a semiconductor integrated circuit 2 including a protection circuit 52 according to a second embodiment of the present invention
- FIG. 3 is a diagram illustrating a configuration of a semiconductor integrated circuit 3 including a protection circuit 53 according to a third embodiment of the present invention
- FIG. 4 is a diagram illustrating a configuration of a semiconductor integrated circuit 4 including a protection circuit 54 according to a fourth embodiment of the present invention
- FIG. 5 is a diagram illustrating a configuration of a semiconductor integrated circuit 5 including a protection circuit 55 according to a fifth embodiment of the present invention
- FIG. 6 is a diagram illustrating a configuration of a semiconductor integrated circuit 6 including a protection circuit 56 according to a sixth embodiment of the present invention.
- FIG. 7 is a diagram illustrating a configuration of a semiconductor integrated circuit 100 including a conventional protection circuit 150 .
- an enhancement-mode MIS field-effect transistor for example, an enhancement-mode MIS field-effect transistor, an enhancement-mode MES field-effect transistor, an enhancement-mode heterojunction field-effect transistor, or the like is used.
- a heterojunction bipolar transistor or the like when used, the same effect is obtained.
- a drain, a gate, and a source used in each embodiment are replaced with a collector, a base, and an emitter, respectively.
- the protection circuit of the present invention may be included in a logic circuit or an analog circuit using a junction field-effect transistor, or the like, or the protection circuit of the present invention and a protected element may be formed on a compound semiconductor substrate.
- FIG. 1 is a diagram illustrating a configuration of a semiconductor integrated circuit 1 including a protection circuit 51 according to a first embodiment of the present invention.
- the semiconductor integrated circuit 1 according to the first embodiment is configured such that a protected element 42 is connected between an input terminal 61 and an output terminal 62 , and a protected element 41 and the protection circuit 51 are connected in parallel with each other between the input terminal 61 and a reference potential terminal 71 .
- the protection circuit 51 includes: a field-effect transistor (FET) 11 in which a drain thereof is connected to the input terminal 61 , and a source thereof is connected to the reference potential terminal 71 ; a resistance 31 having one end connected to a gate of the FET 11 ; a resistance 32 for connecting the other end of the resistance 31 to the source of the FET 11 ; and a capacitor 21 for connecting the other end of the resistance 31 to the drain of the FET 11 .
- FET field-effect transistor
- the FET 11 When a voltage between the gate and the source is greater than a threshold voltage set for the FET 11 , the FET 11 is in a conducting state, and charge for ESD is discharged from the drain of the FET 11 to the source thereof, and the positive ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- the resistance 31 functions to protect the gate of the FET 11 , and prevents breakdown of the FET 11 due to gate forward current.
- the FET 11 When negative ESD voltage is applied to the input terminal 61 , the FET 11 acts as a diode. Thus, charge for ESD is discharged from the source of the FET 11 to the drain thereof, so that the negative ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- the protection circuit 51 enables enhancement of speed for responding to the ESD voltage applied to each of the protected elements 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protected elements 41 and 42 .
- FIG. 2 is a diagram illustrating a configuration of a semiconductor integrated circuit 2 including a protection circuit 52 according to a second embodiment of the present invention.
- the semiconductor integrated circuit 2 according to the second embodiment is configured such that the protected element 42 is connected between the input terminal 61 and the output terminal 62 , and the protected element 41 and the protection circuit 52 are connected in parallel with each other between the input terminal 61 and the reference potential terminal 71 .
- the protection circuit 52 includes: the FET 11 in which the drain thereof is connected to the input terminal 61 ; a FET 12 in which a drain thereof is connected to the source of the FET 11 , and a source thereof is connected to the reference potential terminal 71 ; the resistance 31 having one end connected to the gate of the FET 11 ; a resistance 33 having one end connected to a gate of the FET 12 ; the resistance 32 for connecting the other end of the resistance 31 to the other end of the resistance 33 ; a resistance 34 for connecting the other end of the resistance 33 to the source of the FET 12 ; and the capacitor 21 for connecting the other end of the resistance 31 to the drain of the FET 11 .
- a ratio in voltage increase between point A and point C depends on a ratio in resistance value between the resistance 32 and the resistance 34 , and determines a ratio at which the ESD voltage is divided between the drain/source of the FET 11 and the drain/source of the FET 12 .
- a voltage between the gate and the source of the FET 11 and a voltage between the gate and the source of the FET 12 are greater than threshold voltages, respectively, the FET 11 and the FET 12 are each in a conducting state, and charge for ESD is discharged from the drain of the FET 11 to the source of the FET 12 , and the positive ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- the ESD voltage is divided between the drain/source of the FET 11 and the drain/source of the FET 12 , and therefore it is possible to prevent breakdown caused by the ESD voltage.
- the resistances 31 and 33 function to protect the gates, respectively, and prevent breakdowns of the FET 11 and the FET 12 , respectively, caused due to gate forward current.
- the FET 11 and the FET 12 each act as a diode. Thus, charge for ESD is discharged from the source of the FET 12 to the drain of the FET 11 , and the negative ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- the protection circuit 52 enables enhancement of speed for responding to the ESD voltage applied to each of the protected elements 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protected elements 41 and 42 . Further, the ESD voltage applied to each of the protected elements 41 and 42 is divided between the FET 11 and the FET 12 , thereby preventing breakdown of each of the protected elements 41 and 42 even when the ESD voltage is further increased.
- FIG. 3 is a diagram illustrating a configuration of a semiconductor integrated circuit 3 including a protection circuit 53 according to a third embodiment of the present invention.
