US20060266657A1 - Electropolishing in organic solutions - Google Patents
Electropolishing in organic solutions Download PDFInfo
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- US20060266657A1 US20060266657A1 US11/379,792 US37979206A US2006266657A1 US 20060266657 A1 US20060266657 A1 US 20060266657A1 US 37979206 A US37979206 A US 37979206A US 2006266657 A1 US2006266657 A1 US 2006266657A1
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- electrolyte
- electropolishing
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- dissolving
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- 239000003792 electrolyte Substances 0.000 claims abstract description 37
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 150000003839 salts Chemical class 0.000 claims abstract description 15
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 9
- 239000000956 alloy Substances 0.000 claims abstract description 9
- 239000010936 titanium Substances 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical class [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 4
- 231100001261 hazardous Toxicity 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 3
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 3
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract 2
- 150000003863 ammonium salts Chemical class 0.000 claims abstract 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910052744 lithium Inorganic materials 0.000 claims abstract 2
- 239000011733 molybdenum Substances 0.000 claims abstract 2
- 239000010955 niobium Substances 0.000 claims abstract 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910052700 potassium Inorganic materials 0.000 claims abstract 2
- 239000011591 potassium Substances 0.000 claims abstract 2
- 229910052708 sodium Inorganic materials 0.000 claims abstract 2
- 239000011734 sodium Substances 0.000 claims abstract 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 5
- 239000010935 stainless steel Substances 0.000 abstract description 5
- HLXZNVUGXRDIFK-UHFFFAOYSA-N nickel titanium Chemical compound [Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni] HLXZNVUGXRDIFK-UHFFFAOYSA-N 0.000 abstract 1
- 229910001000 nickel titanium Inorganic materials 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 24
- 238000000034 method Methods 0.000 description 14
- 239000002253 acid Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 150000007513 acids Chemical class 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 7
- 238000005498 polishing Methods 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 4
- 229960002050 hydrofluoric acid Drugs 0.000 description 4
- -1 stainless steel Chemical class 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 229940093476 ethylene glycol Drugs 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 230000007096 poisonous effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 2
- 229910004074 SiF6 Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- WKPSFPXMYGFAQW-UHFFFAOYSA-N iron;hydrate Chemical compound O.[Fe] WKPSFPXMYGFAQW-UHFFFAOYSA-N 0.000 description 1
- 229910000734 martensite Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000379 polypropylene carbonate Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Definitions
- Electrochemical polishing of metal part comprise in passing electrical current through this metal part which is submerged into bath with electrolyte, and this metal part is connected to positive pole of power source, and the negative pole is connected to special electrode—cathode which is located inside the bath with electrolyte. Due to mainly dissolving picks than valleys, the surface becomes smooth and bright.
- the traditional method of electropolishing stainless steel utilize mixtures of concentrated acids; phosphoric, sulfuric, chromic, and some organic acids.
- the main drawback of the traditional method aggressiveness of electrolyte towards workers, equipment; fast changes in electrolyte composition during operation, low quality of polishing stainless steel of ferrite and martensite alloy types.
- the first and the third drawbacks are obvious, the second on is caused by chemical and electrochemical reactions in acids during electropolishing process:
- M i metals in stainless steel alloy composition (ferric, chrome, nickel, and others)
- cathode reaction (2) takes place together with reaction (5), competing to each other.
- reaction (2) it is necessary to: a) select high cathode density, b) select cathode material with high hydrogen overstrain.
- correspondence of cathode electrical current density to anode current density is inversely proportional to correspondence of cathode area to anode area, it is necessary to have total area of cathode be at least few times lesser that total area of anode (in order to have high current density on cathode).
- Electrochemical Polishing is processed when metal parts are submerged into ion-conducting solution (electrolyte) and connecting it to positive pole of power source. Smoothing o the surface and brightness happen during dissolving metal in the electrolyte on anode. Polishing occur only when material on the picks dissolve faster than in hollows, and smooth areas remain smooth while dissolving, without etching.
