US20080210566A1 - Electrochemical Deposition of Selenium in Ionic Liquids - Google Patents
Electrochemical Deposition of Selenium in Ionic Liquids Download PDFInfo
- Publication number
- US20080210566A1 US20080210566A1 US12/088,130 US8813006A US2008210566A1 US 20080210566 A1 US20080210566 A1 US 20080210566A1 US 8813006 A US8813006 A US 8813006A US 2008210566 A1 US2008210566 A1 US 2008210566A1
- Authority
- US
- United States
- Prior art keywords
- hydroxyethyl
- hydroxybutyl
- imidazolium
- methyl
- hydroxypropyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910052711 selenium Inorganic materials 0.000 title claims abstract description 39
- 239000011669 selenium Substances 0.000 title claims abstract description 39
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 27
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 12
- 125000003748 selenium group Chemical group *[Se]* 0.000 title description 12
- 238000000034 method Methods 0.000 claims abstract description 31
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 18
- -1 tetraalkylphosphonium cation Chemical class 0.000 claims description 97
- 125000004432 carbon atom Chemical group C* 0.000 claims description 27
- 238000000151 deposition Methods 0.000 claims description 26
- 230000008021 deposition Effects 0.000 claims description 26
- 239000007983 Tris buffer Substances 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- JFZKOODUSFUFIZ-UHFFFAOYSA-N trifluoro phosphate Chemical compound FOP(=O)(OF)OF JFZKOODUSFUFIZ-UHFFFAOYSA-N 0.000 claims description 10
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 9
- 125000001424 substituent group Chemical group 0.000 claims description 9
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- 150000001450 anions Chemical class 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 7
- 229910006080 SO2X Inorganic materials 0.000 claims description 6
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 229920006395 saturated elastomer Polymers 0.000 claims description 6
- PXELHGDYRQLRQO-UHFFFAOYSA-N 1-butyl-1-methylpyrrolidin-1-ium Chemical compound CCCC[N+]1(C)CCCC1 PXELHGDYRQLRQO-UHFFFAOYSA-N 0.000 claims description 5
- SVONMDAUOJGXHL-UHFFFAOYSA-N 1-hexyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(C)CCCC1 SVONMDAUOJGXHL-UHFFFAOYSA-N 0.000 claims description 5
- JWPBORWCDZAHAU-UHFFFAOYSA-N 1-methyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(C)CCCC1 JWPBORWCDZAHAU-UHFFFAOYSA-N 0.000 claims description 5
- ZGZLRWJZGFRHHQ-UHFFFAOYSA-N 2-(3-methylimidazol-3-ium-1-yl)ethanol Chemical compound CN1C=C[N+](CCO)=C1 ZGZLRWJZGFRHHQ-UHFFFAOYSA-N 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 5
- JKOADRMSALOJAG-UHFFFAOYSA-N 1,1-dihexylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCCCCC)CCCC1 JKOADRMSALOJAG-UHFFFAOYSA-N 0.000 claims description 4
- WQDKVNGDAHQCDU-UHFFFAOYSA-N 1-decyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCC)CCCC1 WQDKVNGDAHQCDU-UHFFFAOYSA-N 0.000 claims description 4
- XIPZVAFVVCJUQT-UHFFFAOYSA-N 1-heptyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCCCC)CCCC1 XIPZVAFVVCJUQT-UHFFFAOYSA-N 0.000 claims description 4
- XGWCAUNVXQXUIZ-UHFFFAOYSA-N 1-hexyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCCC)CCCC1 XGWCAUNVXQXUIZ-UHFFFAOYSA-N 0.000 claims description 4
- AROZXIPMFUNQLO-UHFFFAOYSA-N 1-hexyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCCC)CCCC1 AROZXIPMFUNQLO-UHFFFAOYSA-N 0.000 claims description 4
- HBDRSCGXYGFKFA-UHFFFAOYSA-N 3-[3-(2-hydroxyethyl)imidazol-1-ium-1-yl]propan-1-ol Chemical compound OCCC[N+]=1C=CN(CCO)C=1 HBDRSCGXYGFKFA-UHFFFAOYSA-N 0.000 claims description 4
- CROSHWMSKMXXDW-UHFFFAOYSA-N 4-[3-(2-hydroxyethyl)imidazol-1-ium-1-yl]butan-1-ol Chemical compound OCCCC[N+]=1C=CN(CCO)C=1 CROSHWMSKMXXDW-UHFFFAOYSA-N 0.000 claims description 4
- MYYZRUIUROBMBH-UHFFFAOYSA-N 4-[3-(3-hydroxypropyl)imidazol-3-ium-1-yl]butan-1-ol Chemical compound OCCCCN1C=C[N+](CCCO)=C1 MYYZRUIUROBMBH-UHFFFAOYSA-N 0.000 claims description 4
- 150000003949 imides Chemical class 0.000 claims description 4
- LGRLWUINFJPLSH-UHFFFAOYSA-N methanide Chemical compound [CH3-] LGRLWUINFJPLSH-UHFFFAOYSA-N 0.000 claims description 4
- 150000003342 selenium Chemical class 0.000 claims description 4
- 125000005207 tetraalkylammonium group Chemical group 0.000 claims description 4
- YXJSMCZTRWECJF-UHFFFAOYSA-N 1-butyl-1-ethylpyrrolidin-1-ium Chemical compound CCCC[N+]1(CC)CCCC1 YXJSMCZTRWECJF-UHFFFAOYSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 3
- 125000001072 heteroaryl group Chemical group 0.000 claims description 3
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 3
- BIUUTLHYFPFWRB-UHFFFAOYSA-N methyl-tris(2-methylpropyl)phosphanium Chemical compound CC(C)C[P+](C)(CC(C)C)CC(C)C BIUUTLHYFPFWRB-UHFFFAOYSA-N 0.000 claims description 3
- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical compound FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052755 nonmetal Inorganic materials 0.000 claims description 3
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 claims description 3
- HOMONHWYLOPSLL-UHFFFAOYSA-N tributyl(ethyl)phosphanium Chemical compound CCCC[P+](CC)(CCCC)CCCC HOMONHWYLOPSLL-UHFFFAOYSA-N 0.000 claims description 3
- XKFPGUWSSPXXMF-UHFFFAOYSA-N tributyl(methyl)phosphanium Chemical compound CCCC[P+](C)(CCCC)CCCC XKFPGUWSSPXXMF-UHFFFAOYSA-N 0.000 claims description 3
- PYVOHVLEZJMINC-UHFFFAOYSA-N trihexyl(tetradecyl)phosphanium Chemical compound CCCCCCCCCCCCCC[P+](CCCCCC)(CCCCCC)CCCCCC PYVOHVLEZJMINC-UHFFFAOYSA-N 0.000 claims description 3
- ZKUWNFAAKJBRSA-UHFFFAOYSA-N (1-butylpyrrolidin-1-ium-1-yl)methanol Chemical compound CCCC[N+]1(CO)CCCC1 ZKUWNFAAKJBRSA-UHFFFAOYSA-N 0.000 claims description 2
- KBRPUSYDCBZSJL-UHFFFAOYSA-N (1-ethylpyrrolidin-1-ium-1-yl)methanol Chemical compound CC[N+]1(CO)CCCC1 KBRPUSYDCBZSJL-UHFFFAOYSA-N 0.000 claims description 2
- OOEBATDQOMBMIM-UHFFFAOYSA-N (1-methylpyrrolidin-1-ium-1-yl)methanol Chemical compound OC[N+]1(C)CCCC1 OOEBATDQOMBMIM-UHFFFAOYSA-N 0.000 claims description 2
- YVQWDMIFHBOEJS-UHFFFAOYSA-N (1-propylpyrrolidin-1-ium-1-yl)methanol Chemical compound CCC[N+]1(CO)CCCC1 YVQWDMIFHBOEJS-UHFFFAOYSA-N 0.000 claims description 2
- KXJPFYHAMWXPCN-UHFFFAOYSA-N (3-butylimidazol-1-ium-1-yl)methanol Chemical compound CCCCN1C=C[N+](CO)=C1 KXJPFYHAMWXPCN-UHFFFAOYSA-N 0.000 claims description 2
- VEVZQYCSTFYXOM-UHFFFAOYSA-N (3-ethylimidazol-1-ium-1-yl)methanol Chemical compound CCN1C=C[N+](CO)=C1 VEVZQYCSTFYXOM-UHFFFAOYSA-N 0.000 claims description 2
- AQCASDGVNZHSRX-UHFFFAOYSA-N (3-methylimidazol-3-ium-1-yl)methanol Chemical compound C[N+]=1C=CN(CO)C=1 AQCASDGVNZHSRX-UHFFFAOYSA-N 0.000 claims description 2
- BBERJYHBIYXBBP-UHFFFAOYSA-N (3-propylimidazol-1-ium-1-yl)methanol Chemical compound CCCN1C=C[N+](CO)=C1 BBERJYHBIYXBBP-UHFFFAOYSA-N 0.000 claims description 2
- QIAZNDAYSCULMI-UHFFFAOYSA-N 1,1-dibutylpyrrolidin-1-ium Chemical compound CCCC[N+]1(CCCC)CCCC1 QIAZNDAYSCULMI-UHFFFAOYSA-N 0.000 claims description 2
- MVHJNCLVABFYGX-UHFFFAOYSA-N 1,1-didecylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCCCCC)CCCC1 MVHJNCLVABFYGX-UHFFFAOYSA-N 0.000 claims description 2
- PWZSCBSKFVJMJH-UHFFFAOYSA-N 1,1-diethylpyrrolidin-1-ium Chemical compound CC[N+]1(CC)CCCC1 PWZSCBSKFVJMJH-UHFFFAOYSA-N 0.000 claims description 2
- MOUSJWBVFFBHRT-UHFFFAOYSA-N 1,1-diheptylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCCCCC)CCCC1 MOUSJWBVFFBHRT-UHFFFAOYSA-N 0.000 claims description 2
- GARJMFRQLMUUDD-UHFFFAOYSA-N 1,1-dimethylpyrrolidin-1-ium Chemical compound C[N+]1(C)CCCC1 GARJMFRQLMUUDD-UHFFFAOYSA-N 0.000 claims description 2
- LXOSCSSPCCNKFZ-UHFFFAOYSA-N 1,1-dioctylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCCCCC)CCCC1 LXOSCSSPCCNKFZ-UHFFFAOYSA-N 0.000 claims description 2
- PUNOSRMSQRHNLX-UHFFFAOYSA-N 1,1-dipentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CCCCC)CCCC1 PUNOSRMSQRHNLX-UHFFFAOYSA-N 0.000 claims description 2
- WBHKHVSKPJNNQD-UHFFFAOYSA-N 1,1-dipropylpyrrolidin-1-ium Chemical compound CCC[N+]1(CCC)CCCC1 WBHKHVSKPJNNQD-UHFFFAOYSA-N 0.000 claims description 2
- PLBBYYNJEHFECS-UHFFFAOYSA-N 1-butyl-1-decylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCC)CCCC1 PLBBYYNJEHFECS-UHFFFAOYSA-N 0.000 claims description 2
- FMSXPWVTZLNVHH-UHFFFAOYSA-N 1-butyl-1-heptylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCC)CCCC1 FMSXPWVTZLNVHH-UHFFFAOYSA-N 0.000 claims description 2
- ISRFWLYSLBASFE-UHFFFAOYSA-N 1-butyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCCC)CCCC1 ISRFWLYSLBASFE-UHFFFAOYSA-N 0.000 claims description 2
- ILEUMJQBHUIAII-UHFFFAOYSA-N 1-butyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCC)CCCC1 ILEUMJQBHUIAII-UHFFFAOYSA-N 0.000 claims description 2
- WNUMOMQLEHPHJX-UHFFFAOYSA-N 1-butyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCC)CCCC1 WNUMOMQLEHPHJX-UHFFFAOYSA-N 0.000 claims description 2
- YBKRPLNRDHUION-UHFFFAOYSA-N 1-butyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CCCC)CCCC1 YBKRPLNRDHUION-UHFFFAOYSA-N 0.000 claims description 2
- HODMCOIBCPNLAO-UHFFFAOYSA-N 1-butyl-1-propylpyrrolidin-1-ium Chemical compound CCCC[N+]1(CCC)CCCC1 HODMCOIBCPNLAO-UHFFFAOYSA-N 0.000 claims description 2
- WCDJCIZOGUUMJB-UHFFFAOYSA-N 1-decyl-1-ethylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CC)CCCC1 WCDJCIZOGUUMJB-UHFFFAOYSA-N 0.000 claims description 2
- RUKAFAVBJNZIMP-UHFFFAOYSA-N 1-decyl-1-heptylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCC)CCCC1 RUKAFAVBJNZIMP-UHFFFAOYSA-N 0.000 claims description 2
- YPKUOQRBNZPMAE-UHFFFAOYSA-N 1-decyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(C)CCCC1 YPKUOQRBNZPMAE-UHFFFAOYSA-N 0.000 claims description 2
- BDNWZFLZTWLUBT-UHFFFAOYSA-N 1-decyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCCCC)CCCC1 BDNWZFLZTWLUBT-UHFFFAOYSA-N 0.000 claims description 2
- HWRXGWLPVNFXHM-UHFFFAOYSA-N 1-decyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCCCCC)CCCC1 HWRXGWLPVNFXHM-UHFFFAOYSA-N 0.000 claims description 2
- YKESTDZOVLJXIU-UHFFFAOYSA-N 1-decyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCCCC)CCCC1 YKESTDZOVLJXIU-UHFFFAOYSA-N 0.000 claims description 2
- PVHVCSARNZGEAH-UHFFFAOYSA-N 1-decyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCCCCC[N+]1(CCC)CCCC1 PVHVCSARNZGEAH-UHFFFAOYSA-N 0.000 claims description 2
- PAYARTBUZGCOKP-UHFFFAOYSA-N 1-ethyl-1-heptylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CC)CCCC1 PAYARTBUZGCOKP-UHFFFAOYSA-N 0.000 claims description 2
- VNVSNJDXLYCKSH-UHFFFAOYSA-N 1-ethyl-1-hexylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CC)CCCC1 VNVSNJDXLYCKSH-UHFFFAOYSA-N 0.000 claims description 2
- NIHOUJYFWMURBG-UHFFFAOYSA-N 1-ethyl-1-methylpyrrolidin-1-ium Chemical compound CC[N+]1(C)CCCC1 NIHOUJYFWMURBG-UHFFFAOYSA-N 0.000 claims description 2