- the semiconductor integrated circuit 3 according to the third embodiment is configured such that the protected element 42 is connected between the input terminal 61 and the output terminal 62 , and the protected element 41 and the protection circuit 53 are connected in parallel with each other between the input terminal 61 and the reference potential terminal 71 .
- the protection circuit 53 has a configuration in which the two protection circuits 51 of the first embodiment are connected in series with each other such that one of the two protection circuits 51 has the capacitor 21 connected to the input terminal 61 , and the other of the two protection circuits 51 has the capacitor 21 connected to the reference potential terminal 71 so as to position the two protection circuits 51 in a symmetrical manner.
- the protection circuit 53 enables enhancement of speed for responding to the ESD voltage applied to each of the protected elements 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protected elements 41 and 42 .
- negative voltage which is lower than or equal to forward voltage of the gate of the FET 11 a can be applied to the input terminal 61 , and therefore an absolute value of positive voltage is equal to an absolute value of negative voltage, thereby enabling a wide range of applications of the protection circuit 53 .
- FIG. 4 is a diagram illustrating a configuration of a semiconductor integrated circuit 4 including a protection circuit 54 according to a fourth embodiment of the present invention.
- the semiconductor integrated circuit 4 according to the fourth embodiment is configured such that the protected element 42 is connected between the input terminal 61 and the output terminal 62 , and the protected element 41 and the protection circuit 54 are connected in parallel with each other between the input terminal 61 and the reference potential terminal 71 .
- the protection circuit 54 has a configuration in which the two protection circuits 52 of the second embodiment are connected in series with each other such that one of the two protection circuits 52 has the capacitor 21 connected to the input terminal 61 , and the other of the two protection circuits 52 has the capacitor 21 connected to the reference potential terminal 71 so as to position the two protection circuits 52 in a symmetrical manner.
- the protection circuit 54 enables enhancement of speed for responding to the ESD voltage applied to each of the protected elements 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protected elements 41 and 42 . Further, the ESD voltage applied to each of the protected elements 41 and 42 is divided between the FET 11 and the FET 12 , thereby preventing breakdown of each of the protected elements 41 and 42 even when the ESD voltage is further increased.
- negative voltage which is lower than or equal to forward voltages of the gates of the FET 11 a and the FET 12 a can be applied to the input terminal 61 , and therefore an absolute value of positive voltage is equal to an absolute value of negative voltage, thereby enabling a wide range of applications of the protection circuit 54 .
- the FETs are provided in multiple steps, and therefore the absolute values of the positive and the negative voltages can be increased so as to be greater values.
- FIG. 5 is a diagram illustrating a configuration of a semiconductor integrated circuit 5 including a protection circuit 55 according to a fifth embodiment of the present invention.
- the semiconductor integrated circuit 5 according to the fifth embodiment is configured such that the protected element 42 is connected between the input terminal 61 and the output terminal 62 , and the protected element 41 and the protection circuit 55 are connected in parallel with each other between the input terminal 61 and the reference potential terminal 71 .
- the protection circuit 55 has a configuration in which the two protection circuits 51 of the first embodiment are connected in series with each other such that the capacitor 21 of one of the two protection circuits 51 is connected to the capacitor 21 of the other of the two protection circuits 51 so as to position the two protection circuits 51 in a symmetrical manner.
- the FET 11 a acts as a diode and the FET 11 b is in a conducting state, and therefore charge for ESD is discharged from the source of the FET 11 a to the source of the FET 11 b . Therefore, the positive ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- negative ESD voltage is applied to the input terminal 61 , the FET 11 b acts as a diode and the FET 11 a is in a conducting state. Accordingly, charge for ESD is discharged from the source of the FET 11 b to the source of the FET 11 a , and therefore the negative ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- the protection circuit 55 according to the fifth embodiment of the present invention exerts the same effect as described for the third embodiment.
- FIG. 6 is a diagram illustrating a configuration of a semiconductor integrated circuit 6 including a protection circuit 56 according to a sixth embodiment of the present invention.
- the semiconductor integrated circuit 6 according to the sixth embodiment is configured such that the protected element 42 is connected between the input terminal 61 and the output terminal 62 , and the protected element 41 and the protection circuit 56 are connected in parallel with each other between the input terminal 61 and the reference potential terminal 71 .
- the protection circuit 56 has a configuration in which the two protection circuits 52 of the second embodiment are connected in series with each other such that the capacitor 21 of one of the two protection circuits 52 is connected to the capacitor 21 of the other of the two protection circuits 52 so as to position the two protection circuits 52 in a symmetrical manner.
- the FET 11 b and the FET 12 b each act as a diode and the FET 11 a and the FET 12 a are each in a conducting state, and therefore charge for ESD is discharged from the source of the FET 12 b to the source of the FET 12 a . Therefore, the negative ESD voltage applied to each of the protected elements 41 and 42 is reduced.
- the protection circuit 56 according to the sixth embodiment of the present invention exerts the same effect as described for the fourth embodiment.
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Abstract
In a circuit in which a protected element 42 is connected between an input terminal 61 and an output terminal 62, and a protected element 41 is connected between the input terminal 61 and a reference potential terminal 71, the protected element 41 and a protection circuit 51 are connected in parallel with each other. The protection circuit 51 includes: a field-effect transistor (FET) 11 having a drain connected to the input terminal 61 and a source connected to the reference potential terminal 71; a resistance 31 having one end connected to a gate of the FET 11; a resistance 32 for connecting the other end of the resistance 31 to the source of the FET 11; and a capacitor 21 for connecting the other end of the resistance 31 to the drain of the FET 11.
