US20030153758A1 - 1,3,4-Oxadiazole derivatives and process for producing the same - Google Patents
1,3,4-Oxadiazole derivatives and process for producing the same Download PDFInfo
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- US20030153758A1 US20030153758A1 US10/346,136 US34613603A US2003153758A1 US 20030153758 A1 US20030153758 A1 US 20030153758A1 US 34613603 A US34613603 A US 34613603A US 2003153758 A1 US2003153758 A1 US 2003153758A1
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- United States
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- compound
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- 238000000034 method Methods 0.000 title claims abstract description 40
- 150000005072 1,3,4-oxadiazoles Chemical class 0.000 title description 2
- 150000001875 compounds Chemical class 0.000 claims abstract description 155
- -1 3,4-methylenedioxyphenyl group Chemical group 0.000 claims abstract description 25
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 7
- 238000010511 deprotection reaction Methods 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 14
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 11
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 10
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 claims description 8
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 231100000252 nontoxic Toxicity 0.000 claims description 6
- 230000003000 nontoxic effect Effects 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000006272 (C3-C7) cycloalkyl group Chemical group 0.000 claims description 4
- 230000009435 amidation Effects 0.000 claims description 4
- 238000007112 amidation reaction Methods 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- XQVLIHLQUPIJJK-UHFFFAOYSA-N tert-butyl n-[1-(5-tert-butyl-1,3,4-oxadiazol-2-yl)-3-methyl-1-oxobutan-2-yl]carbamate Chemical compound CC(C)(C)OC(=O)NC(C(C)C)C(=O)C1=NN=C(C(C)(C)C)O1 XQVLIHLQUPIJJK-UHFFFAOYSA-N 0.000 claims description 3
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 claims description 3
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 claims description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 3
- 125000006557 (C2-C5) alkylene group Chemical group 0.000 claims description 2
- PRVRMXZBCAWXAA-UHFFFAOYSA-N 2-amino-1-(5-tert-butyl-1,3,4-oxadiazol-2-yl)-3-methylbutan-1-one Chemical compound CC(C)C(N)C(=O)C1=NN=C(C(C)(C)C)O1 PRVRMXZBCAWXAA-UHFFFAOYSA-N 0.000 claims description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 abstract description 6
- 150000004866 oxadiazoles Chemical class 0.000 abstract description 4
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 108
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 42
- 0 [1*]NC(C(=O)C1=NN=C(C([2*])([3*])[4*])O1)C(C)C Chemical compound [1*]NC(C(=O)C1=NN=C(C([2*])([3*])[4*])O1)C(C)C 0.000 description 41
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 41
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 38
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 34
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 33
- 239000011541 reaction mixture Substances 0.000 description 30
- 239000000243 solution Substances 0.000 description 30
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 28
- 238000003756 stirring Methods 0.000 description 28
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 25
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 24
- 238000003786 synthesis reaction Methods 0.000 description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 23
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 21
- 238000004809 thin layer chromatography Methods 0.000 description 21
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 19
- 239000012044 organic layer Substances 0.000 description 19
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 19
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 18
- 230000000704 physical effect Effects 0.000 description 18
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 15
- 239000010410 layer Substances 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 14
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 12
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- 239000013078 crystal Substances 0.000 description 10
- 229920006395 saturated elastomer Polymers 0.000 description 10
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 9
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 9
- 238000001914 filtration Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 8
- 239000012046 mixed solvent Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Substances OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 235000017557 sodium bicarbonate Nutrition 0.000 description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 6
- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide Chemical compound CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 description 5
- 239000012043 crude product Substances 0.000 description 5
- 150000004820 halides Chemical class 0.000 description 5
- 239000000543 intermediate Substances 0.000 description 5
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 5
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 4
- YSIHYROEMJSOAS-UHFFFAOYSA-N 2-(5-amino-6-oxo-2-phenylpyrimidin-1-yl)-n-[1-(5-tert-butyl-1,3,4-oxadiazol-2-yl)-3-methyl-1-oxobutan-2-yl]acetamide Chemical compound N=1N=C(C(C)(C)C)OC=1C(=O)C(C(C)C)NC(=O)CN(C(C(N)=CN=1)=O)C=1C1=CC=CC=C1 YSIHYROEMJSOAS-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-MZCSYVLQSA-N Deuterated methanol Chemical compound [2H]OC([2H])([2H])[2H] OKKJLVBELUTLKV-MZCSYVLQSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 235000019270 ammonium chloride Nutrition 0.000 description 4
- 239000012300 argon atmosphere Substances 0.000 description 4
- KPWLAZHDXRZIGZ-UHFFFAOYSA-N benzyl n-[1-[2-[[1-(5-tert-butyl-1,3,4-oxadiazol-2-yl)-3-methyl-1-oxobutan-2-yl]amino]-2-oxoethyl]-6-oxo-2-phenylpyrimidin-5-yl]carbamate Chemical compound N=1N=C(C(C)(C)C)OC=1C(=O)C(C(C)C)NC(=O)CN(C1=O)C(C=2C=CC=CC=2)=NC=C1NC(=O)OCC1=CC=CC=C1 KPWLAZHDXRZIGZ-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 150000003512 tertiary amines Chemical class 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YOETUEMZNOLGDB-UHFFFAOYSA-N 2-methylpropyl carbonochloridate Chemical compound CC(C)COC(Cl)=O YOETUEMZNOLGDB-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 3
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 3
- SIPUZPBQZHNSDW-UHFFFAOYSA-N bis(2-methylpropyl)aluminum Chemical compound CC(C)C[Al]CC(C)C SIPUZPBQZHNSDW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000010898 silica gel chromatography Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- LMLOABMZOFQEMF-UHFFFAOYSA-N 1-(2,2-dimethoxyethyl)-n-hydroxy-6-oxo-2-phenylpyrimidine-5-carboxamide Chemical compound C1=C(C(=O)NO)C(=O)N(CC(OC)OC)C(C=2C=CC=CC=2)=N1 LMLOABMZOFQEMF-UHFFFAOYSA-N 0.000 description 2
- VUAXHMVRKOTJKP-UHFFFAOYSA-M 2,2-dimethylbutanoate Chemical compound CCC(C)(C)C([O-])=O VUAXHMVRKOTJKP-UHFFFAOYSA-M 0.000 description 2
- OARJXUPBZNUYBG-UHFFFAOYSA-N 2,2-dimethylpropanehydrazide Chemical compound CC(C)(C)C(=O)NN OARJXUPBZNUYBG-UHFFFAOYSA-N 0.000 description 2
- MYWBQLSEKOCWGR-UHFFFAOYSA-N 2-[6-oxo-2-phenyl-5-(phenylmethoxycarbonylamino)pyrimidin-1-yl]acetic acid Chemical compound O=C1N(CC(=O)O)C(C=2C=CC=CC=2)=NC=C1NC(=O)OCC1=CC=CC=C1 MYWBQLSEKOCWGR-UHFFFAOYSA-N 0.000 description 2
- BKOOMYPCSUNDGP-UHFFFAOYSA-N 2-methylbut-2-ene Chemical compound CC=C(C)C BKOOMYPCSUNDGP-UHFFFAOYSA-N 0.000 description 2
- SETCKKFZFOFBSI-UHFFFAOYSA-N 2-tert-butyl-1,3,4-oxadiazole Chemical compound CC(C)(C)C1=NN=CO1 SETCKKFZFOFBSI-UHFFFAOYSA-N 0.000 description 2
- FPQQSJJWHUJYPU-UHFFFAOYSA-N 3-(dimethylamino)propyliminomethylidene-ethylazanium;chloride Chemical compound Cl.CCN=C=NCCCN(C)C FPQQSJJWHUJYPU-UHFFFAOYSA-N 0.000 description 2
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 2
- KGLZSMSYMBMCAL-UHFFFAOYSA-N 5-amino-3-(2,2-dimethoxyethyl)-2-phenylpyrimidin-4-one Chemical compound C1=C(N)C(=O)N(CC(OC)OC)C(C=2C=CC=CC=2)=N1 KGLZSMSYMBMCAL-UHFFFAOYSA-N 0.000 description 2
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 238000006859 Swern oxidation reaction Methods 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- YXGOZXWJJLANIQ-UHFFFAOYSA-N [[1-(2,2-dimethoxyethyl)-6-oxo-2-phenylpyrimidine-5-carbonyl]amino] acetate Chemical compound C1=C(C(=O)NOC(C)=O)C(=O)N(CC(OC)OC)C(C=2C=CC=CC=2)=N1 YXGOZXWJJLANIQ-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- DCFWWJYMTAIJJY-UHFFFAOYSA-N benzyl n-[1-(2,2-dimethoxyethyl)-6-oxo-2-phenylpyrimidin-5-yl]carbamate Chemical compound O=C1N(CC(OC)OC)C(C=2C=CC=CC=2)=NC=C1NC(=O)OCC1=CC=CC=C1 DCFWWJYMTAIJJY-UHFFFAOYSA-N 0.000 description 2
- YHBUHBUMVBCLKV-UHFFFAOYSA-N benzyl n-[6-oxo-1-(2-oxoethyl)-2-phenylpyrimidin-5-yl]carbamate Chemical compound O=C1N(CC=O)C(C=2C=CC=CC=2)=NC=C1NC(=O)OCC1=CC=CC=C1 YHBUHBUMVBCLKV-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- MVEAAGBEUOMFRX-UHFFFAOYSA-N ethyl acetate;hydrochloride Chemical compound Cl.CCOC(C)=O MVEAAGBEUOMFRX-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 2
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
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- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- NIEHEMAZEULEKB-UHFFFAOYSA-N ortho-ethylanisole Natural products CCC1=CC=CC=C1OC NIEHEMAZEULEKB-UHFFFAOYSA-N 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- WTZQMDJBWPQYAU-UHFFFAOYSA-N oxalyl dichloride;thionyl dichloride Chemical compound ClS(Cl)=O.ClC(=O)C(Cl)=O WTZQMDJBWPQYAU-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- NXJCBFBQEVOTOW-UHFFFAOYSA-L palladium(2+);dihydroxide Chemical compound O[Pd]O NXJCBFBQEVOTOW-UHFFFAOYSA-L 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- RRBFCGUIFHFYQK-SECBINFHSA-N tert-butyl n-[(2r)-1-[methoxy(methyl)amino]-3-methyl-1-oxobutan-2-yl]carbamate Chemical compound CON(C)C(=O)[C@@H](C(C)C)NC(=O)OC(C)(C)C RRBFCGUIFHFYQK-SECBINFHSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M toluenesulfonate group Chemical group C=1(C(=CC=CC1)S(=O)(=O)[O-])C LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D271/00—Heterocyclic compounds containing five-membered rings having two nitrogen atoms and one oxygen atom as the only ring hetero atoms
- C07D271/02—Heterocyclic compounds containing five-membered rings having two nitrogen atoms and one oxygen atom as the only ring hetero atoms not condensed with other rings
- C07D271/10—1,3,4-Oxadiazoles; Hydrogenated 1,3,4-oxadiazoles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
- C07D413/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07K—PEPTIDES
- C07K5/00—Peptides containing up to four amino acids in a fully defined sequence; Derivatives thereof
- C07K5/04—Peptides containing up to four amino acids in a fully defined sequence; Derivatives thereof containing only normal peptide links
- C07K5/06—Dipeptides
- C07K5/06139—Dipeptides with the first amino acid being heterocyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07K—PEPTIDES
- C07K5/00—Peptides containing up to four amino acids in a fully defined sequence; Derivatives thereof
- C07K5/04—Peptides containing up to four amino acids in a fully defined sequence; Derivatives thereof containing only normal peptide links
- C07K5/08—Tripeptides
- C07K5/0821—Tripeptides with the first amino acid being heterocyclic, e.g. His, Pro, Trp
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the invention relates to oxadiazole derivatives useful as intermediates for producing pharmaceuticals, a process for producing the same, and a process for producing 1,3,4-oxadiazole derivatives by using the intermediate.