- GJGKIAQBXIXHST-UHFFFAOYSA-N 1-ethyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CC)CCCC1 GJGKIAQBXIXHST-UHFFFAOYSA-N 0.000 claims description 2
- KIJDSYJKWLPZBL-UHFFFAOYSA-N 1-ethyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CC)CCCC1 KIJDSYJKWLPZBL-UHFFFAOYSA-N 0.000 claims description 2
- BUPNNPKTBYFKKC-UHFFFAOYSA-N 1-ethyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CC)CCCC1 BUPNNPKTBYFKKC-UHFFFAOYSA-N 0.000 claims description 2
- QNXMTMCQDZQADU-UHFFFAOYSA-N 1-ethyl-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(CC)CCCC1 QNXMTMCQDZQADU-UHFFFAOYSA-N 0.000 claims description 2
- XZDPRAGZNFQVIM-UHFFFAOYSA-N 1-heptyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(C)CCCC1 XZDPRAGZNFQVIM-UHFFFAOYSA-N 0.000 claims description 2
- OHLOVGBCBDFCNI-UHFFFAOYSA-N 1-heptyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCCCC)CCCC1 OHLOVGBCBDFCNI-UHFFFAOYSA-N 0.000 claims description 2
- XTGOIQCVRRNXNS-UHFFFAOYSA-N 1-heptyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCCCC)CCCC1 XTGOIQCVRRNXNS-UHFFFAOYSA-N 0.000 claims description 2
- WDOMGVJEVDMYAG-UHFFFAOYSA-N 1-heptyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCCCC)CCCC1 WDOMGVJEVDMYAG-UHFFFAOYSA-N 0.000 claims description 2
- BRBIHAQFQIFSDL-UHFFFAOYSA-N 1-heptyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCC[N+]1(CCC)CCCC1 BRBIHAQFQIFSDL-UHFFFAOYSA-N 0.000 claims description 2
- FKBYITRYIIAMSU-UHFFFAOYSA-N 1-hexyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCCCC)CCCC1 FKBYITRYIIAMSU-UHFFFAOYSA-N 0.000 claims description 2
- QUCGEEIXOHYZCR-UHFFFAOYSA-N 1-hexyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(CCC)CCCC1 QUCGEEIXOHYZCR-UHFFFAOYSA-N 0.000 claims description 2
- LMSPMULSARFKPJ-UHFFFAOYSA-N 1-methyl-1-nonylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(C)CCCC1 LMSPMULSARFKPJ-UHFFFAOYSA-N 0.000 claims description 2
- RRYKUXCBJXYIOD-UHFFFAOYSA-N 1-methyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(C)CCCC1 RRYKUXCBJXYIOD-UHFFFAOYSA-N 0.000 claims description 2
- YQFWGCSKGJMGHE-UHFFFAOYSA-N 1-methyl-1-propylpyrrolidin-1-ium Chemical compound CCC[N+]1(C)CCCC1 YQFWGCSKGJMGHE-UHFFFAOYSA-N 0.000 claims description 2
- DQFPYJGJBDHTAL-UHFFFAOYSA-N 1-nonyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCCCCC)CCCC1 DQFPYJGJBDHTAL-UHFFFAOYSA-N 0.000 claims description 2
- SQNQYKHBPGSNRN-UHFFFAOYSA-N 1-nonyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCCCC)CCCC1 SQNQYKHBPGSNRN-UHFFFAOYSA-N 0.000 claims description 2
- OPMLTMOJVRKEFK-UHFFFAOYSA-N 1-nonyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCCCC[N+]1(CCC)CCCC1 OPMLTMOJVRKEFK-UHFFFAOYSA-N 0.000 claims description 2
- YWVAERUMTYYRBP-UHFFFAOYSA-N 1-octyl-1-pentylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCCCC)CCCC1 YWVAERUMTYYRBP-UHFFFAOYSA-N 0.000 claims description 2
- OOEBEUFXBPCKMQ-UHFFFAOYSA-N 1-octyl-1-propylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(CCC)CCCC1 OOEBEUFXBPCKMQ-UHFFFAOYSA-N 0.000 claims description 2
- XVNWJRAXYYMXSF-UHFFFAOYSA-N 1-pentyl-1-propylpyrrolidin-1-ium Chemical compound CCCCC[N+]1(CCC)CCCC1 XVNWJRAXYYMXSF-UHFFFAOYSA-N 0.000 claims description 2
- NDPHLMDQAUCGNE-UHFFFAOYSA-N 2-(1-butylpyrrolidin-1-ium-1-yl)ethanol Chemical compound CCCC[N+]1(CCO)CCCC1 NDPHLMDQAUCGNE-UHFFFAOYSA-N 0.000 claims description 2
- GGNFSHMDTJHQCJ-UHFFFAOYSA-N 2-(1-ethylpyrrolidin-1-ium-1-yl)ethanol Chemical compound OCC[N+]1(CC)CCCC1 GGNFSHMDTJHQCJ-UHFFFAOYSA-N 0.000 claims description 2
- LDJQSBUDLXCWRU-UHFFFAOYSA-N 2-(1-methylpyrrolidin-1-ium-1-yl)ethanol Chemical compound OCC[N+]1(C)CCCC1 LDJQSBUDLXCWRU-UHFFFAOYSA-N 0.000 claims description 2
- GBUDBMKIXILJTK-UHFFFAOYSA-N 2-(1-propylpyrrolidin-1-ium-1-yl)ethanol Chemical compound CCC[N+]1(CCO)CCCC1 GBUDBMKIXILJTK-UHFFFAOYSA-N 0.000 claims description 2
- LDPLFDDQVOYUFR-UHFFFAOYSA-N 2-(3-butylimidazol-3-ium-1-yl)ethanol Chemical compound CCCC[N+]=1C=CN(CCO)C=1 LDPLFDDQVOYUFR-UHFFFAOYSA-N 0.000 claims description 2
- GFNBXRZHUSGVDY-UHFFFAOYSA-N 2-(3-ethylimidazol-1-ium-1-yl)ethanol Chemical compound CCN1C=C[N+](CCO)=C1 GFNBXRZHUSGVDY-UHFFFAOYSA-N 0.000 claims description 2
- GZGCSDDVMNLPCW-UHFFFAOYSA-N 2-(3-propylimidazol-3-ium-1-yl)ethanol Chemical compound CCC[N+]=1C=CN(CCO)C=1 GZGCSDDVMNLPCW-UHFFFAOYSA-N 0.000 claims description 2
- DGGABWSTMPGDPJ-UHFFFAOYSA-N 2-[3-(2-hydroxyethyl)imidazol-3-ium-1-yl]ethanol Chemical compound OCCN1C=C[N+](CCO)=C1 DGGABWSTMPGDPJ-UHFFFAOYSA-N 0.000 claims description 2
- PPGIQUIOYKTBGB-UHFFFAOYSA-N 2-[3-(hydroxymethyl)imidazol-3-ium-1-yl]ethanol Chemical compound OCCN1C=C[N+](CO)=C1 PPGIQUIOYKTBGB-UHFFFAOYSA-N 0.000 claims description 2
- UNLQIRXDGQFNFJ-UHFFFAOYSA-N 3-(1-butylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound CCCC[N+]1(CCCO)CCCC1 UNLQIRXDGQFNFJ-UHFFFAOYSA-N 0.000 claims description 2
- HCXNIZVQQSKHEO-UHFFFAOYSA-N 3-(1-ethylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound OCCC[N+]1(CC)CCCC1 HCXNIZVQQSKHEO-UHFFFAOYSA-N 0.000 claims description 2
- GVECPPQYIUUGEG-UHFFFAOYSA-N 3-(1-methylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound OCCC[N+]1(C)CCCC1 GVECPPQYIUUGEG-UHFFFAOYSA-N 0.000 claims description 2
- HIPFJLVAAYVWTP-UHFFFAOYSA-N 3-(1-propylpyrrolidin-1-ium-1-yl)propan-1-ol Chemical compound OCCC[N+]1(CCC)CCCC1 HIPFJLVAAYVWTP-UHFFFAOYSA-N 0.000 claims description 2
- FOWQARDLXGAQRN-UHFFFAOYSA-N 3-(3-butylimidazol-1-ium-1-yl)propan-1-ol Chemical compound CCCCN1C=C[N+](CCCO)=C1 FOWQARDLXGAQRN-UHFFFAOYSA-N 0.000 claims description 2
- LHCYGBJTVGBXMH-UHFFFAOYSA-N 3-(3-ethylimidazol-1-ium-1-yl)propan-1-ol Chemical compound CCN1C=C[N+](CCCO)=C1 LHCYGBJTVGBXMH-UHFFFAOYSA-N 0.000 claims description 2
- ZFXCYNGTSCSHND-UHFFFAOYSA-N 3-(3-methylimidazol-3-ium-1-yl)propan-1-ol Chemical compound CN1C=C[N+](CCCO)=C1 ZFXCYNGTSCSHND-UHFFFAOYSA-N 0.000 claims description 2
- GZBDPALRWLLVBU-UHFFFAOYSA-N 3-(3-propylimidazol-3-ium-1-yl)propan-1-ol Chemical compound CCC[N+]=1C=CN(CCCO)C=1 GZBDPALRWLLVBU-UHFFFAOYSA-N 0.000 claims description 2
- PUBXWGIBQLCGSE-UHFFFAOYSA-N 3-[3-(3-hydroxypropyl)imidazol-3-ium-1-yl]propan-1-ol Chemical compound OCCCN1C=C[N+](CCCO)=C1 PUBXWGIBQLCGSE-UHFFFAOYSA-N 0.000 claims description 2
- YLZOIGIGIUGUSJ-UHFFFAOYSA-N 3-[3-(hydroxymethyl)imidazol-3-ium-1-yl]propan-1-ol Chemical compound OCCCN1C=C[N+](CO)=C1 YLZOIGIGIUGUSJ-UHFFFAOYSA-N 0.000 claims description 2
- ICVJRSZVDGARPC-UHFFFAOYSA-N 4-(1-butylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(CCCC)CCCC1 ICVJRSZVDGARPC-UHFFFAOYSA-N 0.000 claims description 2
- VEQDOHACAIHPFT-UHFFFAOYSA-N 4-(1-methylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(C)CCCC1 VEQDOHACAIHPFT-UHFFFAOYSA-N 0.000 claims description 2
- WHTFCBOOYUIFFO-UHFFFAOYSA-N 4-(1-propylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(CCC)CCCC1 WHTFCBOOYUIFFO-UHFFFAOYSA-N 0.000 claims description 2
- PPGVIPXHAGRNMN-UHFFFAOYSA-N 4-(3-butylimidazol-1-ium-1-yl)butan-1-ol Chemical compound CCCCN1C=C[N+](CCCCO)=C1 PPGVIPXHAGRNMN-UHFFFAOYSA-N 0.000 claims description 2
- MYQCBZAULVPTBL-UHFFFAOYSA-N 4-(3-ethylimidazol-1-ium-1-yl)butan-1-ol Chemical compound CCN1C=C[N+](CCCCO)=C1 MYQCBZAULVPTBL-UHFFFAOYSA-N 0.000 claims description 2
- JWNPODYIPACARY-UHFFFAOYSA-N 4-(3-methylimidazol-3-ium-1-yl)butan-1-ol Chemical compound CN1C=C[N+](CCCCO)=C1 JWNPODYIPACARY-UHFFFAOYSA-N 0.000 claims description 2
- ZJMMNXDGWMUPMY-UHFFFAOYSA-N 4-(3-propylimidazol-3-ium-1-yl)butan-1-ol Chemical compound CCC[N+]=1C=CN(CCCCO)C=1 ZJMMNXDGWMUPMY-UHFFFAOYSA-N 0.000 claims description 2
- CYMIKBRKDBLTAH-UHFFFAOYSA-N 4-[3-(4-hydroxybutyl)imidazol-3-ium-1-yl]butan-1-ol Chemical compound OCCCCN1C=C[N+](CCCCO)=C1 CYMIKBRKDBLTAH-UHFFFAOYSA-N 0.000 claims description 2
- QHTZRPBAMGGUNI-UHFFFAOYSA-N 4-[3-(hydroxymethyl)imidazol-3-ium-1-yl]butan-1-ol Chemical compound OCCCCN1C=C[N+](CO)=C1 QHTZRPBAMGGUNI-UHFFFAOYSA-N 0.000 claims description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims description 2
- PLZVEHJLHYMBBY-UHFFFAOYSA-N Tetradecylamine Chemical compound CCCCCCCCCCCCCCN PLZVEHJLHYMBBY-UHFFFAOYSA-N 0.000 claims description 2
- GCUFXCLKSWFPLD-UHFFFAOYSA-N [3-(hydroxymethyl)imidazol-3-ium-1-yl]methanol Chemical compound OCN1C=C[N+](CO)=C1 GCUFXCLKSWFPLD-UHFFFAOYSA-N 0.000 claims description 2
- 150000008051 alkyl sulfates Chemical class 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- YOMFVLRTMZWACQ-UHFFFAOYSA-N ethyltrimethylammonium Chemical compound CC[N+](C)(C)C YOMFVLRTMZWACQ-UHFFFAOYSA-N 0.000 claims description 2
- 150000002367 halogens Chemical group 0.000 claims description 2
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 claims description 2
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- VWGARRKCFILYNY-UHFFFAOYSA-N tetra(nonyl)azanium Chemical compound CCCCCCCCC[N+](CCCCCCCCC)(CCCCCCCCC)CCCCCCCCC VWGARRKCFILYNY-UHFFFAOYSA-N 0.000 claims description 2
- WCKZOASXBBGEKB-UHFFFAOYSA-N tetra(nonyl)phosphanium Chemical compound CCCCCCCCC[P+](CCCCCCCCC)(CCCCCCCCC)CCCCCCCCC WCKZOASXBBGEKB-UHFFFAOYSA-N 0.000 claims description 2
- 125000005497 tetraalkylphosphonium group Chemical group 0.000 claims description 2
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 claims description 2
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 claims description 2
- DAUOXRUBCACRRL-UHFFFAOYSA-N tetradecylphosphane Chemical compound CCCCCCCCCCCCCCP DAUOXRUBCACRRL-UHFFFAOYSA-N 0.000 claims description 2
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 claims description 2
- SZWHXXNVLACKBV-UHFFFAOYSA-N tetraethylphosphanium Chemical compound CC[P+](CC)(CC)CC SZWHXXNVLACKBV-UHFFFAOYSA-N 0.000 claims description 2
- YFZDLRVCXDBOPH-UHFFFAOYSA-N tetraheptylazanium Chemical compound CCCCCCC[N+](CCCCCCC)(CCCCCCC)CCCCCCC YFZDLRVCXDBOPH-UHFFFAOYSA-N 0.000 claims description 2
- ATWHYDCJSAROQC-UHFFFAOYSA-N tetraheptylphosphanium Chemical compound CCCCCCC[P+](CCCCCCC)(CCCCCCC)CCCCCCC ATWHYDCJSAROQC-UHFFFAOYSA-N 0.000 claims description 2
- DTIFFPXSSXFQCJ-UHFFFAOYSA-N tetrahexylazanium Chemical compound CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC DTIFFPXSSXFQCJ-UHFFFAOYSA-N 0.000 claims description 2
- AGWJLDNNUJKAHP-UHFFFAOYSA-N tetrahexylphosphanium Chemical compound CCCCCC[P+](CCCCCC)(CCCCCC)CCCCCC AGWJLDNNUJKAHP-UHFFFAOYSA-N 0.000 claims description 2
- BXYHVFRRNNWPMB-UHFFFAOYSA-N tetramethylphosphanium Chemical compound C[P+](C)(C)C BXYHVFRRNNWPMB-UHFFFAOYSA-N 0.000 claims description 2
- CHYBTAZWINMGHA-UHFFFAOYSA-N tetraoctylazanium Chemical compound CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC CHYBTAZWINMGHA-UHFFFAOYSA-N 0.000 claims description 2
- WFIYFFUAOQKJJS-UHFFFAOYSA-N tetraoctylphosphanium Chemical compound CCCCCCCC[P+](CCCCCCCC)(CCCCCCCC)CCCCCCCC WFIYFFUAOQKJJS-UHFFFAOYSA-N 0.000 claims description 2
- GJSGYPDDPQRWPK-UHFFFAOYSA-N tetrapentylammonium Chemical compound CCCCC[N+](CCCCC)(CCCCC)CCCCC GJSGYPDDPQRWPK-UHFFFAOYSA-N 0.000 claims description 2