Description
- 1. Field of the Invention
- The present invention relates to a protection circuit for preventing electrostatic breakdown, and a semiconductor integrated circuit including the protection circuit.
- 2. Description of the Background Art
- In recent years, a mobile communication apparatus has its size reduced and its performance enhanced, and therefore a radio frequency semiconductor device having enhanced performance is strongly required. In general, however, a radio frequency semiconductor device needs to trade off improvement of breakdown voltage of a transistor thereof for enhancement of its performance, so that its weakness in electrical stress from the outside, in particular, its weakness in electrostatic discharge (ESD), is increased. Accordingly, it is suggested that a technique using an enhancement-mode transistor is applied to a protection circuit so as to cope with the ESD.
-
FIG. 7 is a diagram illustrating a configuration of a semiconductor integrated circuit 100 including aconventional protection circuit 150 for coping with the ESD by using an enhancement-mode transistor. - As shown in
FIG. 7 , a protectedelement 110 such as a radio frequency circuit is connected to a terminal (electrode pad) 120 which is electrically connected to the outside via a lead wire. Theterminal 120 is used as a digital signal terminal, an analog signal terminal, a power supply terminal, a grounding terminal, or the like. A drain of atransistor 130 is connected to theterminal 120, a gate thereof is grounded through aresistance 140, and a source thereof is directly grounded. Thetransistor 130 and theresistance 140 forms theprotection circuit 150 for suppressing ESD voltage applied to the protectedelement 110 through theterminal 120 due to static electricity. - Hereinafter, an operation principle of the
conventional protection circuit 150 using an enhancement-mode field-effect transistor as thetransistor 130 will be described as an example. - When positive ESD voltage (high voltage pulse or the like) is applied to the
terminal 120, drain voltage is increased in thetransistor 130. At this time, gate voltage is also increased in thetransistor 130 due to a leakage current leaking between the drain and the gate, and theresistance 140 being provided. When the gate voltage is increased so as to be greater than a threshold voltage set for thetransmitter 130, thetransistor 130 is in a conducting state, and the charge for ESD is discharged from the drain of thetransmitter 130 to the source thereof. On the other hand, when negative ESD voltage (surge pulse or the like) is applied to theterminal 120, drain voltage is reduced in thetransmitter 130. At this time, when the drain voltage is reduced so as to be lower than or equal to the threshold voltage set for thetransistor 130, thetransistor 130 is in a conducting state, and the charge for ESD is discharged from the source of thetransistor 130 to the drain thereof. - When the threshold voltage for the
transistor 130 and a resistance value of theresistance 140 are appropriately set, thetransistor 130 can be in the conducting state before the drain voltage of thetransistor 130 reaches breakdown voltage of the protectedelement 110, thereby preventing theprotected element 110 from being broken down due to the ESD voltage. - However, the conventional semiconductor integrated circuit 100 shown in
FIG. 7 needs some time period until theprotection circuit 150 starts to operate after application of the ESD voltage to theterminal 120. The reason therefor is as follows. When the ESD voltage is applied to theterminal 120, reverse leakage current is initially generated between the drain and the gate in thetransistor 130. The reverse leakage current flowing through theresistance 140 causes generation of a voltage. When the generated voltage becomes greater than the threshold voltage set for thetransistor 130, a channel of thetransistor 130 is on. Thus, some time period is needed until thetransistor 130 causes the ESD current to bypass the protected element. - Therefore, when excessively high voltage is applied to the
terminal 120 in a substantially short time period, a problem arises that the excessively high voltage may break down the protectedelement 110 before theprotection circuit 150 operates. - Therefore, an object of the present invention is to provide a protection circuit capable of shortening a time period required from application of the ESD voltage to start of the operation of the protection circuit, and improving the resistance of voltage to ESD.
- The present invention is directed to a protection circuit connected to a protected element. In order to attain the object mentioned above, the protection circuit of the present invention uses a basic circuit including: an enhancement-mode field-effect transistor; a first resistance having one end connected to a gate of the field-effect transistor; a second resistance for connecting the other end of the first resistance to a source of the field-effect transmitter; and a capacitor for connecting the other end of the first resistance to a drain of the field-effect transistor, so as to realize various circuit configurations.
- When the number of the basic circuits used is one, one of the drain and the source of the field-effect transistor is connected to the protected element, and the other of the drain and the source thereof is connected to a reference potential.
- When the number of the basic circuits used is two, one of the drains of the two field-effect transistors is connected to the protected element, and the other of the drains thereof is connected to a reference potential, and the sources of the two field-effect transistors are connected to each other. Alternatively, when the number of the basic circuits used is two, one of the sources of the two field-effect transistors is connected to the protected element, and the other of the sources thereof is connected to a reference potential, and the drains of the two field-effect transistors are connected to each other.
- Further, another basic circuit including: a first enhancement-mode field-effect transistor; a second field-effect transistor having a drain connected to a source of the first field-effect transistor; a first resistance having one end connected to a gate of the first field-effect transistor; a second resistance having one end connected to a gate of the second field-effect transistor; a third resistance for connecting the other end of the first resistance to the other end of the second resistance; a fourth resistance for connecting the other end of the second resistance to a source of the second field-effect transistor; and a capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor, may be used.
- When the number of the another basic circuits used is one, one of the drain of the first field-effect transistor and the source of the second field-effect transistor is connected to the protected element, and the other of the drain of the first field-effect transistor and the source of the second field-effect transistor is connected to a reference potential.