- the invention relates to
- WO9824806 discloses that a compound represented by formula (W-a):
- X w and Y w independently represent an oxygen atom, a sulfur atom or a nitrogen atom which may be substituted;
- R 1w represents various substituents, such as an alkyl group which may be substituted, a hydroxyl group, and an amino group;
- R 2w and R 3w independently represent a hydrogen atom or various substituents, such as an alkyl group which may be substituted;
- a w represents a single bond, a —CO— group, an —NHCO— group, an —SO 2 — group, or the like;
- R 4w represents a hydrogen atom or various substituents, such as an alkyl group which may be substituted;
- B w represents an —SO 2 — group, a —CO— group, or the like; and
- R 11w , R 12w , and E w are taken together to form a ring, with the proviso that these definitions are abstracts from the disclosure are useful as a serine protease
- Cbz stands for a benzyloxycarbonyl group
- Py pyridine
- TAA triethylamine
- DMSO dimethyl sulfoxide
- Ac 2 O acetic anhydride
- EDC 1-ethyl-3-[3-(dimethylamino)propyl]carbodiimide hydrochloride
- HOBt 1-hydroxybenzotriazole
- DMF dimethylformamide
- NMM N-methylmorpholine
- Ts a tosyl group
- Ts trifluoroacetic acid
- Me a methyl group
- Et an ethyl group
- T 2w represents a hydrogen atom or a benzyloxycarbonylamino group, and other symbols are as defined above.
- the oxidation using the Dess-Martin reagent and the Swern oxidation are known oxidations.
- reaction scheme 1 involves a number of steps (10 steps) for producing the compound represented by formula (W-1) so that it is insufficient in efficiency.
- the present inventors have conducted extensive studies seeking an efficient process for producing the compounds represented by formula (W-c-1) that are promising as pharmaceuticals. As a result, they have found a process for producing the compound represented by formula (II) shown in reaction scheme 4, in which novel compounds represented by formulae (I-1) and (I-2), namely, the compounds represented by formula (I) are used as a key intermediate.
- R 2 , R 3 and R 4 each independently represents:
- R 3 and R 4 are taken together to represent a C 2-6 alkylene group
- R 5 and R 6 each independently represents an amino-protective group.
- the process of the invention makes it possible to obtain the compound represented by formula (II) through fewer steps in a higher yield.
- the process of the invention provides a desired compound through steps less by two in a three- to four-fold yield.
- the present invention relates to
- R 1 represents a hydrogen atom or an amino-protective group
- R 2 , R 3 and R 4 each independently represents
- R 3 and R 4 are taken together to represent a C 2-6 alkylene group), a non-toxic salt thereof, and a hydrate thereof,
- C 1-8 alkyl group as used herein means a methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl or octyl group or an isomer thereof.
- C 3-7 cycloalkyl group as used herein means a cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl or cycloheptyl group.
- C 1-8 alkoxy group as used herein means a methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy or octyloxy group or an isomer thereof.
- halogen atom as used herein means fluorine, chlorine, bromine or iodine.
- C 2-6 alkylene group as used herein means an ethylene, trimethylene, tetramethylene, pentamethylene or hexamethylene group.
- the amino-protective group represented by R 1 , R 5 or R 6 in the invention includes a benzyloxycarbonyl group, a t-butoxycarbonyl group, a trifluoroacetyl group and the like, but is not limited thereto, so long as it is a group which is easily and selectively removable.
- a benzyloxycarbonyl group a t-butoxycarbonyl group, a trifluoroacetyl group and the like, but is not limited thereto, so long as it is a group which is easily and selectively removable.
- those described in T. W. Greene, Protective Groups in Organic Synthesis , Wiley, New York (1991) are useful.
- the amino-protective group represented by R 1 and R 5 is preferably a t-butoxycarbonyl group or a benzyloxycarbonyl group, and more preferably a t-butoxycarbonyl group.
- the amino-protective group represented by R 6 is preferably a benzyloxycarbonyl group.
- [0055] is preferably a group in which R 2 , R 3 and R 4 each represents a C 1-8 alkyl group; a group in which R 2 represents a phenyl group, and R 3 and R 4 each represents a C 1-8 alkyl group; a group in which R 2 represents a 3,4-methylenedioxyphenyl group, and R 3 and R 4 each represents a C 1-8 alkyl group; and a group in which R 2 represents a C 1-8 alkyl group, and R 3 and R 4 are taken together to represent a C 2-6 alkylene group;
- R 2 , R 3 , and R 4 each represents a C 1-4 alkyl group; a group in which R 2 represents a phenyl group, and R 3 and R 4 each represents a C 1-4 alkyl group; a group in which R 2 represents a 3,4-methylenedioxyphenyl group, and R 3 and R 4 each represents a C 1-4 alkyl group; and a group in which R 2 represents a C 1-4 alkyl group, and R 3 and R 4 are taken together to represent a C 2-5 alkylene group, and
- [0058] represents an ⁇ , ⁇ -dimethyl-3,4-methylenedioxybenzyl group, a t-butyl group, an ⁇ , ⁇ -dimethylbenzyl group or a 1-methylcyclopropyl group.
- the mark shows that the bond is in front of paper (at the ⁇ -position) unless otherwise indicated; the mark indicates that the bond is on the other side of paper (at the ⁇ -position) unless otherwise indicated; the mark shows that the compound has the bond at the ⁇ -position or the ⁇ -position or the compound is a mixture of these compounds; and the mark indicates that the compound is a mixture of a compound having the bond at the ⁇ -position and a compound having the bond at the ⁇ -position.
- an alkyl group, an alkoxy group and an alkylene group include straight-chain groups and branched groups.
- Isomers caused by the presence of an asymmetric carbon e.g., R or S-forms, ⁇ - or ⁇ forms, enantiomers, and diastereomers
- optically active compounds having optical rotation i.e., D-, L-, d- or I-forms
- the compound represented by formula (I) can be produced by processes (1) and (2) described below, the processes according to Examples described below, or known processes.
- the reaction between the compound represented by formula (V) and the compound represented by formula (VI) is carried out in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, toluene, dimethylformamide, or the like) in the presence of a base (e.g., lithium diisopropylamide (LDA), or the like) and a tertiary amine (e.g., tetramethylethylenediamine, or the like) at ⁇ 78 to 0° C.
- an inert organic solvent e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, toluene, dimethylformamide, or the like
- a base e.g., lithium diisopropylamide (LDA), or the like
- a tertiary amine e.g., tetramethylethylenediamine, or
- the deprotection reaction for the amino-protecting group includes, for example,
- the deprotection reaction under alkaline conditions is carried out, for example, at 0° C. to 40° C. in an organic solvent (e.g., methanol, tetrahydrofuran, dioxane, dimethylformamide, or the like) using an alkali metal hydroxide (e.g., sodium hydroxide, potassium hydroxide, lithium hydroxide, or the like), an alkaline earth metal hydroxide (e.g., barium hydroxide, calcium hydroxide, or the like), an organic amine (e.g., triethylamine, N-methylmorpholine, diisopropylethylamine, piperidine, or the like) or a quaternary ammonium salt (e.g., tetrabutylammonium fluoride, or the like) an aqueous solution thereof or a mixture thereof.
- an organic solvent e.g., methanol, tetrahydrofuran, dioxane, dimethyl
- the deprotection reaction under acidic conditions is carried out, for example, at 0° C. to 100° C. in an organic solvent (e.g., methylene chloride, chloroform, dioxane, ethyl acetate, anisole, or the like) or without a solvent using an organic acid (e.g., acetic acid, trifluoroacetic acid, methanesulfonic acid, trimethylsilyl iodide, or the like) or an inorganic acid (e.g., hydrochloric acid, sulfuric acid, or the like), or a mixture thereof (e.g., hydrogen bromide/acetic acid, or the like).
- an organic solvent e.g., methylene chloride, chloroform, dioxane, ethyl acetate, anisole, or the like
- an organic acid e.g., acetic acid, trifluoroacetic acid, methanesulfonic acid, trimethylsilyl i
- the deprotection reaction by hydrolysis is carried out, for example, in an inert solvent (e.g., ethers (tetrahydrofuran, dioxane, dimethoxyethane, diethyl ether, etc.), alcohols (methanol, ethanol, etc.), benzene solvents (benzene, toluene, etc.), ketones (acetone, methyl ethyl ketone, etc.), nitrites (acetonitrile, etc.), amides (dimethylformamide, etc.), water, ethyl acetate, acetic acid, or mixed solvent of two or more thereof) in the presence of a hydrogenation catalyst (e.g., palladium-carbon, palladium black, palladium, palladium hydroxide, platinum dioxide, nickel, Raney nickel, ruthenium chloride, or the like) and in the presence or absence of an inorganic acid (e.g., hydrochloric acid
- the deprotection reaction of the compound represented by formula (I-2) is preferably carried out by the reaction under acidic conditions or the reaction by hydrolysis.
- the reaction under acidic conditions is more preferred.
- amidation is known in the art. It includes, for example,
- the process using an acid halide is carried out by, for example, reacting the compound represented by formula (IV) with an acid halide (e.g., oxalyl chloride thionyl chloride, or the like) in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like) or without a solvent at ⁇ 20° C.
- an acid halide e.g., oxalyl chloride thionyl chloride, or the like
- an inert organic solvent e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like
- the process using a mixed acid anhydride is carried out by, for example, reacting the compound represented by formula (IV) with an acid halide (e.g., pivaloyl chloride, tosyl chloride, mesyl chloride, or the like) or an acid derivative (e.g., ethyl chloroformate (ethyl chlorocarbonate), isobutyl chloroformate (isobutyl chlorocarbonate), or the like) in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like) or without a solvent in the presence of a tertiary amine (e.g., pyridine, triethylamine, dimethylaniline, dimethylaminopyridine, N-methylmorpholine, or the like) at ⁇ 20° C.