- LRPOXSSMNVVCMT-UHFFFAOYSA-N tetrapentylphosphanium Chemical compound CCCCC[P+](CCCCC)(CCCCC)CCCCC LRPOXSSMNVVCMT-UHFFFAOYSA-N 0.000 claims description 2
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 claims description 2
- XOGCTUKDUDAZKA-UHFFFAOYSA-N tetrapropylphosphanium Chemical compound CCC[P+](CCC)(CCC)CCC XOGCTUKDUDAZKA-UHFFFAOYSA-N 0.000 claims description 2
- SEACXNRNJAXIBM-UHFFFAOYSA-N triethyl(methyl)azanium Chemical compound CC[N+](C)(CC)CC SEACXNRNJAXIBM-UHFFFAOYSA-N 0.000 claims description 2
- OWQCSRQHMPMJOK-UHFFFAOYSA-N 4-(1-ethylpyrrolidin-1-ium-1-yl)butan-1-ol Chemical compound OCCCC[N+]1(CC)CCCC1 OWQCSRQHMPMJOK-UHFFFAOYSA-N 0.000 claims 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 24
- 229910052697 platinum Inorganic materials 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 10
- LNBXMNQCXXEHFT-UHFFFAOYSA-N selenium tetrachloride Chemical compound Cl[Se](Cl)(Cl)Cl LNBXMNQCXXEHFT-UHFFFAOYSA-N 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- HSLXOARVFIWOQF-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-butyl-1-methylpyrrolidin-1-ium Chemical compound CCCC[N+]1(C)CCCC1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F HSLXOARVFIWOQF-UHFFFAOYSA-N 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 238000002848 electrochemical method Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- VTQZBGAODFEJOW-UHFFFAOYSA-N selenium tetrabromide Chemical compound Br[Se](Br)(Br)Br VTQZBGAODFEJOW-UHFFFAOYSA-N 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 2
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 description 2
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 2
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 2
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 2
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 2
- 125000000474 3-butynyl group Chemical group [H]C#CC([H])([H])C([H])([H])* 0.000 description 2
- 125000004180 3-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(F)=C1[H] 0.000 description 2
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910006069 SO3H Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- GIIZYNGNGTZORC-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;2-(3-methylimidazol-3-ium-1-yl)ethanol Chemical compound CN1C=C[N+](CCO)=C1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F GIIZYNGNGTZORC-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000002484 cyclic voltammetry Methods 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000006038 hexenyl group Chemical group 0.000 description 2
- 125000005980 hexynyl group Chemical group 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 2
- 125000005246 nonafluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 2
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- DOYSIZKQWJYULQ-UHFFFAOYSA-N 1,1,2,2,2-pentafluoro-n-(1,1,2,2,2-pentafluoroethylsulfonyl)ethanesulfonamide Chemical compound FC(F)(F)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)C(F)(F)F DOYSIZKQWJYULQ-UHFFFAOYSA-N 0.000 description 1
- GKNWQHIXXANPTN-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-N 0.000 description 1
- XBWQFDNGNOOMDZ-UHFFFAOYSA-N 1,1,2,2,3,3,3-heptafluoropropane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)F XBWQFDNGNOOMDZ-UHFFFAOYSA-N 0.000 description 1
- PBMCNXWCDKJXRU-UHFFFAOYSA-N 1-[bis(1,1,2,2,2-pentafluoroethylsulfonyl)methylsulfonyl]-1,1,2,2,2-pentafluoroethane Chemical compound FC(F)(F)C(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)C(F)(F)F)S(=O)(=O)C(F)(F)C(F)(F)F PBMCNXWCDKJXRU-UHFFFAOYSA-N 0.000 description 1
- WZJDNKTZWIOOJE-UHFFFAOYSA-M 1-butyl-1-methylpyrrolidin-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+]1(C)CCCC1 WZJDNKTZWIOOJE-UHFFFAOYSA-M 0.000 description 1
- VJGVQNNAIRBPJB-UHFFFAOYSA-M 1-hexyl-1-methylpyrrolidin-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCCCC[N+]1(C)CCCC1 VJGVQNNAIRBPJB-UHFFFAOYSA-M 0.000 description 1
- CMHSNYURXVUPJO-UHFFFAOYSA-M 1-methyl-1-octylpyrrolidin-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCCCCCC[N+]1(C)CCCC1 CMHSNYURXVUPJO-UHFFFAOYSA-M 0.000 description 1
- 125000004214 1-pyrrolidinyl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001462 1-pyrrolyl group Chemical group [*]N1C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000006276 2-bromophenyl group Chemical group [H]C1=C([H])C(Br)=C(*)C([H])=C1[H] 0.000 description 1
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 1
- 125000004198 2-fluorophenyl group Chemical group [H]C1=C([H])C(F)=C(*)C([H])=C1[H] 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000006304 2-iodophenyl group Chemical group [H]C1=C([H])C(I)=C(*)C([H])=C1[H] 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000004485 2-pyrrolidinyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])([H])C1([H])* 0.000 description 1
- 125000000389 2-pyrrolyl group Chemical group [H]N1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000005809 3,4,5-trimethoxyphenyl group Chemical group [H]C1=C(OC([H])([H])[H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 1
- 125000004211 3,5-difluorophenyl group Chemical group [H]C1=C(F)C([H])=C(*)C([H])=C1F 0.000 description 1
- 125000006275 3-bromophenyl group Chemical group [H]C1=C([H])C(Br)=C([H])C(*)=C1[H] 0.000 description 1
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 description 1
- 125000003682 3-furyl group Chemical group O1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- 125000006305 3-iodophenyl group Chemical group [H]C1=C([H])C(I)=C([H])C(*)=C1[H] 0.000 description 1
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000004575 3-pyrrolidinyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001397 3-pyrrolyl group Chemical group [H]N1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- 125000001541 3-thienyl group Chemical group S1C([H])=C([*])C([H])=C1[H] 0.000 description 1
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- 125000006306 4-iodophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1I 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- KDDQRKBRJSGMQE-UHFFFAOYSA-N 4-thiazolyl Chemical compound [C]1=CSC=N1 KDDQRKBRJSGMQE-UHFFFAOYSA-N 0.000 description 1
- 125000004539 5-benzimidazolyl group Chemical group N1=CNC2=C1C=CC(=C2)* 0.000 description 1
- CWDWFSXUQODZGW-UHFFFAOYSA-N 5-thiazolyl Chemical group [C]1=CN=CS1 CWDWFSXUQODZGW-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- WHLFUNXODNBHOT-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-hexyl-1-methylpyrrolidin-1-ium Chemical compound CCCCCC[N+]1(C)CCCC1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F WHLFUNXODNBHOT-UHFFFAOYSA-N 0.000 description 1
- IZSJXAHBNZXKSK-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-methyl-1-octylpyrrolidin-1-ium Chemical compound CCCCCCCC[N+]1(C)CCCC1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F IZSJXAHBNZXKSK-UHFFFAOYSA-N 0.000 description 1
- UQWLFOMXECTXNQ-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F UQWLFOMXECTXNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical group [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000002100 cyclohexa-1,3-dienyl group Chemical group [H]C1([*])C([H])=C([H])C([H])=C([H])C1([H])[H] 0.000 description 1
- 125000002150 cyclohexa-1,4-dienyl group Chemical group [H]C1=C([H])C([H])(*)C([H])=C([H])C1([H])[H] 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- ZZEMEJKDTZOXOI-UHFFFAOYSA-N digallium;selenium(2-) Chemical compound [Ga+3].[Ga+3].[Se-2].[Se-2].[Se-2] ZZEMEJKDTZOXOI-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000005069 octynyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C#C* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004346 phenylpentyl group Chemical group C1(=CC=CC=C1)CCCCC* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- IWZKICVEHNUQTL-UHFFFAOYSA-M potassium hydrogen phthalate Chemical compound [K+].OC(=O)C1=CC=CC=C1C([O-])=O IWZKICVEHNUQTL-UHFFFAOYSA-M 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000002206 pyridazin-3-yl group Chemical group [H]C1=C([H])C([H])=C(*)N=N1 0.000 description 1
- 125000004940 pyridazin-4-yl group Chemical group N1=NC=C(C=C1)* 0.000 description 1
- 125000006513 pyridinyl methyl group Chemical group 0.000 description 1
- 125000000246 pyrimidin-2-yl group Chemical group [H]C1=NC(*)=NC([H])=C1[H] 0.000 description 1
- 125000004527 pyrimidin-4-yl group Chemical group N1=CN=C(C=C1)* 0.000 description 1
- 125000004528 pyrimidin-5-yl group Chemical group N1=CN=CC(=C1)* 0.000 description 1
- 125000004943 pyrimidin-6-yl group Chemical group N1=CN=CC=C1* 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
Definitions
- the invention relates to a process for the electrochemical deposition of selenium on a substrate in an ionic liquid.
- Selenium has a number of properties which make it suitable for many areas of application in photovoltaics and electronics.
- Selenium is a photosemiconductor which changes (increases) its conductivity by a number of orders of magnitude on exposure to visible light.
- selenium is transparent to wavelengths greater than 650 nm.
- Selenium is often employed as a constituent in thin-film solar cells in combination with Cu and indium, as described, for example, in DE 44 47 866 or in DE 199 177 58.
- the production processes usually mentioned for the production of these systems either all film components are deposited by evaporation processes or only copper or indium is applied by electroplating. In both cases, the selenium is preferably applied via the gas phase in an evaporator.
- Electrochemical deposition of copper indium gallium diselenide is described in US 2004/0206390.
- the electrochemical deposition there is carried out in a buffered bath comprising potassium biphthalate and amidosulfuric acid.
- the said components are said to scavenge H + and OH ⁇ ions formed by electrolysis.
- the said process is overall unsuitable for the deposition of a single selenium phase.
- the electrolytic deposition of selenium is described in U.S. Pat. No. 2,414,438.
- the deposition is carried out in aqueous alkaline solutions of ammonium selenides, alkali metal selenides or alkaline earth metal selenides.
- the deposition is made more difficult since amorphous or glass-like red selenium, which has poor electron conductivity, is usually deposited in the room-temperature region. Only at elevated temperature is a grey, metallic phase deposited, but the deposits do not consist uniquely of grey selenium, even at temperatures around 100° C. Higher temperatures, which would promote the deposition of grey selenium, are excluded in open electroplating baths. However, the electrochemical deposition would facilitate continuous operation in the form of vat electroplating without closed evaporators or sputtering devices.
