US20030130520A1 - Method of producing pesticides - Google Patents
Method of producing pesticides Download PDFInfo
- Publication number
- US20030130520A1 US20030130520A1 US10/226,181 US22618102A US2003130520A1 US 20030130520 A1 US20030130520 A1 US 20030130520A1 US 22618102 A US22618102 A US 22618102A US 2003130520 A1 US2003130520 A1 US 2003130520A1
- Authority
- US
- United States
- Prior art keywords
- formula
- compound
- producing
- iia
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 50
- 239000000575 pesticide Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims abstract description 128
- 239000000203 mixture Substances 0.000 claims abstract description 34
- 150000003839 salts Chemical group 0.000 claims abstract description 27
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 15
- 239000001257 hydrogen Substances 0.000 claims abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 125000000335 thiazolyl group Chemical group 0.000 claims abstract description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 6
- 125000003349 3-pyridyl group Chemical group N1=C([H])C([*])=C([H])C([H])=C1[H] 0.000 claims abstract description 4
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims abstract description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims abstract description 3
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 claims abstract description 3
- -1 propargyloxy Chemical group 0.000 claims description 58
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 27
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 24
- 125000001424 substituent group Chemical group 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 229910052736 halogen Inorganic materials 0.000 claims description 15
- 150000002367 halogens Chemical class 0.000 claims description 15
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 125000000732 arylene group Chemical group 0.000 claims description 10
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 9
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 claims description 8
- 125000006274 (C1-C3)alkoxy group Chemical group 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 5
- 125000005336 allyloxy group Chemical group 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 229920002866 paraformaldehyde Polymers 0.000 claims description 5
- 125000000177 propargylthio group Chemical group [H]C#CC([H])([H])S* 0.000 claims description 5
- 125000004455 (C1-C3) alkylthio group Chemical group 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 238000006467 substitution reaction Methods 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 2
- 125000002950 monocyclic group Chemical group 0.000 claims description 2
- 150000002431 hydrogen Chemical group 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 30
- 0 [1*]C(C)N([H])/C(=N/[N+](=O)[O-])N([2*])[H] Chemical compound [1*]C(C)N([H])/C(=N/[N+](=O)[O-])N([2*])[H] 0.000 description 25
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 21
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 239000000460 chlorine Substances 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 150000003254 radicals Chemical group 0.000 description 9
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 8
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 7
- 229910052794 bromium Inorganic materials 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 229910000027 potassium carbonate Inorganic materials 0.000 description 6
- 125000004076 pyridyl group Chemical group 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- XCXKNNGWSDYMMS-UHFFFAOYSA-N 2-methyl-1-nitroguanidine Chemical compound CNC(N)=N[N+]([O-])=O XCXKNNGWSDYMMS-UHFFFAOYSA-N 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 125000000304 alkynyl group Chemical group 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- FJPZHYAYNAUKKA-UHFFFAOYSA-N CC1=CN=C(Br)S1 Chemical compound CC1=CN=C(Br)S1 FJPZHYAYNAUKKA-UHFFFAOYSA-N 0.000 description 4
- ITQTTZVARXURQS-UHFFFAOYSA-N CC1=CN=CC=C1 Chemical compound CC1=CN=CC=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric Acid Chemical compound [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 150000003973 alkyl amines Chemical class 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- SKCNYHLTRZIINA-UHFFFAOYSA-N 2-chloro-5-(chloromethyl)pyridine Chemical compound ClCC1=CC=C(Cl)N=C1 SKCNYHLTRZIINA-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- HAIYJMDKRRQFAJ-UHFFFAOYSA-N CC1=CC(Cl)=NO1 Chemical compound CC1=CC(Cl)=NO1 HAIYJMDKRRQFAJ-UHFFFAOYSA-N 0.000 description 3
- QQQDQHRIVOYOEZ-UHFFFAOYSA-N CC1=CC=C(CCCC2=CC=C(C)C=C2)C=C1 Chemical compound CC1=CC=C(CCCC2=CC=C(C)C=C2)C=C1 QQQDQHRIVOYOEZ-UHFFFAOYSA-N 0.000 description 3
- YWYHGNUFMPSTTR-UHFFFAOYSA-N CC1=CC=C(OC2=CC=C(C)C=C2)C=C1 Chemical compound CC1=CC=C(OC2=CC=C(C)C=C2)C=C1 YWYHGNUFMPSTTR-UHFFFAOYSA-N 0.000 description 3
- WVUHHPQQQLBMOE-UHFFFAOYSA-N CC1=CN=C(C)S1 Chemical compound CC1=CN=C(C)S1 WVUHHPQQQLBMOE-UHFFFAOYSA-N 0.000 description 3
- YZZGJHDTYZOSIH-UHFFFAOYSA-N CC1=CN=C(Cl)C(Cl)=C1 Chemical compound CC1=CN=C(Cl)C(Cl)=C1 YZZGJHDTYZOSIH-UHFFFAOYSA-N 0.000 description 3
- VXLYOURCUVQYLN-UHFFFAOYSA-N CC1=CN=C(Cl)C=C1 Chemical compound CC1=CN=C(Cl)C=C1 VXLYOURCUVQYLN-UHFFFAOYSA-N 0.000 description 3
- RTEUDRWHKUPKJB-UHFFFAOYSA-N CC1=CN=C(Cl)S1 Chemical compound CC1=CN=C(Cl)S1 RTEUDRWHKUPKJB-UHFFFAOYSA-N 0.000 description 3
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- DMGGLIWGZFZLIY-UHFFFAOYSA-N CC1=C[N+]([O-])=CC=C1 Chemical compound CC1=C[N+]([O-])=CC=C1 DMGGLIWGZFZLIY-UHFFFAOYSA-N 0.000 description 3
- LJPCNSSTRWGCMZ-UHFFFAOYSA-N CC1CCOC1 Chemical compound CC1CCOC1 LJPCNSSTRWGCMZ-UHFFFAOYSA-N 0.000 description 3
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- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- OJVHJLVCWXIYPU-UHFFFAOYSA-N O.[H]N1CN(CCC)CN(C)/C1=N/[N+](=O)[O-] Chemical compound O.[H]N1CN(CCC)CN(C)/C1=N/[N+](=O)[O-] OJVHJLVCWXIYPU-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229940125773 compound 10 Drugs 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 150000008282 halocarbons Chemical class 0.000 description 3
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
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- 229910002027 silica gel Inorganic materials 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- QISOBCMNUJQOJU-UHFFFAOYSA-N 4-bromo-1h-pyrazole-5-carboxylic acid Chemical compound OC(=O)C=1NN=CC=1Br QISOBCMNUJQOJU-UHFFFAOYSA-N 0.000 description 2
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- SGVUHPSBDNVHKL-UHFFFAOYSA-N CC1CCCC(C)C1 Chemical compound CC1CCCC(C)C1 SGVUHPSBDNVHKL-UHFFFAOYSA-N 0.000 description 2
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- 241001465754 Metazoa Species 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical group CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 2
- 125000004450 alkenylene group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000004419 alkynylene group Chemical group 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000004956 cyclohexylene group Chemical group 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
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- ZUHZZVMEUAUWHY-UHFFFAOYSA-N n,n-dimethylpropan-1-amine Chemical compound CCCN(C)C ZUHZZVMEUAUWHY-UHFFFAOYSA-N 0.000 description 2
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- OYWRDHBGMCXGFY-UHFFFAOYSA-N 1,2,3-triazinane Chemical class C1CNNNC1 OYWRDHBGMCXGFY-UHFFFAOYSA-N 0.000 description 1
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- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
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- YOOSAIJKYCBPFW-UHFFFAOYSA-N 3-[4-(3-aminopropoxy)butoxy]propan-1-amine Chemical compound NCCCOCCCCOCCCN YOOSAIJKYCBPFW-UHFFFAOYSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
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- OFBVKPOIKHZZKA-SSZFMOIBSA-N CCCN1CN(C)/C(=N/[N+](=O)[O-])N(CC2=CC=C(Cl)N=C2)C1 Chemical compound CCCN1CN(C)/C(=N/[N+](=O)[O-])N(CC2=CC=C(Cl)N=C2)C1 OFBVKPOIKHZZKA-SSZFMOIBSA-N 0.000 description 1
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- ICPWYMPJTCFACQ-QINSGFPZSA-N CCN1CN(C)/C(=N/[N+](=O)[O-])N(CC2=CC=C(Cl)N=C2)C1 Chemical compound CCN1CN(C)/C(=N/[N+](=O)[O-])N(CC2=CC=C(Cl)N=C2)C1 ICPWYMPJTCFACQ-QINSGFPZSA-N 0.000 description 1
- WFDLASOOKGHPOO-RAXLEYEMSA-N CCN1CN(C)/C(=N/[N+](=O)[O-])N(CC2=CN=C(Cl)S2)C1 Chemical compound CCN1CN(C)/C(=N/[N+](=O)[O-])N(CC2=CN=C(Cl)S2)C1 WFDLASOOKGHPOO-RAXLEYEMSA-N 0.000 description 1
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- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- JNCMHMUGTWEVOZ-UHFFFAOYSA-N F[CH]F Chemical compound F[CH]F JNCMHMUGTWEVOZ-UHFFFAOYSA-N 0.000 description 1
- 241001466042 Fulgoromorpha Species 0.000 description 1
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- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
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- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
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- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
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- 241000607479 Yersinia pestis Species 0.000 description 1
- DENJWAZBLGVDOB-UHFFFAOYSA-N [H]N(C)/C(=N/[N+](=O)[O-])N([H])CC Chemical compound [H]N(C)/C(=N/[N+](=O)[O-])N([H])CC DENJWAZBLGVDOB-UHFFFAOYSA-N 0.000 description 1