- an acid halide e.g., pivaloyl chloride, tosyl chlor
- the process using a condensing agent is conducted by, for example, reacting the compound represented by formula (IV) with the compound represented by formula (I-1) in an organic solvent (e.g., chloroform, methylene chloride, dimethylformamide, diethyl ether, tetrahydrofuran, or the like) or without a solvent in the presence or absence of a tertiary amine (e.g., pyridine, triethylamine, dimethylaniline, dimethylaminopyridine, or the like) using a condensing agent (e.g., 1,3-dicyclohexylcarbodiimide (DCC), 1-ethyl-3-[3-(dimethylamino)propyl]carbodiimide (EDC), 1,1′-carbonyldiimidazole (CDI), 2-chloro-1-methylpyridinium iodide, or the like) and with or without 1-hydroxybenztriazole (DCC), 1,3
- the reactions 1), 2) and 3) are preferably carried out in an atmosphere of an inert gas (e.g., argon, nitrogen, or the like) under anhydrous conditions.
- an inert gas e.g., argon, nitrogen, or the like
- the amidation between the compound represented by formula (I-1) and the compound represented by formula (IV) is preferably carried out by the process using a mixed acid anhydride.
- reaction for converting the compound represented by formula (III) into the compound represented by formula (II) can be carried out by the above deprotection reaction of the amino-protecting group.
- the deprotection reaction of the amino-protecting group for converting the compound represented by formula (III) into the compound represented by formula (II) is preferably carried out by hydrolysis.
- optically active compounds easily provides, for example, N-((1R)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-benzyloxycarbonylamino-6-oxo-2-phenyl-1,6-dihydropyrimidin-1-yl)acetamide, N-((1S)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-benzyloxycarbonylamino-6-oxo-2-phenyl-1,6-dihydropyrimidin-1-yl)acetamide, and the like among the compounds represented by formula (III); and N-((1R)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-amino-6-oxo-2-phenyl-1,6
- the product of each reaction in the invention is purified through common purification means, for example, distillation under normal pressure or reduced pressure, high performance liquid chromatography using silica gel or magnesium silicate, thin layer chromatography, column chromatography, washing, recrystallization, and the like.
- the purification may be carried out at each reaction or after completion of several reactions.
- the compound represented by general formula (I) can be converted into a salt by a known method.
- the salt is preferably non-toxic and water-soluble.
- suitable salts include salts with alkali metals (e.g., potassium, sodium, and the like), salts with alkaline earth metals (e.g., calcium, magnesium, and the like), ammonium salts, and pharmaceutically acceptable salts with organic amines (e.g., tetramethylammonium, triethylamine, methylamine, dimethylamine, cyclopentylamine, benzylamine, phenethylamine, piperidine, monoethanolamine, diethanolamine, tris(hydroxymethyl)aminomethane, lysine, arginine, N-methyl-D-glucamine, and the like).
- alkali metals e.g., potassium, sodium, and the like
- alkaline earth metals e.g., calcium, magnesium, and the like
- ammonium salts
- the compound represented by formula (I) according to the present invention can be converted into an acid addition salt by a known process.
- the acid addition salt is preferably non-toxic and water-soluble.
- suitable acid addition salts include inorganic acid salts, such as hydrochlorides, hydrobromides, sulfates, phosphates, nitrates, and the like; and organic acid salts, such as acetates, trifluoroacetates, lactates, tartrates, oxalates, fumarates, maleates, citrates, benzoates, methanesulfonates, ethanesulfonates, benzenesulfonates, toluenesulfonates, isethionates, glucuronates, gluconates, and the like.
- the process of the invention provides the compound represented by formula (II) through a fewer steps using the novel intermediate represented by formula (I) and is therefore useful as an efficient industrial process of production.
- Solvents in parentheses shown in the part of chromatographic separation and TLC are eluents or developing solvents used, and ratios are by volume.
- Solvents in parentheses shown in the part of NMR are solvents used for the measurement.
- N,O-Dimethylhydroxylamine hydrochloride (3.37 kg) and 1-ethyl-3-[3-(dimethylamino)propyl]carbodiimide (5.73 kg) were dissolved in pyridine (19 liters (L)) at room temperature in a nitrogen atmosphere, and 2-t-butoxycarbonylamino-3-methylbutanoic acid (5.00 kg) was added thereto at 5° C. or lower, followed by stirring at 20-30° C. for 2 hours. Ice-water (23.8 L) and toluene (15.8 L) were added to the reaction mixture, and the resulting layers were separated.
- the organic layers were combined and washed with 1 N hydrochloric acid (40 L, twice).
- Ethyl acetate (7.9 L) was added to the organic layer, and the mixture was washed with a saturated aqueous solution of sodium hydrogencarbonate (16 L, twice), water (30 L, twice), and saturated saline (16 L, twice) successively, followed by concentration.
- the residue was dissolved in methanol (12 L) at 40° C., and water (30 L) was added thereto to precipitate a solid, followed by stirring at 25° C. for 2 hours and then at 5° C. or lower for 2 at least hours.
- the precipitated solid was filtrated and washed with water (5 L).
- the solid was dried in vacuo at 30° C. for at least 15 hours to obtain the title compound (5.16 kg; yield: 86%) having the following physical properties.
- Triethylamine 49.4 ml was added to a solution of 1-(2,2-dimethoxyethyl)-6-oxo-2-phenyl-1,6-dihydropyrimidin-5-ylcarboxylic acid (97.3 g) in tetrahydrofuran (800 ml) in an ice bath in an argon atmosphere, and isobutyl chlorocarbonate (45.6 ml) was added dropwise thereto at 5° C. or lower, followed by stirring at the same temperature for 1 hour. To the reaction mixture was added a 50% hydroxylamine aqueous solution (422 ml), followed by stirring for 20 minutes. The reaction mixture was separated to layers.
- the aqueous layer was extracted with ethyl acetate (200 ml). The organic layers were combined, washed with saturated saline (200 ml), and concentrated. To the residue was added toluene (200 ml), followed by concentration. The resulting crude crystals were washed with isopropyl ether (1000 ml) by heating under reflux for 10 minutes, cooled to room temperature, and crystals were collected by filtration. The collected crystals were dried in vacuo at room temperature overnight to obtain the title compound (93.3 g; yield: 91%) having the following physical properties.
- TLC RF 0.5 (ethyl acetate);
- the organic layer was washed with an aqueous sodium chloride solution (saturated saline (50 ml) and water (50 ml)) and a mixed solution (saturated saline (50 ml) and a saturated aqueous solution of sodium hydrogencarbonate (50 ml)) successively, followed by concentration to obtain the title compound (16.9 g; crude product) having the following physical properties.
- a 2.0 M solution of lithium diiospropylamide (19.65 kg) was added dropwise to a solution of the compound produced in Reference Example 1 (2.52 kg), the compound produced in Reference Example 3 (6.10 kg), and tetramethylethylenediamine (5.62 kg) in tetrahydrofuran (25.2 L) at ⁇ 65° C. or less in an argon stream, followed by stirring at ⁇ 25° C. to ⁇ 20° C. for 3 to 5 hours.
- the reaction mixture was poured into a cool 10% aqueous citric acid solution (93 L) and extracted with ethyl acetate. To the organic layer was added 1N hydrochloric acid (96.8 L), followed by stirring for 1 hour, and the resulting layers were separated.
- the organic layer was washed with a 5% aqueous potassium carbonate solution (50.4 L), water (25.2 L, twice), and saturated saline (8.4 L) successively, and dried over anhydrous magnesium sulfate.
- the anhydrous magnesium sulfate was separated by filtration and washed with tetrahydrofuran (2.8 L).
- the organic layer was concentrated to obtain the compound of the invention (3.69 kg, crude product) having the following physical properties.
- the reaction mixture was concentrated, ethyl acetate (8.8 L) was added thereto, followed by concentration. Ethyl acetate (8.8 L) was again added to the concentrate, followed by concentration.
- N-Methylmorpholine (634 g) was added to a solution of the compound produced in Reference Example 9 (2.38 kg) in tetrahydrofuran (12.9 L) at ⁇ 5° C. or lower in an argon stream, ethyl chlorocarbonate (680 g) was added dropwise thereto at ⁇ 2° C. or lower, and the reaction mixture was stirred at ⁇ 5° C. or lower for 30 minutes.
- the compound produced in Example 2 (1.64 kg) was added to the reaction mixture at ⁇ 5° C. or lower, followed by stirring for 30 minutes.
- N-methylmorpholine (634 g) was added to ⁇ 5° C. or lower, followed by stirring for 30 minutes.
- n-Butyl lithium (1.6 M hexane solution, 308 ml) was added dropwise to a solution of the compound produced in Reference Example 3 (62.1 g) in tetrahydrofuran (1.65 L) at ⁇ 70° C. in an argon atmosphere, followed by stirring for 40 minutes.
- Magnesium bromide diethyl etherate (127 g) was added to the reaction mixture, and the temperature was raised to ⁇ 45° C., followed by stirring for 1.5 hours.
- Triethylamine (69.8 ml) was added dropwise to the reaction mixture at ⁇ 60° C. or lower, followed by stirring at room temperature overnight.
- the reaction mixture was cooled with ice, and 2N hydrochloric acid (200 ml) was added dropwise thereto.
- the organic layer was washed with 1 N hydrochloric acid (150 ml), water (150 ml), and saturated saline (150 ml) successively, dried over anhydrous magnesium sulfate, and concentrated.
- the resulting solid (14.6 g; yield: 100%) was used in the subsequent reaction without purification.
- a solution of aluminum chloride (20.0 g) in nitromethane (70 ml) was added to a solution of the compound produced in Comparative Example 5 (14.4 g) and anisole (16.0 ml) in nitromethane (70 ml) under cooling with ice, followed by stirring under ice cooling for 10 minutes and then stirring at room temperature for 14 hours.
- the reaction mixture was poured into ice-water (200 ml) and extracted with ethyl acetate (120 ml and 40 ml).
- the organic layer was washed with a sodium chloride aqueous solution (a saturated sodium chloride aqueous solution (100 ml)+water (100 ml)) and saturated saline (200 ml) successively, dried over anhydrous magnesium sulfate, and concentrated.
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Abstract
(wherein R1 represents a hydrogen atom or an amino-protective group; R2, R3, and R4 each independently represents an alkyl group, a cycloalkyl group, a phenyl group which may be substituted, or a 3,4-methylenedioxyphenyl group, or R3 and R4 are taken together to represent a C2-6 alkylene group), a process of producing the same, and a process for producing oxadiazole derivatives represented by formula (II):
(wherein all symbols have the same meanings as described above) using the above derivative.