- the object of the invention was to find an alternative method for the electrochemical deposition of grey selenium.
- the object is achieved by the process according to the invention.
- the invention relates to a process for the electrochemical deposition of grey selenium on a substrate in at least one ionic liquid.
- the deposition of grey selenium is carried out on a very wide variety of substrates in a very wide variety of applications.
- the deposition can serve exclusively for the deposition of selenium, but can also be employed in combination with the deposition of further materials, such as, for example, copper or indium.
- the ionic liquids which are suitable for the process according to the invention are highly conductive and are generally thermally stable up to 400° C.
- ionic liquids which are electrochemically stable under the deposition conditions described below They have, for example, an electrochemical window in the cathodic branch which extends from 0 mV to ⁇ 3500 mV against ferrocene/ferrocinium, preferably from ⁇ 2000 mV to ⁇ 3000 mV against ferrocene/ferrocinium.
- suitable ionic liquids have an electrochemical window which extends from 0 mV to +3500 mv against ferrocene/ferrocinium, preferably from +2000 to +3000 mV against ferrocene/ferrocinium.
- the data relate to the measurement arrangements and conditions described below.
- Suitable ionic liquids contain, in particular, at least one tetraalkylammonium or tetraalkylphosphonium cation, where the alkyl groups may each, independently of one another, have 1 to 10 C atoms, or a heterocyclic cation selected from
- R 1 ′ to R 4 ′ each, independently of one another, denote
- R 1 ′, R 2 ′, R 3 ′ and/or R 4 ′ together may also form a ring system
- substituents R 1 ′, to R 4 ′ may be partially or fully substituted by halogens, in particular —F and/or —Cl, or —OR′, —CN, —C(O)OH, —C(O)NR′ 2 , —SO 2 NR′ 2 , —C(O)X, —SO 2 OH, —SO 2 X, —NO 2 , but where R 1 ′ and R 4 ′ cannot simultaneously be fully substituted by halogens, and where one or two non-adjacent and non-heteroatom-bonded carbon atoms of the substituents R 1 ′ to R 4 ′ may be replaced by atoms and/or atomic groups selected from —O—, —S—, —S(O)—, —SO 2 —, —C(O)—, —N + R′ 2 —, —C(O)NR′—, —SO 2 NR′—, —P(O)(
- R 2 ′ or R 3 ′ is in each case, independently of one another, in particular hydrogen, methyl, ethyl, isopropyl, propyl, butyl, sec-butyl, tert-butyl, cyclohexyl, phenyl or benzyl.
- R 2 ′ is particularly preferably hydrogen, methyl, ethyl, isopropyl, propyl, butyl or secbutyl.
- R 2 ′ and R 3 ′ are very particularly preferably hydrogen.
- the C 1 -C 12 -alkyl group is, for example, methyl, ethyl, isopropyl, propyl, butyl, sec-butyl or tert-butyl, furthermore also pentyl, 1-, 2- or 3-methylbutyl, 1,1-, 1,2- or 2,2-dimethylpropyl, 1-ethylpropyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl or dodecyl.
- a straight-chain or branched alkenyl having 2 to 20 C atoms, in which, in addition, a plurality of double bonds may be present, is, for example, allyl, 2- or 3-butenyl, isobutenyl, sec-butenyl, furthermore 4-pentenyl, isopentenyl, hexenyl, heptenyl, octenyl, —C 9 H 17 , —C 10 H 19 to —C 20 H 39 ; preferably allyl, 2- or 3-butenyl, isobutenyl, sec-butenyl, preference is furthermore given to 4-pentenyl, isopentenyl or hexenyl.
- a straight-chain or branched alkynyl having 2 to 20 C atoms, in which, in addition, a plurality of triple bonds may be present, is, for example, ethynyl, 1- or 2-propynyl, 2- or 3-butynyl, furthermore 4-pentynyl, 3-pentynyl, hexynyl, heptynyl, octynyl, —C 9 H 15 , —C 10 H 17 to —C 20 H 37 , preferably ethynyl, 1- or 2-propynyl, 2- or 3-butynyl, 4-pentynyl, 3-pentynyl or hexynyl.
- Aryl-C 1 -C 6 -alkyl denotes, for example, benzyl, phenylethyl, phenylpropyl, phenylbutyl, phenylpentyl or phenylhexyl, where both the phenyl ring and also the alkylene chain may, as described above, be partially or fully substituted by halogens, in particular —F and/or —Cl, or partially by —OR′, —CN, —C(O)OH, —C(O)NR′ 2 , —SO 2 NR′ 2 , —C(O)X, —SO 2 OH, —SO 2 X, —NO 2 .
- Unsubstituted saturated or partially or fully unsaturated cycloalkyl groups having 3-7 C atoms are therefore cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclopentenyl, cyclopenta-1,3-dienyl, cyclohexenyl, cyclohexa-1,3-dienyl, cyclohexa-1,4-dienyl, phenyl, cycloheptenyl, cyclohepta-1,3-dienyl, cyclohepta-1,4-dienyl or cyclohepta-1,5-dienyl, each of which may be substituted by C 1 — to C 6 -alkyl groups, where the cycloalkyl group or the cycloalkyl group which is substituted by C 1 — to C 6 -alkyl groups may in turn also be substituted by hal
- substituents R 1 ′ to R 4 ′ modified in this way are: —OCH 3 , —OCH(CH 3 ) 2 , —CH 2 OCH 3 , —CH 2 —CH 2 —O—CH 3 , —C 2 H 4 OCH(CH 3 ) 2 , —C 2 H 4 SC 2 H 5 , —C 2 H 4 SCH(CH 3 ) 2 , —S(O)CH 3 , —SO 2 CH 3 , —SO 2 C 6 H 5 , —SO 2 C 3 H 7 , —SO 2 CH(CH 3 ) 2 , —SO 2 CH 2 CF 3 , —CH 2 SO 2 CH 3 , —O—C 4 H 8 —O—C 4 H 9 , —CF 3 , —C 2 F 5 , —C 3 F 7 , —C 4 F 9 , —C(CF 3 ) 3 , —CF 2 SO 2 CF 3
- C 3 — to C 7 -cycloalkyl is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl or cycloheptyl.
- substituted phenyl denotes phenyl which is substituted by C 1 — to C 6 -alkyl, C 1 — to C 6 -alkenyl, NO 2 , F, Cl, Br, I, C 1 -C 6 -alkoxy, SCF 3 , SO 2 CF 3 , COOH, SO 2 X′, SO 2 NR′′ 2 or SO 3 H, where X′ denotes F, Cl or Br and R′′ denotes a non-, partially or perfluorinated C 1 — to C 6 -alkyl or C 3 — to C 7 -cycloalkyl as defined for R′, for example, o-, m- or p-methylphenyl, o-, m- or p-ethylphenyl, o-, m- or p-propylphenyl, o-, m- or p-isopropylphenyl, o-, m- or p-
- heteroaryl is taken to mean a saturated or unsaturated mono- or bicyclic heterocyclic radical having 5 to 13 ring members, where 1, 2 or 3 N and/or 1 or 2 S or O atoms may be present and the heterocyclic radical may be mono- or polysubstituted by C 1 — to C 6 -alkyl, C 1 — to C 6 -alkenyl, NO 2 , F, Cl, Br, I, C 1 -C 6 -alkoxy, SCF 3 , SO 2 CF 3 , COOH, SO 2 X′, SO 2 NR′′ 2 or SO 3 H, where X′ and R′′ have a meaning indicated above.
- the heterocyclic radical is preferably substituted or unsubstituted 2- or 3-furyl, 2- or 3-thienyl, 1-, 2- or 3-pyrrolyl, 1-, 2-, 4- or 5-imidazolyl, 3-, 4- or 5-pyrazolyl, 2-, 4- or 5-oxazolyl, 3-, 4- or 5-isoxazolyl, 2-, 4- or 5-thiazolyl, 3-, 4- or 5-isothiazolyl, 2-, 3- or 4-pyridyl, 2-, 4-, 5- or 6-pyrimidinyl, furthermore preferably 1,2,3-triazol-1-, -4- or -5-yl, 1,2,4-triazol-1-, -4- or -5-yl, 1- or 5-tetrazolyl, 1,2,3-oxadiazol-4- or -5-yl 1,2,4-oxadiazol-3- or -5-yl, 1,3,4-thiadiazol-2- or -5-yl, 1,2,4-thiadiazol-3- or -5-yl, 1,
- Heteroaryl-C 1 -C 6 -alkyl is now, analogously to aryl-C 1 -C 6 -alkyl, taken to mean for example pyridinylmethyl, pyridinylethyl, pyridinylpropyl, pyridinylbutyl, pyridinylpentyl, pyridinylhexyl, where furthermore the heterocyclic radicals described above may be linked to the alkylene chain in this way.
- R 1 ′ to R 4 ′ are, in particular, alkyl groups having 1 to 10 C atoms or hydroxyalkyl groups having 1 to 10 C atoms.
- Particularly suitable ionic liquids contain a tetraalkylammonium, tetraalkylphosphonium, 1,1-dialkylpyrrolidinium, 1-hydroxyalkyl-1-alkylpyrrolidinium, 1-hydroxyalkyl-3-alkylimidazolium or 1,3-bis(hydroxyalkyl)imidazolium cation, where the alkyl groups or the alkylene chain of the hydroxyalkyl group may each, independently of one another, have 1 to 10 C atoms.
- alkyl group having 1 to 10 C atoms is taken to mean, for example, methyl, ethyl, isopropyl, propyl, butyl, sec-butyl or tert-butyl, furthermore also pentyl, 1-, 2- or 3-methylbutyl, 1,1-, 1,2- or 2,2-dimethylpropyl, 1-ethylpropyl, hexyl, heptyl, octyl, nonyl or decyl.
- the alkyl groups may also be partially or fully substituted by fluorine.
- Fluorinated alkyl groups are, for example, difluoromethyl, trifluoromethyl, pentafluoroethyl, pentafluoropropyl, heptafluoropropyl, heptafluorobutyl or nonafluorobutyl.
- a hydroxyalkyl group having 1 to 10 C atoms is taken to mean, for example, 1-hydroxymethyl, 2-hydroxyethyl, 3-hydroxyropyl, 4-hydroxybutyl, furthermore also 5-hydroxypentyl, 6-hydroxyhexyl, 7-hydroxyheptyl, 8-hydroxyoctyl, 9-hydroxynonyl or 10-hydroxydecyl.
- the alkylene chain of the hydroxyl group may also be partially or fully substituted by fluorine.
- Fluorinated hydroxyalkyl groups can be described, for example, by the sub-formulae —(CHF) n —OH or —(CF 2 ) n —OH, where n can denote 1, 2, 3, 4, 5, 6, 7, 8, 9 or 10.
- Suitable anions which, in combination with the cations according to the invention, satisfy the above-mentioned condition with respect to stability can be selected from the group PF 6 , BF 4 , alkylsulfate, perfluoroalkylsulfonate, perfluoroacetate, bis(fluorosulfonyl)imide, bis(perfluoroalkylsulfonyl)imide, tris(perfluoroalkyl)trifluorophosphate, bis(perfluoroalkyl)tetrafluorophosphate, tris(perfluoroalkylsulfonyl)methide or perfluoroalkylborate.
- perfluoroalkyl group means that all H atoms of the corresponding alkyl group have been replaced by F atoms.
- the alkyl or perfluoroalkyl groups in the anions indicated preferably each, independently of one another, have 1 to 10 C atoms, particularly preferably 1, 2, 3 or 4 C atoms.
- Anions which are suitable in accordance with the invention can be selected, from the group trifluoromethylsulfonate, pentafluoroethylsulfonate, heptafluoropropylsulfonate, nonafluorobutylsulfonate, bis(fluorosulfonyl)imide, perfluoroacetate, bis(trifluoromethylsulfonyl)imide, bis(pentafluoroethylsulfonyl)imide, bis(heptafluoropropylsulfonyl)imide, bis(nonafluorobutylsulfonyl)imide, tris(trifluoromethylsulfonyl)methide, tris(pentafluoroethylsulfonyl)methide, tris(heptafluoropropylsulfonyl)methide, tris(nonafluorobuty
- perfluoroalkyl groups can denote, independently of one another, different perfluoroalkyl groups.
- the above-mentioned definition therefore also covers, for example, mixed anions, such as trifluoromethylsulfonyl-pentafluoroethylsulfonylimide, bis(trifluoromethyl)sulfonyl-pentafluoroethylsulfonylmethide.
- the anions are particularly preferably selected from the group trifluoromethanesulfonate, bis(trifluoromethylsulfonyl)imide or tris(pentafluoroethyl)trifluorophosphate.
- Suitable cations are, in particular, optionally linear or branched, tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetrabutylammonium, tetrapentylammonium, tetrahexylammonium, tetraheptylammonium, tetraoctylammonium, tetranonylammonium, tetradecylammonium, trimethylalkylammonium, trimethyl(ethyl)ammonium, triethyl(methyl)ammonium, trihexylammonium, methyl(trioctyl)ammonium, tetramethylphosphonium, tetraethylphosphonium, tetrapropylphosphonium, tetrabutylphosphonium, tetrapentylphosphonium, tetrahexylphosphonium,
- Particularly suitable cations are tetramethylammonium, trimethylalkylammonium, where the alkyl group can have 1 to 10 C atoms, in particular trihexyltetradecylphosphonium, triisobutyl(methyl)phosphonium, tributyl(ethyl)phosphonium, tributyl(methyl)phosphonium, in addition preferably 1-butyl-1-methylpyrrolidinium, 1-butyl-1-ethylpyrrolidinium, 1-hexyl-1-methylpyrrolidinium, 1-methyl-1-octylpyrrolidinium or 1-(2-hydroxyethyl)-3-methylimidazolium, very particularly suitable cations are 1-butyl-1-methylpyrrolidinium, 1-hexyl-1-methylpyrrolidinium, 1-methyl-1-octylpyrrolidinium or 1-(2-hydroxyethyl)-3-methyl-imidazolium.