- When the number of the another basic circuits used is two, one of the drains of the two first field-effect transistors is connected to the protected element, and the other of the drains thereof is connected to a reference potential, and the sources of the two second field-effect transistors are connected to each other. Alternatively, when the number of the another basic circuits used is two, one of the sources of the two second field-effect transistors is connected to the protected element, and the other of the sources thereof is connected to a reference potential, and the drains of the two first field-effect transistors are connected to each other.
- Typically, each of the various protections circuits described above and the protected element are formed on a same semiconductor substrate. In this case, it is preferable that the semiconductor substrate is a compound semiconductor substrate.
- According to the present invention, a speed for responding to the ESD voltage applied to a protected element is enhanced, thereby enabling improvement of resistance of voltage to ESD.
- These and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings.
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FIG. 1 is a diagram illustrating a configuration of a semiconductor integratedcircuit 1 including aprotection circuit 51 according to a first embodiment of the present invention; -
FIG. 2 is a diagram illustrating a configuration of a semiconductor integratedcircuit 2 including aprotection circuit 52 according to a second embodiment of the present invention; -
FIG. 3 is a diagram illustrating a configuration of a semiconductor integratedcircuit 3 including aprotection circuit 53 according to a third embodiment of the present invention; -
FIG. 4 is a diagram illustrating a configuration of a semiconductor integratedcircuit 4 including aprotection circuit 54 according to a fourth embodiment of the present invention; -
FIG. 5 is a diagram illustrating a configuration of a semiconductor integratedcircuit 5 including aprotection circuit 55 according to a fifth embodiment of the present invention; -
FIG. 6 is a diagram illustrating a configuration of a semiconductor integratedcircuit 6 including aprotection circuit 56 according to a sixth embodiment of the present invention; and -
FIG. 7 is a diagram illustrating a configuration of a semiconductor integrated circuit 100 including aconventional protection circuit 150. - Hereinafter, a protection circuit of the present invention will be described with reference to the drawings. In the following description, for example, an enhancement-mode MIS field-effect transistor, an enhancement-mode MES field-effect transistor, an enhancement-mode heterojunction field-effect transistor, or the like is used. However, also when a heterojunction bipolar transistor or the like is used, the same effect is obtained. In this case, a drain, a gate, and a source used in each embodiment are replaced with a collector, a base, and an emitter, respectively. Further, the protection circuit of the present invention may be included in a logic circuit or an analog circuit using a junction field-effect transistor, or the like, or the protection circuit of the present invention and a protected element may be formed on a compound semiconductor substrate.
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FIG. 1 is a diagram illustrating a configuration of a semiconductor integratedcircuit 1 including aprotection circuit 51 according to a first embodiment of the present invention. The semiconductor integratedcircuit 1 according to the first embodiment is configured such that a protectedelement 42 is connected between aninput terminal 61 and anoutput terminal 62, and a protectedelement 41 and theprotection circuit 51 are connected in parallel with each other between theinput terminal 61 and a referencepotential terminal 71. Theprotection circuit 51 includes: a field-effect transistor (FET) 11 in which a drain thereof is connected to theinput terminal 61, and a source thereof is connected to the referencepotential terminal 71; aresistance 31 having one end connected to a gate of theFET 11; aresistance 32 for connecting the other end of theresistance 31 to the source of theFET 11; and acapacitor 21 for connecting the other end of theresistance 31 to the drain of theFET 11. - In
FIG. 1 , when no voltage is applied to theinput terminal 61, voltage between the gate and the source of theFET 11 is 0V. When positive ESD voltage is applied to theinput terminal 61, drain voltage is increased in theFET 11. At this time, at point A at which one of electrode ends of thecapacitor 21 is connected to theresistance 31, voltage is instantly increased in accordance with voltage changing at point B at which the other of the electrode ends of thecapacitor 21 is connected to the drain of theFET 11. That is, gate voltage is instantly increased in theFET 11. When a voltage between the gate and the source is greater than a threshold voltage set for theFET 11, theFET 11 is in a conducting state, and charge for ESD is discharged from the drain of theFET 11 to the source thereof, and the positive ESD voltage applied to each of the protected 41 and 42 is reduced. Theelements resistance 31 functions to protect the gate of theFET 11, and prevents breakdown of theFET 11 due to gate forward current. - When negative ESD voltage is applied to the
input terminal 61, theFET 11 acts as a diode. Thus, charge for ESD is discharged from the source of theFET 11 to the drain thereof, so that the negative ESD voltage applied to each of the protected 41 and 42 is reduced.elements - As described above, the
protection circuit 51 according to the first embodiment of the present invention enables enhancement of speed for responding to the ESD voltage applied to each of the protected 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protectedelements 41 and 42.elements -
FIG. 2 is a diagram illustrating a configuration of a semiconductor integratedcircuit 2 including aprotection circuit 52 according to a second embodiment of the present invention. The semiconductor integratedcircuit 2 according to the second embodiment is configured such that the protectedelement 42 is connected between theinput terminal 61 and theoutput terminal 62, and the protectedelement 41 and theprotection circuit 52 are connected in parallel with each other between theinput terminal 61 and the referencepotential terminal 71. Theprotection circuit 52 includes: theFET 11 in which the drain thereof is connected to theinput terminal 61; aFET 12 in which a drain thereof is connected to the source of theFET 11, and a source thereof is connected to the referencepotential terminal 71; theresistance 31 having one end connected to the gate of theFET 11; aresistance 33 having one end connected to a gate of theFET 12; theresistance 32 for connecting the other end of theresistance 31 to the other end of theresistance 33; aresistance 34 for connecting the other end of theresistance 33 to the source of theFET 12; and thecapacitor 21 for connecting the other end of theresistance 31 to the drain of theFET 11. - In