- PF passivating film
- This PF is formed when a) electrochemical reaction between metal and water and/or oxygen-containing anions of electrolyte occur, b) products of this reaction dissolve in electrolyte such way that the speed of oxide formation is the same that the speed of oxide dissolving, and the thickness of PF remain the same. If at the same time the speed of PF dissolving is limited by the speed of diffusion of some component of the electrolyte (for example anions or molecules of solver) then mostly picks are dissolved since the speed of diffusion to them is higher then to the hollows.
- Existence of PH prevent etching of smooth areas of metal surface.
- Another principal way to conduct electropolishing is to slow down formation of PF according to reaction (2). It becomes possible by using electrolytes based on organic solvents, for example alcohols (methyl or ethyl), while allowable water concentration is very low. In this case the speed of PF formation according to (2) decrease so much that strong acids, such as sulfuric acid, can be used as electrolyte.
- organic solvents for example alcohols (methyl or ethyl)
- strong acids such as sulfuric acid
- the electropolishing method comprise electrolyte based on organic solvent, which is safe or low-hazardous: ethylene-glycol (C2H6O2), tri-ethylene-glycol (C6H14O4), glycerin (CH2OHCHOHCH2OH), polypropylene-carbonate (C4H6O3). Water concentration is not so restricted; depending on alloy type for some electrolytes should not be more than 20%.
- the reaction goes not so fast, therefore as the main component can be selected among less dangerous salts containing fluorine-ions, instead of fluoric acid, such as fluoride (F—), fluoborate (BF 4 ⁇ ), fluosilicate (SiF 6 ⁇ ), fluo-aluminate (AlF 4 ⁇ ).
- fluoric acid such as fluoride (F—), fluoborate (BF 4 ⁇ ), fluosilicate (SiF 6 ⁇ ), fluo-aluminate (AlF 4 ⁇ ).
- Selection of cation of these salts depends on dissolving requirements of corresponding complex ions of the following type: TiF 6 2 ⁇ , TaF 7 2 ⁇ etc., for example K2TaF7, Li2TiF6, (NH4)2HfF6 in selected solvent.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Electrolyte for electropolishing metal parts, where electrolyte consist of non-hazardous organic as dissolvent and metal salts of the same metal that is to be polished. Such electrolyte can be used for electropolishing stainless steel of various alloy types. Another variation of electrolyte based on non-hazardous organic as dissolvent, is used to electropolish titanium, zirconium, hafnium, tantalum, niobium, molybdenum, and their alloy, for example nitinol. Such electrolyte include potassium, sodium, lithium, or ammonium salts of fluoride-containing salts.
Description
- Electrochemical polishing of metal part comprise in passing electrical current through this metal part which is submerged into bath with electrolyte, and this metal part is connected to positive pole of power source, and the negative pole is connected to special electrode—cathode which is located inside the bath with electrolyte. Due to mainly dissolving picks than valleys, the surface becomes smooth and bright.
- This method mostly used in treating corrosion-resistant metals, such as stainless steel, for which electropolishing becomes the final operation. The traditional method of electropolishing stainless steel utilize mixtures of concentrated acids; phosphoric, sulfuric, chromic, and some organic acids. The main drawback of the traditional method: aggressiveness of electrolyte towards workers, equipment; fast changes in electrolyte composition during operation, low quality of polishing stainless steel of ferrite and martensite alloy types. The first and the third drawbacks are obvious, the second on is caused by chemical and electrochemical reactions in acids during electropolishing process:
- Reaction on anode is caused by metal Mi dissolving:
Mi=M i zi + +z i e −, (1) - where Mi—metals in stainless steel alloy composition (ferric, chrome, nickel, and others), zi—ion charge of metal Mi, in which metal is transformed during dissolving on anode, for example for Fe3+zi=3, for Ni2+zi=2 and so on.