- selenium ions are dissolved in a suitable ionic liquid, as described above.
- Suitable selenium salts are, for example, selenium tetrahalides, for example selenium tetrachloride or selenium tetrabromide, but also selenium dioxide. In principle, any selenium salt which facilitates selenium deposition under the said conditions is suitable.
- the ion concentration in the ionic liquid for the deposition of metal is preferably 10 ⁇ 5 to 10 mol/l.
- An ion concentration of 10 ⁇ 3 to 10 ⁇ 1 mol/l is preferably used.
- the deposition according to the invention is carried out in a protective-gas atmosphere, for example under argon, where the oxygen and water content and in particular the water content should be below 1 ppm.
- the deposition is carried out in a 3-electrode cell, as known to the person skilled in the art (for example from A. J. Bard, L. R. Faulkner, Electrochemical Methods, Wiley).
- platinum or selenium electrodes are preferably used as counter- and reference electrodes.
- all metals or carbon can be employed as electrode materials so long as the products formed at the counterelectrode do not interfere with the processes at the working electrode, i.e. so long as the electrode materials are not deposited together with selenium under the experimental conditions.
- the choice of suitable materials is made within the expert knowledge of the person skilled in the art.
- the process according to the invention is preferably carried out potentiostatically, at electrode potentials between 0 and ⁇ 2000 mV and at temperatures between 10° C. and 230° C., preferably between 100° C. to 150° C.
- the process according to the invention can also be carried out by means of pulsed techniques, as are known to the person skilled in the art, for example as described in J.-C. Puippe, F. Leaman, Pulse-Plating: Elektrolytician Metallabscheidung mit Pulsstrom [Pulse Plating: Electrolytic Deposition of Metal by Means of a Pulsed Current], Eugen G. Leuze Verlag, 1990.
- the process according to the invention enables grey selenium to be deposited in any desired layer thicknesses, for example between 200 ⁇ m and 300 ⁇ m, in continuous layers made up of micro- or nanocrystals.
- the desired layer thickness is controlled via the electrode potential and the charge that has flowed as well as the electrochemical parameters.
- the layer thickness can be set via the current and time.
- FIG. 1 shows a cyclic voltammogram of an approximately 0.1 molar solution of SeCl 4 in 1-butyl-1-methylpyrrolid inium bis(trifluoromethylsulfonyl)imide (BMP Tf 2 N) at room temperature on Au(111).
- a first reduction peak occurs at ⁇ 1 V vs. Pt quasi-reference and a second occurs at ⁇ 1.75 V.
- An oxidation process is evident at +0.5 volt, where the ratio of the anodic to the cathodic currents that have flowed is significantly less than 1.
- FIG. 3 shows the morphology of selenium deposits which have been deposited from SeCl 4 in BMP Tf2N. at 150° C.
- XRD X-ray diffraction, cobalt K alpha as X-ray
- a wide variety of substrates which can be employed as cathode are possible for the electrochemical deposition of selenium according to the invention.
- the geometry of the substrates is freely selectable and is not subject to any restriction.
- Suitable substrates can be selected, for example, from all categories, for example non-metals, semi-metals, metals, metal alloys, conductive or metallized ceramics or conductive or metallized plastics are possible.
- a preferred non-metal is, for example, graphite.
- a preferred semi-metal is, for example, silicon.
- Preferred metals are, for example, gold, platinum, copper, iron, cobalt, nickel or molybdenum.
- Preferred metal alloys are, for example, a very wide variety of steels or nickel alloys.
- Suitable substrates may also already consist, for example, of a plurality of layers to which a further layer of selenium is applied as interlayer or final layer by the process according to the invention.
- the list of substrates should therefore in no way be regarded as limiting. The person skilled in the art in the respective area of application will be able to select the suitable substrate without further information.
- the ionic liquid can be washed out using organic solvents.
- organic solvents are, for example, toluene, benzene, methylene chloride, acetonitrile, acetone, methanol, ethanol or isopropanol.
- selenium tetrachloride this can also be removed, for example, from the ionic liquid by heating under reduced pressure by distillation.
- the present invention likewise relates to substrates which are coated using the process according to the invention.
- the present invention furthermore relates to the use of ionic liquids for the deposition, preferably for the electrochemical deposition, of grey selenium on a substrate.
- a solution of SeCl 4 in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide is prepared and transferred into the 3-electrode measurement cell at room temperature under a protective-gas atmosphere.
- a typical 3-electrode measurement cell was used, as described, for example, in A. J. Bard and L. R. Faulkner, Electrochemical Methods, Wiley.
- the 3-electrode measurement cell has a gold electrode as working electrode (cathode), and platinum wires serve as quasi-reference and counter-electrode.
- the electrode potential is set to ⁇ 1500 mV vs. platinum quasi-reference.
- the deposition of selenium begins at ⁇ 1000 mV.
- a 0.25 molar solution of SeBr 4 in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide is prepared analogously to Example 1 and transferred into the 3-electrode measurement cell at room temperature under a protective-gas atmosphere.
- a typical 3-electrode measurement cell was used, as described, for example, in A. J. Bard and L. R. Faulkner, Electrochemical Methods, Wiley.
- the 3-electrode measurement cell has a platinum electrode as working electrode (cathode), and platinum wires serve as quasi-reference and counterelectrode.
- the electrode potential is set to ⁇ 1500 mV vs. platinum quasi-reference.
- the deposition of selenium begins at ⁇ 1000 mV.
- a 0.25 molar solution of SeBr 4 in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide is prepared analogously to Example 1 and transferred into the 3-electrode measurement cell at room temperature under a protective-gas atmosphere.
- a typical 3-electrode measurement cell was used, as described, for example, in A. J. Bard and L. R. Faulkner, Electrochemical Methods, Wiley.
- the 3-electrode measurement cell has an indium electrode as working electrode (cathode), and platinum wires serve as quasi-reference and counterelectrode.
- the electrode potential is set to ⁇ 1500 mV vs. platinum quasi-reference.
- the deposition of selenium begins at ⁇ 1000 mV.
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Abstract
The invention relates to a process for the electrochemical deposition of grey selenium on a substrate in an ionic liquid, where the electrochemical deposition can be carried out at temperatures of greater than 10000.
Description
- The invention relates to a process for the electrochemical deposition of selenium on a substrate in an ionic liquid.
- Selenium has a number of properties which make it suitable for many areas of application in photovoltaics and electronics. Selenium is a photosemiconductor which changes (increases) its conductivity by a number of orders of magnitude on exposure to visible light. In addition, selenium is transparent to wavelengths greater than 650 nm.
- Selenium is often employed as a constituent in thin-film solar cells in combination with Cu and indium, as described, for example, in DE 44 47 866 or in DE 199 177 58. In the production processes usually mentioned for the production of these systems, either all film components are deposited by evaporation processes or only copper or indium is applied by electroplating. In both cases, the selenium is preferably applied via the gas phase in an evaporator.
- Electrochemical deposition of copper indium gallium diselenide is described in US 2004/0206390. The electrochemical deposition there is carried out in a buffered bath comprising potassium biphthalate and amidosulfuric acid. The said components are said to scavenge H+ and OH− ions formed by electrolysis. However, the said process is overall unsuitable for the deposition of a single selenium phase.
- The electrolytic deposition of selenium is described in U.S. Pat. No. 2,414,438. The deposition is carried out in aqueous alkaline solutions of ammonium selenides, alkali metal selenides or alkaline earth metal selenides.
- However, the deposition is made more difficult since amorphous or glass-like red selenium, which has poor electron conductivity, is usually deposited in the room-temperature region. Only at elevated temperature is a grey, metallic phase deposited, but the deposits do not consist uniquely of grey selenium, even at temperatures around 100° C. Higher temperatures, which would promote the deposition of grey selenium, are excluded in open electroplating baths. However, the electrochemical deposition would facilitate continuous operation in the form of vat electroplating without closed evaporators or sputtering devices.
- Accordingly, the object of the invention was to find an alternative method for the electrochemical deposition of grey selenium.
- The object is achieved by the process according to the invention.
- The invention relates to a process for the electrochemical deposition of grey selenium on a substrate in at least one ionic liquid.
- The deposition of grey selenium is carried out on a very wide variety of substrates in a very wide variety of applications. The deposition can serve exclusively for the deposition of selenium, but can also be employed in combination with the deposition of further materials, such as, for example, copper or indium.
- The ionic liquids which are suitable for the process according to the invention are highly conductive and are generally thermally stable up to 400° C. In particular, use is made of ionic liquids which are electrochemically stable under the deposition conditions described below. They have, for example, an electrochemical window in the cathodic branch which extends from 0 mV to −3500 mV against ferrocene/ferrocinium, preferably from −2000 mV to −3000 mV against ferrocene/ferrocinium. In the anodic branch, suitable ionic liquids have an electrochemical window which extends from 0 mV to +3500 mv against ferrocene/ferrocinium, preferably from +2000 to +3000 mV against ferrocene/ferrocinium. The data relate to the measurement arrangements and conditions described below.
- Suitable ionic liquids contain, in particular, at least one tetraalkylammonium or tetraalkylphosphonium cation, where the alkyl groups may each, independently of one another, have 1 to 10 C atoms, or a heterocyclic cation selected from
- where
- R1′ to R4′ each, independently of one another, denote
- hydrogen, —CN, —OR′, —NR′2, —P(O)R′2, —P(O)(NR′2)2, —C(O)R′,
- straight-chain or branched alkyl having 1-20 C atoms,
- straight-chain or branched alkenyl having 2-20 C atoms and one or more double bonds,
- straight-chain or branched alkynyl having 2-20 C atoms and one or more triple bonds,
- saturated, partially or fully unsaturated cycloalkyl having 3-7 C atoms,
- which may be substituted by alkyl groups having 1-6 C atoms,
- saturated, partially or fully unsaturated heteroaryl,
- heteroaryl-C1-C6-alkyl or aryl-C1-C6-alkyl,
- where the substituents R1′, R2′, R3′ and/or R4′ together may also form a ring system,
- where one or more substituents R1′, to R4′ may be partially or fully substituted by halogens, in particular —F and/or —Cl, or —OR′, —CN, —C(O)OH, —C(O)NR′2, —SO2NR′2, —C(O)X, —SO2OH, —SO2X, —NO2, but where R1′ and R4′ cannot simultaneously be fully substituted by halogens, and where one or two non-adjacent and non-heteroatom-bonded carbon atoms of the substituents R1′ to R4′ may be replaced by atoms and/or atomic groups selected from —O—, —S—, —S(O)—, —SO2—, —C(O)—, —N+R′2—, —C(O)NR′—, —SO2NR′—, —P(O)(NR′2)NR′—, —PR′2═N— or —P(O)R′—, where R′═H, non-, partially or perfluorinated C1— to C6-alkyl, C3— to C7-cycloalkyl, unsubstituted or substituted phenyl, and X=halogen.
- The substituent R2′ or R3′ is in each case, independently of one another, in particular hydrogen, methyl, ethyl, isopropyl, propyl, butyl, sec-butyl, tert-butyl, cyclohexyl, phenyl or benzyl. R2′ is particularly preferably hydrogen, methyl, ethyl, isopropyl, propyl, butyl or secbutyl. R2′ and R3′ are very particularly preferably hydrogen.
- The C1-C12-alkyl group is, for example, methyl, ethyl, isopropyl, propyl, butyl, sec-butyl or tert-butyl, furthermore also pentyl, 1-, 2- or 3-methylbutyl, 1,1-, 1,2- or 2,2-dimethylpropyl, 1-ethylpropyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl or dodecyl. Optionally difluoromethyl, trifluoromethyl, pentafluoroethyl, heptafluoropropyl or nonafluorobutyl.
- A straight-chain or branched alkenyl having 2 to 20 C atoms, in which, in addition, a plurality of double bonds may be present, is, for example, allyl, 2- or 3-butenyl, isobutenyl, sec-butenyl, furthermore 4-pentenyl, isopentenyl, hexenyl, heptenyl, octenyl, —C9H17, —C10H19 to —C20H39; preferably allyl, 2- or 3-butenyl, isobutenyl, sec-butenyl, preference is furthermore given to 4-pentenyl, isopentenyl or hexenyl.
- A straight-chain or branched alkynyl having 2 to 20 C atoms, in which, in addition, a plurality of triple bonds may be present, is, for example, ethynyl, 1- or 2-propynyl, 2- or 3-butynyl, furthermore 4-pentynyl, 3-pentynyl, hexynyl, heptynyl, octynyl, —C9H15, —C10H17 to —C20H37, preferably ethynyl, 1- or 2-propynyl, 2- or 3-butynyl, 4-pentynyl, 3-pentynyl or hexynyl.
- Aryl-C1-C6-alkyl denotes, for example, benzyl, phenylethyl, phenylpropyl, phenylbutyl, phenylpentyl or phenylhexyl, where both the phenyl ring and also the alkylene chain may, as described above, be partially or fully substituted by halogens, in particular —F and/or —Cl, or partially by —OR′, —CN, —C(O)OH, —C(O)NR′2, —SO2NR′2, —C(O)X, —SO2OH, —SO2X, —NO2.