FIG. 2 , when no voltage is applied to theinput terminal 61, voltage between the gate and the source of theFET 11 is 0V. When positive ESD voltage is applied to theinput terminal 61, drain voltage is increased in theFET 11. At this time, at points A and C at which one of electrode ends of thecapacitor 21 is connected to theresistance 31, voltage is instantly increased in accordance with voltage changing at point B at which the other of the electrode ends of thecapacitor 21 is connected to the drain of theFET 11. That is, gate voltages of theFET 11 and theFET 12 are instantly increased. - A ratio in voltage increase between point A and point C depends on a ratio in resistance value between the
resistance 32 and theresistance 34, and determines a ratio at which the ESD voltage is divided between the drain/source of theFET 11 and the drain/source of theFET 12. When a voltage between the gate and the source of theFET 11 and a voltage between the gate and the source of theFET 12 are greater than threshold voltages, respectively, theFET 11 and theFET 12 are each in a conducting state, and charge for ESD is discharged from the drain of theFET 11 to the source of theFET 12, and the positive ESD voltage applied to each of the protected 41 and 42 is reduced. At this time, the ESD voltage is divided between the drain/source of theelements FET 11 and the drain/source of theFET 12, and therefore it is possible to prevent breakdown caused by the ESD voltage. The 31 and 33 function to protect the gates, respectively, and prevent breakdowns of theresistances FET 11 and theFET 12, respectively, caused due to gate forward current. - When negative ESD voltage is applied to the
input terminal 61, theFET 11 and theFET 12 each act as a diode. Thus, charge for ESD is discharged from the source of theFET 12 to the drain of theFET 11, and the negative ESD voltage applied to each of the protected 41 and 42 is reduced.elements - As described above, the
protection circuit 52 according to the second embodiment of the present invention enables enhancement of speed for responding to the ESD voltage applied to each of the protected 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protectedelements 41 and 42. Further, the ESD voltage applied to each of the protectedelements 41 and 42 is divided between theelements FET 11 and theFET 12, thereby preventing breakdown of each of the protected 41 and 42 even when the ESD voltage is further increased.elements -
FIG. 3 is a diagram illustrating a configuration of a semiconductor integratedcircuit 3 including aprotection circuit 53 according to a third embodiment of the present invention. The semiconductor integratedcircuit 3 according to the third embodiment is configured such that the protectedelement 42 is connected between theinput terminal 61 and theoutput terminal 62, and the protectedelement 41 and theprotection circuit 53 are connected in parallel with each other between theinput terminal 61 and the referencepotential terminal 71. Theprotection circuit 53 has a configuration in which the twoprotection circuits 51 of the first embodiment are connected in series with each other such that one of the twoprotection circuits 51 has thecapacitor 21 connected to theinput terminal 61, and the other of the twoprotection circuits 51 has thecapacitor 21 connected to the referencepotential terminal 71 so as to position the twoprotection circuits 51 in a symmetrical manner. - When in the above configuration positive ESD voltage is applied to the
input terminal 61, aFET 11 a is in a conducting state, and a FET 11 b acts as a diode. Therefore, charge for ESD is discharged from a drain of theFET 11 a to a drain of the FET 11 b, and the positive ESD voltage applied to each of the protected 41 and 42 is reduced. When negative ESD voltage is applied to theelements input terminal 61, the FET 11 b is in a conducting state, and theFET 11 a acts as a diode. Thus, charge for ESD is discharged from the drain of the FET 11 b to the drain of theFET 11 a, and the negative ESD voltage applied to each of the protected 41 and 42 is reduced.elements - As described above, the
protection circuit 53 according to the third embodiment of the present invention enables enhancement of speed for responding to the ESD voltage applied to each of the protected 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protectedelements 41 and 42. Further, negative voltage which is lower than or equal to forward voltage of the gate of theelements FET 11 a can be applied to theinput terminal 61, and therefore an absolute value of positive voltage is equal to an absolute value of negative voltage, thereby enabling a wide range of applications of theprotection circuit 53. -
FIG. 4 is a diagram illustrating a configuration of a semiconductor integratedcircuit 4 including aprotection circuit 54 according to a fourth embodiment of the present invention. The semiconductor integratedcircuit 4 according to the fourth embodiment is configured such that the protectedelement 42 is connected between theinput terminal 61 and theoutput terminal 62, and the protectedelement 41 and theprotection circuit 54 are connected in parallel with each other between theinput terminal 61 and the referencepotential terminal 71. Theprotection circuit 54 has a configuration in which the twoprotection circuits 52 of the second embodiment are connected in series with each other such that one of the twoprotection circuits 52 has thecapacitor 21 connected to theinput terminal 61, and the other of the twoprotection circuits 52 has thecapacitor 21 connected to the referencepotential terminal 71 so as to position the twoprotection circuits 52 in a symmetrical manner. - When in the above configuration positive ESD voltage is applied to the
input terminal 61, theFET 11 a and aFET 12 a are each in a conducting state, and the FET 11 b and aFET 12 b each act as a diode. Therefore, charge for ESD is discharged from the drain of theFET 11 a to the drain of the FET 11 b, and positive ESD voltage applied to each of the protected 41 and 42 is reduced. When negative ESD voltage is applied to theelements input terminal 61, the FET 11 b and theFET 12 b are each in a conducting state, and theFET 11 a and theFET 12 a each act as a diode. Thus, charge for ESD is discharged from the drain of the FET lib to the drain of theFET 11 a, and the negative ESD voltage applied to each of the protected 41 and 42 is reduced.elements - As described above, the