According to the invention, the compound represented by formula (II) is produced through fewer steps in a high yield.
Description
- The invention relates to oxadiazole derivatives useful as intermediates for producing pharmaceuticals, a process for producing the same, and a process for producing 1,3,4-oxadiazole derivatives by using the intermediate.
- More specifically, the invention relates to
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- (wherein all symbols have the same meanings as described below), a non-toxic salt thereof, and a hydrate thereof;
- (2) a process for producing the same, and
-
- (wherein all symbols have the same meanings as described below), comprising using the same.
-
-
-
- (wherein X w and Yw independently represent an oxygen atom, a sulfur atom or a nitrogen atom which may be substituted; R1w represents various substituents, such as an alkyl group which may be substituted, a hydroxyl group, and an amino group; R2w and R3w independently represent a hydrogen atom or various substituents, such as an alkyl group which may be substituted; Aw represents a single bond, a —CO— group, an —NHCO— group, an —SO2— group, or the like; R4w represents a hydrogen atom or various substituents, such as an alkyl group which may be substituted; Bw represents an —SO2— group, a —CO— group, or the like; and R11w, R12w, and Ew are taken together to form a ring, with the proviso that these definitions are abstracts from the disclosure are useful as a serine protease (especially an elastase) inhibitor.
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- (wherein R 1w has the same meaning as described above) among the compounds represented by general formula (W-c).
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- (wherein R 1w has the same meaning as described above). According to the specification, the compound represented by formula (W-1) is produced in accordance with reaction scheme 1 or 2 shown below.
- In reaction scheme 1, “Cbz” stands for a benzyloxycarbonyl group; “Py”, pyridine; “TEA”, triethylamine; “DMSO”, dimethyl sulfoxide; “Ac 2O”, acetic anhydride; “EDC”, 1-ethyl-3-[3-(dimethylamino)propyl]carbodiimide hydrochloride; “HOBt”, 1-hydroxybenzotriazole; “DMF”, dimethylformamide; “NMM”, N-methylmorpholine; “Ts”, a tosyl group; “TFA”, trifluoroacetic acid; “Me”, a methyl group; and “Et”, an ethyl group.
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- The specification also discloses that the compound represented by formula (W-c-1) among the compounds represented by formula (W-c) is produced using the compound represented by formula (W-1) in accordance with reaction scheme 3 shown below.
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- The process according to reaction scheme 1 involves a number of steps (10 steps) for producing the compound represented by formula (W-1) so that it is insufficient in efficiency.
- The present inventors have conducted extensive studies seeking an efficient process for producing the compounds represented by formula (W-c-1) that are promising as pharmaceuticals. As a result, they have found a process for producing the compound represented by formula (II) shown in reaction scheme 4, in which novel compounds represented by formulae (I-1) and (I-2), namely, the compounds represented by formula (I) are used as a key intermediate.
- In reaction scheme 4, R 2, R3 and R4 each independently represents:
- (1) a C 1-8 alkyl group,
- (2) a C 3-7 cycloalkyl group,
- (3) a phenyl group,
- (4) a phenyl group substituted with one to three of a C 1 alkyl group, a C1-8 alkoxy group, a halogen atom, a trifluoromethyl group, and a trifluoromethoxy group, or
- (5) a 3,4-methylenedioxyphenyl group; or
- (6) R 3 and R4 are taken together to represent a C2-6 alkylene group; and
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- The inventors have experimented the conventional processes shown in reaction schemes 2 and 3 to find that the overall synthesis yield of a compound represented by formula (II) in which R 2, R3 and R4 all represent a methyl group was 18% through six steps (see Comparative Examples described below, in which a compound represented by formula (W-XI) was used as a starting material.). In the Comparative Examples, the Swern oxidation was used as an oxidation to produce a compound represented by formula (W-XVII).
- According to the process of the invention shown in reaction scheme 4, on the other hand, the overall synthesis yield of a compound represented by formula (II) wherein R 1w is a t-butyl group was 65% through four steps (see Examples described below). In the Examples, a t-butoxycarbonyl group was used as an amino-protective group R5 in the compound represented by formulae (V) and the compound represented by formula (I-2), and a benzyloxycarbonyl group was used as an amino-protective group R6 in the compound represented by formula (IV) and the compound represented by formula (III).
- Hence, the process of the invention makes it possible to obtain the compound represented by formula (II) through fewer steps in a higher yield. In other words, the process of the invention provides a desired compound through steps less by two in a three- to four-fold yield.
- The present inventors have found that the compound represented by formula (II) can be prepared efficiently by the process represented by reaction scheme 4 which uses the novel compounds represented by formula (I) and thus completed the present invention.
- The present invention relates to
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- (wherein R 1 represents a hydrogen atom or an amino-protective group; R2, R3 and R4 each independently represents
- (1) a C 1-8 alkyl group,
- (2) a C 3-7 cycloalkyl group,
- (3) a phenyl group,
- (4) a phenyl group substituted with one to three of a C 1-8 alkyl group, a C1-8 alkoxy group, a halogen atom, a trifluoromethyl group, and a trifluoromethoxy group, or
- (5) a 3,4-methylenedioxyphenyl group; or
- (6) R 3 and R4 are taken together to represent a C2-6 alkylene group), a non-toxic salt thereof, and a hydrate thereof,
- 2) a process for producing the compound represented by formula (I), and
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- (wherein all symbols have the same meanings as described above), comprising using the compound represented by formula (I).
- The term “C 1-8 alkyl group” as used herein means a methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl or octyl group or an isomer thereof.
- The term “C 3-7 cycloalkyl group” as used herein means a cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl or cycloheptyl group.
- The term “C 1-8 alkoxy group” as used herein means a methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy or octyloxy group or an isomer thereof.
- The term “halogen atom” as used herein means fluorine, chlorine, bromine or iodine.
- The term “C 2-6 alkylene group” as used herein means an ethylene, trimethylene, tetramethylene, pentamethylene or hexamethylene group.
- The amino-protective group represented by R 1, R5 or R6 in the invention includes a benzyloxycarbonyl group, a t-butoxycarbonyl group, a trifluoroacetyl group and the like, but is not limited thereto, so long as it is a group which is easily and selectively removable. For example, those described in T. W. Greene, Protective Groups in Organic Synthesis, Wiley, New York (1991) are useful.
- The amino-protective group represented by R 1 and R5 is preferably a t-butoxycarbonyl group or a benzyloxycarbonyl group, and more preferably a t-butoxycarbonyl group.
- The amino-protective group represented by R 6 is preferably a benzyloxycarbonyl group.
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- is preferably a group in which R 2, R3 and R4 each represents a C1-8 alkyl group; a group in which R2 represents a phenyl group, and R3 and R4 each represents a C1-8 alkyl group; a group in which R2 represents a 3,4-methylenedioxyphenyl group, and R3 and R4 each represents a C1-8 alkyl group; and a group in which R2 represents a C1-8 alkyl group, and R3 and R4 are taken together to represent a C2-6 alkylene group;
- more preferably a group in which R 2, R3, and R4 each represents a C1-4 alkyl group; a group in which R2 represents a phenyl group, and R3 and R4 each represents a C1-4 alkyl group; a group in which R2 represents a 3,4-methylenedioxyphenyl group, and R3 and R4 each represents a C1-4 alkyl group; and a group in which R2 represents a C1-4 alkyl group, and R3 and R4 are taken together to represent a C2-5 alkylene group, and
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- represents an α,α-dimethyl-3,4-methylenedioxybenzyl group, a t-butyl group, an α,α-dimethylbenzyl group or a 1-methylcyclopropyl group.
- In the invention, as is apparent to one skilled in the art, the mark shows that the bond is in front of paper (at the β-position) unless otherwise indicated; the mark indicates that the bond is on the other side of paper (at the α-position) unless otherwise indicated; the mark shows that the compound has the bond at the β-position or the α-position or the compound is a mixture of these compounds; and the mark indicates that the compound is a mixture of a compound having the bond at the β-position and a compound having the bond at the α-position.
- In the invention, all conceivable isomers are included in the scope thereof unless otherwise indicated. For example, an alkyl group, an alkoxy group and an alkylene group include straight-chain groups and branched groups. Isomers caused by the presence of an asymmetric carbon (e.g., R or S-forms, α- or βforms, enantiomers, and diastereomers) and optically active compounds having optical rotation (i.e., D-, L-, d- or I-forms) are all included within the scope of the invention.
- The compound represented by formula (I) can be produced by processes (1) and (2) described below, the processes according to Examples described below, or known processes.
-
-
-
- (wherein all symbols have the same meanings as described above).
- The reaction between the compound represented by formula (V) and the compound represented by formula (VI) is carried out in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, toluene, dimethylformamide, or the like) in the presence of a base (e.g., lithium diisopropylamide (LDA), or the like) and a tertiary amine (e.g., tetramethylethylenediamine, or the like) at −78 to 0° C.
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- (wherein all symbols have the same meanings as described above) is prepared by subjecting the compound represented by formula (I-2) to a deprotection reaction of the amino-protecting group.
- The deprotection reaction for the amino-protecting group includes, for example,
- 1) a deprotection reaction under alkaline conditions,
- 2) a deprotection reaction under acidic conditions, and
- 3) a deprotection reaction by hydrolysis.
- More specifically,
- 1) the deprotection reaction under alkaline conditions is carried out, for example, at 0° C. to 40° C. in an organic solvent (e.g., methanol, tetrahydrofuran, dioxane, dimethylformamide, or the like) using an alkali metal hydroxide (e.g., sodium hydroxide, potassium hydroxide, lithium hydroxide, or the like), an alkaline earth metal hydroxide (e.g., barium hydroxide, calcium hydroxide, or the like), an organic amine (e.g., triethylamine, N-methylmorpholine, diisopropylethylamine, piperidine, or the like) or a quaternary ammonium salt (e.g., tetrabutylammonium fluoride, or the like) an aqueous solution thereof or a mixture thereof.
- 2) The deprotection reaction under acidic conditions is carried out, for example, at 0° C. to 100° C. in an organic solvent (e.g., methylene chloride, chloroform, dioxane, ethyl acetate, anisole, or the like) or without a solvent using an organic acid (e.g., acetic acid, trifluoroacetic acid, methanesulfonic acid, trimethylsilyl iodide, or the like) or an inorganic acid (e.g., hydrochloric acid, sulfuric acid, or the like), or a mixture thereof (e.g., hydrogen bromide/acetic acid, or the like).