-
- Reaction of hydrogen reduction is the main reaction on anode:
2H ++2e − =H 2, (2)
- Reaction of hydrogen reduction is the main reaction on anode:
- However there possible other reactions, such as reduction of ions of metals that dissolve on anode, for example
Fe3− +e −=Fe2+ (3) - During the reactions (1)-(3) exchange of ions H+ in Mizi − take place during bath exploitation. That means that acids transform gradually into metal salts. These salts accumulate in the electrolyte, partially precipitate, and the electrolyte loose efficiency. Inefficient electrolyte requires utilization and replacement by fresh-made electrolyte. Utilization of old electrolyte is a very costly procedure. Our electropolishing method utilizes solutions of salts of the same metals that are part of chemical compositions of polishing alloy types. For example, in order to polish chrome-nickel stainless steel alloy we can use ferric salts, nickel salts, chrome salts, or only some of these salts. No acids are used in electrolyte, however some amount of acid can be formed during hydrolyze of salts, for example:
Fe3++H2O=(FeOH)2++H+ (4)
However amount of hydrogen ions H+ created according to (4) are significantly lower than in acid solutions, therefore together with reaction (2) on cathode there go the reaction opposite to anode reaction (1) in saline electrolyte:
M i z i + +z ie− =M i, (5)
For example:
Fe2++2e −=Fe
Ni2++2e −=Ni
Cr3++3e −=Cr
As a result during electropolishing we can see similar but going to opposite directions reactions (1) and (5) on cathode and anode, the summary result of these reactions is zero, thus composition of electrolyte do not change. Metal that dissolves on anode, is extracted on cathode, and removed from the electrolyte. - The above theoretical scheme of electropolishing and reactions (1) and (5) and can be put into practice if we can select conditions of the process in such way that we do not disturb process of stainless steel smoothening during dissolving on anode. As well known—the main condition of electropolishing process is equality of speed of formation of oxide film and the speed of its dissolving on anode. By switching from acids to salts we significantly reduce (concentration of H+), and thus significantly reduce speed of oxide film dissolving. Therefore in order to equalize both reactions we need to reduce speed of formation of oxide film, which can be achieved by switching from water solutions to water-organic solutions, where passivating films are formatted significantly slower. Relatively safe to humans organics, such as ethylene-glycol, ethyl alcohol, glycerin, triethanalomine, duethanolamine, can be used as dissolving agent.
- In saline-based electrolytes the cathode reaction (2) takes place together with reaction (5), competing to each other. In order to have more of the reaction (5) instead of reaction (2) it is necessary to: a) select high cathode density, b) select cathode material with high hydrogen overstrain. Also since correspondence of cathode electrical current density to anode current density is inversely proportional to correspondence of cathode area to anode area, it is necessary to have total area of cathode be at least few times lesser that total area of anode (in order to have high current density on cathode).
- Metal is precipitated on cathode in form of loose poorly bonded residue. In order to obtain complete mechanical separation of residue from cathode, we use titanium cathodes, since titanium and titanium alloy do not have high hydrogen extrusion overstrain (low speed of reaction (2)), and low bonding with cathode residue.
- Electrochemical Polishing (EP) is processed when metal parts are submerged into ion-conducting solution (electrolyte) and connecting it to positive pole of power source. Smoothing o the surface and brightness happen during dissolving metal in the electrolyte on anode. Polishing occur only when material on the picks dissolve faster than in hollows, and smooth areas remain smooth while dissolving, without etching.
- Most of the scientists think that above conditions occur when dissolving on anode happen in passive condition—when surface is covered by passivating film (PF) of oxide nature. This PF is formed when a) electrochemical reaction between metal and water and/or oxygen-containing anions of electrolyte occur, b) products of this reaction dissolve in electrolyte such way that the speed of oxide formation is the same that the speed of oxide dissolving, and the thickness of PF remain the same. If at the same time the speed of PF dissolving is limited by the speed of diffusion of some component of the electrolyte (for example anions or molecules of solver) then mostly picks are dissolved since the speed of diffusion to them is higher then to the hollows. Existence of PH prevent etching of smooth areas of metal surface.