protection circuit 54 according to the fourth embodiment of the present invention enables enhancement of speed for responding to the ESD voltage applied to each of the protected 41 and 42 so as to improve the resistance of voltage to ESD, thereby preventing breakdown of each of the protectedelements 41 and 42. Further, the ESD voltage applied to each of the protectedelements 41 and 42 is divided between theelements FET 11 and theFET 12, thereby preventing breakdown of each of the protected 41 and 42 even when the ESD voltage is further increased. Further, negative voltage which is lower than or equal to forward voltages of the gates of theelements FET 11 a and theFET 12 a can be applied to theinput terminal 61, and therefore an absolute value of positive voltage is equal to an absolute value of negative voltage, thereby enabling a wide range of applications of theprotection circuit 54. Further, the FETs are provided in multiple steps, and therefore the absolute values of the positive and the negative voltages can be increased so as to be greater values. -
FIG. 5 is a diagram illustrating a configuration of a semiconductor integratedcircuit 5 including aprotection circuit 55 according to a fifth embodiment of the present invention. The semiconductor integratedcircuit 5 according to the fifth embodiment is configured such that the protectedelement 42 is connected between theinput terminal 61 and theoutput terminal 62, and the protectedelement 41 and theprotection circuit 55 are connected in parallel with each other between theinput terminal 61 and the referencepotential terminal 71. Theprotection circuit 55 has a configuration in which the twoprotection circuits 51 of the first embodiment are connected in series with each other such that thecapacitor 21 of one of the twoprotection circuits 51 is connected to thecapacitor 21 of the other of the twoprotection circuits 51 so as to position the twoprotection circuits 51 in a symmetrical manner. - When in the above configuration positive ESD voltage is applied to the
input terminal 61, theFET 11 a acts as a diode and the FET 11 b is in a conducting state, and therefore charge for ESD is discharged from the source of theFET 11 a to the source of the FET 11 b. Therefore, the positive ESD voltage applied to each of the protected 41 and 42 is reduced. When negative ESD voltage is applied to theelements input terminal 61, the FET 11 b acts as a diode and theFET 11 a is in a conducting state. Accordingly, charge for ESD is discharged from the source of the FET 11 b to the source of theFET 11 a, and therefore the negative ESD voltage applied to each of the protected 41 and 42 is reduced.elements - As described above, the
protection circuit 55 according to the fifth embodiment of the present invention exerts the same effect as described for the third embodiment. -
FIG. 6 is a diagram illustrating a configuration of a semiconductor integratedcircuit 6 including aprotection circuit 56 according to a sixth embodiment of the present invention. The semiconductor integratedcircuit 6 according to the sixth embodiment is configured such that the protectedelement 42 is connected between theinput terminal 61 and theoutput terminal 62, and the protectedelement 41 and theprotection circuit 56 are connected in parallel with each other between theinput terminal 61 and the referencepotential terminal 71. Theprotection circuit 56 has a configuration in which the twoprotection circuits 52 of the second embodiment are connected in series with each other such that thecapacitor 21 of one of the twoprotection circuits 52 is connected to thecapacitor 21 of the other of the twoprotection circuits 52 so as to position the twoprotection circuits 52 in a symmetrical manner. - When in the above configuration positive ESD voltage is applied to the
input terminal 61, theFET 11 a and theFET 12 a each act as a diode and the FET 11 b and theFET 12 b are each in a conducting state, and therefore charge for ESD is discharged from the source of theFET 12 a to the source of theFET 12 b. Therefore, the positive ESD voltage applied to each of the protected 41 and 42 is reduced. When negative ESD voltage is applied to theelements input terminal 61, the FET 11 b and theFET 12 b each act as a diode and theFET 11 a and theFET 12 a are each in a conducting state, and therefore charge for ESD is discharged from the source of theFET 12 b to the source of theFET 12 a. Therefore, the negative ESD voltage applied to each of the protected 41 and 42 is reduced.elements - As described above, the
protection circuit 56 according to the sixth embodiment of the present invention exerts the same effect as described for the fourth embodiment. - While the invention has been described in detail, the foregoing description is in all aspects illustrative and not restrictive. It is understood that numerous other modifications and variations can be devised without departing from the scope of the invention.
Claims (13)
1. A protection circuit connected to a protected element, comprising:
an enhancement-mode field-effect transistor;
a first resistance having one end connected to a gate of the field-effect transistor;
a second resistance for connecting the other end of the first resistance to a source of the field-effect transmitter; and
a capacitor for connecting the other end of the first resistance to a drain of the field-effect transistor,
wherein one of the drain and the source of the field-effect transistor is connected to the protected element, and the other of the drain and the source thereof is connected to a reference potential.
2. A protection circuit connected to a protected element, comprising:
a first enhancement-mode field-effect transistor;
a second field-effect transistor having a drain connected to a source of the first field-effect transistor;
a first resistance having one end connected to a gate of the first field-effect transistor;
a second resistance having one end connected to a gate of the second field-effect transistor;
a third resistance for connecting the other end of the first resistance to the other end of the second resistance;
a fourth resistance for connecting the other end of the second resistance to a source of the second field-effect transistor; and
a capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor,
wherein one of the drain of the first field-effect transistor and the source of the second field-effect transistor is connected to the protected element, and the other of the drain of the first field-effect transistor and the source of the second field-effect transistor is connected to a reference potential.