- SWHRDLPFZQFSLS-UHFFFAOYSA-N [H]N(C)/C(=N/[N+](=O)[O-])N([H])CC1=CC=C(Cl)N=C1 Chemical compound [H]N(C)/C(=N/[N+](=O)[O-])N([H])CC1=CC=C(Cl)N=C1 SWHRDLPFZQFSLS-UHFFFAOYSA-N 0.000 description 1
- PGOOBECODWQEAB-UHFFFAOYSA-N [H]N(C)/C(=N/[N+](=O)[O-])N([H])CC1=CN=C(Cl)S1 Chemical compound [H]N(C)/C(=N/[N+](=O)[O-])N([H])CC1=CN=C(Cl)S1 PGOOBECODWQEAB-UHFFFAOYSA-N 0.000 description 1
- XIFCYTIZPAZEAK-UHFFFAOYSA-N [H]N1CN(CC)CN(C)/C1=N/[N+](=O)[O-] Chemical compound [H]N1CN(CC)CN(C)/C1=N/[N+](=O)[O-] XIFCYTIZPAZEAK-UHFFFAOYSA-N 0.000 description 1
- ZYNRBGHHXCDLHG-UHFFFAOYSA-N [H]N1CN(CCCOCCC)CN(C)/C1=N/[N+](=O)[O-] Chemical compound [H]N1CN(CCCOCCC)CN(C)/C1=N/[N+](=O)[O-] ZYNRBGHHXCDLHG-UHFFFAOYSA-N 0.000 description 1
- 239000008351 acetate buffer Substances 0.000 description 1
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- 230000002411 adverse Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
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- 238000005804 alkylation reaction Methods 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
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- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical compound [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- PQZTVWVYCLIIJY-UHFFFAOYSA-N diethyl(propyl)amine Chemical group CCCN(CC)CC PQZTVWVYCLIIJY-UHFFFAOYSA-N 0.000 description 1
- 125000004852 dihydrofuranyl group Chemical group O1C(CC=C1)* 0.000 description 1
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- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
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- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
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- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000842 isoxazolyl group Chemical group 0.000 description 1
- 244000144972 livestock Species 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005394 methallyl group Chemical group 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- KHEZAZQZWQJLAE-UHFFFAOYSA-N nitrothiourea Chemical class [O-][N+](=O)NC(S)=N KHEZAZQZWQJLAE-UHFFFAOYSA-N 0.000 description 1
- 125000006574 non-aromatic ring group Chemical group 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 239000008363 phosphate buffer Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 description 1
- 239000004299 sodium benzoate Substances 0.000 description 1
- 235000010234 sodium benzoate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D213/36—Radicals substituted by singly-bound nitrogen atoms
- C07D213/40—Acylated substituent nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D213/36—Radicals substituted by singly-bound nitrogen atoms
- C07D213/38—Radicals substituted by singly-bound nitrogen atoms having only hydrogen or hydrocarbon radicals attached to the substituent nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/61—Halogen atoms or nitro radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/89—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members with hetero atoms directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/08—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D261/00—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings
- C07D261/02—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings
- C07D261/06—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members
- C07D261/08—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D261/00—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings
- C07D261/02—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings
- C07D261/06—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members
- C07D261/10—Heterocyclic compounds containing 1,2-oxazole or hydrogenated 1,2-oxazole rings not condensed with other rings having two or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D277/22—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D277/28—Radicals substituted by nitrogen atoms
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D277/32—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/10—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/14—Radicals substituted by nitrogen atoms not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/14—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing three or more hetero rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
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- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing three or more hetero rings
Definitions
- the present invention relates to a novel type of method of producing substituted 2-nitro-guanidine derivatives.
- R 1 is hydrogen or C 1 -C 4 -alkyl
- R 2 is hydrogen, C 1 -C 6 -alkyl, C 3 -C 6 -cycloalkyl or a radical —CH 2 B;
- Het is an aromatic or non-aromatic, monocyclic or bicyclic heterocyclic radical which is unsubstituted or—depending on the substitution possibilities of the ring system—mono- to penta- substituted by substituents selected from the group comprising halogen, C 1 -C 3 -alkyl, C 1 -C 3 -alkoxy, halogen-C 1 -C 3 -alkyl, C 1 -C 3 -halogenalkoxy, cyclopropyl, halogencyclopropyl, C 2 -C 3 -alkenyl, C 2 -C 3 -alkynyl, C 2 -C 3 -halogenalkenyl and C 2 -C 3 -halogenalkynyl, C 1 -C 3 -alkylthio, C 1 -C 3 -halogenalkylthio, allyloxy, propargyloxy, allylthio, propargylthio,
- B is phenyl, 3-pyridyl or thiazolyl, which are optionally substituted by one to three substituents from the group comprising C 1 -C 3 -alkyl, C 1 -C 3 -halogenalkyl, cyclopropyl, halogencyclopropyl, C 2 -C 3 -alkenyl, C 2 -C 3 -alkynyl, C 1 -C 3 -alkoxy, C 2 -C 3 -halogenalkenyl, C 2 -C 3 -halogenalkynyl, C 1 -C 3 -halogenalkoxy, C 1 -C 3 -alkylthio, C 1 -C 3 -halogenalkylthio, allyloxy, propargyloxy, allylthio, propargylthio, halogenallyloxy, halogenallylthio, halogen, cyano and nitro;
- A is a direct bond or an organic radical; or of formula
- R 1 , R 2 and Het are as defined above for formula (I), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form.
- the compounds of formula (I) may be present as E/Z isomers, e.g. in the following two isomeric forms
- any reference to compounds of formula (I) hereinbefore and hereinafter is understood to include also their corresponding E/Z isomers, even if the latter are not specifically mentioned in each case.
- the compounds of formula (I) may be present partly in the form of tautomers, for example in the forms
- any reference to compounds of formula (I) hereinbefore and hereinafter is understood to include also their corresponding tautomers, even if the latter are not specifically mentioned in each case.
- the compounds of formula (I) and, where appropriate, the E/Z isomers and tautomers thereof, may be present as salts.
- Compounds of formula (I) having at least one basic centre may form e.g. acid addition salts. These are formed for example with strong inorganic acids, such as mineral acids, e.g. sulfuric acid, a phosphoric acid or a hydrohalic acid, or with strong organic carboxylic acids, such as C 1 -C 4 alkanecarboxylic acids substituted where appropriate for example by halogen, e.g. acetic acid, such as optionally unsaturated dicarboxylic acids, e.g.
- oxalic, malonic, maleic, fumaric or phthalic acid such as hydroxy-carboxylic acids, e.g. ascorbic, lactic, malic, tartaric or citric acid, or benzoic acid, or with organic sulfonic acids, typically C 1 -C 4 alkane or arylsulfonic acids substituted where appropriate for example by halogen, e.g. methane-, trifluoromethane- or p-toluene-sulfonic acid. Salts of compounds of formula (I) with acids of the said kind are preferably obtained when working up the reaction mixtures.
- compounds of formula (I) with at least one acid group can form salts with bases.
- Suitable salts with bases are for example metal salts, typically alkali or alkaline earth metal salts, e.g. sodium, potassium or magnesium salts, or salts with ammonia or an organic amine, such as morpholine, piperidine, pyrrolidine, a mono-, di- or tri-lower alkylamine, e.g. ethyl-, diethyl-, triethyl- or dimethylpropylamine, or a mono-, di- or trihydroxy-lower alkylamine, e.g. mono-, di- or triethanolamine.
- metal salts typically alkali or alkaline earth metal salts, e.g. sodium, potassium or magnesium salts
- salts with ammonia or an organic amine such as morpholine, piperidine, pyrrolidine, a mono-, di- or tri-lower alkylamine, e.g.
- the halogen atoms considered as substituents may be both fluorine and chlorine, and bromine and iodine, whereby fluorine, chlorine and bromine are preferred, especially chlorine.
- Halogen in this context is understood to be an independent substituent or part of a substituent, such as in halogenalkyl, halogenalkylthio, halogenalkoxy, halogencycloalkyl, halogenalkenyl, halogenalkynyl, halogenallyloxy or halogenallylthio.
- the alkyl, alkylthio, alkenyl, alkynyl and alkoxy radicals considered as substituents may be straight-chained or branched.
- alkyls examples include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec.-butyl or tert.-butyl.
- Suitable alkoxy radicals which may be mentioned are, inter alia: methoxy, ethoxy, propoxy, isopropoxy or butoxy and the isomers thereof.
- Alkylthio is for example methylthio, ethylthio, isopropylthio, propylthio or the isomeric butylthio.
- alkyl, alkoxy, alkenyl, alkynyl or cycloalkyl groups considered as substituents are substituted by halogen, they may be only partially halogenated or also perhalogenated.