- Unsubstituted saturated or partially or fully unsaturated cycloalkyl groups having 3-7 C atoms are therefore cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclopentenyl, cyclopenta-1,3-dienyl, cyclohexenyl, cyclohexa-1,3-dienyl, cyclohexa-1,4-dienyl, phenyl, cycloheptenyl, cyclohepta-1,3-dienyl, cyclohepta-1,4-dienyl or cyclohepta-1,5-dienyl, each of which may be substituted by C1— to C6-alkyl groups, where the cycloalkyl group or the cycloalkyl group which is substituted by C1— to C6-alkyl groups may in turn also be substituted by halogen atoms, such as F, Cl, Br or I, in particular F or Cl, or by —OR′, —CN, —C(O)OH, —C(O)NR′2, —SO2NR′2, —C(O)X, —SO2OH, —SO2X, —NO2.
- In the substituents R1′ to R4′, one or two carbon atoms which are not adjacent and are not bonded in the α-position to the heteroatom may also be replaced by atoms and/or atomic groups selected from the group —O—, —S—, —S(O)—, —SO2—, —N+R′2—, —C(O)NR′—, —SO2NR′—, —P(O)(NR′2)NR′— or —P(O)R′—, where R′=non-, partially or perfluorinated C1— to C6-alkyl, C3— to C7-cycloalkyl, unsubstituted or substituted phenyl.
- Without restricting generality, examples of substituents R1′ to R4′ modified in this way are: —OCH3, —OCH(CH3)2, —CH2OCH3, —CH2—CH2—O—CH3, —C2H4OCH(CH3)2, —C2H4SC2H5, —C2H4SCH(CH3)2, —S(O)CH3, —SO2CH3, —SO2C6H5, —SO2C3H7, —SO2CH(CH3)2, —SO2CH2CF3, —CH2SO2CH3, —O—C4H8—O—C4H9, —CF3, —C2F5, —C3F7, —C4F9, —C(CF3)3, —CF2SO2CF3, —C2F4N(C2F5)C2F5, —CHF2, —CH2CF3, —C2F2H3, —C3FH6, —CH2C3F7, —C(CFH2)3, —CH2C(O)OH, —CH2C6H5 or P(O)(C2H5)2.
- In R′, C3— to C7-cycloalkyl is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl or cycloheptyl.
- In R′, substituted phenyl denotes phenyl which is substituted by C1— to C6-alkyl, C1— to C6-alkenyl, NO2, F, Cl, Br, I, C1-C6-alkoxy, SCF3, SO2CF3, COOH, SO2X′, SO2NR″2 or SO3H, where X′ denotes F, Cl or Br and R″ denotes a non-, partially or perfluorinated C1— to C6-alkyl or C3— to C7-cycloalkyl as defined for R′, for example, o-, m- or p-methylphenyl, o-, m- or p-ethylphenyl, o-, m- or p-propylphenyl, o-, m- or p-isopropylphenyl, o-, m- or p-tert-butylphenyl, o-, m- or p-nitrophenyl, o-, m- or p-methoxyphenyl, o-, m- or p-ethoxyphenyl, o-, m-, p-(trifluoromethyl)phenyl, o-, m-, p-(trifluoromethoxy)phenyl, o-, m-, p-(trifluoromethylsulfonyl)phenyl, o-, m- or p-fluorophenyl, o-, m- or p-chlorophenyl, o-, m- or p-bromophenyl, o-, m- or p-iodophenyl, furthermore preferably 2,3-, 2,4-, 2,5-, 2,6-, 3,4- or 3,5-dimethylphenyl, 2,3-, 2,4-, 2,5-, 2,6-, 3,4- or 3,5-dihydroxyphenyl, 2,3-, 2,4-, 2,5-, 2,6-, 3,4- or 3,5-difluorophenyl, 2,3-, 2,4-, 2,5-, 2,6-, 3,4- or 3,5-dichlorophenyl, 2,3-, 2,4-, 2,5-, 2,6-, 3,4- or 3,5-dibromophenyl, 2,3-, 2,4-, 2,5-, 2,6-, 3,4- or 3,5-dimethoxyphenyl, 5-fluoro-2-methylphenyl, 3,4,5-trimethoxyphenyl or 2,4,5-trimethylphenyl.
- In R1′ to R4′, heteroaryl is taken to mean a saturated or unsaturated mono- or bicyclic heterocyclic radical having 5 to 13 ring members, where 1, 2 or 3 N and/or 1 or 2 S or O atoms may be present and the heterocyclic radical may be mono- or polysubstituted by C1— to C6-alkyl, C1— to C6-alkenyl, NO2, F, Cl, Br, I, C1-C6-alkoxy, SCF3, SO2CF3, COOH, SO2X′, SO2NR″2 or SO3H, where X′ and R″ have a meaning indicated above. The heterocyclic radical is preferably substituted or unsubstituted 2- or 3-furyl, 2- or 3-thienyl, 1-, 2- or 3-pyrrolyl, 1-, 2-, 4- or 5-imidazolyl, 3-, 4- or 5-pyrazolyl, 2-, 4- or 5-oxazolyl, 3-, 4- or 5-isoxazolyl, 2-, 4- or 5-thiazolyl, 3-, 4- or 5-isothiazolyl, 2-, 3- or 4-pyridyl, 2-, 4-, 5- or 6-pyrimidinyl, furthermore preferably 1,2,3-triazol-1-, -4- or -5-yl, 1,2,4-triazol-1-, -4- or -5-yl, 1- or 5-tetrazolyl, 1,2,3-oxadiazol-4- or -5-
yl 1,2,4-oxadiazol-3- or -5-yl, 1,3,4-thiadiazol-2- or -5-yl, 1,2,4-thiadiazol-3- or -5-yl, 1,2,3-thiadiazol-4- or -5-yl, 2-, 3-, 4-, 5- or 6-2h-thiopyranyl, 2-, 3- or 4-4h-thiopyranyl, 3- or 4-pyridazinyl, pyrazinyl, 2-, 3-, 4-, 5-, 6- or 7-benzofuryl, 2-, 3-, 4-, 5-, 6- or 7-benzothienyl, 1-, 2-, 3-, 4-, 5-, 6- or 7-1H-indolyl, 1-, 2-, 4- or 5-benzimidazolyl, 1-, 3-, 4-, 5-, 6- or 7-benzopyrazolyl, 2-, 4-, 5-, 6- or 7-benzoxazolyl, 3-, 4-, 5-, 6- or 7-benzisoxazolyl, 2-, 4-, 5-, 6- or 7-benzothiazolyl, 2-, 4-, 5-, 6- or 7-benzisothiazolyl, 4-, 5-, 6- or 7-benz-2,1,3-oxadiazolyl, 1-, 2-, 3-, 4-, 5-, 6-, 7- or 8-quinolinyl, 1-, 3-, 4-, 5-, 6-, 7- or 8-isoquinolinyl, 1-, 2-, 3-, 4- or 9-carbazolyl, 1-, 2-, 3-, 4-, 5-, 6-, 7-, 8- or 9-acridinyl, 3-, 4-, 5-, 6-, 7- or 8-cinnolinyl, 2-, 4-, 5-, 6-, 7- or 8-quinazolinyl or 1-, 2- or 3-pyrrolidinyl. - Heteroaryl-C1-C6-alkyl is now, analogously to aryl-C1-C6-alkyl, taken to mean for example pyridinylmethyl, pyridinylethyl, pyridinylpropyl, pyridinylbutyl, pyridinylpentyl, pyridinylhexyl, where furthermore the heterocyclic radicals described above may be linked to the alkylene chain in this way.
- R1′ to R4′ are, in particular, alkyl groups having 1 to 10 C atoms or hydroxyalkyl groups having 1 to 10 C atoms.
- Particularly suitable ionic liquids contain a tetraalkylammonium, tetraalkylphosphonium, 1,1-dialkylpyrrolidinium, 1-hydroxyalkyl-1-alkylpyrrolidinium, 1-hydroxyalkyl-3-alkylimidazolium or 1,3-bis(hydroxyalkyl)imidazolium cation, where the alkyl groups or the alkylene chain of the hydroxyalkyl group may each, independently of one another, have 1 to 10 C atoms.
- An alkyl group having 1 to 10 C atoms is taken to mean, for example, methyl, ethyl, isopropyl, propyl, butyl, sec-butyl or tert-butyl, furthermore also pentyl, 1-, 2- or 3-methylbutyl, 1,1-, 1,2- or 2,2-dimethylpropyl, 1-ethylpropyl, hexyl, heptyl, octyl, nonyl or decyl. The alkyl groups may also be partially or fully substituted by fluorine. Fluorinated alkyl groups are, for example, difluoromethyl, trifluoromethyl, pentafluoroethyl, pentafluoropropyl, heptafluoropropyl, heptafluorobutyl or nonafluorobutyl.
- A hydroxyalkyl group having 1 to 10 C atoms is taken to mean, for example, 1-hydroxymethyl, 2-hydroxyethyl, 3-hydroxyropyl, 4-hydroxybutyl, furthermore also 5-hydroxypentyl, 6-hydroxyhexyl, 7-hydroxyheptyl, 8-hydroxyoctyl, 9-hydroxynonyl or 10-hydroxydecyl. The alkylene chain of the hydroxyl group may also be partially or fully substituted by fluorine. Fluorinated hydroxyalkyl groups can be described, for example, by the sub-formulae —(CHF)n—OH or —(CF2)n—OH, where n can denote 1, 2, 3, 4, 5, 6, 7, 8, 9 or 10.
- Suitable anions which, in combination with the cations according to the invention, satisfy the above-mentioned condition with respect to stability can be selected from the group PF6, BF4, alkylsulfate, perfluoroalkylsulfonate, perfluoroacetate, bis(fluorosulfonyl)imide, bis(perfluoroalkylsulfonyl)imide, tris(perfluoroalkyl)trifluorophosphate, bis(perfluoroalkyl)tetrafluorophosphate, tris(perfluoroalkylsulfonyl)methide or perfluoroalkylborate.
- The term perfluoroalkyl group means that all H atoms of the corresponding alkyl group have been replaced by F atoms. The alkyl or perfluoroalkyl groups in the anions indicated preferably each, independently of one another, have 1 to 10 C atoms, particularly preferably 1, 2, 3 or 4 C atoms.
- Anions which are suitable in accordance with the invention can be selected, from the group trifluoromethylsulfonate, pentafluoroethylsulfonate, heptafluoropropylsulfonate, nonafluorobutylsulfonate, bis(fluorosulfonyl)imide, perfluoroacetate, bis(trifluoromethylsulfonyl)imide, bis(pentafluoroethylsulfonyl)imide, bis(heptafluoropropylsulfonyl)imide, bis(nonafluorobutylsulfonyl)imide, tris(trifluoromethylsulfonyl)methide, tris(pentafluoroethylsulfonyl)methide, tris(heptafluoropropylsulfonyl)methide, tris(nonafluorobutylsulfonyl)methide, tris(pentafluoroethyl)trifluorophosphate, tris(heptafluoropropyl)trifluorophosphate, tris(nonafluorobutyl)trifluorophosphate, bis(pentafluoroethyl)tetrafluorophosphate, tetrakis(trifluoromethyl)borate, tetrakis(pentafluoroethyl)borate, trifluoromethyltrifluoroborate, pentafluoroethyltrifluoroborate, bis(trifluoromethyl)difluoroborate, bis(pentafluoroethyl)difluoroborate, tris(trifluoromethyl)fluoroborate, tris(pentafluoroethyl)fluoroborate or bis(pentafluoroethyl)trifluoromethylfluoroborate.
- As soon as a plurality of perfluoroalkyl groups occur in the anions, these can denote, independently of one another, different perfluoroalkyl groups. The above-mentioned definition therefore also covers, for example, mixed anions, such as trifluoromethylsulfonyl-pentafluoroethylsulfonylimide, bis(trifluoromethyl)sulfonyl-pentafluoroethylsulfonylmethide.
- The anions are particularly preferably selected from the group trifluoromethanesulfonate, bis(trifluoromethylsulfonyl)imide or tris(pentafluoroethyl)trifluorophosphate.