3. A protection circuit connected to a protected element, comprising:
a first enhancement-mode field-effect transistor;
a first resistance having one end connected to a gate of the first field-effect transistor;
a second resistance for connecting the other end of the first resistance to a source of the first field-effect transistor;
a first capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor;
a second enhancement-mode field-effect transistor;
a third resistance having one end connected to a gate of the second field-effect transistor;
a fourth resistance for connecting the other end of the third resistance to a source of the second field-effect transistor; and
a second capacitor for connecting the other end of the third resistance to a drain of the second field-effect transistor,
wherein one of the drains of the first field-effect transistor and the second field-effect transistor is connected to the protected element, and the other of the drains thereof is connected to a reference potential, and the sources of the first field-effect transistor and the second field-effect transistor are connected to each other.
4. A protection circuit connected to a protected element, comprising:
a first enhancement-mode field-effect transistor;
a second field-effect transistor having a drain connected to a source of the first field-effect transistor;
a first resistance having one end connected to a gate of the first field-effect transistor;
a second resistance having one end connected to a gate of the second field-effect transistor;
a third resistance for connecting the other end of the first resistance to the other end of the second resistance;
a fourth resistance for connecting the other end of the second resistance to a source of the second field-effect transistor;
a first capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor;
a third enhancement-mode field-effect transistor;
a fourth field-effect transistor having a drain connected to a source of the third field-effect transistor;
a fifth resistance having one end connected to a gate of the third field-effect transistor;
a sixth resistance having one end connected to a gate of the fourth field-effect transistor;
a seventh resistance for connecting the other end of the fifth resistance to the other end of the sixth resistance;
an eighth resistance for connecting the other end of the sixth resistance to a source of the fourth field-effect transistor; and
a second capacitor for connecting the other end of the fifth resistance to a drain of the third field-effect transistor; and
wherein one of the drains of the first field-effect transistor and the third field-effect transistor is connected to the protected element, and the other of the drains thereof is connected to a reference potential, and the sources of the second field-effect transistor and the fourth field-effect transistor are connected to each other.
5. A protection circuit connected to a protected element, comprising:
a first enhancement-mode field-effect transistor;
a first resistance having one end connected to a gate of the first field-effect transistor;
a second resistance for connecting the other end of the first resistance to a source of the first field-effect transistor;
a first capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor;
a second enhancement-mode field-effect transistor;
a third resistance having one end connected to a gate of the second field-effect transistor;
a fourth resistance for connecting the other end of the third resistance to a source of the second field-effect transistor; and
a second capacitor for connecting the other end of the third resistance to a drain of the second field-effect transistor,
wherein one of the sources of the first field-effect transistor and the second field-effect transistor is connected to the protected element, and the other of the sources thereof is connected to a reference potential, and the drains of the first field-effect transistor and the second field-effect transistor are connected to each other.
6. A protection circuit connected to a protected element, comprising:
a first enhancement-mode field-effect transistor;
a second field-effect transistor having a drain connected to a source of the first field-effect transistor;
a first resistance having one end connected to a gate of the first field-effect transistor;
a second resistance having one end connected to a gate of the second field-effect transistor;
a third resistance for connecting the other end of the first resistance to the other end of the second resistance;
a fourth resistance for connecting the other end of the second resistance to a source of the second field-effect transistor;
a first capacitor for connecting the other end of the first resistance to a drain of the first field-effect transistor;
a third enhancement-mode field-effect transistor;
a fourth field-effect transistor having a drain connected to a source of the third field-effect transistor;
a fifth resistance having one end connected to a gate of the third field-effect transistor;
a sixth resistance having one end connected to a gate of the fourth field-effect transistor;
a seventh resistance for connecting the other end of the fifth resistance to the other end of the sixth resistance;
an eighth resistance for connecting the other end of the sixth resistance to a source of the fourth field-effect transistor; and
a second capacitor for connecting the other end of the fifth resistance to a drain of the third field-effect transistor;
wherein one of the sources of the second field-effect transistor and the fourth field-effect transistor is connected to the protected element, and the other of the sources thereof is connected to a reference potential, and the drains of the first field-effect transistor and the third field-effect transistor are connected to each other.
7. A semiconductor integrated circuit, wherein the protection circuit according to claim 1 and the protected element are formed on a same semiconductor substrate.
8. The semiconductor integrated circuit according to claim 7 , wherein the semiconductor substrate is a compound semiconductor substrate.
9. A semiconductor integrated circuit, wherein the protection circuit according to claim 2 and the protected element are formed on a same semiconductor substrate.
10. A semiconductor integrated circuit, wherein the protection circuit according to claim 3 and the protected element are formed on a same semiconductor substrate.
11. A semiconductor integrated circuit, wherein the protection circuit according to claim 4 and the protected element are formed on a same semiconductor substrate.
12. A semiconductor integrated circuit, wherein the protection circuit according to claim 5 and the protected element are formed on a same semiconductor substrate.