- halogen alkyl and alkoxy.
- alkyl elements of these groups are methyl which is mono- to trisubstituted by fluorine, chlorine and/or bromine, such as CHF 2 or CF 3 ; ethyl which is mono- to pentasubstituted by fluorine, chlorine and/or bromine, such as CH 2 CF 3 , CF 2 CF 3 , CF 2 CCl 3 , CF 2 CHCl 2 , CF 2 CHF 2 , CF 2 CFCl 2 , CF 2 CHBr 2 , CF 2 CHClF, CF 2 CHBrF or CClFCHClF; propyl or isopropyl, mono- to heptasubstituted by fluorine, chlorine and/or bromine, such as CH 2 CHBrCH 2 Br, CF 2 CHFCF 3 , CH 2 CF 2 CF 3 or CH(CF 3 ) 2 ; butyl or one of its isomers, mono- to nonasubstituted
- alkyl, alkoxy or cycloalkyl groups are substituted by other substituents, they may be mono- or repeatedly substituted by identical or different substituents from those listed. In the substituted groups, it is preferable for one or two further substituents to be present.
- the cycloalkyl radicals considered as substituents may be, for example, cyclopropyl, cyclobutyl, cyclopentyl or cyclohexyl.
- Alkenyl and alkynyl groups contain an unsaturated carbon-carbon bond. Typical representatives are allyl, methallyl or propargyl, but also vinyl and ethynyl. The double or triple bonds in allyloxy, propargyloxy, allylthio or propargylthio are separated from the connection point to the hetero atom (O or S) preferably by a saturated carbon atom.
- alkylene, alkenylene and alkynylene groups may also be straight-chained or branched. Examples are —CH 2 —CH 2 —, —CH 2 —CH 2 —CH 2 —, —CH 2 —CH 2 —CH 2 —, —CH 2 —C(CH 3 )H— and —C(CH 3 )H—C(CH 3 )H—.
- alkylene, alkenylene, alkynylene, cycloalkylene, arylene or heterocyclyl groups listed below are, where appropriate, substituted in the same way as the above-mentioned alkyl, alkenyl and alkynyl groups.
- Aryl or arylene signifies phenyl or naphthyl, or phenylene or naphthylene, especially phenyl or phenylene.
- heteroaryl radical indicated as Het signifies preferably a 5- to 7-membered, aromatic or non-aromatic ring with one to three hetero atoms selected from the group comprising N, O and S.
- aromatic 5- and 6-rings which have a nitrogen atom as the hetero atom and optionally one further hetero atom, preferably nitrogen, oxygen or sulphur, especially nitrogen.
- the hydrolysis process according to the invention may be carried out both in an acidic and in a basic medium.
- pH values In the acidic range, pH values of 6 or less, especially 1 to 3, are preferred.
- a pH value greater than 7 and up to 12, especially 8 to 12, in particular 8 to 10, is preferred.
- the reaction is carried out at normal pressure and at a temperature of 0 to 120° C., preferably 20 to 80° C.
- the reaction is carried out in a solvent or diluent that is inert towards the reaction components.
- Suitable solvents are, in particular, alcohols such as methanol, ethanol, propanol and isopropanol, as well as especially water.
- Further appropriate solvents are e.g. ethers, such as tetrahydrofuran and dioxane, as well as other solvents which do not adversely affect the reaction.
- the solvents may also be used as mixtures.
- a compound of formula (II) is preferably hydrolysed in an aqueous medium or in a mixture of water with an alcohol.
- Suitable acids for carrying out the process are preferably mineral acids, e.g. sulfuric acid, a phosphoric acid or a hydrohalic acid, an organic carboxylic acid, typically C 1 -C 4 alkane-carboxylic acids substituted where appropriate for example by halogen, e.g. acetic acid, such as dicarboxylic acids that are unsaturated where necessary, e.g. oxalic, malonic, maleic, fumaric or phthalic acid, typically hydroxycarboxylic acids, e.g.
- organic sulfonic acid typically C 1 -C 4 alkane- or aryl-sulfonic acids substituted where appropriate for example by halogen, e.g. methanesulfonic or p-toluenesulfonic acid.
- Suitable bases for carrying out the process are preferably hydroxides of alkali metals and alkaline earth metals, such as NaOH and KOH, carbonates such as Na 2 CO 3 , NaHCO 3 , K 2 CO 3 ; phosphates such as Na 3 PO 4 , Na 2 HPO 4 , alcoholates such as sodium methanolate, sodium ethanolate and K-tert.-butanolate, organic amines such as morpholine, piperidine, pyrrolidine, a mono-, di- or tri-lower alkylamine, e.g.
- ethyl-, diethyl, triethyl- or dimethyl-propyl-amine or a mono-, di- or trihydroxy lower alkylamine, e.g. mono-, di- or triethanol-amine, or dialkylaniline, for example N,N-dimethyl- or N,N-diethylaniline, as well as salts of organic acids, such as sodium acetate, potassium acetate or sodium benzoate, or mixtures thereof, for example acetate or phosphate buffers.
- the method according to the invention is preferably used to produce compounds of formula (I) in which the heterocyclic radical Het is unsaturated and is bonded by a carbon atom as a ring member to the fundamental substance.
- Especially preferred radicals Het are pyridyl, thiazolyl, tetrahydrofuranyl, dihydrofuranyl, furanyl, N-oxido-pyridinio, oxazolyl, isoxazolyl, thienyl, morpholinyl, piperidinyl, pyridinyl and pyrazinyl; particularly pyridyl, thiazolyl, tetrahydrofuranyl and N-oxido-pyridinio, most particularly 3-pyridyl, 2-halogenpyrid-5-yl, 2,3-dihalogenpyrid-5-yl, 2-halogenthiazol-5-yl, tetrahydrofuran-3-yl, 2-methyl-tetra
- the heterocycles Het carry one to three substituents from the group halogen, C 1 -C 3 -alkyl, C 1 -C 3 -halogenalkyl and C 1 -C 3 -halogenalkoxy each with 1 to 7 halogen atoms, and C 1 -C 3 -alkoxy, most preferably chlorine or methyl.
- radical B is a phenyl, pyridyl or thiazolyl radical that is unsubstituted or may be substituted by one to two radicals from the group halogen, C 1 -C 3 -alkyl, C 1 -C 3 -halogenalkyl and C 1 -C 3 -halogenalkoxy each with 1 to 7 halogen atoms, and C 1 -C 3 -alkoxy.
- R 1 is hydrogen
- R 2 is hydrogen, C 1 -C 3 -alkyl or cyclopropyl; especially hydrogen, methyl, ethyl or cyclopropyl, in particular methyl;
- Het is pyridyl, 1-oxopyridyl, tetrahydrofuranyl, thiazolyl; or pyridyl, 1-oxidopyridinio, tetra-hydrofuranyl or thiazolyl, respectively substituted by one to three substituents from the group halogen, C 1 -C 3 -alkyl, C 1 -C 3 -halogenalkyl as well as C 1 -C 3 -halogenalkoxy with 1 to 7 halogen atoms and C 1 -C 3 -alkoxy;
- D 1 and D 3 independently of each other, signify optionally substituted C 3 -C 12 -cycloalkylene or arylene and D 2 signifies C 2 -C 20 -alkylene, C 2 -C 20 -alkenylene, C 2 -C 20 -alkynylene, O, N—H or N—C 1 -C 12 -alkyl.
- Particularly preferred bridging members A are C 2 -C 12 -alkylene, C 2 -C 12 -alkylene interrupted by one or two phenylene, cyclohexylene or piperazinylene radicals; cyclohexylene or phenylene; or the group —D 1 —D 2 —D 3 —, wherein D 1 and D 3 are phenylene or dicyclohexylene and D 2 is O or C 2 -C 4 -alkylene; A especially signifies C 2 -C 4 -alkylene.
- a 1 , A 2 and A 3 independently of one another, have the same significances as given above for A in formula (IIa), and
- X signifies N or CH.
- Heterocyclyl A and U in the compounds of formulae (IIa) and (IIb) is preferably an aromatic or non-aromatic, three- to ten-membered ring. If the rings A and U are aromatic, they are preferably the same rings as defined above for Het. If the rings A and U are non-aromatic heterocyclic rings, they are especially piperidinyl, piperazinyl, morpholinyl, pyrrolidinyl, tetrahydrofuranyl and dioxolanyl.
- the radicals A 1 , A 2 and A 3 independently of one another are most preferably C 2 -C 4 -alkylene, especially ethylene.
- a further object of the invention is
- R 2 has the same significance as defined above for formula (I); and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, is reacted when producing a compound of formula (IIIa) with two equivalents or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
- halogen preferably chlorine, bromine or iodine, especially chlorine, or sulfonic acid radicals, such as alkylsulfonic acid radicals, mesylate or tosylate.
- the process step according to b) may be carried out preferably at normal or at a slightly raised pressure and in the presence of preferably aprotic solvents or diluents.
- Suitable solvents or diluents are e.g.
- ethers and ether-type compounds such as diethyl ether, dipropyl ether, dibutyl ether, dioxane, dimethoxyethane and tetrahydrofuran; aliphatic, aromatic and halogenated hydrocarbons, especially benzene, toluene, xylene, chloroform, methylene chloride, carbon tetrachloride and chlorobenzene; nitriles such as acetonitrile or propionitrile; dimethyl sulfoxide or dimethyl formamide, as well as mixtures of these solvents.