- 3) The deprotection reaction by hydrolysis is carried out, for example, in an inert solvent (e.g., ethers (tetrahydrofuran, dioxane, dimethoxyethane, diethyl ether, etc.), alcohols (methanol, ethanol, etc.), benzene solvents (benzene, toluene, etc.), ketones (acetone, methyl ethyl ketone, etc.), nitrites (acetonitrile, etc.), amides (dimethylformamide, etc.), water, ethyl acetate, acetic acid, or mixed solvent of two or more thereof) in the presence of a hydrogenation catalyst (e.g., palladium-carbon, palladium black, palladium, palladium hydroxide, platinum dioxide, nickel, Raney nickel, ruthenium chloride, or the like) and in the presence or absence of an inorganic acid (e.g., hydrochloric acid, sulfuric acid, hypochloric acid, boric acid, tetrafluoroboric acid, or the like) or an organic acid (e.g., acetic acid, p-toluenesulfonic acid, oxalic acid, trifluoroacetic acid, formic acid, or the like) in a hydrogen atmosphere either under normal pressure or under pressure or in the presence of ammonium formate at a 0° C. to 200° C. In using an acid, the acid may be used in the form of its salt.
- As is easily understood by one skilled in the art, the desired compound of the invention can be easily obtained by a proper choice of these reactions.
- The deprotection reaction of the compound represented by formula (I-2) is preferably carried out by the reaction under acidic conditions or the reaction by hydrolysis. The reaction under acidic conditions is more preferred.
-
-
- (wherein all symbols have the same meanings as described above). The reaction for producing the compound represented by formula (III) is an amidation.
- The amidation is known in the art. It includes, for example,
- 1) a process using an acid halide,
- 2) a process using a mixed acid anhydride, and
- 3) a process using a condensing agent.
- More specifically,
- 1) the process using an acid halide is carried out by, for example, reacting the compound represented by formula (IV) with an acid halide (e.g., oxalyl chloride thionyl chloride, or the like) in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like) or without a solvent at −20° C. to a refluxing temperature and reacting the resulting acid halide with the compound represented by formula (I-1) in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like) in the presence of a tertiary amine (e.g., pyridine, triethylamine, dimethylaniline, dimethylaminopyridine, or the like) at −20° C. to 40° C.
- 2) The process using a mixed acid anhydride is carried out by, for example, reacting the compound represented by formula (IV) with an acid halide (e.g., pivaloyl chloride, tosyl chloride, mesyl chloride, or the like) or an acid derivative (e.g., ethyl chloroformate (ethyl chlorocarbonate), isobutyl chloroformate (isobutyl chlorocarbonate), or the like) in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like) or without a solvent in the presence of a tertiary amine (e.g., pyridine, triethylamine, dimethylaniline, dimethylaminopyridine, N-methylmorpholine, or the like) at −20° C. to 40° C. and reacting the resulting mixed acid anhydride with the compound represented by formula (I-1) in an inert organic solvent (e.g., chloroform, methylene chloride, diethyl ether, tetrahydrofuran, or the like) at −20° C. to 40° C.
- 3) The process using a condensing agent is conducted by, for example, reacting the compound represented by formula (IV) with the compound represented by formula (I-1) in an organic solvent (e.g., chloroform, methylene chloride, dimethylformamide, diethyl ether, tetrahydrofuran, or the like) or without a solvent in the presence or absence of a tertiary amine (e.g., pyridine, triethylamine, dimethylaniline, dimethylaminopyridine, or the like) using a condensing agent (e.g., 1,3-dicyclohexylcarbodiimide (DCC), 1-ethyl-3-[3-(dimethylamino)propyl]carbodiimide (EDC), 1,1′-carbonyldiimidazole (CDI), 2-chloro-1-methylpyridinium iodide, or the like) and with or without 1-hydroxybenztriazole (HOBt) at 0° C. to 40° C.
- The reactions 1), 2) and 3) are preferably carried out in an atmosphere of an inert gas (e.g., argon, nitrogen, or the like) under anhydrous conditions.
- The amidation between the compound represented by formula (I-1) and the compound represented by formula (IV) is preferably carried out by the process using a mixed acid anhydride.
- The reaction for converting the compound represented by formula (III) into the compound represented by formula (II) can be carried out by the above deprotection reaction of the amino-protecting group.
- The deprotection reaction of the amino-protecting group for converting the compound represented by formula (III) into the compound represented by formula (II) is preferably carried out by hydrolysis.
- The compound represented by formula (V) and the compound represented by formula (VI) are produced by the process described in WO9824806 or Examples described below.
- The compound represented by formula (IV) is produced by the process described in EP 528633 (JP-A-5-286946).
- The other starting materials and reagents used in the present invention are known per se or can be prepared by known processes.
- As is easily understood by one skilled in the art, the compounds represented by formulas (I-2), (I-1), (III) and (II) in their optically active form can be easily produced using an optically active compound as the compound represented by formula (V).
- For example, among the compounds represented by formula (V), t-butyl N-((1R)-1-(N′-methyl-N′-methoxyaminocarbonyl)-2-methylpropyl)carbamate (CAS Registry No. 190260-92-5), t-butyl N-((1S)-1-(N′-methyl-N′-methoxyaminocarbonyl)-2-methylpropyl)carbamate (CAS Registry No. 160711-20-6), benzyl N-((1S)-1-(N′-methyl-N′-methoxyaminocarbonyl)-2-methylpropyl)carbamate (CAS Registry No. 114744-84-2), and the like are known. Use of these optically active compounds easily provides, for example, N-((1R)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-benzyloxycarbonylamino-6-oxo-2-phenyl-1,6-dihydropyrimidin-1-yl)acetamide, N-((1S)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-benzyloxycarbonylamino-6-oxo-2-phenyl-1,6-dihydropyrimidin-1-yl)acetamide, and the like among the compounds represented by formula (III); and N-((1R)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-amino-6-oxo-2-phenyl-1,6-dihydropyrimidin-1-yl)acetamide, N-((1S)-1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)-2-(5-amino-6-oxo-2-phenyl-1,6-dihydropyrimidin-1-yl)acetamide, and the like among the compounds represented by formula (II).
- The product of each reaction in the invention is purified through common purification means, for example, distillation under normal pressure or reduced pressure, high performance liquid chromatography using silica gel or magnesium silicate, thin layer chromatography, column chromatography, washing, recrystallization, and the like. The purification may be carried out at each reaction or after completion of several reactions.
- The compound represented by general formula (I) can be converted into a salt by a known method. The salt is preferably non-toxic and water-soluble. Examples of suitable salts include salts with alkali metals (e.g., potassium, sodium, and the like), salts with alkaline earth metals (e.g., calcium, magnesium, and the like), ammonium salts, and pharmaceutically acceptable salts with organic amines (e.g., tetramethylammonium, triethylamine, methylamine, dimethylamine, cyclopentylamine, benzylamine, phenethylamine, piperidine, monoethanolamine, diethanolamine, tris(hydroxymethyl)aminomethane, lysine, arginine, N-methyl-D-glucamine, and the like).
- The compound represented by formula (I) according to the present invention can be converted into an acid addition salt by a known process. The acid addition salt is preferably non-toxic and water-soluble. Examples of suitable acid addition salts include inorganic acid salts, such as hydrochlorides, hydrobromides, sulfates, phosphates, nitrates, and the like; and organic acid salts, such as acetates, trifluoroacetates, lactates, tartrates, oxalates, fumarates, maleates, citrates, benzoates, methanesulfonates, ethanesulfonates, benzenesulfonates, toluenesulfonates, isethionates, glucuronates, gluconates, and the like.
- The compound represented by formula (I) according to the invention or a non-toxic salt thereof can be converted into a hydrate thereof by a known method.
- The process of the invention provides the compound represented by formula (II) through a fewer steps using the novel intermediate represented by formula (I) and is therefore useful as an efficient industrial process of production.
- The present invention will now be illustrated in greater detail by way of Reference Examples, Examples, and Comparative Examples, but the invention is not limited thereto.
- Solvents in parentheses shown in the part of chromatographic separation and TLC are eluents or developing solvents used, and ratios are by volume.
- Solvents in parentheses shown in the part of NMR are solvents used for the measurement.
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- N,O-Dimethylhydroxylamine hydrochloride (3.37 kg) and 1-ethyl-3-[3-(dimethylamino)propyl]carbodiimide (5.73 kg) were dissolved in pyridine (19 liters (L)) at room temperature in a nitrogen atmosphere, and 2-t-butoxycarbonylamino-3-methylbutanoic acid (5.00 kg) was added thereto at 5° C. or lower, followed by stirring at 20-30° C. for 2 hours. Ice-water (23.8 L) and toluene (15.8 L) were added to the reaction mixture, and the resulting layers were separated. The aqueous layer was extracted with a mixed solvent (toluene:ethyl acetate=1:1, 15.8 L). The organic layers were combined and washed with 1 N hydrochloric acid (40 L, twice). Ethyl acetate (7.9 L) was added to the organic layer, and the mixture was washed with a saturated aqueous solution of sodium hydrogencarbonate (16 L, twice), water (30 L, twice), and saturated saline (16 L, twice) successively, followed by concentration. The residue was dissolved in methanol (12 L) at 40° C., and water (30 L) was added thereto to precipitate a solid, followed by stirring at 25° C. for 2 hours and then at 5° C. or lower for 2 at least hours. The precipitated solid was filtrated and washed with water (5 L). The solid was dried in vacuo at 30° C. for at least 15 hours to obtain the title compound (5.16 kg; yield: 86%) having the following physical properties.
- TLC: Rf 0.49 (hexane:ethyl acetate=2:1)
- NMR (CDCl 3): δ5.13 (brd, 1H), 4.57 (brt, 1H), 3.77 (s, 3H), 3.22 (s, 3H), 1.97 (m, 1H), 1.44 (s, 9H), 0.96 (d, J=6.8 Hz, 3H), 0.91 (d, J=6.8 Hz, 3H).
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- Methyl pivalate (1040 ml) and hydrazine monohydrate (760 ml) were heated under reflux for 14.5 hours in an argon stream. The reaction mixture was cooled to room temperature and concentrated. The residue was cooled with ice, and the precipitated crystals were collected by filtration. The filtered material was washed with hexane (250 ml, twice; and 300 ml, once) to obtain the title compound. Furthermore, the mother liquid (510 g) was cooled with ice, and the precipitated crystals were collected by filtration. The filtered material was washed with hexane (100 ml, twice; and 200 ml, once) to obtain the title compound having the following physical properties (total yield: 571.8 g, 63%).
- TLC: Rf 0.59 (chloroform:methanol=10:1)
- NMR (CDCl 3): δ7.06 (brs, 1H), 3.87 (brs, 2H), 1.21 (s, 9H)
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- A mixture of the compound produced in Reference Example 2 (570 g), methyl orthoformate (805 ml) and p-toluenesulfonic acid monohydrate (14.0 g) was heated under stirring for 9 hours while distilling off produced methanol. The reaction mixture was cooled to room temperature and distilled under reduced pressure to obtain a compound of the invention (538.4 g; 86%) having the following physical properties.