13. A semiconductor integrated circuit, wherein the protection circuit according to claim 6 and the protected element are formed on a same semiconductor substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-251542 | 2007-09-27 | ||
| JP2007251542A JP2009087962A (en) | 2007-09-27 | 2007-09-27 | Protection circuit and semiconductor integrated circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20090086394A1 true US20090086394A1 (en) | 2009-04-02 |
Family
ID=40508013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US12/237,066 Abandoned US20090086394A1 (en) | 2007-09-27 | 2008-09-24 | Protection circuit and semiconductor integrated circuit |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20090086394A1 (en) |
| JP (1) | JP2009087962A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120262828A1 (en) * | 2011-04-13 | 2012-10-18 | Rf Micro Devices, Inc. | Clamp based esd protection circuits |
| US20160336744A1 (en) * | 2015-05-15 | 2016-11-17 | Analog Devices, Inc. | Electrostatic discharge protection circuits for radio frequency communication systems |
| US9627883B2 (en) | 2011-04-13 | 2017-04-18 | Qorvo Us, Inc. | Multiple port RF switch ESD protection using single protection structure |
| DE102013109834B4 (en) * | 2012-09-24 | 2018-01-11 | Analog Devices Inc. | Bidirectional heterojunction semiconductor protection devices and methods of forming the same |
| EP3324439A4 (en) * | 2016-09-26 | 2018-09-12 | Shenzhen Goodix Technology Co., Ltd. | Electrostatic-discharge protection circuit applied to integrated circuit |
| US10134725B2 (en) | 2016-09-26 | 2018-11-20 | Shenzhen GOODIX Technology Co., Ltd. | Electrostatic discharge protection circuit applied in integrated circuit |
| DE102017103632B4 (en) * | 2016-02-23 | 2020-09-24 | Analog Devices, Inc. | Devices for robust overload protection in compound semiconductor circuit applications |
| US10978445B2 (en) * | 2018-01-31 | 2021-04-13 | Taiwan Semiconductor Manufacturing Company Ltd. | Electrostatic discharge protection circuit and semiconductor circuit |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4456939A (en) * | 1980-06-30 | 1984-06-26 | Mitsubishi Denki Kabushiki Kaisha | Input protective circuit for semiconductor device |
| US4932053A (en) * | 1988-11-10 | 1990-06-05 | Sgs-Thomson Microelectronics, S.A. | Safety device against the unauthorized detection of protected data |
| US5559659A (en) * | 1995-03-23 | 1996-09-24 | Lucent Technologies Inc. | Enhanced RC coupled electrostatic discharge protection |
| US6724603B2 (en) * | 2002-08-09 | 2004-04-20 | Motorola, Inc. | Electrostatic discharge protection circuitry and method of operation |
| US20080043388A1 (en) * | 2004-10-13 | 2008-02-21 | Sony Corporation | High Frequency Integrated Circuit |
-
2007
- 2007-09-27 JP JP2007251542A patent/JP2009087962A/en not_active Withdrawn
-
2008
- 2008-09-24 US US12/237,066 patent/US20090086394A1/en not_active Abandoned
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4456939A (en) * | 1980-06-30 | 1984-06-26 | Mitsubishi Denki Kabushiki Kaisha | Input protective circuit for semiconductor device |
| US4932053A (en) * | 1988-11-10 | 1990-06-05 | Sgs-Thomson Microelectronics, S.A. | Safety device against the unauthorized detection of protected data |
| US5559659A (en) * | 1995-03-23 | 1996-09-24 | Lucent Technologies Inc. | Enhanced RC coupled electrostatic discharge protection |
| US6724603B2 (en) * | 2002-08-09 | 2004-04-20 | Motorola, Inc. | Electrostatic discharge protection circuitry and method of operation |
| US20080043388A1 (en) * | 2004-10-13 | 2008-02-21 | Sony Corporation | High Frequency Integrated Circuit |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9627883B2 (en) | 2011-04-13 | 2017-04-18 | Qorvo Us, Inc. | Multiple port RF switch ESD protection using single protection structure |
| US20120262828A1 (en) * | 2011-04-13 | 2012-10-18 | Rf Micro Devices, Inc. | Clamp based esd protection circuits |
| US9728532B2 (en) * | 2011-04-13 | 2017-08-08 | Qorvo Us, Inc. | Clamp based ESD protection circuits |
| DE102013109834B4 (en) * | 2012-09-24 | 2018-01-11 | Analog Devices Inc. | Bidirectional heterojunction semiconductor protection devices and methods of forming the same |
| CN106158849A (en) * | 2015-05-15 | 2016-11-23 | 美国亚德诺半导体公司 | Electrostatic Discharge Protection Circuits for RF Communication Systems |
| US9831666B2 (en) | 2015-05-15 | 2017-11-28 | Analog Devices, Inc. | Apparatus and methods for electrostatic discharge protection of radio frequency interfaces |
| US20160336744A1 (en) * | 2015-05-15 | 2016-11-17 | Analog Devices, Inc. | Electrostatic discharge protection circuits for radio frequency communication systems |
| US9954356B2 (en) * | 2015-05-15 | 2018-04-24 | Analog Devices, Inc. | Electrostatic discharge protection circuits for radio frequency communication systems |
| CN109378310A (en) * | 2015-05-15 | 2019-02-22 | 美国亚德诺半导体公司 | Electrostatic discharge protection circuits for radio frequency communication systems |
| DE102017103632B4 (en) * | 2016-02-23 | 2020-09-24 | Analog Devices, Inc. | Devices for robust overload protection in compound semiconductor circuit applications |
| EP3324439A4 (en) * | 2016-09-26 | 2018-09-12 | Shenzhen Goodix Technology Co., Ltd. | Electrostatic-discharge protection circuit applied to integrated circuit |
| US10134725B2 (en) | 2016-09-26 | 2018-11-20 | Shenzhen GOODIX Technology Co., Ltd. | Electrostatic discharge protection circuit applied in integrated circuit |
| US10978445B2 (en) * | 2018-01-31 | 2021-04-13 | Taiwan Semiconductor Manufacturing Company Ltd. | Electrostatic discharge protection circuit and semiconductor circuit |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009087962A (en) | 2009-04-23 |
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