- This process step is generally carried out at a temperature of ⁇ 20° C. to +140° C., preferably between 0° C.
- Suitable bases are e.g. carbonates, such as sodium and potassium carbonate. Hydrides may also be used as bases, for example sodium hydride, potassium hydride and calcium hydride. If required, the reaction can also be carried out in the presence of a catalyst, e.g. cesium chloride.
- a catalyst e.g. cesium chloride.
- a further object of the invention is
- E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof each in free form or in salt form, wherein A and U have the same significance as defined above for the compounds of formulae (IIa) and (IIb), and which are known or may be produced analogously to methods known per se, is reacted when producing a compound of formula (IIIa) either with two equivalents, or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
- the process according to c) for the preparation of the compounds of formula (III) is advantageously carried out at normal pressure, but also optionally at a raised pressure in the presence of an inert solvent and at temperatures of between 0° C. and +140° C., preferably between +20° C. and +120° C.
- Suitable solvents are, in particular, alcohols such as methanol, ethanol, and propanol, as well as water. Further suitable solvents are eg.
- aromatic hydrocarbons such as benzene, toluene and xylene; ethers such as tetrahydrofuran, dioxane and diethyl ether, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and chlorobenzene, as well as other solvents which to not impair the reaction.
- the solvents may also be used as mixtures.
- the process is optionally effected adding an acidic catalyst, such as HCl, H 2 SO 4 or a sulfonic acid, such as p-toluene-sulfonic acid.
- the resulting reaction water may be removed, if desired, using a water separator or by adding a molecular sieve.
- a further object of the invention is
- E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof each in free form or in salt form, wherein A and U have the same significance as defined above for the compounds of formulae (IIa) and (IIb), and which are known or may be produced analogously to methods known per se, is reacted when producing a compound of formula (IIIa) either with two equivalents, or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
- the process according to c) for the preparation of the compounds of formula (III) is advantageously carried out at normal pressure, but also optionally at a raised pressure in the presence of an inert solvent and at temperatures of between 0° C. and +140° C., preferably between +20° C. and +120° C.
- Suitable solvents are, in particular, alcohols such as methanol, ethanol, and propanol, as well as water. Further suitable solvents are e.g.
- aromatic hydrocarbons such as benzene, toluene and xylene; ethers such as tetrahydrofuran, dioxane and diethyl ether, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and chlorobenzene, as well as other solvents which to not impair the reaction.
- the solvents may also be used as mixtures.
- the process is optionally effected adding an acidic catalyst, such as HCl, H 2 SO 4 or a sulfonic acid, such as p-toluene-sulfonic acid.
- the resulting reaction water may be removed, if desired, using a water separator or by adding a molecular sieve.
- a further object of the invention is
- Further objects of the invention are the compounds of formulae (IIa), (IIb), (IIIa) and (IIIb), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form.
- the compounds of formula (I) produced according to the invention are known. They are valuable active ingredients in pest control, that are well tolerated by warm-blooded animals, fish and plants.
- the compounds of formula (I) are especially suitable for the control of insects and arachnids, which appear on crops and ornamentals in agriculture, especially in cotton, vegetable and fruit plantations, in forestry, in the protection of stock and material, as well as in the hygiene sector, especially on domestic animals and productive livestock.
- the compounds are especially effective against plant-damaging sucking insects, especially against aphids and plant and leaf hoppers.
- a mixture of 1.8 g of 1-methyl-2-nitroguanidine, 1.35 g of paraformaldehyde and 0.78 g of 1,5-diamino-3-oxa-pentane in 20 ml of toluene and 20 ml of dioxane is mixed at room temperature with two drops of a 37% solution of HCl in water, then heated to reflux temperature and stirred at this temperature for 6 hours. The mixture is then evaporated to dryness under vacuum, the residue stirred with diethyl ether and the title compound isolated by filtration (compound 1.15).
- a mixture of 8.0 g of 1-methyl-2-nitroguanidine and 3.0 g of 1,4-diaminobutane in 25 ml of ethanol is mixed at room temperature with 25 ml of a 37% solution of formaldehyde in water, heated to 50° C. and stirred at this temperature for 16 hours. Then, the mixture is evaporated to dryness under vacuum, and the residue is stirred with ethanol. The title compound is obtained with a melting point of 232-234° C. (compound 1.4).
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Abstract
and, if appropriate, the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, wherein
R1 is hydrogen or C1-C4-alkyl;
R2 is hydrogen, C1-C6-alkyl, C3-C6-cycloalkyl or a radical —CH2B;
Het is an unsubstituted or substituted heterocyclic radical; and
B is phenyl, 3-pyridyl or thiazolyl, which are optionally substituted;
characterised in that a compound of formula
Q—A—Q (IIa)
wherein U is an organic radical; and in compounds (IIa) and (IIb)
and R1, R2 and Het are as defined above for formula (I), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, is hydrolysed;
and a method for producing the compounds of formulae (IIa), (IIb), (IIIa) and (IIIb); are described.
Description
- The present invention relates to a novel type of method of producing substituted 2-nitro-guanidine derivatives.
- It is known that, in order to produce 1,3-disubstituted 2-nitroguanidines, a further substituent may be introduced into monosubstituted 2-nitroguanidines (e.g. by alkylation) (see e.g. EP patent applications 0.375.907, 0.376.279 and 0.383.091). Owing to the presence of three reactive hydrogen atoms in the monosubstituted 2-nitroguanidines used as the starting material in these reactions, the previously proposed substitution reactions of this kind are often non-selective and lead to undesired substitution products. The mentioned EP patent applications describe the production of 1,3-disubstituted 2-nitroguanidines by reacting monosubstituted nitroisothioureas with primary amines whilst cleaving mercaptan. However, these nitroisothiourea compounds, containing alkylthio leaving groups, which are proposed as starting compounds in the known processes, can only be obtained with difficulty. In addition, in EP-A-0483.062, a method of producing the compounds of formula (I) by hydrolysis of hexahydro-triazines is described.
- It has now been shown that the above-described methods of producing compounds of formula (I) do not satisfy the requirements in respect of purity and yield, for which reason there is therefore a need to provide improved methods of producing these compounds from readily available starting compounds. It has now surprisingly been found that the method according to the invention is able to satisfy these requirements to a large extent.
- Accordingly, it is the aim of the present invention to provide an improved method of producing 1-monosubstituted and 1,3-disubstituted 2-nitroguanidines from readily obtainable starting compounds, which allows specific 1,3-disubstitution without obtaining major amounts of undesired by-products.
- The object of the invention is
-
- and, if appropriate, the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, wherein
- R 1 is hydrogen or C1-C4-alkyl;
- R 2 is hydrogen, C1-C6-alkyl, C3-C6-cycloalkyl or a radical —CH2B;
- Het is an aromatic or non-aromatic, monocyclic or bicyclic heterocyclic radical which is unsubstituted or—depending on the substitution possibilities of the ring system—mono- to penta- substituted by substituents selected from the group comprising halogen, C 1-C3-alkyl, C1-C3-alkoxy, halogen-C1-C3-alkyl, C1-C3-halogenalkoxy, cyclopropyl, halogencyclopropyl, C2-C3-alkenyl, C2-C3-alkynyl, C2-C3-halogenalkenyl and C2-C3-halogenalkynyl, C1-C3-alkylthio, C1-C3-halogenalkylthio, allyloxy, propargyloxy, allylthio, propargylthio, halogenallyloxy, halogenallylthio, cyano and nitro; and
- B is phenyl, 3-pyridyl or thiazolyl, which are optionally substituted by one to three substituents from the group comprising C 1-C3-alkyl, C1-C3-halogenalkyl, cyclopropyl, halogencyclopropyl, C2-C3-alkenyl, C2-C3-alkynyl, C1-C3-alkoxy, C2-C3-halogenalkenyl, C2-C3-halogenalkynyl, C1-C3-halogenalkoxy, C1-C3-alkylthio, C1-C3-halogenalkylthio, allyloxy, propargyloxy, allylthio, propargylthio, halogenallyloxy, halogenallylthio, halogen, cyano and nitro;
- characterised by hydrolysing a compound of formula
- Q—A—Q (IIa)
-
- wherein U is an organic radical; and in compounds (IIa) and (IIb)
-
- and R 1, R2 and Het are as defined above for formula (I), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form.
-
- Accordingly, any reference to compounds of formula (I) hereinbefore and hereinafter is understood to include also their corresponding E/Z isomers, even if the latter are not specifically mentioned in each case.
-
- Accordingly, any reference to compounds of formula (I) hereinbefore and hereinafter is understood to include also their corresponding tautomers, even if the latter are not specifically mentioned in each case.