- Such metals as Ti, Zr, Hf, V, Nb, Ta, Mo, W form PF very easily, thus in average conditions (ex.: in air or in water) they are always covered by oxide films, for example according to reaction:
Ti+2H2O=TiO2+2H2 (1)
During anode current the oxide film formation happen electrochemically:
Ti+2H2O=TiO2+4H++4e−(2)
PF on these metals are very chemically stable and dissolve very slowly even in strong non-organic acid solutions, such as sulfuric, nitric, hydrochloric, phosphoric. Only fluoric acid dissolve them due to formation of complex anions: TiF62− , TaF72− and similar. Dissolving happen according to reaction:
TiO2+4H++6F−=TiF62− +2H2O (3)
Such PF features make it difficult to practically electropolish these metals and their alloy. It is necessary to use fluoric acid—source of F-ions. However fluoric acid is very weak, the constant of its dissociation is 6,6·10-4, therefore in order to speed up the reactions similar to (3) it is necessary to add strong acids (sulfuric, phosphoric, etc.) in order to increase concentration of ions of hydrogen (acidity) H+. Thus electrolytes suitable for electropolishing above group of metal contain mixture of strong acids. These are very aggressive solutions, hazardous for health, environment and equipment. Fluoric acid is very volatile, very poisonous and chemically aggressive. Use if such mixtures are restricted in developed countries. - Another principal way to conduct electropolishing is to slow down formation of PF according to reaction (2). It becomes possible by using electrolytes based on organic solvents, for example alcohols (methyl or ethyl), while allowable water concentration is very low. In this case the speed of PF formation according to (2) decrease so much that strong acids, such as sulfuric acid, can be used as electrolyte.
- This direction in EP allows creating relatively safe technology of electropolishing, however super complex and expensive. Usually well dehydrated methyl alcohol is used as a solvent; process goes in low than normal temperature, complex precautions measures are set up in order to prevent water to penetrate into electrolyte. This process requires complex equipment, very expensive and low-productive. Besides methyl alcohol is very poisonous.
- We suggest new method of electropolishing abovementioned metals and their alloy. This method combines advantages of previous technologies, but lack their deficiencies. The electropolishing method comprise electrolyte based on organic solvent, which is safe or low-hazardous: ethylene-glycol (C2H6O2), tri-ethylene-glycol (C6H14O4), glycerin (CH2OHCHOHCH2OH), polypropylene-carbonate (C4H6O3). Water concentration is not so restricted; depending on alloy type for some electrolytes should not be more than 20%. With such solvents the reaction goes not so fast, therefore as the main component can be selected among less dangerous salts containing fluorine-ions, instead of fluoric acid, such as fluoride (F—), fluoborate (BF4
− ), fluosilicate (SiF6− ), fluo-aluminate (AlF4− ). Selection of cation of these salts depends on dissolving requirements of corresponding complex ions of the following type: TiF62− , TaF72− etc., for example K2TaF7, Li2TiF6, (NH4)2HfF6 in selected solvent. - Particular conditions of EP such as electrolyte composition, temperature, current density, voltage, duration—are selected during experiments and depend on metal and alloy type. Selection of polishing parameters must satisfy the main requirement: speed of PF formation must be equal to speed of PF dissolving.
- If speed of PF formation (2) exceed speed of its dissolving, then instead of polishing metal surfaces is covered by oxide layer. It means that chemical activity of electrolyte is not enough, and it is necessary in increase it by raising salt concentration, or temperature, or select more active ions, or decrease water concentration in electrolyte. Based on chemical activity anions are located in the row (from lowest to highest): fluoborate, fluosilicate, fluo-aluminate, fluoride.
- On the other hand if speed of PF dissolving is higher than speed of PF formation, then the surface is etched instead of electropolishing, becomes matte. In this case it is necessary to decrease chemical activity of electrolyte: decrease salts concentration, temperature, or select less active anion.
Claims (3)
1. Electrolyte for electropolishing metal parts, comprising water and/or organic dissolvent and metal salts, of the same metal that is to be polished.
2. Electrolyte for electropolishing titanium, zirconium, hafnium, tantalum, niobium, molybdenum, and their alloy, which comprise organic dissolvent and potassium, sodium, lithium or ammonium salts of fluoride-containing salts.