- Suitable cations are, in particular, optionally linear or branched, tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetrabutylammonium, tetrapentylammonium, tetrahexylammonium, tetraheptylammonium, tetraoctylammonium, tetranonylammonium, tetradecylammonium, trimethylalkylammonium, trimethyl(ethyl)ammonium, triethyl(methyl)ammonium, trihexylammonium, methyl(trioctyl)ammonium, tetramethylphosphonium, tetraethylphosphonium, tetrapropylphosphonium, tetrabutylphosphonium, tetrapentylphosphonium, tetrahexylphosphonium, tetraheptylphosphonium, tetraoctylphosphonium, tetranonylphosphonium, tetradecylphosphonium, trihexyltetradecylphosphonium, triisobutyl(methyl)phosphonium, tributyl(ethyl)phosphonium, tributyl(methyl)phosphonium, 1,1-dimethylpyrrolidinium, 1-methyl-1-ethylpyrrolidinium, 1-methyl-1-propylpyrrolidinium, 1-methyl-1-butylpyrrolidinium, 1-methyl-1-pentylpyrrolidinium, 1-methyl-1-hexylpyrrolidinium, 1-methyl-1-heptylpyrrolidinium, 1-methyl-1-octylpyrrolidinium, 1-methyl-1-nonylpyrrolidinium, 1-methyl-1-decylpyrrolidinium, 1,1-diethylpyrrolidinium, 1-ethyl-1-propylpyrrolidinium, 1-ethyl-1-butylpyrrolidinium, 1-ethyl-1-pentylpyrrolidinium, 1-ethyl-1-hexylpyrrolidinium, 1-ethyl-1-heptylpyrrolidinium, 1-ethyl-1-octylpyrrolidinium, 1-ethyl-1-nonylpyrrolidinium, 1-ethyl-1-decylpyrrolidinium, 1,1-dipropylpyrrolidinium, 1-propyl-1-butylpyrrolidinium, 1-propyl-1-pentylpyrrolidinium, 1-propyl-1-hexylpyrrolidinium, 1-propyl-1-heptylpyrrolidinium, 1-propyl-1-octylpyrrolidinium, 1-propyl-1-nonylpyrrolidinium, 1-propyl-1-decylpyrrolidinium, 1,1-dibutylpyrrolidinium, 1-butyl-1-pentylpyrrolidinium, 1-butyl-1-hexylpyrrolidinium, 1-butyl-1-heptylpyrrolidinium, 1-butyl-1-octylpyrrolidinium, 1-butyl-1-nonylpyrrolidinium, 1-butyl-1-decylpyrrolidinium, 1,1-dipentylpyrrolidinium, 1-pentyl-1-hexylpyrrolidinium, 1-pentyl-1-heptylpyrrolidinium, 1-pentyl-1-octylpyrrolidinium, 1-pentyl-1-nonylpyrrolidinium, 1-pentyl-1-decylpyrrolidinium, 1,1-dihexylpyrrolidinium, 1-hexyl-1-heptylpyrrolidinium, 1-hexyl-1-octylpyrrolidinium, 1-hexyl-1-nonylpyrrolidinium, 1-hexyl-1-decylpyrrolidinium, 1,1-dihexylpyrrolidinium, 1-hexyl-1-heptylpyrrolidinium, 1-hexyl-1-octylpyrrolidinium, 1-hexyl-1-nonylpyrrolidinium, 1-hexyl-1-decylpyrrolidinium, 1,1-diheptylpyrrolidinium, 1-heptyl-1-octylpyrrolidinium, 1-heptyl-1-nonylpyrrolidinium, 1-heptyl-1-decylpyrrolidinium, 1,1-dioctylpyrrolidinium, 1-octyl-1-nonylpyrrolidinium, 1-octyl-1-decylpyrrolidinium, 1-1-dinonylpyrrolidinium, 1-nonyl-1-decylpyrrolidinium or 1,1-didecylpyrrolidinium, 1-hydroxymethyl-1-methylpyrrolidinium, 1-hydroxymethyl-1-ethylpyrrolidinium, 1-hydroxymethyl-1-propylpyrrolidinium, 1-hydroxymethyl-1-butylpyrrolidinium, 1-(2-hydroxyethyl)-1-methylpyrrolidinium, 1-(2-hydroxyethyl)-1-ethylpyrrolidinium, 1-(2-hydroxyethyl)-1-propylpyrrolidinium, 1-(2-hydroxyethyl)-1-butylpyrrolidinium, 1-(3-hydroxypropyl)-1-methylpyrrolidinium, 1-(3-hydroxypropyl)-1-ethylpyrrolidinium, 1-(3-hydroxypropyl)-1-propylpyrrolidinium, 1-(3-hydroxypropyl)-1-butylpyrrolidinium, 1-(4-hydroxybutyl)-1-methylpyrrolidinium, 1-(4-hydroxybutyl)-1-ethylpyrrolidiniurn, 1-(4-hydroxybutyl)-1-propylpyrrolidinium or 1-(4-hydroxybutyl)-1-butylpyrrolidinium, 1-(1-hydroxymethyl)-3-methylimidazolium, 1-(1-hydroxymethyl)-3-ethylimidazolium, 1-(1-hydroxymethyl)-3-propylimidazolium, 1-(1-hydroxymethyl)-3-butylimidazolium, 1-(2-hydroxyethyl)-3-methylimidazolium, 1-(2-hydroxyethyl)-3-ethylimidazolium, 1-(2-hydroxyethyl)-3-propylimidazolium, 1-(2-hydroxyethyl)-3-butylimidazolium, 1-(3-hydroxypropyl)-3-methylimidazolium, 1-(3-hydroxypropyl)-3-ethylimidazolium, 1-(3-hydroxypropyl)-3-propylimidazolium, 1-(3-hydroxypropyl)-3-butylimidazolium, 1-(4-hydroxybutyl)-3-methylimidazolium, 1-(4-hydroxybutyl)-3-ethylimidazolium, 1-(4-hydroxybutyl)-3-propylimidazolium, 1-(4-hydroxybutyl)-3-butylimidazolium, 1,3-bis(1-hydroxymethyl)imidazolium, 1,3-bis(2-hydroxyethyl)imidazolium, 1,3-bis(3-hydroxypropyl)imidazolium, 1,3-bis(4-hydroxybutyl)imidazolium, 1-(2-hydroxyethyl)-3-(1-hydroxymethyl)imidazolium, 1-(2-hydroxyethyl)-3-(3-hydroxypropyl)imidazolium, 1-(2-hydroxyethyl)-3-(4-hydroxybutyl)imidazolium, 1-(3-hydroxypropyl)-3-(1-hydroxymethyl)imidazolium, 1-(3-hydroxypropyl)-3-(2-hydroxyethyl)imidazolium, 1-(3-hydroxypropyl)-3-(4-hydroxybutyl)imidazolium, 1-(4-hydroxybutyl)-3-(1-hydroxymethyl)imidazolium, 1-(4-hydroxybutyl)-3-(2-hydroxyethyl)imidazolium or 1-(4-hydroxybutyl)-3-(3-hydroxypropyl)imidazolium.
- Particularly suitable cations are tetramethylammonium, trimethylalkylammonium, where the alkyl group can have 1 to 10 C atoms, in particular trihexyltetradecylphosphonium, triisobutyl(methyl)phosphonium, tributyl(ethyl)phosphonium, tributyl(methyl)phosphonium, in addition preferably 1-butyl-1-methylpyrrolidinium, 1-butyl-1-ethylpyrrolidinium, 1-hexyl-1-methylpyrrolidinium, 1-methyl-1-octylpyrrolidinium or 1-(2-hydroxyethyl)-3-methylimidazolium, very particularly suitable cations are 1-butyl-1-methylpyrrolidinium, 1-hexyl-1-methylpyrrolidinium, 1-methyl-1-octylpyrrolidinium or 1-(2-hydroxyethyl)-3-methyl-imidazolium.
- Particularly suitable ionic liquids for use in the process according to the invention are
- 1-butyl-1-methylpyrrolidinium trifluoromethanesulfonate,
- 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide,
- 1-butyl-1-methylpyrrolidinium tris(pentafluoroethyl)trifluorophosphate,
- 1-hexyl-1-methylpyrrolidinium trifluoromethanesulfonate,
- 1-hexyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide,
- 1-hexyl-1-methylpyrrolidinium tris(pentafluoroethyl)trifluorophosphate,
- 1-methyl-1-octylpyrrolidinium trifluoromethanesulfonate,
- 1-methyl-1-octylpyrrolidinium bis(trifluoromethylsulfonyl)imide,
- 1-methyl-1-octylpyrrolidinium tris(pentafluoroethyl)trifluorophosphate,
- 1-(2-hydroxyethyl)-3-methylimidazolium trifluoromethanesulfonate,
- 1-(2-hydroxyethyl)-3-methylimidazolium bis(trifluoromethylsulfonyl)imide or
- 1-(2-hydroxyethyl)-3-methylimidazolium tris(pentafluoroethyl)trifluorophosphate.
- According to the process according to the invention, selenium ions are dissolved in a suitable ionic liquid, as described above.
- This can be carried out by dissolution of a selenium salt in the ionic liquid.
- Suitable selenium salts are, for example, selenium tetrahalides, for example selenium tetrachloride or selenium tetrabromide, but also selenium dioxide. In principle, any selenium salt which facilitates selenium deposition under the said conditions is suitable.
- The ion concentration in the ionic liquid for the deposition of metal is preferably 10−5 to 10 mol/l. An ion concentration of 10−3 to 10−1 mol/l is preferably used.
- The deposition according to the invention is carried out in a protective-gas atmosphere, for example under argon, where the oxygen and water content and in particular the water content should be below 1 ppm. The deposition is carried out in a 3-electrode cell, as known to the person skilled in the art (for example from A. J. Bard, L. R. Faulkner, Electrochemical Methods, Wiley). During deposition on a suitable substrate, platinum or selenium electrodes are preferably used as counter- and reference electrodes. In general, all metals or carbon can be employed as electrode materials so long as the products formed at the counterelectrode do not interfere with the processes at the working electrode, i.e. so long as the electrode materials are not deposited together with selenium under the experimental conditions. The choice of suitable materials here is made within the expert knowledge of the person skilled in the art.
- The process according to the invention is preferably carried out potentiostatically, at electrode potentials between 0 and −2000 mV and at temperatures between 10° C. and 230° C., preferably between 100° C. to 150° C.
- However, the process according to the invention can also be carried out by means of pulsed techniques, as are known to the person skilled in the art, for example as described in J.-C. Puippe, F. Leaman, Pulse-Plating: Elektrolytische Metallabscheidung mit Pulsstrom [Pulse Plating: Electrolytic Deposition of Metal by Means of a Pulsed Current], Eugen G. Leuze Verlag, 1990.
- The process according to the invention enables grey selenium to be deposited in any desired layer thicknesses, for example between 200 μm and 300 μm, in continuous layers made up of micro- or nanocrystals. The desired layer thickness is controlled via the electrode potential and the charge that has flowed as well as the electrochemical parameters.
- This correlation is described in a generally valid manner via the Faraday law:
-
- where F=Faraday constant, A=area, ρ=density of the metal, I=current, t=time and M=molar mass of the metal.
- Ultimately, the layer thickness can be set via the current and time.
-
FIG. 1 shows a cyclic voltammogram of an approximately 0.1 molar solution of SeCl4 in 1-butyl-1-methylpyrrolid inium bis(trifluoromethylsulfonyl)imide (BMP Tf2N) at room temperature on Au(111). A first reduction peak occurs at −1 V vs. Pt quasi-reference and a second occurs at −1.75 V. An oxidation process is evident at +0.5 volt, where the ratio of the anodic to the cathodic currents that have flowed is significantly less than 1. - At 120° C. (
FIG. 2 ), the shape of the cyclic voltammogram changes significantly. Instead of 2 clear reduction processes, only one cathodic current increasing to a greater or lesser extent with a pronounced oxidation process at about 1 volt vs. Pt quasi-reference is observed. -
FIG. 3 shows the morphology of selenium deposits which have been deposited from SeCl4 in BMP Tf2N. at 150° C. -
FIG. 4 shows an X-ray diffraction pattern (XRD=X-ray diffraction, cobalt K alpha as X-ray) of selenium which has been deposited from SeCl4/BMP Tf2N [0.1 mol/l of SeCl4 in BMP Tf2N] at 150° C. on platinum. - A wide variety of substrates which can be employed as cathode are possible for the electrochemical deposition of selenium according to the invention. The geometry of the substrates is freely selectable and is not subject to any restriction.
- Suitable substrates can be selected, for example, from all categories, for example non-metals, semi-metals, metals, metal alloys, conductive or metallized ceramics or conductive or metallized plastics are possible.
- A preferred non-metal is, for example, graphite.
- A preferred semi-metal is, for example, silicon.
- Preferred metals are, for example, gold, platinum, copper, iron, cobalt, nickel or molybdenum.
- Preferred metal alloys are, for example, a very wide variety of steels or nickel alloys.
- Suitable substrates may also already consist, for example, of a plurality of layers to which a further layer of selenium is applied as interlayer or final layer by the process according to the invention. The list of substrates should therefore in no way be regarded as limiting. The person skilled in the art in the respective area of application will be able to select the suitable substrate without further information.
- After deposition of selenium, the ionic liquid can be washed out using organic solvents. Suitable organic solvents are, for example, toluene, benzene, methylene chloride, acetonitrile, acetone, methanol, ethanol or isopropanol. On use of selenium tetrachloride, this can also be removed, for example, from the ionic liquid by heating under reduced pressure by distillation.
- The present invention likewise relates to substrates which are coated using the process according to the invention. The present invention furthermore relates to the use of ionic liquids for the deposition, preferably for the electrochemical deposition, of grey selenium on a substrate.
- The detailed conditions for the deposition and the suitable ionic liquids and the aftertreatment of the coated substrate are revealed in the comments described above.
- Even without further comments, it is assumed that a person skilled in the art will be able to utilize the above description in the broadest scope. The preferred embodiments and examples should therefore merely be regarded as descriptive disclosure which is absolutely not limiting in any way.
- The electrochemical measurements were carried out using a Princeton Applied Research (EG & G) PAR 2263 potentiostat/galvanostat. In general, any potentiostat and any constant-current source as well as batteries, in each case with or without pulse generator, are suitable.
- A solution of SeCl4 in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide is prepared and transferred into the 3-electrode measurement cell at room temperature under a protective-gas atmosphere. A typical 3-electrode measurement cell was used, as described, for example, in A. J. Bard and L. R. Faulkner, Electrochemical Methods, Wiley. The 3-electrode measurement cell has a gold electrode as working electrode (cathode), and platinum wires serve as quasi-reference and counter-electrode.
- The electrode potential is set to −1500 mV vs. platinum quasi-reference.
- The deposition of selenium begins at −1000 mV.
- A 0.25 molar solution of SeBr4 in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide is prepared analogously to Example 1 and transferred into the 3-electrode measurement cell at room temperature under a protective-gas atmosphere. A typical 3-electrode measurement cell was used, as described, for example, in A. J. Bard and L. R. Faulkner, Electrochemical Methods, Wiley.
- The 3-electrode measurement cell has a platinum electrode as working electrode (cathode), and platinum wires serve as quasi-reference and counterelectrode.
- The electrode potential is set to −1500 mV vs. platinum quasi-reference.
- The deposition of selenium begins at −1000 mV.
- A 0.25 molar solution of SeBr4 in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide is prepared analogously to Example 1 and transferred into the 3-electrode measurement cell at room temperature under a protective-gas atmosphere. A typical 3-electrode measurement cell was used, as described, for example, in A. J. Bard and L. R. Faulkner, Electrochemical Methods, Wiley.