- The compounds of formula (I) and, where appropriate, the E/Z isomers and tautomers thereof, may be present as salts. Compounds of formula (I) having at least one basic centre may form e.g. acid addition salts. These are formed for example with strong inorganic acids, such as mineral acids, e.g. sulfuric acid, a phosphoric acid or a hydrohalic acid, or with strong organic carboxylic acids, such as C 1-C4alkanecarboxylic acids substituted where appropriate for example by halogen, e.g. acetic acid, such as optionally unsaturated dicarboxylic acids, e.g. oxalic, malonic, maleic, fumaric or phthalic acid, such as hydroxy-carboxylic acids, e.g. ascorbic, lactic, malic, tartaric or citric acid, or benzoic acid, or with organic sulfonic acids, typically C1-C4alkane or arylsulfonic acids substituted where appropriate for example by halogen, e.g. methane-, trifluoromethane- or p-toluene-sulfonic acid. Salts of compounds of formula (I) with acids of the said kind are preferably obtained when working up the reaction mixtures.
- In a broader sense, compounds of formula (I) with at least one acid group can form salts with bases. Suitable salts with bases are for example metal salts, typically alkali or alkaline earth metal salts, e.g. sodium, potassium or magnesium salts, or salts with ammonia or an organic amine, such as morpholine, piperidine, pyrrolidine, a mono-, di- or tri-lower alkylamine, e.g. ethyl-, diethyl-, triethyl- or dimethylpropylamine, or a mono-, di- or trihydroxy-lower alkylamine, e.g. mono-, di- or triethanolamine. Corresponding internal salts where appropriate may also be formed. Preferred compounds within the scope of this invention are agrochemically advantageous salts. Hereinbefore and hereinafter, the free compounds of formula (I) are understood where appropriate to include also by analogy the corresponding salts, or the salts are understood to include also the free compounds of formula (I). The same applies to E/Z isomers and tautomers of compounds of formula (I) and salts thereof. The free form is preferred.
- The statements made about the free compounds of formula (I) or the E/Z isomers and tautomers and salts thereof also apply by analogy to the compounds of formulae (IIa) and (IIb), as well as the compounds of formulae (IIa) and (IIIb) below.
- In the definitions of the above formulae (I), (IIa), (IIb) and of the compounds of formulae (IIIa) and (IIIb) below, the individual generic terms are to be understood as follows:
- The halogen atoms considered as substituents may be both fluorine and chlorine, and bromine and iodine, whereby fluorine, chlorine and bromine are preferred, especially chlorine. Halogen in this context is understood to be an independent substituent or part of a substituent, such as in halogenalkyl, halogenalkylthio, halogenalkoxy, halogencycloalkyl, halogenalkenyl, halogenalkynyl, halogenallyloxy or halogenallylthio. The alkyl, alkylthio, alkenyl, alkynyl and alkoxy radicals considered as substituents may be straight-chained or branched. Examples of such alkyls which may be mentioned are methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec.-butyl or tert.-butyl. Suitable alkoxy radicals which may be mentioned are, inter alia: methoxy, ethoxy, propoxy, isopropoxy or butoxy and the isomers thereof. Alkylthio is for example methylthio, ethylthio, isopropylthio, propylthio or the isomeric butylthio. If the alkyl, alkoxy, alkenyl, alkynyl or cycloalkyl groups considered as substituents are substituted by halogen, they may be only partially halogenated or also perhalogenated. The above-mentioned definitions apply here to halogen, alkyl and alkoxy. Examples of the alkyl elements of these groups are methyl which is mono- to trisubstituted by fluorine, chlorine and/or bromine, such as CHF 2 or CF3; ethyl which is mono- to pentasubstituted by fluorine, chlorine and/or bromine, such as CH2CF3, CF2CF3, CF2CCl3, CF2CHCl2, CF2CHF2, CF2CFCl2, CF2CHBr2, CF2CHClF, CF2CHBrF or CClFCHClF; propyl or isopropyl, mono- to heptasubstituted by fluorine, chlorine and/or bromine, such as CH2CHBrCH2Br, CF2CHFCF3, CH2CF2CF3 or CH(CF3)2; butyl or one of its isomers, mono- to nonasubstituted by fluorine, chlorine and/or bromine, such as CF(CF3)CHFCF3 or CH2(CF2)2CF3; 2-chlorocyclopropyl or 2,2-difluorocyclopropyl; 2,2-difluorovinyl, 2,2-dichlorovinyl, 2-chloroalkyl, 2,3-dichiorovinyl or 2,3-dibromovinyl.
- If the defined alkyl, alkoxy or cycloalkyl groups are substituted by other substituents, they may be mono- or repeatedly substituted by identical or different substituents from those listed. In the substituted groups, it is preferable for one or two further substituents to be present. The cycloalkyl radicals considered as substituents may be, for example, cyclopropyl, cyclobutyl, cyclopentyl or cyclohexyl. Alkenyl and alkynyl groups contain an unsaturated carbon-carbon bond. Typical representatives are allyl, methallyl or propargyl, but also vinyl and ethynyl. The double or triple bonds in allyloxy, propargyloxy, allylthio or propargylthio are separated from the connection point to the hetero atom (O or S) preferably by a saturated carbon atom.
- As with the above-mentioned alkyl, alkenyl and alkynyl groups, the alkylene, alkenylene and alkynylene groups defined in the following may also be straight-chained or branched. Examples are —CH 2—CH2—, —CH2—CH2—CH2—, —CH2—CH2—CH2—CH2—, —CH2—C(CH3)H— and —C(CH3)H—C(CH3)H—. The alkylene, alkenylene, alkynylene, cycloalkylene, arylene or heterocyclyl groups listed below are, where appropriate, substituted in the same way as the above-mentioned alkyl, alkenyl and alkynyl groups.
- Aryl or arylene signifies phenyl or naphthyl, or phenylene or naphthylene, especially phenyl or phenylene.
- In the context of the present invention, the heteroaryl radical indicated as Het signifies preferably a 5- to 7-membered, aromatic or non-aromatic ring with one to three hetero atoms selected from the group comprising N, O and S. Preference is given to aromatic 5- and 6-rings, which have a nitrogen atom as the hetero atom and optionally one further hetero atom, preferably nitrogen, oxygen or sulphur, especially nitrogen.
- It has now surprisingly been found that the method according to the invention is able to satisfy the requirements mentioned initially.
- The hydrolysis process according to the invention may be carried out both in an acidic and in a basic medium. In the acidic range, pH values of 6 or less, especially 1 to 3, are preferred.
- In the basic range, a pH value greater than 7 and up to 12, especially 8 to 12, in particular 8 to 10, is preferred. The reaction is carried out at normal pressure and at a temperature of 0 to 120° C., preferably 20 to 80° C.
- The reaction is carried out in a solvent or diluent that is inert towards the reaction components. Suitable solvents are, in particular, alcohols such as methanol, ethanol, propanol and isopropanol, as well as especially water. Further appropriate solvents are e.g. ethers, such as tetrahydrofuran and dioxane, as well as other solvents which do not adversely affect the reaction. The solvents may also be used as mixtures. A compound of formula (II) is preferably hydrolysed in an aqueous medium or in a mixture of water with an alcohol.
- Suitable acids for carrying out the process are preferably mineral acids, e.g. sulfuric acid, a phosphoric acid or a hydrohalic acid, an organic carboxylic acid, typically C 1-C4alkane-carboxylic acids substituted where appropriate for example by halogen, e.g. acetic acid, such as dicarboxylic acids that are unsaturated where necessary, e.g. oxalic, malonic, maleic, fumaric or phthalic acid, typically hydroxycarboxylic acids, e.g. ascorbic, lactic, malic, tartaric or citric acid, or benzoic acid, or an organic sulfonic acid, typically C1-C4alkane- or aryl-sulfonic acids substituted where appropriate for example by halogen, e.g. methanesulfonic or p-toluenesulfonic acid.
- Suitable bases for carrying out the process are preferably hydroxides of alkali metals and alkaline earth metals, such as NaOH and KOH, carbonates such as Na 2CO3, NaHCO3, K2CO3; phosphates such as Na3PO4, Na2HPO4, alcoholates such as sodium methanolate, sodium ethanolate and K-tert.-butanolate, organic amines such as morpholine, piperidine, pyrrolidine, a mono-, di- or tri-lower alkylamine, e.g. ethyl-, diethyl, triethyl- or dimethyl-propyl-amine, or a mono-, di- or trihydroxy lower alkylamine, e.g. mono-, di- or triethanol-amine, or dialkylaniline, for example N,N-dimethyl- or N,N-diethylaniline, as well as salts of organic acids, such as sodium acetate, potassium acetate or sodium benzoate, or mixtures thereof, for example acetate or phosphate buffers.
- Especially advantageous reaction conditions are described in the examples.
- The method according to the invention is preferably used to produce compounds of formula (I) in which the heterocyclic radical Het is unsaturated and is bonded by a carbon atom as a ring member to the fundamental substance. Especially preferred radicals Het are pyridyl, thiazolyl, tetrahydrofuranyl, dihydrofuranyl, furanyl, N-oxido-pyridinio, oxazolyl, isoxazolyl, thienyl, morpholinyl, piperidinyl, pyridinyl and pyrazinyl; particularly pyridyl, thiazolyl, tetrahydrofuranyl and N-oxido-pyridinio, most particularly 3-pyridyl, 2-halogenpyrid-5-yl, 2,3-dihalogenpyrid-5-yl, 2-halogenthiazol-5-yl, tetrahydrofuran-3-yl, 2-methyl-tetra-hydrofuran-4-yl, 1-oxopyrid-3-yl, 1 -oxo-2-halogenpyrid-5-yl and 1-oxo-2,3-dihalogenpyrid-5-yl.