- TLC: Rf 0.68 (chloroform:methanol=10:1)
- NMR (CDCl 3): δ8.33 (s, 1H), 1.45 (s, 9H)
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- Triethylamine (49.4 ml) was added to a solution of 1-(2,2-dimethoxyethyl)-6-oxo-2-phenyl-1,6-dihydropyrimidin-5-ylcarboxylic acid (97.3 g) in tetrahydrofuran (800 ml) in an ice bath in an argon atmosphere, and isobutyl chlorocarbonate (45.6 ml) was added dropwise thereto at 5° C. or lower, followed by stirring at the same temperature for 1 hour. To the reaction mixture was added a 50% hydroxylamine aqueous solution (422 ml), followed by stirring for 20 minutes. The reaction mixture was separated to layers. The aqueous layer was extracted with ethyl acetate (200 ml). The organic layers were combined, washed with saturated saline (200 ml), and concentrated. To the residue was added toluene (200 ml), followed by concentration. The resulting crude crystals were washed with isopropyl ether (1000 ml) by heating under reflux for 10 minutes, cooled to room temperature, and crystals were collected by filtration. The collected crystals were dried in vacuo at room temperature overnight to obtain the title compound (93.3 g; yield: 91%) having the following physical properties.
- TLC: RF 0.5 (ethyl acetate);
- NMR (CDCl 3): δ8.95 (s, 1H), 7.62-7.45 (m, 5H), 4.76 (t, J=5.8 Hz, 1H), 4.21 (2H, d, J=5.8 Hz), 3.30 (6H, s).
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- Pyridine (5.66 ml) was added to a suspension of the compound produced in Reference Example 4 (15.95 g) in tetrahydrofuran (50 ml) at room temperature in an argon atmosphere, and acetic anhydride (5.19 ml) was added dropwise thereto, followed by stirring for 20 minutes. Ethyl acetate (150 ml) and 1N hydrochloric acid (84 ml) were added to the reaction mixture, and the resulting layers were separated. The organic layer was washed with an aqueous sodium chloride solution (saturated saline (50 ml) and water (50 ml)) and a mixed solution (saturated saline (50 ml) and a saturated aqueous solution of sodium hydrogencarbonate (50 ml)) successively, followed by concentration to obtain the title compound (16.9 g; crude product) having the following physical properties.
- TLC: Rf 0.44 (toluene:acetone=4:1)
- NMR (CDCl 3): δ8.99 (s, 1H), 7.62-7.45 (m, 5H), 4.79 (t, J=5.4 Hz, 1H), 4.22 (d, J=5.4 Hz, 2H), 3.30 (s, 6H), 2.30 (s, 3H).
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- A suspension of the compound produced in Reference Example 5 (16.9 g) in tetrahydrofuran (200 ml) was heated to obtain a solution. Water (18 ml) was added thereto at 40° C., and 1,8-diazabicyclo[5.4.0]-7-undecene (9.35 ml) was added thereto at 50° C., followed by heating under reflux for 1 hour. After cooling the reaction mixture to room temperature, toluene (100 ml) and a saturated aqueous solution of ammonium chloride (100 ml) were added thereto, and the resulting layers were separated. The organic layer was washed with a saturated aqueous ammonium chloride solution and saturated saline (100 ml) successively and concentrated to obtain the title compound (15.7 g; crude product) having the following physical properties.
- TLC: Rf 0.26 (toluene:acetone=4:1)
- NMR (CDCl 3): δ7.55-7.38 (m, 6H), 4.77 (t, J=5.6 Hz, 1H), 4.14 (d, J=5.6 Hz, 2H), 4.02 (brs, 2H), 3.27 (s, 6H)
-
- A mixture of the compound produced in Reference Example 6 (15.7 g), tetrahydrofuran (75 ml), water (75 ml), and sodium hydrogencarbonate (5.88 g) was cooled with ice, and benzyloxycarbonyl chloride (8.56 ml) was added dropwise thereto at 5° C. or lower, followed by stirring at 5° C. overnight. Ethyl acetate (100 ml) was added to the reaction mixture, and the resulting layers were separated. The organic layer was washed with saturated saline (100 ml), followed by concentration to obtain the title compound (22.0 g; crude product) having the following physical properties.
- TLC: Rf 0.67 (toluene:acetone=4:1)
- NMR (CDCl 3): δ8.73 (brs, 1H), 7.60-7.30 (m, 10H), 5.24 (s, 2H), 4.71 (t, J=5.5 Hz, 1H), 4.15 (d, J=5.5 Hz, 2H), 3.26 (s, 6H)
-
- A mixture of the compound produced in Reference Example 7 (22.0 g), 1N hydrochloric acid (10 ml), and acetic acid (30 ml) was heated to 70-77° C., followed by stirring for 2 hours. The reaction mixture was cooled to room temperature, water (75 ml) and a mixed solvent (toluene:ethyl acetate=4:1, 60 ml) were added thereto, and the resulting layers were separated. The aqueous layer was extracted with a mixed solvent (toluene:ethyl acetate=4:1, two 30 ml portions). The organic layers were combined and washed with water (50 ml), a saturated aqueous solution of sodium hydrogencarbonate (50 ml), and saturated saline (50 ml) successively, and dried over anhydrous magnesium sulfate, followed by concentration to obtain the title compound (16.8 g; crude product) having the following physical properties.
- TLC: Rf 0.36 (hexane:ethyl acetate=1:1)
- NMR (CDCl 3): δ9.59 (s, 1H), 8.79 (brs, 1H), 7.60-7.10 (m, 10H), 5.24 (s, 2H), 4.77 (s, 2H)
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- An aqueous solution (20 ml) of sodium dihydrogenphosphate (7.20 g) was added to a solution of the compound produced in Reference Example 8 (16.8 g) in a mixed solvent (t-butanol:water=4:1, 100 ml), followed by cooling with ice. To the reaction mixture was added 2-methyl-2-butene (23.8 ml), and an aqueous solution (32 ml) of sodium chlorite (19.78 g) was added dropwise thereto, followed by stirring at room temperature for 3 hours. Ethyl acetate (30 ml) was added to the reaction mixture, and the resulting layers were separated. To the organic layer were added a saturated aqueous sodium chloride solution (60 ml) and ethyl acetate (30 ml), and the resulting layers were separated. The organic layer was washed with a 10% aqueous solution of sodium hydrogensulfite (60 ml). The aqueous layer was extracted with ethyl acetate (50 ml). The organic layers were combined and washed with 1N hydrochloric acid (60 ml) and saturated saline (60 ml) successively, and dried over anhydrous magnesium sulfate, followed by concentration. Ethyl acetate (50 ml) was added to the residue, followed by concentration. Ethyl acetate (50 ml) was further added to the residue, followed by concentration. To the resulting crude crystals was added ethyl acetate (35 ml), followed by heating under reflux for 15 minutes. Isopropyl ether (17.5 ml) was added, followed by heating under reflux for further 15 minutes. The solution was cooled to room temperature, followed by stirring at 5° C. overnight. The precipitated crystals were collected by filtration, and washed with isopropyl ether (50 ml). The crystals were dried in vacuo to obtain the compound of the invention (11.99 g; yield: 63%) having the following physical properties.
- TLC: Rf 0.55 (chloroform:methanol:acetic acid=18:1:1)
- NMR (CD 3OD): δ8.65 (s, 1H), 7.60-7.25 (m, 10H), 5.23 (s, 2H), 4.60 (s, 2H)
-
- A 2.0 M solution of lithium diiospropylamide (19.65 kg) was added dropwise to a solution of the compound produced in Reference Example 1 (2.52 kg), the compound produced in Reference Example 3 (6.10 kg), and tetramethylethylenediamine (5.62 kg) in tetrahydrofuran (25.2 L) at −65° C. or less in an argon stream, followed by stirring at −25° C. to −20° C. for 3 to 5 hours. The reaction mixture was poured into a cool 10% aqueous citric acid solution (93 L) and extracted with ethyl acetate. To the organic layer was added 1N hydrochloric acid (96.8 L), followed by stirring for 1 hour, and the resulting layers were separated. The organic layer was washed with a 5% aqueous potassium carbonate solution (50.4 L), water (25.2 L, twice), and saturated saline (8.4 L) successively, and dried over anhydrous magnesium sulfate. The anhydrous magnesium sulfate was separated by filtration and washed with tetrahydrofuran (2.8 L). The organic layer was concentrated to obtain the compound of the invention (3.69 kg, crude product) having the following physical properties.
- TLC: Rf 0.70 (hexane:ethyl acetate=2:1)
- NMR (CDCl 3): δ5.30-5.05 (m, 2H), 2.46 (m, 1H), 1.48 (s, 9H), 1.43 (s, 9H), 1.09 (d, J=6.9 Hz, 3H), 0.88 (d, J=6.9 Hz, 3H).
-
- The compound of the invention having the following physical properties was obtained in the same manner as in Example 1, except for replacing the compound produced in Reference Example 3 with a corresponding oxadiazole derivative and replacing the compound produced in Reference Example 1 with t-butyl N-((2S)-1-(N′-methyl-N′-methoxyaminocarbonyl)-2-methylpropyl)carbamate.
- TLC: Rf 0.50 (ethyl acetate:n-hexane=1:2)
- NMR (CDCl 3): δ7.32 (m, 5H), 5.16 (m, 2H), 2.45 (m, 1H), 1.89 (s, 6H), 1.43 (s, 9H), 1.07 (d, 3H, J=6.8 Hz), 0.86 (d, 3H, J=7.2 Hz) cl EXAMPLE 2
-
- A solution of the compound produced in Example 1 (3.15 kg) in ethyl acetate (4.3 L) was added dropwise to a 4N hydrogen chloride-ethyl acetate solution (9.7 L) at 10-20° C. in a nitrogen stream, followed by stirring for 1.5-2 hours. A 4N hydrogen chloride-ethyl acetate solution (4.8 L) was added to the reaction mixture at 10-20° C., followed by stirring for 1 hour. The reaction mixture was concentrated, ethyl acetate (8.8 L) was added thereto, followed by concentration. Ethyl acetate (8.8 L) was again added to the concentrate, followed by concentration. t-Butyl methyl ether (29.0 L) was added to the concentrate, followed by stirring at 5° C. or lower for at least 2 hours. The precipitated solid was collected by filtration. The filtered solid was washed with a mixed solvent (t-butyl methyl ether (3.84 L) and ethyl acetate (0.96 L)) and dried in vacuo at 30° C. for at least 15 hours to obtain the compound of the invention (2.16 kg; yield through the two steps: 86%) having the following physical properties.