3. Electrolyte from claim 1 and 2 where organic dissolvent is selected from a group of non-hazardous organics.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/379,792 US20060266657A1 (en) | 2005-05-31 | 2006-04-23 | Electropolishing in organic solutions |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US68558805P | 2005-05-31 | 2005-05-31 | |
| US68559505P | 2005-05-31 | 2005-05-31 | |
| US11/379,792 US20060266657A1 (en) | 2005-05-31 | 2006-04-23 | Electropolishing in organic solutions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20060266657A1 true US20060266657A1 (en) | 2006-11-30 |
Family
ID=37462028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/379,792 Abandoned US20060266657A1 (en) | 2005-05-31 | 2006-04-23 | Electropolishing in organic solutions |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US20060266657A1 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110017608A1 (en) * | 2009-07-27 | 2011-01-27 | Faraday Technology, Inc. | Electrochemical etching and polishing of conductive substrates |
| US20110120883A1 (en) * | 2009-11-23 | 2011-05-26 | MetCon LLC | Electrolyte Solution and Electropolishing Methods |
| US20120299673A1 (en) * | 2007-04-19 | 2012-11-29 | Indimet Inc. | Solenoid housing and method of providing a solenoid housing |
| KR20160008899A (en) * | 2014-07-15 | 2016-01-25 | 한국화학연구원 | Niobium etching methods of heavy ion cavity by using a composition of mild mixed-acid. |
| US9499919B2 (en) | 2010-11-22 | 2016-11-22 | MetCon LLC | Electrolyte solution and electrochemical surface modification methods |
| CN108754596A (en) * | 2018-07-04 | 2018-11-06 | 湖南科技大学 | A kind of the environmental protection polishing electrolyte and polishing method of titanium alloy |
| CN112410866A (en) * | 2020-11-19 | 2021-02-26 | 科凯(南通)生命科学有限公司 | Electrochemical polishing solution and polishing method for nickel-titanium alloy |
| WO2021090088A1 (en) | 2019-11-05 | 2021-05-14 | Ethicon Llc | Electrolyte solutions for electropolishing of nitinol needles |
| CN115683771A (en) * | 2022-10-21 | 2023-02-03 | 北京星航机电装备有限公司 | Preparation method of tantalum and tantalum alloy EBSD sample |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3776827A (en) * | 1966-12-01 | 1973-12-04 | K Inoue | Method of deburring workpieces |
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2006
- 2006-04-23 US US11/379,792 patent/US20060266657A1/en not_active Abandoned
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3776827A (en) * | 1966-12-01 | 1973-12-04 | K Inoue | Method of deburring workpieces |
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| US20120299673A1 (en) * | 2007-04-19 | 2012-11-29 | Indimet Inc. | Solenoid housing and method of providing a solenoid housing |
| US9636741B2 (en) * | 2007-04-19 | 2017-05-02 | Indimet, Inc. | Solenoid housing and method of providing a solenoid housing |
| US20110017608A1 (en) * | 2009-07-27 | 2011-01-27 | Faraday Technology, Inc. | Electrochemical etching and polishing of conductive substrates |
| US20110120883A1 (en) * | 2009-11-23 | 2011-05-26 | MetCon LLC | Electrolyte Solution and Electropolishing Methods |
| US8357287B2 (en) | 2009-11-23 | 2013-01-22 | MetCon LLC | Electrolyte solution and electropolishing methods |
| US9499919B2 (en) | 2010-11-22 | 2016-11-22 | MetCon LLC | Electrolyte solution and electrochemical surface modification methods |
| KR101600428B1 (en) * | 2014-07-15 | 2016-03-07 | 한국화학연구원 | Niobium etching methods of heavy ion cavity |
| KR20160008899A (en) * | 2014-07-15 | 2016-01-25 | 한국화학연구원 | Niobium etching methods of heavy ion cavity by using a composition of mild mixed-acid. |
| CN108754596A (en) * | 2018-07-04 | 2018-11-06 | 湖南科技大学 | A kind of the environmental protection polishing electrolyte and polishing method of titanium alloy |
| WO2021090088A1 (en) | 2019-11-05 | 2021-05-14 | Ethicon Llc | Electrolyte solutions for electropolishing of nitinol needles |
| US11492723B2 (en) | 2019-11-05 | 2022-11-08 | Cilag Gmbh International | Electrolyte solutions for electropolishing of nitinol needles |
| CN112410866A (en) * | 2020-11-19 | 2021-02-26 | 科凯(南通)生命科学有限公司 | Electrochemical polishing solution and polishing method for nickel-titanium alloy |
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