- Equally preferably, the heterocycles Het carry one to three substituents from the group halogen, C 1-C3-alkyl, C1-C3-halogenalkyl and C1-C3-halogenalkoxy each with 1 to 7 halogen atoms, and C1-C3-alkoxy, most preferably chlorine or methyl.
- Furthermore, compounds of formula (I) are preferably produced according to the invention, in which the radical B is a phenyl, pyridyl or thiazolyl radical that is unsubstituted or may be substituted by one to two radicals from the group halogen, C 1-C3-alkyl, C1-C3-halogenalkyl and C1-C3-halogenalkoxy each with 1 to 7 halogen atoms, and C1-C3-alkoxy.
- Of the compounds of formula (I) to be produced according to the invention, the notable ones are those in which
- R 1 is hydrogen;
- R 2 is hydrogen, C1-C3-alkyl or cyclopropyl; especially hydrogen, methyl, ethyl or cyclopropyl, in particular methyl; and
- Het is pyridyl, 1-oxopyridyl, tetrahydrofuranyl, thiazolyl; or pyridyl, 1-oxidopyridinio, tetra-hydrofuranyl or thiazolyl, respectively substituted by one to three substituents from the group halogen, C 1-C3-alkyl, C1-C3-halogenalkyl as well as C1-C3-halogenalkoxy with 1 to 7 halogen atoms and C1-C3-alkoxy;
- especially 2-chloropyrid-5-yl, tetrahydrofuran-3-yl, 2-methyl-tetrahydrofuran-4-yl or 2-chloro-thiazol-5-yl.
- To carry out the process according to the invention, on the one hand preferably those compounds of formula (IIa) are used, in which A is straight-chained or branched C 2-C20-alkylene, C2-C20-alkenylene, C2-C20-alkynylene, C3-C12-cycloalkylene, arylene or hetero-cyclylene; whereby the groups C2-C20-alkylene, C2-C20-alkenylene, C2-C20-alkynylene, C3-C12-cycloalkylene, arylene and heterocyclylene are optionally substituted once or several times, independently of each other, and the groups C2-C20-alkylene, C2-C20-alkenylene and C2-C20-alkynylene are optionally interrupted once or several times, independently of each other, by O, N—H or N—C1-C12-alkyl, C3-C9-cycloalkylene, arylene or heterocyclylene; or a group —D1—D2—D3—; wherein
- D 1 and D3, independently of each other, signify optionally substituted C3-C12-cycloalkylene or arylene and D2 signifies C2-C20-alkylene, C2-C20-alkenylene, C2-C20-alkynylene, O, N—H or N—C1-C12-alkyl.
- Particularly preferred bridging members A are C 2-C12-alkylene, C2-C12-alkylene interrupted by one or two phenylene, cyclohexylene or piperazinylene radicals; cyclohexylene or phenylene; or the group —D1—D2—D3—, wherein D1 and D3 are phenylene or dicyclohexylene and D2 is O or C2-C4-alkylene; A especially signifies C2-C4-alkylene.
-
- wherein
- A 1, A2 and A3 independently of one another, have the same significances as given above for A in formula (IIa), and
- X signifies N or CH.
- Heterocyclyl A and U in the compounds of formulae (IIa) and (IIb) is preferably an aromatic or non-aromatic, three- to ten-membered ring. If the rings A and U are aromatic, they are preferably the same rings as defined above for Het. If the rings A and U are non-aromatic heterocyclic rings, they are especially piperidinyl, piperazinyl, morpholinyl, pyrrolidinyl, tetrahydrofuranyl and dioxolanyl. The radicals A 1, A2 and A3 independently of one another are most preferably C2-C4-alkylene, especially ethylene.
- A further object of the invention is
- b) a method of producing a compound of formula (IIa) and (IIb), in which a compound of formula
- T—A—T (IIa)
-
-
- and R 2 has the same significance as defined above for formula (I); and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, is reacted when producing a compound of formula (IIIa) with two equivalents or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
- which is known or may be produced analogously to methods known per se, wherein R. and Het are defined as given above for formula (I) and Y is a leaving group, preferably in the presence of a base.
- The following may be considered as the leaving group Y in the context of the described method of operation: halogen, preferably chlorine, bromine or iodine, especially chlorine, or sulfonic acid radicals, such as alkylsulfonic acid radicals, mesylate or tosylate.
- The process step according to b) may be carried out preferably at normal or at a slightly raised pressure and in the presence of preferably aprotic solvents or diluents. Suitable solvents or diluents are e.g. ethers and ether-type compounds, such as diethyl ether, dipropyl ether, dibutyl ether, dioxane, dimethoxyethane and tetrahydrofuran; aliphatic, aromatic and halogenated hydrocarbons, especially benzene, toluene, xylene, chloroform, methylene chloride, carbon tetrachloride and chlorobenzene; nitriles such as acetonitrile or propionitrile; dimethyl sulfoxide or dimethyl formamide, as well as mixtures of these solvents. This process step is generally carried out at a temperature of −20° C. to +140° C., preferably between 0° C. and +120° C., preferably in the presence of a base. Suitable bases are e.g. carbonates, such as sodium and potassium carbonate. Hydrides may also be used as bases, for example sodium hydride, potassium hydride and calcium hydride. If required, the reaction can also be carried out in the presence of a catalyst, e.g. cesium chloride.
- A further object of the invention is
- c) a method of producing the compounds of formula (IIIa) and (IIIb), in which a compound of formula
- H2N—A—NH2 (Va)
-
- and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, wherein A and U have the same significance as defined above for the compounds of formulae (IIa) and (IIb), and which are known or may be produced analogously to methods known per se, is reacted when producing a compound of formula (IIIa) either with two equivalents, or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
- which is known or may be produced analogously to methods known per se, and wherein R 2 has the same significance as defined for formula (I), in the presence of an excess of formaldehyde or paraformaldehyde.
- The process according to c) for the preparation of the compounds of formula (III) is advantageously carried out at normal pressure, but also optionally at a raised pressure in the presence of an inert solvent and at temperatures of between 0° C. and +140° C., preferably between +20° C. and +120° C. Suitable solvents are, in particular, alcohols such as methanol, ethanol, and propanol, as well as water. Further suitable solvents are eg. aromatic hydrocarbons, such as benzene, toluene and xylene; ethers such as tetrahydrofuran, dioxane and diethyl ether, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and chlorobenzene, as well as other solvents which to not impair the reaction. The solvents may also be used as mixtures. The process is optionally effected adding an acidic catalyst, such as HCl, H 2SO4 or a sulfonic acid, such as p-toluene-sulfonic acid. The resulting reaction water may be removed, if desired, using a water separator or by adding a molecular sieve.
- A further object of the invention is
- d) a method of producing a compound of formula (I), in which a compound of formula (Va) or (Vb) is converted into a compound of formula (IIIa) or (IIIb) by reacting it with a compound of
- c) a method of producing the compounds of formula (IIa) and (IIIb), in which a compound of formula
- H2N—A—NH2 (Va)
-
- and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, wherein A and U have the same significance as defined above for the compounds of formulae (IIa) and (IIb), and which are known or may be produced analogously to methods known per se, is reacted when producing a compound of formula (IIIa) either with two equivalents, or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
- which is known or may be produced analogously to methods known per se, and wherein R 2 has the same significance as defined for formula (I), in the presence of an excess of formaldehyde or paraformaldehyde.
- The process according to c) for the preparation of the compounds of formula (III) is advantageously carried out at normal pressure, but also optionally at a raised pressure in the presence of an inert solvent and at temperatures of between 0° C. and +140° C., preferably between +20° C. and +120° C. Suitable solvents are, in particular, alcohols such as methanol, ethanol, and propanol, as well as water. Further suitable solvents are e.g. aromatic hydrocarbons, such as benzene, toluene and xylene; ethers such as tetrahydrofuran, dioxane and diethyl ether, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and chlorobenzene, as well as other solvents which to not impair the reaction. The solvents may also be used as mixtures. The process is optionally effected adding an acidic catalyst, such as HCl, H 2SO4 or a sulfonic acid, such as p-toluene-sulfonic acid. The resulting reaction water may be removed, if desired, using a water separator or by adding a molecular sieve.
- A further object of the invention is
- d) a method of producing a compound of formula (I), in which a compound of formula (Va) or (Vb) is converted into a compound of formula (IIIa) or (IIIb) by reacting it with a compound of formula (VI) and formaldehyde or paraformaldehyde; this compound of formula (IIIa) or (IIIb) is converted by a compound of formula (IV) into a compound of formula (IIa) or (IIb) and this compound of formula (IIa) or (IIb) is hydrolysed.
- Further objects of the invention are the compounds of formulae (IIa), (IIb), (IIIa) and (IIIb), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form.
- Especially preferred embodiments of the method according to variants b) to d) may be taken from the examples.
- The compounds of formula (I) produced according to the invention are known. They are valuable active ingredients in pest control, that are well tolerated by warm-blooded animals, fish and plants. The compounds of formula (I) are especially suitable for the control of insects and arachnids, which appear on crops and ornamentals in agriculture, especially in cotton, vegetable and fruit plantations, in forestry, in the protection of stock and material, as well as in the hygiene sector, especially on domestic animals and productive livestock. The compounds are especially effective against plant-damaging sucking insects, especially against aphids and plant and leaf hoppers.