- TLC: Rf 0.90 (chloroform:methanol=10:1)
- NMR (CD 3OD): δ5.05 (d, J=3.8 Hz, 1H), 2.85 (m, 1H), 1.48 (s, 9H), 1.35 (d, J=6.9 Hz, 3H), 1.10 (d, J=6.9 Hz, 3H)
-
- The compound of the invention having the following physical properties was obtained in the same manner as in Example 2, except for replacing the compound produced in Example 1 with the compound produced in
- TLC: Rf 0.50 (chloroform:methanol=10:1)
- NMR (CDCl 3): δ9.05 (brs, 2H), 7.28 (m, 5H), 4.96 (m, 1H), 2.79 (m, 1H), 1.87 (s, 6H), 1.29 (d, J=6.8 Hz, 3H), 1.02 (d, J=7.2 Hz, 3H)
-
- N-Methylmorpholine (634 g) was added to a solution of the compound produced in Reference Example 9 (2.38 kg) in tetrahydrofuran (12.9 L) at −5° C. or lower in an argon stream, ethyl chlorocarbonate (680 g) was added dropwise thereto at −2° C. or lower, and the reaction mixture was stirred at −5° C. or lower for 30 minutes. The compound produced in Example 2 (1.64 kg) was added to the reaction mixture at −5° C. or lower, followed by stirring for 30 minutes. To the reaction mixture was added N-methylmorpholine (634 g) at −5° C. or lower, followed by stirring for 30 minutes. t-Butyl methyl ether (24.8 L) and 1N hydrochloric acid (12.9 L) were added to the reaction mixture, and the resulting layers were separated. The organic layer was washed with a 5% aqueous sodium hydrogencarbonate solution (12.9 L), a 5% aqueous potassium carbonate solution (12.9 L), 1N hydrochloric acid (12.9 L), water (12.9 L), and saturated saline (12.9 L) successively, and dried over anhydrous magnesium sulfate. The magnesium sulfate was separated by filtration and washed with tetrahydrofuran (18 L). The organic layer was concentrated to obtain the compound of the invention (3.61 kg; yield: 98%) having the following physical properties.
- TLC: Rf 0.33 (hexane:ethyl acetate=1:1)
- NMR (CDCl 3): δ8.78 (s, 1H), 7.60-7.30 (m, 10H), 6.74 (d, J=8.5 Hz, 1H), 5.43 (dd, J=8.5, 5.2 Hz, 1H), 5.23 (s, 2H), 4.64 (d, J=15.3 Hz, 1H), 4.60 (d, J=15.3 Hz, 1H), 2.50 (m, 1H), 1.47 (s, 9H), 1.06 (d, J=6.8 Hz, 3H), 0.87 (d, J=6.8 Hz, 3H).
-
- To a solution of the compound produced in Example 3 (1.61 kg) in methanol (27 L) was added 10% palladium-carbon (water content: 50%; 274 g) at room temperature in an argon atmosphere. Argon substitution was carried out three times, and then hydrogen substitution was carried out three times. The reaction mixture was stirred at 25° C. and 3 atm for 25 minutes. After argon substitution was carried out three times, the reaction mixture was filtered, and the filtrate was concentrated. The residue was dissolved in methanol (54.8 L), followed by filtration. Water (54.8 L) was added to the filtrate, and seed crystals (12.4 g) were added to thereto, followed by stirring overnight and then stirring at 5-10° C. for 1 hour. The precipitated crystals were collected by filtration, washed with water (30 L), and dried in vacuo at 60° C. for at least 38 hours to obtain the compound of the invention (1.90 kg; yield: 77%) having the following physical properties.
- TLC: Rf 0.45 (methylene chloride:ethyl acetate:ethanol=10:10:1)
- NMR (CDCl 3): δ7.58-7.35 (m, 6H), 6.94 (d, J=8.4 Hz, 1H), 5.44 (dd, J=8.4, 4.9 Hz, 1H), 4.66 (d, J=15.4 Hz, 1H), 4.60 (d, J=15.4 Hz, 1H), 4.06 (brs, 2H), 2.51 (m, 1H), 1.48 (s, 9H), 1.07 (d, J=6.9 Hz, 3H), 0.87 (d, J=6.9 Hz, 1H)
- Among the compounds represented by formula (W-c-1), a compound in which R 1w is a t-butyl group was produced by the processes shown in the previously described reaction schemes 2 and 3.
-
- Diisobutylaluminum hydride (1.0 M toluene solution, 80 ml) was added dropwise to a solution of the compound produced in Reference Example 1 (9.0 g) in anhydrous tetrahydrofuran (500 ml) at −78° C. in an argon stream, followed by stirring for 30 minutes. Methanol (100 ml) was added to the reaction mixture, the temperature was raised to 0° C., and a saturated aqueous ammonium chloride solution (100 ml) was added thereto. The reaction mixture was filtered, and the filtrate was concentrated. The residue was purified by silica gel column chromatography (hexane:ethyl acetate=19:1→4:1) to obtain the title compound (5.4 g; yield: 78%) having the following physical properties.
- TLC: Rf 0.55 (hexane:ethyl acetate=4:1)
- NMR (CDCl 3): δ9.62 (s, 1H), 5.16 (brs, 1H), 4.25 (brs, 1H), 2.27 (m, 1H), 1.43 (s, 9H), 1.03 (d, J=6.6 Hz, 3H), 0.96 (d, J=6.6 Hz, 3H)
-
- n-Butyl lithium (1.6 M hexane solution, 308 ml) was added dropwise to a solution of the compound produced in Reference Example 3 (62.1 g) in tetrahydrofuran (1.65 L) at −70° C. in an argon atmosphere, followed by stirring for 40 minutes. Magnesium bromide diethyl etherate (127 g) was added to the reaction mixture, and the temperature was raised to −45° C., followed by stirring for 1.5 hours. A solution of the compound prepared in Comparative Example 1 (90.0 g) in tetrahydrofuran (60 ml) was added to the reaction mixture, and the temperature was raised to −20° C., followed by stirring for 3.5 hours. A saturated aqueous solution of ammonia chloride (1.5 L) was added to the reaction mixture, followed by extraction with ethyl acetate (1.8 L). The organic layer was washed with water (1 L, three times) and saturated saline (1 L) successively, dried over anhydrous sodium sulfate, and concentrated. The residue was purified by silica gel column chromatography (ethyl acetate:hexane=1:20→1:1) to obtain the title compound (76.8 g; yield: 53%) having the following physical properties.
- TLC: Rf 0.42 (ethyl acetate:hexane=1:1).
- NMR (CDCl 3): δ5.18-4.90 (m, 2H), 4.51 and 4.12 (each m, totally 1H), 3.91 and 3.66 (each m, totally 1H), 1.95 (m, 1H), 1.42, 1.41 and 1.34 (each s, totally 18H), 1.15-0.90 (m, 6H).
-
- A solution of the compound produced in Comparative Example 2 (76.3 g) and a 4N hydrogen chloride-dioxane solution (1 L) in dioxane (200 ml) was vigorously stirred at room temperature for 2 hours, followed by concentration. The residue was solidified with diethyl ether and subjected to azeotropy with benzene to quantitatively obtain the title compound (66.1 g) having the following physical properties.
- TLC: Rf 0.30 and 0.26 (methanol:chloroform=1:10)
- NMR (CDCl 3): δ8.34 and 8.24 (each br, each 1H), 5.60 (br, 1H), 3.97-3.60 (m, 2H), 2.08 (m, 1H), 1.42 and 1.41 (each s, totally 9H), 1.25-0.95 (m, 6H).
-
- To a solution of the compound produced in Reference Example 9 (10.0 g) and the compound produced in Comparative Example 3 (8.16 g) in anhydrous dimethylformamide (88 ml) were added 1-hydroxybenzotriazole monohydrate (4.44 g) and 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (6.62 g) in an argon stream under cooling with ice, and N-methylmorpholine (3.19 ml) was added dropwise thereto. The reaction mixture was stirred under ice-cooling for 20 minutes and then at room temperature for 6.5 hours, followed by concentration. Ethyl acetate (100 ml) and water (100 ml) were added to the residue, and the resulting layers were separated. The organic layer was washed with a saturated aqueous solution of ammonium chloride (60 ml, twice), a saturated aqueous solution of sodium hydrogencarbonate (60 ml, twice), water (60 ml), and saturated saline (60 ml) successively, dried over anhydrous sodium sulfate, and concentrated. The resulting solid (14.7 g; yield: 95%) was used in the subsequent reaction without purification.
- TLC: Rf 0.60 and 0.55 (chloroform:methanol=9:1)
- NMR (CDCl 3): δ8.80 and 8.71 (each brs, total 1H), 7.64-7.24 (m, 11H), 7.15 and 6.79 (each brd, J=9.8 Hz, total 1H), 5.28-4.98 (m, ca. 1.5H), 5.20 (s, 2H), 4.69 (brs, ca. 0.5H), 4.58 and 4.46 (each brs, total 2H), 4.30 and 4.05 (each m, total 1H), 2.05-1.65 (m, 1H), 1.38 and 1.34 (each s, total 9H), 1.08, 0.96, 0.92, and 0.91 (each d, J=6.4 Hz, total 6H).
-
- A solution of dimethyl sulfoxide (7.1 ml) in anhydrous methylene chloride (100 ml) was added dropwise to a solution of oxalyl chloride (4.4 ml) in anhydrous methylene chloride (100 ml) at −60° C. or lower in an argon stream, followed by stirring for 40 minutes. A solution of the compound produced in Comparative Example 4 (14.7 g) in a mixed solvent (anhydrous methylene chloride (75 ml) and dimethyl sulfoxide (10 ml)) was added dropwise to the reaction mixture at −60° C. or lower, followed by stirring for 2 hours. Triethylamine (69.8 ml) was added dropwise to the reaction mixture at −60° C. or lower, followed by stirring at room temperature overnight. The reaction mixture was cooled with ice, and 2N hydrochloric acid (200 ml) was added dropwise thereto. The organic layer was washed with 1 N hydrochloric acid (150 ml), water (150 ml), and saturated saline (150 ml) successively, dried over anhydrous magnesium sulfate, and concentrated. The resulting solid (14.6 g; yield: 100%) was used in the subsequent reaction without purification.
-
- A solution of aluminum chloride (20.0 g) in nitromethane (70 ml) was added to a solution of the compound produced in Comparative Example 5 (14.4 g) and anisole (16.0 ml) in nitromethane (70 ml) under cooling with ice, followed by stirring under ice cooling for 10 minutes and then stirring at room temperature for 14 hours. The reaction mixture was poured into ice-water (200 ml) and extracted with ethyl acetate (120 ml and 40 ml). The organic layer was washed with a sodium chloride aqueous solution (a saturated sodium chloride aqueous solution (100 ml)+water (100 ml)) and saturated saline (200 ml) successively, dried over anhydrous magnesium sulfate, and concentrated. The residue was purified by silica gel column chromatography (hexane:ethyl acetate=1:2→0:1) to obtain a solid (6.7 g). The solid was washed with a mixed solvent (hexane:ethyl acetate=1:3) to obtain the title compound (5.2 g; yield: 46%).