- The 3-electrode measurement cell has an indium electrode as working electrode (cathode), and platinum wires serve as quasi-reference and counterelectrode.
- The electrode potential is set to −1500 mV vs. platinum quasi-reference.
- The deposition of selenium begins at −1000 mV.
Claims (12)
1. Process for the electrochemical deposition of grey selenium on a substrate in at least one ionic liquid.
2. Process according to claim 1 , characterized in that the ionic liquid has at least one tetraalkylammonium or tetraalkylphosphonium cation, where the alkyl groups may each, independently of one another, have 1 to 10 C atoms, or a heterocyclic cation selected from
where
R1′ to R4′ each, independently of one another, denote hydrogen, —CN, —OR′, —NR′2, —P(O)R′2, —P(O)(NR′2)2, —C(O)R′,
straight-chain or branched alkyl having 1-20 C atoms,
straight-chain or branched alkenyl having 2-20 C atoms and one or more double bonds,
straight-chain or branched alkynyl having 2-20 C atoms and one or more triple bonds, saturated, partially or fully unsaturated cycloalkyl having 3-7 C atoms, which may be substituted by alkyl groups having 1-6 C atoms,
saturated, partially or fully unsaturated heteroaryl,
heteroaryl-C1-C6-alkyl or aryl-C1-C6-alkyl,
where the substituents R1′, R2′, R3′ and/or R4′ together may also form a ring system,
where one or more substituents R1′ to R4′ may be partially or fully substituted by halogens, in particular —F and/or —Cl, or —OR′, —CN, —C(O)OH, —C(O)NR′2, —SO2NR′2, —C(O)X, —SO2OH, —SO2X, —NO2, but where R1′ and R4′ cannot simultaneously be fully substituted by halogens, and where one or two non-adjacent and non-heteroatom-bonded carbon atoms of the substituents R1′ to R4′ may be replaced by atoms and/or atomic groups selected from —O—, —S—, —S(O)—, —SO2—, —C(O)—, —N+R′2—, —C(O)NR′—, —SO2NR′—, —P(O)(NR′2)NR′—, —PR′2═N— or —P(O)R′—, where R′═H, non-, partially or perfluorinated C1— to C6-alkyl, C3— to C7-cycloalkyl, unsubstituted or substituted phenyl, and X=halogen.
3. Process according to claim 1 , characterized in that the ionic liquid contains at least one tetraalkylammonium, tetraalkylphosphonium-, 1,1-dialkylpyrrolidinium, 1-hydroxyalkyl-1-alkylpyrrolidinium, 1-hydroxyalkyl-3-alkylimidazolium or 1,3-bis(hydroxyalkyl)imidazolium cation, where the alkyl groups or the alkylene chain of the hydroxyalkyl group may each, independently of one another, have 1 to 10 C atoms.
4. Process according to claim 1 , characterized in that the ionic liquid has an electrochemical window from 0 mV to −3500 mV against ferrocene/ferrocinium in the cathodic branch and from 0 mV to +3500 mV against ferrocene/ferrocinium in the anodic branch.
5. Process according to claim 1 , characterized in that the anion of the ionic liquid is selected from the group PF6, BF4, alkylsulfate, perfluoroalkylsulfonate, perfluoroacetate, bis(fluorosulfonyl)imide, bis(perfluoroalkylsulfonyl)imide, tris(perfluoroalkyl)trifluorophosphate, bis(perfluoroalkyl)tetrafluorophosphate, tris(perfluoroalkylsulfonyl)methide or perfluoroalkylborate.
6. Process according to claim 1 , characterized in that the cation is selected from the group linear or branched tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetrabutylammonium, tetrapentylammonium, tetrahexylammonium, tetraheptylammonium, tetraoctylammonium, tetranonylammonium, tetradecylammonium, trimethylalkylammonium, trimethyl(ethyl)ammonium, triethyl(methyl)ammonium, trihexylammonium, methyl(trioctyl)ammonium, tetramethylphosphonium, tetraethylphosphonium, tetrapropylphosphonium, tetrabutylphosphonium, tetrapentylphosphonium, tetrahexylphosphonium, tetraheptylphosphonium, tetraoctylphosphonium, tetranonylphosphonium, tetradecylphosphonium, trihexyltetradecylphosphonium, triisobutyl(methyl)phosphonium, tributyl(ethyl)phosphonium, tributyl(methyl)phosphonium, 1,1-dimethylpyrrolidinium, 1-methyl-1-ethylpyrrolidinium, 1-methyl-1-propylpyrrolidinium, 1-methyl-1-butylpyrrolidinium, 1-methyl-1-pentylpyrrolidinium, 1-methyl-1-hexylpyrrolidinium, 1-methyl-1-heptylpyrrolidinium, 1-methyl-1-octylpyrrolidinium, 1-methyl-1-nonylpyrrolidinium, 1-methyl-1-decylpyrrolidinium, 1,1-diethylpyrrolidinium, 1-ethyl-1-propylpyrrolidinium, 1-ethyl-1-butylpyrrolidinium, 1-ethyl-1-pentylpyrrolidinium, 1-ethyl-1-hexylpyrrolidinium, 1-ethyl-1-heptylpyrrolidinium, 1-ethyl-1-octylpyrrolidinium, 1-ethyl-1-nonylpyrrolidinium, 1-ethyl-1-decylpyrrolidinium, 1,1-dipropylpyrrolidinium, 1-propyl-1-butylpyrrolidinium, 1-propyl-1-pentylpyrrolidinium, 1-propyl-1-hexylpyrrolidinium, 1-propyl-1-heptylpyrrolidinium, 1-propyl-1-octylpyrrolidinium, 1-propyl-1-nonylpyrrolidinium, 1-propyl-1-decylpyrrolidinium, 1,1-dibutylpyrrolidinium, 1-butyl-1-pentylpyrrolidinium, 1-butyl-1-hexylpyrrolidinium, 1-butyl-1-heptylpyrrolidinium, 1-butyl-1-octylpyrrolidinium, 1-butyl-1-nonylpyrrolidinium, 1-butyl-1-decylpyrrolidinium, 1,1-dipentylpyrrolidinium, 1-pentyl-1-hexylpyrrolidinium, 1-pentyl-1-heptylpyrrolidinium, 1-pentyl-1-octylpyrrolidinium, 1-pentyl-1-nonylpyrrolidinium, 1-pentyl-1-decylpyrrolidinium, 1,1-dihexylpyrrolidinium, 1-hexyl-1-heptylpyrrolidinium, 1-hexyl-1-octylpyrrolidinium, 1-hexyl-1-nonylpyrrolidinium, 1-hexyl-1-decylpyrrolidinium, 1,1-dihexylpyrrolidinium, 1-hexyl-1-heptylpyrrolidinium, 1-hexyl-1-octylpyrrolidinium, 1-hexyl-1-nonylpyrrolidinium, 1-hexyl-1-decylpyrrolidinium, 1,1-diheptylpyrrolidinium, 1-heptyl-1-octylpyrrolidinium, 1-heptyl-1-nonylpyrrolidinium, 1-heptyl-1-decylpyrrolidinium, 1,1-dioctylpyrrolidinium, 1-octyl-1-nonylpyrrolidinium, 1-octyl-1-decylpyrrolidinium, 1-1-dinonylpyrrolidinium, 1-nonyl-1-decylpyrrolidinium or 1,1-didecylpyrrolidinium, 1-hydroxymethyl-1-methylpyrrolidinium, 1-hydroxymethyl-1-ethylpyrrolidinium, 1-hydroxymethyl-1-propylpyrrolidinium, 1-hydroxymethyl-1-butylpyrrolidinium, 1-(2-hydroxyethyl)-1-methylpyrrolidinium, 1-(2-hydroxyethyl)-1-ethylpyrrolidinium, 1-(2-hydroxyethyl)-1-propylpyrrolidinium, 1-(2-hydroxyethyl)-1-butylpyrrolidinium, 1-(3-hydroxypropyl)-1-methylpyrrolidinium, 1-(3-hydroxypropyl)-1-ethylpyrrolidinium, 1-(3-hydroxypropyl)-1-propylpyrrolidinium, 1-(3-hydroxypropyl)-1-butylpyrrolidinium, 1-(4-hydroxybutyl)-1-methylpyrrolidinium, 1-(4-hydroxybutyl)-1-ethylpyrrolidinium, 1-(4-hydroxybutyl)-1-propylpyrrolidinium or 1-(4-hydroxybutyl)-1-butylpyrrolidinium, 1-(1-hydroxymethyl)-3-methylimidazolium, 1-(1-hydroxymethyl)-3-ethylimidazolium, 1-(1-hydroxymethyl)-3-propylimidazolium, 1-(1-hydroxymethyl)-3-butylimidazolium, 1-(2-hydroxyethyl)-3-methylimidazolium, 1-(2-hydroxyethyl)-3-ethylimidazolium, 1-(2-hydroxyethyl)-3-propylimidazolium, 1-(2-hydroxyethyl)-3-butylimidazolium, 1-(3-hydroxypropyl)-3-methylimidazolium, 1-(3-hydroxypropyl)-3-ethylimidazolium, 1-(3-hydroxypropyl)-3-propylimidazolium, 1-(3-hydroxypropyl)-3-butylimidazolium, 1-(4-hydroxybutyl)-3-methylimidazolium, 1-(4-hydroxybutyl)-3-ethylimidazolium, 1-(4-hydroxybutyl)-3-propylimidazolium, 1-(4-hydroxybutyl)-3-butylimidazolium, 1,3-bis(1-hydroxymethyl)imidazolium, 1,3-bis(2-hydroxyethyl)imidazolium, 1,3-bis(3-hydroxypropyl)imidazolium, 1,3-bis(4-hydroxybutyl)imidazolium, 1-(2-hydroxyethyl)-3-(1-hydroxymethyl)imidazolium, 1-(2-hydroxyethyl)-3-(3-hydroxypropyl)imidazolium, 1-(2-hydroxyethyl)-3-(4-hydroxybutyl)imidazolium, 1-(3-hydroxypropyl)-3-(1-hydroxymethyl)imidazolium, 1-(3-hydroxypropyl)-3-(2-hydroxyethyl)imidazolium, 1-(3-hydroxypropyl)-3-(4-hydroxybutyl)imidazolium, 1-(4-hydroxybutyl)-3-(1-hydroxymethyl)imidazolium, 1-(4-hydroxybutyl)-3-(2-hydroxyethyl)imidazolium or 1-(4-hydroxybutyl)-3-(3-hydroxypropyl)imidazolium.
7. Process according to claim 1 , characterized in that selenium ions are in dissolved form in the ionic liquid.
8. Process according to claim 7 , characterized in that the selenium ions are produced by dissolution of a selenium salt.
9. Process according to claim 1 , characterized in that the substrate is a non-metal, semi-metal, metal, metal alloy or conductive and/or metallized ceramics or conductive and/or metallized plastic.
10. Process according to claim 1 , characterized in that the process is carried out at temperatures between 10° C. and 230° C.
11. Substrates coated by a process according to claim 1 .
12. Use of ionic liquids for the deposition of grey selenium on a substrate.
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| PCT/EP2006/008631 WO2007039035A1 (en) | 2005-09-30 | 2006-09-05 | Electrochemical deposition of selenium in ionic liquids |
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| US20110086272A1 (en) * | 2009-10-13 | 2011-04-14 | Kepler Keith D | Li-ion battery and its preparation method |
| CN103122471A (en) * | 2013-03-01 | 2013-05-29 | 沈阳师范大学 | Cyanide-free indium plating electroplate liquid |
| WO2013173006A1 (en) * | 2012-05-14 | 2013-11-21 | United Technologies Corporation | Method for making metal plated gas turbine engine components |
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| DE102009055828A1 (en) | 2008-12-19 | 2010-07-01 | Merck Patent Gmbh | Preparing metal coated particles, useful e.g. in lacquers, colors, inks, pigment mixtures, comprises electrochemical metal deposition of metals on the particle substrate, whose surface is electrically conductive or semi-conductive |
| GB2473285A (en) * | 2009-09-08 | 2011-03-09 | Astron Advanced Materials Ltd | Low temperature joining process |
| DE102011080230A1 (en) | 2011-08-01 | 2013-02-07 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Extraction of precious metal (ions) by means of ionic liquids |
| WO2017099189A1 (en) * | 2015-12-09 | 2017-06-15 | 学校法人 慶應義塾 | Method for separating and recovering long-lived fission products from radioactive waste by using ionic liquid |
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- 2006-09-05 AT AT06791833T patent/ATE440157T1/en active
- 2006-09-05 DE DE502006004616T patent/DE502006004616D1/en active Active
- 2006-09-05 US US12/088,130 patent/US20080210566A1/en not_active Abandoned
- 2006-09-05 EP EP06791833A patent/EP1951934B1/en not_active Not-in-force
- 2006-09-05 JP JP2008532621A patent/JP2009510261A/en active Pending
- 2006-09-29 TW TW095136252A patent/TW200728516A/en unknown
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| US20110086272A1 (en) * | 2009-10-13 | 2011-04-14 | Kepler Keith D | Li-ion battery and its preparation method |
| WO2013173006A1 (en) * | 2012-05-14 | 2013-11-21 | United Technologies Corporation | Method for making metal plated gas turbine engine components |
| CN103122471A (en) * | 2013-03-01 | 2013-05-29 | 沈阳师范大学 | Cyanide-free indium plating electroplate liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009510261A (en) | 2009-03-12 |
| DE102005046908A1 (en) | 2007-04-05 |
| DE502006004616D1 (en) | 2009-10-01 |
| WO2007039035A1 (en) | 2007-04-12 |
| EP1951934A1 (en) | 2008-08-06 |
| EP1951934B1 (en) | 2009-08-19 |
| TW200728516A (en) | 2007-08-01 |
| ATE440157T1 (en) | 2009-09-15 |
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