-
- A mixture of 3.0 g of 1-methyl-2-nitroguanidine, 0.85 g of 1,2-diaminoethane, 15 ml of dioxane and 5.7 ml of a 37% solution of formaldehyde in water at room temperature is heated to 50° C. and stirred at this temperature for 4 hours. The mixture is then evaporated to dryness under vacuum, the residue stirred with diethyl ether and the title compound isolated by filtration. M.p. 222-223° C. (compound 1.1).
-
- A mixture of 1.8 g of 1-methyl-2-nitroguanidine, 1.35 g of paraformaldehyde and 0.78 g of 1,5-diamino-3-oxa-pentane in 20 ml of toluene and 20 ml of dioxane is mixed at room temperature with two drops of a 37% solution of HCl in water, then heated to reflux temperature and stirred at this temperature for 6 hours. The mixture is then evaporated to dryness under vacuum, the residue stirred with diethyl ether and the title compound isolated by filtration (compound 1.15).
-
- A mixture of 8.0 g of 1-methyl-2-nitroguanidine and 3.0 g of 1,4-diaminobutane in 25 ml of ethanol is mixed at room temperature with 25 ml of a 37% solution of formaldehyde in water, heated to 50° C. and stirred at this temperature for 16 hours. Then, the mixture is evaporated to dryness under vacuum, and the residue is stirred with ethanol. The title compound is obtained with a melting point of 232-234° C. (compound 1.4).
-
- A mixture of 6.0 g of 1-methyl-2-nitroguanidine and 5.4 g of 4,9-dioxa-1,12-diaminododecane in 25 ml of ethanol is mixed at room temperature with 19 ml of a 37% solution of formaldehyde in water, heated to 50° C. and stirred at this temperature for 16 hours. Then, the mixture is cooled to 5° C., filtered and the residue washed with a little ethanol. The title compound is obtained with a melting point of 140-143° C. (compound 1.14).
- The following compounds listed in Table I can also be obtained analogously to the above methods of examples P1.1 to P1.4.
TABLE 1 Compounds of formula No. A phys. data 1.1 —(CH2)2— m.p. 222- 223° C. 1.2 —CH(CH3)—CH2— 1.3 —(CH2)3— 1.4 —(CH2)4— m.p. 232- 234° C. 1.5 —(CH2)5— 1.6 —(CH2)6— 1.7 —(CH2)7— 1.8 —(CH2)8— 1.9 —(CH2)9— 1.10 —(CH2)10— 1.11 —(CH2)12— 1.12 —CH2—C(CH3)2—CH2— 1.13 —CH2—CH(OH)—CH2— 1.14 —(CH2)3—O—(CH2)4—O—(CH2)3— m.p. 140- 143° C. 1.15 —CH2—CH2—O—CH2—CH2— 1.16 —CH2—CH(CH3)—(CH2)3— 1.17 —(CH2)2—O—(CH2)2—O—(CH2)2— 1.18 —(CH2)3—O—(CH2)2—O—(CH2)2—O—(CH2)3— 1.19 —(CH2)3—N(CH3)—(CH2)3— 1.20 1.21 1.22 1.23 1.24 1.25 1.26 1.27 1.28 1.29 1.30 -
- A mixture of 2.4 g of 1-methyl-2-nitroguanidine and 1.0 g of tris(2-aminoethyl)amine in 50 ml of ethanol is mixed at room temperature with 30 ml of a 37% solution of formaldehyde in water, heated to 50° C. and stirred at this temperature for 16 hours. The mixture is then evaporated to dryness under vacuum, the residue stirred with diethyl ether/ethyl acetate (1:1) and the title compound isolated by filtration (compound 2.1).
-
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- A mixture of 2.0 g of the product obtainable according to example P1.1, 1.6 g of 2-chloro-5-chloromethylpyridine and 2.8 g of potassium carbonate in 20 ml of dimethylformamide is stirred for 9 hours at 90° C. Then, the reaction mixture is filtered, the filtrate concentrated by evaporation under vacuum, and the residue taken up in 100 ml of dichloromethane. The organic phase is washed with 50 ml of water and 50 ml of saturated sodium chloride solution, dried over MgSO 4 and evaporated to dryness. The residue is stirred with diethyl ether and the title compound isolated by filtration (compound 10.B.1).
-
- A mixture of 3.7 g of the compound obtainable according to example P1.3, 3.2 g of 2-chloro-5-chloromethylpyridine and 5.5 g of potassium carbonate in 20 ml of dimethylformamide is stirred for 16 hours at 55° C. Then, the reaction mixture is filtered, the filtrate is concentrated by evaporation under vacuum, the residue is stirred in methanol and filtration carried out. This yields the title compound with a melting point of 178-180° C. (compound 10.B.4).
-
- A mixture of 4.9 g of the compound obtainable according to example P1.4, 3.24 g of 2-chloro-5-chloromethylpyridine and 5.5 g of potassium carbonate in 20 ml of dimethylformamide is stirred for 16 hours at 55° C. Then, the reaction mixture is filtered, the filtrate concentrated by evaporation under vacuum, and the residue purified on silica gel with ethyl acetate/methanol (2:1) as eluant. This yields the title compound with a melting point of 70-72° C. (compound 10.B.14).
-
- A mixture of 2.0 g of the compound obtainable according to example P1.1, 1.95 g of 2-chloro-5-chloromethylthiazole, 4.0 g of potassium carbonate and 1.53 g of 18-Crown-6 (1,5,7,10,13,16-hexaoxacyclooctadecane) in 20 ml of tetrahydrofuran is stirred for 24 hours at 50° C. Then, the reaction mixture is filtered, the filtrate concentrated by evaporation under vacuum, and the residue purified on silica gel with dichloromethane/methanol (9:1) as eluant. This yields the title compound with a melting point of 175-178 ° C. (compound 3.B.1).
- The following compounds listed in Tables 3 to 26 can also be obtained analogously to the above methods of examples P3.1 to P3.4.
TABLE B Compounds of formula (IIc) No. A B.1 —(CH2)2— B.2 —CH(CH3)—CH2— B.3 —(CH2)3— B.4 —(CH2)4— B.5 —(CH2)5— B.6 —(CH2)6— B.7 —(CH2)7— B.8 —(CH2)8— B.9 —(CH2)9— B.10 —(CH2)10— B.11 —(CH2)12— B.12 —CH2—C(CH3)2—CH2— B.13 —CH2—CH(OH)—CH2— B.14 —(CH2)3—O—(CH2)4—O—(CH2)3— B.15 —CH2—CH2—O—CH2—CH2— B.16 —CH2—CH(CH3)—(CH2)3— B.17 —(CH2)2—O—(CH2)2—O—(CH2)2— B.18 —(CH2)3—O—(CH2)2—O—(CH2)2—O—(CH2)3— B.19 —(CH2)3—N(CH3)—(CH2)3— B.20 B.21 B.22 B.23 B.24 B.25 B.26 B.27 B.28 B.29 B.30 -
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- 1.2 g of the compound obtainable according to example P3.1 are stirred for 16 hours at room temperature together with 10 ml of methanol and 10 ml of 1 n hydrochloric acid. The reaction mixture is concentrated to dryness by evaporation and the residue purified on silica gel with dichloromethane/methanol (95:5) as the eluant. This yields the title product with a melting point of 147-149° C. (compound 27.6).
-
- 1.2 g of the compound obtainable according to example P3.4 are stirred for 40 hours at 50° C. together with 3.3 ml of methanol and 3.3 ml of 1 n hydrochloric acid. The reaction mixture is evaporated to dryness and the residue recrystallised from methanol. This yields the title product with a melting point of 170-172° C. (compound 27.1).
- The following compounds listed in Table 27 can also be obtained analogously to the above methods of examples 4.1 and 4.2.
TABLE 27 Compounds of the general formula (I) No. Het phys. data 27.1 m.p. 170-172° C. 27.2 27.3 27.4 m.p. 166-168° C. 27.5 27.6 147-149° C. 27.7 27.8 m.p. 173-174° C. 27.9 27.10 27.11 27.12
Claims (11)
1. Method of producing a compound of formula
and, if appropriate, the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, wherein
R1 is hydrogen or C1-C4-alkyl;
R2 is hydrogen, C1-C6-alkyl, C3-C6-cycloalkyl or a radical —CH2B;
Het is an aromatic or non-aromatic, monocyclic or bicyclic heterocyclic radical which is unsubstituted or—depending on the substitution possibilities of the ring system—mono- to penta-substituted by substituents selected from the group comprising halogen, C1-C3-alkyl, C1-C3-alkoxy, halogen-C1-C3-alkyl, C1-C3-halogenalkoxy, cyclopropyl, halogencyclopropyl, C2-C3-alkenyl, C2-C3-alkynyl, C2-C3-halogenalkenyl and C2-C3-halogenalkynyl, C1-C3-alkylthio, C1-C3-halogenalkylthio, allyloxy, propargyloxy, allylthio, propargylthio, halogenallyloxy, halogenallylthio, cyano and nitro; and
B is phenyl, 3-pyridyl or thiazolyl, which are optionally substituted by one to three substituents from the group comprising C1-C3-alkyl, C1-C3-halogenalkyl, cyclopropyl, halogencyclopropyl, C2-C3-alkenyl, C2-C3-alkynyl, C1-C3-alkoxy, C2-C3-halogenalkenyl, C2-C3-halogenalkynyl, C1-C3-halogenalkoxy, C1-C3-alkylthio, C1-C3-halogenalkylthio, allyloxy, propargyloxy, allylthio, propargylthio, halogenallyloxy, halogenallylthio, halogen, cyano and nitro;
characterised by hydrolysing a compound of formula
Q—A—Q (IIa)
wherein A is a direct bond or an organic radical, or of formula
wherein U is an organic radical; and in compounds (IIa) and (Ib)
Q signifies
wherein R1, R2 and Het are as defined above for formula (I), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form.