Claims (11)
1. A compound represented by formula (I):
(wherein R1 represents a hydrogen atom or an amino-protective group; R2, R3 and R4 each independently represents
(1) a C1-8 alkyl group,
(2) a C3-7 cycloalkyl group,
(3) a phenyl group,
(4) a phenyl group substituted with one to three of a C1-8 alkyl group, a C1-8 alkoxy group, a halogen atom, a trifluoromethyl group, and a trifluoromethoxy group, or
(5) a 3,4-methylenedioxyphenyl group; or
(6) R3 and R4 are taken together to represent a C2-6 alkylene group), a non-toxic salt thereof or a hydrate thereof.
3. The compound according to claim 1 , wherein R1 represents a benzyloxycarbonyl group, a t-butoxycarbonyl group or a trifluoroacetyl group in formula (I), said compound being represented by formula (I-2):
(wherein R5 represents a benzyloxycarbonyl group, a t-butoxycarbonyl group or a trifluoroacetyl group; and R2, R3 and R4 have the same meanings as in claim 1) .
4. The compound according to claim 1 , wherein R2, R3 and R4 each independently represents a C1-8 alkyl group, a phenyl group or a 3,4-methylenedioxyphenyl group, or R3 and R4 are taken together to represent a C2-5 alkylene group in formula (I).
5. The compound according to claim 4 , wherein R2, R3 and R4 each represents a methyl group; R2 represents a methyl group, and R3 and R4 are taken together to represent an ethylene group; R2 and R3 each represents a methyl group, and R4 represents a phenyl group; or R2 and R3 each represents a methyl group, and R4 represents a 3,4-methylenedioxyphenyl group.
6. The compound according to claim 2 , which is
(1) 1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropylamine, or
(2) 1-(2-(α,α-dimethylbenzyl)-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropylamine.
7. The compound according to claim 3 , which is
(1) t-butyl N-(1-(2-t-butyl-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)carbamate, or
(2) t-butyl N-(1-(2-(α,α-dimethylbenzyl)-1,3,4-oxadiazol-5-ylcarbonyl)-2-methylpropyl)carbamate.
8. A process for producing a compound represented by formula (I-2):
(wherein symbols in the formula have the same meanings as described below), comprising reacting a compound represented by formula (V):
(wherein R5 has the same meaning as in claim 3) with a compound represented by formula (VI):
(wherein R2, R3, and R4 have the same meanings as in claim 1) .
9. A process for producing a compound represented by formula (I-1)
(wherein symbols in the formula have the same meanings as described below), comprising subjecting a compound represented by formula (I-2):
(wherein R2, R3, R4 and R5 have the same meanings as in claim 3) to a deprotection reaction of the amino-protecting group.
10. A process for producing a compound represented by formula (III):
(wherein R2, R3, R4 and R6 have the same meanings as described below) comprising subjecting a compound represented by formula (I-2):
(wherein R2, R3, R4, and R5 have the same meanings as described in claim 3) to a deprotection reaction of the amino-protecting group, and subjecting the resulting compound represented by formula (I-1):
(wherein symbols in the formula have the same meanings as described above) to an amidation with a compound represented by formula (IV):
(wherein R6 represents an amino-protecting group).
11. A process for producing a compound represented by formula (II):
(wherein symbols in the formula have the same meanings as described below), comprising subjecting a compound represented by formula (I-2):
(wherein R2, R3, R4, and R5 have the same meanings as in claim 3) to a deprotection reaction of the amino-protecting group, reacting the resulting compound represented by formula (I-1):
(wherein symbols in the formula have the same meanings as described above) with a compound represented by formula (IV), and subjecting the resulting compound represented by formula (III):
(wherein R2, R3, R4 1 and R6 have the same meanings as in claim 10) to a deprotection reaction of the amino-protecting group.
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| US10/346,136 US20030153758A1 (en) | 1999-03-12 | 2003-01-17 | 1,3,4-Oxadiazole derivatives and process for producing the same |
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| JP6606599 | 1999-03-12 | ||
| JP1166065 | 1999-03-12 | ||
| US09/936,331 US6534658B1 (en) | 1999-03-12 | 2000-03-10 | 1,3,4-oxadiazole derivatives and process for producing the same |
| US10/346,136 US20030153758A1 (en) | 1999-03-12 | 2003-01-17 | 1,3,4-Oxadiazole derivatives and process for producing the same |
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| US09/936,331 Division US6534658B1 (en) | 1999-03-12 | 2000-03-10 | 1,3,4-oxadiazole derivatives and process for producing the same |
| PCT/JP2000/001464 Division WO2000055145A1 (en) | 1999-03-12 | 2000-03-10 | 1,3,4-oxadiazole derivatives and process for producing the same |
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| US10/346,136 Abandoned US20030153758A1 (en) | 1999-03-12 | 2003-01-17 | 1,3,4-Oxadiazole derivatives and process for producing the same |
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| EP (1) | EP1162199A4 (en) |
| KR (1) | KR20010102569A (en) |
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| AU (1) | AU2941200A (en) |
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| RU (1) | RU2001124908A (en) |
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| EP2088471A1 (en) | 2008-02-11 | 2009-08-12 | Samsung Electronics Co., Ltd. | Electrophographic Photoreceptor and Electrophotographic Imaging Apparatus Using the Same |
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| BR0108068A (en) * | 2000-02-03 | 2004-07-06 | Ono Pharmaceutical Co | 1,3,4-oxadiazole derivatives and process for their production |
| WO2002014310A1 (en) * | 2000-08-10 | 2002-02-21 | Ono Pharmaceutical Co., Ltd. | 2-[5-AMINO-6-OXO-2-PHENYL-1,6-DIHYDRO-1-PYRIMIDYL]-N-[1-(2-[5-t-BUTYL-1,3,4-OXADIAZOLYL]CARBONYL)-2-(R,S)-METHYLPROPYL]ACETAMIDE HYDROCHLORIDE |
| US20040023998A1 (en) * | 2000-09-08 | 2004-02-05 | Tsutomu Kojima | Novel crystals of 1,3,4-oxadiazole derivatives, process for producing the crystals and medicines containing the same as the active ingredient |
| JPWO2002051815A1 (en) * | 2000-12-26 | 2004-04-22 | 小野薬品工業株式会社 | Pyrimidine derivative compounds and methods for their production |
| JP2007518711A (en) * | 2003-12-19 | 2007-07-12 | メルク エンド カムパニー インコーポレーテッド | Mitotic kinesin inhibitor |
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| US5591695A (en) * | 1995-02-08 | 1997-01-07 | American Cyanamid Co. | Herbicidal [1,3,4]oxadiazoles and thiadiazoles |
| US5801148A (en) * | 1994-11-21 | 1998-09-01 | Cortech, Inc. | Serine protease inhibitors-proline analogs |
| US6015791A (en) * | 1994-11-21 | 2000-01-18 | Cortech Inc. | Serine protease inhibitors-cycloheptane derivatives |
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| RU2217436C2 (en) * | 1996-12-06 | 2003-11-27 | Кортеч, Инк. | Derivatives of ox diazole, thiadiazole or triazole as inhibitors of serine proteases and pharmaceutical compositions containing thereof |
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2000
- 2000-03-10 AU AU29412/00A patent/AU2941200A/en not_active Abandoned
- 2000-03-10 RU RU2001124908/04A patent/RU2001124908A/en unknown
- 2000-03-10 WO PCT/JP2000/001464 patent/WO2000055145A1/en not_active Ceased
- 2000-03-10 US US09/936,331 patent/US6534658B1/en not_active Expired - Fee Related
- 2000-03-10 TW TW089104322A patent/TW482763B/en not_active IP Right Cessation
- 2000-03-10 KR KR1020017011573A patent/KR20010102569A/en not_active Withdrawn
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- 2000-03-10 EP EP00907995A patent/EP1162199A4/en not_active Withdrawn
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- 2000-03-10 CA CA002367418A patent/CA2367418A1/en not_active Abandoned
- 2000-03-10 MX MXPA01009165A patent/MXPA01009165A/en not_active Application Discontinuation
- 2000-03-10 CN CN00807456A patent/CN1350525A/en active Pending
- 2000-03-10 NZ NZ513921A patent/NZ513921A/en not_active Application Discontinuation
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- 2001-08-31 ZA ZA200107256A patent/ZA200107256B/en unknown
- 2001-09-10 NO NO20014393A patent/NO20014393L/en not_active Application Discontinuation
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5801148A (en) * | 1994-11-21 | 1998-09-01 | Cortech, Inc. | Serine protease inhibitors-proline analogs |
| US6015791A (en) * | 1994-11-21 | 2000-01-18 | Cortech Inc. | Serine protease inhibitors-cycloheptane derivatives |
| US5591695A (en) * | 1995-02-08 | 1997-01-07 | American Cyanamid Co. | Herbicidal [1,3,4]oxadiazoles and thiadiazoles |
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| EP2088471A1 (en) | 2008-02-11 | 2009-08-12 | Samsung Electronics Co., Ltd. | Electrophographic Photoreceptor and Electrophotographic Imaging Apparatus Using the Same |
| US20090202929A1 (en) * | 2008-02-11 | 2009-08-13 | Samsung Electronics Co., Ltd | Electrophographic photoreceptor including diphenoquinone-based compounds including oxadiazolene group, and electrophotographic imaging apparatus using the same |
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| KR20010102569A (en) | 2001-11-15 |
| NO20014393L (en) | 2001-11-08 |
| TR200102680T2 (en) | 2002-07-22 |
| CA2367418A1 (en) | 2000-09-21 |
| NO20014393D0 (en) | 2001-09-10 |
| EP1162199A1 (en) | 2001-12-12 |
| EP1162199A4 (en) | 2002-06-05 |
| NZ513921A (en) | 2001-09-28 |
| CN1350525A (en) | 2002-05-22 |
| HUP0200476A3 (en) | 2004-03-29 |
| WO2000055145A1 (en) | 2000-09-21 |
| BR0008936A (en) | 2002-04-09 |
| US6534658B1 (en) | 2003-03-18 |
| HUP0200476A2 (en) | 2002-08-28 |
| RU2001124908A (en) | 2004-02-27 |
| ZA200107256B (en) | 2002-12-02 |
| AU2941200A (en) | 2000-10-04 |
| TW482763B (en) | 2002-04-11 |
| MXPA01009165A (en) | 2002-08-20 |
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