2. Method according to claim 1 of producing a compound of formula (I) in free form.
3. Method according to claim 1 or 2 of producing a compound of formula (I) wherein R. is hydrogen.
4. Method according to one of claims 1 to 3 of producing a compound of formula (I), wherein
R2 is hydrogen, C1-C3-alkyl or cyclopropyl.
5. Method according to one of claims 1 to 4 of producing a compound of formula (I) from a compound of formula (IIa), wherein
A is straight-chained or branched C2-C20-alkylene, C2-C20-alkenylene, C2-C20-alkynylene,
C3-C12-cycloalkylene, arylene or heterocyclylene; whereby the groups C2-C20-alkylene,
C2-C20-alkenylene, C2-C20-alkynylene, C3-C12-cycloalkylene, arylene and heterocyclylene are optionally substituted once or several times, independently of each other, and the groups
C2-C20-alkylene, C2-C20-alkenylene and C2-C20-alkynylene are optionally interrupted once or several times, independently of each other, by O, N—H or N—C1-C12-alkyl, C3-C9-cycloalkylene, arylene or heterocyclylene; or a group —D1-D2-D3—; wherein
D1 and D3, independently of each other, signify optionally substituted C3-C12-cycloalkylene or arylene and D2 signifies C2-C20-alkylene, C2-C20-alkenylene, C2-C20-alkynylene, O, N—H or N—C1-Cl2-alkyl.
6. Method according to one of claims 1 to 4 of producing a compound of formula (I) from a compound of formula (IIb), wherein
U is aryl, heterocyclyl, C3-C12-cycloalkyl or a group
wherein
A1, A2 and A3 independently of one another, have the same significances as given in claim 5 for A in formula (IIa), and
X signifies N or CH.
7. Method according to one of claims 1 to 6 of producing a compound of formula (I) wherein Het signifies 2-chloropyrid-5-yl, tetrahydrofuran-3-yl, 5-methyl-tetrahydrofuran-3-yl or 2-chlorothiazol-5-yl.
8. Method according to one of claims 1 to 7 of producing a compound of formula (I), characterised in that the pH value is less than 6.
9. Method according to one of claims 1 to 8 of producing a compound of formula (I), characterised in that it is effected in water, an alcohol or a mixture of water with an alcohol.
10. Method of producing a compound of formula
Q—A—Q (IIa)
wherein A is a direct bond or an organic radical; or of formula
wherein U is an organic radical; and in compounds (IIa) and (IIb)
Q signifies
wherein R1, R2 and Het are as defined in claim 1 for formula (I), and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form. characterised in that a compound of formula
T—A—T (IIIa)
or of formula
wherein A and U have the same significance as defined for formulae (IIa) and (IIb);
T signifies
and R2 has the same significance as defined in claim 1 for formula (I); and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, is reacted when producing a compound of formula (IIa) either with two equivalents, or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
wherein R1 and Het are defined as in claim 1 for formula (I), and Y is a leaving group.
11. Method of producing a compound of formula (IIa) or (IIIb), as defined in claim 10 , characterised in that either a compound of formula
H2N—A—NH2 (Va)
or
and optionally the E/Z isomers, E/Z isomeric mixtures and/or tautomers thereof, each in free form or in salt form, wherein A and U have the same significance as defined in claim 1 for the compounds of formulae (IIa) and (IIb), is reacted when producing a compound of formula (IIIa) either with two equivalents, or when producing a compound of formula (IIIb) with three equivalents of a compound of formula
wherein R2 has the same significance as defined for formula (I), in the presence of an excess of formaldehyde or paraformaldehyde.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/226,181 US20030130520A1 (en) | 1997-08-18 | 2002-08-22 | Method of producing pesticides |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH193497 | 1997-08-18 | ||
| CH1934/97 | 1997-08-18 | ||
| US09/485,873 US6462043B1 (en) | 1997-08-18 | 1998-08-14 | Method for producing substituted-2-nitroguanidine derivatives |
| US10/226,181 US20030130520A1 (en) | 1997-08-18 | 2002-08-22 | Method of producing pesticides |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/485,873 Division US6462043B1 (en) | 1997-08-18 | 1998-08-14 | Method for producing substituted-2-nitroguanidine derivatives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20030130520A1 true US20030130520A1 (en) | 2003-07-10 |
Family
ID=4222018
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/485,873 Expired - Fee Related US6462043B1 (en) | 1997-08-18 | 1998-08-14 | Method for producing substituted-2-nitroguanidine derivatives |
| US10/226,181 Abandoned US20030130520A1 (en) | 1997-08-18 | 2002-08-22 | Method of producing pesticides |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/485,873 Expired - Fee Related US6462043B1 (en) | 1997-08-18 | 1998-08-14 | Method for producing substituted-2-nitroguanidine derivatives |
Country Status (15)
| Country | Link |
|---|---|
| US (2) | US6462043B1 (en) |
| EP (1) | EP1005455A1 (en) |
| JP (1) | JP2001515065A (en) |
| KR (1) | KR20010022974A (en) |
| CN (1) | CN1271345A (en) |
| AU (1) | AU738428B2 (en) |
| BR (1) | BR9811912A (en) |
| CA (1) | CA2300808A1 (en) |
| HU (1) | HUP0003497A3 (en) |
| ID (1) | ID23446A (en) |
| IL (1) | IL134549A0 (en) |
| PL (1) | PL338645A1 (en) |
| RU (1) | RU2202544C2 (en) |
| UA (1) | UA69387C2 (en) |
| WO (1) | WO1999009008A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170140375A (en) * | 2015-06-03 | 2017-12-20 | 닛뽕소다 가부시키가이샤 | Guanidine compounds and disinfectants |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW198724B (en) * | 1990-10-24 | 1993-01-21 | Ciba Geigy Ag | |
| CZ284456B6 (en) * | 1992-02-15 | 1998-12-16 | Hoechst Aktiengesellschaft | Amino substituted benzylguanidines, process of their preparation and their use for preparing medicaments |
-
1998
- 1998-08-14 JP JP2000509692A patent/JP2001515065A/en active Pending
- 1998-08-14 PL PL98338645A patent/PL338645A1/en unknown
- 1998-08-14 IL IL13454998A patent/IL134549A0/en unknown
- 1998-08-14 US US09/485,873 patent/US6462043B1/en not_active Expired - Fee Related
- 1998-08-14 HU HU0003497A patent/HUP0003497A3/en not_active Application Discontinuation
- 1998-08-14 BR BR9811912-5A patent/BR9811912A/en not_active Application Discontinuation
- 1998-08-14 EP EP98946337A patent/EP1005455A1/en not_active Withdrawn
- 1998-08-14 RU RU2000106433/04A patent/RU2202544C2/en not_active IP Right Cessation
- 1998-08-14 CA CA002300808A patent/CA2300808A1/en not_active Abandoned
- 1998-08-14 UA UA2000020845A patent/UA69387C2/en unknown
- 1998-08-14 KR KR1020007001582A patent/KR20010022974A/en not_active Ceased
- 1998-08-14 CN CN98809327A patent/CN1271345A/en active Pending
- 1998-08-14 AU AU93423/98A patent/AU738428B2/en not_active Ceased
- 1998-08-14 WO PCT/EP1998/005166 patent/WO1999009008A1/en not_active Ceased
- 1998-08-14 ID IDW20000317A patent/ID23446A/en unknown
-
2002
- 2002-08-22 US US10/226,181 patent/US20030130520A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| HUP0003497A2 (en) | 2001-02-28 |
| EP1005455A1 (en) | 2000-06-07 |
| AU738428B2 (en) | 2001-09-20 |
| AU9342398A (en) | 1999-03-08 |
| ID23446A (en) | 2000-04-20 |
| CA2300808A1 (en) | 1999-02-25 |
| CN1271345A (en) | 2000-10-25 |
| RU2202544C2 (en) | 2003-04-20 |
| WO1999009008A1 (en) | 1999-02-25 |
| PL338645A1 (en) | 2000-11-06 |
| KR20010022974A (en) | 2001-03-26 |
| US6462043B1 (en) | 2002-10-08 |
| UA69387C2 (en) | 2004-09-15 |
| JP2001515065A (en) | 2001-09-18 |
| HUP0003497A3 (en) | 2002-11-28 |
| IL134549A0 (en) | 2001-04-30 |
| BR9811912A (en) | 2000-08-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |